Security element

Abstract

The invention relates to a security element (1), in particular for security documents, security papers or security articles, such as banknotes, certificates, credit cards, the security element (1) having at least one region (2) with a structure (3), according to the invention, at least one color tilting optical effect layer (4), which results in a color tilting effect, is arranged in the at least one first region (2) when viewed from the first side of the security element, and the structure (3) is covered over the entire surface or in part by the at least one optical effect layer (4), the structure (3) having a depth (T) of greater than 500 nm, in particular between 500 nm-4 [mu] m.

Description

Technical Field

[0001] The present invention relates to a security element, in particular for securities, security papers or security articles, such as banknotes, documents, credit cards, wherein the security element has at least one area with a structure, wherein at least one color-tilted optical effect layer is provided, which causes a color-tilted effect in the at least one first area when viewed from a first side of the security element, and the structure is covered entirely or partially by the at least one optical effect layer. Background Art

[0002] Security elements of the above-mentioned type are usually used to increase the anti-counterfeiting properties of valuable documents or security papers, such as banknotes, certificates, credit cards, bank cards, tickets and the like.

[0003] In the case of security elements of the type mentioned at the outset, undesired coupling effects between the structures and the color-tilted optical effect layer can occur. In particular, the effects produced by the structures can be superimposed on the color-tilted effect of the optical effect layer and interact with it, which can lead to undesired and random impairments, such as attenuation of the color of the optical effect layer and a reduction in the perceptibility of the color-tilted effect for an observer. Such impairments are disadvantageous in particular with regard to the security element's anti-counterfeiting properties. Summary of the invention

[0004] It is therefore an object of the present invention to overcome the above-mentioned disadvantages and to provide a security element which has increased resistance to forgery.

[0005] According to the invention, the above-mentioned task is achieved by a security element of the type mentioned above, i.e., the structure has a depth greater than 500 nm, in particular a depth between 500 nm and 4 μm. In the context of the present invention, the depth of the structure is understood to be the normal distance between the level of the deepest point of the structure and the level of the highest point.

[0006] According to a preferred variant of the present invention, the structure is a light diffraction structure.

[0007] It has proven to be particularly advantageous if the structure is an embossed structure, in particular a structure embossed into an embossing lacquer layer.

[0008] According to an advantageous development of the invention, it is provided that the optical effect layer is designed as a thin-film element and has at least one absorption layer and at least one spacer layer.

[0009] It has proven to be particularly advantageous if the at least one absorption layer comprises at least one metallic material, which is in particular selected from the group of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials, or consists of at least one of these materials.

[0010] Furthermore, it has proven to be particularly advantageous if the at least one spacer layer comprises a low-refractive-index dielectric material having a refractive index of less than or equal to 1.65, which is in particular selected from aluminum oxide (Al2O3), metal fluorides, such as magnesium fluoride (MgF2), aluminum fluoride (AlF3), cerium fluoride (CeF3), sodium aluminum fluoride (such as Na3AlF6 or Na5Al3F 14 ), silicon oxide (SIO x ), silicon dioxide (SiO2), neodymium fluoride (NdF3), lanthanum fluoride (LaF3), samarium fluoride (SmF3), barium fluoride (BaF2), calcium fluoride (CaF2), lithium fluoride (LiF), a low-refractive-index organic monomer and / or a low-refractive-index organic polymer; or at least one high-refractive-index dielectric material having a refractive index greater than 1.65, which is particularly selected from zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C), indium oxide (In 2O3), indium tin oxide (ITO), tantalum pentoxide (Ta2O5), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (Eu2O3), iron oxides, such as iron (II, III) oxide (Fe3O4) and iron (III) oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3), hexaproxypraseodymium undecene oxide (Pr6O 11 ), samarium oxide (Sm2O3), antimony trioxide (Sb2O3), silicon carbide (SiC), silicon nitride (Si3N4), silicon monoxide (SiO), selenium trioxide (Se2O3), tin oxide (SnO2), tungsten trioxide (WO3), a group of high refractive index organic monomers and / or high refractive index organic polymers, or is made of at least one of these materials.

[0011] A preferred embodiment provides that the optical effect layer constructed as a thin-film element further comprises at least one reflective layer and / or a second absorption layer, wherein the at least one spacer layer is arranged between the at least one first absorption layer and the at least one reflective layer and / or the at least one second absorption layer.

[0012] Preferably, the at least one reflective layer comprises at least one metallic material, in particular selected from the group consisting of silver, copper, aluminum, gold, platinum, niobium, tin or selected from the group consisting of nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt-nickel alloys, or comprises at least one high-refractive-index dielectric material having a refractive index greater than 1.65, in particular selected from the group consisting of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C), indium oxide (In2O3), indium tin oxide ( ITO), tantalum pentoxide (Ta2O5), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (Eu2O3), iron oxides such as iron (II, III) oxide (Fe3O4) and iron (III) oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3), hexaproxypraseodymium undecanoate (Pr6O 11 ), samarium oxide (Sm2O3), antimony trioxide (Sb2O3), silicon carbide (SiC), silicon nitride (Si3N4), silicon monoxide (SiO), selenium trioxide (Se2O3), tin oxide (SnO2), tungsten trioxide (WO3), a group of high refractive index organic monomers and / or high refractive index organic polymers, or is made of at least one of these materials.

[0013] Furthermore, it can be provided that the security element comprises a carrier layer made of plastic, wherein in particular the plastic is formed by a light-transmissive and / or thermoplastic plastic and the carrier layer preferably comprises a polymer selected from the group consisting of polyimide (PI), polypropylene (PP), uniaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone (PEEK), polyetherketone (PEK), polyethyleneimine (PEI), polysulfone (PSU), polyaryletherketone (PAEK), polyethylene naphthalate (PEN), liquid crystal polymer (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA), polycarbonate (PC), cycloolefin copolymer (COC), polyoxymethylene (POM), acrylonitrile-butadiene-styrene copolymer (ABS), polyvinyl chloride (PVC) At least one material from the group of ethylene tetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride (PVF), polyvinylidene fluoride (PVDF), ethylene tetrafluoroethylene hexafluoropropylene fluorinated terpolymer (EFEP), cellulose or lignin-based plastics, polyhydroxyalkanoate (PHA), thermoplastic starch (TPS), polylactic acid (PLA), polycaprolactone (PCL), polybutylene succinate (PBS) and polybutylene adipate-terephthalate (PBAT) and / or includes at least one recycled and / or biodegradable and / or marine degradable plastic and / or a mixture and / or copolymer of these materials or is made of at least one of these materials.

[0014] Furthermore, it can be advantageous if the security element is provided with further color-inclined layers, in particular with color-inclined pigments or liquid crystals and / or with machine-readable features, wherein the machine-readable features are in particular magnetic codes, conductive layers, substances that absorb and / or re-emit electromagnetic waves. In particular, it is possible that the security element has additional layers, which in particular include protective lacquers, heat-sealing lacquers, adhesives, primers and / or films. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] In order to better understand the present invention, the present invention is explained in more detail with the help of the following drawings.

[0016] Shown in a strongly simplified schematic diagram:

[0017] Figure 1 The layer structure of a security element according to the invention is shown. DETAILED DESCRIPTION

[0018] according to Figure 1According to the present invention, the security element 1 has an area 2 in which a structure 3 is arranged, and the security element is used for the anti-counterfeiting of securities, security papers or security articles, such as banknotes, documents, credit cards, tickets, etc. The area 2 can extend over a part of the security element 1 or can also extend over the entire security element 1. The structure 3 is constructed in the area 2. Preferably, the structure 3 is a light diffraction or diffraction structure. The structure 3 can, for example, produce a hologram and has a depth T greater than 500 nm, especially between 500 nm-4μm. In the context of the present invention, the depth T of the structure 3 should be understood as the normal distance between the level of the deepest point of the structure 3 and the level of the highest point. The width B of the structure 3 corresponds to the minimum width of the depression of the structure 3. Preferably, the structure 3 has an aspect ratio of 0.05-8. For structures with a right-angle inclination angle, such as a columnar structure, the aspect ratio is understood as the ratio of the depth T of the structure 3 to the width B. In structures with a tilt angle different from 90°, such as sawtooth structures, the aspect ratio is the ratio of the depth T of the structure to the peak-to-peak spacing.

[0019] The optical effect layer 4 is applied to the structure 3 over the entire surface or in parts. For example, an area 5 may also be provided in which the effect layer 4 is not provided. The optical effect layer 4 can be arranged directly on the structure 3. However, an additional adhesion promoter layer can also be arranged between the structure 3 and the optical effect layer 4. The material of the adhesion promoter layer can, for example, include a material selected from the group of nickel, titanium, manganese, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials, in particular at least one nickel-chromium alloy, or be made of at least one of these materials. It is particularly preferred that the material of the adhesion promoter layer is chromium or a nickel-chromium alloy, such as Inconel.

[0020] The optical effect layer 4 is preferably designed as a thin-film element. The optical effect layer 4 designed as a thin-film element comprises at least one absorption layer 6 and at least one spacer layer 7 .

[0021] The absorption layer 6 may include a metallic material, in particular selected from the group of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials or made of at least one of these materials.

[0022] The at least one spacer layer 7 can be formed, for example, from a dielectric material. In addition, the at least one spacer layer 7 comprises at least one low-refractive-index dielectric material having a refractive index less than or equal to 1.65, which is in particular selected from aluminum oxide (Al2O3), metal fluorides, such as magnesium fluoride (MgF2), aluminum fluoride (AlF3), cerium fluoride (CeF3), sodium aluminum fluoride (such as Na3AlF6 or Na5Al3F 14), silicon oxide (SIOx), silicon dioxide (SiO2), neodymium fluoride (NdF3), lanthanum fluoride (LaF3), samarium fluoride (SmF3), barium fluoride (BaF2), calcium fluoride (CaF2), lithium fluoride (LiF), a low-refractive-index organic monomer and / or a low-refractive-index organic polymer; or at least one high-refractive-index dielectric material having a refractive index greater than 1.65, which is particularly selected from zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C), oxygen Indium nitride (In2O3), indium tin oxide (ITO), tantalum pentoxide (Ta2O5), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (Eu2O3), iron oxides, such as iron (II, III) oxide (Fe3O4) and iron (III) oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3), hexaproxypraseodymium undecene oxide (Pr6O 11 ), samarium oxide (Sm2O3), antimony trioxide (Sb2O3), silicon carbide (SiC), silicon nitride (Si3N4), silicon monoxide (SiO), selenium trioxide (Se2O3), tin oxide (SnO2), tungsten trioxide (WO3), a group of high refractive index organic monomers and / or high refractive index organic polymers, or is made of at least one of these materials.

[0023] The optical effect layer 4 embodied as a thin-film element can be applied directly to the structure 3 or, for example, to an above-mentioned adhesion promoter layer which can be arranged on the structure 3 .

[0024] The layer thicknesses of the individual layers or stacks forming the thin-film element are shown greatly exaggerated and not to scale.

[0025] The color-inclined optical effect layer 4 may also further comprise a reflective layer 8. In this case, the at least one spacer layer 7 is arranged between the absorbent layer 6 and the reflective layer 8. The reflective layer 8 is applied to the structure 3 and may in particular be printed and / or evaporated onto the structure. It is also possible to reverse the order in the optical effect layer, so that the absorbent layer is arranged on the adhesion promoter layer 5 and then the spacer layer and the reflective layer. The arrangement is thus in the following order, namely, structure 3 - absorbent layer 6 - spacer layer 7 - reflective layer 8.

[0026] The reflective layer 8 may comprise a metallic material, in particular selected from the group consisting of silver, copper, aluminum, gold, platinum, niobium, tin or selected from the group consisting of nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular a cobalt-nickel alloy, or at least one high-refractive-index dielectric material having a refractive index greater than 1.65, in particular selected from the group consisting of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C), indium oxide (In2O3), indium tin oxide (ITO), tantalum pentoxide (Ta2O5), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (Eu2O3), iron oxides, for example iron (II, III) oxide (Fe3O4) and iron (III) oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3), hexapraseodymium undecene oxide (Pr6O3), and tantalum pentoxide (Ta2O5). 11 ), samarium oxide (Sm2O3), antimony trioxide (Sb2O3), silicon carbide (SiC), silicon nitride (Si3N4), silicon monoxide (SiO), selenium trioxide (Se2O3), tin oxide (SnO2), tungsten trioxide (WO3), a group of high-refractive-index organic monomers and / or high-refractive-index organic polymers, or is made of at least one of these materials. This applies to all the reflective layers 8 described in the embodiments.

[0027] However, instead of the above-mentioned reflective layer 8, a further absorption layer can also be provided.

[0028] The security element 1 may further comprise a carrier layer 9. The carrier layer 9 may be formed of a plastic material. Furthermore, a plurality of layers may also form the carrier layer 9. The plastic may be composed of a light-transmitting and / or thermoplastic plastic material. As a material for the carrier layer 9, at least one of these materials may comprise a material selected from the group consisting of polyimide (PI), polypropylene (PP), uniaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone (PEEK), polyetherketone (PEK), polyethyleneimine (PEI), polysulfone (PSU), polyaryletherketone (PAEK), polyethylene naphthalate (PEN), liquid crystal polymer (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA), polycarbonate (PC), cycloolefin copolymer (COC), polyoxymethylene (POM), acrylonitrile-butadiene-styrene copolymer (ABS), polyvinyl chloride (PVC) , ethylene-tetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride (PVF), polyvinylidene fluoride (PVDF), ethylene-tetrafluoroethylene-hexafluoropropylene fluorinated terpolymer (EFEP), cellulose or lignin-based plastics, polyhydroxyalkanoates (PHA), thermoplastic starch (TPS), polylactic acid (PLA), polycaprolactone (PCL), polybutylene succinate (PBS) and polybutylene adipate-terephthalate (PBAT) and / or include at least one recycled and / or biodegradable and / or marine degradable plastic and / or a mixture and / or copolymer of these materials or be made of at least one of these materials. In this case, the carrier layer can have a thickness of 5 μm to 1000 μm, particularly preferably a thickness of 10 μm to 50 μm.

[0029] The arrangement or application of the optical effect layer 4 or a layer thereof on the structure 3 can be carried out, for example, by a printing process and / or an evaporation process or a plurality of printing processes and / or evaporation processes.

[0030] The structure 3 can be embossed directly into the carrier layer 9, for example by heating the carrier layer 9 and pressing the structure in with the aid of an embossing tool, such as an embossing roller.

[0031] A further alternative possibility is to provide a separate further layer 10 for accommodating the structures 3. This further layer 10 can be applied directly to the carrier layer 9. Thus, for example, the further layer 10 can be formed by an embossing lacquer, which is deformed accordingly for the arrangement of the structures 3. This can in turn be carried out in an embossing method with the aid of a stamping device or a stamping element. The further layer, in particular the embossing lacquer layer, with the structures 3 formed therein can have a thickness of, for example, 0.5 μm to 300 μm, in particular 0.8 μm to 50 μm, preferably 1 μm to 10 μm.

[0032] Furthermore, at least one intermediate layer may be provided between the layer 10 and the carrier layer 9 , which intermediate layer may be formed, for example, by an adhesion promoter, a primer, an adhesive or the like.

[0033] As the uppermost layer or outermost layer on the optical effect layer 4, for example, a protective layer (not shown here) can be provided, which protects the entire layer structure and / or stack structure from mechanical damage, such as scratches, incisions, etc. The protective layer can also be arranged on the side of the carrier layer 9 facing away from the optical effect layer. It is also conceivable to arrange it on both sides. Preferably, a planar structure of the security element 1 can also be achieved with the help of the protective layer.

[0034] It should be mentioned that the layer structure and the arrangement of the further layers depend on the installation of the security element on the security article, since the side of the security element to be observed after installation is decisive. Thus, the visible side can be observed from above as shown in the figure, but the security element can also be observed from the visible side below, for example through the carrier.

[0035] It should be pointed out here that the expression "a layer is applied to something" is to be understood as meaning that the layer can be applied directly or that one or more intermediate layers can also be present between the applied layer and the layer to which it is applied. It should also be pointed out here that one or more intermediate layers can be arranged between the layers described in this article. It is therefore not absolutely necessary for the layers described to be in contact with one another. It should also be pointed out that the concept of layer in this article is to be understood as meaning that a layer can also be composed of a plurality of sublayers.

[0036] Reference numerals list

[0037] 1 Security Element

[0038] 2 Regions

[0039] 3 Structure

[0040] 4 Effect Layers

[0041] 5th floor

[0042] 6 Absorption layer

[0043] 7 Spacer

[0044] 8 Reflection layer

[0045] 9 Carrier layer

[0046] 10 Adhesion promoter layer

Claims

1. A security element (1), in particular for securities, security papers or security articles, such as banknotes, ID cards, credit cards, wherein: The security element (1) has at least one region (2) with a structure (3), wherein at least one color-tilted optical effect layer (4) is provided which causes a color-tilted effect in the at least one first region (2) when viewed from a first side of the security element, and the structure (3) is covered entirely or partially by the at least one optical effect layer (4), characterized in that the structure (3) has a depth (T) greater than 500 nm, in particular between 500 nm and 4 μm.

2. The security element according to claim 1, characterized in that The structure (3) is a light diffraction structure.

3. The safety element according to claim 1 or 2, characterized in that: The structure (3) is an embossed structure, in particular a structure embossed into an embossing lacquer layer.

4. The security element according to any one of claims 1 to 3, characterized in that The optical effect layer (4) is designed as a thin-film element and has at least one absorption layer (6) and at least one spacer layer (7).

5. The safety element according to claim 4, characterized in that The at least one absorption layer (6) comprises at least one metallic material, in particular selected from the group consisting of nickel, titanium, vanadium, chromium, cobalt, palladium, iron, tungsten, molybdenum, niobium, aluminum, silver, copper and / or alloys of these materials or consists of at least one of these materials.

6. The safety element according to claim 4 or 5, characterized in that The at least one spacer layer (7) comprises a low-refractive-index dielectric material having a refractive index less than or equal to 1.65, which is in particular selected from aluminum oxide (Al2O3), metal fluorides, such as magnesium fluoride (MgF2), aluminum fluoride (AlF3), cerium fluoride (CeF3), sodium aluminum fluoride (such as Na3AlF6 or Na5Al3F 14 ), silicon oxide (SIOx), silicon dioxide (SiO2), neodymium fluoride (NdF3), lanthanum fluoride (LaF3), samarium fluoride (SmF3), barium fluoride (BaF2), calcium fluoride (CaF2), lithium fluoride (LiF), a low-refractive-index organic monomer and / or a low-refractive-index organic polymer; or at least one dielectric material having a high refractive index greater than 1.65, which is especially selected from zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C), oxygen Indium nitride (In2O3), indium tin oxide (ITO), tantalum pentoxide (Ta2O5), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (Eu2O3), iron oxides, such as iron (II, III) oxide (Fe3O4) and iron (III) oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3), hexaproxypraseodymium undecene oxide (Pr6O 11 ), samarium oxide (Sm2O3), antimony trioxide (Sb2O3), silicon carbide (SiC), silicon nitride (Si3N4), silicon monoxide (SiO), selenium trioxide (Se2O3), tin oxide (SnO2), tungsten trioxide (WO3), a group of high refractive index organic monomers and / or high refractive index organic polymers, or is made of at least one of these materials.

7. The security element according to any one of claims 4 to 6, characterized in that The optical effect layer (4) configured as a thin-film element further comprises at least one reflective layer (8) and / or a second absorption layer, wherein the at least one spacer layer (7) is arranged between the at least one first absorption layer (6) and the at least one reflective layer (8) and / or the at least one second absorption layer.

8. The security element according to claim 7, characterized in that The at least one reflective layer (8) comprises at least one metallic material, which is in particular selected from the group consisting of silver, copper, aluminum, gold, platinum, niobium, tin or selected from the group consisting of nickel, titanium, vanadium, chromium, cobalt and palladium or alloys of these materials, in particular cobalt-nickel alloys, or comprises at least one high-refractive-index dielectric material having a refractive index greater than 1.65, which is in particular selected from the group consisting of zinc sulfide (ZnS), zinc oxide (ZnO), titanium dioxide (TiO2), carbon (C), indium oxide (In2O3), indium tin oxide (I TO), tantalum pentoxide (Ta2O5), cerium oxide (CeO2), yttrium oxide (Y2O3), europium oxide (Eu2O3), iron oxides such as iron (II, III) oxide (Fe3O4) and iron (III) oxide (Fe2O3), hafnium nitride (HfN), hafnium carbide (HfC), hafnium oxide (HfO2), lanthanum oxide (La2O3), magnesium oxide (MgO), neodymium oxide (Nd2O3), hexaproxypraseodymium undecanoate (Pr6O 11 ), samarium oxide (Sm2O3), antimony trioxide (Sb2O3), silicon carbide (SiC), silicon nitride (Si3N4), silicon monoxide (SiO), selenium trioxide (Se2O3), tin oxide (SnO2), tungsten trioxide (WO3), a group of high refractive index organic monomers and / or high refractive index organic polymers, or is made of at least one of these materials.

9. The security element according to any one of claims 1 to 8, characterized in that The security element comprises a carrier layer (9) made of plastic, wherein in particular the plastic is formed by a light-transmissive and / or thermoplastic plastic and the carrier layer preferably comprises a polymer selected from the group consisting of polyimide (PI), polypropylene (PP), uniaxially oriented polypropylene (MOPP), biaxially oriented polypropylene (BOPP), polyethylene (PE), polyphenylene sulfide (PPS), polyetheretherketone (PEEK), polyetherketone (PEK), polyethyleneimine (PEI), polysulfone (PSU), polyaryletherketone (PAEK), polyethylene naphthalate (PEN), liquid crystal polymer (LCP), polyester, polybutylene terephthalate (PBT), polyethylene terephthalate (PET), polyamide (PA), polycarbonate (PC), cycloolefin copolymer (COC), polyoxymethylene (POM) and the like. , acrylonitrile-butadiene-styrene copolymer (ABS), polyvinyl chloride (PVC), ethylene-tetrafluoroethylene (ETFE), polytetrafluoroethylene (PTFE), polyvinyl fluoride (PVF), polyvinylidene fluoride (PVDF), ethylene-tetrafluoroethylene-hexafluoropropylene fluorinated terpolymer (EFEP), cellulose or lignin-based plastics, polyhydroxyalkanoate (PHA), thermoplastic starch (TPS), polylactic acid (PLA), polycaprolactone (PCL), polybutylene succinate (PBS) and polybutylene adipate-terephthalate (PBAT) The group of materials and / or include at least one recycled and / or biodegradable and / or marine degradable plastic and / or a mixture and / or copolymer of these materials or are made of at least one of these materials.

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