Reaction Vessel, Drive System and Usage Method of Chemical Vapor Deposition Equipment

Abstract

This patent relates to a reaction vessel, a drive system and a usage method of a chemical vapor deposition device, including: a reaction vessel, a connection mechanism and a drive device. The reaction vessel is used to provide a reaction space for chemical vapor deposition reaction. The connection mechanism includes at least two connection components, which are arranged on an outer surface of the reaction vessel. The drive device includes: a rotational power source and a first drive shaft. The first drive shaft is connected to the rotational power source, and at least two plug connectors are connected to the first drive shaft. The rotational power source can drive the plug connectors to rotate circumferentially through the first drive shaft. At least two connection components and two plug connectors are arranged corresponding to each other, so that the driven plug connectors are connected or disconnected one by one. The connection mechanism is driven by the drive device, so that the connection mechanism drives the reaction vessel to move, realizing the movement of the reaction vessel within the reaction system.

Description

Technical Field

[0001] This patent relates to the field of chemical vapor deposition, and particularly to a reaction vessel, a drive system, and a usage method of a chemical vapor deposition apparatus. Background Art

[0002] Silicon carbide is a representative ceramic material and has been widely used in the entire industrial field due to its excellent physical, chemical, and electrical properties.

[0003] In recent years, with the active development of semiconductor processing components using silicon carbide materials, the importance of silicon carbide materials has been increasing. In particular, silicon carbide materials are widely used as components for etching processes in semiconductor process components due to their high plasma tolerance.

[0004] The traditional method of manufacturing silicon carbide for semiconductor etching process parts is used. Since the quality and performance cannot be satisfied by this method, chemical vapor deposition is used for manufacturing.

[0005] Chemical vapor deposition of silicon carbide uses a mixture of Si-containing gases such as SiH4, SiCl2, SiCl4 and C-containing gases such as C2H2, CH4, C3H8, etc. as source gases, or CH3SiCl3, CH3SiH3,

[0006] (CH3)3SiH), etc. There are some deposition methods using single-piece raw materials. Manufacturing silicon carbide materials by chemical vapor deposition has the disadvantage of low productivity because the process is carried out in a batch heating furnace.

[0007] In order to improve the reaction efficiency, the batch heating furnace needs to be replaced with a continuous one, but how to achieve transportation in a continuous reaction system has become a major problem. Summary of the Invention

[0008] To solve or at least partially solve the above technical problems, this patent provides a reaction vessel, a drive system, and a usage method of a chemical vapor deposition apparatus.

[0009] A drive system for a reaction vessel of a chemical vapor deposition apparatus, comprising: a reaction vessel, a connection mechanism, and a drive device. The reaction vessel is used to provide a reaction space for chemical vapor deposition reaction. The connection mechanism includes at least two connection components and is disposed on an outer surface of the reaction vessel. The drive device includes a rotational power source and a first drive shaft. The first drive shaft is connected to the rotational power source, and at least two plug connectors are connected to the first drive shaft. The rotational power source can drive the plug connectors to rotate circumferentially through the first drive shaft. At least two connection components and two plug connectors are arranged correspondingly so that the driven plug connectors are connected or disconnected correspondingly one by one.

[0010] Preferably, the connecting component includes a cover plate and a connecting portion. The cover plate is connected to the outer surface of the reaction vessel through the connecting portion, and a receiving groove is formed between the cover plate and the outer surface of the reaction vessel. The outer surface shape of the plug-in member is adapted to the receiving groove to be inserted into or removed from the receiving groove.

[0011] Preferably, the cross-section of the receiving groove parallel to the outer surface of the reaction vessel is a part of a circle, and the central angle of the cross-section is less than 180 degrees. The outer surface shape of the plug-in member in the cross-section parallel to the cover plate is a part of a circle, and the area of the cross-section of the plug-in member is less than or equal to the area of the cross-section of the receiving groove parallel to the outer surface of the reaction vessel.

[0012] Preferably, the number of connecting components is 2 - 10, and the connecting components are evenly distributed along the circumferential direction of a plurality of concentrically arranged first virtual circles on the outer surface of the reaction vessel. The plug-in members are evenly distributed along the circumferential direction of a plurality of concentrically arranged second virtual circles, and each second virtual circle corresponds to a first virtual circle.

[0013] Preferably, the first drive shaft includes a shaft body and a transmission gear sleeved on the shaft body. The rotational power source includes a motor, and a drive gear is sleeved on the output shaft of the motor. The drive gear meshes with the transmission gear to drive the shaft body to rotate.

[0014] Preferably, the driving device further includes a linear power source and a second drive shaft. The second drive shaft is sleeved on the first drive shaft, and the first drive shaft can rotate freely relative to the second drive shaft. The linear power source can drive the plug-in member to move closer to or away from the outer surface of the reaction vessel provided with the connecting component along a direction perpendicular to the outer surface of the reaction vessel through the second drive shaft and the first drive shaft, so as to drive the reaction vessel to move when the plug-in member is connected to the connecting component.

[0015] Preferably, the linear power source is a pneumatic rod or a hydraulic rod. The rotational power source further includes a sliding base. The motor is arranged on the sliding base, and the sliding base is connected to the second drive shaft. The sliding base moves synchronously with the second drive shaft under the drive of the second drive shaft. The reaction system of the chemical vapor deposition equipment further includes a guide rail, which is arranged along the length direction of the first drive shaft. The reaction vessel is arranged on the guide rail and moves along the guide rail. The sliding base is also arranged on the guide rail and moves along the guide rail.

[0016] Preferably, a rolling groove is arranged on the side of the plug-in member facing the reaction vessel. The drive system of the reaction vessel of the chemical vapor deposition equipment further includes rolling balls. The rolling balls are clamped in the rolling groove, and the rolling balls can roll in the rolling groove, and part of the rolling balls are exposed outside the rolling groove.

[0017] Preferably, the drive system of the reaction vessel of the chemical vapor deposition equipment further includes a control module and at least one first sensor.

[0018] At least one first sensor is disposed in the rolling groove to send a contact completion signal to the control module after coming into contact with the rolling ball.

[0019] Preferably, the drive system of the reaction vessel of the chemical vapor deposition equipment further includes a control module, a plurality of first sensors and a plurality of second sensors. The plurality of first sensors are communicatively connected to the control module. The plurality of first sensors are disposed on a side of the plug-in member facing the reaction vessel to send a contact completion signal to the control module when the plug-in member abuts against the reaction vessel. The plurality of second sensors are communicatively connected to the control module. The plurality of second sensors are disposed in the connection assembly to send a docking completion signal to the control module when the plug-in member is connected to the connection assembly.

[0020] An embodiment of the present invention further discloses a reaction system of a chemical vapor deposition equipment, and the reaction system of the chemical vapor deposition equipment includes the drive system of the reaction vessel of the chemical vapor deposition equipment as described above.

[0021] An embodiment of the present invention further discloses a method of using a drive system of a reaction vessel of a chemical vapor deposition equipment, and the method of using includes:

[0022] In response to the first docking signal, start the driving device to drive the first driving shaft to move the plug-in member towards the reaction vessel.

[0023] In response to the contact completion signal, stop the driving device and start the rotational power source to rotate the plug-in member. The contact completion signal is generated by the first type of sensor when the plug-in member comes into contact with the reaction vessel.

[0024] In response to the docking completion signal, stop the rotational power source. The docking completion signal is generated by the second sensor when the plug-in member is connected to the connection assembly.

[0025] Restart the driving device to drive the first driving shaft to push the reaction vessel to move.

[0026] Preferably, after the step of restarting the driving device to drive the first driving shaft to push the reaction vessel to move, it further includes:

[0027] In response to the first separation signal, start the rotational power source to rotate the first driving shaft so that the plug-in member is separated from the connection assembly. The first separation signal is generated by the light sensor when it is detected that the reaction vessel reaches the target position.

[0028] After the first driving shaft rotates a preset angle, stop the rotational power source.

[0029] Start the driving device to drive the first driving shaft to drive the plug-in member to move away from the reaction vessel.

[0030] Compared with the prior art, the driving device of the present application is connected to the reaction vessel through a connecting mechanism, and drives the reaction vessel to move along a preset direction. At the same time, through the setting of the connecting mechanism, a better movable connection is achieved between the driving device and the reaction vessel, and at the same time, the external force output by the driving device is transmitted through the connecting mechanism, so that the reaction vessel can be evenly stressed, ensuring that the reaction vessel advances smoothly under the drive of the driving device and avoiding the rotation of the reaction vessel during the movement. Brief Description of the Drawings

[0031] In order to more clearly illustrate the implementation manners of the present patent, the relevant drawings will be briefly introduced below. It can be understood that the drawings in the following description are only used to illustrate some implementation manners of the present patent, and those of ordinary skill in the art can also obtain many other technical features and connection relationships not mentioned herein according to these drawings.

[0032] Figure 1 is a three-dimensional schematic diagram of the driving system of the reaction vessel of a chemical vapor deposition device according to an implementation manner of the present patent;

[0033] Figure 2 is a three-dimensional schematic diagram of the driving system of the reaction vessel of a chemical vapor deposition device according to an implementation manner of the present patent;

[0034] Figure 3 is a three-dimensional schematic diagram of the driving system of the reaction vessel of a chemical vapor deposition device according to an implementation manner of the present patent;

[0035] Figure 4 is a three-dimensional schematic diagram of a driving device according to an implementation manner of the present patent;

[0036] Figure 5 is a three-dimensional schematic diagram of the reaction vessel of a chemical vapor deposition device according to an implementation manner of the present patent;

[0037] Figure 6 is a three-dimensional schematic diagram of the reaction vessel of a chemical vapor deposition device according to an implementation manner of the present patent;

[0038] Figure 7 is a control module diagram of the driving system of the reaction vessel of a chemical vapor deposition device according to an implementation manner of the present patent;

[0039] Figure 8 is a flowchart of the usage method of the driving system of the reaction vessel of a chemical vapor deposition device according to an implementation manner of the present patent.

[0040] Explanation of Reference Numerals:

[0041] 1. Reaction vessel; 2. Connection mechanism; 21. Connection component; 210. Connection part; 220. Cover plate; 230. Accommodation groove; 3. Driving device; 31. First driving shaft; 32. Rotary power source; 33. Linear power source; 34. Sliding base; 311. Plug-in part; 312. Shaft body; 313. Transmission gear; 314. Second driving shaft; 4. Guide rail; 5. Rolling ball. Detailed implementation mode

[0042] The following combines the accompanying drawings to elaborate on this patent in detail.

[0043] Refer to Figure 5 、 Figure 6 It can be seen that the chemical vapor deposition reaction system equipment set up to improve the chemical vapor deposition reaction efficiency can be provided with three different workstations, and the three workstations respectively perform different treatments on the reaction vessel 1. And by Figure 5 Or Figure 6 We can clearly obtain that since the three workstations need to perform different work processes, in order to prevent mutual influence between each workstation during work, each workstation needs to be separated from each other by a gate. Therefore, the movement of the reaction vessel 1 between the three workstations of the reaction system has become the primary problem that the chemical vapor deposition reaction system needs to solve.

[0044] In addition, through Figure 5 We can find that in the middle workstation of the chemical vapor deposition reaction system, gas needs to be introduced into the reaction vessel 1 to realize the reaction inside the reaction vessel 1. In order to enable the external gas supply component to be smoothly docked with the reaction vessel 1, it is necessary to keep the orientation of the reaction vessel 1 accurate. In other words, when docking the gas supply pipeline, the side wall of the reaction vessel 1 for docking needs to be perpendicular to the gas supply pipeline of the gas supply component to ensure the smooth docking of the gas supply pipeline with the reaction vessel 1.

[0045] To meet the docking requirements between the reaction vessel 1 and the gas supply component, the reaction vessel 1 needs to maintain an accurate orientation during movement to avoid deflection when the reaction vessel 1 moves within the reaction system, thereby further avoiding deviation in the orientation of the reaction vessel 1..

[0046] In view of this, the implementation mode of this patent proposes a driving system for the reaction vessel 1 of a chemical vapor deposition device to solve the above technical problems.

[0047] First implementation mode

[0048] As Figure 1 、 Figure 2 、 Figure 3An embodiment of the present invention discloses a drive system for a reaction vessel 1 of a chemical vapor deposition device, including: a reaction vessel 1, a connection mechanism 2, and a drive device 3. The reaction vessel 1 is used to provide a reaction space for chemical vapor deposition reaction. The connection mechanism 2 includes at least two connection components 21, which are arranged on an outer surface of the reaction vessel 1. The drive device 3 includes a rotational power source 32 and a first drive shaft 31. The first drive shaft 31 is connected to the rotational power source 32, and at least two plug connectors 311 are connected to the first drive shaft 31. The rotational power source 32 can drive the plug connectors 311 to rotate circumferentially through the first drive shaft 31. At least two connection components 21 and two plug connectors 311 are arranged correspondingly so that the driven plug connectors 311 are connected or disconnected correspondingly one by one.

[0049] During the movement of the reaction vessel 1, first, it is necessary to dock the drive device 3 with the connection mechanism 2 provided on the reaction vessel 1, and drive the reaction vessel 1 to move through the drive device 3. At least two connection components 21 of the connection mechanism 2 are arranged on the outer surface of the reaction vessel 1. During the docking process of the drive device 3 and the reaction vessel 1, each connection component 21 needs to be connected to the corresponding plug connector 311 on the drive device 3. Specifically, the connection components 21 are distributed on the outer surface of the reaction vessel 1. When docking is required, the plug connectors 311 provided on the first drive shaft 31 will move towards the reaction vessel 1 together with the first drive shaft 31 until the first drive shaft 31 abuts against the outer surface of the reaction vessel 1. The rotational power source 32 drives the first drive shaft 31 to rotate around its axis, and the plug connectors 311 provided on the first drive shaft 31 will rotate together with the first drive shaft 31. At this time, each plug connector 311 will be docked with the connection component 21. When the first drive shaft 31 advances along the movement direction of the reaction vessel 1, it will push the reaction vessel 1 to move together. Since the drive device 3 is connected to the reaction vessel 1 through the docking of the connection component 21 and the plug connector 311, during the process of the drive device 3 pushing the reaction vessel 1 to move, the drive device 3 will not be separated from the reaction vessel 1. It can be understood that the attitude of the reaction vessel 1 is not easily shifted due to the action of the drive device 3.

[0050] Furthermore, the number of connection components 21 is multiple. Therefore, after the docking of the drive device 3 is completed, multi-point contact will be achieved between the drive device 3 and the reaction vessel 1. At this time, the external force exerted on the reaction vessel 1 by the drive device 3 will be more uniform, making it difficult for the orientation of the reaction vessel 1 to change when it moves along the target trajectory through each station, so as to ensure that when the reaction vessel 1 undergoes a vapor deposition reaction, the gas supply pipeline of the gas supply component is smoothly docked with the reaction vessel 1, ensuring the smooth progress of the chemical vapor deposition reaction.

[0051] In addition, as Figure 1As shown in the embodiment of the present invention, the connection component 21 includes a cover plate 220 and a connection portion 210. The cover plate 220 is connected to the outer surface of the reaction vessel 1 through the connection portion 210, and a receiving groove 230 is formed between the cover plate 220 and the outer surface of the reaction vessel 1. The outer surface shape of the plug-in member 311 is adapted to the receiving groove 230 to be inserted into or removed from the receiving groove 230.

[0052] During the chemical vapor deposition (CVD) process, the sealing performance and stability of the reaction vessel 1 are crucial. As a technology for depositing thin films on the surface of a substrate, CVD is widely used in fields such as semiconductor manufacturing, photovoltaic industry, and coating technology. To ensure the smooth progress of the reaction process, the reaction vessel 1 needs to remain stable in a high-temperature and low-pressure environment and be tightly connected to the gas supply system and the exhaust system. Therefore, after the driving device 3 drives the reaction vessel 1 to reach the target station, the driving device 3 needs to be separated from the reaction vessel 1 to leave the reaction vessel 1 alone at the station. Therefore, the connection component 21 needs to be movably connected to the driving device 3 while ensuring that the connection component 21 and the driving device 3 do not separate during the movement process. The receiving groove 230 formed by the cover plate 220 and the connection portion 210 can be used to receive and allow the plug-in member 311 to extend into, and the plug-in member 311 is limited by the receiving groove 230, thereby avoiding the separation problem of the driving device 3 during the driving process. The opening direction of the receiving groove 230 is perpendicular to the movement direction of the reaction vessel 1. Therefore, during the movement of the reaction vessel 1, the connection between the driving device 3 and the connection mechanism 2 is not easily affected. When the driving device 3 is disconnected from the connection mechanism 2, the orientation of the reaction vessel 1 is not easily affected, thus ensuring the orientation of the reaction vessel 1 during the movement process.

[0053] Furthermore, as Figure 1 shown Figure 3 in the figure, the cross-section of the receiving groove 230 parallel to the outer surface of the reaction vessel 1 is a part of a circle, and the central angle of the cross-section is less than 180 degrees. The outer surface shape of the plug-in member 311 in the cross-section parallel to the cover plate 220 is a part of a circle, and the area of the cross-section of the plug-in member 311 is less than or equal to the area of the cross-section of the receiving groove 230 parallel to the outer surface of the reaction vessel 1. The number of connection components 21 is 2 - 10, and the connection components 21 are evenly distributed along the circumferential direction of several concentric first virtual circles on the outer surface of the reaction vessel 1. The plug-in members 311 are evenly distributed along the circumferential direction of several concentric second virtual circles, and each second virtual circle corresponds to the first virtual circle.

[0054] It can be easily concluded from the above content that the cross-section of a receiving groove 230 formed by a cover plate 220 and a connecting portion 210 is a part of a circle with a central angle less than 180 degrees, such that the side walls on both sides of the opening of the receiving groove 230 are both arcs approaching each other. During the process of inserting the plug-in member 311 into the receiving groove 230 for docking, there may be slight friction between the plug-in member 311 and the side walls of the receiving groove 230. At this time, the side walls on both sides of the opening of the receiving groove 230 can guide the plug-in member 311 to slide into the interior to complete the docking between the plug-in member 311 and the connecting assembly 21.

[0055] Meanwhile, the connecting assemblies 21 are evenly distributed according to a number of concentrically arranged first virtual circles, and the location where the connecting assemblies 21 are provided is the acting point of the force exerted by the driving device 3 on the outer surface of the reaction vessel 1. At this time, the driving force received by the reaction vessel 1 from the driving device 3 can diverge outward from the center of the first virtual circle and be evenly distributed on the outer surface of the reaction vessel 1. At this time, the acting force received by the surface of the reaction vessel 1 is more uniform and dispersed, avoiding deviation in the orientation of the reaction vessel 1 caused by excessive force at a certain location.

[0056] Since multiple connecting assemblies 21 can be distributed on different concentric first virtual circles, compared with a single virtual circle, the distribution of the connecting assemblies 21 becomes more uniform. Further, the plug-in members 311 are distributed according to a number of concentric second virtual circles. Then, when the first drive shaft 31 rotates, the plug-in members 311 connected to the first drive shaft 31 will rotate simultaneously. Since the second virtual circle corresponds to the first virtual circle and each plug-in member 311 is evenly distributed on the second virtual circle, during the docking process between the driving device 3 and the connecting mechanism 2, after the first drive shaft 31 rotates, the docking between all the plug-in members 311 and the connecting assemblies 21 can be achieved, improving the docking efficiency between the driving device 3 and the connecting mechanism 2. In some embodiments, the connecting assemblies 21 located on a number of first virtual circles are staggered with each other. Similarly, the plug-in members 311 corresponding to and located on a number of second virtual circles are also staggered with each other. Through such a distribution arrangement, the external force exerted by the driving device 3 on the surface of the reaction vessel 1 can be more evenly dispersed to ensure the stable orientation of the reaction vessel 1 during movement.

[0057] Such as Figure 4As shown in the figure, in the embodiment of the present invention, the first drive shaft 31 includes: a shaft body 312 and a transmission gear 313 sleeved on the shaft body 312. The rotary power source 32 includes: a motor, and a drive gear is sleeved on the output shaft of the motor. The drive gear meshes with the transmission gear 313 to drive the shaft body 312 to rotate. Specifically, the drive device 3 further includes: a linear power source 34 and a second drive shaft 314. The second drive shaft 314 is sleeved on the first drive shaft 31, and the first drive shaft 31 can rotate freely relative to the second drive shaft 314. The linear power source 34 can drive the plug connector 311 to move closer to or away from the outer surface of the reaction vessel 1 provided with the connection assembly 21 along a direction perpendicular to the outer surface of the reaction vessel 1 through the second drive shaft 314 and the first drive shaft 31, so as to drive the reaction vessel 1 to move when the plug connector 311 is connected to the connection assembly 21.

[0058] It can be easily concluded from the above content that the first drive shaft 31 needs to drive each plug connector 311 to rotate together so that the plug connector 311 can be inserted into the receiving groove 230 of the connection assembly 21 for docking. Therefore, when the motor of the rotary power source 32 works, the drive gear sleeved on the output shaft of the motor can drive the transmission gear 313 to rotate. At this time, the transmission gear 313 can drive the shaft body 312 to rotate together. Driven by the shaft body 312, the plug connectors 311 uniformly arranged on the first drive shaft 31 can be smoothly inserted into the receiving groove 230. Moreover, during the docking process of the drive device 3 and the docking mechanism, the rotation angle of the first drive shaft 31 needs to be precisely controlled to meet the rotation angles of each plug connector 311. And the rotation angle of the motor can be precisely controlled, thus ensuring the rotation angle of the first drive shaft 31 to guarantee the docking accuracy.

[0059] Furthermore, the drive device 3 needs to drive the reaction vessel 1 to move linearly. The linear power source 34 can drive the second drive shaft 314 to move linearly and simultaneously drive the first drive shaft 31 sleeved with the second drive shaft 314. The plug connector 311 connected to the first drive shaft 31 is connected to the docking assembly provided on the reaction vessel 1. The reaction vessel 1 can be pushed by the first drive shaft 31 and move linearly to meet the movement between each station in the reaction system. The first drive shaft 31 and the second drive shaft 314 sleeved with each other enable relative rotation between the two, thereby realizing the rotation of the first drive shaft 31 driving each plug connector 311 and realizing the docking with the reaction vessel 1. In this embodiment, the first drive shaft 31 is sleeved outside the second drive shaft 314. Of course, in other embodiments, the second drive shaft 314 can also be sleeved outside the first drive shaft 31.

[0060] In addition, the linear power source 34 is a pneumatic rod or a hydraulic rod. The rotary power source 32 further includes a sliding base 34. The motor is disposed on the sliding base 34. The sliding base 34 is connected to the second drive shaft 314. Driven by the second drive shaft 314, the sliding base 34 moves synchronously with the second drive shaft 314. The reaction system of the chemical vapor deposition equipment further includes a guide rail 4. The guide rail 4 is arranged along the length direction of the first drive shaft 31. The reaction vessel 1 is disposed on the guide rail 4 and moves along the guide rail 4. The sliding base 34 is also disposed on the guide rail 4 and moves along the guide rail 4.

[0061] It can be easily concluded from the above content that the sliding base 34 is used to fix the motor that drives the first drive shaft 31 to rotate. During the process of the driving device 3 driving the reaction vessel 1 to move, the first drive shaft 31 sleeved with the second drive shaft 314 will move together with the second drive shaft 314. The second drive shaft 314 moves linearly under the drive of the linear power source 34. The sliding base 34 connected to the second drive shaft 314 and the first drive shaft 31 sleeved with the second drive shaft 314 will move together with the expansion and contraction of the second drive shaft 314. Therefore, the synchronous movement of the motor disposed on the sliding base 34 and the first drive shaft 31 is realized, and the motor can always drive the rotation of the first drive shaft 31 to meet the docking or undocking between the driving device 3 and the reaction vessel 1. Since the linear power source 34 not only needs to push the movement of the first drive shaft 31 and the second drive shaft 314, but also needs to push the reaction vessel 1 to move along a fixed linear direction. Therefore, the linear power source 34 needs to have a sufficiently large output force, and the linear power source 34 using a pneumatic rod or a hydraulic rod can meet the movement of the reaction vessel 1 to ensure that the reaction vessel 1 moves between each working station to complete the reaction work. Further, the guide rail 4 arranged along the movement direction of the reaction vessel 1 can reduce the resistance during the movement of the reaction vessel 1 along the guide rail 4. The guide rail 4 is provided with rollers. During the translation of the reaction vessel 1, the rollers on the guide rail 4 will rotate, thereby reducing the friction between the guide rail 4 and the reaction vessel 1. At the same time, the guide rail 4 has a guiding effect on the movement direction of the reaction vessel 1, and can make the reaction vessel 1 move in an accurate direction to improve the movement accuracy of the reaction vessel 1.

[0062] As Figure 2 、 Figure 4 shown, in the embodiment of the present invention, a rolling groove is provided on one side of the plug-in member 311 facing the reaction vessel 1. The drive system of the reaction vessel 1 of the chemical vapor deposition equipment further includes a rolling ball 5. The rolling ball 5 is clamped in the rolling groove. The rolling ball 5 can roll in the rolling groove, and part of the rolling ball 5 is exposed outside the rolling groove.

[0063] It can be easily concluded from the above content that when the driving device 3 is docked with the connecting mechanism 2, the rolling ball 5 will abut against the outer surface of the reaction vessel 1. When the first driving shaft 31 rotates to drive the plug-in member 311 to rotate, the rolling ball 5 will also rotate between the side wall of the reaction vessel 1. The arrangement of the rolling ball 5 avoids the direct contact between the plug-in member 311 and the surface of the reaction vessel 1, reduces the friction between the first driving shaft 31 and the reaction vessel 1 during the rotation process, and reduces the rotational resistance of the first driving shaft 31. This facilitates the first driving shaft 31 to drive the plug-in member 311 to smoothly insert into the receiving groove 230, completing the docking between the driving device 3 and the connecting mechanism 2.

[0064] Furthermore, the drive system of the reaction vessel 1 of the chemical vapor deposition equipment further includes a control module and at least one first sensor. The first sensor is arranged in the rolling groove to send a contact completion signal to the control module after abutting against the rolling ball 5.

[0065] Combining the above content, it can be easily concluded that when the rolling ball 5 abuts against the outer wall of the reaction vessel 1, the rolling ball 5 will be compressed inward, thereby squeezing the first sensor arranged in the rolling groove and triggering the first sensor. This indicates that the plug-in member 311 arranged on the first driving shaft 31 has completed the contact with the reaction vessel 1, and the first sensor can send a signal to the control module to facilitate the next step of rotating the first driving shaft 31 to insert the plug-in member 311 into the receiving groove 230 to complete the docking. This avoids the first driving shaft 31 from starting to rotate before it has contacted the reaction vessel 1, ensuring the docking success rate between the driving device 3 and the docking mechanism and avoiding docking errors.

[0066] Second Embodiment

[0067] In the first embodiment, a rolling ball 5 is arranged on the first driving shaft 31, and it is judged whether the first driving shaft 31 and the reaction vessel 1 have completed contact through the extrusion of the rolling ball 5, and the rotation of the first driving shaft 31 is driven according to the contact result between the first driving shaft 31 and the reaction vessel 1 to complete the docking. However, the first embodiment does not make a judgment on the docking result, and the driving device 3 needs to drive the reaction vessel 1 to move after completing the docking.

[0068] In view of this, in the second embodiment of the present invention, as Figure 7The drive system of the reaction vessel 1 of the chemical vapor deposition equipment shown also includes a control module, a plurality of first sensors and a plurality of second sensors. The plurality of first sensors are communicatively connected to the control module, and the plurality of first sensors are arranged on the side of the plug-in member 311 facing the reaction vessel 1, so as to send a contact completion signal to the control module when the plug-in member 311 abuts against the reaction vessel 1. The plurality of second sensors are communicatively connected to the control module, and the plurality of second sensors are arranged inside the connection assembly 21, so as to send a docking completion signal to the control module when the plug-in member 311 is connected to the connection assembly 21.

[0069] It can be easily concluded from the above content that when the plug-in member 311 contacts the side wall of the reaction vessel 1 driven by the first drive shaft 31, the first sensor arranged on the plug-in member 311 will be triggered. The triggered first sensor will send a signal to the control module, indicating that the first drive shaft 31 can perform the rotary docking operation at this time. The first drive shaft 31 drives the plug-in member 311 to rotate, so that the plug-in member 311 is inserted into the accommodating cavity of the docking assembly. When the plug-in member 311 triggers the second sensor arranged inside the connection assembly 21, it indicates that the docking between the plug-in member 311 and the docking assembly is completed. At this time, the reaction vessel 1 can be smoothly pushed along the preset direction through the first drive shaft 31, avoiding errors and failures during the movement of the reaction vessel 1 driven by the drive device 3 due to the premature driving of the first drive shaft 31 before the docking between the plug-in member 311 and the docking assembly is completely completed.

[0070] More specifically, the first sensor can adopt a pressure sensor, and a preset pressure value is set in the control module. When the pressure received by the pressure sensor exceeds the preset value, it indicates that the plug-in member 311 abuts against the surface of the reaction vessel 1. After the plug-in member 311 abuts against the surface of the reaction vessel 1, the first drive shaft 31 can be rotated to perform the docking between the plug-in member 311 and the docking assembly. The second sensor can also adopt a pressure sensor and is arranged in the accommodating groove 230 of the docking assembly. When the plug-in member 311 extends into the accommodating groove 230 and contacts the pressure sensor in the accommodating groove 230, it indicates that the plug-in member 311 has completed the docking with the docking assembly at this time and can perform the pushing operation of the reaction vessel 1.

[0071] The third embodiment

[0072] The third embodiment of the present invention also discloses a reaction system of a chemical vapor deposition equipment. The reaction system of the chemical vapor deposition equipment includes the drive system of the reaction vessel 1 of the above-mentioned chemical vapor deposition equipment.

[0073] By setting the drive system of the reaction vessel 1 of the chemical vapor deposition equipment, the reaction vessel 1 can move between various workstations in the chemical vapor deposition equipment. At the same time, the drive system can ensure the posture of the reaction vessel 1 within each workstation, so that when gas needs to be injected into the reaction vessel 1, the posture and orientation of the reaction vessel 1 can always be accurate, ensuring the docking between the gas supply assembly and the reaction vessel 1.

[0074] Based on the above supply system reference Figure 8 As shown, an embodiment of the present invention also discloses a method of using the drive system of the reaction vessel 1 of a chemical vapor deposition equipment, and the method of use includes:

[0075] In response to the first docking signal, start the drive device 3, so that the first drive shaft 31 drives the plug-in member 311 to move in the direction of the reaction vessel 1.

[0076] In response to the completion of contact signal, stop the drive device 3 and start the rotational power source 32 to rotate the plug-in member 311. The completion of contact signal is generated by the first type of sensor when the plug-in member 311 contacts the reaction vessel 1.

[0077] In response to the completion of docking signal, stop the rotational power source 32. The docking signal is generated by the second sensor when the plug-in member 311 is connected to the connection assembly 21.

[0078] Restart the drive device 3 to drive the first drive shaft 31 to push the reaction vessel 1 to move.

[0079] When the reaction vessel 1 needs to move in the system, refer to Figure 5 、 Figure 6 It can be seen that when the reaction vessel 1 reacts at the workstation, the gates on both sides need to be lowered to ensure the airtightness inside the workstation during the reaction process. Therefore, when the reaction vessel 1 needs to be moved, after the gates on both sides of the workstation where the reaction vessel 1 is located are opened, control to start the drive device 3 so that the first drive shaft 31 of the drive device 3 moves towards the reaction vessel 1. When the drive device 3 contacts the outer wall of the reaction vessel 1, at this time, the first drive shaft 31 of the drive device 3 has reached the docking position, and control the drive rod device to dock with the reaction vessel 1. When it is detected that the docking is completed, the reaction vessel 1 can move together under the drive of the drive device 3, and the drive device 3 can drive the reaction vessel 1 to move towards the next target workstation. And since the drive device 3 has completed the docking with the reaction vessel 1, the degree of freedom of the reaction vessel 1 is restricted by the drive device 3. Therefore, the movement of the reaction vessel 1 and the first drive shaft 31 will be synchronized, and the orientation and posture of the reaction vessel 1 during the movement will not be affected.

[0080] Furthermore, after the step of restarting the driving device 3 to drive the first driving shaft 31 to push the reaction vessel 1 to move, the following steps are further included:

[0081] In response to the first separation signal, start the rotary power source 32 to rotate the first driving shaft 31 to separate the plug-in connector 311 from the connection assembly 21. The first separation signal is generated by a light sensor when it detects that the reaction vessel 1 reaches the target position.

[0082] After the first driving shaft 31 rotates a preset angle, stop the rotary power source 32.

[0083] Start the driving device 3 to drive the first driving shaft 31 to drive the plug-in connector 311 to move away from the reaction vessel 1.

[0084] After transporting the reaction vessel 1 to the target work station by using the driving device 3, reactions need to be carried out inside the reaction vessel 1. Therefore, it is necessary to disconnect the connection between the driving device 3 and the reaction vessel 1 so that the reaction vessel 1 can stay alone in the work station. A light sensor is arranged at the work station of the reaction vessel 1 to detect whether the reaction vessel 1 reaches the target position. When the light sensor detects that the reaction vessel 1 reaches the target position, it can send out the first separation signal. According to the first separation signal that the reaction vessel 1 reaches the work station, the first driving shaft 31 rotates in reverse to separate the plug-in connector 311 from the receiving groove 230, thereby completing the separation of the plug-in connector 311 from the docking assembly. When the first driving shaft 31 rotates a preset angle, it indicates that the complete separation of the plug-in connector 311 from the docking assembly has been completed. Start the driving device 3 to drive the first driving shaft 31 to retreat, and the first driving shaft 31 moves away from the reaction vessel 1, so that the gates on both sides of the reaction system work station can be lowered naturally, avoiding interference with the first driving shaft 31 and ensuring the normal operation of the reaction system.

[0085] Finally, it should be noted that those of ordinary skill in the art can understand that in order to enable readers to better understand this patent, many technical details are proposed in the embodiments of this patent. However, even without these technical details and various changes and modifications based on the above embodiments, the technical solutions required to be protected by the claims of this patent can be basically implemented. Therefore, in practical applications, various changes can be made to the above embodiments in form and details without departing from the spirit and scope of this patent.

Claims

1. A driving system for a reaction vessel of a chemical vapor deposition device, characterized in that Comprising: A reaction vessel for providing a reaction space for chemical vapor deposition reaction; A connection mechanism including at least two connection components disposed on an outer surface of the reaction vessel; A driving device including: A rotational power source; A first driving shaft connected to the rotational power source; At least two plug connectors connected to the first driving shaft, and the rotational power source can drive the plug connectors to rotate circumferentially through the first driving shaft; At least two of the connection components and two of the plug connectors are arranged correspondingly so that the driven plug connectors are connected or disconnected one by one; The connection component includes: A cover plate and a connection portion, and the cover plate is connected to the outer surface of the reaction vessel through the connection portion, and a receiving groove is formed between the cover plate and the outer surface of the reaction vessel; The outer surface shape of the plug connector is adapted to the receiving groove to be inserted into or removed from the receiving groove; The cross-section of the receiving groove parallel to the outer surface of the reaction vessel is a part of a circle, and the central angle of the cross-section is less than 180 degrees; The outer surface shape of the plug connector in the cross-section parallel to the cover plate is a part of a circle, and the area of the cross-section of the plug connector is less than or equal to the area of the cross-section of the receiving groove parallel to the outer surface of the reaction vessel; A rolling groove is provided on a side of the plug connector facing the reaction vessel; The driving system of the reaction vessel of the chemical vapor deposition equipment further includes: A rolling ball clamped in the rolling groove, the rolling ball can roll in the rolling groove, and part of the rolling ball is exposed outside the rolling groove; The driving system of the reaction vessel of the chemical vapor deposition equipment further includes: A control module; At least one first sensor is disposed in the rolling groove to send a contact completion signal to the control module after coming into contact with the rolling ball.

2. The drive system of the reaction vessel of the chemical vapor deposition equipment according to claim 1, characterized in that, The number of the connection components is 2-10, and the connection components are evenly distributed along the circumferential direction of several concentric first virtual circles on the outer surface of the reaction vessel; The plug connectors are evenly distributed along the circumferential direction of several concentric second virtual circles, and each of the second virtual circles corresponds to the first virtual circle.

3. The drive system of the reaction vessel of the chemical vapor deposition equipment according to claim 1, characterized in that, The first driving shaft includes: A shaft body and a transmission gear sleeved on the shaft body; The rotational power source includes a motor, and a driving gear is sleeved on the output shaft of the motor, and the driving gear meshes with the transmission gear to drive the shaft body to rotate.

4. The drive system of the reaction vessel of the chemical vapor deposition equipment according to claim 3, characterized in that, The driving device further includes: A linear power source; A second driving shaft sleeved on the first driving shaft, and the first driving shaft can rotate freely relative to the second driving shaft; The linear power source can drive the plug connectors to move closer to or away from each other along a direction perpendicular to the outer surface of the reaction vessel provided with the connection components through the second driving shaft and the first driving shaft, so as to drive the reaction vessel to move when the plug connectors are connected to the connection components.

5. The drive system of the reaction vessel of the chemical vapor deposition apparatus according to claim 4, characterized in that, The linear power source is a pneumatic rod or a hydraulic rod; The rotational power source further includes: A sliding base, on which the motor is arranged. The sliding base is connected to the second drive shaft, and driven by the second drive shaft, the sliding base moves synchronously with the second drive shaft. The reaction system of the chemical vapor deposition equipment further includes: A guide rail arranged along the length direction of the first drive shaft. The reaction vessel is arranged on the guide rail and moves along the guide rail. The sliding base is also arranged on the guide rail and moves along the guide rail.

6. The drive system of the reaction vessel of the chemical vapor deposition apparatus according to claim 1, characterized in that, The drive system of the reaction vessel of the chemical vapor deposition equipment further includes: A control module; A plurality of first sensors communicatively connected to the control module. The plurality of first sensors are arranged on one side of the plug-in member facing the reaction vessel, so as to send a contact completion signal to the control module when the plug-in member abuts against the reaction vessel. A plurality of second sensors communicatively connected to the control module. The plurality of second sensors are arranged in the connection assembly, so as to send a docking completion signal to the control module when the plug-in member is connected to the connection assembly.

7. A reaction system of a chemical vapor deposition device, characterized in that The reaction system of the chemical vapor deposition equipment includes the drive system of the reaction vessel of the chemical vapor deposition equipment according to any one of claims 1-6.

8. A method of using a drive system for a reaction vessel of a chemical vapor deposition apparatus, characterized in that, The usage method of the drive system is applicable to the drive system of the reaction vessel of the chemical vapor deposition equipment according to any one of claims 1-6. The usage method includes: In response to a first docking signal, start the drive device to drive the first drive shaft to drive the plug-in member towards the reaction vessel; In response to the contact completion signal, stop the drive device and start the rotational power source to rotate the plug-in member. The contact completion signal is generated by the first type of sensor when the plug-in member contacts the reaction vessel. In response to the docking completion signal, stop the rotational power source. The docking completion signal is generated by the second sensor when the plug-in member is connected to the connection assembly. Restart the drive device to drive the first drive shaft to push the reaction vessel to move.

9. The method of using the drive system of the reaction vessel of the chemical vapor deposition equipment according to claim 8, characterized in that After the step of restarting the drive device to drive the first drive shaft to push the reaction vessel to move, it further includes: In response to a first separation signal, start the rotational power source to rotate the first drive shaft to separate the plug-in member from the connection assembly. The first separation signal is generated by a light sensor when it is detected that the reaction vessel reaches the target position. After the first drive shaft rotates a preset angle, stop the rotational power source; Start the drive device to drive the first drive shaft to drive the plug-in member away from the reaction vessel.

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