Automatic soaking cavity for silicon wafer cleaning

Abstract

The invention discloses an automatic soaking cavity for silicon wafer cleaning, and relates to the field of silicon wafer cleaning, the automatic soaking cavity comprises a fixing frame, a soaking cavity body is mounted at the top of the fixing frame, a diaphragm pump pipeline is mounted on the outer wall of the fixing frame, an air blowing mechanism is mounted at the top of the side edge of the fixing frame, and a throwing module is arranged at the side edge of the bottom of a flower basket moving structure. A flower basket body is movably connected into an inner cavity of the flower basket moving structure, a fixed air cylinder and a swing cylinder are installed on the top of the storage rack, and an inclined air cylinder is installed on the side edge of the flower basket moving structure. According to the automatic soaking cavity for silicon wafer cleaning, under the condition that the equipment size is not changed, automatic wet feeding of silicon wafers can be achieved, the cost can be effectively reduced, the influence of human factors on the brushing quality and efficiency of silicon wafer bodies is reduced, soaking liquid can be effectively controlled through the additionally-arranged inclined air cylinder and the additionally-arranged blowing mechanism, and the cleaning efficiency of the silicon wafers is improved. And the liquid residue at the silicon wafer body is reduced, and the possibility of secondary pollution of the soaking liquid to the silicon wafer is avoided.

Description

Technical Field

[0001] The invention relates to the field of silicon wafer cleaning, and in particular to an automatic immersion chamber for silicon wafer cleaning. Background Art

[0002] Silicon wafers are thin sheets made of silicon through a series of processing techniques. They are mainly derived from silicon ores, such as quartz stone. Silicon dioxide is converted into high-purity polysilicon through a high-temperature carbon reduction reaction. In industrial production, quartz sand and coke are mixed and heated to about 300 °C in an electric arc furnace to react and generate crude silicon. They are then purified through processes such as chemical vapor deposition such as the Siemens method to obtain high-purity silicon, which can be used as raw material for silicon wafer manufacturing.

[0003] At present, the single-wafer scrubber for silicon wafers generally has a dual-chamber structure, with front scrubbing and back scrubbing. In order to achieve wet feeding of silicon wafers, an external immersion chamber is generally adopted. The flower basket is manually soaked and then placed in the loading area to achieve wet feeding, or an immersion chamber is added inside the equipment. This equipment not only requires larger equipment and increased costs, but also greatly affects the scrubbing rhythm. The above two methods will affect the scrubbing quality, scrubbing efficiency and equipment life of the silicon wafers, and the immersion liquid is not effectively controlled.

[0004] Therefore, it is necessary to propose an automatic immersion chamber for cleaning silicon wafers to solve the above problems. Summary of the invention

[0005] The main purpose of the present invention is to provide an automatic immersion chamber for cleaning silicon wafers, which can effectively solve the problems in the background technology.

[0006] To achieve the above object, the technical solution adopted by the present invention is:

[0007] An automatic immersion chamber for cleaning silicon wafers comprises a fixing frame, a immersion chamber body is installed on the top of the fixing frame, a diaphragm pump pipeline is installed on the outer wall of the fixing frame, and a blowing mechanism is installed on the top of the side of the fixing frame;

[0008] The top of the soaking chamber body is movably connected with a flower basket moving structure, a throwing module is arranged on the side of the bottom of the flower basket moving structure, a flower basket body is movably connected in the inner cavity of the flower basket moving structure, limiting frames are symmetrically installed on both sides of the top of the flower basket body, a storage rack is arranged on the top of the limiting frame, a fixed cylinder and a swing cylinder are installed on the top of the storage rack, and a tilting cylinder is installed on the side of the flower basket moving structure.

[0009] Preferably, a diaphragm pump is connected to a flange at one end of the outer wall of the diaphragm pump pipeline, and a flow regulating valve is connected to a flange at the other end of the outer wall of the diaphragm pump pipeline. A liquid level sensor is installed on the side of the immersion chamber body, and the liquid level sensor extends into the inner cavity of the immersion chamber body. The top of the diaphragm pump pipeline is located at the top of the immersion chamber body. The diaphragm pump is used to input the immersion liquid into the inner cavity of the immersion chamber body through the diaphragm pump pipeline. The immersion chamber body is an overflow chamber, and the immersion chamber body is always in a liquid-filled state.

[0010] Preferably, the bottom of the fixing frame is mounted on the top of the base, an air inlet pipe is mounted on the bottom of the blowing mechanism, and a blowing pipe is mounted on a side of the blowing mechanism close to the soaking chamber body.

[0011] Preferably, the bottom of the throwing module is installed on the top of the base, and slide rails are symmetrically installed at both ends of the top of the base. The throwing module is a linear motor, and the flower basket moving structure is installed on the driving end of the linear motor. The two sides of the bottom of the flower basket moving structure are movably connected to the outer wall of the slide rail.

[0012] Preferably, a mounting seat is installed on the top of the flower basket body, the bottom of the limit frame is installed on the mounting seat, a silicon wafer body is arranged in the center of the top of the flower basket body, connecting rods are symmetrically installed around the top of the flower basket body, and the tops of four connecting rods are symmetrically installed around the bottom of the rack.

[0013] Preferably, a positioning frame is installed at the bottom of the fixed cylinder, and the positioning frame is movably connected to the top of the silicon wafer body. A positioning rod is installed at the bottom of the swing cylinder, and the positioning rod is attached to the side of the silicon wafer body.

[0014] Preferably, the bottom of the tilting cylinder is installed on the side of the flower basket body, and tilting shafts are symmetrically installed on both sides of the top of the shelf. The two tilting shafts are symmetrically rotatably connected to both sides of the top of the inner cavity of the flower basket moving structure.

[0015] Preferably, an adapting groove is provided in the middle of the bottom of the flower basket movable structure, the adapting groove and the soaking chamber body are adapted to each other in size, and the flower basket body, the adapting groove and the soaking chamber body are located on the same axis.

[0016] Compared with the prior art, the present invention provides an automatic immersion chamber for cleaning silicon wafers, which has the following beneficial effects:

[0017] 1. The automatic immersion chamber for cleaning silicon wafers can realize automatic wet feeding of silicon wafers without changing the volume of the equipment, which can effectively reduce costs and reduce the impact of human factors on the cleaning quality and efficiency of the silicon wafer body. By setting up additional tilting cylinders and blowing mechanisms, the immersion liquid can be effectively controlled to reduce liquid residue on the silicon wafer body and avoid the possibility of secondary contamination of the silicon wafer by the immersion liquid, thereby further improving the cleaning quality of the silicon wafer body.

[0018] 2. The automatic immersion chamber for cleaning silicon wafers can monitor the liquid level of the immersion chamber body at all times through the provided liquid level sensor, so that it can always be in a full liquid state. Through the provided diaphragm pump, the immersion liquid can be input into the inner cavity of the immersion chamber body through the diaphragm pump pipeline. Through the provided flow regulating valve, the input flow of the immersion liquid can be controlled, thereby facilitating the cleaning of the silicon wafer body.

[0019] 3. The automatic immersion chamber for cleaning silicon wafers can be blown to the air pipe through the air inlet pipe through the blowing mechanism, so that after the silicon wafer body is cleaned, it can be blown dry, and the residual liquid on the surface of the silicon wafer body can be blown off, which can effectively prevent the residual liquid from polluting the silicon wafer body.

[0020] 4. The automatic immersion chamber for cleaning silicon wafers can install the limiting frame according to the size of the silicon wafer body through the provided mounting seat. When cleaning the silicon wafer body, the side of the silicon wafer body can be positioned. By starting the provided fixed cylinder, the positioning frame can be driven to press down so that the positioning frame can limit the top of the silicon wafer body. By starting the provided swing cylinder, the positioning rod can be driven to rotate so that the positioning rod can fit the side of the silicon wafer body. In this way, the silicon wafer body can be positioned in all directions. When cleaning, the shaking of the silicon wafer body can be avoided, the integrity of the silicon wafer body can be improved, and the loss caused by collision with the immersion chamber body can be avoided.

[0021] 5. The automatic immersion chamber for cleaning silicon wafers can drive the silicon wafer body to tilt through the flower basket body by starting the tilting cylinder. When the air is blown by the blowing mechanism, the removal efficiency of the residual liquid can be improved, which can effectively improve the work efficiency. By starting the throwing module, the flower basket moving structure can be driven to move up and down. When the flower basket moving structure moves downward, the silicon wafer body can be moved to the inner cavity of the immersion chamber body for immersion cleaning. When the flower basket moving structure moves upward, the silicon wafer body can be separated from the inner cavity of the immersion chamber body, so that it can be blown dry. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0023] Figure 2 It is a structural schematic diagram of the soaking chamber body of the present invention;

[0024] Figure 3 It is a structural schematic diagram of the blowing mechanism of the present invention;

[0025] Figure 4 It is a structural schematic diagram of the flower basket moving structure of the present invention;

[0026] Figure 5 The present invention Figure 4 Enlarged view of point A in the middle.

[0027] In the figure: 1. fixed frame; 2. immersion chamber body; 3. diaphragm pump pipeline; 4. flow control valve; 5. flower basket moving structure; 6. tilting cylinder; 7. fixed cylinder; 8. swing cylinder; 9. tilting shaft; 10. flower basket body; 11. throwing module; 12. blowing mechanism; 13. blowing pipe; 14. air inlet pipe; 15. diaphragm pump; 16. liquid level sensor; 17. base; 18. slide rail; 19. adapter slot; 20. storage rack; 21. silicon wafer body; 22. limit frame; 23. mounting seat; 24. connecting rod; 25. positioning rod; 26. positioning frame. DETAILED DESCRIPTION

[0028] In order to make the technical means, creative features, objectives and effects achieved by the present invention easy to understand, the present invention is further explained below in conjunction with specific implementation methods.

[0029] Embodiment 1:

[0030] like Figure 1-Figure 3 As shown, an automatic immersion chamber for cleaning silicon wafers comprises a fixing frame 1, a immersion chamber body 2 is installed on the top of the fixing frame 1, a diaphragm pump pipeline 3 is installed on the outer wall of the fixing frame 1, a blowing mechanism 12 is installed on the top of the side of the fixing frame 1, a diaphragm pump 15 is connected to one end of the outer wall of the diaphragm pump pipeline 3 by a flange, a flow regulating valve 4 is connected to the other end of the outer wall of the diaphragm pump pipeline 3 by a flange, a liquid level sensor 16 is installed on the side of the immersion chamber body 2, the liquid level sensor 16 extends into the inner cavity of the immersion chamber body 2, the top of the diaphragm pump pipeline 3 is located at the top of the immersion chamber body 2, the diaphragm pump 15 is used to input the immersion liquid into the inner cavity of the immersion chamber body 2 through the diaphragm pump pipeline 3, the immersion chamber body 2 is an overflow chamber, and the immersion chamber body 2 is always in a liquid-filled state, the bottom of the fixing frame 1 is installed on the top of the base 17, an air inlet pipe 14 is installed at the bottom of the blowing mechanism 12, and a blowing pipe 13 is installed on the side of the blowing mechanism 12 close to the immersion chamber body 2;

[0031] In the case of the equipment volume remaining unchanged, the automatic wet feeding of the silicon wafer can be realized, which can effectively reduce the cost and reduce the influence of human factors on the scrubbing quality and efficiency of the silicon wafer body 21. By setting the additional tilting cylinder 6 and the blowing mechanism 12, the soaking liquid can be effectively controlled, the liquid residue at the silicon wafer body 21 can be reduced, and the possibility of secondary contamination of the silicon wafer by the soaking liquid can be avoided, so as to further improve the scrubbing quality of the silicon wafer body 21.

[0032] The liquid level sensor 16 can monitor the liquid level of the immersion chamber body 2 at all times, so that it can always be in a full state. The diaphragm pump 15 can input the immersion liquid into the inner cavity of the immersion chamber body 2 through the diaphragm pump pipeline 3. The flow rate regulating valve 4 can control the input flow of the immersion liquid, so as to facilitate the cleaning of the silicon wafer body 21.

[0033] By setting the air inlet pipe 14, the air blowing mechanism 12 can be used to blow the air pipe 13, so that after the silicon wafer body 21 is cleaned, it can be blown dry to blow off the residual liquid on the surface of the silicon wafer body 21, which can effectively prevent the residual liquid from polluting the silicon wafer body 21.

[0034] Embodiment 2:

[0035] like Figure 1 , Figure 4 , Figure 5As shown, an automatic immersion chamber for cleaning silicon wafers is shown, the top of the immersion chamber body 2 is movably connected with a basket moving structure 5, the side of the bottom of the basket moving structure 5 is provided with a throwing module 11, the inner cavity of the basket moving structure 5 is movably connected with a basket body 10, the two sides of the top of the basket body 10 are symmetrically installed with limit frames 22, the top of the limit frame 22 is provided with a storage rack 20, the top of the storage rack 20 is installed with a fixed cylinder 7 and a swing cylinder 8, the side of the basket moving structure 5 is installed with a tilting cylinder 6, the bottom of the throwing module 11 is installed on the top of the base 17, the two ends of the top of the base 17 are symmetrically installed with slide rails 18, the throwing module 11 is a linear motor, the basket moving structure 5 is installed on the driving end of the linear motor, the two sides of the bottom of the basket moving structure 5 are movably connected to the outer wall of the slide rail 18, the top of the basket body 10 is installed with a mounting seat 23, the bottom of the limit frame 22 is installed At the mounting seat 23, a silicon wafer body 21 is arranged in the middle of the top of the flower basket body 10, connecting rods 24 are symmetrically installed around the top of the flower basket body 10, and the tops of the four connecting rods 24 are symmetrically installed around the bottom of the rack 20, a positioning frame 26 is installed at the bottom of the fixed cylinder 7, and the positioning frame 26 is movably connected to the top of the silicon wafer body 21, a positioning rod 25 is installed at the bottom of the swing cylinder 8, and the positioning rod 25 is attached to the side of the silicon wafer body 21, the bottom of the tilting cylinder 6 is installed on the side of the flower basket body 10, and the two sides of the top of the rack 20 are symmetrically installed with tilting shafts 9, and the two tilting shafts 9 are symmetrically rotatably connected to the two sides of the top of the inner cavity of the flower basket moving structure 5, and an adapting groove 19 is opened in the middle of the bottom of the flower basket moving structure 5, and the size of the adapting groove 19 and the soaking chamber body 2 are adapted, and the flower basket body 10, the adapting groove 19 and the soaking chamber body 2 are on the same axis;

[0036] By means of the provided mounting seat 23, the limiting frame 22 can be installed according to the size of the silicon wafer body 21. When the silicon wafer body 21 is cleaned, the side of the silicon wafer body 21 can be positioned. By starting the provided fixed cylinder 7, the positioning frame 26 can be driven to press down, so that the positioning frame 26 can limit the top of the silicon wafer body 21. By starting the provided swing cylinder 8, the positioning rod 25 can be driven to rotate, so that the positioning rod 25 can fit the side of the silicon wafer body 21. In this way, the silicon wafer body 21 can be positioned in all directions. When cleaning, the shaking of the silicon wafer body 21 can be avoided, and the integrity of the silicon wafer body 21 can be improved to avoid the collision between the silicon wafer body 21 and the immersion chamber body 2 and the loss caused by the collision;

[0037] By starting the tilting cylinder 6, the silicon wafer body 21 can be tilted through the flower basket body 10. When the blowing mechanism 12 is used to blow air to it, the removal efficiency of the residual liquid can be improved, which can effectively improve the work efficiency. By starting the throwing module 11, the flower basket moving structure 5 can be driven to move up and down. When the flower basket moving structure 5 moves downward, the silicon wafer body 21 can be moved to the inner cavity of the immersion chamber body 2 for immersion and cleaning. When the flower basket moving structure 5 moves upward, the silicon wafer body 21 can be separated from the inner cavity of the immersion chamber body 2, so that it can be blown dry.

[0038] Embodiment three:

[0039] The diaphragm pump 15 pumps the soaking liquid into the soaking chamber body 2. The soaking chamber body 2 is an overflow chamber and is always full of liquid. The pipeline realizes liquid circulation and the flow rate can be adjusted by the flow regulating valve 4.

[0040] The basket body 10 is tilted, and the diaphragm pump pipeline 3 works while the water flows by itself, completely removing the liquid residue in a large area of ​​the silicon wafer body 21;

[0041] The basket body 10 is manually loaded, the fixed cylinder 7 is lowered, the basket body 10 is pressed tightly by the positioning frame 26, the swing cylinder 8 is started, the silicon wafer body 21 inside the basket body 10 is fixed, and the throwing module 11 is started to lower the basket moving structure 5, so that the silicon wafer body 21 can be in a soaking state;

[0042] When the ascending tossing module 11 reaches the upper limit, the tilting cylinder 6 is started, so that the basket body 10 can be tilted with the tilting shaft 9 as the rotation center, and the blowing mechanism 12 is started to blow air to remove the liquid residue on the surface of the silicon wafer body 21 in a large area. At this time, the silicon wafer body 21 is in a tilted state;

[0043] The basket body 10 is reset by tilting the cylinder 6 so that the basket body 10 is in a horizontal state, and the swing cylinder 8 is started to reset it. At this time, the silicon wafer body 21 can be unloaded.

[0044] It should be noted that the present invention is an automatic immersion chamber for cleaning silicon wafers. When in use, the diaphragm pump 15 is started to input the immersion liquid into the inner cavity of the immersion chamber body 2 through the diaphragm pump pipeline 3. At the same time, the flow regulating valve 4 monitors the flow of the immersion liquid, and the liquid level sensor 16 monitors the liquid level in the inner cavity of the immersion chamber body 2 to ensure that the immersion chamber body 2 is always in a liquid-filled state.

[0045] The silicon wafer body 21 is placed on the top of the basket body 10, and the limiting frames 22 on both sides are installed according to the size of the silicon wafer body 21, and are installed in the mounting seat 23 at a suitable position. The fixing cylinder 7 is started to drive the positioning frame 26 to press down so that the positioning frame 26 can fit on the top of the silicon wafer body 21, and the swing cylinder 8 is started to drive the positioning rod 25 to rotate so that it fits on the side of the silicon wafer body 21;

[0046] Start the throwing module 11 to drive the basket moving structure 5 to move to the bottom. The basket moving structure 5 will be sleeved on the outer wall of the immersion chamber body 2 and the fixing frame 1 through the adapting groove 19. At the same time, the basket body 10 will drive the silicon wafer body 21 into the inner cavity of the immersion chamber body 2. At this time, the silicon wafer body 21 can be immersed and cleaned;

[0047] After cleaning is completed, the silicon wafer body 21 is lifted up, and the tilting cylinder 6 is started, so that the storage rack 20 can rotate in the inner cavity of the flower basket moving structure 5 through the tilting shaft 9. At the same time, the storage rack 20 will drive the flower basket body 10 to rotate through the connecting rod 24, so that the flower basket body 10 can adjust the silicon wafer body 21 to a tilted state, and the air inlet pipe 14 supplies air to the blowing mechanism 12, so that the blowing pipe 13 can perform the exhaust work until the residual liquid in the silicon wafer body 21 is removed, and the silicon wafer body 21 can be unloaded.

[0048] The above shows and describes the basic principles and main features of the present invention and the advantages of the present invention. It should be understood by those skilled in the art that the present invention is not limited to the above embodiments. The above embodiments and descriptions are only for explaining the principles of the present invention. Without departing from the spirit and scope of the present invention, the present invention may have various changes and improvements, which fall within the scope of the present invention to be protected. The scope of protection of the present invention is defined by the attached claims and their equivalents.

Claims

1. An automatic immersion chamber for cleaning silicon wafers, comprising a fixing frame (1), characterized in that: The top of the fixed frame (1) is provided with an immersion chamber body (2), the outer wall of the fixed frame (1) is provided with a diaphragm pump pipeline (3), and the top of the side of the fixed frame (1) is provided with an air blowing mechanism (12); The top of the soaking chamber body (2) is movably connected to a flower basket moving structure (5), the side of the bottom of the flower basket moving structure (5) is provided with a throwing module (11), the inner cavity of the flower basket moving structure (5) is movably connected to a flower basket body (10), the two sides of the top of the flower basket body (10) are symmetrically installed with limit frames (22), the top of the limit frames (22) is provided with a storage rack (20), the top of the storage rack (20) is installed with a fixed cylinder (7) and a swing cylinder (8), and the side of the flower basket moving structure (5) is installed with a tilting cylinder (6).

2. The automatic immersion chamber for cleaning silicon wafers according to claim 1, characterized in that: A diaphragm pump (15) is connected to a flange at one end of the outer wall of the diaphragm pump pipeline (3), and a flow regulating valve (4) is connected to a flange at the other end of the outer wall of the diaphragm pump pipeline (3). A liquid level sensor (16) is installed on the side of the immersion chamber body (2), and the liquid level sensor (16) extends into the inner cavity of the immersion chamber body (2). The top of the diaphragm pump pipeline (3) is located at the top of the immersion chamber body (2). The diaphragm pump (15) is used to input the immersion liquid into the inner cavity of the immersion chamber body (2) through the diaphragm pump pipeline (3). The immersion chamber body (2) is an overflow chamber, and the immersion chamber body (2) is always in a liquid-filled state.

3. The automatic immersion chamber for cleaning silicon wafers according to claim 1, characterized in that: The bottom of the fixing frame (1) is mounted on the top of the base (17), an air inlet pipe (14) is mounted on the bottom of the blowing mechanism (12), and a blowing pipe (13) is mounted on a side of the blowing mechanism (12) close to the soaking chamber body (2).

4. The automatic immersion chamber for cleaning silicon wafers according to claim 1, characterized in that: The bottom of the throwing module (11) is mounted on the top of the base (17), and slide rails (18) are symmetrically mounted at both ends of the top of the base (17). The throwing module (11) is a linear motor, and the flower basket moving structure (5) is mounted on the driving end of the linear motor. The two sides of the bottom of the flower basket moving structure (5) are movably connected to the outer wall of the slide rail (18).

5. The automatic immersion chamber for cleaning silicon wafers according to claim 1, characterized in that: A mounting seat (23) is installed on the top of the flower basket body (10), the bottom of the limiting frame (22) is installed on the mounting seat (23), a silicon chip body (21) is arranged in the middle of the top of the flower basket body (10), connecting rods (24) are symmetrically installed around the top of the flower basket body (10), and the tops of four connecting rods (24) are symmetrically installed around the bottom of the storage rack (20).

6. The automatic immersion chamber for cleaning silicon wafers according to claim 1, characterized in that: A positioning frame (26) is installed at the bottom of the fixed cylinder (7), and the positioning frame (26) is movably connected to the top of the silicon wafer body (21). A positioning rod (25) is installed at the bottom of the swing cylinder (8), and the positioning rod (25) is attached to the side of the silicon wafer body (21).

7. The automatic immersion chamber for cleaning silicon wafers according to claim 1, characterized in that: The bottom of the tilting cylinder (6) is installed on the side of the flower basket body (10), and tilting shafts (9) are symmetrically installed on both sides of the top of the storage rack (20). The two tilting shafts (9) are symmetrically rotatably connected to both sides of the top of the inner cavity of the flower basket moving structure (5).

8. The automatic immersion chamber for cleaning silicon wafers according to claim 1, characterized in that: An adaption groove (19) is provided in the middle of the bottom of the flower basket moving structure (5); the adaption groove (19) and the soaking chamber body (2) are adapted in size; and the flower basket body (10), the adaption groove (19) and the soaking chamber body (2) are located on the same axis.

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