A 193 nm band ultraviolet laser generating device

Abstract

The application discloses a device and method for generating 193nm waveband ultraviolet laser, which comprises a near-infrared laser driving unit 1, a nonlinear frequency conversion system 2 and an ultraviolet laser generating system 3 connected in sequence. The near-infrared laser driving unit is a high-power picosecond laser for generating near-infrared laser with a wavelength of 1064nm. The near-infrared laser is divided into two parts by a beam splitter, one part of which is used as pump light of a first optical parametric oscillator (OPO1) and generates 840nm laser, and the 840nm laser is converted into 210nm laser through four frequency doubling; the other part is directly used as pump light of a second optical parametric oscillator (OPO2) and generates 2380nm laser. In the last ultraviolet laser generating system, the 210nm laser and the 2380nm laser are combined through sum frequency mixing to finally realize the output of 193nm waveband ultraviolet laser. The application provides a new idea and technical route for the development of vacuum ultraviolet 193nm waveband solid-state laser by using mature nonlinear crystal and nonlinear frequency conversion process.

Description

Technical Field

[0001] This invention belongs to the field of laser technology, specifically relating to a device for generating 193nm ultraviolet laser. Background Technology

[0002] 193nm ultraviolet lasers are crucial tools in high-resolution spectroscopy, surface science, photochemistry, fiber grating fabrication, integrated circuit etching, and precision laser processing. Developing 193nm ultraviolet lasers is of great significance and has broad application prospects. Currently, the main method for obtaining 193nm ultraviolet lasers relies on ArF excimer gas lasers, which generate ultraviolet lasers using a combination of rare and reactive gases under high pressure. However, this method carries risks of harmful gases posing a threat to human safety and causing environmental pollution, as well as drawbacks such as high cost, limited repetition rate, poor beam quality, and poor coherence, severely restricting the development of related research and applications. Compared to gas lasers, solid-state 193nm ultraviolet lasers offer advantages such as tunable repetition rate, good beam quality, good coherence, small size, and tunable wavelength. With the continuous development of lasers, nonlinear crystals, and related technologies, the advantages of generating 193nm ultraviolet lasers through nonlinear frequency transformation methods such as frequency doubling and sum-frequency generation compared to gas lasers are becoming increasingly apparent.

[0003] Currently, nonlinear frequency conversion-based schemes are widely used in the generation of 193nm ultraviolet lasers. However, these schemes have high requirements for the driving light source and related nonlinear crystals, resulting in low output power and conversion efficiency. Furthermore, ultraviolet continuous laser generation systems combining fiber lasers and diamond Raman technology utilize diamond crystals to generate diamond Raman lasers, which are then further frequency-converted to generate 193nm ultraviolet lasers. However, these systems have high requirements for the driving light source, and the diamond crystals require special cooling treatment, increasing the complexity of the experiment.

[0004] Therefore, how to stably and efficiently generate high-power 193nm ultraviolet lasers using a single driving light source, and how to explore various technical routes for generating 193nm ultraviolet lasers, are urgent problems that researchers in this field need to solve. Summary of the Invention

[0005] To address the problems existing in the prior art, this invention provides an apparatus and method for generating 193nm ultraviolet laser light. The technical solution of this invention is as follows:

[0006] An apparatus for generating 193nm ultraviolet laser includes a near-infrared laser driving unit, a nonlinear frequency conversion system, and an ultraviolet laser generating system connected in sequence. The near-infrared laser driving unit generates near-infrared laser with a wavelength of λ1. In the nonlinear frequency conversion system, the near-infrared laser with wavelength λ1 generated by the near-infrared laser driving unit is split into two parts by a beam splitter. One part undergoes a frequency doubling process to generate laser with wavelength λ2, where λ2 = λ1 / 2. Subsequently, the laser with wavelength λ2 is used as pump light to pump a first optical parametric oscillator (OPO1) to generate laser with wavelength λ3. After a fourth frequency doubling process, laser with wavelength λ4 is generated, where λ4 = λ3 / 4. The other part directly pumps a second optical parametric oscillator (OPO2) to generate laser with wavelength λ5. The two laser beams with wavelengths λ4 and λ5 then enter the ultraviolet laser generating system, and finally, a 193nm ultraviolet laser with wavelength λ6 is generated through a sum-frequency conversion method, where 1 / λ6 = 1 / λ4 + 1 / λ5.

[0007] The near-infrared laser driving unit includes an optical fiber seed source, a stretcher, a preamplifier, a main amplifier, and a compressor;

[0008] The seed source is an optical fiber seed source, which generates a seed laser with a center wavelength of 1064nm and an energy in the nanojoule range.

[0009] The stretcher is a CFBG stretcher, which is responsible for stretching the seed laser pulse width to hundreds of picoseconds or even nanoseconds.

[0010] The preamplifier is a regenerative amplifier, which has the advantages of good beam quality and simple structure.

[0011] The main amplifier is a dual-pass amplifier, which is responsible for further enhancing the laser energy output by the preamplifier;

[0012] The compressor is a single-grating compressor, which can provide negative second-order dispersion for the pulse. It is conjugate with the stretcher and the amount of dispersion can be adjusted by adjusting the incident angle and the delay position to compress the amplified pulse to the picosecond level.

[0013] The nonlinear frequency conversion system includes a beam splitter, a first focusing system, a first nonlinear crystal, a first collimation system, a first optical parametric oscillator module, a second collimation system, a second focusing system, a third nonlinear crystal, a third collimation system, a third focusing system, a second optical parametric oscillator module, and a fourth collimation system.

[0014] The first nonlinear crystal acts as a frequency doubling crystal, generating frequency-doubled light with a wavelength of λ2 through single-pass frequency doubling, double-pass frequency doubling, or cascaded single-pass frequency doubling, where λ2 = λ1 / 2. The first optical parametric oscillator module uses the frequency-doubled light with a wavelength of λ2 generated by frequency doubling as pump light and the second nonlinear crystal as a frequency conversion device to generate signal light with a wavelength of λ3. The third nonlinear crystal acts as a fourth frequency doubling crystal, using the signal light with a wavelength of λ3 generated by the first optical parametric oscillator module as fundamental frequency light and generating fourth frequency-doubled light with a wavelength of λ4 through fourth frequency doubling. The second optical parametric oscillator module uses picosecond laser with a wavelength of λ1 output from the near-infrared laser driving unit as pump light and the fourth nonlinear crystal as a frequency conversion device to generate idler light with a wavelength of λ5.

[0015] The first nonlinear crystal refers to a single nonlinear crystal used to achieve single-pass frequency doubling or double-pass frequency doubling, or multiple cascaded nonlinear crystals used to achieve cascaded single-pass frequency doubling, such as barium β-metabolic crystal, lithium triborate crystal, bismuth triborate crystal, lithium cesium borate crystal, potassium titanate phosphate crystal, potassium titanate arsenate crystal, potassium dihydrogen phosphate crystal, potassium dideuterium phosphate crystal, ammonium dihydrogen phosphate crystal, ammonium dideuterium phosphate crystal, guanidine tetrafluoroborate crystal, yttrium calcium borate crystal, periodically polarized lithium niobate crystal, magnesium oxide-doped periodically polarized lithium niobate crystal, and periodically polarized titanium oxide phosphate crystal. The first nonlinear crystal is a potassium crystal or a periodically polarized potassium titanate arsenate crystal; the second nonlinear crystal refers to a nonlinear crystal used in the first optical parametric oscillator module to realize frequency conversion from wavelength λ2 to λ3, such as lithium triborate crystal, barium borate crystal, bismuth borate crystal, etc.; the third nonlinear crystal refers to a nonlinear crystal used to realize frequency conversion from wavelength λ3 to λ4, such as β-barium metaborate crystal; the fourth nonlinear crystal refers to a nonlinear crystal used in the second optical parametric oscillator module to realize frequency conversion from wavelength λ1 to λ5, such as a periodically polarized magnesium oxide-doped lithium niobate crystal.

[0016] The ultraviolet laser generation system includes a fourth focusing system, a fifth nonlinear crystal, and a fifth collimation system;

[0017] The fifth nonlinear crystal is used as a sum-frequency crystal, and two beams of light with wavelengths of λ4 and λ5 are used as fundamental frequency light to generate sum-frequency light with wavelength of λ6 through sum-frequency generation.

[0018] The fifth nonlinear crystal refers to a nonlinear crystal used to realize sum frequencies, such as a lithium triborate crystal.

[0019] The first focusing system, the second focusing system, the third focusing system, and the fourth focusing system, as well as the first collimating system, the second collimating system, the third collimating system, the fourth collimating system, and the fifth collimating system, employ a single lens or a lens group.

[0020] The near-infrared laser driving unit further includes a first spatial isolator and a second spatial isolator. The first spatial isolator is connected between the stretcher and the preamplifier, and the second spatial isolator is connected between the preamplifier and the main amplifier.

[0021] Advantages of this invention:

[0022] 1. The present invention provides an apparatus and method for generating 193nm ultraviolet laser, which uses a ytterbium-doped picosecond solid-state laser as the driving light source, eliminating the need for other lasers and greatly simplifying the laser system.

[0023] 2. Compared with existing ArF excimer gas lasers, this invention does not pose any risk to personal safety or environmental pollution, and has advantages such as scalable repetition frequency, good beam quality, good coherence, small size, adjustable pulse width, and tunable wavelength. Compared with diamond Raman lasers, the crystals used for frequency conversion in this invention are all mature crystals, and have the characteristics of high efficiency, low cost, easy maintenance, and stable operation.

[0024] 3. The frequency transformations involved in this invention are all nonlinear processes, which have great flexibility and can achieve wavelength tunable output, providing convenience for generating high-power 193nm ultraviolet lasers. Attached Figure Description

[0025] Figure 1 This is a schematic diagram of the device and method for generating 193nm ultraviolet laser according to the present invention;

[0026] Figure 2 This is a schematic diagram of the near-infrared driving unit included in the system of the present invention;

[0027] Figure 3 This is a schematic diagram of the nonlinear frequency conversion system included in the system of the present invention;

[0028] Figure 4 This is a schematic diagram of the ultraviolet laser generation system included in the system of the present invention;

[0029] Figure 5 This is a schematic diagram of the optical path of the first optical parametric oscillator module included in the system of the present invention;

[0030] Figure 6 This is a schematic diagram of the optical path of the second optical parametric oscillator module included in the system of the present invention;

[0031] In the attached diagram, the components are: near-infrared laser drive unit 1, seed source 11, stretcher 12, spatial isolator 13, preamplifier 14, spatial isolator 15, main amplifier 16, compressor 17, nonlinear frequency conversion system 2, beam splitter 21, first focusing system 22, first nonlinear crystal 23, first collimation system 24, first optical parametric oscillator module 25, second collimation system 26, second focusing system 27, third nonlinear crystal 28, third collimation system 29, and third focusing system 210. The system comprises: a second optical parametric oscillator module 211, a fourth collimation system 212, an ultraviolet laser generation system 3, a fourth focusing system 31, a fifth nonlinear crystal 32, a fifth collimation system 33, a first dichroic mirror 251a, a second dichroic mirror 251b, a second nonlinear crystal 252, a first end mirror 253, a first coupling output mirror 254, a third dichroic mirror 2111a, a fourth dichroic mirror 2111b, a fourth nonlinear crystal 2112, a second end mirror 2113, and a second coupling output mirror 2114. Detailed Implementation

[0032] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention.

[0033] This invention provides an apparatus and method for generating 193nm ultraviolet laser light, such as... Figure 1 The system includes: a near-infrared laser driving unit 1, a nonlinear frequency conversion system 2, and an ultraviolet laser generating system 3. The near-infrared laser driving unit 1 generates a 1064nm near-infrared laser as the system's driving light source. The nonlinear frequency conversion system 2 obtains the desired wavelength laser through nonlinear processes such as frequency doubling, optical parametric oscillation, and fourth harmonication. Finally, the ultraviolet laser generating system 3 generates a 193nm ultraviolet laser through a sum-frequency process.

[0034] like Figure 2 As shown, the near-infrared laser driving unit 1 includes a seed source 11, a stretcher 12, a first spatial isolator 13, a preamplifier 14, a second spatial isolator 15, a main amplifier 16, and a compressor 17.

[0035] The seed source 11 is the Huari Fiber Optic Seed Source HR-Seed-ps, which can generate seed lasers with a center wavelength of 1064.3nm and energy in the nanojoule range.

[0036] The stretcher 12 is a Teraxion CFBG stretcher PWS-HPSR, which is responsible for stretching the seed laser pulse width to hundreds of picoseconds or even nanoseconds.

[0037] The preamplifier 14 is a regenerative amplifier, which has the advantages of good beam quality and simple structure.

[0038] The main amplifier 16 is a dual-pass amplifier, which is responsible for further enhancing the laser energy output by the preamplifier.

[0039] Both the first spatial isolator 13 and the second spatial isolator 15 are designed to prevent backlight from damaging the preceding optical components and equipment.

[0040] The compressor 17 is a single-grating compressor, which can provide negative second-order dispersion for the pulse. It is conjugate with the stretcher and the amount of dispersion can be adjusted by adjusting the incident angle and the delay position, so as to compress the amplified pulse to the picosecond level.

[0041] like Figure 3 , Figure 5 and Figure 6 As shown, the nonlinear frequency conversion system 2 includes a beam splitter 21, a first focusing system 22, a first nonlinear crystal 23, a first collimation system 24, a first optical parametric oscillator module 25, a second collimation system 26, a second focusing system 27, a third nonlinear crystal 28, a third collimation system 29, a third focusing system 210, a second optical parametric oscillator module 211, a fourth collimation system 212, a first dichroic mirror 251a, a second dichroic mirror 251b, a second nonlinear crystal 252, a first end mirror 253, a first coupling output mirror 254, a third dichroic mirror 2111a, a fourth dichroic mirror 2111b, a fourth nonlinear crystal 2112, a second end mirror 2113, and a second coupling output mirror 2114.

[0042] The first nonlinear crystal 23 serves as a frequency doubling crystal, generating frequency-doubled light with a wavelength of λ2 (λ2 = λ1 / 2) through single-pass frequency doubling, double-pass frequency doubling, or cascaded single-pass frequency doubling. The frequency-doubled light with a wavelength of λ2 in the first optical parametric oscillator module 25 serves as pump light. This pump light enters the first optical parametric oscillator module through the first dichroic mirror 251a. Using the second nonlinear crystal 252 as a frequency conversion device, it generates signal light with a wavelength of λ3, which oscillates in the resonant cavity composed of the first dichroic mirror 251a, the second dichroic mirror 251b, the first end mirror 253, and the first coupling output mirror 254, and is finally output through the first coupling output mirror 254. The third nonlinear crystal 28 serves as a fourth frequency doubling crystal. The first optical parametric oscillator module uses a signal light with a wavelength of λ3 generated by the first optical parametric oscillator module as the fundamental frequency light, and generates a fourth harmonic light with a wavelength of λ4 through a fourth harmonic process; the second optical parametric oscillator module 211 uses a picosecond laser with a wavelength of λ1 output by the near-infrared laser driving unit as the pump light. This pump light enters the second optical parametric oscillator module through the third dichroic mirror 2111a, and uses the fourth nonlinear crystal 2112 as a frequency conversion device to generate idler light with a wavelength of λ5. This idler light oscillates in the resonant cavity composed of the third dichroic mirror 2111a, the fourth dichroic mirror 2111b, the second end mirror 2113, and the second coupling output mirror 2114, and is finally output through the second coupling output mirror 2114.

[0043] The first nonlinear crystal refers to a single nonlinear crystal used to achieve single-pass frequency doubling or double-pass frequency doubling, or multiple cascaded nonlinear crystals used to achieve cascaded single-pass frequency doubling. The crystals selected include barium β-metabolic crystal, lithium triborate crystal, bismuth triborate crystal, lithium cesium borate crystal, potassium titanate phosphate crystal, potassium titanate arsenate crystal, potassium dihydrogen phosphate crystal, potassium dideuterium phosphate crystal, ammonium dihydrogen phosphate crystal, ammonium dideuterium phosphate crystal, guanidine tetrafluoroborate crystal, yttrium calcium borate crystal, periodically polarized lithium niobate crystal, magnesium oxide-doped periodically polarized lithium niobate crystal, periodically polarized potassium titanate phosphate crystal, or periodically polarized potassium titanate arsenate crystal.

[0044] The second nonlinear crystal refers to the nonlinear crystal used in the first optical parametric oscillator module to realize the frequency conversion from wavelength λ2 to λ3, and lithium triborate crystal, barium borate crystal, and bismuth borate crystal are selected.

[0045] The third nonlinear crystal refers to a nonlinear crystal used to achieve a fourth harmonic frequency conversion, realizing a frequency conversion from wavelength λ3 to λ4, and is selected as a β-barium metaborate crystal.

[0046] The fourth nonlinear crystal refers to the nonlinear crystal used in the second optical parametric oscillator module to realize the frequency conversion from wavelength λ1 to λ5, and a periodically polarized lithium magnesium oxide niobate crystal is selected.

[0047] The first and second dichroic mirrors refer to lenses that have high transmittance for lasers with a wavelength of λ2 and high reflectance for lasers with a wavelength of λ3; the third and fourth dichroic mirrors refer to lenses that have high transmittance for lasers with a wavelength of λ1 and high reflectance for lasers with a wavelength of λ5.

[0048] The first end mirror refers to a lens with high reflectivity for lasers in the wavelength bands λ2 and λ3; the second end mirror refers to a lens with high reflectivity for lasers in the wavelength bands λ1 and λ5.

[0049] The first coupling output mirror refers to a lens that has high reflectivity for lasers in the λ2 wavelength band and a certain transmittance for lasers in the λ3 wavelength band; the second coupling output mirror refers to a lens that has high reflectivity for lasers in the λ1 wavelength band and a certain transmittance for lasers in the λ5 wavelength band.

[0050] like Figure 4 As shown, the ultraviolet laser generating system 3 includes a fourth focusing system 31, a fifth nonlinear crystal 32, and a fifth collimation system 33 connected in sequence.

[0051] The five nonlinear crystals 32 are used as sum-frequency crystals, and two beams of light with wavelengths of λ4 and λ5 are used as fundamental frequency light to generate sum-frequency light with wavelength of λ6 through sum-frequency generation.

[0052] The fifth nonlinear crystal refers to a nonlinear crystal used to generate a sum-frequency light with a wavelength of λ6 from two beams of light with wavelengths of λ4 and λ5, and lithium triborate crystal is selected.

[0053] The first focusing system 22, the second focusing system 27, the third focusing system 210 and the fourth focusing system 31, the first collimation system 24, the second collimation system 26, the third collimation system 29, the fourth collimation system 212 and the fifth collimation system 33 can all use a single lens or a lens group.

[0054] Example

[0055] The high-power near-infrared laser with a wavelength of 1064nm generated by the near-infrared laser driving unit 1 enters the nonlinear frequency conversion system 2. After passing through the beam splitter 21, it is split into two parts. One part passes through the first focusing system 22 and enters the β-barium borate crystal, where it undergoes frequency conversion to generate a frequency-doubled light with a wavelength of 532nm. This light then enters the first optical parametric oscillator module, where it undergoes frequency conversion through the lithium triborate crystal to generate a signal light with a wavelength of 840nm. After passing through the second focusing system 27, it enters the β-barium borate crystal again, where it undergoes frequency conversion to generate a fourth-harmonic light with a wavelength of 210nm. The other part enters the second optical parametric oscillator module, where it undergoes frequency conversion through the periodically polarized magnesium oxide-doped lithium niobate crystal to generate an idler light with a wavelength of 2380nm. The fourth-harmonic light with a wavelength of 210nm and the idler light with a wavelength of 2380nm both enter the ultraviolet laser generation system 3. After passing through the fourth focusing system 31, they enter the lithium triborate crystal and undergo frequency conversion to generate an ultraviolet laser with a wavelength of 193nm.

[0056] Those skilled in the art will readily understand that the above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A 193 nm wavelength band ultraviolet laser generating apparatus characterized by comprising: The application relates to a near-infrared laser driving unit, a nonlinear frequency conversion system and an ultraviolet laser generating system which are connected in sequence, wherein the near-infrared laser driving unit generates near-infrared laser with a wavelength of lambda 1, and lambda 1 is 1064 nm; the nonlinear frequency conversion system divides the near-infrared laser into two paths through a beam splitter, one path generates visible laser with a wavelength of lambda 2=532 nm through a frequency doubling process to pump a first optical parametric oscillator (OPO1) to generate laser with a wavelength of lambda 3=840 nm, and then generates laser with a wavelength of lambda 4=210 nm through a four-frequency doubling process, and the other path directly pumps a second optical parametric oscillator (OPO2) with the near-infrared laser to generate laser with a wavelength of lambda 5=2380 nm; and the ultraviolet laser generating system generates ultraviolet laser with a wavelength of lambda 6=193 nm through sum frequency mixing of the two lasers with wavelengths of lambda 4=210 nm and lambda 5=2380 nm.

2. The 193 nm band ultraviolet laser generating apparatus according to claim 1, wherein The near-infrared laser driving unit comprises a fiber seed source, a stretcher, a preamplifier, a main amplifier and a compressor; the seed light with a center wavelength of 1064 nm generated by the fiber seed source is stretched by the stretcher, then enters the preamplifier and the main amplifier in sequence to be amplified, and finally is compressed by the compressor to obtain high-power near-infrared picosecond laser output.

3. The 193 nm band ultraviolet laser light generating device according to claim 2, wherein The seed source is a commercial fiber seed source, generates seed light with a center wavelength of 1064 nm and nanojoule energy, the stretcher is a chirped fiber grating (CFBG) stretcher, the preamplifier is a regenerative amplifier, the main amplifier is a double-pass amplifier, and the compressor is a single-grating compressor.

4. The 193 nm band ultraviolet laser light generating device according to claim 2, wherein A first spatial isolator is connected between the stretcher and the preamplifier, and a second spatial isolator is connected between the preamplifier and the main amplifier.

5. The 193 nm band ultraviolet laser light generating device according to claim 1, wherein The nonlinear frequency conversion comprises a beam splitter and two light paths into which the near-infrared laser generated by the near-infrared laser driving unit is divided by the beam splitter, one light path sequentially passes through a first focusing system, a first nonlinear crystal, a first collimating system, a first optical parametric oscillator module, a second collimating system, a second focusing system, a third nonlinear crystal and a third collimating system, and the other light path sequentially passes through a third focusing system, a second optical parametric oscillator module and a fourth collimating system; The first nonlinear crystal serves as a frequency doubling crystal, generates frequency-doubled light with a wavelength of lambda 2 through single-pass frequency doubling, double-pass frequency doubling or cascaded single-pass frequency doubling, and lambda 2=lambda 1 / 2; the first optical parametric oscillator module generates signal light with a wavelength of lambda 3 by taking the frequency-doubled light with the wavelength of lambda 2 as pumping light and taking a second nonlinear crystal as a frequency conversion device; the third nonlinear crystal serves as a four-frequency doubling crystal, generates four-frequency-doubled light with a wavelength of lambda 4 by taking the signal light with the wavelength of lambda 3 generated by the first optical parametric oscillator module as base frequency light through four-frequency doubling; and the second optical parametric oscillator module generates idler light with a wavelength of lambda 5 by taking the picosecond laser with the wavelength of lambda 1 output by the near-infrared laser driving unit as pumping light and taking a fourth nonlinear crystal as a frequency conversion device.

6. The 193 nm band ultraviolet laser light generating device according to claim 5, wherein The beam splitter is a non-polarization beam splitter; the first nonlinear crystal is a beta-barium borate crystal, a lithium triborate crystal, a bismuth triborate crystal, a cesium lithium borate crystal, a potassium titanyl phosphate crystal, a potassium titanyl arsenate crystal, a potassium dihydrogen phosphate crystal, a potassium di-deuterium phosphate crystal, a dihydrogen ammonium phosphate crystal, a di-deuterium ammonium phosphate crystal, a guanidinium tetrafluoroborate crystal, a yttrium calcium oxyborate crystal, a periodically poled lithium niobate crystal, a periodically poled lithium niobate crystal doped with magnesium oxide, a periodically poled potassium titanyl phosphate crystal, or a periodically poled potassium titanyl arsenate crystal; the second nonlinear crystal is a lithium triborate crystal, a barium borate crystal, or a bismuth borate crystal; the third nonlinear crystal is a beta-barium borate crystal; and the fourth nonlinear crystal is a periodically poled lithium niobate crystal doped with magnesium oxide.

7. The 193 nm band ultraviolet laser light generating device according to claim 5, wherein The first focusing system, the second focusing system, the third focusing system, the first collimating system, the second collimating system, the third collimating system, and the fourth collimating system are single lenses or lens groups.

8. The 193 nm band ultraviolet laser light generating device according to claim 1, wherein The ultraviolet laser generation system comprises a fourth focusing system, a fifth nonlinear crystal, and a fifth collimating system. After the two beams of laser generated by the nonlinear frequency conversion system are focused by the fourth focusing system, the two beams of laser are frequency-mixed by the fifth nonlinear crystal, and then collimated and output by the fifth collimating system.

9. The 193 nm band ultraviolet laser light generating device according to claim 8, wherein The fifth nonlinear crystal is a frequency-mixing crystal, and is a lithium triborate crystal.

10. The 193 nm band ultraviolet laser light generating device according to claim 8, wherein The fourth focusing system and the fifth collimating system are single lenses or lens groups.

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