Low-residue disinfecting wipe

By using a composition of quaternary ammonium cation and betaine surfactant in the disinfectant, the problem of existing disinfectant leaving residue on smooth surfaces is solved, achieving lower residues and better cleaning and disinfection effects.

CN119817576APending Publication Date: 2025-04-15ASADA LLC
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Patent Information

Application Number
CN202510025415.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Priority Date
2016-09-28
Filing Date
2017-09-26
Publication Date
2025-04-15

AI Technical Summary

Technical Problem

The existing disinfectant is prone to leave significant streaks and film-forming residues after use on a smooth and glossy surface, making it difficult to meet the cleaning and disinfection requirements of low residues.

Method used

A wipe composition containing quaternary ammonium cations and a surfactant reducing residue is used, specifically, using betaine surfactant, by adjusting the ratio of antimicrobial and surfactant (about 1:0.2 to 1:10) to reduce residue on the surface.

Benefits of technology

Significantly reduces the stripes and film-forming residues left after use on hard surfaces, improving the cleaning performance and visual effects of disinfection wipes.

✦ Generated by Eureka AI based on patent content.

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Patent Text Reader

Abstract

The present disclosure relates to a wiping composition. The composition contains a quaternary ammonium compound in a concentration sufficient to have antimicrobial efficacy. In order to reduce striping and / or film formation during use of the wiping composition, the composition also contains a residue-reducing surfactant. In one embodiment, the residue reducing surfactant comprises a betaine surfactant.
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Description

[0001] This application is a divisional application of the Chinese invention patent application with application date of September 26, 2017, application number 201780063756.2, and invention name “Low Residue Disinfection Wipe”.

[0002] Related Applications

[0003] This application is based upon and claims the benefit of U.S. Provisional Patent Application Serial No. 62 / 400,663, filed on September 28, 2016, which is incorporated herein by reference. Background of the Invention

[0005] Pathogenic organisms such as bacteria, fungi and viruses continue to cause infections in humans as well as domestic animals and pets. In recent years, people have paid more and more attention to foodborne pathogens and the possibility of them contaminating the food chain. Disinfectant formulations have been developed in the past decades to reduce or destroy pathogenic organisms, and therefore reduce infection rates. Indeed, any hard surface, including floors, walls, countertops, windows, window sills, sinks, faucets, waste containers, appliances and cabinet surfaces may be contaminated. Disinfectants have been developed to handle hard surfaces for use in hospitals, nursing homes, schools and families. Antimicrobial compositions for decontamination, disinfection and / or cleaning can be added to wipes to handle these surfaces.

[0006] One particular class of antimicrobial compositions includes quaternary ammonium compounds, also known as "quats," as microbial control agents. The use of quaternary amines as biocides is well known.

[0007] In hard surface cleaning / disinfecting wipe applications, the desired product should exhibit good cleaning and disinfecting performance while leaving the surface visually clear of spots, streaks and films. Most cationic formulations, such as quaternary ammonium compound based wipe disinfectant formulations, leave a noticeable visible residue that is particularly noticeable on smooth glossy surfaces.

[0008] In one application, the antimicrobial composition can be incorporated into a wipe product and packaged as a pre-moistened wipe. These products are generally inexpensive to manufacture, easy to use, and disposable after use. However, the problem of streaking and filmy residue is exacerbated when pre-moistened wipes are used because the product leaves the surface wet and is not dry wiped.

[0009] Attempts have been made to prepare compositions with minimal residues. For example, C8 to C 10 Alkyl polyglucoside (APG) surfactants and amine oxide surfactants in an attempt to produce low residue wipes.

[0010] Known low-streaking surfactant compounds can reduce streaking, but tend to exhibit filming on hard surfaces after application, particularly when the hard surfaces are exposed to higher humidity conditions.

[0011] The present disclosure relates to wiping compositions and / or pre-moistened wipes containing the wiping compositions that reduce streaking and filming after the composition is applied to an adjacent surface. More specifically, the present invention relates to a wiping composition containing quaternary ammonium cations that produces reduced visible residue after use, even when applied to a smooth, glossy surface. SUMMARY OF THE INVENTION

[0013] Generally, the present disclosure relates to a wiping composition having antimicrobial properties. The wiping composition contains a quaternary ammonium cation and a residue-reducing surfactant. The residue-reducing surfactant is present in an amount sufficient to reduce streaking and / or filming. In one embodiment, the residue-reducing surfactant comprises an amphoteric surfactant or a zwitterionic surfactant. In a particular embodiment, the residue-reducing surfactant comprises a betaine surfactant. In one embodiment, the antimicrobial agent comprising a quaternary ammonium cation is present in the wiping composition in a weight ratio of about 1:0.2 to about 1:10, such as about 1:0.5 to about 1:5 relative to the residue-reducing surfactant.

[0014] The quaternary ammonium cation may generally comprise any suitable antimicrobial agent. For example, the quaternary ammonium cation may comprise a halide salt of a quaternary ammonium cation. Specific examples of quaternary ammonium cations include alkyl dimethyl benzyl ammonium chloride, dialkyl dimethyl ammonium chloride, alkyl dimethyl ethyl benzyl ammonium chloride, or a mixture thereof.

[0015] In an alternative embodiment, the quaternary ammonium cation may comprise a carbonate / bicarbonate salt of a quaternary ammonium cation.

[0016] In another aspect, the betaine surfactant may comprise any suitable betaine surfactant capable of reducing streaking and / or filming. In one embodiment, the betaine surfactant may have the formula:

[0017]

[0018] Where R 2 Alkyl groups having up to 20 carbon atoms are included.

[0019] The betaine surfactant may comprise cocamidopropyl betaine. Other betaine surfactants that may be used in the composition include decyl betaine, myristyl betaine, palmityl betaine, lauryl betaine, cetyl betaine, octadecyl betaine, coconut dimethyl carboxymethyl betaine ("coco betaine"), cocamidoethyl betaine, cocamidopropyl betaine, lauramidopropyl betaine, myristyl amidopropyl betaine, lauryl dimethyl carboxymethyl betaine, lauryl dimethyl alpha-carboxy-ethyl betaine, cetyl dimethyl carboxymethyl betaine, lauryl bis-(2-hydroxy-ethyl) carboxymethyl betaine, octadecyl bis-(2-hydroxy-propyl) carboxymethyl betaine, oleyl dimethyl gamma-carboxypropyl betaine, lauryl bis-(2-hydroxypropyl) alpha-carboxyethyl betaine, cocamidopropyl dimethyl betaine, or mixtures thereof.

[0020] In one embodiment, the residual reducing surfactant may comprise a polymeric betaine. The polymeric betaine may have the formula:

[0021]

[0022] In addition to the antimicrobial agent and the surfactant that reduces residue, the wiping composition generally contains at least one solvent, such as water. For example, the water may be present in an amount greater than about 90% by weight, such as greater than about 95% by weight. In one embodiment, the only solvent present in the composition comprises water. Alternatively, water may be present in combination with an organic solvent (such as an alcohol or glycol ether).

[0023] The composition may also contain various other components, such as chelating agents, pH builders, organic solvents, etc. In a specific embodiment, the composition contains a chelating agent and a pH builder. The pH builder comprises a silicate. The composition may further contain at least one nonionic surfactant. The nonionic surfactant may comprise an ethoxylated alcohol. The antimicrobial agent may be present in an amount less than about 2% by weight, such as less than about 1% by weight, in the aqueous solution. The surfactant that reduces the residue may also be present in an amount less than about 2% by weight, such as less than about 1% by weight in the aqueous solution.

[0024] In one embodiment, the present disclosure relates to a pre-moistened wiping product containing the above-mentioned wiping composition. The pre-moistened wiping product may include a liquid-absorbent substrate impregnated with the wiping composition. The liquid-absorbent substrate may include a meltblown web, a coform web, a spunbond web, an airlaid web, and an airlaced web, a hydroentangled web, a bonded carded web, or a laminate thereof.

[0025] Other features and aspects of the disclosure are discussed in more detail below. DETAILED DESCRIPTION OF THE INVENTION

[0027] Those of ordinary skill in the art will appreciate that this discussion is merely a description of exemplary embodiments and is not intended to limit the broader aspects of the present disclosure.

[0028] Low-residue antimicrobial compositions are generally disclosed. The antimicrobial compositions can be used to impregnate cleaning wipes. The compositions contain a quaternary ammonium antimicrobial agent and a residue-reducing surfactant. The inventors have discovered new surfactant compounds that can significantly reduce visible residues (films and streaks) on hard surfaces when used with quaternary ammonium-based disinfectant formulations. Use of the residue-reducing surfactant compounds according to the present invention can outperform known low-residue surfactant compounds, such as alkyl polyglucosides (APGs) and amine oxides.

[0029] As described above, the composition comprises a quaternary ammonium antimicrobial compound. Preferably, the quaternary ammonium compound is a quaternary ammonium salt, such as a halide salt or a carbonate / bicarbonate. The composition also comprises a surfactant that reduces residues. For example, in one embodiment, the surfactant that reduces residues comprises an amphoteric surfactant. In one embodiment, the surfactant that reduces residues may comprise a betaine surfactant. The betaine surfactant may be a betaine or sulfobetaine surfactant. In one embodiment, the surfactant that reduces residues may comprise a polymerized betaine surfactant and / or a betaine ester surfactant. The composition may further contain other ingredients, including solvents, surfactants, pH builders, chelating agents, builder salts, dyes, fragrances, etc., which are commonly used in the art for cleaning and disinfecting solutions.

[0030] Quaternary ammonium compounds, also known as "quats", generally contain at least one quaternary ammonium cation with a suitable anion. Quaternary ammonium generally has the general formula (1)

[0031]

[0032] The groups R1, R2, R3 and R4 can vary within wide ranges, and examples of quaternary ammonium compounds having antimicrobial properties are well known to those skilled in the art. Typically, two of R1, R2, R3 and R4 are lower alkyl groups, meaning having 1 to 4 carbon atoms, such as methyl, ethyl, propyl or butyl. Alternatively, two of R1, R2, R3 and R4 are long chain alkyl groups having 6 to 24 carbon atoms or benzyl groups. - It is a monovalent anion or a polyvalent anion of an equivalent of an inorganic or organic acid. -Anions are in principle all inorganic or organic anions, in particular halides, for example chlorides or bromides, carbonates, bicarbonates, carboxylates, sulfonates, phosphates or mixtures thereof. The carboxylates can be derived from lower carboxylic acids or fatty acids.

[0033] In the following text, alkyl means in each case a straight-chain or branched alkyl radical having the indicated number of carbon atoms, but preferably straight-chain alkyl radicals, particularly preferably those having an even number of carbon atoms. In particular, this is also taken to mean homologous mixtures derived from natural raw materials, for example "cocoalkyl".

[0034] In one embodiment, the quaternary ammonium compound may have the following R groups: R1 is benzyl or C 6-18 Alkyl, R2 is C 1-18 Alkyl or —[(CH2)2—O] n R5, wherein n=1-20, R3 and R4 are independently C 1-4 alkyl, R5 is hydrogen or unsubstituted or substituted phenyl, A - It is a monovalent anion or a polyvalent anion of an equivalent inorganic or organic acid.

[0035] Substituted phenyl refers in particular to phenyl groups which are replaced by one or more C 1-18 A phenyl group substituted with an alkyl group and / or a halogen atom.

[0036] Suitable quaternary ammonium compounds include, but are not limited to, alkyl dimethyl benzyl ammonium chloride, dialkyl methyl benzyl ammonium chloride, dialkyl dimethyl ammonium chloride, alkyl dimethyl ethyl benzyl quaternary ammonium chloride, benzethonium chloride, and any combination of any of the foregoing.

[0037] In one embodiment, the quaternary ammonium compound may comprise a dialkylammonium compound, such as a dimethyldialkylammonium compound. In one embodiment, the dimethyldialkylammonium compound may have from about 8 to about 12 carbon atoms, such as from about 8 to about 10 carbon atoms in each alkyl group.

[0038] Examples of dimethyldialkylammonium compounds include dimethyldioctylammonium compounds, such as dimethyldioctylammonium chloride, dimethyldidecylammonium compounds, such as dimethyldidecylammonium chloride, and the like. Mixtures of dimethyldialkylammonium compounds may also be used, as may other anions, such as those described above. Commercially available dimethyldialkylammonium compounds include, for example, those sold by Lonza Inc under the trade name or Marketed and sold compositions.

[0039] Examples of such commercially available dimethyldialkylammonium compounds include dioctyldimethylammonium chloride (available from Lonza, Inc. LF and LF-80), octyldecyl dimethyl ammonium chloride (available as a mixture of octyldecyl dimethyl ammonium chloride, dioctyl dimethyl ammonium chloride, and didecyl dimethyl ammonium chloride from Lonza, Inc. 2050 and 2080), didecyldimethylammonium chloride (available from Lonza, Inc. 2250 and 2280), decyl isononyl dimethyl ammonium chloride (available from Lonza, Inc. 21), diisodecyl dimethyl ammonium chloride (BTC 99 available from Stepan Co. of Northfield, Ill), and any combination of any of the foregoing.

[0040] In an alternative embodiment, the quaternary ammonium compound may comprise a benzyl ammonium compound, such as an alkyl dimethyl benzyl ammonium compound. Typically, the alkyl group may contain from about 10 to about 18 carbon atoms, such as from about 12 to about 16 carbon atoms.

[0041] Examples of alkyl dimethyl benzyl ammonium compounds that can be used as the first biocide include C12 alkyl dimethyl benzyl ammonium chloride, C14 alkyl dimethyl benzyl ammonium chloride, and C16 alkyl dimethyl benzyl ammonium chloride. In addition, mixtures of these alkyl dimethyl benzyl ammonium compounds can be used. Commercially available alkyl dimethyl benzyl ammonium compounds include, for example, those sold by Lonza Inc. under the trade name These commercially available alkyl dimethyl benzyl ammonium compounds are C 12 , C 14 and C 16 alkyl dimethyl benzyl ammonium chloride. Generally, when the blend contains more than C 16 The higher concentration of alkyl components in C 12 Alkyl and C 14 When the alkyl component is an alkyl dimethyl benzyl ammonium compound, it is preferred. It should be noted that other anions may also be used, including those mentioned above.

[0042] Non-limiting examples of alkyl dimethyl benzyl ammonium chloride include alkyl (C 14 50%; C 12 40%, C 16 10%) dimethylbenzyl ammonium chloride (available from Lonza Inc. MB-50 and MB-80), alkyl (C 14 60%; C 16 30%; C 12 5%; C 18 5%) dimethylbenzylammonium chloride (available from Lonza, Inc. 4280Z)、(C 12 -C18 alkyl)dimethylbenzyl ammonium chloride, and any combination of any of the foregoing.

[0043] In yet another embodiment, the antimicrobial agent may comprise a quaternary ammonium carbonate. The quaternary ammonium carbonate may be represented by the following formula:

[0044]

[0045] wherein R1 is a C1-C20 alkyl group or an aryl-substituted alkyl group, and R2 is a C8-C20 alkyl group, preferably wherein R1 is the same as R2, and R1 is a C8-C 12 Alkyl, and compositions containing the corresponding quaternary ammonium bicarbonate

[0046]

[0047] wherein R1 is the same or different C1-C20 alkyl or aryl-substituted alkyl as above, and R2 is the same or different C8-C20 alkyl as above, but preferably wherein R1 is the same as R2, and R1 is C8-C 12 alkyl.

[0048] In one embodiment, the quaternary ammonium compound included in the composition comprises di-C8-C 12 Alkyl ammonium carbonates / bicarbonates. For example, in one particular embodiment, the antimicrobial agent includes didecyl dimethyl ammonium carbonate and didecyl dimethyl ammonium bicarbonate.

[0049] However, in other embodiments, the carbonate / bicarbonate of the quaternary ammonium cation can be selected from dioctyldimethylammonium carbonate, decyloctyldimethylammonium carbonate, benzalkonium carbonate, benzylsodium carbonate, stearammonium carbonate, hexadecyltrimethylammonium carbonate, behenyltrimethylammonium carbonate, dioctyldimethylammonium bicarbonate, decyloctyldimethylammonium bicarbonate, benzalkonium bicarbonate, benzylsodium bicarbonate, stearammonium bicarbonate, hexadecyltrimethylammonium bicarbonate, behenyltrimethylammonium bicarbonate and mixtures of one or more such carbonates.

[0050] It should be understood that the quaternary ammonium compound may comprise more than one specific quaternary ammonium material, and may comprise combinations of any of the foregoing quaternary ammonium compounds.

[0051] The quaternary ammonium compound may be present in the composition in an amount of about 0.1% to about 25% by weight, based on the total weight of the antimicrobial composition. Preferably, the quaternary ammonium compound is present in the composition in an amount of about 0.25% to about 20% by weight. The concentration of the quaternary ammonium compound in the ready-to-use (RTU) form of the composition that can be applied to the wipe substrate is preferably about 0.1% to about 3%, such as about 0.2% to about 2% (based on the weight of the RTU composition). In a concentrated composition, the quaternary ammonium compound may be present in the composition in an amount of about 5% to about 40% by weight, such as about 10% to about 20% by weight, based on the weight of the concentrated composition.

[0052] In addition to the antimicrobial agent, the wipe composition of the present disclosure also contains a residue-reducing surfactant. In one embodiment, the residue-reducing surfactant may include an amphoteric surfactant or a zwitterionic surfactant. In a particular embodiment, the residue-reducing surfactant includes a betaine surfactant. The betaine surfactant may include betaines and sulfobetaines of formula (2):

[0053]

[0054] Where R is an alkyl group or (3)

[0055]

[0056] Z - COO - or R1 is alkyl or hydrogenalkyl, R2 is alkyl of up to about 20 carbon atoms, preferably from about 6 to about 16 carbon atoms, and R3 is alkyl.

[0057] In one embodiment, the betaine surfactant may have the formula:

[0058]

[0059] Where R 2 Alkyl groups having up to about 20 carbon atoms, such as from about 6 carbon atoms to about 16 carbon atoms are included.

[0060] Examples of betaines useful herein include decyl betaine or 2-(N-decyl-N,N-dimethylammonium) acetate, myristyl betaine, palmityl betaine, lauryl betaine, cetyl betaine, octadecyl betaine, cocodimethyl carboxymethyl betaine ("coco betaine"), cocamidoethyl betaine, cocamidopropyl betaine, lauramidopropyl betaine, myristylamidopropyl betaine, lauryl dimethyl carboxymethyl betaine, lauryl dimethyl α-carboxy-ethyl betaine, cetyl dimethyl carboxymethyl betaine, lauryl bis-(2-hydroxy-ethyl) carboxymethyl betaine, octadecyl bis-(2-hydroxy-propyl) carboxymethyl betaine, oleyl dimethyl γ-carboxypropyl betaine, lauryl bis-(2-hydroxypropyl) α-carboxyethyl betaine, cocamidopropyl dimethyl betaine, mixtures thereof, and the like.

[0061] Specific examples of betaine surfactants include coco betaine sold under the name EMCOLCC 37-18 by Witco Chemical Corporation and cocamidopropyl betaine sold under the name LONZAINE CO by Lonza Inc.

[0062] Examples of sulfobetaine surfactants include 3-(N,N-dimethyl-N-acylamidopropylammonio)-2-hydroxy-propane-1-sulfonate, wherein the acyl group is derived from tallow fatty alcohol or coconut fatty alcohol, preferably coconut fatty alcohol. Those skilled in the art will recognize that in the normal preparation of these tallow or coconut fatty alcohol derivatives, a mixture of sulfobetaines with acyl groups of different carbon chain lengths will be produced. These fatty alcohols in most cases contain carbon chain lengths that will provide acyl groups with the desired number of carbon atoms (i.e., from about 8 to about 18 carbon atoms). Therefore, these mixtures obtained from tallow or coconut fatty alcohol can be used to provide sulfobetaine surfactants for the agents of the present disclosure. Such materials used in the compositions of the present disclosure are N-cocoamido-propyl-N,N-dimethyl-N-2-hydroxypropyl sulfobetaine. An example of this is LONZAINE CS, which is commercially available from Lonza, Inc.

[0063] Sulfobetaine suitable for use in the antimicrobial composition can be represented by cocodimethyl sulfopropyl betaine, octadecyldimethyl sulfopropyl betaine, lauryldimethyl sulfoethyl betaine, lauryl bis-(2-hydroxy-ethyl) sulfopropyl betaine, and the like; amidobetaines and amidosulfobetaines (wherein the RCONH(CH2)x group is attached to the nitrogen atom of the betaine) are also useful.

[0064] Betaine can also include betaine polymers, such as amphiphilic betaine polymers. For example, polymeric betaine can include a complex of a dialkyldialkoxylated quaternary ammonium salt and boric acid. Other similar compounds can also include quaternary ammonium salts formed by protonation of monoalkylamines, dialkylamines, trialkylamines, and mono-dialkoxylated amines. In a particular embodiment, polymeric betaine can include didecylbis(hydroxyethyl)ammonium borate. Polymeric betaine can have the following formula:

[0065]

[0066] The wipe composition of the present invention may contain a single betaine or a combination of betaines as described above. In one embodiment, for example, betaines according to Formulae 2 and 3 above may be combined with a polymeric betaine.

[0067] Betaine can be present in the antimicrobial composition in an amount of about 0.05% to about 30% by weight, based on the weight of the composition. In the RTU composition, betaine is preferably present in an amount of about 0.2% to about 5%, such as about 0.3% to about 3%, especially about 0.5% to about 1.0%, based on the weight of the RTU composition. In one embodiment, the surfactant that reduces the residual is present in the composition in an amount of less than about 2% by weight, such as less than about 1.5% by weight. In the concentrate composition, betaine is preferably present in an amount of about 10% to about 30%, such as about 15% to about 25%, based on the weight of the concentrate composition.

[0068] Betaine can be present in an amount greater than the amount of quaternary ammonium compound present. The antimicrobial agent can be present in the composition relative to the residual reducing surfactant such that the weight ratio between the antimicrobial agent and the residual reducing surfactant is from about 1:0.2 to about 1:10, such as from about 1:0.5 to about 1:5, such as from about 1:0.9 to about 1:3.

[0069] It has been found that the presence of betaine surfactants does not affect the efficacy of quaternary ammonium based antimicrobial compositions.

[0070] In addition to antimicrobial agents and surfactants to reduce residues, the wiping compositions of the present disclosure may include various other components and ingredients. For example, the composition may contain pH builders, chelating agents, other surfactants, solvents other than water such as organic solvents, builder salts, fragrances, preservatives, etc. Each of the above additives may exist alone or in combination with other additives.

[0071] For example, the antimicrobial composition may also contain a pH builder. Suitable pH builders include sodium hydroxide, potassium hydroxide, potassium carbonate, sodium citrate, sodium carbonate, silicates such as sodium metasilicate and other similar compounds. Preferred is sodium metasilicate pentahydrate.

[0072] Alkanolamines have also been found to be effective in raising the pH of the composition while adversely affecting the function of the quaternary ammonium compound. Essentially any alkanolamine may be used, including mono-, di- and trialkanolamines. One particularly useful alkanolamine is monoethanolamine.

[0073] The pH builder is preferably present in the composition in an amount of about 0.01% to about 2%, such as about 0.02% to about 1%, based on the weight of the composition. In one embodiment, the pH of the wipe composition is greater than about 8, such as greater than about 9, such as greater than about 10. The pH is typically less than about 14, such as less than about 12. In a particular embodiment, for example, the wipe composition may have a pH of about 10 to about 12. The pH builder may be added in an amount sufficient to provide the composition with a pH within the above range.

[0074] The composition may also contain a chelating agent. Suitable chelating agents include, but are not limited to, ethylenediaminetetraacetic acid (EDTA) and its salts (e.g., tetrasodium edetate, which can be used as Versene Chelating agents include chelating agents (eg, chelating agents obtained from Dow Europe SA of Horgen, Switzerland), nitrilotriacetic acid (NTA), and diammonium ethylenediaminetetraacetate. The ability of NTA and EDTA to remove metal ions benefits the solution by preventing hardness (calcium) precipitation. Chelating agents can also be used to bind other metal ions that may adversely affect the effectiveness of the disinfecting components in the composition.

[0075] The chelating agent is preferably present in the composition in an amount of from about 0.01% to about 10%, such as from about 0.04% to about 6%, by weight of the composition.

[0076] In addition to the surfactants that reduce residuals, nonionic surfactants may also be included in the composition. In one embodiment, nonionic surfactants can be broadly defined as compounds produced by the condensation of hydrophilic alkylene oxide groups with aliphatic or alkyl aromatic hydrophobic compounds. Examples of preferred classes of nonionic surfactants are:

[0077] Long chain tertiary amine oxides, corresponding to the following general formula:

[0078] R1R2R3N→O

[0079] wherein R1 contains an alkyl, alkenyl or monohydroxyalkyl group having from about 8 to about 18 carbon atoms, up to about 10 ethylene oxide moieties, and up to 1 glyceryl moiety, and R2 and R3 contain from 1 to about 3 carbon atoms and up to about 1 hydroxyl group, for example, methyl, ethyl, propyl, hydroxyethyl or hydroxypropyl. Examples of amine oxides suitable for use in the present invention include: dimethyl dodecylamine oxide, oleyl di(2-hydroxyethyl)amine oxide, dimethyl octylamine oxide, dimethyl decylamine oxide, dimethyl tetradecylamine oxide, di(2-hydroxyethyl)tetradecylamine oxide, 3-dodecyloxy-2-hydroxypropyl di(3-hydroxypropyl)amine oxide, and dimethyl hexadecylamine oxide.

[0080] Polyethylene oxide condensates of alkylphenols, for example, the condensation products of alkylphenols having an alkyl group containing from about 6 to 12 carbon atoms in either a straight chain or branched configuration with ethylene oxide present in an amount equal to from 6 to 60 moles of ethylene oxide per mole of alkylphenol. The alkyl substituents in these compounds may be derived from polymerized propylene, diisobutylene, octane or nonane.

[0081] Those derived from the condensation of ethylene oxide with the product resulting from the reaction of propylene oxide and ethylenediamine, which can vary in composition depending on the desired balance between hydrophobic and hydrophilic elements. For example, compounds containing from about 40% to about 80% by weight of polyoxyethylene and having a molecular weight of from about 5,000 to about 11,000, derived from the reaction of ethylene oxide groups with a hydrophobic base consisting of the reaction product of ethylenediamine and an excess of propylene oxide, the base having a molecular weight of from about 2,500 to 3,000, are satisfactory.

[0082] The condensation products of straight chain or branched aliphatic alcohols having from 8 to 18 carbon atoms with ethylene oxide, for example coconut alcohol ethylene oxide condensates having from 10 to 30 moles of ethylene oxide per mole of coconut alcohol, the coconut alcohol moiety having from 10 to 14 carbon atoms.

[0083] Specific surfactants that can be used in the composition are nonylphenol ethoxylates (6-12 moles), primary alcohol ethoxylates (3-12 moles), and secondary alcohol ethoxylates (3-12 moles).

[0084] The nonionic surfactants described herein are selected to be adsorbed or otherwise bonded to the fibers of the dry substrate of the cleaning wipes to prevent the active disinfectant from being adsorbed by the fibers of the dry substrate. Without being bound by theory, it is believed that the nonionic surfactants described herein change the relative balance at the surface of the cleaning wipes by modifying the surface to reduce its hydrophobicity and modifying the wiping composition to reduce its hydrophilicity. For example, in the case of quaternary ammonium solutions (such as dialkyl or alkyl benzyl quaternary ammonium solutions), the final result is that the hydrophobic wipe surface reduces the attractive force of the hydrophobic hydrocarbon tail of the quaternary ammonium solution. The hydrophobic group has an affinity for the fiber surface of the substrate. Unlike anionic surfactants, the nonionic nature of the surfactant does not attract solutions based on cationic quaternary ammonium or disinfectant solutions based on chlorine, and prevents the active disinfectant from being bonded to the substrate fibers.

[0085] An exemplary commercially available nonionic surfactant of the composition is a C11-C15 secondary alkanol condensed with 7, 9, 12, 20 or 40 moles of ethylene oxide (alkoxy polyethyleneoxyethanol), available from Dow Chemical under the trade name 15-S-7, 15-S-9, 15-S-12, 15-S-20 and 15-S-40. Additional exemplary nonionic surfactants of the same type are manufactured by Dow Chemical under the trade names TMN-6 and TMN-10 are sold and are believed to comprise the reaction product of trimethyl-nonanol and ethylene oxide. Other exemplary nonionic surfactants are available under the trade names HL 560 is commercially available from BASF. Other nonionic surfactants include block copolymers of polyoxyethylene and polyoxypropylene, which are available under the trade name Commercially available, it is sold by BASF. Any single member of the foregoing nonionic surfactant composition may be used in the wipe composition, or mixtures of these exemplary nonionic surfactant materials may be used.

[0086] The amount of nonionic surfactant in the composition is preferably from about 0.01% to about 5% based on the weight of the composition. Typically, the composition contains from about 0.05% to about 3% nonionic surfactant. Alternatively, the composition may not contain a nonionic surfactant. In addition, the composition may not contain alkyl polyglycoside (APG) and amine oxide surfactants. In an alternative embodiment, the wiping composition may contain a mixture of a surfactant and an antimicrobial agent to reduce residues and an alkyl polyglycoside, an amine oxide, or both.

[0087] The antimicrobial compositions of the present disclosure may be provided as concentrates, which are diluted to a use level prior to use. Alternatively, the disinfecting compositions may be provided as ready-to-use (RTU) compositions. In either case, the compositions contain a solvent.

[0088] Typically, the solvent is a polar solvent, such as water, or an organic solvent, such as an alcohol and / or a glycol ether. In one embodiment, the only solvent present in the composition is water. Alternatively, the composition may contain water and an organic solvent.

[0089] Examples of organic solvents include ethanol, propanol, benzyl alcohol, phenoxyethanol, isopropanol, diethylene glycol propyl ether, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, diethylene glycol monomethyl ether, diethylene glycol monobutyl ether, diethylene glycol monoethyl ether, diethylene glycol n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, propylene glycol n-butyl ether, propylene glycol n-propyl ether, tripropylene glycol methyl ether, dipropylene glycol methyl ether, dipropylene glycol butyl ether, dipropylene glycol n-propyl ether, ethylene glycol hexyl ether, and combinations thereof.

[0090] The amount of water present in the composition can generally be greater than about 60% by weight, such as greater than about 70% by weight, such as greater than about 80% by weight, such as greater than about 90% by weight. For example, the amount of water present in the composition can be greater than about 92% by weight, such as greater than about 94% by weight, such as greater than about 96% by weight, such as greater than about 98% by weight. The amount of water present is generally less than about 99.5% by weight, such as less than about 99% by weight, such as less than about 95% by weight.

[0091] In one embodiment, the solvent comprises water and an additional organic solvent, such as isopropanol, propylene glycol n-propyl ether or propylene glycol n-butyl ether. When a solvent is present in addition to water, it is preferably present in an amount of about 0.1% to 20% based on the weight of the composition. At RTU concentrations, the organic solvent other than water is preferably present in an amount of about 0.25% to about 2%, such as about 0.3% to about 0.5%, based on the weight of the composition. In concentrated compositions, the additional solvent is preferably present in an amount of about 1% to about 15%, such as about 8% to about 12%, based on the weight of the composition.

[0092] The wiping composition of the present disclosure may optionally also contain corrosion inhibitors, complexing agents, auxiliary agents, preservatives, aromatics, colorants, etc. Exemplary corrosion inhibitors include, for example, organic phosphorous compounds and blends of organic phosphorous compounds with polymer components. Exemplary auxiliary agents include, for example, polyethylene glycol or other similar compounds. Examples of builder salts that can be used include sodium metasilicate, sodium tripolyphosphate, sodium nitrilotriacetate, sodium carbonate, sodium silicate, citrate and zeolite. Colorants and aromatics can be added as long as they do not interfere with the function of the composition and can be used to identify the composition. Typically, the optional other ingredients account for less than about 20% of the weight of the composition. For example, the presence of each of the above-mentioned identified ingredients or components in the composition can generally be about 0.01% by weight to about 5% by weight. For example, each of the above-mentioned components can be present in the composition in an amount of about 0.1% to about 2% by weight, such as about 0.3% to about 1% by weight. Optional additives are added in an amount conventionally used for disinfection and disinfection compositions.

[0093] Advantageously, it has been found that the addition of fragrance does not alter the streaking and film-forming properties of the composition.

[0094] A particularly useful application method is to impregnate the wiping composition into the wiping substrate. In this embodiment, the wipe is a single-use wipe impregnated with the wiping composition and stored in a container that distributes the wipe to the user. The container with these wipes can include a single wipe or several wipes. Suitable containers include a pouch containing a single wipe, such as a wet towel torn open by a user; or it can be a pouch with a resealable opening, which contains several wipes in a stacked manner, a winding manner, or other suitable forms that will allow a single wipe to be removed from the opening each time. The pouch is usually made of fluid-impermeable materials, such as films, coated papers or foils or other similar fluid-impermeable materials. Another way to distribute the wipe of the present disclosure is to place the wipe in a fluid-impermeable container with an opening so that the wipe in the container can be accessed. The container can be a molded plastic container with a fluid-impermeable lid. In general, the lid will have an opening so that the wipe in the container can be accessed. The wipe in the container can be staggered stacking, so that when removing a wipe from the container, the next wipe is positioned in the opening of the container to prepare for the user to remove the next wipe. Alternatively, the wipe can be a continuous material, which is perforated between the individual wipes of the continuous material. The continuous wiping material with perforation can be in folded form or can be in a winding form. Usually, in the winding form, the wiping material is transported from the center of the winding material. As with staggered stacking, when removing a wipe from the container, the next wipe is positioned in the opening so that the next wipe is removed when needed.

[0095] Disposable wipes offer advantages over other application vehicles such as reusable sponges, rags, etc. Unlike reusable sponges, rags, etc., impregnated wipes are used once and disposed of. Reusing sponges or rags is problematic because the sponge or rag may carry microorganisms that are not easily killed by the disinfecting composition.

[0096] The wiping composition can be impregnated in the wiping material, so that the wiping material is pre-moistened and the wiping composition is squeezed or released on the surface when the wiping material passes through the surface to be treated. Usually, the wiping composition is impregnated in the wiping material, so that the wiping material will be released on the surface by the wiping action. Usually, the usage amount of the wiping composition is about 2 weight parts to 6 weight parts / 1 weight part wiping material substrate, more preferably about 3 to about 5 weight parts / 1 weight part wiping material substrate. In these scopes, it is possible to achieve the complete soaking of these substrates. It should be noted that, depending on the concrete wiping substrate, the amount of the wiping solution can increase or decrease in order to achieve the complete soaking of the wiping substrate.

[0097] Suitable wiping substrates include weaving and nonwoven materials. Any nonwoven web material can be used basically. Exemplary nonwoven materials may include but are not limited to meltblown webs, combined webs, spunbond webs, air-laid webs and hydraulically entangled air-laid webs, hydraulically entangled nonwoven webs, bonded carded webs and laminates thereof. Optionally, nonwoven materials may also be laminated with film materials. The fiber used to prepare the wipe substrate may be cellulose fiber, thermoplastic fiber and a mixture thereof. These fibers may also be continuous fibers, discontinuous fibers, staple fibers and a mixture thereof. The basis weight of the nonwoven web may vary from about 12 grams per square meter to 200 grams per square meter or more.

[0098] In one embodiment, the wipe is impregnated with a liquid component containing both active ingredients and inert ingredients within an allowable tolerance level, and the wipe composition squeezed from the wipe contains an active ingredient within an allowable tolerance level. Once applied to the surface, the antimicrobial wipe composition is allowed to remain on the surface for a period of time. The antimicrobial composition can be applied to the surface and allowed to dry, or can alternatively be dried by wiping the surface with a dry wipe or wiping device, which is preferably unused. As mentioned above, it was unexpectedly found that when applied using the wipe, particularly on a glossy surface, the wiping composition produces fewer streaks and film formation than previously known compositions.

[0099] The following examples are intended to provide a more complete understanding of the present invention. However, these examples are not intended to limit the present invention. Example

[0100] Quaternary ammonium based disinfecting samples formulated according to the present invention were tested for streaking / filming performance and antimicrobial efficacy.

[0101] The formulation details of the disinfecting samples are provided in Tables 1, 2, 3 and 4. To test streaking / filming performance, the samples were loaded onto the wipe substrate at a 4.0 loading ratio. The wipe substrate was then wiped on a black glass plate and allowed to dry. The black glass plate was then visually inspected for film and streaking and graded from low to medium to high.

[0102] Table 1 below provides the streaking / filming performance of samples containing various surfactants. As shown in Table 1, samples containing betaine surfactants exhibited lower streaking and filming than samples containing other surfactants.

[0103] Table 1 Streaking / Filming Performance of Quaternary Ammonium-Based Disinfecting Samples Containing Surfactants Alkyl Polyglucoside, Amine Oxide and Betaine

[0104]

[0105] Table 2 provides the streaking / filming performance of the quaternary ammonium based disinfectant samples containing fragrances. As shown in Table 2, samples 9-12 containing betaine and fragrances have lower streaking and filming than sample 9 containing alkyl polyglucoside and fragrance.

[0106] Table 2 Streaking / Filming Performance of Quaternary Ammonium-Based Disinfectant Samples Containing Fragrance and Surfactants Alkyl Polyglucoside and Betaine

[0107]

[0108] As shown in Table 3, the quaternary ammonium-based disinfecting samples containing lower concentrations of betaine surfactants caused less streaking and filming than samples containing lower concentrations of other surfactants.

[0109] Table 3 Streaking / Filming Performance of Quaternary Ammonium-Based Disinfectant Samples Containing Lower Concentrations of Surfactants Alkyl Polyglucoside and Betaine

[0110]

[0111] Table 4 illustrates the effect of solvent on streaking and filming of quaternary ammonium based disinfecting samples. As shown in Table 4, samples 18, 19 and 20 containing isopropyl alcohol, propylene glycol n-butyl ether and propylene glycol n-propyl ether showed lower streaking and filming performance than samples containing other solvents.

[0112] Table 4 Streaking / Filming Performance of Quaternary Ammonium-Based Disinfection Samples Containing Betaine and Various Solvents

[0113]

[0114] The low residual quaternary ammonium / betaine based disinfectant formulations described in Table 5 were evaluated for antimicrobial efficacy against Staphylococcus aureus (ATCC 6538). Testing was performed according to the protocol described in AOAC Official Method 961.02 Germicidal Spray Products as Disinfectants, modified for use with wipes.

[0115] Cultures of Staphylococcus aureus and sterile glass test carriers are prepared. The microbial concentrations of the three carriers are calculated before the test begins to determine the carrier microbial concentration before the test. The test carrier is placed in a petri dish lined with sterile filter paper. The carrier is then inoculated with Staphylococcus aureus by spreading the culture evenly on the carrier surface and allowing the culture to dry. The dry, contaminated test carrier surface is then sprayed individually with the disinfectant sample. The microbial concentrations of the three test carriers are calculated to determine the carrier microbial concentration after the test. The contaminated test surface is incubated in the disinfectant for the specified contact time and then individually transferred to a sterile test tube or jar containing neutralization / growth medium and incubated for 48 hours. After incubation, the number of test tubes showing growth of the target microorganism is recorded. The preparation is then recorded as "passed" or "failed" based on the number of test surfaces that demonstrate complete disinfection.

[0116] As shown in Table 5 below, all disinfectant formulations containing betaine surfactants passed the antimicrobial efficacy test.

[0117] Table 5 Antimicrobial efficacy test results of quaternary ammonium / betaine-based disinfection samples against Staphylococcus aureus

[0118]

[0119] Further examples of low residual quaternary ammonium / betaine based disinfecting formulations are provided in Table 6 below.

[0120] Table 6 Examples of low streak concentrate formulations

[0121]

[0122] Without departing from the spirit and scope of the present invention, those of ordinary skill in the art may implement these and other modifications and changes to the present invention, the spirit and scope of the present invention being more specifically set forth in the appended claims. In addition, it should be understood that the various aspects of the various embodiments may be interchangeable in whole or in part. In addition, those of ordinary skill in the art will appreciate that the foregoing description is merely exemplary and is not intended to limit the present invention further described in the appended claims.

[0123] This application also includes the following specific implementation schemes:

[0124] 1. A wipe composition for disinfecting surfaces with reduced streaking, the wipe composition comprising an aqueous solution containing an antimicrobial agent and a residue-reducing surfactant, the antimicrobial agent comprising a quaternary ammonium cation, the residue-reducing surfactant comprising an amphoteric surfactant, the antimicrobial agent being present in the wipe composition in a weight ratio relative to the residue-reducing surfactant of from about 1:0.2 to about 1:10, such as from about 1:0.5 to about 1:5.

[0125] 2. A wipe composition as defined in embodiment 1, wherein the amphoteric surfactant comprises a betaine surfactant.

[0126] 3. A wiping composition as defined in embodiment 1 or 2, wherein the quaternary ammonium cation comprises a halide salt of a quaternary ammonium cation.

[0127] 4. The wiping composition as defined in embodiment 1 or 2, wherein the quaternary ammonium cation comprises alkyl dimethyl benzyl ammonium chloride, dialkyl dimethyl ammonium chloride, alkyl dimethyl ethyl benzyl ammonium chloride or a mixture thereof.

[0128] 5. A wipe composition as defined in any one of the preceding embodiments wherein the residue reducing surfactant comprises cocamidopropyl betaine.

[0129] 6. A wiping composition as defined in any one of embodiments 1 to 5, wherein the only solvent contained in the wiping composition is water.

[0130] 7. A wipe composition as defined in any of the preceding embodiments, wherein the composition further comprises a chelating agent and a pH builder, wherein the pH builder comprises a silicate, wherein the wipe composition further comprises at least one nonionic surfactant, wherein the nonionic surfactant comprises an ethoxylated alcohol, and wherein the antimicrobial agent is present in an amount of less than about 2% by weight, such as less than about 1% by weight, in the aqueous solution, and wherein the residual reducing surfactant is present in an amount of less than about 2% by weight, such as less than about 1% by weight, in the aqueous solution, and wherein the wipe composition comprises water in an amount greater than about 90% by weight, such as greater than about 95% by weight.

[0131] 8. A wiping composition as defined in any one of the preceding embodiments, wherein the residue reducing surfactant has the formula:

[0132]

[0133] Where R 2 Alkyl groups having up to 20 carbon atoms are included.

[0134] 9. A wipe composition as defined in any one of embodiments 1 to 7, wherein the residue-reducing surfactant comprises decyl betaine, myristyl betaine, palmityl betaine, lauryl betaine, cetyl betaine, octadecyl betaine, cocodimethyl carboxymethyl betaine ("coco betaine"), cocamidoethyl betaine, cocamidopropyl betaine, lauramidopropyl betaine, myristylamidopropyl betaine, lauryl dimethyl carboxymethyl betaine, lauryl dimethyl alpha-carboxy-ethyl betaine, cetyl dimethyl carboxymethyl betaine, lauryl bis-(2-hydroxy-ethyl) carboxymethyl betaine, octadecyl bis-(2-hydroxy-propyl) carboxymethyl betaine, oleyl dimethyl gamma-carboxypropyl betaine, lauryl bis-(2-hydroxypropyl) alpha-carboxyethyl betaine, cocamidopropyl dimethyl betaine, or a mixture thereof.

[0135] 10. A wipe composition as defined in any one of embodiments 1 to 6, wherein the residue reducing surfactant comprises a polymeric betaine.

[0136] 11. A wiping composition as defined in embodiment 10, wherein the residue reducing surfactant has the formula:

[0137]

[0138] 12. A wipe composition as defined in any one of the preceding embodiments, wherein the antimicrobial agent comprises a di-C8-C12 alkylammonium chloride.

[0139] 13. A wipe composition as defined in any one of the preceding embodiments, wherein the wipe composition comprises a concentrate to be diluted prior to use, the concentrate comprising the quaternary ammonium cation in an amount of about 5% to about 40% by weight.

[0140] 14. A wipe composition as defined in any one of the preceding embodiments, wherein the quaternary ammonium cation comprises a carbonate / bicarbonate salt of a quaternary ammonium cation.

[0141] 15. A pre-moistened wipe product comprising:

[0142] a liquid absorbent substrate; and

[0143] A wipe composition contained within a substrate, the wipe composition comprising an aqueous solution containing an antimicrobial agent comprising a quaternary ammonium cation and a residue reducing surfactant comprising an amphoteric surfactant.

[0144] 16. A pre-moistened wipe product as defined in embodiment 15, wherein the residue reducing surfactant comprises a betaine surfactant.

[0145] 17. A pre-moistened wipe product as defined in embodiment 15, wherein the residue reducing surfactant comprises cocamidopropyl betaine.

[0146] 18. A pre-moistened wipe product as defined in embodiment 15, wherein the residue-reducing surfactant comprises decyl betaine, myristyl betaine, palmityl betaine, lauryl betaine, cetyl betaine, stearyl betaine, cocodimethyl carboxymethyl betaine ("coco betaine"), cocamidoethyl betaine, cocamidopropyl betaine, lauramidopropyl betaine, myristylamidopropyl betaine, lauryl dimethyl carboxymethyl betaine, lauryl dimethyl alpha-carboxy-ethyl betaine, cetyl dimethyl carboxymethyl betaine, lauryl bis-(2-hydroxy-ethyl) carboxymethyl betaine, stearyl bis-(2-hydroxy-propyl) carboxymethyl betaine, oleyl dimethyl gamma-carboxypropyl betaine, lauryl bis-(2-hydroxypropyl) alpha-carboxyethyl betaine, cocamidopropyl dimethyl betaine, or mixtures thereof.

[0147] 19. A pre-moistened wipe product as defined in embodiment 15, wherein the residue reducing surfactant has the formula:

[0148]

[0149] Where R 2 Alkyl groups having up to 20 carbon atoms are included.

[0150] 20. A pre-moistened wipe product as defined in embodiment 15, wherein the residue reducing surfactant comprises a polymeric betaine.

[0151] 21. A pre-moistened wipe product as defined in embodiment 15, wherein the residue reducing surfactant has the formula:

[0152]

[0153] 22. A pre-moistened wipe product as defined in any one of embodiments 15-21, wherein the antimicrobial agent is present in a weight ratio relative to the residue reducing agent of from about 1:0.2 to about 1:10, such as from about 1:0.5 to about 1:5, such as from about 1:0.9 to about 1:3.

[0154] 23. A pre-moistened wipe product as defined in any one of embodiments 15-22, wherein the antimicrobial agent is present in an amount of less than 1% by weight, such as less than about 0.8% by weight, in the aqueous solution, and wherein the residual reducing surfactant is present in an amount of less than about 2% by weight, such as less than about 1.0% by weight, in the aqueous solution, and wherein the wipe composition further comprises at least one nonionic surfactant comprising an ethoxylated alcohol, and wherein the wipe composition further comprises a silicate, such as sodium metasilicate pentahydrate, and wherein the quaternary ammonium cation comprises a di-C8 to C12 alkylammonium chloride.

[0155] 24. A pre-moistened wipe product as defined in any one of embodiments 15-23, wherein the quaternary ammonium cation comprises a halide salt of a quaternary ammonium cation.

[0156] 25. A pre-moistened wipe product as defined in any one of embodiments 15-23, wherein the quaternary ammonium cation comprises alkyl dimethyl benzyl ammonium chloride, dialkyl dimethyl ammonium chloride, alkyl dimethyl ethyl benzyl ammonium chloride, or mixtures thereof.

[0157] 26. A pre-moistened wipe product as defined in any one of embodiments 15-25, wherein the liquid-absorbent substrate comprises a nonwoven web, and wherein the liquid-absorbent substrate comprises a meltblown web, a combined web, a spunbond web, an air-laid web, a hydroentangled air-laid web, a hydroentangled web, a bonded carded web, or a laminate thereof.

Claims

1. A wipe composition for disinfecting surfaces with reduced streaking, the wipe composition comprising an aqueous solution containing an antimicrobial agent, a residual reducing surfactant, and a pH builder, wherein the antimicrobial agent comprises a quaternary ammonium cation, the residual reducing surfactant comprises an amphoteric surfactant, the antimicrobial agent is present in the wipe composition in a weight ratio relative to the residual reducing surfactant of from about 1:0.2 to about 1:10, such as from about 1:0.5 to about 1:5, and wherein the pH of the wipe composition is greater than about 8, wherein the wipe composition for disinfecting surfaces with reduced streaking is a ready-to-use composition or a concentrated composition, and the amphoteric surfactant comprises a betaine surfactant, the betaine is present in an amount of from about 0.2% to about 5% based on the weight of the ready-to-use composition, or the betaine is present in an amount of from about 10% to about 30% based on the weight of the concentrated composition.

2. A wiping composition as defined in claim 1, wherein the quaternary ammonium cation comprises a halide salt of a quaternary ammonium cation.

3. The wiping composition as defined in claim 1, wherein the quaternary ammonium cation comprises alkyl dimethyl benzyl ammonium chloride, dialkyl dimethyl ammonium chloride, alkyl dimethyl ethyl benzyl ammonium chloride, or a mixture thereof.

4. A wipe composition as defined in any one of the preceding claims wherein the residue reducing surfactant comprises cocamidopropyl betaine.

5. A wipe composition as defined in any one of claims 1 to 4, wherein the only solvent contained in the wipe composition is water.

6. A wipe composition as defined in any of the preceding claims, wherein the composition further comprises a chelating agent, the pH builder comprises a silicate or an alkanolamine, the wipe composition further comprises at least one nonionic surfactant, the nonionic surfactant comprises an ethoxylated alcohol, and wherein the antimicrobial agent is present in an amount of less than about 2% by weight, such as less than about 1% by weight in the aqueous solution, and wherein the residual reducing surfactant is present in an amount of less than about 2% by weight, such as less than about 1% by weight in the aqueous solution, and wherein the wipe composition comprises water in an amount greater than about 90% by weight, such as greater than about 95% by weight.

7. A wiping composition as defined in any one of the preceding claims wherein the residue reducing surfactant has the formula: Where R 2 Alkyl groups having up to 20 carbon atoms are included.

8. A wipe composition as defined in any one of claims 1 to 6, wherein the residue reducing surfactant comprises decyl betaine, myristyl betaine, palmityl betaine, lauryl betaine, cetyl betaine, octadecyl betaine, cocodimethyl carboxymethyl betaine ("coco betaine"), cocamidoethyl betaine, cocamidopropyl betaine, lauramidopropyl betaine, myristylamidopropyl betaine, lauryl dimethyl carboxymethyl betaine, lauryl dimethyl alpha-carboxy-ethyl betaine, cetyl dimethyl carboxymethyl betaine, lauryl bis-(2-hydroxy-ethyl) carboxymethyl betaine, octadecyl bis-(2-hydroxy-propyl) carboxymethyl betaine, oleyl dimethyl gamma-carboxypropyl betaine, lauryl bis-(2-hydroxypropyl) alpha-carboxyethyl betaine, cocamidopropyl dimethyl betaine, or mixtures thereof.

9. A wipe composition as defined in any one of claims 1 to 5 wherein the residue reducing surfactant comprises a polymeric betaine.

10. A wiping composition as defined in claim 9, wherein the residue reducing surfactant has the formula:

11. A wipe composition as defined in any one of the preceding claims wherein the antimicrobial agent comprises a di-C8-C12 alkylammonium chloride.

12. A wipe composition as defined in any one of the preceding claims, wherein the wipe composition comprises a concentrate to be diluted prior to use, the concentrate comprising the quaternary ammonium cation in an amount of from about 5% to about 40% by weight.

13. A wipe composition as defined in any one of the preceding claims wherein the quaternary ammonium cation comprises a carbonate / bicarbonate salt of a quaternary ammonium cation.

14. A pre-moistened wipe product comprising: a liquid absorbent substrate; and A wipe composition contained within a substrate, the wipe composition comprising an aqueous solution containing an antimicrobial agent and a residue reducing surfactant, the antimicrobial agent comprising a quaternary ammonium cation, the residue reducing surfactant comprising an amphoteric surfactant, wherein the pH of the wipe composition is greater than about 8, wherein the pre-moistened wipe product is a ready-to-use composition or a concentrate composition, and the amphoteric surfactant comprises a betaine surfactant, the betaine being present in an amount of about 0.2% to about 5% based on the weight of the ready-to-use composition, or the betaine being present in an amount of about 10% to about 30% based on the weight of the concentrate composition.

15. A pre-moistened wipe product as defined in claim 14, wherein the residue reducing surfactant comprises cocamidopropyl betaine.

16. A pre-moistened wipe product as defined in claim 14, wherein the residue reducing surfactant comprises decyl betaine, myristyl betaine, palmityl betaine, lauryl betaine, cetyl betaine, octadecyl betaine, cocodimethyl carboxymethyl betaine ("coco betaine"), cocamidoethyl betaine, cocamidopropyl betaine, lauramidopropyl betaine, myristylamidopropyl betaine, lauryl dimethyl carboxymethyl betaine, lauryl dimethyl alpha-carboxy-ethyl betaine, cetyl dimethyl carboxymethyl betaine, lauryl bis-(2-hydroxy-ethyl) carboxymethyl betaine, octadecyl bis-(2-hydroxy-propyl) carboxymethyl betaine, oleyl dimethyl gamma-carboxypropyl betaine, lauryl bis-(2-hydroxypropyl) alpha-carboxyethyl betaine, cocamidopropyl dimethyl betaine, or mixtures thereof.

17. A pre-moistened wipe product as defined in claim 14, wherein the residue reducing surfactant has the formula: Where R 2 Alkyl groups having up to 20 carbon atoms are included.

18. A pre-moistened wipe product as defined in claim 14, wherein the residue reducing surfactant comprises a polymeric betaine.

19. A pre-moistened wipe product as defined in claim 14, wherein the residue reducing surfactant has the formula:

20. A premoistened wipe product as defined in any one of claims 14 to 19, wherein the antimicrobial agent is present in a weight ratio relative to the residue reducing agent of from about 1:0.2 to about 1:10, such as from about 1:0.5 to about 1:5, such as from about 1:0.9 to about 1:

3.

21. A premoistened wipe product as defined in any one of claims 14-20, wherein the antimicrobial agent is present in an amount of less than 1% by weight, such as less than about 0.8% by weight, in the aqueous solution, and wherein the residual reducing surfactant is present in an amount of less than about 2% by weight, such as less than about 1.0% by weight, in the aqueous solution, and wherein the wipe composition further comprises at least one nonionic surfactant comprising an ethoxylated alcohol, and wherein the wipe composition further comprises a silicate, such as sodium metasilicate pentahydrate, and wherein the quaternary ammonium cation comprises a di-C8 to C12 alkylammonium chloride.

22. A pre-moistened wipe product as defined in any one of claims 14 to 21 wherein the quaternary ammonium cation comprises a halide salt of a quaternary ammonium cation.

23. A pre-moistened wipe product as defined in any one of claims 14 to 21 wherein the quaternary ammonium cation comprises alkyl dimethyl benzyl ammonium chloride, dialkyl dimethyl ammonium chloride, alkyl dimethyl ethyl benzyl ammonium chloride or mixtures thereof.

24. A premoistened wipe product as defined in any one of claims 14 to 23, wherein the liquid absorbent substrate comprises a nonwoven web, and wherein the liquid absorbent substrate comprises a meltblown web, a combined web, a spunbond web, an airlaid web, a hydroentangled airlaid web, a hydroentangled web, a bonded carded web, or a laminate thereof.