Cleaning machine with zero discharge of rinse water for cleaning PCBA (printed circuit board assembly) and semiconductor

Abstract

The invention discloses a cleaning machine with zero discharge of rinsing water for cleaning a PCBA (Printed Circuit Board Assembly) and a semiconductor, relates to the technical field of cleaning equipment of the PCBA and the semiconductor, and aims to solve the problems that serious environmental pollution is easily caused, water resources cannot be effectively saved, and the use cost of an enterprise is high due to the fact that a large amount of water is used because the discharge amount of the rinsing water is huge. The rinsing water is finally discharged to the designed rinsing wastewater recycling device after being subjected to multi-stage overflow, and the rinsing wastewater is subjected to multi-stage reverse osmosis treatment and is repeatedly utilized, so that the discharge of the rinsing water is reduced by more than 95%, the function of zero discharge in a long time is achieved, the discharge of the rinsing water is reduced, serious environmental pollution is not caused, and the environmental pollution is reduced. And water resources can be effectively saved, and the water resource use cost of enterprises is reduced.

Description

Technical Field

[0001] The invention relates to the technical field of PCBA and semiconductor cleaning equipment, and in particular to a cleaning machine with zero discharge of rinsing water for PCBA and semiconductor cleaning. Background Art

[0002] PCBA and semiconductor cleaning machines are professional equipment designed to solve problems such as flux residue in PCBA and semiconductor production.

[0003] Functionally, it can accurately remove all kinds of flux residues and other harmful substances on the surface of PCBA and semiconductor components. By adopting advanced cleaning technologies such as spraying and ultrasound, it ensures comprehensive and efficient cleaning, and avoids residual flux from corroding components and affecting PCBA and semiconductor performance and reliability.

[0004] In terms of structural design, the equipment is compact and reasonably laid out. It has a multi-stage cleaning tank that can perform different processes such as cleaning, rinsing, and drying in sequence to meet different cleaning needs. It is equipped with an automatic control system that can accurately control parameters such as cleaning time, temperature, and pressure to ensure the consistency and stability of the cleaning effect.

[0005] In the application field, it widely serves PCBA, semiconductor manufacturing, electronic packaging and other industries. Whether it is a large-scale chip manufacturing company or a small electronic packaging factory, it can help improve product quality and production efficiency. With its professional and efficient characteristics, PCBA and semiconductor flux residue cleaning machine plays an indispensable role in the PCBA and semiconductor production process, providing strong support for industrial development.

[0006] However, the existing PCBA and semiconductor cleaning machines have many disadvantages. When cleaning PCBA and semiconductors, the amount of rinsing water discharged is large, which not only easily causes serious environmental pollution, but also fails to effectively save water resources. The large amount of water used makes the cost of use of enterprises high. From the perspective of environmental protection and economic cost, it is urgent to optimize and improve the performance of PCBA and semiconductor cleaning machines.

[0007] Therefore, there is a need for a cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductors. Summary of the invention

[0008] In order to solve all or part of the above problems, the purpose of the present invention is to provide a cleaning machine with zero discharge of rinsing water for PCBA and semiconductor cleaning, so as to solve the problem of huge discharge of rinsing water, which not only easily causes serious environmental pollution, but also fails to effectively save water resources. The large amount of water use makes the company's use cost high.

[0009] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductors, characterized in that it comprises a casing and an inlet section assembly and an outlet section assembly arranged at both ends of the casing, a conveying assembly is arranged inside the inlet section assembly, the casing and the outlet section assembly, a cleaning mechanism is arranged inside the casing, a transmission path of the conveying assembly passes through the middle of the cleaning mechanism, a cleaning liquid tank, an ST liquid tank assembly and a rinsing liquid tank assembly are installed at the lower end of the cleaning mechanism, Rinsing liquid is transported in the rinsing liquid tank assembly, and the overflow of the rinsing liquid tank assembly flows into the ST liquid tank assembly to form ST liquid. The ST liquid tank assembly includes ST three liquid tanks and ST four liquid tanks. The rinsing liquid tank assembly includes rinse liquid tank one and rinse liquid tank two. The output ends of ST three liquid tanks, ST four liquid tanks, rinse liquid tank one and rinse liquid tank two are all provided with rinse water zero-discharge circulation mechanisms. The waste liquid in ST three liquid tanks, ST four liquid tanks, rinse liquid tank one and rinse liquid tank two is discharged into the inside of the rinse water zero-discharge circulation mechanism and is filtered.

[0010] Furthermore, the cleaning mechanism includes an inlet plate isolation section 1, a cleaning component 1, a cleaning component 2, a cleaning component 3, a wind cut component 1, an ST component 1, an ST cut component 1, an ST component 2, an ST cut component 2, an ST component 3, an ST cut component 3, an inlet plate isolation section 2, an ST component 4, an ST cut component 4, a rinsing component 1, a rinsing component 2, an wind cut component 2, a rinsing component 3, an wind cut component 3, a drying component 1, a drying component 2 and an outlet plate isolation section, which are arranged in sequence from the inlet plate section component to the outlet plate section component.

[0011] Furthermore, the cleaning liquid tank provides cleaning liquid for the cleaning mechanism, and the cleaning liquid forms a closed loop between the cleaning liquid tank, cleaning component one, cleaning component two, and cleaning component three. An ST liquid tank assembly is arranged below the ST component one, ST component one, ST component two, ST component two, ST component three, ST component three, plate inlet isolation section two, ST component four, and ST component four. The ST liquid tank assembly consists of the ST liquid tank one, ST liquid tank two, ST liquid tank three, and ST liquid tank four. The ST liquid tank one, ST liquid tank two, ST liquid tank three, and ST liquid tank four provide liquid for the ST component one, ST component two, ST component three, and ST component four respectively. The ST liquid tank one receives the liquid flowing down from the ST component one and the ST component one, the ST liquid tank two receives the liquid flowing down from the ST component two and the ST component two, the ST liquid tank three receives the liquid flowing down from the ST component three and the ST component three, and the ST liquid tank four receives the liquid flowing down from the plate inlet isolation section two, the ST component four, and the ST component four.

[0012] Furthermore, a rinsing liquid tank assembly is provided below the rinsing component 1, rinsing component 2, wind shear component 2, rinsing component 3, wind shear component 3, drying component 1, drying component 2 and the plate exit isolation section. The rinsing liquid tank assembly is composed of a rinsing liquid tank 1, a rinsing liquid tank 2 and a rinsing liquid tank 3. The filtered rinsing water is recycled to the ST liquid tank 4, the rinsing liquid tank 1 and the inside of the rinsing component 2;

[0013] The rinse liquid tank 1, the rinse liquid tank 2 and the rinse liquid tank 3 respectively provide corresponding liquids for the rinse component 1, the rinse component 2 and the rinse component 3;

[0014] The rinse liquid tank 1 receives the liquid flowing from the rinse liquid tank 1, the rinse liquid tank 2 receives the liquid flowing from the rinse liquid tank 2 and the wind shear liquid tank 2, the rinse liquid tank 3 receives the liquid flowing from the rinse liquid tank 3, the wind shear liquid tank 3, the drying liquid tank 1, the drying liquid tank 2 and the plate outlet isolation section, and the sewage collected by the ST liquid tank 3, the ST liquid tank 4, the rinse liquid tank 1 and the rinse liquid tank 2 is transported to the pipeline provided at the lower end of the rinse liquid tank assembly and transported to the input end of the rinse water zero discharge circulation mechanism. The rinse wastewater of the rinse liquid tank 3 (433) can be directly discharged when needed;

[0015] The three-liquid rinsing tank is always replenished with an appropriate amount of rinsing water. An overflow port is provided between the three-liquid rinsing tank and the two-liquid rinsing tank, and the excess rinsing water in the three-liquid rinsing tank will overflow into the two-liquid rinsing tank; an overflow port is provided between the two-liquid rinsing tank and the one-liquid rinsing tank, and the excess rinsing water in the two-liquid rinsing tank will overflow and filter into the one-liquid rinsing tank;

[0016] An overflow port is provided between the rinse liquid tank 1 and the ST liquid tank 4. The excess rinse water in the rinse liquid tank 1 will overflow and filter into the ST liquid tank 4. After the rinse water overflows into the ST liquid tank 4, it is called ST liquid.

[0017] The ST liquid tank 4 is provided with an overflow port, and the excess ST liquid in the ST liquid tank 4 will overflow out and then be pumped to the ST liquid tank 3 through the pneumatic diaphragm pump; an overflow port is provided between the ST liquid tank 3 and the ST liquid tank 2, and the excess ST liquid in the ST liquid tank 3 will overflow and filter into the ST liquid tank 2; an overflow port is provided between the ST liquid tank 2 and the ST liquid tank 1, and the excess ST liquid in the ST liquid tank 2 will overflow and filter into the ST liquid tank 1; the ST liquid tank 1 is provided with an overflow port, and the excess ST liquid in the ST liquid tank 1 will overflow out and be collected and transported to the pipeline provided at the lower end of the ST liquid tank assembly (42) and transported to the pipeline provided at the lower end of the output end of the rinsing liquid tank assembly (43).

[0018] Furthermore, a ST three-tank zero-discharge ball valve, an ST four-tank zero-discharge ball valve and a zero-discharge ball valve for a rinse tank are arranged on the pipeline arranged at the lower end of the rinse liquid tank assembly, and a zero-discharge circulation mechanism for rinse water comprises a zero-discharge water pump 1, and the ST three-tank zero-discharge ball valve, the ST four-tank zero-discharge ball valve and the zero-discharge ball valve for a rinse tank 1 are connected in parallel to the inlet of the zero-discharge water pump 1, a zero-discharge cotton filter element filter 1 is arranged at the output end of the zero-discharge water pump 1, a zero-discharge water pump 2 is arranged at the output end of the zero-discharge cotton filter element filter 1, and a DTRO filter membrane 1 is arranged at the output end of the zero-discharge water pump 2;

[0019] The DTRO filter membrane 1 is provided with two outlets, wherein the output end of the first outlet is provided with a DTRO filter membrane 1 regulating valve, a DTRO filter membrane 1 flow meter 1, and a DTRO filter membrane 1 selection switch in sequence;

[0020] When the DTRO filter membrane selection switch is on the first side, the filtered and recovered liquid flows back to the ST four-liquid tank. When the DTRO filter membrane selection switch is on the other side, the filtered and recovered liquid flows back to the rinse one-liquid tank.

[0021] The recovered liquid at the second outlet of DTRO filter membrane 1 passes through the check valve and DTRO filter membrane 1 flowmeter 2, is connected in parallel with the pipeline behind DTRO filter membrane 2 flowmeter 2, and then enters the spray pipe component 1 on the rinse component 2.

[0022] Further, the first rinsing liquid tank and the second rinsing liquid tank are respectively provided with a second zero-discharge ball valve for the first rinsing liquid tank and a second zero-discharge ball valve for the second rinsing liquid tank, the second zero-discharge ball valve for the first rinsing liquid tank and the second zero-discharge ball valve for the second rinsing liquid tank are connected in parallel to the inlet of the third zero-discharge water pump, the output end of the third zero-discharge water pump is provided with a second zero-discharge cotton filter cartridge, the output end of the second zero-discharge cotton filter cartridge is provided with a fourth zero-discharge water pump, and the output end of the fourth zero-discharge water pump is provided with a second DTRO filter membrane;

[0023] The DTRO filter membrane 2 is provided with two outlets, wherein the output end of the first outlet is provided with a DTRO filter membrane 2 regulating valve, a DTRO filter membrane 2 flow meter 1, and a DTRO filter membrane 2 selection switch in sequence;

[0024] When the DTRO filter membrane second selection switch is selected at the first side, the filtered and recovered liquid flows back to the rinsing liquid tank 1; when the DTRO filter membrane second selection switch is selected at the other side, the filtered and recovered liquid flows back to the rinsing liquid tank 2;

[0025] The recovered liquid at the second outlet of DTRO filter membrane 2 passes through the check valve and DTRO filter membrane 2 flowmeter 2, is connected in parallel with the pipeline behind DTRO filter membrane 1 flowmeter 2, and then enters the spray pipe component 1 on the rinsing component 2.

[0026] Furthermore, the DTRO filter membrane 1 has the same structural composition as the DTRO filter membrane 2. The DTRO filter membrane 1 includes an input pipe, a filter barrel, a coarse filter membrane, a fine filter DTRO filter membrane and an output pipe. The input pipe is installed at one end of the upper side of the filter barrel, and the input pipe is connected to the output end of the zero-emission water pump 2. The output pipe is installed at one end of the lower side of the filter barrel. The output end of the output pipe is divided into two routes for transportation. The coarse filter membrane and the fine filter DTRO filter membrane are both installed on the inner side of the filter barrel.

[0027] Furthermore, the DTRO filter membrane 1 also includes an input end control valve plate, an output end control valve plate, an electric telescopic rod and a transmission rod. The input end control valve plate and the output end control valve plate are both installed on the inner side of the filter barrel. The input end control valve plate is located between the coarse filter membrane and the output end of the input pipe, and the output end control valve plate is located between the fine filter DTRO filter membrane and the input end of the output pipe. A tooth 1 is fixedly provided on the transmission rod, and a gear 1 is provided on the input end control valve plate and the output end control valve plate.

[0028] Furthermore, the DTRO filter membrane also includes a protective shell, a piston sleeve, a guide plate, a transmission column, a connecting column, an extrusion spring, an extrusion column and a piston plate. The electric telescopic rod is installed on the inner side of the protective shell, a piston sleeve is installed on one end of the protective shell, a guide plate is installed on one end of the piston sleeve, an output end of the guide plate is connected to the filter barrel, one end of the transmission column is connected to the driving end of the electric telescopic rod, a connecting column is installed on the other end of the transmission column, an extrusion spring is installed on the inner side of one end of the connecting column, an extrusion column is installed on one end of the extrusion spring, a piston plate is installed on one end of the extrusion column, and the piston plate is located on the inner side of the piston sleeve.

[0029] Furthermore, a second tooth is fixedly provided on the transmission rod, and a wastewater centralized discharge pipe is installed on the filter barrel located between the fine filtration DTRO filter membrane and the coarse filtration membrane and between the coarse filtration membrane and the input end control valve plate. The two wastewater centralized discharge pipes both pass through the electric telescopic rod and the transmission column. A wastewater centralized discharge valve plate is installed on the inner side of the wastewater centralized discharge pipe, and a second gear is installed on the wastewater centralized discharge valve plate.

[0030] Compared with the prior art, the present invention has the following beneficial effects:

[0031] The present invention proposes a zero-discharge cleaning machine for rinsing water for cleaning PCBA and semiconductors. PCBA and semiconductors are transported by a transport component and cleaned by a cleaning mechanism. The cleaning liquid is circulated among a cleaning liquid tank, a cleaning component 1, a cleaning component 2, and a cleaning component 3. The rinsing liquid is sequentially transported to a rinsing liquid tank component and an ST liquid tank component. After multi-stage overflow, the rinsing water is finally discharged to a designed rinsing wastewater recycling device. The rinsing wastewater is then subjected to multi-stage reverse osmosis treatment and repeated use, thereby reducing the discharge of rinsing water by more than 95%, thereby achieving the effect of zero discharge of rinsing water for a long time. Not only is the discharge of rinsing water reduced, which will not cause serious environmental pollution, but it can also effectively save water resources and reduce the cost of using water resources for enterprises. BRIEF DESCRIPTION OF THE DRAWINGS

[0032] Figure 1 It is a schematic diagram of the overall three-dimensional structure of the cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductors of the present invention;

[0033] Figure 2 It is a schematic diagram of the overall internal plan structure of the cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductors of the present invention;

[0034] Figure 3 It is a schematic diagram of a zero-discharge circulation mechanism of a cleaning machine for cleaning PCBA and semiconductors with zero-discharge of rinse water according to the present invention;

[0035] Figure 4 A schematic diagram of a three-dimensional structure of a DTRO filter membrane of a cleaning machine with zero discharge of rinsing water for PCBA and semiconductor cleaning according to the present invention;

[0036] Figure 5 It is a partially cutaway three-dimensional structural schematic diagram of a DTRO filter membrane of a cleaning machine with zero discharge of rinsing water for PCBA and semiconductor cleaning according to the present invention;

[0037] Figure 6 It is a three-dimensional structural schematic diagram of the internal structure of the DTRO filter membrane of the cleaning machine with zero discharge of rinsing water for PCBA and semiconductor cleaning of the present invention;

[0038] Figure 7 The invention is based on the invention of a cleaning machine with zero discharge of rinsing water for PCBA and semiconductor cleaning. Figure 6 Schematic diagram of the internal three-dimensional structure of the DTRO filter membrane.

[0039] In the figure:

[0040] 01, housing; 1, board entry section assembly; 2, board entry isolation section 1; 3, cleaning assembly 1; 4, cleaning assembly 2; 5, cleaning assembly 3; 6, wind cutting assembly 1; 7, ST assembly 1; 8, ST cutting assembly 1; 9, ST assembly 2; 10, ST cutting assembly 2; 11, ST assembly 3; 12, ST cutting assembly 3; 13, board entry isolation section 2; 14, ST assembly 4; 15, ST assembly 4; 16, rinsing assembly 1; 17, rinsing assembly 2; 18, wind cutting assembly 2; 19, rinsing assembly 3; 20, wind cutting assembly 3; 21, drying assembly 1; 22, drying assembly 2; 23, board exit isolation section; 24, board exit section assembly;

[0041] 41. Cleaning liquid tank; 42. ST liquid tank assembly; 421. ST liquid tank 1; 422. ST liquid tank 2; 423. ST liquid tank 3; 424. ST liquid tank 4; 43. Rinse liquid tank assembly; 431. Rinse liquid tank 1; 432. Rinse liquid tank 2; 433. Rinse liquid tank 3; 44. Conveying assembly; 45. Spray pipe assembly 1; 46. Spray pipe assembly 2; 47. Air blowing mechanism;

[0042] 48. Zero-discharge circulation mechanism for rinse water; 480. ST four-tank zero-discharge ball valve; 481. ST four-tank zero-discharge ball valve; 482. Zero-discharge ball valve for rinse tank 1; 483. Zero-discharge water pump 1; 484. Zero-discharge water pump 1 regulating valve; 485. Zero-discharge cotton filter element 1; 486. Zero-discharge water pump 2; 487. Zero-discharge accumulator 1; 488. DTRO filter membrane 1; 4881. Input pipe; 4882. Filter barrel; 4883. Coarse filter membrane; 4884, fine DTRO filter membrane; 4885, output pipe; 4886, input end control valve plate; 48861, gear one; 4887, output end control valve plate; 4888, electric telescopic rod; 4889, transmission rod; 48891, tooth one; 48892, tooth two; 48810, protective shell; 48811, piston sleeve; 48812, guide plate; 48813, transmission column; 48814, connecting column; 48815, extrusion Compression spring; 48816, extrusion column; 48817, piston plate; 48818, centralized wastewater discharge pipe; 488181, centralized wastewater discharge valve plate; 488182, gear 2; 489, DTRO filter membrane one regulating valve; 4810, DTRO filter membrane one flow meter one; 4811, DTRO filter membrane one selection switch; 4812, rinse one liquid tank zero discharge ball valve two; 4813, rinse two liquid tank zero discharge ball valve; 4814, zero discharge water pump three ; 4815, zero-emission water pump three regulating valve; 4816, zero-emission cotton filter element two; 4817, zero-emission water pump four; 4818, zero-emission accumulator two; 4819, DTRO filter membrane two; 4820, DTRO filter membrane two regulating valve; 4821, DTRO filter membrane two flowmeter one; 4822, DTRO filter membrane two selection switch; 4823, DTRO filter membrane one flowmeter two; 4824, DTRO filter membrane two flowmeter two. DETAILED DESCRIPTION

[0043] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0044] like Figure 1-Figure 2As shown, a cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductors comprises a housing 01 and an inlet plate segment assembly 1 and an outlet plate segment assembly 24 arranged at both ends of the housing 01, a conveying assembly 44 is arranged inside the inlet plate segment assembly 1, the housing 01 and the outlet plate segment assembly 24, a cleaning mechanism is arranged inside the housing 01, and the cleaning mechanism comprises an inlet plate isolation section 1 2, a cleaning component 1 3, a cleaning component 2 4, a cleaning component 3 5, and an air cutter 6, which are arranged in sequence from the inlet plate segment assembly 1 to the outlet plate segment assembly 24 inside the housing 01. Component 1 6, ST component 1 7, ST cut component 1 8, ST component 2 9, ST cut component 2 10, ST component 3 11, ST cut component 3 12, board entry isolation section 2 13, ST component 4 14, ST cut component 4 15, rinse component 1 16, rinse component 2 17, wind cut component 2 18, rinse component 3 19, wind cut component 3 20, drying component 1 21, drying component 22 and board exit isolation section 23. The transmission path of the conveying component 44 passes through the middle of the cleaning mechanism and runs through the entire cleaning machine.

[0045] The conveying assembly 44 conveys the object to be cleaned into the cleaning machine, starting from the inlet plate segment assembly 1, passing through the cleaning mechanism and being output from the outlet plate segment assembly 24, thus completing the cleaning, ST washing, rinsing and drying of the object to be cleaned.

[0046] like Figure 1-Figure 2 As shown, a cleaning liquid tank 41 is arranged below the cleaning component 1 3, the cleaning component 2 4, the cleaning component 3 5 and the wind cutting component 1 6, and the cleaning liquid tank 41 provides cleaning liquid for the cleaning component 1 3, the cleaning component 2 4, the cleaning component 3 5. The cleaning liquid tank 41 provides cleaning liquid for the cleaning mechanism, and the cleaning liquid forms a closed loop among the cleaning liquid tank 41, the cleaning component 1 3, the cleaning component 2 4, the cleaning component 3 5, and the cleaning liquid tank 41 also receives the cleaning liquid flowing down from the cleaning component 1 3, the cleaning component 2 4, the cleaning component 3 5, and the wind cutting component 1 6 above, and transports the contaminated cleaning liquid to the pipeline arranged at the lower end of the waste liquid output end of the ST liquid tank component 42.

[0047] An ST liquid tank assembly 42 is arranged below the ST-1 assembly 7, the ST-1 assembly 8, the ST-2 assembly 9, the ST-2 assembly 10, the ST-3 assembly 11, the ST-3 assembly 12, the inlet isolation section 2 13, the ST-4 assembly 14 and the ST-4 assembly 15. The ST liquid tank assembly 42 consists of an ST-1 liquid tank 421, an ST-2 liquid tank 422, an ST-3 liquid tank 423 and an ST-4 liquid tank 424. The ST-1 liquid tank 421, the ST-2 liquid tank 422, the ST-3 liquid tank 423 and the ST-4 liquid tank 424 are welded into an internally independent whole. The ST-1 liquid tank 421, the ST-2 liquid tank 422, the ST-3 liquid tank 423 and the ST-4 liquid tank 424 are welded into an internally independent whole. The ST-1 liquid tank 421, the ST-2 liquid tank The ST liquid tank 422, ST liquid tank 423 and ST liquid tank 424 respectively provide liquid for ST component 1 7, ST component 2 9, ST component 3 11 and ST component 4 14. The ST liquid tank 421 also receives liquid from ST component 1 7 and ST component 1 8; the ST liquid tank 422 also receives liquid from ST component 2 9 and ST component 2 10; the ST liquid tank 423 also receives liquid from ST component 3 11 and ST component 3 12, and the ST liquid tank 424 receives liquid from the inlet isolation section 2 13, ST component 4 14 and ST component 4 15.

[0048] The contaminated liquid collected by ST liquid tank 1 421, ST liquid tank 2 422, ST liquid tank 3 423 and ST liquid tank 424 is transported to the pipeline set at the lower end of the ST liquid tank assembly 42 and to the pipeline set at the lower end of the waste liquid output end of the rinsing liquid tank assembly 43.

[0049] The three-liquid rinsing tank 433 is constantly replenished with an appropriate amount of rinsing water. An overflow port is provided between the three-liquid rinsing tank 433 and the two-liquid rinsing tank (432), and the excess rinsing water in the three-liquid rinsing tank 433 will overflow into the two-liquid rinsing tank (432); an overflow port is provided between the two-liquid rinsing tank (432) and the one-liquid rinsing tank 431, and the excess rinsing water in the two-liquid rinsing tank (432) will overflow and filter into the one-liquid rinsing tank 431;

[0050] An overflow port is provided between the rinse liquid tank 431 and the ST liquid tank 424. The excess rinse water in the rinse liquid tank 431 will overflow and filter into the ST liquid tank 424. After the rinse water overflows into the ST liquid tank 424, it is called ST liquid.

[0051] The ST four-liquid tank 424 is provided with an overflow port, and the excess ST liquid in the ST four-liquid tank 424 will overflow out and then be pumped to the ST three-liquid tank 423 through the pneumatic diaphragm pump; an overflow port is provided between the ST three-liquid tank 423 and the ST two-liquid tank 422, and the excess ST liquid in the ST three-liquid tank 423 will overflow and filter into the ST two-liquid tank 422; an overflow port is provided between the ST two-liquid tank 422 and the ST one-liquid tank 421, and the excess ST liquid in the ST two-liquid tank 422 will overflow and filter into the ST one-liquid tank 421;

[0052] The ST liquid tank 421 is provided with an overflow port, and the excess ST liquid in the ST liquid tank 421 will overflow and be collected and transported to the pipeline set at the lower end of the ST liquid tank assembly 42 and transported to the pipeline set at the lower end of the output end of the rinsing liquid tank assembly 43.

[0053] A rinsing liquid tank assembly 43 is arranged below the rinsing component 16, the rinsing component 2, the wind shear component 2, the rinsing component 19, the wind shear component 3, the drying component 21, the drying component 22 and the plate outlet isolation section 23. The rinsing liquid tank assembly 43 is composed of a rinsing liquid tank 1 431, a rinsing liquid tank 2 432 and a rinsing liquid tank 3 433 welded into an internally independent whole.

[0054] The rinse liquid tank 1 431 , the rinse liquid tank 2 432 and the rinse liquid tank 3 433 provide corresponding liquids to the rinse component 1 16 , the rinse component 2 17 and the rinse component 3 19 in turn.

[0055] The rinse liquid tank 431 receives the liquid flowing down from the rinse component 16, the rinse liquid tank 432 receives the liquid flowing down from the rinse component 17 and the wind shear component 18, the rinse liquid tank 433 receives the liquid flowing down from the rinse component 19, the wind shear component 20, the drying component 1 21, the drying component 22 and the plate outlet isolation section 23, and the contaminated liquid collected by the ST liquid tank 423, the ST liquid tank 424, the rinse liquid tank 431 and the rinse liquid tank 432 is transported to the pipeline set at the lower end of the rinse liquid tank assembly 43 and transported to the input end of the rinse water zero discharge circulation mechanism 48.

[0056] The cleaning component 1 3, the cleaning component 2 4, the cleaning component 3 5, the rinsing component 1 16, the rinsing component 2 17 and the rinsing component 3 19 are all provided with a spray pipe component 1 45 for cleaning PCBA and semiconductors.

[0057] The ST 1 assembly 7 , the ST 2 assembly 9 , the ST 3 assembly 11 and the ST 4 assembly 14 are all provided with a spray pipe assembly 2 46 for cleaning PCBA and semiconductors.

[0058] The wind cutting component 1 6, the ST cutting component 1 8, the ST cutting component 2 10, the ST cutting component 3 12, the ST cutting component 4 15, the wind cutting component 2 18, the wind cutting component 3 20, the drying component 1 21 and the drying component 22 are all provided with a wind blowing mechanism 47 for blowing air on the surface of the PCBA and the semiconductor to blow away the cleaning water on the surface of the PCBA and the semiconductor, and the wind blowing mechanism 47 of the drying component 1 21 and the drying component 22 can blow out hot air to dry the PCBA and the semiconductor.

[0059] like Figure 1-Figure 3As shown, the pipeline provided at the lower end of the ST three-liquid tank 423 is provided with an ST three-liquid tank zero-discharge ball valve 480, which is in a normally open state. The pipeline provided at the lower end of the ST four-liquid tank 424 is provided with an ST four-liquid tank zero-discharge ball valve 481 and a rinse one-liquid tank zero-discharge ball valve 482, which is in a normally open state and a rinse one-liquid tank zero-discharge ball valve 482, which is in a normally closed state.

[0060] The zero-discharge circulation mechanism 48 for rinsing water includes a zero-discharge water pump 483, an ST three-tank zero-discharge ball valve 480, an ST four-tank zero-discharge ball valve 481 and a rinse tank zero-discharge ball valve 482 which are connected in parallel to the inlet of the zero-discharge water pump 483, a zero-discharge cotton filter element filter 485 is arranged at the output end of the zero-discharge water pump 483, and the zero-discharge cotton filter element filter 485 is used to preferentially filter the largest particle impurities, a zero-discharge water pump 2 486 is arranged at the output end of the zero-discharge cotton filter element filter 485, a DTRO filter membrane 488 is arranged at the output end of the zero-discharge water pump 2 486, and a zero-discharge accumulator 487 is arranged on the pipeline between the zero-discharge water pump 2 486 and the DTRO filter membrane 488, and the function of the zero-discharge accumulator 487 is to release the stored energy when the system needs it, so as to ensure the stable operation of the system.

[0061] The DTRO filter membrane 488 is provided with two outlets, wherein the output end of the first outlet is provided with a DTRO filter membrane regulating valve 489, a DTRO filter membrane flow meter 4810, and a DTRO filter membrane selection switch 4811 in sequence.

[0062] When the DTRO filter membrane selection switch 4811 is selected at the first side, most of the filtered and recovered liquid flows back to the ST four-liquid tank 424. When the DTRO filter membrane selection switch 4811 is selected at the other side, a small part of the filtered and recovered liquid flows back to the rinse liquid tank 431, and the liquid flowing back to the ST four-liquid tank 424 is sufficient for ST washing.

[0063] A small portion of the recovered liquid from the second outlet of the DTRO filter membrane 488 passes through the check valve and the DTRO filter membrane flow meter 4823, is connected in parallel with the pipeline behind the DTRO filter membrane flow meter 4824, and then enters the spray pipe assembly 45 on the rinse assembly 17.

[0064] A bypass pipeline is arranged after the zero-emission water pump 483, and a zero-emission water pump regulating valve 484 is installed on the bypass pipeline. After passing through the zero-emission water pump regulating valve 484, the bypass pipeline is connected with the pipeline before the zero-emission water pump 483 again. Its main function is to adjust the pressure and flow of the zero-emission water pump 483.

[0065] like Figure 1-Figure 3As shown, the rinse tank 1 431 and the rinse tank 2 432 are respectively provided with a rinse tank 1 zero discharge ball valve 2 4812 and a rinse tank 2 zero discharge ball valve 4813, the rinse tank 1 zero discharge ball valve 2 4812 is normally open, and the rinse tank 2 zero discharge ball valve 4813 is normally open. The rinse tank 1 zero discharge ball valve 2 4812 and the rinse tank 2 zero discharge ball valve 4813 are connected in parallel to the inlet of the zero discharge water pump 3 4814.

[0066] A zero-emission cotton filter element filter 2 4816 is provided at the output end of the zero-emission water pump 3 4814, a zero-emission cotton filter element filter 2 4816 is provided at the output end of the zero-emission water pump 4 4817, a DTRO filter membrane 2 4819 is provided at the output end of the zero-emission water pump 4 4817, a zero-emission accumulator 2 4818 is provided on the pipeline between the zero-emission water pump 4 4817 and the DTRO filter membrane 2 4819, and the function of the zero-emission accumulator 2 4818 is to release the stored energy when the system needs it, so as to ensure the stable operation of the system.

[0067] The DTRO filter membrane 2 4819 is provided with two outlets, wherein the output end of the first outlet is provided with a DTRO filter membrane 2 regulating valve 4820, a DTRO filter membrane 2 flowmeter 1 4821, and a DTRO filter membrane 2 selection switch 4822 in sequence.

[0068] When the DTRO filter membrane second selection switch 4822 is selected at the first side, the filtered and recovered liquid flows back to the rinsing liquid tank 1 431. When the DTRO filter membrane second selection switch 4822 is selected at the other side, the filtered and recovered liquid flows back to the rinsing liquid tank 2 432.

[0069] The recovered liquid from the second outlet of DTRO filter membrane 2 4819 passes through the check valve and DTRO filter membrane 2 flowmeter 2 4824, is connected in parallel with the pipeline behind DTRO filter membrane 1 flowmeter 2 4823, and then enters the spray pipe assembly 1 45 on the rinsing assembly 17.

[0070] A bypass pipeline is arranged after the zero-emission water pump three 4814, on which a zero-emission water pump three regulating valve 4815 is installed. The bypass pipeline is connected with the pipeline before the zero-emission water pump three 4814 again after passing through the zero-emission water pump three regulating valve 4815. Its main function is to adjust the pressure and flow of the zero-emission water pump three 4814.

[0071] like Figure 2-Figure 4As shown, the DTRO filter membrane 1 488 has the same structure as the DTRO filter membrane 2 4819. The DTRO filter membrane 1 488 includes an input pipe 4881, a filter barrel 4882, a coarse filter membrane 4883, a fine filter DTRO filter membrane 4884 and an output pipe 4885. An input pipe 4881 is installed at one end of the upper side of the filter barrel 4882, and the input pipe 4881 is connected to the output end of the zero-emission water pump 2 486. An output pipe 4885 is installed at one end of the lower side of the filter barrel 4882. The output end of the output pipe 4885 is divided into two transmission paths. The coarse filter membrane 4883 and the fine filter DTRO filter membrane 4884 are both installed on the inner side of the filter barrel 4882. The rinsing water enters from the input pipe 4881, passes through the coarse filter membrane 4883 to filter large particles of impurities, and then passes through the fine filter DTRO filter membrane 4884 to filter fine impurities. Finally, the filtered water is discharged from the output pipe 4885.

[0072] like Figure 4-Figure 7 As shown, the DTRO filter membrane 488 also includes an input end control valve plate 4886, an output end control valve plate 4887, an electric telescopic rod 4888 and a transmission rod 4889. The input end control valve plate 4886 and the output end control valve plate 4887 are both installed on the inner side of the filter barrel 4882. The input end control valve plate 4886 is located between the coarse filter membrane 4883 and the output end of the input pipe 4881, and the output end control valve plate 4887 is located between the fine filter DTRO filter membrane 4884 and the input end of the output pipe 4885. The electric telescopic rod 4888 is started to drive the transmission rod 4889 to move. As the transmission rod 4889 moves, the input end control valve plate 4886 and the output end control valve plate 4887 can be driven to close at the same time, so that the space where the coarse filter membrane 4883 and the fine filter DTRO filter membrane 4884 are located is sealed.

[0073] Furthermore, a tooth 48891 is fixedly provided on the transmission rod 4889, and a gear 48861 is provided on both the input-end control valve plate 4886 and the output-end control valve plate 4887. The movement of the transmission rod 4889 drives the tooth 48891 to move and then drives the gear 48861 to rotate 90°, thereby realizing the rotational closure of the input-end control valve plate 4886 and the output-end control valve plate 4887. In the filtering state, the input-end control valve plate 4886 and the output-end control valve plate 4887 are both in the open state.

[0074] The DTRO filter membrane 488 also includes a protective shell 48810, a piston sleeve 48811, a guide plate 48812, a transmission column 48813, a connecting column 48814, an extrusion spring 48815, an extrusion column 48816 and a piston plate 48817. The electric telescopic rod 4888 is installed on the inner side of the protective shell 48810. The piston sleeve 48811 is installed on one end of the protective shell 48810. The guide plate 48812 is installed on one end of the piston sleeve 48811. The guide plate 488 The output end of 12 is connected to the filter barrel 4882, one end of the transmission column 48813 is connected to the driving end of the electric telescopic rod 4888, the other end of the transmission column 48813 is installed with a connecting column 48814, an extrusion spring 48815 is installed on the inner side of one end of the connecting column 48814, an extrusion column 48816 is installed on one end of the extrusion spring 48815, a piston disk 48817 is installed on one end of the extrusion column 48816, and the piston disk 48817 is located on the inner side of the piston sleeve 48811.

[0075] A second tooth 48892 is also fixedly provided on the transmission rod 4889. Wastewater centralized discharge pipes 48818 are installed on the filter barrels 4882 located between the fine filter DTRO filter membrane 4884 and the coarse filter membrane 4883 and between the coarse filter membrane 4883 and the input end control valve plate 4886. The two wastewater centralized discharge pipes 48818 both penetrate the electric telescopic rod 4888 and the transmission column 48813, and a slide groove is also provided in the middle of the transmission column 48813 to facilitate the movement of the transmission column 48813 without impacting the wastewater centralized discharge pipe 48818. A wastewater centralized discharge valve plate 488181 is installed on the inner side of the wastewater centralized discharge pipe 48818, and a second gear 488182 is installed on the wastewater centralized discharge valve plate 488181.

[0076] Specifically, when the electric telescopic rod 4888 is started, causing the input-end control valve plate 4886 and the output-end control valve plate 4887 to rotate and close, the transmission column 48813 drives the connecting column 48814 so that the squeezing column 48816 drives the piston disc 48817 to squeeze the liquid inside the piston sleeve 48811, thereby causing the liquid in the filter barrel 4882 to flow from the fine filtration DTRO filter membrane 4884 to the coarse filtration membrane 4883. Since the input-end control valve plate 4886 and the output-end control valve plate 4887 are preferably closed, and at this time, tooth 2 48892 has not yet meshed with gear 2 488182, the resistance of the piston disc 48817 to squeeze the liquid when sliding in the piston sleeve 48811 increases, thereby reversely squeezing the squeezing spring 48815, and the squeezing spring 48815 begins to accumulate force. Before the pressure reaches the maximum level, tooth 2 48892 meshes with gear 2 488182, thereby opening the wastewater centralized discharge valve plate 488181. At this time, the piston disk 48817 moves rapidly under the reset of the extrusion spring 48815 and the continued push of the electric telescopic rod 4888, so that the liquid in the filter barrel 4882 quickly reverses to impact the fine filtration DTRO filter membrane 4884 and the coarse filtration membrane 4883, and prevents the fine filtration DTRO filter membrane 4884 and the coarse filtration membrane 4883 from being blocked. At the same time, the impurities flushed out are quickly discharged from the wastewater centralized discharge pipe 48818, which greatly reduces the replacement of the fine filtration DTRO filter membrane 4884 and the coarse filtration membrane 4883 while achieving maximum zero emission, thereby reducing the complexity of manual operation and the cost of manual maintenance, and reducing the number of shutdowns due to filter replacement, thereby further improving work efficiency.

[0077] It should be noted that, in the description of the present application, it should be understood that the terms "length", "thickness", "inside", "outside", "axial", "radial", etc., indicating orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0078] In addition, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprises", or any other variations thereof are intended to cover non-exclusive inclusion, so that a process, method, article, or apparatus that includes a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article, or apparatus.

[0079] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes according to the technical scheme and inventive concept of the present invention within the technical scope disclosed by the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A cleaning machine with zero discharge of rinsing water for PCBA and semiconductor cleaning, characterized in that: The invention comprises a housing (01) and an inlet plate section assembly (1) and an outlet plate section assembly (24) arranged at both ends of the housing (01); a conveying assembly (44) is arranged inside the inlet plate section assembly (1), the housing (01) and the outlet plate section assembly (24); a cleaning mechanism is arranged inside the housing (01); a conveying path of the conveying assembly (44) passes through the middle of the cleaning mechanism; a cleaning liquid tank (41), an ST liquid tank assembly (42) and a rinsing liquid tank assembly (43) are installed at the lower end of the cleaning mechanism; a rinsing liquid is transported in the rinsing liquid tank assembly (43); the rinsing liquid overflows from the rinsing liquid tank assembly (43) and flows into the ST liquid tank assembly (42) to form a ST liquid, the ST liquid tank assembly (42) includes an ST three-liquid tank (423) and an ST four-liquid tank (424), the rinse liquid tank assembly (43) includes a rinse one-liquid tank (431) and a rinse two-liquid tank (432), the output ends of the ST three-liquid tank (423), the ST four-liquid tank (424), the rinse one-liquid tank (431) and the rinse two-liquid tank (432) are all provided with a rinse water zero-discharge circulation mechanism (48), and the waste liquid in the ST three-liquid tank (423), the ST four-liquid tank (424), the rinse one-liquid tank (431) and the rinse two-liquid tank (432) is discharged into the inside of the rinse water zero-discharge circulation mechanism (48) to be filtered.

2. A cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductors as claimed in claim 1, characterized in that: The cleaning mechanism comprises a first plate entry isolation section (2), a cleaning component (3), a second cleaning component (4), a third cleaning component (5), a first air cutting component (6), a first ST component (7), a first ST cutting component (8), a second ST component (9), a second ST cutting component (10), a third ST cutting component (11), a third ST cutting component (12), a second plate entry isolation section (13), a fourth ST component (14), a fourth ST cutting component (15), a first rinsing component (16), a second rinsing component (17), a second air cutting component (18), a third rinsing component (19), a third air cutting component (20), a first drying component (21), a second drying component (22) and a plate exit isolation section (23), which are arranged in sequence on the inner side of the housing (01) from the first plate entry component (1) to the plate exit component (24).

3. A cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductors as claimed in claim 2, characterized in that: The cleaning liquid tank (41) provides cleaning liquid for the cleaning mechanism. The cleaning liquid forms a closed cycle between the cleaning liquid tank (41), the cleaning component 1 (3), the cleaning component 2 (4), and the cleaning component 3 (5). An ST liquid tank assembly (42) is arranged below the ST component 1 (7), the ST component 1 (8), the ST component 2 (9), the ST component 2 (10), the ST component 3 (11), the ST component 3 (12), the inlet isolation section 2 (13), the ST component 4 (14), and the ST component 4 (15). The ST liquid tank assembly (42) consists of an ST liquid tank 1 (421), an ST liquid tank 2 (422), an ST liquid tank 3 (423), and an ST liquid tank 4 (424). The ST liquid tank 1 (42 1), ST2 liquid tank (422), ST3 liquid tank (423) and ST4 liquid tank (424) respectively provide liquid for ST1 component (7), ST2 component (9), ST3 component (11) and ST4 component (14). ST1 liquid tank (421) receives liquid flowing from ST1 component (7) and ST1 component (8), ST2 liquid tank (422) receives liquid flowing from ST2 component (9) and ST2 component (10), ST3 liquid tank (423) receives liquid flowing from ST3 component (11) and ST3 component (12), and ST4 liquid tank (424) receives liquid flowing from inlet plate isolation section 2 (13), ST4 component (14) and ST4 component (15).

4. A cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductors as claimed in claim 3, characterized in that: A rinsing liquid tank assembly (43) is arranged below the rinsing component (16), the rinsing component (17), the wind shear component (18), the rinsing component (19), the wind shear component (20), the drying component (21), the drying component (22) and the plate outlet isolation section (23). The rinsing liquid tank assembly (43) is composed of a rinsing liquid tank (431), a rinsing liquid tank (432) and a rinsing liquid tank (433). The rinsing water filtered by the rinsing liquid tank (431) and the rinsing liquid tank (432) is recycled to the ST liquid tank (424), the rinsing liquid tank (431) and the inside of the rinsing component (17), and the rinsing waste water of the rinsing liquid tank (433) is directly discharged. The first rinse liquid tank (431), the second rinse liquid tank (432) and the third rinse liquid tank (433) respectively provide corresponding liquids for the first rinse component (16), the second rinse component (17) and the third rinse component (19); The first rinsing liquid tank (431) receives the liquid flowing from the first rinsing component (16), the second rinsing liquid tank (432) receives the liquid flowing from the second rinsing component (17) and the second wind shear component (18), the third rinsing liquid tank (433) receives the liquid flowing from the third rinsing component (19), the third wind shear component (20), the first drying component (21), the second drying component (22) and the plate outlet isolation section (23), and the sewage collected by the third ST liquid tank (423), the fourth ST liquid tank (424), the first rinsing liquid tank (431) and the second rinsing liquid tank (432) is transported to the pipeline provided at the lower end of the rinsing liquid tank component (43) and transported to the input end of the rinsing water zero discharge circulation mechanism (48); The three-liquid rinsing tank (433) is constantly replenished with an appropriate amount of rinsing water. An overflow port is provided between the three-liquid rinsing tank (433) and the two-liquid rinsing tank (432), and the excess rinsing water in the three-liquid rinsing tank (433) will overflow into the two-liquid rinsing tank (432); an overflow port is provided between the two-liquid rinsing tank (432) and the one-liquid rinsing tank (431), and the excess rinsing water in the two-liquid rinsing tank (432) will overflow and filter into the one-liquid rinsing tank (431); An overflow port is provided between the rinse liquid tank (431) and the ST liquid tank (424), and the excess rinse water in the rinse liquid tank (431) will overflow and filter into the ST liquid tank (424); The ST four-liquid tank (424) is provided with an overflow port, and the excess ST liquid in the ST four-liquid tank (424) will overflow out and then be pumped to the ST three-liquid tank (423) through the pneumatic diaphragm pump; an overflow port is provided between the ST three-liquid tank (423) and the ST two-liquid tank (422), and the excess ST liquid in the ST three-liquid tank (423) will overflow and filter into the ST two-liquid tank (422); an overflow port is provided between the ST two-liquid tank (422) and the ST one-liquid tank (421), and the excess ST liquid in the ST two-liquid tank (422) will overflow and filter into the ST one-liquid tank (421); the ST one-liquid tank (421) is provided with an overflow port, and the excess ST liquid in the ST one-liquid tank (421) will overflow out and be collected and transported to the pipeline provided at the lower end of the ST liquid tank assembly (42) and transported to the pipeline provided at the lower end of the output end of the rinsing liquid tank assembly (43).

5. A cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductors as claimed in claim 4, characterized in that: The pipeline arranged at the lower end of the rinse liquid tank assembly (43) is provided with an ST three-tank zero-discharge ball valve (480), an ST four-tank zero-discharge ball valve (481) and a rinse liquid tank zero-discharge ball valve (482); the rinse water zero-discharge circulation mechanism (48) comprises a zero-discharge water pump (483); the ST three-tank zero-discharge ball valve (480), the ST four-tank zero-discharge ball valve (481) and the rinse liquid tank zero-discharge ball valve (482) are connected in parallel and then connected to the inlet of the zero-discharge water pump (483); a zero-discharge cotton filter element filter (485) is arranged at the output end of the zero-discharge cotton filter element filter (485); a zero-discharge water pump (486) is arranged at the output end of the zero-discharge cotton filter element filter (485); a DTRO filter membrane (488) is arranged at the output end of the zero-discharge water pump (486); The DTRO filter membrane 1 (488) is provided with two outlets, wherein the output end of the first outlet is provided with a DTRO filter membrane 1 regulating valve (489), a DTRO filter membrane 1 flow meter 1 (4810), and a DTRO filter membrane 1 selection switch (4811) in sequence; When the DTRO filter membrane selection switch (4811) is selected at the first side, the filtered and recovered liquid flows back to the ST four-liquid tank (424); when the DTRO filter membrane selection switch (4811) is selected at the other side, the filtered and recovered liquid flows back to the rinse liquid tank (431); The recovered liquid from the second outlet of DTRO filter membrane 1 (488) passes through the check valve and DTRO filter membrane 1 flowmeter 2 (4823), is connected in parallel with the pipeline behind DTRO filter membrane 2 flowmeter 2 (4824), and then enters the spray pipe component 1 (45) on the rinse component 2 (17).

6. A zero-discharge cleaning machine for cleaning PCBA and semiconductors as claimed in claim 1, characterized in that: The first rinsing liquid tank (431) and the second rinsing liquid tank (432) are respectively provided with a second zero-discharge ball valve (4812) for the first rinsing liquid tank and a second zero-discharge ball valve (4813) for the second rinsing liquid tank. The second zero-discharge ball valve (4812) for the first rinsing liquid tank and the second zero-discharge ball valve (4813) for the second rinsing liquid tank are connected in parallel to the inlet of the third zero-discharge water pump (4814). The output end of the third zero-discharge water pump (4814) is provided with a second zero-discharge cotton filter cartridge filter (4816). The output end of the second zero-discharge cotton filter cartridge filter (4816) is provided with a fourth zero-discharge water pump (4817). The output end of the fourth zero-discharge water pump (4817) is provided with a second DTRO filter membrane (4819). The DTRO filter membrane 2 (4819) is provided with two outlets, wherein the output end of the first outlet is provided with a DTRO filter membrane 2 regulating valve (4820), a DTRO filter membrane 2 flow meter 1 (4821), and a DTRO filter membrane 2 selection switch (4822) in sequence; When the DTRO filter membrane second selection switch (4822) is selected at the first side, the filtered and recovered liquid flows back to the first rinsing liquid tank (431); when the DTRO filter membrane second selection switch (4822) is selected at the other side, the filtered and recovered liquid flows back to the second rinsing liquid tank (432); The recovered liquid from the second outlet of DTRO filter membrane 2 (4819) passes through the check valve and DTRO filter membrane 2 flowmeter 2 (4824), is connected in parallel with the pipeline behind DTRO filter membrane 1 flowmeter 2 (4823), and then enters the spray pipe component 1 (45) on the rinse component 2 (17).

7. A cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductor as claimed in claim 5 or 6, characterized in that: The DTRO filter membrane 1 (488) and the DTRO filter membrane 2 (4819) have the same structural composition. The DTRO filter membrane 1 488 includes an input pipe (4881), a filter barrel (4882), a coarse filter membrane (4883), a fine filter DTRO filter membrane (4884) and an output pipe (4885). The input pipe (4881) is installed at one end of the upper side of the filter barrel (4882). The input pipe (4881) is connected to the output end of the zero-emission water pump 2 486. The output pipe (4885) is installed at one end of the lower side of the filter barrel (4882). The output end of the output pipe (4885) is divided into two transmission paths. The coarse filter membrane (4883) and the fine filter DTRO filter membrane (4884) are both installed on the inner side of the filter barrel (4882).

8. A cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductors as claimed in claim 7, characterized in that: The DTRO filter membrane 1 (488) further comprises an input end control valve plate (4886), an output end control valve plate (4887), an electric telescopic rod (4888) and a transmission rod (4889). The input end control valve plate (4886) and the output end control valve plate (4887) are both installed on the inner side of the filter barrel (4882). The input end control valve plate (4886) is located between the coarse filter membrane (4883) and the output end of the input pipe (4881). The output end control valve plate (4887) is located between the fine filter DTRO filter membrane (4884) and the input end of the output pipe (4885). A tooth 1 (48891) is fixedly provided on the transmission rod (4889). A gear 1 (48861) is provided on the input end control valve plate (4886) and the output end control valve plate (4887).

9. A cleaning machine with zero discharge of rinsing water for cleaning PCBA and semiconductors as claimed in claim 8, characterized in that: The DTRO filter membrane 488 also includes a protective shell (48810), a piston sleeve (48811), a guide plate (48812), a transmission column (48813), a connecting column (48814), an extrusion spring (48815), an extrusion column (48816) and a piston plate (48817). The electric telescopic rod (4888) is installed on the inner side of the protective shell (48810). The piston sleeve (48811) is installed on one end of the protective shell (48810). The guide plate (48812) is installed on one end of the piston sleeve (48811). The output end of the electric telescopic rod (4888) is connected to the filter barrel (4882), one end of the transmission column (48813) is connected to the driving end of the electric telescopic rod (4888), the other end of the transmission column (48813) is installed with a connecting column (48814), an extrusion spring (48815) is installed on the inner side of one end of the connecting column (48814), an extrusion column (48816) is installed on one end of the extrusion spring (48815), a piston disc (48817) is installed on one end of the extrusion column (48816), and the piston disc (48817) is located on the inner side of the piston sleeve (48811).

10. A zero-discharge cleaning machine for rinsing water for PCBA and semiconductor cleaning as claimed in claim 8, characterized in that: The transmission rod (4889) is also fixedly provided with a second tooth (48892). A wastewater centralized discharge pipe (48818) is installed on the filter barrel (4882) located between the fine filter DTRO filter membrane (4884) and the coarse filter membrane (4883) and between the coarse filter membrane (4883) and the input end control valve plate (4886). The two wastewater centralized discharge pipes (48818) both penetrate the electric telescopic rod (4888) and the transmission column (48813). A wastewater centralized discharge valve plate (488181) is installed on the inner side of the wastewater centralized discharge pipe (48818), and a second gear (488182) is installed on the wastewater centralized discharge valve plate (488181).

Images