Polishing platen and polishing equipment

Abstract

The present invention discloses a polishing platen and a polishing device, comprising: a support disk, a polishing disk and a fulcrum member; both ends of the fulcrum member are respectively connected to the support disk and the first end of the polishing disk; an expansion cavity is provided between the support disk and the second end of the polishing disk away from the polishing end face, and by controlling the pressure in the expansion cavity, the outer cavity wall is deformed, so that the outer cavity wall transmits a torque through the second end of the polishing disk, and the second end of the polishing disk transmits a torque to the polishing end face of the polishing disk through the fulcrum member, and under the action of the torque, the polishing surface shape of the polishing disk is deformed. The present invention makes the arrangement position of the expansion cavity more flexible and the structure of the expansion cavity simpler. At the same time, in the process of adjusting the polishing surface shape, only the pressure in the expansion cavity needs to be adjusted to deform the outer cavity wall of the expansion cavity. Compared with the related art that requires the cooperation of inner and outer ring adjusting devices, the control is also simpler.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor production, and more particularly, to a polishing platen and a semiconductor polishing apparatus. Background Art

[0002] A polishing apparatus for wafers can planarize the surface of wafers required in corresponding processes of chip manufacturing. In a double-sided polishing apparatus for wafers, there are both an upper platen and a lower platen, and the upper and lower platens jointly squeeze the material to achieve polishing. However, since the polishing speeds at different radii are inconsistent during the rotation of the wafer, the surface shape of the wafer is not flat enough.

[0003] To solve the problem that the surface shape of the wafer is not flat enough during polishing, in the prior art, an inner and outer ring adjusting device is provided between the upper platen and its support disk. By means of the inner and outer ring adjusting device, the platen is formed into a concave or convex shape, thereby improving the flatness of the wafer after polishing.

[0004] In the process of implementing the present invention, the inventor found that the prior art has at least the following technical problems:

[0005] The structure of the inner and outer ring adjusting device is relatively delicate, with a large processing difficulty, and the inner and outer ring adjusting devices sometimes need to be used in combination, and the control process is slightly complicated. Summary of the Invention

[0006] The main object of the present invention is to provide a polishing platen and a semiconductor polishing apparatus to solve the problems in the related art that it is necessary to control the inner and outer ring adjusting device in the polishing platen to change the polishing surface shape, the structure is delicate, the processing difficulty is large, and the control is complicated when the inner and outer rings are coordinated.

[0007] To achieve the above object, the present invention provides a polishing platen, including:

[0008] A support disk, a polishing disk, and a fulcrum member;

[0009] Both ends of the fulcrum member are respectively connected to the support disk and the first end of the polishing disk; an expansion cavity is provided between the support disk and the second end of the polishing disk away from the polishing end face. By controlling the pressure in the expansion cavity, the outer cavity wall deforms, and the outer cavity wall transmits a torque through the second end of the polishing disk, and the second end of the polishing disk transmits a torque to the polishing end face of the polishing disk through the fulcrum member. Under the action of the torque, the polishing surface shape of the polishing disk deforms.

[0010] Further, the expansion cavity is a ring-shaped cylinder.

[0011] Further, the fulcrum member includes a first connecting plate, a second connecting plate and a fulcrum plate. The first connecting plate and the second connecting plate are respectively connected to the support disk and the first end of the polishing disk. The fulcrum plate is connected between the first connecting plate and the second connecting plate. When the outer cavity wall deforms by controlling the pressure in the expansion cavity, the first connecting plate, the second connecting plate and the fulcrum plate elastically deform under the action of torque to change the angle between the first connecting plate and the second connecting plate.

[0012] Further, the first connecting plate, the second connecting plate and the fulcrum plate are all annular.

[0013] Further, the connection shape of the first connecting plate, the second connecting plate and the fulcrum plate is in the shape of an I-beam.

[0014] Further, when the polishing surface of the polishing disk is not deformed, its shape is convex inward and concave outward.

[0015] Further, the polishing pressure plate further includes a first annular member. The first annular member is disposed between the support disk and the second end of the polishing disk. The expansion cavity is located between the first annular member and the support disk.

[0016] Further, the first annular member includes a first sealing portion, a first thin-walled portion and a second sealing portion connected in sequence. The expansion cavity is disposed between the first thin-walled portion and the support disk;

[0017] The first sealing portion and the second sealing portion are used to seal the expansion cavity.

[0018] Further, the first sealing portion is sealingly connected to the upper part of the support disk, and the second sealing portion is sealingly connected to the lower part of the support disk.

[0019] Further, the upper end of the first annular member is turned outward to form the first sealing portion, and the lower end of the first annular member is turned inward to form the second sealing portion;

[0020] The upper edge of the support disk has an outwardly protruding edge, and the first sealing portion is sealed with the lower end face of the edge;

[0021] The lower edge of the support disk has a mounting groove, and the second sealing portion is disposed in the mounting groove and sealed with the upper end face of the mounting groove.

[0022] Further, the polishing pressure plate further includes a second annular member. The second annular member is located between the first annular member and the support disk;

[0023] The expansion cavity is located between the inner ring side of the first annular member and the outer ring side of the second annular member.

[0024] Furthermore, the first annular member includes a third sealing portion, a second thin-walled portion, and a fourth sealing portion that are connected in sequence, and the expansion cavity is disposed between the second thin-walled portion and the support disk;

[0025] The third sealing portion and the fourth sealing portion are used to seal the expansion cavity.

[0026] Furthermore, the outer ring side of the second annular member has a protruding fifth sealing portion, and the third sealing portion and the fifth sealing portion are attached and sealed together;

[0027] The outer ring side of the support disk has a first connecting protrusion, the fourth sealing portion is disposed on the first connecting protrusion, and the fourth sealing portion is attached and sealed to the lower end surface of the second annular member.

[0028] Furthermore, the inner ring side of the polishing disk is provided with a second connecting protrusion protruding toward the first annular member, and the second connecting protrusion is attached to the second thin-walled portion.

[0029] Furthermore, there is a gap between the upper end surface of the second connecting protrusion and the lower end surface of the third sealing portion, and between the lower end surface of the second connecting protrusion and the upper end surface of the first connecting protrusion, and the movement space of the second connecting protrusion is provided through the gap.

[0030] Furthermore, the outer ring side of the support disk is provided with a first limiting portion, and the inner ring side of the second annular member is provided with a second limiting portion, and the second limiting portion is installed on the first limiting portion to limit the vertical movement of the second limiting portion by the first limiting portion.

[0031] Furthermore, the first limiting portion includes a limiting groove, and the second limiting portion includes a limiting protrusion, and the limiting protrusion is installed in the limiting groove.

[0032] Furthermore, the polishing platen further includes an anti-falling disk, and the anti-falling disk is connected to the polishing disk through a connecting member and vertically limits the polishing disk through the connecting member.

[0033] Furthermore, the polishing platen further includes a pressure regulating channel, a first end of the pressure regulating channel communicates with the expansion cavity, and a second end is used to communicate with a pressure control source to control the pressure in the expansion cavity through the pressure control source.

[0034] According to another aspect of the present invention, there is provided a polishing device including the above-mentioned polishing platen.

[0035] In an embodiment of the present invention, a support disk, a polishing disk, and a fulcrum member are provided; both ends of the fulcrum member are respectively connected to the support disk and the first end of the polishing disk; an expansion cavity is provided between the support disk and the second end of the polishing disk away from the polishing end face. By controlling the pressure in the expansion cavity, the outer cavity wall deforms, and the outer cavity wall transmits a torque through the second end of the polishing disk, and the second end of the polishing disk transmits the torque to the polishing end face of the polishing disk through the fulcrum member, and under the action of the torque, the polishing surface shape of the polishing disk deforms. On the one hand, after using the fulcrum member as the connecting member between the support disk and the polishing disk, the expansion cavity does not need to play the role of connecting the support disk and the polishing disk, making the layout position of the expansion cavity more flexible and the structure of the expansion cavity simpler.

[0036] At the same time, since the fulcrum member is located between the support disk and the second end of the polishing end face of the polishing disk, the expansion cavity can be arranged at a single position, for example, only arranged at a position close to the outer ring on the polishing platen. During the process of adjusting the polishing surface shape, only the pressure in the expansion cavity needs to be adjusted to cause the outer cavity wall of the expansion cavity to deform, and the outer cavity wall transmits the torque to the second end of the polishing disk, and the second end of the polishing disk transmits the torque to the polishing end face through the fulcrum member to make the polishing surface shape deform. Compared with the related art that requires the cooperation of inner and outer ring adjusting devices, the control is also simpler.

[0037] On the other hand, when the expansion cavity does not need to play the role of connecting the support disk and the polishing disk, the installation and disassembly of the expansion cavity are also simpler. And since the process of adjusting the polishing surface shape is essentially a process of controlling the outer cavity wall of the expansion cavity to expand, after the expansion cavity is easy to install and disassemble, it is easier to meet the adjustment requirements of different polishing surface shapes by replacing the expansion cavity. BRIEF DESCRIPTION OF THE DRAWINGS

[0038] The drawings constituting a part of the present invention are used to provide a further understanding of the present invention, making other features, objects, and advantages of the present invention more obvious. The schematic embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings:

[0039] Figure 1 is a schematic diagram showing the polishing surface shape of the polishing platen unchanged according to an embodiment of the present invention;

[0040] Figure 2 is a schematic diagram showing the polishing surface shape of the polishing platen changed according to an embodiment of the present invention;

[0041] Figure 3 is a cross-sectional structural schematic diagram of the polishing platen according to an embodiment of the present invention;

[0042] Figure 4 is Figure 3 an enlarged structural schematic diagram of the partial B in

[0043] Figure 5 It is a schematic cross-sectional structure diagram of a polishing platen according to another embodiment of the present invention;

[0044] Figure 6 is Figure 5 a schematic enlarged structure diagram of part I in

[0045] Wherein, 1 is a support disk, 100 is a first connecting protrusion, 101 is a second limiting portion, 102 is a mounting groove, 103 is an edge, 2 is a polishing disk, 200 is a second connecting protrusion, 201 is a third connecting protrusion, 3 is a fulcrum member, 30 is a first connecting plate, 31 is a fulcrum plate, 310 is a groove, 32 is a second connecting plate, 4 is an expansion cavity, 40 is an outer cavity wall, 5 is a pressure regulating channel, 6 is an anti-falling disk, 60 is a receiving groove, 8 is a second annular member, 80 is a first limiting portion, 81 is a fifth sealing portion, 9 is a first annular member, 90 is a third sealing portion, 91 is a fourth sealing portion, 92 is a second thin wall portion, 93 is a first sealing portion, 94 is a second sealing portion, 95 is a first thin wall portion, 12 is a control chamber, 13 is a sealing ring. Detailed implementation manners

[0046] In order to enable those skilled in the art of the present technology to better understand the solution of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0047] It should be noted that the terms "first", "second", etc. in the description and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and do not necessarily need to describe a specific order or sequence. It should be understood that such used data can be interchanged under appropriate circumstances, so as to describe the embodiments of the present invention here.

[0048] In the present invention, the orientation or positional relationship indicated by terms such as "upper", "lower", "inner", etc. is based on the orientation or positional relationship shown in the drawings. These terms are mainly used to better describe the present invention and its embodiments, and are not used to limit that the indicated devices, elements or components must have a specific orientation, or be constructed and operated in a specific orientation.

[0049] Moreover, in addition to being able to represent an orientation or positional relationship, some of the above-mentioned terms may also be used to represent other meanings. For example, the term "upper" may also be used to represent a certain attachment relationship or connection relationship in some cases. For those of ordinary skill in the art, the specific meanings of these terms in the present invention can be understood according to specific circumstances.

[0050] In addition, terms such as "arranged", "provided with", "connected", "fixed", etc. should be understood in a broad sense. For example, "connected" can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection or an electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or there can be internal communication between two devices, components or parts. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0051] In addition, the meaning of the term "plurality" should be two or more.

[0052] It should be noted that, without conflict, the embodiments in the present invention and the features in the embodiments can be combined with each other. The present invention will be described in detail below with reference to the drawings and in conjunction with the embodiments.

[0053] To solve the related technical problems, such as Figures 1 to 6 As shown, an embodiment of the present invention provides a polishing platen, including: a support disk 1, a polishing disk 2, and a fulcrum member 3; wherein,

[0054] Both ends of the fulcrum member 3 are respectively connected to the support disk 1 and the first end of the polishing disk 2; an expansion cavity 4 is provided between the second ends of the support disk 1 and the polishing disk 2 away from the polishing end face, and the fulcrum member 3 is located between the polishing end face and the second end of the polishing disk 2;

[0055] By controlling the pressure in the expansion cavity 4, the outer cavity wall 40 deforms, and the outer cavity wall 40 transmits a torque through the second end of the polishing disk 2, and the second end of the polishing disk 2 transmits a torque to the polishing end face of the polishing disk 2 through the fulcrum member 3, and under the action of the torque, the polishing surface shape of the polishing disk 2 deforms.

[0056] In this embodiment, the polishing platen mainly includes a support disk 1, a polishing disk 2, and a fulcrum member 3, wherein the support disk 1 is a rigid structure. The lower surface of the polishing disk 2 serves as the polishing end face, and the polishing disk 2 is a deformable disk that can deform to a certain extent under an external force. Specifically, under the action of an external force, the polishing end face of the polishing disk 2 can be adjusted as a whole from a horizontal structure to a concave or convex structure, or can be adjusted as a whole from a convex structure to a horizontal or concave structure. During the polishing process, the polishing end face can contact the surface of the workpiece to be polished (such as a wafer or a glass sheet) for squeezing and polishing the workpiece to be polished.

[0057] The polishing disc 2 is installed at the lower part of the support disc 1. Specifically, in this embodiment, a concave structure is formed in the middle of the polishing disc 2, and the lower part of the support disc 1 extends into the concave structure. The polishing disc 2 and the support disc 1 are connected by a fulcrum member 3. At the same time, the fulcrum member 3 is located between the polishing end face of the polishing disc 2 and the second end of the polishing disc 2. When a torque is applied to the second end of the polishing disc 2, the fulcrum member 3 serves as a fulcrum, enabling the torque at the second end of the polishing disc 2 to be transmitted to the polishing end face, causing the polishing end face to deform. In one implementation, the fulcrum member 3 can be set as an annular structure and surround the outer circle of the support disc 1, and the upper and lower ends of the fulcrum member 3 are respectively connected to the support disc 1 and the polishing disc 2. In another implementation, the fulcrum member 3 can also be set as multiple, and the multiple fulcrum members 3 are circumferentially distributed along the outer circle of the support disc 1. The multiple fulcrum members 3 can be arranged at intervals or closely attached to each other.

[0058] Due to the setting of the fulcrum member 3, not only is it unnecessary to connect the support disc and the polishing disc 2 by means of an expansion cavity 4, but also the expansion cavity 4 can be only arranged between the second end of the polishing disc 2 and the support disc 1. The expansion cavity 4 has an outer cavity wall 40. When the pressure in the expansion cavity 4 increases, the outer cavity wall 40 of the expansion cavity 4 expands and bulges outwards accordingly, thereby transmitting a torque to the second end of the polishing disc 2. After the second end of the polishing disc 2 receives this torque, due to the existence of the fulcrum member 3, the second end of the polishing disc 2 can transmit the torque to the polishing end face of the polishing disc 2, causing the polishing end face to deform, thereby changing the polishing surface shape of the polishing end face.

[0059] It can be seen that on the one hand, after the fulcrum member 3 is used as the connecting member between the support disc 1 and the polishing disc 2 in the present invention, the expansion cavity 4 does not need to play the role of connecting the support disc 1 and the polishing disc 2, making the arrangement position of the expansion cavity 4 more flexible and the structural setting of the expansion cavity 4 simpler.

[0060] At the same time, since the fulcrum member 3 is located between the polishing end face and the second end of the polishing disc 2, the expansion cavity 4 can be arranged at a single position, for example, only arranged at a position close to the outer circle on the polishing platen. During the process of adjusting the polishing surface shape, only the pressure in the expansion cavity 4 needs to be adjusted to cause the outer cavity wall 40 of the expansion cavity 4 to deform, and the outer cavity wall 40 transmits a torque to the second end of the polishing disc 2. The second end of the polishing disc 2 then transmits the torque to the polishing end face through the fulcrum member 3, enabling the polishing surface shape to deform. Compared with the related art that requires the cooperation of inner and outer ring adjusting devices, the control is also simpler;

[0061] On the other hand, when the expansion cavity 4 does not need to play the role of connecting the support disc 1 and the polishing disc 2, the installation and disassembly of the expansion cavity 4 are also simpler. Moreover, since the process of adjusting the polishing surface shape is essentially a process of controlling the expansion of the outer cavity wall 40 of the expansion cavity 4, after the expansion cavity 4 is easy to install and disassemble, it is easier to meet the adjustment requirements of different polishing surface shapes by replacing the expansion cavity 4.

[0062] In one embodiment, as shown in Figure 4 and Figure 6 , there is a certain distance between the edge of the support disk 1 and the second end of the polishing disk 2, thus forming a control chamber 12. The range included in the control chamber 12 includes the area between the outer ring side of the support disk 1 and the inner ring side of the second end of the polishing disk 2. A separate expansion chamber 4 is provided in the control chamber 12. In one embodiment, the expansion chamber 4 is an airbag provided in the control chamber 12, and the outer chamber wall 40 is the outer wall of the airbag.

[0063] In another embodiment, as shown in Figure 6 , two opposite annular members can be arranged in the control chamber 12, and the expansion chamber 4 is provided between the two annular members. In still another embodiment, as shown in Figure 4 , one annular member can be arranged in the control chamber 12, and the expansion chamber 4 is provided between the annular member and the support disk 1. In this embodiment, there is no limitation on the specific setting manner of the expansion chamber 4, as long as a separate and expandable cavity can be provided in the control chamber 12.

[0064] According to the specific setting manner of the expansion chamber 4, it has one or more expandable walls. As shown in Figure 3 and Figure 4 , in this embodiment, the outer chamber wall 40 of the expansion chamber 4 corresponds to the second end of the polishing disk 2. When the pressure in the expansion chamber 4 increases, the outer chamber wall 40 can expand. When the pressure in the expansion chamber 4 decreases, the outer chamber wall 40 can contract. The outer chamber wall 40 of the expansion chamber 4 and the second end of the polishing disk 2 can be in mutual contact, or of course, there can be a certain distance therebetween.

[0065] When the outer chamber wall 40 of the expansion chamber 4 is in mutual contact with the polishing disk 2, the expansion of the outer chamber wall 40 can push the polishing disk 2 to deform outward. When the outer chamber wall 40 contracts, an additional force is required to drive the polishing disk 2 to deform inward. This force can come from the elastic force inherent in the polishing disk 2 itself, or from a fulcrum member 3 with elastic force, or the polishing disk 2 is pulled to deform inward through other structures with elastic restoring force.

[0066] When there is a certain distance between the outer chamber wall 40 of the expansion chamber 4 and the polishing disk 2, this distance should be less than the maximum expansion degree that the outer chamber wall 40 can achieve, so that the outer chamber wall 40 can push the polishing disk 2 to deform before expanding to the maximum degree.

[0067] In this embodiment, the pressure in the expansion cavity 4 is controlled to cause the outer cavity wall 40 of the expansion cavity 4 to expand and contract. In one implementation, a gas with a certain pressure can be introduced into the expansion cavity 4 to control the pressure in the expansion cavity 4. In another implementation, a liquid with a certain pressure (such as high-pressure oil) can be introduced into the expansion cavity 4 to control the pressure in the expansion cavity 4. In both implementations, an external pressure control source needs to be relied on. For this reason, as Figure 4 and Figure 6 shown, the polishing platen in this embodiment further includes a pressure regulating channel 5, and the pressure regulating channel 5 can be arranged on the support disk 1. The first end of the pressure regulating channel 5 communicates with the expansion cavity 4, and the second end is used to communicate with the pressure control source. The pressure in the expansion cavity 4 is controlled by the pressure control source, so as to control the expansion and contraction of the outer cavity wall 40 of the expansion cavity 4, and further drive the polishing end face to deform by the outer cavity wall 40, and finally adjust the polishing surface shape of the polishing disk 2.

[0068] In this embodiment, the adjustment process of the polishing surface shape is a process in which the pressure in the expansion cavity 4 increases, causing the outer cavity wall 40 to expand outward and push the second end of the polishing disk 2, and under the action of the fulcrum member 3, the polishing end face of the polishing disk 2 deforms. The center point of the deformation of the polishing end face is the center of the circle of the polishing end face. Therefore, in order to smoothly control the deformation of the polishing disk 2, as Figure 3 and Figure 5 shown, the expansion cavity 4 can be arranged at a position close to the edge of the polishing disk 2, and the fulcrum member 3 is arranged at a position relatively close to the center of the circle of the polishing end face. In other words, in this embodiment, the vertical distance between the outer cavity wall 40 of the expansion cavity 4 and the center of the circle of the polishing end face is greater than the vertical distance between the fulcrum member 3 and the center of the circle of the polishing end face.

[0069] Since the polishing disk 2 and the support disk 1 are of annular structure, in order to enable the outer cavity wall 40 of the expansion cavity 4 to uniformly transmit torque to the second end of the polishing disk 2, the expansion cavity 4 is arranged as an annular cylindrical shape in this embodiment, that is, the expansion cavity 4 is arranged around the support disk 1 for one week between the second end of the polishing disk 2 and the support disk 1. When the output load of the pressure control source increases, the pressure in the expansion cavity 4 increases, the deflection of the outer cavity wall 40 of the expansion cavity 4 increases, and the outer cavity wall 40 can uniformly transmit torque to the circumference of the second end of the polishing disk 2, so that the polishing end face can deform uniformly.

[0070] According to the description of the structure of the polishing platen, the expansion cavity 4 is essentially an annular cylindrical space, and both ends of the outer cavity wall 40 are simply supported structures. Therefore, this embodiment provides a corresponding relationship between the output load of the pressure control source and the deflection of the outer side cavity wall 40:

[0071] ;

[0072] Among them, is the deflection of the outer side cavity wall, is the load, is the axial position of each point on the outer cavity wall, is the axial length of the outer cavity wall, is the flexural rigidity of the outer cavity wall, is the wall thickness of the outer cavity wall, , , E is the elastic modulus of the outer cavity wall, is the Poisson's ratio.

[0073] Since the polishing disc 2 and the support disc 1 are connected by the fulcrum member 3, the pressure received by the support disc 1 during the polishing process needs to be transmitted to the polishing disc 2 through the fulcrum member 3. Therefore, the fulcrum member 3 needs to have a certain rigidity. At the same time, during the adjustment of the polishing surface shape, the polishing disc 2 will deform, and the fulcrum member 3 connecting the polishing disc 2 will also deform to a certain extent as the fulcrum. Therefore, the fulcrum member 3 also needs to have a certain elasticity.

[0074] In one embodiment, as shown in Figure 3 and Figure 6 , the fulcrum member 3 includes a first connecting plate 30, a second connecting plate 32 and a fulcrum plate 31. The first connecting plate 30 and the second connecting plate 32 are respectively connected to the first ends of the support disc 1 and the polishing disc 2, and the fulcrum plate 31 is connected between the first connecting plate 30 and the second connecting plate 32. When the outer cavity wall 40 deforms by controlling the pressure in the expansion cavity 4, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 elastically deform under the action of the moment to change the angle between the first connecting plate 30 and the second connecting plate 32.

[0075] Specifically, in this embodiment, the fulcrum member 3 not only plays the role of connecting the polishing disc 2 and the support disc 1, but also plays the role of using its own elastic force to pull the polishing disc 2 to deform inward during the contraction of the outer cavity wall 40 of the expansion cavity 4. The first connecting plate 30 at the upper end of the fulcrum member 3 is fixedly connected to the support disc 1. The first connecting plate 30 is generally a plate-like structure with a relatively large contact area, thereby improving the connection stability between the fulcrum member 3 and the support disc 1. Similarly, the second connecting plate 32 at the lower end of the fulcrum member 3 is fixedly connected to the first end of the polishing disc 2, and the second connecting plate 32 being generally a plate-like structure can also improve the connection stability between the fulcrum member 3 and the polishing disc 2. The first connecting plate 30 and the support disc 1 can be fixed by welding or bolt connection, and the second connecting plate 32 and the polishing disc 2 can be fixed by welding or bolt connection.

[0076] The middle part of the fulcrum member 3 is a fulcrum plate 31, and the upper and lower ends of the fulcrum plate 31 are respectively fixedly connected to the first connecting plate 30 and the second connecting plate 32. In a more specific embodiment, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 can be integrally formed structures, thus having higher structural strength. When the pressure in the expansion cavity 4 increases, the outer cavity wall 40 of the expansion cavity 4 expands and applies a moment to the second end of the polishing disc 2 (that is, applies a moment to the area on the polishing disc 2 above the fulcrum member 3). Under the action of this moment, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 produce elastic deformation of bending outwards, and the polishing end face of the polishing disc 2 (that is, the area on the polishing disc 2 below the fulcrum member 3) produces deformation synchronously to change the polishing surface shape. When the pressure in the expansion cavity 4 decreases, the outer cavity wall 40 of the expansion cavity 4 contracts. At this time, the moment applied by the expansion cavity 4 to the second end of the polishing disc 2 decreases, and the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 produce elastic recovery under the action of their own elastic force, and the polishing end face of the polishing disc 2 produces deformation synchronously and changes the polishing surface shape in the opposite direction.

[0077] In one embodiment, a plurality of fulcrum members 3 can be provided and distributed circumferentially. To make the forces on the support disc 1 and the polishing disc 2 uniform everywhere, it is preferred that the fulcrum members 3 are arranged in a ring shape, that is, the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 are all ring-shaped.

[0078] In a preferred embodiment, as Figure 3 shown, the connection shape of the first connecting plate 30, the second connecting plate 32 and the fulcrum plate 31 is in the shape of an I-beam, so as to provide a relatively stable support connection function.

[0079] To facilitate the elastic bending of the fulcrum plate 31, in this embodiment, grooves 310 are provided on both the inner and outer sides of the fulcrum plate 31, and the grooves 310 can be arc-shaped grooves.

[0080] Since in the present invention, the change of the polishing surface shape is achieved by controlling the pressure change in the expansion cavity 4. When the pressure in the expansion cavity 4 increases, the polishing end face of the polishing disc 2 produces an outward deformation under the action of the outer cavity wall 40 of the expansion cavity 4. When the pressure in the expansion cavity 4 decreases, the polishing end face of the polishing disc 2 needs to produce an inward deformation under the action of its own elastic force or the elastic force of the fulcrum member 3. In other words, in the present invention, the outer cavity wall 40 of the expansion cavity 4 cannot actively drive the polishing end face to deform inwards. Therefore, to increase the adjustment range of the polishing surface shape, in this embodiment, when the pressure in the expansion cavity 4 is normal pressure, the polishing surface shape of the polishing end face is convex inwards and concave outwards. On the basis of this polishing surface shape, when the pressure in the expansion cavity 4 increases, the polishing surface shape can change from convex inwards and concave outwards to flat, and then from flat to concave inwards and convex outwards.

[0081] In one embodiment of the polishing platen, as Figure 3and Figure 4 As shown, the polishing platen further includes a first annular member 9 disposed between the support disk 1 and the second end of the polishing disk 2, and the expansion chamber 4 is located between the first annular member 9 and the support disk 1.

[0082] Specifically, in this embodiment, the first annular member 9 can be sleeved and fixed on the outer ring side of the support disk 1. There is a gap between the inner ring side of the first annular member 9 and the outer ring side of the support disk 1, and this gap is used as the expansion chamber 4. The vertical side wall of the first annular member 9 serves as the outer chamber wall 40. The upper end of the first annular member 9 is sealed with the upper end of the support disk 1, and the lower end of the first annular member 9 is sealed with the lower end of the support disk 1. A pressure adjustment channel 5 is provided on the support disk 1, and the pressure adjustment channel 5 communicates with the expansion chamber 4. An external pressure control source controls the pressure in the expansion chamber 4 through the pressure adjustment channel 5, thereby controlling the expansion and contraction of the outer chamber wall 40.

[0083] To facilitate the sealed connection between the first annular member 9 and the support disk 1, and for the outer chamber wall 40 on the first annular member 9 to generate elastic deformation, in this embodiment, the first annular member 9 includes a first sealing portion 93, a first thin wall portion 95, and a second sealing portion 94 connected in sequence. The expansion chamber 4 is disposed between the first thin wall portion 95 and the support disk 1; the first sealing portion 93 and the second sealing portion 94 are used to seal the expansion chamber 4.

[0084] Specifically, in this embodiment, the first sealing portion 93 includes the plane at the upper end of the first annular member 9, and the second sealing portion 94 includes the plane at the lower end of the first annular member 9. The support disk 1 is provided with edge planes corresponding to the first sealing portion 93 and the second sealing portion 94. After installation, the first sealing portion 93 fits with the edge plane of the upper part of the support disk 1, and the second sealing portion 94 fits with the edge plane of the lower part of the support disk 1 to achieve sealing. To further improve the sealing performance, a sealing ring 13 can be provided between the first sealing portion 93 and the support disk 1. Similarly, a sealing ring 13 can also be provided between the second sealing portion 94 and the support disk 1.

[0085] In the present invention, since the vertical side wall of the first annular member 9 expands to push the polishing disk 2 to deform, the vertical side wall of the first annular member 9 corresponding to the expansion chamber 4 needs to be easily expandable and contractible. For this reason, the first annular member 9 in this embodiment further includes a first thin wall portion 95 located between the first sealing portion 93 and the second sealing portion 94. The expansion chamber 4 is located between the first thin wall portion 95 and the outer ring side of the support disk 1, and the first thin wall portion 95 serves as the outer chamber wall 40 of the expansion chamber 4. The wall of the first thin wall portion 95 is relatively thin, so it is easier to deform when the pressure in the expansion chamber 4 changes. The first sealing portion 93 and the second sealing portion 94, as components that play a sealing role, do not deform during the expansion and contraction of the expansion chamber 4. Therefore, their thickness can be set to be relatively thick to ensure sufficient sealing performance.

[0086] Since the first annular member 9 is sleeved on the support disk 1, in order to achieve sealing by using the first sealing portion 93 and the second sealing portion 94, in this embodiment, the upper end of the first annular member 9 is folded outward to form the first sealing portion 93, and the lower end of the first annular member 9 is folded inward to form the second sealing portion 94; the upper edge of the support disk 1 has an outwardly protruding edge 103, and the first sealing portion 93 is sealed with the lower end surface of the edge 103; the lower edge of the support disk 1 has a mounting groove 102, and the second sealing portion 94 is disposed in the mounting groove 102 and is sealed with the upper end surface of the mounting groove 102.

[0087] Specifically, in this embodiment, the edge 103 on the upper part of the support disk 1 corresponds to and closely fits with the first sealing portion 93 to form a seal, and the second sealing portion 94 is located in the mounting groove 102 on the lower part of the support disk 1. The upper surface of the second sealing portion 94 corresponds to and closely fits with the upper end surface of the mounting groove 102 to form a seal. A sealing ring 13 can be provided between the lower end surface of the first sealing portion 93 and the edge 103 to improve the sealing performance, and a sealing ring 13 can be provided between the upper end surface of the second sealing portion 94 and the mounting groove 102 to improve the sealing performance.

[0088] On the basis of the above embodiment, as Figure 4 shown, in order to support the first annular member 9, a part of the second sealing portion 94 is disposed on the fulcrum member 3, specifically disposed on the first connecting plate 30 of the fulcrum member 3, and the second sealing portion 94 is pressed and fixed in the mounting groove 102 through the first connecting plate 30.

[0089] In the above embodiment, the expansion cavity 4 is located between the first annular member 9 and the support disk 1, and the structural form of the expansion cavity 4 is restricted by the structure of the support disk 1. Therefore, in order to enable the expansion cavity 4 to be set more flexibly, in another embodiment, as Figure 5 and Figure 6 shown, the polishing press plate further includes a second annular member 8, and the second annular member 8 is located between the first annular member 9 and the support disk 1; the expansion cavity 4 is located between the inner ring side of the first annular member 9 and the outer ring side of the second annular member 8.

[0090] Specifically, in this embodiment, the expansion cavity 4 is located between the first annular member 9 and the second annular member 8, and the structural form of the expansion cavity 4 is only restricted by the structures of the first annular member 9 and the second annular member 8. As replaceable parts, different first annular members 9 or second annular members 8 can be replaced to adjust the structure of the expansion cavity 4, making the setting of the expansion cavity 4 more flexible.

[0091] In this embodiment, the first annular member 9 and the second annular member 8 are connected in an outer-inner sleeved manner. There is a certain gap between the vertical side walls of the first annular member 9 and the second annular member 8, and this gap is used as the expansion cavity 4. Therefore, the vertical side wall of the first annular member 9 also serves as the outer cavity wall 40 of the expansion cavity 4. During the process of pressurizing the expansion cavity 4, the second annular member 8 closely adheres to the support disk 1, and the vertical side wall of the first annular member 9, serving as the outer cavity wall 40, expands and applies a moment to the second end of the polishing disk 2.

[0092] Similarly, in this embodiment, it is necessary to make the expansion cavity 4 a sealed cavity. When the first annular member 9 and the second annular member 8 form the expansion cavity 4, the areas of the first annular member 9 and the second annular member 8 outside the gap should be sealed. Specifically, in this embodiment, a groove may be formed on the vertical side wall of the first annular member 9 or the second annular member 8, and the areas outside the groove are mutually adhered to each other, so as to form the expansion cavity 4 by using the gap generated by the groove, and the other areas form a seal after being closely adhered.

[0093] To achieve pressure control of the expansion cavity 4, in this embodiment, a pressure adjustment channel 5 is provided on the second annular member 8, and the pressure adjustment channel 5 is connected to the expansion cavity 4 and the pressure control source. Of course, pressure adjustment channels 5 may also be provided on both the second annular member 8 and the support disk 1 at the same time. The two channels are communicated. The pressure adjustment channel 5 on the second annular member 8 is directly connected to the expansion cavity 4, and the pressure adjustment channel 5 on the support disk 1 is directly connected to the pressure control source. To avoid additional processing of the support disk 1, in this embodiment, it is preferably to provide the pressure adjustment channel 5 only on the second annular member 8.

[0094] Similarly, to achieve sealing of the upper and lower ends of the expansion cavity 4, as Figure 6 shown, in this embodiment, the first annular member 9 includes a third sealing portion 90, a second thin-wall portion 92, and a fourth sealing portion 91 that are sequentially connected. The expansion cavity 4 is provided between the second thin-wall portion 92 and the support disk 1; the third sealing portion 90 and the fourth sealing portion 91 are used to seal the expansion cavity 4.

[0095] Specifically, in this embodiment, the third sealing portion 90 includes the plane at the upper end of the first annular member 9, and the fourth sealing portion 91 includes the plane at the lower end of the first annular member 9. The third sealing portion 90 is closely adhered to the upper end of the second annular member 8, and the second sealing portion 94 is closely adhered to the lower end of the second annular member 8 to achieve sealing. To further improve the sealing performance, a sealing ring 13 may be provided between the third sealing portion 90 and the upper end of the second annular member 8. Similarly, a sealing ring 13 may also be provided between the fourth sealing portion 91 and the lower end of the second annular member 8.

[0096] In the present invention, since the deformation of the polishing pad 2 is promoted by the expansion deformation of the first annular member 9, the vertical side wall of the first annular member 9 corresponding to the expansion cavity 4 needs to be easily expandable and contractible. For this purpose, the first annular member 9 in this embodiment further includes a second thin-wall portion 92 located between the third sealing portion 90 and the fourth sealing portion 91. The second thin-wall portion 92 is attached to the inner ring side of the first annular member 9. The expansion cavity 4 is located between the second thin-wall portion 92 and the outer ring side of the second annular member 8. The first thin-wall portion 95 serves as the outer cavity wall 40 of the expansion cavity 4. The wall of the first thin-wall portion 95 is thinner, so it is easier to deform when the pressure in the expansion cavity 4 changes. The third sealing portion 90 and the fourth sealing portion 91 are components that play a sealing role and do not deform during the expansion and contraction of the expansion cavity 4. Therefore, their thickness can be set to be relatively thick to ensure sufficient sealing performance.

[0097] In addition, since the wall of the second thin-wall portion 92 is thin, in order to enable a gap to be formed between the second thin-wall portion 92 and the second annular member 8 as the expansion cavity 4, in this embodiment, it is preferably to form a groove corresponding to the second thin-wall portion 92 on the outer ring side of the second annular member 8, so as to form a gap between the groove and the second thin-wall portion 92.

[0098] In the present invention, the first annular member 9 and the second annular member 8 are in a sleeved connection relationship. When installing, the first annular member 9 can be sleeved on the outside of the second annular member 8. On this basis, in order to use the third sealing portion 90 and the fourth sealing portion 91 to achieve sealing, as Figure 6 shown, in this embodiment, the upper end of the first annular member 9 is turned outward to form the third sealing portion 90, and the lower end of the first annular member 9 is turned inward to form the fourth sealing portion 91. The outer ring side of the second annular member 8 has a protruding fifth sealing portion 81. The third sealing portion 90 and the fifth sealing portion 81 are attached and sealed; the outer ring side of the support disk 1 has a first connection protrusion 100. The fourth sealing portion 91 is provided on the first connection protrusion 100. The fourth sealing portion 91 is attached to and sealed with the lower end surface of the second annular member 8.

[0099] Specifically, in this embodiment, the fifth sealing portion 81 corresponds to and is closely attached to the third sealing portion 90 to form a seal. A sealing ring 13 can be provided between the fifth sealing portion 81 and the third sealing portion 90 to increase the sealing performance. The lower end surface of the second annular member 8 corresponds to and is closely attached to the fourth sealing portion 91 to form a seal. A sealing ring 13 can be provided between the lower end surface of the second annular member 8 and the fourth sealing portion 91 to increase the sealing performance. At the same time, the lower surface of the fourth sealing portion 91 corresponds to and is closely attached to the first connection protrusion 100. The first connection protrusion 100 serves as the support basis of the first annular member 9.

[0100] Since the polishing disc 2 is located outside the first annular member 9, after the third sealing portion 90 is formed by folding the upper end of the first annular member 9 outward, in order to make the second thin wall portion 92 on the first annular member 9 fit with the polishing disc 2, as Figure 6 shown, in this embodiment, a second connecting protrusion 200 is provided on the inner ring side of the polishing disc 2. The second connecting protrusion 200 protrudes toward the second thin wall portion 92, and the second connecting protrusion 200 fits with the second thin wall portion 92. To increase the force-bearing area, the dimension of the second connecting protrusion 200 in the vertical direction is close to the dimension of the second thin wall portion 92.

[0101] To avoid interference during the deformation of the polishing disc 2, in this embodiment, there is a gap between the upper end surface of the second connecting protrusion 200 and the lower end surface of the third sealing portion 90, and between the lower end surface of the second connecting protrusion 200 and the upper end surface of the first connecting protrusion 100, so as to provide a movement space for the second connecting protrusion 200 through the gap.

[0102] In other words, in this embodiment, during the deformation of the polishing disc 2, the second connecting protrusion 200 will deflect at a certain angle. During the deflection of the second connecting protrusion 200, the upper end of the second connecting protrusion 200 does not contact the third sealing portion 90, and the lower end of the second connecting protrusion 200 does not contact the first connecting protrusion 100, so as to avoid interference with the deflection of the second connecting protrusion 200, and further avoid interference with the deformation of the polishing disc 2.

[0103] To facilitate the installation of the fulcrum member 3, in this embodiment, a third connecting protrusion 201 is provided on the inner ring side of the polishing disc 2. The third connecting protrusion 201 is located below the first connecting protrusion 100;

[0104] The upper end of the fulcrum member 3 is connected to the lower end surface of the first connecting protrusion 100, and the lower end of the fulcrum member 3 is connected to the third connecting protrusion 201.

[0105] Specifically, in this embodiment, the first connecting protrusion 100 corresponds to the third connecting protrusion 201, and the fulcrum member 3 is installed between the first connecting protrusion 100 and the third connecting protrusion 201. Specifically, the first connecting plate 30 of the fulcrum member 3 is fixedly connected to the first connecting protrusion 100, and the second connecting plate 32 of the fulcrum member 3 is fixedly connected to the second connecting protrusion 200. It can be understood that the structure of the third connecting protrusion 201 should also satisfy that it does not interfere with the support disc 1 during the deformation of the polishing disc 2.

[0106] As Figure 6As shown in the figure, for the convenience of positioning the first annular member 9, in this embodiment, a first limiting portion 80 is provided on the outer ring side of the support disk 1, and a second limiting portion 101 is provided on the inner ring side of the second annular member 8. The second limiting portion 101 is installed on the first limiting portion 80 so that the first limiting portion 80 limits the vertical direction of the second limiting portion 101.

[0107] Specifically, the second annular member 8 is sleeved on the support disk 1, and the vertical position of the second annular member 8 is limited by the first limiting portion 80 and the second limiting portion 101 abutting against each other up and down. In one implementation manner, the first limiting portion 80 includes a limiting groove 310, and the second limiting portion 101 includes a limiting protrusion. The limiting protrusion is lapped in the limiting groove 310. In this implementation manner, the limiting groove 310 is an annular groove formed on the upper edge of the support disk 1, and the limiting protrusion is an annular protrusion formed on the inner ring side of the second annular member 8. After the second annular member 8 is sleeved on the support disk 1, the limiting protrusion is installed in the limiting groove 310, thereby limiting the vertical position of the second annular member 8.

[0108] To prevent the polishing disk 2 from falling off vertically, as Figure 5 shown, the polishing platen in this embodiment further includes an anti-falling disk 6. The anti-falling disk 6 is connected to the polishing disk 2 through a connecting member, and the connecting member limits the vertical direction of the polishing disk 2.

[0109] Specifically, in this embodiment, the anti-falling disk 6 is arranged at the upper end of the polishing disk 2. The connecting member can be a connecting bolt. After the anti-falling disk 6 is connected to the polishing disk 2 through the connecting member, it can deform with the polishing disk 2.

[0110] As Figure 6 shown, when the polishing platen includes the first annular member 9 and the second annular member 8, to prevent the deformation of the polishing disk 2 from being interfered, a receiving groove 60 is provided at the lower end of the anti-falling disk 6. The upper part of the first annular member 9 is located in the receiving groove 60, and there is a gap between the upper part of the first annular member 9 and the receiving groove 60 in the horizontal and vertical directions, so that the anti-falling disk 6 does not interfere with the first annular member 9 when deforming with the polishing disk 2.

[0111] According to another aspect of the present invention, a semiconductor polishing device is provided, including the above-mentioned polishing platen.

[0112] The above are only the preferred embodiments of the present invention and are not used to limit the present invention. For those skilled in the art, the present invention can have various changes and modifications. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A polishing platen, characterized in that, Comprising: A support disk, a polishing disk, and a fulcrum member; A concave structure is formed in the middle of the polishing disk, the lower part of the support disk extends into the concave structure, and both ends of the fulcrum member are fixedly connected to the support disk and the first end of the polishing disk respectively; an expansion cavity is provided between the support disk and the second end of the polishing disk away from the polishing end face, and the fulcrum member is located between the polishing end face and the second end of the polishing disk; By controlling the pressure in the expansion cavity, the outer cavity wall deforms, so that the outer cavity wall transmits a torque through the second end of the polishing disk, and the second end of the polishing disk transmits a torque to the polishing end face of the polishing disk through the fulcrum member, and under the action of the torque, the polishing surface shape of the polishing disk deforms.

2. The polishing platen according to claim 1, wherein, The expansion cavity is in a ring-shaped cylindrical shape.

3. The polishing platen according to claim 1, wherein The fulcrum member includes a first connecting plate, a second connecting plate, and a fulcrum plate. The first connecting plate and the second connecting plate are respectively connected to the support disk and the first end of the polishing disk, and the fulcrum plate is connected between the first connecting plate and the second connecting plate; When the outer cavity wall deforms by controlling the pressure in the expansion cavity, the first connecting plate, the second connecting plate, and the fulcrum plate generate elastic deformation under the action of the torque to change the angle between the first connecting plate and the second connecting plate.

4. The polishing platen according to claim 3, wherein, The first connecting plate, the second connecting plate, and the fulcrum plate are all annular.

5. The polishing platen according to claim 3, wherein, The connection shape of the first connecting plate, the second connecting plate, and the fulcrum plate is in the shape of an I-beam.

6. The polishing platen according to claim 1, wherein When the polishing surface shape of the polishing disk is not deformed, its shape is convex inside and concave outside.

7. The polishing platen according to claim 1, wherein The polishing pressure disk further includes a first annular member, the first annular member is arranged between the support disk and the second end of the polishing disk, and the expansion cavity is located between the first annular member and the support disk.

8. The polishing platen according to claim 7, characterized in that, The first annular member includes a first sealing portion, a first thin-wall portion, and a second sealing portion that are connected in sequence, and the expansion cavity is arranged between the first thin-wall portion and the support disk; The first sealing portion and the second sealing portion are used to seal the expansion cavity.

9. The polishing platen according to claim 8, wherein, The upper end of the first annular member is turned outward to form the first sealing portion, and the lower end of the first annular member is turned inward to form the second sealing portion; The upper edge of the support disk has an outwardly protruding edge, and the first sealing portion is sealed with the lower end surface of the edge; The lower edge of the support disk has a mounting groove, and the second sealing portion is arranged in the mounting groove and sealed with the upper end surface of the mounting groove.

10. The polishing platen according to claim 7, wherein The polishing pressure disk further includes a second annular member, and the second annular member is located between the first annular member and the support disk; The expansion cavity is located between the inner ring side of the first annular member and the outer ring side of the second annular member.

11. The polishing platen according to claim 10, wherein, The first annular member includes a third sealing portion, a second thin-wall portion, and a fourth sealing portion that are connected in sequence, and the expansion cavity is arranged between the second thin-wall portion and the support disk; The third sealing portion and the fourth sealing portion are used to seal the expansion cavity.

12. The polishing platen according to claim 11, wherein, The outer ring side of the second annular member has a protruding fifth sealing portion, and the third sealing portion and the fifth sealing portion are attached and sealed to each other; The outer ring side of the support disk has a first connection protrusion, and the fourth sealing portion is provided on the first connection protrusion. The fourth sealing portion is in close contact with and sealingly connected to the lower end surface of the second annular member.

13. The polishing platen according to claim 12, wherein The inner ring side of the polishing disk is provided with a second connection protrusion protruding towards the first annular member, and the second connection protrusion is in close contact with the second thin wall portion.

14. The polishing platen according to claim 13, wherein, There is a gap between the upper end surface of the second connection protrusion and the lower end surface of the third sealing portion, and between the lower end surface of the second connection protrusion and the upper end surface of the first connection protrusion, and the movement space of the second connection protrusion is provided through the gap.

15. The polishing platen according to claim 10, characterized in that, The outer ring side of the support disk is provided with a first limiting portion, and the inner ring side of the second annular member is provided with a second limiting portion. The second limiting portion is installed on the first limiting portion to limit the vertical movement of the second limiting portion by the first limiting portion.

16. The polishing platen according to claim 15, wherein, The first limiting portion includes a limiting groove, and the second limiting portion includes a limiting protrusion. The limiting protrusion is installed in the limiting groove.

17. The polishing platen according to claim 1, characterized in that, The polishing platen further includes a pressure regulating channel. The first end of the pressure regulating channel communicates with the expansion chamber, and the second end is used to communicate with a pressure control source to control the pressure in the expansion chamber through the pressure control source.

18. A polishing device, characterized in that, Including the polishing platen according to any one of claims 1 to 17.

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