Electrostatic chuck surface pattern forming equipment and forming method

Abstract

The invention provides electrostatic chuck surface pattern forming equipment and a forming method. The electrostatic chuck surface pattern forming equipment comprises a reaction tank, a liquid conveying device, a supporting structure and a heating device. The supporting structure is arranged in the reaction tank, the ceramic plate placed in the reaction tank is supported through the supporting structure, and protective films are attached to the positions, not needing to be corroded, of the surface of the ceramic plate; the liquid conveying device conveys and sucks corrosive liquid into the reaction tank; after the liquid conveying device conveys the corrosive liquid into the reaction tank, the heating device can heat the corrosive liquid in the reaction tank so as to improve the corrosion efficiency of the corrosive liquid on the ceramic plate. According to the method, the ceramic plate is corroded through the corrosive liquid to form the ceramic plate end face pattern, so that the removal thickness of the ceramic plate is uniform, and damage and corner chipping of the ceramic plate cannot be caused.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor equipment, in particular to an electrostatic chuck surface pattern forming device and an electrostatic chuck surface pattern forming method. Background Art

[0002] Electrostatic chucks are used in semiconductor processes to transport objects such as wafers, masks, and glass. They use electrostatic adsorption, which causes less damage to the wafer than mechanical clamping, and are therefore widely used.

[0003] During electrostatic chuck manufacturing, the surface of the ceramic plate must be patterned as needed. Existing techniques typically employ sandblasting or thermal spraying to create these patterns. Specifically, thermal spraying involves laminating a perforated mask to the surface of the ceramic plate. Molten material is then sprayed through the holes in the mask onto the surface of the ceramic plate, forming raised bumps. These numerous bumps form the pattern, but thermal spraying can create poor surface adhesion and easily peel off. The boss formed by the sandblasting method can avoid falling off. The sandblasting method is to apply a sandblasting film on the ceramic plate, and cut the outer contour of the area on the sandblasting film corresponding to the need to form the boss, uncover the sandblasting film applied except the boss area, and retain the sandblasting film above the area where the boss is required to be formed; then the surface of the ceramic plate is sandblasted, and the sandblasting operation is performed on the remaining areas on the surface of the ceramic plate except for the area where the sandblasting film is applied; after the sandblasting is completed, the sandblasting film applied on the boss area is removed, thereby forming a large number of bosses, and the large number of bosses form a pattern, but the sandblasting process removes uneven thickness and is prone to damage and chipping of the formed electrostatic chuck. Summary of the Invention

[0004] In view of the deficiencies in the prior art, the present invention provides an electrostatic chuck surface pattern forming device and forming method, which can solve or at least alleviate one or more of the above-mentioned problems and other problems in the prior art.

[0005] The present invention provides an electrostatic chuck surface pattern forming device, comprising:

[0006] reaction tank;

[0007] a liquid delivery device, used for delivering and sucking the corrosive liquid into the reaction tank;

[0008] A supporting structure is provided in the reaction tank and is used to support the ceramic plate placed in the reaction tank, and a protective film is applied to the surfaces of the ceramic plate that do not need to be corroded; and

[0009] The heating device is used to heat the corrosive liquid in the reaction tank to improve its corrosion efficiency on the ceramic plate.

[0010] Preferably, it also includes:

[0011] More than one airbag, wherein the outer peripheral wall of the airbag can be in contact with the entire inner peripheral wall of the ejection hole;

[0012] One or more support rods, each of which is connected to the corresponding airbag and passes through the corresponding airbag, and each of which can pass through an ejection hole of the ceramic plate; and

[0013] A gas delivery device is used to inflate and suction the airbag.

[0014] Preferably, the upper end of the support rod is provided with an axial vent hole; the side wall of the support rod is provided with an air hole connected to the air hole; the air hole is connected to the inner cavity of the airbag; and the gas delivery device is used to inflate and inhale air into the air hole.

[0015] Preferably, it also includes:

[0016] One or more positioning seats, each of which is connected to the bottom of the reaction tank and has a first positioning hole that is clearance-matched with the lower end of the support rod; and

[0017] The upper positioning structure is used to limit the horizontal movement of the upper end of the support rod when the support rod passes through the ejection hole of the ceramic plate.

[0018] Preferably, the support structure comprises:

[0019] A plurality of support seats connected to the bottom of the reaction tank, each support seat having a support groove; and

[0020] A plurality of supporting balls are rotatably arranged in the supporting groove, and the supporting balls are used to support the lower end of the supporting ceramic plate.

[0021] Preferably, a plurality of vertical mounting grooves are provided on the inner wall of the reaction tank;

[0022] The upper fixing mechanism includes a support plate; a plurality of sliding protrusions are connected to the outer periphery of the support plate; when the support plate is placed in the reaction tank, the sliding protrusions can slide vertically with the corresponding mounting grooves; the sliding protrusions can abut against the inner wall of the lower end of the mounting groove; more than one limiting hole is provided on the support plate; a limiting cylinder is connected to the outer periphery of the support rod; when the support rod passes through the corresponding limiting hole, the outer wall of the limiting cylinder is clearance-matched with the limiting hole.

[0023] Preferably, the opening end of the positioning hole gradually expands outward; the lower end of the support rod is conical; the lower end of the limiting cylinder is connected to a coaxial guide cone; and the guide cone is connected to the support rod.

[0024] Preferably, a limiting ring is externally mounted on the limiting cylinder; the limiting ring can abut against the upper end of the support plate.

[0025] Preferably, the outer contour of the airbag is cylindrical; the airbag is coaxial with the support rod; and the diameters of both ends of the airbag are larger than the diameter of the middle thereof.

[0026] The present invention provides a method for forming a surface pattern of an electrostatic chuck, which uses the above-mentioned electrostatic chuck surface pattern forming device, including the following steps:

[0027] S1. Apply protective film to the surface of ceramic plate according to design requirements;

[0028] S2. Perform anti-corrosion protection treatment on the ejection holes of the ceramic plate;

[0029] S3, placing the ceramic plate after the anti-corrosion protection treatment into a reaction tank, and adding a corrosive solution into the reaction tank, so that the ceramic plate is submerged in the corrosive solution and corroded for 2-3 hours;

[0030] S4, taking the ceramic plate out of the reaction tank and cleaning the surface to remove the adhered corrosive liquid;

[0031] S5. Drying the cleaned ceramic plate to obtain a ceramic plate with a completed surface pattern.

[0032] Compared with the prior art, the present invention has the following beneficial effects:

[0033] In the technology of the present invention, the ceramic plate is corroded by the corrosive liquid to form the ceramic plate end surface pattern, so that the thickness of the ceramic plate is removed evenly without causing damage to the ceramic plate and chipping of the corners. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the following briefly describes the drawings required for the specific embodiments or the description of the prior art. Similar elements or parts are generally identified by similar reference numerals throughout the drawings. Elements or parts in the drawings are not necessarily drawn to scale.

[0035] Figure 1 A perspective view of an electrostatic chuck surface pattern forming device according to an embodiment of the present invention;

[0036] Figure 2 for Figure 1 Another stereogram of

[0037] Figure 3 for Figure 1 Schematic diagram of the internal structure;

[0038] Figure 4 for Figure 1 sectional view of

[0039] Figure 5 for Figure 4 Enlarged schematic diagram of S.

[0040] Reference numerals:

[0041] 10. Reaction tank; 11. Installation tank;

[0042] 20. Support structure; 21. Support seat; 22. Support ball;

[0043] 30. Ceramic plate; 31. Ejection hole;

[0044] 40. Airbag; 41. Support rod; 42. Vent hole; 43. Air hole; 44. Stopper cylinder; 45. Guide cone; 46. Stopper ring;

[0045] 50. Positioning seat; 51. Positioning hole;

[0046] 60. Upper positioning structure; 61. Support plate; 611. Limiting hole; 62. Sliding protrusion. DETAILED DESCRIPTION

[0047] The following embodiments of the technical solution of the present invention will be described in detail with reference to the accompanying drawings. The following embodiments are only used to more clearly illustrate the technical solution of the present invention and are therefore only examples and are not intended to limit the scope of protection of the present invention.

[0048] It should be noted that, unless otherwise specified, the technical or scientific terms used in this application should have the common meanings understood by those skilled in the art to which the present invention belongs.

[0049] In the description of this application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like to indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0050] In addition, the terms "first," "second," etc. are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the technical features indicated. In the description of the present invention, "plurality" means more than two, unless otherwise specifically defined.

[0051] In this application, unless otherwise expressly specified or limited, terms such as "mounted," "connected," "connect," and "fixed" should be understood in a broad sense. For example, they may refer to fixed or detachable connections, or integration; mechanical or electrical connections; direct or indirect connections through an intermediate medium; and internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on specific circumstances.

[0052] In this application, unless otherwise expressly specified or limited, when a first feature is "above" or "below" a second feature, it may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Furthermore, when a first feature is "above," "above," or "above" a second feature, it may mean that the first feature is directly above or diagonally above the second feature, or simply means that the first feature is at a higher level than the second feature. When a first feature is "below," "below," or "below" a second feature, it may mean that the first feature is directly below or diagonally below the second feature, or simply means that the first feature is at a lower level than the second feature.

[0053] See also Figures 1 to 5 This embodiment provides an electrostatic chuck surface pattern forming device, which includes a reaction tank 10, a liquid delivery device (not shown), a support structure 20 and a heating device (not shown).

[0054] The reaction tank 10 is a container with an open top, and the liquid conveying device is used to convey and suck the corrosive liquid into the reaction tank 10. The corrosive liquid can be a mixed solution of hydrofluoric acid and nitric acid in a certain proportion, which has a good corrosive effect on the electrostatic chuck made of ceramic material. The liquid conveying device adopts the existing technology and will not be described in detail here. The support structure 20 is arranged in the reaction tank 10, and the support structure 20 is used to support the ceramic plate 30 placed in the reaction tank 10, and the surface of the ceramic plate 30 that does not need to be corroded is affixed with an anti-corrosion and anti-permeation protective film. Specifically, the ceramic plate 30 is disc-shaped, and its upper end surface needs to form a boss, and its outer peripheral wall and its lower end surface are all affixed with an anti-corrosion and anti-permeation protective film. The heating device is used to heat the corrosive liquid in the reaction tank 10 to improve its corrosion efficiency on the ceramic plate 30. Specifically, the contact position between the heating device and the corrosive liquid is made of anti-corrosion material, and the heating device adopts the existing technology.

[0055] In this embodiment, a ceramic plate 30, coated with an anti-corrosion and anti-permeation protective film on the exterior where chemical etching is not required, is placed on the support structure 20 within the reaction tank 10, and the ceramic plate 30 is etched by an etching solution. The etching solution etches the ceramic plate 30 to form a pattern on the end surface of the ceramic plate 30, thereby ensuring a uniform thickness of the ceramic plate 30 and preventing damage or chipping of the ceramic plate 30.

[0056] In one embodiment, the ceramic plate 30 is provided with one or more ejection holes 31 , and the formed electrostatic chuck is provided with ejector pins at the ejection holes 31 , and the ejector pins are used to eject the material on the electrostatic chuck.

[0057] The electrostatic chuck surface pattern forming device further includes an air bag 40, a support rod 41 and a gas delivery device.

[0058] There are more than one airbag 40, and the number of the airbag 40 is the same as the number of the ejection holes 31. After the airbag 40 is inflated, the outer peripheral wall thereof can fully fit with the entire inner peripheral wall of the ejection hole 31.

[0059] There are more than one support rod 41, and the support rod 41 is connected to the corresponding airbag 40. The support rod 41 passes through the corresponding airbag 40, and the support rod 41 can pass through the ejection hole 31 of the ceramic plate 30, so that the middle part of the airbag 40 is located in the ejection hole 31. The gas delivery device is used to inflate and inhale the airbag 40. The gas delivery device adopts the existing technology and will not be described here. In addition, compared with the combination of the support rod 41 and the airbag 40, it is also possible to adopt a structure in which the support rod 41 is outsourced to an electroactive polymer layer, and the electroactive polymer layer is outsourced to a protective film. By energizing and de-energizing the electroactive polymer, the lateral volume of the electroactive polymer layer is increased or reduced. When the lateral volume of the electroactive polymer layer increases, the protective film outsourced to the electroactive polymer is pressed against the inner wall of the ejection hole 31, thereby protecting the inner wall of the ejection hole 31.

[0060] In this embodiment, it has been found in practice that ejection hole 31 is severely damaged by the corrosive fluid, so it also requires protection. After the support rod 41 and airbag 40 are passed through the ejection hole 31, the airbag 40 is inflated using a gas delivery device. After the airbag 40 is inflated, its outer wall is fully aligned with the ejection hole 31, preventing external corrosive fluid from entering between the airbag 40 and the ejection hole 31, thereby protecting the inner wall of the ejection hole 31 from corrosion. After processing is completed, the corrosive fluid can be removed, and the gas delivery device extracts gas from the airbag 40. The support rod 41 is pulled out, and the completed electrostatic chuck (ceramic plate 30) is removed.

[0061] In one embodiment, the upper end of the support rod 41 is provided with an axial air vent 42; the side wall of the support rod 41 is provided with an air hole 43 connected to the air vent 42; the air hole 43 is connected to the inner cavity of the airbag 40; and the gas delivery device is used to inflate and inhale air into the air hole 42.

[0062] In this embodiment, the support rod 41 is used as a bridge to inflate and inhale the airbag 40, and the structure is relatively compact.

[0063] In one embodiment, the electrostatic chuck surface pattern forming apparatus further includes a positioning seat 50 and an upper positioning structure 60 .

[0064] At least one positioning seat 50 is provided, and the number of positioning seats 50 is the same as the number of support rods 41. The positioning seat 50 is connected to the bottom of the reaction tank 10, and the positioning seat 50 is provided with a first positioning hole 51 that is clearance-matched with the lower end of the support rod 41. When the support rod 41 passes through the ejection hole 31 of the ceramic plate 30, the upper fixing structure is used to limit the horizontal movement of the upper end of the support rod 41. Specifically, the upper fixing structure is used to restrain the upper end of the support rod 41 so that the upper end of the support rod 41 cannot move in the horizontal direction.

[0065] In this embodiment, the ceramic plate 30 is placed on the support structure 20, and the ejection hole 31 on the ceramic plate 30 is roughly aligned with the positioning seat 50. Then, after the support rod 41 and the airbag 40 are passed through the ejection hole 31 on the ceramic plate 30, the lower end of the support rod 41 is inserted into the first positioning hole 51; then the upper positioning mechanism limits the upper end of the support rod 41, and the gas delivery device inflates the airbag 40 through the support rod 41. At this time, the position of the ceramic plate 30 can be slightly adjusted manually so that the axis of the strip-shaped airbag 40 coincides with the axis of the ejection hole 31, so that the outer wall of the inflated airbag 40 is fully fitted with the inner wall of the ejection hole 31, thereby preventing corrosive liquid from entering between the airbag 40 and the ejection hole 31, protecting the ejection hole 31 from corrosion.

[0066] In one embodiment, the support structure 20 includes a plurality of support seats 21 and a plurality of support balls 22 .

[0067] The support base 21 is connected to the bottom of the reaction tank 10 , and a support groove is formed on the support base 21 . The support ball 22 is rotatably arranged in the support groove, and the support ball 22 is used to support the lower end of the ceramic plate 30 .

[0068] In this embodiment, when the airbag 40 is located in the ejection hole 31 of the ceramic plate 30 and is inflated, the support rod 41 is restricted in the horizontal direction and cannot move. As the airbag 40 expands, since the ceramic plate is placed on the support ball 22, the expanded airbag 40 corrects the deviated ceramic plate 30, so that the outer wall of the airbag 40 is fully fitted with the inner wall of the ejection hole 31 of the ceramic plate 30.

[0069] In one embodiment, a plurality of vertical mounting grooves 11 are provided on the inner wall of the reaction tank 10;

[0070] The upper fixing mechanism includes a support plate 61; a plurality of sliding protrusions 62 are connected to the outer periphery of the support plate 61; when the support plate 61 is placed in the reaction tank 10, the sliding protrusions 62 can slide vertically with the corresponding mounting slots 11; the sliding protrusions 62 can abut against the lower inner wall of the mounting slot 11; the support plate 61 is provided with one or more limiting holes 611; the support rod 41 is outer-mounted with a limiting cylinder 44; when the support rod 41 passes through the corresponding limiting hole 611 and is inserted into the positioning hole 51, the outer wall of the limiting cylinder 44 is clearance-fitted with the limiting hole 611. The limiting hole 611 and the positioning hole 51 are coaxial.

[0071] In this embodiment, the size of the retaining hole 611 is larger than the diameter of the support rod 41 to facilitate the passage of the airbag 40. The retaining cylinder 44 stabilizes the upper end of the support rod 41 after being restrained. When the airbag 40 expands to correct the deviation of the ceramic plate 30, the positioning seat 50 and the support plate 61 keep the support rod 41 stationary.

[0072] In one embodiment, the opening end of the positioning hole 51 gradually expands outward; the lower end of the support rod 41 is conical; the lower end of the limiting cylinder 44 is connected to a coaxial guide cone 45; the guide cone 45 is connected to the support rod 41.

[0073] In this embodiment, since the lower end of the support rod 41 is conical and the upper end of the positioning hole 51 is expanded outward, the lower end of the support rod 41 is more easily inserted into the positioning hole 51. Similarly, the guide cone 45 at the lower end of the limiting cylinder 44 makes it easier for the limiting cylinder 44 to enter the limiting hole 611.

[0074] In one embodiment, a limiting ring 46 is externally mounted on the limiting cylinder 44 ; the limiting ring 46 can abut against the upper end of the support plate 61 .

[0075] In this embodiment, since the ceramic plate 30 is manually placed on the support ball 22, there is a certain deviation between the ejection hole 31 on the ceramic plate 30 and the limiting hole 611. After the lower end of the support rod 41 passes through the limiting hole 611, it is difficult to insert into the ejection hole 31. Therefore, after the ceramic plate 30 is placed on the support ball 22, multiple support rods 41 can be inserted into the limiting holes 611 of the support plate 61. Due to the presence of the limiting ring 46, the support rods 41 will not be separated from the support plate 61. Then, the support plate 61 is placed into the reaction tank 10. At this time, the position of the ceramic plate 30 is adjusted so that the lower ends of the multiple support rods 41 enter the limiting holes 611 one by one.

[0076] In one embodiment, the outer contour of the airbag 40 is cylindrical; the airbag 40 is coaxial with the support rod 41; the diameters at both ends of the airbag 40 are larger than the diameter in the middle. Specifically, the outer diameters at both ends of the airbag 40 are larger than the outer diameter in the middle.

[0077] In this embodiment, the airbag 40, when inflated, protects the inner wall of the ejection hole 31. The outer diameters of the airbag 40 at both ends are larger than the outer diameter of the middle portion. This allows the ends of the airbag 40 located on both sides of the ceramic plate 30 to expand outward when the airbag 40 inflates, thereby protecting the opening of the ejection hole 31.

[0078] This embodiment also provides a method for forming a pattern on the surface of an electrostatic chuck, using the above-mentioned electrostatic chuck surface pattern forming device, comprising the following steps:

[0079] S1. Apply a protective film to the surface of the ceramic plate according to the design requirements. Specifically, apply the protective film to the lower end surface, outer peripheral wall, and upper end surface of the circular ceramic plate where the boss needs to be formed. The protective film has anti-penetration and anti-corrosion effects.

[0080] S2. Performing anti-corrosion protection treatment on the ejection hole 31 of the ceramic plate. Specifically, an air bag 40 placed in the ejection hole is inflated and fits against the inner wall of the ejection hole 31 to protect the inner wall of the ejection hole 31.

[0081] S3. Place the anti-corrosion treated ceramic plate into the reaction tank 10 and add a corrosive solution to the reaction tank 10, submerging the ceramic plate 30 in the corrosive solution and corroding for 2-3 hours. In addition, a heating device may be used to heat the corrosive solution in the reaction tank 10 to 30-35° C. to improve the corrosion efficiency.

[0082] S4, take the ceramic plate 30 out of the reaction tank, and clean the surface to remove the adhered corrosive liquid. At this time, the many bosses on the upper end of the ceramic plate 30 together form a pattern.

[0083] S5. Drying the cleaned ceramic plate 30 to obtain a ceramic plate 30 with a finished surface pattern (ie, an electrostatic chuck).

[0084] In the description of the present invention, a large number of specific details are described. However, it is understood that embodiments of the present invention can be practiced without these specific details. In some instances, well-known methods, structures, and techniques are not shown in detail so as not to obscure the understanding of this description.

[0085] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or make equivalent replacements for some or all of the technical features therein. These modifications or replacements do not deviate the essence of the corresponding technical solutions from the scope of the technical solutions of the embodiments of the present invention, and they should all be included in the scope of the claims and description of the present invention.

Claims

1. An electrostatic chuck surface pattern forming device, characterized in that: include: Reaction tank (10); A liquid conveying device, used for conveying and sucking the corrosive liquid into the reaction tank (10); A support structure (20) is arranged in the reaction tank (10) and is used to support a ceramic plate (30) placed in the reaction tank (10), and a protective film is applied to the surface of the ceramic plate (30) where no corrosion is required; and The heating device is used to heat the etching liquid in the reaction tank (10) to improve the etching efficiency of the ceramic plate (30).

2. An electrostatic chuck surface pattern forming device as claimed in claim 1, characterized in that: Also includes: More than one airbag (40), the outer peripheral wall of the airbag (40) can be in contact with the entire inner peripheral wall of the ejection hole (31); One or more support rods (41), the support rods (41) being connected to the corresponding airbags (40), the support rods (41) passing through the corresponding airbags (40), and the support rods (41) being able to pass through the ejection holes (31) of the ceramic plate (30); and A gas delivery device is used to inflate and suction the air bag (40).

3. An electrostatic chuck surface pattern forming device as claimed in claim 2, characterized in that: The upper end of the support rod (41) is provided with an air vent (42) along its axial direction; the side wall of the support rod (41) is provided with an air hole (43) connected to the air vent (42); the air hole (43) is connected to the inner cavity of the airbag (40); and the gas delivery device is used to inflate and inhale air into the air vent (42).

4. An electrostatic chuck surface pattern forming device as claimed in claim 3, characterized in that: Also includes: One or more positioning seats (50), the positioning seats (50) being connected to the bottom of the reaction tank (10), and the positioning seats (50) being provided with a first positioning hole (51) which is gap-matched with the lower end of the support rod (41); as well as The upper positioning structure (60) is used to limit the horizontal movement of the upper end of the support rod (41) when the support rod (41) passes through the ejection hole (31) of the ceramic plate (30).

5. An electrostatic chuck surface pattern forming device as claimed in claim 4, characterized in that: The support structure (20) comprises: A plurality of support seats (21) connected to the bottom of the reaction tank (10), wherein the support seats (21) are provided with support grooves; and A plurality of supporting balls (22) are rotatably arranged in the supporting grooves, and the supporting balls (22) are used to support the lower end of the supporting ceramic plate (30).

6. An electrostatic chuck surface pattern forming device as claimed in claim 5, characterized in that: A plurality of vertical mounting grooves (11) are provided on the inner wall of the reaction tank (10); The upper fixing mechanism comprises a support plate (61); a plurality of sliding protrusions (62) are connected to the outer periphery of the support plate (61); when the support plate (61) is placed in the reaction tank (10), the sliding protrusions (62) can slide vertically with the corresponding mounting groove (11); the sliding protrusions (62) can abut against the inner wall of the lower end of the mounting groove (11); one or more limiting holes (611) are provided on the support plate (61); a limiting tube (44) is connected to the outer periphery of the support rod (41); when the support rod (41) passes through the corresponding limiting hole (611), the outer wall of the limiting tube (44) is clearance-matched with the limiting hole (611).

7. An electrostatic chuck surface pattern forming device as claimed in claim 6, characterized in that: The opening end of the positioning hole (51) gradually expands outward; the lower end of the support rod (41) is conical; the lower end of the limiting cylinder (44) is connected to a coaxial guide cone (45); and the guide cone (45) is connected to the support rod (41).

8. An electrostatic chuck surface pattern forming device as claimed in claim 7, characterized in that: The limiting cylinder (44) is outer-mounted with a limiting ring (46); the limiting ring (46) can abut against the upper end of the supporting plate (61).

9. An electrostatic chuck surface pattern forming device as described in any one of claims 2 to 7, characterized in that: The outer contour of the airbag (40) is columnar; the airbag (40) is coaxial with the support rod (41); and the diameters at both ends of the airbag (40) are larger than the diameter in the middle.

10. A method for forming a surface pattern of an electrostatic chuck, characterized in that: The electrostatic chuck surface pattern forming device according to any one of claims 1 to 9 comprises the following steps: S1. Apply protective film to the surface of ceramic plate according to design requirements; S2. Perform anti-corrosion protection treatment on the ejection hole of the ceramic plate; S3, placing the ceramic plate after the anti-corrosion protection treatment into a reaction tank, and adding a corrosive liquid into the reaction tank, so that the ceramic plate is submerged in the corrosive liquid and corroded for 2-3 hours; S4, taking the ceramic plate out of the reaction tank, and cleaning the surface to remove the adhered corrosive liquid; S5. Drying the cleaned ceramic plate to obtain a ceramic plate with a finished surface pattern.

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