Mask structure and method of manufacturing the same

Abstract

This application relates to a mask structure and its manufacturing method. The mask structure includes: a frame; multiple support members, each support member having its two ends fixedly connected to the frame, the multiple support members including multiple first support members spaced apart along a first direction and multiple second support members spaced apart along a second direction, the first direction and the second direction intersecting, the multiple first support members and the multiple second support members defining at least two vapor deposition areas; at least one mask unit extending along the second direction, with both ends of the mask unit along the second direction fixed to the frame, the mask unit including at least one grid area corresponding to at least one vapor deposition area; wherein, the mask structure includes at least one first portion located at the overlap of the support members and the mask unit, the mask unit and the second support members being fixedly connected at the first portion. This application can improve the performance of the mask structure and improve the display quality of the display panel.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a mask structure and its manufacturing method. Background Technology

[0002] OLED (Organic Light Emitting Diode) display panels are currently one of the hottest research topics in the field of display panels. OLED display panels have advantages such as low energy consumption, low cost, self-emissiveness, wide viewing angle, and fast response speed. In OLED manufacturing technology, the mask structure used for vacuum evaporation is one of the most crucial components. Generally, the mask structure includes a frame, a support, and a mask sheet. The coordination of these three components determines the display effect of the display panel after vacuum evaporation.

[0003] However, the performance of current mask structures needs to be improved to enhance the display effect of display panels. Summary of the Invention

[0004] Therefore, it is necessary to provide a mask structure and its manufacturing method to improve the performance of the mask structure.

[0005] According to a first aspect of this application, a mask structure is provided, comprising:

[0006] frame;

[0007] Multiple support members, each of which is fixedly connected to the frame at both ends. The multiple support members include multiple first support members spaced apart along a first direction and multiple second support members spaced apart along a second direction. The first direction and the second direction intersect. The multiple first support members and the multiple second support members define at least two vapor deposition areas.

[0008] At least one mask unit is provided extending along the second direction, and both ends of the mask unit along the second direction are fixed to the frame. The mask unit includes at least one grid region, and the grid region corresponds to at least one of the vapor deposition regions.

[0009] The mask structure includes at least one first portion located at the overlap between the support member and the mask unit, and the mask unit and the second support member are fixedly connected at the first portion.

[0010] In some embodiments, the mask unit is rigidly fixedly connected to the second support member at the first location;

[0011] Optionally, the mask unit is welded to the second support member.

[0012] In some embodiments, the mask unit is elastically fixedly connected to the second support member at the first location;

[0013] Optionally, the mask structure further includes an elastic connector, through which the mask unit is connected to the second support member;

[0014] Optionally, the material of the elastic connector includes heat-sensitive adhesive.

[0015] In some embodiments, the mask structure includes at least three first portions, each of the at least three first portions including a first sub-portion and two second sub-portions located along a second direction at the ends of the first sub-portions near the ends of the mask unit;

[0016] The mask unit is elastically and fixedly connected to the second support member at the second sub-part.

[0017] The mask unit is rigidly fixed to the second support member at the first sub-part.

[0018] In some embodiments, the grid region includes multiple vapor deposition openings;

[0019] The first portion is located between at least two adjacent vapor deposition openings, and in a direction perpendicular to the plane where the vapor deposition area is located, the thickness of the mask unit at the first portion is greater than 0 and less than the maximum thickness of the mask unit;

[0020] Optionally, the mask unit includes multiple grid regions, each corresponding to a different evaporation region.

[0021] In some embodiments, the thickness of the mask unit at the first location is equal to the maximum thickness of the mask unit in a direction perpendicular to the plane of the vapor deposition area.

[0022] In some embodiments, the mask structure includes a plurality of first portions;

[0023] Multiple first portions are symmetrically arranged with respect to the first center line extending along the first direction relative to the mask unit.

[0024] In some embodiments, the mask structure includes a plurality of first portions;

[0025] The density of the plurality of the first portions per unit length gradually increases from the end of the mask unit toward the first center line extending along the first direction of the mask unit.

[0026] In some embodiments, the frame includes a second centerline extending along the second direction and a third centerline extending along the first direction, the mask unit includes a first end and a second end in the second direction, and the at least one grid region includes a plurality of vapor deposition openings;

[0027] In at least one of the mask units located on one side of the second centerline, the plurality of vapor deposition openings include a first edge opening near the first end and near the second centerline, and the plurality of vapor deposition openings also include a second edge opening near the first end and away from the second centerline;

[0028] In at least one of the mask units located on one side of the second centerline, the plurality of vapor deposition openings further include a third edge opening near the second end and near the second centerline, and the plurality of vapor deposition openings further include a fourth edge opening near the second end and away from the second centerline;

[0029] The distance from the first edge opening to the third center line is greater than the distance from the second edge opening to the third center line, and the distance from the third edge opening to the third center line is greater than the distance from the fourth edge opening to the third center line;

[0030] Optionally, the first edge opening and the third edge opening are symmetrically arranged about the third center line, and the second edge opening and the fourth edge opening are symmetrically arranged about the third center line.

[0031] According to a second aspect of this application, a method for manufacturing a mask structure is provided, comprising:

[0032] Provide a framework;

[0033] A plurality of support members are provided, and the two ends of each support member are fixedly connected to the frame. The plurality of support members include a plurality of first support members spaced apart along a first direction and a plurality of second support members spaced apart along a second direction. The first direction and the second direction intersect, and the plurality of first support members and the plurality of second support members define at least two vapor deposition areas.

[0034] At least one mask unit is provided, the mask unit is extended along the second direction, and both ends of the mask unit along the second direction are fixed to the frame. The mask unit includes at least one grid area, the grid area corresponding to at least one of the vapor deposition areas.

[0035] The mask structure includes at least one first portion located at the overlap between the support member and the mask unit, and the mask unit and the second support member are fixedly connected at the first portion.

[0036] In this embodiment, the mask structure includes at least one first portion located at the intersection of the support member and the mask unit. The mask unit and the second support member are fixedly connected at the first portion. The first portion serves to fix the mask unit, increasing the stability and rigidity of the mask structure, thereby resisting the influence of external forces. This can improve or prevent the mask unit from shifting or deforming, thereby improving or preventing poor color mixing of the display panel caused by vapor deposition. Attached Figure Description

[0037] To more clearly illustrate the technical solutions in the embodiments or exemplary embodiments of this application, the drawings used in the description of the embodiments or exemplary embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0038] Figure 1 This is a top view schematic diagram of a mask structure in a related technology.

[0039] Figure 2 This is a top view schematic diagram of a mask structure provided in an embodiment of this application.

[0040] Figure 3 This is a schematic diagram of a first partial cross-sectional structure of a mask structure provided in an embodiment of this application.

[0041] Figure 4 This is a schematic diagram of a second partial cross-sectional structure of a mask structure provided in an embodiment of this application.

[0042] Figure 5 This is a schematic diagram of a third partial cross-sectional structure of a mask structure provided in an embodiment of this application.

[0043] Figure 6 This is a first top view schematic diagram of a mask unit for a mask structure provided in an embodiment of this application.

[0044] Figure 7 This is a second top view schematic diagram of a mask unit for a mask structure provided in an embodiment of this application.

[0045] Figure 8 This is a first enlarged top view of a mask unit of a mask structure provided in an embodiment of this application.

[0046] Figure 9 This is a second enlarged top view of a mask unit of a mask structure provided in an embodiment of this application.

[0047] Figure 10This is a schematic diagram illustrating the process steps of a mask structure manufacturing method provided in an embodiment of this application.

[0048] Figure label:

[0049] Mask structure 100; frame 10; support 20; mask unit 30; first support 21; second support 22; vapor deposition area 20z; grid area 32;

[0050] First direction X; Second direction Y; First centerline D1; Second centerline D2; Third centerline D3; First end 30a; First edge opening 30k1; Second edge opening 30k2; Second end 30b; Third edge opening 30k3; Fourth edge opening 30k4; Bracket shape 101C; Third direction Z; First mask unit 301; Second mask unit 302;

[0051] First part 101; vapor deposition opening 30k; frame body 11; hollow space 12; mask unit body 31; connector 101L; first sub-part 1011; second sub-part 1012; large groove 101a; small groove 101b. Detailed Implementation

[0052] To make the above-mentioned objectives, features, and advantages of this application more apparent and understandable, the specific embodiments of this application are described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of this application. However, this application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this application. Therefore, this application is not limited to the specific embodiments disclosed below.

[0053] In the description of this application, it should be understood that if terms such as "center", "longitudinal", "lateral", "length", "size", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" appear, these terms indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.

[0054] Furthermore, where the terms "first" and "second" appear, these terms are for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this application, where the term "multiple" appears, "multiple" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0055] In this application, unless otherwise expressly specified and limited, the use of descriptions such as "above" or "below" the second feature indicates that the first and second features are in direct contact or indirect contact via an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. Similarly, "below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0056] It should be noted that if an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. If an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. If so, the terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used in this application are for illustrative purposes only and do not represent the only possible implementation.

[0057] In related technologies, the combination of the frame, support, and mask unit determines the display effect of the display panel after vacuum evaporation. The performance of the current mask structure needs to be improved to enhance the display effect of the display panel. Figure 1 This is a top view schematic diagram of a mask structure in the relevant technology. Figure 1 The diagram illustrates a mask structure 100 including a frame 10, a support member 20, and a mask unit 30. The inventors discovered that during the vapor deposition process, after the mask structure is bonded to the substrate, the mask unit 30 undergoes a bracket-shaped shift or deformation 101C under the influence of temperature, external forces, etc., resulting in poor color mixing in the display panel. The inventors also discovered that the mask unit 30 extends along a second direction Y, with a first center line D1 perpendicular to the second direction Y. The closer the mask unit 30 is to the first center line D1, the greater the shift or deformation.

[0058] In order to improve the display quality of the display panel, this application designs a mask structure and its manufacturing method, aiming to improve the performance of the mask structure, thereby improving the display quality of the display panel.

[0059] Please see Figures 2 to 9 . Figure 2 This is a top view schematic diagram of a mask structure provided in an embodiment of this application. Figure 3 This is a schematic diagram of a first partial cross-sectional structure of a mask structure provided in an embodiment of this application. Figure 4 This is a schematic diagram of a second partial cross-sectional structure of a mask structure provided in an embodiment of this application. Figure 5 This is a schematic diagram of a third partial cross-sectional structure of a mask structure provided in an embodiment of this application. Figures 3 to 5 for Figure 2 A schematic diagram of the cross-section at the dashed line C1-C1.

[0060] Figure 6 This is a first top view schematic diagram of a mask unit for a mask structure provided in an embodiment of this application. Figure 7 This is a second top view schematic diagram of a mask unit for a mask structure provided in an embodiment of this application.

[0061] Figure 8 This is a first enlarged top view of a mask unit of a mask structure provided in an embodiment of this application. Figure 9 This is a second enlarged top view schematic diagram of a mask unit for a mask structure provided in an embodiment of this application. Compared to Figure 6 and Figure 7 , Figure 8 and Figure 9 The diagram illustrates the vapor deposition openings in the mask unit. Figure 8 for Figure 2 An enlarged schematic diagram of the first mask unit 301. Figure 9 for Figure 2 An enlarged schematic diagram of the second mask unit 302.

[0062] This application provides a mask structure 100, which includes a frame 10, a plurality of supports 20, and at least one mask unit 30. Each support 20 is fixedly connected to the frame 10 at both ends. The plurality of supports 20 includes a plurality of first supports 21 spaced apart along a first direction X and a plurality of second supports 22 spaced apart along a second direction Y. The first direction X intersects the second direction Y, and the plurality of first supports 21 and second supports 22 define at least two vapor deposition regions 20z. The mask unit 30 extends along the second direction Y, and both ends of the mask unit 30 along the second direction Y are fixed to the frame 10. The mask unit 30 includes at least one grid region 32, which corresponds to at least one vapor deposition region 20z. The mask structure 100 includes at least one first portion 101 located at the overlap of the supports 20 and the mask unit 30, and the mask unit 30 and the second supports 22 are fixedly connected to the first portion 101.

[0063] For example, the mask structure 100 provided in the embodiments of this application can be used in the vapor deposition process, and the mask structure 100 can be a precision metal mask (FMM).

[0064] For example, the mask unit 30 includes at least one grid region 32, which corresponds to at least one vapor deposition region 20z, and the orthographic projection of the grid region 32 on the plane of the vapor deposition region 20z at least partially overlaps with the corresponding vapor deposition region 20z.

[0065] For example, in some embodiments, the mask structure 100 can be used to form a display motherboard (or display panel) on a substrate. After the display motherboard is manufactured, it can be cut to obtain multiple display panels. One vapor deposition area 20z of the mask structure 100 can correspond to the effective display area of ​​a display panel. The grid area 32 includes multiple vapor deposition openings 30k. During the vapor deposition process, the vapor deposition material can pass through the vapor deposition openings 30k to form on the substrate. For example, one vapor deposition opening 30k can correspond to a sub-pixel opening in the effective display area.

[0066] For example, the first direction X and the second direction Y can be perpendicular to each other, but are not limited to this.

[0067] For example, the frame 10 includes a frame body 11 and a hollow space 12 surrounded by the frame body 11.

[0068] For example, the mask unit 30 includes a mask unit body 31 and a grid region 32 disposed on the mask unit body 31.

[0069] For example, in some embodiments, the distance from the first portion 101 to the portion of the grid area 32 corresponding to the effective display area of ​​the display panel is greater than or equal to 3 mm, thereby reducing or avoiding the influence of the first portion 101 on the vapor deposition opening 30k of the effective display area.

[0070] For example, in a plane parallel to the vapor deposition region 20z, the first part 101 (or the first position) is located on one side of the vapor deposition opening 30k, and the first part 101 does not interfere with the passage of material in the vapor deposition opening 30k during vapor deposition.

[0071] In this embodiment of the application, the mask structure 100 includes at least one first portion 101 located at the intersection of the support member 20 and the mask unit 30. The mask unit 30 and the second support member 22 are fixedly connected to the first portion 101. The first portion 101 serves to fix the mask unit 30, increasing the stability and rigidity of the mask structure 100, thereby resisting the influence of external forces, thereby improving or avoiding the displacement or deformation of the mask unit 30, and thereby improving or avoiding the poor color mixing of the display panel caused by vapor deposition.

[0072] In some implementations, such as Figures 3 to 5 As shown, the mask unit 30 is rigidly fixedly connected to the second support member 22 at the first part 101.

[0073] Alternatively, in some implementations, such as Figures 3 to 5 As shown, the mask unit 30 is welded to the second support member 22.

[0074] For example, the mask unit 30 and the second support member 22 can be rigidly fixedly connected by welding or other connection methods, which increases the stability and rigidity of the mask structure 100, thereby resisting the influence of external forces and thus improving or preventing the mask unit 30 from shifting or deforming.

[0075] For example, such as Figure 3 As shown, the mask unit 30 is welded to the second support member 22. The mask unit 30 and the second support member 22 may also have a connector 101L between the first part 101. The material of the connector 101L may be a bonding metal such as solder.

[0076] In some implementations, such as Figure 4 As shown, the mask unit 30 and the second support member 22 are elastically fixedly connected at the first part 101.

[0077] For example, the mask unit 30 and the second support member 22 are elastically fixedly connected at the first part 101, which can tolerate slight displacement or slight deformation of the mask unit 30, so as to adapt to the external force on the mask unit 30, improve the toughness of the mask structure 100, and avoid the risk of the mask unit 30 breaking. For example, in the mask structure 100 for vapor deposition of large-size display panels, the external force on the mask unit 30 is relatively strong. At this time, the elastic fixed connection can play a buffering role and avoid the risk of the mask unit 30 breaking.

[0078] For example, the mask unit 30 is elastically fixed to the second support member 22 at the first part 101. At this time, it provides a buffering effect for the external force on the mask unit 30 and can prevent the mask unit 30 from being damaged.

[0079] Optionally, the mask structure 100 further includes an elastic connector, through which the mask unit 30 is connected to the second support member 22.

[0080] For example, such as Figure 4 As shown, the mask unit 30 and the second support member 22 have a connector 101L between the first part 101. The connector 101L is an elastic connector (the connector 101L includes an elastic material).

[0081] Alternatively, the material of the flexible connector may include heat-sensitive adhesive.

[0082] For example, the material of the elastic connector includes thermal adhesive. Thermal adhesive has a certain elasticity and can buffer external forces. When heated to a certain high temperature, thermal adhesive turns into a liquid. At this time, it has the characteristic of low viscosity, which can facilitate the rework and maintenance of the mask structure 100 and avoid damage to the mask structure 100 during rework and maintenance.

[0083] In some implementations, such as Figure 6 and Figure 7 As shown, the mask structure 100 includes at least three first portions 101, each including a first sub-portion 1011 and two second sub-portions 1012 located along the second direction Y near the ends of the first sub-portions 1011 close to the mask unit 30; the mask unit 30 and the second support member 22 are elastically fixedly connected in the second sub-portions 1012; the mask unit 30 and the second support member 22 are rigidly fixedly connected in the first sub-portions 1011.

[0084] For example, the closer the mask unit 30 is to the first center line D1, the greater the offset or deformation. The first sub-part 1011 is closer to the first center line D1, and the second sub-part 1012 is closer to the end of the mask unit 30. The offset and deformation of the mask unit 30 in the first sub-part 1011 are greater. The rigid fixed connection between the mask unit 30 and the second support member 22 in the first sub-part 1011 can better improve the offset and deformation of the mask unit 30. The elastic fixed connection between the mask unit 30 and the second support member 22 in the second sub-part 1012 can buffer the external force. At this time, the deformation of the mask unit 30 and the buffering capacity of the mask unit 30 are reduced at the same time.

[0085] It should be noted that, Figure 6 The diagram illustrates that the mask unit 30 includes multiple grid areas 32, and one grid area 32 can correspond to one display panel, but is not limited to this.

[0086] It should be noted that, Figure 7 The diagram illustrates that the mask unit 30 includes a grid area 32, which can correspond to multiple display panels, but is not limited to this.

[0087] In some implementations, such as Figure 3 and Figure 5 As shown, the grid region 32 includes a plurality of vapor deposition openings 30k; the first part 101 is located between at least two adjacent vapor deposition openings 30k, and in the direction perpendicular to the plane where the vapor deposition region 20z is located, the thickness of the mask unit 30 at the first part 101 is greater than 0 and less than the maximum thickness of the mask unit 30.

[0088] For example, please combine Figure 2 ,as well as Figure 3 and Figure 5 As shown, the third direction Z is the direction perpendicular to the plane containing the evaporation region 20z. Figure 2 The direction perpendicular to the desktop or paper surface.

[0089] For example, such as Figure 3 and Figure 5 As shown, the first portion 101 is located between at least two adjacent vapor deposition openings 30k. In the direction perpendicular to the plane of the vapor deposition region 20z, the thickness of the mask unit 30 in the first portion 101 is greater than 0 and less than the maximum thickness of the mask unit 30. That is, no vapor deposition opening 30k is provided in the first portion 101 region to improve the stability and mechanical strength of the connection between the mask unit 30 and the second support member 22 in the first portion 101. Meanwhile, in the first portion 101, Figure 3 The example illustrates that the mask unit 30 is provided with a large recess 101a. Figure 5The example illustrates that the mask unit 30 is provided with multiple small grooves 101b, so that the first part 101 of the mask unit 30 is a half-etched area, thereby reducing the thickness of the mask unit 30 in the first part 101 and making the stress of the mask unit 30 in the first part 101 as uniform as possible with the surrounding area where the vapor deposition openings 30k are provided.

[0090] For example, in some implementations, such as Figure 5 As shown, the multiple small grooves 101b can be distributed in a grid pattern, so that the distribution of the multiple small grooves 101b imitates the distribution of the vapor deposition openings 30k, so that the stress of the first part 101 is as uniform as possible with the surrounding area where the vapor deposition openings 30k are set.

[0091] For example, in some embodiments, the mask unit 30 is a half-etched area around the first portion 101, and the first portion 101 is a full-thickness area, wherein the thickness of the half-etched area is less than the thickness of the full-thickness area in the third direction Z.

[0092] For example, in some embodiments, at least one first groove (not shown) is provided on the surface of the support member 20 facing the mask unit 30 at the first portion 101, the first groove being able to accommodate the connector 101L.

[0093] For example, in some embodiments, at least one first groove (not shown) is provided on the surface of the support member 20 facing the mask unit 30 at the first portion 101, and at least one second groove (not shown) is provided on the surface of the mask unit 30 facing the support member 20, and the first groove and the second groove together accommodate the connector 101L.

[0094] Optionally, in some embodiments, the mask unit 30 includes a plurality of grid regions 32, each of which corresponds to a vapor deposition region 20z.

[0095] In some implementations, such as Figure 4 As shown, in the direction perpendicular to the plane where the vapor deposition area 20z is located, the thickness of the mask unit 30 at the first part 101 is equal to the maximum thickness of the mask unit 30.

[0096] For example, such as Figure 4 As shown, in the direction perpendicular to the plane where the vapor deposition area 20z is located, the thickness of the mask unit 30 in the first part 101 is equal to the maximum thickness of the mask unit 30, that is, the vapor deposition opening 30k is no longer provided in the first part 101 area, and the mask unit 30 in the first part 101 is a full thickness area, so as to improve the stability and mechanical strength of the connection between the mask unit 30 and the second support member 22 in the first part 101.

[0097] In some implementations, such as Figure 6As shown, the mask structure 100 includes a plurality of first portions 101; the plurality of first portions 101 are symmetrically arranged with respect to the first center line D1 extending along the first direction X of the mask unit 30.

[0098] For example, such as Figure 6 As shown, the length extension direction of the mask unit 30 is the second direction Y, and the first center line D1 is the center line of the mask unit 30 along the first direction X.

[0099] For example, please combine Figure 1 and Figure 6 The inventors discovered that the deformation of the mask unit 30 is symmetrical about the first center line D1, and the plurality of first parts 101 are symmetrically arranged with respect to the first center line D1, so that the arrangement of the plurality of first parts 101 is symmetrically matched with the deformation of the mask unit 30 about the first center line D1. This can uniformly reduce the occurrence of deformation in various parts of the mask unit 30, thereby improving the display quality of the display panel.

[0100] In some implementations, such as Figure 6 As shown, the mask structure 100 includes a plurality of first portions 101; the density of the plurality of first portions 101 per unit length gradually increases from the end of the mask unit 30 toward the first center line D1 extending along the first direction X of the mask unit 30.

[0101] For example, please combine Figure 1 and Figure 6 The closer the mask unit 30 is to the first center line D1, the greater the offset or deformation. The closer the density of the first part 101 is to the first center line D1, the greater the density per unit length. This can better match the greater deformation of the mask unit 30 to the first center line D1, and can uniformly reduce the occurrence of deformation in various parts of the mask unit 30.

[0102] In some implementations, such as Figure 2 , Figure 8 and Figure 9 As shown, the frame 10 includes a second center line D2 extending along the second direction Y and a third center line D3 extending along the first direction X. The mask unit 30 includes a first end 30a and a second end 30b in the second direction Y. At least one grid region 32 includes a plurality of vapor deposition openings 30k.

[0103] In at least one mask unit 30 located on one side of the second center line D2, a plurality of vapor deposition openings 30k include a first edge opening 30k1 near the first end 30a and near the second center line D2, and a plurality of vapor deposition openings 30k also include a second edge opening 30k2 near the first end 30a and away from the second center line D2.

[0104] In at least one mask unit 30 located on one side of the second center line D2, the plurality of vapor deposition openings 30k further include a third edge opening 30k3 near the second end 30b and near the second center line D2, and the plurality of vapor deposition openings 30k further include a fourth edge opening 30k4 near the second end 30b and away from the second center line D2.

[0105] The distance from the first edge opening 30k1 to the third center line D3 is greater than the distance from the second edge opening 30k2 to the third center line D3, and the distance from the third edge opening 30k3 to the third center line D3 is greater than the distance from the fourth edge opening 30k4 to the third center line D3.

[0106] For example, such as Figure 2 , Figure 8 and Figure 9 As shown, Figure 8 It indicated Figure 2 A mask unit 30 to the left of the second centerline D2. Figure 9 It indicated Figure 2 A mask unit 30 to the right of the second center line D2.

[0107] For example, please combine Figure 1 ,as well as Figure 8 and Figure 9 The inventors discovered that during the vapor deposition process, after the mask structure 100 is bonded to the substrate, the mask unit 30 undergoes a shift or deformation of the bracket shape 101C due to temperature, external force, etc. Therefore, the distance from the first edge opening 30k1 to the third center line D3 is set to be greater than the distance from the second edge opening 30k2 to the third center line D3, and the distance from the third edge opening 30k3 to the third center line D3 is greater than the distance from the fourth edge opening 30k4 to the third center line D3. This allows the setting of the vapor deposition openings 30k to compensate for the deformation of the mask unit 30. After these compensations, after the mask unit 30 shifts or deforms in the bracket shape 101C, each vapor deposition opening 30k can be positioned in a preset position and the shape of each vapor deposition opening 30k is a preset shape, thereby effectively compensating for the deformation or shift of the mask unit 30.

[0108] For example, such as Figure 8 As shown, for Figure 2 The mask unit 30 to the left of the second center line D2 satisfies the following conditions: the distance from the first edge opening 30k1 to the third center line D3 is greater than the distance from the second edge opening 30k2 to the third center line D3, and the distance from the third edge opening 30k3 to the third center line D3 is greater than the distance from the fourth edge opening 30k4 to the third center line D3.

[0109] For example, such as Figure 9 As shown, for Figure 2The mask unit 30 to the right of the second center line D2 satisfies the following conditions: the distance from the first edge opening 30k1 to the third center line D3 is greater than the distance from the second edge opening 30k2 to the third center line D3, and the distance from the third edge opening 30k3 to the third center line D3 is greater than the distance from the fourth edge opening 30k4 to the third center line D3.

[0110] For example, the distances from the first edge opening 30k1, the second edge opening 30k2, the third edge opening 30k3, and the fourth edge opening 30k4 to the third centerline D3 can be set according to the simulation results or the actual test results of the product.

[0111] For example, the first edge opening 30k1, the second edge opening 30k2, the third edge opening 30k3 and the fourth edge opening 30k4 are all vapor deposition openings 30k at the outermost edge of the mask unit 30.

[0112] For example, the distribution of vapor deposition openings 30k between the first edge opening 30k1 and the second edge opening 30k2, and the distribution of vapor deposition openings 30k between the third edge opening 30k3 and the fourth edge opening 30k4, can be set according to simulation results or actual product test results.

[0113] Optionally, in some embodiments, the first edge opening 30k1 and the third edge opening 30k3 are symmetrically arranged about the third center line D3, and the second edge opening 30k2 and the fourth edge opening 30k4 are symmetrically arranged about the third center line D3.

[0114] For example, such as Figure 8 or Figure 9 As shown, the deformation of the mask unit 30 is symmetrical about the first center line D1, the first edge opening 30k1 and the third edge opening 30k3 are symmetrically arranged about the third center line D3, and the second edge opening 30k2 and the fourth edge opening 30k4 are symmetrically arranged about the third center line D3. This makes the arrangement of the multiple vapor deposition openings 30k symmetrically matched with the deformation of the mask unit 30 about the first center line D1, which can uniformly reduce the occurrence of deformation at various parts of the mask unit 30.

[0115] Please see Figure 10 , Figure 10 This is a schematic diagram illustrating the process steps of a mask structure manufacturing method provided in an embodiment of this application.

[0116] This application also provides a method for manufacturing a mask structure, and the mask structure 100 in any of the above embodiments can be manufactured using this method. The method for manufacturing a mask structure includes steps S100, S200, and S300.

[0117] Step S100: Provide a framework.

[0118] Step S200: Provide a plurality of support members and fix both ends of each support member to the frame. The plurality of support members include a plurality of first support members spaced apart along a first direction and a plurality of second support members spaced apart along a second direction. The first direction and the second direction intersect. The plurality of first support members and the plurality of second support members define at least two vapor deposition areas.

[0119] For example, please combine Figure 2 A plurality of support members 20 are provided, and the two ends of each support member 20 are fixedly connected to the frame 10. The plurality of support members 20 include a plurality of first support members 21 arranged at intervals along a first direction X and a plurality of second support members 22 arranged at intervals along a second direction Y. The first direction X and the second direction Y intersect, and the plurality of first support members 21 and the plurality of second support members 22 define at least two vapor deposition areas 20z.

[0120] Step S300: Provide at least one mask unit, extend the mask unit along the second direction, and fix both ends of the mask unit along the second direction to the frame. The mask unit includes at least one grid area, and the grid area corresponds to at least one of the vapor deposition areas.

[0121] The mask structure includes at least one first portion located at the overlap between the support member and the mask unit, and the mask unit and the second support member are fixedly connected at the first portion.

[0122] For example, please combine Figure 2 At least one mask unit 30 is provided, the mask unit 30 is extended along the second direction Y, and the two ends of the mask unit 30 along the second direction Y are fixed to the frame 10. The mask unit 30 includes at least one grid region 32, and the grid region 32 corresponds to at least one vapor deposition region 20z.

[0123] The mask structure 100 includes at least one first portion 101 located at the intersection of the support member 20 and the mask unit 30, and the mask unit 30 and the second support member 22 are fixedly connected to the first portion 101.

[0124] For example, the mask structure manufactured using this mask structure manufacturing method has the same or similar features and effects as the mask structure 100 in the above embodiments, and will not be described again here.

[0125] This application also provides a display panel, which can be manufactured using the mask structure 100 described above.

[0126] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0127] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A mask structure, characterized in that, include: frame; Multiple support members, each of which is fixedly connected to the frame at both ends. The multiple support members include multiple first support members spaced apart along a first direction and multiple second support members spaced apart along a second direction. The first direction and the second direction intersect. The multiple first support members and the multiple second support members define at least two vapor deposition areas. At least one mask unit is provided extending along the second direction, and both ends of the mask unit along the second direction are fixed to the frame. The mask unit includes at least one grid region, and the grid region corresponds to at least one of the vapor deposition regions. The mask structure includes at least one first portion located at the intersection of the support member and the mask unit, and the mask unit and the second support member are fixedly connected at the first portion; The mask structure includes at least three first portions, each of which includes a first sub-portion and two second sub-portions located along a second direction at the ends of the first sub-portions near the mask unit. The mask unit is elastically and fixedly connected to the second support member at the second sub-part. The mask unit is rigidly fixed to the second support member at the first sub-part; The frame includes a second centerline extending along the second direction and a third centerline extending along the first direction; the mask unit includes a first end and a second end in the second direction; and the at least one grid region includes a plurality of vapor deposition openings. In at least one of the mask units located on one side of the second centerline, the plurality of vapor deposition openings include a first edge opening near the first end and near the second centerline, and the plurality of vapor deposition openings also include a second edge opening near the first end and away from the second centerline; In at least one of the mask units located on one side of the second centerline, the plurality of vapor deposition openings further include a third edge opening near the second end and near the second centerline, and the plurality of vapor deposition openings further include a fourth edge opening near the second end and away from the second centerline; The distance from the first edge opening to the third center line is greater than the distance from the second edge opening to the third center line, and the distance from the third edge opening to the third center line is greater than the distance from the fourth edge opening to the third center line.

2. The mask structure according to claim 1, characterized in that, The mask unit is rigidly fixed to the second support member at the first location.

3. The mask structure according to claim 2, characterized in that, The mask unit is welded to the second support member.

4. The mask structure according to claim 1, characterized in that, The mask unit is elastically fixed to the second support member at the first location.

5. The mask structure according to claim 4, characterized in that, The mask structure also includes an elastic connector, through which the mask unit is connected to the second support member.

6. The mask structure according to claim 5, characterized in that, The material of the elastic connector includes heat-sensitive adhesive.

7. The mask structure according to claim 1, characterized in that, The grid area includes multiple vapor deposition openings; The first portion is located between at least two adjacent vapor deposition openings, and in a direction perpendicular to the plane of the vapor deposition area, the thickness of the mask unit at the first portion is greater than 0 and less than the maximum thickness of the mask unit.

8. The mask structure according to claim 1, characterized in that, The mask unit includes multiple grid regions, and each grid region corresponds to a vapor deposition region.

9. The mask structure according to claim 1, characterized in that, In a direction perpendicular to the plane of the vapor deposition area, the thickness of the mask unit at the first location is equal to the maximum thickness of the mask unit.

10. The mask structure according to claim 1, characterized in that, The mask structure includes multiple first parts; Multiple first portions are symmetrically arranged with respect to the first center line extending along the first direction relative to the mask unit.

11. The mask structure according to claim 1, characterized in that, The mask structure includes multiple first parts; The density of the plurality of the first portions per unit length gradually increases from the end of the mask unit toward the first center line extending along the first direction of the mask unit.

12. The mask structure according to claim 1, characterized in that, The first edge opening and the third edge opening are symmetrically arranged about the third center line, and the second edge opening and the fourth edge opening are symmetrically arranged about the third center line.

13. A method for manufacturing a mask structure, characterized in that, A method for manufacturing a mask structure as described in any one of claims 1 to 12, the method comprising: Provide a framework; A plurality of support members are provided, and the two ends of each support member are fixedly connected to the frame. The plurality of support members include a plurality of first support members spaced apart along a first direction and a plurality of second support members spaced apart along a second direction. The first direction and the second direction intersect, and the plurality of first support members and the plurality of second support members define at least two vapor deposition areas. At least one mask unit is provided, the mask unit is extended along the second direction, and both ends of the mask unit along the second direction are fixed to the frame. The mask unit includes at least one grid area, the grid area corresponding to at least one of the vapor deposition areas. The mask structure includes at least one first portion located at the intersection of the support member and the mask unit, and the mask unit and the second support member are fixedly connected at the first portion.

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