Vacuum chuck and process treatment apparatus
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHENZHEN SICARRIER IND MACHINES CO LTD
- Filing Date
- 2025-01-10
- Publication Date
- 2026-06-02
Smart Images
Figure CN119833464B_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of process technology, and in particular to a vacuum chuck and process equipment. Background Technology
[0002] When processing workpieces in a process chamber, a vacuum chuck can be used to hold and hold the workpiece, facilitating the processing. Vacuum chucks typically have a vacuum-drawing structure. This structure not only needs to provide vacuum suction but also needs to create a uniform pressure distribution on the chuck surface. This pressure distribution affects the uniformity of the chuck's heating. Therefore, a good vacuum-drawing structure directly determines the performance of the vacuum chuck.
[0003] Traditional vacuum chucks often exhibit a low center temperature during temperature uniformity testing. This is because the pressure distribution between the chuck surface and the workpiece adsorbed on it is uneven, resulting in a significant low-pressure zone in the center of the chuck. This increases the contact thermal resistance between the chuck and the workpiece, thus affecting the chuck's temperature uniformity performance. Summary of the Invention
[0004] This application provides a vacuum chuck and a process equipment that can reduce the influence of the evacuation port on the air pressure between the chuck and the workpiece, and maintain a balanced air pressure distribution between the chuck and the workpiece to maintain good temperature uniformity.
[0005] Firstly, this application provides a vacuum chuck that can be used to adsorb workpieces for processing in the process chamber of a processing equipment, facilitating the processing of the workpieces. The vacuum chuck includes a support structure, and the chuck has a bottom surface with opposing surfaces. The support structure is connected to one side of the bottom surface of the chuck to provide support. An air extraction port is provided on the chuck, penetrating both the top and bottom surfaces. The air extraction port is located at an inlet on the top surface and an outlet on the bottom surface. The gas flow area of the inlet is smaller than that of the outlet, meaning the area through which gas flows is smaller than the area through which gas flows. An air groove structure is also provided on the surface of the chuck, communicating with the inlet. An air extraction pipe assembly is provided on the support structure, with one end communicating with the outlet and the other end communicating with a vacuum pump. When a vacuum chuck adsorbs a workpiece, a vacuum process is required between the chuck surface and the workpiece to create a low-pressure or vacuum environment. This allows the workpiece to be securely adsorbed onto the chuck surface, achieving proper fixation. During the vacuum process, the gas between the chuck surface and the workpiece enters the evacuation port through the gas groove structure and is then extracted through the evacuation pipe assembly. Because the inlet area of the evacuation port is small, it increases airflow resistance, reducing the low-pressure state near the inlet caused by the vacuum process. This, in turn, reduces the impact of the evacuation port on the pressure distribution between the chuck surface and the workpiece. Consequently, it lowers the thermal resistance between the chuck and the workpiece, improving the temperature uniformity of the workpiece.
[0006] In one possible implementation, along the direction from the surface of the chuck to the bottom surface of the chuck, the evacuation port includes a first section and a second section coaxially arranged. The end of the first section opposite to the second section forms the air inlet, and the end of the second section opposite to the first section forms the air outlet. Dividing the evacuation port into segments facilitates the structural design of the air inlet and outlet.
[0007] Possibly, the radial dimension of the first orifice segment can be set to be smaller than that of the second orifice segment. Here, radial dimension refers to the inner diameter passing through the center of the orifice segment. If the radial dimension of the first orifice segment is smaller than that of the second orifice segment, the area of the air inlet is smaller than the area of the air outlet, resulting in a smaller gas flow area at the air inlet compared to the gas flow area at the air outlet. The radial dimension of the first orifice segment can be selected within the range of 0.1 mm to 1.5 mm, depending on the requirements.
[0008] Possibly, the radial dimension of the first orifice can be set to be greater than or equal to the radial dimension of the second orifice, and a porous medium can be filled within the first orifice. When the first orifice is filled with a porous medium, gas can only pass through the pores of the porous medium, thereby reducing the gas flow area within the cross-section of the first orifice, which makes the gas flow area at the inlet smaller than that at the outlet. The porous medium can be porous ceramic.
[0009] In one possible implementation, two evacuation ports are provided, symmetrically distributed about the center of the chuck. This prevents the two ports from being located at the center of the chuck, which helps to disperse the pressure at the center of the chuck surface. The air groove structure is symmetrically distributed about the two evacuation ports, ensuring a balanced airflow on the chuck surface during vacuuming.
[0010] Specifically, the gas groove structure may include at least two circumferential gas grooves, at least two radial gas grooves, and two guide gas grooves. The circumferential gas grooves are annular, and the at least two circumferential gas grooves are concentrically distributed, with the center of each groove coinciding with the center of the chuck. The at least two radial gas grooves are symmetrically distributed about the center of the chuck, with each radial groove extending through the center of a circumferential gas groove and communicating with each circumferential gas groove. The two guide gas grooves are symmetrically distributed about the center of the chuck, and each evacuation port communicates with the innermost circumferential gas groove through a guide gas groove. During vacuuming, gas between the chuck surface and the workpiece can enter the gas grooves. Gas in each circumferential gas groove can be collected in the innermost circumferential gas groove via the radial gas grooves. Gas in the innermost circumferential gas groove is then guided to the evacuation port via the guide gas grooves. The evacuation pipe assembly in the support structure then removes the gas through the evacuation port, achieving vacuuming between the chuck surface and the workpiece.
[0011] In one possible implementation, the extraction pipe assembly includes a first extraction pipe, a second extraction pipe, a manifold pipe, and a guide pipe connected in sequence. The first extraction pipe is connected to the inlet of the extraction port, and the guide pipe is used to connect to a vacuum pumping device. The gas flow area of the inlet of the extraction port is smaller than that of the first extraction pipe, allowing for smoother gas flow after entering the first extraction pipe from the extraction port.
[0012] The first suction line, the second suction line, and the guide line all extend parallel to the surface of the chuck, pointing towards the bottom. The manifold line is perpendicular to the surface of the chuck, also pointing towards the bottom. The manifold line connects the second suction line and the guide line, serving as a confluence.
[0013] For ease of manufacturing, the manifold runs through the support structure in a direction perpendicular to the chuck surface and pointing towards the bottom surface, and sealing components are provided at both ends of the manifold.
[0014] In one possible implementation, the support structure includes a base and a support rod, with the support rod connecting the chuck and the base. The first suction pipe is located on the support rod, while the second suction pipe, the manifold pipe, and the guide pipe are located on the base. A sealing structure, such as a rubber ring, is provided at the connection between the support rod and the base to prevent air leakage.
[0015] Secondly, this application provides a process processing apparatus, including a process chamber and any of the vacuum chucks provided in the first aspect. The process chamber has a reaction chamber, the chuck of the vacuum chuck is disposed inside the reaction chamber, one end of the support structure supports the bottom surface of the chuck, and the other end of the support structure extends out of the reaction chamber to communicate with a vacuum pumping device. Attached Figure Description
[0016] Figure 1 A schematic diagram of the structure of a process equipment provided in an embodiment of this application;
[0017] Figure 2 This is a schematic diagram of the structure of a vacuum chuck provided in an embodiment of this application;
[0018] Figure 3 A schematic diagram of a half-section structure of a chuck in a vacuum chuck is provided for an embodiment of this application;
[0019] Figure 4 A schematic diagram of a half-section structure of a vacuum chuck provided in an embodiment of this application;
[0020] Figure 5 A cross-sectional structural diagram of a vacuum chuck provided in an embodiment of this application;
[0021] Figure 6 This is a partial structural diagram of a vacuum chuck provided in an embodiment of this application;
[0022] Figure 7a This application provides a schematic diagram of the structure of an air extraction port and a first air extraction pipe in a vacuum chuck.
[0023] Figure 7b This application provides a schematic diagram of the structure of an air extraction port and a first air extraction pipe in a vacuum chuck.
[0024] Figure 8a A top view of a vacuum chuck provided in an embodiment of this application;
[0025] Figure 8b for Figure 8a A schematic diagram of the airflow direction of the chuck shown;
[0026] Figure 9a A top view of a vacuum chuck provided in an embodiment of this application;
[0027] Figure 9b for Figure 9a The diagram shows the airflow direction of the chuck. Detailed Implementation
[0028] When processing workpieces using processing equipment, the workpieces are typically vacuum-adsorbed onto a vacuum chuck housed within the processing chamber. However, the heating uniformity of the vacuum chuck must be considered during the heating process. Traditional vacuum chucks often exhibit a low center temperature in temperature uniformity tests. This is because the pressure distribution between the chuck surface and the workpiece adsorbed on it is uneven, resulting in a significant low-pressure zone in the center of the chuck. This increases the contact thermal resistance between the chuck and the workpiece, thus affecting the temperature uniformity performance.
[0029] Based on this, the present application provides a vacuum chuck and a process equipment. When the vacuum chuck is applied to a workpiece for vacuum adsorption, a balanced pressure distribution can be formed between the surface of the vacuum chuck and the workpiece, thereby reducing the thermal resistance between the vacuum chuck and the adsorbed workpiece and improving the temperature uniformity of the workpiece.
[0030] The terminology used in the following embodiments is for the purpose of describing particular embodiments only and is not intended to be limiting of this application. As used in the specification and appended claims of this application, the singular expressions “a,” “an,” “the,” “the,” “the,” and “this” are intended to also include expressions such as “one or more,” unless the context clearly indicates otherwise. “A plurality” in this application refers to two or more.
[0031] References to "one embodiment" or "some embodiments" as described in this specification mean that one or more embodiments of this application include a specific feature, structure, or characteristic described in connection with that embodiment. Therefore, the phrases "in one embodiment," "in some embodiments," "in other embodiments," "in still other embodiments," etc., appearing in different parts of this specification do not necessarily refer to the same embodiment, but rather mean "one or more, but not all, embodiments," unless otherwise specifically emphasized. The terms "comprising," "including," "having," and variations thereof mean "including but not limited to," unless otherwise specifically emphasized.
[0032] like Figure 1The illustrated processing apparatus includes a process chamber 20 having a reaction chamber A within which workpieces can be processed. The apparatus also includes a vacuum chuck 10, specifically comprising a chuck 1 and a support structure 2. The chuck 1 is disc-shaped, having opposing surfaces a1 and a bottom surface a2. Surface a1 supports the workpiece, while the bottom surface a2 faces away from surface a1. The central axis Q of the chuck 1 passes perpendicularly through the center of surface a1 and the center of bottom surface a2. The chuck 1 is located within the reaction chamber A, and the support structure 2 is fixedly connected to one side of the bottom surface a2 of the chuck 1 and extends out of the reaction chamber A from the bottom of the process chamber 20. Specifically, the support structure 2 can be connected to the center of the bottom surface a2. The support structure 2 is columnar, with its length parallel to the central axis Q of the chuck 1. For stable support, the center of the support structure 2 along its length is on the central axis Q of the chuck 1.
[0033] Figure 2 The structure of the vacuum chuck 10 is shown. An air groove structure 11 is provided on the surface a1 of the chuck 1. An evacuation hole 12 is also provided on the chuck 1, penetrating the surface a1 and the bottom surface a2, and is connected to the air groove structure 11. When the chuck 1 adsorbs a workpiece, the gas between the surface a1 of the chuck 1 and the workpiece can enter the air groove structure 11 and be extracted through the evacuation hole 12, thereby creating a low-pressure or vacuum state between the workpiece and the surface a1 of the chuck 1, reliably adsorbing the workpiece onto the surface a1 of the chuck 1.
[0034] To prevent a low-pressure area from appearing at the center of surface a1 of chuck 1, two evacuation holes 12 are provided, symmetrical about the center of surface a1 of chuck 1. Of course, the number of evacuation holes 12 may also be three or more, such as three, four, or six, and these multiple evacuation holes 12 are arranged in a ring array about the center of surface a1 of chuck 1. This embodiment uses two evacuation holes 12 as an example for illustration.
[0035] The chuck 1 is equipped with two suction ports 12. The air groove structure 11 specifically includes at least two circumferential air grooves 111, at least two radial air grooves 112, and two guide air grooves 113. The circumferential air grooves 111 are annular; in this example, there are two concentrically arranged circumferential air grooves 111, with the center of each circumferential air groove 111 on the central axis Q of the chuck 1. The two radial air grooves 112 are symmetrically distributed about the two suction ports 12. Any radial air groove 112 is simultaneously connected to each circumferential air groove 111, achieving communication between different circumferential air grooves 111. The length direction of each radial air groove 112 is perpendicular to and passes through the central axis Q of the chuck 1. The innermost circumferential air groove 111 is connected to the two suction ports 12 through the two guide air grooves 113, that is, each suction port 12 is connected to the innermost circumferential air groove 111 through one guide air groove 113. It should be understood that the number and distribution of the circumferential air grooves 111 can be set according to the requirements. The distribution of the circumferential air grooves 111 allows gas from any area of the chuck surface a1 to enter the air groove structure 11.
[0036] Combination Figure 2 Continue to refer to Figure 3 The diagram shows a half-sectional view of the chuck 1. An air extraction port 12 penetrates the chuck 1, with one end of the port located on surface a1 of the chuck 1 and the other end located on the bottom surface a2 of the chuck 1. The air extraction port 12 communicates with the innermost of a plurality of circumferential air grooves 111. Specifically, the port of the air extraction port 12 located on surface a1 is the air inlet b1, and the port of the air extraction port 12 located on the bottom surface a2 is the air outlet b2.
[0037] Refer to together Figure 2 and Figure 4 A vacuum pipe assembly 211 is provided on the support structure 2. One end of the vacuum pipe assembly 211 is connected to the air inlet b2 of the vacuum port 12, and the other end is used to connect to a vacuum pumping device. The support structure 2 includes, exemplarily, a support rod 21 and a base 22. The support rod 21 is connected between the base 22 and the chuck 1. A portion of the vacuum pipe assembly 211 is disposed on the support rod 21, and a portion is disposed on the base 22. The base 22 and the support rod 21 can be fixed together by screws or other connecting components.
[0038] In the vacuum chuck 10 provided in this embodiment, the air groove structures 11 on the surface a1 of the chuck 1 are symmetrically distributed about the two suction holes 12, and the reference plane of the symmetrically distributed air groove structures 11 passes through the central axis Q of the chuck 1. The symmetrically distributed air groove structures 11 can keep the airflow distribution on the surface a1 of the chuck 1 balanced. It should be understood that the suction pipe assembly 211 on the support structure 2 also needs to be symmetrically distributed, and the reference plane of the symmetrically distributed suction pipe assembly 211 should be consistent with the reference plane of the air groove structures 11, so that the airflow distribution of the entire vacuum chuck 10 is balanced during the vacuuming process. For example, if the air groove structures 11 are symmetrically distributed about the plane passing through the two suction holes 12, then the suction pipe assembly 211 should also be symmetrically distributed about this plane, so as to achieve structural adaptation between the air groove structures 111 and the suction pipe assembly 211, and ensure that the airflow distribution is balanced during the vacuuming process.
[0039] Combination Figure 4 and Figure 5 The structure of the suction pipe assembly 211 is illustrated below. There are two suction ports 12, and the suction pipe assembly 211 exemplarily includes two first suction pipes 2111. Each suction pipe 211 is connected to the outlet b2 of one suction port 12. The first suction pipes 2111 are mounted on the support rod 21. The suction pipe assembly 211 also includes two second suction pipes 2112 mounted on the base 22, which are connected to the two first suction pipes 2111 in a one-to-one correspondence. The suction pipe assembly 211 also includes a manifold 2113 and a guide pipe 2114 mounted on the base 22. The manifold 2113 extends perpendicularly to the central axis Q of the chuck 1, and both second suction pipes 2112 are connected to this manifold 2113, allowing the gas in the two suction pipes 2112 to flow into the manifold 2113. One end of the gas guide pipe 2114 is connected to the manifold pipe 2113, and the other end is used to connect to the vacuum pumping equipment. The gas in the manifold pipe 2113 can be drawn away by the vacuum pumping equipment through the gas guide pipe 2114.
[0040] Please refer to the above. Figure 5 and Figure 6 A sealing structure 3 is provided at the connection between the support rod 21 and the base 22. This sealing structure can be a rubber sealing ring or similar structure. Figure 6As can be seen, the manifold 2113 extends through the base 22 in a direction perpendicular to the central axis Q of the chuck 1. Sealing elements 2115 are provided at both ends of the manifold 2113, ensuring that both ends of the manifold 2113 in the direction perpendicular to the central axis Q of the chuck 1 are closed. The gas supplied to the manifold 2113 by the second extraction pipe 2112 can be collected within the manifold 2113 and discharged through the guide pipe 2114. The manifold 2113 can mix the airflow within the two second extraction pipes 2112. Furthermore, to control the airflow within the first extraction pipe 2111, an annular boss t is provided within the first extraction pipe 2111. The inner diameter of the annular boss t is smaller than the inner diameter of the first extraction pipe 2111, thus limiting the flow.
[0041] Refer to together Figure 4 and Figure 5 As shown, during operation, the workpiece is placed on surface a1 of chuck 1. A vacuum device extracts gas between surface a1 of chuck 1 and the workpiece through the extraction pipe assembly 211 and extraction port 12, bringing the pressure between the workpiece and surface a1 of chuck 1 close to a vacuum. This tightly adheres the workpiece to surface a1 of chuck 1, achieving vibration-induced adsorption. The gas between surface a1 of chuck 1 and the workpiece is transported to extraction port 12 via circumferential gas channels 111 and connecting channels 112 in the gas channel assembly 11. Due to the vacuuming effect of the vacuum device, a relatively obvious low-pressure area is formed near the air inlet b1 of extraction port 12. To reduce the impact of this low-pressure area on the pressure distribution between the workpiece and surface a1 of chuck 1, in this embodiment, the gas flow area of the air inlet b1 is smaller than the gas flow area of the outlet b2. The airflow area refers to the area within the cross-section of the suction port 12 along its extension direction, allowing gas to pass through. In this embodiment, the area of the inlet b1 that allows gas to pass through is smaller than the area of the outlet b2, resulting in greater flow resistance at the inlet b1 than at the outlet b2. In other words, the airflow experiences greater resistance when passing through the inlet b1, thus mitigating the formation of excessively low air pressure at the inlet b1. This structural design of the suction port 12 helps to strengthen the back pressure of the suction port 12, preventing the formation of a low-pressure area at the inlet b1 on surface a1 of the chuck 1, and reducing the impact of this area on the air pressure distribution between the workpiece and surface a1 of the chuck 1.
[0042] Combination Figure 4 Please refer to Figure 7a and Figure 7bThe diagram shows a partial structural connection between the chuck 1 and the support structure 2. Along the direction from the chuck 1 to the support structure 2, that is, from the surface a1 of the chuck 1 to the bottom surface 1b, the air extraction port 12 is divided into a first section 121 and a second section 122. The end of the first section 121 opposite to the second section 122 forms an air inlet b1, and the end of the second section 122 opposite to the first section 121 forms an air outlet b2.
[0043] like Figure 7a As shown, the radial dimension of the first hole segment 121 is h11, and the radial dimension of the second hole segment 122 is h12, where h11 is smaller than h12, making the first hole segment 121 and the second hole segment 122 step-like. The radial dimension of the first hole segment 121 refers to the inner diameter passing through the center of the first hole segment 121, and the radial dimension of the second hole segment 122 refers to the inner diameter passing through the center of the second hole segment 122. Exemplarily, both the first hole segment 121 and the second hole segment 122 are cylindrical holes, and they are coaxially arranged, meaning the centerline of the first hole segment 121 coincides with the centerline of the second hole segment 122. The cross-sections of both the first hole segment 121 and the second hole segment 122 perpendicular to their length direction are circular. The radial dimension of the first hole segment 121 is the diameter of its cross-section, and the radial dimension of the second hole segment 122 is the diameter of its cross-section.
[0044] When manufacturing the chuck 1, a large hole can be first drilled on one side of the bottom surface a2 of the chuck 1 to form a second hole segment 122, and then a small hole can be drilled inside the second hole segment 122 to the surface a1 to form a first hole segment 121. The inner diameter of the first hole segment 121 can be selected between 0.1mm and 1.5mm, and can be specifically selected according to requirements, such as 0.1mm, 0.2mm, 0.5mm, 0.8mm, 1.2mm, 1.5mm, etc.
[0045] Or, such as Figure 7bAs shown, the radial dimension of the first orifice 121 is h11, and the radial dimension of the second orifice 122 is h12, where h11 is greater than h12, making the first orifice 121 and the second orifice 122 stepped. To reduce the gas flow area of the inlet b1, a porous medium 13 is filled into the first orifice 121. For example, porous ceramic is used. The porous medium 13 has a solid portion and a void portion; during operation, gas can only pass through the void portion of the porous medium 13. Therefore, during the vacuuming process, the presence of the porous medium 13 reduces the airflow flow area of the first orifice 121 in cross-section to a size smaller than that of the second orifice 122 in cross-section, thereby making the area available for airflow through the inlet b1 smaller than the area available for airflow through the outlet b2, thus increasing the air pressure near the inlet b1. The increased air pressure near the inlet b1 reduces the thermal resistance between the chuck 1 and the workpiece, thereby improving the heating uniformity of the workpiece.
[0046] Refer to together Figure 4 and Figure 7a , Figure 7b Each exhaust port 12 has an outlet b2 that is connected to a first exhaust pipe 2111 of the exhaust pipe assembly 211. The first exhaust pipe 2111 is coaxially connected to the exhaust port 12. The radial dimension of the first exhaust pipe 2111 is h2, and the radial dimension of the second section 122 of the exhaust port 12 is h12. h2 is greater than h12, making the first exhaust pipe 2111 and the second section 122 step-like. When gas enters the first exhaust pipe 2111 from the exhaust port 12, the gas flow area increases, resulting in smoother flow. The extension direction of the first exhaust pipe 2111 is parallel to the extension direction of the exhaust port 12, further facilitating airflow.
[0047] Combination Figure 4 Please refer to Figure 8a The diagram shows a top view of the chuck 1. The air groove structure 11 exemplarily includes two circumferential air grooves 111, namely circumferential air groove 111a and circumferential air groove 111b, which are concentrically distributed, with circumferential air groove 111a located on the inner side. The air groove structure 11 exemplarily includes four radial air grooves 112, arranged in a ring around the center of the chuck 1. The air groove structure 11 also exemplarily includes a guide groove 113. Two evacuation ports 12 are provided, each communicating with the innermost circumferential air groove 111a via a guide groove 113. The two evacuation ports 12 are located outside the area surrounded by the circumferential air groove 111a. When a vacuum is applied to the surface a1 of the chuck 1, such as... Figure 8bAs shown, the gas in the circumferential gas groove 111b flows to the circumferential gas groove 111a via the radial gas groove 112 in the direction indicated by the arrow. The gas in the circumferential gas groove 111a flows to the extraction hole 12 via the guide groove 113 in the direction indicated by the arrow, and is finally extracted through the extraction pipe group 211 of the support structure 2.
[0048] Combination Figure 4 Please refer to Figure 9a The diagram shows a top view of another chuck 1. The air groove structure 11 exemplarily includes two circumferential air grooves 111, namely circumferential air groove 111a and circumferential air groove 111b, which are concentrically distributed, with circumferential air groove 111a located on the inner side. The air groove structure 11 exemplarily includes two radial air grooves 112, which are centrally symmetrically distributed with reference to the center of the chuck 1. The air groove structure 11 also exemplarily includes a guide groove 113. Two suction holes 12 are provided, each suction hole 12 communicating with the innermost circumferential air groove 111a via a guide groove 113. The two suction holes 12 are located within the area surrounded by the circumferential air groove 111a. When a vacuum is applied to the surface a1 of the chuck 1, such as... Figure 9b As shown, the gas in the circumferential gas groove 111b flows to the circumferential gas groove 111a via the radial gas groove 112 in the direction indicated by the arrow. The gas in the circumferential gas groove 111a flows to the extraction hole 12 via the guide groove 113 in the direction indicated by the arrow, and is finally extracted through the extraction pipe group 211 of the support structure 2.
[0049] It should be understood that the cross-section of the circumferential air groove 111, radial air groove 112, and air guide groove 113 is not limited and can be trapezoidal, elliptical, rectangular, semi-circular, etc. The air groove structure 11 can be processed by laser, machining, sandblasting, etc.
[0050] The vacuum chuck 10 provided in this embodiment can be used in process to adsorb workpieces. By performing a vacuum treatment between the surface a1 of the chuck 1 and the workpiece, the workpiece is reliably adsorbed onto the surface a1 of the chuck 1. During the vacuum treatment, the gas between the surface a1 of the chuck 1 and the workpiece enters the evacuation port 12 through the gas groove structure 11 and is extracted through the evacuation pipe assembly 211. Because the gas flow area of the inlet b1 of the evacuation port 12 is small, the airflow resistance can be increased, which can reduce the low pressure state near the inlet b1 caused by vacuum treatment, thereby reducing the influence of the evacuation port 12 on the gas pressure distribution between the surface a1 of the chuck 1 and the workpiece. This reduces the thermal resistance between the chuck 1 and the workpiece, improves the temperature uniformity of the workpiece, and helps to improve the effect of process treatment.
[0051] Obviously, those skilled in the art can make various modifications and variations to the embodiments of the present invention without departing from the spirit and scope of the invention. Therefore, if these modifications and variations fall within the scope of the claims of the present invention and their equivalents, the present invention also intends to include these modifications and variations.
Claims
1. A vacuum chuck, characterized in that, include: A chuck (1) has a surface and a bottom surface. The chuck (1) is provided with an air extraction hole (12) penetrating the surface and the bottom surface. The air extraction hole (12) has an air inlet located on the surface of the chuck (1) and an air outlet located on the bottom surface of the chuck (1). The surface of the chuck (1) is provided with an air groove structure (11) communicating with the air inlet. The gas between the surface of the chuck (1) and the workpiece to be processed is transported to the air extraction hole (12) through the air groove structure (11). The gas flow area of the air inlet is smaller than the gas flow area of the air outlet, so as to form a balanced pressure distribution between the surface of the chuck (1) and the workpiece to be processed. Support structure (2), the support structure (2) is connected to one side of the bottom surface of the chuck (1); the support structure (2) is provided with a vacuum pipe assembly (211), one end of the vacuum pipe assembly (211) is connected to the air outlet, and the other end of the vacuum pipe assembly (211) is used to connect to a vacuum pumping device; Along the direction from the surface of the chuck (1) to the bottom surface of the chuck (1), the air extraction hole (12) includes a first hole section (121) and a second hole section (122) arranged coaxially. The first hole segment (121) forms the air inlet at the end opposite to the second hole segment (122), and the second hole segment (122) forms the air outlet at the end opposite to the first hole segment (121); Wherein, the radial dimension of the first hole segment (121) is smaller than the radial dimension of the second hole segment (122); or, the radial dimension of the first hole segment (121) is greater than or equal to the radial dimension of the second hole segment (122), and the first hole segment (121) is filled with a porous medium (13).
2. The vacuum chuck according to claim 1, characterized in that, The radial dimension of the first hole segment (121) is between 0.1 mm and 1.5 mm.
3. The vacuum chuck according to claim 1, characterized in that, The porous medium (13) is a porous ceramic.
4. The vacuum chuck according to any one of claims 1-3, characterized in that, There are two air extraction holes (12), which are symmetrically distributed about the center of the chuck (1); the air groove structure (11) is symmetrically distributed about the two air extraction holes (12).
5. The vacuum chuck according to claim 4, characterized in that, The air groove structure (11) includes at least two circumferential air grooves (111), at least two radial air grooves (112), and two air guide grooves (113). The at least two circumferential air grooves (111) are arranged in concentric circles, and the center of each circumferential air groove (111) coincides with the center of the chuck (1); The at least two radial air grooves (112) are symmetrically distributed about the center of the chuck (1); the extension direction of each radial air groove (112) passes through the center of the chuck (1), and each radial air groove (112) is simultaneously connected to each circumferential air groove (111). The two air guide grooves (113) are symmetrically distributed about the center of the chuck (1), and each of the air extraction holes (12) is connected to the innermost circumferential air groove (111) of the at least two circumferential air grooves (111) through one of the air guide grooves (113).
6. The vacuum chuck according to any one of claims 1-3, characterized in that, The air extraction pipe assembly (211) includes a first air extraction pipe (2111), a second air extraction pipe (2112), a manifold pipe (2113), and a guide pipe (2114) connected in sequence. The first suction pipe (2111) is connected to the outlet of the suction hole (12), and the air guide pipe (2114) is used to connect the vacuum equipment. The gas flow area of the exhaust port (12) is smaller than the gas flow area of the first exhaust pipe (2111).
7. The vacuum chuck according to claim 6, characterized in that, The first suction pipe (2111), the second suction pipe (2112), and the air guide pipe (2114) extend in directions parallel to the surface of the chuck (1) pointing towards the bottom, while the manifold (2113) is perpendicular to the surface of the chuck pointing towards the bottom.
8. The vacuum chuck according to claim 7, characterized in that, Along the direction perpendicular to the surface of the chuck (1) and pointing to the bottom, the manifold (2113) passes through the support structure (2), and the two ends of the manifold (2113) are provided with sealing elements (2115).
9. The vacuum chuck according to any one of claims 1-3, characterized in that, The support structure (2) includes a base (22) and a support rod (21), the support rod (21) being connected between the chuck (1) and the base (22).
10. The vacuum chuck according to claim 9, characterized in that, A sealing structure (3) is provided at the connection between the base (22) and the support rod (21).
11. A process equipment, characterized in that, Includes a process chamber (20) and a vacuum chuck as described in any one of claims 1-10; The process chamber (20) has a reaction chamber, the chuck (1) of the vacuum chuck (10) is located inside the reaction chamber, and the support structure (2) extends outside the reaction chamber for communication with a vacuum pumping device.