Vapor deposition device

Abstract

The invention provides an evaporation device which is characterized in that a shell is provided with a pretreatment cavity and an evaporation cavity, a separation part capable of being opened and closed is arranged between the pretreatment cavity and the evaporation cavity, a material inlet and a vacuumizing opening are formed in the shell in an openable and closable mode, and the material inlet and the vacuumizing opening can both communicate with the pretreatment cavity; the conveying mechanism is used for receiving the material plate which enters the pretreatment cavity from the outside of the evaporation device through the material inlet and enabling the material plate to enter the evaporation cavity from the pretreatment cavity through the separation part; and the evaporation table is arranged in the evaporation cavity, the evaporation table is provided with a containing part for containing a coating material, and when the conveying mechanism is located in the evaporation cavity, the material plate is located above the evaporation table. According to the technical scheme provided by the invention, the problems that the content of water vapor needs to be controlled in evaporation equipment in the prior art, external air enters the evaporation equipment when a coating material is put into the evaporation equipment, water vapor in the evaporation cabin becomes much, and the film forming quality is influenced can be solved.

Description

Technical Field

[0001] The present invention relates to the technical field of evaporation equipment, and in particular to an evaporation device. Background Art

[0002] Vacuum evaporation refers to a process in which a certain heating method is used under vacuum conditions to convert the coating material into a gas state, and the particles fly to the surface of the substrate and condense into a film. There are five general heating methods for the evaporation source: resistance heating, electron beam heating, high-frequency induction heating, arc heating, and laser heating. Vacuum evaporation has the advantages of simple film formation method, good film purity and density, controllable film thickness and crystal morphology, and a wide range of applications. In recent years, with the development of information technology and new materials, evaporation technology has been widely used in the preparation and processing of optical and electronic devices and other fields.

[0003] In the related art, the coating material is placed on a tray, and the evaporation equipment is turned on, and then the tray and the coating material are placed in the evaporation equipment to achieve vacuum coating. However, in the related art, the water vapor content in the evaporation equipment needs to be controlled. When the coating material is placed in the evaporation equipment, external air will enter the evaporation equipment, resulting in more water vapor in the evaporation chamber, which affects the film quality. Summary of the invention

[0004] The present invention provides an evaporation device to solve the problem in the related art that the content of water vapor needs to be controlled in the evaporation equipment. When the coating material is placed in the evaporation equipment, external air will enter the evaporation equipment, resulting in more water vapor in the evaporation chamber, which affects the film quality.

[0005] The present invention provides an evaporation device, which includes: a shell, having a pretreatment chamber and an evaporation chamber, the pretreatment chamber and the evaporation chamber are arranged adjacent to each other, an openable and closable partition is arranged between the pretreatment chamber and the evaporation chamber, the partition enables the pretreatment chamber and the evaporation chamber to be connected or isolated, a material inlet and a vacuum port are openably and closably arranged on the shell, both of which can be connected to the pretreatment chamber; a conveying mechanism is used to receive a material plate entering the pretreatment chamber from the outside of the evaporation device through the material inlet, and to pass the material plate from the pretreatment chamber into the evaporation chamber through the partition; an evaporation table is arranged in the evaporation chamber, the evaporation table has a accommodating portion for accommodating a coating material, and when the conveying mechanism is located in the evaporation chamber, the material plate is located above the evaporation table.

[0006] Furthermore, the conveying mechanism includes a first conveying member and a second conveying member. The first conveying member is arranged in the pretreatment chamber and is used to receive the material plate entering the pretreatment chamber from the outside of the evaporation device through the material inlet. The second conveying member is arranged in the evaporation chamber and is used to receive the material plate entering the evaporation chamber through the partition.

[0007] Further, the first conveyor member includes a first drive motor, a first conveyor belt and a second conveyor belt, the first drive motor is drivingly connected to the first conveyor belt and the second conveyor belt respectively, the first conveyor belt and the second conveyor belt are spaced apart along the width direction of the pretreatment chamber, the material plate can be placed on the first conveyor belt and the second conveyor belt, and a first avoidance gap for materials on the material plate is provided between the first conveyor belt and the second conveyor belt; the second conveyor member includes a second drive motor, a third conveyor belt and a fourth conveyor belt, the second drive motor is drivingly connected to the third conveyor belt and the fourth conveyor belt respectively, the third conveyor belt and the fourth conveyor belt are spaced apart along the width direction of the evaporation chamber, the material plate can be placed on the third conveyor belt and the fourth conveyor belt, and a second avoidance gap for materials on the material plate is provided between the third conveyor belt and the fourth conveyor belt.

[0008] Furthermore, a first opening and closing member and a second opening and closing member are movably provided on the shell, the first opening and closing member is movably provided at the material inlet so that the material inlet has a first open state and a first closed state, and the second opening and closing member is movably provided at the material inlet so that the vacuum port has a second open state and a second closed state; wherein, when the material plate is placed on the first conveying member, the material inlet is in the first open state, the vacuum port is in the second closed state, and the partition is in the closed state; when the material plate is located in the pretreatment chamber, the material inlet is in the first closed state, the vacuum port is in the second closed state, and the partition remains in the closed state; when the material plate is conveyed to the evaporation chamber through the second conveying member, the material inlet is in the first closed state, the vacuum port is in the second closed state, and the partition is in the open state.

[0009] Furthermore, the partition portion includes a partition plate and a third opening and closing member, the partition plate is vertically arranged in the shell, an escape opening is arranged on the partition plate, and the third opening and closing member is movably arranged at the escape opening.

[0010] Furthermore, the evaporation device also includes a control unit, which is signal-connected to the first opening and closing member, the second opening and closing member, and the third opening and closing member respectively.

[0011] Furthermore, a movable baffle and a return spring are provided in the pretreatment chamber. The movable baffle is arranged in the pretreatment chamber along the horizontal direction. The side walls of the movable baffle are respectively fitted with the inner wall of the pretreatment chamber and the side wall of the partition plate. The first end of the return spring is connected to the inner wall of the top of the pretreatment chamber, and the second end of the return spring is connected to the movable baffle, so that the movable baffle can be movably arranged in the pretreatment chamber along the vertical direction.

[0012] Furthermore, a hydrogen storage tank and an oxygen storage tank are provided in the pretreatment chamber and the evaporation chamber, and the hydrogen storage tank and the oxygen storage tank are both connected to the control unit signal so that the opening of the hydrogen storage tank and the opening of the oxygen storage tank can be opened and closed.

[0013] Furthermore, a detection unit capable of detecting humidity is disposed in both the pretreatment chamber and the evaporation chamber, and the detection unit is signal-connected to the control unit.

[0014] Furthermore, the material plate includes a tray and a substrate, the tray is provided with a mounting groove, the substrate is mounted in the mounting groove, and the lower surface of the substrate is arranged toward the evaporation table.

[0015] According to the technical solution of the present invention, the evaporation device includes a shell, a conveying mechanism and an evaporation table. The shell has a pretreatment chamber and an evaporation chamber. The pretreatment chamber and the evaporation chamber are arranged adjacent to each other, and a partition is arranged between the pretreatment chamber and the evaporation chamber, which can connect or isolate the pretreatment chamber and the evaporation chamber. A material inlet is arranged on the shell in an openable and closable manner. When the material inlet is opened, a material plate can enter the pretreatment chamber from the outside of the evaporation device through the material inlet, and the pretreatment chamber is vacuumed through the vacuum port. The material plate is received by the conveying mechanism, and then the partition is opened to allow the material plate to enter the evaporation chamber from the pretreatment chamber. An evaporation table is arranged in the evaporation chamber, and the accommodating part of the evaporation table can accommodate the coating material. When the conveying mechanism is located in the evaporation chamber, the material plate can be located above the evaporation table, which is convenient for coating the material plate and ensuring the film quality. Among them, through the separation and connection of the pretreatment chamber and the evaporation chamber, and the precise control of the conveying mechanism, the efficient transmission of the material plate under different environments and the precise evaporation of the coating material are achieved. The implementation effect is manifested in improving the continuity and efficiency of the coating process, while reducing the impact of the external environment on the evaporation process and improving the coating quality. The use process is that the material plate first enters the pretreatment chamber through the material inlet, undergoes preliminary environmental adaptation and pretreatment, and then enters the evaporation chamber through the partition to evaporate the coating material. This can prevent external air from entering the evaporation equipment and affecting the vacuum environment in the evaporation chamber when the coating material enters the evaporation equipment, thereby improving the film quality of the evaporation device. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] The drawings constituting a part of the present application are used to provide a further understanding of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings:

[0017] Figure 1 A schematic diagram of an evaporation device provided according to an embodiment of the present invention is shown.

[0018] The above drawings include the following reference numerals:

[0019] 10. Shell; 11. Pretreatment chamber; 12. Evaporation chamber; 13. Partition; 14. Material inlet; 15. Vacuum outlet; 16. First opening and closing member; 17. Second opening and closing member;

[0020] 20. Conveying mechanism; 21. Material plate;

[0021] 30. Evaporation table;

[0022] 41. Moving baffle; 42. Return spring; 43. Hydrogen storage tank; 44. Oxygen storage tank. DETAILED DESCRIPTION

[0023] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments. The following description of at least one exemplary embodiment is actually only illustrative and is by no means intended to limit the present invention and its application or use. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0024] like Figure 1 As shown, an embodiment of the present invention provides an evaporation device, which includes a shell 10, a conveying mechanism 20 and an evaporation table 30. The shell 10 has a pretreatment chamber 11 and an evaporation chamber 12. The pretreatment chamber 11 and the evaporation chamber 12 are arranged adjacent to each other. An openable and closable partition 13 is arranged between the pretreatment chamber 11 and the evaporation chamber 12. The partition 13 enables the pretreatment chamber 11 and the evaporation chamber 12 to be connected or isolated. The shell 10 is openably and closably provided with a material inlet 14 and a vacuum port 15. The material inlet 14 and the vacuum port 15 are provided on the shell 10. The port 14 and the vacuum port 15 can be communicated with the pretreatment chamber 11. The conveying mechanism 20 is used to receive the material plate 21 entering the pretreatment chamber 11 from the outside of the evaporation device through the material inlet 14, and pass the material plate 21 from the pretreatment chamber 11 into the evaporation chamber 12 through the partition 13. The evaporation table 30 is arranged in the evaporation chamber 12. The evaporation table 30 has a accommodating portion for accommodating the coating material. When the conveying mechanism 20 is located in the evaporation chamber 12, the material plate 21 is located above the evaporation table 30.

[0025] The evaporation device provided in this embodiment is applied, and the evaporation device includes a shell 10, a conveying mechanism 20 and an evaporation table 30. The shell 10 has a pretreatment chamber 11 and an evaporation chamber 12. The pretreatment chamber 11 and the evaporation chamber 12 are arranged adjacent to each other, and a partition is arranged between the pretreatment chamber 11 and the evaporation chamber 12, which can connect or isolate the pretreatment chamber 11 and the evaporation chamber 12. The shell 10 is provided with a material inlet 14 that can be opened and closed. When the material inlet 14 is opened, a material plate 21 can be introduced from the outside of the evaporation device through the material The inlet 14 enters the pretreatment chamber 11, and the pretreatment chamber 11 is vacuumed through the vacuum port 15. The material plate 21 is received by the conveying mechanism 20, and then the partition 13 is opened to allow the material plate 21 to enter the evaporation chamber 12 from the pretreatment chamber 11. An evaporation table 30 is provided in the evaporation chamber 12. The accommodating portion of the evaporation table 30 can accommodate the coating material, and when the conveying mechanism 20 is located in the evaporation chamber 12, the material plate 21 can be located above the evaporation table 30, which is convenient for coating the material plate 21 and ensuring the film quality. Among them, through the separation and connection of the pretreatment chamber 11 and the evaporation chamber 12, and the precise control of the conveying mechanism 20, the efficient transmission of the material plate 21 in different environments and the precise evaporation of the coating material are achieved. The implementation effect is manifested in that the continuity and efficiency of the coating process are improved, while the influence of the external environment on the evaporation process is reduced, and the coating quality is improved. The use process is that the material plate 21 first enters the pretreatment chamber 11 through the material inlet 14 to undergo preliminary environmental adaptation and pretreatment, and then enters the evaporation chamber 12 through the partition 13 to undergo evaporation coating of the coating material. This can prevent outside air from entering the evaporation chamber 12 and affecting the vacuum environment in the evaporation chamber 12 when the coating material enters the evaporation device, thereby improving the film formation quality of the evaporation device.

[0026] In this embodiment, the conveying mechanism 20 includes a first conveying member and a second conveying member. The first conveying member is arranged in the pretreatment chamber 11 and is used to receive the material plate 21 entering the pretreatment chamber 11 from the outside of the evaporation device through the material inlet 14. The second conveying member is arranged in the evaporation chamber 12 and is used to receive the material plate 21 entering the evaporation chamber 12 through the partition 13. With the above structure, the smooth transition and precise positioning of the material plate 21 between the pretreatment chamber 11 and the evaporation chamber 12 are achieved through the cooperation of the first conveying member and the second conveying member. The implementation effect is manifested in that the stability and accuracy of material transmission are improved, the damage of the coating material during the transmission process is reduced, and the continuity of the coating process is accelerated. The use process is that after the material plate 21 completes the pretreatment on the first conveying member, it smoothly transitions to the second conveying member through the partition 13, and is then accurately sent to the top of the evaporation table 30 for coating.

[0027] In this embodiment, the first conveyor member includes a first drive motor, a first conveyor belt and a second conveyor belt, the first drive motor is respectively driven and connected to the first conveyor belt and the second conveyor belt, the first conveyor belt and the second conveyor belt are spaced apart along the width direction of the pretreatment chamber 11, the material plate 21 can be placed on the first conveyor belt and the second conveyor belt, and a first avoidance gap is provided between the first conveyor belt and the second conveyor belt to avoid the material of the material plate 21, the second conveyor member includes a second drive motor, a third conveyor belt and a fourth conveyor belt, the second drive motor is respectively driven and connected to the third conveyor belt and the fourth conveyor belt, the third conveyor belt and the fourth conveyor belt are spaced apart along the width direction of the evaporation chamber 12, the material plate 21 can be placed on the third conveyor belt and the fourth conveyor belt, and a second avoidance gap is provided between the third conveyor belt and the fourth conveyor belt to avoid the material of the material plate 21.

[0028] With the above structure, the material plate 21 is precisely controlled and transmitted through the cooperation of the first drive motor, the first conveyor belt and the second conveyor belt. At the same time, the design of the first avoidance gap and the second avoidance gap ensures that the material on the material plate 21 will not be disturbed by the conveying mechanism 20, so as to maintain the integrity of the material and the coating effect. The implementation effect is manifested in that the accuracy and efficiency of material transmission are improved, while the loss of materials during the transmission process is reduced, and the utilization rate of coating materials is improved. The application scenarios include coating processes that require high-precision material transmission and coating material protection, such as the transmission and coating of high-purity coating materials. The use process is that the material plate 21 is placed on the first conveyor belt and the second conveyor belt, and is smoothly transmitted to the designated position in the pretreatment chamber 11 by the drive of the first drive motor, and then smoothly transitioned to the third conveyor belt and the fourth conveyor belt by the drive of the second drive motor, and enters the evaporation chamber 12 for coating. Therefore, the material plate 21 can be transported by utilizing the first conveying member in the pretreatment chamber 11 and the second conveying member in the evaporation chamber 12, so that the material plate 21 can enter the pretreatment chamber 11 through the material inlet 14 from the outside of the evaporation device, and then be transported to the partition 13 under the action of the first conveying member. The partition 13 is opened, and then transported from the pretreatment chamber 11 to the evaporation chamber 12 under the action of the second conveying member, so that the material plate 21 can be coated in the evaporation chamber 12.

[0029] like Figure 1As shown, a first opening and closing member 16 and a second opening and closing member 17 are movably provided on the shell 10, and the first opening and closing member 16 is movably provided at the material inlet 14 so that the material inlet 14 has a first open state and a first closed state, and the second opening and closing member 17 is movably provided at the material inlet 14 so that the vacuum port 15 has a second open state and a second closed state, wherein, when the material plate 21 is placed on the first conveying member, the material inlet 14 is in the first open state, the vacuum port 15 is in the second closed state, and the partition 13 is in the closed state; when the material plate 21 is located in the pretreatment chamber 11, the material inlet 14 is in the first closed state, the vacuum port 15 is in the second closed state, and the partition 13 remains in the closed state; when the material plate 21 is conveyed to the evaporation chamber 12 through the second conveying member, the material inlet 14 is in the first closed state, the vacuum port 15 is in the second closed state, and the partition 13 is in the open state.

[0030] With the above structure, when the material plate 21 enters the pretreatment chamber 11 from the outside of the evaporation device, the first opening and closing member 16 needs to be in the first opening state, at which time the second opening and closing member 17 is in the second closing state, and the partition 13 is in the isolation state. Then, the second opening and closing member 17 is opened in the second opening state, and the first opening and closing member 16 is in the first closing state, and the pretreatment chamber 11 is vacuumed. Then, the partition 13 is in the connection state, the first opening and closing member 16 is in the first closing state, and the second opening and closing member 17 is in the second closing state. Then, under the action of the first conveying member and the second conveying member, the material plate 21 can be easily conveyed from the pretreatment chamber 11 to the evaporation chamber 12, and the material plate 21 can be coated in the evaporation chamber 12. The principle of this design is to achieve independent environmental control of the pretreatment chamber 11 and the evaporation chamber 12, and smooth transition of the material plate 21 between different environments through precise control of the first opening and closing member and the second opening and closing member. The implementation effect is to improve the environmental control accuracy of the coating process, reduce the impact of the external environment on the coating process, accelerate the continuity of the coating process, and improve production efficiency. The use process is that the material plate 21 enters the pretreatment chamber 11 through the opening of the first opening and closing member, and the environmental conditions of the pretreatment chamber 11 are independently controlled by closing the vacuum port 15 and closing the first opening and closing member, and then smoothly transitions to the evaporation chamber 12 for coating by opening the partition 13.

[0031] In this embodiment, the partition 13 includes a partition plate and a third opening and closing member. The partition plate is vertically arranged in the shell 10, and a avoidance opening is arranged on the partition plate. The third opening and closing member is movably arranged at the avoidance opening. With the above structure, the physical isolation and connection control between the pretreatment chamber 11 and the evaporation chamber 12 are achieved through the cooperation of the partition plate and the third opening and closing member, ensuring the independence of the two environments and the continuity of the coating process. The implementation effect is manifested in that the environmental isolation effect of the coating process is improved, the mutual influence between different environments is reduced, and the coating quality and production efficiency are improved. The use process is that after the material plate 21 completes the pretreatment in the pretreatment chamber 11, the third opening and closing member is opened, and the material plate 21 smoothly transitions to the evaporation chamber 12 through the avoidance opening for coating.

[0032] In this embodiment, the evaporation device also includes a control unit, and the control unit is respectively connected to the first opening and closing member 16, the second opening and closing member 17, and the third opening and closing member by signal. With the above structure, the environmental conditions of the pretreatment chamber 11 and the evaporation chamber 12 are precisely controlled through the intelligent control of the control unit, and the material plate 21 smoothly transitions between different environments. The implementation effect is manifested in that the degree of automation and the accuracy of environmental control in the coating process are improved, manual intervention is reduced, and production efficiency is improved. Application scenarios include coating processes that require a high degree of automation and precise environmental control, such as continuous coating in large-scale production, coating of high-precision coating materials, etc. The use process is that the control unit automatically controls the states of the first opening and closing member, the second opening and closing member, and the third opening and closing member according to preset process parameters to ensure the smooth transition of the material plate 21 between the pretreatment chamber 11 and the evaporation chamber 12.

[0033] It should be noted that the first opening and closing member 16 , the second opening and closing member 17 and the third opening and closing member are all gate valves.

[0034] like Figure 1As shown, a movable baffle 41 and a reset spring 42 are provided in the pretreatment chamber 11. The movable baffle 41 is arranged in the pretreatment chamber 11 in the horizontal direction. The side walls of the movable baffle 41 are respectively fitted with the inner wall of the pretreatment chamber 11 and the side wall of the partition plate. The first end of the reset spring 42 is connected to the inner wall of the top of the pretreatment chamber 11, and the second end of the reset spring 42 is connected to the movable baffle 41, so that the movable baffle 41 is movably arranged in the pretreatment chamber 11 along the vertical direction. With the above structure, the dynamic adjustment of the internal environment of the pretreatment chamber 11 is realized through the cooperation of the movable baffle 41 and the reset spring 42, so as to ensure the environmental stability of the material plate 21 during the transmission process. The implementation effect is manifested in that the environmental control accuracy of the pretreatment chamber 11 is improved, the environmental fluctuation of the material plate 21 during the transmission process is reduced, and the coating quality and production efficiency are improved. During use, when the material plate 21 enters the pretreatment chamber 11, the movable baffle 41 is automatically adjusted according to the size and position of the material plate 21 to ensure the stability of the internal environment of the pretreatment chamber 11, and to facilitate the discharge of air when the movable baffle 41 moves vertically during vacuuming. Subsequently, the movable baffle 41 is reset through the action of the reset spring 42 to prepare for the entry of the next material plate 21.

[0035] like Figure 1 As shown, a hydrogen storage tank 43 and an oxygen storage tank 44 are provided in the pretreatment chamber 11 and the evaporation chamber 12, and the hydrogen storage tank 43 and the oxygen storage tank 44 are both connected to the control unit signal so that the opening of the hydrogen storage tank 43 and the opening of the oxygen storage tank 44 can be opened and closed. With the above structure, the gas environment inside the pretreatment chamber 11 and the evaporation chamber 12 can be accurately adjusted through the dynamic gas supply of the hydrogen storage tank 43 and the oxygen storage tank 44, and the precise control of the control unit to meet the requirements of different coating processes. The implementation effect is manifested in improving the gas environment control accuracy of the coating process, reducing the impact of the gas environment on the coating process, and improving the coating quality and production efficiency. The use process is that the control unit automatically controls the gas supply of the hydrogen storage tank 43 and the oxygen storage tank 44 according to the process requirements to ensure the humidity environment in the evaporation chamber 12, which can avoid high or low humidity. When the humidity is high, vacuum treatment is required. When the humidity is low, gas needs to be supplied through the hydrogen storage tank 43 and the oxygen storage tank 44. After that, a reaction is carried out to ensure that the humidity is at a predetermined standard, thereby ensuring the precise adjustment of the gas environment inside the pretreatment chamber 11 and the evaporation chamber 12 to meet the requirements of different coating materials and processes.

[0036] In this embodiment, a detection unit capable of detecting humidity is provided in both the pretreatment chamber 11 and the evaporation chamber 12, and the detection unit is connected to the control unit by signal. With the above structure, the humidity changes inside the pretreatment chamber 11 and the evaporation chamber 12 are monitored in real time by the detection unit, and the intelligent control of the control unit is used to achieve precise control of the humidity environment of the coating process to meet the needs of different coating processes. The implementation effect is manifested in improving the humidity control accuracy of the coating process, reducing the impact of the humidity environment on the coating process, and improving the coating quality and production efficiency. The use process is that the detection unit monitors the humidity inside the pretreatment chamber 11 and the evaporation chamber 12 in real time, and the control unit automatically adjusts the gas environment according to the monitoring results to ensure precise control of the humidity environment of the coating process.

[0037] In this embodiment, the material plate 21 includes a tray and a substrate. The tray is provided with a mounting groove, the substrate is installed in the mounting groove, and the lower surface of the substrate is arranged toward the evaporation table 30. With the above structure, the tray and the substrate cooperate to achieve accurate positioning and protection of the coating material, ensuring the stability of the coating process and the coating effect. The use process is that the coating material is placed on the substrate, the substrate is installed in the mounting groove of the tray, ensuring the accurate positioning and protection of the coating material, and then it is smoothly transferred to the top of the evaporation table 30 by the conveying mechanism 20 for coating. And the lower surface of the substrate is arranged toward the evaporation table 30, which is convenient for the evaporation table 30 to coat the substrate.

[0038] It should be noted that the terms used herein are only for describing specific embodiments and are not intended to limit the exemplary embodiments according to the present application. As used herein, unless the context clearly indicates otherwise, the singular form is also intended to include the plural form. In addition, it should be understood that when the terms "comprise" and / or "include" are used in this specification, it indicates the presence of features, steps, operations, devices, components and / or combinations thereof.

[0039] Unless otherwise specifically stated, the relative arrangement, numerical expressions and numerical values ​​of the parts and steps set forth in these embodiments do not limit the scope of the present invention. Meanwhile, it should be understood that, for ease of description, the sizes of the various parts shown in the accompanying drawings are not drawn according to the actual proportional relationship. The technology, method and equipment known to those of ordinary skill in the relevant art may not be discussed in detail, but in appropriate cases, the technology, method and equipment should be considered as a part of the specification. In all examples shown and discussed here, any specific value should be interpreted as being merely exemplary, rather than as a limitation. Therefore, other examples of exemplary embodiments may have different values. It should be noted that similar reference numerals and letters represent similar items in the following drawings, and therefore, once a certain item is defined in an accompanying drawing, it does not need to be further discussed in subsequent drawings.

[0040] In the description of the present invention, it is necessary to understand that the directions or positional relationships indicated by directional words such as "front, back, up, down, left, right", "lateral, vertical, perpendicular, horizontal" and "top, bottom" are usually based on the directions or positional relationships shown in the drawings. They are only for the convenience of describing the present invention and simplifying the description. Unless otherwise specified, these directional words do not indicate or imply that the devices or elements referred to must have a specific direction or be constructed and operated in a specific direction. Therefore, they cannot be understood as limiting the scope of protection of the present invention. The directional words "inside and outside" refer to the inside and outside relative to the contours of each component itself.

[0041] For ease of description, spatially relative terms such as "above", "above", "on the upper surface of", "above", etc. may be used here to describe the spatial positional relationship between a device or feature and other devices or features as shown in the figure. It should be understood that spatially relative terms are intended to include different orientations of the device in use or operation in addition to the orientation described in the figure. For example, if the device in the accompanying drawings is inverted, the device described as "above other devices or structures" or "above other devices or structures" will be positioned as "below other devices or structures" or "below other devices or structures". Thus, the exemplary term "above" can include both "above" and "below". The device can also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatially relative descriptions used here are interpreted accordingly.

[0042] In addition, it should be noted that the use of terms such as "first" and "second" to limit components is only for the convenience of distinguishing the corresponding components. If not otherwise stated, the above terms have no special meaning and therefore cannot be understood as limiting the scope of protection of the present invention.

[0043] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A vapor deposition device, characterized in that: The evaporation device comprises: A shell (10) comprises a pretreatment chamber (11) and a vapor deposition chamber (12), wherein the pretreatment chamber (11) and the vapor deposition chamber (12) are arranged adjacent to each other, and an openable and closable partition (13) is arranged between the pretreatment chamber (11) and the vapor deposition chamber (12), wherein the partition (13) enables the pretreatment chamber (11) and the vapor deposition chamber (12) to be connected or isolated, and a material inlet (14) and a vacuum port (15) are openably and closably arranged on the shell (10), wherein both the material inlet (14) and the vacuum port (15) can be connected to the pretreatment chamber (11); a conveying mechanism (20) for receiving a material plate (21) entering the pretreatment chamber (11) from the outside of the evaporation device through the material inlet (14), and conveying the material plate (21) from the pretreatment chamber (11) into the evaporation chamber (12) through the partition (13); An evaporation table (30) is arranged in the evaporation chamber (12), and the evaporation table (30) has a receiving portion for receiving a coating material. When the conveying mechanism (20) is located in the evaporation chamber (12), the material plate (21) is located above the evaporation table (30).

2. The evaporation device according to claim 1, characterized in that: The conveying mechanism (20) comprises a first conveying member and a second conveying member, wherein the first conveying member is arranged in the pretreatment chamber (11) and is used to receive the material plate (21) entering the pretreatment chamber (11) from the outside of the evaporation device through the material inlet (14), and the second conveying member is arranged in the evaporation chamber (12) and is used to receive the material plate (21) entering the evaporation chamber (12) through the partition (13).

3. The evaporation device according to claim 2, characterized in that: The first conveyor member comprises a first drive motor, a first conveyor belt and a second conveyor belt, the first drive motor is respectively connected to the first conveyor belt and the second conveyor belt, the first conveyor belt and the second conveyor belt are arranged at intervals along the width direction of the pre-treatment chamber (11), the material plate (21) can be placed on the first conveyor belt and the second conveyor belt, and a first avoidance gap is provided between the first conveyor belt and the second conveyor belt for avoiding the material of the material plate (21); The second conveying member comprises a second driving motor, a third conveying sub-belt and a fourth conveying sub-belt, the second driving motor is respectively connected to the third conveying sub-belt and the fourth conveying sub-belt for driving, the third conveying sub-belt and the fourth conveying sub-belt are arranged at intervals along the width direction of the evaporation chamber (12), the material plate (21) can be placed on the third conveying sub-belt and the fourth conveying sub-belt, and a second avoidance gap is provided between the third conveying sub-belt and the fourth conveying sub-belt for avoiding the material of the material plate (21).

4. The evaporation device according to claim 2, characterized in that: A first opening and closing member (16) and a second opening and closing member (17) are movably provided on the housing (10); the first opening and closing member (16) is movably provided at the material inlet (14) so ​​that the material inlet (14) has a first open state and a first closed state; the second opening and closing member (17) is movably provided at the material inlet (14) so ​​that the vacuum port (15) has a second open state and a second closed state; Wherein, when the material plate (21) is placed on the first conveying member, the material inlet (14) is in the first open state, the vacuum port (15) is in the second closed state, and the partition (13) is in the closed state; when the material plate (21) is located in the pretreatment chamber (11), the material inlet (14) is in the first closed state, the vacuum port (15) is in the second closed state, and the partition (13) remains in the closed state; when the material plate (21) is conveyed to the evaporation chamber (12) via the second conveying member, the material inlet (14) is in the first closed state, the vacuum port (15) is in the second closed state, and the partition (13) is in the open state.

5. The evaporation device according to claim 4, characterized in that: The partition portion (13) comprises a partition plate and a third opening and closing member, wherein the partition plate is vertically arranged in the housing (10), an escape opening is arranged on the partition plate, and the third opening and closing member is movably arranged at the escape opening.

6. The evaporation device according to claim 5, characterized in that: The evaporation device further comprises a control unit, which is respectively connected to the first opening and closing member (16), the second opening and closing member (17) and the third opening and closing member by signals.

7. The evaporation device according to claim 5, characterized in that: A movable baffle (41) and a return spring (42) are arranged in the pretreatment chamber (11); the movable baffle (41) is arranged in the pretreatment chamber (11) along the horizontal direction; the side walls of the movable baffle (41) are respectively in contact with the inner wall of the pretreatment chamber (11) and the side wall of the partition plate; the first end of the return spring (42) is connected to the inner wall of the top of the pretreatment chamber (11); the second end of the return spring (42) is connected to the movable baffle (41), so that the movable baffle (41) is movably arranged in the pretreatment chamber (11) along the vertical direction.

8. The evaporation device according to claim 7, characterized in that: The pretreatment chamber (11) and the evaporation chamber (12) are both provided with a hydrogen storage tank (43) and an oxygen storage tank (44), and the hydrogen storage tank (43) and the hydrogen storage tank (43) are both connected to the control unit signal so that the opening of the hydrogen storage tank (43) and the opening of the oxygen storage tank (44) can be opened and closed.

9. The evaporation device according to claim 6, characterized in that: The pretreatment chamber (11) and the evaporation chamber (12) are both provided with a detection unit capable of detecting humidity, and the detection unit is signal-connected to the control unit.

10. The evaporation device according to claim 1, characterized in that: The material plate (21) comprises a tray and a substrate, the tray is provided with a mounting groove, the substrate is mounted in the mounting groove, and the lower surface of the substrate is arranged towards the evaporation table (30).

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