Wear-resistant impurity pump and pump body thereof

Abstract

The invention discloses a wear-resistant impurity pump and a pump body thereof, the wear-resistant impurity pump comprises the pump body, an impeller and a sealing device arranged between the pump body and the impeller, and the sealing device comprises a moving ring, a static ring and a guide sleeve; a static ring cavity for accommodating the static ring is formed between the radial outer side of the guide sleeve and the pump body; a medium enters an impeller suction inlet of the impeller through the radial inner side of the guide sleeve, the end, away from the impeller, of the static ring is a free end, and the end, capable of making contact with the movable ring, of the static ring is a friction end. The static ring can move in the axis direction of the guide sleeve. The static ring cavity is communicated with a flushing water inlet; the axial thickness of the guide sleeve is larger than that of the static ring. The wear-resistant impurity pump can prevent or reduce internal leakage of media, and is better in sealing performance and wear resistance, low in cost and easy to maintain.

Description

Technical Field

[0001] The invention belongs to the field of manufacturing wear-resistant impurity pumps, and in particular relates to a wear-resistant impurity pump and a pump body thereof. Background Art

[0002] The vane pump is the most common fluid conveying equipment; when the conveyed liquid contains solid particles, that is, when the medium is a liquid-solid two-phase flow, this vane pump is often called a debris pump. Depending on the usage scenario, the debris pump is sometimes also called a slurry pump, sewage pump, gravel pump, etc. Since solid particles can cause great wear on the impeller, pump body and other flow parts of the pump, the flow parts of the debris pump are generally made of more wear-resistant materials, such as wear-resistant alloys, wear-resistant rubber, ceramics, etc. For clean water pumps, in order to improve the efficiency of the pump, a sealing ring is generally designed to reduce internal leakage. However, for the debris pump, since solid particles can cause the sealing ring to wear quickly and fail, a sealing ring is generally not designed, but an auxiliary blade is designed to reduce internal leakage. However, whether it is a sealing ring or an auxiliary blade, internal leakage of the debris pump is unavoidable. For impurity pumps, internal leakage not only leads to a decrease in the working efficiency of the pump, but more importantly, it leads to accelerated wear of the flow-through parts. This is because when the particles in the medium leak from the high-pressure area in the pump body through the gap between the impeller front cover and the pump body toward the suction port, the medium's scouring speed on the outer surface of the impeller front cover and the surface of the corresponding pump body part is much higher than the scouring speed on other parts such as the flow-through parts, which also causes the wear speed of the surface of this part to be much higher than that of other parts.

[0003] In order to solve this problem, the invention patent with the authorized patent number CN114738311 B discloses "a leak-free centrifugal pump", the utility model patent with the authorized patent number CN2150371Y discloses "a pump suction ring sealing device", and the invention patent application with the application publication number CN116696784A discloses "a ship-used mud and sand pump with an inlet sealing ring". The above three patents / patent applications all disclose that a structure similar to a mechanical seal friction pair is set at the position of the impeller sealing ring, and the seal is compressed by elastic parts such as springs, and the friction pair is used to block the leakage of the medium in the high-pressure area of ​​the pressure chamber to the low-pressure area of ​​the suction port. This structure can indeed solve the leakage problem in theory, but in actual operation, under the influence of friction of the medium containing a large amount of particles, the life of the friction pair will be very short, so it is difficult to promote in actual industrial applications.

[0004] Therefore, in order to improve the life of the impeller mouth ring, the invention patent application with application publication number CN116696784A discloses "a ship-based mud and sand pump with an inlet sealing ring", which proposes a technical solution of opening a flushing hole in the mouth ring and flushing the mouth ring with external clean water through the flushing hole. However, since this technical solution can only flush the mouth ring, it cannot reduce the flow rate of the medium in the high-pressure area of ​​the pressure chamber leaking to the suction port, and the wear condition of the outer surface of the impeller front cover plate and the corresponding flow surface of the pump body has not been significantly improved, so the effect of extending the life of the flow parts is extremely limited.

[0005] In addition, an invention patent application with application publication number CN116066373A discloses a "zero leakage, easy-to-maintain, and efficient slurry pump". The solution proposed in the invention patent application sets up 4 pairs of friction pairs. After high-pressure clean water is injected into the friction pairs, two front and rear high-pressure clean water chambers are formed. Clean water is used to flush and cool the 4 pairs of friction pairs, thereby reducing the wear of the flow-through parts. The above solution can theoretically reduce the wear of the flow-through parts, but the slurry pump of the solution has a complex structure, a high manufacturing cost, and it is difficult to guarantee the life of the friction pairs, which leads to a high maintenance frequency. At the same time, when the friction pairs are repaired and replaced, the entire pump body must be disassembled, and the maintenance workload is large, so it is difficult to promote. Summary of the invention

[0006] In order to overcome the deficiencies of the prior art, the present invention provides a wear-resistant impurity pump, which can prevent or reduce internal leakage of the medium, has better sealing and wear resistance, lower cost and is easy to maintain.

[0007] A second object of the present invention is to provide a pump body for the above-mentioned wear-resistant impurity pump.

[0008] The technical solution of the present invention to solve the above technical problems is:

[0009] A wear-resistant impurity pump comprises a pump body, an impeller and a sealing device arranged between the pump body and the impeller, wherein the sealing device comprises a dynamic ring, a static ring and a guide sleeve; a static ring cavity for accommodating the static ring is formed between the radial outer side of the guide sleeve and the pump body; a medium enters the impeller suction port of the impeller through the radial inner side of the guide sleeve, the end of the static ring away from the impeller is a free end, and the end of the static ring that can contact the dynamic ring is a friction end; the static ring can move along the axial direction of the guide sleeve; the static ring cavity is connected to the flushing water inlet; the axial thickness of the guide sleeve is greater than the axial thickness of the static ring.

[0010] Preferably, the guide sleeve is mounted on the pump body, and the guide sleeve can be installed in the pump body along the suction direction of the impeller, and the static ring can be installed in the pump body along the suction direction of the impeller.

[0011] Preferably, the guide sleeve extends from the outer end surface of the pump body to the suction port of the impeller; a positioning flange is provided on the guide sleeve, and the positioning flange is arranged at an end of the guide sleeve away from the impeller; the pump body is provided with a positioning stop at a position corresponding to the positioning flange; the positioning stop and the pump body are coaxially arranged; the outer diameter of the positioning flange is larger than the outer diameter of the static ring.

[0012] Preferably, the flushing water inlet is arranged in the static ring cavity at one end away from the impeller and close to the positioning flange.

[0013] Preferably, there is a first fitting gap between the guide sleeve and the stationary ring, and there is a second fitting gap between the stationary ring and the pump body; and the size of the first fitting gap is smaller than the size of the second fitting gap.

[0014] Preferably, a seal is provided between the guide sleeve and the static ring, and the seal is a sealing ring.

[0015] Preferably, the sealing device also includes an anti-rotation structure for preventing relative rotation between the guide sleeve and the stationary ring; the anti-rotation structure includes a pin arranged on the guide sleeve; the axial direction of the pin is parallel to the axial direction of the stationary ring cavity; and a keyway cooperating with the pin is arranged on the stationary ring.

[0016] Preferably, the sealing device also includes an elastic member for driving the stationary ring to move toward the dynamic ring, one end of the elastic member acts on the stationary ring, and the other end acts on the guide sleeve; when the guide sleeve is removed, the elastic member is taken out of the pump body along the opposite direction of the suction direction of the impeller.

[0017] Preferably, the axial thickness of the stationary ring is 3-20 times the axial thickness of the dynamic ring, and the hardness of the stationary ring is less than the hardness of the dynamic ring.

[0018] Preferably, an inlet flange is provided on the outer end of the suction port of the pump body, and the outer end face of the guide sleeve is flush with the end face of the inlet flange; the flushing water inlet is close to the inlet flange, and the axial direction of the flushing water inlet is perpendicular to the axial direction of the pump body.

[0019] Preferably, the stationary ring is provided with a plurality of water holes extending from the free end of the stationary ring to the friction end thereof, and a water guide groove connected to the water holes is provided at the friction end of the stationary ring, wherein the water guide groove is annular; and a plurality of water spray holes are provided on the outer side of the friction end of the stationary ring.

[0020] A pump body used for the wear-resistant impurity pump.

[0021] Compared with the prior art, the present invention has the following advantages and beneficial effects:

[0022] 1. The sealing device in the wear-resistant impurity pump of the present invention has a simple structure, wherein the guide sleeve is not only a channel for the medium to flow into the impeller suction port, but also the stationary ring can rely on the guide sleeve to maintain its coaxiality and flatness with the moving ring. Therefore, the axial length of the stationary ring can be extended to obtain a longer compensation length without increasing the axial size of the impurity pump, thereby improving the coaxiality and flatness level of the stationary ring and the moving ring, which is beneficial to reduce the wear of the friction pair formed between the stationary ring and the moving ring; on the other hand, the stationary ring can also obtain a smaller radial size, thereby reducing the friction line speed between the friction pairs, thereby extending the life of the friction pairs.

[0023] 2. When the wear-resistant impurity pump of the present invention is working, the flushing water can flow from the gap between the static ring cavity and the static ring to the friction pair formed by the static ring and the dynamic ring. At the same time, the water pressure pushes the static ring to move axially in the direction of the dynamic ring, so that the dynamic ring and the static ring are in contact to block the channel for the medium in the high-pressure area to leak to the low-pressure area, thereby reducing the leakage to the inlet low-pressure area; because the pressure of the flushing water can be higher than the pressure of the medium at the friction pair and the suction port, the flushing water will penetrate into the surface of the friction pair and lubricate and cool it. Compared with the prior art, the contact force and sealing effect between the static ring and the dynamic ring will not change significantly due to the surface wear of the friction pair and the change in the length of the static ring, and the medium entering the friction pair is mainly high-pressure clean water, which carries fewer solid particles. Therefore, the life of the friction pair can be greatly improved.

[0024] 3. When the wear-resistant impurity pump of the present invention is working, under the condition that the amount of flushing water and the pressure are appropriate, the injection amount of flushing water can be greater than the leakage between the friction pairs. At this time, the medium in the high-pressure area of ​​the pump body will not leak toward the suction port, and part of the flushing water will flow from the friction pair to the high-pressure area of ​​the pump body. The solid particles in the medium are difficult to enter the gap between the impeller front cover and the pump body due to the centrifugal effect of the impeller rotation. This will greatly reduce the wear of the outer surface of the impeller front cover and its corresponding pump body parts, which is beneficial to increase the service life of the impurity pump.

[0025] 4. Even if the amount of flushing water is less than the leakage between the friction pairs, it can still reduce the leakage from the high-pressure area of ​​the pump body to the suction port, thereby reducing the leakage flow rate or concentration and increasing the life of the wear-resistant impurity pump of the present invention.

[0026] 5. Compared with the prior art where the friction pair needs to be repaired and the pump body needs to be disassembled to replace the static ring and other wearing parts, the present invention can install the guide sleeve, static ring and other wearing parts into the pump body along the direction of the impeller suction port, and can also be removed from the pump body along the opposite direction. In this way, the static ring, guide sleeve and other wearing parts can be replaced without disassembling the pump body, and the maintenance workload can be greatly reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 It is a cross-sectional view of a first specific embodiment of the wear-resistant impurity pump of the present invention.

[0028] Figure 2 for Figure 1 Partial view at A.

[0029] Figure 3 It is a cross-sectional view of a second specific embodiment of the wear-resistant impurity pump of the present invention.

[0030] Figure 4 for Figure 3 Partial view at B.

[0031] Figure 5 This is a cross-sectional view of the static ring.

[0032] Figure 6 It is a cross-sectional view of a third specific embodiment of the wear-resistant impurity pump of the present invention.

[0033] Figure 7 for Figure 6 Partial view at C.

[0034] Figure 8 It is a three-dimensional cross-sectional view of the static ring.

[0035] Fig. 9 It is a cross-sectional view of a fourth specific embodiment of the wear-resistant impurity pump of the present invention.

[0036] Fig.10 for Fig. 9 Partial view at D.

[0037] Fig.11 It is a cross-sectional view of a fifth specific embodiment of the wear-resistant impurity pump of the present invention.

[0038] Fig.12 for Fig.11 Partial view at E.

[0039] Fig.13 It is a cross-sectional view of a sixth specific embodiment of the wear-resistant impurity pump of the present invention.

[0040] Fig.14 for Fig.13 Partial view at F.

[0041] In the figure: 1-pump body, 101-rear pump body, 102-front pump body, 2-impeller, 3-flushing water inlet, 4-moving ring, 5-static ring, 51-water inlet hole, 52, water guide groove, 53, water spray hole, 6-guide sleeve, 61-positioning flange, 7-static ring cavity, 8-pin, 9-sealing ring, 10-spring, 11-inlet flange. DETAILED DESCRIPTION

[0042] The present invention is further described in detail below in conjunction with embodiments and drawings, but the embodiments of the present invention are not limited thereto.

[0043] Example 1

[0044] like Figure 1 and Figure 2 As shown, the wear-resistant impurity pump of this embodiment includes a pump body 1, an impeller 2 arranged in the pump body 1, and a sealing device arranged between the pump body 1 and the impeller 2, wherein the sealing device includes a dynamic ring 4, a static ring 5 and a guide sleeve 6; the dynamic ring 4 is installed on the front cover plate of the impeller 2, and a static ring cavity 7 for accommodating the static ring 5 is formed between the radial outer side of the guide sleeve 6 and the pump body 1; the medium flows to the suction port of the impeller 2 through the radial inner side of the guide sleeve 6; the static ring 5 can flow along the guide sleeve 6 axial direction, and one end of the static ring 5 contacts the dynamic ring 4; the end of the static ring 5 close to the dynamic ring 4 is the friction end, and the end of the static ring 5 away from the dynamic ring 4 is the free end; the static ring cavity 7 is connected to the flushing water inlet 3, and the flushing water inlet 3 is arranged at one end of the static ring cavity 7 away from the impeller 2 and close to the positioning flange 61; the water pressure of the medium entering the static ring cavity 7 can push the static ring 5 to move axially in the static ring cavity 7, so as to cause the friction end of the static ring 5 to contact with the dynamic ring 4.

[0045] like Figure 1 and Figure 2 As shown, the guide sleeve 6 is provided with a positioning flange 61, and the positioning flange 61 is provided at one end of the guide sleeve 6 away from the impeller 2. By providing the positioning flange 61, it is ensured that the axes of the guide sleeve 6 and the pump body 1 are coaxial during installation, thereby ensuring that the axes of the stationary ring 5 and the impeller 2 are coaxial, thereby reducing the wear of the stationary ring 5 and the dynamic ring 4 due to different axes, and at the same time, the stationary ring cavity 7 is made to have a larger axial length as much as possible to accommodate a longer stationary ring 5.

[0046] like Figure 1 and Figure 2As shown, the guide sleeve 6 extends from the outer end surface of the pump body 1 to the suction port of the impeller 2, and the medium enters the suction port of the impeller 2 from the radial inner side of the guide sleeve 6. The material of the guide sleeve 6 is a wear-resistant alloy, which not only can obtain a longer service life, but also can prevent the medium from scouring the static ring 5, thereby improving the service life of the static ring 5. The pump body 1 is provided with a positioning stop at a position corresponding to the positioning flange 501; the outer diameter of the positioning flange 61 is larger than the outer diameter of the static ring 5.

[0047] like Figure 1 and Figure 2 As shown, the guide sleeve 6 can be installed into the pump body 1 along the suction direction of the impeller 2 (that is, the guide sleeve 6 can be installed into the pump body 1 from right to left), and the stationary ring 5 can be installed into the pump body 1 along the suction direction of the impeller 2 (that is, the stationary ring 5 can be installed into the pump body 1 from right to left). In this way, the easily damaged stationary ring 5 and guide sleeve 6 can be replaced without dismantling the pump body 1, thereby greatly reducing the maintenance workload.

[0048] like Figure 1 and Figure 2 As shown, the flushing water inlet 3 is arranged in the static ring cavity 7 at one end away from the impeller 2 and close to the positioning flange 61, so that the static ring 5 can obtain a larger axial length to obtain a longer service life.

[0049] In addition, the pressure of the flushing water is about 30% higher than the outlet pressure of the wear-resistant impurity pump in this embodiment, and industrial clean water is generally used for flushing water. When the wear-resistant impurity pump in this embodiment is working, the flushing water enters the static ring cavity 7 from the flushing water inlet 3, and the static ring 5 moves toward the direction of the dynamic ring 4 and contacts it under the push of the water pressure in the static ring cavity 7, thereby preventing the high-pressure medium in the pressure water chamber from leaking to the suction chamber.

[0050] In addition, the flushing water in the static ring cavity 7 will enter the outside of the friction pair composed of the friction end face of the static ring 5 and the dynamic ring 4 from the first fitting gap of 3-4mm between the static ring 5 and the pump body 1, and part of the flushing water will penetrate from the high-pressure area on the outside of the friction pair to the low-pressure area on the inside of the friction pair, thereby cooling and lubricating the friction pair, thereby improving the life of the friction pair; another part of the flushing water will flow from the outside of the friction pair along the gap between the front cover plate of the impeller 2 and the pump body 1 to the high-pressure area of ​​the water pressure chamber, thereby preventing solid particles in the high-pressure area of ​​the water pressure chamber from entering the gap between the front cover plate of the impeller 2 and the pump body 1, thereby reducing the wear between the two; the first fitting gap between the static ring 5 and the guide sleeve 6 is 0.5-0.8mm, which is smaller than the second fitting gap between the static ring 5 and the pump body 1, so that most of the flushing water can enter the high-pressure area of ​​the water pressure chamber, thereby reducing its entry into the suction port, and further reducing the consumption of flushing water.

[0051] like Figure 1 and Figure 2 As shown, the material of the stationary ring 5 is bronze, and the material of the dynamic ring 4 is tungsten carbide hard alloy. Since the hardness of the dynamic ring 4 is much greater than that of the stationary ring 5, the wear rate of the dynamic ring 4 is much lower than that of the stationary ring 5. After the stationary ring 5 is worn, under the action of the flushing water pressure, the stationary ring 5 moves axially toward the direction of the dynamic ring 4 to compensate for the wear, thereby ensuring the contact of the friction pair, so the sealing effect is hardly affected by wear. Since the stationary ring 5 can be designed with a longer axial length, a longer life can be obtained. Generally, the axial length of the stationary ring 5 can be 3-30 times the axial length of the dynamic ring 4. When it is less than 3 times, the life of the stationary ring 5 is too short; and when it is greater than 30 times, the axial length of the pump body 1 is too large, so that the manufacturing cost of the wear-resistant impurity pump in this embodiment is too high.

[0052] In this embodiment, the axial thickness of the stationary ring 5 is 400 mm, and the axial thickness of the dynamic ring 4 is 22 mm, and the former is 18.2 times of the latter.

[0053] like Figure 1 and Figure 2 As shown, an inlet flange 11 is provided at the end of the suction side of the pump body 1, and the outer end face of the guide sleeve 6 is flush with the end face of the inlet flange 11. The guide sleeve 6 extends from the outer side of the pump body 1 along the suction direction of the impeller 2 to the suction port of the impeller 2; in this way, the flange on the suction pipe matched with the inlet flange 11 can be used to fasten the guide sleeve 6, so that the guide sleeve 6 obtains the maximum axial length, which saves costs and is convenient for maintenance and assembly.

[0054] like Figure 1 and Figure 2 As shown, the flushing water inlet 3 is close to the inlet flange 11 and away from the suction port of the impeller 2; the axial direction of the flushing water inlet 3 is perpendicular to the axial direction of the pump body 1, and its purpose is also to make the static ring 5 obtain a longer axial length.

[0055] Example 2

[0056] The main differences between this embodiment and embodiment 1 are:

[0057] like Figure 3-Figure 5 As shown, the stationary ring 5 is provided with 20 water holes 51 extending along the axial direction thereof and penetrating the free end and the friction end of the stationary ring 5, so that flushing water can be injected into the friction surface between the moving ring 4 and the stationary ring 5 through the water holes 51, forming a structure similar to a hydrostatic thrust bearing, thereby greatly improving the lubrication condition of the friction surface, thereby further increasing the life of the friction pair.

[0058] In addition, a water guide groove 52 connected to the water hole 51 is also provided on the friction end surface of the stationary ring 5, which can further improve the lubrication condition of the friction pair, thereby increasing the service life of the friction pair.

[0059] In addition, an anti-rotation structure is provided between the guide sleeve 6 and the stationary ring 5 to prevent the guide sleeve 6 and the stationary ring 5 from rotating relative to each other; the anti-rotation structure includes a pin 8 provided on the guide sleeve 6; the axial direction of the pin 8 is parallel to the axial direction of the stationary ring cavity 7; and a keyway is provided on the stationary ring 5 to cooperate with the pin 8. By providing the anti-rotation structure, the stationary ring 5 can be prevented from rotating to cause wear of the stationary ring 5 or the stationary ring cavity 7, thereby improving the service life of the guide sleeve 6 and the stationary ring 5.

[0060] Example 3

[0061] The main differences between this embodiment and embodiment 2 are:

[0062] like Figure 6-Figure 8 As shown, a sealing ring 9 is provided between the stationary ring 5 and the guide sleeve 6, which can reduce the flow rate of flushing water leaking to the suction port, thereby improving the efficiency of the wear-resistant impurity pump in this embodiment, and also reducing the consumption of flushing water. In addition, this is equivalent to adding a damping mechanism, thereby reducing the vibration amplitude of the stationary ring 5 and increasing the life of the friction pair.

[0063] In addition, 20 water spray holes 53 connected to the water inlet hole 51 are arranged on the end face of the static ring 5 close to its friction end. This can increase the leakage to the high-pressure area of ​​the water pressure chamber, thereby reducing the amount of solid particles in the gap between the front cover plate of the impeller 2 and the pump body 1, thereby further improving the life of the impeller 2 and the pump body 1.

[0064] Example 4

[0065] The main differences between this embodiment and embodiment 2 are:

[0066] like Fig. 9 and Fig.10 As shown, the end surface area of ​​the friction end of the stationary ring 5 (including the area of ​​the water hole 51, the water guide groove 52 and the water spray hole 53) is larger than the end surface area of ​​the free end of the stationary ring 5 (including the area of ​​the water hole 51). The above arrangement has the following advantages:

[0067] For high-lift pumps, since the pressure in its water pressure chamber is much different from that at the suction port, the water pressure difference between the free end and the friction end of the stationary ring 5 will also be large, which may cause excessive pressure between the friction surfaces between the stationary ring 5 and the dynamic ring 4 and shorten the life of the friction pair; if the area of ​​the friction end of the stationary ring 5 is larger than the area of ​​its free end, the combined force of the pressure of the flushing water acting on the free end and the friction end of the stationary ring 5 will be reduced, which can reduce the unit area pressure between the friction pairs and thus increase the life of the friction pairs.

[0068] Example 5

[0069] The main differences between this embodiment and embodiment 4 are:

[0070] like Fig.11 and Fig.12 As shown, four springs 10 are further arranged between the guide sleeve 6 and the static ring 5, one end of the spring 10 acts on the guide sleeve 6, and the other end acts on the static ring 5. In this way, during maintenance, the guide sleeve 6, the static ring 5 and the spring 10 can be replaced without disassembling the pump body 1, thereby greatly reducing the maintenance workload of replacing wearing parts.

[0071] In addition, the above setting also has the following advantages:

[0072] When flushing water is injected into the friction end of the stationary ring 5 through the water inlet hole 51 on the stationary ring 5, the water pressure at the friction end of the stationary ring 5 is in a fluctuating state. When the flushing water pushes the stationary ring 5 to move axially in the direction of the moving ring 4, the water inlet hole 51 or the water guide groove 52 at the friction end of the stationary ring 5 will be blocked, so that the pressure of the flushing water at the friction end of the stationary ring 5 will naturally rise, thereby preventing the stationary ring 5 from moving in the direction of the moving ring 4. The forces in two directions will reach a balance at a certain position, but because both the stationary ring 5 and water have inertia, the stationary ring 5 cannot be stably at the balance point, but vibrates near the balance point; if the vibration amplitude is large, it may accelerate the wear of the friction pair, thereby increasing the consumption of flushing water; by arranging a number of elastic parts (spring 10) on the free end side of the stationary ring 5, this is equivalent to adding a damping mechanism, thereby reducing the vibration amplitude of the stationary ring 5, and then increasing the life of the friction pair, thereby reducing the consumption of flushing water. In addition, a sealing ring 9 can be provided between the stationary ring 5 and the stationary ring cavity 7 or the guide sleeve 6, which can also achieve a similar effect. In the present embodiment, since the sealing force of the friction pair does not entirely rely on the elastic force of the spring 10, the elastic force linearity of the spring 10 can be designed to be different from that of the spring in the prior art, which can be more conducive to improving the service life of the friction pair.

[0073] like Fig.11 and Fig.12As shown, the pump body 1 is composed of two parts, the front pump body 102 and the rear pump body 101, so that different parts can be replaced according to the wear of the parts during maintenance, thereby reducing maintenance costs.

[0074] Example 6

[0075] The main differences between this embodiment and embodiment 5 are:

[0076] like Fig.13 and Fig.14 As shown, the pump body 1 is also divided into a front pump body 102 and a rear pump body 101, but the division positions are different. However, different positions can also be replaced according to the wear condition of the pump body 1 to reduce the operation cost.

[0077] In addition, the impeller 2 in this embodiment is made of high-chromium wear-resistant alloy, and the dynamic ring 4 is directly processed on the blank of the impeller 2, which can reduce the manufacturing cost; at this time, the axial thickness of the dynamic ring 4 is the thickness of the front cover plate of the impeller 2 corresponding to the static ring 5.

[0078] In this embodiment, the axial thickness of the stationary ring 5 is 220 mm, and the axial thickness of the dynamic ring 4 is 35 mm, and the former is 6.3 times the latter.

[0079] The stationary ring 5 in this embodiment is composed of two materials: the material of the free end is aluminum alloy, and the material of the friction end is bronze. This structure can reduce the manufacturing cost and inertia of the stationary ring 5.

[0080] Example 7

[0081] The pump body 1 of this embodiment is provided with a space for accommodating the impeller 2 and the guide sleeve 6, which can be combined with the guide sleeve 6 to form a static ring cavity 7 for accommodating the static ring 5; the guide sleeve 6 and the static ring 5 can be installed in the pump body 1 along the suction direction of the impeller 2; the positioning stop coaxially arranged with the axial direction of the pump body 1 can cooperate with the positioning flange 61 arranged on the guide sleeve 6 to realize the positioning of the guide sleeve 6; the medium enters the suction port of the impeller 2 from the outside along the axial direction of the pump body 1 through the radial inner side of the guide sleeve 6;

[0082] In addition, a flushing water inlet 3 is provided on the pump body 1 to communicate with the static ring cavity 7, and an inlet flange 11 is provided on the end of the suction side of the pump body 1; the outer end face of the guide sleeve 6 is flush with the end face of the inlet flange 11; the flushing water inlet 3 is close to the inlet flange 11 and away from the impeller suction port, and its axial direction is perpendicular to the axial direction of the pump body 1.

[0083] The above is a preferred embodiment of the present invention, but the embodiment of the present invention is not limited to the above content. Any other changes, modifications, substitutions, combinations, and simplifications that do not deviate from the spirit and principles of the present invention should be equivalent replacement methods and are included in the protection scope of the present invention.

Claims

1. A wear-resistant impurity pump, characterized in that: It comprises a pump body, an impeller and a sealing device arranged between the pump body and the impeller, wherein the sealing device comprises a dynamic ring, a static ring and a guide sleeve; a static ring cavity for accommodating the static ring is formed between the radial outer side of the guide sleeve and the pump body; the medium enters the impeller suction port of the impeller through the radial inner side of the guide sleeve, the end of the static ring away from the impeller is a free end, and the end of the static ring that can contact with the dynamic ring is a friction end; the static ring can move along the axial direction of the guide sleeve; the static ring cavity is connected to the flushing water inlet; the axial thickness of the guide sleeve is greater than the axial thickness of the static ring.

2. The wear-resistant impurity pump according to claim 1, characterized in that: The guide sleeve is installed on the pump body. The guide sleeve can be installed in the pump body along the suction direction of the impeller. The static ring can be installed in the pump body along the suction direction of the impeller.

3. The wear-resistant impurity pump according to claim 1, characterized in that: The guide sleeve extends from the outer end surface of the pump body to the suction port of the impeller; a positioning flange is provided on the guide sleeve, and the positioning flange is arranged at the end of the guide sleeve away from the impeller; the pump body is provided with a positioning stop at a position corresponding to the positioning flange; the positioning stop and the pump body are coaxially arranged; the outer diameter of the positioning flange is larger than the outer diameter of the static ring.

4. The wear-resistant impurity pump according to claim 3, characterized in that: The flushing water inlet is arranged in the static ring cavity at one end away from the impeller and close to the positioning flange.

5. The wear-resistant impurity pump according to claim 1, characterized in that: There is a first fitting gap between the guide sleeve and the stationary ring, and there is a second fitting gap between the stationary ring and the pump body; the size of the first fitting gap is smaller than the size of the second fitting gap.

6. The wear-resistant impurity pump according to claim 1, characterized in that: A sealing member is arranged between the guide sleeve and the static ring, and the sealing member is a sealing ring.

7. The wear-resistant impurity pump according to any one of claims 1 to 6, characterized in that: The sealing device also includes an anti-rotation structure for preventing relative rotation between the guide sleeve and the stationary ring; the anti-rotation structure includes a pin arranged on the guide sleeve; the axial direction of the pin is parallel to the axial direction of the stationary ring cavity; and a keyway cooperating with the pin is arranged on the stationary ring.

8. The wear-resistant impurity pump according to any one of claims 1 to 6, characterized in that: The sealing device also includes an elastic member for driving the stationary ring to move toward the dynamic ring, one end of the elastic member acts on the stationary ring, and the other end acts on the guide sleeve; when the guide sleeve is removed, the elastic member is taken out of the pump body along the opposite direction of the suction direction of the impeller.

9. The wear-resistant impurity pump according to any one of claims 1 to 6, characterized in that: The axial thickness of the stationary ring is 3-20 times the axial thickness of the dynamic ring, and the hardness of the stationary ring is less than that of the dynamic ring.

10. The wear-resistant impurity pump according to any one of claims 1 to 6, characterized in that: An inlet flange is arranged on the outer end of the suction port of the pump body, and the outer end face of the guide sleeve is flush with the end face of the inlet flange; the flushing water inlet is close to the inlet flange, and the axial direction of the flushing water inlet is perpendicular to the axial direction of the pump body.

11. The wear-resistant impurity pump according to any one of claims 1 to 6, characterized in that: The stationary ring is provided with a plurality of water holes extending from the free end of the stationary ring to the friction end thereof, and a water guide groove arranged at the friction end of the stationary ring and connected with the water holes, wherein the water guide groove is annular; and a plurality of water spray holes are arranged on the outer side of the friction end of the stationary ring.

12. A pump body for the wear-resistant impurity pump according to claim 1.

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