Supporting device and substrate annealing equipment

Abstract

The invention discloses a supporting device and substrate annealing equipment. A supporting device is used for supporting a bearing disc on a base and comprises a first supporting piece and a second supporting piece which are movably connected. The first supporting piece is fixedly connected with one of the base and the bearing disc, the second supporting piece is fixedly connected with the other one of the base and the bearing disc, and the first supporting piece and the second supporting piece are configured to be capable of relatively moving in the radial direction of the bearing disc so that the bearing disc can have a radial deformation space. According to the scheme, the bearing disc can be effectively supported on the base, and the bearing disc can have a certain radial deformation space. When the bearing disc is heated to expand, the bearing disc can freely expand in the radial deformation space range, so that thermal stress generated due to the fact that expansion is restrained can be reduced, the risk of damage to the bearing disc is reduced, and the service life of the bearing disc is prolonged.

Description

Technical Field

[0001] The present application relates to the field of semiconductor manufacturing equipment, and in particular to a supporting device and substrate annealing equipment. Background Art

[0002] In the existing VLSI manufacturing, electrochemical copper plating process is usually used to realize the metal interconnection lines inside the chip. However, after electrochemical copper plating, a further annealing process is required to make the electroplated metal copper layer achieve stable physical properties, eliminate residual stress, stabilize the size, refine the grains, adjust the organization, and form a stable lattice structure.

[0003] The annealing process is carried out in the annealing chamber. The annealing chamber includes a hot plate located inside the chamber for heating the substrate. The hot plate usually needs to be installed and fixed in the chamber using support feet. One end of the support foot is fixedly connected to the hot plate, and the other end is fixedly connected to the chamber base of the annealing chamber. During the heating process, the hot plate will expand due to the heat, and the expansion in the radial direction is most significant. Since the hot plate is fixed inside the chamber by support feet, the expansion of the hot plate is constrained by the support feet, which in turn generates thermal stress, causing damage to the hot plate and making it difficult to continue using it, greatly reducing the service life of the hot plate.

[0004] Therefore, the problem that the heat plate expands due to heat and reduces the service life of the heat plate has become a technical issue that needs attention. Summary of the invention

[0005] In view of the above-mentioned shortcomings of the prior art, the purpose of the present application is to provide a support device for supporting a carrier plate on a base, so as to solve the problem that the existing support device is difficult to adapt to the thermal expansion of the carrier plate, resulting in a reduced service life of the carrier plate.

[0006] To achieve the above-mentioned purpose and other related purposes, one aspect of the present application proposes a supporting device for supporting a carrying plate on a base, comprising a first supporting member and a second supporting member that are movably connected; the first supporting member is fixedly connected to one of the base and the carrying plate, and the second supporting member is fixedly connected to the other of the base and the carrying plate, wherein the first supporting member and the second supporting member are configured to be relatively movable in the radial direction of the carrying plate so that the carrying plate has a radial deformation space.

[0007] In some embodiments, the second support member includes a groove, which extends in the radial direction of the supporting plate; the first support member includes a groove fitting member, which is configured to be at least partially located in the groove; wherein the groove and the groove fitting member are relatively movable in the radial direction of the supporting plate.

[0008] In some embodiments, the groove also includes at least one pair of first protrusions close to each other, and the first protrusions extend from the side walls of the groove to the internal space of the groove; the groove mating piece includes a first groove corresponding to the first protrusion; wherein the first protrusion and the first groove are mutually engaged, and the second protrusion and the second groove are mutually engaged.

[0009] In some embodiments, the channel fitting includes at least one pair of second protrusions far away from each other, and the second protrusions extend from the channel fitting to the side wall of the channel; the channel includes a second groove corresponding to the second protrusion; wherein the second protrusion and the second groove are engaged with each other.

[0010] In some embodiments, a protrusion is further included, and the protrusion is arranged between the first support member and the second support member to reduce the contact area between the first support member and the second support member.

[0011] Another aspect of the present application provides a substrate annealing device, comprising an annealing chamber, a substrate heating plate and the above-mentioned supporting device, wherein the substrate heating plate is located in the annealing chamber, the substrate heating plate is the carrier plate, and the cavity base of the annealing chamber is the pedestal.

[0012] As described above, the present application provides a support device and a substrate annealing device, which at least has the following

[0013] Beneficial effects:

[0014] (1) It can not only effectively support the carrier disc on the base, but also allow the carrier disc to have a certain radial deformation space. When the carrier disc expands due to heat, the carrier disc can expand freely within the radial deformation space, thereby reducing the thermal stress caused by the expansion being constrained, thereby reducing the risk of damaging the carrier disc and extending the service life of the carrier disc;

[0015] (2) Through the mutual cooperation between the groove and the groove matching member, the first support member and the second support member are configured to be relatively movable in the radial direction of the supporting disk, and are mutually constrained in directions other than the radial direction of the supporting disk, thereby effectively improving the stability of the supporting device. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1a is a schematic diagram of the structure of an exemplary annealing chamber;

[0017] Figure 1b is a partial structural cross-sectional view of a heat plate in an exemplary annealing chamber;

[0018] Figure 2 is a schematic top view of a carrier plate of a support device using an exemplary embodiment of the present application;

[0019] Figure 3 and Figure 4 is a cross-sectional schematic diagram of a support device of an exemplary embodiment of the present application from different viewing angles;

[0020] Figure 5 and Figure 6 is a three-dimensional schematic diagram of a support device of an exemplary embodiment of the present application from different viewing angles;

[0021] Figure 7 is a cross-sectional perspective schematic diagram of a support device of an exemplary embodiment of the present application;

[0022] Figure 8 is a schematic structural diagram of a substrate annealing device according to an exemplary embodiment of the present application; and

[0023] Fig. 9 It is a structural schematic diagram of a supporting device according to another embodiment of the present application. DETAILED DESCRIPTION

[0024] The following describes the implementation of the present application through specific examples, and those skilled in the art can easily understand other advantages and effects of the present application from the contents disclosed in this specification. The present application can also be implemented or applied through other different specific implementations, and the details in this specification can also be modified or adjusted in various ways based on different viewpoints and applications without departing from the spirit of the present application.

[0025] It should be noted that the drawings of the present application only illustrate the basic concept of the present application in a schematic manner. Although the drawings only show components related to the present application and are not drawn according to the number, shape and size of components in actual implementation, the shape, quantity and proportion of each component in actual implementation can be adjusted arbitrarily, and the component layout may also be more complicated.

[0026] When the following description refers to the drawings, unless otherwise indicated, the same numbers in different drawings represent the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present application. Instead, they are only examples of devices consistent with some aspects of the present application as detailed in the attached claims.

[0027] The terms used in this application are for the purpose of describing specific embodiments only and are not intended to limit this application. The singular forms of "a", "said" and "the" used in this application and the appended claims are also intended to include plural forms unless the context clearly indicates other meanings. It should also be understood that the term "and / or" used herein refers to and includes any or all possible combinations of one or more associated listed items.

[0028] In the description of this application, unless otherwise specified and limited, it should be noted that the terms "installed", "connected" and "connected" should be understood in a broad sense. For example, it can be a mechanical connection or an electrical connection, or it can be the internal connection between two components. It can be a direct connection or an indirect connection through an intermediate medium. For those skilled in the art, the specific meanings of the above terms can be understood according to the specific circumstances.

[0029] It should be understood that although the terms first, second, third, etc. may be used in the present application to describe various information, such information should not be limited to these terms. These terms are only used to distinguish the same type of information from each other.

[0030] In the description of the present application, it should be understood that the terms "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside" and "outside" that may be used to indicate orientations or positional relationships are based on the orientations or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they should not be understood as limitations on the present application.

[0031] See also Figure 1a and Figure 1b , Figure 1a A schematic diagram of the structure of an exemplary annealing chamber is shown; Figure 1b FIG. 2 shows a partial structural cross-sectional view of a heat plate in an exemplary annealing chamber. Figure 1a The annealing chamber 00 includes a hot plate 01 and a cold plate 02. The hot plate 01 is used to heat the substrate, and the cold plate 02 is used to cool the substrate. Both the hot plate 01 and the cold plate 02 are located in the annealing chamber 00, and usually need to be installed and fixed in the chamber using support feet 10. Figure 1b One end of the support leg 10 is fixedly connected to the heat plate 01, and the other end is fixedly connected to the bottom 001 of the annealing chamber 00. During the heating process, the heat plate 01 will expand due to the heat and expand in the radial direction ( Figure 1b The deformation in the D1 direction is most significant. The support legs 10 constrain the expansion of the heat plate 01, so that the expansion cannot proceed freely and thermal stress is generated. This may cause damage to the heat plate 01, for example, damage to the connection between the heat plate 01 and the support legs 10 or arching and deformation of the heat plate 01.

[0032] In order to solve at least some or all of the above problems, one aspect of the present application provides a supporting device for supporting a carrier plate on a base. Figures 2 to 4 , Figure 2 is a schematic top view of a carrier plate of a support device using an exemplary embodiment of the present application, Figure 3 and Figure 4It is a cross-sectional schematic diagram from different viewing angles of a supporting device of an exemplary embodiment of the present application.

[0033] The supporting device 2 includes a first supporting member 21 and a second supporting member 22. The first supporting member 21 is fixedly connected to one of the carrier disc 1 and the base 3, and the second supporting member 22 is fixedly connected to the other of the carrier disc 1 and the base 3. The first supporting member 21 and the second supporting member 22 are configured to be relatively movable in the radial direction (D1 direction) of the carrier disc 1, so that the carrier disc 1 has a radial deformation space. Such a scheme can not only effectively support the carrier disc 1 on the base 3, but also enable the carrier disc 1 to have a certain radial deformation space. When the carrier disc 1 expands due to heat, the carrier disc 1 can expand freely within the range of the radial deformation space, thereby reducing the thermal stress caused by the constrained expansion, thereby reducing the risk of damaging the carrier disc 1 and extending the service life of the carrier disc 1.

[0034] Combination Figure 2 and Figure 3 In a specific example, the carrier plate 1 is horizontally placed on the base 3, and the first support member 21 and the second support member 22 are located between the carrier plate 1 and the base 3. Exemplarily, three support devices 2 are arranged between the carrier plate 1 and the base 3, and the three support devices 2 are located near the radial edge of the carrier plate 1 and are evenly distributed along the circumference of the carrier plate 1 to achieve stable support for the carrier plate 1. In other embodiments, the number of support devices 2 may be more than three. Exemplarily, the first support member 21 is fixedly connected to the carrier plate 1 by a first screw 12, and the second support member 22 is fixedly connected to the base 3 by a second screw 32. It should be understood that the first screw 12 and the second screw 32 are only exemplary connecting members, and the first support member 21 and the carrier plate 1, and the second support member 22 and the base 3 may also be fixedly connected in any other possible manner.

[0035] The first support member 21 is located at the lower part of the carrier plate 1, and extends downward from the carrier plate 1, and cooperates with the second support member 22 on the base 3. In other possible embodiments, the first support member 21 may also be located at the upper part or the side of the carrier plate 1, and extends downward from the upper part or the side of the carrier plate 1, and cooperates with the second support member 22 on the base 3. It should be understood that in other embodiments, the first support member 21 may be fixedly connected to the base 3, and the second support member 22 may be fixedly connected to the carrier plate 1.

[0036] See also Figure 5 and Figure 6 , and combined with Figure 3 and Figure 4 , Figure 5 and Figure 6It is a three-dimensional schematic diagram of a support device of an exemplary embodiment of the present application from different perspectives. In some embodiments, the second support member 22 includes a groove 221, and the groove 221 extends along the radial direction (D1 direction) of the carrier plate 1. The first support member 21 includes a groove fitting member 211. The groove fitting member 211 is configured to be at least partially located in the groove 221, wherein the groove 221 and the groove fitting member 211 are relatively movable in the radial direction of the carrier plate 1. Through the mutual cooperation of the groove 221 and the groove fitting member 211, the first support member 21 and the second support member 22 are configured to be relatively movable in the radial direction of the carrier plate 1, and to constrain each other in other directions other than the radial direction of the carrier plate 1.

[0037] Combination Figures 2 to 6 , for the convenience of description, the front and rear directions are marked in the D1 direction. Among them, "front" is the direction pointing to the center of the carrier plate 1 in the D1 direction, and "rear" is the direction pointing to the edge of the carrier plate 1 in the D1 direction. In a specific example, the main structure of the groove 221 includes two oppositely arranged side walls 2210, and the side walls 2210 extend along the radial direction (D1 direction) of the carrier plate 1, and the internal space of the groove 221 is formed between the two side walls 2210. Exemplarily, in some embodiments, the groove 221 includes at least one pair of first protrusions 2211 close to each other, and the first protrusions 2211 extend from the side walls 2210 of the groove 221 to the internal space of the groove 221. As shown Figure 4 As shown in FIG. 1 , in a specific example, the first protrusion 2211 is located at the upper end of the side wall 2210, and a notch 2212 of the channel 221 is formed between the two first protrusions 2211. The lower end of the channel matching piece 211 passes through the notch 2212 and extends to the inner space of the channel 221. The channel matching piece 211 includes a first groove 2111 corresponding to the first protrusion 2211. In order to clearly show the position and structure of the first groove 2111, Figure 4 In the figure, the contour of the first groove 2111 is thickened. The first protrusion 2211 and the first groove 2111 are engaged with each other, so that the channel fitting 211 and the channel 221 are mutually constrained in other directions except the extension direction (D1 direction) of the channel 221. It should be understood that the position of the first protrusion 2211 is not limited thereto. In other embodiments, the first protrusion 2211 can also be other positions between the upper and lower ends of the side wall 2210.

[0038] Optionally, see Fig. 9 , Fig. 92 is a schematic diagram of the structure of a support device of another embodiment of the present application. In some embodiments, the channel matching member 211 includes at least one pair of second protrusions 2116 that are far away from each other, and the side wall 2210 includes a second groove 2216 corresponding to the second protrusion 2116. The second protrusion 2116 and the second groove 2216 are engaged with each other, so that the channel matching member 211 and the channel 221 are mutually constrained in other directions except the extension direction of the channel 221. In addition, in some embodiments, the first protrusion 2211 and the first groove 2111, the second protrusion 2116 and the second groove 2216 may be included at the same time. The first protrusion 2211 and the first groove 2111 are mutually engaged, and the second protrusion 2116 and the second groove 2216 are mutually engaged, so that the channel matching member 211 and the channel 221 are mutually constrained in other directions except the extension direction of the channel 221.

[0039] Preferably, if Figure 4 As shown, in some embodiments, the first protrusion 2211 has a chamfer 22110. Such a design can reduce the contact area between the first protrusion 2211 and the channel matching member 211, thereby reducing the friction between the channel matching member 211 and the first protrusion 2211 during the movement. In other embodiments, the area where the chamfer 22110 is located can also be designed to be rounded. Similarly, in the embodiment with the second protrusion 2116 and the second groove 2216, the second protrusion 2116 can also have a chamfer or a rounded shape.

[0040] In some embodiments, the second support member 22 further includes a support seat 2200, and the support seat 2200 is located at the rear side of the groove 221. Figure 5 and Figure 6 As shown, in some embodiments, the channel 221 further includes a front wall 2214, which is located at the front end of the channel 221 and connects the two side walls 2210 of the channel 221, wherein the front end is an end of the channel 221 close to the center of the carrier plate 1. By providing the front wall 2214 connecting the two side walls 2210 of the channel 221, the structure of the channel 221 can be made more stable. Exemplarily, the support seat 2200 is provided with a second screw hole adapted to the second screw 32, and the second screw 32 passes through the second screw hole and extends to the base 3 to achieve a fixed connection between the second support member 22 and the base 3. Figure 2 and Figure 6The support seat 2200 includes an extension portion 2201, which extends toward the inner space of the channel 221. A positioning portion is provided on the extension portion 2201, and the positioning portion is used for positioning between the second support member 22 and the base 3. Exemplarily, the bottom of the support seat 2200 extends toward the inner space of the channel 221 to form the extension portion 2201, and a positioning portion, such as a positioning pin 2202, is provided on the extension portion 2201. When the second support member 22 is installed on the base 3, the positioning pin 2202 plays a positioning role, and can also play a role in strengthening the connection between the two to a certain extent.

[0041] Furthermore, in some embodiments, the side wall 2210 of the channel 221 includes an inclined portion 2215 , which is located at the front end of the channel 221 and inclines backward from top to bottom, thereby reducing the space occupied by the side wall 2210 .

[0042] Preferably, in some embodiments, the support device 2 further comprises a protrusion 23, which is arranged on the contact surface between the first support member 21 and the second support member 22, and is used to reduce the contact area between the first support member 21 and the second support member 22, thereby reducing the friction between the first support member 21 and the second support member 22 during relative movement. Figure 5 The protrusion 23 is arranged on the upper surface of the first protrusion 2211, and is a strip-shaped protrusion extending along the D1 direction, so that the surface contact between the upper surface of the first protrusion 2211 and the first groove 2111 becomes a line contact, reducing the contact area between the two. The protrusion 23 is preferably arranged on the upper surface of the first protrusion 2211 because, on the one hand, it is more convenient to process the protrusion 23 on the upper surface of the first protrusion 2211; on the other hand, in this example, the channel fitting 211 is arranged vertically, and the pressure between the upper surface of the first protrusion 2211 and the first groove 2111 is relatively large. When the first support member 21 and the second support member 22 move relative to each other, the friction force on the contact surface is relatively large, so it is more necessary to reduce the friction.

[0043] See below Figure 7 Combined with Figures 3 to 6 The channel fitting 211 in an exemplary embodiment of the present application is further described. Figure 7 It is a cross-sectional perspective schematic diagram of a support device of an exemplary embodiment of the present application.

[0044] In a specific example, the channel fitting 211 includes a first fitting 211a and a second fitting 211b, and a first groove 2111 is formed between the first fitting 211a and the second fitting 211b (see Figure 4The first groove 2111 in the support plate 1). Wherein, one end of the first fitting 211a is fixedly connected to the supporting plate 1, and the other end is connected to the second fitting 211b. Exemplarily, the first fitting 211a is located above the second fitting 211b. The first screw 12 passes through the second fitting 211b and the first fitting 211a and is connected to the supporting plate 1, connecting the first fitting 211a and the second fitting 211b as a whole and fixedly connected to the supporting plate 1. In some embodiments, due to the provision of the forearm 2214 and the support seat 2200 located on the rear side, the front and rear ends of the groove 221 are closed. Therefore, the groove fitting 211 is arranged as a detachable first fitting 211a and a second fitting 211b, which can facilitate the assembly of the groove 221 and the groove fitting 211. During the assembly process, the first matching piece 211 a can enter the inner space of the groove 221 from above the groove 221 , and the second matching piece 211 b can enter the inner space of the groove 221 from below the groove 221 , and the connection is achieved through the first screw 12 .

[0045] Preferably, the upper end of the first matching piece 211a has a first protrusion 21100, and the first protrusion 21100 is embedded in the carrier plate 1 to play a role in installation and positioning, and can strengthen the connection between the first matching piece 211a and the carrier plate 1.

[0046] In addition, in some embodiments, the second mating piece 211b includes a second protruding portion 21111, which is located at one end of the second mating piece 211b close to the first mating piece 211a and at least one side of the first mating piece 211a in the D1 direction, and abuts against the first mating piece 211a. Such a design can strengthen the connection between the first mating piece 211a and the second mating piece 211b. Figure 3 and Figure 7 As shown, in a specific example, the second protrusion 21111 is located at the upper end of the second mating piece 211b and at the front side of the second mating piece 211b in the D1 direction. In this example, the second mating piece 211b is an asymmetric shape in the D1 direction, and the rear side of the second mating piece 211b is partially recessed forward compared to the first mating piece 211a. This design is to reduce the space occupied by the second mating piece 211b and facilitate installation. In other embodiments, the second protrusion 21111 may also be located at the front and rear sides of the second mating piece 211b, and the second mating piece 211b is a symmetrical shape in the D1 direction. In these embodiments, the second mating piece 211b includes Figure 3 and Figure 7 The structure is indicated by the dotted frame X. It should be understood that in some embodiments, the channel fitting member 211 may also be an integrally formed component, that is, the first fitting member 211a and the second fitting member 211b are integrally formed to form an inseparable whole.

[0047] Preferably, in some embodiments, the support device 2 further comprises a heat insulating member, and the heat insulating member is located at a position where the support device 2 contacts the carrier plate 1. Figures 3 to 7 In the illustrated embodiment, the first matching member 211a is a heat insulating member, which is made of heat insulating material, such as ceramics and other materials with good heat resistance and low heat conduction efficiency. When the carrier plate 1 needs to be heated, the heat insulating material can reduce the heat loss on the carrier plate 1 and prevent the components under the carrier plate 1 from being damaged due to heat.

[0048] Another aspect of the present application also provides a substrate annealing device. Figure 8 , Figure 8 80 is a schematic diagram of the structure of a substrate annealing device according to an exemplary embodiment of the present invention. The substrate annealing device 80 includes an annealing chamber 800, a substrate heating plate 801 and a supporting device 802. The substrate heating plate 801 is located in the annealing chamber 800. For the specific structure of the supporting device 802, please refer to Figures 2 to 7 The supporting device 2 in the embodiment will not be described in detail here. Figures 2 to 7 In the illustrated embodiment, the substrate heating plate 801 is a carrier plate 1 , the chamber base 803 of the annealing chamber 800 is a susceptor 3 , and the substrate heating plate 801 is supported on the chamber base 803 of the annealing chamber 800 by a supporting device 802 .

[0049] When the substrate heating disk 801 heats the substrate, even if the substrate heating disk 801 expands due to heat, it can have a certain deformation space in the radial direction, thereby avoiding thermal stress caused by expansion constraint, which may cause damage to the substrate heating disk 801. This can extend the service life of the substrate heating disk 801.

[0050] In addition, the substrate annealing device 80 further includes a substrate cooling plate 804, which is located in the annealing chamber 800 and near the substrate heating plate 801. In the substrate annealing process, the substrate is first placed on the substrate heating plate 801 for heating, and then the heated substrate is placed on the substrate cooling plate 804 for cooling. It should be understood that the substrate cooling plate 804 does not have the problem of thermal expansion, so it can be supported by conventional support feet (such as Figure 1b The supporting foot 100) is installed on the cavity base 803, and can also be installed on the cavity base 803 through the supporting device 802.

[0051] The above embodiments are merely illustrative of the principles and effects of the present application and are not configured to limit the present application. Anyone familiar with the technology may modify or adjust the above embodiments without violating the spirit and scope of the present application. Therefore, all equivalent modifications or adjustments made by a person of ordinary knowledge in the technical field without departing from the spirit and technical ideas disclosed in the present application shall still be covered by the claims of the present application.

Claims

1. A supporting device for supporting a carrier plate on a base, characterized in that: It includes a first support member and a second support member that are movably connected; The first support member is fixedly connected to one of the base and the carrier plate, and the second support member is fixedly connected to the other of the base and the carrier plate. The first support member and the second support member are configured to be relatively movable in a radial direction of the carrier plate, so that the carrier plate has a radial deformation space.

2. The support device according to claim 1, characterized in that: The second support member comprises a channel, and the channel extends along the radial direction of the carrying plate; The first support member includes a channel fitting configured to be at least partially located within the channel; Wherein, the channel and the channel fitting part are relatively movable in the radial direction of the carrying plate.

3. The supporting device according to claim 2, characterized in that: The channel further comprises at least one pair of first protrusions close to each other, wherein the first protrusions extend from the side wall of the channel toward the inner space of the channel; the channel matching piece comprises a first groove corresponding to the first protrusions; Wherein, the first protrusion and the first groove are engaged with each other.

4. The supporting device according to claim 2 or 3, characterized in that: The channel matching piece includes at least one pair of second protrusions that are far away from each other, and the second protrusions extend from the channel matching piece to the side wall of the channel; the channel includes a second groove corresponding to the second protrusions; Wherein, the second protrusion and the second groove are engaged with each other.

5. The supporting device according to claim 4, characterized in that: The first protrusion and / or the second protrusion has a chamfer or a rounded corner.

6. The supporting device according to claim 2, characterized in that: The channel further includes a front wall, which is located at the front end of the channel and connects two side walls of the channel, wherein the front end is an end of the channel close to the center of the supporting plate.

7. The supporting device according to claim 2, characterized in that: The channel fitting member includes a first fitting member and a second fitting member, one end of the first fitting member is fixedly connected to the carrying plate, and the other end of the first fitting member is connected to the second fitting member.

8. The supporting device according to claim 2, characterized in that: It also includes a protrusion, which is arranged between the first support member and the second support member and is used to reduce the contact area between the first support member and the second support member.

9. The supporting device according to claim 1, characterized in that: It also includes a heat insulating member, which is located at a position where the supporting device contacts the carrying plate.

10. A substrate annealing device, characterized in that: It comprises an annealing chamber, a substrate heating plate and a supporting device as described in any one of claims 1 to 9, wherein the substrate heating plate is located in the annealing chamber, the substrate heating plate is the carrying plate, and the cavity base of the annealing chamber is the pedestal.

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