Photoelectric glass material with high thermal stability as well as preparation method and application thereof

Abstract

The invention provides a photoelectric glass material with high thermal stability and a preparation method and application of the photoelectric glass material with high thermal stability, and provides a photoelectric glass material composition with high thermal stability. The invention discloses a high-temperature-resistant glass which comprises the following components in percentage by weight: 52 to 62 percent of SiO2, 0.1 to 5 percent of Bi2O3, 0.1 to 1 percent of AgO, 13 to 20 percent of Na2O, 0 to 7 percent of K2O, 0.1 to 4 percent of B2O3, 8 to 18 percent of Al2O3, 0.1 to 6 percent of ZrO2, 0.1 to 3 percent of MgO, 0.1 to 4 percent of CaO, 0.1 to 1 percent of CeO2 and 0.1 to 1 percent of NaCl. The photoelectric glass material has the advantages of excellent spectrum transmittance, effective stray light elimination area, high thermal stability, proper expansion coefficient and high bending strength, can be used for preparing photoelectric display screens, and plays an important role in the aspects of information photoelectric display screen display, intelligent vision, clinical monitoring, optical lenses and the like.

Description

Technical Field

[0001] The present application relates to the field of glass technology, and specifically to a glass material, especially a photoelectric glass material with high thermal stability, and a preparation method and application thereof. Background Art

[0002] Any discussion of the prior art throughout the specification should not be considered as an admission that such prior art is widely known or forms part of the common general knowledge in the field.

[0003] With the rapid development of the optoelectronic display industry, the market and product applications have put forward higher requirements on the performance of optoelectronic glass materials. Especially in the fields of information display, intelligent vision, clinical monitoring, optical lenses, etc. Optoelectronic glass materials must have excellent spectral transmittance, effective stray light elimination area, high thermal stability, suitable expansion coefficient and high bending strength.

[0004] However, existing optoelectronic glass materials often face challenges in achieving these performance indicators. Although there are some glass products on the market that are strengthened by chemical or physical methods, these products often have deficiencies in certain performance aspects, such as insufficient optical properties, insufficient stability in high temperature environments, or limitations in bending strength, which limits their use in a wider range of application scenarios.

[0005] In addition, most high-performance optoelectronic glass materials currently rely on imports, which not only increases costs, but may also affect the stability of product supply due to supply chain issues. This dependence restricts the development of local industries and technological autonomy, and also limits the competitiveness of the domestic market in the field of global optoelectronic technology. Therefore, the development and optimization of this high thermal stability optoelectronic glass material is of great significance for improving the performance and user experience of optical systems and reducing dependence on imported materials. Summary of the invention

[0006] The present invention provides a photoelectric glass material with high thermal stability, a preparation method and application thereof. The photoelectric glass material with high thermal stability provided by the present invention is a strengthened glass after chemical strengthening treatment, and the strengthened glass has excellent spectral transmittance, effective stray light elimination area, high thermal stability, suitable expansion coefficient and high bending strength, and can be used to prepare photoelectric display screens, which plays an important role in information display, intelligent vision, clinical monitoring, optical lenses and the like.

[0007] In order to achieve the above object, the present invention provides the following technical solutions:

[0008] In a first aspect of the present invention, a photovoltaic glass composition is provided, which comprises or consists of the following components, by mass percentage: 52-62% SiO2 , 0.1-5% Bi 2 O 3 , 0.1-3% AgO, 13-20% Na 2 O, 0-7% K 2 O, 0.1-4% B 2 O 3 8-18% Al 2 O 3 0.1-6% ZrO 2 , 0.1-3% MgO, 0.1-4% CaO, 0.1-1% CeO 2 and 0.1-1% NaCl.

[0009] In the present invention, SiO 2 As a glass-forming oxide, it is the main component of the glass skeleton network structure. In the glass structure, it is [SiO 4 ] exists in tetrahedral form, which plays a role in reducing the thermal expansion coefficient and improving the thermal stability, heat resistance, chemical stability, and mechanical strength of the glass. An appropriate amount of SiO2 can ensure that the glass has excellent thermal stability, heat resistance, chemical stability, and mechanical strength, while maintaining an appropriate melting point and viscosity for easy production and processing. Too high or too low a SiO2 content will have an adverse effect on the performance of the glass. Too high a SiO2 content will increase the melting point and viscosity of the glass, making the production process more difficult, but it will also improve the chemical stability and mechanical strength. Too low a SiO2 content will reduce the chemical stability and mechanical strength of the glass, but will help to reduce the melting point and viscosity and improve the processing performance. Therefore, the content of SiO2 needs to be precisely controlled in the glass formula. In the present invention, SiO2 is expressed in mass percentage. 2 The content range of SiO is 52-62%. In some optional embodiments, SiO 2The content range may be selected from the following content ranges or any value in the following content ranges: 52-54.3%, 52-55%, 52-56.6%, 52-59.9%, 52-60%, 52-61.9%, 52-62%, 52.5-54.3%, 52.5-54.9%, 52.5-55%, 52.5-56.6%, 52.5-59.9%, 52.5-60%, 52.5-61.9%, 52 .5-62%, 54.3-55%, 54.3-56.6%, 54.3-59.9%, 54.3-60%, 54.3-61.9%, 54.3-62%, 54.9-55%, 54.9-56.6%, 54.9-59.9%, 54.9-60%, 54.9-61.9%, 54.9-62%, 55-56.6%, 55-60%, 55-61.9%, 55-62% , 56.6-59.9%, 56.6-60%, 56.6-61.9%, 56.6-62%, 56.7-59.9%, 56.8-59.9%, 57-59.9%, 57.1-59.9%, 57.3-59.9%, 57.6-59.9%, 57.9-59.9%, 58-59.9%, 58.1-59.9%, 58.3-59.9%, 58.6-59.9% , 58.8-59.9%, 59-59.9%, 59.1-59.9%, 59.3-59.9%, 59.5-59.9%, 59.6-59.9%, 59.8-59.9%, 59.9-61.9%, 59.9-62%, 59.9-60%, 59.9-61.5%, 59.9-61%, 60-61.9%, 60-62%, 59-62%, 57-62%, and so on.

[0010] In the present invention, Bi2O3 is an important additive. In the glass, the bismuth element can be reduced to bismuth in a low oxidation state, or even metallic bismuth, under a high-temperature reducing atmosphere. This reduction process causes the color of the glass material to change, making it present a specific color such as black or gray. The dispersion of bismuth in the glass matrix can significantly increase the light absorption capacity of the material, thereby enhancing its absorption of light. The present invention achieves the adjustment of the light absorption characteristics of the entire glass by controlling the reduction process to generate bismuth particles. An appropriate amount of Bi2O3 can ensure that the glass has good light absorption capacity when needed, while maintaining high light transmittance and mechanical stability. Too high or too low Bi2O3 content will have an adverse effect on the performance of the glass. Too high Bi2O3 content may cause a decrease in optical properties, such as uneven light absorption. In addition, too many bismuth particles may cause a decrease in the mechanical properties of the glass, such as a decrease in hardness and impact strength, making the glass more fragile, and may also affect the thermal stability of the glass, making it easy to deform or break at high temperatures. On the contrary, if the Bi2O3 content is too low, the light absorption layer of the glass will not be obvious, and the light absorption cannot be effectively enhanced. In addition, if the Bi2O3 content is too low, it may not form enough bismuth particles, and the optical properties of the glass cannot be significantly optimized, resulting in insufficient light absorption characteristics. Therefore, the content of Bi2O3 needs to be precisely controlled in the glass formula. In the present invention, Bi2O3 is expressed in mass percentage. 2 O 3 The content range of Bi is 0.1-5%. In some optional embodiments, Bi 2 O 3 It can be selected from the following content ranges or any value in the following content ranges: 0.1-0.5%, 0.1-1%, 0.1-4.2%, 0.1-5%, 0.5-1%, 0.5-4.2%, 0.5-5%, 1-1%, 1-4.2%, 1-5%, 4.2-5%, 4.3-5%, 4.4-5%, 4.5-5%, 4.6-5%, 4.7-5%, 4.8-5%, 4.9-5%, and the like.

[0011] In the present invention, AgO is an important additive in optoelectronic glass, and is usually introduced into the glass by using silver nitrate. Silver nitrate will precipitate colloidal particles of silver during the glass melting process, and the glass will appear light yellow after heating and reduction. However, too high or too low AgO content will have an adverse effect on the performance of the glass. Too high AgO content will cause too many silver particles to precipitate in the glass, significantly reducing the light transmittance of the glass, affecting its transparency and color. At the same time, too many silver particles may cause uneven optical properties and affect imaging quality. On the contrary, too low AgO content is not enough to form enough silver particles, and the optoelectronic properties of the glass cannot be significantly improved, affecting its effect in optoelectronic applications. Therefore, the content of AgO needs to be precisely controlled to balance the light transmittance, light absorption capacity and optoelectronic properties of the glass. An appropriate amount of AgO can significantly optimize the physical, chemical and optoelectronic properties of the glass and achieve high-performance optoelectronic glass.

[0012] In the present invention, Bi 2 O 3 The synergistic effect of AgO not only optimizes the physical and chemical properties of glass, but also improves the optoelectronic performance by forming a light absorption layer in the glass. In the present invention, the content of AgO is in the range of 0.1-3% by mass. In some optional embodiments, AgO can be selected from the following content ranges or any value in the following content ranges: 0.1-0.3%, 0.1-0.5%, 0.1-0.6%, 0.1-0.8%, 0.1-1%, 0.1-3%, 0.3-0.5%, 0.3-0.6%, 0.3-0.8%, 0.3-1%, 0.3-3%, 0.5-0.6%, 0.5-0.8%, 0.5-1%, 0.5-3%, 0.6-0.8%, 0.6-1%, 0. 6-3%, 0.8-1%, 0.8-3%, 0.81-1%, 0.82-1%, 0.85-1%, 0.88-1%, 0.9-1%, 0.93-1%, 0.95-1%, 0.98-1%, 1-3%, 1-2.9%, 1-2.6%, 1-2.3%, 1-2.0%, 1-1.9%, 1-1.8%, 1-1.7%, 1-1.6%, 1-1.5%, 1-1.4%, 1-1.3%, 1-1.2%, 1-1.1%, etc.

[0013] Bi2O3 and AgO each have unique roles in optoelectronic glass. The synergistic effect of these two additives can optimize the physical and chemical properties of the glass, while improving the optoelectronic performance by forming a light absorption layer. When Bi2O3 and AgO are used together, they can play a significant synergistic and complementary role. Bi2O3 can improve the light absorption capacity and chemical stability of the glass, while AgO enhances the optoelectronic performance and conductivity. The combination of the two can not only improve the overall performance of the glass, but also form a more uniform and effective light absorption layer, improving the photoelectric conversion efficiency. In addition, the combination of AgO and Bi2O3 can adjust the color of the glass to meet the needs of different applications. In order to achieve the best effect, the content ratio of Bi2O3 and AgO needs to be controlled. In some embodiments of the present invention, the preferred Bi 2 O 3 The ratio of Bi to AgO is 0.1-14:1. 2 O 3 The content ratio of AgO can be selected from 0.125-14:1, 0.17-14:1, 0.8-14:1, 5-14:1 or 5-10:1, 5-9.5:1, 5-9:1, 5-8.5:1, 5-8:1, 5-7.5:1, 5-7:1, 5-6.5:1, 5-6:1, 2.5-5:1, 3-5:1, 3.5-5:1, 4-5:1, 4.5-5:1.

[0014] In the present invention, Na 2 O and K 2O is an alkali metal oxide, which acts as a network exosome in the glass structure. Alkali metal ions are easy to move and diffuse in the glass, interrupting the silicon-oxygen network structure of the glass, reducing the melting point and viscosity of the glass, and making the glass easier to melt and form at a lower temperature. It is a good flux. However, too high or too low a content of Na2O and K2O will have an adverse effect on the performance of the glass. When the content of Na2O and K2O is too high, the chemical stability of the glass will decrease significantly, increasing the sensitivity to water and acid, making the glass more susceptible to corrosion and degradation. In addition, high content of Na2O and K2O will also reduce the mechanical strength and hardness of the glass, making it more susceptible to scratches and breakage. The forming process will also be affected. A high content of alkali metal oxides will cause the glass to be too fluid during the forming process, making it difficult to control the forming accuracy. On the contrary, when the content of Na2O and K2O is too low, the melting point and viscosity of the glass will increase, so that the glass can only be melted and formed at a higher temperature, increasing the energy consumption and cost of production. Although a low content of alkali metal oxides will improve the chemical stability and mechanical strength of the glass, it will make the glass difficult to operate during the forming process, and may require higher temperatures and more complex equipment. The combination of appropriate amounts of Na2O and K2O can effectively reduce the melting point and viscosity of glass, optimize the forming process, and maintain the chemical stability and mechanical strength of glass. 2 The content of O is in the range of 13-20%. In some alternative embodiments, Na 2 O can be selected from the following content ranges or any value in the following content ranges: 13-14%, 13-16%, 13-17%, 13-20%, 14-15%, 14-15.1%, 14-15.2%, 14-15.3%, 14-15.4%, 14-15.5%, 14-15.6%, 14-15.7%, 14-15.8%, 14-15.9%, 14-1 6%, 14-17%, 14-17.5%, 14-20%, 16-16%, 16-17%, 16-20%, 17-20%, 13.1-14%, 13.3-14%, 13.5-14%, 13.6-14%, 13.8-14%, 14-14.9%, 14-14.6%, 14-14.5%, 14-14.3%, 14-14.1%, and the like. In the present invention, K is expressed in terms of mass percentage. 2 The content of O is in the range of 0-7%. In some optional embodiments, K 2The content of O can be selected from the following content ranges or be any value in the following content ranges: 0, 0-0.3%, 0-0.5%, 0-0.6%, 0-0.8%, 0-1%, 0-1.1%, 0-3%, 0-5%, 0-5.4%, 0-6%, 0-7%, 1.1-3%, 1.1-5%, 1.1-5.4%, 1.1-7%, 2-5.5%, 3-5%, 3-5.4%, 3-7%, 4-5.5%, 5-5.4%, 5-7%, 5.4-7%, and the like.

[0015] In some embodiments of the present invention, preferably Na 2 O and K 2 The sum of the contents of O is 14-22.5%. In some optional embodiments, Na 2 O and K 2 The sum of the O contents is selected from 14-21.5%, 14-21%, 14-20%, 14-19%, 14-18%, 14-17%, 14-16%, and 14-15%.

[0016] In the present invention, B2O3 is a glass-forming oxide. In silicate glass, B2O3 can partially replace Si to form a network structure. In addition, B2O3 has a fluxing effect, which can reduce the high-temperature viscosity of the glass, thereby saving costs and facilitating production. However, as the content of B2O3 increases, the devitrification range of the glass will increase, and B2O3 is volatile, causing environmental pollution. Therefore, the amount of B2O3 used should be strictly controlled during the production process. In the present invention, B2O3 is expressed in mass percentage. 2 O 3 The content range of B is 0.1-4%. 2 O 3 The content can be selected from the following content ranges or be any value in the following content ranges: 0.1-1%, 0.1-2%, 0.1-2.5%, 0.1-3%, 0.1-4%, 1-2%, 1-3%, 1-4%, 2-2%, 2-3%, 2-4%, 3-4%, 1.1-2%, 1.3-2%, 1.5-2%, 1.6-2%, 1.8-2%, 1.9-2%, 2-2.9%, 2-2.6%, 2-2.5%, 2-2.3%, 2-2.1%, and the like.

[0017] In the present invention, Al2O3 is an intermediate oxide in the glass, and its content directly affects the thermal expansion coefficient, chemical stability and thermal stability of the glass. Increasing the content of Al2O3 can improve the mechanical processing properties of the glass, but excessive content will reduce the machinability of the glass. In addition, in the glass structure, the volume of [AlO4] is 41cm 3 / mol, and the volume of [SiO4] is 27cm 3 / mol, [AlO4] is 52% larger than [SiO4]. Therefore, the presence of [AlO4] will increase the voids in the glass, which is beneficial to the improvement of ion exchange efficiency and makes the glass material have excellent chemical strengthening properties. 2 O 3 The content range of Al is 8-18%. In some optional embodiments, Al 2 O 3 The content of can be selected from the following content ranges or any value in the following content ranges: 8-10%, 8-10.8%, 8-12%, 8-14.3%, 8-18%, 8.1-10%, 8.3-10%, 8.5-10%, 8.6-10%, 8.7-10%, 8.8-10%, 9-10%, 9.1-10%, 9.2-10%, 9.5-10%, 9.6-10%, 9.8-10% , 9.9-10%, 10-10.2%, 10-10.3%, 10-10.5%, 10-10.6%, 10-10.8%, 10-11%, 10-12%, 10-14%, 10-14.3%, 10-15%, 10-18%, 10.8-12%, 10.8-14.3%, 10.8-18%, 12-14.3%, 12-18%, 14.3-18%, and so on.

[0018] In the present invention, ZrO 2 It is a glass intermediate oxide, which has the effect of improving chemical stability and preventing the exposure of alkali metal and alkaline earth metal ions. It is also an important component for improving the tensile elastic modulus and is also very helpful for improving the hardness of glass after chemical strengthening. 2 The content range of ZrO is 0.1-6%. In some optional embodiments, ZrO 2 The content can be selected from the following content ranges or be any value in the following content ranges: 0.1-0.5%, 0.1-1%, 0.1-2%, 0.1-6%, 0.5-1%, 0.6-1%, 0.7-1%, 0.8-1%, 0.9-1%, 0.5-2%, 0.5-6%, 1-1%, 1-1.1%, 1-1.2%, 1-1.3%, 1-1.4%, 1-1.5%, 1-1.6%, 1-1.7%, 1-1.8%, 1-1.9%, 1-2%, 1-6%, 2-6%, and the like.

[0019] In the present invention, MgO and CaO are alkaline earth metal oxides, and their addition can significantly reduce the phase separation tendency of glass. In addition, adding MgO to alkali-aluminosilicate glass plays a role of breaking the network and melting the glass, and will not substantially destroy the network structure, which helps to form a variety of ring structures in the network structure, including ternary rings, quaternary rings, pentacyclic rings and hexacyclic rings. This not only maintains the integrity of the glass network, but also helps to create gaps between glass structural units, provides channels for ion exchange, and helps to increase the depth (DOL) of the compressive stress layer after chemical strengthening. CaO can improve the hardness and mechanical strength of glass, and help to improve the compression and bending resistance of glass. CaO can also optimize the melting and forming properties of glass, making glass easier to process at lower temperatures while maintaining the integrity and stability of the glass structure. When the content of MgO and CaO is too high, the chemical stability of the glass may be reduced, making it more susceptible to chemical erosion. In addition, too much MgO and CaO may cause the thermal expansion coefficient of the glass to increase, thereby more easily generating thermal stress and cracking when the temperature changes. At the same time, too high a content may also cause the glass to become too fragile and the mechanical strength to decrease. On the contrary, when the content of MgO and CaO is too low, the phase separation tendency of the glass cannot be effectively controlled, which may lead to uneven physical and chemical properties of the glass. Low content of MgO and CaO is also insufficient to provide sufficient fluxing effect and mechanical strength improvement effect, resulting in poor performance of the glass during melting and forming, and difficulty in forming a variety of ring structures, affecting the efficiency of ion exchange and the depth of the compressive stress layer. In the present invention, the content of MgO is in the range of 0.1-3% by mass. In some optional embodiments, the content of MgO can be selected from the following content ranges or any value in the following content ranges: 0.1-1%, 0.1-1.5%, 0.1-2%, 0.1-3%, 1-1.5%, 1-2%, 1-3%, 1.5-2%, 1.6-2%, 1.7-2%, 1.8-2%, 1.9-2%, 1.5-3%, 2-2.1%, 2-2.2%, 2-2.3%, 2-2.4%, 2-2.5%, 2-2.6%, 2-2.7%, 2-2.8%, 2-2.9%, 2-3%, etc. In the present invention, the content of CaO is in the range of 0.1-4% by mass.In some optional embodiments, the CaO content can be selected from the following content ranges or be any value in the following content ranges: 0.1-1.9%, 0.1-2%, 0.1-2.5%, 0.1-3%, 0.1-4%, 1.9-2%, 1.9-2.5%, 1.9-3%, 3.1-4%, 3.2-4%, 3.3-4%, 3.4-4%, 3.5-4%, 3.6-4%, 3.7-4%, 3.8-4%, 3.9-4%, 1.9-4%, 2-2.5%, 2-3%, 2-4%, 2.5-3%, 2.5-4%, 3-4%, and the like.

[0020] In the present invention, there is a synergistic and complementary effect between MgO and CaO. The combination of the breaking fluxing effect of MgO and the hardness and mechanical strength improvement effect of CaO can significantly optimize the overall performance of the glass. MgO helps to form a variety of ring structures and improve the chemical strengthening effect, while CaO can improve the mechanical properties and forming properties of the glass. The combination of the two can effectively avoid the adverse effects of too high or too low a single component, and ensure the balance and optimization of the performance of the glass in all aspects. Therefore, in the glass formula, it is necessary to control the content ratio of MgO and CaO to ensure the best performance of their synergistic effect. In some embodiments of the present invention, the sum of the content of MgO and CaO is preferably 1.5-6%. In some optional embodiments, the sum of the content of MgO and CaO is selected from 1.6-6%, 2-6%, 2.5-6%, 3-6%, 3.5-6%, 4-6%, 4.5-6%, 5-6%, 5.5-6%.

[0021] In the present invention, CeO 2 It can improve the ultraviolet absorption capacity and anti-explosion effect of glass. It is also a strong oxidant. When heated at high temperature, it can release oxygen and act as a clarifier. In addition, CeO 2 It can also improve the chemical and thermal stability, radiation resistance and fading of glass. However, too high a CeO2 content will make the glass brittle, reduce light transmittance and increase production costs. Too low a CeO2 content will result in insufficient UV absorption and anti-aging performance, reduced chemical stability and radiation resistance, and affect the clarification effect. In the present invention, CeO2 is expressed in mass percentage. 2 The content range of CeO is 0.1-1%. In some optional embodiments, CeO 2 The content can be selected from the following content ranges or be any value in the following content ranges: 0.1-0.2%, 0.1-0.3%, 0.1-0.4%, 0.1-0.45%, 0.1-0.49%, 0.1-0.5%, 0.1-0.8%, 0.1-1%, 0.5-0.8%, 0.5-1%, 0.8-1%, and the like.

[0022] In the present invention, NaCl is used as a high-temperature volatile clarifier with a boiling point of 1413°C. Its volatility can enter bubbles by diffusion at high temperatures, increasing the volume and rising speed of bubbles. The volatilization of NaCl may also help regulate the local chemical environment of molten glass and promote the merging and removal of bubbles. The addition of NaCl can promote the uniform distribution of glass components, reduce performance differences, and improve the quality of glass. By effectively removing bubbles and impurities, NaCl significantly improves the transparency and optical properties of glass, making the glass clearer and more transparent. NaCl can also enhance the chemical stability of glass, making it more resistant to corrosion and erosion, and promote redox reactions in molten glass at high temperatures, help remove harmful impurities, and improve the purity of glass. However, the NaCl content should not be too high. Excessive NaCl may cause excessive sodium ions in the glass, destroy the glass network structure, and reduce the mechanical strength and chemical stability of the glass. In addition, excessive NaCl volatilization will form sodium salt deposition on the surface of the glass, affecting the appearance and quality of the glass. High content of NaCl may also cause excessive bubbles in the glass, forming larger bubbles, which is not conducive to the clarification effect. In the present invention, the content of NaCl is in the range of 0.1-1% by mass. In some optional embodiments, the content of NaCl can be selected from the following content ranges or any value in the following content ranges: 0.1-0.7%, 0.1-0.9%, 0.1-1%, 0.7-0.9%, 0.7-1%, 0.9-1%, 0.91-1%, 0.92-1%, 0.93-1%, 0.94-1%, 0.95-1%, 0.96-1%, 0.97-1%, 0.98-1%, 0.99-1%, and the like.

[0023] In the present invention, CeO 2 The use of CeO2 and NaCl can significantly improve the clarification effect of glass, making the glass more transparent and pure, and can greatly improve the durability and stability of glass. The volatility of NaCl may form deposits on the surface of glass, affecting the quality. The addition of CeO2 can reduce such deposits through its oxidizing properties and improve the surface quality of glass. At the same time, the role of NaCl can help eliminate the excessive oxygen release caused by CeO2, adjust the bubble removal speed, and prevent excessive bubble formation. In some embodiments of the present invention, the preferred CeO2 2 The sum of the contents of CeO and NaCl is 0.8-2%. 2 The sum of the contents of NaCl and Bt is selected from 1-2%, 0.8-1.7%, 0.8-1.5%, 1.1-2%, 1.1-1.4%, 1.1-1.5%, 1.1-1.7%, 0.85-1.1%, 0.9-1.1%, and 1-1.1%.

[0024] The various specific technical features described in all the above-mentioned embodiments of the present invention can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not further explain various possible combinations.

[0025] Unless otherwise specified, the numerical range described in the present invention includes all the numerical values ​​within this range, and includes the range value composed of any two numerical values ​​within this range. For example, 0.1-1%, this numerical range includes all the numerical values ​​between 0.1-1%, and includes the range value (0.11-0.9%) composed of any two numerical values ​​within this range (for example: 0.11%, 0.9%); different numerical values ​​of the same indicator appearing in all embodiments of the present invention can be arbitrarily combined to form a range value.

[0026] For example, in some embodiments of the present invention, the glass composition of the present invention comprises or consists of the following components, measured by mass percentage: 52-62% SiO 2 , 0.1-5% Bi 2 O 3 , 0.1-1% AgO, 14-18% Na 2 O, 0-7% K 2 O, 0.1-4% B 2 O 3 10-18% Al 2 O 3 0.1-6% ZrO 2 , 1-3% MgO, 0.1-4% CaO, 0.1-1% CeO 2 and 0.7-1% NaCl.

[0027] For example, in some embodiments of the present invention, the glass composition of the present invention comprises or consists of the following components, measured by mass percentage: 52-62% SiO 2 , 1-5% Bi 2 O 3 , 0.1-1% AgO, 14-18% Na 2 O, 0 or 3-6% K 2 O, 0.1-3% B 2 O 3 10-18% Al 2 O 3 0.5-2% ZrO 2 , 1-3% MgO, 0.1-4% CaO, 0.1-1% CeO 2 and 0.7-1% NaCl.

[0028] In a second aspect of the present invention, a photovoltaic glass blank is provided, which is made of the photovoltaic glass composition described in the first aspect.

[0029] In some embodiments of the present invention, the method for preparing the optoelectronic glass blank comprises: mixing the raw materials uniformly, melting at a high temperature of 1550-1620°C, stirring, clarifying, then cooling to 1360-1450°C for molding, and annealing at 480-560°C after molding to obtain the optoelectronic glass blank.

[0030] In some embodiments of the present invention, the raw materials may also be selected from the following materials as needed: quartz sand, bismuth oxide, silver nitrate, sodium carbonate (or sodium nitrate), potassium carbonate (or potassium nitrate), boron oxide (or boric acid), aluminum hydroxide (or aluminum oxide), zirconium oxide, calcium oxide (or calcium carbonate), magnesium oxide (or basic magnesium carbonate), cerium oxide and sodium chloride.

[0031] In an embodiment of the present invention, the minimum spectral transmittance of the optoelectronic glass blank to 400-1000nm light is ≥90.00%, preferably ≥90.5%, more preferably ≥91%, and most preferably ≥92%. For example, in some embodiments of the present invention, the minimum spectral transmittance of the optoelectronic glass blank to 400-1000nm light can be selected from 90-92.07%, 90.5-92.07%, 90.86-92.07%, 91-92.07%, 91.5-92.07%.

[0032] In a third aspect of the present invention, there is provided a photovoltaic glass material comprising a light-transmitting glass substrate and a light-absorbing layer;

[0033] The light absorbing layer covers part of the surface of the light-transmitting base glass, and divides the surface of the light-transmitting base glass into a low light-transmitting area and at least one light-transmitting effective area; wherein the light-transmitting effective area is not covered with the light absorbing layer, allowing the target light to pass through; and the low light-transmitting area covers the light absorbing layer to absorb or block the target light;

[0034] The light-transmitting substrate glass has the glass composition described in the first aspect or the active area is made of the optoelectronic glass blank described in the second aspect.

[0035] In an embodiment of the present invention, the photoelectric glass material has a minimum spectral transmittance of ≥90.00% for 400-1000nm light in its effective area, preferably ≥90.5%, more preferably ≥91%, and most preferably ≥92%. For example, in some embodiments of the present invention, the minimum spectral transmittance of 400-1000nm light in the effective area can be selected from 90-92.07%, 90.5-92.07%, 90.86-92.07%, 91-92.07%, and 91.5-92.07%. This shows that the photoelectric glass material of the present invention has a very high transmittance in the entire visible light (400-700nm) to near-infrared light (700-1000nm) range, which can ensure the clarity of the image and the authenticity of the color, and is suitable for applications requiring high clarity and high color accuracy, such as high-end cameras, precision measuring equipment, etc. For example, in a photoelectric display screen, high transmittance can significantly improve the display quality, making the colors more vivid and the contrast higher. Likewise, in optical lenses and clinical monitoring devices, excellent light transmission helps provide clearer images, which is critical for accurate diagnosis and high-quality visual output.

[0036] In an embodiment of the present invention, the maximum transmittance of the absorption layer of the photoelectric glass material to 400-1000nm light is ≤2%, preferably ≤1.91%, more preferably ≤1.82%, and most preferably ≤1.69%. For example, in some embodiments of the present invention, the maximum transmittance of the absorption layer to 400-1000nm light can be selected from 1.55-2%, 1.55-1.91%, 1.55-1.86%, 1.55-1.82%, and 1.55-1.69%. This ensures that within the range of 400-1000nm, the photoelectric glass material of the present invention can effectively eliminate stray light, and maintain image clarity and contrast even under extreme lighting conditions (such as strong direct sunlight, low light environment, reflected light and scattered light environment, high dynamic range environment). This is crucial to improving the performance of visual systems, especially in high dynamic range imaging and precise optical measurement. By limiting the maximum transmittance of stray light, photoelectric glass can effectively reduce light scattering and halo, thereby improving the contrast and overall visual quality of the image. This performance is particularly important in intelligent vision systems, such as security monitoring and autonomous driving technology, which can provide more accurate and reliable image analysis. In addition, for optical lenses, reducing stray light is also critical, which can enhance the performance of cameras and observation equipment, especially in low-light environments.

[0037] In an embodiment of the present invention, the thermal stability ΔT of the optoelectronic glass material is ≥180°C, preferably ≥188°C, and more preferably ≥197°C. For example, in some embodiments of the present invention, the thermal stability ΔT of the optoelectronic glass material may be 182-197°C, 182-188°C, or 188-197°C. This means that the optoelectronic glass material of the present invention can withstand a temperature difference of at least 188°C without affecting its structure and performance, which is extremely important for applications that may be exposed to high temperature environments (such as outdoor equipment or industrial process monitoring systems). High thermal stability means that the optoelectronic glass can maintain its performance unchanged in the face of high temperature changes, which is especially important for optoelectronic display screens, especially those installed outdoors or in environments with large temperature fluctuations. In clinical monitoring equipment, this high thermal stability also ensures that the equipment can still operate normally after a high-temperature sterilization process, ensuring medical safety and equipment reliability.

[0038] In the embodiment of the present invention, the photoelectric glass material has a heat resistance of (95-105)×10 -7 / ℃. Control of the expansion coefficient is extremely important to ensure the dimensional stability of glass under temperature changes. Dimensional stability directly affects the accuracy of the optical system, especially in precision optical lenses, where improper expansion may cause the image to be out of focus or deformed. Optical display screens and clinical monitoring equipment used in high temperature environments also rely on this performance to maintain long-term reliability and performance consistency.

[0039] In an embodiment of the present invention, the bending strength of the optoelectronic glass material after chemical strengthening is ≥200MPa, preferably ≥205MPa, more preferably ≥210MPa, and most preferably ≥214MPa. For example, in some embodiments of the present invention, the bending strength of the optoelectronic glass material after chemical strengthening can be 200-217MPa, 205-217MPa, 208-217MPa, 211-217MPa, 214-217MPa. The high bending strength after chemical strengthening ensures the durability and fracture resistance of the glass when subjected to mechanical stress, can withstand greater physical pressure, and is suitable for environments that may be impacted or require high durability. This ensures that the optical components of the system remain intact and function properly even in physical shock or high-pressure environments. This is particularly important for optoelectronic display screens and intelligent visual systems that may be subjected to physical shocks. In addition, this also helps the tempered glass in the optical lens to withstand various physical pressures that may be encountered during transportation and use, ensuring that the performance and accuracy of the device are not affected for a long time.

[0040] In a fourth aspect of the present invention, a method for preparing the optoelectronic glass material described in the third aspect is provided, comprising:

[0041] The raw materials are mixed evenly, melted at a high temperature of 1550-1620°C, stirred, clarified, and then cooled to 1360-1450°C for molding. After molding, they are annealed at 480-560°C to obtain optoelectronic glass blanks.

[0042] Processing the optoelectronic glass blank into a certain size as a light-transmitting glass substrate. For example, in some embodiments, the optoelectronic glass blank is processed into a truncated cone of a certain size;

[0043] Then, a reduction treatment is performed to form an absorption layer on the surface of the glass material. In some embodiments of the present invention, the reduction treatment is performed under a reducing atmosphere, such as hydrogen, and the reduction treatment time is 3000-20000 min, the pressure is 0.01-0.5 MPa, the temperature is 500-700° C., and there are multiple cycles of inflation and deflation during the entire reduction process, and one cycle period is 150-300 min;

[0044] The glass material with the absorption layer formed on the surface is mechanically processed. The mechanical processing includes conventional mechanical processing operations such as grinding, polishing, fine carving, chamfering, etc., which can be selected according to needs. For example, according to needs, part of the absorption layer on the glass surface can be removed by grinding to expose the effective area. For example, taking the truncated cone as an example, the absorption layer on the upper and lower circular surfaces can be removed, and the absorption layer on the side of the truncated cone can be retained;

[0045] The machined material is subjected to chemical strengthening treatment, which refers to placing the glass in a salt bath for single or multiple chemical ion exchange. The salt bath used for ion exchange can be lithium salt, sodium salt, potassium salt or a mixed molten salt of the three. For example, in some embodiments, the molten salt is molten potassium nitrate, and the temperature of chemical strengthening is 400-490°C and the time is 200-800 minutes.

[0046] The method of the present invention has process stability, and the glass material prepared by the process method can show stable characteristics, and will not cause non-negligible fluctuations in glass performance due to the increase or decrease of process parameters within the range (such as temperature, time, pressure, etc. within the range). Of course, it can be understood that within the process range, some higher temperatures can shorten the preparation process compared to lower temperatures. If it is necessary to shorten the time cost as much as possible, the technicians in this field can select a relatively higher temperature within the temperature range disclosed in the present invention when operating. If it is necessary to save energy as much as possible, the technicians in this field can also select a relatively lower temperature within the temperature range disclosed in the present invention when operating.

[0047] In a fifth aspect of the present invention, there is provided an application of the glass composition described in the first aspect or the optoelectronic glass material described in the third aspect in the field of intelligent technology applications.

[0048] In the embodiments of the present invention, the application fields of the intelligent technology are not limited to information display, intelligent vision, clinical monitoring, optical lens and other fields. The specific technical features described in all the above embodiments of the present invention can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not further describe various possible combinations.

[0049] Through one or more of the above technical means, the following beneficial effects can be achieved:

[0050] The present invention provides a photoelectric glass material with high thermal stability, a preparation method and an application thereof. The material, as a photoelectric glass cover material, has excellent spectral transmittance, a minimum spectral transmittance in an effective area ≥90.00% (@400-1000nm), an effective stray light elimination area, a maximum transmittance of a light absorption layer ≤2% (@400-1000nm), good thermal stability, ΔT ≥180°C, and a suitable expansion coefficient, and has a chemically strengthened property, and the bending strength of the glass after chemical strengthening is ≥200MPa. BRIEF DESCRIPTION OF THE DRAWINGS

[0051] The drawings constituting part of the present application are used to provide a further understanding of the present application. The illustrative embodiments and descriptions of the present application are used to explain the present application and do not constitute an improper limitation on the present application. The implementation scheme of the present application is described in detail below in conjunction with the drawings, wherein:

[0052] Figure 1 A comparison chart of the minimum transmittance of the effective area of ​​the photovoltaic glass of Examples 1-6 of the present invention and Comparative Examples 1-10 and the maximum transmittance value (@400-1000nm) of the absorption layer after reduction treatment is shown.

[0053] Figure 2 A comparison chart of the bending strength values ​​of the photovoltaic glasses of Examples 1-6 of the present invention and Comparative Examples 1-10 after chemical strengthening is shown.

[0054] Figure 3 A comparison chart of the thermal stability ΔT values ​​of the photovoltaic glasses of Examples 1-6 of the present invention and Comparative Examples 1-10 is shown. DETAILED DESCRIPTION

[0055] The present application is further described below in conjunction with specific examples. It should be understood that these examples are only used to illustrate the present application and are not intended to limit the scope of the present application. The experimental methods in the following examples without specifying specific conditions are usually carried out under conventional conditions or according to the conditions recommended by the manufacturer.

[0056] Unless otherwise defined, all professional and scientific terms used herein have the same meanings as those familiar to those skilled in the art. The reagents or raw materials used in this application can be purchased through conventional channels. Unless otherwise specified, the reagents or raw materials used in this application are used in a conventional manner in the art or in accordance with the product instructions. In addition, any method and material similar to or equivalent to the content described herein can be applied to the method of this application. The preferred implementation methods and materials described in the text are for demonstration purposes only.

[0057] In the following embodiments of the present invention, unless otherwise specified, the following methods are used to test the relevant properties:

[0058] The transmittance of the glass sample was measured using a Shimadzu UV-Vis spectrophotometer (UV-3600Plus). The test wavelength range was 350nm-1000nm, the surface of the tested glass sample was optically polished, and the test sample thickness was 2mm. (GB / T7962.12-2010).

[0059] The thermal expansion coefficient of the glass sample was tested using a NETZSCH DIL 402 expansion coefficient tester. The glass sample was polished into a cylindrical glass strip of Φ6mm×50mm, and the two end faces were parallel. The instrument heating rate was set to 5℃ / min, and the data acquisition cycle was 20ms. (GB / T 7962.16-2010)

[0060] The bending strength of the glass sample is measured using a three-point bending tester. The sample size is 3mm×4mm×40mm. The four long sides of the tested glass sample are optically polished, the long edges are chamfered, and the end surface of the test sample does not require special treatment. (GB / T 6569-2006)

[0061] The thermal stability test method is as follows: take 6 pieces of each type of annealed samples, the sample size is 10mm×10mm×4mm, the sample cutting parts need to be polished, the samples are placed on refractory bricks and put into the annealing furnace, the initial insulation temperature is set to 120℃, the heating time is set to control the heating rate at 4±1℃ / min, and the annealing furnace temperature is kept warm for 60min after it rises to 120℃. After the insulation is completed, immerse the sample in ice water and check it in water after at least 10s. After the inspection, the undamaged sample is wiped clean with alcohol and put back into the annealing furnace, and the temperature is raised by 10℃ compared with the previous time. Repeat the test according to the above steps until all the samples are broken. The thermal stability ΔT of each sample is calculated using the following formula:

[0062]

[0063] In the formula, ΔT 1 , ΔT 2 , ΔT 3 , ... ΔTi is the temperature difference between the furnace and water at each measurement, N 1 , N 2 , N 3 , ... N i is the number of sample fractures during each measurement.

[0064] Example 1

[0065] The glass blank of this embodiment is composed of the following components in percentage by mass: 62% SiO 2 , 1% Bi 2 O 3 , 0.1% AgO, 17% Na 2 O, 5.4% K 2 O, 0.1% B 2 O 3 , 10.8% Al 2 O 3 , 0.5% ZrO 2 、1.5% MgO、0.1% CaO、0.5% CeO 2 , 1% NaCl.

[0066] Quartz sand, bismuth oxide, silver nitrate, sodium carbonate, potassium nitrate, boric acid, aluminum hydroxide, zirconium oxide, calcium carbonate, basic magnesium carbonate, cerium oxide and sodium chloride are used as raw materials. After each glass raw material is mixed in proportion, the batch material is melted at a high temperature of 1550°C, clarified by auxiliary stirring, mechanically formed at 1360°C, and annealed at 480°C to obtain a glass blank.

[0067] The glass blank of this embodiment is processed into a certain size, and then in a hydrogen atmosphere, it is subjected to a reduction process of 7200 minutes, 0.03 MPa, and 680°C, and there are multiple cycles of inflation and deflation during the entire reduction process, and one cycle period is 180 minutes, to form a light absorption layer on the glass surface. The glass material with the absorption layer on the surface is mechanically processed, and the mechanical processing includes grinding, polishing, fine carving, and chamfering. The polished glass sheet is chemically strengthened at 440°C for 400 minutes (molten salt uses molten potassium nitrate) to obtain the optoelectronic glass material of this embodiment.

[0068] The materials obtained during the preparation process were tested and the results are shown in Table 3.

[0069] Example 2

[0070] The glass blank of this embodiment is composed of the following components in percentage by mass: 52.5% SiO 2 , 0.5% Bi 2 O 3 , 3% AgO, 13% Na2 O, 7% K 2 O, 4% B 2 O 3 , 14.3% Al 2 O 3 , 1% ZrO 2 , 2% MgO, 1.9% CaO, 0.1% CeO 2 , 0.1% NaCl.

[0071] Quartz sand, bismuth oxide, silver nitrate, sodium nitrate, potassium carbonate, boron oxide, aluminum oxide, zirconium oxide, calcium oxide, magnesium oxide, cerium oxide and sodium chloride are used as raw materials, and each glass raw material is mixed in proportion, and then a glass blank and a photoelectric glass material are prepared according to the method of Example 1.

[0072] The materials obtained during the preparation process were tested and the results are shown in Table 3.

[0073] Example 3

[0074] The glass blank of this embodiment is composed of the following components in percentage by mass: 52% SiO 2 , 4.2% Bi 2 O 3 , 0.3% AgO, 16% Na 2 O. 5% K 2 O, 3% B 2 O 3 , 12% Al 2 O 3 , 2% ZrO 2 , 1% MgO, 2.5% CaO, 1% CeO 2 , 1% NaCl.

[0075] Quartz sand, bismuth oxide, silver nitrate, sodium carbonate, potassium nitrate, boric acid, aluminum hydroxide, zirconium oxide, calcium carbonate, basic magnesium carbonate, cerium oxide and sodium chloride are used as raw materials. After mixing the glass raw materials in proportion, a glass blank and a photoelectric glass material are prepared according to the method of Example 1.

[0076] The materials obtained during the preparation process were tested and the results are shown in Table 3.

[0077] Example 4

[0078] The glass blank of this embodiment is composed of the following components in percentage by mass: 59.9% SiO 2 , 5% Bi 2 O 3 , 1% AgO, 14% Na 2 O, 2% B2 O 3 , 10% Al 2 O 3 , 1% ZrO 2 , 2% MgO, 4% CaO, 0.1% CeO 2 , 1% NaCl.

[0079] Quartz sand, bismuth oxide, silver nitrate, sodium nitrate, boron oxide, aluminum oxide, zirconium oxide, calcium oxide, magnesium oxide, cerium oxide and sodium chloride are used as raw materials. After mixing the glass raw materials in proportion, a glass blank and a photoelectric glass material are prepared according to the method of Example 1.

[0080] The materials obtained during the preparation process were tested and the results are shown in Table 3.

[0081] Example 5

[0082] The glass blank of this embodiment is composed of the following components in percentage by mass: 56.6% SiO 2 , 1% Bi 2 O 3 , 0.5% AgO, 20% Na 2 O, 1.1% K 2 O, 2% B 2 O 3 , 8% Al 2 O 3 , 6% ZrO 2 , 0.1% MgO, 3% CaO, 0.8% CeO 2 , 0.9% NaCl.

[0083] Quartz sand, bismuth oxide, silver nitrate, sodium nitrate, potassium carbonate, boron oxide, aluminum oxide, zirconium oxide, calcium oxide, magnesium oxide, cerium oxide and sodium chloride are used as raw materials, and each glass raw material is mixed in proportion, and then a glass blank and a photoelectric glass material are prepared according to the method of Example 1.

[0084] The materials obtained during the preparation process were tested and the results are shown in Table 3.

[0085] Example 6

[0086] The glass blank of this embodiment is composed of the following components in percentage by mass: 54.9% SiO 2 、0.1%Bi 2 O 3 , 0.8% AgO, 16% Na 2 O, 3% K 2 O, 1% B 2 O 3、18% Al 2 O 3 , 0.1% ZrO 2 , 3% MgO, 2% CaO, 1% CeO 2 , 0.1% NaCl.

[0087] Quartz sand, bismuth oxide, silver nitrate, sodium carbonate, potassium nitrate, boric acid, aluminum hydroxide, zirconium oxide, calcium carbonate, basic magnesium carbonate, cerium oxide and sodium chloride are used as raw materials. After mixing the glass raw materials in proportion, a glass blank and a photoelectric glass material are prepared according to the method of Example 1.

[0088] The materials obtained during the preparation process were tested and the results are shown in Table 3.

[0089] Comparative Examples 1-10

[0090] The raw material compositions of Comparative Examples 1 to 10 are shown in Table 2. The raw materials were used to prepare glass blanks and photovoltaic glass materials according to the method of Example 1. The materials obtained during the preparation process were tested, and the results are shown in Table 4.

[0091] The compositions and properties of the glass samples of Examples 1-6 and Comparative Examples 1-6 of the present invention are shown in Tables 1 to 4, respectively.

[0092] Table 1 Composition of glass samples of Examples 1-6

[0093]

[0094] Table 2 Glass sample composition of comparative examples 1-10

[0095]

[0096]

[0097] Table 3 Performance test results of glass samples of Examples 1-6

[0098]

[0099] Table 4 Performance test results of glass samples of Comparative Examples 1-10

[0100]

[0101] As shown in Table 3, the optoelectronic glass materials of the embodiments of the present invention have excellent spectral transmittance, the minimum spectral transmittance in the effective area is ≥90.00% (@400-1000nm), it has an effective stray light elimination area, the maximum transmittance of the light absorption layer is ≤2% (@400-1000nm), it has good thermal stability, ΔT ≥182°C, and has a suitable thermal expansion coefficient of 30-300°C (95-105)×10-7 / ℃, and has the property of being chemically strengthened, and the bending strength of the glass after chemical strengthening is ≥200MPa. The glass in the embodiment of the present invention has substantially the same spectral transmittance and thermal stability before and after chemical strengthening.

[0102] The above description is only the preferred embodiment of the present application and is not intended to limit the present application. Although the present application is described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or replace some of the technical features therein by equivalents. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.

Claims

1. A photovoltaic glass material composition with high thermal stability, comprising the following components, by mass percentage: 52-62% SiO2, 0.1-5% Bi2O3, 0.1-3% AgO, 13-20% Na2O, 0-7% K2O, 0.1-4% B2O3, 8-18% Al2O3, 0.1-6% ZrO2, 0.1-3% MgO, 0.1-4% CaO, 0.1-1% CeO2 and 0.1-1% NaCl.

2. The photovoltaic glass material composition with high thermal stability according to claim 1, characterized in that: In terms of mass percentage, the content of NaCl is 0.9-1%, preferably 0.95-1%; Preferably, in terms of mass percentage, the content ratio of Bi2O3 to AgO is 0.1-14:1, preferably 5-14:1, more preferably 5-10:1; Preferably, the sum of the contents of Na2O and K2O is 14-22.5% by mass, preferably 14-21%, more preferably 14-18%; Preferably, the sum of the contents of MgO and CaO is 1.5-6% by mass, preferably 3-6%, more preferably 4-6%; Preferably, the sum of the contents of CeO2 and NaCl is 0.8-2%, preferably 1.1-2%, more preferably 1.1-1.5%, by mass percentage; Preferably, the content of SiO2 is 54-62% by mass, preferably 57-62%, more preferably 59-62%; Preferably, the content of Bi2O3 is 0.5-5%, preferably 1-5%, more preferably 4-5%, by mass percentage; Preferably, in terms of mass percentage, the content of AgO is 0.3-1%, preferably 0.5-1%, more preferably 0.8-1%; Preferably, the content of Na2O is 14-20% by mass, preferably 14-18%, more preferably 14-17.5%; Preferably, the content of K2O is 0-1% or 1.1-7%, preferably 0 or 2-5.5%, more preferably 4-5.5% by mass percentage; Preferably, the content of B2O3 is 0.1-3%, preferably 0.1-2.5%, more preferably 0.1-2% by mass; Preferably, the content of Al2O3 is 10-18% by mass, preferably 10-14%, more preferably 10-12%; Preferably, the content of ZrO2 is 0.1-2%, preferably 0.1-1%, more preferably 0.5-1% by mass percentage; Preferably, the content of MgO is 1-3%, preferably 1-2%, more preferably 1.5-2% by mass; Preferably, in terms of mass percentage, the CaO content is 1.9-4%, preferably 2-4%, more preferably 2.5-4%; Preferably, in terms of mass percentage, the content of CeO2 is 0.1-0.8%, preferably 0.1-0.5%, and more preferably 0.1-0.45%.

3. The photovoltaic glass material composition with high thermal stability according to claim 1 or 2, characterized in that: The invention comprises the following components in percentage by mass: 52-62% SiO2, 0.1-5% Bi2O3, 0.1-1% AgO, 14-18% Na2O, 0-7% K2O, 0.1-4% B2O3, 10-18% Al2O3, 0.1-6% ZrO2, 1-3% MgO, 0.1-4% CaO, 0.1-1% CeO2 and 0.7-1% NaCl; Preferably, it consists of the following components, in mass percentage: 52-62% SiO2, 1-5% Bi2O3, 0.1-1% AgO, 14-18% Na2O, 0 or 3-6% K2O, 0.1-3% B2O3, 10-18% Al2O3, 0.5-2% ZrO2, 1-3% MgO, 0.1-4% CaO, 0.1-1% CeO2 and 0.7-1% NaCl.

4. A photovoltaic glass blank with high thermal stability, which is made of the photovoltaic glass material composition with high thermal stability according to any one of claims 1 to 3; Preferably, the method for preparing the optoelectronic glass blank comprises: The raw materials are mixed evenly, melted at a high temperature of 1550-1620°C, stirred, clarified, and then cooled to 1360-1450°C for molding. After molding, they are annealed at 480-560°C to obtain optoelectronic glass blanks.

5. A photoelectric glass material with high thermal stability, comprising a light-transmitting substrate glass, a light-transmitting glass substrate and a light-absorbing layer; in, The light absorbing layer covers part of the surface of the light-transmitting base glass, and divides the surface of the light-transmitting base glass into a low light-transmitting area and at least one light-transmitting effective area; wherein the light-transmitting effective area is not covered with the light absorbing layer, allowing the target light to pass through; and the low light-transmitting area is covered with the light absorbing layer to absorb or block the target light; The light-transmitting substrate glass light-transmitting glass substrate has a composition of the glass composition according to any one of claims 1 to 3, or is made of the glass blank according to claim 4; Preferably, the light absorbing layer is obtained by reducing a light-transmitting glass substrate; preferably, the reduction treatment is carried out in a reducing atmosphere, the reduction treatment time is 3000-20000 min, the pressure is 0.01-0.5 MPa, and the temperature is 500-700° C.; Preferably, the optoelectronic glass material with high thermal stability has a minimum spectral transmittance of 400-1000nm light in its effective area of ​​≥90.00%; Preferably, the maximum transmittance of the absorption layer of the photoelectric glass material with high thermal stability to 400-1000nm light is ≤2%; Preferably, the photovoltaic glass material with high thermal stability has a thermal stability ΔT ≥ 180°C; Preferably, the photovoltaic glass material with high thermal stability has a bending strength of ≥200 MPa after chemical strengthening.

6. A method for preparing the optoelectronic glass material with high thermal stability according to claim 5, comprising: Preparation of optoelectronic glass blanks; Processing the photoelectric glass blank into a certain size as a light-transmitting glass substrate; Performing reduction treatment on the light-transmitting glass substrate to form an absorption layer on its surface; Mechanical processing of glass material with an absorption layer formed on the surface; Preferably, the step of chemical strengthening treatment is further included after the mechanical processing; Preferably, the method for preparing the optoelectronic glass blank comprises: mixing the raw materials uniformly, melting at a high temperature of 1550-1620° C., stirring, clarifying, then cooling to 1360-1450° C. for forming, and annealing at 480-560° C. after forming, to obtain the optoelectronic glass blank; Preferably, the reduction treatment is carried out in a reducing atmosphere, the time of the reduction treatment is 3000-20000 min, the pressure is 0.01-0.5 MPa, and the temperature is 500-700° C.; Preferably, the chemical strengthening adopts an ion exchange method, and the temperature of the chemical strengthening is 400-490° C. and the time is 200-800 min.

7. A glass cover plate, made of the electric glass material with high thermal stability according to claim 5 or the method according to claim 6.

8. An electronic device, comprising: a glass cover plate, the glass cover plate as claimed in claim 7; Preferably, the electronic device is a photoelectric display screen.

9. Application of the optoelectronic glass material composition with high thermal stability according to any one of claims 1 to 3, the optoelectronic glass blank with high thermal stability according to claim 4, the optoelectronic glass material with high thermal stability according to claim 5, the glass cover material according to claim 7, or the electronic device according to claim 8 in the field of intelligent technology applications.

10. The use according to claim 9, characterized in that: The application fields of the intelligent technology include information display, intelligent vision, clinical monitoring, and optical lens.

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