X-ray scatterometry apparatus, monitoring method and medium

Abstract

An X-ray scattering measurement device includes an X-ray source, a monitoring detector, a monitoring adjustment system and a vacuum collimation system, the vacuum collimation system includes a first slit; when X-rays emitted by the X-ray source irradiate the first slit, a part of the X-rays blocked by the first slit forms first scattered X-rays; the monitoring detector is used for detecting the first scattered X-rays and outputting intensity information; the monitoring adjustment system processes the intensity information to obtain intensity monitoring data of the X-rays, and monitors the X-ray source according to the intensity monitoring data. Since the first scattered X-rays belong to useless X-rays blocked by the first slit of the vacuum collimation system and cannot participate in measurement, the useless X-rays in the measurement light path are used as monitoring objects, the X-ray source can be monitored in real time without interrupting the measurement process; at the same time, the state of the X-ray source can be judged according to the real-time monitoring result, the cause of abnormal measurement result can be automatically identified and countermeasures can be taken, and the intensity stability of the X-ray source can be ensured.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of optical measurement equipment, in particular to an X-ray scattering measurement equipment, a monitoring method and a medium. BACKGROUND

[0002] Critical dimension small angle X-ray scattering (CD-SAXS) is a kind of transmission variable angle X-ray scattering measurement technology, which can be used to measure the characteristics of complex periodic structure in the order of 1-100 nanometers. Taking the measurement of high aspect ratio structure (HAR) of semiconductor device as an example, the X-ray beam penetrates the semiconductor device and scatters from the HAR structure. By detecting the angular distribution information of the scattered X-rays of the HAR structure, the three-dimensional topography of the HAR structure can be reconstructed through CD-SAXS analysis algorithm, so as to realize the measurement of the critical dimension of the HAR structure in the horizontal and vertical directions.

[0003] Since the X-ray source configured by the CD-SAXS measurement equipment needs to have the characteristics of high power and high brightness, the X-ray sources that meet this characteristic at present mainly include synchrotron X-ray source, liquid metal target X-ray source and rotating anode target X-ray source. Among them, the synchrotron X-ray source belongs to a large scientific device, and the cost and maintenance cost are extremely high, which is not suitable for wide application in CD-SAXS equipment. Therefore, the existing CD-SAXS measurement equipment usually adopts liquid metal target X-ray source or rotating anode target X-ray source. However, compared with the fixed anode target source, the structure of these two kinds of sources is more complex, so the intensity stability is poor. During the measurement process, the intensity stability of the X-ray source is a key factor to ensure the accuracy and consistency of the measurement results. Therefore, how to monitor and control the X-ray source has become a technical problem to be solved in the industry. SUMMARY

[0004] The technical problem solved by the present application is to provide an X-ray scattering measurement equipment, a monitoring method and a medium, which can realize real-time monitoring and adjustment of the X-ray source.

[0005] According to a first aspect, an embodiment provides an X-ray scattering measurement equipment, comprising:

[0006] an X-ray source for emitting X-rays;

[0007] a vacuum collimation system arranged on the X-ray emission path of the X-ray source, the vacuum collimation system comprising a first slit; when the X-rays emitted by the X-ray source irradiate the first slit, the part of the X-rays passing through the first slit forms a measurement X-ray beam, and the part of the X-rays blocked by the first slit forms a first scattered X-ray; the measurement X-ray beam is used to irradiate a sample to be measured;

[0008] A detection system is configured to receive second scattered X-rays formed after the measurement X-ray beam passes through the sample to be measured, and output measurement information of a topography of the sample to be measured.

[0009] A monitoring detector is arranged in an optical path of the first scattered X-rays, and configured to detect the first scattered X-rays and output intensity information of the first scattered X-rays.

[0010] A monitoring adjustment system is connected to the X-ray source and the monitoring detector, respectively, and configured to process the intensity information to obtain intensity monitoring data of the X-rays, and monitor the X-ray source according to the intensity monitoring data.

[0011] In an embodiment, a plurality of monitoring detectors are arranged around a center line of an opening of the first slit and are arranged at intervals on a side of the first slit close to the X-ray source.

[0012] In an embodiment, the first slit includes a plurality of slit pieces, and the plurality of slit pieces jointly define the opening of the first slit. The plurality of monitoring detectors correspond to the plurality of slit pieces one by one, so that each monitoring detector can detect the first scattered X-rays blocked by the corresponding slit piece.

[0013] In an embodiment, the monitoring detector detects a photon number of the first scattered X-rays, and determines the intensity information by using the photon number. The monitoring adjustment system processes the intensity information to obtain the intensity monitoring data.

[0014] In an embodiment, the monitoring adjustment system compares the intensity monitoring data with a first preset intensity threshold. When the intensity monitoring data is greater than the first preset intensity threshold, the monitoring adjustment system determines that the intensity stability of the X-ray source is abnormal.

[0015] In an embodiment, the monitoring adjustment system further compares the intensity monitoring data with a second preset intensity threshold, and the second preset intensity threshold is less than the first preset intensity threshold.

[0016] When the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring adjustment system performs at least one of the following operations: outputs instruction information for adjusting an output power of the X-ray source, outputs instruction information for adjusting an environmental parameter of an environment in which the X-ray source is located, and outputs instruction information for adjusting a spatial position of the X-ray source.

[0017] In a case where the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjusting system at least one of: outputting instruction information for suspending the X-ray source from emitting X-rays, outputting an abnormality alarm.

[0018] In one embodiment, the X-ray scattering measurement device further comprises a first displacement stage system and / or an environment control system; wherein:

[0019] The X-ray source is arranged on the first displacement stage system; the displacement stage system is connected to the monitoring and adjusting system, so as to adjust the spatial position of the X-ray source according to the instruction information output by the monitoring and adjusting system.

[0020] The environment control system is used for monitoring and adjusting the environmental parameters of the environment in which the X-ray source is located; the environment control system is connected to the monitoring and adjusting system, so as to output the monitored environmental parameters to the monitoring and adjusting system, and adjust the environmental parameters according to the instruction information output by the monitoring and adjusting system.

[0021] According to a second aspect, one embodiment provides a monitoring method of an X-ray scattering measurement device, comprising:

[0022] Controlling the X-ray source to emit X-rays;

[0023] Obtaining intensity information of first scattered X-rays by monitoring the first scattered X-rays blocked by a first slit of a vacuum collimation system;

[0024] Processing the intensity information by a monitoring and adjusting system connected to the X-ray source and the monitoring detector respectively, obtaining intensity monitoring data of the X-rays, and monitoring the X-ray source according to the intensity monitoring data.

[0025] In one embodiment, the monitoring the X-ray source according to the intensity monitoring data comprises:

[0026] Comparing the intensity monitoring data with a first preset intensity threshold, and determining that the intensity stability of the X-ray source is abnormal if the intensity monitoring data is greater than the first preset intensity threshold.

[0027] In one embodiment, the monitoring the X-ray source according to the intensity monitoring data further comprises: comparing the intensity monitoring data with a second preset intensity threshold, the second preset intensity threshold being greater than the first preset intensity threshold.

[0028] If the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the following steps are performed:

[0029] determining whether an environmental parameter of an environment in which the X-ray source is located deviates from a preset environmental reference value;

[0030] if the environmental parameter deviates from the preset environmental reference value, outputting instruction information for adjusting the environmental parameter, and after the environmental parameter is adjusted to the preset environmental reference value, comparing intensity monitoring data obtained after the adjustment with the first preset intensity threshold and the second preset intensity threshold to generate an abnormality monitoring and adjustment report;

[0031] if the environmental parameter does not deviate from the preset environmental reference value, determining whether intensity information output by a plurality of monitoring detectors changes synchronously;

[0032] if the intensity information obtained by the plurality of monitoring detectors changes synchronously, outputting instruction information for adjusting output power of the X-ray source until intensity monitoring data obtained after the output power of the X-ray source is adjusted is less than or equal to the first preset intensity threshold, and generating an abnormality monitoring and adjustment report;

[0033] if the intensity information obtained by the plurality of monitoring detectors does not change synchronously, outputting instruction information for adjusting a spatial position of the X-ray source, and after the intensity information obtained by each of the monitoring detectors returns to a preset intensity reference value, comparing intensity monitoring data obtained after the position of the X-ray source is adjusted with the first preset intensity threshold and the second preset intensity threshold to generate an abnormality monitoring and adjustment report;

[0034] if the intensity monitoring data is greater than or equal to the second preset intensity threshold, outputting instruction information for suspending X-ray emission of the X-ray source and / or outputting an abnormality alarm.

[0035] In one embodiment, the intensity information of the first scattered X-rays is obtained by monitoring detectors detecting the first scattered X-rays blocked by a first slit of a vacuum collimation system, including: a plurality of monitoring detectors arranged at intervals around an opening center line of the first slit detecting photon numbers of corresponding first scattered X-rays.

[0036] Each of the monitoring detectors obtains the intensity information including the photon numbers.

[0037] According to a third aspect, one embodiment provides a computer readable storage medium, on which a computer program is stored, the computer program being executable by a processor to implement the monitoring method of the first aspect.

[0038] The X-ray scattering measurement device according to the above embodiment comprises an X-ray source, a monitoring detector, a monitoring adjustment system and a vacuum collimation system, the vacuum collimation system comprises a first slit; when the X-rays emitted by the X-ray source irradiate the first slit, the part of the X-rays blocked by the first slit forms first scattered X-rays; the monitoring detector is used for detecting the first scattered X-rays and outputting intensity information; the monitoring adjustment system processes the intensity information to obtain intensity monitoring data of the X-rays, and monitors the X-ray source according to the intensity monitoring data. Since the first scattered X-rays belong to useless X-rays blocked by the vacuum collimation system and cannot participate in measurement, the useless X-rays in the measurement light path are used as monitoring objects, so that the X-ray source can be monitored in real time without interrupting the measurement process; at the same time, the state of the X-ray source can be judged according to the real-time monitoring result, the cause of abnormal measurement result can be automatically identified and countermeasures can be taken, so as to ensure the intensity stability of the X-ray source. BRIEF DESCRIPTION OF DRAWINGS

[0039] Figure 1 The figure is a schematic diagram of the system structure of the X-ray scattering measurement device of an embodiment.

[0040] Figure 2 The figure is a schematic diagram of the system structure of the X-ray scattering measurement device in the embodiment. Figure 1

[0041] Figure 3 The figure is a schematic diagram of the arrangement principle of the monitoring detector in the X-ray scattering measurement device of an embodiment.

[0042] Figure 4 The figure is a schematic diagram of the formation principle of the first scattered X-rays in the X-ray scattering measurement device of an embodiment.

[0043] Figure 5 The figure is a schematic diagram of the structure of the first slit in the X-ray scattering measurement device of an embodiment.

[0044] Figure 6 The figure is a schematic diagram of the flow principle of the monitoring method of an embodiment.

[0045] Figure 7 The figure is a schematic diagram of the flow principle of the monitoring step in the monitoring method of an embodiment.

[0046] Figure 8 The figure is a logic flow chart of the monitoring step in the monitoring method of an embodiment.

[0047] In the figure:

[0048] ​10 x-ray source; 20 vacuum collimation system; 21 first slit; 21a slit piece; 22 second slit; 23 third slit; 30 second displacement stage system; 40 detection system; 41 vacuum scatter system; 42 x-ray detector; 50 monitoring detector; 60 monitoring adjustment system; 70 first displacement stage system; 80 environment control system; L1 measuring x-ray beam; L2 first scattered x-ray. DETAILED DESCRIPTION

[0049] The application will be further described below in connection with specific embodiments with reference to the drawings. Like numbers in different figures refer to like elements. In the following description, numerous specific details are described to provide a thorough understanding of the application. However, one of ordinary skill in the art will recognize that the application can be practiced without one or more of the specific details. In other instances, well-known structures and devices are shown in block diagram form. In some instances, operations are not shown or described in detail in order to avoid obscuring the application. Also, the description just describes some of the features, operations or characteristics, which can be combined in any appropriate manner in various embodiments. Also, the order of steps or acts in the methods described can be changed in any appropriate manner, which is apparent to those skilled in the art. Therefore, the description and drawings are to be regarded as illustrative in nature and not as restrictive.

[0050] In addition, the features, operations or characteristics described in the specification can be combined in any appropriate manner in various embodiments. Also, the order of steps or acts in the methods described can be changed in any appropriate manner, which is apparent to those skilled in the art. Therefore, the description and drawings are to be regarded as illustrative in nature and not as restrictive.

[0051] In this document, the terms "first", "second", etc. are used only to distinguish one object from another, and do not necessarily have any temporal or technical meaning. The terms "connect", "couple" and the like, unless otherwise specified, include both direct and indirect connections (couplings).

[0052] Currently, the monitoring means for the x-ray source of the CD-SAXS (critical dimension small angle x-ray scattering) measurement equipment is mainly periodic sampling detection, that is, periodically inserting an x-ray detector in the main light path of the x-ray measurement during the use of the equipment, judging the state of the x-ray source by detecting the change of the light intensity of the x-ray relative to the previous value, and taking corresponding measures according to the state of the x-ray source, such as adjusting the output power of the x-ray source, recalibrating the light intensity of the detection system and the algorithm analysis system, etc.

[0053] However, this monitoring means has the following disadvantages:

[0054] 1. The measurement process of the measurement equipment needs to be interrupted, which greatly reduces the measurement throughput of the equipment and causes loss of X-ray intensity of the measurement main light path;

[0055] 2. Since it is a periodic sampling detection, the abnormality of the X-ray source cannot be found in time. Although it is possible to find the abnormality of the X-ray source through the change of the final measurement result, since the measurement result is mainly related to the shape of the sample itself, the cause of the abnormal measurement result cannot be directly located to the X-ray source in the first time, making it difficult to analyze the root cause of the abnormal measurement result;

[0056] 3. Since the abnormality of the X-ray source cannot be found in the first time, the reliability of a part of the measurement data before the abnormality is found is also reduced;

[0057] 4. Since the cause and effect analysis cannot be decoupled from the measurement result of the sample shape, it is difficult to automatically analyze and process the abnormal measurement result, which greatly increases the cost of daily operation and maintenance of the measurement equipment.

[0058] 5. Since the X-ray source usually needs to be installed on a multi-degree-of-freedom electric displacement table, the vibration generated by the electric displacement table is also a factor that causes abnormal measurement results or unstable X-ray sources, but the existing monitoring means cannot monitor these influencing factors, which further increases the difficulty of root cause analysis of abnormal measurement results.

[0059] Please refer to Figures 1 to 5 The embodiment of the present application provides an X-ray scattering measurement equipment (hereinafter referred to as measurement equipment), which can be used for measuring the critical dimension of a nano-etching structure in a semiconductor device; the measurement equipment comprises an X-ray source 10, a vacuum collimation system 20, a second displacement table system 30, a detection system 40, a monitoring detector 50, a monitoring adjustment system 60 and other functional components as needed; the measurement equipment can realize real-time monitoring and automatic adjustment of the X-ray source 10 by monitoring the useless X-rays in the light path of the measurement equipment through the cooperation of the monitoring detector 50 and the monitoring adjustment system 60; the following will be specifically explained.

[0060] Please refer to Figure 1The X-ray source 10 is mainly configured to generate and emit X-rays (e.g., a point-dispersed X-ray beam). In some embodiments, the X-ray source 10 can also be embodied as an X-ray light source, such as a liquid metal target X-ray light source, a rotating anode target X-ray light source, etc. In other embodiments, the X-ray source 10 can also be a combination of an X-ray light source and a collimating monochromator (e.g., a Montel monochromator with a multi-layer film structure), which receives the X-rays emitted by the X-ray light source and converts the received X-rays (e.g., a point-dispersed polychromatic X-ray beam) into a quasi-monochromatic and quasi-parallel X-ray beam for output, thereby achieving the function of the X-ray source 10 to emit an X-ray beam.

[0061] Referring to Figure 1 The vacuum collimating system 20 is disposed on the X-ray emission path of the X-ray source 10. The vacuum collimating system 20 includes one or more slits, which can be used to limit the opening angle of the X-ray beam, block stray light, improve energy resolution, etc. so that the vacuum collimating system 20 can further collimate the X-ray beam output by the X-ray source 10 and achieve precise control of the X-ray beam spot size to finally project the X-rays onto the sample to be measured.

[0062] Exemplarily, referring to Figure 1 The vacuum collimating system 20 includes a first slit 21, a third slit 23, and a second slit 22 located between the first slit 21 and the third slit 23. The first slit 21 is located at one end of the vacuum collimating system 20 close to the X-ray source 10. That is, in some embodiments, the first slit 21 can be understood as the entrance slit of the vacuum collimating system 20, and the third slit 23 can be understood as the exit slit of the vacuum collimating system 20. The first slit 21, the second slit 22, the third slit 23, and the optical paths therebetween can be in a vacuum environment to reduce the attenuation of the X-ray beam caused by air during transmission.

[0063] Referring to Figure 3 When the X-rays emitted by the X-ray source 10 irradiate the first slit 21, part of the X-rays will pass through the opening of the first slit 21. After being processed by the vacuum collimating system 20 (e.g., processed by the second slit 22 and the third slit 23), this part of the X-rays will be guided by the vacuum collimating system 20 to project onto the sample to be measured to participate in the measurement. Another part of the X-rays will be blocked by the first slit 21 and cannot participate in the measurement. For ease of distinction and description, the part of the X-rays passing through the first slit 21 is defined as the measurement X-ray beam L1, and the part of the X-rays blocked by the first slit 21 (e.g., X-rays scattered due to being blocked by the first slit 21) is defined as the first scattered X-rays L2. It can be understood that the measurement X-ray beam L1 is the X-ray beam used to irradiate the sample to be measured and participate in the measurement.

[0064] Please refer to Figure 1 , the second displacement stage system 30 is arranged between the vacuum collimation system 20 and the detection system 40; wherein, the second displacement stage system 30 can have multiple degrees of freedom of motion (for example, including degrees of freedom of movement along X, Y, Z three axes and degrees of freedom of rotation around X, Y, Z three axes), mainly used for carrying the sample to be measured, so as to realize the adjustment of the angle position of the sample to be measured relative to the optical axis and the scanning control while realizing the accurate positioning of any point on the sample to be measured.

[0065] The detection system 40 is mainly used for receiving the scattered X-rays (for example, the X-rays scattered by the periodic nanolithography structure in the semiconductor device) after the measurement X-ray beam L1 transmits through the sample to be measured; for the convenience of distinction, the scattered X-rays generated by the sample to be measured are defined as the second scattered X-rays, and by detecting the intensity and angular distribution information of the second scattered X-rays, the measurement information of the topography of the sample to be measured (for example, the three-dimensional topography of the periodic nanolithography structure in the semiconductor device) can be output.

[0066] Exemplarily, please refer to Figure 1 , the detection system 40 includes a vacuum scattering system 41 and an X-ray detector 42; wherein, the vacuum scattering system 41 can include a high vacuum cavity structure, which is used to provide a vacuum transmission environment for the second scattered X-rays generated by the sample to be measured during the transmission to the X-ray detector 42, so as to reduce the attenuation of the second scattered X-rays caused by air during the transmission; and the X-ray detector is used to detect the intensity and angular distribution information of the second scattered X-rays, so as to output the measurement information of the topography of the sample to be measured.

[0067] Please refer to Figures 1 to 3 , the monitoring detector 50 is arranged on the optical path of the first scattered X-rays L2, for example, in the direction of the optical path of the measurement X-ray beam L1, the monitoring detector 50 is arranged on the side of the first slit 21 close to the X-ray source 10; the monitoring detector 50 is mainly used for detecting the first scattered X-rays L2 and outputting the intensity information of the first scattered X-rays L2.

[0068] Exemplarily, the monitoring detector 50 includes a photon counter, the photon number of the first scattered X-rays L2 is detected by the monitoring detector 50, and the intensity information of the first scattered X-rays L2 is determined by using the photon number.

[0069] Of course, the monitoring detector 50 can also adopt other types of X-ray signal detection devices, for example, the monitoring detector 50 can output the light intensity as the intensity information by detecting the light intensity of the first scattered X-rays L2.

[0070] Please refer to Figure 1 and Figure 2The monitoring and adjusting system 60 is connected with the X-ray source 10 and the monitoring detector 50 respectively, and can be understood as a device or system composed of a controller, a processor and related functional devices, and having functions of data analysis and processing. The monitoring and adjusting system 60 is mainly used for receiving and processing the intensity information output by the monitoring detector 50 to obtain intensity monitoring data of the X-ray, and monitoring the X-ray source 10 according to the intensity monitoring data.

[0071] For example, the monitoring and adjusting system 60 can compare the intensity monitoring data with a preset intensity threshold, and determine whether the intensity stability of the X-ray source 10 is normal according to the comparison result.

[0072] If the monitoring and adjusting system 60 determines that the intensity stability of the X-ray source 10 is normal, the monitoring and adjusting system 60 can only generate a monitoring record report in the form of a document, so that the measurement process of the measurement equipment can be carried out normally and continuously.

[0073] If the monitoring and adjusting system 60 determines that the intensity stability of the X-ray source 10 is abnormal, the monitoring and adjusting system 60 outputs instruction information for adjusting the X-ray source 10 (such as outputting instruction information to the control system of the measurement equipment), so that the measurement equipment can automatically and autonomously adjust the output power of the X-ray source 10, adjust the environmental parameters of the environment where the X-ray source 10 is located, adjust the spatial position of the X-ray source 10, pause the emission of X-ray by the X-ray source 10, pause the measurement process, generate an abnormal monitoring report in the form of a document, output an abnormal alarm, generate an abnormal monitoring and adjusting report in the form of a document, and the like.

[0074] It should be noted that the description of the "control system of the measurement equipment" is introduced herein only for understanding the role of the monitoring and adjusting system 60 in the measurement equipment, and the control system can be understood as a collection of related devices for regulating and managing related functional devices and functional systems in the measurement equipment. The control system can support the implementation of all or part of the functions of the measurement equipment.

[0075] That is, in some embodiments, the monitoring and adjusting system 60 can be a functional system that is independently arranged with respect to the control system of the metrology apparatus, and the monitoring and adjusting system 60 cooperates with the control system of the metrology apparatus to analyze and process the intensity information output by the monitoring detector 50, and then sends corresponding instruction information to the control system of the metrology apparatus according to the obtained intensity monitoring data, so as to prompt the control system of the metrology apparatus to perform corresponding regulation and control on the X-ray source 10 and the like. In other embodiments, the monitoring and adjusting system 60 can be a part of the control system of the metrology apparatus or the control system of the metrology apparatus has the functions of the monitoring and adjusting system 60, so that the monitoring and adjusting system 60 can directly regulate and control the X-ray source 10 and the like according to the intensity monitoring data.

[0076] Thus, based on the cooperation of the monitoring detector 50 and the monitoring and adjusting system 60, a monitoring system that is relatively independent of the main system of the metrology apparatus can be combined and built in the system structure architecture of the metrology apparatus, and the X-rays (i.e., the first scattered X-rays L2) that are not used in the optical path of the metrology apparatus are used as real-time monitoring objects, and the real-time monitoring and automatic regulation of the X-ray source 10 can be realized by analyzing and processing the intensity information of the first scattered X-rays L2.

[0077] Firstly, the metrology apparatus can simultaneously perform the metrology and monitoring processes during use, i.e., the metrology process and the monitoring process are performed in parallel, so that no loss is caused to the metrology flux (or the metrology X-ray beam L1) of the metrology apparatus, and the metrology efficiency of the metrology apparatus is effectively ensured.

[0078] Secondly, the intensity stability of the X-ray source 10 can be judged in real time during the monitoring process, and corresponding measures can be automatically taken in response to relatively common abnormal monitoring results, such as adjusting the output power of the X-ray source 10 and the like, so that the frequency of manual intervention in processing abnormalities during equipment maintenance is effectively reduced, and the downtime of the metrology apparatus and the labor cost of daily operation and maintenance of the equipment are reduced.

[0079] Thirdly, based on the monitoring results, the abnormality of the metrology results can be located to the X-ray source 10 in the first time, and support can be provided for automatically analyzing, processing and judging the root cause relationship between the abnormal metrology results and the abnormal state of the X-ray source 10, so that the accuracy and consistency of the metrology results can be effectively improved.

[0080] Fourthly, the first scattered X-rays L2 blocked by the first slit 21 are detected by the monitoring detector 50, so that the accuracy of the monitoring results can be ensured, and the structural stability of the X-ray source 10 can be monitored in real time, so that other factors that affect the intensity stability of the X-ray source 10 can be included in the range of real-time monitoring, and the X-ray source 10 can be more accurately and automatically regulated.

[0081] In some embodiments, referring to Figures 1 to 3 , the number of monitoring detectors 50 is set to multiple, and the multiple monitoring detectors 50 are arranged at intervals around the center line of the opening of the first slit 21 on the side of the first slit 21 close to the X-ray source 10; for example, two monitoring detectors 50 are arranged symmetrically about the center line of the opening of the first slit 21.

[0082] Considering that the optical axis of the X-ray beam (for example, the X-ray beam output from the collimating monochromator) incident on the vacuum collimating system 20 can deviate from the center line of the opening of the first slit 21, which can cause uneven scattering of a portion of the X-ray beam due to the blocking of the first slit 21, for example Figure 4 As shown, the signal intensity of the first scattered X-ray L2 formed on the upper side of the first slit 21 is strong, and the signal intensity of the first scattered X-ray L2 formed on the lower side of the first slit 21 is weak; therefore, by setting at least two monitoring detectors 50, effective detection of the first scattered X-ray L2 can be achieved, the signal intensity and signal-to-noise ratio received by the monitoring and adjusting system 60 can be improved, and more accurate intensity monitoring data can be obtained.

[0083] In some embodiments, referring to Figure 5 , the first slit 21 adopts a four-blade slit structure, which includes four slit blades 21a with knife edges, and the knife edges of the four slit blades 21a jointly define the opening of the first slit 21; specifically, the four slit blades 21a can be divided into two groups, two slit blades 21a in one group are vertically opposite and the knife edges are arranged in parallel, and two slit blades 21a in the other group are horizontally opposite and the knife edges are arranged in parallel, and each slit blade 21a can be driven by a linear driving device; in this way, by driving the four slit blades 21a to move, the size and shape of the opening of the first slit 21 can be defined by the knife edges of the four slit blades 21a, so as to constrain the X-rays irradiating the first slit 21 in both horizontal and vertical directions, and further form the measurement X-ray beam L1 and the first scattered X-ray L2.

[0084] Correspondingly, the number of monitoring detectors 50 can be set to four, and the four monitoring detectors 50 correspond to the four slit blades 21a one by one, so that each monitoring detector 50 can detect the first scattered X-ray L2 blocked by the corresponding slit blade 21a, thereby ensuring the signal intensity of the intensity information received by the monitoring and adjusting system.

[0085] Of course, the first slit 21 can also adopt a slit structure with other number of blades, and in this case, the number of monitoring detectors 50 can be configured according to the number of slit blades 21a or knife edges of the first slit 21.

[0086] As described above, in some embodiments, the monitoring detector 50 is configured to detect the number of photons of the first scattered X-rays L2, and the intensity information is determined based on the number of photons; in the case where a plurality of monitoring detectors 50 are provided, the monitoring and adjusting system 60 processes the intensity information obtained by each monitoring detector 50, thereby obtaining the intensity monitoring data; for example, the monitoring and adjusting system 60 can perform summation processing on the number of photons detected by the plurality of monitoring detectors 50, and the summation result of the number of photons (i.e., the sum of the number of photons detected by the plurality of monitoring detectors 50) is used as the intensity monitoring data to monitor the X-ray source 10.

[0087] By counting the photons of the first scattered X-rays L2 by the plurality of monitoring detectors 50, and processing the intensity information obtained by each monitoring detector 50 by the monitoring and adjusting system 60 (for example, performing summation processing on the number of photons detected by each monitoring detector 50), the signal intensity of the signal received by the monitoring and adjusting system 60 can be ensured, and the accuracy of the intensity monitoring data obtained by the monitoring and adjusting system 60 can be improved, thereby providing strong support for accurately adjusting the X-ray source 10; at the same time, by counting the photons of the first scattered X-rays L2, the performance of the X-ray source 10 can be more directly determined, and the accuracy of the obtained intensity monitoring data can be ensured.

[0088] In some embodiments, referring to Figure 1 and Figure 2 , the metrology apparatus further comprises a first displacement stage system 70, which can have a plurality of degrees of freedom of motion, for example, including degrees of freedom of motion along the X, Y, Z three axes and degrees of freedom of rotation around the X, Y, Z three axes, etc.; the first displacement stage system 70 is mainly used to carry the X-ray source 10, and it can also be understood that the X-ray source 10 is mounted on the first displacement stage system 70. By the first displacement stage system 70, the spatial position of the X-ray source 10 relative to the vacuum collimation system 60 can be adjusted to achieve optical path alignment adjustment.

[0089] The monitoring and adjusting system 60 is connected with the first displacement stage system 70, so that the first displacement stage system 70 can adjust the position of the X-ray source 10 relative to the vacuum collimation system 60 according to the instruction information output by the monitoring and adjusting system 60; in this way, by monitoring and adjusting the first displacement stage system 70, real-time monitoring and adjustment of unstable factors such as vibration of the X-ray source 10 can be achieved.

[0090] It should be noted that the spatial position of the X-ray source 10 described herein refers to the relative spatial position of the X-ray source 10 and the vacuum collimation system 20 (specifically, the first slit 21).

[0091] In some embodiments, referring to Figure 1 and Figure 2The metrology apparatus further comprises an environment control system 80 connected with the monitoring and adjusting system 60, which is configured to monitor and adjust the environmental parameters (e.g. temperature of the environment inside and outside the X-ray source 10) of the environment where the X-ray source 10 is located, so as to ensure the stability of the X-ray source 10. Accordingly, the monitoring and adjusting system 60 can receive the environmental parameters monitored by the environment control system 80, so that when the environmental parameters change, the monitoring and adjusting system 60 can directly or indirectly send the instruction information for adjusting the environmental parameters of the X-ray source 10 to the environment control system 80 according to the intensity monitoring data, so as to realize the adjusting operation of the environmental parameters of the X-ray source 10.

[0092] As described above, in some embodiments, the monitoring and adjusting system 60 can compare the intensity monitoring data with the preset intensity threshold, and determine whether the intensity stability of the X-ray source 10 is normal according to the comparison result.

[0093] Specifically, the preset intensity threshold can comprise a first preset intensity threshold and a second preset intensity threshold, and the first preset intensity threshold is smaller than the second preset intensity threshold; in the case that the intensity monitoring data (total number of photons monitored in real time, or the change amplitude of the total number of photons within a preset time period, etc.) is less than or equal to the first preset intensity threshold, the monitoring and adjusting system 60 determines that the intensity stability of the X-ray source 10 is normal; and in the case that the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjusting system 60 determines that the intensity stability of the X-ray source 10 is abnormal.

[0094] In the case that the intensity stability of the X-ray source 10 is determined to be normal, the monitoring and adjusting system 60 can only generate the monitoring record report in the form of a document, so as to avoid affecting the measurement process of the metrology apparatus.

[0095] In the case that the intensity stability of the X-ray source 10 is determined to be abnormal and the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjusting system 60 can output the instruction information for suspending the measurement process and / or suspending the X-ray emission of the X-ray source 10, and can simultaneously output the abnormal alarm or generate the abnormal monitoring report, etc., so as to enable the device engineer to manually intervene in the adjusting and maintaining operation of the metrology apparatus.

[0096] In the case that the intensity stability of the X-ray source 10 is determined to be abnormal and the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjusting system 60 outputs instruction information for adjusting the X-ray source 10, which can include instruction information for pausing the measurement process, instruction information for controlling the environmental control system 80 to adjust the environmental parameters of the environment in which the X-ray source 10 is located, instruction information for adjusting the output power of the X-ray source 10, instruction information for controlling the second displacement table system 90 to adjust the position of the X-ray source 10, and generating an abnormal monitoring and adjusting report, etc., so that the measurement device can automatically adjust the X-ray source 10 to continue the measurement process after the intensity stability of the X-ray source 10 returns to normal.

[0097] In other embodiments, the measurement device can be given different functional modes according to actual needs and based on the cooperation between the monitoring and adjusting system 60 and the monitoring detector 50.

[0098] For example, the preset intensity threshold is the first preset intensity threshold. In the case that the intensity monitoring data is less than or equal to the first preset intensity threshold, the monitoring and adjusting system 60 determines that the intensity stability of the X-ray source 10 is normal and generates a monitoring record report. In the case that the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjusting system 60 determines that the intensity stability of the X-ray source 10 is abnormal, at which time the monitoring and adjusting system 60 can output instruction information for pausing the measurement process and the emission of the X-ray source 10, and can simultaneously output an abnormal alarm and generate an abnormal monitoring report, etc., so as to allow a device engineer to directly intervene.

[0099] For example, the preset intensity threshold is the first preset intensity threshold. In the case that the intensity monitoring data is less than or equal to the first preset intensity threshold, the monitoring and adjusting system 60 determines that the intensity stability of the X-ray source 10 is normal and generates a monitoring record report. In the case that the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjusting system 60 determines that the intensity stability of the X-ray source 10 is abnormal, at which time the monitoring and adjusting system 60 can output instruction information for pausing the measurement process and the emission of the X-ray source 10, and can simultaneously output an abnormal alarm and generate an abnormal monitoring report, etc., so as to allow a device engineer to directly intervene.

[0100] It should be noted that the preset intensity threshold, the first preset intensity threshold, and the second preset intensity threshold, etc. described herein can be determined according to actual needs. These intensity thresholds can be specific data values (e.g., photon number values) or data value ranges.

[0101] It should be noted that, Figure 1 and Figure 2The bold solid line in the figure indicates the connection relationship between the relevant functional components, the bold dashed line indicates the measurement main beam or the measurement light path of the measurement apparatus, Figure 4 The dotted line in the figure indicates the opening center line of the first slit 21, and the dashed line indicates the optical axis of the X-ray beam irradiating the first slit 21.

[0102] Please refer to Figures 6 to 8 and in combination with Figures 1 to 5 The embodiments of the present application also provide a monitoring method of an X-ray scattering measurement apparatus, which can realize real-time monitoring and adjustment of the X-ray scattering measurement apparatus of the foregoing embodiments; please refer to Figure 6 The monitoring method comprises steps 100 to 300, which are described below.

[0103] Step 100: Control the X-ray source 10 to emit X-rays.

[0104] Specifically, by controlling the X-ray source 10 to emit X-rays, the measurement apparatus is converted to a use state (for example, a state of executing a measurement process), when the X-rays emitted by the X-ray source 10 irradiate the first slit 21, the part of the X-rays passing through the first slit 21 forms a measurement X-ray beam L1, and the part blocked by the first slit 21 forms a first scattered X-ray L2; wherein the measurement X-ray beam L1 will eventually irradiate a sample to be measured carried by the second displacement stage system 30; and the detection system 40 receives the scattered X-rays (i.e. second scattered X-rays) generated by the sample to be measured, thereby outputting measurement information of the topography of the sample to be measured.

[0105] Step 200: Detect the first scattered X-ray L2 to obtain intensity information of the first scattered X-ray L2.

[0106] Exemplarily, please refer to Figure 2 and Figure 3 By means of the monitoring detector 50 arranged on the light path of the first scattered X-ray L2, the number of photons of the first scattered X-ray L2 is detected, and the intensity information of the first scattered X-ray L2 is determined and obtained by means of the number of photons.

[0107] Step 300: Process the intensity information of the first scattered X-ray L2 to obtain intensity monitoring data about the X-rays, and monitor the X-ray source 10 according to the intensity monitoring data.

[0108] Specifically, please refer to Figure 2 By means of the monitoring and adjusting system 60 connected with the X-ray source 10 and the monitoring detector 50 respectively, the intensity information output by the monitoring detector 50 is received and processed to obtain the intensity monitoring data, and the X-ray source 10 is monitored according to the intensity monitoring data.

[0109] In some embodiments, please refer to Figure 2 and Figure 3The plurality of monitoring detectors 50 are arranged around the opening center line of the first slit 21, and the intensity monitoring data is obtained by detecting the number of photons corresponding to the first scattered X-rays L2 through the monitoring detectors 50 and summing the number of photons output by each monitoring detector 50 through the monitoring adjustment system 60.

[0110] Thus, the first scattered X-rays L2 in the measurement light path of the measurement device are taken as the monitoring object, the intensity monitoring data of the X-rays is obtained based on the intensity information of the first scattered X-rays L2, and the X-ray source 10 is monitored according to the intensity monitoring data; the X-ray source 10 can be monitored in real time synchronously without affecting the measurement process of the measurement device; this not only does not cause loss of the measurement flux of the measurement device, but also can judge the state of the X-ray source 10 in real time according to the intensity monitoring data, so that corresponding measures can be taken automatically according to the more common abnormal monitoring results without the manual intervention of the equipment engineer, thereby effectively reducing the labor cost of the daily operation of the measurement device and ensuring the accuracy of the measurement results.

[0111] As described above, the step 300 mainly includes the steps of processing the intensity information of the first scattered X-rays L2 to obtain the intensity monitoring data of the X-rays, and monitoring the X-ray source 10 according to the intensity monitoring data. In some embodiments, please refer to 7 and Figure 8 The step of monitoring the X-ray source 10 according to the intensity monitoring data includes steps 310 to 330.

[0112] Step 310, compare the intensity monitoring data with the preset intensity threshold, and determine whether the intensity stability of the X-ray source 10 is normal according to the comparison result.

[0113] Specifically, when the intensity monitoring data (for example, the total number of photons obtained by the monitoring adjustment system 60 by summing the number of photons detected and output by each monitoring detector 50) is less than or equal to the preset intensity threshold, the monitoring adjustment system 60 determines that the intensity stability of the X-ray source 10 is normal; when the intensity monitoring data is greater than the preset intensity threshold, the monitoring adjustment system 60 determines that the intensity stability of the X-ray source 10 is abnormal.

[0114] The preset intensity threshold can be determined according to the state (for example, the intensity stability state) of the X-ray source 10 required when the measurement device normally performs the measurement process; the preset intensity threshold can be a specific data value (for example, a photon number value), or a data value range.

[0115] Step 320, if the intensity stability of the X-ray source 10 is normal, a monitoring record report is generated.

[0116] Specifically, in the case that the intensity stability of the X-ray source 10 is normal, if the metrology apparatus is in the state of executing the metrology process, the monitoring and adjusting system 60 can only generate the monitoring record report without interrupting the metrology process; if the metrology apparatus is in the state of suspending the metrology process, the monitoring and adjusting system 60 can output the instruction information for controlling the metrology apparatus to continue the metrology process and generate the monitoring record report.

[0117] Step 330, if the intensity stability of the X-ray source 10 is abnormal, the metrology process is suspended.

[0118] In some embodiments, referring to Figure 8 , the preset intensity threshold includes a first preset intensity threshold and a second preset intensity threshold, the first preset intensity threshold is smaller than the second preset intensity threshold; the intensity stability of the X-ray source 10 is determined to be normal when the intensity monitoring data is less than or equal to the first preset intensity threshold, and the intensity stability of the X-ray source 10 is determined to be abnormal when the intensity monitoring data is greater than the first preset intensity threshold (i.e. the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, or the intensity monitoring data is greater than or equal to the second preset intensity threshold).

[0119] In the case that the intensity stability of the X-ray source 10 is abnormal, if the intensity monitoring data is greater than the second preset intensity threshold, the monitoring and adjusting system 60 can output the instruction information for suspending the metrology process, output the instruction information for suspending the emission of X-rays by the X-ray source 10, output the abnormal alarm, generate the abnormal monitoring report, and the like, so as to manually intervene by the equipment engineer.

[0120] In the case that the intensity stability of the X-ray source 10 is abnormal, if the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjusting system 60 can output the instruction information for suspending the metrology process, output the instruction information for adjusting the output power of the X-ray source 10, output the instruction information for adjusting the environmental parameter of the X-ray source 10, output the instruction information for adjusting the spatial position of the X-ray source 10, generate the abnormal monitoring and adjusting report, and the like, so as to realize the automatic and autonomous adjustment of the metrology apparatus.

[0121] In other embodiments, the preset intensity threshold is a single preset threshold, for example, the preset intensity threshold is the first preset intensity threshold; the intensity stability of the X-ray source 10 is determined to be normal when the intensity monitoring data is less than or equal to the first preset intensity threshold; and the intensity stability of the X-ray source 10 is determined to be abnormal when the intensity monitoring data is greater than the first preset intensity threshold.

[0122] In the case of determining the intensity stability abnormality of the X-ray source 10, the monitoring and adjusting system 60 can only output instruction information for pausing the measurement process, output instruction information for pausing the X-ray source 10 from emitting X-rays, output an abnormality alarm, generate an abnormality monitoring report, and the like. The monitoring and adjusting system 60 can also only output instruction information for pausing the measurement process, output instruction information for adjusting the output power of the X-ray source 10, output instruction information for adjusting the environmental parameter of the X-ray source 10, output instruction information for adjusting the position of the X-ray source 10, generate an abnormality monitoring and adjusting report, and the like.

[0123] In some embodiments, referring to Figure 8 In the case of the intensity stability abnormality of the X-ray source 10, and the need for pausing the measurement process, adjusting the X-ray source 10, and the like, the steps of the adjusting operation can specifically include steps 331 to 335.

[0124] In step 331, the measurement process is paused, and it is determined whether the environmental parameter of the environment in which the X-ray source 10 is located deviates from a preset environmental reference value.

[0125] Specifically, the monitoring and adjusting system 60 can compare the environmental parameter monitored by the environmental control system 80 with the preset environmental reference value to determine whether the environmental parameter of the environment in which the X-ray source 10 is located changes relative to the preset environmental reference value, by using the environmental parameter monitored by the environmental control system 80. The preset environmental reference value can be understood as the environmental condition (for example, the internal and external environmental temperature of the X-ray source 10) required to be provided for the X-ray source 10 when the measurement equipment normally executes the measurement process. The preset environmental reference value can be a specific value or a value range.

[0126] In step 332, if the environmental parameter of the environment in which the X-ray source 10 is located deviates from the preset environmental reference value, the environmental parameter is adjusted to the preset environmental reference value, the intensity monitoring data obtained after adjusting the environmental parameter is compared with the preset intensity threshold, and an abnormality monitoring and adjusting report is generated.

[0127] Specifically, if the environmental parameter deviates from the preset environmental reference value, the monitoring and adjusting system 60 can directly or indirectly issue instruction information for adjusting the environmental parameter to the environmental control system 80, so as to adjust the environmental parameter to the preset environmental reference value by using the environmental control system 80, so that the environmental parameter of the environment in which the X-ray source 10 is located returns to normal. Then, the intensity monitoring data obtained after adjusting the environmental parameter is compared with the preset intensity threshold (i.e., the first preset intensity threshold and the second preset intensity threshold), and an abnormality monitoring and adjusting report is generated, so as to continue to determine whether the intensity stability of the X-ray source 10 returns to normal.

[0128] Step 333, if the environmental parameter of the environment where the X-ray source 10 is located does not deviate from the preset environmental reference value, it is determined whether the intensity information obtained or output by the plurality of monitoring detectors 50 changes synchronously.

[0129] For example, it is determined whether the photon number monitoring value (which can also be understood as intensity information) output by the plurality of monitoring detectors 50 increases or decreases synchronously relative to the previous value; if the monitoring values of the plurality of monitoring detectors 50 change synchronously, it indicates that the second displacement stage system 90 is stable (i.e., the spatial position of the X-ray source 10 relative to the vacuum collimation system 20 does not change), and it indicates that the abnormal intensity stability of the X-ray source 10 is mainly caused by the filament attenuation of the X-ray source 10.

[0130] If the monitoring values of the plurality of monitoring detectors 50 do not increase or decrease synchronously, it indicates that the abnormal intensity stability of the X-ray source 10 can be caused by factors such as vibration of the second displacement stage system 90 (i.e., the position of the X-ray source 10 relative to the vacuum collimation system 20 has changed).

[0131] Step 334, if the intensity information obtained or output by the plurality of monitoring detectors 50 changes synchronously, the output power of the X-ray source 10 is adjusted until the intensity monitoring data obtained after adjusting the output power of the X-ray source 10 is less than or equal to the first preset intensity threshold, and an intensity monitoring and adjustment report is generated.

[0132] Specifically, after excluding the environmental parameter of the X-ray source 10, the relative position, etc. as factors causing the abnormal intensity stability of the X-ray source 10, it can be basically determined that the output power of the X-ray source 10 affects the intensity stability of the X-ray source 10; therefore, at this time, by adjusting the output power of the X-ray source 10, the intensity stability of the X-ray source 10 can be restored to normal; after the intensity monitoring data obtained after adjusting the output power of the X-ray source 10 is less than or equal to the preset intensity threshold (for example, less than or equal to the first preset intensity threshold), the monitoring and adjustment system 60 can output an instruction information of a continuous measurement process, and generate an abnormal monitoring and adjustment report based on the abnormal monitoring condition and the adjustment process.

[0133] Step 335, if the intensity information output by the plurality of monitoring detectors 50 does not change synchronously, the spatial position of the X-ray source 10 is adjusted, and after the intensity information output by each monitoring detector 50 returns to the preset intensity reference value, the intensity monitoring data obtained after adjusting the position of the X-ray source 10 is compared with the preset intensity threshold, and an abnormal monitoring and adjustment report is generated.

[0134] Specifically, if the intensity information output by the plurality of monitoring detectors 50 does not change synchronously, the monitoring adjustment system 60 outputs instruction information for controlling the movement of the second displacement table system 90, so that the second displacement table system 90 drives the X-ray source 10 to change the position synchronously, thereby realizing the fine adjustment of the relative spatial position between the X-ray source 10 and the vacuum collimation system 20; after the intensity information output by each monitoring detector 50 returns to the preset intensity reference value, the intensity monitoring data obtained after adjusting the position of the X-ray source 10 is compared with the preset intensity threshold (i.e., the first preset intensity threshold and the second preset intensity threshold), so as to continue to judge whether the intensity stability of the X-ray source 10 returns to normal.

[0135] It should be noted that the "preset intensity reference value" mentioned herein can be understood as a specific data value determined by the intensity information obtained by the monitoring detectors 50 detecting the first scattered X-ray L2 when the X-ray source 10 is stably running. That is, the preset intensity reference value can be determined according to the monitoring values of the monitoring detectors 50 when the X-ray source 10 is stably running.

[0136] Based on this, since the flow steps of the entire monitoring method can be performed in real time during the measurement process of the measurement equipment, it can be found in time whether the abnormal measurement result is caused by the abnormality of the X-ray source 10, and the corresponding measures can be automatically and timely taken for the abnormality of the X-ray source 10, so that the measurement efficiency of the equipment can be ensured, and the root cause analysis efficiency of the abnormal measurement result can be greatly improved, thereby ensuring the accuracy of the measurement result.

[0137] Those skilled in the art can understand that all or part of the functions of the various methods in the above embodiments can be realized by hardware or by a computer program. When all or part of the functions in the above embodiments are realized by a computer program, the program can be stored in a computer readable storage medium, which can include read-only memory, random access memory, magnetic disk, optical disk, hard disk, etc. The above functions are realized by executing the program by a computer. For example, the program is stored in the memory of the equipment, and when the program in the memory is executed by the processor, the above all or part of the functions are realized.

[0138] In addition, when all or part of the functions in the above embodiments are realized by a computer program, the program can also be stored in a server, another computer, a storage medium such as a disk, an optical disk, a flash disk or a mobile hard disk, and is saved in the memory of the local equipment by downloading or copying, or the system of the local equipment is updated, and when the program in the memory is executed by the processor, all or part of the functions in the above embodiments are realized.

[0139] The above application of specific examples to illustrate the present invention, is only used to help understand the present invention, and does not limit the present invention. For the skilled in the art to which the present invention belongs, according to the idea of the present invention, several simple deductions, deformation or replacement can be made.

Claims

1. An X-ray scatterometry apparatus, characterized in that, include: An X-ray source used to emit X-rays; A vacuum collimation system is disposed in the X-ray emission path of the X-ray source, and the vacuum collimation system includes a first slit; when the X-rays emitted by the X-ray source irradiate the first slit, the portion of the X-rays passing through the first slit forms a measurement X-ray beam, and the portion of the X-rays blocked by the first slit forms a first scattered X-ray; the measurement X-ray beam is used to irradiate the sample to be tested; The detection system is used to receive the second scattered X-rays formed after the measurement X-ray beam passes through the sample to be tested, and output the measurement information of the morphology of the sample to be tested. A monitoring detector is positioned in the optical path of the first scattered X-ray; the monitoring detector detects the first scattered X-ray and outputs the intensity information of the first scattered X-ray; A monitoring and adjustment system is connected to both the X-ray source and the monitoring detector. The monitoring and adjustment system processes the intensity information to obtain intensity monitoring data of the X-rays and monitors the X-ray source based on the intensity monitoring data.

2. The X-ray scatterometry apparatus of claim 1, wherein, The number of monitoring detectors is set to multiple; the multiple monitoring detectors are arranged at intervals around the center line of the opening of the first slit on the side of the first slit near the X-ray source.

3. The X-ray scatterometry apparatus of claim 2, wherein, The first slit includes a plurality of slit plates, which together define the opening of the first slit; a plurality of monitoring detectors correspond one-to-one with the plurality of slit plates, so that each monitoring detector can detect the first scattered X-rays formed by being blocked by the corresponding slit plate.

4. The X-ray scatterometry apparatus of claim 1, wherein, The monitoring detector detects the number of photons in the first scattered X-ray and uses the number of photons to determine the intensity information; the monitoring and adjustment system processes the intensity information to obtain the intensity monitoring data.

5. The X-ray scatterometry apparatus of any of claims 1-4, wherein, The monitoring and adjustment system compares the intensity monitoring data with a first preset intensity threshold. If the intensity monitoring data is greater than the first preset intensity threshold, the monitoring and adjustment system determines that the intensity stability of the X-ray source is abnormal.

6. The X-ray scatterometry apparatus of claim 5, wherein, The monitoring and adjustment system also compares the intensity monitoring data with a second preset intensity threshold, where the second preset intensity threshold is less than the first preset intensity threshold; When the intensity monitoring data is greater than the first preset intensity threshold and less than the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputting instruction information to adjust the output power of the X-ray source, outputting instruction information to adjust the environmental parameters of the environment in which the X-ray source is located, and outputting instruction information to adjust the spatial position of the X-ray source. If the intensity monitoring data is greater than or equal to the second preset intensity threshold, the monitoring and adjustment system performs at least one of the following operations: outputs an instruction to pause the X-ray source from emitting X-rays, or outputs an abnormal alarm.

7. The X-ray scatterometry apparatus of claim 5, wherein, It also includes a first displacement stage system and / or an environmental control system; wherein: The X-ray source is arranged on the first displacement table system; the displacement table system is connected to the monitoring and adjusting system, so as to adjust the spatial position of the X-ray source according to the instruction information output by the monitoring and adjusting system; The environment control system is used for monitoring and adjusting the environmental parameters of the environment where the X-ray source is located; the environment control system is connected to the monitoring and adjusting system, so as to output the monitored environmental parameters to the monitoring and adjusting system, and adjust the environmental parameters according to the instruction information output by the monitoring and adjusting system.

8. A monitoring method of an X-ray scatterometry apparatus, characterized by, Comprise: Controlling the X-ray source to emit X-rays; Detecting first scattered X-rays blocked by a first slit of the vacuum collimation system by a monitoring detector, to obtain intensity information of the first scattered X-rays; Processing the intensity information by a monitoring and adjusting system connected to the X-ray source and the monitoring detector respectively, to obtain intensity monitoring data about the X-rays, and monitoring the X-ray source according to the intensity monitoring data.

9. The monitoring method of claim 8, wherein, The monitoring of the X-ray source according to the intensity monitoring data comprises: Comparing the intensity monitoring data with a first preset intensity threshold value, and determining that the intensity stability of the X-ray source is abnormal if the intensity monitoring data is greater than the first preset intensity threshold value.

10. The monitoring method of claim 9, wherein, The monitoring of the X-ray source according to the intensity monitoring data further comprises: comparing the intensity monitoring data with a second preset intensity threshold value, which is greater than the first preset intensity threshold value; If the intensity monitoring data is greater than the first preset intensity threshold value and less than the second preset intensity threshold value, the following steps are performed: Judging whether the environmental parameters of the environment where the X-ray source is located deviate from preset environmental reference values; If the environmental parameters deviate from the preset environmental reference values, outputting instruction information for adjusting the environmental parameters, so as to compare the intensity monitoring data obtained after adjusting the environmental parameters with the first preset intensity threshold value and the second preset intensity threshold value after the environmental parameters are adjusted to the preset environmental reference values, and generate an abnormal monitoring and adjusting report; If the environmental parameters do not deviate from the preset environmental reference values, judging whether the intensity information output by multiple monitoring detectors changes synchronously; If the intensity information obtained by multiple monitoring detectors changes synchronously, outputting instruction information for adjusting the output power of the X-ray source, until the intensity monitoring data obtained after adjusting the output power of the X-ray source is less than or equal to the first preset intensity threshold value, and generating an abnormal monitoring and adjusting report; If the intensity information obtained by multiple monitoring detectors does not change synchronously, outputting instruction information for adjusting the spatial position of the X-ray source, so as to compare the intensity monitoring data obtained after adjusting the spatial position of the X-ray source with the first preset intensity threshold value and the second preset intensity threshold value after the intensity information obtained by each monitoring detector returns to a preset intensity reference value, and generate an abnormal monitoring and adjusting report; If the intensity monitoring data is greater than or equal to the second preset intensity threshold value, the following steps are performed: outputting instruction information for suspending the emission of X-rays by the X-ray source, and / or outputting an abnormal alarm.

11. The monitoring method according to any one of claims 8 to 10, characterized in that, The first scattered X-rays blocked by the first slit of the vacuum collimation system are detected by monitoring detectors to obtain intensity information of the first scattered X-rays, including: a plurality of monitoring detectors arranged at intervals around the opening center line of the first slit to detect the number of photons of the corresponding first scattered X-rays. The intensity information obtained by each monitoring detector includes the number of photons.

12. A computer-readable storage medium, characterized in that, The medium stores a computer program, and the computer program can be executed by a processor to implement the monitoring method in any one of claims 8-11.

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