Gas flow regulating device and dilution refrigerator

Abstract

The present invention provides a gas flow regulating device and a dilution refrigerator, relating to the technical field of dilution refrigerators. The gas flow regulating device includes: a support body; a gas pipeline configured to be wound around the outside of the support body in the height direction of the support body, and the gas pipeline is used to transport <supgt;3< / supgt;He vapor from the outside; an extrusion assembly arranged on the outside of the gas pipeline, and the extrusion assembly is configured to extrude the gas pipeline along the width direction of the support body when driven by an external force, so as to reduce the pipe diameter of the gas pipeline, so that at least part of the <supgt;3< / supgt>He vapor is liquefied to form <supgt;3< / supgt>He fluid flowing back to the mixing chamber of the dilution refrigerator.

Description

Technical Field

[0001] The present invention relates to the technical field of dilution refrigerators, and more specifically, to a gas flow regulating device and a dilution refrigerator. Background Art

[0002] A dilution refrigerator is a refrigeration device that uses 3 He vapor to perform a dilution refrigeration cycle, and its lowest temperature can reach the mK level. When the dilution refrigerator is started, during the dilution refrigeration cycle, 3 He vapor will be pumped out from the dilution core area to the room temperature area by a vacuum pump, and at the same time, it will also be input from the room temperature area to the dilution core area for continuous circulating flow. When 3 He vapor is pressed into the low-temperature refrigeration circulation pipeline from the circulation pipeline in the room temperature part by a gas compressor pump, it will first pass through a throttling effect to 3 preliminarily cool and liquefy the He vapor into a liquid. The gas throttler plays a role in throttling, and the common gas throttler is suitable for a temperature environment of approximately -30°C, having defects such as being inapplicable to an extremely low-temperature working environment, being unable to flexibly adjust the magnitude of its resistance, and requiring customization. Summary of the Invention

[0003] To solve at least one of the technical problems in the prior art, an embodiment of the present invention provides a gas flow regulating device and a dilution refrigerator. The gas flow regulating device is suitable for the extremely low-temperature working environment of the dilution refrigerator and can flexibly adjust the diameter of the gas pipeline.

[0004] The present invention provides a gas flow regulating device, including: a support body; a gas pipeline configured to be wound around the outside of the support body in the height direction of the support body, and the gas pipeline is used to transport 3 He vapor from the outside; an extrusion assembly disposed outside the gas pipeline, and the extrusion assembly is configured to, when driven by an external force, extrude the gas pipeline in the width direction of the support body to reduce the diameter of the gas pipeline, so that the 3 He vapor is at least partially liquefied to form a 3 He fluid that flows back to the mixing chamber of the dilution refrigerator.

[0005] Optionally, two surfaces of the support body close to the extrusion assembly are respectively provided with extrusion surfaces, and the two extrusion surfaces are configured to respectively have recesses, and the two recesses provide space for the extrusion assembly to extrude the gas pipeline.

[0006] Optionally, there are multiple groups of the extrusion assembly, and there are multiple groups of the recesses. The multiple groups of recesses respectively provide space for the multiple groups of the extrusion assembly to extrude the gas pipeline.

[0007] Optionally, each of the above-mentioned extrusion assemblies includes: two first rod portions respectively disposed outside the two above-mentioned concave portions and extending along the height direction of the above-mentioned support body; two second rod portions respectively passing through both ends of the two above-mentioned first rod portions along the width direction of the above-mentioned support body to limit the above-mentioned support body between the two above-mentioned first rod portions; two first limiting members respectively disposed at one end of the two above-mentioned second rod portions; and two second limiting members respectively rotatably disposed at the other end of the two above-mentioned second rod portions to respectively adjust the positions of the two above-mentioned second rod portions between both ends of the two above-mentioned first rod portions.

[0008] Optionally, through holes are formed at opposite positions at both ends of the two above-mentioned first rod portions to allow the above-mentioned second rod portions to pass through.

[0009] Optionally, the two above-mentioned second limiting members are nuts, threaded portions are provided on both of the two above-mentioned second rod portions, and the two above-mentioned nuts are respectively threadedly engaged with the two above-mentioned threaded portions; wherein, when the two above-mentioned nuts are driven by an external force, the two above-mentioned first rod portions are driven to approach each other to extrude the above-mentioned gas pipeline along the width direction of the above-mentioned support body, so that the pipe diameter of the above-mentioned gas pipeline is reduced.

[0010] Optionally, the cross-section of the above-mentioned support body in a plane perpendicular to the above-mentioned height direction is any one of opposed horseshoe shapes, oval shapes, trapezoidal shapes, and square shapes.

[0011] Optionally, the material of the above-mentioned support body is any one of stainless steel, titanium alloy, and nickel alloy.

[0012] An embodiment of another aspect of the present invention provides a dilution refrigerator, including: a mixing chamber in which an 3 He enriched phase located in the upper layer and an 3 He dilution phase located in the lower layer are stored, and the above-mentioned 3 He enriched phase is configured to respond to the above-mentioned 3 He dilution phase 3 in which the concentration of He decreases, compensate 3 He to the above-mentioned 3 He dilution phase and absorb surrounding heat at the same time for refrigeration; an evaporation chamber communicating with the 3 He dilution phase in the above-mentioned mixing chamber, and the above-mentioned evaporation chamber is used to separate 3 He vapor from the above-mentioned 3 He dilution phase; a transfer pump set for pumping 3 He vapor out of the above-mentioned evaporation chamber; the above-mentioned gas flow regulating device connected between the above-mentioned transfer pump set and the above-mentioned mixing chamber, and the above-mentioned gas flow regulating device is used to at least partially liquefy the above-mentioned 3 He vapor to form a flow back to the above-mentioned mixing chamber3 He fluid

[0013] Optionally, the above gas flow regulating device is removably connected between the above transfer pump set and the above mixing chamber

[0014] According to an embodiment of the present invention, a gas flow regulating device and a dilution refrigerator, a gas pipeline is wound around the outside of a support body in the height direction of the support body, and the gas pipeline is used to transport 3 He vapor from the outside. An extrusion assembly is arranged outside the gas pipeline. When the extrusion assembly is driven by an external force, it extrudes the gas pipeline in the width direction of the support body. The gas flow regulating device provided by the present invention is applicable to the extremely low temperature working environment of the dilution refrigerator. The beneficial effect of the present invention is that it can flexibly adjust the pipe diameter of the gas pipeline, so that 3 at least part of the He vapor is liquefied to form 3 He fluid flowing back to the mixing chamber of the dilution refrigerator Description of the Drawings

[0015] Figure 1 is a first perspective three-dimensional view of a gas flow regulating device according to an embodiment of the present invention;

[0016] Figure 2 is a second perspective three-dimensional view of the gas flow regulating device according to an embodiment of the present invention;

[0017] Figure 3 is a side view of the gas flow regulating device according to an embodiment of the present invention;

[0018] Figure 4 is Figure 3 a cross-sectional view taken along the A-A direction;

[0019] Figure 5 is an overall schematic diagram of a gas heat sink according to an embodiment of the present invention;

[0020] Figure 6 is a plan view of a gas heat sink according to an embodiment of the present invention;

[0021] Figure 7 is a sectional view of a gas heat sink according to an embodiment of the present invention;

[0022] Figure 8 is Figure 7 an enlarged view at B in;

[0023] Figure 9 is a sectional view of the gas heat sink from another angle according to an embodiment of the present invention;

[0024] Figure 10Simplified schematic diagram of the internal gas flow of a gas heat sink according to an embodiment of the present invention;

[0025] Figure 11 Explosion schematic diagram of a gas heat sink according to an embodiment of the present invention;

[0026] Figure 12 Schematic diagram of the working principle of a dilution refrigerator according to an embodiment of the present invention.

[0027] In the said drawings, the meanings of the reference numerals are specifically as follows:

[0028] 1. Housing; 11. Input port; 12. Output port; 13. Main body; 14. Cover; 15. Seal; 2. Deflector; 21. First main body part; 211. Through groove; 22. Flared part; 3. Partition; 31. Second main body part; 32. Partition part; 321. Avoidance notch; 4. First flow channel; 5. Second flow channel; 6. Mixing chamber; 7. Evaporation chamber; 8. Transfer pump group; 9. Gas heat sink; 10. Gas flow regulating device; 101. Support body; 102. Gas pipeline; 103. First rod part; 104. Second rod part; 105. First limiting part; 106. Second limiting part. Detailed implementation manners

[0029] Hereinafter, embodiments of the present invention will be described with reference to the drawings. However, it should be understood that these descriptions are merely exemplary and are not intended to limit the scope of the present invention. In the following detailed description, for the sake of explanation, many specific details are set forth in order to provide a comprehensive understanding of the embodiments of the present invention. However, obviously, one or more embodiments can also be implemented without these specific details. In addition, in the following description, descriptions of well-known structures and technologies are omitted to avoid unnecessarily obscuring the concepts of the present invention.

[0030] The terms used herein are merely for describing specific embodiments and are not intended to limit the present invention. The terms "including", "comprising", etc. used herein indicate the presence of the described features, steps, operations, and / or components, but do not exclude the presence or addition of one or more other features, steps, operations, or components.

[0031] All terms used herein (including technical and scientific terms) have the meanings commonly understood by those skilled in the art, unless otherwise defined. It should be noted that the terms used herein should be interpreted as having a meaning consistent with the context of this specification and should not be interpreted in an idealized or overly rigid manner.

[0032] In the case of using expressions such as "at least one of A, B, and C, etc.", generally, it should be interpreted according to the meaning that those skilled in the art usually understand this expression (for example, "a system having at least one of A, B, and C" should include, but not be limited to, a system having only A, only B, only C, having A and B, having A and C, having B and C, and / or having A, B, and C, etc.). In the case of using expressions such as "at least one of A, B, or C, etc.", generally, it should be interpreted according to the meaning that those skilled in the art usually understand this expression (for example, "a system having at least one of A, B, or C" should include, but not be limited to, a system having only A, only B, only C, having A and B, having A and C, having B and C, and / or having A, B, and C, etc.).

[0033] To solve the problem that the existing gas throttler is not applicable to extremely low-temperature working environments and cannot flexibly adjust the magnitude of its resistance, according to the inventive concept of one aspect of the present invention, the gas pipeline is wound around the outside of the support body in the height direction of the support body, and the gas pipeline is used to transport 3 He vapor from the outside. The extrusion assembly is arranged outside the gas pipeline. When the extrusion assembly is driven by an external force, it extrudes the gas pipeline in the width direction of the support body, so that 3 at least part of the He vapor is liquefied to form a 3 He fluid flowing back to the mixing chamber of the dilution refrigerator. The gas flow rate regulating device provided by the present invention is applicable to the extremely low-temperature working environment of the dilution refrigerator and can flexibly adjust the pipe diameter of the gas pipeline.

[0034] Figure 1 is a first perspective three-dimensional view of a gas flow rate regulating device according to an embodiment of the present invention, Figure 2 is a second perspective three-dimensional view of a gas flow rate regulating device according to an embodiment of the present invention.

[0035] A gas flow rate regulating device according to an embodiment of the present invention, as Figure 1 and Figure 2 shown, includes a support body 101, a gas pipeline 102, and an extrusion assembly. The gas pipeline 102 is configured to be wound around the outside of the support body 101 in the height direction of the support body 101, and the gas pipeline 102 is used to transport 3 He vapor from the outside. The extrusion assembly is arranged outside the gas pipeline 102. The extrusion assembly is configured to, when driven by an external force, extrude the gas pipeline 102 in the width direction of the support body 101 to reduce the pipe diameter of the gas pipeline 102, so that 3 at least part of the He vapor is liquefied and mixed with the unliquefied 3 He to form a3 He fluid

[0036] According to an embodiment of the present invention, in a dilution refrigerator, helium-3 ( 3 He) and helium-4 ( 4 He) mixed working fluid is mainly used for refrigeration. When the 3 He and 4 He mixture is in a temperature range below 0.86K, it will separate into two phases. The upper layer is the concentrated phase, and the main component is 3 He, that is, 3 He solution. The lower layer is the dilution phase, and the main component is a mixture of 3 He and 4 He, where the proportion of 3 He is about 6.4% - 6.6%. The 3 He vapor in the evaporation chamber is pumped out by a vacuum pump, and the 3 He vapor is at least partially condensed and liquefied and then mixed with the unliquefied 3 He to form 3 He fluid, which flows back into the concentrated phase and then passes through the phase interface between the concentrated phase and the dilution phase to form dilution refrigeration. And before the 3 He vapor is at least partially condensed and liquefied and then mixed with the unliquefied 3 He to form 3 He fluid, it needs to be preliminarily cooled and liquefied and then flow back to the concentrated phase of the mixing chamber of the dilution refrigerator.

[0037] According to an embodiment of the present invention, when the 3 He vapor extracted from the evaporation chamber passes through the gas pipeline 102, under the drive of an external force, the extrusion assembly extrudes the gas pipeline 102 along the width direction of the support body 101, the diameter of the gas pipeline 102 decreases, 3 the pressure of the 3 He vapor drops when it flows through the gas pipeline 102, 3 the 3 He vapor undergoes the Joule - Thomson effect. Since the interatomic force of 3 He is close to the ideal gas level, and since the inversion temperature of 3 He is extremely low, approximately 40K (-233°C), when the gas expands, the change in interatomic force causes a change in internal energy, which in turn causes a temperature change. When the temperature is greater than 40K, the Joule - Thomson coefficient is negative, 3 He heats up during throttling. When the temperature is less than 40K, the Joule - Thomson coefficient is positive, 3 He cools down during throttling, 3 the 3 He vapor is at least partially liquefied and then mixed with the unliquefied 3 He to form

[0038] According to an embodiment of the present invention, the height direction of the support body 101 is Figure 2 the Z direction shown in Figure 2 , the width direction of the support body 101 is Figure 2 the X direction shown in

[0039] According to an embodiment of the present invention, the gas pipeline 102 is wound around the outside of the support body 101 in the height direction of the support body 101. The gas pipeline 102 is used to transport 3 He vapor from the outside. The extrusion assembly is arranged on the outside of the gas pipeline 102. When the extrusion assembly is driven by an external force, it extrudes the gas pipeline 102 along the width direction of the support body 101, so that 3 at least part of the He vapor is liquefied and then mixed with the unliquefied 3 He to form a 3 He fluid flowing back to the mixing chamber of the dilution refrigerator. The gas flow rate regulating device provided by the present invention is applicable to the cryogenic working environment of the dilution refrigerator, can flexibly adjust the pipe diameter of the gas pipeline 102, is simple to manufacture, has high use reliability, and a wide adjustable range.

[0040] According to an embodiment of the present invention, two extrusion surfaces are respectively arranged on two surfaces of the support body 101 close to the extrusion assembly. The two extrusion surfaces are configured to respectively have recesses, and the two recesses provide space for the extrusion assembly to extrude the gas pipeline 102.

[0041] According to an embodiment of the present invention, the two recesses provide necessary space for the extrusion assembly to extrude the gas pipeline 102, ensure the smooth progress of the extrusion process, avoid direct contact between the extrusion assembly and the support body 101, reduce mechanical interference and wear, extend the service life of the gas pipeline 102, and also facilitate subsequent maintenance and replacement. The two recesses also make the extrusion pressure evenly distributed on the gas pipeline 102 along the height direction of the support body 101, prevent local stress concentration, provide a protective effect for the gas pipeline 102, and the uniform force application improves the stability of the extrusion process, ensuring the consistency of the extrusion effect of the gas pipeline 102 in the height direction of the support body 101. Moreover, the two extrusion surfaces respectively have recesses, which can adapt to gas pipelines 102 of different sizes, improve flexibility, and also enhance the versatility of the gas flow rate regulating device.

[0042] According to an embodiment of the present invention, there are multiple groups of extrusion assemblies, and there are multiple groups of recesses. The multiple groups of recesses respectively provide space for the multiple groups of extrusion assemblies to extrude the gas pipeline 102.

[0043] According to an embodiment of the present invention, multiple sets of extrusion components can be arranged in parallel. The arrangement of multiple sets of extrusion components and multiple sets of recesses can ensure that the extrusion pressure is evenly distributed on the gas pipeline 102 along the length direction of the support body 101, prevent local stress concentration, provide a protective effect for the gas pipeline 102, improve the stability of the extrusion process by evenly distributing the force, and ensure the consistency of the extrusion effect of the gas pipeline 102 in the length direction of the support body 101. The multiple sets of recesses can better limit the position of the gas pipeline 102 and the support body 101, ensuring the accuracy of the extrusion component to extrude the gas pipeline 102. The arrangement of multiple sets of extrusion components and multiple sets of recesses can also achieve load balancing, avoid overloading of a single component, and load balancing can extend the service life of the extrusion component and the support body 101.

[0044] According to an embodiment of the present invention, each set of extrusion components includes two first rod portions 103, two second rod portions 104, two first limiting members 105, and two second limiting members 106. The two first rod portions 103 are respectively arranged outside the two recesses, and the two first rod portions 103 extend along the height direction of the support body 101. The two second rod portions 104 respectively pass through both ends of the two first rod portions 103 along the width direction of the support body 101 to limit the support body 101 between the two first rod portions 103. The two first limiting members 105 are respectively arranged at one end of the two second rod portions 104. The two second limiting members 106 are respectively rotatably arranged at the other end of the two second rod portions 104 to respectively adjust the positions of the two second rod portions 104 between both ends of the two first rod portions 103.

[0045] According to an embodiment of the present invention, when the two second limiting members 106 are driven by an external force to respectively adjust the positions of the two second rod portions 104 between both ends of the two first rod portions 103, a device for detecting the flow rate can be externally connected to the gas pipeline 102. By detecting 3 the flow rate of He vapor flowing through the gas pipeline 102, the deformation caused by the extrusion force exerted by the two first rod portions 103 on the gas pipeline 102 can be obtained. The applied external force is, for example, 10 N, the pressure of the gas pipeline 102 is 0.2 MPa, 3 and the flow rate of He vapor flowing through the gas pipeline 102 is 20 ml / min.

[0046] Figure 3 is a side view of a gas flow rate regulating device according to an embodiment of the present invention, Figure 4 is Figure 3 a cross-sectional view in the A - A direction.

[0047] According to an embodiment of the present invention, as Figure 3 and Figure 4 shown, through holes are provided at opposite positions at both ends of the two first rod portions 103 to allow the second rod portions 104 to pass through.

[0048] According to an embodiment of the present invention, a second rod portion 104 penetrates through through-holes formed at both ends (on the same side) of two first rod portions 103, and another second rod portion 104 penetrates through through-holes formed at both ends of two first rod portions 103, which can effectively connect the two first rod portions 103, improve stability and rigidity, and the two second rod portions 104 are easy to install and disassemble, facilitating subsequent maintenance and replacement. The through-holes can ensure the precise alignment of the two first rod portions 103 and the second rod portion 104, improving the installation accuracy.

[0049] According to an embodiment of the present invention, the two second limiting members 106 are nuts, threaded portions are provided on both second rod portions 104, and the two nuts are threadedly engaged with the two threaded portions respectively. Among them, when the two nuts are driven by an external force, the two first rod portions 103 are driven to approach each other, so as to squeeze the gas pipeline 102 in the width direction of the support body 101, reducing the diameter of the gas pipeline 102.

[0050] According to an embodiment of the present invention, the two nuts are threadedly engaged with the two threaded portions respectively. When the two nuts are driven by an external force, one first rod portion 103 is driven to slide on the two second rod portions 104 and approach the other first rod portion 103, so as to squeeze the gas pipeline 102 in the width direction of the support body 101, reducing the diameter of the gas pipeline 102. Threaded portions are provided on both second rod portions 104, providing a greater degree of freedom of movement for the sliding of the first rod portion 103 and having a wide adjustable range.

[0051] According to an embodiment of the present invention, by changing the number of turns of the gas pipeline 102 wound around the outside of the support body 101 in the height direction of the support body 101, the adjustable range of the gas flow rate is further expanded, and the number of turns can be 5 turns, 6 turns, 7 turns, etc.

[0052] According to an embodiment of the present invention, the cross-section of the support body 101 in a plane perpendicular to the height direction is any one of opposed horseshoe shapes, oval shapes, trapezoidal shapes, and square shapes.

[0053] According to an embodiment of the present invention, when the cross-section of the support body 101 in a plane perpendicular to the height direction is an opposed horseshoe shape or an opposed oval shape, the arc-shaped structure can effectively disperse stress, reduce stress concentration, extend the service life of the support body 101, and can also fit well with the gas pipeline 102, improving space utilization. When the cross-section of the support body 101 in a plane perpendicular to the height direction is an opposed trapezoidal shape or an opposed square shape, the trapezoid and the square are wider than the horseshoe shape or the oval shape, and can provide good support and stability for the gas pipeline 102.

[0054] According to an embodiment of the present invention, the material of the support body 101 is any one of stainless steel, titanium alloy, and nickel alloy.

[0055] According to an embodiment of the present invention, if the material of the support body 101 is stainless steel, the stainless steel can maintain good toughness and strength in an extremely low-temperature working environment, and also has good corrosion resistance and low cost. If the material of the support body 101 is titanium alloy, the titanium alloy can maintain good toughness and strength in an extremely low-temperature working environment, and the titanium alloy has a low thermal conductivity, which can reduce heat conduction and maintain the ambient temperature. At the same time, the titanium alloy has a low density but high strength, which helps to reduce the overall weight and maintain the structural strength. If the material of the support body 101 is nickel alloy, the nickel alloy can maintain excellent toughness and strength in an extremely low-temperature working environment, and the nickel alloy has excellent corrosion resistance.

[0056] Figure 12 It is a schematic diagram of the working principle of a dilution refrigerator according to an embodiment of the present invention.

[0057] According to an embodiment of another aspect of the present invention, as Figure 12 shown, a dilution refrigerator is provided, including a mixing chamber 6, an evaporation chamber 7, a transfer pump group 8, and a gas flow regulating device 10. The mixing chamber 6 stores a 3 He enriched phase in the upper layer and a 3 He dilute phase in the lower layer. The 3 He enriched phase is configured to compensate for 3 He in the 3 He dilute phase and absorb the surrounding heat for refrigeration in response to a decrease in the concentration of 3 He in the 3 He dilute phase. The evaporation chamber 7 is in communication with the 3 He dilute phase in the mixing chamber 6, and the evaporation chamber 7 is used to separate 3 He vapor from the 3 He dilute phase. The transfer pump group 8 is used to pump 3 He vapor out of the evaporation chamber 7. The gas flow regulating device 10 is connected between the transfer pump group 8 and the mixing chamber 6, and the gas flow regulating device 10 is used to at least partially liquefy the 3 He vapor and mix it with the unliquefied 3 He to form a 3 He fluid flowing back to the mixing chamber 6.

[0058] According to an embodiment of the present invention, a gas heat sink 9 can be provided between the transfer pump group 8 and the gas flow regulating device 10. The gas heat sink 9 is used to receive the 3 He vapor from the transfer pump group 8 and pre-cool the 3 He vapor. The gas flow regulating device 10 processes the pre-cooled3 The He vapor undergoes adiabatic throttling to at least partially liquefy the He vapor through the Joule-Thomson effect and then mix with the unliquefied 3 He to form a He fluid flowing back to the mixing chamber 6. 3 3

[0059] Figure 5 is an overall schematic diagram of a gas heat sink according to an embodiment of the present invention. Figure 6 is a plan schematic diagram of a gas heat sink according to an embodiment of the present invention, with the cover removed. Figure 7 is a sectional schematic diagram of a gas heat sink according to an embodiment of the present invention. Figure 8 is Figure 7 an enlarged view at B in Figure 9 is a sectional schematic diagram of the gas heat sink from another angle according to an embodiment of the present invention. Figure 10 is a simplified schematic diagram of the internal gas flow of the gas heat sink according to an embodiment of the present invention.

[0060] According to an embodiment of the present invention, the dilution refrigerator further includes a gas heat sink 9, as Figures 5 to 10 shown, which includes a housing 1, a plurality of flow guiding plates 2 and a plurality of partition plates 3. The opposite ends of the housing 1 are provided with an input port 11 and an output port 12 communicating with the outside. The plurality of flow guiding plates 2 are arranged at intervals in the height direction of the housing 1, and a plurality of through grooves 211 extending in the length direction of the housing 1 are formed on the flow guiding plates 2. Each flow guiding plate 2 is clamped between two adjacent partition plates 3 and is adapted to block the middle part of the through groove 211 to form a first flow channel 4. The side wall of the partition plate 3 facing the input port 11 and the flow guiding plate 2 define a second flow channel 5 communicating with the input port 11, and the first flow channel 4 and the second flow channel 5 are communicated. Among them, the second flow channel 5 is configured to guide the gas input from the input port 11 to enter the plurality of first flow channels 4 through multiple diffusions in the height direction, and the housing 1 is configured to exchange heat with the gas through the flow guiding plates 2 and the partition plates 3 and transfer the heat to an external cold source.

[0061] In such an embodiment, the housing 1 is a sealed housing. The gas carrying more heat enters from the input port 11, exchanges heat with the flow guiding plates 2 and the partition plates 3, and then outputs the cooled gas through the output port 12. Among them, the heat of the flow guiding plates 2 and the partition plates 3 is transferred to the external cold source through heat exchange with the housing 1 to continuously cool the gas. Specifically, inside the housing 1, the flow guiding plates 2 and the partition plates 3 are alternately stacked in the height direction. A plurality of through grooves 211 are formed on the flow guiding plates 2, and the middle parts of the through grooves 211 are blocked by two adjacent partition plates 3 to form a first flow channel 4. At the same time, the side wall of the partition plate 3 facing the input port 11 and the flow guiding plate 2 define an irregular-shaped second flow channel 5 communicating with the input port 11, as Figure 6 ​​As shown, it can guide the input gas to diffuse multiple times in the height direction and enter the plurality of first flow channels 4 through the end of the through groove 211 that is not blocked by the partition plate 3. In this way, not only does it reduce the flow channel cross-sectional area using the plurality of first flow channels 4, reduce the boundary layer thickness, but also effectively increases the diffusion range of the gas, increases the heat exchange area, and improves the heat exchange efficiency.

[0062] Further, in a dilution refrigerator, the gas heat sink 9 is used to 3 pre-cool the He vapor, and at the same time cooperate with other heat exchangers for 3 continuous multi-stage heat exchange of the He fluid. In this way, not only is the number of heat exchange stages increased on the original basis, but also the heat exchange efficiency is improved through structural optimization, and further 3 the heat carried by the He fluid when it returns to the mixing chamber 6 is reduced.

[0063] In an embodiment of the present invention, the materials of the flow guide plate 2, the partition plate 3, and the housing 1 include but are not limited to copper. In extremely low temperature fields such as dilution refrigerators, oxygen-free copper is preferably used to obtain higher stability and thermal conductivity.

[0064] In some other embodiments, the thickness of the flow guide plate 2 is greater than the thickness of the partition plate 3 to reduce 3 the resistance of the He vapor flowing in the first flow channel 4.

[0065] Figure 11 is an explosion schematic diagram of a gas heat sink according to an embodiment of the present invention, mainly showing the flow guide plate and the partition plate.

[0066] In an exemplary embodiment, as Figures 8 to 11 shown, the flow guide plate 2 has a first main body portion 21 forming the through groove 211, and extends from the first main body portion 21 to both sides along the length direction to form a flaring portion 22 that diffuses or converges the 3 He vapor in the width direction.

[0067] In such an embodiment, the first main body portion 21 of the flow guide plate 2 is configured as a rectangular plate, and a plurality of through grooves 211 extending along the length direction are opened on the rectangular plate. The flaring portion 22 extends from the first main body portion 21 to both sides along the length direction. The side close to the input port 11 is used to guide the input 3 He vapor to diffuse in the width direction, and the side close to the output port 12 is used to guide the 3 He vapor to converge towards the output port 12 in the width direction.

[0068] According to an embodiment of the present invention, the flaring portion 22 is configured to extend from the two opposite sides of the first main body portion 21 in the width direction along the length direction and approach each other to form a flaring structure at the end.

[0069] In such an embodiment, taking the side of the first main body portion 21, i.e., the rectangular plate, close to the input port 11 as an example, the flared portions 22 extend from the two opposite sides of the rectangular plate in the width direction, that is, the longer set of side edges, along the length direction respectively, and then approach each other along the width direction and cooperate at the ends to form a flared structure, so that 3 the He steam can diffuse along the width direction after entering from the input port 11. Based on the same principle, the flared portions 22 on the side of the rectangular plate close to the output port 12 have the same structure and are suitable for guiding the 3 He steam after heat exchange and cooling to gradually converge to the output port 12 along the width direction.

[0070] According to an embodiment of the present invention, as Figures 8 to 11 shown, the partition plate 3 has a second main body portion 31 that encloses the through groove 211, and a partition portion 32 that extends from the second main body portion 31 to both sides along the length direction and is used to enclose the flared portion 22 to form a flared flow channel.

[0071] In such an embodiment, the second main body portion 31 of the partition plate 3 is also constructed as a rectangular plate, which is a solid structure, and its length is less than the length of the through groove 211 and is located at approximately the middle position of the through groove 211 to leave both ends for the first flow channel 4 and the second flow channel 5 to communicate. The partition portions 32 extend from the longer set of side edges of the rectangular plate along the length direction by the same length as the flared portion 22, and then approach each other and combine along the width direction to separate the flared portions 22 of the adjacent flow channel plates 2 in the height direction to form independent flared flow channels, which is beneficial to 3 the diffusion of He steam in the height direction.

[0072] Further according to an embodiment of the present invention, as Figure 6 and Figure 11 shown, an avoidance notch 321 is formed on the partition portion 32 and is arranged opposite to the input port 11 in the width direction, which is suitable for reducing 3 the resistance when the He steam is input.

[0073] In such an embodiment, the avoidance notch 321 leaves a distance between the side wall of the partition portion 32 facing the input port 11 and the input port 11, avoiding 3 the He steam directly impacting the side wall, resulting in excessive resistance and accumulation at the input port 11. However, at the same time, the avoidance notch 321 does not disconnect the partition portion 32 and still maintains the formation of a flared flow channel with the flared portion 22.

[0074] In an exemplary embodiment, the input port 11 is arranged opposite to the flared portion 22 in the width direction.

[0075] In such an embodiment, by arranging the input port 11 opposite to the flared portion 22 in the width direction, it is beneficial to3 He vapor input. More specifically, as Figure 2 shown, the input port 11 and the flared portion 22 are located on the axis of symmetry of the housing 1 in the longitudinal direction.

[0076] In an exemplary embodiment, as Figure 11 shown, a plurality of through grooves 211 are spaced apart in the width direction.

[0077] In such an embodiment, the plurality of through grooves 211 extend in the longitudinal direction and are spaced apart in the width direction to cooperate with the partition 3 to form a densely arranged first flow channel 4. When 3 the He vapor enters the housing 1 from the input port 11, after multiple diffusions, it exchanges heat sufficiently with the deflector 2 and the partition 3 through the plurality of first flow channels 4, and is discharged through the output port 12 after heat exchange. The heat accumulated in the housing 1, the deflector 2 and the partition 3 is taken away by an external cold source, and the choice of the external cold source depends on the application scenario of the gas heat sink 9, for example, it can be a flowing cryogenic liquid working medium.

[0078] In an exemplary embodiment, as Figure 5 and Figure 6 shown, the housing 1 includes a main body 13 and a cover 14. A receiving cavity is formed in the main body 13, and the deflector 2 and the partition 3 are disposed in the receiving cavity. The cover 14 is fastened to the main body 13 to close the receiving cavity.

[0079] In such an embodiment, the deflector 2 and the partition 3 are alternately stacked in the receiving cavity, and the shape of the receiving cavity is substantially the same as the shapes of the deflector 2 and the partition 3, so that the deflector 2 and the partition 3 can be stably embedded in the receiving cavity without the aid of a connecting component. In some alternative embodiments, there is an interference fit between the deflector 2, the partition 3 and the housing 1. After the cover 14 is fastened to the main body 13, it is fastened by bolts to ensure the sealing performance of the gas heat sink 9.

[0080] In some other embodiments, a boss is formed on the lower surface of the cover 14, that is, the surface facing the main body 13 when fastened. When the cover 14 is fastened to the main body 13, the boss is embedded in the receiving cavity to further ensure the sealing performance.

[0081] According to an embodiment of the present invention, a sealing member 15 is clamped between the main body 13 and the cover 14. The sealing member 15 is made of indium metal and is adapted to deform under the extrusion of the cover 14 and the main body 13 to seal the gap between the cover 14 and the main body 13.

[0082] In such an embodiment, by using the sealing member 15 made of indium metal to seal the gas heat sink 9, while improving the sealing performance, it also has good corrosion resistance and stability at low temperatures. Since indium metal is soft in texture, sealing can be achieved by extrusion deformation, which is convenient to operate.

[0083] In some other embodiments, the seal 15 can also be a washer made of rubber.

[0084] According to an embodiment of the present invention, as Figure 12 shown, the mixing chamber 6 stores 3 a He enriched phase (i.e., 3 a He solution) and 3 a He dilute phase (i.e., 3 a mixture of He and 4 He). When the evaporation chamber 7 reaches a preset temperature, about 0.6 - 1 K (Kelvin), generally 0.8 K is selected. At this time, 3 the saturated vapor pressure of He is significantly higher than 4 that of He, so it is selectively evaporated. The concentration of He in the evaporation chamber 7 decreases accordingly, and the 3 He dilute phase in the mixing chamber 6 replenishes 3 He to the evaporation chamber 7, and further causes the 3 He in the He enriched phase in the mixing chamber 6 to dissolve into the 3 He dilute phase. When 3 He passes through the phase interface, it absorbs the surrounding heat, and the temperature of the mixing chamber 6 and the surrounding cold plates decreases, realizing dilution refrigeration. In addition, 3 after He is selectively evaporated, it becomes 3 He vapor. The He vapor is pumped out of the evaporation chamber 7 by the transfer pump group 8 (including a compressor pump). To enable the dilution refrigeration to proceed continuously and cyclically, the 3 He vapor is at least partially throttled and depressurized through the gas flow regulating device 10 and then liquefied and mixed with the unliquefied 3 He to form 3 a He fluid, and then flows back to the 3 He enriched phase in the mixing chamber 6, so as to perform dilution refrigeration cyclically. 3 He fluid, and then flows back to the 3 He enriched phase in the mixing chamber 6, so as to perform dilution refrigeration cyclically. 3 He enriched phase, so as to perform dilution refrigeration cyclically.

[0085] More specifically, since the 3 He vapor is at room temperature after being pumped out, although it is throttled and cooled by the gas flow regulating device 10, the heat it carries will still have a greater impact on the refrigeration of the dilution refrigerator, which is also called heat leakage. Therefore, after the transfer pump group 8 pumps out the 3 He vapor, it is pumped into the gas heat sink 9 for preliminary heat exchange and cooling, and then introduced into the gas flow regulating device 10. The gas heat sink 9 can be cooled by a pulse tube refrigerator to take away at least part of the heat of the 3 He vapor.

[0086] In an exemplary embodiment, the gas flow regulating device 10 includes a support body 101, a gas pipeline 102, and a squeezing assembly. The gas pipeline 102 is wound around the outside of the support body 101 in the height direction of the support body 101. The gas pipeline 102 is used to transport 3 He vapor from the outside. The squeezing assembly is arranged on the outside of the gas pipeline 102. When driven by an external force, the squeezing assembly squeezes the gas pipeline 102 along the width direction of the support body 101 to reduce the pipe diameter of the gas pipeline 102, so that 3 at least part of the He vapor is liquefied and then mixed with the unliquefied 3 He to form a He fluid flowing back to the mixing chamber 6 of the dilution refrigerator. The gas flow regulating device 10 provided by the present invention is applicable to the extremely low temperature working environment of the dilution refrigerator, can flexibly adjust the pipe diameter of the gas pipeline 102, is simple to manufacture, has high use reliability, and has a wide adjustable range. 3 He fluid, the gas flow regulating device 10 provided by the present invention is applicable to the extremely low temperature working environment of the dilution refrigerator, can flexibly adjust the pipe diameter of the gas pipeline 102, is simple to manufacture, has high use reliability, and has a wide adjustable range.

[0087] In some other embodiments, during the process of the He fluid flowing back to the mixing chamber 6 after throttling, it will also undergo multi-stage heat exchange to further reduce the heat leakage. 3 He fluid flowing back to the mixing chamber 6 after throttling, it will also undergo multi-stage heat exchange to further reduce the heat leakage.

[0088] In such an embodiment, the heat exchange structure includes but is not limited to a disc-shaped radiator, the upper layer and the lower layer of which are separated by oxygen-free copper to transfer heat; or a spiral double-layer tube radiator, the inner layer and the outer layer of which are separated by the tube wall to transfer heat. The heat exchange object is preferably the 3 He and 4 He mixture from the mixing chamber 6. The reason is that 3 He and 4 after the He and He mixture absorbs heat, the temperature does not rise significantly.

[0089] According to an embodiment of the present invention, the gas flow regulating device 10 is detachably connected between the transfer pump group 8 and the mixing chamber 6.

[0090] According to an embodiment of the present invention, if it is necessary to adjust the He vapor output from the transfer pump group 8 with different flow rates, the gas flow device 10 can be removed, replaced with a new gas flow device, and then the gas pipeline 102 is re-squeezed along the width direction of the support body 101 to adjust the pipe diameter of the gas pipeline 102, so as to adjust 3 the flow rate of the He fluid flowing through the gas pipeline 102. By adjusting 3 the flow rate of the He fluid, it is made to match the dilution refrigerator, expand its performance limit, and lay a foundation for the further development of the dilution refrigerator. 3 the flow rate of the He fluid, it is made to match the dilution refrigerator, expand its performance limit, and lay a foundation for the further development of the dilution refrigerator.

[0091] Those skilled in the art can understand that the features recited in the various embodiments and / or claims of the present invention can be combined or combined in various ways, even if such combinations or combinations are not explicitly recited in the present invention. In particular, without departing from the spirit and teachings of the present invention, the features recited in the various embodiments and / or claims of the present invention can be combined and / or combined in various ways. All such combinations and / or combinations fall within the scope of the present invention.

[0092] It should also be noted that the directional terms mentioned in the embodiments, such as "upper", "lower", "front", "rear", "left", "right", etc., are only references to the directions in the drawings and are not used to limit the protection scope of the present invention. Throughout the drawings, the same elements are represented by the same or similar reference numerals. When it may cause confusion in the understanding of the present invention, the conventional structures or configurations will be omitted, and the shapes and sizes of the components in the drawings do not reflect the actual sizes and proportions, but only illustrate the content of the embodiments of the present invention.

[0093] Unless otherwise known to the contrary, the numerical parameters in this specification and the appended claims are approximate values and can be changed according to the required characteristics obtained through the content of the present invention. Specifically, all the numbers representing the contents of the components, reaction conditions, etc. used in the specification and claims should be understood to be modified by the term "about" in all cases. Generally, the meaning expressed is that it includes changes of ±10% in some embodiments, ±5% in some embodiments, ±1% in some embodiments, and ±0.5% in some embodiments for a specific quantity.

[0094] The ordinal numbers such as "first", "second", "third", etc. used in the specification and claims are used to modify the corresponding elements, and they do not mean that the elements have any ordinal numbers in themselves, nor do they represent the order of one element and another element or the order in the manufacturing method. The use of these ordinal numbers is only to clearly distinguish one element with a certain name from another element with the same name.

[0095] In addition, unless specifically described or steps that must occur in sequence, the order of the above steps is not limited to the above list and can be changed or rearranged according to the required design. And the above embodiments can be used in combination with each other or combined with other embodiments based on considerations of design and reliability, that is, the technical features in different embodiments can be freely combined to form more embodiments.

[0096] The embodiments of the present invention have been described above. However, these embodiments are for illustrative purposes only and are not intended to limit the scope of the present invention. Although the embodiments have been described separately above, this does not mean that the measures in each embodiment cannot be used advantageously in combination. The scope of the present invention is defined by the appended claims and their equivalents. Without departing from the scope of the present invention, those skilled in the art can make various substitutions and modifications, and all such substitutions and modifications should fall within the scope of the present invention.

Claims

1. A gas flow regulating device, characterized in that: include: Supporting the body; The gas pipeline is configured to be wound around the outside of the support body in the height direction of the support body, and the gas pipeline is used to transport gas from the outside. 3 He steam; An extrusion assembly is arranged outside the gas pipeline, and the extrusion assembly is configured to squeeze the gas pipeline along the width direction of the support body when driven by an external force to reduce the diameter of the gas pipeline so that the 3 The He vapor is at least partially liquefied to form a mixture that flows back into the mixing chamber of the dilution refrigerator. 3 and fluid.

2. The gas flow regulating device according to claim 1, characterized in that: The two surfaces of the support body close to the extrusion assembly are respectively provided with extrusion surfaces, and the two extrusion surfaces are configured to have recesses respectively, and the two recesses provide space for the extrusion assembly to extrude the gas pipeline.

3. The gas flow regulating device according to claim 2, characterized in that: The extrusion components have multiple groups, the recesses have multiple groups, and the multiple groups of recesses respectively provide spaces for the multiple groups of extrusion components to extrude the gas pipelines.

4. The gas flow regulating device according to claim 2, characterized in that: Each set of extrusion components includes: Two first rod portions are respectively arranged at the outer sides of the two recessed portions, and the two first rod portions extend along the height direction of the support body; Two second rod portions, respectively passing through two ends of the two first rod portions along the width direction of the support body, so as to restrict the support body between the two first rod portions; Two first limit members are respectively arranged at one end of the two second rod parts; The two second position-limiting members are rotatably disposed at the other ends of the two second rod portions, respectively, so as to respectively adjust the positions of the two second rod portions between the two ends of the two first rod portions.

5. The gas flow regulating device according to claim 4, characterized in that: Through holes are provided at opposite ends of the two first rod portions to allow the second rod portion to pass through.

6. The gas flow regulating device according to claim 4, characterized in that: The two second position-limiting members are nuts, the two second rod portions are both provided with threaded portions, and the two nuts are respectively threadedly coupled with the two threaded portions; Wherein, when driven by an external force, the two nuts drive the two first rod portions to approach each other, so as to squeeze the gas pipeline along the width direction of the support body, so that the diameter of the gas pipeline is reduced.

7. The gas flow regulating device according to claim 1, characterized in that: The cross section of the support body in a plane perpendicular to the height direction is any one of opposing horseshoes, ellipses, trapezoids and squares.

8. The gas flow regulating device according to claim 1, characterized in that: The support body is made of any one of stainless steel, titanium alloy and nickel alloy.

9. A dilution refrigerator, characterized in that: include: A mixing chamber is provided in which the upper 3 The He-concentrated phase and the lower 3 He dilution phase, the 3 The He-enriched phase is configured to respond to the 3 He dilution phase 3 The concentration of He decreases to 3 He dilution phase compensation 3 He also absorbs surrounding heat to cool; The evaporation chamber and the mixing chamber 3 He dilution is connected, and the evaporation chamber is used to extract 3 He is separated from the dilute phase 3 He steam; Transfer pump set for 3 He vapor is extracted from the evaporation chamber; The gas flow regulating device according to any one of claims 1 to 8 is connected between the transmission pump group and the mixing chamber, and is used to 3 The He vapor is at least partially liquefied to form a 3 and fluid.

10. The dilution refrigerator according to claim 9, characterized in that The gas flow regulating device is detachably connected between the transmission pump group and the mixing chamber.

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