Method and system for determining interference fit distance between cable aluminum sheath and buffer layer

Abstract

The invention discloses a method and a system for determining the interference fit distance between a cable aluminum sheath and a buffer layer. The method comprises the following steps: determining a relation curve between the resistivity of the current buffer layer thickness and the deformation distance; marking a starting point, an end point and a plurality of assumed turning points in the relation curve, and for each assumed turning point, connecting the starting point and the assumed turning point to obtain a first fitting line segment, and connecting the assumed turning point and the end point to obtain a second fitting line segment; acquiring all original point data on the relation curve, and determining an optimal turning point on the relation curve according to all the original point data, the slope of the straight line where the first fitting line segment is located and the slope of the straight line where the second fitting line segment is located; and determining a deformation distance corresponding to the optimal turning point on the relation curve, and determining the deformation distance as the optimal interference fit distance between the aluminum sheath and the buffer layer. The optimal interference fit distance can be determined, and therefore it is guaranteed that the buffer layer has the good absorption capacity for thermal expansion of the XLPE insulating layer, and good conductivity is achieved between the aluminum sheath and the insulating shielding layer.

Description

Technical Field

[0001] The invention relates to the technical field of corrugated aluminum sheathed cables, and in particular to a method and system for determining the interference fit distance between an aluminum sheath of a cable and a buffer layer. Background Art

[0002] In recent years, the poor electrical contact between the metal sheath and the buffer layer of high-voltage corrugated aluminum sheathed cables has led to frequent buffer layer ablation failures. However, the existing corrugated aluminum sheathed cable models ignore the significant deformation characteristics of the buffer layer resistivity when performing electrical-thermal field simulations, resulting in the calculation results of the buffer layer resistivity seriously deviating from the actual working conditions, and there is a lack of research on the interference fit distance of the buffer layer.

[0003] The conductive mechanism of the buffer layer is mainly to achieve the migration of carriers through carbon black fillers. The more carbon black there is per unit thickness, the lower the resistivity of the buffer layer. When the buffer layer is deformed, such as when it is compressed, its thickness decreases, and the amount of carbon black per unit thickness increases. More carbon black can form current channels, thereby reducing the resistivity of the buffer layer.

[0004] Therefore, the deformation distance of the buffer layer will affect the resistivity of the buffer layer, and the larger the deformation distance of the buffer layer, the smaller the resistivity of the buffer layer, that is, the larger the interference fit distance between the buffer layer and the aluminum sheath, the smaller the resistivity of the buffer layer, and thus the conductivity between the aluminum sheath and the insulating shielding layer is better. However, considering the buffer layer's ability to absorb thermal expansion of the XLPE (cross-linked polyethylene) insulation layer during cable operation, specifically, the larger the deformation distance of the buffer layer, the weaker the buffer layer's ability to absorb thermal expansion of the XLPE insulation layer. In order to ensure that the buffer layer has a better absorption capacity for thermal expansion of the XLPE insulation layer, and at the same time ensure better conductivity between the aluminum sheath and the insulating shielding layer, it is necessary to provide a method for determining a suitable interference fit distance between the aluminum sheath and the buffer layer to determine a suitable interference fit distance. Summary of the invention

[0005] The present invention aims to solve the technical problems in the related art at least to a certain extent. To this end, the first object of the present invention is to provide a method for determining the interference fit distance between the cable aluminum sheath and the buffer layer, which method is convenient for determining the appropriate interference fit distance, thereby ensuring that the buffer layer has a good absorption capacity for the thermal expansion of the XLPE insulation layer and ensuring better conductivity between the aluminum sheath and the insulation shielding layer.

[0006] The second object of the present invention is to provide a system for determining the interference fit distance between the cable aluminum sheath and the buffer layer.

[0007] A third object of the present invention is to provide a computer-readable storage medium.

[0008] A fourth object of the present invention is to provide an electronic device.

[0009] To achieve the above object, the present invention is implemented through the following technical solutions:

[0010] A method for determining the interference fit distance between a cable aluminum sheath and a buffer layer, comprising:

[0011] Determine the relationship curve between resistivity and deformation distance of the current buffer layer thickness;

[0012] Marking a starting point, an end point and several assumed turning points in the relationship curve, and for each assumed turning point, connecting the starting point and the assumed turning point to obtain a first fitting line segment, and connecting the assumed turning point and the end point to obtain a second fitting line segment;

[0013] Obtaining all original point data on the relationship curve, and determining the optimal turning point on the relationship curve according to all original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located;

[0014] The deformation distance corresponding to the optimal turning point is determined on the relationship curve, and the deformation distance is determined as the optimal interference fit distance between the aluminum sheath and the buffer layer.

[0015] Preferably, determining the optimal turning point on the relationship curve according to all original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located includes:

[0016] The average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point is calculated according to all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located;

[0017] For each assumed turning point, the average relative error is calculated to obtain the average relative error corresponding to all assumed turning points;

[0018] The assumed turning point corresponding to the minimum average relative error is determined as the optimal turning point.

[0019] Preferably, the average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point is calculated based on all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located, including:

[0020] Acquire the original point data corresponding to the first fitting line segment from all the original point data and record it as the first original point data, wherein all the original point data are located on the relationship curve;

[0021] Determine the slope of the straight line where the first fitting line segment is located according to the coordinate values ​​of the starting point and the assumed turning point;

[0022] Determine the slope of the straight line where the first fitting line segment is located according to the first original point data and the coordinate value of the assumed turning point;

[0023] The slopes of the straight lines where the first fitting line segments are located are made equal by the two methods, so as to solve the ordinates of all the first original point data on the straight line where the first fitting line segments are located;

[0024] Obtaining the ordinates of all first original point data on the relationship curve;

[0025] Calculate the differences between the ordinates of all first original point data on the straight line where the first fitting line segment is located and the relationship curve;

[0026] Acquire the original point data corresponding to the second fitting line segment from all the original point data, and record it as the second original point data;

[0027] Calculate the differences between the ordinates of all the second original point data on the straight line where the second fitting line segment is located and the relationship curve;

[0028] The average relative error corresponding to the assumed turning point is obtained based on the difference between the ordinates of all the original point data on the corresponding fitting line segment and the relationship curve, and the number of the original point data.

[0029] Preferably, before marking the relationship curve, the range of the abscissa of the relationship curve is extrapolated to the entire buffer layer thickness.

[0030] To achieve the above object, the second aspect of the present invention provides a system for determining the interference fit distance between the cable aluminum sheath and the buffer layer, comprising:

[0031] A first determination module is used to determine a relationship curve between the resistivity and deformation distance of the current buffer layer thickness;

[0032] A fitting module, used for marking a starting point, an end point and a plurality of assumed turning points in the relationship curve, and for each assumed turning point, connecting the starting point and the assumed turning point to obtain a first fitting line segment, and connecting the assumed turning point and the end point to obtain a second fitting line segment;

[0033] A second determination module is used to obtain all original point data on the relationship curve, and determine the optimal turning point on the relationship curve according to all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located;

[0034] The third determination module is used to determine the deformation distance corresponding to the optimal turning point on the relationship curve, and determine the deformation distance as the optimal interference fit distance between the aluminum sheath and the buffer layer.

[0035] Preferably, the second determining module is specifically used for:

[0036] The average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point is calculated according to all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located;

[0037] For each assumed turning point, the average relative error is calculated to obtain the average relative error corresponding to all assumed turning points;

[0038] The assumed turning point corresponding to the minimum average relative error is determined as the optimal turning point.

[0039] Preferably, when the second determination module calculates the average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point according to all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located, it is specifically used to:

[0040] Acquire the original point data corresponding to the first fitting line segment from all the original point data and record it as the first original point data, wherein all the original point data are located on the relationship curve;

[0041] Determine the slope of the straight line where the first fitting line segment is located according to the coordinate values ​​of the starting point and the assumed turning point;

[0042] Determine the slope of the straight line where the first fitting line segment is located according to the first original point data and the coordinate value of the assumed turning point;

[0043] The slopes of the straight lines where the first fitting line segments are located are made equal by the two methods, so as to solve the ordinates of all the first original point data on the straight line where the first fitting line segments are located;

[0044] Obtaining the ordinates of all first original point data on the relationship curve;

[0045] Calculate the differences between the ordinates of all first original point data on the straight line where the first fitting line segment is located and the relationship curve;

[0046] Acquire the original point data corresponding to the second fitting line segment from all the original point data, and record it as the second original point data;

[0047] Calculate the differences between the ordinates of all the second original point data on the straight line where the second fitting line segment is located and the relationship curve;

[0048] The average relative error corresponding to the assumed turning point is obtained based on the difference between the ordinates of all the original point data on the corresponding fitting line segment and the relationship curve, and the number of the original point data.

[0049] Preferably, the system further comprises a curve processing module for extrapolating the range of the abscissa of the relationship curve to the entire buffer layer thickness before marking the relationship curve.

[0050] To achieve the above-mentioned purpose, the third aspect of the present invention provides a computer-readable storage medium having a computer program stored thereon, and when the computer program is executed by a processor, the method for determining the interference fit distance between the cable aluminum sheath and the buffer layer as described above is implemented.

[0051] To achieve the above-mentioned purpose, the fourth aspect of the present invention provides an electronic device, including a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the computer program, the method for determining the interference fit distance between the cable aluminum sheath and the buffer layer as described above is implemented.

[0052] The present invention has at least the following technical effects:

[0053] The present invention obtains the optimal interference fit distance between the aluminum sheath and the buffer layer through accurate resistivity and deformation relationship analysis, thereby achieving a more economical and efficient design while meeting the cable strength, durability and other requirements, and avoiding unnecessary costs or performance deficiencies caused by an overly thick or thin buffer layer. Therefore, the present invention provides a selection process for the optimal interference fit distance between the aluminum sheath and the buffer layer, which helps to improve the accuracy, economy and adaptability of cable design, and overcomes the problem of large calculation deviations in traditional methods.

[0054] Additional aspects and advantages of the present invention will be given in part in the following description and in part will be obvious from the following description, or will be learned through practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0055] Figure 1 The present invention is a flowchart of a method for determining the interference fit distance between the cable aluminum sheath and the buffer layer according to an embodiment of the present invention.

[0056] Figure 2(a)-2(c) Schematic diagram of the resistivity and deformation distance relationship curve of 3-layer, 2-layer and 1-layer buffer layer in an embodiment of the present invention.

[0057] Figure 3 Schematic diagram of relationship curve marking according to an embodiment of the present invention.

[0058] Figure 4 The present invention is a structural block diagram of a system for determining the interference fit distance between the cable aluminum sheath and the buffer layer according to an embodiment of the present invention. DETAILED DESCRIPTION

[0059] The present embodiment is described in detail below, and examples of the embodiment are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended to be used to explain the present invention, and should not be construed as limiting the present invention.

[0060] The following describes the method and system for determining the interference fit distance between the cable aluminum sheath and the buffer layer of this embodiment with reference to the accompanying drawings.

[0061] Figure 1 Flow chart of the method for determining the interference fit distance between the cable aluminum sheath and the buffer layer according to an embodiment of the present invention. Figure 1 As shown, the method includes:

[0062] Step S101: determining a relationship curve between the resistivity and deformation distance of the current buffer layer thickness.

[0063] Step S102: Mark the starting point, the end point and several assumed turning points in the relationship curve, and for each assumed turning point, connect the starting point and the assumed turning point to obtain a first fitting line segment, and connect the assumed turning point and the end point to obtain a second fitting line segment.

[0064] It should be noted that before marking the relationship curve, the range of the abscissa of the relationship curve is extrapolated to the entire buffer layer thickness.

[0065] Step S103: Acquire all original point data on the relationship curve, and determine the optimal turning point on the relationship curve according to all original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located.

[0066] The optimal turning point on the relationship curve is determined according to all original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located, including: calculating the average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point according to all original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located; calculating the average relative error for each assumed turning point to obtain the average relative errors corresponding to all assumed turning points; and determining the assumed turning point corresponding to the minimum average relative error as the optimal turning point.

[0067] In this embodiment, the average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point is calculated based on all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located, including:

[0068] The original point data corresponding to the first fitting line segment are obtained from all the original point data and recorded as the first original point data, and all the original point data are located on the relationship curve; the slope of the straight line where the first fitting line segment is located is determined according to the coordinate values ​​of the starting point and the assumed turning point; the slope of the straight line where the first fitting line segment is located is determined according to the coordinate values ​​of the first original point data and the assumed turning point; the slopes of the straight line where the first fitting line segment is located obtained by the two methods are equal to solve the ordinates of all the first original point data on the straight line where the first fitting line segment is located; the ordinates of all the first original point data on the relationship curve are obtained; the difference between the ordinates of all the first original point data on the straight line where the first fitting line segment is located and the relationship curve is calculated; the original point data corresponding to the second fitting line segment are obtained from all the original point data and recorded as the second original point data; the difference between the ordinates of all the second original point data on the straight line where the second fitting line segment is located and the relationship curve is calculated; based on the difference between the ordinates of all the original point data on the corresponding fitting line segment and the relationship curve, and the number of original point data, the average relative error corresponding to the assumed turning point is obtained.

[0069] Step S104: determining the deformation distance corresponding to the optimal turning point on the relationship curve, and determining the deformation distance as the optimal interference fit distance between the aluminum sheath and the buffer layer.

[0070] In order to enable those skilled in the art to clearly understand the method for determining the interference fit distance between the cable aluminum sheath and the buffer layer of this embodiment, the method is described in detail below.

[0071] Before determining the relationship curve between the resistivity and deformation distance of the current buffer layer thickness, a buffer layer resistivity deformation characteristic experiment is conducted on high-voltage cables with different buffer layer thicknesses to obtain the relationship curve between the resistivity and deformation distance of different buffer layer thicknesses and analyze them. When conducting the buffer layer resistivity deformation characteristic experiment on high-voltage cables with different buffer layer thicknesses, high-voltage cables with 1, 2 and 3 buffer layer layers are used for the experiment, and the buffer layer uses polyester fiber cloth with carbon powder.

[0072] The buffer layer resistivity deformation characteristic test platform includes a press, a height gauge and a multimeter, and the measurement accuracy of the height gauge is 0.02mm. The size of the semi-conductive buffer water-blocking tape sample used in the experiment is 70mm×70mm×2mm. The buffer layer in the actual high-voltage cable is often wrapped with multiple layers, so the number of buffer layers is set to 1, 2 and 3 layers respectively. Before the experiment, the buffer layer sample was dried at 45℃ for 6h. After taking it out, the experiment was carried out as soon as possible to avoid the buffer layer from getting wet. The room temperature during the experiment was 20℃. The conductive performance of the buffer layer is completed by the carbon powder in the polyester fiber cloth. The temperature coefficient of carbon at 20℃ is only -0.0005. The resistivity of the buffer layer changes by only 1.25% between the drying temperature and the experimental temperature. Therefore, the influence of temperature on the resistivity test results is ignored. The measured cable uses 2 layers of buffer layer. Through the measurement of the four end faces of the two sections of cable, the thickness of the buffer layer after compression is about 2mm, so the deformation distance of the 1st, 2nd and 3rd buffer layers is set to at least 1mm, 2mm and 3mm respectively. Before the experiment, the test circuit was connected, the height gauge was installed and its reading was recorded. During the experiment, the resistance value was recorded every 0.02 mm of deformation distance, and the resistivity was calculated based on the cross-sectional area and thickness of the buffer layer. Each group of experiments was repeated three times.

[0073] The experimentally obtained resistivity and deformation distance curves of 3-layer, 2-layer and 1-layer buffer layers are shown in Figure 2(a) , 2(b) and 2(c). Figure 2(a)-2(c) It can be seen that the resistivity of the buffer layer decreases with the increase of deformation distance, and the speed of decrease is fast at first and then slows down. The error between repeated experimental results also decreases with the increase of deformation distance. At the same time, when the deformation distance is between 0 and 1 mm, the resistivity of the buffer layer has an obvious turning point.

[0074] Through the test, the relationship curve between the resistivity of the buffer layer and the deformation distance was obtained. It can be found that with the increase of the deformation distance, the resistivity of the buffer layer continues to decrease, and there is an obvious turning point. Before the turning point, the resistivity of the buffer layer decreases rapidly, but the resistivity value is large, and it is difficult to ensure good electrical contact between the aluminum sheath and the insulation shield; after the turning point, the resistivity decrease rate of the buffer layer slows down. Therefore, the deformation distance corresponding to this turning point can be used as a criterion for judging whether the buffer layer plays a role in maintaining good electrical contact between the metal sheath and the insulation shield, so the deformation distance corresponding to the turning point should be the optimal interference fit distance between the aluminum sheath and the buffer layer. It should be noted that the turning point should be on the relationship curve to ensure that its horizontal and vertical coordinates have physical meaning.

[0075] Taking the resistivity and deformation distance relationship curve of two buffer layers as an example, that is, taking the relationship curve of Figure 2(b) as an example, the method for determining the interference fit distance between the cable aluminum sheath and the buffer layer of this embodiment is described as follows.

[0076] The selection of turning points through manual observation will be interfered by subjective factors, and the reliability and repeatability are poor. Figure 3 As shown, the starting point A, the end point C and several assumed turning points B can be marked on the relationship curve. The relationship curve changes approximately linearly on both sides of the turning point B. Therefore, when the relationship curve is linearly fitted with two secant lines through the two end points A and C of the relationship curve and the line connecting any point on the relationship curve, the fitting effect using the turning point B should be the best. This embodiment proposes a method for determining this turning point. First, it is assumed that any point on the relationship curve between the resistivity of the buffer layer and the deformation distance is a turning point, that is, an assumed turning point. Then, it is connected with the two end points of the relationship curve to obtain two secant lines of the relationship curve, that is, the first fitting line segment AB and the second fitting line segment BC. The mean relative error (Mean Relative Error, MRE) of the resistivity on each original point data and the two fitting line segments AB and BC is calculated and recorded. The point B with the smallest mean relative error is the optimal turning point. In order to avoid the influence of the unmeasured data on the left and right sides of the relationship curve on the determination of the optimal turning point due to equipment limitations, it is first necessary to extrapolate the relationship curve to the entire buffer layer thickness, and then select the optimal turning point.

[0077] In this embodiment, the method for calculating the average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point based on all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located is as follows:

[0078]

[0079] Among them, x c，1 is the horizontal coordinate of the starting point A, y c，1 is the ordinate of the starting point A, x c，i is the horizontal coordinate of the i-th assumed turning point B on the relationship curve, y c，i is the ordinate of the i-th assumed turning point B on the relationship curve, and the slope of the straight line where the first fitting line segment AB is located can be determined according to the coordinate values ​​of the starting point and the assumed turning point.

[0080] x n is the horizontal coordinate of any point on the relationship curve, i.e., the original point data, y l.1 is the horizontal coordinate x on the straight line where the first fitting line segment AB is located n The vertical coordinate value of the formula (1) is n is located on the left side of the i-th assumed turning point B, so x at this time n Belongs to the first original point data. Therefore, the slope of the straight line where the first fitting line segment is located can also be determined according to the coordinate value of the first original point data and the assumed turning point B. By making the two equal, the upper half of formula (1) can be obtained.

[0081] Similarly, x c.end is the horizontal coordinate of the end point C on the relationship curve, y c.end is the ordinate of point C on the relationship curve, y l.2 is the horizontal coordinate x on the straight line where the second fitting line segment BC is located n At this time, the lower part of formula (1), x n is located to the right of the i-th assumed turning point B, so x at this time n Belongs to the second original point data. Therefore, the slope of the straight line where the second fitting line segment is located can be determined according to the coordinate value of the second original point data and the assumed turning point B. At the same time, the slope of the straight line where the second fitting line segment is located can also be determined according to the coordinate value of the assumed turning point B and the end point. Let the two be equal, and the lower half of the equation of formula (1) can be obtained.

[0082] Therefore, we can solve formula (1) to get y l.1 ,y l.2 , that is, to solve and obtain the ordinate values ​​of the original point data on the relationship curve on the straight lines where the two fitting line segments are located.

[0083] Further, compare it with the horizontal coordinate x of all the original point data on the relationship curve n The ordinate value of is obtained by subtracting the ordinate value of , and then the average relative error of the resistivity of the i-th assumed turning point B is obtained based on the ordinate difference of all the original point data, as follows:

[0084] In getting y l.1 ,y l.2 After that, we get the function value combination y of the two fitting segments at the original point data. l .

[0085] Then the average relative error of the resistivity of the i-th assumed turning point B is obtained as follows:

[0086]

[0087] Among them, y l.1 Includes the ordinate values ​​of all the first original point data on the straight line where the first fitting line segment is located, y l.2 It includes the ordinate values ​​of all the second original point data on the straight line where the second fitting line segment is located, and both parameters are vectors.

[0088] Among them, y n.j is the ordinate value of the jth original point data on the relationship curve. So when calculating, you need to l Find the ordinate value of the jth original point data on the straight line corresponding to the fitted line segment, and then subtract y n.j, the ordinate difference of the jth original point data is obtained, and the mean relative error MRE of the resistivity of the i-th assumed turning point B is calculated based on the ordinate difference of all the original point data and the number of original point data n.

[0089] Furthermore, the average relative errors of all assumed turning points B are calculated, and then the assumed turning point B corresponding to the minimum average relative error is found, and the assumed turning point B corresponding to the minimum average relative error is taken as the optimal turning point.

[0090] Afterwards, the deformation distance corresponding to the optimal turning point is found on the resistivity and deformation distance relationship curve of the current buffer layer thickness, and the deformation distance is used as the optimal interference fit distance between the aluminum sheath and the buffer layer to be determined.

[0091] Therefore, when designing the cable, by designing the optimal interference fit distance, it can be ensured that the buffer layer has a better ability to absorb the thermal expansion of the XLPE insulation layer, and that there is better conductivity between the aluminum sheath and the insulating shielding layer. This allows the designed cable to meet the requirements of cable strength, durability, etc. while meeting more economical and efficient design requirements, thereby avoiding unnecessary costs or performance deficiencies caused by excessively thick or thin buffer layers.

[0092] Furthermore, the present invention also provides a system for determining the interference fit distance between the cable aluminum sheath and the buffer layer, such as Figure 4 As shown, the system for determining the interference fit distance between the cable aluminum sheath and the buffer layer includes a first determining module, a fitting module, a second determining module and a third determining module which are connected in sequence.

[0093] Among them, the first determination module is used to determine the relationship curve between the resistivity and deformation distance of the current buffer layer thickness; the fitting module is used to mark the starting point, the end point and several assumed turning points in the relationship curve, and for each assumed turning point, the starting point and the assumed turning point are connected to obtain the first fitting line segment, and the assumed turning point and the end point are connected to obtain the second fitting line segment; the second determination module is used to obtain all the original point data on the relationship curve, and determine the optimal turning point on the relationship curve according to all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located; the third determination module is used to determine the deformation distance corresponding to the optimal turning point on the relationship curve, and determine the deformation distance as the optimal interference fit distance between the aluminum sheath and the buffer layer.

[0094] In one embodiment of the present invention, the second determination module is specifically used to: calculate the average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point based on all original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located; calculate the average relative error for each assumed turning point to obtain the average relative error corresponding to all assumed turning points; and determine the assumed turning point corresponding to the minimum average relative error as the optimal turning point.

[0095] In one embodiment of the present invention, when the second determination module calculates the average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point according to all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located, it is specifically used to:

[0096] The original point data corresponding to the first fitting line segment are obtained from all the original point data and recorded as the first original point data, and all the original point data are located on the relationship curve; the slope of the straight line where the first fitting line segment is located is determined according to the coordinate values ​​of the starting point and the assumed turning point; the slope of the straight line where the first fitting line segment is located is determined according to the coordinate values ​​of the first original point data and the assumed turning point; the slopes of the straight line where the first fitting line segment is located obtained by the two methods are equal to solve the ordinates of all the first original point data on the straight line where the first fitting line segment is located; the ordinates of all the first original point data on the relationship curve are obtained; the difference between the ordinates of all the first original point data on the straight line where the first fitting line segment is located and the relationship curve is calculated; the original point data corresponding to the second fitting line segment are obtained from all the original point data and recorded as the second original point data; the difference between the ordinates of all the second original point data on the straight line where the second fitting line segment is located and the relationship curve is calculated; based on the difference between the ordinates of all the original point data on the corresponding fitting line segment and the relationship curve, and the number of original point data, the average relative error corresponding to the assumed turning point is obtained.

[0097] In one embodiment of the present invention, the system further comprises a curve processing module for extrapolating the range of the abscissa of the relationship curve to the entire buffer layer thickness before marking the relationship curve.

[0098] It should be noted that the specific implementation of the system for determining the interference fit distance between the cable aluminum sheath and the buffer layer of this embodiment can refer to the specific implementation of the method for determining the interference fit distance between the cable aluminum sheath and the buffer layer mentioned above. To avoid redundancy, it will not be repeated here.

[0099] Furthermore, the present invention also provides a computer-readable storage medium having a computer program stored thereon, and when the computer program is executed by a processor, the above-mentioned method for determining the interference fit distance between the cable aluminum sheath and the buffer layer is implemented.

[0100] Furthermore, the present invention also provides an electronic device, including a memory, a processor, and a computer program stored in the memory and executable on the processor. When the processor executes the computer program, the method for determining the interference fit distance between the cable aluminum sheath and the buffer layer is implemented.

[0101] In summary, the present invention obtains the optimal interference fit distance between the aluminum sheath and the buffer layer through accurate resistivity and deformation relationship analysis, so that a more economical and efficient design can be achieved while meeting the requirements of cable strength and durability, avoiding unnecessary costs or insufficient performance caused by an overly thick or thin buffer layer. Therefore, the present invention provides a selection process for the optimal interference fit distance between the aluminum sheath and the buffer layer, which helps to improve the accuracy, economy and adaptability of cable design, and overcomes the problem of large calculation deviation of traditional methods.

[0102] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprise a ..." do not exclude the existence of other identical elements in the process, method, article or device including the elements.

[0103] Although the content of the present invention has been described in detail through the above preferred embodiments, it should be appreciated that the above description should not be considered as a limitation of the present invention. After reading the above content, it will be apparent to those skilled in the art that various modifications and substitutions of the present invention will occur. Therefore, the protection scope of the present invention should be limited by the appended claims.

Claims

1. A method for determining the interference fit distance between a cable aluminum sheath and a buffer layer, characterized in that: Determine the relationship curve between resistivity and deformation distance of the current buffer layer thickness; Marking a starting point, an end point and several assumed turning points in the relationship curve, and for each assumed turning point, connecting the starting point and the assumed turning point to obtain a first fitting line segment, and connecting the assumed turning point and the end point to obtain a second fitting line segment; Obtaining all original point data on the relationship curve, and determining the optimal turning point on the relationship curve according to all original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located; The deformation distance corresponding to the optimal turning point is determined on the relationship curve, and the deformation distance is determined as the optimal interference fit distance between the aluminum sheath and the buffer layer.

2. The method for determining the interference fit distance between the cable aluminum sheath and the buffer layer according to claim 1, characterized in that: The optimal turning point on the relationship curve is determined according to all original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located, including: The average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point is calculated according to all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located; For each assumed turning point, the average relative error is calculated to obtain the average relative error corresponding to all assumed turning points; The assumed turning point corresponding to the minimum average relative error is determined as the optimal turning point.

3. The method for determining the interference fit distance between the cable aluminum sheath and the buffer layer according to claim 2, characterized in that: The average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point is calculated based on all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located, including: Acquire the original point data corresponding to the first fitting line segment from all the original point data and record it as the first original point data, wherein all the original point data are located on the relationship curve; Determine the slope of the straight line where the first fitting line segment is located according to the coordinate values ​​of the starting point and the assumed turning point; Determine the slope of the straight line where the first fitting line segment is located according to the first original point data and the coordinate value of the assumed turning point; The slopes of the straight lines where the first fitting line segments are located are made equal by the two methods, so as to solve the ordinates of all the first original point data on the straight line where the first fitting line segments are located; Obtaining the ordinates of all first original point data on the relationship curve; Calculate the differences between the ordinates of all first original point data on the straight line where the first fitting line segment is located and the relationship curve; Acquire the original point data corresponding to the second fitting line segment from all the original point data, and record it as the second original point data; Calculate the differences between the ordinates of all the second original point data on the straight line where the second fitting line segment is located and the relationship curve; The average relative error corresponding to the assumed turning point is obtained based on the difference between the ordinates of all the original point data on the corresponding fitting line segment and the relationship curve, and the number of the original point data.

4. The method for determining the interference fit distance between the cable aluminum sheath and the buffer layer according to claim 1, characterized in that: Before marking the relationship curve, the range of the abscissa of the relationship curve is extrapolated to the entire buffer layer thickness.

5. A system for determining the interference fit distance between the cable aluminum sheath and the buffer layer, characterized in that: include: A first determination module is used to determine a relationship curve between the resistivity and deformation distance of the current buffer layer thickness; A fitting module, used for marking a starting point, an end point and a plurality of assumed turning points in the relationship curve, and for each assumed turning point, connecting the starting point and the assumed turning point to obtain a first fitting line segment, and connecting the assumed turning point and the end point to obtain a second fitting line segment; A second determination module is used to obtain all original point data on the relationship curve, and determine the optimal turning point on the relationship curve according to all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located; The third determination module is used to determine the deformation distance corresponding to the optimal turning point on the relationship curve, and determine the deformation distance as the optimal interference fit distance between the aluminum sheath and the buffer layer.

6. The system for determining the interference fit distance between the cable aluminum sheath and the buffer layer according to claim 5, characterized in that: The second determination module is specifically used for: The average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point is calculated according to all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located; For each assumed turning point, the average relative error is calculated to obtain the average relative error corresponding to all assumed turning points; The assumed turning point corresponding to the minimum average relative error is determined as the optimal turning point.

7. The system for determining the interference fit distance between the cable aluminum sheath and the buffer layer according to claim 6, characterized in that: The second determination module is specifically used to calculate the average relative error of the resistivity from the starting point to the assumed turning point and from the assumed turning point to the end point according to all the original point data, the slope of the straight line where the first fitting line segment is located, and the slope of the straight line where the second fitting line segment is located: Acquire the original point data corresponding to the first fitting line segment from all the original point data and record it as the first original point data, wherein all the original point data are located on the relationship curve; Determine the slope of the straight line where the first fitting line segment is located according to the coordinate values ​​of the starting point and the assumed turning point; Determine the slope of the straight line where the first fitting line segment is located according to the first original point data and the coordinate value of the assumed turning point; The slopes of the straight lines where the first fitting line segments are located are made equal by the two methods, so as to solve the ordinates of all the first original point data on the straight line where the first fitting line segments are located; Obtaining the ordinates of all first original point data on the relationship curve; Calculate the differences between the ordinates of all first original point data on the straight line where the first fitting line segment is located and the relationship curve; Acquire the original point data corresponding to the second fitting line segment from all the original point data, and record it as the second original point data; Calculate the differences between the ordinates of all the second original point data on the straight line where the second fitting line segment is located and the relationship curve; The average relative error corresponding to the assumed turning point is obtained based on the difference between the ordinates of all the original point data on the corresponding fitting line segment and the relationship curve, and the number of the original point data.

8. The system for determining the interference fit distance between the cable aluminum sheath and the buffer layer according to claim 5, characterized in that: It also includes a curve processing module, which is used to extrapolate the range of the horizontal coordinate of the relationship curve to the entire buffer layer thickness before marking the relationship curve.

9. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the method for determining the interference fit distance between the cable aluminum sheath and the buffer layer as described in any one of claims 1 to 4 is implemented.

10. An electronic device comprising a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein: When the processor executes the computer program, the method for determining the interference fit distance between the cable aluminum sheath and the buffer layer according to any one of claims 1 to 4 is implemented.

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