Preparation method of Mo2CTx / Mo9O26 quantum dot heterostructure electrode material
The small layer of Mo2CTx MXene prepared by hydrochloric acid etching method and ultrasonic-assisted pre-intercalation treatment was carried out, and converted into Mo9O26 quantum dots through oxidation to form a Mo2CTx/Mo9O26 quantum dot heterostructure, which solved the problem of lower specific capacity and re-stack of the MXenes electrode material, and significantly improved the cyclic stability and rate performance.
Patent Information
- Application Number
- CN202510175131.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-02-18
- Publication Date
- 2025-05-16
- Estimated Expiration
- 2045-02-18
AI Technical Summary
The specific capacity of the existing MXenes electrode materials is relatively low, and re-stacking is prone to occur during charging and discharging, resulting in poor rate performance and rapid attenuation of specific capacity.
Multi-layer Mo2CTx MXene was prepared by hydrochloric acid etching method, and pre-intercalation was performed through ultrasonic assisted method to expand the layer spacing. Then, some of the few-layer Mo2CTx MXene was ultrasonic broken and oxidized and converted into Mo9O26 quantum dots to form a small-layer Mo2CTx/Mo9O26 quantum dot heterostructure.
The transportation and storage space of electrolyte Li+ is significantly expanded, the re-stack of Mo2CTx MXene is suppressed, the charge storage site is improved, the cycle stability and rate performance is significantly improved, and the reversible charge and discharge with high specific capacity is achieved.
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Abstract
Citation Information
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