Wavelength scanning type display inspection device

Abstract

The invention relates to a wavelength scanning type display inspection device. The wavelength scanning type display inspection apparatus according to one embodiment of the present invention comprises: a display sample having one or more layers; a light irradiation unit that irradiates light to the display sample such that the light is incident on a two-dimensional region in a surface of the display sample; a filter wheel having a plurality of filters for converting reflected light reflected from the display sample into wavelength reflected light having a corresponding wavelength, respectively; a driving unit that rotates the filter wheel; a light splitting unit for measuring the spectrum of the wavelength reflected light; and a control unit that controls the driving unit to change the filter through which the reflected light passes, and determines a thickness of each of the one or more layers on the basis of a spectrum of the two-dimensional region on a plurality of wavelengths depending on the change of the filter.

Description

Technical Field

[0001] The present invention relates to a wavelength scanning display inspection device, and specifically, to a wavelength scanning display inspection device for inspecting thin films of displays such as organic light emitting diodes (OLED; Organic Light Emitting Diode; Quantum dot Light Emitting Diode) and quantum dot light emitting diodes (QLED) manufactured by inkjet printing. Background Art

[0002] In recent years, as displays have been widely used in mobile phones, computers, automobiles, etc., there is a growing demand for display inspection equipment that can quickly inspect thin films that constitute displays during the process of manufacturing displays.

[0003] Figure 1a is a front view for explaining ellipsometry used in a thin film thickness measuring device according to the prior art, Figure 1b This is a perspective view for explaining the problems of ellipsometry used in a conventional thin film thickness measuring apparatus.

[0004] Reference Figure 1a In the ellipsometry method used in the prior art thin film thickness measuring apparatus, a light source 10 is used to irradiate a light ray L onto the surface of a thin film sample S' so that the light ray L makes a predetermined angle θ with the normal line (V) of the surface of the thin film sample S' when incident, and a reflected light Lr reflected from the thin film sample S' is detected by a detector 20. The thickness S' of the thin film sample is measured based on the spectrum of the reflected light Lr received in this manner.

[0005] Reference Figure 1b For this ellipsometry method, when it is used to measure the thickness of the thin film TL of the sub-pixel RSP of a display sample S such as OLED or QLED manufactured using inkjet printing, there is a problem that the light L irradiated by the light source 10 is blocked by the partition wall B1 (also called the pixel defining layer (PDL)), or even if the light L is incident on the thin film TL of the pixel P and is reflected, the reflected light is blocked by the partition wall B2, so it is difficult to check the thickness of the thin film of the display sample S.

[0006] In addition, contact-type thickness measurement inspection devices such as atomic force microscopes (AFM), scanning probe microscopes (SPM), scanning tunneling microscopes (STM), or surface profilers require a long measurement time, so real-time inspection is impossible and there is a problem of film damage.

[0007] As a prior art patent document 1, Korean authorized patent publication No. 10-2531420 discloses "display inspection device and display inspection method". Patent document 1 shows that the prediction of film thickness can be further improved by using machine learning technology. However, the display inspection device uses a line scan method. That is, only information about the line can be measured, and since the image information about the two-dimensional area is constructed by scanning the line, there is a problem of increased measurement time.

[0008] Prior art literature

[0009] Patent Literature

[0010] (Patent Document 1) Korean Patent Publication No. 10-2531420 Summary of the invention

[0011] Technical issues solved

[0012] An object of the present invention is to provide a wavelength scanning display inspection device capable of quickly measuring the thickness of a thin film of a display sample at the nanometer level.

[0013] Another object of the present invention is to provide a wavelength scanning display inspection device that can predict the thickness of each OLED and QLED device produced by inkjet printing through a single measurement, and can determine defects caused by thickness non-uniformity and improve defects through feedback about thickness non-uniformity.

[0014] Another object of the present invention is to provide a wavelength scanning display inspection device that can not only reduce the measurement time but also minimize the prediction error of each thickness.

[0015] Workaround

[0016] In order to achieve the above-mentioned purpose, a wavelength scanning display inspection device according to the first feature of an embodiment of the present invention includes: a display sample having one or more layers; a light irradiation unit, irradiating light to the display sample so that the light is incident on a two-dimensional area on the surface of the display sample; a filter wheel, having a plurality of filters, for converting reflected light reflected from the display sample into wavelength reflected light having corresponding wavelengths, respectively; a driving unit, rotating the filter wheel; a spectroscopic unit, measuring the spectrum of the wavelength reflected light; and a control unit, controlling the driving unit to change the filter for the reflected light to pass through, and determining the thickness of each of the one or more layers based on the spectrum of the two-dimensional area at a plurality of wavelengths depending on the change of the filter.

[0017] In the wavelength scanning display inspection apparatus according to the first feature, the control unit may determine the thickness of each of the one or more layers using artificial intelligence.

[0018] In the wavelength scanning display inspection device according to the first feature, the artificial intelligence may include one or more of random forest, Gaussian process regression and deep learning neural network.

[0019] According to the second feature of one embodiment of the present invention, a wavelength scanning display inspection device includes: a display sample having one or more layers; a light irradiation unit, which irradiates light to the display sample so that the light is incident on a two-dimensional area on the surface of the display sample, and includes a light source that generates the light; a spectroscopic unit, which measures the spectrum of reflected light formed by the light being reflected by the display sample; and a control unit, which controls the light source to change the wavelength of the light and determines the thickness of each of the one or more layers based on the spectrum of the two-dimensional area at multiple wavelengths depending on the change in the wavelength of the light.

[0020] In the wavelength scanning display inspection apparatus according to the second feature, the control unit may determine the thickness of each of the one or more layers using artificial intelligence.

[0021] In the wavelength scanning display inspection device according to the second feature, the artificial intelligence may include one or more of random forest, Gaussian process regression and deep learning neural network.

[0022] Beneficial Effects

[0023] By using the wavelength scanning display inspection device according to an embodiment of the present invention, the following effects are achieved.

[0024] 1. Capable of quickly measuring the thickness of thin films of display samples at the nanometer level.

[0025] 2. The thickness of each of OLED and QLED devices fabricated by inkjet printing can be predicted through a single measurement, and defects due to thickness non-uniformity can be determined and improved through feedback on the thickness non-uniformity.

[0026] 3. It can not only reduce the measurement time, but also minimize the prediction error of each thickness. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Hereinafter, preferred embodiments of the wavelength scanning display inspection device according to the present invention will be described in detail with reference to the accompanying drawings.

[0028] Figure 1a is a front view for explaining ellipsometry used in a thin film thickness measuring apparatus according to the prior art.

[0029] Figure 1b This is a perspective view for explaining the problems of ellipsometry used in a conventional thin film thickness measuring apparatus.

[0030] Figure 2 4 is a front view of a wavelength scanning display inspection device according to an embodiment of the present invention.

[0031] Figure 3 This is a conceptual diagram for explaining a wavelength scanning display inspection device according to an embodiment of the present invention.

[0032] Figure 4 It is a conceptual diagram for explaining a line scanning display inspection device according to a comparative example.

[0033] Figure 5 and Figure 6 is a plan view of a display sample, used to illustrate the two-dimensional area of ​​the display sample.

[0034] Figure 7 is a cross-sectional view of a pixel of a display sample.

[0035] Figure 8 : is a graph showing the relationship between the number of filters and the relative error when the thickness of each layer of a display sample is simulated measured by a wavelength scanning display inspection apparatus according to an embodiment of the present invention.

[0036] Fig. 9 : is a graph showing the relationship between the number of estimators and the relative error in simulating the thickness measurement of each layer of a display sample by a wavelength scanning display inspection apparatus according to an embodiment of the present invention.

[0037] Fig.10 1 is a front view of a wavelength scanning display inspection device according to a modified example of an embodiment of the present invention.

[0038] Fig.11 is a graph showing the relationship between the actual layer thickness and the predicted layer thickness as a result of actually inspecting the layer thickness of a display sample having a single layer by a wavelength scanning display inspection apparatus according to a modified example of an embodiment of the present invention.

[0039] Fig.12 and Fig.13 A graph showing the relationship between actual layer thickness and predicted layer thickness as a result of actually inspecting the thickness of each layer of a display sample having two layers by a wavelength scanning display inspection apparatus according to a modified example of an embodiment of the present invention.

[0040] Description of Reference Numerals

[0041] 10: Light source 20: Detector

[0042] 100': Line scan display inspection device

[0043] 100: Wavelength scanning display inspection device

[0044] 110: light irradiation unit 111: light source

[0045] 112: beam splitter 113a~113c: lens

[0046] 120: Spectroscopic unit 130: Filter wheel

[0047] 140: drive unit 150: control unit

[0048] 160: Storage unit F: Filter

[0049] S': Film sample S: Display sample

[0050] SP: Support unit SR: Surface

[0051] L: light Lr: reflected light

[0052] Lrw: wavelength of reflected light AR: two-dimensional area

[0053] L1~Lk: Layer P: Pixel

[0054] B, B1~B4: Partition wall TL: Film DETAILED DESCRIPTION

[0055] Hereinafter, preferred embodiments of the wavelength scanning display inspection device according to the present invention will be described in detail with reference to the accompanying drawings.

[0056] Figure 2 is a front view of a wavelength scanning display inspection device according to an embodiment of the present invention, Figure 3is a conceptual diagram for explaining a wavelength scanning display inspection device according to an embodiment of the present invention, and Figure 4 It is a conceptual diagram for explaining a line scanning display inspection device according to a comparative example.

[0057] Figure 5 and Figure 6 is a plan view of a display sample for illustrating a two-dimensional area of ​​the display sample, and Figure 7 is a cross-sectional view of a pixel of a display sample.

[0058] refer to Figures 2 to 6 , a wavelength scanning display inspection device 100 according to an embodiment of the present invention will be described.

[0059] The wavelength scanning display inspection device 100 includes a display sample S, a light irradiation unit 110 , a filter wheel 130 , a driving unit 140 , a spectroscopic unit 120 , and a control unit 150 . The wavelength scanning display inspection device 100 may further include a storage unit 160 .

[0060] The display sample S has one or more layers L1 to Lk (see Figure 7 ; hereinafter also referred to as "thin film"). The number of the one or more layers L1 to Lk may be 1 or more and 10 or less. The display sample S may include one or more of OLED and QLED.

[0061] The light irradiation unit 110 irradiates the display sample S with light L so that the light L is incident on a two-dimensional area AR in a surface SR of the display sample S.

[0062] For example, refer to Figure 5 and Figure 6 , the two-dimensional area AR may represent “an area where a plurality of pixels P are arranged along a first direction D1 and a plurality of pixels P are arranged along a second direction D2 orthogonal to the first direction D1”. The structure where “a plurality of pixels P are arranged along the first direction D1” includes not only Figure 5 The structure of "the pixels P adjacent to each other are arranged in a row along the first direction D1" may also include Figure 6 The structure of "pixels P facing each other are arranged in a row along the first direction D1 with a row of pixels P in between" is shown. Similarly, the structure of "a plurality of pixels P are arranged along the second direction D2" includes not only the structure of "pixels P adjacent to each other are arranged in a row along the second direction D2", but also the structure of "pixels P facing each other are arranged in a row along the second direction D2 with a row of pixels P in between".

[0063] In this specification, “pixel P” means “a portion corresponding to one or more layers L1 to Lk surrounded by partition walls B when viewed in a direction perpendicular to a surface SR of the display sample S”. Each pixel P may emit light corresponding to one color of red, green, and blue.

[0064] For example, refer to Figure 2 The surface SR of the display sample S may be supported by a support unit SP. The support unit SP may be a glass substrate.

[0065] The support unit SP may support the entire surface SR of the display sample S, and the light L may be irradiated to the surface SR of the display sample S via the support unit SP. However, not limited thereto, the support unit SP may also support only the edge of the surface SR of the display sample S, and the light L may be directly irradiated to the remaining portion of the surface SR of the display sample S except for the edge. Figure 3 As shown, the light L may also be irradiated to the surface SR of the display sample S located on the opposite side of the support unit SP.

[0066] The light irradiation unit 110 may include a light source 111, a beam splitter 112, and a first lens 113a. The light irradiation unit 110 may further include one or more of a second lens 113b and a third lens 113c. The light source 111 generates light L. The beam splitter 112 reflects the light L emitted from the light source 111 toward the display sample S. The first lens 113a converges the light L reflected from the beam splitter 112 so that the light L is incident on the surface SR of the display sample S. The second lens 113b converges the wavelength reflected light Lrw so that the wavelength reflected light Lrw is incident on the light splitting unit 120.

[0067] The filter wheel 130 is a wheel having a plurality of filters F. Each of the plurality of filters F converts reflected light Lr resulting from the light L being reflected by the display sample S into reflected light Lrw of a corresponding wavelength.

[0068] The driving unit 140 rotates the filter wheel 130. For example, the driving unit 140 may be implemented by a motor.

[0069] The spectroscopic unit 120 measures the spectrum of the wavelength reflected light Lrw. For example, the spectroscopic unit 120 can measure the spectrum of the wavelength reflected light Lrw included in the ultraviolet range to the visible light range. For example, the spectroscopic unit 120 can measure the spectrum of the wavelength reflected light Lrw included in the wavelength range of 100nm to 1000nm. The spectroscopic unit 120 can be implemented as a charge coupled device (CCD; Charge-Coupled Device) or a complementary metal oxide semiconductor (CMOS; Complementary Metal-Oxide Semiconductor) camera.

[0070] The control unit 150 controls the driving unit 140 to change the filter F through which the reflected light Lr passes. The control unit 150 determines the thickness of each of the one or more layers L1 to Lk based on the spectrum of the two-dimensional area AR at multiple wavelengths depending on the change of the filter F. The number of the multiple wavelengths may be 2 or more and 20 or less.

[0071] The control unit 150 may use artificial intelligence to determine the thickness of each of the one or more layers L1 to Lk. The artificial intelligence may include one or more of random forest, Gaussian process regression, and deep learning neural network.

[0072] The storage unit 160 may store an artificial intelligence model (artificial intelligence program).

[0073] Reference Figure 4 According to the comparative example, the line scanning display inspection device 100' acquires reflectivity information about a line (one-dimensional) through the slit SL, and then performs light separation using a prism P or a grating. By this, information about the wavelength along the λ axis and the actual x size along the x axis can be obtained, such as Figure 4 As shown in the upper part of . In order to obtain information about the y-axis (expanding from one dimension to two dimensions), it is necessary to move the display sample S in the y-axis direction, that is, scan. In this process, the information acquisition speed depends on the scanning speed, so the information acquisition speed is usually slow.

[0074] In contrast, the wavelength scanning display inspection device 100 according to an embodiment of the present invention includes a filter wheel 130 having a plurality of filters F that convert the reflected light Lr into wavelength reflected light Lrw having corresponding wavelengths. When the filter wheel 130 rotates, the reflectivity can be measured using the wavelength of the corresponding filter F. That is, for the wavelength reflected light Lrw into which the reflected light Lr is converted, the number of wavelengths is determined by the number of filters F. Therefore, the spectral spectrum of the wavelength scanning display inspection device 100 is not continuous like the line scanning method, so the amount of spectral information is reduced. However, compared to the line scanning method, the wavelength scanning display inspection device 100 only needs to rotate the filter wheel 130 to perform the measurement, so the spectral information of a larger two-dimensional area AR can be obtained more quickly.

[0075] Figure 8 : is a graph showing the relationship between the number of filters and the relative error when the thickness of each layer of a display sample is simulated measured by a wavelength scanning display inspection apparatus according to an embodiment of the present invention.

[0076] In this regard, the first layer L1 of the display sample S is a ZnO layer with a refractive index of 2, the second layer L2 is a quantum dot layer with a refractive index of 2.7, the third layer L3 is a TCTA (4,4',4"-tris(carbazol-9-yl)-triphenylamine) layer with a refractive index of 1.7, and the fourth layer L4 is a MoO layer with a refractive index of 2.5. 3 layer. In addition, the thickness of each layer is randomly assumed to be 10nm to 70nm. For simulation, the reflectivity of 10,000 laminates (display samples S) with different stacking numbers and different thicknesses is calculated. Random forest is used to learn the data of reflectivity calculated in this way. Using the random forest learned in this way, the thickness of each layer of 100 new display samples S is simulated and measured.

[0077] In this regard, it is assumed that the filter wheel 130 has a total of three filters F, namely, a filter F for converting to the wavelength reflection light Lrw of 230 nm, a filter F for converting to the wavelength reflection light Lrw of 260 nm, and a filter F for converting to the wavelength reflection light Lrw of 290 nm. In addition, the number of estimators (hereinafter also referred to as "parameters") used in the random forest is 300.

[0078] Furthermore, the relative error is calculated using the following mathematical formula 1.

[0079]

Mathematical formula 1

[0080]

[0081] In Formula 1, N is the total number of layers L1 to Lk for which the thickness is predicted, Y is the actual thickness of each layer L1 to Lk, and Y pred is the predicted thickness of each layer L1 to Lk, and E is the relative error.

[0082] from Figure 8 It can be seen that in the case of the display sample S having one layer or the display sample S having two layers, a relative error of 1% level can be achieved even when only two filters F are used. Furthermore, in the case of the display sample S having three layers, when 11 or more filters F are used, a relative error of 3% or less is achieved. Furthermore, in the case of the display sample S having four layers, when 13 or more filters F are used, the relative error converges to a level of 6%.

[0083] Fig. 9 : is a graph showing the relationship between the number of estimators and the relative error in simulating the thickness measurement of each layer of a display sample by a wavelength scanning display inspection apparatus according to an embodiment of the present invention.

[0084] For this, it is assumed that the filter wheel 130 has 15 filters F each of which converts to wavelength reflection light Lrw having 15 wavelengths determined at intervals of 30 nm starting from 230 nm. In addition, a simulation was performed to calculate relative errors while changing the number of estimators of the random forest.

[0085] It can be seen from Table 8 that the more the number of stacked layers, the less accurate the prediction is, but it can be seen from Table 9 that the relative error tends to decrease as the number of estimators increases. That is, by setting the number of estimators of artificial intelligence such as random forest according to the number of stacked layers of one or more layers L1 to Lk of the display sample S, the thickness of each layer L1 to Lk of each display sample S having a variety of stacked layer numbers can be quickly predicted while minimizing the relative error.

[0086] According to the first feature of the embodiment of the present invention, the wavelength scanning display inspection device 100 includes: a display sample S having one or more layers L1 to Lk; a light irradiation unit 110 irradiating light L to the display sample S so that the light L is incident on a two-dimensional area AR in a surface SR of the display sample S; a filter wheel 130 having a plurality of filters F for converting reflected light Lr reflected from the display sample S into wavelength reflected light Lrw having corresponding wavelengths, respectively; a driving unit 140 rotating the filter wheel 130; a spectroscopic unit 120 measuring the spectrum of the wavelength reflected light Lrw; and a control unit 150 controlling the driving unit 140 to change the filter F through which the reflected light Lr passes, and determining the thickness of each of the one or more layers L1 to Lk based on the spectrum of the two-dimensional area AR at a plurality of wavelengths depending on the change of the filter F. Therefore, the thickness of the thin film of the display sample S can be quickly measured in nm level. In addition, the thickness of each layer of OLED and QLED devices made by inkjet printing can be predicted from a single measurement, and defects caused by thickness non-uniformity can be determined and improved through feedback.

[0087] In the wavelength scanning display inspection device 100 according to the first feature, the control unit 150 may use artificial intelligence to determine the thickness of each of the one or more layers L1 to Lk. In addition, in the wavelength scanning display inspection device 100 according to the first feature, the artificial intelligence may include one or more of random forest, Gaussian process regression, and deep learning neural network. Therefore, not only the measurement time can be reduced, but also the prediction error of the thickness of each layer can be minimized.

[0088] Fig.10 1 is a front view of a wavelength scanning display inspection device according to a modified example of an embodiment of the present invention.

[0089] Reference Fig.10 as well as Figures 5 to 7 The wavelength scanning display inspection apparatus 100A according to the modified example includes a display sample S, a light irradiation unit 110, a spectroscopic unit 120, and a control unit 150. The wavelength scanning display inspection apparatus 100A according to the modified example may further include a storage unit 160.

[0090] Compared to Figure 2 The wavelength scanning display inspection device 100 shown, the wavelength scanning display inspection device 100A according to the modified example does not include the filter wheel 130 and the driving unit 140, and the difference is that the light irradiation unit 110 includes the structure of the light source 111 capable of changing the wavelength of the light L, and the operation of the corresponding control unit 150.

[0091] The display sample S has one or more layers L1 to Lk. The number of the one or more layers L1 to Lk may be 1 or more and 10 or less. The display sample S may include one or more of an OLED and a QLED.

[0092] The light irradiation unit 110 irradiates the display sample S with light L so that the light L is incident on a two-dimensional area AR in a surface SR of the display sample S.

[0093] The light irradiation unit 110 includes a light source 111 that generates light L. The light irradiation unit 110 may further include a beam splitter 112 and a first lens 113a. The light irradiation unit 110 may further include a second lens 113b. The beam splitter 112 reflects the light L emitted from the light source 111 toward the display sample S. The first lens 113a converges the light L reflected from the beam splitter 112 so that the light L is incident on the surface SR of the display sample S. The second lens 113b converges the reflected light Lr so that the reflected light Lr is incident on the light splitting unit 120.

[0094] The spectroscopic unit 120 measures the spectrum of the reflected light Lr formed by the light L reflected from the display sample S.

[0095] The control unit 150 controls the light source 111 to change the wavelength of the light L. The control unit 150 determines the thickness of each of the one or more layers L1 to Lk based on the spectrum of the two-dimensional area AR at multiple wavelengths depending on the change in the wavelength of the light L. The number of the multiple wavelengths may be 2 or more and 20 or less.

[0096] The control unit 150 may use artificial intelligence to determine the thickness of each of the one or more layers L1 to Lk. The artificial intelligence may include one or more of random forest, Gaussian process regression, and deep learning neural network.

[0097] The storage unit 160 may store an artificial intelligence model (artificial intelligence program).

[0098] Fig.11 It is a graph showing the relationship between the actual layer thickness and the predicted layer thickness of a display sample with a single layer when inspecting the layer thickness by a wavelength scanning type display inspection device according to a modified example of an embodiment of the present invention.

[0099] Regarding this, as the light source 111 of the wavelength scanning type display inspection device 100A according to the modified example, a multi-LED light source with the model name pE-4000 from CoolLED is used. 1250 display samples S with single ZnO layers of different thicknesses are prepared. The light source 111 sequentially emits light L of 10 wavelengths, namely 365 nm, 385 nm, 405 nm, 435 nm, 460 nm, 470 nm, 490 nm, 500 nm, 525 nm, and 550 nm. After performing random forest learning using some of the 1250 display samples S, the thickness of the ZnO layer of the remaining samples among the 1250 display samples S is actually inspected (predicted).

[0100] In Fig.11 , the darker the circle, the higher the frequency. As can be seen from Fig.11 , the actual layer thickness is basically consistent with the predicted layer thickness, and it is confirmed that the error is within about 3%.

[0101] Fig.12 And Fig.13 It is a graph showing the relationship between the actual layer thickness and the predicted layer thickness of each layer when inspecting the layer thickness of a display sample with two layers by a wavelength scanning type display inspection device according to a modified example of an embodiment of the present invention.

[0102] Regarding this, as the light source 111 of the wavelength scanning type display inspection device 100A according to the modified example, a multi-LED light source with the model name pE-4000 from CoolLED is used. 185 two-layer display samples S with a ZnO layer and a quantum dot layer stacked in sequence are prepared, and the thicknesses of the ZnO layer and the quantum dot layer are inspected (predicted) respectively.

[0103] As can be seen from Fig.12 And Fig.13 , it is confirmed that the prediction error for the thickness of each of the ZnO layer and the quantum dot layer is within 10%.

[0104] According to the second feature of an embodiment of the present invention, a wavelength scanning display inspection device 100A includes: a display sample S having one or more layers L1 to Lk; a light irradiation unit 110, irradiating light L to the display sample S so that the light L is incident on a two-dimensional area AR on the surface of the display sample S, and including a light source 111 that generates the light L; a spectroscopic unit 120, measuring a spectrum of reflected light Lr formed by reflection of the light L by the display sample S; and a control unit 150, controlling the light source 111 to change the wavelength of the light L, and determining the thickness of each of the one or more layers L1 to Lk based on the spectrum of the two-dimensional area AR at multiple wavelengths depending on the change in the wavelength of the light L.

[0105] In the wavelength scanning display inspection device 100A according to the second feature, the control unit 150 may use artificial intelligence to determine the thickness of each of the one or more layers L1 to Lk. In addition, in the wavelength scanning display inspection device 100A according to the second feature, the artificial intelligence may include one or more of random forest, Gaussian process regression, and deep learning neural network.

[0106] The present invention is shown and described in the preferred embodiments of the attached exemplary drawings, but the present invention is not limited thereto and it is obvious that a person skilled in the art can implement the present invention in various forms within the scope of the technical idea of ​​the present invention as set forth in the attached claims.

Claims

1. A wavelength scanning display inspection device, comprising: a display sample having one or more layers; a light irradiation unit that irradiates light to the display sample so that the light is incident on a two-dimensional area in a surface of the display sample; a filter wheel having a plurality of filters for converting the reflected light reflected from the display sample into reflected light of wavelengths having corresponding wavelengths; A driving unit, causing the filter wheel to rotate; A spectroscopic unit, measuring the spectrum of the reflected light of the wavelength; as well as A control unit controls the driving unit to change the optical filter through which the reflected light passes, and determines a thickness of each of the one or more layers based on the spectrum of the two-dimensional area at a plurality of wavelengths depending on the change of the optical filter.

2. The wavelength scanning display inspection device according to claim 1, wherein: The control unit uses artificial intelligence to determine the thickness of each of the one or more layers.

3. The wavelength scanning display inspection device according to claim 2, wherein: The artificial intelligence includes one or more of random forest, Gaussian process regression and deep learning neural network.

4. The wavelength scanning display inspection device according to claim 1, wherein: The number of the plurality of wavelengths is greater than or equal to 2 and less than or equal to 20.

5. The wavelength scanning display inspection device according to claim 1, wherein: The number of the one or more layers is 1 or more and 10 or less.

6. The wavelength scanning display inspection device according to claim 1, wherein: The light irradiation unit comprises: a light source, generating said light, a beam splitter to reflect the light emitted from the light source toward the display sample, and A first lens converges the light reflected from the beam splitter to make it incident on a surface of the display sample.

7. The wavelength scanning display inspection device according to claim 6, wherein: The light irradiation unit further includes: The second lens converges the reflected light of the wavelength so that the reflected light of the wavelength is incident on the light splitting unit.

8. The wavelength scanning display inspection device according to claim 1, wherein: The display samples include one or more of OLED and QLED.

9. A wavelength scanning display inspection device, comprising: a display sample having one or more layers; a light irradiation unit that irradiates light to the display sample so that the light is incident on a two-dimensional area in a surface of the display sample and includes a light source that generates the light; A spectroscopic unit, measuring the spectrum of reflected light formed by the light being reflected by the display sample; as well as A control unit controls the light source to change the wavelength of the light, and determines a thickness of each of the one or more layers based on a spectrum of a two-dimensional region at a plurality of wavelengths depending on the change in the wavelength of the light.

10. The wavelength scanning display inspection device according to claim 9, wherein: The control unit uses artificial intelligence to determine the thickness of each of the one or more layers.

11. The wavelength scanning display inspection device according to claim 10, wherein: The artificial intelligence includes one or more of random forest, Gaussian process regression and deep learning neural network.

12. The wavelength scanning display inspection device according to claim 9, wherein: The number of the plurality of wavelengths is 2 or more and 20 or less.

13. The wavelength scanning display inspection device according to claim 9, wherein: The number of the one or more layers is 1 or more and 10 or less.

14. The wavelength scanning display inspection device according to claim 9, wherein: The light irradiation unit further includes: a beam splitter to reflect the light emitted from the light source toward the display sample, and A first lens converges the light reflected from the beam splitter so that the light is incident on a surface of the display sample.

15. The wavelength scanning display inspection device according to claim 14, wherein: The light irradiation unit further includes: The second lens converges the reflected light so that the reflected light is incident on the light splitting unit.

16. The wavelength scanning display inspection device according to claim 9, wherein: The display samples include one or more of OLED and QLED.

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