A processing device for the shaft seal assembly of an axial flow screw pump

Abstract

The present invention discloses a processing device for the shaft seal assembly of an axial flow screw pump, which relates to the technical field of metal processing. It includes a transfer assembly for transporting the stationary ring. The transfer assembly drives the stationary ring to move and clamps the stationary ring to reach the working position. A polishing assembly and a processing assembly are respectively arranged on both sides of the transfer assembly. The polishing assembly polishes the surface of the stationary ring, and the polishing assembly realizes rough polishing and fine polishing of the surface of the stationary ring. The processing assembly polishes the grooves provided on the stationary ring, and at the same time, the processing assembly detects the flatness of the surface of the stationary ring. When the processing assembly grinds the grooves on the stationary ring, it automatically adjusts the thickness of the polishing sheet according to the sizes of the grooves on different stationary rings. The present invention automatically polishes and detects the stationary ring, improving the polishing efficiency of the stationary ring and at the same time improving the polishing accuracy of the stationary ring.

Description

Technical Field

[0001] The present invention relates to the technical field of metal processing, and particularly relates to a processing device for an axial flow screw pump shaft seal assembly. Background Art

[0002] Mechanical seal is an efficient sealing method widely used in modern industrial equipment, especially excellent in rotating equipment such as pumps and compressors. Its core advantage lies in achieving a reliable dynamic sealing effect through precise design and material selection. The end faces of the dynamic ring and the static ring are closely attached under the pressure of a spring or a bellows, forming an extremely thin liquid film, which can not only lubricate but also block the leakage of the medium.

[0003] The polishing accuracy of the dynamic ring and the static ring in a mechanical seal is one of the core factors determining the sealing performance. The control of its surface roughness, flatness and smoothness directly affects the contact state, friction and wear characteristics and leakage amount of the sealing surface. The polishing accuracy of the dynamic ring and the static ring in a mechanical seal directly determines the reliability and service life of the sealing performance. High-precision polishing can ensure the formation of a uniform microscopic liquid film on the sealing end face, effectively block the leakage of the medium and reduce the frictional heat, thereby significantly reducing the wear risk and extending the service life. If the polishing is insufficient, the rough surface will cause local leakage channels, particle embedding or abnormal wear, resulting in a sharp increase in the leakage amount, burning of the sealing surface and even corrosion of the equipment.

[0004] The Chinese invention patent with the publication number of CN117863063B discloses a metal seal ring grinding and polishing device and method. This device limits the metal seal ring through a plurality of sets of limiting rollers arranged, and at the same time drives the seal ring to rotate to polish multiple surfaces of the seal ring. At the same time, the polishing efficiency of the metal seal ring is improved through the arranged polishing adaptor. However, firstly, this device can only polish a flat seal disc and cannot polish an uneven metal sealing ring. At the same time, it cannot accurately polish the grooves on the sealing ring, affecting the polishing efficiency of the metal sealing ring and reducing the applicability of this device. Summary of the Invention

[0005] In view of the above technical problems, the present invention discloses a processing device for an axial flow screw pump shaft seal assembly.

[0006] The technical solution adopted by the present invention to solve the above technical problems is as follows: A processing device for the shaft seal assembly of an axial flow screw pump, including a transfer assembly, the transfer assembly includes a base and a transfer frame, multiple groups of static rings are placed on the base, the transfer frame drives the static rings to rotate, a polishing assembly and a processing assembly are arranged on the side of the base, the polishing assembly includes an adjusting frame five slidably mounted on the base, a support frame two is slidably arranged on the adjusting frame five, an adjusting frame one is slidably arranged on the support frame two, a rough polishing barrel and a fine polishing barrel are arranged on the adjusting frame one, multiple groups of polishing heads are arranged in both the rough polishing barrel and the fine polishing barrel, an adjusting frame three is arranged on the side of the fine polishing barrel, a sealing barrel plate is slidably arranged on the adjusting frame three, multiple groups of liquid spraying ports and liquid spraying pipes are arranged inside the fine polishing barrel, the processing assembly includes a mounting frame, an adjusting plate and a picking frame are slidably arranged on the mounting frame, a scanning head is arranged on the adjusting plate, a mounting block and a placing frame are arranged on the picking frame, a processing frame is slidably arranged on the mounting block, a polishing sheet is arranged on the processing frame, and an adsorption head and multiple groups of polishing sheets are arranged on the placing frame.

[0007] Further, a clamping column is slidably arranged inside the transfer frame, an adjusting disc is rotatably arranged on the clamping column, and a clamping plate one is slidably arranged on the adjusting disc.

[0008] Further, an adjusting block one, an adjusting block two, an adjusting block three and an adjusting block four are slidably arranged in both the rough polishing barrel and the fine polishing barrel, polishing heads are rotatably arranged on the adjusting block one, the adjusting block two, the adjusting block three and the adjusting block four, and the polishing heads are respectively attached to different surfaces of the static ring.

[0009] Further, a positioning disc and a clamping plate two are slidably arranged at the lower ends of both the rough polishing barrel and the fine polishing barrel, a grinding frame is rotatably arranged on the positioning disc, and a polishing head is rotatably arranged on the grinding frame.

[0010] Further, an adjusting frame three is arranged on the fine polishing barrel, a sealing barrel plate is slidably arranged on the adjusting frame three, and multiple groups of liquid spraying ports and liquid spraying pipes are arranged inside the fine polishing barrel.

[0011] Further, the polishing heads in the rough polishing barrel are all diamond material grinding heads, and the polishing heads in the fine polishing barrel are all non-woven fabric polishing heads.

[0012] Further, a detection plate is rotatably arranged on the adjusting plate, a wiping disc and multiple groups of scanning heads are arranged on the detection plate.

[0013] Further, a clamping plate three is slidably arranged on the picking frame, an adjusting frame four is slidably arranged on the processing frame, a locking block is rotatably arranged on the adjusting frame four, and the locking block is attached to the polishing sheet.

[0014] The beneficial effects of the present invention compared with the prior art are as follows: The transfer component provided by the present invention continuously picks up and places the stationary ring, locates the working position of the stationary ring, and processes multiple groups of stationary rings at the same time, improving the processing efficiency of the stationary ring. The polishing component provided by the present invention polishes the stationary ring, and at the same time processes multiple surfaces and the inside and outside of the stationary ring, rough-polishing and fine-polishing the stationary ring to improve the polishing efficiency and accuracy of the stationary ring. The sealed barrel plate provided in the polishing component closes the fine-polishing barrel to prevent the polishing liquid from leaking during fine-polishing. The processing component provided by the present invention grinds the grooves on the stationary ring and automatically adjusts the thickness of the polishing sheet according to the different widths of the grooves, improving the processing efficiency of the grooves on the stationary ring. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 is the front view of the overall structure of the present invention;

[0016] Figure 2 is the schematic diagram of the overall structure of the present invention;

[0017] Figure 3 is the front view of the structure of the transfer component of the present invention;

[0018] Figure 4 is Figure 3 the sectional view of the structure in the A-A direction in

[0019] Figure 5 is Figure 4 the enlarged schematic diagram of the structure at A in

[0020] Figure 6 is the schematic diagram of the installation position of the polishing component and the transfer component of the present invention;

[0021] Figure 7 is the top view of the partial structure of the polishing component of the present invention;

[0022] Figure 8 is Figure 7 the sectional view of the structure in the B-B direction in

[0023] Figure 9 is the sectional view of the partial structure of the polishing component of the present invention;

[0024] Figure 10 is the sectional view of the partial structure of the fine-polishing barrel of the present invention;

[0025] Figure 11 is the schematic diagram of the structure of the processing component of the present invention;

[0026] Figure 12 is the schematic diagram of the partial structure of the processing component of the present invention;

[0027] Figure 13 is the left view of the structure of the processing component of the present invention;

[0028] Figure 14 For Figure 13 Schematic enlarged view of the structure at position B in the middle;

[0029] Figure 15 Schematic diagram of the installation position of the adsorption head of the present invention.

[0030] Reference numerals: 1 - transfer assembly; 2 - polishing assembly; 3 - processing assembly; 101 - base; 102 - conveyor belt; 103 - stationary ring; 104 - support frame 1; 105 - transfer frame; 106 - clamping column; 107 - adjusting disc; 108 - clamping plate 1; 201 - support frame 2; 202 - adjusting frame 1; 203 - rough polishing barrel; 204 - fine polishing barrel; 205 - sealing barrel plate; 206 - adjusting block 1; 207 - adjusting block 2; 208 - adjusting block 3; 209 - adjusting block 4; 210 - clamping plate 2; 211 - positioning disc; 212 - grinding frame; 213 - polishing head; 214 - adjusting frame 2; 215 - adjusting frame 3; 216 - adjusting frame 5; 217 - liquid spraying port; 218 - liquid spraying pipe; 301 - mounting frame; 302 - picking frame; 303 - adjusting plate; 304 - detecting plate; 305 - wiping disc; 306 - clamping plate 3; 307 - mounting block; 308 - processing frame; 309 - polishing sheet; 310 - placing frame; 311 - adsorption head; 312 - adjusting frame 4; 313 - locking block. Detailed implementation manners

[0031] Refer to Figures 1 to 15 A processing device for the shaft seal assembly of an axial flow screw pump as shown, including a transfer assembly 1 for transporting multiple groups of stationary rings 103. The transfer assembly 1 clamps the stationary rings 103 and drives the stationary rings 103 to rotate to different processing positions. A polishing assembly 2 for polishing the surface of the stationary rings 103 is arranged on the side of the transfer assembly 1. The polishing assembly 2 performs rough polishing and fine polishing on the stationary rings 103 respectively to improve the polishing effect of the stationary rings 103. A processing assembly 3 for grinding the grooves on the stationary rings 103 is arranged on the other side of the transfer assembly 1. The processing assembly 3 automatically adjusts the thickness of the polishing sheet 309 according to the size of the grooves on the stationary rings 103 to improve the grinding efficiency of the grooves on the stationary rings 103, and the processing assembly 3 detects the flatness of the surface of the stationary rings 103.

[0032] The transfer component 1 includes a base 101, on which a conveyor belt 102 is rotatably arranged. Place the stationary ring 103 on the conveyor belt 102, drive the conveyor belt 102 to rotate, and the conveyor belt 102 drives the stationary ring 103 to move. A first support frame 104 is arranged on the side of the base 101, and a transfer frame 105 is rotatably arranged on the first support frame 104. A plurality of clamping columns 106 are slidably arranged in the transfer frame 105. One end of the clamping column 106 far from the axis of the transfer frame 105 is rotatably provided with an adjustment disc 107. Two groups of first clamping plates 108 are slidably arranged on the adjustment disc 107. The first clamping plates 108 are attached to the inner wall of the stationary ring 103 to clamp and fix the stationary ring 103. When the conveyor belt 102 drives the stationary ring 103 to align with the adjustment disc 107, drive the clamping column 106 to slide on the transfer frame 105. The clamping column 106 drives the adjustment disc 107 and the first clamping plates 108 to insert into the stationary ring 103. Drive the plurality of first clamping plates 108 to move away from each other. The first clamping plates 108 clamp the inner wall of the stationary ring 103. Drive the clamping column 106 to reset, drive the transfer frame 105 to rotate, and the transfer frame 105 drives the clamping column 106 and the stationary ring 103 to align with the polishing component 2 or the processing component 3, and then process the stationary ring 103.

[0033] The polishing assembly 2 includes an adjusting frame five 216 slidably mounted on the side of the base 101. A support frame two 201 is slidably arranged on the adjusting frame five 216. An adjusting frame one 202 is slidably arranged on the support frame two 201. A set of rough polishing barrels 203 and fine polishing barrels 204 are arranged on the adjusting frame one 202. When driving the adjusting frame five 216, the support frame two 201 and the adjusting frame one 202 to move, the positions of the rough polishing barrels 203 and the fine polishing barrels 204 are adjusted. The rough polishing barrels 203 and the fine polishing barrels 204 are sleeved on the stationary ring 103 to be polished. Adjusting blocks two 207, adjusting blocks one 206, adjusting blocks three 208, adjusting blocks four 209 and an adjusting frame two 214 are slidably arranged in both the rough polishing barrels 203 and the fine polishing barrels 204. Polishing heads 213 are rotatably arranged on the adjusting blocks two 207, the adjusting blocks one 206, the adjusting blocks three 208, the adjusting blocks four 209 and the adjusting frame two 214. Multiple groups of polishing heads 213 are respectively attached to different surfaces of the stationary ring 103. The polishing head 213 arranged on the adjusting block one 206 is attached to the topmost surface of the stationary ring 103. The polishing head 213 arranged on the adjusting frame two 214 is attached to the bottommost surface of the stationary ring 103. The polishing head 213 arranged on the adjusting block three 208 is attached to the upper side edge of the stationary ring 103. The polishing head 213 arranged on the adjusting block four 209 is attached to the lower side edge of the stationary ring 103. The polishing head 213 arranged on the adjusting block two 207 is attached to the middle section surface of the stationary ring 103. Driving multiple groups of polishing heads 213 to rotate, the polishing heads 213 polish the stationary ring 103. At the same time, the stationary ring 103 is driven to rotate by the transfer assembly 1 to complete the polishing of the outside of the stationary ring 103. A positioning disk 211 and a clamping plate two 210 are slidably arranged at the lower ends of the rough polishing barrels 203 and the fine polishing barrels 204. There are two groups of clamping plates two 210. When the two groups of clamping plates two 210 approach each other, they clamp the stationary ring 103. A polishing frame 212 is rotatably arranged on the positioning disk 211. Multiple groups of polishing heads 213 are rotatably arranged on the polishing frame 212. The polishing heads 213 polish the inner wall of the stationary ring 103. The polishing heads 213 arranged in the rough polishing barrels 203 are all diamond material grinding heads. The polishing heads 213 arranged in the fine polishing barrels 204 are all non-woven fabric polishing heads. Since the polishing heads 213 in the fine polishing barrels 204 perform fine polishing on the stationary ring 103, multiple groups of liquid spraying ports 217 and liquid spraying pipes 218 are also arranged in the fine polishing barrels 204. The liquid spraying ports 217 and the adjusting blocks three 208 pour diamond micropowder polishing liquid to the fine polishing position of the stationary ring 103. Adjusting frames three 215 are arranged on both sides of the fine polishing barrels 204. Two groups of sealing barrel plates 205 are slidably arranged on the adjusting frames three 215. When the two groups of sealing barrel plates 205 approach each other, they are attached to the transfer frame 105 to realize the enclosure of the space in the fine polishing barrels 204 and prevent the diamond micropowder polishing liquid from leaking.

[0034] The processing component 3 includes a mounting frame 301. A regulating plate 303 is slidably arranged on the side of the mounting frame 301. A detection plate 304 is rotatably arranged on the regulating plate 303. A wiping disc 305 is rotatably arranged on one side of the detection plate 304. A plurality of groups of scanning heads are arranged on the other side of the detection plate 304. The wiping disc 305 wipes the surface of the stationary ring 103, and the scanning heads scan the surface of the stationary ring 103 to determine whether the flatness of the surface of the stationary ring 103 meets the standard. Two sets of picking frames 302 are slidably arranged on the mounting frame 301. A clamping plate three 306 is slidably arranged on the picking frame 302, and the clamping plate three 306 clamps the stationary ring 103. A placing frame 310 is arranged on the picking frame 302. A plurality of polishing wafers 309 are placed at the lower end of the placing frame 310, and the polishing wafers 309 polish the grooves on the stationary ring 103. A suction head 311 is slidably arranged at the lower end of the placing frame 310, and the suction head 311 adsorbs the polishing wafers 309. A mounting block 307 is slidably arranged on the picking frame 302. A processing frame 308 is slidably arranged on the mounting block 307. A plurality of polishing wafers 309 are placed on the processing frame 308. A regulating frame four 312 is slidably arranged on the side of the processing frame 308. A locking block 313 is rotatably arranged on the regulating frame four 312, and the locking block 313 presses the polishing wafers 309 on the processing frame 308. When it is necessary to change the thickness of the polishing wafers 309 on the processing frame 308, drive the suction head 311 to adsorb the polishing wafers 309, drive the suction head 311 to slide on the placing frame 310, the suction head 311 drives the polishing wafers 309 to move, the suction head 311 places the polishing wafers 309 on the processing frame 308, drive the locking block 313 to rotate on the regulating frame four 312. After the locking block 313 is aligned with the processing frame 308, drive the regulating frame four 312 to slide in the processing frame 308, the processing frame 308 drives the locking block 313 to move, and the locking block 313 presses the polishing wafers 309 on the processing frame 308 to complete the fixation of the polishing wafers 309. Drive the mounting block 307 to slide on the picking frame 302, the mounting block 307 drives the processing frame 308 and the polishing wafers 309 to move. After the polishing wafers 309 are aligned with the grooves on the stationary ring 103, drive the processing frame 308 to slide on the mounting block 307, and the processing frame 308 drives the polishing wafers 309 to polish the grooves on the stationary ring 103.

[0035] Working principle: During operation, the stationary ring 103 is placed on the conveyor belt 102. The conveyor belt 102 is driven to rotate, and the conveyor belt 102 drives the stationary ring 103 to move. After the conveyor belt 102 drives the stationary ring 103 to align with the clamping column 106, the clamping column 106 is driven to slide within the transfer rack 105. The clamping column 106 drives the adjusting disc 107 and the first clamping plate 108 to insert into the interior of the stationary ring 103. The first clamping plates 108 are driven to move away from each other, and the first clamping plates 108 clamp the inner wall of the stationary ring 103 to complete the fixation of the stationary ring 103. After the clamping column 106 is driven to reset, the transfer rack 105 is driven to rotate, and the transfer rack 105 removes the stationary ring 103 from the conveyor belt 102. The transfer rack 105 drives the stationary ring 103 to reach the position of the polishing assembly 2. When the transfer rack 105 removes the stationary ring 103 to be processed from the conveyor belt 102, the processed stationary ring 103 on the transfer rack 105 is placed on the conveyor belt 102 again. The first clamping plates 108 are driven to reset, and the first clamping plates 108 release the fixation of the stationary ring 103. The processed stationary ring 103 is placed on the conveyor belt 102, improving the processing efficiency of the stationary ring 103.

[0036] The transfer rack 105 drives the stationary ring 103 to rotate. After the transfer rack 105 drives the stationary ring 103 to align with the polishing assembly 2, first, rough polishing is performed on a group of stationary rings 103. The fifth adjusting rack 216 is driven to slide on the base 101, and the fifth adjusting rack 216 drives the rough polishing barrel 203 and the fine polishing barrel 204 to move. After the fifth adjusting rack 216 drives the rough polishing barrel 203 to align with the first group of stationary rings 103, the second supporting rack 201 and the first adjusting rack 202 are driven to move. The second supporting rack 201 and the first adjusting rack 202 drive the rough polishing barrel 203 to be sleeved on the first group of stationary rings 103. At this time, the fine polishing barrel 204 does not work. After the rough polishing barrel 203 is sleeved on the stationary ring 103, the clamping column 106 is driven to drive the stationary ring 103 to move, and at the same time, the second adjusting rack 214 is driven to rotate. The second adjusting rack 214 drives the polishing head 213 to rotate out. When the stationary ring 103 fits with the bottom surface of the polishing head 213, driving the clamping column 106 stops. The first adjusting block 206, the second adjusting block 207, the third adjusting block 208, and the fourth adjusting block 209 are driven to slide on the rough polishing barrel 203. The first adjusting block 206, the second adjusting block 207, the third adjusting block 208, and the fourth adjusting block 209 respectively drive the polishing head 213 to fit with the stationary ring 103. The polishing head 213 and the first clamping plate 108 are driven to rotate, and the first clamping plate 108 drives the stationary ring 103 to rotate. Multiple polishing heads 213 polish multiple surfaces of the stationary ring 103 simultaneously. After the surface polishing is completed, the second adjusting rack 214, the first adjusting block 206, the second adjusting block 207, the third adjusting block 208, and the fourth adjusting block 209 are driven to reset. Subsequently, the clamping column 106 is continuously driven to drive the stationary ring 103 to move. When the stationary ring 103 aligns with the second clamping plate 210, the second clamping plates 210 are driven to move closer to each other, and the second clamping plates 210 clamp the stationary ring 103. The clamping column 106 is driven to reset. The positioning disk 211 is driven to slide in the rough polishing barrel 203. The positioning disk 211 drives the polishing frame 212 and the polishing head 213 to be inserted into the stationary ring 103, and the polishing head 213 fits with the inner wall of the stationary ring 103. The polishing head 213 and the polishing frame 212 are driven to rotate, and the polishing frame 212 drives the polishing head 213 to polish the inner wall of the stationary ring 103. After the rough polishing of the inner and outer surfaces of the stationary ring 103 is completed, the clamping column 106 and the first clamping plate 108 are driven to clamp the stationary ring 103, and the clamping column 106 is driven to drive the stationary ring 103 to reset, and the stationary ring 103 is taken out of the rough polishing barrel 203.

[0037] At this time, fine polishing of the stationary ring 103 is carried out. The driving adjustment frame five 216 slides on the base 101. The adjustment frame five 216 drives the support frame two 201 and the adjustment frame one 202 to move. The adjustment frame one 202 drives the rough polishing barrel 203 to align with a group of stationary rings 103 that have not been polished. The adjustment frame one 202 drives the fine polishing barrel 204 to align with the stationary rings 103 that have completed rough polishing. The support frame two 201 and the adjustment frame one 202 are driven to move, and the rough polishing barrel 203 and the fine polishing barrel 204 are sleeved on the stationary ring 103. The driving seal barrel plate 205 slides on the adjustment frame three 215, and the seal barrel plate 205 fits with the transfer frame 105 to complete the enclosure of the internal space of the fine polishing barrel 204. After the enclosure is completed, the adjustment frame two 214, the adjustment block one 206, the adjustment block two 207, the adjustment block three 208, and the adjustment block four 209 are driven to work, which is the same as the process of polishing the stationary ring 103 by the rough polishing barrel 203. During the polishing process of the fine polishing barrel 204, the liquid spraying port 217 and the liquid spraying pipe 218 are driven to pour diamond micropowder polishing liquid onto the finely polished stationary ring 103. After a group is finely polished, the adjustment frame five 216 is driven to move, and the adjustment frame five 216 drives the fine polishing barrel 204 to carry out fine polishing on another group of stationary rings 103. After the polishing of the stationary ring 103 is completed, the clamping column 106 is driven to pull out the stationary ring 103 from the polishing assembly 2, and the transfer frame 105 is driven to rotate. The transfer frame 105 drives the stationary ring 103 to align with the processing assembly 3.

[0038] After the transfer rack 105 drives the stationary ring 103 to align with the clamping plate three 306, it drives the detection plate 304 to rotate on the adjusting plate 303. The detection plate 304 drives the wiping disc 305 towards the stationary ring 103. It drives the adjusting plate 303 to slide on the mounting rack 301. The adjusting plate 303 drives the detection plate 304 to move. It drives the wiping disc 305 to rotate. The detection plate 304 drives the wiping disc 305 to wipe the stationary ring 103. After driving the adjusting plate 303 to reset, it drives the detection plate 304 to rotate again. The side of the detection plate 304 with the scanning head faces the stationary ring 103. It drives the adjusting plate 303 to move. The adjusting plate 303 drives the scanning head to move and the scanning head scans the stationary ring 103 to complete the detection of the flatness of one side of the stationary ring 103. Subsequently, it drives the picking rack 302 to slide on the mounting rack 301. The picking rack 302 drives the clamping plate three 306 to approach the stationary ring 103. After the clamping plate three 306 aligns with the stationary ring 103, it drives the clamping plate three 306 to clamp the stationary ring 103. It drives the clamping plate one 108 to reset to release the clamping of the stationary ring 103. It drives the picking rack 302 away from the transfer rack 105. It drives the clamping column 106 to reset. It drives the mounting block 307 to slide on the picking rack 302. The mounting block 307 drives the processing rack 308 and the polishing sheet 309 to move, so that the polishing sheet 309 aligns with the groove on the stationary ring 103. It drives the processing rack 308 to slide on the mounting block 307. The processing rack 308 drives the polishing sheet 309 to move. The polishing sheet 309 reciprocates in the groove of the stationary ring 103 to achieve the grinding of the groove. After completing the grinding, it drives the picking rack 302 to move. The picking rack 302 drives the stationary ring 103 to move closer to the adjusting plate 303. It drives the adjusting plate 303 and the detection plate 304 to move. The detection plate 304 wipes and scans the side of the stationary ring 103 with the groove. After completing the detection, it drives the clamping column 106 to approach the stationary ring 103. The clamping column 106 drives the clamping plate one 108 to clamp the stationary ring 103. It drives the transfer rack 105 to rotate. The transfer rack 105 places the stationary ring 103 on the conveyor belt 102 to complete the processing of the stationary ring 103.

[0039] When grinding the groove on the stationary ring 103, if it is necessary to change the thickness of the polishing sheet 309, it drives the suction head 311 to adsorb the polishing sheet 309. It drives the suction head 311 to slide on the placement rack 310. The suction head 311 drives the polishing sheet 309 to move. The suction head 311 places the polishing sheet 309 on the processing rack 308. It drives the locking block 313 to rotate on the adjusting rack four 312. After the locking block 313 aligns with the processing rack 308, it drives the adjusting rack four 312 to slide inside the processing rack 308. The processing rack 308 drives the locking block 313 to move. The locking block 313 presses the polishing sheet 309 on the processing rack 308 to complete the fixation of the polishing sheet 309 and complete the adjustment of the thickness of the polishing sheet 309.

Claims

1. An axial flow screw pump shaft seal assembly processing device, including a transfer assembly (1), characterized in that: The transfer component (1) includes a base (101) and a transfer rack (105). Multiple sets of stationary rings (103) are placed on the base (101). The transfer rack (105) drives the stationary rings (103) to rotate. A polishing component (2) and a processing component (3) are arranged on the side of the base (101). The polishing component (2) includes an adjusting rack five (216) slidably mounted on the base (101). A support rack two (201) is slidably arranged on the adjusting rack five (216). An adjusting rack one (202) is slidably arranged on the support rack two (201). A rough polishing barrel (203) and a fine polishing barrel (204) are arranged on the adjusting rack one (202). Multiple sets of polishing heads (213) are arranged in both the rough polishing barrel (203) and the fine polishing barrel (204). An adjusting rack three (215) is arranged on the side of the fine polishing barrel (204). A sealing barrel plate (205) is slidably arranged on the adjusting rack three (215). Multiple sets of liquid spraying ports (217) and liquid spraying pipes (218) are arranged inside the fine polishing barrel (204). The processing component (3) includes a mounting rack (301). An adjusting plate (303) and a picking rack (302) are slidably arranged on the mounting rack (301). A scanning head is arranged on the adjusting plate (303). A mounting block (307) and a placing rack (310) are arranged on the picking rack (302). A processing rack (308) is slidably arranged on the mounting block (307). A polishing sheet (309) is arranged on the processing rack (308). An adsorption head (311) and multiple sets of polishing sheets (309) are arranged on the placing rack (310); A clamping column (106) is slidably arranged inside the transfer rack (105). An adjusting disk (107) is rotatably arranged on the clamping column (106). A clamping plate one (108) is slidably arranged on the adjusting disk (107); An adjusting block one (206), an adjusting block two (207), an adjusting block three (208) and an adjusting block four (209) are slidably arranged in both the rough polishing barrel (203) and the fine polishing barrel (204). Polishing heads (213) are rotatably arranged on the adjusting block one (206), the adjusting block two (207), the adjusting block three (208) and the adjusting block four (209). The polishing heads (213) are respectively in contact with different surfaces of the stationary ring (103); A positioning disk (211) and a clamping plate two (210) are slidably arranged at the lower ends of both the rough polishing barrel (203) and the fine polishing barrel (204). A polishing rack (212) is rotatably arranged on the positioning disk (211). A polishing head (213) is rotatably arranged on the polishing rack (212).

2. The processing equipment for the shaft seal assembly of an axial flow screw pump according to claim 1, characterized in that: The fine polishing barrel (204) is provided with an adjusting rack three (215). A sealing barrel plate (205) is slidably arranged on the adjusting rack three (215). Multiple sets of liquid spraying ports (217) and liquid spraying pipes (218) are arranged inside the fine polishing barrel (204).

3. The processing equipment for the shaft seal assembly of an axial flow screw pump according to claim 2, characterized in that: The polishing heads (213) in the rough polishing barrel (203) are all diamond - material grinding heads, and the polishing heads (213) in the fine polishing barrel (204) are all non - woven fabric polishing heads.

4. The processing equipment for the shaft seal assembly of an axial flow screw pump according to claim 3, characterized in that: A detection plate (304) is rotatably arranged on the adjusting plate (303), and a wiping disc (305) and multiple groups of scanning heads are arranged on the detection plate (304).

5. The processing equipment for the shaft seal assembly of an axial flow screw pump according to claim 4, characterized in that: A third clamping plate (306) is slidably arranged on the picking rack (302), a fourth adjusting rack (312) is slidably arranged on the processing rack (308), a locking block (313) is rotatably arranged on the fourth adjusting rack (312), and the locking block (313) is attached to the polishing sheet (309).

Images