Long-distance high-lift high-flow water supply system and method
By designing a long-distance high-head and high-flow water supply system including a water supply pool, a water pump suction pipe, a high-pressure water pump, a main water pipe and a return water pipe, and using pressure monitoring, liquid level detection, concentration detection and automatic control devices, the problems of insufficient water supply and unstable pressure in conventional water supply systems in long-distance high-head and high-flow water supply scenarios are solved, and efficient and automated water supply effects are achieved.
Patent Information
- Application Number
- CN202510305673.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-14
- Publication Date
- 2025-05-30
AI Technical Summary
Conventional water supply systems are prone to problems such as insufficient water supply, unstable pump water pressure, and turbid water quality in long-distance, high-lift and large-flow water supply scenarios, resulting in problems such as large vibration of the equipment, low pumping efficiency, lots of debris, and congestion of pipelines.
A long-distance high-head and large flow water supply system is designed, including water supply pools, water pump suction pipes, high-pressure water pumps, main water pipes and return water pipes, and the system is automated management and efficient water supply through pressure monitoring, liquid level detection, concentration detection and automatic control devices.
It effectively solves the problems of insufficient water supply, unstable pressure and water quality, improves pumping efficiency, reduces equipment vibration and debris accumulation, and realizes the system's automated control and efficient water supply.
Smart Images
Figure CN120061439A_ABST
Abstract
Description
Technical Field
[0001] The present invention belongs to the technical field of mine water supply, and particularly relates to a long-distance, high-lift, large-flow water supply system and method. Background Art
[0002] Taiyuan Iron and Steel Group Lanxian Mining Co., Ltd. is the main iron ore powder and pellet raw material supply base of Taiyuan Iron and Steel Group. It is built on a mountain. Due to its high terrain and large water consumption, it is difficult to meet its usage requirements relying on conventional water supply systems. Moreover, when conventional water supply systems are applied to long-distance, high-lift, large-flow water supply scenarios, problems such as insufficient water supply, unstable pump water pressure, turbid water quality, low pumping efficiency, a large amount of debris, pipeline blockage, cavitation, turbulent flow, and water hammer, which cause large equipment vibration, are likely to occur, and they are not suitable for the application scenarios of this unit. Therefore, it is necessary to design a long-distance, high-lift, large-flow water supply system. Summary of the Invention
[0003] The present invention provides a long-distance, high-lift, large-flow water supply system and method for the above problems.
[0004] To achieve the above object, the present invention adopts the following technical solutions:
[0005] A long-distance, high-lift, large-flow water supply system includes a water supply pool. There are two water supply pools. A pool inlet pipe and a water supply overflow pipe are arranged on the upper part of the water supply pool. A water pump suction pipe is arranged on the lower part of the water supply pool. A suction electric butterfly valve and a suction manual butterfly valve are arranged on the water pump suction pipe. The water pump suction pipe is connected to two high-pressure water pumps through a first connector. The two first connectors are connected to each other through a connecting electric butterfly valve. An inlet electric butterfly valve and an inlet manual butterfly valve are arranged at the water inlet of the high-pressure water pump. An outlet electric ball valve is arranged at the water outlet of the high-pressure water pump. The water outlets of the four high-pressure water pumps are connected to the main water pipe through a second connector. Two return pipes are connected to the main water pipe. The other ends of the return pipes are connected to the water supply pool. A drain electric ball valve and a nitrogen water hammer pressure relief valve are installed on the return pipes. The other end of the main water pipe is connected to the water inlet of the high-level water pool through a connecting flange. A check valve is installed at the water inlet of the high-level water pool. An outlet pipe is arranged on the high-level water pool. The suction electric butterfly valve, the high-pressure water pump, the connecting electric butterfly valve, the inlet electric butterfly valve, the outlet electric ball valve, the drain electric ball valve, and the second pressure monitoring device are all electrically connected to the control device.
[0006] Further, the four high-pressure water pumps are connected in parallel and operate in a three-working-one-spare mode.
[0007] Furthermore, a screen is arranged in the pool inlet pipe for filtering debris.
[0008] Furthermore, a water supply and sewage discharge pipe is provided at the lower part of the water supply pool, a blind plate is provided at the outer end of the water supply and sewage discharge pipe, a high-level sewage discharge pipe is provided at the lower part of the high-level pool, a blind plate is provided at the outer end of the high-level sewage discharge pipe, and a high-level overflow pipe is provided at the upper part of the high-level pool.
[0009] Furthermore, the water supply pool is arranged higher than the high-pressure water pump, and a first pressure monitoring device is also provided at the water inlet of the high-pressure water pump. The first pressure monitoring device is electrically connected to the control device.
[0010] Furthermore, the main water pipe is arranged in a undulating shape along the mountain body, an exhaust valve is installed at the highest point of the undulating position of the main water pipe, and the included angle between the main water pipe and the horizontal plane is 30°-70°.
[0011] Furthermore, a water supply liquid level detection device and a water supply concentration detection device are also provided in the water supply pool, a high-level liquid level detection device and a high-level concentration detection device are provided in the high-level pool, and the water supply liquid level detection device, the water supply concentration detection device, the high-level liquid level detection device and the high-level concentration detection device are all electrically connected to the control device.
[0012] Furthermore, a PE polyethylene outer coating is provided on the outside of the main water pipe, an epoxy resin layer is provided inside the main water pipe, and a wear-resistant rubber plate is bonded inside the epoxy resin layer.
[0013] Furthermore, a second pressure monitoring device is provided at a position on the main water pipe close to the return water pipe, a water outlet electric main valve is installed on the main water pipe, the water outlet electric main valve is located behind the return water pipe, and the water outlet electric main valve is electrically connected to the control device.
[0014] A long-distance high-lift large-flow water supply method stores water in the water supply pool through a pool water inlet pipe. The water stored in the water supply pool flows into the high-level pool through a water pump suction pipe, a high-pressure water pump and a main water pipe. The inlet pressure of the high-pressure water pump is set. When the first pressure monitoring device detects that the inlet pressure of the high-pressure water pump is lower than the set value, the control device prohibits the high-pressure water pump from starting. When the first pressure monitoring device detects that the inlet pressure of the high-pressure water pump is greater than or equal to the set value, the control device starts the high-pressure water pump to supply water;
[0015] During the water supply process, the water supply level detection device automatically detects and senses the level of the water supply reservoir. When the water supply level detection device detects and senses that the water level in the water supply reservoir is between 30% and 100% of the reservoir depth, the existing operating frequency of the high-pressure water pump is maintained, and water is pumped at the normal frequency. When the water supply level detection device detects and senses that the water level in the water supply reservoir is lower than 30% of the reservoir depth, the control device reduces the operating frequency and speed of the high-pressure water pump, reduces the water supply volume until the water level in the water supply reservoir gradually rises to the position of the overflow pipe. When the water supply level detection device detects and senses that the water level in the water supply reservoir is higher than the position of the overflow pipe, the control device increases the operating frequency and speed of the high-pressure water pump, increases the water supply volume until the water level in the water supply reservoir gradually drops to 100% position, and then resumes normal frequency operation.
[0016] During the water supply process, the water supply concentration detection device automatically senses and detects the concentration of the liquid in the water supply reservoir. When the water supply concentration detection device detects and senses that the concentration of the liquid in the water supply reservoir is < 3%, the existing operating frequency of the high-pressure water pump is maintained, and water is pumped at the normal frequency. When the water supply concentration detection device detects and senses that the concentration of the liquid in the water supply reservoir is > 3%, the control device issues an alarm signal, and it is determined manually whether to stop pumping water. When the water supply concentration detection device detects and senses that the concentration of the liquid in the water supply reservoir is > 8%, the control device automatically shuts down the machine 60 seconds after issuing the alarm signal, preventing the high-pressure water pump from sucking high-concentration river water, blocking the pipeline, wearing the pump casing and impeller, and reducing the service life of spare parts.
[0017] During the water supply process, the high-level water level detection device automatically senses and detects the water level in the high-level reservoir. When the high-level water level detection device detects and senses that the water level depth in the high-level reservoir is between 30% and 100%, the existing operating frequency of the high-pressure water pump is maintained, and water is pumped at the normal frequency. When the high-level water level detection device detects and senses that the water level depth in the high-level reservoir is lower than 30%, the control device increases the operating frequency and speed of the high-pressure water pump, increases the water supply volume until the water level in the water supply reservoir gradually rises to the position of the overflow pipe. When the high-level water level detection device detects and senses that the water level depth in the high-level reservoir is higher than 100%, the control device reduces the operating frequency and speed of the high-pressure water pump, reduces the water supply volume until the water level in the high-level reservoir gradually drops to 80%, and then resumes normal frequency water supply of the high-pressure water pump.
[0018] During the water supply process, the second pressure monitoring device detects the pressure inside the main water pipe. When the pressure inside the main water pipe exceeds the rated pressure value, the control device opens the nitrogen water hammer relief valve and the drain electric ball valve, and returns the water inside the main water pipe back to the water supply reservoir through the return pipe.
[0019] During the water supply process, when the internal pressure of the main water pipe exceeds the set value, the exhaust valve automatically opens to release the overpressure gas inside, so that the internal pressure of the main water pipe returns to balance. Conversely, when the internal pressure of the main water pipe is lower than the set value, the exhaust valve automatically closes to prevent the liquid from continuing to flow out of the exhaust pipe. Secondly, when there is gas in the main water pipe, the gas will climb upward along the main water pipe and finally gather at the highest point of the undulating position of the main water pipe, that is, the installation position of the exhaust valve. As the gas in the exhaust valve increases, the pressure rises. When the gas pressure is greater than the internal system pressure of the main water pipe, the gas will cause the water level inside the main water pipe to drop. The float or buoy on the exhaust valve drops along with the water level, and then the exhaust hole on the exhaust valve is opened for exhaust. When the gas is exhausted, the water level rises, the float or buoy on the exhaust valve rises along with the water level, and the exhaust hole on the exhaust valve automatically closes. In this way, the automatic exhaust of the main water pipe is realized;
[0020] During the water supply process, the control device controls the four high-pressure water pumps to start in a staggered peak-shaving manner. According to the liquid level inside the elevated water tank and different power consumption periods, the four high-pressure water pumps are alternately turned on, and the liquid level control strategy inside the elevated water tank takes precedence over the control strategy of the power consumption period. During the day with peak power consumption, at least one high-pressure water pump is turned on. During the low-power consumption period, the high-pressure water pumps are controlled according to the liquid level inside the elevated water tank for water supply.
[0021] Compared with the prior art, the present invention has the following advantages:
[0022] The present invention sets a first pressure monitoring device at the inlet of the high-pressure water pump to measure the inlet pressure of the high-pressure water pump. Only when the pressure exceeds the set value is the water pump turned on for water supply, preventing safety production accidents such as cavitation, turbulence, and water hammer caused by insufficient water absorption of the high-pressure water pump;
[0023] The present invention sets a return pipe, installs a nitrogen water hammer relief valve on the return pipe, and sets a second pressure monitoring device on the main water pipe near the return pipe. When the second pressure monitoring device detects that the pressure in the main water pipe exceeds the standard, the control device opens the nitrogen water hammer relief valve and the drain electric ball valve, eliminating the harm of water hammer and preventing phenomena such as sudden opening and closing of valves, sudden start and stop of high-pressure water pumps, or other accident fault states, resulting in sudden changes in flow velocity and large fluctuations in pressure;
[0024] The present invention sets a plurality of exhaust valves on the main water pipe, realizing the automatic exhaust of the main water pipe;
[0025] The present invention can control the operation of the high-pressure water pumps according to different working conditions, realize the automatic control of the water supply system, and at the same time can realize the staggered use of high-pressure water pumps, effectively reducing the water supply cost. BRIEF DESCRIPTION OF THE DRAWINGS
[0026] Figure 1Schematic diagram of the structure of the present invention;
[0027] Figure 2 Schematic diagram of the structure of the first communicating vessel of the present invention;
[0028] Figure 3 Schematic diagram of the structure of the second communicating vessel of the present invention;
[0029] In the figure, there are water supply pool 1, pool inlet pipe 2, water supply overflow pipe 3, water supply liquid level detection device 4, water supply concentration detection device 5, water pump suction pipe 6, suction electric butterfly valve 7, suction manual butterfly valve 8, first communicating vessel 9, high-pressure water pump 10, communicating electric butterfly valve 11, inlet electric butterfly valve 12, inlet manual butterfly valve 13, outlet electric ball valve 14, second communicating vessel 15, main water pipe 16, return water pipe 17, drain electric ball valve 18, nitrogen water hammer pressure relief valve 19, second pressure monitoring device 20, outlet electric main valve 21, elevated water tank 22, check valve 23, elevated sewage pipe 24, elevated overflow pipe 25, outlet pipe 26, elevated liquid level detection device 27, elevated concentration detection device 28, water supply sewage pipe 30, first pressure monitoring device 31, exhaust valve 32. Detailed implementation manners
[0030] In order to further elaborate the technical solution of the present invention, the present invention will be further described below through embodiments.
[0031] As Figures 1 to 3As shown in the figure, a long-distance, high-lift and large-flow water supply system includes a water supply pool 1. There are two such water supply pools 1. A screen is provided in the water inlet pipe 2 of the pool to filter debris. A water inlet pipe 2 and a water supply overflow pipe 3 are provided at the upper part of the water supply pool 1. A water supply sewage pipe 30 is provided at the lower part of the water supply pool 1. A blind plate is provided at the outer end of the water supply sewage pipe 30. A water supply liquid level detection device 4 and a water supply concentration detection device 5 are also provided in the water supply pool 1. A water pump suction pipe 6 is provided at the lower part of the water supply pool 1. A suction electric butterfly valve 7 and a suction manual butterfly valve 8 are provided on the water pump suction pipe 6. The water pump suction pipe 6 is connected to two high-pressure water pumps 10 through a first connector 9. The water supply pool 1 is set higher than the high-pressure water pumps 10. The four high-pressure water pumps 10 are connected in parallel and operate in a mode of three working and one standby. The two first connectors 9 are connected to each other through a connecting electric butterfly valve 11. An inlet electric butterfly valve 12 and an inlet manual butterfly valve 13 are provided at the water inlet of the high-pressure water pump 10. A first pressure monitoring device 31 is also provided at the water inlet of the high-pressure water pump 10. An outlet electric ball valve 14 is provided at the water outlet of the high-pressure water pump 10. The water outlets of the four high-pressure water pumps 10 are connected to the main water pipe 16 through a second connector 15. A PE polyethylene outer coating is provided on the outside of the main water pipe 16. An epoxy resin layer is provided inside the main water pipe 16. A wear-resistant rubber plate is adhesively bonded inside the epoxy resin layer. Two return water pipes 17 are connected to the main water pipe 16. The other ends of the return water pipes 17 are connected to the water supply pool 1. A drain electric ball valve 18 and a nitrogen water hammer pressure relief valve 19 are installed on the return water pipes 17. A second pressure monitoring device 20 is provided at a position on the main water pipe 16 close to the return water pipes 17. An outlet electric main valve 21 is installed on the main water pipe 16. The outlet electric main valve 21 is located behind the return water pipes 17. The main water pipe 16 is arranged in a undulating shape along the mountain. An exhaust valve 32 is installed at the highest point of the undulating position of the main water pipe 16. The angle between the main water pipe 16 and the horizontal plane is 30° to 70°. The other end of the main water pipe 16 is connected to the water inlet of a high-level water tank 22 through a connecting flange. A check valve 23 is installed at the water inlet of the high-level water tank 22. A high-level liquid level detection device 27 and a high-level concentration detection device 28 are provided in the high-level water tank 22. A water outlet pipe 26 is provided on the high-level water tank 22. A high-level sewage pipe 24 is provided at the lower part of the high-level water tank 22. A blind plate is provided at the outer end of the high-level sewage pipe 24. A high-level overflow pipe 25 is provided at the upper part of the high-level water tank 22.The water supply level detection device 4, water supply concentration detection device 5, suction electric butterfly valve 7, high-pressure water pump 10, connecting electric butterfly valve 11, inlet electric butterfly valve 12, outlet electric ball valve 14, drain electric ball valve 18, second pressure monitoring device 20, outlet electric main valve 21, high-level liquid level detection device 27, high-level concentration detection device 28, and first pressure monitoring device 31 are all electrically connected to the control device.
[0032] A long-distance, high-lift, large-flow water supply method stores water in the water supply reservoir 1 through the reservoir inlet pipe 2. The water stored in the water supply reservoir 1 flows into the high-level reservoir 22 through the water pump suction pipe 6, high-pressure water pump 10, and main pipe 16. The inlet pressure of the high-pressure water pump 10 is set. When the first pressure monitoring device 31 detects that the inlet pressure of the high-pressure water pump 10 is lower than the set value, the control device prohibits the high-pressure water pump 10 from starting. When the first pressure monitoring device 31 detects that the inlet pressure of the high-pressure water pump 10 is greater than or equal to the set value, the control device starts the high-pressure water pump 10 to supply water.
[0033] During the water supply process, the water supply level detection device 4 automatically detects and senses the level of the water supply reservoir 1. When the water supply level detection device 4 detects and senses that the level of the water supply reservoir 1 is between 30% and 100% of the reservoir depth, the existing operating frequency of the high-pressure water pump 10 is maintained, and water is pumped at the normal frequency. When the water supply level detection device 4 detects and senses that the level of the water supply reservoir 1 is lower than 30% of the reservoir depth, the control device reduces the operating frequency and speed of the high-pressure water pump 10 to reduce the water supply volume until the level of the water supply reservoir 1 gradually rises to the position of the overflow pipe. When the water supply level detection device 4 detects and senses that the water level of the water supply reservoir 1 is higher than the position of the overflow pipe, the control device increases the operating frequency and speed of the high-pressure water pump 10 to increase the water supply volume until the level of the water supply reservoir 1 gradually decreases to the position where the level of the water supply reservoir 1 is at 100%, and then resumes normal frequency operation.
[0034] During the water supply process, the water supply concentration detection device 5 automatically senses and detects the concentration of the liquid in the water supply reservoir 1. When the water supply concentration detection device 5 detects and senses that the concentration of the liquid in the water supply reservoir 1 is <3%, the existing operating frequency of the high-pressure water pump 10 is maintained, and water is pumped at the normal frequency. When the water supply concentration detection device 5 detects and senses that the concentration of the liquid in the water supply reservoir 1 is >3%, the control device issues an alarm signal, and it is determined manually whether to stop pumping water. When the water supply concentration detection device 5 detects and senses that the concentration of the liquid in the water supply reservoir 1 is >8%, the control device automatically shuts down the machine 60 seconds after issuing the alarm signal, preventing the high-pressure water pump 10 from sucking high-concentration river water, blocking the pipeline, wearing the pump casing and impeller, and reducing the service life of spare parts.
[0035] During the water supply process, the high-level liquid level detection device 27 automatically senses and detects the liquid level in the high-level water tank 22. When the liquid level depth detected by the high-level liquid level detection device 27 in the high-level water tank 22 is between 30% and 100%, the existing operating frequency of the high-pressure water pump 10 is maintained, and water is pumped at the normal frequency. When the high-level liquid level detection device 27 detects that the liquid level depth in the high-level water tank 22 is lower than 30%, the control device increases the operating frequency and speed of the high-pressure water pump 10 to increase the water supply volume until the liquid level of the water supply tank 1 gradually rises to the position of the overflow pipe. When the high-level liquid level detection device 27 detects that the liquid level depth in the high-level water tank 22 is higher than 100%, the control device reduces the operating frequency and speed of the high-pressure water pump 10 to reduce the water supply volume. When the liquid level of the high-level water tank 22 gradually drops to 80% high, the normal frequency water supply of the high-pressure water pump 10 is restored;
[0036] During the water supply process, the pressure inside the main water pipe 16 is detected by the second pressure monitoring device 20. When the pressure inside the main water pipe 16 exceeds the rated pressure value, the nitrogen water hammer relief valve 19 and the drain electric ball valve 18 are opened through the control device, and the water inside the main water pipe 16 is sent back to the water supply tank 1 through the return water pipe 17;
[0037] During the water supply process, when the pressure inside the main water pipe 16 exceeds the set value, the exhaust valve 32 automatically opens to release the internal overpressure gas, so that the pressure inside the main water pipe 16 is restored to balance. On the contrary, when the pressure inside the main water pipe 16 is lower than the set value, the exhaust valve 32 automatically closes to prevent the liquid from continuing to flow out of the exhaust pipe. Secondly, when there is gas inside the main water pipe 16, the gas will climb up along the main water pipe 16 and finally gather at the highest point of the undulating position of the main water pipe 16, that is, the installation position of the exhaust valve 32. As the gas in the exhaust valve 32 increases, the pressure rises. When the gas pressure is greater than the internal system pressure of the main water pipe 16, the gas will cause the water level inside the main water pipe 16 to drop, and the float or float in the exhaust valve 32 will drop with the water level, and then the exhaust hole on the exhaust valve 32 will be opened for exhaust. When the gas is exhausted, the water level rises, the float or float in the exhaust valve 32 rises with the water level, and the exhaust hole on the exhaust valve 32 automatically closes. In this way, the automatic exhaust of the main water pipe 16 is realized;
[0038] During the water supply process, the control device controls the four high-pressure water pumps 10 to start in turn with peak shifting. According to the liquid level inside the high-level water tank 22 and different power consumption periods, the four high-pressure water pumps 10 are turned on in turn, and the liquid level control strategy inside the high-level water tank 22 takes precedence over the control strategy of the power consumption period. During the day with peak power consumption, at least one high-pressure water pump 10 is turned on. During the low power consumption period, the high-pressure water pump 10 is controlled according to the liquid level inside the high-level water tank 22 for water supply.
[0039] The main features and advantages of the present invention have been shown and described above. For those skilled in the art, it is obvious that the present invention is not limited to the details of the above-described exemplary embodiments, and without departing from the spirit or basic characteristics of the present invention, the present invention can be implemented in other specific forms. Therefore, from any point of view, the embodiments should be regarded as exemplary and non-limiting. The scope of the present invention is defined by the appended claims rather than the above description. Therefore, all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be embraced within the present invention.
[0040] In addition, it should be understood that although this specification is described in terms of embodiments, not every embodiment only contains an independent technical solution. This narrative manner of the specification is only for clarity. Those skilled in the art should regard the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.
Claims
1. A long-distance, high-lift, large-flow water supply system, characterized by: The invention comprises a water supply pool (1), wherein the water supply pool (1) has two water supply pools (1), a water pool water inlet pipe (2) and a water supply overflow pipe (3) are arranged at the upper part of the water supply pool (1), a water pump water suction pipe (6) is arranged at the lower part of the water supply pool (1), a water suction electric butterfly valve (7) and a water suction manual butterfly valve (8) are arranged on the water pump water suction pipe (6), the water pump water suction pipe (6) is connected to two high-pressure water pumps (10) through a No. 1 communicating vessel (9), the two No. 1 communicating vessels (9) are connected through a connecting electric butterfly valve (11), a water inlet electric butterfly valve (12) and a water inlet manual butterfly valve (13) are arranged at the water inlet of the high-pressure water pump (10), a water outlet electric ball valve (14) is arranged at the water outlet of the high-pressure water pump (10), and the water outlets of the four high-pressure water pumps (10) are connected through a No. 2 communicating vessel. (15) is connected to the main water pipe (16), and two return pipes (17) are connected to the main water pipe (16). The other end of the return pipe (17) is connected to the water supply tank (1), and a water discharge electric ball valve (18) and a nitrogen water hammer pressure relief valve (19) are installed on the return pipe (17). The other end of the main water pipe (16) is connected to the water inlet of the high-level water tank (22) through a connecting flange. A check valve (23) is installed at the water inlet of the high-level water tank (22). An outlet pipe (26) is arranged on the high-level water tank (22). The water suction electric butterfly valve (7), the high-pressure water pump (10), the connecting electric butterfly valve (11), the water inlet electric butterfly valve (12), the water outlet electric ball valve (14), the water discharge electric ball valve (18) and the second pressure monitoring device (20) are all electrically connected to the control device.
2. A long-distance, high-lift, large-flow water supply system according to claim 1, characterized in that: The four high-pressure water pumps (10) are connected in parallel and operate in a three-in-one-standby mode.
3. A long-distance, high-lift, large-flow water supply system according to claim 2, characterized in that: A screen is arranged inside the pool water inlet pipe (2) for filtering debris.
4. A long-distance, high-lift, large-flow water supply system according to claim 3, characterized in that: A water supply sewage pipe (30) is arranged at the lower part of the water supply pool (1), and a blind plate is arranged at the outer end of the water supply sewage pipe (30); a high-level sewage pipe (24) is arranged at the lower part of the high-level water pool (22), and a blind plate is arranged at the outer end of the high-level sewage pipe (24); and a high-level overflow pipe (25) is arranged at the upper part of the high-level water pool (22).
5. A long-distance, high-lift, large-flow water supply system according to claim 4, characterized in that: The water supply pool (1) is arranged higher than the high-pressure water pump (10), and a first pressure monitoring device (31) is also arranged at the water inlet of the high-pressure water pump (10), and the first pressure monitoring device (31) is electrically connected to the control device.
6. A long-distance, high-lift, large-flow water supply system according to claim 5, characterized in that: The main water pipe (16) is arranged in an undulating shape along the mountain, and an exhaust valve (32) is installed at the highest point of the undulating position of the main water pipe (16). The angle between the main water pipe (16) and the horizontal plane is 30° to 70°.
7. A long-distance, high-lift, large-flow water supply system according to claim 6, characterized in that: A water supply level detection device (4) and a water supply concentration detection device (5) are also provided in the water supply pool (1), and a high-level liquid level detection device (27) and a high-level concentration detection device (28) are provided in the high-level water pool (22). The water supply level detection device (4), the water supply concentration detection device (5), the high-level liquid level detection device (27) and the high-level concentration detection device (28) are all electrically connected to the control device.
8. A long-distance, high-lift, large-flow water supply system according to claim 7, characterized in that: A PE polyethylene outer coating is arranged on the outside of the main water pipe (16), an epoxy resin layer is arranged on the inside of the main water pipe (16), and a wear-resistant rubber plate is bonded to the inside of the epoxy resin layer.
9. A long-distance, high-lift, large-flow water supply system according to claim 8, characterized in that: A second pressure monitoring device (20) is arranged on the main water pipe (16) near the return pipe (17), and a water outlet electric main valve (21) is installed on the main water pipe (16). The water outlet electric main valve (21) is located behind the return pipe (17), and the water outlet electric main valve (21) is electrically connected to the control device.
10. A long-distance, high-lift, and large-flow water supply method based on the system of claim 9, characterized in that: Water is stored in a water supply pool (1) through a pool water inlet pipe (2), and the water stored in the water supply pool (1) flows into a high-level water pool (22) through a water pump suction pipe (6), a high-pressure water pump (10) and a main water pipe (16). The water inlet pressure of the high-pressure water pump (10) is set. When the first pressure monitoring device (31) detects that the water inlet pressure of the high-pressure water pump (10) is lower than the set value, the control device prohibits the high-pressure water pump (10) from starting. When the first pressure monitoring device (31) detects that the water inlet pressure of the high-pressure water pump (10) is greater than or equal to the set value, the control device starts the high-pressure water pump (10) to supply water; During the water supply process, the water supply liquid level detection device (4) automatically detects and senses the liquid level of the water supply pool (1). When the water supply liquid level detection device (4) detects and senses that the liquid level of the water supply pool (1) is between 30% and 100% of the pool depth, the existing operating frequency of the high-pressure water pump (10) is maintained and water is pumped at a normal frequency. When the water supply liquid level detection device (4) detects and senses that the liquid level of the water supply pool (1) is lower than 30% of the pool depth, the control device reduces the operating frequency and operating speed of the high-pressure water pump (10) and reduces the amount of water supplied to the outside until the liquid level of the water supply pool (1) gradually rises to the position of the overflow pipe. When the water supply liquid level detection device (4) detects and senses that the water level of the water supply pool (1) is higher than the position of the overflow pipe, the control device increases the operating frequency and operating speed of the high-pressure water pump (10) and increases the amount of water supplied until the liquid level of the water supply pool (1) gradually decreases to the position of 100% of the liquid level of the water supply pool (1), and then resumes normal frequency operation. During the water supply process, the concentration of the liquid in the water supply pool (1) is automatically sensed and detected by the water supply concentration detection device (5). When the water supply concentration detection device (5) detects that the concentration of the liquid in the water supply pool (1) is less than 3%, the existing operating frequency of the high-pressure water pump (10) is maintained, and water is pumped at a normal frequency. When the water supply concentration detection device (5) detects that the concentration of the liquid in the water supply pool (1) is greater than 3%, the control device sends an alarm signal, and a manual determination is made as to whether the water pumping needs to be stopped. When the water supply concentration detection device (5) detects that the concentration of the liquid in the water supply pool (1) is greater than 8%, the control device automatically stops after sending an alarm signal for 60 seconds, thereby preventing the high-pressure water pump (10) from absorbing high-concentration river water, clogging the pipeline, wearing the pump casing and impeller, and reducing the service life of spare parts. During the water supply process, the liquid level in the high-level water tank (22) is automatically sensed and detected by the high-level liquid level detection device (27). When the high-level liquid level detection device (27) detects that the liquid level depth in the high-level water tank (22) is between 30% and 100%, the existing operating frequency of the high-pressure water pump (10) is maintained and water is pumped at a normal frequency. When the high-level liquid level detection device (27) detects that the liquid level depth in the high-level water tank (22) is lower than 30%, the high-pressure water pump (10) is increased by the control device. The operating frequency and speed of the high-pressure water pump (10) are increased to increase the water supply until the liquid level in the water supply pool (1) gradually rises to the position of the overflow pipe; when the high-level liquid level detection device (27) detects that the liquid level in the high-level water pool (22) is higher than 100%, the operating frequency and speed of the high-pressure water pump (10) are reduced through the control device to reduce the water supply, and when the liquid level in the high-level water pool (22) gradually decreases to 80% of the high level, the high-pressure water pump (10) is restored to supply water at a normal frequency; During the water supply process, the pressure inside the main water pipe (16) is detected by the second pressure monitoring device (20). When the pressure inside the main water pipe (16) exceeds the rated pressure value, the nitrogen water hammer pressure relief valve (19) and the water discharge electric ball valve (18) are opened by the control device, and the water inside the main water pipe (16) is returned to the water supply pool (1) through the return pipe (17); During the water supply process, when the internal pressure of the main water pipe (16) exceeds the set value, the exhaust valve (32) automatically opens to release the internal overpressure gas, so that the internal pressure of the main water pipe (16) returns to balance. On the contrary, when the internal pressure of the main water pipe (16) is lower than the set value, the exhaust valve (32) automatically closes to prevent the liquid from continuing to flow out of the exhaust pipe. Secondly, when there is gas inside the main water pipe (16), the gas will climb up along the main water pipe (16) and finally gather at the highest point of the undulating position of the main water pipe (16), that is, the installation position of the exhaust valve (32). As the gas in the exhaust valve (32) increases, the pressure rises. When the gas pressure is greater than the system pressure inside the main water pipe (16), the gas causes the water level inside the main water pipe (16) to drop, and the float or buoy on the exhaust valve (32) drops along with the water level, and then the exhaust hole on the exhaust valve (32) is opened to exhaust. When the gas is exhausted, the water level rises, and the float or buoy on the exhaust valve (32) rises along with the water level, and the exhaust hole on the exhaust valve (32) is automatically closed. This cycle is repeated to achieve automatic exhaust of the main water pipe (16). During the water supply process, the control device controls the four high-pressure water pumps (10) to start in turn at different times according to the liquid level inside the high-level water tank (22) and different power consumption periods. The four high-pressure water pumps (10) are started in turn, and the liquid level control strategy inside the high-level water tank (22) takes precedence over the control strategy for the power consumption period. During the day when power consumption is at a peak, at least one high-pressure water pump (10) is started. During low power consumption, the high-pressure water pump (10) is controlled to supply water according to the liquid level inside the high-level water tank (22).