Directed radiation breeding and planting method
By enriching specific elements in plants and using their interaction with radiation, a nuclear reaction is generated and the radiation level in the specific functional cells of the plant is improved, the problem of high throughput in the existing technology is solved, and directional radiation cultivation is achieved, which improves mutation rate and safety.
Patent Information
- Application Number
- CN202510293458.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-03-12
- Publication Date
- 2025-06-03
AI Technical Summary
Existing radiation cultivation techniques require extremely high radiation to induce plant mutations, resulting in low technical complexity and success rate, and it is difficult to achieve directional radiation cultivation.
By enriching preset elements, such as 6Li, 10B, 233U, 235U, 239Pu and 241Pu in sample plants, and interacting with radiation in a radiation environment, a nuclear reaction of charged particles is generated, thereby increasing the radiation level in specific functional cells, increasing the probability of gene mutation, and realizing directional radiation cultivation.
Implementing radiation cultivation at low flux reduces the radiation flux and cost required for radiation cultivation, improves the orientation and selection efficiency of mutation rates, and enhances the safety and promotion scope of the technology.
Smart Images
Figure CN120077947A_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of radiation breeding, and specifically, to a method for directional radiation breeding. Background Art
[0002] Radiation breeding technology is one of the important means for plant improvement. It mainly uses radiation to induce changes in the genetic characteristics of organisms, and then cultivates new excellent varieties through artificial selection. In principle, radiation breeding technology uses radiation to ionize and excite various molecules in the sample plant, causing changes in the DNA molecular structure or chromosomal aberrations, thereby generating mutations in the sample plant. Finally, by selecting and identifying mutants, new varieties that can be utilized are directly or indirectly cultivated.
[0003] Radiation breeding technology often uses γ-rays, X-rays, β-rays, neutrons, etc. Currently, in order to achieve a sufficient mutation rate in radiation breeding, it is usually necessary to make the sample plant reach a dose level of several Gy to several hundred Gy. Therefore, a very large irradiation dose is required to induce mutations in the sample plant. Taking neutrons as an example, when performing radiation breeding on a sample plant, the neutron flux range is 1×10 11 to 1×10 12 n / cm 2 , irradiating with a semi-lethal dose or a neighboring dose, and the dose rate is above several R / min. A very high neutron flux is required, which greatly limits the popularization and application of radiation breeding technology.
[0004] Since gene mutations induced by radiation breeding may occur in all cells of the plant, the low mutation rate greatly increases the complexity of radiation breeding and reduces the success rate of radiation breeding. Therefore, how to improve the frequency of induced beneficial mutations and selection efficiency is also an important research content of radiation breeding. Directional mutagenesis is the core means to increase the mutation rate. However, the mutagenic effects of different mutagenic factors on different plants are different. Even for different varieties of the same plant, the effects of mutagenic factors are also different. Moreover, there are also great differences in the effects of inducing a certain trait in the plant.
[0005] In the related art, how to achieve directional radiation breeding under low-flux radiation is a technical problem that needs to be solved urgently by those skilled in the art. Summary of the Invention
[0006] The present invention aims to solve at least one of the technical problems in the related art to some extent. For this purpose, an embodiment of the present invention provides a method for directional radiation breeding. The method for directional radiation breeding uses the interaction between a preset element in a sample plant and radiation to increase the radiation level in specific functional cells of a first target plant under the same irradiation dose, thereby increasing the probability of gene mutation in the specific functional cells and achieving directional radiation breeding.
[0007] The directional radiation cultivation method of the present invention includes:
[0008] S300: Place the first target plant enriched with a preset element in a radiation environment with a preset flux for radiation to obtain a mutated second target plant, where the preset element is enriched at the target position of the first target plant, and the preset element can produce a nuclear reaction generating charged particles inside the cells of the first target plant under the action of the radiation.
[0009] Optionally, before step S300, the directional radiation cultivation method further includes:
[0010] S100: Place the first sample plant in a nutrient solution containing the preset element for cultivation, and screen to obtain a second sample plant enriched with the preset element;
[0011] S200: Detect whether the preset element in the second sample plant is enriched at the target position of the second sample plant, and screen to obtain the first target plant with the preset element enriched at the target position.
[0012] Optionally, step S200 further includes:
[0013] Cultivate the first target plant to obtain the first target plant with genetic performance;
[0014] Among them, the genetic performance of the first target plant has the characteristic of inheriting the enrichment of the preset element at the target position.
[0015] Optionally, in step S100, it further includes: screening the second sample plant to obtain the second sample plant enriched with a target quantity of the preset element.
[0016] Optionally, under a certain irradiation dose and flux, the radiation duration is inversely proportional to the storage amount of the preset element inside the cells of the second sample plant.
[0017] Optionally, under a certain irradiation dose and duration, the preset flux is inversely proportional to the storage amount of the preset element inside the cells of the second sample plant.
[0018] Optionally, after step S300, the directional radiation cultivation method further includes:
[0019] S400: Cultivate the second target plant and screen to obtain a third target plant expressing the target function.
[0020] Optionally, in the first target plant, the preset element is enriched in specific functional cells.
[0021] Optionally, the radiation is neutron radiation, where the preset element is 6 Li, 10 B, 233 U, 235 U, 239 Pu, and 241 at least one of Pu.
[0022] Optionally, the radiation is ionizing radiation. BRIEF DESCRIPTION OF THE DRAWINGS
[0023] Figure 1 is a schematic flow chart of the directional radiation cultivation method according to a specific embodiment of the present invention. DETAILED DESCRIPTION
[0024] Embodiments of the present invention will be described in detail below. Examples of the embodiments are shown in the drawings. The embodiments described below by referring to the drawings are exemplary and are intended to explain the present invention, and should not be construed as limiting the present invention.
[0025] The directional radiation cultivation method according to an embodiment of the present invention will be described below with reference to the drawings. As Figure 1 shown, the directional radiation cultivation method according to an embodiment of the present invention includes:
[0026] S300: Place a first target plant enriched with a preset element in a radiation environment with a preset flux for radiation to obtain a mutated second target plant, where the preset element is enriched at a target position of the first target plant, and the preset element can produce a nuclear reaction generating charged particles in the cells of the first target plant under the action of radiation.
[0027] According to the directional radiation cultivation method in this embodiment, when irradiating the first target plant enriched with the preset element, the interaction between the preset element and the radiation can generate charged particles in the cells of the first target plant. The cells of the first target plant are simultaneously affected by the combined action of the external radiation dose and the internal charged particle radiation dose. That is, the radiation dose level in the cells of the first target plant can be increased, thereby greatly reducing the preset flux of the external radiation, and thus realizing radiation cultivation at a low flux, reducing the radiation flux required for radiation cultivation, and also reducing the difficulty and cost of radiation cultivation. At the same time, the preset element is enriched at the target position of the first target plant, and the charged particles generated by the interaction between the preset element and the radiation can act on the target position to make the dose at the target position higher than other positions, thereby increasing the probability of mutation at the target position and achieving the effect of directional mutation. In addition, reducing the preset flux required for radiation cultivation can reduce the radiation risk of the staff during the radiation cultivation process, and improve the safety and popularization range of radiation cultivation.
[0028] As Figure 1As shown below, to make the technical solution of the present application easier to understand, the technical solution of the present application will be described in more detail with specific embodiments of the directional radiation cultivation method.
[0029] In some specific embodiments, as Figure 1 shown, S100: Place the first sample plant in a nutrient solution containing a preset element for cultivation, and screen to obtain a second sample plant enriched with the preset element. Specifically, cultivate the first sample plant in a nutrient solution containing a preset element. Some of the first sample plants have a chance to enrich the preset element, and then screen to obtain a second sample plant enriched with the preset element. Among them, the first sample plant is detected by conventional means, and it is determined that the preset element is enriched in the first sample plant. The second sample plant enriched with the preset element can increase the dose level in the cell through the nuclear reaction of the preset element, and then can reach the radiation level required for radiation cultivation at a lower flux. That is to say, the interaction between the preset element and radiation can generate charged particles in the cells of the second sample plant, and the cells of the second sample plant are simultaneously affected by the combined action of the radiation dose and the charged particle radiation dose. That is, the radiation dose level in the cells of the second sample plant can be increased, thereby greatly reducing the preset flux of radiation required for radiation cultivation, realizing radiation cultivation at a low flux, reducing the radiation intensity required for radiation cultivation, and reducing the difficulty and cost of radiation cultivation.
[0030] In some specific embodiments, step S100 further includes: screening the second sample plant to obtain a second sample plant enriched with a target amount of the preset element. Specifically, in the second sample plant, the content of the preset element increases, which can further increase the nuclear reaction dose level in the cell, thereby further reducing the flux required to achieve radiation cultivation. That is to say, when the concentration of the preset element in the cells of the second sample plant is high enough, the preset flux of radiation required to achieve radiation cultivation can be greatly reduced, thereby realizing radiation cultivation at a low flux, reducing the radiation intensity required for radiation cultivation, and reducing the difficulty and cost of radiation cultivation. In addition, reducing the preset flux required for radiation cultivation can reduce the radiation risk of the staff during the radiation cultivation process, and improve the safety and promotion range of radiation cultivation.
[0031] In some specific embodiments, under a certain irradiation dose and flux, the radiation duration is inversely proportional to the content of a preset element in the cells of the second sample plant. Specifically, when the content of the preset element in the cells increases, the number of charged particles generated by the nuclear reaction between the preset element and the radiation increases, so the internal radiation dose generated by the nuclear reaction increases. Since the total irradiation dose required for radiation breeding of a specific type of plant is constant, the requirement for the external irradiation dose can be reduced. Therefore, under a certain flux irradiation, the radiation flux required for radiation breeding can be further reduced. Similarly, under a certain irradiation dose and duration, the preset flux is inversely proportional to the storage amount of the preset element in the cells of the second sample plant. The working principle and technical effects are similar to those where the radiation duration is inversely proportional to the content of the preset element in the cells of the second sample plant, and will not be elaborated here.
[0032] In some specific embodiments, in step S100, in the first target plant, the preset element is enriched in specific functional cells. Specifically, the specific functional cells can be understood as the cells that can express specific functions in the first target plant. For example, specific functional cells such as those that can improve the yield or nutritional value of the first target plant. Taking the example of improving the yield of the first target plant, when the preset element is enriched in specific functional cells, the specific functional cells can be distinguished from the rest of the cells, so as to ensure that radiation-induced mutations only occur within the specific functional cells, thereby achieving directional constraints in radiation breeding and reducing the random range of mutations. At the same time, when the preset element is enriched in specific functional cells, the dose level within the specific functional cells can be increased, and then the radiation flux can be reduced, ensuring that the dose of other cells is maintained at a low level, thereby achieving radiation breeding within the specific functional cells. In some specific embodiments, as Figure 1 shown, S200: Detect whether the preset element in the second sample plant is enriched at the target position of the second sample plant, and screen to obtain the first target plant in which the preset element is enriched at the target position. Specifically, screening to obtain the first target plant in which the preset element is enriched at the target position is achieved by using conventional detection technical means to detect the preset element at the target position, such as mass spectrometry, chromatography, or conventional gene detection techniques, etc. Specifically, detect the second sample plant to determine whether the preset element is enriched at the target position of the second sample plant, and screen to obtain the first target plant in which the preset element is enriched at the target position, that is, perform directional irradiation on the target position and then perform directional mutation. In addition, reducing the preset flux required for radiation breeding can reduce the radiation risk of the staff during the process of radiation breeding, and improve the safety and promotion scope of radiation breeding.
[0033] In some specific embodiments, a first target plant is cultivated, and a first target plant with genetic performance is screened out; wherein, the genetic performance of the first target plant has the characteristic that genetic preset elements are enriched at target positions, that is, among the first target plants enriched with preset elements, the first target plant can be cultivated, and a first target plant with genetic performance can be screened out, so that the first target plant can permanently obtain the characteristic that the preset elements are enriched at the target positions.
[0034] In some specific embodiments, as Figure 1 shown, the first target plant enriched with preset elements is placed in a radiation environment with a preset flux for radiation to obtain a mutated second target plant, wherein the preset elements are enriched at the target positions of the first target plant, and the preset elements can produce nuclear reactions generating charged particles in the cells of the first target plant under the action of radiation. Specifically, when the first target plant contains preset elements, the preset elements and radiation can interact with each other in the cells of the first target plant to generate charged particles. The cells of the first target plant are simultaneously affected by the combined action of the radiation dose and the charged particle dose, which can increase the nuclear reaction dose level of the preset elements in the cells and increase the probability of radiation-induced mutation. That is to say, generally, the total dose required to induce cell mutation is constant, that is, the total dose in the cells is jointly given by the radiation dose, the γ dose, and the nuclear reaction dose of the preset elements. Traditional radiation breeding is jointly given by the neutron radiation dose and the γ dose. Compared with traditional radiation breeding, the first target plant in this specific embodiment contains preset elements. When the total dose in the cells remains unchanged, not only the radiation dose is reduced, but also the first target plant can reach the mutation probability required for radiation breeding, that is, by adding preset elements to the first target plant, by increasing the nuclear reaction dose level of the preset elements in the cells of the first target plant, the preset flux of radiation can be greatly reduced, thereby reducing the cost of radiation breeding. At the same time, reducing the preset flux of radiation can reduce the radiation risk of the staff during the radiation breeding process and improve the safety of radiation breeding. In addition, reducing the preset flux of radiation can reduce the radiation risk of the staff during the radiation breeding process and improve the safety of radiation breeding.
[0035] It should be noted that after a certain content of the preset element concentration is contained in the cells of the first target plant, the first target plant is placed in a radiation field with a preset flux for radiation for a certain time. In the cells, the preset elements and radiation undergo a nuclear reaction to absorb neutrons and generate charged particles such as α particles, tritium ions, and hydrogen ions. Since the range of the charged particles is extremely short, ionization occurs in the cells, causing effects such as single-strand breakage of DNA, double-strand breakage, base damage, chromosomal structure variation, and indirect interaction with DNA through the ionization of water, thereby causing the cells to mutate.
[0036] In some specific embodiments, such as Figure 1 shown, S400: Cultivate the second target plant and screen to obtain a third target plant that expresses the target function. Specifically, after irradiating the first target plant, cultivate the obtained second target plant normally, then screen the second target plant to screen the third target plant that has expressed the target gene, and then cultivate the third target plant that has expressed the target function to obtain a heritable third target plant that has expressed the target function.
[0037] In some specific embodiments, the irradiation is neutron irradiation, wherein the preset element is 6 Li, 10 B, 233 U, 235 U, 239 Pu, and 241 at least one of Pu.
[0038] Further explain the working principle of the present invention in the case where the irradiation ray is a neutron beam and the preset element is Li-6:
[0039] S100: Place the first sample plant in a nutrient solution containing a preset element and screen to obtain a second sample plant enriched with the preset element.
[0040] Cultivate the first sample plant alone in a nutrient solution containing Li-6. By monitoring the concentration of Li-6 in the culture solution, it can be confirmed that the first sample plant can enrich Li-6 to obtain a second sample plant. Among them, by culturing the second sample plant for multiple generations, a large number of second sample plants with genetic properties can be obtained.
[0041] S200: Detect whether the preset element in the second sample plant is enriched at the target position of the second sample plant and screen to obtain a first target plant in which the preset element is enriched at the target position.
[0042] Detect the second sample plant to determine whether Li-6 is enriched at the target position of the second sample plant and screen to obtain a first target plant in which Li-6 is enriched at the target position. Among them, Li-6 is enriched at the target position of the first target plant. The charged particles generated by the interaction between Li-6 and the radiation can act on the target position, which can cause mutations at the target position, that is, perform directional irradiation on the target position, and then perform directional mutations.
[0043] S300: Place the first target plant enriched with a preset element in a radiation environment with a preset flux for radiation to obtain a mutated second target plant. The preset element is enriched at a target position of the first target plant, and the preset element can produce a nuclear reaction that generates charged particles within the cells of the first target plant under the action of radiation.
[0044] Within the first target plant, the concentration of Li-6 at the target position is much higher than that at other positions. When irradiated in a thermal neutron radiation field, Li-6 undergoes a nuclear reaction with thermal neutrons to generate a charged particle dose, while the dose generated by the thermal neutrons themselves within the first target plant is very low. The dose generated within the first target plant is mainly produced by the nuclear reaction of Li-6 with thermal neutrons. Among them, since Li-6 is mainly concentrated at the target position, that is, the dose at the target position is much higher than that at other positions, so that the cells at the target position are at a semi-lethal dose, while the remaining positions are at a safe dose. Since the range of the charged particles generated by the nuclear reaction is only a few micrometers, the radiation-induced mutation can be controlled to occur only within the target position, thereby controlling the range of the radiation-induced mutation.
[0045] S400: Cultivate the second target plant and screen to obtain a third target plant expressing the target function.
[0046] Place the second target plant in a specific environment for cultivation, and screen for beneficial mutations occurring on the second target plant. For example, for beneficial mutations such as increased yield, disease resistance, and lodging resistance of the second target plant, screen and cultivate the beneficial mutations to obtain a third target plant with cultivable beneficial mutations.
[0047] In the description of the present invention, it should be understood that the orientation or positional relationship indicated by the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. is the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. It is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be construed as a limitation to the present invention.
[0048] In addition, the terms "first" and "second" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include at least one of such features. In the description of the present invention, the meaning of "a plurality" is at least two, such as two, three, etc., unless otherwise specifically defined.
[0049] In the present invention, unless otherwise clearly specified or limited, the terms "mounted", "connected", "coupled", "fixed", etc. shall be construed in a broad sense. For example, it may be a fixed connection, a detachable connection, or an integral body; it may be a mechanical connection, an electrical connection, or capable of communicating with each other; it may be directly connected, or indirectly connected through an intermediate medium, and it may be the internal communication of two components or the interaction relationship between two components, unless otherwise clearly limited. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.
[0050] In the present invention, unless otherwise clearly specified or limited, the first feature being "on" or "under" the second feature may be that the first and second features are in direct contact, or the first and second features are indirectly in contact through an intermediate medium. Moreover, the first feature being "above", "over" and "on top of" the second feature may be that the first feature is directly above or obliquely above the second feature, or merely indicates that the first feature has a higher horizontal height than the second feature. The first feature being "under", "beneath" and "underneath" the second feature may be that the first feature is directly below or obliquely below the second feature, or merely indicates that the first feature has a lower horizontal height than the second feature.
[0051] In the present invention, the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples", etc. mean that the specific features, structures, materials, or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic descriptions of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in a suitable manner in any one or more embodiments or examples. In addition, without contradiction, those skilled in the art can combine and combine the different embodiments or examples described in this specification and the features of different embodiments or examples.
[0052] Although the above embodiments have been shown and described, it can be understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Any changes, modifications, substitutions, and variations made by those of ordinary skill in the art to the above embodiments are within the protection scope of the present invention.
Claims
1. A directional radiation planting method, characterized in that: include: S300: placing a first target plant enriched with a preset element in a radiation environment of a preset flux for radiation to obtain a mutated second target plant, wherein the preset element is enriched in a target position of the first target plant, and the preset element can cause a nuclear reaction to produce charged particles in cells of the first target plant under the action of the radiation.
2. The directional radiation implantation method according to claim 1, characterized in that: Before step S300, the method further includes: S100: placing the first sample plant in a nutrient solution containing the preset element for cultivation, and screening to obtain a second sample plant enriched with the preset element; S200: Detecting whether the preset element in the second sample plant is enriched in a target position of the second sample plant, and screening to obtain the first target plant in which the preset element is enriched in the target position.
3. The directional radiation implantation method according to claim 2, characterized in that: Step S200 also includes: Cultivating the first target plant to obtain the first target plant having genetic properties; Among them, the genetic performance of the first target plant has the characteristic of enriching the preset element in the target position.
4. The directional radiation planting method according to claim 2, characterized in that: Step S100 also includes: screening the second sample plants to obtain the second sample plants enriched with the target amount of the preset elements.
5. The directional radiation implantation method according to claim 4, characterized in that: Under certain irradiation amount and flux, the irradiation duration is inversely proportional to the storage amount of the preset element in the cells of the second sample plant.
6. The directional radiation implantation method according to claim 4, characterized in that: Under certain irradiation amount and duration, the preset flux is inversely proportional to the storage amount of the preset element in the cells of the second sample plant.
7. The directional radiation implantation method according to claim 1, characterized in that: After step S300, the method further includes: S400: Cultivating the second target plant, and screening to obtain a third target plant expressing the target function.
8. The directional radiation implantation method according to any one of claims 1 to 7, characterized in that: Step S300 also includes: In the first target plant, the preset element is enriched in specific functional cells.
9. The directional radiation implantation method according to any one of claims 1 to 7, characterized in that: The radiation is neutron radiation, wherein the preset element is 6 Li, 10 B. 233 U. 235 U. 239 Pu and 241 At least one of Pu.
10. The directional radiation implantation method according to any one of claims 1 to 7, characterized in that: The radiation is ionizing radiation.