Two-dimensional turntable obstacle avoidance topological relation modeling and planning method

Abstract

The invention discloses a two-dimensional turntable obstacle avoidance topological relation modeling and planning method, and belongs to the technical field of satellite task planning. The method comprises the following steps: planning an obstacle avoidance elliptical trajectory curve of a two-dimensional turntable according to intersection point information of an original task planning trajectory, a sun circle and a rugged limit curve; selecting a plurality of equally-spaced key path points on the obstacle avoidance elliptical trajectory curve, a fitting curve of the starting point of the original task planning trajectory and the starting point of the obstacle avoidance elliptical trajectory curve, and a fitting curve of the end point of the original task planning trajectory and the end point of the obstacle avoidance elliptical trajectory curve; according to a minimum jerk algorithm, fitting calculation is carried out on a path segment formed by every two adjacent key path points, and the optimal task planning track of the two-dimensional rotary table is obtained. According to the invention, the two-dimensional turntable can simultaneously carry out track planning of sunlight avoidance and rugged limiting, so that the task can be smoothly executed.

Description

Technical Field

[0001] The present invention relates to the technical field of satellite mission planning, and particularly relates to a method for modeling and planning the obstacle avoidance topological relationship of a two-dimensional turntable. Background Art

[0002] The wide-area surveillance satellite uses a precision tracking camera installed on a two-dimensional turntable to achieve rapid maneuvering tracking of space targets. However, the rotation of the two-dimensional turntable is subject to the rugged limit problem caused by strong non-linear geometric constraints such as the limit of on-board sensors and the sun avoidance of the precision tracking camera. Therefore, when planning the tracking target trajectory of the turntable on the satellite, it is necessary to consider whether the rotation angle of the turntable will cause the precision tracking camera to point to the sun or the precision tracking camera to collide with other sensors.

[0003] In the related art, it is usually impossible to simultaneously perform trajectory planning for sun avoidance and rugged limit, which results in the inability to complete the tracking tasks of many space targets in the actual application process.

[0004] Based on this, there is an urgent need for a method for modeling and planning the obstacle avoidance topological relationship of a two-dimensional turntable to solve the above technical problems. Summary of the Invention

[0005] The present invention provides a method for modeling and planning the obstacle avoidance topological relationship of a two-dimensional turntable, which can realize the trajectory planning of sun avoidance and rugged limit simultaneously for the on-board turntable. The technical solution is as follows:

[0006] On the one hand, a method for modeling and planning the obstacle avoidance topological relationship of a two-dimensional turntable is provided. The method includes:

[0007] According to the intersection information of the original task planning trajectory with the sun circle and the rugged limit curve, plan to obtain the obstacle avoidance elliptical trajectory curve of the two-dimensional turntable;

[0008] On the three curves of the obstacle avoidance elliptical trajectory curve, the fitting curve of the starting point of the original task planning trajectory and the starting point of the obstacle avoidance elliptical trajectory curve, and the fitting curve of the ending point of the original task planning trajectory and the ending point of the obstacle avoidance elliptical trajectory curve, select multiple equally spaced key path points;

[0009] According to the minimum jerk algorithm, perform fitting calculation on the path segments formed by all adjacent two key path points to obtain the optimal task planning trajectory of the two-dimensional turntable.

[0010] On the other hand, a device for modeling and planning the obstacle avoidance topological relationship of a two-dimensional turntable is provided. The device includes:

[0011] A planning module, configured to plan to obtain the obstacle avoidance elliptical trajectory curve of the two-dimensional turntable according to the intersection information of the original task planning trajectory with the sun circle and the rugged limit curve;

[0012] A selection module, configured to select a plurality of equally-spaced key path points on each of the three curves: the obstacle avoidance elliptical trajectory curve, the fitting curve of the starting point of the original task planning trajectory and the starting point of the obstacle avoidance elliptical trajectory curve, and the fitting curve of the ending point of the original task planning trajectory and the ending point of the obstacle avoidance elliptical trajectory curve;

[0013] A calculation module, configured to perform fitting calculations on all path segments formed by two adjacent key path points according to the minimum snap algorithm to obtain the optimal task planning trajectory of the two-dimensional turntable.

[0014] On the other hand, a computer device is provided, which includes a memory and a processor. The memory is used to store a computer program, and the processor is used to execute the computer program stored on the memory to implement the steps of the above-mentioned two-dimensional turntable obstacle avoidance topological relationship modeling and planning method.

[0015] On the other hand, a computer-readable storage medium is provided. The storage medium stores a computer program, and when the computer program is executed by a processor, it implements the steps of the above-mentioned two-dimensional turntable obstacle avoidance topological relationship modeling and planning method.

[0016] On the other hand, a computer program product is provided, which includes a computer program. When the computer program is executed by a processor, it implements the steps of the above-mentioned two-dimensional turntable obstacle avoidance topological relationship modeling and planning method.

[0017] The technical solution provided by the present invention can at least bring the following beneficial effects: First, according to the intersection relationship between the original task planning trajectory and the sun circle, the sun avoidance trajectory curve of the two-dimensional turntable is planned. Then, on the sun avoidance trajectory curve, the fitting curve of the starting point of the original task planning trajectory and the starting point of the new task planning trajectory, and the fitting curve of the ending point of the original task planning trajectory and the ending point of the new task planning trajectory, a plurality of key points are equally-spaced selected on each curve. Finally, based on the minimum snap algorithm, the motion trajectory between any two key points is re-planned to obtain the optimal task planning trajectory of the two-dimensional turntable. Through this method, the trajectory planning of the two-dimensional turntable for both sunlight avoidance and rough limit is realized, enabling the task to be executed smoothly. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the following drawings are some embodiments of the present invention. For those of ordinary skill in the art, other drawings can be obtained based on these drawings without creative efforts.

[0019] Figure 1 It is a flowchart of a two-dimensional turntable obstacle avoidance topological relationship modeling and planning method provided by an embodiment of the present invention;

[0020] Figure 2 It is a schematic diagram provided by an embodiment of the present invention where there is no intersection between the sun circle and the rugged limit curve;

[0021] Figure 3 It is a schematic diagram provided by an embodiment of the present invention where there is an intersection between the sun circle and the rugged limit curve;

[0022] Figure 4 It is a schematic diagram provided by an embodiment of the present invention where the original task planning trajectory only intersects with the rugged limit curve;

[0023] Figure 5 It is a schematic diagram of the intersection topological structure between the turntable limit frame and the sun circle provided by an embodiment of the present invention;

[0024] Figure 6 It is a schematic diagram of the selection of key path points for the full three - segment trajectory provided by an embodiment of the present invention;

[0025] Figure 7 It is a schematic diagram of the turntable obstacle - avoidance planning trajectory provided by an embodiment of the present invention;

[0026] Figure 8 It is a schematic diagram of the corner, angular velocity, angular acceleration, and jerk of the turntable obstacle - avoidance planning trajectory provided by an embodiment of the present invention;

[0027] Figure 9 It is a structural diagram of the two - dimensional turntable obstacle - avoidance topological relationship modeling and planning device provided by an embodiment of the present invention;

[0028] Figure 10 It is a hardware architecture diagram of a computer device provided by an embodiment of the present invention. Detailed implementation manners

[0029] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are some, but not all, of the embodiments of the present invention. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts fall within the protection scope of the present invention.

[0030] As described above, the existing on - satellite two - dimensional turntable is often subject to the rugged limit problem caused by strong non - linear geometric constraints such as the limit of on - satellite sensors and the sunlight avoidance of the fine - tracking camera during operation. The prior art cannot simultaneously perform the planning of sunlight avoidance and rugged limit.

[0031] Based on this, the concept of the present invention is to re-plan the task trajectory according to the intersection information between the path curves of the solar projection and the rough limit in the turntable coordinate system and the original task planning trajectory, so as to achieve the planning of sunlight avoidance and rough limit simultaneously.

[0032] The following describes the specific implementation manners of the above concept.

[0033] Please refer to Figure 1 , a two-dimensional turntable obstacle avoidance topological relationship modeling and planning method provided by an embodiment of the present invention, the method includes:

[0034] Step 100, plan an obstacle avoidance elliptical trajectory curve of the two-dimensional turntable according to the intersection information between the original task planning trajectory and the solar circle and the rough limit curve;

[0035] Step 102, on the three curves of the obstacle avoidance elliptical trajectory curve, the fitting curve between the starting point of the original task planning trajectory and the starting point of the obstacle avoidance elliptical trajectory curve, and the fitting curve between the ending point of the original task planning trajectory and the ending point of the obstacle avoidance elliptical trajectory curve, select multiple equally spaced key path points respectively;

[0036] Step 104, perform fitting calculation on the path segments formed by all adjacent two key path points according to the minimum snap algorithm to obtain the optimal task planning trajectory of the two-dimensional turntable.

[0037] In the embodiment of the present invention, first, according to the intersection relationship between the original task planning trajectory and the solar circle, plan the solar avoidance trajectory curve of the two-dimensional turntable. Then, on the solar avoidance trajectory curve, the fitting curve between the starting point of the original task planning trajectory and the starting point of the new task planning trajectory, and the fitting curve between the ending point of the original task planning trajectory and the ending point of the new task planning trajectory, select multiple key points at equal intervals on each curve. Finally, re-plan the motion trajectory between any two key points based on the minimum snap algorithm to obtain the optimal task planning trajectory of the two-dimensional turntable. Through this method, the trajectory planning of sunlight avoidance and rough limit is simultaneously realized for the two-dimensional turntable, so that the task can be executed smoothly.

[0038] The following describes Figure 1 the execution manners of the following steps.

[0039] First, for step 100, plan an obstacle avoidance elliptical trajectory curve of the two-dimensional turntable according to the intersection information between the original task planning trajectory and the solar circle and the rough limit curve.

[0040] In the embodiment of the present invention, the planning of the obstacle avoidance elliptical trajectory curve includes the following process:

[0041] When there are intersection points A and B between the original task planning trajectory and the sun circle, calculate the intersection points C1 and C2 of the perpendicular bisector of the line connecting intersection points A and B and the first perpendicular of the sun circle, and construct a first elliptical path trajectory with a semi-major axis greater than the radius of the sun circle using intersection points C1 and C2 as the short-axis vertices;

[0042] When there are no intersection points between the original task planning trajectory and the sun circle, and there are intersection points A' and B' with the rugged limit curve, establish an obstacle avoidance circle using intersection points A', B' and the inflection point of the rugged limit curve, calculate the intersection points C1' and C2' of the perpendicular bisector of the line connecting intersection points A' and B' and the second perpendicular of the obstacle avoidance circle, and construct a second elliptical path trajectory with a semi-major axis greater than the radius of the obstacle avoidance circle using intersection points C1' and C2' as the short-axis vertices;

[0043] Furthermore, selecting the obstacle avoidance elliptical trajectory curve from the first elliptical path trajectory or the second elliptical path trajectory according to a preset selection criterion includes:

[0044] When it is the first elliptical path, if there are intersection points between the sun circle and the rugged limit curve, use the intersection point of the first perpendicular above the line connecting intersection points A and B as the center of symmetry, use the included angle between intersection points A and B and the sun center as the target angle, and select the circular arc on the first elliptical path trajectory corresponding to the target angle and above the rugged limit curve as the obstacle avoidance elliptical trajectory curve;

[0045] If there are no intersection points between the sun circle and the rugged limit curve, use the inferior arc included angle between intersection points A and B and the sun center as the target angle, and select the elliptical circular arc on the first elliptical path trajectory corresponding to the target angle as the obstacle avoidance elliptical trajectory curve;

[0046] When it is the second elliptical path, use the intersection point of the second perpendicular above the rugged limit curve as the center of symmetry, use the included angle between intersection points A' and B' and the sun center as the target angle, and select the circular arc on the second elliptical path trajectory corresponding to the target angle and above the rugged limit curve as the obstacle avoidance elliptical trajectory curve.

[0047] Specifically, the sun circle is a form of the sun's projection in the turntable coordinate system. As Figure 2 shown, Figure 2 the circular curve in it is the sun circle. According to the intersection points A and B between the original task planning trajectory and the sun circle, the first elliptical path trajectory as shown in the ellipse in Figure 2 can be planned. At this time, there are no intersection points between the sun circle and the rugged limit. To reduce the trajectory length of the turntable, it is preferred to select the elliptical circular arc corresponding to the inferior arc included angle between intersection points A and B and the sun center as the obstacle avoidance elliptical trajectory curve.

[0048] As Figure 3 shown, Figure 3Schematic diagram when the solar circle intersects both the rugged limit and the original mission planning trajectory. In this case, the intersection point C1 of the first perpendicular line above the line connecting intersection points A and B is taken as the symmetry center, and the included angle of the major arc between intersection points A and B and the center of the solar circle is taken as the target angle. The arc on the corresponding ellipse of this angle is selected as the obstacle avoidance ellipse trajectory curve.

[0049] It should be noted that Figure 3 only one possibility is provided when the solar circle intersects both the rugged limit and the original mission planning trajectory. In the actual application process, regardless of whether the included angle corresponds to the major arc or the minor arc, the arc of the ellipse corresponding to the target angle and located above the rugged limit curve is selected as the obstacle avoidance ellipse trajectory curve.

[0050] As Figure 4 shown, Figure 4 For the case where the original mission planning trajectory has no intersection with the solar circle but has an intersection with the rugged limit curve, an obstacle avoidance circle can be established with intersection points A' and B' and the inflection point of the rugged limit curve. Then, a second ellipse path trajectory is established through the above process. Next, the intersection point C1' of the second perpendicular line above the rugged limit curve is taken as the symmetry center, and the included angle between intersection points A' and B' and the center of the solar circle is taken as the target angle. The arc on the corresponding ellipse path trajectory of this target angle and located above the rugged limit curve is selected as the obstacle avoidance ellipse trajectory curve.

[0051] It can be understood that when part of the arc corresponding to the target angle is located below the rugged limit curve, the arc above the rugged limit curve with the intersection point of the second perpendicular line above the rugged limit curve as the symmetry center is preferentially selected.

[0052] Then, for step 102, on the three curves of the obstacle avoidance ellipse trajectory curve, the fitting curve between the starting point of the original mission planning trajectory and the starting point of the obstacle avoidance ellipse trajectory curve, and the fitting curve between the ending point of the original mission planning trajectory and the ending point of the obstacle avoidance ellipse trajectory curve, multiple equally spaced key path points are selected respectively.

[0053] As Figure 5 , Figure 6 and Figure 7 shown, first, 10 equally spaced points are selected on the determined obstacle avoidance ellipse trajectory curve to represent the key path points [R 21 , R 22 , …, R 2n , n ∈ [1, 10];

[0054] Next, according to the recorded positions of the starting point S0 and the ending point S1 of the original mission planning trajectory, a B-spline curve is fitted from the starting point S0 to the starting point R 21 of the obstacle avoidance ellipse trajectory curve, and 10 equally spaced key path points [R 11 , R 12 , …, R1n , where \(n\in[1,10]\); the B-spline curve from the fitting end point \(S1\) to the end point \(R\) of the obstacle avoidance elliptical trajectory curve 210 , and equally spacedly take 10 key path points \([R 31 ,R 32 ,…,R 3n , where \(n\in[1,10]\).

[0055] In this way, 30 key path points for characterizing the optimal task planning trajectory are obtained. It should be noted that in order to enable the two-dimensional turntable to run smoothly on the newly planned trajectory, it is necessary to ensure that the speed and acceleration of the starting point \(R\) of the obstacle avoidance elliptical trajectory curve 21 and the previous adjacent key path point are consistent. Similarly, the speed and acceleration of the end point \(R\) of the obstacle avoidance elliptical trajectory curve 210 and the next adjacent key path point are also consistent.

[0056] For step 104, according to the minimum snap algorithm, fitting calculations are performed on the path segments composed of all adjacent pairs of key path points to obtain the optimal task planning trajectory of the two-dimensional turntable.

[0057] In the embodiment of the present invention, the process of fitting calculation includes allocating time to each path segment according to the preset total time, and adjusting the allocated time according to the preset maximum angular velocity threshold and maximum angular acceleration threshold to obtain the optimal time allocation result; according to the optimal time allocation result, using a fifth-order polynomial to fit the trajectory of each path segment; using the minimum snap algorithm to solve the trajectory parameters of the fit to obtain the optimal task planning trajectory.

[0058] Specifically, before performing the fitting calculation, it is necessary to input the planned total time in advance to perform the time allocation of each segment of the trajectory, and it is necessary to ensure that the maximum angular velocity and maximum angular acceleration of the planned segmented trajectory are less than the set threshold. Therefore, in this embodiment, the original task planning total time can be preferentially adopted. If the planned angular velocity and angular acceleration exceed the limit, the time limit is gradually relaxed until the optimal result of the current task curve time is finally achieved.

[0059] Furthermore, using a fifth-order polynomial to fit the trajectory of each path segment, then the \(m\)-th segment of the trajectory is:[[]]

[0060]

[0061] where \(m\) is the serial number of the path segment; \(p m,0 to \(p m,5 are all the trajectory parameters of the \(m\)-th segment of the trajectory fit; \(t\) is the optimal time of each path segment.

[0062] Furthermore, calculate the fourth-order derivative of the trajectory of each path segment

[0063]

[0064] Finally, the fourth-order derivative is obtained:

[0065]

[0066] Next, construct the cost function \(J\) of the \(m\)-th trajectory segment m :

[0067]

[0068] Construct the total cost function \(J\) of all path segment trajectories:

[0069]

[0070] In the formula, where \(J\) m is the cost function corresponding to the \(m\)-th trajectory segment; \(Y\) m-1 is the \((m - 1)\)-th key path point, that is, the starting point of the \(m\)-th trajectory segment; \(Y\) m is the \(m\)-th key path point, that is, the end point of the \(m\)-th trajectory segment; \(Q\) m is the positive definite matrix of the \(m\)-th trajectory segment; \(P\) m is the fourth-order derivative of the \(m\)-th segment.

[0071] Finally, according to the position, velocity, acceleration and other constraint conditions of each key path point, the cost function can be expressed by the following formula:

[0072] \(J=\min d\) T \(A\) -T \(QA\) -1 \(d\)

[0073] Since only the position information of the intermediate key path points is determined, without velocity and acceleration information, the \(d\) m matrix is split into the variables \(d\) mF (i.e., the variables fixed by the constraint conditions) and the variables \(d\) mP (i.e., the variables to be optimized, such as the higher-order derivatives of each path end point), expressed as Substitute it into the cost function and calculate it in combination with the constraint conditions to obtain:

[0074]

[0075] In the formula, \(C\) is the selection matrix; \(d\) F is the variable fixed by the constraint conditions; \(d\) P is the variable to be optimized; the matrix \(A\) is the mapping matrix that maps the fifth-order polynomial coefficients to each derivative \(d\).

[0076] Please refer to Figure 9, an embodiment of the present invention provides a device for modeling and planning the topological relationship of obstacle avoidance for a two-dimensional turntable, and the device includes:

[0077] A planning module 900, configured to plan an obstacle avoidance elliptical trajectory curve of the two-dimensional turntable according to the intersection information of the original task planned trajectory with the sun circle and the rugged limit curve;

[0078] A selection module 902, configured to select a plurality of equally spaced key path points on each of the three curves: the obstacle avoidance elliptical trajectory curve, the fitting curve between the starting point of the original task planned trajectory and the starting point of the obstacle avoidance elliptical trajectory curve, and the fitting curve between the ending point of the original task planned trajectory and the ending point of the obstacle avoidance elliptical trajectory curve;

[0079] A calculation module 904, configured to perform fitting calculation on the path segments formed by all adjacent two key path points according to the minimum jerk algorithm to obtain the optimal task planned trajectory of the two-dimensional turntable.

[0080] In the embodiment of the present invention, when the planning module 900 executes the operation of planning the obstacle avoidance elliptical trajectory curve of the two-dimensional turntable according to the intersection information of the original task planned trajectory with the sun circle and the rugged limit curve, it is specifically configured to perform the following operations: when there are intersections A and B between the original task planned trajectory and the sun circle, calculate the first perpendicular intersection points C1 and C2 of the perpendicular bisector of the line segment connecting the intersections A and B with the sun circle, and construct a first elliptical path trajectory with a semi-major axis greater than the radius of the sun circle with the intersection points C1 and C2 as the short-axis vertices; when there are no intersections between the original task planned trajectory and the sun circle, and there are intersections A' and B' with the rugged limit curve, establish an obstacle avoidance circle with the intersections A', B' and the inflection point of the rugged limit curve, calculate the second perpendicular intersection points C1' and C2' of the perpendicular bisector of the line segment connecting the intersections A' and B' with the obstacle avoidance circle, and construct a second elliptical path trajectory with a semi-major axis greater than the radius of the obstacle avoidance circle with the intersection points C1' and C2' as the short-axis vertices; select the obstacle avoidance elliptical trajectory curve from the first elliptical path trajectory or the second elliptical path trajectory according to a preset selection criterion.

[0081] In the embodiment of the present invention, when the planning module 900 selects the obstacle avoidance elliptical trajectory curve from the first elliptical path trajectory or the second elliptical path trajectory according to a preset selection criterion, it is specifically configured to perform the following operations: When it is the first elliptical path, if the sun circle intersects with the rugged limit curve, then with the intersection point of the first perpendicular line above the line connecting the intersection points A and B as the symmetry center, and the included angle between the intersection points A and B and the sun center as the target angle, select the arc on the first elliptical path trajectory corresponding to the target angle and located above the rugged limit curve as the obstacle avoidance elliptical trajectory curve; if the sun circle does not intersect with the rugged limit curve, then with the inferior arc included angle between the intersection points A and B and the sun center as the target angle, select the arc on the first elliptical path trajectory corresponding to the target angle as the obstacle avoidance elliptical trajectory curve; when it is the second elliptical path, with the intersection point of the second perpendicular line above the rugged limit curve as the symmetry center, and the included angle between the intersection points A' and B' and the sun center as the target angle, select the arc on the second elliptical path trajectory corresponding to the target angle and located above the rugged limit curve as the obstacle avoidance elliptical trajectory curve.

[0082] In the embodiment of the present invention, when the calculation module 904 performs fitting calculation on the path segments formed by all adjacent two key path points according to the minimum snap algorithm to obtain the optimal task planning trajectory of the two-dimensional turntable, it is specifically configured to perform the following operations: Perform time allocation for each path segment according to a preset total time, and adjust the allocated time according to a preset maximum angular velocity threshold and maximum angular acceleration threshold to obtain an optimal time allocation result; According to the optimal time allocation result, use a fifth-order polynomial to fit the trajectory of each path segment; Use the minimum snap algorithm to solve the trajectory parameters of the fitting to obtain the optimal task planning trajectory.

[0083] In the embodiment of the present invention, the trajectory of the path segment is obtained by fitting through the following formula:

[0084]

[0085] where m is the serial number of the path segment; p m,0 to p m,5 are all the trajectory parameters of the m-th segment trajectory fitting; t is the optimal time of each path segment.

[0086] In the embodiment of the present invention, when the calculation module 904 performs using the minimum snap algorithm to solve the trajectory parameters of the fitting to obtain the optimal task planning trajectory, it is specifically configured to perform the following operations:

[0087] Calculate the fourth derivative of the trajectory of each path segment

[0088]

[0089] Construct the total cost function \(J\) of all path segment trajectories according to the calculation results:

[0090]

[0091] In the formula, \(J\) m is the cost function corresponding to the \(m\)-th segment of the trajectory; \(Y\) m-1 is the \((m - 1)\)-th key path point; \(Y\) m is the \(m\)-th key path point; \(Q\) m is the positive definite matrix of the \(m\)-th segment of the trajectory.

[0092] Calculate the trajectory parameters according to the constraint conditions of each key path point to obtain the optimal task planning trajectory:

[0093]

[0094] In the formula, \(C\) is the selection matrix; \(d\) F is the variable fixed by the constraint condition; \(d\) P is the variable to be optimized; the matrix \(A\) is the mapping matrix that maps the coefficients of the fifth-order polynomial to each derivative \(d\).

[0095] It should be noted that: for the two-dimensional turntable obstacle avoidance topological relationship modeling and planning device provided in the above embodiments, only the above division of each functional module is used for illustration. In practical applications, the above functions can be allocated to different functional modules according to needs, that is, the internal structure of the device is divided into different functional modules to complete all or part of the functions described above. In addition, the two-dimensional turntable obstacle avoidance topological relationship modeling and planning device provided in the above embodiments and the embodiments of the two-dimensional turntable obstacle avoidance topological relationship modeling and planning method belong to the same concept. For the specific implementation process, please refer to the method embodiments, which will not be elaborated here.

[0096] The embodiments of the present application also provide a computer device. Please refer to Figure 10 , this computer device includes a processor and a memory. At least one instruction, at least one program, a code set or an instruction set is stored in the memory. At least one instruction, at least one program, a code set or an instruction set is loaded and executed by the processor to implement the two-dimensional turntable obstacle avoidance topological relationship modeling and planning method provided in each of the above method embodiments.

[0097] The embodiments of the present application also provide a computer-readable storage medium. At least one instruction, at least one program, a code set or an instruction set is stored on this computer-readable storage medium. At least one instruction, at least one program, a code set or an instruction set is loaded and executed by the processor to implement the two-dimensional turntable obstacle avoidance topological relationship modeling and planning method provided in each of the above method embodiments.

[0098] Embodiments of the present application also provide a computer program product. The computer program product includes a computer program. A processor of a computer device reads the computer program from a computer-readable storage medium, and the processor executes the computer program, so that the computer device executes the two-dimensional turntable obstacle avoidance topological relationship modeling and planning method described in any of the above embodiments.

[0099] For the convenience of description, when describing the above system or device, it is divided into various modules or units according to functions for description. Of course, when implementing the present application, the functions of each unit can be implemented in one or more software and / or hardware.

[0100] From the description of the above embodiments, those skilled in the art can clearly understand that the present application can be implemented by means of software plus a necessary general hardware platform. Based on such an understanding, the technical solution of the present application, in essence, or the part that contributes to the prior art, can be embodied in the form of a software product. The computer software product can be stored in a storage medium, such as ROM / RAM, magnetic disk, optical disc, etc., and includes several instructions for causing a computer device (which can be a personal computer, a server, or a network device, etc.) to execute the methods described in various embodiments or some parts of the embodiments of the present application.

[0101] Finally, it should also be noted that in this article, relational terms such as first, second, third, and fourth are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the term "comprising", "including" or any other variant thereof is intended to cover a non-exclusive inclusion, so that a process, method, article or device including a series of elements not only includes those elements, but also includes other elements not expressly listed, or further includes elements inherent to such process, method, article or device. Without further limitation, an element defined by the statement "including a..." does not exclude the existence of additional identical elements in the process, method, article or device including the element.

[0102] The above are only the preferred embodiments of the present application. It should be pointed out that for those of ordinary skill in the art, without departing from the principle of the present application, several improvements and refinements can be made, and these improvements and refinements should also be regarded as the protection scope of the present application.

Claims

1. A two-dimensional turntable obstacle avoidance topological relationship modeling and planning method, characterized in that: The method comprises: According to the intersection information of the original mission planning trajectory, the sun circle and the rugged limit curve, the obstacle avoidance elliptical trajectory curve of the two-dimensional turntable is planned; Select a plurality of equally spaced key path points on each of the three curves, namely, the obstacle avoidance elliptical trajectory curve, the fitting curve between the starting point of the original task planning trajectory and the starting point of the obstacle avoidance elliptical trajectory curve, and the fitting curve between the end point of the original task planning trajectory and the end point of the obstacle avoidance elliptical trajectory curve; According to the minimum jerk algorithm, the path segments consisting of all two adjacent key path points are fitted and calculated to obtain the optimal task planning trajectory of the two-dimensional turntable.

2. The method according to claim 1, characterized in that The obstacle avoidance elliptical trajectory curve of the two-dimensional turntable is planned based on the intersection information of the original task planning trajectory, the sun circle and the rugged limit curve, including: When the original mission planning trajectory and the sun circle have intersection points A and B, calculate the intersection points C1 and C2 of the perpendicular bisector of the line connecting the intersection points A and B and the first perpendicular line of the sun circle, and construct the first elliptical path trajectory with the semi-major axis greater than the radius of the sun circle with the intersection points C1 and C2 as the minor axis vertices; When the original mission planning trajectory has no intersection with the sun circle, and has intersections A' and B' with the rugged limit curve, an obstacle avoidance circle is established with the intersections A', B' and the inflection point of the rugged limit curve, and the intersections C1' and C2' of the perpendicular bisector of the line connecting the intersections A' and B' and the second perpendicular line of the obstacle avoidance circle are calculated, and a second elliptical path trajectory with a semi-major axis greater than the radius of the obstacle avoidance circle is constructed with the intersections C1' and C2' as the minor axis vertices; The obstacle avoidance elliptical trajectory curve is selected from the first elliptical path trajectory or the second elliptical path trajectory according to a preset selection criterion.

3. The method according to claim 2, characterized in that The step of selecting the obstacle avoidance elliptical trajectory curve from the first elliptical path trajectory or the second elliptical path trajectory according to a preset selection criterion includes: When it is the first elliptical path, if the sun circle and the rugged limit curve have an intersection, the first perpendicular intersection above the line connecting the intersection points A and B is taken as the symmetry center, the angle between the intersection points A and B and the center of the sun circle is taken as the target angle, and the arc corresponding to the target angle on the first elliptical path trajectory and located above the rugged limit curve is selected as the obstacle avoidance elliptical trajectory curve; If the sun circle has no intersection with the rugged limit curve, the minor arc angle between the intersection points A and B and the center of the sun circle is taken as the target angle, and the arc corresponding to the target angle on the first elliptical path trajectory is selected as the obstacle avoidance elliptical trajectory curve; When it is the second elliptical path, the intersection of the second vertical lines above the rugged limit curve is taken as the center of symmetry, the angle between the intersection points A' and B' and the center of the sun is taken as the target angle, and the arc above the rugged limit curve corresponding to the target angle on the second elliptical path trajectory is selected as the obstacle avoidance elliptical trajectory curve.

4. The method according to claim 1, characterized in that According to the minimum jerk algorithm, the path segments composed of all two adjacent key path points are fitted and calculated to obtain the optimal task planning trajectory of the two-dimensional turntable, including: Allocate time for each path segment according to a preset total time, and adjust the allocated time according to a preset maximum angular velocity threshold and a maximum angular acceleration threshold to obtain an optimal time allocation result; According to the optimal time allocation result, a fifth-order polynomial is used to fit the trajectory of each path segment; The minimum jerk algorithm is used to solve the fitted trajectory parameters to obtain the optimal task planning trajectory.

5. The method according to claim 4, characterized in that The trajectory of the path segment is obtained by fitting the following formula: Where m is the sequence number of the path segment; p m,0 to p m,5 are the trajectory parameters of the mth trajectory fitting; t is the optimal time for each path segment.

6. The method according to claim 5, characterized in that The method of solving the fitted trajectory parameters by using the minimum jerk algorithm to obtain the optimal task planning trajectory includes: Calculate the fourth-order derivative of each path segment trajectory The total cost function J of all path segment trajectories is constructed based on the calculation results: In the formula, J m is the cost function corresponding to the mth trajectory; Y m-1 is the m-1th key path point; Y m is the mth key path point; Q m is the positive definite matrix of the mth trajectory. According to the constraints of each key path point, the trajectory parameters are calculated to obtain the optimal task planning trajectory: Where C is the selection matrix; d F is the variable fixed by the constraint; d P is the variable to be optimized; the matrix A is the mapping matrix that maps the fifth-order polynomial coefficients to each derivative d.

7. A two-dimensional turntable obstacle avoidance topological relationship modeling and planning device, characterized in that: The device comprises: A planning module is used to plan the obstacle avoidance elliptical trajectory curve of the two-dimensional turntable according to the intersection information of the original mission planning trajectory, the sun circle and the rugged limit curve; A selection module is used to select a plurality of equally spaced key path points on each of the three curves, namely, the obstacle avoidance elliptical trajectory curve, the fitting curve between the starting point of the original task planning trajectory and the starting point of the obstacle avoidance elliptical trajectory curve, and the fitting curve between the end point of the original task planning trajectory and the end point of the obstacle avoidance elliptical trajectory curve; The calculation module is used to perform fitting calculation on the path segments composed of all two adjacent key path points according to the minimum jerk algorithm to obtain the optimal task planning trajectory of the two-dimensional turntable.

8. A computer device, characterized in that: The computer device includes a memory and a processor, the memory is used to store a computer program, and the processor is used to execute the computer program stored in the memory to implement the steps of any one of the methods described in claims 1-6.

9. A computer-readable storage medium, characterized in that: The storage medium stores a computer program, and when the computer program is executed by a processor, the steps of the method described in any one of claims 1 to 6 are implemented.

10. A computer program product, characterized in that The method comprises a computer program, wherein when the computer program is executed by a processor, the steps of the method according to any one of claims 1 to 6 are implemented.

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