Sphere low-damage polishing device and method

Abstract

The low-damage ball polishing device comprises a base. An outer accommodating groove and an inner accommodating groove are formed in the base; a circulating hole is formed in the bottom end of the groove wall of the inner accommodating groove; a spiral track groove is formed in the groove wall of the outer containing groove. According to the mechanical rheology polishing device, force rheology polishing machining can be conducted on a ball, during machining, the ball and force rheology polishing liquid in the inner containing groove enter the space between the outer containing groove and the inner containing groove through the circulation holes under the action of centrifugal force, and then the ball climbs along the spiral track groove under the driving action of the inner containing groove; and the inner containing groove rotates relative to the outer containing groove to drive the force rheological polishing liquid, so that the force rheological polishing liquid forms a continuous flow field on the surface of the ball body, shear stress is generated on the surface of the ball body, materials on the surface of the ball body are evenly removed, and a high-precision machining surface is obtained. The invention further provides a ball low-damage polishing method achieved through the ball low-damage polishing device.

Description

Technical Field

[0001] The present invention relates to the technology of finishing the surface of a sphere, and particularly to a low-damage polishing device and method for a sphere. Background Art

[0002] As a reference element for roundness meters, gyroscopes, bearings, and precision measurements, high-precision spheres play an irreplaceable role in the field of high-end equipment manufacturing. Especially in the field of ball bearings, precision parameters such as spherical deviation, diameter variation, and surface roughness directly affect the motion precision, noise characteristics, and service life of the bearings, and ultimately determine the overall performance of the equipment. Compared with traditional GCr15 bearing steel materials, advanced ceramic materials such as silicon nitride exhibit significant advantages: their corrosion resistance, high-temperature stability, non-magnetic properties, and low density (about 40% of that of steel) can meet the requirements of extreme working conditions; a smaller coefficient of thermal expansion (25% of that of steel) and a higher elastic modulus (1.5 times that of steel) endow it with excellent dimensional stability, making it an ideal choice for high-speed and high-precision bearings in high-end equipment such as aeroengines and precision machine tools. Aiming at the hard and brittle characteristics of silicon nitride ceramics, the current processing technology adopts a three-stage process of grinding-lapping-polishing. Among them, the lapping / polishing process in the finishing stage relies on the mechanical-chemical combined action of free abrasives to improve dimensional accuracy and surface integrity through micron-level material removal. Since the V-groove processing equipment for steel bearing balls is still used, high-cost diamond abrasives need to be continuously used, and the single-batch processing cycle is as long as several weeks, resulting in high production costs. With the continuous improvement of the precision requirements of spheres for precision instruments, how to achieve efficient and precise processing of ceramic balls while ensuring processing consistency has become the core technical bottleneck restricting their large-scale application. Summary of the Invention

[0003] Aiming at the deficiencies of the existing technology, the present invention provides a low-damage polishing device for a sphere. The low-damage polishing device for a sphere of the present invention has a specific structure and can perform rheological polishing processing on the sphere. During processing, the sphere and the rheological polishing liquid in the inner accommodation groove enter the space between the outer accommodation groove and the inner accommodation groove through the circulation holes under the action of centrifugal force, and then, under the driving action of the inner accommodation groove, climb along the spiral track groove, and after separating from the spiral track groove at the spiral track groove outlet, fall back into the inner accommodation groove again, and perform such cyclic motion. The relative rotation of the inner accommodation groove with respect to the outer accommodation groove drives the rheological polishing liquid between the two, so that the rheological polishing liquid forms a continuous flow field on the surface of the sphere, causing the rheological polishing liquid to generate shear stress on the surface of the sphere, uniformly removing the surface material of the sphere, obtaining a high-precision processed surface, and achieving efficient removal of surface defects and subsurface damage layers of the ceramic ball, achieving the purpose of efficient, high-quality, and damage-free polishing. Correspondingly, the present invention also provides a low-damage polishing method for a sphere implemented by using the low-damage polishing device for a sphere of the present invention.

[0004] For a polishing device, the present application provides the following technical solutions:

[0005] A low-damage polishing device for spheres, comprising a base; an outer accommodation groove and an inner accommodation groove are provided on the base; the inner accommodation groove is arranged inside the outer accommodation groove and is concentrically distributed with the outer accommodation groove; the outer accommodation groove is fixedly connected to the base; the inner accommodation groove is arranged on the base through a driving device, and the driving device can drive the inner accommodation groove to perform a rotational motion; the bottom of the outer accommodation groove and the bottom of the inner accommodation groove cooperate with each other and are sealed by a sealing member; a circulation hole is provided at the bottom end of the groove wall of the inner accommodation groove, so that the polishing liquid and the spheres in the inner accommodation groove can enter the outer accommodation groove through the circulation hole; a spiral track groove is provided on the groove wall of the outer accommodation groove, the entrance of the spiral track groove is located at the bottom of the outer accommodation groove, and the exit is located at the top of the outer accommodation groove; the spiral direction of the spiral track groove is the same as the rotational direction of the inner accommodation groove; during operation, the inner accommodation groove performs a rotational motion, so that the spheres and the polishing liquid therein enter the space between the outer accommodation groove and the inner accommodation groove through the circulation hole, and then, driven by the inner accommodation groove, climb along the spiral track groove, and after separating from the spiral track groove at the exit of the spiral track groove, fall back into the inner accommodation groove again.

[0006] Compared with the prior art, in the low-damage polishing device for spheres of the present invention, a spiral track groove is provided on the groove wall of the outer accommodation groove, a circulation hole is provided at the bottom of the groove wall of the inner accommodation groove to enable the spheres and the polishing liquid to pass through, and the inner accommodation groove can rotate relative to the outer side. During processing, a magnetorheological polishing liquid is added to the inner accommodation groove, and the spheres to be processed are placed in the inner accommodation groove. The rotation of the inner accommodation groove generates a centrifugal force, so that the magnetorheological polishing liquid and the spheres enter the space between the outer accommodation groove and the inner accommodation groove through the circulation hole, and then, driven by the inner accommodation groove, climb along the spiral track groove, and after separating from the spiral track groove at the exit of the spiral track groove, fall back into the inner accommodation groove again. In such a cyclic motion, during the processing, the inner accommodation groove rotates relative to the outer accommodation groove to drive the magnetorheological polishing liquid therebetween, so that the magnetorheological polishing liquid forms a continuous flow field on the surface of the spheres, enabling the magnetorheological polishing liquid to generate a shear stress on the surface of the spheres, so that the surface material of the spheres is uniformly removed, a high-precision processed surface is obtained, the surface defects and the subsurface damage layer of the ceramic spheres can be efficiently removed, and the polishing purpose of high efficiency, high quality and no damage can be achieved.

[0007] As an optimization solution, in the aforementioned sphere low-damage polishing device, the inner accommodating groove includes an inner groove bottom and an inner groove wall. The inner groove wall is connected to the inner groove bottom through a group of circumferentially distributed support blocks. Thus, a flow-through hole is formed between two adjacent support blocks. This structure is easy to implement and has high reliability. Further, the outer side surface of the support block is deflected by a certain angle relative to the tangential direction of the inner accommodating groove. Thus, when the inner accommodating groove rotates, the support block has a squeezing effect on the polishing liquid, making the magnetorheological polishing liquid flow faster in the spiral track groove and the rheological effect stronger, thereby improving the material removal efficiency. Further, the outer side surface of the support block is arc-shaped. Thus, the resistance received when the inner accommodating groove rotates is small, which is beneficial to reducing energy consumption.

[0008] As an optimization solution, in the aforementioned sphere low-damage polishing device, the outer accommodating groove includes an outer groove base body and a spiral track groove carrier installed inside the outer groove base body. A spiral track groove is provided inside the spiral track groove carrier. The outer accommodating groove adopts a split design, and the spiral track groove carrier can be replaced to adapt to spheres of different specifications. Further, a slot is provided on the outer groove base body, and a plug-in block is correspondingly provided on the spiral track groove carrier. The spiral track groove carrier is installed on the outer groove base body by the cooperation of the plug-in block and the slot. Thus, the spiral track groove carrier can be quickly disassembled and assembled.

[0009] As an optimization solution, the aforementioned sphere low-damage polishing device further includes a cover; the cover is used to seal the top of the outer accommodating groove. Thus, the outer accommodating groove can be covered by the cover to prevent the polishing liquid from splashing out.

[0010] As an optimization solution, the aforementioned sphere low-damage polishing device further includes a recovery groove; the size of the recovery groove is adapted to the inner accommodating groove and can be installed in the inner accommodating groove to recover the spheres coming out of the spiral track groove. Thus, after the polishing reaches the set time, the recovery groove can be placed in the inner accommodating groove to collect the spheres.

[0011] As an optimization solution, in the aforementioned sphere low-damage polishing device, a guiding block is provided at the top of the outer accommodating groove. The guiding block is located at the outlet of the spiral track groove and is used to guide the spheres coming out of the spiral track groove back into the inner accommodating groove. By providing the guiding block to guide the spheres to fall back into the inner accommodating groove, the structure is easy to implement.

[0012] For the polishing method, the present invention provides the following technical solution:

[0013] A sphere low-damage polishing method, which uses the aforementioned sphere low-damage polishing device of the present invention to polish the sphere; includes the following steps:

[0014] S1. Place the prepared magnetorheological polishing liquid in the inner accommodating groove;

[0015] S2. Place the sphere to be processed in the content placement groove;

[0016] S3. Start processing: Control the content placement groove to rotate. The sphere and the magnetorheological polishing fluid enter the spiral track groove due to the centrifugal force. Driven by the content placement groove, the sphere and the magnetorheological polishing fluid continuously climb along the spiral track groove, come out from the top outlet of the spiral track groove and then fall back into the content placement groove, repeating this process continuously;

[0017] S4. After the processing reaches the set time, the polishing is completed.

[0018] Compared with the prior art, the method of the present invention uses the aforementioned sphere low-damage polishing device of the present invention to polish the sphere, which can uniformly remove the surface material of the sphere, obtain a high-precision processed surface, can efficiently remove the surface defects and subsurface damage layers of the ceramic ball, achieve the purpose of efficient, high-quality and non-damaging polishing, and has a simple process and is easy to implement industrially. Brief Description of the Drawings

[0019] Figure 1 is a schematic structural diagram of the sphere low-damage polishing device in the embodiment of the present invention (the cover is open);

[0020] Figure 2 is a schematic structural diagram of the sphere low-damage polishing device in the embodiment of the present invention (the sphere recovery state);

[0021] Figure 3 is a schematic structural diagram of the sphere low-damage polishing device in the embodiment of the present invention (the cover is closed);

[0022] Figure 4 is the front projection view of the sphere low-damage polishing device in the embodiment of the present invention;

[0023] Figure 5 is Figure 4 the A-direction sectional view of the sphere low-damage polishing device in

[0024] Figure 6 is a schematic structural diagram of the content placement groove in the embodiment of the present invention;

[0025] Figure 7 is a schematic structural diagram of the outer groove base body in the embodiment of the present invention;

[0026] Figure 8 is a schematic structural diagram of the spiral track groove carrier in the embodiment of the present invention.

[0027] The reference numerals are as follows: 1 - base; 2 - outer accommodation groove, 201 - spiral track groove, 202 - outer groove base, 203 - spiral track groove carrier, 204 - slot, 205 - inserted block; 3 - inner accommodation groove, 301 - circulation hole, 302 - inner groove bottom, 303 - inner groove wall, 304 - support block; 4 - driving device; 5 - seal; 6 - cover; 7 - recovery groove; 8 - guiding block. Detailed implementation manners

[0028] The present application will be further described below in conjunction with the accompanying drawings and embodiments, but it shall not be used as a basis for restricting the present application. In the following embodiments, the content not described in detail or not shown in detail in the drawings is common general knowledge in the art.

[0029] Embodiment (see Figures 1 to 8 ):

[0030] In the embodiment, the sphere low-damage polishing device includes a base 1; an outer accommodation groove 2 and an inner accommodation groove 3 are provided on the base 1; the inner accommodation groove 3 is arranged inside the outer accommodation groove 2 and is concentrically distributed with the outer accommodation groove 2; the outer accommodation groove 2 is fixedly connected to the base 1; the inner accommodation groove 3 is arranged on the base 1 through a driving device 4, and the driving device 4 can drive the inner accommodation groove 3 to make a rotational movement; the bottom of the outer accommodation groove 2 and the bottom of the inner accommodation groove 3 are matched and sealed by a seal 5; a circulation hole 301 is provided at the bottom end of the groove wall of the inner accommodation groove 3, so that the polishing liquid and the sphere in the inner accommodation groove 3 can enter the outer accommodation groove 2 from the circulation hole 301; a spiral track groove 201 is provided on the groove wall of the outer accommodation groove 2, the inlet of the spiral track groove 201 is located at the bottom of the outer accommodation groove 2, and the outlet is located at the top of the outer accommodation groove 2; the spiral direction of the spiral track groove 201 is the same as the rotational direction of the inner accommodation groove 3; during operation, the inner accommodation groove 3 makes a rotational movement, so that the sphere and the polishing liquid therein enter the space between the outer accommodation groove 2 and the inner accommodation groove 3 from the circulation hole 301, and then, driven by the inner accommodation groove 3, climb along the spiral track groove 201, and after separating from the spiral track groove 201 at the outlet of the spiral track groove 201, fall back into the inner accommodation groove 3 again. During the polishing process, the sphere makes a circular motion, and the rotational movement of the inner accommodation groove drives the rheological polishing liquid, so that the rheological polishing liquid generates a continuous flow field on the surface of the sphere, so that the rheological polishing liquid generates a shear stress on the surface of the sphere, and the material on the surface of the sphere is uniformly removed.

[0031] In the embodiment, the inner accommodation groove 3 includes an inner groove bottom 302 and an inner groove wall 303, and the inner groove wall 303 is connected to the inner groove bottom 302 through a group of support blocks 304 distributed circumferentially, so that a circulation hole 301 is formed between two adjacent support blocks 304.

[0032] In an embodiment, the outer side surface of the support block 304 is deflected by a certain angle relative to the tangential direction of the inner content groove 3. When the inner content groove 3 rotates, the outer side surface of the support block 304 deflects the magnetorheological polishing fluid outward, accelerating the flow of the magnetorheological polishing fluid.

[0033] In an embodiment, the outer side surface of the support block 304 is arc-shaped, so that when the inner content groove 3 rotates, the resistance received by the magnetorheological polishing fluid is small. And the shearing effect of the support block on the magnetorheological polishing fluid is weak, so the resulting rheological effect is also weak, making the flow performance of the magnetorheological polishing fluid strong and easier to enter the space between the inner content groove 3 and the outer content groove 2.

[0034] In an embodiment, the outer content groove 2 includes an outer groove base body 202 and a spiral track groove carrier 203 installed inside the outer groove base body 202. A spiral track groove 201 is provided inside the spiral track groove carrier 203. During use, according to the specifications of the sphere, a suitable spiral track groove carrier 203 is selected and installed on the outer groove base body 202.

[0035] In an embodiment, a slot 204 is provided on the outer groove base body 202, and a plug-in block 205 is correspondingly provided on the spiral track groove carrier 203. The spiral track groove carrier 203 is installed on the outer groove base body 202 by the cooperation of the plug-in block 205 and the slot 204. During installation, only the plug-in block 205 needs to be aligned with the slot 204, and then the spiral track groove carrier 203 is placed on it to complete the installation.

[0036] In an embodiment, the sphere low-damage polishing device further includes a cover 6; the cover 6 is used to seal the top of the outer content groove 2. During processing, the cover 6 can be used to cover the outer content groove 2 to prevent the polishing fluid from splashing out.

[0037] In an embodiment, the cover 6 is installed on the outer content groove 2 through a hinge, which is convenient for opening and closing.

[0038] In an embodiment, the sphere low-damage polishing device further includes a recovery tank 7; the size of the recovery tank 7 is adapted to the inner content groove 3 and can be installed in the inner content groove 3 to recover the spheres coming out of the spiral track groove 201. After processing is completed, the recovery tank 7 is placed in the inner content groove so that the spheres fall into the recovery tank 7 to achieve collection.

[0039] In an embodiment, bolt mounting holes are provided on the recovery tank 7. Correspondingly, threaded holes are provided on the inner content groove 3, and bolts can be used to fix the recovery tank 7 to avoid shaking caused by the rotation of the inner content groove 3.

[0040] In an embodiment, a guiding block 8 is provided at the top of the outer accommodation groove 2. The guiding block 8 is located at the outlet of the spiral track groove 201 and is used to guide the spheres coming out of the spiral track groove 201 back into the inner accommodation groove 3. During processing, after the spheres come out of the spiral track groove 201, they fall back into the inner accommodation groove 3 under the action of the guiding block 8. Specifically, the guiding block 8 is provided at the top of the spiral track groove carrier 203.

[0041] In an embodiment, the polishing method implemented by the sphere low-damage polishing device includes the following steps:

[0042] S1. Place the prepared magnetorheological polishing fluid into the inner accommodation groove 3;

[0043] S2. Place the spheres to be processed into the inner accommodation groove 3;

[0044] S3. Start processing: Control the inner accommodation groove 3 to rotate. Due to the centrifugal force, the spheres and the magnetorheological polishing fluid enter the spiral track groove 201. Driven by the inner accommodation groove 3, the spheres and the magnetorheological polishing fluid continuously climb along the spiral track groove 201, come out from the top outlet of the spiral track groove 201 and then fall back into the inner accommodation groove, repeating this process continuously;

[0045] S4. After the processing reaches the set time, place the recovery groove 7 into the inner accommodation groove 3 and wait for all the spheres to enter the recovery groove 7 to complete the polishing.

[0046] Using the technology of the present invention to polish silicon nitride ceramic spheres can significantly shorten the polishing time. Of course, the sphere low-damage polishing device and method of the present invention are not limited to polishing silicon nitride ceramic spheres and can also process spheres of other materials.

[0047] The above general description of the invention involved in this application and the description of its specific embodiments should not be understood as a limitation to the technical solution of the invention. Those skilled in the art can, based on the disclosure of this application, without violating the constituent elements of the involved invention, add, subtract, or combine the disclosed technical features in the above general description or / and specific embodiments (including examples) to form other technical solutions within the protection scope of this application.

Claims

1. A sphere low-damage polishing device, characterized in that: It includes a base (1); an outer accommodation groove (2) and an inner accommodation groove (3) are provided on the base (1); the inner accommodation groove (3) is arranged inside the outer accommodation groove (2) and is concentrically distributed with the outer accommodation groove (2); the outer accommodation groove (2) is fixedly connected to the base (1); the inner accommodation groove (3) is arranged on the base (1) through a driving device (4), and the driving device (4) can drive the inner accommodation groove (3) to make a rotational movement; the bottom of the outer accommodation groove (2) and the bottom of the inner accommodation groove (3) are matched and sealed by a sealing member (5); a circulation hole (301) is provided at the bottom end of the groove wall of the inner accommodation groove (3), so that the polishing liquid and the spheres in the inner accommodation groove (3) can enter the outer accommodation groove (2) from the circulation hole (301); a spiral track groove (201) is provided on the groove wall of the outer accommodation groove (2), the entrance of the spiral track groove (201) is located at the bottom of the outer accommodation groove (2), and the exit is located at the top of the outer accommodation groove (2); the spiral direction of the spiral track groove (201) is the same as the rotational direction of the inner accommodation groove (3); during operation, the inner accommodation groove (3) makes a rotational movement, so that the spheres and the polishing liquid therein enter the space between the outer accommodation groove (2) and the inner accommodation groove (3) from the circulation hole (301), and then, driven by the inner accommodation groove (3), climb along the spiral track groove (201), and after leaving the spiral track groove (201) from the exit of the spiral track groove (201), fall back into the inner accommodation groove (3).

2. The sphere low-damage polishing device according to claim 1, wherein: The inner accommodation groove (3) includes an inner groove bottom (302) and an inner groove wall (303), and the inner groove wall (303) is connected to the inner groove bottom (302) through a group of circumferentially distributed support blocks (304), so that a circulation hole (301) is formed between two adjacent support blocks (304).

3. The sphere low-damage polishing device according to claim 2, characterized in that: The outer side surface of the support block (304) is deflected by a certain angle relative to the tangent of the inner accommodation groove (3).

4. The sphere low-damage polishing device according to claim 2, wherein: The outer side surface of the support block (304) is arc-shaped.

5. The sphere low-damage polishing device according to claim 1, characterized in that: The outer accommodation groove (2) includes an outer groove base body (202) and a spiral track groove carrier (203) installed inside the outer groove base body (202), and a spiral track groove (201) is provided inside the spiral track groove carrier (203).

6. The sphere low-damage polishing device according to claim 5, characterized in that: A slot (204) is provided on the outer groove base body (202), a plug-in block (205) is correspondingly provided on the spiral track groove carrier (203), and the spiral track groove carrier (203) is installed on the outer groove base body (202) by the cooperation of the plug-in block (205) and the slot (204).

7. The sphere low-damage polishing device according to claim 1, characterized in that: It further includes a cover (6); the cover (6) is used to seal the top of the outer accommodation groove (2).

8. The sphere low-damage polishing device according to claim 1, wherein: It further includes a recovery groove (7); the size of the recovery groove (7) is adapted to the inner accommodation groove (3) and can be installed in the inner accommodation groove (3) to recover the spheres coming out of the spiral track groove (201).

9. The sphere low-damage polishing device according to claim 1, characterized in that: A guiding block (8) is provided at the top of the outer accommodation groove (2), and the guiding block (8) is located at the exit of the spiral track groove (201) and is used to guide the spheres coming out of the spiral track groove (201) back into the inner accommodation groove (3).

10. A method for low-damage polishing of a sphere, characterized in that: This method uses the sphere low-damage polishing device described in any one of claims 1-9 to polish the sphere; it includes the following steps: S1. Place the prepared magnetorheological polishing fluid in the inner placement tank (3); S2. Place the sphere to be processed in the inner placement tank (3); S3. Start processing: Control the rotation of the inner placement tank (3). Due to the centrifugal force, the sphere and the magnetorheological polishing fluid enter through the spiral track groove (201). Driven by the inner placement tank (3), the sphere and the magnetorheological polishing fluid continuously climb along the spiral track groove (201), and after coming out from the top outlet of the spiral track groove (201), they fall back into the inner placement tank, repeating this process continuously; S4. After the processing reaches the set time, the polishing is completed.

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