Photosensitive resin composition, color filter and manufacturing method thereof, and liquid crystal display device
By using a photosensitive resin composition of a triphenylmethane-based colorant within a specific g value range, the pattern linearity of the color filter pixel layer under low exposure is improved, and the problem of insufficient pattern linearity in the prior art is solved, thereby achieving higher precision and energy-saving and carbon reduction effects.
Patent Information
- Application Number
- CN202510095515.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Priority Date
- 2024-02-05
- Filing Date
- 2025-01-21
- Publication Date
- 2025-08-05
AI Technical Summary
The pixel layer pattern formed by the existing color filters at low exposure is poorly linear, especially when the gap between the mask and the coating film is reduced, resulting in insufficient linearity of the exposure pattern.
Using a photosensitive resin composition containing a triphenylmethane-based colorant, the characteristic peak g value with the greatest intensity in the electron spin resonance spectrum is controlled within the range of 1.8000 to 2.0400. By adjusting the free radical transfer and curing reaction speed, the low exposure linearity of the pattern is improved.
The low exposure linearity of the color filter pixel layer pattern is improved to meet the needs of higher precision and energy saving and carbon reduction.