Display device and method of manufacturing same

Abstract

A display device and a method of manufacturing the same are provided, the display device including: a substrate including a first light emitting area, a second light emitting area, and a non-light emitting area; first and second reflective electrodes disposed in the first and second emission regions, respectively, on the substrate, and spaced apart from each other in the first direction; a first pixel electrode on the first reflective electrode and having a width greater than a width of the first reflective electrode; a second pixel electrode on the second reflective electrode and having a width greater than a width of the second reflective electrode; first and second hole auxiliary layers disposed on the first and second pixel electrodes, respectively, and spaced apart from each other in the first direction; a light emitting layer disposed on the first hole auxiliary layer and the second hole auxiliary layer; and a common electrode disposed on the light emitting layer.

Description

Technical Field

[0001] The embodiment relates to a display device for providing visual information and a method of manufacturing the display device. Background Art

[0002] With the development of information technology, the importance of display devices as a connection medium between users and information has become increasingly prominent. Therefore, the use of display devices such as liquid crystal display devices, organic light emitting display devices, and plasma display devices is increasing.

[0003] The display device includes a light emitting element, and the light emitting element includes a pixel electrode, a common electrode, and a light emitting layer disposed between the pixel electrode and the common electrode. To improve the power efficiency of the light emitting element, functional layers (such as a hole assist layer and an electron assist layer, etc.) may be further provided on and under the light emitting layer. Summary of the Invention

[0004] The embodiment provides a display device for improving color mixing defects.

[0005] The embodiment provides a method of manufacturing a display device.

[0006] The display device according to the embodiment may include: a substrate including a first light emitting region, a second light emitting region spaced apart from the first light emitting region in a first direction, and a non-light emitting region located between the first light emitting region and the second light emitting region; a first reflective electrode disposed on the substrate in the first light emitting region; a second reflective electrode disposed on the substrate in the second light emitting region and spaced apart from the first reflective electrode in the first direction; a first pixel electrode disposed on the first reflective electrode in the first light emitting region and having a width greater than the width of the first reflective electrode in the first direction; a second pixel electrode disposed on the second reflective electrode in the second light emitting region, spaced apart from the first pixel electrode in the first direction, and having a width greater than the width of the second reflective electrode in the first direction; a first hole assist layer disposed on the first pixel electrode in the first light emitting region; a second hole assist layer disposed on the second pixel electrode in the second light emitting region and spaced apart from the first hole assist layer in the first direction; at least one light emitting layer disposed on the first hole assist layer and the second hole assist layer; and a common electrode disposed on the at least one light emitting layer in the first light emitting region, the second light emitting region, and the non-light emitting region.

[0007] In the embodiment, the first pixel electrode may include a first lower pixel electrode disposed on the first reflective electrode and a first upper pixel electrode disposed on the first lower pixel electrode, and the second pixel electrode may include a second lower pixel electrode disposed on the second reflective electrode and a second upper pixel electrode disposed on the second lower pixel electrode.

[0008] In an embodiment, the first lower pixel electrode may include silver (Ag).

[0009] In an embodiment, the second upper pixel electrode may include indium tin oxide (ITO).

[0010] In an embodiment, the thickness of the first lower pixel electrode may be greater than the thickness of the first upper pixel electrode, and the thickness of the second lower pixel electrode may be greater than the thickness of the second upper pixel electrode.

[0011] In an embodiment, the thickness of each of the first lower pixel electrode and the second lower pixel electrode may be in the range of about 200 Å to about 1000 Å.

[0012] In an embodiment, the thickness of each of the first upper pixel electrode and the second upper pixel electrode may be in the range of about 30 Å to about 100 Å.

[0013] In an embodiment, at least one light-emitting layer may include: a first light-emitting layer disposed between a first hole auxiliary layer and a second hole auxiliary layer; a second light-emitting layer disposed on the first light-emitting layer; a first charge generation layer disposed between the first light-emitting layer and the second light-emitting layer in a first light-emitting region; and a second charge generation layer disposed between the first light-emitting layer and the second light-emitting layer in a second light-emitting region.

[0014] In an embodiment, the first charge generation layer and the second charge generation layer may be spaced apart from each other in a first direction.

[0015] In an embodiment, at least one light-emitting layer may further include: a third light-emitting layer disposed on the second light-emitting layer; a third charge generation layer disposed between the second light-emitting layer and the third light-emitting layer in a first light-emitting region; and a fourth charge generation layer disposed between the second light-emitting layer and the third light-emitting layer in a second light-emitting region.

[0016] In an embodiment, the third charge generation layer and the fourth charge generation layer may be spaced apart from each other in a first direction.

[0017] In an embodiment, the first reflective electrode may include a first lower reflective electrode disposed on a substrate and a first upper reflective electrode disposed on the first lower reflective electrode, and the second reflective electrode may include a second lower reflective electrode disposed on the substrate and a second upper reflective electrode disposed on the second lower reflective electrode.

[0018] In an embodiment, in a cross-sectional view, the first lower reflective electrode may have an undercut shape below the first upper reflective electrode, and the second lower reflective electrode may have an undercut shape below the second upper reflective electrode.

[0019] In an embodiment, the display device may further include: a pixel defining layer disposed on the substrate in a non-light-emitting region, a part of the first light-emitting region, and a part of the second light-emitting region, and covering a part of the upper surface and the side surface of the hole assisting layer.

[0020] In an embodiment, the display device may further include: a spacer disposed on the pixel defining layer in the non-light-emitting region.

[0021] A method of manufacturing a display device according to an embodiment may include: forming a first reflective electrode in a first light-emitting region on a substrate, the substrate including a first light-emitting region, a second light-emitting region spaced apart from the first light-emitting region in a first direction, and a non-light-emitting region located between the first light-emitting region and the second light-emitting region; forming a second reflective electrode spaced apart from the first reflective electrode in the first direction in the second light-emitting region on the substrate; forming a first pixel electrode on the first reflective electrode; forming a second pixel electrode spaced apart from the first pixel electrode in the first direction on the second reflective electrode; forming a first hole assisting layer on the first pixel electrode; forming a second hole assisting layer spaced apart from the first hole assisting layer in the first direction on the second pixel electrode; forming a first light-emitting layer on the first hole assisting layer and the second hole assisting layer; forming a first charge generation layer in the first light-emitting region on the first light-emitting layer; forming a second charge generation layer spaced apart from the first charge generation layer in the first direction in the second light-emitting region on the first light-emitting layer; and forming a second light-emitting layer on the first charge generation layer and the second charge generation layer.

[0022] In an embodiment, the first reflective electrode may include a lower reflective electrode disposed on the substrate and an upper reflective electrode disposed on the lower reflective electrode, and the step of forming the first reflective electrode may include: forming an initial lower reflective electrode in the first light-emitting region on the substrate; forming an upper reflective electrode in the first light-emitting region on the initial lower reflective electrode; and removing a part of the initial lower reflective electrode such that the width of the initial lower reflective electrode in the first direction is smaller than the width of the upper reflective electrode in the first direction.

[0023] In an embodiment, in the step of removing a part of the initial lower reflective electrode, the initial lower reflective electrode may be etched to have an undercut shape under the upper reflective electrode in a cross-sectional view to form the lower reflective electrode.

[0024] In an embodiment, in the steps of forming the first hole assisting layer and the second hole assisting layer, deposition materials constituting the first hole assisting layer and the second hole assisting layer may be applied throughout the first light-emitting region, the second light-emitting region, and the non-light-emitting region, and after applying the deposition materials, the first hole assisting layer and the second hole assisting layer may be spaced apart from each other.

[0025] In an embodiment, in the step of forming the first charge generation layer and the step of forming the second charge generation layer, deposition materials constituting the first charge generation layer and the second charge generation layer may be applied on the first light-emitting layer, and after the deposition materials are applied, the first charge generation layer and the second charge generation layer may be spaced apart from each other.

[0026] In a display device according to the disclosed embodiment, the display device may include: a substrate including a first light-emitting region, a second light-emitting region, and a non-light-emitting region; a first reflective electrode disposed on the substrate; a second reflective electrode disposed on the substrate; and a pixel electrode disposed on the second reflective electrode. The thickness of the pixel electrode may be greater than or equal to about 200 Å. Thus, a hole auxiliary layer, a first charge generation layer, and a second charge generation layer formed on the pixel electrode may be disconnected in the non-light-emitting region. Accordingly, color mixing defects due to the generation of lateral leakage current in the display device may be reduced, and the display quality of the display device may be improved.

[0027] In a method of manufacturing a display device according to the disclosed embodiment, a first reflective electrode having an undercut shape in a cross-sectional view may be formed under the second reflective electrode by removing a part of the first initial reflective electrode. Thus, when the pixel electrode is formed on the reflective electrode, the pixel electrode may be self-patterned to be disconnected from the non-light-emitting region without an additional process.

[0028] When each of the hole auxiliary layer, the first charge generation layer, and the second charge generation layer is formed on the pixel electrode, each of the hole auxiliary layer, the first charge generation layer, and the second charge generation layer may be formed to be automatically disconnected in the non-light-emitting region without an additional process. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Exemplary, non-limiting embodiments will be understood more clearly through the following detailed description in conjunction with the accompanying drawings.

[0030] Figure 1 is a plan view showing a display device according to the disclosed embodiment.

[0031] Figure 2 is according to an embodiment along Figure 1 a schematic cross-sectional view of the display device taken along line I-I'.

[0032] Figure 3 is a schematic enlarged cross-sectional view showing Figure 2 region A1 of

[0033] Figure 4 , Figure 5 , Figure 6 , Figure 7 , Figure 8 , Figure 9 ,Figure 10 , Figure 11 , Figure 12 , Figure 13 , Figure 14 and Figure 15 are schematic cross-sectional views showing a method of manufacturing a Figure 2 display device.

[0034] Figure 16 is a schematic cross-sectional view of a display device taken along line I-I' according to an embodiment Figure 1 of the display device.

[0035] Figure 17 is a schematic enlarged cross-sectional view showing Figure 16 region A2 of the display device.

[0036] Figure 18 is a schematic cross-sectional view of a display device taken along line I-I' according to an embodiment Figure 1 of the display device.

[0037] Figure 19 is a schematic enlarged cross-sectional view showing Figure 18 region A3 of the display device. Detailed Description

[0038] Unless otherwise specified in detail, the illustrated embodiments will be understood to provide exemplary features of the invention. Thus, unless otherwise specified in detail, the features, components, modules, layers, films, panels, regions, and / or aspects, etc. (hereinafter, individually or collectively referred to as "elements") of each embodiment may be combined, separated, interchanged, and / or rearranged otherwise without departing from the disclosure.

[0039] The use of cross-hatching and / or shading in the drawings is generally provided to make the boundaries between adjacent elements clear. Thus, unless specified in detail, the presence or absence of cross-hatching or shading does not convey or imply any preference or requirement for a particular material, material property, size, scale, commonality between the elements shown, and / or any other characteristic, attribute, property, etc. Additionally, in the drawings, the dimensions and relative dimensions of elements may be exaggerated for clarity and / or descriptive purposes. When an embodiment can be implemented differently, a specific process order different from the described order may be executed. For example, two consecutively described processes may be executed substantially simultaneously or in an order opposite to the described order.

[0040] When an element or layer is referred to as being “on,” “connected to,” or “coupled to” another element or layer, it can be directly on, directly connected to, or directly coupled to the other element or layer, or intervening elements or layers may be present. However, when an element or layer is referred to as being “directly on,” “directly connected to,” or “directly coupled to” another element or layer, no intervening elements or layers are present. For this reason, the term “connected” can refer to physical connection, electrical connection, and / or fluid connection with or without intervening elements. Additionally, when an element is referred to as being “in contact” or “contacted” etc. with another element, the element can be “electrically in contact” or “physically in contact” with the other element; or “indirectly in contact” or “directly in contact” with the other element.

[0041] As used herein, “about” or “approximate” includes the stated value and means within an acceptable deviation range of the specific value as determined by one of ordinary skill in the art in view of the measurements discussed and the error associated with the measurement of the particular quantity (i.e., the limitations of the measurement system). For example, “about” can mean within one or more standard deviations of the stated value, or within ±30%, ±20%, ±10%, or ±5% of the stated value.

[0042] Although the terms “first,” “second,” etc. may be used herein to describe various types of elements, these elements should not be limited by these terms. These terms are used to distinguish one element from another. Thus, a first element discussed below could be termed a second element without departing from the teachings of the disclosure.

[0043] For descriptive purposes, spatial relative terms such as “beneath,” “below,” “under,” “lower,” “above,” “upper,” “on,” “over,” “higher,” and “side” (e.g., as in “sidewall”) may be used herein to describe the relationship of one element to another (other) element as shown in the figures. Spatial relative terms are intended to encompass different orientations of the device in use, operation, and / or manufacture in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, an element described as “beneath” or “below” other elements or features will then be oriented “above” the other elements or features. Thus, the exemplary term “beneath” can encompass both an orientation above and below. Additionally, the device may be otherwise oriented (e.g., rotated 90 degrees or at other orientations), and as such, the corresponding spatial relative descriptors used herein are to be interpreted accordingly.

[0044] The terms used herein are for the purpose of describing particular embodiments and are not intended to be limiting. As used herein, unless the context clearly dictates otherwise, the singular forms "a," "an," and "the" are also intended to include the plural forms. Further, when the terms "comprises," "comprising," and / or their variants are used in this specification, they specify the presence of the stated features, integers, steps, operations, elements, components, and / or groups thereof, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups thereof.

[0045] In the specification and claims, the phrase "at least one of..." is intended to include the meaning of "at least one of selected from the group of..." for purposes of its meaning and interpretation. For example, "at least one of A and B" can be understood to mean "A, B, or A and B." In the specification and claims, the term "and / or" is intended to include any combination of the terms "and" and "or" for purposes of its meaning and interpretation. For example, "A and / or B" can be understood to mean "A, B, or A and B." The terms "and" and "or" can be used in a conjunctive sense or a disjunctive sense and can be understood to be equivalent to "and / or."

[0046] Unless otherwise defined or implied herein, all terms (including technical and scientific terms) used have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure pertains. It will also be understood that terms, such as those defined in a general dictionary, should be interpreted as having a meaning consistent with their meaning in the context of the relevant art and should not be interpreted in an idealized or overly formal sense unless clearly defined in the specification.

[0047] Hereinafter, a display device according to an embodiment will be described in more detail with reference to the accompanying drawings. The same reference numerals in the drawings are used for the same components, and redundant descriptions of the same components will be omitted.

[0048] Figure 1 is a plan view showing a display device according to an embodiment of the disclosure.

[0049] Referring to Figure 1 , a display device DD according to an embodiment of the disclosure may include a display area DA and a peripheral area PA. The display area DA may be an area where an image is generated, and the peripheral area PA may be an area where an image is not generated.

[0050] In this specification, a plane may be defined by a first direction DR1 and a second direction DR2 intersecting the first direction DR1. For example, the second direction DR2 may be perpendicular to the first direction DR1. A third direction DR3 may be perpendicular to the plane.

[0051] At least one pixel PX may be disposed in the display area DA. The pixel PX may include a first pixel PX1, a second pixel PX2, and a third pixel PX3. For example, the first pixel PX1 may emit a first light, the second pixel PX2 may emit a second light, and the third pixel PX3 may emit a third light. In an embodiment, the first light may be red light, the second light may be green light, and the third light may be blue light. However, the disclosure is not limited thereto. For example, multiple pixels PX may emit yellow light, cyan light, or magenta light.

[0052] The first pixel PX1, the second pixel PX2, and the third pixel PX3 may be repeatedly arranged in a first direction DR1 and a second direction DR2 intersecting the first direction DR1 in a plan view. For example, the second pixel PX2 may be adjacent to the first pixel PX1 in the first direction DR1. The third pixel PX3 may be adjacent to the second pixel PX2 in the first direction DR1.

[0053] The peripheral area PA may be provided adjacent to the display area DA. For example, in a plan view, the peripheral area PA may surround at least a part of the display area DA. A driver may be disposed in the peripheral area PA. The driver may supply a signal or voltage to the pixel PX. For example, the driver may include a data driver and a gate driver, etc.

[0054] In an embodiment, the display device DD may be a super-small LED (or micro-LED) display device (or micro-LED display device) including a super-small LED (or micro-LED) as a light-emitting element. However, the disclosure is not limited thereto. In another embodiment, the display device DD may be an organic light-emitting diode display device including an organic light-emitting diode as a light-emitting element.

[0055] Figure 2 is a schematic cross-sectional view of a display device taken along the line I-I' according to an embodiment. Figure 1 The schematic cross-sectional view of the display device taken along the line I-I' according to an embodiment. Figure 3 is a schematic enlarged cross-sectional view showing the area A1 of Figure 2 The schematic enlarged cross-sectional view showing the area A1 of

[0056] Referring to Figure 2 and Figure 3 , Figure 1 the display area DA of Figure 1 may include a first light-emitting area LA1, a second light-emitting area LA2, a third light-emitting area LA3, and a non-light-emitting area NLA. Figure 1 The first pixel PX1 that emits the first light of Figure 1The third pixel PX3 that emits the third light can be disposed in the third light-emitting region LA3. In other words, the first light-emitting region LA1, the second light-emitting region LA2, and the third light-emitting region LA3 can be regions that emit light in the display region DA.

[0057] The non-light-emitting region NLA can be disposed between two adjacent light-emitting regions among the first light-emitting region LA1, the second light-emitting region LA2, and the third light-emitting region LA3. For example, the non-light-emitting region NLA can be disposed between the first light-emitting region LA1 and the second light-emitting region LA2. The non-light-emitting region NLA can be disposed between the second light-emitting region LA2 and the third light-emitting region LA3. The non-light-emitting region NLA can be a region that does not emit light in the display region DA.

[0058] In an embodiment, the first light-emitting region LA1, the second light-emitting region LA2, and the third light-emitting region LA3 can have substantially the same area in a plan view. In another embodiment, the first light-emitting region LA1, the second light-emitting region LA2, and the third light-emitting region LA3 can have different areas.

[0059] The display device DD can include a substrate SUB, an insulating structure IL, a reflective electrode RE, a pixel electrode PE, an intermediate layer ML, a common electrode CE, a packaging layer ENL, a color filter layer CFL, a light-blocking member BM, a first microlens LN1, a second microlens LN2, and a third microlens LN3, a planarization layer OC, a window layer WNL, and an optical functional layer OFL. The color filter layer CFL can include a first color filter CF1, a second color filter CF2, and a third color filter CF3.

[0060] The substrate SUB can include a base substrate BS and a plurality of pixel circuits PXC. In an embodiment, the substrate SUB can be a semiconductor circuit board. The base substrate BS can include a silicon wafer. However, the disclosure is not limited thereto, and the base substrate BS can include glass. A plurality of grooves GV can be defined in the base substrate BS. The pixel circuits PXC can be respectively accommodated in the grooves GV.

[0061] Each of the pixel circuits PXC can include at least one transistor. Each of the pixel circuits PXC can include at least one capacitor.

[0062] The insulating structure IL can be disposed on the substrate SUB. For example, the insulating structure IL can cover the substrate SUB. At least one contact hole CH can be defined in the insulating structure IL. The contact hole CH can penetrate the insulating structure IL in a thickness direction (e.g., the third direction DR3).

[0063] The insulating structure IL may include at least one organic layer and at least one inorganic layer. For example, the inorganic layer may be disposed on the substrate SUB, and the organic layer may be disposed on the inorganic layer. The inorganic layer may include an inorganic insulating material. For example, the inorganic insulating material may include silicon oxide, silicon nitride, silicon oxynitride, etc. These may be used alone or in combination with each other. The organic layer may include an organic insulating material. For example, the organic insulating material may include polyimide resins and polyamide resins, etc. These may be used alone or in combination with each other.

[0064] The reflective electrode RE may be disposed on the insulating structure IL. The reflective electrode RE may be electrically connected to the pixel circuit PXC through the contact hole CH. The reflective electrode RE may receive an anode voltage from the pixel circuit PXC. The reflective electrode RE may reflect light incident from the outside of the display device DD or emitted from the intermediate layer ML.

[0065] The reflective electrode RE may include a first reflective electrode RE1 and a second reflective electrode RE2. The second reflective electrode RE2 may be disposed on the first reflective electrode RE1. In an embodiment, the reflective electrode RE may have a two-layer structure. However, the disclosure is not limited thereto, and the reflective electrode RE may have a single-layer or a three-layer or more-layer structure.

[0066] In an embodiment, the width of the first reflective electrode RE1 in the first direction DR1 may be smaller than the width of the second reflective electrode RE2 in the first direction DR1. For example, in a cross-sectional view, the first reflective electrode RE1 may have an undercut shape under the second reflective electrode RE2. For example, the width of the first reflective electrode RE1 in the first direction DR1 may gradually decrease along the third direction DR3, and the upper surface of the first reflective electrode RE1 may contact the lower surface of the second reflective electrode RE2.

[0067] The reflective electrode RE may include a metal material. In an embodiment, the first reflective electrode RE1 and the second reflective electrode RE2 may include different metal materials. For example, the first reflective electrode RE1 may include aluminum (Al), and the second reflective electrode RE2 may include titanium (Ti). However, the materials included in the first reflective electrode RE1 and the second reflective electrode RE2 are not limited thereto, and the first reflective electrode RE1 and the second reflective electrode RE2 may include various metal materials.

[0068] In an embodiment, the thickness of the first reflective electrode RE1 and the thickness of the second reflective electrode RE2 may be different from each other. For example, the thickness of the first reflective electrode RE1 may be smaller than the thickness of the second reflective electrode RE2. However, the disclosure is not limited thereto, and the thickness of the first reflective electrode RE1 may be greater than the thickness of the second reflective electrode RE2.

[0069] In an embodiment, the reflective electrode RE may overlap with the first light-emitting region LA1 and the second light-emitting region LA2 in a plan view. The first reflective electrode RE1 may include a 1-1 reflective electrode RE1-1 overlapping with the first light-emitting region LA1 and a 1-2 reflective electrode RE1-2 overlapping with the second light-emitting region LA2 in a plan view. The second reflective electrode RE2 may include a 2-1 reflective electrode RE2-1 overlapping with the first light-emitting region LA1 and a 2-2 reflective electrode RE2-2 overlapping with the second light-emitting region LA2 in a plan view. In other words, the reflective electrode RE may not overlap with the non-light-emitting region NLA.

[0070] The 1-1 reflective electrode RE1-1 and the 1-2 reflective electrode RE1-2 may be spaced apart from each other. For example, the 1-1 reflective electrode RE1-1 and the 1-2 reflective electrode RE1-2 may be disposed on the insulating structure IL and spaced apart from each other in the first direction DR1.

[0071] The 2-1 reflective electrode RE2-1 may be disposed on the 1-1 reflective electrode RE1-1. The 2-2 reflective electrode RE2-2 may be disposed on the 1-2 reflective electrode RE1-2. The 2-1 reflective electrode RE2-1 and the 2-2 reflective electrode RE2-2 may be spaced apart from each other.

[0072] In this specification, the 1-1 reflective electrode RE1-1 and the 2-1 reflective electrode RE2-1 may be referred to as the first reflective electrode, and the 1-2 reflective electrode RE1-2 and the 2-2 reflective electrode RE2-2 may be referred to as the second reflective electrode. The 1-1 reflective electrode RE1-1 may be referred to as the first lower reflective electrode, and the 2-1 reflective electrode RE2-1 may be referred to as the first upper reflective electrode. The 1-2 reflective electrode RE1-2 may be referred to as the second lower reflective electrode, and the 2-2 reflective electrode RE2-2 may be referred to as the second upper reflective electrode.

[0073] The pixel electrode PE may be disposed on the reflective electrode RE. The pixel electrode PE may be in contact with the reflective electrode RE. Accordingly, the pixel electrode PE may receive an anode voltage from the reflective electrode RE.

[0074] The pixel electrode PE may include a first pixel electrode PE1 and a second pixel electrode PE2. The second pixel electrode PE2 may be disposed on the first pixel electrode PE1. In an embodiment, the pixel electrode PE may have a two-layer structure. However, the disclosure is not limited thereto, and the pixel electrode PE may have a single-layer or three-layer structure.

[0075] In an embodiment, the first pixel electrode PE1 and the second pixel electrode PE2 may have different materials from each other. For example, the first pixel electrode PE1 may include silver (Ag), and the second pixel electrode PE2 may include indium tin oxide (ITO). However, the materials included in the first pixel electrode PE1 and the second pixel electrode PE2 are not limited thereto, and the first pixel electrode PE1 and the second pixel electrode PE2 may have various materials.

[0076] In an embodiment, the thickness of the first pixel electrode PE1 may be greater than the thickness of the second pixel electrode PE2. For example, the thickness of the first pixel electrode PE1 may be about 200 Å, and the thickness of the second pixel electrode PE2 may be about 70 Å. However, the thickness of each of the first pixel electrode PE1 and the second pixel electrode PE2 is not limited thereto.

[0077] In an embodiment, the thickness of the first pixel electrode PE1 may be less than the thickness of each of the first reflective electrode RE1 and the second reflective electrode RE2. The thickness of the second pixel electrode PE2 may be less than the thickness of each of the first reflective electrode RE1 and the second reflective electrode RE2.

[0078] In an embodiment, the pixel electrode PE may overlap with the first light-emitting region LA1 and the second light-emitting region LA2 in a plan view. The first pixel electrode PE1 may include a 1-1 pixel electrode PE1-1 that overlaps with the first light-emitting region LA1 and a 1-2 pixel electrode PE1-2 that overlaps with the second light-emitting region LA2 in a plan view. The second pixel electrode PE2 may include a 2-1 pixel electrode PE2-1 that overlaps with the first light-emitting region LA1 and a 2-2 pixel electrode PE2-2 that overlaps with the second light-emitting region LA2 in a plan view. In other words, the pixel electrode PE may not overlap with the non-light-emitting region NLA.

[0079] The 1-1 pixel electrode PE1-1 may be disposed on the 2-1 reflective electrode RE2-1. The 1-2 pixel electrode PE1-2 may be disposed on the 2-2 reflective electrode RE2-2. The 1-1 pixel electrode PE1-1 and the 1-2 pixel electrode PE1-2 may be spaced apart from each other.

[0080] The 2-1 pixel electrode PE2-1 may be disposed on the 1-1 pixel electrode PE1-1. The 2-2 pixel electrode PE2-2 may be disposed on the 1-2 pixel electrode PE1-2. The 2-1 pixel electrode PE2-1 and the 2-2 pixel electrode PE2-2 may be spaced apart from each other.

[0081] In this specification, the 1-1 pixel electrode PE1-1 and the 2-1 pixel electrode PE2-1 may be referred to as the first pixel electrodes, and the 1-2 pixel electrode PE1-2 and the 2-2 pixel electrode PE2-2 may be referred to as the second pixel electrodes. The 1-1 pixel electrode PE1-1 may be referred to as the first lower pixel electrode, and the 2-1 pixel electrode PE2-1 may be referred to as the first upper pixel electrode. The 1-2 pixel electrode PE1-2 may be referred to as the second lower pixel electrode, and the 2-2 pixel electrode PE2-2 may be referred to as the second upper pixel electrode.

[0082] In an embodiment, the width of the 1-1 pixel electrode PE1-1 in the first direction DR1 may be greater than the width of the 2-1 reflective electrode RE2-1 in the first direction DR1. The width of the 1-2 pixel electrode PE1-2 in the first direction DR1 may be greater than the width of the 2-2 reflective electrode RE2-2 in the first direction DR1. However, the disclosure is not limited thereto, and the widths of the 1-1 pixel electrode PE1-1 and the 1-2 pixel electrode PE1-2 in the first direction DR1 may be equal to or less than the widths of the 2-1 reflective electrode RE2-1 and the 2-2 reflective electrode RE2-2 in the first direction DR1.

[0083] In an embodiment, the first dummy layer D1 may be disposed in the non-light-emitting region NLA on the insulating structure IL. For example, the first dummy layer D1 may be disposed between the 1-1 reflective electrode RE1-1 and the 1-2 reflective electrode RE1-2.

[0084] The first dummy layer D1 and the first pixel electrode PE1 may be formed by the same process and may include the same material. For example, during the process of depositing the first pixel electrode PE1 on the second reflective electrode RE2, the material forming the first pixel electrode PE1 may be deposited on the upper surface of the insulating structure IL between the 2-1 reflective electrode RE2-1 and the 2-2 reflective electrode RE2-2 to form the first dummy layer D1. However, the disclosure is not limited thereto, and the first dummy layer D1 may not be formed on the insulating structure IL.

[0085] In an embodiment, the second dummy layer D2 may be disposed in the non-light-emitting region NLA on the insulating structure IL. For example, the second dummy layer D2 may be disposed on the first dummy layer D1. The second dummy layer D2 may be disposed between the 1-1 reflective electrode RE1-1 and the 1-2 reflective electrode RE1-2.

[0086] The second dummy layer D2 and the second pixel electrode PE2 can be formed by the same process and can include the same materials. For example, during the process of depositing the second pixel electrode PE2 on the first pixel electrode PE1, the material forming the second pixel electrode PE2 can be deposited on the upper surface of the first dummy layer D1 located between the 1-1 pixel electrode PE1-1 and the 1-2 pixel electrode PE1-2 to form the second dummy layer D2. However, the disclosure is not limited thereto, and the second dummy layer D2 may not be formed on the insulating structure IL.

[0087] The intermediate layer ML can be disposed on the pixel electrode PE. For example, the intermediate layer ML can be disposed on the second pixel electrode PE2. The intermediate layer ML can include a hole assisting layer HIL, a first light emitting layer EML1, a first charge generation layer CGL1, a second light emitting layer EML2, a second charge generation layer GGL2, and a third light emitting layer EML3.

[0088] The hole assisting layer HIL can include a hole injection layer and a hole transport layer. For example, the hole transport layer can be disposed on the hole injection layer.

[0089] The hole injection layer can include a hole injection material. For example, the hole injection material can include (N-carbazolyl) triphenylamine (TCTA) and 4,4',4''-tris[3-methylphenyl(phenyl)amino] triphenylamine (m-MTDATA), etc. These can be used alone or in combination with each other.

[0090] The hole transport layer can include a hole transport material. For example, the hole transport material can include 4,4'-bis[N-(1-naphthyl)-N-phenylamino] biphenyl (NPB), 4,4'-bis[N-(3-methylphenyl)-N-phenylamino] biphenyl (TPD), N,N-bis(1-naphthyl)-N,N-diphenyl-1,1-biphenyl-4,4-diamine (NPD), N-phenylcarbazole, and polyvinylcarbazole, etc. These can be used alone or in combination with each other.

[0091] The hole assisting layer HIL can include a first hole assisting layer HIL1 that overlaps with the first light emitting region LA1 in a plan view and a second hole assisting layer HIL2 that overlaps with the second light emitting region LA2. The first hole assisting layer HIL1 and the second hole assisting layer HIL2 can be spaced apart from each other in the first direction DR1. In other words, the hole assisting layer HIL can have a structure that is interrupted in the non-light emitting region NLA.

[0092] The first hole assisting layer HIL1 can be disposed on the 2-1 pixel electrode PE2-1. The first hole assisting layer HIL1 can cover the 2-1 pixel electrode PE2-1. For example, the first hole assisting layer HIL1 can cover the upper surface and the side surface of the 2-1 pixel electrode PE2-1.

[0093] The second hole injection layer HIL2 may be disposed on the 2-2 pixel electrode PE2-2. The second hole injection layer HIL2 may cover the 2-2 pixel electrode PE2-2. For example, the second hole injection layer HIL2 may cover the upper surface and the side surface of the 2-2 pixel electrode PE2-2.

[0094] In an embodiment, the third dummy layer D3 may be disposed in the non-light emitting region NLA on the insulating structure IL. For example, the third dummy layer D3 may be disposed on the second dummy layer D2. The third dummy layer D3 may be disposed between the 1-1 reflective electrode RE1-1 and the 1-2 reflective electrode RE1-2.

[0095] The third dummy layer D3 and the hole injection layer HIL may be formed by the same process and may include the same material. For example, during the process of depositing the hole injection layer HIL on the second pixel electrode PE2, the material forming the hole injection layer HIL may be deposited on the upper surface of the second dummy layer D2 located between the 2-1 pixel electrode PE2-1 and the 2-2 pixel electrode PE2-2 to form the third dummy layer D3. However, the disclosure is not limited thereto, and the third dummy layer D3 may not be formed on the insulating structure IL.

[0096] The first light emitting layer EML1 may be disposed on the hole injection layer HIL. The first light emitting layer EML1 may be superimposed on the first hole injection layer HIL1 and the second hole injection layer HIL2 in a plan view. In an embodiment, the first light emitting layer EML1 may be disposed to cover the first light emitting region LA1, the second light emitting region LA2, and the non-light emitting region NLA. In another embodiment, the first light emitting layer EML1 may be disposed in the first light emitting region LA1 and the second light emitting region LA2. For example, the first light emitting layer EML1 may not be disposed in the non-light emitting region NLA and may have a disconnected structure in the non-light emitting region NLA.

[0097] The first light emitting layer EML1 may emit the first light in the red wavelength band. However, the color of the light emitted from the first light emitting layer EML1 is not limited thereto, and the light emitted from the first light emitting layer EML1 may have various colors.

[0098] The first charge generation layer CGL1 can be disposed on the first light-emitting layer EML1. The first charge generation layer CGL1 can include an n-type arylamine layer and a p-type metal oxide layer, and when a voltage is applied to the n-type arylamine layer and the p-type metal oxide layer, the n-type arylamine layer and the p-type metal oxide layer can form a complex and generate charges by undergoing a redox reaction. The first charge generation layer CGL1 can include arylamine-based organic compounds, metals, metal oxides, metal carbides, and metal fluorides, etc. These can be used alone or in combination with each other. For example, the arylamine-based organic compounds can include α-NPD, 2-TNATA, TDATA, MTDATA, spiro-TAD, and spiro-NPB, the metals can include Cs, Mo, V, Ti, W, Ba, and Li, etc., and the metal oxides, metal carbides, and metal fluorides can include Re2O7, MoO3, V2O5, WO3, TiO2, Cs2CO3, BaF, LiF, and CsF, etc.

[0099] The first charge generation layer CGL1 can include a 1-1 charge generation layer CGL1-1 that overlaps with the first light-emitting region LA1 and a 1-2 charge generation layer CGL1-2 that overlaps with the second light-emitting region LA2 in a plan view. The 1-1 charge generation layer CGL1-1 and the 1-2 charge generation layer CGL1-2 can be spaced apart from each other in the first direction DR1. In other words, the first charge generation layer CGL1 can have a structure that is interrupted in the non-light-emitting region NLA.

[0100] In this specification, the 1-1 charge generation layer CGL1-1 can be referred to as the first charge generation layer, and the 1-2 charge generation layer CGL1-2 can be referred to as the second charge generation layer.

[0101] The second light-emitting layer EML2 can be disposed on the first charge generation layer CGL1. The second light-emitting layer EML2 can overlap with the 1-1 charge generation layer CGL1-1 and the 1-2 charge generation layer CGL1-2 in a plan view. In an embodiment, the second light-emitting layer EML2 can be disposed to cover the first light-emitting region LA1, the second light-emitting region LA2, and the non-light-emitting region NLA. In another embodiment, the second light-emitting layer EML2 can be disposed in the first light-emitting region LA1 and the second light-emitting region LA2. For example, the second light-emitting layer EML2 can not be disposed in the non-light-emitting region NLA, but can have a structure that is interrupted in the non-light-emitting region NLA.

[0102] The second emitting layer EML2 can emit a second light in the green wavelength band. The second light emitted from the second emitting layer EML2 can be mixed with the first light emitted from the first emitting layer EML1. For example, the red first light and the green second light can be mixed to produce yellow light. However, the color of the light emitted from the second emitting layer EML2 is not limited thereto, and the light emitted from the second emitting layer EML2 can have various colors.

[0103] The second charge generation layer CGL2 can be disposed on the second emitting layer EML2. The material included in the second charge generation layer CGL2 and the material included in the first charge generation layer CGL1 can be substantially the same.

[0104] The second charge generation layer CGL2 can include a 2-1 charge generation layer CGL2-1 that overlaps with the first light emitting region LA1 in a plan view and a 2-2 charge generation layer CGL2-2 that overlaps with the second light emitting region LA2. The 2-1 charge generation layer CGL2-1 and the 2-2 charge generation layer CGL2-2 can be spaced apart from each other in the first direction DR1. In other words, the second charge generation layer CGL2 can have a structure that is interrupted in the non-light emitting region NLA.

[0105] In this specification, the 2-1 charge generation layer CGL2-1 can be referred to as the third charge generation layer, and the 2-2 charge generation layer CGL2-2 can be referred to as the fourth charge generation layer.

[0106] The third emitting layer EML3 can be disposed on the second charge generation layer CGL2. The third emitting layer EML3 can overlap with the 2-1 charge generation layer CGL2-1 and the 2-2 charge generation layer CGL2-2 in a plan view. In an embodiment, the third emitting layer EML3 can be disposed over the first light emitting region LA1, the second light emitting region LA2, and the non-light emitting region NLA. In another embodiment, the third emitting layer EML3 can be disposed only in the first light emitting region LA1 and the second light emitting region LA2. For example, the third emitting layer EML3 can not be disposed in the non-light emitting region NLA, but can have a structure that is interrupted in the non-light emitting region NLA.

[0107] The third emitting layer EML3 can emit a third light in the blue wavelength band. The third light emitted from the third emitting layer EML3 can be mixed with the first light emitted from the first emitting layer EML1 and the second light emitted from the second emitting layer EML2. For example, the red first light, the green second light, and the blue third light can be mixed together to generate white light. However, the color of the light emitted from the third emitting layer EML3 is not limited thereto, and the light emitted from the third emitting layer EML3 can have various colors.

[0108] As described above, the display device DD may include a first light-emitting layer EML1, a second light-emitting layer EML2, and a third light-emitting layer EML3. In other words, the display device DD may have a structure in which at least two or more light-emitting layers are stacked on one another. However, the disclosure is not limited thereto, and the display device DD may have a single light-emitting layer.

[0109] The common electrode CE may be disposed on the third light-emitting layer EML3. An electron assisting layer may be disposed between the common electrode CE and the third light-emitting layer EML3. In an embodiment, the electron assisting layer may be disposed to cover the first light-emitting region LA1, the second light-emitting region LA2, and the non-light-emitting region NLA. In another embodiment, the electron assisting layer may be disposed in the first light-emitting region LA1 and the second light-emitting region LA2. For example, the electron assisting layer may have a structure that is interrupted in the non-light-emitting region NLA. The electron assisting layer may include an electron transport layer and an electron injection layer. For example, the electron injection layer may be disposed on the electron transport layer.

[0110] The electron transport layer may include an electron transport material. For example, the electron transport material may include Alq3, 2-(4-biphenylyl)-5-(4-tert-butylphenyl)-1,3,4-oxadiazole (tBu-PBD), bis(2-methyl-8-hydroxyquinolinato)-4-phenylphenoxo-aluminum (BAlq), bathocuproine (BCP), triazole (TAZ), and phenylquinazoline, etc. These may be used alone or in combination with each other.

[0111] The electron injection layer may include an electron injection material. For example, the electron injection material may include LiF and CsF, etc. These may be used alone or in combination with each other.

[0112] The common electrode CE may be disposed to cover the first light-emitting region LA1, the second light-emitting region LA2, and the non-light-emitting region NLA. The common electrode CE may include a metal, a metal alloy, a metal nitride, a conductive metal oxide, or a transparent conductive material, etc. These may be used alone or in combination with each other.

[0113] The pixel electrode PE, the intermediate layer ML, and the common electrode CE may form a light-emitting element LE.

[0114] The encapsulation layer ENL may be disposed on the common electrode CE. The encapsulation layer ENL may cover the light-emitting element LE. The encapsulation layer ENL may prevent foreign impurities from penetrating into the light-emitting element LE.

[0115] The encapsulation layer ENL may include at least one inorganic layer and at least one organic layer. For example, the encapsulation layer ENL may include a first inorganic layer disposed on the common electrode CE, an organic layer disposed on the first inorganic layer, and a second inorganic layer disposed on the organic layer.

[0116] The color filter layer CFL may be disposed on the encapsulation layer ENL. The light blocking member BM may be disposed on the encapsulation layer ENL. The light blocking member BM may define a first light emitting region LA1, a second light emitting region LA2, and a third light emitting region LA3. For example, the light blocking member BM may define a plurality of openings that divide the first light emitting region LA1, the second light emitting region LA2, and the third light emitting region LA3. Accordingly, the light blocking member BM may not overlap with the first light emitting region LA1, the second light emitting region LA2, and the third light emitting region LA3 in a plan view. The light blocking member BM may include an organic material and / or an inorganic material containing a black pigment or a black dye, etc.

[0117] The first color filter CF1, the second color filter CF2, and the third color filter CF3 may all be disposed in the openings defined by the light blocking member BM.

[0118] The first color filter CF1 may overlap with the first light emitting region LA1 in a plan view. The first color filter CF1 may transmit the first light and absorb or block the second light and the third light. For example, the first color filter CF1 may transmit light in the red wavelength band and absorb or block light in other wavelength bands such as green and blue, but the disclosure is not limited thereto.

[0119] The second color filter CF2 may overlap with the second light emitting region LA2 in a plan view. The second color filter CF2 may transmit the second light and absorb or block the first light and the third light. For example, the second color filter CF2 may transmit light in the green wavelength band and absorb or block light in other wavelength bands such as blue and red, but the disclosure is not limited thereto.

[0120] The third color filter CF3 may overlap with the third light emitting region LA3 in a plan view. The third color filter CF3 may transmit the third light and absorb or block the first light and the second light. For example, the third color filter CF3 may transmit light in the blue wavelength band and absorb or block light in other wavelength bands such as green and red, but the disclosure is not limited thereto.

[0121] The microlens LN may be disposed on the color filter layer CFL. The microlens LN may be disposed on each of the first color filter CF1, the second color filter CF2, and the third color filter CF3. For example, the microlens LN may overlap with each of the first light emitting region LA1, the second light emitting region LA2, and the third light emitting region LA3 in a plan view. Each of the microlenses LN may have the shape of a convex lens. The microlens LN may improve the light extraction efficiency.

[0122] The planarization layer OC may be disposed on the microlens LN. The planarization layer OC may have a substantially flat upper surface. For example, the planarization layer OC may include an organic material.

[0123] The window layer WNL can be provided on the planarization layer OC. The window layer WNL can protect the intermediate layer ML, the substrate SUB, etc. For example, the window layer WNL can include glass.

[0124] The optical function layer OFL can be provided on the window layer WNL. For example, the optical function layer OFL can be a polarization layer. The optical function layer OFL can reduce the external light reflection of the display device DD. With the reduction of the external light reflection, the visibility of the display device DD can be improved.

[0125] When the thickness of the first pixel electrode PE1 is less than or equal to about 200 Å, the hole assist layer HIL, the first charge generation layer CGL1, and the second charge generation layer CGL2 formed on the first pixel electrode PE1 may not be disconnected in the non-light emitting region NLA. Therefore, a lateral leakage current may be generated between adjacent pixels PX among the pixels PX.

[0126] As described above, the thickness of the first pixel electrode PE1 included in the display device DD can be greater than or equal to about 200 Å. For example, the thickness of each of the 1-1 pixel electrode PE1-1 and the 1-2 pixel electrode PE1-2 can be in the range of about 200 Å to about 1000 Å. Therefore, the hole assist layer HIL, the first charge generation layer CGL1, and the second charge generation layer CGL2 formed on the first pixel electrode PE1 can be disconnected in the non-light emitting region NLA. Therefore, the color mixing defect due to the generation of the lateral leakage current in the display device DD can be reduced, and the display quality of the display device DD can be improved. In addition, the thickness of each of the 2-1 pixel electrode PE2-1 and the 2-2 pixel electrode PE2-2 can be in the range of about 30 Å to about 100 Å.

[0127] Figure 4 、 Figure 5 、 Figure 6 、 Figure 7 、 Figure 8 、 Figure 9 、 Figure 10 、 Figure 11 、 Figure 12 、 Figure 13 、 Figure 14 and Figure 15 are schematic cross-sectional views showing a method of manufacturing Figure 2 the display device.

[0128] Hereinafter, the content overlapping with that described with reference to Figure 2 and Figure 3 will be omitted or simplified.

[0129] Refer to Figure 4, an insulating structure IL can be formed on a substrate SUB. The insulating structure IL can be formed on the substrate SUB to cover the first light-emitting region LA1, the second light-emitting region LA2, the third light-emitting region LA3, and the non-light-emitting region NLA. The insulating structure IL can cover a matrix substrate BS and a pixel circuit PXC that are both included in the substrate SUB.

[0130] In an embodiment, as described above, the insulating structure IL can include at least one organic layer and at least one inorganic layer. Therefore, after forming at least one inorganic layer on the substrate SUB, at least one organic layer can be formed on the inorganic layer. The organic layer can have a substantially flat upper surface.

[0131] Referring to Figure 5 , a part of the insulating structure IL can be removed, and a part of the upper surface of the substrate SUB can be exposed. For example, a part of the insulating structure IL can be removed to form a contact hole CH that exposes at least a part of the pixel circuit PXC.

[0132] Referring to Figure 6 , a first initial reflective electrode RE1' can be formed on the insulating structure IL. A second reflective electrode RE2 can be formed on the first initial reflective electrode RE1'. For example, both the first initial reflective electrode RE1' and the second reflective electrode RE2 can be superimposed on the first light-emitting region LA1, the second light-emitting region LA2, and the third light-emitting region LA3 in a plan view. In other words, neither the first initial reflective electrode RE1' nor the second reflective electrode RE2 can be superimposed on the non-light-emitting region NLA. The 1-1 initial reflective electrode RE1-1' and the 1-2 initial reflective electrode RE1-2' can be spaced apart from each other in the first direction DR1. The 2-1 reflective electrode RE2-1 and the 2-2 reflective electrode RE2-2 can be spaced apart from each other in the first direction DR1.

[0133] For example, a material for forming the first initial reflective electrode RE1' can be formed on the insulating structure IL and over the entire first light-emitting region LA1, the second light-emitting region LA2, the third light-emitting region LA3, and the non-light-emitting region NLA. Thereafter, a material for forming the second reflective electrode RE2 can be applied on the material for forming the first initial reflective electrode RE1' and over the entire first light-emitting region LA1, the second light-emitting region LA2, the third light-emitting region LA3, and the non-light-emitting region NLA. Thereafter, the material for forming the first initial reflective electrode RE1' that is superimposed on the non-light-emitting region NLA can be removed to form the first initial reflective electrode RE1'. A part of the material for forming the second reflective electrode RE2 that is superimposed on the non-light-emitting region NLA can be removed to form the second reflective electrode RE2.

[0134] In an embodiment, the width of the first initial reflective electrode RE1' in the first direction DR1 and the width of the second reflective electrode RE2 in the first direction DR1 may be substantially the same. The material forming the first initial reflective electrode RE1' may fill the contact hole CH. Accordingly, the first initial reflective electrode RE1' may be electrically connected to the pixel circuit PXC.

[0135] Figure 7 is Figure 6 A schematic enlarged cross-sectional view of region B of.

[0136] Referring to Figure 7 and Figure 8 , a portion of the first initial reflective electrode RE1' may be removed to form the first reflective electrode RE1. For example, a portion of the first initial reflective electrode RE1' may be removed by dry etching. The width of the first reflective electrode RE1 formed by removing a portion of the first initial reflective electrode RE1' in the first direction DR1 may be smaller than the width of the second reflective electrode RE2 in the first direction DR1. For example, a portion of the first initial reflective electrode RE1' may be removed by dry etching, and the first reflective electrode REl may be formed to have an undercut shape in a cross-sectional view under the second reflective electrode RE2.

[0137] When performing Figure 6 , Figure 7 and Figure 8 the steps of the manufacturing method shown in, the 1-1 initial reflective electrode RE1-1' may be referred to as an initial lower reflective electrode.

[0138] Referring to Figure 9 a first pixel electrode PE1 may be formed on the second reflective electrode RE2. For example, a 1-1 pixel electrode PE1-1 may be formed on the 2-1 reflective electrode RE2-1. A 1-2 pixel electrode PE1-2 may be formed on the 2-2 reflective electrode RE2-2.

[0139] For example, a material for forming the first pixel electrode PE1 may be deposited in the first light-emitting region LA1, the second light-emitting region LA2, and the non-light-emitting region NLA. Since the first reflective electrode RE1 has an undercut shape under the second reflective electrode RE2 in a cross-sectional view, the material for forming the first pixel electrode PE1 may form the 1-1 pixel electrode PE1-1 and the 1-2 pixel electrode PE1-2 spaced apart from each other in the first direction DR1. In the case of depositing a material for forming the first pixel electrode PE1 in the non-light-emitting region NLA, a first dummy layer D1 may be formed on the insulating structure IL. However, the disclosure is not limited thereto, and a material for forming the first pixel electrode PE1 may not be deposited in the non-light-emitting region NLA.

[0140] The second pixel electrode PE2 can be formed on the first pixel electrode PE1. For example, the 2-1 pixel electrode PE2-1 can be formed on the 1-1 pixel electrode PE1-1. The 2-2 pixel electrode PE2-2 can be formed on the 1-2 pixel electrode PE1-2.

[0141] For example, materials for forming the second pixel electrode PE2 can be deposited in the first light-emitting region LA1, the second light-emitting region LA2, and the non-light-emitting region NLA. Since the first reflective electrode RE1 has an undercut shape below the second reflective electrode RE2 in the cross-sectional view, the materials for forming the second pixel electrode PE2 can form the 2-1 pixel electrode PE2-1 and the 2-2 pixel electrode PE2-2 spaced apart from each other in the first direction DR1. In the case where materials for forming the second pixel electrode PE2 are deposited in the non-light-emitting region NLA, the second dummy layer D2 can be formed on the first dummy layer D1. However, the disclosure is not limited thereto, and materials for forming the second pixel electrode PE2 may not be deposited in the non-light-emitting region NLA.

[0142] In an embodiment, materials for forming the first pixel electrode PE1 and the second pixel electrode PE2 can be deposited by a sputtering method, a thermal evaporation method, or the like. However, the deposition method is not limited thereto, and various methods can be used to deposit materials for the first pixel electrode PE1 and the second pixel electrode PE2.

[0143] Refer to Figure 10 , a hole injection layer HIL can be formed on the second pixel electrode PE2. For example, the first hole injection layer HIL1 can be formed on the 2-1 pixel electrode PE2-1. The second hole injection layer HIL2 can be formed on the 2-2 pixel electrode PE2-2.

[0144] In an embodiment, deposition materials for forming the first hole injection layer HIL1 and the second hole injection layer HIL2 can be deposited throughout the first light-emitting region LA1, the second light-emitting region LA2, and the non-light-emitting region NLA, and when the deposition materials are applied, the first hole injection layer HIL1 and the second hole injection layer HIL2 can be spaced apart from each other.

[0145] For example, a deposition material for forming the hole injection layer HIL can be deposited in the first light-emitting region LA1, the second light-emitting region LA2, and the non-light-emitting region NLA. Since the first reflective electrode RE1 has an undercut shape below the second reflective electrode RE2 in the cross-sectional view, the material for forming the hole injection layer HIL can form a first hole injection layer HIL1 and a second hole injection layer HIL2 spaced apart from each other in the first direction DR1. In the case where the material for forming the hole injection layer HIL is deposited in the non-light-emitting region NLA, a third dummy layer D3 can be formed on the second dummy layer D2. However, the disclosure is not limited thereto, and the material for forming the hole injection layer HIL may not be deposited in the non-light-emitting region NLA.

[0146] Referring Figure 11 , a first light-emitting layer EML1 can be formed on the hole injection layer HIL. In an embodiment, the first light-emitting layer EML1 can be formed over the entire first light-emitting region LA1, the second light-emitting region LA2, and the non-light-emitting region NLA. In another embodiment, the first light-emitting layer EML1 can be formed in the first light-emitting region LA1 and the second light-emitting region LA2. For example, the first light-emitting layer EML1 can be formed on the hole injection layer HIL such that the first light-emitting layer EML1 is disconnected in the non-light-emitting region NLA.

[0147] Referring Figure 12 , a first charge generation layer CGL1 can be formed on the first light-emitting layer EML1. For example, the first charge generation layer CGL1 can be formed in the first light-emitting region LA1 and the second light-emitting region LA2. In other words, the first charge generation layer CGL1 can be formed on the first light-emitting layer EML1 such that the first charge generation layer CGL1 is disconnected in the non-light-emitting region NLA.

[0148] In an embodiment, a first material M1 constituting the 1-1 charge generation layer CGL1-1 and the 1-2 charge generation layer CGL1-2 can be applied on the first light-emitting layer EML1. In the case of applying the first material M1, the 1-1 charge generation layer CGL1-1 and the 1-2 charge generation layer CGL1-2 can be spaced apart from each other.

[0149] For example, the first material M1 for forming the first charge generation layer CGL1 can be deposited on the first light-emitting layer EML1. Since the first reflective electrode RE1 has an undercut shape below the second reflective electrode RE2 in the cross-sectional view, the first material M1 can be deposited on the first light-emitting layer EML1 that overlaps the first light-emitting region LA1 and the second light-emitting region LA2 in the plan view. In other words, the first material M1 may not be deposited on the first light-emitting layer EML1 that overlaps the non-light-emitting region NLA. Therefore, the 1-1 charge generation layer CGL1-1 and the 1-2 charge generation layer CGL1-2 can be spaced apart from each other in the first direction DR1.

[0150] Referring to Figure 13 , a second light-emitting layer EML2 can be formed on the first charge generation layer CGL1. In an embodiment, the second light-emitting layer EML2 can be formed over the entire first light-emitting region LA1, second light-emitting region LA2, and non-light-emitting region NLA. In another embodiment, the second light-emitting layer EML2 can be formed in the first light-emitting region LA1 and the second light-emitting region LA2. For example, the second light-emitting layer EML2 can be formed on the first charge generation layer CGL1 such that the second light-emitting layer EML2 is disconnected in the non-light-emitting region NLA.

[0151] Referring to Figure 14 , a second charge generation layer CGL2 can be formed on the second light-emitting layer EML2. For example, the second charge generation layer CGL2 can be formed in the first light-emitting region LA1 and the second light-emitting region LA2. In other words, the second charge generation layer CGL2 can be formed on the second light-emitting layer EML2 such that the second charge generation layer CGL2 is disconnected in the non-light-emitting region NLA.

[0152] In an embodiment, a second material M2 constituting the 2-1 charge generation layer CGL2-1 and the 2-2 charge generation layer CGL2-2 can be applied on the second light-emitting layer EML2. In the case where the second material M2 is applied, the 2-1 charge generation layer CGL2-1 and the 2-2 charge generation layer CGL2-2 can be spaced apart from each other.

[0153] For example, the second material M2 for forming the second charge generation layer CGL2 can be deposited on the second light-emitting layer EML2. Since the first reflective electrode RE1 has an undercut shape below the second reflective electrode RE2 in the cross-sectional view, the second material M2 can be deposited on the second light-emitting layer EML2 that overlaps the first light-emitting region LA1 and the second light-emitting region LA2 in the plan view. In other words, the second material M2 can not be deposited on the second light-emitting layer EML2 that overlaps the non-light-emitting region NLA. Therefore, the 2-1 charge generation layer CGL2-1 and the 2-2 charge generation layer CGL2-2 can be spaced apart from each other in the first direction DR1.

[0154] Referring to Figure 15 , a third light-emitting layer EML3 can be formed on the second charge generation layer CGL2. In an embodiment, the third light-emitting layer EML3 can be formed over the entire first light-emitting region LA1, second light-emitting region LA2, and non-light-emitting region NLA. In another embodiment, the third light-emitting layer EML3 can be formed in the first light-emitting region LA1 and the second light-emitting region LA2. For example, the third light-emitting layer EML3 can be formed on the second charge generation layer CGL2 such that the third light-emitting layer EML3 is disconnected in the non-light-emitting region NLA.

[0155] The common electrode CE, encapsulation layer ENL, color filter layer CFL, planarization layer OC, window layer WNL, and optical functional layer OFL can be formed on the third emission layer EML3. Thereafter, a display device DD can be manufactured. Figure 2 of the common electrode CE, encapsulation layer ENL, color filter layer CFL, planarization layer OC, window layer WNL, and optical functional layer OFL. Thereafter, a display device DD Figure 1 can be manufactured.

[0156] As described above, in the method of manufacturing the display device DD, a part of the first initial reflective electrode RE1' can be removed to form the first reflective electrode RE1 having an undercut shape in the cross-sectional view. Therefore, when forming the pixel electrode PE on the reflective electrode RE, self-patterning can be performed so that the pixel electrode PE is disconnected in the non-light-emitting region NLA without an additional process (e.g., an etching process).

[0157] When forming each of the hole injection layer HIL, the first charge generation layer CGL1, and the second charge generation layer CGL2, each of the hole injection layer HIL, the first charge generation layer CGL1, and the second charge generation layer CGL2 can be formed to be automatically disconnected in the non-light-emitting region NLA without an additional process.

[0158] Figure 16 is a schematic cross-sectional view of a display device taken along the line I-I' according to an embodiment. Figure 1 of the display device taken along the line I-I'. Figure 17 is a schematic enlarged cross-sectional view showing Figure 16 the region A2 of.

[0159] Except for the pixel defining layer PDL, the components of the display device DD' described in reference to Figure 16 and Figure 17 are substantially the same as the components of the display device DD described in reference to Figure 2 and Figure 3 described.

[0160] Hereinafter, the content overlapping with that described in reference to Figure 2 and Figure 3 will be omitted or simplified.

[0161] Referring to Figure 16 and Figure 17 , the pixel defining layer PDL can be disposed in the non-light-emitting region NLA on the insulating structure IL. The pixel defining layer PDL can cover a part of the hole injection layer HIL. The pixel defining layer PDL can fill the space between the 1-1 reflective electrode RE1-1 and the 1-2 reflective electrode RE1-2.

[0162] In an embodiment, at least one opening may be defined in the pixel defining layer PDL. The opening may expose a part of the upper surface of the third dummy layer D3. However, the disclosure is not limited thereto, and in the case where the first dummy layer D1, the second dummy layer D2, and the third dummy layer D3 are not formed on the insulating structure IL, the opening may expose a part of the upper surface of the insulating structure IL.

[0163] In an embodiment, the pixel defining layer PDL may include an organic insulating material. In an embodiment, the pixel defining layer PDL may further include a light blocking material. The light blocking material may be a black dye or a black pigment, etc., and may include carbon black, a metal (e.g., chromium, etc.) or a metal oxide. Thus, the pixel defining layer PDL may block light.

[0164] Figure 18 is a schematic cross-sectional view of a display device taken along the Figure 1 line I-I' according to an embodiment. Figure 19 is a schematic enlarged cross-sectional view showing Figure 18 the region A3 of

[0165] Except for the pixel defining layer PDL, the spacer SP, and the first light emitting layer EML1, the second light emitting layer EML2, and the third light emitting layer EML3, the components of the display device DD'' described in Figure 18 and Figure 19 are the same as the components of the display device DD described in Figure 2 and Figure 3 Hereinafter, the content overlapping with that described in

[0166] will be omitted or simplified. Figure 2 and Figure 3 Referring to

[0167] and Figure 18 and Figure 19 , the pixel defining layer PDL may fill the space between the reflective electrode RE and the pixel electrode PE overlapping with the first light emitting region LA1 and the reflective electrode RE and the pixel electrode PE overlapping with the second light emitting region LA2. The pixel defining layer PDL may not have an opening defined to expose the upper surface of the third dummy layer D3 or the upper surface of the insulating structure IL. The pixel defining layer PDL may have a substantially flat upper surface.

[0168] The spacer SP may be disposed on the pixel defining layer PDL. The spacer SP may overlap with the non-light emitting region NLA in a plan view. The spacer SP may disconnect the first light emitting layer EML1, the second light emitting layer EML2, and the third light emitting layer EML3 in the non-light emitting region NLA. The spacer SP may include a first spacer SP1 and a second spacer SP2.

[0169] The first spacer SP1 may be disposed on the pixel defining layer PDL. The second spacer SP2 may be disposed on the first spacer SP1. In an embodiment, the width of the second spacer SP2 in the first direction DR1 may be greater than the width of the first spacer SP1 in the first direction DR1. In an embodiment, the first spacer SP1 and the second spacer SP2 may have a T shape in a cross-sectional view. However, the disclosure is not limited thereto, and the width of the second spacer SP2 in the first direction DR1 may be less than or substantially equal to the width of the first spacer SP1 in the first direction DR1.

[0170] The display device and method according to an embodiment may be applied to an electronic device included in a computer, a laptop computer, a mobile phone, a smartphone, a smart tablet, a PMP, a PDA, an MP3 player, or the like.

[0171] The above description is an example of the technical features of the disclosure, and those skilled in the art to which the disclosure pertains will be able to make various modifications and variations. Therefore, the embodiments of the disclosure described above may be implemented individually or in combination with each other.

[0172] Therefore, the embodiments disclosed in the disclosure are not intended to limit the technical spirit of the disclosure, but rather to describe the technical spirit of the disclosure, and the scope of the technical spirit of the disclosure is not limited by these embodiments. The protection scope of the disclosure should be interpreted by the appended claims, and it should be interpreted that all technical spirits within the equivalent scope are included in the scope of the disclosure.

Claims

1. A display device, comprising: a substrate comprising a first light-emitting region, a second light-emitting region spaced apart from the first light-emitting region in a first direction, and a non-light-emitting region between the first light-emitting region and the second light-emitting region; a first reflective electrode, disposed on the substrate in the first light-emitting area; a second reflective electrode disposed in the second light emitting region on the substrate and spaced apart from the first reflective electrode in the first direction; a first pixel electrode disposed in the first light emitting region on the first reflective electrode and having a width greater than a width of the first reflective electrode in the first direction; a second pixel electrode disposed in the second light emitting region on the second reflective electrode, spaced apart from the first pixel electrode in the first direction, and having a width greater than that of the second reflective electrode in the first direction; a first hole auxiliary layer, disposed on the first pixel electrode in the first light emitting area; a second hole auxiliary layer disposed on the second pixel electrode in the second light emitting region and spaced apart from the first hole auxiliary layer in the first direction; at least one light-emitting layer disposed on the first hole-assisting layer and the second hole-assisting layer; as well as A common electrode is provided on the at least one light-emitting layer in the first light-emitting region, the second light-emitting region, and the non-light-emitting region.

2. The display device according to claim 1, wherein The first pixel electrode comprises: a first lower pixel electrode, disposed on the first reflective electrode; and a first upper pixel electrode, disposed on the first lower pixel electrode, and The second pixel electrode includes: a second lower pixel electrode, disposed on the second reflective electrode; and The second upper pixel electrode is arranged on the second lower pixel electrode.

3. The display device according to claim 2, wherein: The first lower pixel electrode comprises silver, and The second upper pixel electrode includes indium tin oxide.

4. The display device according to claim 2, wherein The thickness of the first lower pixel electrode is greater than the thickness of the first upper pixel electrode, and The thickness of the second lower pixel electrode is greater than the thickness of the second upper pixel electrode.

5. The display device according to claim 4, wherein The thickness of the first lower pixel electrode and the thickness of the second lower pixel electrode are in the range of 200Å to 1000Å, and The thickness of the first upper pixel electrode and the thickness of the second upper pixel electrode are in a range of 30Å to 100Å. The display device according to claim 1 , wherein: The at least one light-emitting layer comprises: a first light-emitting layer, disposed between the first hole-assisting layer and the second hole-assisting layer; a second light-emitting layer, disposed on the first light-emitting layer; a first charge generation layer provided between the first light-emitting layer and the second light-emitting layer in the first light-emitting region; and The second charge generation layer is provided between the first light-emitting layer and the second light-emitting layer in the second light-emitting region.

7. The display device according to claim 1, wherein The first reflective electrode comprises: A first lower reflective electrode is disposed on the substrate; and a first upper reflective electrode, disposed on the first lower reflective electrode, and The second reflective electrode includes: a second lower reflective electrode, disposed on the substrate; and a second upper reflective electrode, disposed on the second lower reflective electrode; In the cross-sectional view, The first lower reflective electrode has an undercut shape below the first upper reflective electrode, and The second lower reflective electrode has an undercut shape below the second upper reflective electrode.

8. A method for manufacturing a display device, the method comprising the following steps: forming a first reflective electrode in a first light-emitting region on a substrate, the substrate comprising the first light-emitting region, a second light-emitting region spaced apart from the first light-emitting region in a first direction, and a non-light-emitting region between the first light-emitting region and the second light-emitting region; forming a second reflective electrode spaced apart from the first reflective electrode in the second light emitting region on the substrate in the first direction; forming a first pixel electrode on the first reflective electrode; forming a second pixel electrode on the second reflective electrode, spaced apart from the first pixel electrode in the first direction; forming a first hole auxiliary layer on the first pixel electrode; forming a second hole auxiliary layer on the second pixel electrode, spaced apart from the first hole auxiliary layer in the first direction; forming a first light-emitting layer on the first hole-assisting layer and the second hole-assisting layer; forming a first charge generation layer in the first light emitting region on the first light emitting layer; forming a second charge generation layer spaced apart from the first charge generation layer in the first direction in the second light emitting region on the first light emitting layer; as well as A second light emitting layer is formed on the first charge generation layer and the second charge generation layer.

9. The method for manufacturing a display device according to claim 8, wherein: The first reflective electrode comprises: a lower reflective electrode, disposed on the substrate; and an upper reflective electrode disposed on the lower reflective electrode, and The step of forming the first reflective electrode includes: forming an initial lower reflective electrode on the substrate in the first light emitting region; forming the upper reflective electrode in the first light emitting region on the initial lower reflective electrode; and A portion of the initial lower reflective electrode is removed so that a width of the initial lower reflective electrode in the first direction is smaller than a width of the upper reflective electrode in the first direction.

10. The method for manufacturing a display device according to claim 8, wherein: In the step of forming the first hole auxiliary layer and the step of forming the second hole auxiliary layer, applying deposition materials constituting the first hole auxiliary layer and the second hole auxiliary layer throughout the first light emitting region, the second light emitting region, and the non-light emitting region, and After applying the deposition material, the first hole assisting layer and the second hole assisting layer are spaced apart from each other.

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