Solid object, optical member, method for manufacturing solid object, method for forming surface, glasses, touch panel, smartphone, and tablet terminal

Abstract

A solid matter which is characterized in that the solid matter has a silicon oxide-containing layer and a polymer brush on the silicon oxide-containing layer, the polymer brush constituting the surface of the solid matter, the polymer brush having a segment of an alkyl group having 14-65 carbon atoms, and the segment having the alkyl group being bonded to the silicon oxide via an oxygen atom.

Description

Technical Field

[0001] The present disclosure relates to a solid material having excellent scratch resistance and long-term antifouling properties, a method for producing the same, an optical component having the solid material, and glasses, a touch panel, a smartphone, and a tablet terminal having the same.

[0002] The present disclosure relates to a laminate having excellent scratch resistance and long-term antifouling properties, a method for producing the laminate, an optical component having the laminate, and glasses, a touch panel, a smartphone, and a tablet terminal having the optical component.

[0003] Furthermore, the present disclosure relates to a surface-forming material and a surface-forming method for forming a surface having excellent scratch resistance and long-term antifouling properties. Background Art

[0004] Optical components such as filters and eyeglass lenses, as well as items such as touch panels and smartphones, form an antifouling film on the outermost layer to prevent and remove the adhesion of dirt such as fingerprints, sebum, sweat, and cosmetics. Antifouling films are required to have excellent antifouling properties (water and oil repellency) and damage resistance, and most of them use organofluorine compounds (PFAS) represented by perfluorooctanoic acid (PFOA) and perfluorosulfonic acid (PFOS). However, PFAS are substances that may have an impact on the environment and ecosystems, and various countries are studying restrictions on them. In the future, they may not be used in antifouling films, so antifouling films that do not contain PFAS are needed.

[0005] As a PFAS-free antifouling film, an antifouling coating agent containing a quaternary ammonium chloride of an amino-modified silicon compound and an aliphatic amine alkylene oxide adduct has been disclosed (Patent Document 1). Patent Document 1 discloses that the hard surface obtained using this antifouling coating agent has excellent antifouling properties.

[0006] On the other hand, it is well known that if knot-like polymers grow on the surface of a material, forming a molecular structure resembling a toothbrush (polymer brush), a surface with excellent durability can be obtained. By coating a base layer that functions as a polymerization initiator on the surface of a material, a polymer brush can be formed on the base layer through a polymerization reaction. Patent Document 2 discloses a polymer brush-forming substrate having a polymerization initiation layer and a precursor solution for producing the polymer brush-forming substrate.

[0007] Prior art literature

[0008] Patent Literature

[0009] Patent Document 1: Japanese Patent Application Laid-Open No. 2012-241187

[0010] Patent Document 2: International Publication No. 2019 / 131872 Summary of the Invention

[0011] Problems to be solved by the invention

[0012] The present inventors have conducted research and found that the silicone antifouling film disclosed in Patent Document 1 has excellent antifouling properties. However, it has low scratch resistance, forms scratches when repeatedly wiping off dirt, and has a problem of reduced antifouling properties with long-term use.

[0013] Patent Document 2 also discloses a polymer brush-forming substrate comprising a polymerization initiation layer and a precursor solution for producing the polymer brush-forming substrate. However, the present inventors have discovered that, due to the use of a polymerization reaction, it is difficult to control the molecular weight of the resulting polymer brush, leading to difficulties in controlling the structure of the polymer brush. Furthermore, Patent Document 2 does not mention the damage resistance or long-term antifouling properties of the resulting polymer brush.

[0014] The solutions described in Patent Documents 1 and 2 are not sufficient in terms of achieving both scratch resistance and long-term antifouling properties in antifouling films, and a surface excellent in both scratch resistance and long-term antifouling properties is desired.

[0015] The present disclosure provides a solid material having excellent both scratch resistance and long-term antifouling properties, a method for producing the same, an optical component, glasses, a touch panel, a smartphone, and a tablet terminal.

[0016] The present disclosure provides a laminate having excellent both scratch resistance and long-term antifouling properties, a method for producing the same, an optical component, and glasses, a touch panel, a smartphone, and a tablet terminal.

[0017] Furthermore, a surface forming material and a surface forming method for forming a surface having excellent scratch resistance and long-term antifouling properties are provided.

[0018] Technical solutions to problems

[0019] The solid material disclosed herein is characterized in that it comprises a layer containing silicon oxide and a polymer brush on the layer containing silicon oxide.

[0020] The polymer brush constitutes the surface of the solid object,

[0021] The polymer brush has a segment of an alkyl group having 14 or more and 65 or less carbon atoms.

[0022] The segment having the alkyl group is bonded to the silicon oxide via an oxygen atom.

[0023] Furthermore, the optical component of the present disclosure is an optical component including the above-mentioned solid matter.

[0024] Furthermore, the glasses of the present disclosure are glasses having the above-mentioned optical components.

[0025] Furthermore, the touch panel of the present disclosure is a touch panel including the above-mentioned optical component.

[0026] Furthermore, the smartphone disclosed herein is a smartphone having the above-mentioned optical component.

[0027] Furthermore, the tablet terminal of the present disclosure is a tablet terminal including the above-mentioned optical component.

[0028] In addition, the method for producing a solid substance disclosed herein comprises, in sequence:

[0029] a first vapor deposition step of forming a layer containing silicon oxide by vacuum vapor deposition of a first vapor deposition material containing silicon oxide; and

[0030] The second vapor deposition step is to form the polymer brush by vacuum vapor deposition of a second vapor deposition material containing a first compound having an alkyl chain segment with 14 to 65 carbon atoms and a hydroxyl group.

[0031] The laminate disclosed herein is a laminate having a first layer and a polymer brush layer on the first layer, characterized in that:

[0032] The first layer contains silicon oxide,

[0033] The polymer brush layer constitutes the surface of the laminate,

[0034] The polymer brush contained in the polymer brush layer has a segment of an alkyl group having 14 or more and 65 or less carbon atoms.

[0035] The segment having the alkyl group is bonded to the silicon oxide via an oxygen atom.

[0036] Furthermore, the optical component of the present disclosure is an optical component including the above-mentioned laminated body.

[0037] Furthermore, the glasses of the present disclosure are glasses having the above-mentioned optical components.

[0038] Furthermore, the touch panel of the present disclosure is a touch panel including the above-mentioned optical component.

[0039] Furthermore, the smartphone disclosed herein is a smartphone having the above-mentioned optical component.

[0040] Furthermore, the tablet terminal of the present disclosure is a tablet terminal including the above-mentioned optical component.

[0041] Furthermore, the method for manufacturing the laminated body of the present disclosure includes, in sequence:

[0042] a first evaporation step of forming the first layer by vacuum evaporating a first evaporation material containing silicon oxide; and

[0043] The second vapor deposition step is to form the polymer brush layer by vacuum vapor deposition of a second vapor deposition material containing a first compound, wherein the first compound has a segment of an alkyl group having 14 or more and 65 or less carbon atoms and a hydroxyl group.

[0044] Furthermore, the surface-forming material of the present disclosure is a surface-forming material containing a first compound having a segment of an alkyl group having 14 or more and 65 or less carbon atoms and a hydroxyl group.

[0045] Furthermore, the surface forming method disclosed herein is a surface forming method using a vacuum evaporation method, which sequentially comprises:

[0046] a first vapor deposition step of forming a layer containing silicon oxide by vacuum vapor deposition of a first vapor deposition material containing silicon oxide; and

[0047] The second vapor deposition step is to vacuum-deposit a second vapor deposition material containing a first compound having an alkyl segment with 14 to 65 carbon atoms and a hydroxyl group.

[0048] Effects of the Invention

[0049] The present disclosure provides a solid material having a surface with both excellent scratch resistance and long-term antifouling properties, a method for producing the same, a laminate and a method for producing the same, an optical component, eyeglasses, a touch panel, a smartphone, and a tablet terminal. Furthermore, the present disclosure provides a surface-forming material and a surface-forming method for forming a surface with both excellent scratch resistance and long-term antifouling properties. BRIEF DESCRIPTION OF THE DRAWINGS

[0050] Figure 1 It is a schematic diagram showing the structure of the solid object or laminate of the present disclosure. DETAILED DESCRIPTION

[0051] The following describes preferred embodiments of the solid material and its production method, laminate and its production method, optical component, eyeglasses, smartphone, tablet terminal, surface forming material, and surface forming method according to the present disclosure. However, the present disclosure is not limited to the following embodiments.

[0052] In addition, in this disclosure, the description of "XX or more and YY or less" or "XX to YY" expressing a numerical range, unless otherwise specified, means that the numerical range includes the lower limit and the upper limit as endpoints. Moreover, when the numerical range is described in stages, the upper and lower limits of each numerical range can be arbitrarily combined.

[0053] In this disclosure, a polymer brush refers to a structure in which knot-like polymers are fixed to the surface of a substrate. For example, it refers to a molecular structure in which knot-like polymers are arranged on the surface of a substrate like a brush. In this disclosure, segments having alkyl groups and segments having dimethylsiloxane chains correspond to knot-like polymers.

[0054] In the method for producing a polymer brush substrate described in Patent Document 2, a monomer is coated on the substrate or the substrate is immersed in the monomer, followed by a polymerization reaction to form the polymer brush. Forming the polymer brush through this polymerization reaction is difficult to control, for example, the molecular weight of the polymer brush, and therefore, its structure. Therefore, it is speculated that the damage resistance and long-term antifouling properties of the antifouling film described in Patent Document 2 may not be sufficient.

[0055] According to the present disclosure, the polymer brush forms a high-density and uniform brush-like molecular structure through a segment having an alkyl group with a specific carbon number, and becomes a solid material having a surface excellent in scratch resistance and long-term antifouling properties.

[0056] In addition, according to the manufacturing method disclosed herein, a polymer brush is formed by vacuum evaporating a vapor deposition material containing a first compound, thereby making it easy to control the molecular length of the polymer brush and easily form a high-density and uniform brush-like molecular structure, thereby manufacturing a solid material having a surface with excellent damage resistance and long-term antifouling properties, wherein the first compound has a chain segment of an alkyl group with a specific number of carbon atoms and a hydroxyl group.

[0057] According to the present disclosure, the polymer brushes contained in the polymer brush layer form a high-density and uniform brush-like molecular structure through segments having an alkyl group with a specific carbon number, resulting in a laminate having excellent scratch resistance and long-term antifouling properties.

[0058] In addition, according to the manufacturing method disclosed herein, a polymer brush layer is formed by vacuum evaporating a vapor deposition material containing a first compound, thereby making it easy to control the molecular length of the polymer brush and easily form a high-density and uniform brush-like molecular structure, thereby manufacturing a laminate with excellent damage resistance and long-term anti-fouling properties, wherein the first compound has a chain segment of an alkyl group with a specific number of carbon atoms and a hydroxyl group.

[0059] <Solid matter>

[0060] The solid material having a surface according to the present disclosure will be described.

[0061] The solid material comprises a layer containing silicon oxide and a polymer brush on the silicon oxide layer. Furthermore, the polymer brush forms the surface of the solid material. Furthermore, the polymer brush comprises a segment comprising an alkyl group having 14 to 65 carbon atoms. Furthermore, the segment comprising the alkyl group having 14 to 65 carbon atoms is bonded to the silicon oxide via an oxygen atom.

[0062] The polymer brush comprises a chain segment containing an alkyl group with a carbon number of 14 to 65. The carbon number of the alkyl group is preferably 16 to 60, more preferably 18 to 60, and even more preferably 18 to 40. Furthermore, the alkyl group can be linear or branched, but is preferably a linear alkyl group. Furthermore, the chain segment containing the alkyl group is preferably a linear aliphatic structure, more preferably a linear alkyl group. This structure forms a high-density, uniform brush-like molecular structure, resulting in a solid product with a surface that exhibits excellent damage resistance and long-term antifouling properties.

[0063] The segment having an alkyl group is a segment having the general formula: [C n H 2n+1 ]-represented by the chain segment of the structure. In the formula, n represents the carbon number of the alkyl group, and the preferred range of n is 14 to 65, more preferably 16 to 60, even more preferably 18 to 60, and particularly preferably 18 to 40.

[0064] When the carbon number of the alkyl group is within the above range, a high-density and uniform brush-like molecular structure is formed, resulting in a solid material having a surface with excellent damage resistance and long-term antifouling properties. When the carbon number is less than 14, it becomes difficult to form a high-density and uniform brush-like molecular structure, resulting in reduced damage resistance and antifouling properties. Furthermore, when the carbon number exceeds 65, it becomes difficult to form a high-density and uniform brush-like molecular structure, resulting in reduced damage resistance and antifouling properties.

[0065] The number of carbon atoms in the alkyl group can be adjusted by changing the types of the first compound having an alkyl segment and a hydroxyl group.

[0066] The segment having an alkyl group may further have an oxyalkylene group such as an oxyethylene group -(CH2)2-O- or an oxypropylene group -(CH(CH3)CH2)-O-, and preferably has an oxyethylene group.

[0067] The segment having an alkyl group and an oxyethylene group has the general formula: [C n’ H 2n’+1 ]-O-[(CH2)2O] m - represents a chain segment of a structure. n' in the formula represents the number of carbon atoms in the alkyl group, and m in the formula represents the degree of polymerization of the oxyethylene group. The preferred range of n'+2m, which represents the total number of carbon atoms in the alkyl group and the number of carbon atoms in the oxyethylene group in the chain segment having the alkyl group and the oxyethylene group, is 14 to 65, more preferably 16 to 60, even more preferably 18 to 60, and particularly preferably 18 to 40. In addition, the alkyl group may be linear or branched, but is preferably a linear alkyl group. Moreover, the chain segment having the alkyl group and the oxyethylene group is preferably a linear alkyl group having the oxyethylene group.

[0068] When the total number of carbon atoms in the alkyl group and the number of carbon atoms in the oxyethylene group falls within the above range, a high-density, uniform brush-like molecular structure is formed, and the resulting solid material easily exhibits a surface with excellent scratch resistance and long-term antifouling properties. When the carbon number is less than 14, it becomes difficult to form a high-density, uniform brush-like molecular structure, and scratch resistance and antifouling properties tend to decline. Furthermore, when the carbon number exceeds 65, it becomes difficult to form a high-density, uniform brush-like molecular structure, and scratch resistance and antifouling properties tend to decline.

[0069] The degree of polymerization of the oxyethylene groups is not particularly limited and may be 1-20, 1-15, or 1-10.

[0070] The total number of carbon atoms in the alkyl group and the oxyalkylene group, and the degree of polymerization of the oxyalkylene group can be adjusted by changing the type of the first compound having the alkyl group and the oxyalkylene group segment and the hydroxyl group.

[0071] In the layer containing silicon oxide, silicon oxide refers to a layer composed of SiO x Compounds represented by (x is, for example, 1 to 2), SiO2 in complex inorganic oxides such as SiO2·Al2O3, etc. Here, the layer containing silicon oxide is bonded to the segment having an alkyl group forming the polymer brush through an oxygen atom. That is, the segment having an alkyl group is bonded to silicon oxide through an oxygen atom. As a result, the durability of the polymer brush is improved, and the damage resistance of the solid can be improved. Here, the bonding method is a covalent bond. In addition, the bonding method through oxygen atoms can be a method in which the segment having an alkyl group forming the polymer brush and the layer containing silicon oxide are directly bonded, or it can be a method in which they are indirectly bonded through other bonding groups.

[0072] Furthermore, the presence of a layer containing silicon oxide allows for the formation of active sites on the silicon oxide contained in this layer. As a result, the alkyl groups in the polymer brushes are more likely to bond to the silicon oxide via oxygen atoms. This facilitates the formation of polymer brushes on the surface of the solid material. Examples of methods for forming such active sites include forming a layer containing silicon oxide through the first vapor deposition step described below, and modifying the surface by irradiating the substrate with ultraviolet light, plasma, or an ion beam.

[0073] Examples of compounds that may be contained in the silicon oxide layer include SiO2 (silicon dioxide), SiO2 with added Al2O3 (silicon dioxide with added aluminum oxide), and the like. However, the silicon oxide-containing compounds are not limited to these. Furthermore, the silicon oxide-containing layer may also contain inorganic oxides such as ITO (indium tin oxide) and TiO2 (titanium dioxide). The inorganic oxide may also be a composite oxide.

[0074] <Laminated body>

[0075] The laminated body according to the present disclosure will be described.

[0076] The laminate comprises a first layer and a polymer brush layer on the first layer. Furthermore, the first layer comprises silicon oxide. Furthermore, the polymer brush layer forms the surface of the laminate. Furthermore, the polymer brush contained in the polymer brush layer comprises a segment having an alkyl group with a carbon number of 14 to 65. Furthermore, the segment having an alkyl group with a carbon number of 14 to 65 is bonded to the silicon oxide via an oxygen atom.

[0077] The polymer brushes contained in the polymer brush layer have segments with alkyl groups having a carbon number of 14 to 65. The carbon number of the alkyl group is preferably 16 to 60, more preferably 18 to 60, and even more preferably 18 to 40. The alkyl group can be linear or branched, but is preferably a linear alkyl group. Furthermore, the segment with the alkyl group preferably has a linear aliphatic structure, more preferably a linear alkyl group. This structure forms a high-density, uniform brush-like molecular structure, resulting in a laminate with excellent damage resistance and long-term antifouling properties.

[0078] The segment having an alkyl group is a segment having the general formula: [C n H 2n+1 ]-represented by the chain segment of the structure. In the formula, n represents the carbon number of the alkyl group, and the preferred range of n is 14 to 65, more preferably 16 to 60, even more preferably 18 to 60, and particularly preferably 18 to 40.

[0079] When the carbon number of the alkyl group is within the above range, a high-density and uniform brush-like molecular structure is formed, resulting in a laminate with excellent damage resistance and long-term antifouling properties. When the carbon number is less than 14, it becomes difficult to form a high-density and uniform brush-like molecular structure, resulting in reduced damage resistance and antifouling properties. Furthermore, when the carbon number exceeds 65, it becomes difficult to form a high-density and uniform brush-like molecular structure, resulting in reduced damage resistance and antifouling properties.

[0080] The number of carbon atoms in the alkyl group can be adjusted by changing the types of the first compound having an alkyl segment and a hydroxyl group.

[0081] The segment having an alkyl group may further have an oxyalkylene group such as an oxyethylene group -(CH2)2-O- or an oxypropylene group -(CH(CH3)CH2)-O-, and preferably has an oxyethylene group.

[0082] The segment having an alkyl group and an oxyethylene group is a segment having the general formula: [C n’ H 2n’+1 ]-O-[(CH2)2O] m- represents a chain segment of a structure. n' in the formula represents the number of carbon atoms in the alkyl group, and m in the formula represents the degree of polymerization of the oxyethylene group. The preferred range of n'+2m, which represents the total number of carbon atoms in the alkyl group and the number of carbon atoms in the oxyethylene group in the chain segment having the alkyl group and the oxyethylene group, is 14 to 65, more preferably 16 to 60, even more preferably 18 to 60, and particularly preferably 18 to 40. In addition, the alkyl group may be linear or branched, but is preferably a linear alkyl group. Moreover, the chain segment having the alkyl group and the oxyethylene group is preferably a linear alkyl group having the oxyethylene group.

[0083] When the total number of carbon atoms in the alkyl group and the number of carbon atoms in the oxyethylene group are within the above range, a high-density and uniform brush-like molecular structure is formed, resulting in a laminate with excellent damage resistance and long-term antifouling properties. When the carbon number is less than 14, it becomes difficult to form a high-density and uniform brush-like molecular structure, resulting in reduced damage resistance and antifouling properties. Furthermore, when the carbon number exceeds 65, it becomes difficult to form a high-density and uniform brush-like molecular structure, resulting in reduced damage resistance and antifouling properties.

[0084] The degree of polymerization of the oxyethylene groups is not particularly limited and may be 1-20, 1-15, or 1-10.

[0085] The total number of carbon atoms in the alkyl group and the oxyalkylene group, and the degree of polymerization of the oxyalkylene group can be adjusted by changing the type of the first compound having the alkyl group and the oxyalkylene group segment and the hydroxyl group.

[0086] The first layer contains silicon oxide. Silicon oxide refers to the x Compounds represented by (x is, for example, 1 to 2), SiO2 in complex inorganic oxides such as SiO2·Al2O3, etc. Here, the first layer is a layer containing silicon oxide that is bonded to the chain segments having alkyl groups that form the polymer brush through oxygen atoms. That is, the chain segments having alkyl groups are bonded to silicon oxide through oxygen atoms. As a result, the durability of the polymer brush is improved, and the damage resistance of the laminate can be improved. Here, the bonding method is a covalent bond. In addition, the bonding method through oxygen atoms can be a method in which the chain segments having alkyl groups that form the polymer brush and the layer containing silicon oxide are directly bonded, or it can be a method in which they are indirectly bonded through other bonding groups.

[0087] Furthermore, the presence of a layer containing silicon oxide allows for the formation of active sites on the silicon oxide contained in this layer. As a result, the alkyl groups in the polymer brushes are more likely to bond to the silicon oxide via oxygen atoms. This facilitates the formation of polymer brushes on the surface of the solid material. Examples of methods for forming such active sites include forming a layer containing silicon oxide through the first vapor deposition step described below, and modifying the surface by irradiating the substrate with ultraviolet light, plasma, or an ion beam.

[0088] Examples of compounds that may be included in the first layer include SiO2 (silicon dioxide), Al2O3 (aluminum oxide), and SiO2 with added Al2O3 (silicon dioxide with added aluminum oxide). However, compounds containing silicon oxide are not limited to these. Furthermore, the first layer may also contain inorganic oxides such as ITO (indium tin oxide) and TiO2 (titanium dioxide). The inorganic oxide may also be a composite oxide.

[0089] In the solid material and laminate of the present disclosure, the polymer brush preferably further contains a segment having a dimethylsiloxane chain with a silicon atom number of 3 to 110. The inclusion of a segment having a dimethylsiloxane chain can further improve water repellency and oil repellency (antifouling properties).

[0090] The segment having dimethylsiloxane chain is a segment having the general formula: -[Si(CH3)2O] i - represents a chain segment of a structure. In the formula, i represents the degree of polymerization of the dimethylsiloxane chain, that is, the number of silicon atoms in the dimethylsiloxane chain. The preferred range of i is 3 or more and 110 or less, more preferably 3 or more and 100 or less, and even more preferably 3 or more and 50 or less.

[0091] The segment containing a dimethylsiloxane chain may further contain an alkylene group such as a methylene group or an ethylene group. The number of carbon atoms in the alkylene group is not particularly limited and may be, for example, 1 to 6, 1 to 3, or 1 to 2. The presence of an alkylene group in the segment containing a dimethylsiloxane chain can adjust the water repellency and lipophilicity.

[0092] The molecular weight of the segment having a dimethylsiloxane chain is preferably 200 to 8000, more preferably 240 to 7600, and even more preferably 300 to 7600. Alternatively, it may be 300 to 8000.

[0093] When the molecular weight is within the above range, the water repellency and lipophilicity of the dimethylsiloxane chain can be further enhanced.

[0094] By changing the types of the dimethylsiloxane chain segment and the second compound with a reactive functional group, the number of silicon atoms in the dimethylsiloxane chain can be adjusted, the dimethylsiloxane chain segment can be provided with an alkylene group, and the molecular weight of the dimethylsiloxane chain segment can be adjusted.

[0095] In the solid material and laminate of the present disclosure, the mass-based ratio of the segments having dimethylsiloxane chains to the segments having alkyl groups in the polymer brush is expressed as P. B / P A , where P Ais the peak intensity derived from the segment having an alkyl group when measured on the surface of a solid or laminated body by a micro-Raman spectrometer, P B is the peak intensity of the segment with dimethylsiloxane chain. B / P A It is preferably 0.0 to 1.1, more preferably 0.1 to 1.0, and even more preferably 0.1 to 0.5. By setting it within the above range, the scratch resistance can be further improved. B / P A It may be 0.3 to 0.7. When it is within this range, the antifouling property of the solid material or the laminate can be further improved.

[0096] P B / P A The content can be adjusted by the mass ratio of the content of the second compound having a dimethylsiloxane chain segment and a reactive functional group to the content of the first compound having an alkyl chain segment and a hydroxyl group in the surface-forming material.

[0097] P B / P A It can be obtained by the following method.

[0098] A region on the surface of a solid object or laminate is identified as the target for measurement using a microscopic Raman spectrometer. This region is determined by the magnification of the objective lens included with the instrument and the wavelength and aperture of the excitation laser. Hereinafter, this identified region is referred to as the measurement region.

[0099] Next, the scattered light generated by irradiating the measurement area with the excitation laser light is measured to obtain the peak value. The measurement conditions are as follows.

[0100] ·Measurement device: Micro-Raman spectrometer manufactured by Thermo Fisher Scientific

[0101] Objective lens magnification: 10x

[0102] Excitation laser wavelength: 532nm

[0103] Pore diameter: 25 μm

[0104] ·Measurement area: 2μm

[0105] Among the peaks in the obtained Raman spectrum, the peak derived from the C—C bond is a peak derived from the segment having an alkyl group, and the peak intensity of this peak is defined as P. A In addition, among the peaks in the obtained Raman spectrum, the peak derived from the Si-C bond is considered to be derived from the segment having a dimethylsiloxane chain, and the peak intensity of the peak is P B According to the obtained P Aand P B , calculate P B / P A .

[0106] <Method for producing solid matter>

[0107] Next, the method for producing the solid material according to the present disclosure will be described.

[0108] The method for manufacturing a solid material includes, in the following order: a first evaporation step of forming a layer containing silicon oxide by vacuum evaporating a first evaporation material containing silicon oxide; and a second evaporation step of forming the polymer brush by vacuum evaporating a second evaporation material containing a first compound, wherein the first compound has a chain segment of an alkyl group with a carbon number of 14 or more and 65 or less and a hydroxyl group.

[0109] In the first vapor deposition step, a first vapor deposition material containing silicon oxide is vacuum-deposited to form a layer containing silicon oxide. This first vapor deposition step allows the silicon oxide layer to serve as a base layer. Furthermore, forming the silicon oxide layer in the first vapor deposition step allows active sites to be formed on the silicon oxide contained in the layer. Known materials can be used as base materials for vacuum deposition.

[0110] The first evaporation material is not particularly limited as long as it contains silicon oxide, and examples thereof include SiO2 and SiO2 with added Al2O3. In addition, the first evaporation material may also contain inorganic oxides such as Al2O3, ITO, and TiO2. Here, silicon oxide refers to an inorganic oxide composed of SiO x Compounds represented by (x is, for example, 1 to 2), SiO2 in complex inorganic oxides such as SiO2·Al2O3, etc.

[0111] The conditions for vacuum deposition in the first deposition step are not particularly limited, and known conditions can be used.

[0112] In the second vapor deposition step, a second vapor deposition material containing a first compound having an alkyl chain with 14 to 65 carbon atoms and a hydroxyl group is vacuum-deposited to form a polymer brush. Performing this second vapor deposition step after the first vapor deposition step allows the polymer brush to be formed on the layer containing silicon oxide. Furthermore, the alkyl chain with 14 to 65 carbon atoms contained in the polymer brush can be bonded to the silicon oxide contained in the first layer via oxygen atoms. These oxygen atoms are presumed to originate from the hydroxyl groups contained in the first compound. Here, the bonding method is covalent bonding.

[0113] The first compound having an alkyl segment and a hydroxyl group contained in the second vapor deposition material is not particularly limited, and examples thereof include linear aliphatic alcohols and aliphatic alcohols having a branched structure, and is preferably a compound having the general formula: [C n H 2n+1 ]-OH is a straight-chain alkyl alcohol. The hydroxyl group in the formula may be located at the terminal or internal portion of the alkyl group, but is preferably located at the terminal portion. The first compound can bind to silicon oxide contained in the silicon oxide-containing layer by having a hydroxyl group.

[0114] In the formula, n represents the number of carbon atoms in the alkyl group, and the preferred range of n is 14 to 65, more preferably 16 to 60, even more preferably 18 to 60, and particularly preferably 18 to 40.

[0115] Specific examples of the first compound having an alkyl segment and a hydroxyl group include compounds A-1, A-2, A-3, and A-4 shown in Table 1.

[0116] <Method for producing laminate>

[0117] Next, a method for producing the laminate according to the present disclosure will be described.

[0118] The method for manufacturing a laminate includes, in the following order: a first evaporation step of forming the first layer by vacuum evaporating a first evaporation material containing silicon oxide; and a second evaporation step of forming the polymer brush layer by vacuum evaporating a second evaporation material containing a first compound, wherein the first compound has a chain segment of an alkyl group with a carbon number of 14 or more and 65 or less and a hydroxyl group.

[0119] In the first vapor deposition step, a first vapor deposition material containing silicon oxide is vacuum-deposited to form the first layer. This first vapor deposition step allows the first layer to contain silicon oxide. Furthermore, forming a layer containing silicon oxide in the first vapor deposition step allows active sites to be formed on the silicon oxide contained in the layer. A known material can be used as the substrate for vacuum deposition.

[0120] The first evaporation material is not particularly limited as long as it contains silicon oxide, and examples thereof include SiO2 and SiO2 with added Al2O3. In addition, the first evaporation material may also contain inorganic oxides such as Al2O3, ITO, and TiO2. Here, silicon oxide refers to an inorganic oxide composed of SiO x Compounds represented by (x is, for example, 1 to 2), SiO2 in complex inorganic oxides such as SiO2·Al2O3, etc.

[0121] The conditions for vacuum deposition in the first deposition step are not particularly limited, and known conditions can be used.

[0122] In the second vapor deposition step, a second vapor deposition material containing a first compound having an alkyl chain with 14 to 65 carbon atoms and a hydroxyl group is vacuum-deposited to form a polymer brush layer. Performing this second vapor deposition step after the first vapor deposition step allows the polymer brush layer to be formed on the first layer. Furthermore, the alkyl chain with 14 to 65 carbon atoms contained in the polymer brush can be bonded to the silicon oxide contained in the first layer via oxygen atoms. It is presumed that these oxygen atoms originate from the hydroxyl groups contained in the first compound. Here, the bonding method is covalent bonding.

[0123] The first compound having an alkyl segment and a hydroxyl group contained in the second vapor deposition material is not particularly limited, and examples thereof include linear aliphatic alcohols and aliphatic alcohols having a branched structure, and is preferably a compound having the general formula: [C n H 2n+1 ]-OH is a straight-chain alkyl alcohol. The hydroxyl group in the formula may be located at the end or inside the alkyl group, but is preferably located at the end. The first compound having a hydroxyl group enables bonding with the silicon oxide contained in the first layer.

[0124] In the formula, n represents the number of carbon atoms in the alkyl group, and the preferred range of n is 14 to 65, more preferably 16 to 60, even more preferably 18 to 60, and particularly preferably 18 to 40.

[0125] Specific examples of the first compound having an alkyl segment and a hydroxyl group include compounds A-1, A-2, A-3, and A-4 shown in Table 1.

[0126] The first compound in the method for producing a solid and the method for producing a laminate may be a linear alcohol alkoxylate or an alcohol alkoxylate having a branched structure, and is preferably a compound represented by the general formula: [C n’ H 2n’+1 ]-O-[(CH2)2O] m A linear alcohol ethoxylate represented by -H. The alkoxylate has a hydroxyl group at the end, thereby being able to bond with silicon oxide contained in the silicon oxide-containing layer or the silicon oxide contained in the first layer.

[0127] In the formula, n' represents the number of carbon atoms in the alkyl group, and m represents the degree of polymerization of the oxyethylene groups. The value of n'+2m, which represents the total number of carbon atoms in the linear alcohol ethoxylate, is preferably in the range of 14 to 65, more preferably in the range of 16 to 60, even more preferably in the range of 18 to 60, and particularly preferably in the range of 18 to 40.

[0128] The degree of polymerization of the oxyethylene groups is not particularly limited and may be 1-20, 1-15, or 1-10.

[0129] Specific examples of the linear alcohol alkoxylate include compounds A-11, A-12, A-13, and A-14 shown in Table 1.

[0130] In the method for producing a solid material and the method for producing a laminate, the first compound may be used alone or in combination of two or more compounds. Specifically, the first compound may be at least one selected from the group consisting of linear aliphatic alcohols, aliphatic alcohols having a branched structure, linear alcohol alkoxylates, and alcohol alkoxylates having a branched structure. For example, linear aliphatic alcohols include 1-octadecyl alcohol, 1-eicosanol, 1-triacontanol, and 1-hexacosanol, and linear alcohol ethoxylates include ethylene glycol monohexadecyl ether, ethylene glycol monooctadecyl ether, ethylene glycol monooctacosyl ether, and decaethylene glycol tetracosyl ether.

[0131] The second vapor deposition material in the method for producing a solid material and the method for producing a laminate may contain, in addition to the first compound, a second compound having a dimethylsiloxane chain segment and a reactive functional group. The second compound having a dimethylsiloxane chain segment and a reactive functional group is not particularly limited, but preferably has the general formula: R-[Si(CH3)2O] i -R' represents a compound of the structure.

[0132] In the formula, i represents the degree of polymerization of the dimethylsiloxane chain, that is, the number of silicon atoms in the dimethylsiloxane chain. The preferred range of i is 3 or more and 110 or less, more preferably 3 or more and 100 or less, and even more preferably 3 or more and 50 or less. In the formula, at least one of the groups consisting of R and R' is a reactive functional group capable of bonding to the silicon oxide-containing layer or the first silicon oxide-containing layer via an oxygen atom. It is presumed that the oxygen atom originates from the reactive functional group contained in the second compound. In other words, the reactive functional group is not limited as long as it can bond to silicon oxide, and examples thereof include alkoxy groups such as methoxy and ethoxy groups, and hydroxy groups. Of these, methoxy is preferred.

[0133] At least one of R and R' is a reactive functional group capable of bonding to the silicon oxide-containing layer or the first silicon oxide-containing layer via an oxygen atom, thereby enabling the second compound to bond to the silicon oxide contained in the silicon oxide-containing layer or the first silicon oxide-containing layer. Here, the bonding is a covalent bond.

[0134] In the group consisting of R and R', the functional group that is not a reactive functional group is not particularly limited, and examples thereof include alkyl groups such as methyl and ethyl, and hydrogen. Among them, methyl is preferred.

[0135] The method for producing a solid material and the method for producing a laminate may include a third vapor deposition step of vapor depositing the second compound before or after the second vapor deposition step.

[0136] The molecular weight of the second compound is preferably 200 to 8000, more preferably 240 to 7600, further preferably 300 to 7600, and further preferably 300 to 8000.

[0137] Specific examples of the second compound include compounds B-1, B-2, and B-3 shown in Table 1.

[0138] In the second vapor deposition material, the mass basis ratio of the content of the second compound to the content of the first compound is preferably 0.0 to 1.1, more preferably 0.1 to 1.0, and even more preferably 0.1 to 0.5. In addition, the mass basis ratio of the content of the second compound to the content of the first compound can be 0.3 to 0.7. By setting it within the above range, it is easy to make P B / P A Within the above range.

[0139] Surface Formation Method

[0140] Next, the surface forming method according to the present disclosure will be described.

[0141] The surface formation method uses vacuum deposition. The surface formation method includes, in the following order: a first deposition step of vacuum-depositing a first deposition material containing silicon oxide to form a layer containing silicon oxide; and a second deposition step of vacuum-depositing a second deposition material containing a first compound having an alkyl chain with 14 to 65 carbon atoms and a hydroxyl group.

[0142] In the first vapor deposition step, a first vapor deposition material containing silicon oxide is vacuum-deposited to form a layer containing silicon oxide. This first vapor deposition step allows the formation of a layer containing silicon oxide. Furthermore, the formation of the layer containing silicon oxide in the first vapor deposition step allows the formation of active sites on the silicon oxide contained in the layer. Known materials can be used as substrates for vacuum deposition.

[0143] The first evaporation material is not particularly limited as long as it contains silicon oxide, and examples thereof include SiO2 and SiO2 with added Al2O3. In addition, the first evaporation material may also contain inorganic oxides such as Al2O3, ITO, and TiO2. Here, silicon oxide refers to an inorganic oxide composed of SiO xCompounds represented by (x is, for example, 1 to 2), SiO2 in complex inorganic oxides such as SiO2·Al2O3, etc.

[0144] The conditions for vacuum deposition in the first deposition step are not particularly limited, and known conditions can be used.

[0145] In the second vapor deposition step of the surface forming method, a second vapor deposition material containing a first compound having an alkyl segment with 14 to 65 carbon atoms and a hydroxyl group is vacuum-deposited. Performing this second vapor deposition step after the first vapor deposition step allows the resulting solid surface to have excellent scratch resistance and long-term antifouling properties.

[0146] Examples of the first compound include the first compounds described in the column of the method for producing a solid material or the method for producing a laminate.

[0147] The second vapor deposition material in the surface formation method may contain, in addition to the first compound, a second compound having a dimethylsiloxane chain segment and a reactive functional group. The second compound described in the section "Methods for Producing a Solid Material" or "Methods for Producing a Laminated Material" can be used as the second compound. Furthermore, the surface formation method may include a third vapor deposition step in which the second compound is vapor deposited before or after the second vapor deposition step.

[0148] By vapor-depositing the second compound, the surface of the obtained solid material becomes a surface with more excellent water repellency and oil repellency (antifouling property).

[0149] In the second evaporation material, the ratio of the mass basis of the content of the second compound to the content of the first compound is preferably 0.0 to 1.1, more preferably 0.1 to 1.0, and further preferably 0.1 to 0.5. By setting it within the above range, the obtained solid surface becomes a surface with better damage resistance. In addition, the ratio of the mass basis of the content of the second compound to the content of the first compound can be 0.3 to 0.7. When it is in this range, the antifouling property of the obtained solid surface becomes better.

[0150] Surface forming materials

[0151] Next, the surface forming material according to the present disclosure will be described.

[0152] The surface-forming material contains a first compound having an alkyl segment with a carbon number of 14 to 65 and a hydroxyl group. The first compound described in the "Method for Producing a Solid Material" or "Method for Producing a Laminated Material" section can be used as the first compound. The surface-forming material contains the first compound, so that the surface obtained by surface-treating a substrate using the surface-forming material has both excellent scratch resistance and long-term antifouling properties.

[0153] The surface forming material can be used as the second vapor deposition material in the column of the method for producing a solid material, the method for producing a laminate, or the surface forming method.

[0154] The surface forming material can also contain the segment with dimethylsiloxane chain and the second compound of reactive functional groups. As the second compound, the second compound of recording in the manufacture method of solid matter or the manufacture method column of laminate can be used. The surface forming material, by containing the second compound, uses the surface forming material to carry out the surface obtained by the surface treatment of base material to become the surface that water repellency and oil repellency (antifouling) are more excellent.

[0155] In the surface forming material, the ratio of the mass basis of the content of the second compound to the content of the first compound is preferably 0.0 or more and 1.1 or less, more preferably 0.1 or more and 1.0 or less, and further preferably 0.1 or more and 0.5 or less. By setting it within the above range, the surface obtained by surface treatment of the substrate using the surface forming material becomes a surface with better damage resistance. In addition, the ratio of the mass basis of the content of the second compound to the content of the first compound can be 0.3 to 0.7. When within this range, the antifouling property of the surface obtained by surface treatment of the substrate using the surface forming material can be made into a surface with better antifouling.

[0156] Optical components

[0157] The optical component is an optical component containing the solid material or laminate of the present disclosure.

[0158] Examples of the optical components include optical filters, optical lenses, eyeglass lenses, photographic lenses, cover glasses for displays, and various films.

[0159] <Glasses>

[0160] Glasses are glasses with the optical components of the present disclosure. Glasses include all devices worn around the eyes, not limited to conventional glasses for vision correction, and include decorative glasses, protective goggles, helmet displays, sunglasses, smart glasses, etc.

[0161] Touch Panel

[0162] The touch panel includes the optical component disclosed herein. The touch panel disclosed herein can be used in any device having a touch panel. Examples of devices having a touch panel include smartphones and tablet computers. Specifically, smartphones include the optical component disclosed herein. Furthermore, tablet computers also include the optical component disclosed herein.

[0163]

Table 1

[0164] No. structure A-1 <![CDATA[[C 18 H 37 ]-OH]]> A-2 <![CDATA[[C 20 H 41 ]-OH]]> A-3 <![CDATA[[C 30 H 61 ]-OH]]> A-4 <![CDATA[[C 60 H 121 ]-OH]]> A-5 <![CDATA[[C 10 H 21 ]-OH]]> A-6 <![CDATA[[C 70 H 141 ]-OH]]> A-11 <![CDATA[[C 16 H 33 ]-O-[(CH2)2O]-H]]> A-12 <![CDATA[[C 18 H 37 ]-O-[(CH2)2O]-H<!-- 11 --> ]]> A-13 <![CDATA[[C 28 H 57 ]-O-[(CH2)2O]-H]]> A-14 <![CDATA[[C 40 H 81 ]-O-[(CH2)2O] 10 -H]]> B-1 <![CDATA[HO-[Si(CH3)2O]3-H]]> B-2 <![CDATA[CH3-[Si(CH3)2O] 20 -Si[OCH3]3]]> B-3 <![CDATA[CH3-[Si(CH3)2O] 100 -[CH2]3-O-[CH2]2-OH]]>

[0165] Hereinafter, the analysis method of the present disclosure will be described.

[0166] <Method for confirming that the segment having an alkyl group is bonded to silicon oxide via an oxygen atom>

[0167] The bonding of the segment having an alkyl group to silicon oxide via an oxygen atom can be confirmed by the following procedure.

[0168] On a substrate A composed of borosilicate glass and a substrate B composed of borosilicate glass, a first evaporation material containing silicon oxide is vacuum-deposited to form a layer containing silicon oxide. By forming a layer containing silicon oxide through this first evaporation process, active points can be formed on the silicon oxide contained in the layer. Then, after the layer containing silicon oxide is formed on substrate A, a second evaporation material is vacuum-deposited while maintaining a vacuum state, thereby obtaining the solid substance disclosed herein. After the layer containing silicon oxide is formed on substrate B, it is removed from the vacuum evaporation device and exposed to atmospheric pressure and air to perform a treatment to eliminate the active points of the silicon oxide contained in the layer, and then the second evaporation material is vacuum-deposited.

[0169] Substrates A and B, which had been vacuum-deposited with the second deposition material, were heated in a vacuum. The temperatures at which segments containing alkyl groups were detected were compared using a mass spectrometer (trade name: infiTOF-DUO, manufactured by KANOMAX Co., Ltd., Japan). This confirmed that the segments containing alkyl groups were bonded to silicon oxide via oxygen atoms. Since the segments containing alkyl groups in substrate A were bonded to silicon oxide via oxygen atoms, the temperature at which the segments containing alkyl groups were detected was higher than that in substrate B. The measurement conditions are as follows.

[0170] Temperature range: room temperature ~ 1000℃

[0171] Heating rate: 10℃ / min

[0172] ·Ambient air: decompression state (5×10 -7 Pa below)

[0173] ·Measurement mass range: m / z 1~1000

[0174] Furthermore, in the above method, the segment having an alkyl group is bonded to silicon oxide via an oxygen atom, which indicates that the solid material has a polymer brush on the layer containing silicon oxide.

[0175] First Implementation Method

[0176] Figure 1 This is a schematic diagram showing the structure of the first embodiment of the solid material or laminate of the present disclosure, showing an example of the structure of the solid material or laminate in which a first layer (layer containing silicon oxide) 12 containing silicon oxide is formed on a substrate 11, and a polymer brush 13 is formed on the first layer 12. Figure 1 The diagram schematically shows the structure having the polymer brush and does not show the actual thicknesses of the substrate 11 , the first layer 12 , and the polymer brush 13 in a correct ratio.

[0177] (Substrate 11)

[0178] The substrate 11 can be any material as long as it is a solid material capable of forming the first layer 12 containing silicon oxide and the polymer brush 13. Examples include glass, ceramics, resins, or thin films made of metals, glass, or resins. When using any of these materials as the substrate for an optical component comprising the solid material or laminate disclosed herein, the substrate is preferably a material that transmits visible light or light of a specific wavelength. The thickness of the substrate is not particularly limited and can be appropriately set depending on the intended use.

[0179] (First layer 12 containing silicon oxide)

[0180] The first layer 12 containing silicon oxide is a first layer containing the silicon oxide disclosed above.

[0181] The thickness of the layer 12 is not particularly limited, and examples thereof include 2 nm to 50 nm and 4 nm to 20 nm.

[0182] (Polymer brush 13)

[0183] The polymer brush 13 is a polymer brush on the first layer containing the silicon oxide of the present disclosure described above.

[0184] The thickness of the polymer brush 13 is not particularly limited, and examples thereof include 1 nm to 10 nm and 1 to 5 nm. By setting the thickness within the above range, a solid product or laminate having excellent scratch resistance and long-term antifouling properties can be easily obtained.

[0185] Example

[0186] The present disclosure will be described in more detail below with reference to the following examples, but the present disclosure is not limited to the following examples.

[0187] [Example 1]

[0188] (Preparation of Surface Forming Material)

[0189] Table 2 shows the combination of component A (first compound) and component B (second compound) and the mass ratio of component B to component A. The structures of the substances corresponding to the numbers in Table 2 are shown in Table 1. In Example 1, 30 mg of 1-triacontanol (manufactured by Tokyo Chemical Industry Co., Ltd., trade name: 1-Triacontanol), which is A-3 in Table 1, was added as a surface-forming material to a metal container (Production Example 1).

[0190] (Preparation of Silicon Oxide-Containing Layer)

[0191] SiO2 (manufactured by Canon Optron, trade name: SiO2-E-1-2) was used as the first deposition material. A first layer 12 containing silicon oxide, composed of SiO2 and having a thickness of 10 nm, was formed by deposition using a vacuum deposition apparatus (dome diameter 900 mm, deposition distance 890 mm) on a 3 mm thick borosilicate glass substrate 11. The thickness of the first layer 12 containing silicon oxide was measured using a spectroscopic ellipsometer (ESM300, manufactured by JA WOOLLAM) and was found to be 10 nm.

[0192] (Preparation of polymer brushes)

[0193] Using the surface-forming material described in Production Example 1 as the second deposition material, a polymer brush 13 was formed by vapor deposition on the first layer 12 containing silicon oxide using a vacuum vapor deposition apparatus (dome diameter 900 mm, deposition distance 890 mm) to produce an optical component. The thickness of the polymer brush 13, measured using a spectroscopic ellipsometer (ESM300, manufactured by JA WOOLLAM Co., Ltd.), was 3 nm.

[0194] (Evaluation of scratch resistance)

[0195] The scratch resistance of the surface of the prepared optical component was evaluated by the following method.

[0196] First, the water contact angle of the surface of the prepared optical component was measured by the method described below.

[0197] Then, use the cut to 1cm 2A friction test was conducted using steel wool (produced by Japan Steel Wool Co., Ltd., grade #0000, wire diameter: approximately 0.012 mm) in contact with the surface of an optical component while moving it back and forth. The applied load was adjusted to 9.8 kgf, and the friction was performed at a reciprocating speed of 60 strokes / minute and a travel distance of 15 mm. The friction was repeated 1000 times. The water contact angle was then measured.

[0198] The water contact angle is the angle between the tangent line to the water droplet's surface and the solid surface at the point where the solid and water droplet make contact. A smaller difference in the water contact angle before and after friction indicates fewer surface scratches. In other words, a smaller difference in the water contact angle before and after friction indicates higher damage resistance. Furthermore, if the difference in the water contact angle before and after friction is small and the antifouling performance evaluation (described later) is good, it can also be judged that the long-term antifouling properties are excellent.

[0199] The water contact angle was measured using a contact angle meter (CA-X150, manufactured by Kyowa Interface Science Co., Ltd.) The specific measurement method is as follows.

[0200] 2.5 μL of ion-exchanged water was dropped onto the surface of the optical component, and the angle between the tangent line of the water droplet surface and the optical component surface at the point where the water droplet contacted the optical component surface was measured from an image obtained 5 seconds after the droplet was added.

[0201] Table 3 shows the evaluation results of the scratch resistance.

[0202] (Evaluation of antifouling properties)

[0203] The antifouling properties of the prepared optical components were evaluated using the following method. Repellency and wiping resistance were used as indicators of antifouling properties, and the evaluation was conducted based on the following criteria. The results are shown in Table 3.

[0204] (Evaluation Criteria)

[0205] A: After the pen tip is attached to the surface, the ink will turn into a ball and be repelled within 5 seconds. All the ink can be wiped off with Clint paper.

[0206] B: After the pen tip is attached to the surface, the ink will not be repelled even if it exceeds 5 seconds. If you wipe it with Clint paper, all the ink can be wiped off.

[0207] C: After the pen tip is attached to the surface, the ink will not be repelled even if it exceeds 5 seconds, and it cannot be wiped off even with Clint paper.

[0208] [Examples 2 to 21]

[0209] Surface-forming materials were prepared in the same manner as in Example 1, except that the compounds listed in Table 1 were used as component A and component B in the combinations and mass ratios of component B to component A listed in Table 2. These materials were used to prepare optical components, as in Example 1. Furthermore, scratch resistance and antifouling properties were evaluated in the same manner as in Example 1. The results are shown in Table 3.

[0210] In addition, the P in the obtained solid or laminated body B / P A The mass ratio of component B to component A in the surface forming material was measured using a micro-Raman spectrometer and was consistent with that in the surface forming material.

[0211] [Example 22]

[0212] An optical component was obtained in the same manner as in Example 1, except that SiO₂ (manufactured by Canon Optron Corporation, trade name: SiO₂-E-1-2) and Al₂O₃ (manufactured by Canon Optron Corporation, trade name: Al₂O₃-A-1-2) were used as the first vapor deposition material. The mass ratio of Al₂O₃ to the mass of SiO₂ was adjusted to be 0.01. Furthermore, the scratch resistance and antifouling properties were evaluated in the same manner as in Example 1. The results are shown in Table 3.

[0213] [Comparative Examples 1 to 3]

[0214] Surface-forming materials were prepared in the same manner as in Example 1, except that the compounds listed in Table 1 were used as component A and component B in the combination and mass ratio of component B to component A as shown in Table 2. These materials were then used to prepare Comparative Examples 1 to 3. Optical components were obtained using the resulting Comparative Examples 1 to 3. Furthermore, scratch resistance and antifouling properties were evaluated in the same manner as in Example 1. The results are shown in Table 3.

[0215] [Comparative Example 4]

[0216] Chloromethylphenylethyltrimethoxysilane (0.564 parts by volume) was added to a mixed solution of 0.01M aqueous HCl solution (1 part by volume), tetraethoxysilane (2.8 parts by volume), and ethanol (8 parts by volume), and the mixture was stirred at room temperature for 24 hours to prepare a precursor solution.

[0217] The precursor solution was dropped onto a silicon wafer and spin-coated (2000 rpm / 10 seconds), followed by drying at room temperature for 24 hours to form a polymerization initiation layer on the surface of the silicon wafer.

[0218] 2-(Dimethylamino)ethyl methacrylate (5.5 parts by volume), copper (II) chloride (4 parts by volume), N,N,N',N",N"-pentamethyldiethylenetriamine (7 parts by volume), sodium ascorbate (1 part by volume), and water (1 part by volume) were mixed to form a polymerization solution. The silicon wafer on which the polymerization initiation layer was formed was immersed in the polymerization solution for 2 hours to form a polymer brush on the surface of the substrate, i.e., the silicon wafer, as an optical component. In addition, the damage resistance and antifouling properties were evaluated in the same manner as in Example 1. As a result, the contact angle before friction was 65°, and the contact angle after 1000 frictions was 7°. The antifouling evaluation result was C.

[0219]

Table 2

[0220]

[0221]

Table 3

[0222]

[0223] Label Description

[0224] 11. Substrate

[0225] 12 First layer containing silicon oxide (layer containing silicon oxide)

[0226] 13 Polymer Brushes.

Claims

1. A solid substance, characterized in that: The solid material has a layer containing silicon oxide and a polymer brush on the layer containing silicon oxide. The polymer brush constitutes the surface of the solid object, The polymer brush has a segment of an alkyl group having 14 or more and 65 or less carbon atoms. The segment having the alkyl group is bonded to the silicon oxide via an oxygen atom.

2. The solid material according to claim 1, wherein The segment having the alkyl group also has an oxyethylene group -(CH2)2-O-.

3. The solid material according to claim 1 or 2, characterized in that The segment having the alkyl group is a straight-chain aliphatic structure.

4. The solid material according to any one of claims 1 to 3, characterized in that The segment having the alkyl group is a linear alkyl group having an oxyethylene group -(CH2)2-O-.

5. The solid material according to any one of claims 1 to 4, characterized in that The polymer brush further includes a dimethylsiloxane chain segment having 3 to 110 silicon atoms, and the dimethylsiloxane chain segment is bonded to the silicon oxide via an oxygen atom.

6. The solid material according to claim 5, wherein The molecular weight of the segment having the dimethylsiloxane chain is 200 to 8000.

7. An optical component, characterized in that: Contains the solid material according to any one of claims 1 to 6.

8. A pair of glasses, characterized in that: A method of providing an optical component according to claim 7.

9. A touch panel, characterized in that: A method of providing an optical component according to claim 7.

10. A smart phone, characterized in that: A method of providing an optical component according to claim 7.

11. A tablet terminal, characterized in that: A method of providing an optical component according to claim 7.

12. A method for producing a solid material, which is the method for producing a solid material according to any one of claims 1 to 6, characterized in that: Including in order: a first vapor deposition step of forming a layer containing silicon oxide by vacuum vapor deposition of a first vapor deposition material containing silicon oxide; as well as The second vapor deposition step is to form the polymer brush by vacuum vapor deposition of a second vapor deposition material containing a first compound having an alkyl chain segment with 14 to 65 carbon atoms and a hydroxyl group.

13. The method for producing a solid material according to claim 12, wherein: The first compound is a straight-chain aliphatic alcohol.

14. The method for producing a solid material according to claim 12 or 13, wherein: The first compound is a linear alcohol ethoxylate.

15. The method for producing a solid material according to any one of claims 12 to 14, wherein: The second evaporation material further contains a second compound, wherein the second compound has a dimethylsiloxane chain segment and a reactive functional group.

16. The method for producing a solid material according to claim 15, wherein: In the second vapor deposition material, a ratio of a content of the second compound to a content of the first compound is 0.1 or more and 1.0 or less.

17. A surface forming method using a vacuum evaporation method, characterized in that: Including in order: a first vapor deposition step of forming a layer containing silicon oxide by vacuum vapor deposition of a first vapor deposition material containing silicon oxide; as well as The second vapor deposition step is to vacuum-deposit a second vapor deposition material containing a first compound having an alkyl segment with 14 to 65 carbon atoms and a hydroxyl group.

18. The surface forming method according to claim 17, wherein: The first compound is a straight-chain aliphatic alcohol.

19. The surface forming method according to claim 17 or 18, characterized in that: The first compound is a linear alcohol ethoxylate.

20. The surface forming method according to any one of claims 17 to 19, characterized in that: The second evaporation material further contains a second compound, wherein the second compound has a dimethylsiloxane chain segment and a reactive functional group.

21. The surface forming method according to claim 20, characterized in that In the second vapor deposition material, a ratio of a content of the second compound to a content of the first compound is 0.1 or more and 1.0 or less.

22. A solid substance, characterized in that A surface having a surface formed by the surface forming method according to any one of claims 17 to 21.

23. An optical component, characterized in that: Containing the solid material according to claim 22.

24. A pair of glasses, characterized in that: An optical component according to claim 23.

25. A touch panel, characterized in that: A method of providing an optical component according to claim 23.

26. A smart phone, characterized in that: An optical component according to claim 23.

27. A tablet terminal, characterized in that: An optical component according to claim 23.

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