Multilayer optical film detection method, device, equipment and storage medium

Abstract

The present invention provides a method, device, equipment, and storage medium for detecting multilayer optical films. The method comprises: obtaining polarization phase difference signals between transmitted and reflected light and recording changes in polarization ellipticity parameters through multi-band programmable laser light irradiation at multiple angles; then determining the spatial coordinates and stress distribution diagram of the stress anomaly area by combining confocal microscopy interference and polarization analysis; then continuously irradiating with a broadband light source in a photothermal coupling environment and monitoring the interference signal, polarization state, and temperature changes to obtain dynamic evolution characteristics; finally, performing a simulation test on the multilayer optical film in a system environment with a preset optical axis arrangement and beam energy distribution, obtaining in-situ polarization state and interference pattern data, and evaluating the optical performance of the film layer. The present invention can locate potential defects at a relatively high resolution and accurately evaluate the reliability and imaging quality of the film layer under complex application conditions.

Description

Technical Field

[0001] The present invention relates to the field of optical film detection technology, and in particular to a detection method, device, equipment and storage medium for a multi-layer optical film. Background Art

[0002] In the field of multilayer optical film inspection, existing technologies mostly rely on spectral reflectance and transmittance measurements to evaluate the overall optical performance of the film. However, because multilayer films may have nanoscale inclusions, interlayer stress concentrations, or local thickness gradients in complex operating environments, inspection methods based solely on macroscopic spectral data cannot accurately identify these potential defects. Especially in applications with high-power light sources or large temperature gradients, ignoring local stress distribution and its accompanying polarization anomalies can easily lead to cracking, polarization mismatch, or optical performance degradation in the film during subsequent use. Summary of the Invention

[0003] The main purpose of the present invention is to solve the technical problem that the existing technology cannot accurately identify potential defects caused by local stress and polarization anomalies in multilayer optical films;

[0004] A first aspect of the present invention provides a method for detecting a multilayer optical film, the method comprising:

[0005] A multi-band programmable laser source is used to irradiate the multilayer optical film sample at multiple angles to obtain a polarization phase difference signal between the transmitted light and the reflected light. The polarization ellipticity parameter change of the multilayer optical film sample is recorded according to the polarization phase difference signal to obtain an optical polarization parameter mapping diagram;

[0006] A confocal microscopy interferometry device is used to perform a topographic scan of the multilayer optical film according to the optical polarization parameter mapping diagram to obtain film interface profile data, and a local stress analysis is performed based on the film interface profile data in combination with a polarization analysis component to obtain the spatial coordinates and stress distribution diagram of the stress anomaly area;

[0007] The multilayer optical film is continuously irradiated in a preset test chamber using a broadband light source according to the spatial coordinates and the stress distribution diagram to obtain interference signals and polarization state data. The temperature change of the stress abnormality area is collected based on the interference signals and polarization state data in combination with infrared thermal imaging to obtain the corresponding dynamic evolution characteristics;

[0008] According to the dynamic evolution characteristics, a simulation test of the multilayer optical film is carried out in a system environment with a preset optical axis arrangement and beam energy distribution to obtain in-situ polarization state and interference pattern data. The optical performance of the film layer is analyzed based on the in-situ polarization state and interference pattern data to obtain a comprehensive evaluation result under the system environment.

[0009] Optionally, in a first implementation of the first aspect of the present invention, the multi-band programmable laser source is used to perform multi-angle incident irradiation on the multilayer optical film sample to obtain a polarization phase difference signal between the transmitted light and the reflected light, and the polarization ellipticity parameter change of the multilayer optical film sample is recorded according to the polarization phase difference signal to obtain an optical polarization parameter mapping diagram, which includes:

[0010] A plurality of predetermined wavelength ranges are set in a multi-band programmable laser source, and each wavelength range is sequentially emitted to a multilayer optical film sample according to a sequence of different incident angles to obtain the transmitted light and reflected light signals under various incident conditions;

[0011] Performing phase splitting operation on the transmitted light and reflected light signals, separating polarization phase difference signals corresponding to different wavelength-angle combinations using a phase unpacking algorithm, and forming a polarization phase difference matrix;

[0012] According to the polarization phase difference matrix, the corresponding ellipticity and polarization angle data are calculated respectively, and the ellipticity and polarization angle data are interpolated, and the interpolation results are integrated into an optical polarization parameter mapping diagram.

[0013] Optionally, in a second implementation of the first aspect of the present invention, the confocal microscopy interferometry device is used to perform a topographic scan of the multilayer optical film according to the optical polarization parameter mapping diagram to obtain film layer interface profile data, and local stress analysis is performed based on the film layer interface profile data in combination with a polarization analysis component to obtain the spatial coordinates and stress distribution diagram of the stress anomaly area, including:

[0014] Performing a partition query on the optical polarization parameter map, and determining a local polarization abnormal region and a corresponding coordinate index in the optical polarization parameter map according to the partition query result;

[0015] Using a confocal microscopy interferometry device to scan the corresponding local polarization anomaly area point by point based on the coordinate index, and using an interference phase acquisition module of the confocal microscopy interferometry device to calculate the interference fringes on the surface of the multilayer optical film in real time based on the scanning results to obtain local film layer morphology data;

[0016] Comparing the local film layer topography data with the polarization state change results provided by the polarization analysis component, performing differential calculation on the phase shift of the interference fringes in the local polarization anomaly region, and extracting lattice information where stress concentration or material defects exist;

[0017] A stress tensor inference operation is performed on the lattice information, the interference phase variation amplitude of each point in the lattice information is correlated and fitted with the degree of polarization state anomaly, the spatial coordinates of the stress anomaly area are output, and a stress distribution map is marked under the corresponding spatial coordinates.

[0018] Optionally, in a third implementation of the first aspect of the present invention, comparing the local film layer topography data with the polarization state change result provided by the polarization analysis component, performing differential calculation on the phase shift of the interference fringes in the local polarization anomaly region, and extracting lattice information indicating stress concentration or material defects includes:

[0019] Matrixing the local film layer morphology data to obtain a morphology feature matrix within the local polarization anomaly region;

[0020] According to the polarization state change result provided by the polarization analysis component, a segmented screening process is performed on the interference fringe phase distribution in the morphology feature matrix to obtain a corresponding phase comparison reference set;

[0021] Performing a differential operation on the phase comparison reference set to extract the phase drift gradient of each point in the adjacent area, and recording points with a phase drift gradient greater than a preset threshold as suspicious stress points or material defect points;

[0022] Interpolation fitting processing is performed according to the coordinates of the suspicious stress points or material defect points in the morphology feature matrix to obtain corresponding lattice information of the stress concentration or material defect.

[0023] Optionally, in a fourth implementation of the first aspect of the present invention, the broadband light source is used to continuously irradiate the multilayer optical film in a preset test chamber according to the spatial coordinates and the stress distribution diagram to obtain interference signals and polarization state data, and the temperature change of the stress abnormality area is collected by infrared thermal imaging based on the interference signals and polarization state data to obtain corresponding dynamic evolution characteristics, including:

[0024] According to the spatial coordinates and the stress distribution diagram, the irradiation range and incident power of the broadband light source are set, and the temperature control module in the preset test chamber is adjusted to a segmented incremental mode;

[0025] During the continuous irradiation of the broadband light source, the interference detection component monitors the fluctuation data of the interference phase in the stress abnormality area and the interference fringe distribution corresponding to each temperature section to obtain the interference detection result;

[0026] Using a polarization detector to collect polarization state data of the stress anomaly area in real time, and combining it with the interference detection results to perform multi-dimensional linkage analysis, and statistically analyzing the change trend of polarization phase or ellipticity with temperature gradient;

[0027] An infrared thermal imaging device is used to continuously collect the local temperature field of the stress anomaly area in the test chamber. The local temperature field is correlated with the interference fringes and the change trend to obtain the dynamic evolution characteristics of the stress anomaly area under photothermal excitation.

[0028] Optionally, in a fifth implementation of the first aspect of the present invention, the polarization state data of the stress anomaly area is collected in real time using a polarization detector, and multi-dimensional linkage analysis is performed in combination with the interference detection results, and the statistical trend of the polarization phase or ellipticity with the temperature gradient includes:

[0029] Performing segmented extraction processing on the polarization state data collected by the polarization detector in each temperature segment to obtain a polarization sequence corresponding to each temperature segment;

[0030] performing a matching operation on the interference fringe distribution in the interference detection result according to the polarization sequence to obtain a phase-polarization mapping matrix;

[0031] Performing differential operation or wavelet analysis on the phase-polarization mapping matrix, correlating and fitting the phase change and ellipticity change in each temperature range, and outputting a multi-dimensional polarization phase or ellipticity eigenvector;

[0032] According to the polarization phase or ellipticity characteristic vector, a change curve of the polarization phase or ellipticity is fitted according to the temperature gradient, and the sudden increase, inflection point or abnormal interval in the change curve is further subdivided to obtain the change trend of the polarization phase or ellipticity of the stress anomaly area with the temperature gradient in the photothermal coupling environment.

[0033] Optionally, in a sixth implementation of the first aspect of the present invention, based on the dynamic evolution characteristics, a simulation test is performed on the multilayer optical film in a system environment with a preset optical axis arrangement and beam energy distribution to obtain in-situ polarization state and interference pattern data, and the optical properties of the film layer are analyzed based on the in-situ polarization state and interference pattern data to obtain a comprehensive evaluation result under the system environment, including:

[0034] According to the dynamic evolution characteristics, a system environment including a preset optical axis arrangement and beam energy distribution is set, and a multilayer optical film is placed in a specified beam path of the system environment;

[0035] In the system environment, a polarization analyzer and an interferometer monitoring component are used to synchronously collect and record the in-situ polarization state and interference pattern data of the multilayer optical film under a preset optical axis arrangement and beam energy distribution, and phase unpacking processing is performed to form a spatial interference phase sequence;

[0036] Based on the spatial interference phase sequence, a differential operation or a frequency domain filtering algorithm is used to compare the stress diffusion and film thickness change generated by the film layer of the multilayer optical film in the system environment frame by frame to obtain the evolution of the optical performance of the film layer in the system environment;

[0037] Performing a multi-dimensional correlation analysis on the evolution and the dynamic evolution characteristics to obtain a comprehensive data result, and comparing the comprehensive data result with the beam energy and optical axis arrangement index of the system environment to determine whether the multilayer optical film has polarization mismatch or film layer loss in the system environment, and obtaining a judgment result;

[0038] The reliability and imaging quality of the film layer in the system environment are determined according to the judgment result, and a comprehensive evaluation result in the system environment is obtained.

[0039] A second aspect of the present invention provides a device for detecting a multilayer optical film, the device comprising:

[0040] A laser incident module is used to irradiate the multilayer optical film sample at multiple angles through a multi-band programmable laser source to obtain a polarization phase difference signal between the transmitted light and the reflected light, and to record the change in the polarization ellipticity parameter of the multilayer optical film sample based on the polarization phase difference signal to obtain an optical polarization parameter mapping diagram;

[0041] An interference stress module is used to perform a topographic scan of a multilayer optical film using a confocal microscopy interferometer according to the optical polarization parameter map to obtain film interface profile data, and to perform local stress analysis based on the film interface profile data in combination with a polarization analysis component to obtain the spatial coordinates and stress distribution map of the stress anomaly area;

[0042] a photothermal testing module for continuously irradiating the multilayer optical film in a preset test chamber using a broadband light source according to the spatial coordinates and stress distribution diagram, obtaining interference signals and polarization state data, and acquiring temperature changes in the stress anomaly area based on the interference signals and polarization state data in combination with infrared thermal imaging to obtain corresponding dynamic evolution characteristics;

[0043] The system simulation module is used to simulate and test the multilayer optical film according to the dynamic evolution characteristics through a system environment with a preset optical axis arrangement and beam energy distribution, obtain in-situ polarization state and interference pattern data, analyze the optical performance of the film layer according to the in-situ polarization state and interference pattern data, and obtain a comprehensive evaluation result under the system environment.

[0044] The third aspect of the present invention provides a detection device for a multilayer optical film, comprising: a memory and at least one processor, wherein instructions are stored in the memory, and the memory and the at least one processor are interconnected via lines; the at least one processor calls the instructions in the memory so that the detection device for the multilayer optical film performs the steps of the above-mentioned detection method for the multilayer optical film.

[0045] A fourth aspect of the present invention provides a computer-readable storage medium having instructions stored therein, which, when executed on a computer, causes the computer to execute the steps of the above-mentioned method for detecting a multilayer optical film.

[0046] The above-mentioned detection method, device, equipment and storage medium for multi-layer optical films use a multi-band programmable laser source for multi-angle incident irradiation to obtain the polarization phase difference signal between the transmitted light and the reflected light and record the change in the polarization ellipticity parameter; then, confocal microscopy and polarization analysis are combined to determine the spatial coordinates and stress distribution diagram of the stress anomaly area; then, a broadband light source is used for continuous irradiation in a photothermal coupling environment and the interference signal, polarization state and temperature changes are monitored to obtain dynamic evolution characteristics; finally, a simulation test is performed on the multi-layer optical film in a system environment with a preset optical axis arrangement and beam energy distribution, to obtain in-situ polarization state and interference pattern data and evaluate the optical performance of the film layer. The present invention can locate potential defects at a high resolution and accurately evaluate the reliability and imaging quality of the film layer under complex application conditions.

[0047] Other features and advantages of the present invention will be described in the following description, and in part will become apparent from the description, or understood by practicing the present invention. The purposes and other advantages of the present invention are realized and obtained by the structures particularly pointed out in the description, claims and drawings.

[0048] In order to make the above-mentioned objects, features and advantages of the present invention more obvious and easy to understand, preferred embodiments are given below and described in detail with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0049] Figure 1 Schematic diagram of a first embodiment of a method for detecting a multilayer optical film according to an embodiment of the present invention;

[0050] Figure 2 Schematic diagram of an embodiment of a detection device for a multilayer optical film according to an embodiment of the present invention;

[0051] Figure 3 Schematic diagram of an embodiment of a detection device for a multilayer optical film according to an embodiment of the present invention. DETAILED DESCRIPTION

[0052] To make the objectives, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of them. All other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making any creative efforts shall fall within the scope of protection of the present invention.

[0053] The terms "including," "having," and any variations thereof, as used in the embodiments of the present invention are intended to cover non-exclusive inclusions. For example, a process, method, system, product, or device comprising a series of steps or units is not limited to the listed steps or units, but may optionally include other steps or units not listed, or may optionally include other steps or units inherent to the process, method, product, or device.

[0054] To facilitate understanding of this embodiment, a method for detecting a multilayer optical film disclosed in an embodiment of the present invention is first introduced in detail. Figure 1 As shown, this method includes the following steps:

[0055] 101. Using a multi-band programmable laser source to illuminate a multi-layer optical film sample at multiple angles, obtain polarization phase difference signals between transmitted light and reflected light, record changes in polarization ellipticity parameters of the multi-layer optical film sample based on the polarization phase difference signals, and obtain an optical polarization parameter mapping diagram;

[0056] In one embodiment of the present invention, a multi-band programmable laser source is used to perform multi-angle incident irradiation on a multi-layer optical film sample to obtain polarization phase difference signals of transmitted light and reflected light, and the polarization ellipticity parameter changes of the multi-layer optical film sample are recorded according to the polarization phase difference signals to obtain an optical polarization parameter mapping diagram, including: setting a plurality of predetermined wavelength ranges in the multi-band programmable laser source, and sequentially emitting each wavelength range to the multi-layer optical film sample according to a different incident angle sequence to obtain transmitted light and reflected light signals under various incident conditions; performing phase splitting operation on the transmitted light and reflected light signals, and using a phase unpacking algorithm to separate the polarization phase difference signals corresponding to different wavelength-angle combinations to form a polarization phase difference matrix; according to the polarization phase difference matrix, respectively calculating the corresponding ellipticity and polarization angle data, and performing interpolation processing on the ellipticity and polarization angle data, and integrating the interpolation results into an optical polarization parameter mapping diagram.

[0057] Specifically, in the process of multi-angle incident irradiation of a multi-layer optical film sample by a multi-band programmable laser source, a set of wavelength ranges can be set in the multi-band programmable laser source first, each wavelength range corresponds to a set of different incident angle sequences, and these wavelength and angle combinations are sequentially emitted to the surface of the multi-layer optical film sample. The multi-layer optical film will produce a variety of reflection and induced effects at different wavelengths and angles, and the transmitted light and the reflected light will output the original light signal after passing through the photoelectric converter. When performing phase splitting operations on these original light signals, a phase unpacking algorithm will be used. For example, in the phase unpacking process, ,in is an integer used to correct the phase jump, is the initial phase value collected by the interferometer or phase detection module. The phase of the interval is unfolded into a continuous domain. After the split is completed, the polarization phase difference matrix is ​​obtained. Then, the ellipticity and polarization angle data are obtained for the positions of different wavelength and angle combinations in the matrix. The discrete distribution of ellipticity and polarization angle is smoothed by interpolation or surface fitting to generate an optical polarization parameter mapping diagram. The mapping diagram often uses the incident angle and wavelength as the horizontal and vertical coordinates on the coordinate axis, and the ellipticity or phase difference as the color level or height distribution, which is used to distinguish the polarization response of different regions at each wavelength and angle. All mapping results are uniformly stored to form a high-dimensional matrix structure, which can be further applied to subsequent interference scanning and stress analysis modules to track local defect areas at the nanoscale.

[0058] When a multilayer optical film is topographically scanned using a confocal microscopic interference device based on the optical polarization parameter map, the microscopic interference probe is selectively aligned with the suspicious areas based on the coordinate areas where the ellipticity or polarization angle in the optical polarization parameter map appears abnormal. The topography scanning process is mainly completed by combining a confocal objective lens and an interference phase acquisition module. The period and contrast of the interference fringes on the film surface or at the interface between layers are affected by the thickness and refractive index differences of the material. During the scanning process, the interference pattern is collected in real time and the grayscale or fringe direction in the pattern is phase unpacked and numerically fitted to analyze the microscopic height information or interface profile data of the film surface. After comparing the topography data with the previously acquired polarization parameters, the areas showing large deviations in the fringe phase or polarization data are located through differential or comparison algorithms, and the stress distribution in the area is inferred. Stress analysis can use stress tensor decomposition to correlate the phase variation of each pixel in the interference pattern with the degree of polarization angle anomaly in the mapping pattern. Combining the Young's modulus and refractive index gradient of the film material, the stress concentration factor is calculated and the spatial coordinates and stress distribution map of the stress anomaly area are output for subsequent irradiation positioning of photothermal testing.

[0059] Using a broadband light source, the multilayer optical film is continuously irradiated within a pre-defined test chamber based on the spatial coordinates and stress distribution. The irradiation parameters of the broadband light source are linked to the temperature control module within the test chamber. The chamber temperature can be increased in steps, and the light source maintains a stable or synchronously adjusts the irradiation power accordingly, ensuring that the stress anomaly area maintains the desired photothermal coupling environment. Real-time acquisition of interference signals and polarization state data is performed by the same interferometer and polarization detector. The interferometer monitors fringe contrast and phase shift to record subtle changes in film thickness or interface, while the polarization detector records the dynamic changes in polarization ellipticity or phase over time within the area at each temperature range. To accurately assess heat accumulation within the stress anomaly area, an infrared thermal imager simultaneously records the surface temperature field of the corresponding coordinate area in the test chamber. A three-dimensional mapping is then established based on the linkage between the temperature time series data and the interference phase or polarization ellipticity. This mapping resolves the localized deformation and polarization state transitions caused by stress concentration within each temperature range, thereby characterizing the dynamic evolution of that area and providing guidance for simulation testing within a system environment.

[0060] According to the dynamic evolution characteristics, when simulating the test of the multilayer optical film through the system environment with preset optical axis arrangement and beam energy distribution, it is necessary to accurately design the arrangement of the optical path and the coupling method of the beam energy so as to restore the incident angle, wavelength coverage and energy distribution characteristics under the subsequent real application conditions as much as possible. After being placed in the environment, the polarization analyzer and the interference monitoring component are coaxially arranged with the optical axis so that the angle between the detection beam and the film layer under test fully conforms to the key area previously selected in the polarization parameter mapping diagram. The in-situ polarization state and interference pattern data are processed in the system environment with the same phase unpacking and multidimensional fitting method, and compared with the temperature-polarization-stress distribution relationship obtained from the dynamic evolution characteristics. If the performance of the film layer in this system environment can be described by the coupling function of the following form:

[0061] ;

[0062] The optical shift of the film layer under local microstress or local temperature rise can be evaluated based on the responsivity of the coupling function, where: Represents the function of optical polarization parameters, where θ is the angle parameter and λ is the wavelength parameter, is the stress distribution function, which represents the stress value at the coordinate (x, y). is the thermal strain function, representing the thermal strain caused by temperature T. By plotting these evaluation results using comprehensive coordinates or a graded graph, it is possible to quantitatively analyze the performance of the coating under real-world optical system conditions. This allows for timely identification of discrepancies between comprehensive evaluation results and dynamic evolution characteristics under system conditions, providing in-depth assessment of the reliability of multilayer optical films in complex scenarios.

[0063] 102. Scan the multilayer optical film using a confocal microscopy interferometer based on an optical polarization parameter map to obtain film interface profile data. Perform local stress analysis based on the film interface profile data in conjunction with a polarization analysis component to obtain the spatial coordinates and stress distribution map of the stress anomaly area.

[0064] In one embodiment of the present invention, the method comprises: performing a partition query on the optical polarization parameter map, and determining the local polarization abnormality region and the corresponding coordinate index in the optical polarization parameter map based on the partition query result; scanning the corresponding local polarization abnormality region point by point based on the coordinate index using the confocal microscopy interferometer, and using the polarization analysis component to perform a local stress analysis based on the film interface profile data to obtain the spatial coordinates and stress distribution map of the stress abnormality region. The interference phase acquisition module of the confocal microscopy interference device calculates the interference fringes on the surface of the multilayer optical film in real time based on the scanning results to obtain local film layer morphology data; compares the local film layer morphology data with the polarization state change results provided by the polarization analysis component, performs differential calculation on the phase drift of the interference fringes in the local polarization anomaly area, and extracts the lattice information where stress concentration or material defects exist; performs stress tensor inference operation on the lattice information, correlates and fits the interference phase change amplitude of each point in the lattice information with the degree of polarization state anomaly, outputs the spatial coordinates of the stress anomaly area, and marks the stress distribution map under the corresponding spatial coordinates.

[0065] Specifically, in the process of performing a partitioned query on the optical polarization parameter map and determining the local polarization anomaly regions and corresponding coordinate indices in the optical polarization parameter map based on the partitioned query results, it is necessary to first establish a coordinate mapping relationship for each pixel or grid cell in the optical polarization parameter map and partition the map into multiple dimensions based on spectral range and incident angle. To accurately locate portions within these partitioned regions where the ellipticity or polarization angle significantly deviates from the normal distribution, a threshold comparison method can be used to compare the ellipticity or phase difference values ​​of each grid cell with a standard range. Grid cells with values ​​exceeding the limit are defined as polarization anomaly points. Next, region growing or cluster analysis can be performed around these anomaly points, merging adjacent anomaly points to form a local polarization anomaly region. The boundaries of these regions are then fitted to obtain a stable coordinate range. To ensure the stability of the calculation results, the threshold can be fine-tuned through multiple iterations during the partitioned query phase, and interpolation or smoothing algorithms can be used to eliminate discrete noise. After region identification, coordinate indices can be extracted from the center point of the anomaly region boundary or several surrounding pixels, and these coordinate indices can be recorded in an index table. The index table is synchronized with the mapping diagram and can be used as a reference for the scanning path during subsequent confocal microscopy interference scanning, thereby enabling the scanning device to accurately locate the abnormal area and perform point-by-point scanning operations.

[0066] A confocal microscopic interference device is used to scan the corresponding local polarization anomaly area point by point based on the coordinate index, and the interference phase acquisition module of the confocal microscopic interference device is used to calculate the interference fringes on the surface of the multilayer optical film in real time based on the scanning results. In the process of obtaining the local film layer morphology data, the microscopic interference device can be linked with the precision displacement stage to move the displacement stage according to the coordinate sequence recorded in the index table. Every time a scanning coordinate is reached, the confocal optical path can be used to perform interference detection on the reflected signal at that point and within a small range, and the interference fringe intensity and phase distribution can be recorded by the photoelectric detection unit. The interference fringes can usually be written as ,in and is the reference light intensity and modulation amplitude, is the interference phase. If the digital phase unpacking algorithm is used in this step to reconstruct The continuous distribution of the microscopic height information of the film surface can be obtained. The surface height information obtained in this way will form a set of scanning data at each coordinate point, and will be summarized as local film morphology data after the scanning path completely covers the entire abnormal area. Through this point-by-point scanning and real-time phase solution method, each tiny position on the surface of the film can be detected with high resolution, thereby providing a sufficiently fine surface profile for the subsequent analysis of the stress state of the film. The local film morphology data is compared with the polarization state change results provided by the polarization analysis component, and the phase drift of the interference fringes in the local polarization abnormal area is differentially calculated. When extracting the lattice information of stress concentration or material defects, it is necessary to compare in two dimensions of time and space. Specifically, the polarization state change results output by the polarization analysis component and the morphology data of the corresponding position can be aligned according to the coordinates, and the timestamp or scan serial number can be used as the index to make a one-to-one correspondence between the sequence of changes in polarization parameters (such as ellipticity or polarization angle) with position and the sequence of changes in interference phase. Subsequently, differential operations can be used to analyze the phase changes of the interference fringes at different scanning moments or between different scanning lines point by point, and the pixel points whose changes exceed a predetermined threshold are judged as suspicious stress concentration or defect points, and their coordinates and phase drift magnitude are stored in the form of a dot matrix. In order to make the judgment result more accurate, the polarization state change amplitude can be combined to perform an associated threshold judgment. If the phase drift and polarization anomaly both meet a certain level of deviation, it will be marked as a high-risk point and the coordinates of the high-risk point in the local morphology data will be output. In this way, stress concentration or material defects can be quickly located in the polarization anomaly area, and specific dot matrix information can be provided for the next step of stress tensor calculation. A stress tensor inference operation is performed on the dot matrix information, and the interference phase change amplitude of each point in the dot matrix information is correlated and fitted with the degree of polarization state anomaly, and the spatial coordinates of the stress anomaly area are output. In the process of marking the stress distribution map under the corresponding spatial coordinates, a hybrid model combining mechanics and optics can be used for analysis. Since there is an intrinsic connection between the optical properties of the film material (such as refractive index) and mechanical stress, the interference phase change amplitude can be recorded as , the degree of polarization anomaly is recorded as , and establish The stress tensor estimation function of Indicates the first In order to obtain the overall stress distribution diagram, the interpolation algorithm can be used to convert the lattice information into Continuous processing is performed in space, and high stress value areas are pseudo-colored or contoured on the coordinate plane. When outputting the spatial coordinates of stress anomaly areas, connected areas with stress values ​​exceeding a defined threshold can be uniformly identified as stress anomaly areas, and the boundary and center coordinates of these areas can be recorded in the form of a data structure and annotated on the stress distribution map.

[0067] Furthermore, the local film layer morphology data is compared with the polarization state change result provided by the polarization analysis component, the phase drift of the interference fringes in the local polarization anomaly area is differentially calculated, and the lattice information of the stress concentration or material defect is extracted, including: matrix processing of the local film layer morphology data to obtain a morphology feature matrix in the local polarization anomaly area; according to the polarization state change result provided by the polarization analysis component, segmented screening processing is performed on the phase distribution of the interference fringes in the morphology feature matrix to obtain a corresponding phase comparison reference set; differential operation is performed on the phase comparison reference set to extract the phase drift gradient of each point in the adjacent area, and the point with a phase drift gradient greater than a preset threshold is recorded as a suspected stress point or material defect point; interpolation fitting processing is performed according to the coordinates of the suspected stress point or material defect point in the morphology feature matrix to obtain the corresponding lattice information of the stress concentration or material defect.

[0068] Specifically, in the process of matrix processing the local film layer morphology data to obtain the morphology feature matrix in the local polarization anomaly area, the interference fringe data output by the scanning device and the corresponding coordinate sequence can be uniformly indexed and mapped. The coordinate sequence is usually generated by a high-precision translation stage or a scanning galvanometer, and corresponds one-to-one to the phase value provided by the interference phase acquisition module. In order to make the morphology data mathematically convenient for calculation, the phase value of each sampling point can be first converted into height or thickness information, and the formula is used. ( ) is quantified, where For height data, is the coefficient obtained by calibration of the film material and the interference system, ( ) is the phase distribution at this position. The obtained height data is consistent with After coordinate matching, a two-dimensional matrix is ​​populated according to the scanning order, such that each element in the matrix corresponds to the topographic parameter of a specific point within the scanned area. To ensure uniform distribution of the interferometric data on the coordinate plane, the matrix can be further interpolated or resampled to fill in locations with missing or sparse signals, creating a continuously processable topographic feature matrix. Once the topographic feature matrix is ​​constructed, the entire region of local polarization anomaly is presented in matrix form. Each matrix element represents the film surface profile corresponding to the interferometric phase measurement. Matrix processing is used because most image processing algorithms or differential operations are highly feasible on gridded data, and coordinates, phase distribution, and subsequent polarization information can be encapsulated in a single data structure for easy correlation. This matrix allows for coordinate-level alignment of topographic information with previously extracted polarization data, laying a comprehensive data foundation for subsequent screening of interference fringe phase distributions and comparison with polarization state change results. After matrix processing is complete, a topographic feature matrix containing row and column indices, phase height values, and other statistical information is output, providing a usable data structure for the next step of segmented interference fringe screening. According to the polarization state change results provided by the polarization analysis component, the interference fringe phase distribution in the morphology feature matrix is ​​subjected to segmented screening processing. In the process of obtaining the corresponding phase comparison reference set, it is necessary to first align the ellipticity or phase difference information output by the polarization analysis component with the coordinate index in the morphology feature matrix. The polarization analysis component usually gives a mark value where there is obvious polarization anomaly in certain coordinate intervals, and the morphology feature matrix can locate the specific value of the interference phase at the same coordinate position. During the screening process, the phase values ​​of the morphology feature matrix can be segmented and traversed by rows or columns, and the parts overlapping or adjacent to the polarization anomaly mark can be divided into key comparison intervals. In order to perform more refined screening, a phase difference threshold can be set. and polarization anomaly threshold , and retain the features that satisfy or entries. These entries can be locally clustered according to their coordinate positions in the matrix, and adjacent elements can be merged into several subsets. The average phase or median phase is calculated in each subset to reduce sampling noise. The coordinates and phase distribution of these subsets can then be extracted to form a phase comparison reference set. Segmented screening processing often requires combining interpolation or smoothing algorithms to suppress phase value spikes to prevent measurement errors or local noise from interfering with the final judgment. When concentrated high phase differences and high polarization anomalies appear in these screened subsets, it means that there is a greater probability of film defects or stress accumulation in the area. After integrating this information into a phase comparison reference set, these high-risk intervals can be targeted in the next differential operation to obtain more accurate stress or defect positioning. In the process of performing differential operations on the phase comparison reference set, extracting the phase drift gradient of each point in the adjacent area, and recording points with phase drift gradients greater than a preset threshold as suspicious stress points or material defect points, it is necessary to establish neighborhood differential calculation rules. The phase drift gradient can usually be defined as , where φ represents the coordinate For each subset or grid position in the phase comparison reference set, partial derivatives can be calculated in the adjacent interval around it. If the grid step size of the adjacent interval is or ,but When the difference value is greater than the threshold When , it can be determined that the point has a significant phase drift gradient. The points are labeled as suspected stress or defects, and their coordinates, phase values, and corresponding polarization data are registered in a suspicious point set. The differential operation can be performed using single or multiple iterations. A single differential operation only calculates phase shifts within a fixed neighborhood, while multiple iterations repeatedly update the neighborhood search range, allowing gradient values ​​to be evaluated over a wider range. This allows for the identification of a wider range of stress concentration areas. For these marked points, their topography matrix can be searched to determine whether they coincide with phase or polarization anomalies, thereby eliminating misjudgments due to noise or measurement failure. When a point meets the dual criteria of phase drift gradient and polarization anomaly, it is considered a higher-risk suspected stress point or material defect, providing a coordinate basis for interpolation fitting. Interpolation fitting is performed based on the coordinates of these suspected stress points or material defect points in the topography matrix. When obtaining the corresponding point matrix information indicating stress concentration or material defects, all marked suspicious points are first locked in the topography matrix, and a certain range of coordinates around them are selected for interpolation calculations. Common interpolation methods include bicubic spline interpolation and polynomial fitting. If bicubic spline interpolation is used, a local control grid can be defined in the point set, the suspicious points can be regarded as control points, and a surface function can be constructed in each cell using a cubic polynomial to make the surface function smoothly transition between the suspicious point and its adjacent points. The interpolation function can be written as ,in and is the cubic spline basis function, are the coefficients to be determined, and n and m are the upper limits of the sum. After interpolation, a continuous stress or defect distribution surface is obtained, and the maximum value or the interval of sharp change is found on this surface. If sharp phase jumps and polarization value anomalies appear in certain local interpolation areas, they can be regarded as higher-level stress concentration areas or material defect lattices, and these locations and corresponding phase anomaly values ​​are output in matrix or mapping form. Lattice information often contains row and column coordinates, interpolated stress or phase gradient values, etc., which can be combined with mechanical or thermal models in subsequent steps to calculate local stress tensors or predict potential failure locations. Through this interpolation fitting, when the resolution is insufficient or there is a lot of noise during measurement, the spatial accuracy can be improved by relying on multi-point correlation, and ultimately the stress concentration or material defect area can be accurately located.

[0069] 103. Using a broadband light source, continuously irradiate the multilayer optical film in a preset test chamber according to the spatial coordinates and stress distribution diagram to obtain interference signals and polarization state data. Based on the interference signals and polarization state data, combined with infrared thermal imaging, the temperature changes in the stress abnormality area are collected to obtain the corresponding dynamic evolution characteristics;

[0070] In one embodiment of the present invention, the multilayer optical film is continuously irradiated in a preset test chamber by a broadband light source according to the spatial coordinates and the stress distribution map to obtain interference signals and polarization state data, and the temperature change of the stress anomaly area is collected in combination with infrared thermal imaging according to the interference signals and polarization state data to obtain the corresponding dynamic evolution characteristics, including: setting the irradiation range and incident power of the broadband light source according to the spatial coordinates and the stress distribution map, and adjusting the temperature control module in the preset test chamber to a segmented incremental mode; during the continuous irradiation of the broadband light source, the interference phase fluctuation data in the stress anomaly area and the interference fringe distribution corresponding to each temperature segment are monitored by an interference detection component to obtain interference detection results; the polarization state data of the stress anomaly area is collected in real time by a polarization detector, and a multi-dimensional linkage analysis is performed in combination with the interference detection results to statistically analyze the change trend of the polarization phase or ellipticity with the temperature gradient; the local temperature field of the stress anomaly area in the test chamber is continuously collected by an infrared thermal imaging device, and the local temperature field is correlated with the interference fringes and the change trend to obtain the dynamic evolution characteristics of the stress anomaly area under photothermal excitation.

[0071] Specifically, according to the spatial coordinates and stress distribution diagram, the irradiation range and incident power of the broadband light source are set, and the temperature control module in the preset test chamber is adjusted to the segmented incremental mode. It is necessary to first call the data in the spatial coordinates and stress distribution diagram to determine the location of the stress abnormality area of ​​the film layer. Figure 1 This data typically includes stress peaks, regional boundaries, and markers related to the film's material properties. By reading this data, areas requiring focused irradiation can be identified. Subsequently, a central frequency band within the broadband light source is selected that matches the film's absorption spectrum or critical operating band. The irradiation power and spot size are then appropriately set based on the light source's energy output characteristics to maintain a certain degree of beam uniformity near the stress anomaly. To simulate the increasing thermal load experienced in a real-world environment, multiple temperature steps can be defined within the temperature control module. Each step is maintained for a set period and then incremented to the next set temperature, creating a stepwise ramp-up mode. This mode allows the film to be continuously irradiated under varying thermal load levels, facilitating the observation of interference and polarization changes under the combined effects of temperature and stress. This step typically involves the light source control program working in conjunction with the temperature control system to schedule each temperature step and its duration, maintaining beam output stability during the ramp-up or hold-temperature phases. To further refine the irradiation strategy, short, high-power pulse tests can be added within certain temperature ranges to evaluate the transient stress response of the film. Through this flexible configuration, the optical changes in stress anomaly areas can be studied under a variety of thermal and mechanical combinations and linked with subsequent interferometric detection results, thus providing reliable data for evaluating the optical stability of the film layer.

[0072] During the continuous irradiation of the broadband light source, the interference detection component is used to monitor the fluctuation data of the interference phase in the stress anomaly area and the interference fringe distribution corresponding to each temperature segment. When the interference detection result is obtained, the interference detection component needs to be accurately aligned with the stress anomaly area, and ensure that the detection beam and the irradiation area of ​​the broadband light source have a certain degree of overlap. The detection component usually includes an interference objective lens, a phase acquisition unit and a high-precision data acquisition card. The recording frequency of the interference pattern can be consistent with the time step of temperature control, or a higher frequency can be used to capture instantaneous changes. The fringe period and phase appearing in the interference pattern will respond to changes in the local thickness and refractive index of the film layer. If methods such as phase unpacking or wavelet decomposition are used, the microscopic fluctuation information of the film layer morphology or thickness can be extracted from the original interference fringes, and a dynamic sequence of the interference phase over time or temperature segments can be formed. This dynamic sequence can be expressed as ,in It is A temperature ladder, is the sampling time within the temperature range, is the interference phase. If the phase shows a sudden increase or dramatic fluctuation in these sequences, it can be inferred that the film is undergoing deformation or delamination under the current thermal load. A series of interference fringe images are obtained for each temperature range. Image processing algorithms (such as gradient direction tracking or least squares fitting) are used to locate fringe drift, outputting both spatially and temporally resolved information. This information is packaged and aggregated to define the interferometry results and cross-referenced with subsequently acquired polarization and temperature field data to comprehensively determine the optical and thermal coupling behavior of the stress anomaly region under different thermal loads. Polarization state data of the stress anomaly region is collected in real time using a polarization detector and combined with the interferometry results for multi-dimensional linkage analysis. To statistically analyze the trend of polarization phase or ellipticity with temperature gradients, it is necessary to record both polarization and interference phase information in the same sequence or with a synchronized trigger signal. The polarization detector can be an ellipsometer or a fast polarization analysis module to measure the reflected or transmitted light beam within the irradiated area. This measurement outputs data such as ellipticity and polarization angle that vary with time and temperature range, and these data are indexed and associated with the interference phase sequence. To achieve linkage at the data processing level, a three-dimensional mapping can be constructed: ,in represents the temperature ladder, represents the interference phase value, Represents the polarization state or ellipticity. In multi-dimensional linkage analysis, it is necessary to and The correlation between them is quantitatively calculated to observe whether the polarization phase presents a linear or nonlinear coupling relationship with the interference phase change as the temperature gradient rises. If strong coupling or a significant turning point occurs in the high temperature section, it means that the refractive index and stress distribution of the film layer have undergone significant changes under the action of thermal load. In order to reduce noise interference, Kalman filtering or adaptive smoothing methods can be used to denoise the time series, and then differential or correlation coefficient operations are performed on the key temperature points to output the trend of polarization phase or ellipticity changes with temperature. This trend can reflect how local stress causes the shift of polarization state or phase during the heating process, and provide a strong basis for in-depth analysis of the photothermal coupling mechanism. An infrared thermal imaging device is used to continuously collect the local temperature field of the stress abnormality area in the test chamber, and the local temperature field is correlated with the interference fringes and the change trend to obtain the dynamic evolution characteristics of the stress abnormality area under photothermal excitation. It is necessary to ensure that the infrared thermal imaging device has high spatial and temperature resolution to observe the temperature evolution of the stress abnormality area in real time. After scanning the surface of the film layer, the thermal imaging device will output a series of thermal images, and each frame of the image contains The temperature value under the coordinates can be aligned with the phase distribution in the interferometric detection results and the measurement sequence of the polarization detector in terms of coordinates and time. Then, a multidimensional mapping function is constructed based on some interpolation or fitting strategy, such as . This function can describe the coupling relationship between phase, polarization and temperature, and describe the evolution trajectory of the film layer in the time dimension. If the phase and polarization state change abruptly within a certain temperature range, and the temperature in the thermal image also rises locally or is unevenly distributed, it can be determined that there is a significant photothermal stress concentration in the area. Based on this coupling relationship, the behavior of the film layer can be monitored throughout the heating and constant temperature stages, the key time points of film deformation and polarization anomalies can be extracted, and data visualization or statistical analysis can be performed in a three-dimensional or four-dimensional (including space, time, phase, temperature) perspective. Ultimately, the observed local temperature peaks, interference phase transitions, and polarization state mutations can be integrated into the dynamic evolution characteristics of the stress anomaly area, and the output is used to evaluate the safety margin and service life of the multilayer optical film under photothermal excitation conditions.

[0073] Furthermore, the polarization state data of the stress anomaly zone is collected in real time using a polarization detector, and a multi-dimensional linkage analysis is performed in combination with the interference detection results to statistically analyze the changing trend of the polarization phase or ellipticity with the temperature gradient, including: performing segmented extraction processing on the polarization state data collected by the polarization detector in each temperature segment to obtain a polarization sequence corresponding to each temperature segment; performing a matching operation on the interference fringe distribution in the interference detection result according to the polarization sequence to obtain a phase-polarization mapping matrix; performing differential operation or wavelet analysis on the phase-polarization mapping matrix, correlating and fitting the phase change and ellipticity change in each temperature segment, and outputting a multi-dimensional polarization phase or ellipticity characteristic vector; fitting a polarization phase or ellipticity change curve according to the polarization phase or ellipticity characteristic vector according to each temperature gradient, and further subdividing the sudden increase, inflection point or abnormal interval in the change curve to obtain the changing trend of the polarization phase or ellipticity of the stress anomaly zone with the temperature gradient in a photothermal coupling environment.

[0074] Specifically, the polarization state data collected by the polarization detector at each temperature range is segmented and processed to obtain the corresponding polarization sequence. This requires first partitioning the large-scale data collected by the polarization detector into blocks based on the time axis or temperature step index of the temperature control system. For each temperature range, key parameters such as ellipticity, polarization angle, or light intensity ratio, which are continuously recorded within that temperature range, are extracted from the polarization detector output. These parameters are aligned using a timestamp or synchronization trigger signal and packaged into a complete data block, called a polarization sequence. This operation facilitates precise understanding of polarization state variations under varying thermal loads during subsequent analysis. To improve the sequence's robustness in noisy environments, mean smoothing or median filtering can be performed on the sampling points to eliminate occasional pulse interference. At the end of the extraction, each temperature range corresponds to a corresponding polarization sequence, which contains both temporal evolution information and implicit responses to local stresses in the film. To further improve accuracy, baseline correction can be used to normalize the polarization sequence for each temperature range to eliminate errors caused by instrument drift and ambient light interference. The extracted polarization sequence will be used as the subsequent interferometric detection image or phase unwrapping curve, and can also be stored in the form of a multi-frame image sequence. ,in Indicates the film layer in coordinates and time The phase value under and Perform joint retrieval on the time dimension and establish it by interpolation or interpolation point At this time, a two-dimensional or three-dimensional array can be constructed for each temperature segment or each sampling moment to store the coupling between the polarization metric and the interference phase. The mapping matrix can be expressed as , where each matrix unit contains the polarization value and phase value obtained from the same coordinate and time. If you want to enhance the spatial resolution, you need to and Bilinear or spline interpolation methods are used in the coordinate matching to be compatible with denser or sparser sampling situations. The phase-polarization mapping matrix obtained after the matching is completed can reflect the linkage response of the local area to the optical and thermal load in the same temperature range, laying a data foundation for subsequent differential operations or wavelet analysis. By performing differential operations or wavelet analysis on the phase-polarization mapping matrix, the phase change in each temperature range is correlated and fitted with the ellipticity change. When outputting a multi-dimensional polarization phase or ellipticity eigenvector, it is necessary to select time or temperature as a slice reference in the mapping matrix. If a time series is selected, the same coordinate position at different sampling times can be obtained. and Perform the difference and then calculate the and The difference operation can be performed using a first-order or second-order scheme. The first-order difference focuses on capturing the mutation point, while the second-order difference can emphasize the acceleration or deceleration trend. If wavelet transform is used in the analysis, such as WT With WT , can more flexibly distinguish short-term or long-term fluctuations and simultaneously evaluate the coupling strength between the two in the frequency domain and time domain. By correlating these analysis results, the coupling coefficient between phase and polarization in the mapping matrix can be obtained. If the coupling coefficient is defined as , a multi-dimensional polarization phase or ellipticity characteristic weight can be output in the coordinate or time dimension, marking the important change trends in different temperature ranges. If a large jump or high-frequency component is found in the characteristic vector, it means that the local stress state and the photothermal coupling may cause significant changes in the refractive index or film morphology, so this information can be used to further locate potential failure risks. By fitting the polarization phase or ellipticity change curve according to the temperature gradient according to the polarization phase or ellipticity characteristic weight, and further subdividing the sudden increase, inflection point or abnormal interval in the change curve, the change trend of the polarization phase or ellipticity of the stress abnormal area with the temperature gradient in the photothermal coupling environment is obtained. It is necessary to compare the characteristic vector obtained in the previous step with the temperature sequence recorded by the temperature control system. Mapping can be done. Defined as the temperature The corresponding eigenvector mean or peak value is then obtained by polynomial fitting or spline fitting. If there are mutations, inflection points or non-monotonic segments in the fitting curve, the local search algorithm can be used to segment the curve and identify significant refractive index changes or signs of microcracks through asymptotic convergence or slope thresholds. For the connection between different temperature segments, the segmented fitting formula can be used This technique can be used to capture response differences under different heating regimes. Detecting a sharp jump in the high-temperature range indicates intense thermomechanical coupling in the stress-abnormal region or the presence of nonlinear optical effects in the film material. The resulting output of polarization phase or ellipticity versus temperature gradient can be presented in a table or curve, with the inflection point temperature and polarization phase abrupt increase marked on the coordinate axes. This provides an accurate basis for evaluating the thermal stability and stress tolerance of the film.

[0075] 104. Based on the dynamic evolution characteristics, a simulation test of the multilayer optical film is carried out through a system environment with a preset optical axis arrangement and beam energy distribution to obtain in-situ polarization state and interference pattern data. The optical performance of the film layer is analyzed based on the in-situ polarization state and interference pattern data to obtain a comprehensive evaluation result under the system environment.

[0076] In one embodiment of the present invention, according to the dynamic evolution characteristics, a simulation test is performed on the multilayer optical film through a system environment with a preset optical axis arrangement and beam energy distribution to obtain in-situ polarization state and interference pattern data, and the optical performance of the film layer is analyzed according to the in-situ polarization state and interference pattern data to obtain a comprehensive evaluation result under the system environment, including: according to the dynamic evolution characteristics, a system environment including a preset optical axis arrangement and beam energy distribution is set, and the multilayer optical film is placed in a specified beam path of the system environment; in the system environment, a polarization analyzer and an interference monitoring component are used for synchronous acquisition to record the in-situ polarization state and interference pattern data of the multilayer optical film under the preset optical axis arrangement and beam energy distribution, and perform phase unpacking processing to form a spatial interference phase sequence; based on the spatial interference phase sequence, the stress diffusion and film thickness change of the multilayer optical film in the system environment are compared frame by frame through differential operation or frequency domain filtering algorithm to obtain the evolution of the optical performance of the film in the system environment; a multi-dimensional correlation analysis is performed on the evolution and the dynamic evolution characteristics to obtain a comprehensive data result, and the comprehensive data result is compared with the beam energy and optical axis arrangement index of the system environment to determine whether the multilayer optical film has polarization mismatch or film loss in the system environment to obtain a judgment result; the reliability and imaging quality of the film in the system environment are determined according to the judgment result to obtain a comprehensive evaluation result in the generated system environment.

[0077] Specifically, based on the dynamic evolution characteristics, a system environment with a preset optical axis arrangement and beam energy distribution is set up, and a multilayer optical film is placed in a specified beam path within this system environment. During this process, the temperature-stress-polarization coupling relationship recorded in the dynamic evolution characteristics is first analyzed to determine the beam energy level and optical axis orientation that primarily affect the film within this system environment. By synchronously configuring the optical system's mechanical adjustment devices and beam shapers, the incident beam is spatially aligned with the dynamic evolution characteristics, and strict angular alignment of the optical axis is achieved, ensuring that the surface and interior of the film are subjected to the beam under physical conditions corresponding to the dynamic evolution characteristics. To ensure higher confidence in the observed data, a parallel collimator and a polarizer adjustment mount are combined to arrange the polarization components of the beam in the desired proportions and angles, subjecting the film to an optical load and temperature field distribution similar to the dynamic evolution characteristics within the specified beam path. The repeatability of the irradiation range and energy distribution is ensured by stabilizing the light source power and scanning head trajectory.

[0078] In the system environment, a polarization analyzer and an interference monitoring component are used for synchronous acquisition to record the in-situ polarization state and interference pattern data of the multilayer optical film under a preset optical axis arrangement and beam energy distribution, and perform phase unpacking processing to form a spatial interference phase sequence; this synchronous acquisition needs to be consistent in time trigger signal and position coordinates, and the polarization analyzer and the interference monitoring component are ensured to receive information from the same optical path at the same time through homologous or interlocked trigger circuits. The polarization analyzer can use high-bandwidth detectors and electronic modulation elements to quickly capture key parameters such as polarization angle, ellipticity or phase difference in multiple bands, and the interference monitoring component records the intensity distribution and phase trend of the interference fringes through multiple optical channels, and uses a phase unpacking algorithm to obtain the information. unwrap ) changes the original phase from This algorithm can reduce the discontinuity caused by fringe jumps, so that each pixel has an accurate phase value. The unpacked phase information is then converted into a continuous domain according to the film layer on the two-dimensional plane. The coordinates on the image are reorganized to form a spatial interference phase sequence to represent the distribution of local thickness or refractive index changes of the film layer in the system environment, laying a data foundation for the next step of analyzing stress diffusion and film changes. Based on the spatial interference phase sequence, the stress diffusion and film thickness changes generated by the film layer of the multilayer optical film in the system environment are compared frame by frame through differential operation or frequency domain filtering algorithm to obtain the evolution of the optical performance of the film layer in the system environment; at this stage, it is necessary to compare the unpacked phase sequence frame by frame, and identify the phase change of the film layer at different sampling times through differential or filtering methods. If differential operation is used, you can set , subtract the phases of any adjacent frames, if Exceeding a preset threshold indicates significant thickness or refractive index fluctuations at that pixel. Using a frequency-domain filtering algorithm, the time series can be mapped to the frequency domain. Discrete Fourier Transform (DFT) can be used to detect energy peaks in the film phase at preset frequencies, thereby identifying periodic or random stress diffusion patterns. Through these computational methods, the temporal trajectory of each coordinate point can be refined into a characteristic curve, which can then be aggregated into a dynamic description of the film's optical properties, including key indicators such as the local fluctuation range and the overall rate of change. This evolution can be displayed as a continuous animation at the image level or converted into a numerical matrix to provide input for subsequent multidimensional correlation analysis. A multidimensional correlation analysis is performed on the evolution and the dynamic evolution characteristics to generate a comprehensive data result. This comprehensive data result is then compared with the beam energy and optical axis alignment indicators of the system environment to determine whether the multilayer optical film exhibits polarization mismatch or film loss in the system environment. To perform this correlation analysis, the phase time series and spatial distribution of the evolution is mapped with the temperature, stress parameters, and polarization information of the dynamic evolution characteristics to construct a multidimensional data fusion model. The model can use a set of mapping functions ,in represents the spatial phase, represents the polarization state, Indicates temperature or time, This is the result of the combined data. By jointly interpolating or fusion-matrix-ing these data in both spatial and temporal dimensions, a high-dimensional matrix is ​​formed that displays the degree of coupling, correlation coefficient, or phase mismatch. If a significant polarization mismatch peak or a large-scale sign of film optical loss is observed in this high-dimensional matrix, it is considered a failure risk in the judgment conclusion. When the combined data results are compared with the theoretical values ​​of beam energy and optical axis alignment, if the film deviates from the design specifications or produces excessive energy leakage, a mismatch warning or loss conclusion can be output, thereby determining the usability of the film in a real-world system environment.

[0079] Based on the judgment results, the reliability and imaging quality of the film layer in the system environment are determined to obtain a comprehensive evaluation result in the generated system environment; in this step, the polarization mismatch degree of the film layer, the optical loss value and the imaging clarity data extracted from the judgment results can be comprehensively weighed, and matched with the index system that has requirements for imaging quality or beam quality to obtain a comprehensive score of the film layer under the specified optical axis and energy conditions. If the score is higher than a certain threshold, it means that the film layer has the stability and imaging accuracy to work normally in this system environment. If the score is too low, it implies that the film layer has large structural defects in stress or polarization. In order to present a systematic conclusion of the evaluation result, it can be visualized as a radar chart or a segmented bar chart, and local weak areas or energy overload areas can be marked on the graph to provide a quantitative basis for improving the film design or adjusting the system environment.

[0080] In this embodiment, a multi-band programmable laser source is used for multi-angle incident illumination to obtain the polarization phase difference signal between the transmitted and reflected light and record the changes in the polarization ellipticity parameter. Subsequently, confocal microscopy and polarization analysis are combined to determine the spatial coordinates and stress distribution map of the stress anomaly area. Continuous illumination is then performed using a broadband light source in a photothermal coupling environment, and the interference signal, polarization state, and temperature changes are monitored to obtain dynamic evolution characteristics. Finally, a simulation test is performed on the multilayer optical film in a system environment with a preset optical axis arrangement and beam energy distribution, obtaining in-situ polarization state and interference pattern data and evaluating the optical performance of the film layer. This invention can locate potential defects at a high resolution and accurately evaluate the reliability and imaging quality of the film layer under complex application conditions.

[0081] The above describes the detection method of the multilayer optical film in the embodiment of the present invention. The following describes the detection device of the multilayer optical film in the embodiment of the present invention. Figure 2 In one embodiment of the present invention, a device for detecting a multilayer optical film includes:

[0082] The laser incident module 201 is used to irradiate the multilayer optical film sample at multiple angles through a multi-band programmable laser source to obtain a polarization phase difference signal between the transmitted light and the reflected light, and to record the change in the polarization ellipticity parameter of the multilayer optical film sample based on the polarization phase difference signal to obtain an optical polarization parameter mapping diagram;

[0083] Interference stress module 202 is used to perform a topographic scan of the multilayer optical film using a confocal microscopy interferometer according to the optical polarization parameter map to obtain film interface profile data, and perform local stress analysis based on the film interface profile data in combination with a polarization analysis component to obtain the spatial coordinates and stress distribution map of the stress anomaly area;

[0084] The photothermal testing module 203 is configured to continuously irradiate the multilayer optical film in a preset test chamber using a broadband light source according to the spatial coordinates and stress distribution diagram, obtain interference signals and polarization state data, and acquire temperature changes in the stress abnormality area based on the interference signals and polarization state data in combination with infrared thermal imaging to obtain corresponding dynamic evolution characteristics;

[0085] The system simulation module 204 is used to simulate and test the multilayer optical film according to the dynamic evolution characteristics through a system environment with a preset optical axis arrangement and beam energy distribution, obtain in-situ polarization state and interference pattern data, analyze the optical performance of the film layer according to the in-situ polarization state and interference pattern data, and obtain a comprehensive evaluation result under the system environment.

[0086] In an embodiment of the present invention, the detection device for the multilayer optical film runs the above-mentioned detection method for the multilayer optical film. The detection device for the multilayer optical film obtains the polarization phase difference signal of the transmitted light and the reflected light and records the change of the polarization ellipticity parameter through multi-band programmable laser source for multi-angle incident irradiation; then combines confocal microscopy interference and polarization analysis to determine the spatial coordinates and stress distribution map of the stress anomaly area; then continuously irradiates with a broadband light source in a photothermal coupling environment and monitors the interference signal, polarization state and temperature change to obtain dynamic evolution characteristics; finally, simulates the multilayer optical film in a system environment with a preset optical axis arrangement and beam energy distribution, obtains in-situ polarization state and interference pattern data, and evaluates the optical performance of the film layer. The present invention can locate potential defects at a higher resolution and accurately evaluate the reliability and imaging quality of the film layer under complex application conditions.

[0087] above Figure 2 The detection device for the multilayer optical film in the embodiment of the present invention is described in detail from the perspective of modular functional entities. The detection equipment for the multilayer optical film in the embodiment of the present invention is described in detail from the perspective of hardware processing.

[0088] Figure 3FIG3 is a schematic diagram of the structure of a multilayer optical film inspection device provided by an embodiment of the present invention. The multilayer optical film inspection device 300 may vary significantly depending on configuration or performance. The device may include one or more central processing units (CPUs) 310 (e.g., one or more processors), memory 320, and one or more storage media 330 (e.g., one or more mass storage devices) storing application programs 333 or data 332. The memory 320 and storage media 330 may be either transient or persistent storage. The program stored in the storage medium 330 may include one or more modules (not shown), each of which may include a series of instructions for operating the multilayer optical film inspection device 300. Furthermore, the processor 310 may be configured to communicate with the storage medium 330, allowing the multilayer optical film inspection device 300 to execute the series of instructions stored in the storage medium 330 to implement the steps of the multilayer optical film inspection method described above.

[0089] The multilayer optical film inspection device 300 may further include one or more power supplies 340, one or more wired or wireless network interfaces 350, one or more input and output interfaces 360, and / or one or more operating systems 331, such as Windows Server, Mac OS X, Unix, Linux, FreeBSD, etc. It will be understood by those skilled in the art that Figure 3 The structure of the multilayer optical film detection device shown does not constitute a limitation on the multilayer optical film detection device provided by the present invention, and may include more or fewer components than shown in the figure, or a combination of certain components, or a different arrangement of components.

[0090] The present invention also provides a computer-readable storage medium, which can be a non-volatile computer-readable storage medium or a volatile computer-readable storage medium. The computer-readable storage medium stores instructions, and when the instructions are run on a computer, the computer executes the steps of the multilayer optical film detection method.

[0091] Those skilled in the art will clearly understand that, for the convenience and brevity of description, the specific working processes of the above-described systems, devices, and units can refer to the corresponding processes in the aforementioned method embodiments and will not be repeated here.

[0092] If the integrated unit is implemented as a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present invention, or the portion that contributes to the prior art, or all or part of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes several instructions for causing a computer device (which can be a personal computer, server, or network device, etc.) to execute all or part of the steps of the method described in each embodiment of the present invention. The aforementioned storage medium includes various media that can store program code, such as a USB flash drive, a mobile hard drive, a read-only memory (ROM), a random access memory (RAM), a magnetic disk, or an optical disk.

[0093] As described above, the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit the same. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that the technical solutions described in the above embodiments can still be modified, or some of the technical features thereof can be replaced by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for detecting a multilayer optical film, characterized in that: The detection method of the multilayer optical film includes: A multi-band programmable laser source is used to irradiate the multilayer optical film sample at multiple angles to obtain a polarization phase difference signal between the transmitted light and the reflected light. The polarization ellipticity parameter change of the multilayer optical film sample is recorded according to the polarization phase difference signal to obtain an optical polarization parameter mapping diagram; A confocal microscopy interferometry device is used to perform a topographic scan of the multilayer optical film according to the optical polarization parameter mapping diagram to obtain film interface profile data, and a local stress analysis is performed based on the film interface profile data in combination with a polarization analysis component to obtain the spatial coordinates and stress distribution diagram of the stress anomaly area; The multilayer optical film is continuously irradiated in a preset test chamber using a broadband light source according to the spatial coordinates and the stress distribution diagram to obtain interference signals and polarization state data. The temperature change of the stress abnormality area is collected based on the interference signals and polarization state data in combination with infrared thermal imaging to obtain the corresponding dynamic evolution characteristics; According to the dynamic evolution characteristics, a simulation test of the multilayer optical film is carried out in a system environment with a preset optical axis arrangement and beam energy distribution to obtain in-situ polarization state and interference pattern data. The optical performance of the film layer is analyzed based on the in-situ polarization state and interference pattern data to obtain a comprehensive evaluation result under the system environment.

2. The method for detecting a multilayer optical film according to claim 1, wherein: The multi-band programmable laser source is used to irradiate the multi-layer optical film sample at multiple angles to obtain a polarization phase difference signal between the transmitted light and the reflected light, and the polarization ellipticity parameter change of the multi-layer optical film sample is recorded according to the polarization phase difference signal to obtain an optical polarization parameter mapping diagram, which includes: A plurality of predetermined wavelength ranges are set in a multi-band programmable laser source, and each wavelength range is sequentially emitted to a multilayer optical film sample according to a sequence of different incident angles to obtain the transmitted light and reflected light signals under various incident conditions; Performing phase splitting operation on the transmitted light and reflected light signals, separating polarization phase difference signals corresponding to different wavelength-angle combinations using a phase unpacking algorithm, and forming a polarization phase difference matrix; According to the polarization phase difference matrix, the corresponding ellipticity and polarization angle data are calculated respectively, and the ellipticity and polarization angle data are interpolated, and the interpolation results are integrated into an optical polarization parameter mapping diagram.

3. The method for detecting a multilayer optical film according to claim 1, wherein: The confocal microscopy interferometry device is used to perform a topographic scan of the multilayer optical film according to the optical polarization parameter mapping diagram to obtain film layer interface profile data, and local stress analysis is performed based on the film layer interface profile data in combination with a polarization analysis component to obtain the spatial coordinates and stress distribution diagram of the stress abnormality area, including: Performing a partition query on the optical polarization parameter map, and determining a local polarization abnormal region and a corresponding coordinate index in the optical polarization parameter map according to the partition query result; Using a confocal microscopy interferometry device to scan the corresponding local polarization anomaly area point by point based on the coordinate index, and using an interference phase acquisition module of the confocal microscopy interferometry device to calculate the interference fringes on the surface of the multilayer optical film in real time based on the scanning results to obtain local film layer morphology data; Comparing the local film layer topography data with the polarization state change results provided by the polarization analysis component, performing differential calculation on the phase shift of the interference fringes in the local polarization anomaly region, and extracting lattice information where stress concentration or material defects exist; A stress tensor inference operation is performed on the lattice information, the interference phase variation amplitude of each point in the lattice information is correlated and fitted with the degree of polarization state anomaly, the spatial coordinates of the stress anomaly area are output, and a stress distribution map is marked under the corresponding spatial coordinates.

4. The method for detecting a multilayer optical film according to claim 3, wherein: Comparing the local film layer topography data with the polarization state change results provided by the polarization analysis component, performing differential calculation on the phase shift of the interference fringes in the local polarization anomaly region, and extracting lattice information of stress concentration or material defects includes: Matrixing the local film layer morphology data to obtain a morphology feature matrix within the local polarization anomaly region; According to the polarization state change result provided by the polarization analysis component, a segmented screening process is performed on the interference fringe phase distribution in the morphology feature matrix to obtain a corresponding phase comparison reference set; Performing a differential operation on the phase comparison reference set to extract the phase drift gradient of each point in the adjacent area, and recording points with a phase drift gradient greater than a preset threshold as suspicious stress points or material defect points; Interpolation fitting processing is performed according to the coordinates of the suspicious stress points or material defect points in the morphology feature matrix to obtain corresponding lattice information of the stress concentration or material defect.

5. The method for detecting a multilayer optical film according to claim 1, wherein: The broadband light source is used to continuously irradiate the multilayer optical film in a preset test chamber according to the spatial coordinates and the stress distribution diagram to obtain interference signals and polarization state data. The interference signals and polarization state data are combined with infrared thermal imaging to collect temperature changes in the stress abnormality area to obtain corresponding dynamic evolution characteristics, including: According to the spatial coordinates and the stress distribution diagram, the irradiation range and incident power of the broadband light source are set, and the temperature control module in the preset test chamber is adjusted to a segmented incremental mode; During the continuous irradiation of the broadband light source, the interference detection component monitors the fluctuation data of the interference phase in the stress abnormality area and the interference fringe distribution corresponding to each temperature section to obtain the interference detection result; Using a polarization detector to collect polarization state data of the stress anomaly area in real time, and combining it with the interference detection results to perform multi-dimensional linkage analysis, and statistically analyzing the change trend of polarization phase or ellipticity with temperature gradient; An infrared thermal imaging device is used to continuously collect the local temperature field of the stress anomaly area in the test chamber. The local temperature field is correlated with the interference fringes and the change trend to obtain the dynamic evolution characteristics of the stress anomaly area under photothermal excitation.

6. The method for detecting a multilayer optical film according to claim 5, wherein: The polarization state data of the stress anomaly area is collected in real time by using a polarization detector, and multi-dimensional linkage analysis is performed in combination with the interference detection results to statistically analyze the change trend of the polarization phase or ellipticity with the temperature gradient, including: Performing segmented extraction processing on the polarization state data collected by the polarization detector in each temperature segment to obtain a polarization sequence corresponding to each temperature segment; Performing a matching operation on the interference fringe distribution in the interference detection result according to the polarization sequence to obtain a phase-polarization mapping matrix; Performing differential operation or wavelet analysis on the phase-polarization mapping matrix, correlating and fitting the phase change and ellipticity change in each temperature range, and outputting a multi-dimensional polarization phase or ellipticity eigenvector; According to the polarization phase or ellipticity characteristic vector, a change curve of the polarization phase or ellipticity is fitted according to the temperature gradient, and the sudden increase, inflection point or abnormal interval in the change curve is further subdivided to obtain the change trend of the polarization phase or ellipticity of the stress anomaly area with the temperature gradient in the photothermal coupling environment.

7. The method for detecting a multilayer optical film according to claim 1, wherein: According to the dynamic evolution characteristics, a multilayer optical film is simulated and tested in a system environment with a preset optical axis arrangement and beam energy distribution to obtain in-situ polarization state and interference pattern data. The optical performance of the film layer is analyzed based on the in-situ polarization state and interference pattern data, and the comprehensive evaluation results under the system environment include: According to the dynamic evolution characteristics, a system environment including a preset optical axis arrangement and beam energy distribution is set, and a multilayer optical film is placed in a specified beam path of the system environment; In the system environment, a polarization analyzer and an interferometer monitoring component are used to synchronously collect and record the in-situ polarization state and interference pattern data of the multilayer optical film under a preset optical axis arrangement and beam energy distribution, and phase unpacking processing is performed to form a spatial interference phase sequence; Based on the spatial interference phase sequence, a differential operation or a frequency domain filtering algorithm is used to compare the stress diffusion and film thickness change generated by the film layer of the multilayer optical film in the system environment frame by frame to obtain the evolution of the optical performance of the film layer in the system environment; Performing a multi-dimensional correlation analysis on the evolution and the dynamic evolution characteristics to obtain a comprehensive data result, and comparing the comprehensive data result with the beam energy and optical axis arrangement index of the system environment to determine whether the multilayer optical film has polarization mismatch or film layer loss in the system environment, and obtaining a judgment result; The reliability and imaging quality of the film layer in the system environment are determined according to the judgment result, and a comprehensive evaluation result in the system environment is obtained.

8. A device for detecting a multilayer optical film, characterized in that: The detection device of the multilayer optical film includes: A laser incident module is used to irradiate the multilayer optical film sample at multiple angles through a multi-band programmable laser source to obtain a polarization phase difference signal between the transmitted light and the reflected light, and to record the change in the polarization ellipticity parameter of the multilayer optical film sample based on the polarization phase difference signal to obtain an optical polarization parameter mapping diagram; An interference stress module is used to perform a topographic scan of a multilayer optical film using a confocal microscopy interferometer according to the optical polarization parameter map to obtain film interface profile data, and to perform local stress analysis based on the film interface profile data in combination with a polarization analysis component to obtain the spatial coordinates and stress distribution map of the stress anomaly area; a photothermal testing module for continuously irradiating the multilayer optical film in a preset test chamber using a broadband light source according to the spatial coordinates and stress distribution diagram, obtaining interference signals and polarization state data, and acquiring temperature changes in the stress anomaly area based on the interference signals and polarization state data in combination with infrared thermal imaging to obtain corresponding dynamic evolution characteristics; The system simulation module is used to simulate and test the multilayer optical film according to the dynamic evolution characteristics through a system environment with a preset optical axis arrangement and beam energy distribution, obtain in-situ polarization state and interference pattern data, analyze the optical performance of the film layer according to the in-situ polarization state and interference pattern data, and obtain a comprehensive evaluation result under the system environment.

9. A multi-layer optical film detection device, characterized in that: The multi-layer optical film detection device includes: a memory and at least one processor, wherein the memory stores instructions; The at least one processor calls the instructions in the memory to enable the multilayer optical film detection device to perform the steps of the multilayer optical film detection method according to any one of claims 1 to 7.

10. A computer-readable storage medium having instructions stored thereon, characterized in that: When the instructions are executed by a processor, the steps of the method for detecting a multilayer optical film according to any one of claims 1 to 7 are implemented.

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