Photoresist drawing and uniform coating device

By designing a photoresist coating device that rotates synchronously with the suction cup and the rotary joint, the problem of synchronous rotation between the substrate and the nozzle is solved, efficient coating and full utilization of the photoresist is achieved, and production costs are reduced.

CN120479656AInactive Publication Date: 2025-08-15SUZHOU ZHONGTENG SEMICONDUCTOR TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202510578361.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-05-07
Publication Date
2025-08-15
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

The existing photoresist coating device cannot realize the rotation of the substrate and the nozzle in a synchronous direction, increase the coating stroke, reduce the coating efficiency, and cannot fully absorb the photoresist, resulting in low utilization and increasing production costs.

Method used

A photoresist extraction and uniform coating device is designed, and the rotation speed is rotated oppositely through the suction cup and the rotary joint. Combined with the nozzle mechanism and the photoresist absorption mechanism, the synchronous rotation of the substrate and the nozzle is realized, and the inner wall of the photoresist drum is cleaned with an inert gas to ensure the full absorption and uniform coating of the photoresist.

Benefits of technology

The stroke distance during the spraying process is shortened, the spraying range of photoresist is expanded, the coating efficiency is improved, the utilization rate of photoresist is improved, and the production cost is reduced.

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Abstract

The photoresist drawing and uniform coating device comprises a support, a photoresist outlet pipe is further arranged on one side of the support, and the photoresist outlet pipe is further provided with a spray head mechanism which synchronously and oppositely rotates with a suction cup; the spray head mechanism comprises a rotating joint, an upper belt wheel structure synchronously rotating with the transmission shaft is further arranged on the outer surface of the rotating joint, the transmission shaft is rotationally arranged in the mounting frame, the lower side of the transmission shaft and a connecting shaft synchronously rotate through a lower belt wheel structure, and the connecting shaft is rotationally arranged on one side in the mounting table; the connecting shaft and the driving shaft rotate oppositely through an opposite transmission structure, the driving shaft is rotationally arranged in the middle of the mounting table, and one end of the driving shaft is connected with the suction cup; according to the photoresist spraying device, the stroke distance in the spraying process is shortened, the spraying efficiency of the photoresist is improved, the utilization rate of the photoresist is improved, and the overall production cost is reduced.
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Description

Technical Field

[0001] The invention belongs to the technical field of semiconductors, and in particular relates to a photoresist extraction and uniform coating device. Background Art

[0002] Examples of semiconductor device manufacturing processes include thin film formation processes, ion implantation processes, photolithography processes, testing processes, and assembly processes. In the photolithography process, a photoresist coating apparatus applies photoresist to pattern a thin film formed on a substrate (such as a wafer). The photoresist film thinly applied on the wafer can be formed into a photoresist pattern through an exposure process and a development process.

[0003] For example, a photoresist coating device disclosed in the invention with the announcement number CN118768168A includes an operating table, a fixing mechanism, a rotating assembly, and a positioning mechanism. The substrate is placed on the top of the suction cup, and then the first driving assembly is driven to drive three groups of clamping rods to move close to the axis of the suction cup. The three groups of clamping rods move close to the axis of the suction cup to contact the periphery of the substrate and push the substrate to move. When the three groups of clamping rods are in contact with the periphery of the substrate, the substrate can be coaxial with the suction cup. The negative pressure assembly is then driven to fix the substrate on the suction cup. The first driving assembly is then driven to drive the three groups of clamping rods to move away from the axis of the suction cup and separate from the substrate. Finally, the rotating assembly is driven to drive the suction cup to rotate. The rotation of the suction cup can drive the substrate to rotate, which is convenient for positioning the substrate. Make the substrate and the suction cup coaxial to ensure that the centrifugal force exerted on the photoresist during the rotation process is uniform, improve the effect of the device in coating the photoresist, and avoid affecting the subsequent photolithography process. The above scheme can only perform a single rotation of the substrate, and it cannot make the substrate and the nozzle rotate synchronously in opposite directions, which increases the coating stroke. At the same time, it is impossible to coat the photoresist in a large atmosphere, reducing the coating efficiency. At the same time, it is impossible to fully absorb the colloid in the photoresist barrel, which may easily cause low photoresist utilization and increase production costs. For this reason, we propose a photoresist extraction and uniform coating device. Summary of the Invention

[0004] The purpose of the present invention is to provide a photoresist extraction and uniform coating device to solve the problem that the existing technology proposed in the above background technology can only perform a single rotation on the substrate, and it is impossible to make the substrate and the nozzle rotate synchronously in opposite directions, which increases the coating stroke. At the same time, it is impossible to coat the photoresist in a large atmosphere, which reduces the coating efficiency. At the same time, it is impossible to fully absorb the colloid in the photoresist barrel, which easily leads to low photoresist utilization and increased production costs.

[0005] To achieve the above-mentioned object, the present invention provides the following technical solution: a device for collecting and uniformly coating photoresist, comprising a bracket, a mounting platform provided on the bracket, and a suction cup provided on the mounting platform; a glue outlet pipe is further provided on one side of the bracket, and the glue outlet pipe is further provided with a nozzle mechanism that rotates synchronously with the suction cup;

[0006] The nozzle mechanism includes a rotary joint, which is rotatably arranged at one end of the glue outlet hose, and an upper pulley structure that rotates synchronously with the transmission shaft is further arranged on the outer surface of the rotary joint. The transmission shaft is rotatably arranged in the mounting bracket, and the mounting bracket is arranged on one side of the outer surface of the mounting platform. The lower side of the transmission shaft rotates synchronously with the connecting shaft through the lower pulley structure, and the connecting shaft is rotatably arranged on one side of the mounting platform. The connecting shaft rotates in opposite directions with the drive shaft through the opposing transmission structure. The drive shaft is rotatably arranged in the middle of the mounting platform, and one end of the drive shaft is connected to the suction cup;

[0007] The other end of the glue outlet pipe is connected to the glue delivery pipe, and one end of the glue delivery pipe is also provided with a photoresist suction mechanism.

[0008] Preferably, one end of the driving shaft is connected to the output shaft of the driving motor through a reducer, and the reducer is arranged on one side of the support plate, and the support plate is arranged on one side of the mounting platform, which can reduce the rotation of the driving shaft.

[0009] Preferably, the opposing transmission structure includes a first gear and a second gear, the first gear is arranged on one side of the driving shaft, the first gear is engaged with the second gear, and the second gear is arranged on one side of the connecting shaft. Through the transmission of the first gear and the second gear, the driving shaft and the connecting shaft can rotate in opposite directions.

[0010] Preferably, the lower pulley structure includes a first lower pulley and a second lower pulley, the first lower pulley is arranged on the other side of the connecting shaft, the first lower pulley is connected to the second lower pulley through a synchronous belt, and the second lower pulley is arranged on one side of the transmission shaft, which can make the connecting shaft and the transmission shaft rotate synchronously in the same direction.

[0011] Preferably, the upper pulley structure includes a first upper pulley, which is arranged on the other side of the transmission shaft. The first upper pulley is connected to the second upper pulley through a synchronous belt, and the second upper pulley is arranged on one side of the rotary joint, which can make the transmission shaft and the rotary joint rotate synchronously in the same direction, and then make the rotary joint and the suction cup rotate in opposite directions at the same speed.

[0012] Preferably, one end of the rubber outlet hose is connected to the mounting sleeve, and one end of the mounting sleeve is connected to the mounting frame, which can ensure the stability of the rubber outlet hose when it is fixed.

[0013] Preferably, a transfer sleeve is further provided at one end of the rotary joint, diversion tubes are further provided on both sides of the transfer sleeve, and glue discharge heads are evenly provided on the diversion tubes, which can increase the spraying range of the photoresist.

[0014] Preferably, the photoresist suction mechanism includes an outer end cover, which is movably arranged on one side of the photoresist delivery pipe. The outer surface of the outer end cover is also provided with a positioning structure for fixing to the end of the photoresist barrel. A sealing plug is also provided inside the outer end cover, and a conical head is provided at the end of the sealing plug. High-pressure nozzles are also evenly provided on the outer surface of the conical head. One end of the high-pressure nozzles is connected to an annular gas delivery pipe, and the annular gas delivery pipe is provided in the conical head. An inert gas input pipe is also provided on the outer end cover, and the inert gas input pipe is connected to the annular gas delivery pipe, so that the photoresist adhered to the photoresist barrel can be cleaned and used.

[0015] Preferably, a retractable inner sleeve is provided at the bottom of the glue delivery tube, a suction head is provided at the end of the inner sleeve, and glue inlets are evenly provided at the bottom of the suction head, which can meet the use of photoresist barrels of different depths.

[0016] Preferably, guide blocks are further provided on both sides of the inner sleeve, one end of the guide block is movably provided in the guide groove, the guide groove is provided on both sides of the inner wall of the rubber delivery tube, a return spring is further provided in the guide groove, one end of the return spring is connected to the guide block, and a guide tube with a length greater than the length of the guide groove is further provided at one end of the inner sleeve, so that the suction head can always fit tightly with the bottom of the photoresist barrel, so as to facilitate the full absorption of the photoresist in the barrel.

[0017] Compared with the prior art, the present invention has the following beneficial effects:

[0018] (1) The present application enables the suction cup and the rotary joint to rotate synchronously and at the same speed in opposite directions, which greatly shortens the travel distance during the spraying process, while expanding the spraying range of the photoresist, improving the spraying efficiency of the photoresist, and shortening the spraying time.

[0019] (2) The present application can adsorb photoresists in photoresist barrels of different specifications, and can fully absorb and utilize the photoresist adhered to the photoresist barrel, thereby greatly improving the utilization rate of the photoresist and reducing the overall production cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a schematic diagram of the overall structure of the present invention;

[0021] Figure 2 Schematic diagram of the half-section structure of the nozzle mechanism of the present invention;

[0022] Figure 3 for Figure 2 Schematic diagram of the enlarged structure at A in the middle;

[0023] Figure 4 It is a structural schematic diagram of the opposing transmission structure, the lower pulley structure and the upper pulley in the present invention;

[0024] Figure 5 Schematic diagram of a half-section structure of the photoresist suction mechanism of the present invention;

[0025] Figure 6 for Figure 5 Schematic diagram of the enlarged structure at B in the middle;

[0026] Figure 7 Schematic diagram of the half-section structure of the inner sleeve in the present invention;

[0027] Figure 8 for Figure 7 Schematic diagram of the enlarged structure at C in the middle;

[0028] Figure 9 Schematic diagram of the structure of the suction head in the present invention;

[0029] In the figure: 1, photoresist suction mechanism; 2, mounting platform; 3, suction cup; 4, nozzle mechanism; 5, glue outlet pipe; 6, bracket; 7, glue pump; 8, glue pipe; 9, photoresist barrel; 101, outer end cover; 102, sealing plug; 103, inert gas inlet pipe; 104, conical head; 105, annular gas pipe; 106, high-pressure nozzle; 107, arc-shaped splint; 108, horizontal support arm; 109, mounting port; 110, upper inclined portion; 111, lower inclined portion; 112, locking ring; 113, guide pipe; 114, inner Sleeve; 115, guide block; 116, guide groove; 117, return spring; 118, suction head; 119, glue inlet; 401, rotary joint; 402, mounting sleeve; 403, second upper pulley; 404, transfer sleeve; 405, diverter pipe; 406, mounting frame; 407, first upper pulley; 408, transmission shaft; 409, drive motor; 410, support plate; 411, first gear; 412, drive shaft; 413, second gear; 414, first lower pulley; 415, connecting shaft; 416, second lower pulley. DETAILED DESCRIPTION

[0030] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0031] See also Figure 1-Figure 4The present invention provides a technical solution: a photoresist extraction and uniform coating device, a mounting platform 2 is provided on a bracket 6, a suction cup 3 is provided on the top of the mounting platform 2, a glue discharge pipe 5 is further provided on one side of the bracket 6, and the glue discharge pipe 5 is also provided with a nozzle mechanism 4, the nozzle mechanism 4 includes a rotary joint 401, the rotary joint 401 is rotatably arranged at one end of the glue discharge pipe 5, the outer surface of the rotary joint 401 is further provided with an upper pulley structure that rotates synchronously with the transmission shaft 408, the transmission shaft 408 is rotatably arranged in the mounting bracket 406, the mounting bracket 406 is arranged on one side of the outer surface of the mounting platform 2, the lower side of the transmission shaft 408 rotates synchronously with the connecting shaft 415 through the lower pulley structure, the connecting shaft 415 is rotatably arranged on one side inside the mounting platform 2, the connecting shaft 415 rotates in opposite directions with the driving shaft 412 through the opposing transmission structure, the driving shaft 412 is rotatably arranged in the middle of the mounting platform 2, and one end of the driving shaft 412 is connected to the suction cup 3, the glue discharge pipe 5 is connected to the glue delivery pipe 8, and the glue delivery pipe 8 is also provided with a glue delivery pump 7, which can provide glue delivery suction.

[0032] One end of the driving shaft 412 is connected to the output shaft of the driving motor 409 through a reducer. The reducer is arranged on one side of the support plate 410. The support plate 410 is arranged on one side of the mounting platform 2 and can reduce the rotation of the driving shaft 412.

[0033] The opposing transmission structure includes a first gear 411 and a second gear 413. The first gear 411 is arranged on one side of the driving shaft 412. The first gear 411 is engaged with the second gear 413. The second gear 413 is arranged on one side of the connecting shaft 415. The first gear 411 rotates to drive the second gear 413 to rotate in opposite directions at the same speed. The second gear 413 drives the connecting shaft 415 to rotate, so that the driving shaft 412 and the connecting shaft 415 can rotate in opposite directions.

[0034] The lower pulley structure includes a first lower pulley 414 and a second lower pulley 416. The first lower pulley 414 is arranged on the other side of the connecting shaft 415. The first lower pulley 414 is connected to the second lower pulley 416 through a synchronous belt. The second lower pulley 416 is arranged on one side of the transmission shaft 408. Through the transmission of the first lower pulley 414 and the second lower pulley 416, the connecting shaft 415 and the transmission shaft 408 can rotate synchronously in the same direction.

[0035] The upper pulley structure includes a first upper pulley 407, which is arranged on the other side of the transmission shaft 408. The first upper pulley 407 is connected to the second upper pulley 403 through a synchronous belt. The second upper pulley 403 is arranged on one side of the rotary joint 401, which can make the transmission shaft 408 and the rotary joint 401 rotate synchronously in the same direction, and then make the rotary joint 401 and the suction cup 3 rotate in opposite directions at the same speed.

[0036] First, the photoresist suction mechanism 1 is inserted into the photoresist barrel 9, and the wafer is placed on the suction cup 3. The suction cup 3 absorbs the wafer, and the photoresist is transported to the glue outlet pipe 5 through the glue delivery pump 7 through the glue delivery pipe 8. The glue outlet pipe 5 transports the photoresist to the rotary joint 401, and the driving motor 409 drives the driving shaft 412 to rotate, and the driving shaft 412 drives the suction cup 3 to rotate. At the same time, the driving shaft 412 drives the first gear 411 to rotate, and the first gear 411 drives the second gear 413 to rotate, and the second gear 413 drives the connecting shaft 415 to rotate. At this time, the connecting shaft 415 and the driving shaft 412 rotate at the same speed in opposite directions, and the connecting shaft 415 drives the first lower pulley 414 to rotate, and the first lower pulley 414 drives the second lower pulley 416 to rotate through the synchronous belt, and the second lower pulley 41 6 drives the transmission group to rotate, the transmission shaft 408 drives the first upper pulley 407 to rotate, the first upper pulley 407 drives the second upper pulley 403 to rotate through the synchronous belt, the second upper pulley 403 drives the rotary joint 401 to rotate at the end of the glue discharge pipe 5, the rotation of the rotary joint 401 drives the transfer sleeve 404 to rotate, the transfer sleeve 404 drives the two groups of diverter pipes 405 to rotate, the diverter pipes 405 and the suction cup 3 rotate synchronously at the same speed in opposite directions, the photoresist is transported to the transfer sleeve 404 through the rotary joint 401, the transfer sleeve 404 transports the photoresist to the two groups of diverter pipes 405, and then the photoresist is coated on the wafer through a number of glue discharge heads. Since the suction cup 3 and the rotary joint 401 rotate synchronously at the same speed, the photoresist can be quickly and evenly coated, which greatly improves the photoresist coating efficiency.

[0037] Furthermore, one end of the rubber outlet pipe 5 is connected to the mounting sleeve 402 , and one end of the mounting sleeve 402 is connected to the mounting bracket 406 , which can ensure the stability of the rubber outlet pipe 5 when it is fixed.

[0038] Furthermore, a transfer sleeve 404 is provided at one end of the rotary joint 401 , and diverter tubes 405 are provided on both sides of the transfer sleeve 404 . Glue discharge heads are evenly provided on the diverter tubes 405 , which can increase the spraying range of the photoresist.

[0039] See also Figure 5-Figure 9 A photoresist suction mechanism 1 is also provided at one end of the glue delivery tube 8. The photoresist suction mechanism 1 includes an outer end cover 101. The outer end cover 101 is movably provided on one side of the glue delivery tube 8. The outer surface of the outer end cover 101 is also provided with a positioning structure for fixing with the end of the photoresist barrel 9. A sealing plug 102 is also provided in the outer end cover 101. A conical head 104 is provided at the end of the sealing plug 102. High-pressure nozzles 106 are also evenly provided on the outer surface of the conical head 104. One end of the high-pressure nozzles 106 is connected to an annular gas delivery pipe 105. The annular gas delivery pipe 105 is provided in the conical head 104. An inert gas input pipe 103 is also provided on the outer end cover 101, and the inert gas input pipe 103 is connected to the annular gas delivery pipe 105, so that the photoresist adhering to the photoresist barrel 9 can be cleaned and used.

[0040] The positioning structure includes a locking ring 112, which is connected to the outer end cover 101 through a thread. An upper inclined portion 110 is also provided on the lower side of the locking ring 112. The upper inclined portion 110 is fitted with the lower inclined portions 111 of multiple groups of transverse support arms 108. The transverse support arms 108 are respectively arranged in corresponding mounting openings 109. The mounting openings 109 are evenly arranged on the outer end cover 101. An arc-shaped splint 107 is also provided at one end of the transverse support arm 108.

[0041] Insert the glue delivery tube 8 into the photoresist barrel 9, and move the upper end cover at the same time. The upper end cover moves along the glue delivery tube 8, and at the same time, the upper end cover drives the sealing plug 102 to move, and moves the sealing plug 102 to the port of the photoresist barrel 9. At the same time, the inner sleeve 114 is inserted into the bottom of the photoresist barrel 9, and the locking ring 112 is rotated. The locking ring 112 moves downward along the outer end cover 101, and the locking ring 112 drives the upper inclined portion 110 to move downward. The upper inclined portion 110 can drive the horizontal support arm 108 to move synchronously through the transmission with the lower inclined portion 111. The horizontal support arm 108 8 drives the arc-shaped clamping plate 107 to move, and the arc-shaped clamping plate 107 fits tightly with the outer surface of the end of the photoresist barrel 9, and fixes the outer end cover 101 at the end position of the photoresist barrel 9; then the inert gas passes through the inert gas input pipe 103 and is transported to the annular gas pipe 105, and the annular gas pipe 105 transports the inert gas to the high-pressure nozzle 106, and the high-pressure nozzle 106 sprays the inert gas onto the inner wall of the photoresist barrel 9, cleaning the photoresist adhering to the inner wall of the photoresist barrel 9 downwards, so that it flows to the bottom of the photoresist barrel 9 for easy suction.

[0042] See also Figure 7-Figure 9 A retractable inner sleeve 114 is also provided at the bottom of the glue delivery pipe 8, and a suction head 118 is also provided at the end of the inner sleeve 114. A glue inlet 119 is also evenly provided at the bottom of the suction head 118, which can meet the use of photoresist barrels 9 of different depths. Guide blocks 115 are also provided on both sides of the inner sleeve 114, and one end of the guide block 115 is movably arranged in a guide groove 116. The guide groove 116 is arranged on both sides of the inner wall of the glue delivery pipe 8. A return spring 117 is also provided in the guide groove 116, and one end of the return spring 117 is connected to the guide block 115, so that the suction head 118 can always fit closely with the bottom of the photoresist barrel 9, which is convenient for fully absorbing the photoresist in the barrel. A guide pipe 113 with a length greater than the length of the guide groove 116 is also provided at one end of the inner sleeve 114 to prevent the photoresist from flowing into the guide groove 116 and causing waste of photoresist.

[0043] When the glue delivery tube 8 is inserted into the barrel body, after the suction head 118 fits with the bottom of the photoresist barrel body 9, the suction head 118 drives the inner sleeve 114 to move in the glue delivery tube 8, and the inner sleeve drives the guide block 115 to move in the guide groove 116 and compresses the reset spring 117. When the outer end cover 101 fits with the end of the photoresist barrel body 9, the elastic force of the reset spring 117 can make the suction head 118 fit tightly with the bottom of the photoresist barrel body 9, meeting the use of photoresist barrel bodies 9 of different depths. The photoresist is delivered to the inner sleeve 114 through the glue inlet 119, and then delivered to the glue delivery tube 8 through the guide tube 113 to transport the photoresist.

[0044] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to these embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the appended claims and their equivalents.

Claims

1. A device for collecting and uniformly coating photoresist, comprising a bracket (6), a mounting platform (2) arranged on the bracket (6), and a suction cup (3) arranged on the mounting platform (2), characterized in that: A rubber outlet pipe (5) is also provided on one side of the bracket (6), and the rubber outlet pipe (5) is also provided with a nozzle mechanism (4) that rotates synchronously with the suction cup (3); The nozzle mechanism (4) includes a rotary joint (401), the rotary joint (401) is rotatably arranged at one end of the rubber outlet hose (5), an upper pulley structure that rotates synchronously with the transmission shaft (408) is further arranged on the outer surface of the rotary joint (401), the transmission shaft (408) is rotatably arranged in the mounting frame (406), the mounting frame (406) is arranged on one side of the outer surface of the mounting platform (2), the lower side of the transmission shaft (408) rotates synchronously with the connecting shaft (415) through the lower pulley structure, the connecting shaft (415) is rotatably arranged on one side of the mounting platform (2), the connecting shaft (415) rotates in opposite directions with the driving shaft (412) through the opposing transmission structure, the driving shaft (412) is rotatably arranged in the middle of the mounting platform (2), and one end of the driving shaft (412) is connected to the suction cup (3); The other end of the glue outlet pipe (5) is connected to the glue delivery pipe (8), and a photoresist suction mechanism (1) is also provided at one end of the glue delivery pipe (8).

2. The device for collecting and uniformly coating photoresist according to claim 1, characterized in that: One end of the drive shaft (412) is connected to the output shaft of the drive motor (409) through a reducer, and the reducer is arranged on one side of the support plate (410), and the support plate (410) is arranged on one side inside the mounting platform (2).

3. The device for collecting and uniformly coating photoresist according to claim 1, characterized in that: The opposing transmission structure includes a first gear (411) and a second gear (413), wherein the first gear (411) is arranged on one side of the driving shaft (412), the first gear (411) is meshed with the second gear (413), and the second gear (413) is arranged on one side of the connecting shaft (415).

4. The device for collecting and uniformly coating photoresist according to claim 1, characterized in that: The lower pulley structure includes a first lower pulley (414) and a second lower pulley (416), wherein the first lower pulley (414) is arranged on the other side of the connecting shaft (415), the first lower pulley (414) is connected to the second lower pulley (416) through a synchronous belt, and the second lower pulley (416) is arranged on one side of the transmission shaft (408).

5. The device for collecting and uniformly coating photoresist according to claim 1, characterized in that: The upper pulley structure includes a first upper pulley (407), which is arranged on the other side of the transmission shaft (408), and the first upper pulley (407) is connected to the second upper pulley (403) through a synchronous belt, and the second upper pulley (403) is arranged on one side of the rotary joint (401).

6. The device for collecting and uniformly coating photoresist according to claim 1, characterized in that: One end of the rubber outlet hose (5) is connected to the installation sleeve (402), and one end of the installation sleeve (402) is connected to the installation frame (406).

7. A photoresist extraction and uniform coating device according to claim 1 or 5, characterized in that: A transfer sleeve (404) is further provided at one end of the rotary joint (401), and diversion tubes (405) are further provided on both sides of the transfer sleeve (404), and glue outlet heads are evenly provided on the diversion tubes (405).

8. The device for collecting and uniformly coating photoresist according to claim 1, characterized in that: The photoresist suction mechanism (1) comprises an outer end cover (101), the outer end cover (101) is movably arranged on one side of the glue delivery pipe (8), the outer surface of the outer end cover (101) is also provided with a positioning structure for fixing with the end of the photoresist barrel (9), a sealing plug (102) is also provided in the outer end cover (101), a conical head (104) is provided at the end of the sealing plug (102), and high-pressure nozzles (106) are also uniformly provided on the outer surface of the conical head (104), one end of each of the high-pressure nozzles (106) is connected to an annular gas delivery pipe (105), and the annular gas delivery pipe (105) is arranged in the conical head (104). An inert gas input pipe (103) is also provided on the outer end cover (101), and the inert gas input pipe (103) is connected to the annular gas delivery pipe (105).

9. The device for collecting and uniformly coating photoresist according to claim 8, characterized in that: A retractable inner sleeve (114) is also provided at the bottom of the rubber delivery pipe (8), a suction head (118) is also provided at the end of the inner sleeve (114), and a rubber inlet (119) is evenly provided at the bottom of the suction head (118).

10. The device for collecting and uniformly coating photoresist according to claim 9, characterized in that: Guide blocks (115) are also provided on both sides of the inner sleeve (114), one end of the guide block (115) is movably provided in a guide groove (116), the guide groove (116) is provided on both sides of the inner wall of the rubber delivery hose (8), a return spring (117) is also provided in the guide groove (116), one end of the return spring (117) is connected to the guide block (115), and a guide tube (113) having a length greater than that of the guide groove (116) is also provided at one end of the inner sleeve (114).

Citation Information

Patent Citations

  • Photoresist coating device

    CN118768168A