Combustion reaction cavity structure applied to semiconductor tail gas treatment equipment

Abstract

The invention belongs to the technical field of semiconductor waste gas treatment, and particularly relates to a combustion reaction cavity structure applied to semiconductor tail gas treatment equipment, which comprises an upper cover, a combustor, a waste gas connecting pipe, an upper-stage reaction cylinder, an intermediate-stage reaction cylinder, a lower-stage reaction cylinder and an inner closing-in cylinder, the intermediate reaction cylinder is communicated with one end of each of a plurality of water inlet pipes B; according to the invention, gas and flames emitted by the flame emitting end of the burner enter the inner cavity of the intermediate reaction cylinder body through the inner closing-in cylinder body and then enter the lower reaction cylinder body, so that when the gas passes through the inner closing-in cylinder body with a relatively small caliber, the gas close to the inner wall of the inner closing-in cylinder body can be fully and reliably heated and burnt; and a two-stage overflow water curtain can be formed, so that dust or other particle byproducts and the like are more effectively taken away through water flow, the risk of blockage is reduced, the equipment maintenance period is prolonged, and the production efficiency is improved.

Description

Technical Field

[0001] The present invention belongs to the technical field of semiconductor waste gas treatment, in particular to a combustion reaction chamber structure applied to semiconductor tail gas treatment equipment. Background Art

[0002] In the existing patent document with the publication number CN118623330A, a combustion chamber structure for semiconductor tail gas treatment equipment is disclosed, which includes an exhaust gas pipeline, a burner, an air curtain ring, a reaction chamber, a porous ceramic brick chamber and an upper cover, and the flame generated is located inside the porous ceramic brick chamber. However, the aperture above the porous ceramic brick chamber is too large relative to the size of the flame generated, which makes it difficult for the gas near the hole wall above the porous ceramic brick chamber to be heated reliably and evenly, resulting in poor treatment effect of part of the gas near the inner wall of the porous ceramic brick chamber. In addition, the technical solution of the above-mentioned existing patent document will generate a lot of dust accumulation when processing large dust processes and cause clogging of the combustion reaction chamber, causing equipment failure and shutdown, and shortening the equipment maintenance cycle. Summary of the Invention

[0003] In view of the above problems, the object of the present invention is to provide a combustion reaction chamber structure applied to semiconductor tail gas treatment equipment.

[0004] The object of the present invention is achieved through the following technical solutions:

[0005] A combustion reaction chamber structure for semiconductor tail gas treatment equipment includes an upper cover, a burner, and an exhaust gas pipe. The burner is arranged in the middle of the upper cover. The lower ends of the exhaust gas pipes are evenly arranged on the upper cover and around the burner. The upper ends of the exhaust gas pipes are respectively located above the upper cover. The structure also includes an upper reaction cylinder, an intermediate reaction cylinder, a lower reaction cylinder, and an inner-end cylinder.

[0006] The top of the upper reaction cylinder is open, the top of the upper reaction cylinder is fixed to the lower side of the upper cover, the flame emitting end of the burner and the lower ends of the exhaust gas pipes are respectively connected to the inner cavity of the upper reaction cylinder, and the bottom of the upper reaction cylinder is provided with an inner closing cylinder installation opening;

[0007] The top of the intermediate reaction cylinder is open, the top of the intermediate reaction cylinder is fixed to the lower side of the upper reaction cylinder, and the bottom of the intermediate reaction cylinder is provided with a lower reaction cylinder installation opening;

[0008] The outer peripheral surface of the lower reaction cylinder is fixedly connected to the lower reaction cylinder installation port, the upper and lower ends of the lower reaction cylinder are open, the upper end opening of the lower reaction cylinder is higher than the inner cavity bottom surface of the intermediate reaction cylinder, and the lower end opening of the lower reaction cylinder is located below the intermediate reaction cylinder;

[0009] The outer peripheral surface of the inner-mouthed cylinder is fixedly connected to the inner-mouthed cylinder installation opening, and the upper and lower ends of the inner-mouthed cylinder are both open. The upper end opening of the inner-mouthed cylinder is higher than the bottom surface of the inner cavity of the upper reaction cylinder and corresponds to the upper and lower setting positions of the flame emitting end of the burner. The lower end opening of the inner-mouthed cylinder extends into the inner cavity of the intermediate reaction cylinder, and the inner diameter of the inner-mouthed cylinder is smaller than the inner diameter of the lower reaction cylinder.

[0010] The upper reaction cylinder is connected to one end of a plurality of water inlet pipes A, and the intermediate reaction cylinder is connected to one end of a plurality of water inlet pipes B.

[0011] The upper reaction cylinder, the intermediate reaction cylinder, the lower reaction cylinder and the inner closing cylinder are an integrated structure.

[0012] The axial center line of the flame emitting end of the burner, the axial center line of the upper reaction cylinder, the axial center line of the middle reaction cylinder, the axial center line of the lower reaction cylinder and the axial center line of the inner closing cylinder are all collinear.

[0013] The outer diameters of the upper reaction cylinder, the middle reaction cylinder, the lower reaction cylinder, and the inner closing cylinder are gradually reduced in sequence.

[0014] A connecting flange portion is formed extending from the outer periphery of the top opening of the upper reaction cylinder.

[0015] The lower end of each exhaust gas connecting pipe is located outside the upper end opening of the inner-closed cylinder.

[0016] The number of the water inlet pipes A and the number of the water inlet pipes B are both at least two.

[0017] The water inlet pipes A are evenly arranged along the circumference of the upper reaction cylinder, and the water inlet pipes B are evenly arranged along the circumference of the intermediate reaction cylinder.

[0018] The outer contour of the inner cavity of the upper reaction cylinder and the outer contour of the inner cavity of the intermediate reaction cylinder are both circular, and the water supply direction of each water inlet pipe A to the upper reaction cylinder is parallel to the tangential direction of the outer contour of the inner cavity of the upper reaction cylinder, and the water supply direction of each water inlet pipe B to the intermediate reaction cylinder is parallel to the tangential direction of the outer contour of the inner cavity of the intermediate reaction cylinder.

[0019] The height position of one end of each water inlet pipe A is lower than the height position of the upper end opening of the inner-closed cylinder, and the height position of one end of each water inlet pipe B is lower than the height position of the upper end opening of the lower-stage reaction cylinder.

[0020] The advantages and positive effects of the present invention are:

[0021] The present invention forms a closed structure by arranging an inner closed-end cylinder, which allows the gas and the flame emitted by the flame emitting end of the burner to first pass through the inner closed-end cylinder into the inner cavity of the intermediate reaction cylinder, and then enter the lower reaction cylinder, so that when the gas passes through the inner closed-end cylinder with a relatively small diameter, the gas close to the inner wall of the inner closed-end cylinder can also be fully and reliably heated and burned; and a two-stage overflow water curtain can be formed, which can more effectively carry away dust or other particulate by-products through water flow, reduce the risk of blockage, extend the equipment maintenance cycle, and improve production efficiency. It is more suitable for processes with large dust and large flow. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1 It is a schematic diagram of the three-dimensional structure of the present invention;

[0023] Figure 2 Schematic diagram of the external structure of the present invention;

[0024] Figure 3 It is a schematic diagram of the cross-sectional structure of the present invention.

[0025] In the figure: 1 is the upper reaction cylinder, 2 is the intermediate reaction cylinder, 3 is the lower reaction cylinder, 4 is the inner closing cylinder, 5 is the water inlet pipe A, and 6 is the water inlet pipe B;

[0026] 001 is the upper cover, 002 is the burner, and 003 is the exhaust gas connection pipe. DETAILED DESCRIPTION

[0027] The following is combined with Figure 1-3 The present invention is described in further detail.

[0028] A combustion reaction chamber structure used in semiconductor tail gas treatment equipment, such as Figure 1-3 As shown, this embodiment includes an upper cover 001, a burner 002, and an exhaust gas pipe 003. Burner 002 is located in the center of upper cover 001. The lower ends of six exhaust gas pipes 003 are evenly distributed on upper cover 001 and around the periphery of burner 002. The upper ends of each exhaust gas pipe 003 are located above upper cover 001. In this embodiment, burner 002 is an existing product, and the installation structure of burner 002 and exhaust gas pipe 003 on upper cover 001 also adopts existing technology. Each exhaust gas pipe 003 is connected to the exhaust pipe of the corresponding equipment.

[0029] The combustion reaction chamber structure applied to semiconductor tail gas treatment equipment in this embodiment further includes an upper reaction cylinder 1 , a middle reaction cylinder 2 , a lower reaction cylinder 3 , and an inner-end cylinder 4 .

[0030] The upper reaction cylinder 1 has an open top, which is affixed to the underside of the upper cover 001. The flame-emitting end of the burner 002 and the lower ends of the exhaust pipes 003 are respectively connected to the inner cavity of the upper reaction cylinder 1. The bottom of the upper reaction cylinder 1 is provided with an inner-closed cylinder mounting opening. In this embodiment, a connecting flange is formed extending from the outer periphery of the upper reaction cylinder 1's top opening, which facilitates connection to the upper cover 001 via this flange and bolts.

[0031] The top of the intermediate reaction cylinder 2 is open, the top of the intermediate reaction cylinder 2 is fixed to the lower side of the upper reaction cylinder 1, and the bottom of the intermediate reaction cylinder 2 is provided with a lower reaction cylinder installation opening.

[0032] The outer circumference of the lower reaction cylinder 3 is fixedly connected to the lower reaction cylinder installation port. The lower reaction cylinder 3 has openings at both the upper and lower ends. The upper opening of the lower reaction cylinder 3 is higher than the bottom surface of the inner cavity of the intermediate reaction cylinder 2, and the lower opening of the lower reaction cylinder 3 is located below the intermediate reaction cylinder 2. The lower opening of the lower reaction cylinder 3 is used to connect to the subsequent existing spray structure, and the connection setting method adopts the existing technology.

[0033] The outer peripheral surface of the inner-closed-end cylinder 4 is fixedly connected to the inner-closed-end cylinder installation port, and the upper and lower ends of the inner-closed-end cylinder 4 are both open. The upper end opening of the inner-closed-end cylinder 4 is higher than the bottom surface of the inner cavity of the upper reaction cylinder 1, and corresponds to the upper and lower settings of the flame emitting end of the burner 002. The lower end opening of the inner-closed-end cylinder 4 extends into the inner cavity of the intermediate reaction cylinder 2. The inner diameter of the inner-closed-end cylinder 4 is smaller than the inner diameter of the lower reaction cylinder 3. By providing the inner-closed-end cylinder 4 to form a closed structure, the gas and the flame emitted by the flame emitting end of the burner 002 can first pass through the inner-closed-end cylinder 4 to enter the inner cavity of the intermediate reaction cylinder 2, and then enter the lower reaction cylinder 3, so that when the gas passes through the inner-closed-end cylinder 4 with a relatively small diameter, the gas close to the inner wall of the inner-closed-end cylinder 4 can also be fully and reliably heated and burned.

[0034] Specifically, in this embodiment, the upper reaction cylinder 1, the intermediate reaction cylinder 2, the lower reaction cylinder 3, and the inner closing cylinder 4 are an integrated structure, which is convenient for manufacturing and subsequent disassembly and assembly. The outer diameter of the upper reaction cylinder 1, the outer diameter of the intermediate reaction cylinder 2, the outer diameter of the lower reaction cylinder 3, and the outer diameter of the inner closing cylinder 4 are gradually reduced in sequence, which can minimize the overall occupied space formed by the upper reaction cylinder 1, the intermediate reaction cylinder 2, the lower reaction cylinder 3, and the inner closing cylinder 4. The axial center line of the flame emitting end of the burner 002, the axial center line of the upper reaction cylinder 1, the axial center line of the intermediate reaction cylinder 2, the axial center line of the lower reaction cylinder 3, and the axial center line of the inner closing cylinder 4 are all collinear to ensure that the exhaust gas burns evenly in the overall body formed by the upper reaction cylinder 1, the intermediate reaction cylinder 2, the lower reaction cylinder 3, and the inner closing cylinder 4. The lower end of each waste gas connecting pipe 003 is located outside the upper opening of the inner-closed cylinder 4. Each waste gas connecting pipe 003 can collect the waste gas into the inner cavity of the upper reaction cylinder 1 and then flow it to the upper opening of the inner-closed cylinder 4 to be fully burned by the flame emitted from the flame emitting end of the burner 002.

[0035] Specifically, in this embodiment, the upper reaction cylinder 1 is connected to one end of two water inlet pipes A 5, and the intermediate reaction cylinder 2 is connected to one end of two water inlet pipes B 6. The other end of each water inlet pipe A 5 and the other end of each water inlet pipe B 6 are both connected to an external water source. By allowing water inlet pipes A 5 and B 6 to enter the entire structure formed by the upper reaction cylinder 1, the intermediate reaction cylinder 2, the lower reaction cylinder 3, and the inner-end cylinder 4, the water flow can carry away dust or other particulate byproducts produced by the combustion reaction, effectively reducing the risk of reaction chamber blockage, extending the equipment maintenance cycle, and improving production efficiency. The height position of one end of each water inlet pipe A 5 is lower than the height position of the upper end opening of the inner-closed cylinder 4, and the height position of one end of each water inlet pipe B 6 is lower than the height position of the upper end opening of the lower reaction cylinder 3, thereby effectively ensuring that the water input to the upper reaction cylinder 1 and the intermediate reaction cylinder 2 through the water inlet pipe A 5 and the water inlet pipe B 6 respectively overflows under the blocking action of the inner-closed cylinder 4 and the lower reaction cylinder 3, and forms a reliable water curtain on the inner wall of the inner-closed cylinder 4 and the inner wall of the lower reaction cylinder 3 respectively, thereby ensuring that dust or other particulate by-products are taken away, etc., and at the same time reducing the overall temperature formed by the upper reaction cylinder 1, the intermediate reaction cylinder 2, the lower reaction cylinder 3, and the inner-closed cylinder 4, preventing people from being scalded by contacting the outer surface, and avoiding the problem of components being easily corroded at high temperatures. Each water inlet pipe A 5 is evenly arranged along the circumference of the upper reaction cylinder 1, and each water inlet pipe B 6 is evenly arranged along the circumference of the intermediate reaction cylinder 2. The outer peripheral contour of the inner cavity of the upper reaction cylinder 1 and the outer peripheral contour of the inner cavity of the intermediate reaction cylinder 2 are both circular. The water supply direction of each water inlet pipe A 5 to the upper reaction cylinder 1 is parallel to the tangential direction of the outer peripheral contour of the inner cavity of the upper reaction cylinder 1, and the water supply direction of each water inlet pipe B 6 to the intermediate reaction cylinder 2 is parallel to the tangential direction of the outer peripheral contour of the inner cavity of the intermediate reaction cylinder 2. The water input into the upper reaction cylinder 1 and the intermediate reaction cylinder 2 can form a vortex before overflowing, ensuring the subsequent formation of a uniform water curtain.

Claims

1. A combustion reaction chamber structure for semiconductor tail gas treatment equipment, comprising an upper cover (001), a burner (002), and an exhaust gas pipe (003), wherein the burner (002) is arranged in the middle of the upper cover (001), and the lower ends of a plurality of exhaust gas pipes (003) are evenly arranged on the upper cover (001) and on the outer periphery of the burner (002), and the upper ends of the exhaust gas pipes (003) are respectively located above the upper cover (001), characterized in that: It also includes an upper reaction cylinder (1), a middle reaction cylinder (2), a lower reaction cylinder (3), and an inner-end cylinder (4); The top of the upper reaction cylinder (1) is open, the top of the upper reaction cylinder (1) is fixed to the lower side of the upper cover (001), the flame emitting end of the burner (002) and the lower end of each exhaust gas pipe (003) are respectively connected to the inner cavity of the upper reaction cylinder (1), and the bottom of the upper reaction cylinder (1) is provided with an inner closing cylinder installation opening; The top of the intermediate reaction cylinder (2) is open, the top of the intermediate reaction cylinder (2) is fixedly connected to the lower side of the upper reaction cylinder (1), and the bottom of the intermediate reaction cylinder (2) is provided with a lower reaction cylinder installation opening; The outer peripheral surface of the lower reaction cylinder (3) is fixedly connected to the lower reaction cylinder installation port, the upper and lower ends of the lower reaction cylinder (3) are both open, the upper end opening of the lower reaction cylinder (3) is higher than the bottom surface of the inner cavity of the intermediate reaction cylinder (2), and the lower end opening of the lower reaction cylinder (3) is located below the intermediate reaction cylinder (2); The outer peripheral surface of the inner-closed cylinder (4) is fixedly connected to the inner-closed cylinder installation port, and the upper and lower ends of the inner-closed cylinder (4) are both open. The upper end opening of the inner-closed cylinder (4) is higher than the bottom surface of the inner cavity of the upper reaction cylinder (1) and corresponds to the upper and lower setting positions of the flame emission end of the burner (002). The lower end opening of the inner-closed cylinder (4) extends into the inner cavity of the intermediate reaction cylinder (2). The inner diameter of the inner-closed cylinder (4) is smaller than the inner diameter of the lower reaction cylinder (3). The upper reaction cylinder (1) is connected to one end of a plurality of water inlet pipes A (5), and the intermediate reaction cylinder (2) is connected to one end of a plurality of water inlet pipes B (6).

2. The combustion reaction chamber structure for semiconductor tail gas treatment equipment according to claim 1, characterized in that: The upper reaction cylinder (1), the intermediate reaction cylinder (2), the lower reaction cylinder (3), and the inner-end cylinder (4) are an integrated structure.

3. The combustion reaction chamber structure for semiconductor tail gas treatment equipment according to claim 1, characterized in that: The axial centerline of the flame emitting end of the burner (002), the axial centerline of the upper reaction cylinder (1), the axial centerline of the middle reaction cylinder (2), the axial centerline of the lower reaction cylinder (3), and the axial centerline of the inner closing cylinder (4) are all collinear.

4. The combustion reaction chamber structure for semiconductor tail gas treatment equipment according to claim 1, characterized in that: The outer diameters of the upper reaction cylinder (1), the middle reaction cylinder (2), the lower reaction cylinder (3), and the inner closing cylinder (4) gradually decrease in sequence.

5. The combustion reaction chamber structure for semiconductor tail gas treatment equipment according to claim 1, characterized in that: A connecting flange portion is formed on the outer periphery of the top opening of the upper reaction cylinder (1).

6. The combustion reaction chamber structure for semiconductor tail gas treatment equipment according to claim 1, characterized in that: The lower end of each exhaust gas connecting pipe (003) is located outside the upper end opening of the inner-closed cylinder (4).

7. The combustion reaction chamber structure for semiconductor tail gas treatment equipment according to claim 1, characterized in that: The number of the water inlet pipes A (5) and the number of the water inlet pipes B (6) are both at least two.

8. The combustion reaction chamber structure for semiconductor tail gas treatment equipment according to claim 1, characterized in that: Each of the water inlet pipes A (5) is evenly arranged along the circumference of the upper reaction cylinder (1), and each of the water inlet pipes B (6) is evenly arranged along the circumference of the intermediate reaction cylinder (2).

9. The combustion reaction chamber structure for semiconductor tail gas treatment equipment according to claim 1, characterized in that: The outer contour of the inner cavity of the upper reaction cylinder (1) and the outer contour of the inner cavity of the intermediate reaction cylinder (2) are both circular, and the water supply direction of each water inlet pipe A (5) to the upper reaction cylinder (1) is parallel to the tangential direction of the outer contour of the inner cavity of the upper reaction cylinder (1), and the water supply direction of each water inlet pipe B (6) to the intermediate reaction cylinder (2) is parallel to the tangential direction of the outer contour of the inner cavity of the intermediate reaction cylinder (2).

10. The combustion reaction chamber structure used in semiconductor tail gas treatment equipment according to claim 1, characterized in that: The height position of one end of each water inlet pipe A (5) is lower than the height position of the upper end opening of the inner-end cylinder (4), and the height position of one end of each water inlet pipe B (6) is lower than the height position of the upper end opening of the lower-stage reaction cylinder (3).

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