Multi-power-supply extreme ultraviolet light generation system and method

Abstract

The invention relates to the technical field of plasmas, in particular to a multi-power-supply extreme ultraviolet light generation system and a multi-power-supply extreme ultraviolet light generation method. The system comprises an extreme ultraviolet light generator, a power supply device and a delay device, the power supply device is electrically connected with the extreme ultraviolet light generator and applies a current pulse to the interior of the extreme ultraviolet light generator so as to radiate extreme ultraviolet light; the power supply device comprises a plurality of power supply modules, and each power supply module independently generates a current pulse for radiating extreme ultraviolet light; the delay device is in control connection with the power supply device to control the plurality of power supply modules to work. According to the invention, the delay device is arranged to control the discharge time of the plurality of power supply modules, so that the repetition frequency of the current pulse generated by the power supply modules acting on the target material in the extreme ultraviolet light generator is improved, thereby improving the power and brightness of extreme ultraviolet light radiation; and the current pulse acts on the target material at high frequency, so that the state of the plasma in the extreme ultraviolet light generator is relatively stable, and the stability of extreme ultraviolet light radiation is improved.

Description

Technical field

[0001] The present invention relates to the field of plasma technology, and in particular to a multi-power source extreme ultraviolet light generation system and method. [Background Technology]

[0002] With the continuous advancement of semiconductor technology, the industry's demand for chip feature sizes continues to decrease. However, deep ultraviolet lithography (DUVL) based on immersion and multiple exposure processes has reached its current commercial limits. Therefore, extreme ultraviolet lithography (EUVL), which uses 13.5nm extreme ultraviolet light, is considered the next generation of lithography technology. To meet the needs of high-volume manufacturing (HVM), EUVL is being developed to address two key issues: lithography light sources and mask inspection.

[0003] Lithography light source systems should feature high output power, excellent stability, low contamination, and low manufacturing and maintenance costs. As wafer throughput increases, mask inspection efficiency must improve to handle large numbers of masks. Mask inspection efficiency is partially defined by the brightness of the EUV light (W / mm² / sr).

[0004] The semiconductor industry requires a radiant brightness of 100W / mm2 / sr, while the currently available brightness is approximately 10W / mm2 / sr. Therefore, improving the brightness of EUV light is a key issue in improving mask inspection efficiency.

[0005] Therefore, based on the problem that the existing extreme ultraviolet light power and brightness cannot meet the existing lithography requirements, there is an urgent need to provide a technical method to increase the power and brightness of extreme ultraviolet light. [Summary of the invention]

[0006] In order to solve the problem that the power and brightness of existing extreme ultraviolet light cannot meet the existing photolithography requirements, the present invention provides a multi-power source extreme ultraviolet light generation system and method.

[0007] In order to solve the above technical problems, the present invention provides the following technical solutions: a multi-power source extreme ultraviolet light generation system, the multi-power source extreme ultraviolet light generation system comprising: an extreme ultraviolet light generator, a power supply device and a delay device;

[0008] The power supply device is electrically connected to the extreme ultraviolet light generator and applies current pulses to the interior of the extreme ultraviolet light generator to radiate extreme ultraviolet light; each of the power supply devices includes multiple power modules, and the power modules individually generate current pulses for radiating extreme ultraviolet light; the delay device is control-connected to the power supply device to control the operation of multiple power modules.

[0009] Preferably, the power module includes a charging and discharging module and a compression module.

[0010] Preferably, the power supply module can generate two-level current pulses with different current peak values.

[0011] Preferably, the current pulses generated by different power modules are the same or different.

[0012] Preferably, the multi-power source EUV light generating system further comprises a target material supply device, which is connected to the EUV light generator and provides target material to the EUV light generator to generate plasma.

[0013] Preferably, the extreme ultraviolet light generator is a pinch device, a gas discharge plasma device and / or a laser discharge plasma device.

[0014] To solve the above technical problems, the present invention provides another technical solution as follows: a multi-power source extreme ultraviolet light generation method, which can be performed by the multi-power source extreme ultraviolet light generation system as described in any of the above items, the method comprising the following steps:

[0015] Providing target materials to the EUV generator;

[0016] The delay device controls multiple power modules to continuously release current pulses to act on the target material according to the preset delay time to obtain extreme ultraviolet light.

[0017] Preferably, the delay device controls the multiple power modules to continuously release current pulses according to a preset delay time, comprising the following steps:

[0018] Provides preset delay time for each power module;

[0019] The corresponding power module is started to release the current pulse according to the preset delay time.

[0020] Preferably, the current pulse generated by each power module has the energy required to radiate extreme ultraviolet light.

[0021] Preferably, applying a current pulse to the target comprises the following steps:

[0022] The power supply device releases a pre-current pulse to act on the target material to form an initial plasma;

[0023] The power supply device releases a main current pulse to act on the initial plasma to obtain extreme ultraviolet light.

[0024] Compared with the prior art, the multi-power source extreme ultraviolet light generation system and method provided by the present invention has the following beneficial effects:

[0025] 1. An embodiment of the present invention provides a multi-power source extreme ultraviolet light generation system, comprising: an extreme ultraviolet light generator, a power supply device, and a delay device;

[0026] The power supply device is electrically connected to the extreme ultraviolet light generator and applies current pulses to the interior of the extreme ultraviolet light generator to radiate extreme ultraviolet light; the power supply device includes multiple power modules, each of which generates current pulses for radiating extreme ultraviolet light; the delay device is control-connected to the power supply device to control the operation of multiple power modules.

[0027] It can be understood that the power supply device of the multi-power extreme ultraviolet light generating system provided in this embodiment is provided with multiple power supply modules, and each power supply module has the function of applying electric pulses to the extreme ultraviolet light generator to generate extreme ultraviolet light; it should be understood that by setting a delay device to control the start time of releasing current pulses of multiple power supply modules, the start time of generating current pulses of each power supply module can be different, thereby making the time of releasing current pulses have a sequence, and through the combination of multiple power supply modules, the repetition frequency of the current pulses finally generated and applied to the extreme ultraviolet light generator is improved, that is, the repetition frequency of the current pulses acting on the target material in the extreme ultraviolet light generator is improved, thereby improving the power and brightness of the extreme ultraviolet light radiation.

[0028] On the other hand, as the repetition frequency of the current pulses applied to the EUV light generator increases, the dynamic balance between the generation and consumption of plasma in the EUV light generator is stabilized, that is, the stability of the states of various components in the EUV light generator is improved to a considerable extent, thereby improving the stability of the output EUV light.

[0029] Through this design, the repetition frequency of the current pulses acting on the target material in the extreme ultraviolet light generator can be effectively increased, thereby effectively improving the radiation power and brightness of the extreme ultraviolet light.

[0030] 2. The power module provided in the embodiment of the present invention includes a charging and discharging module and a compression module.

[0031] As can be understood, a single power module primarily consists of two modules: a charge-discharge module and a compression module. The charge-discharge module is primarily responsible for charging and storing energy in the circuits within the power module and controlling the circuits' release of energy to generate current pulses. Specifically, the amount of energy stored in the circuit by the charge-discharge module determines the amount of energy ultimately generated by the circuit's current pulses.

[0032] Furthermore, the compression module is mainly used to compress the current pulse released by the circuit to obtain a higher peak current. After the circuit completes charging and energy storage, it will release a current pulse under the action of the charging and discharging module. The released current pulse first passes through the compression module, and the current pulse is compressed by the compression module to obtain a higher peak current before being released from the power module.

[0033] Through this design, the power module can release current pulses with higher peak current to act on the extreme ultraviolet light generator, so as to better radiate extreme ultraviolet light.

[0034] 3. The power module provided in the embodiment of the present invention can generate two-level current pulses with different current peak values.

[0035] It can be understood that the power module has the ability to generate two-level current pulses, pre-current pulses and main current pulses. The current peak value of the pre-current pulse is relatively small. When it is applied to the extreme ultraviolet light generator, it can ionize the target material in the extreme ultraviolet light generator to form an initial plasma; the current peak value of the main current pulse is greater than the current peak value of the pre-current pulse. When the target material in the extreme ultraviolet light generator is ionized by the pre-current pulse to form an initial plasma, the main current pulse begins to discharge, and the initial plasma in the extreme ultraviolet light generator is pinched toward the axis under the action of the Lorentz force, that is, a z-pinch effect is generated, and a high-temperature and high-density plasma is obtained, thereby radiating extreme ultraviolet light.

[0036] Through this design, a pre-current pulse is used to ionize the target material in the extreme ultraviolet light generator to form an initial plasma that is more easily connected to the conductive layer plasma ring, effectively improving the conversion efficiency of the target material.

[0037] 4. The current pulses generated by different power modules provided in the embodiments of the present invention are the same or different.

[0038] It can be understood that there are multiple power modules in the power supply device, and each power module can generate current pulses independently. By controlling the working delay time between the power modules, the current pulses act on the target material periodically in turn to increase the frequency of the pulses acting on the target material. Specifically, whether the current pulses generated by multiple power modules are completely consistent, that is, whether the pulse amplitude, pulse width, repetition frequency or pulse delay time are the same, this solution can be established.

[0039] 5. The multi-power source EUV light generation system provided in an embodiment of the present invention further includes a target material supply device, which is connected to the EUV light generator and provides target material to the EUV light generator to generate plasma.

[0040] It can be understood that the multi-power source extreme ultraviolet light generating system provided in this embodiment is also provided with a target material supply device for providing target material to the extreme ultraviolet light generator, that is, material that can generate plasma. When a current pulse is applied to the target material in the extreme ultraviolet light generator, plasma can be generated and further radiate extreme ultraviolet light.

[0041] Through this design, the target material in the EUV generator can be maintained at a certain level, preventing the target material in the EUV generator from being gradually consumed due to the radiation of EUV light, resulting in a scarcity of target material in the EUV generator, thereby reducing the output of EUV light.

[0042] 6. The extreme ultraviolet light generator provided in the embodiment of the present invention is a pinch device, a gas discharge plasma device and / or a laser discharge plasma device.

[0043] It is understandable that plasma generally uses strong pulses or lasers to convert the substrate material into plasma, and then the plasma radiates to generate extreme ultraviolet light. The design key point of the multi-power extreme ultraviolet light generation system provided in this embodiment is to increase the repetition frequency of current pulses by combining multiple power modules, thereby increasing the radiation frequency of extreme ultraviolet light in the extreme ultraviolet light generator. Therefore, as long as the extreme ultraviolet light generating device requires current pulses in the plasma conversion process, such as an electrodeless pinch device, an electroded gas discharge plasma device, or a laser discharge plasma device, it can be powered by the power supply device provided in this embodiment, and the high current pulse repetition frequency of the power supply device can improve the conversion efficiency of extreme ultraviolet light.

[0044] Through this design, the multi-power source extreme ultraviolet light generation system provided in this embodiment can be applied to more types of extreme ultraviolet light radiation devices, thereby improving the compatibility and market competitiveness of the system.

[0045] 7. An embodiment of the present invention provides a multi-power source extreme ultraviolet light generation method, which can be performed by any of the multi-power source extreme ultraviolet light generation systems described above, and the method includes the following steps:

[0046] Providing target materials to the EUV generator;

[0047] The delay device controls multiple power modules to continuously release current pulses to act on the target material according to the preset delay time to obtain extreme ultraviolet light.

[0048] It is understandable that the current pulse acting on the target material can ionize it to form plasma and radiate extreme ultraviolet light, but for a single power module, each current pulse requires a certain amount of time to generate. The delay device controls multiple power modules to release current pulses on the target material in a regular and sequential manner according to a specific delay time. For the target material, this operation increases the repetition frequency of the current pulses acting on the target material. From this perspective, the repetition frequency of the current pulses is ultimately increased.

[0049] By using this method, the current pulses generated by the discharge of multiple power modules are combined, so that the release frequency of the current pulses is effectively improved.

[0050] 8. The delay device provided in an embodiment of the present invention controls multiple power modules to continuously release current pulses according to a preset delay time, comprising the following steps:

[0051] Provides preset delay time for each power module;

[0052] The corresponding power module is started to release the current pulse according to the preset delay time.

[0053] It can be understood that by obtaining the preset delay time of the power module, the current pulses generated by the discharge of the power module are combined in time, and the corresponding power module is further controlled to start working based on the preset delay time of the power module, so that the power supply device finally releases current pulses at a higher discharge frequency to act on the target material, so as to improve the efficiency of radiating extreme ultraviolet light.

[0054] 9. The current pulse provided in the embodiment of the present invention acts on the target material, comprising the following steps:

[0055] The power supply device releases a pre-current pulse to act on the target material to form an initial plasma;

[0056] The power supply device releases a main current pulse to act on the initial plasma to obtain extreme ultraviolet light.

[0057] It can be understood that a pre-current pulse with a lower peak value is first used to act on the target material to ionize it to form an initial plasma that is more easily broken down, so that the main current pulse can effectively radiate extreme ultraviolet light after discharge, thereby improving the conversion efficiency of the target material.

Brief Description of the Drawings

[0058] Figure 1 This is a structural diagram of a multi-power source extreme ultraviolet light generation system provided by the first embodiment of the present invention.

[0059] Figure 2 This is a structural diagram of a power supply module in a multi-power EUV light generation system provided by the first embodiment of the present invention.

[0060] Figure 3 This is a structural principle diagram of the z-pinch process occurring in an EUV light generator in a multi-power EUV light generation system provided by the first embodiment of the present invention.

[0061] Figure 4 This is a flowchart of the steps of a multi-power source extreme ultraviolet light generation method provided by the second embodiment of the present invention.

[0062] Figure 5 This is a flow chart of the steps for continuously releasing current pulses in a multi-power source extreme ultraviolet light generation method provided in the second embodiment.

[0063] Figure 6This is a flow chart of the steps of applying current pulses to a target material in a multi-power source extreme ultraviolet light generation method provided in the second embodiment.

[0064] Figure 7 This is a principle diagram of the timing superposition of power supply electrical pulses with different pulse widths in a multi-power supply extreme ultraviolet light generation system provided by the first embodiment of the present invention.

[0065] Figure 8 This is a timing diagram of the sequential superposition of power supply electric pulses with different pulse widths acting on a target material in a multi-power supply extreme ultraviolet light generation system provided by the first embodiment of the present invention.

[0066] Figure 9 This is a principle diagram of the timing superposition effect of power supply electric pulses of different amplitudes in a multi-power supply extreme ultraviolet light generation system provided by the first embodiment of the present invention.

[0067] Figure 10 This is a timing diagram of the sequential superposition of power supply electric pulses of different amplitudes acting on a target material in a multi-power supply extreme ultraviolet light generation system provided by the first embodiment of the present invention.

[0068] Figure 11 This is a principle diagram of the timing superposition effect of power supply electrical pulses with different repetition frequencies in a multi-power supply extreme ultraviolet light generation system provided by the first embodiment of the present invention.

[0069] Figure 12 This is a timing diagram of the sequential superposition of power supply electric pulses with different repetition frequencies acting on a target material in a multi-power supply extreme ultraviolet light generation system provided by the first embodiment of the present invention.

[0070] Figure 13 This is a timing diagram of complete overlap of electrical pulses generated by two power supplies in a multi-power EUV light generation system provided by the first embodiment of the present invention.

[0071] Figure 14 This is a timing diagram of partial overlap of electrical pulses generated by two power supplies in a multi-power EUV light generation system provided by the first embodiment of the present invention.

[0072] Figure 15 This is a timing diagram of non-overlapping electrical pulses generated by two power supplies in a multi-power EUV light generation system provided by the first embodiment of the present invention.

[0073] Description of the accompanying drawings:

[0074] 1. Multi-power source extreme ultraviolet light generation system;

[0075] 11. Extreme ultraviolet light generator; 111. Magnetic core; 112. Plasma ring; 113. Plasma; 12. Power supply device; 121. Power module; 1211. Charge and discharge module; 1212. Compression module; 1213. Circuit; 13. Delay device; 14. Target material supply device. [Specific implementation method]

[0076] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention will be further described in detail below with reference to the accompanying drawings and implementation examples. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0077] In the embodiments provided herein, it should be understood that "B corresponding to A" means that B is associated with A and B can be determined based on A. However, it should also be understood that determining B based on A does not mean determining B based solely on A; B can also be determined based on A and / or other information.

[0078] It should be understood that references to "one embodiment" or "an embodiment" throughout this specification mean that specific features, structures, or characteristics associated with the embodiment are included in at least one embodiment of the present invention. Therefore, the appearance of "in one embodiment" or "in an embodiment" throughout this specification does not necessarily refer to the same embodiment. Furthermore, these specific features, structures, or characteristics may be combined in any suitable manner in one or more embodiments. Those skilled in the art should also be aware that the embodiments described in this specification are all optional embodiments, and the actions and modules involved are not necessarily required for the present invention.

[0079] In various embodiments of the present invention, it should be understood that the size of the serial numbers of the above-mentioned processes does not necessarily mean the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present invention.

[0080] The flow charts and block diagrams in the accompanying drawings of the present invention illustrate the possible implementation architecture, functions and operations of the system, method and computer program product according to various embodiments of the present application. In this regard, each box in the flow chart or block diagram can represent a module, program segment or a part of code, and the module, program segment or a part of code contains one or more executable instructions for realizing the specified logical function. It should also be noted that in some alternative implementation schemes, the functions marked in the box can also occur in a different order than those marked in the accompanying drawings. For example, two boxes represented in succession can actually be executed substantially in parallel, and they can sometimes be executed in the opposite order, which is determined based on the functions involved. It should be noted that each box in the block diagram and / or flow chart, and the combination of the boxes in the block diagram and / or flow chart can be implemented by a dedicated hardware-based system that performs the specified function or operation, or can be implemented by a combination of dedicated hardware and computer instructions.

[0081] EUV, extreme ultraviolet light, also known as extreme ultraviolet radiation, refers to electromagnetic radiation with wavelengths ranging from 121 nanometers to 10 nanometers in the electromagnetic spectrum.

[0082] Z pinch, also known as Z-Pinch, is the self-pinch effect formed in the radial direction (R direction) by the Lorentz force generated by the strong axial current (Z direction) of the plasma.

[0083] Laser-Produced Plasma (LPP) is a process in which a high-power laser beam is applied to a target material, generating a high-temperature, high-density plasma that radiates extreme ultraviolet light. LPP operates in two broad modes: one in which a pre-pulse is applied to a liquid tin target to shape it into the desired shape, followed by a main pulse to generate a high-temperature, high-density plasma that radiates extreme ultraviolet light; the other in which a pre-pulse initially ionizes the target material to produce an initial plasma, followed by a main pulse to generate a high-temperature, high-density plasma that radiates extreme ultraviolet light.

[0084] DPP (Discharge Produced Plasma), a gas discharge plasma, is a technical solution that directly converts electrical energy into plasma energy. Its basic physical process is: a current pulse acts on the target material to generate a columnar plasma. The columnar plasma generates a toroidal magnetic field under the action of the current, and then pinches toward the axis under the action of the magnetic field. When the plasma pinches, the ions and electrons in the plasma collide with each other to produce a high-temperature, high-density plasma, which then radiates extreme ultraviolet light.

[0085] LDP (Laser-Assisted Discharge Produced Plasma), laser-assisted discharge plasma, is a method for obtaining extreme ultraviolet light sources. It is equivalent to a combination of LPP and DPP. The basic physical process is: using a laser beam to act on the target material to generate an initial plasma, and then using an electric pulse to act on the initial plasma to produce a high-temperature, high-density plasma, which then radiates extreme ultraviolet light.

[0086] See also Figure 1 The first embodiment of the present invention provides a multi-power source extreme ultraviolet light generation system 1, the multi-power source extreme ultraviolet light generation system 1 includes: an extreme ultraviolet light generator 11, a power supply device 12 and a delay device 13;

[0087] The power supply device 12 is electrically connected to the extreme ultraviolet light generator 11, and when the power supply device 12 is working, it applies a current pulse to the extreme ultraviolet light generator 11 so that the extreme ultraviolet light generator 11 radiates extreme ultraviolet light; the power supply device 12 includes multiple power modules 121, each power module 121 separately generates a current pulse for radiating extreme ultraviolet light; the delay device 13 is controlled and connected to the power supply device 12, and is used to control the operation of the multiple power modules 121.

[0088] It should be noted that a commercial LPP source, using a 50kHz repetition rate and 21.5kW laser, can produce 250W of stable EUV light. In contrast, a commercial DPP source uses electrical pulses with a repetition rate of 7kHz, a peak current of 20-50kA, and a pulse duration of approximately 100-200ns to produce only 10W of EUV light output. In terms of conversion efficiency, LPP has a higher conversion efficiency because it requires a process from electricity to laser to EUV light, while DPP directly converts electricity to EUV light. However, with existing technologies, DPP's output power is lower than LPP's. The primary factor contributing to this phenomenon is the lower repetition rate of the current pulses used in DPP sources.

[0089] Understandably, DPP compresses and amplifies current pulses by designing circuits. The frequency of these current pulses is also determined by the circuit itself and is limited by the speed of the "switches" in the circuit. Therefore, it is very difficult to increase the repetition frequency of current pulses from a few kHz to tens of kHz from a design perspective.

[0090] The multi-power source extreme ultraviolet light generation system 1 provided in this embodiment includes an extreme ultraviolet light generator 11, a power supply device 12 and a delay device 13, wherein a plurality of power modules 121 are arranged in parallel in the power supply device 12, and each power module 121 has the function of independently applying a current pulse to the extreme ultraviolet light generator 11 to act on its internal target material and cause it to radiate extreme ultraviolet light. The power supply device 12 multiplexes multiple power modules 121 of several kHz, and controls the repetition frequency of the output current pulse by controlling the discharge delay time between two power modules 121, thereby improving the power and brightness of the extreme ultraviolet light radiation.

[0091] Furthermore, the delay device 13 is used to control the discharge start time of each power module in the power supply device 12. It should be understood that the delay device 13 is essentially a control system, or a fast switching system, which is used to start the power module 121. The delay device 13 controls the release time of multiple power modules to release current pulses, that is, to start multiple power modules 121 in a certain order, so that the current pulses generated by the multiple power modules 121 are delayed with each other, thereby increasing the repetition frequency of the current pulses.

[0092] Furthermore, the current pulses generated by different power modules are the same or different.

[0093] In a feasible embodiment, the current pulses generated by each power module 121 are completely consistent, that is, the amplitude, pulse width, frequency, etc. are all the same. In other words, a plurality of identical power modules 121 are arranged in the power supply device 12, and each power module can independently generate a current pulse to act on the target material, ionizing it to generate plasma and thereby radiating extreme ultraviolet light.

[0094] Since the time and frequency of the current pulses generated by all power modules 121 are the same, when the delay device 13 controls each power module 121 to start in sequence with a certain delay time, the power supply device 12 will continuously generate current pulses with the delay time as the interval, that is, the repetition frequency of the current pulses released by the power supply device 12 is greatly improved.

[0095] It can be understood that, assuming that a power module 121 can generate a current pulse every 10 seconds, then 10 power modules 121 are set in parallel on the power supply device 12, and the delay device 13 is used to control these 10 power modules 121 to start the power modules 121 in sequence with a delay of 1 second between adjacent ones. Then, a current pulse will be generated every second between the 10th second and the 20th second, that is, the power supply device 12 can generate a current pulse every second at this time. Compared with a single power module 121, the repetition frequency of its current pulse is increased by 10 times.

[0096] In another feasible embodiment, different power modules 121 generate different current pulses, that is, their pulse amplitude, pulse width, pulse repetition frequency, and pulse delay time differ in one or more of them. It should be understood that the parameters of the current pulses generated by each power module 121 meet the minimum energy requirements for the EUV light generator 11 to trigger Z-pinch and radiate EUV light. Each current pulse acts on the target material to generate EUV light radiation. Increasing the peak value, pulse width, or repetition frequency of a single pulse will correspondingly increase parameters such as the average power and repetition frequency of the EUV light radiation.

[0097] Optionally, the solution of this embodiment is applicable to pulses of any shape, such as rectangular pulses, square wave pulses, trapezoidal wave pulses or sharp pulses, without too many restrictions, as long as the conditions for radiating extreme ultraviolet light are met.

[0098] For details, please refer to Figure 7-12 , current pulses with different pulse widths, amplitudes or repetition frequencies generated by different power modules 121 are applied to the target material with a certain delay time, that is, the target material plasma group is affected by the electric pulse generated by the second power module 121 in the interval between being affected by the pulse of the first power module 121. This can be equivalently regarded as increasing the frequency of the current pulse acting on the target material on the basis of a single power module 121, that is, increasing the radiation frequency of the extreme ultraviolet light.

[0099] Please also refer to Figure 13-15 It should be noted that when multiple power modules 121 simultaneously generate current pulses to act on the target material, based on the timing relationship between the pulses of different power modules 121, the pulses that finally enter the extreme ultraviolet light generator 11 may be in three situations: the multiple current pulses generated by different power modules 121 completely overlap, partially overlap, or do not overlap.

[0100] It can be understood that when multiple current pulses completely overlap, for the target material, when it is affected by the same electric pulses from different power sources at the same time, the plasma cluster will be compressed to a smaller size, thereby increasing the peak power of the radiated extreme ultraviolet light; when multiple current pulses partially overlap, for the target material, it is equivalent to being affected by an electric pulse with a larger pulse width value, which will be reflected in the fact that the duration of the Z pinch will be prolonged, the duration of the radiated extreme ultraviolet light will increase, and ultimately the average power of the extreme ultraviolet light will be increased; when multiple current pulses do not overlap, by controlling the delay time of the power module 121, the electric pulse of another power module 121 is filled in the gap between the electric pulses generated by the power module 121, which increases the repetition frequency of the electric pulses felt by the target material, ultimately reflecting the increase in the repetition frequency of the radiated extreme ultraviolet light.

[0101] From the perspective of the target material in the EUV light generator 11, when the current pulse generated by a single power module 121 acts on the target material, it corresponds to the radiation of EUV light. When multiple current pulses are delayed and combined, the operating frequency of the target material is improved, and thus the repetition frequency of the EUV light output in response is also improved, thereby improving the power and brightness of the EUV light radiation.

[0102] On the other hand, for the EUV generator 11, the increase in the repetition frequency of the current pulses applied thereto increases the efficiency of the target material's ionizing radiation output of EUV light. This means that the rate of generation and consumption of the various material components within the EUV generator 11 is accelerated. Consequently, the stability of the various components within the EUV generator 11 is significantly improved, and the dynamic balance of the plasma generation and consumption process within the EUV generator 11 is stabilized, which in turn improves the stability of the EUV light output to a certain extent.

[0103] It can be understood that by designing a combination of multiple power modules 121 and supplementing the delay control by the delay device 13, the repetition frequency of the current pulse acting on the target material in the EUV light generator 11 can be effectively increased, thereby increasing the radiation power and brightness of the EUV light.

[0104] Furthermore, in a possible embodiment, the EUV light generator 11 provided on the EUV light generating system 1 with multiple power sources is a pinch device, a gas discharge plasma device and / or a laser discharge plasma device.

[0105] It should be noted that EUV light is typically generated by converting a substrate material into a plasma using intense pulses or lasers, which is then radiated by the plasma to generate EUV light. In this embodiment, EUV light generator 11 is essentially a device capable of generating EUV light. Existing EUV light generating devices can be roughly divided into three categories: the first category uses discharge to generate plasma, such as an electrodeless pinch device or an electroded gas discharge plasma device; the second category uses laser-assisted discharge to generate plasma, such as an electroded laser discharge plasma device; and the third category uses laser-generated plasma devices.

[0106] With the exception of the LPP device, which generates EUV light by applying a high-power laser to a substrate material to form a high-density plasma, and which does not require current pulses, the other two types of EUV light generating devices require current pulses when radiating EUV light, and their EUV light generation efficiency is also affected by the frequency of the current pulses. Therefore, the EUV light generator 11 in the embodiment of the present invention can specifically be a device that requires power, such as an electrodeless pinch device, a gas discharge plasma device, or a laser discharge plasma device. After being electrically connected to the power supply device 12, it is applied with high-frequency current pulses by the power supply device 12 composed of multiple power modules 121, thereby improving the conversion efficiency of EUV light.

[0107] It can be understood that the EUV light generator 11 can be adapted to various types of EUV light generating devices, further improving the compatibility of the power supply device 12 and making the EUV light generating system 1 with multiple power sources more competitive in the market.

[0108] In particular, please also see Figure 3 The EUV light generator 11 of this embodiment specifically employs an electrodeless pinch device, and the target material therein is an inert gas, xenon. Since xenon is an inert gas and does not readily deposit at room temperature, using xenon as a target material for EUV light generation results in less debris contamination. It should be understood that, depending on the actual situation, the target material within the pinch device can also be argon, neon, or another target material capable of generating EUV light, and the specific choice can be made based on actual needs.

[0109] It should be noted that, in addition to being filled with xenon gas, the electrodeless pinching device is also provided with a magnetic core 111 with a coil wrapped around the periphery for generating a magnetic field. The electrodeless pinching device is used as an extreme ultraviolet light generator 11. The device uses the principle of electromagnetic induction to apply a pre-current pulse to the xenon gas to ionize it and form an initial plasma 113. During the main pulse operation, energy is also transferred to the xenon ions through the principle of electromagnetic induction, so that they are ionized and turned on to form a plasma ring 112. After the conduction, the plasma ring 112 carries current. The plasma 113 in the middle is pinched by the inward Lorentz force in the annular magnetic field generated by the current to produce a z-pinch effect, thereby generating a high-temperature and high-density plasma that radiates 13.5nm extreme ultraviolet light.

[0110] It should be understood that this "electrodeless" operating method, which utilizes the electromagnetic induction effect of a magnetic core structure to transmit current pulse energy to the target, can reduce debris contamination generated during the EUV radiation process compared to operating methods with electrodes. The pinch device generates EUV light through this electrodeless discharge method, fully utilizing the effect of the magnetic field to mitigate debris contamination within the device. This electrodeless approach directly avoids the plasma erosion problem associated with electrodes, thereby extending the device's service life.

[0111] It should be noted that the power supply device 12 provided in the present application is not only applicable to pinch devices with light debris contamination and no electrodes, but also applicable to pinch devices with electrodes or other extreme ultraviolet light generators that require current pulses.

[0112] Further, please also refer to Figure 2 The power module 121 includes a charging and discharging module 1211 and a compression module 1212 .

[0113] It should be noted that the EUV generator is powered by a power module 121, which includes a charge-discharge module 1211, a compression module 1212, and a circuit 1213. The charge-discharge module 1211 is used to charge and store energy in the circuit 1213 and enable the circuit 1213 to release electrical energy to generate current pulses. The compression module 1212 is used to compress and amplify the current pulses released by the circuit 1213, so that the final output current pulse has a higher peak current.

[0114] Specifically, the amount of energy stored by the charging and discharging module 1211 for the circuit 1213 determines the amount of energy of the current pulse ultimately generated by the circuit 1213; after completing the charging and energy storage, the circuit 1213 will release a current pulse under the action of the charging and discharging module 1211. The current pulse initially released by the circuit 1213 will first be processed by the compression module 1212. The compression module 1212 compresses and amplifies the current pulse so that the current pulse obtains a higher peak current before releasing the current pulse from the power module 121.

[0115] Through the design of the compression module 1212 , the power supply module 121 can release a current pulse with a higher peak current to act on the EUV light generator 11 , so as to better radiate EUV light.

[0116] Optionally, according to actual application requirements, the power module 121 can generate multi-level current pulses with different peak values ​​or other parameters.

[0117] Furthermore, the power module 121 can generate two-level current pulses with different current peak values.

[0118] It should be noted that the power module 121 has the ability to generate two-level current pulses, namely a pre-current pulse with a smaller peak current and a main current pulse with a larger peak current. It should be understood that the power module 121 will perform pre-current pulse discharge and main current pulse discharge in different time periods, and these two-level current pulses will have a certain buffer time during the release process, and the discharge process of the pre-current pulse and the main current pulse will be repeated continuously during the discharge process of the entire power module 121. By acting on target materials such as xenon through the two-level discharge method of pre-current pulse and main current pulse, the energy conversion efficiency can be effectively improved.

[0119] Optionally, the peak value of the pre-current pulse is in the range of 2kA-10kA, and the pulse width is 3us-10us; the peak value of the main pulse is about 15kA-40kA, and the pulse width is 100-200ns; and the delay time between the pre-current pulse and the main current pulse is 1us-20us.

[0120] Preferably, in this embodiment, the peak value of the pre-current pulse is 5kA-8kA, and the peak value of the main pulse is 25kA-30kA.

[0121] It can be understood that when the pre-current pulse acts on the EUV generator 11, it can ionize the target material in the EUV generator 11 to form an initial plasma, making it easier for the plasma ring to conduct, thereby improving the energy conversion efficiency and the stability of the EUV radiation.

[0122] Specifically, taking xenon as an example, the pre-current pulse acts on the xenon gas to cause it to be initially ionized, generating low-valence ions such as Xe+ and Xe2+. When the main current pulse discharges, these initial plasmas are conducted to form a plasma ring, and an induced current is generated under the electromagnetic induction effect in the extreme ultraviolet light generator 11. The current on the plasma ring flows through the plasma located in the center, generating a radially inward Lorentz force. The initial plasma is squeezed and pinched under the action of the Lorentz force, and the low-valence ions are stripped of their outer electrons due to collisions between particles to obtain high-valence Xe10+ ions. Xe10+ radiates 13.5nm extreme ultraviolet light due to energy level transitions.

[0123] Furthermore, the EUV light generating system 1 with multiple power supplies further includes a target material supply device 14 , which is connected to the EUV light generator 11 and provides target materials to the EUV light generator 11 to generate plasma.

[0124] It should be noted that the multi-power source EUV light generating system 1 provided in this embodiment is further provided with a target material supply device 14 connected to the EUV light generator 11, for supplying EUV light irradiated target materials to the EUV light generator 11. It should be understood that after the target materials in the EUV light generator 11 undergo multiple ionization and EUV light irradiation, their number concentration will gradually decrease, thereby affecting the conversion efficiency of the target materials.

[0125] Specifically, depending on the actual needs of the product, the target material supply device 14 can provide the target material to the extreme ultraviolet light generator 11, including but not limited to xenon, argon, neon, tin, germanium and other gases or solid materials, as long as they can radiate extreme ultraviolet light after ionization. The specific selection can be made according to actual conditions and no further restrictions are made here.

[0126] It can be understood that during the working process of the multi-power source extreme ultraviolet light generating system 1, the target material supply device 14 supplies the extreme ultraviolet light generator 11 to replenish the target material lost during the radiation of extreme ultraviolet light, so as to avoid the subsequent extreme ultraviolet light conversion efficiency being reduced due to excessive consumption of internal target material after the extreme ultraviolet light generator 11 generates extreme ultraviolet light.

[0127] Through the design of the target material supply device 14, the target material concentration in the EUV light generator 11 can be maintained at a level suitable for radiating EUV light, so that the conversion efficiency of the target material can be maintained at a high level; by replenishing the consumed target material for the EUV light generator 11 through the target material supply device 14, the state of each component system in the EUV light generator 11 can be maintained relatively stable, thereby improving the stability of the EUV light output.

[0128] For further information, see Figure 4 The second embodiment of the present invention further provides a multi-power source extreme ultraviolet light generation method, which can be performed by the multi-power source extreme ultraviolet light generation system 1 as described above. The multi-power source extreme ultraviolet light generation method includes the following steps:

[0129] Step S1: providing a target material to the EUV light generator 11;

[0130] Step S2: the delay device 13 controls the multiple power modules 121 to continuously release current pulses to act on the target material according to a preset delay time, so as to obtain extreme ultraviolet light.

[0131] It should be noted that the target material is a base material that radiates extreme ultraviolet light, so the multi-power source extreme ultraviolet light generation system 1 needs to input a certain amount of target material into the extreme ultraviolet light generator 11 in the early stage of starting operation.

[0132] It can be understood that step S1 is equivalent to the preparatory step of step S2. When step S1 completes the filling of the target material and provides the basic material for extreme ultraviolet radiation, step S1 can be performed to control the power module 121 through the delay device 13 to generate a current pulse acting on the target material, thereby radiating extreme ultraviolet light.

[0133] Specifically, the delay device 13 combines the discharges of multiple power modules 121 on the time axis by controlling the delay time of discharge between the power modules 121, that is, the order of starting discharge is sorted and combined. As long as the delay time between the start of work of two adjacent power modules 121 is controlled so that they all maintain the same preset delay time, the time for the power module 121 to discharge and generate current pulses can be combined, so that the power supply device 12 composed of N power modules 121 can act on the target material at N times the discharge frequency, causing ionization and then radiating extreme ultraviolet light; from the perspective of the target material, this operation increases the repetition frequency of the current pulses acting on the target material, and therefore, the repetition frequency of the corresponding target current pulses is increased.

[0134] It can be understood that by executing the above method steps, the current pulse repetition frequency is increased, thereby improving the conversion efficiency of the target material.

[0135] Further, please also refer to Figure 5 The delay device 13 controls the multiple power modules 121 to continuously release current pulses according to the preset delay time, and further includes the following steps:

[0136] Step S21: providing a preset delay time for each power module 121;

[0137] Step S22: starting the corresponding power module 121 to release the current pulse according to the preset delay time.

[0138] It should be noted that in order to control multiple power modules 121 to perform delayed discharge according to a preset process, it is first necessary to obtain the preset delay time of each power module 121, and then the delay device 13 starts the corresponding power module 121 according to the preset delay time, and finally makes the power module 121 work according to the preset mode to achieve the purpose of increasing the current pulse repetition frequency.

[0139] Specifically, the current pulse generated by each power module has the energy required to radiate EUV light. In other words, each current pulse acting on the target can trigger Z-pinch and radiate EUV light.

[0140] It should be further explained that if the discharge delay time control between the power modules 121 is unstable or inaccurate, resulting in the current pulses ultimately acting on the target material being distinguishable single high-speed repetitive current pulses, it does not actually affect the use of the multi-power source extreme ultraviolet light generation system 1. It is just that at this time there may be overlapping parts of the current pulses, which will cause the generated current pulses to show an enhanced intermediate current peak and a wider pulse width, which is also beneficial for improving the extreme ultraviolet light radiation efficiency.

[0141] For further information, please also refer to Figure 6 , a current pulse is applied to the target, comprising the following steps:

[0142] Step S23: the power supply device 12 releases a pre-current pulse to act on the target material to form an initial plasma;

[0143] Step S24: the power supply device 12 releases a main current pulse to act on the initial plasma to obtain extreme ultraviolet light.

[0144] It should be noted that the pre-current pulse acts on the target material, causing it to be initially ionized to obtain an initial plasma. When the main current pulse discharges, the initial plasma will be conducted to form a plasma ring. The plasma in the central hole begins to pinch toward the axis under the action of the Lorentz force, generating a high-temperature, high-density plasma and radiating 13.5nm extreme ultraviolet light.

[0145] It can be understood that the role of the pre-current pulse is to pre-ionize the target material to form an initial plasma, making it easier for the plasma ring to be turned on when the main current pulse is discharged, and then radiate extreme ultraviolet light, which is beneficial to improving the energy conversion efficiency.

[0146] Compared with the prior art, the multi-power source extreme ultraviolet light generation system and method provided by the present invention has the following beneficial effects:

[0147] 1. An embodiment of the present invention provides a multi-power source extreme ultraviolet light generation system, comprising: an extreme ultraviolet light generator, a power supply device, and a delay device;

[0148] The power supply device is electrically connected to the extreme ultraviolet light generator and applies current pulses to the interior of the extreme ultraviolet light generator to radiate extreme ultraviolet light; the power supply device includes multiple power modules, each of which generates current pulses for radiating extreme ultraviolet light; the delay device is control-connected to the power supply device to control the operation of multiple power modules.

[0149] It can be understood that the power supply device of the multi-power extreme ultraviolet light generating system provided in this embodiment is provided with multiple power supply modules, and each power supply module has the function of applying electric pulses to the extreme ultraviolet light generator to generate extreme ultraviolet light; it should be understood that by setting a delay device to control the start time of releasing current pulses of multiple power supply modules, the time of releasing current pulses is made sequential, so that the start time of generating current pulses of each power supply module is different. Through the combination of multiple power supply modules, the repetition frequency of the current pulses finally generated and applied to the extreme ultraviolet light generator is improved, that is, the repetition frequency of the current pulses acting on the target material in the extreme ultraviolet light generator is improved, thereby improving the power and brightness of the extreme ultraviolet light radiation.

[0150] On the other hand, due to the increase in the repetition frequency of the current pulses applied to the EUV light generator, the dynamic balance between the generation and consumption of plasma in the EUV light generator is stabilized, that is, the stability of the states of various components in the EUV light generator is improved to a considerable extent, thereby improving the stability of the output EUV light.

[0151] Through this design, the repetition frequency of the current pulses acting on the target material in the extreme ultraviolet light generator can be effectively increased, thereby effectively improving the radiation power and brightness of the extreme ultraviolet light.

[0152] 2. The power module provided in the embodiment of the present invention includes a charging and discharging module and a compression module.

[0153] As can be understood, a single power module primarily consists of two modules: a charge-discharge module and a compression module. The charge-discharge module is primarily responsible for charging and storing energy in the circuits within the power module and controlling the circuits' release of energy to generate current pulses. Specifically, the amount of energy stored in the circuit by the charge-discharge module determines the amount of energy ultimately generated by the circuit's current pulses.

[0154] Furthermore, the compression module is mainly used to compress the current pulse released by the circuit to obtain a higher peak current. After the circuit completes charging and energy storage, it will release a current pulse under the action of the charging and discharging module. The released current pulse first passes through the compression module, and the current pulse is compressed by the compression module to obtain a higher peak current before being released from the power module.

[0155] Through this design, the power module can release current pulses with higher peak current to act on the extreme ultraviolet light generator, so as to better radiate extreme ultraviolet light.

[0156] 3. The power module provided in the embodiment of the present invention can generate two-level current pulses with different current peak values.

[0157] It can be understood that the power module has the ability to generate two-level current pulses, pre-current pulses and main current pulses. The current peak value of the pre-current pulse is relatively small. When it is applied to the extreme ultraviolet light generator, it can ionize the target material in the extreme ultraviolet light generator to form an initial plasma; the current peak value of the main current pulse is greater than the current peak value of the pre-current pulse. When the target material in the extreme ultraviolet light generator is ionized by the pre-current pulse to form an initial plasma, the main current pulse begins to discharge, and the initial plasma in the extreme ultraviolet light generator is pinched toward the axis under the action of the Lorentz force, that is, a z-pinch effect is generated, and a high-temperature and high-density plasma is obtained, thereby radiating extreme ultraviolet light.

[0158] Through this design, a pre-current pulse is used to ionize the target material in the extreme ultraviolet light generator to form an initial plasma that is more easily connected to the conductive layer plasma ring, effectively improving the conversion efficiency of the target material.

[0159] 4. The current pulses generated by different power modules provided in the embodiments of the present invention are the same or different.

[0160] It can be understood that there are multiple power modules in the power supply device, and each power module can generate current pulses independently. By controlling the working delay time between the power modules, the current pulses act on the target material periodically in turn to increase the frequency of the pulses acting on the target material. Specifically, whether the current pulses generated by multiple power modules are completely consistent, that is, whether the pulse amplitude, pulse width, repetition frequency or pulse delay time are the same, this solution can be established.

[0161] 5. The multi-power source EUV light generation system provided in an embodiment of the present invention further includes a target material supply device, which is connected to the EUV light generator and provides target material to the EUV light generator to generate plasma.

[0162] It can be understood that the multi-power source extreme ultraviolet light generating system provided in this embodiment is also provided with a target material supply device for providing target material to the extreme ultraviolet light generator, that is, material that can generate plasma. When a current pulse is applied to the target material in the extreme ultraviolet light generator, plasma can be generated and further radiate extreme ultraviolet light.

[0163] Through this design, the target material in the EUV generator can be maintained at a certain level, preventing the target material in the EUV generator from being gradually consumed due to the radiation of EUV light, resulting in a scarcity of target material in the EUV generator, thereby reducing the output of EUV light.

[0164] 6. The extreme ultraviolet light generator provided in the embodiment of the present invention is a pinch device, a gas discharge plasma device and / or a laser discharge plasma device.

[0165] It is understandable that plasma generally uses strong pulses or lasers to convert the substrate material into plasma, and then the plasma radiates to generate extreme ultraviolet light. The design key point of the multi-power extreme ultraviolet light generation system provided in this embodiment is to increase the repetition frequency of current pulses by combining multiple power modules, thereby increasing the radiation frequency of extreme ultraviolet light in the extreme ultraviolet light generator. Therefore, as long as the extreme ultraviolet light generating device requires current pulses in the plasma conversion process, such as an electrodeless pinch device, an electroded gas discharge plasma device, or a laser discharge plasma device, it can be powered by the power supply device provided in this embodiment, and the high current pulse repetition frequency of the power supply device can improve the conversion efficiency of extreme ultraviolet light.

[0166] Through this design, the multi-power source extreme ultraviolet light generation system provided in this embodiment can be applied to more types of extreme ultraviolet light radiation devices, thereby improving the compatibility and market competitiveness of the system.

[0167] 7. An embodiment of the present invention provides a multi-power source extreme ultraviolet light generation method, which can be performed by any of the multi-power source extreme ultraviolet light generation systems described above, and the method includes the following steps:

[0168] Providing target materials to the EUV generator;

[0169] The delay device controls multiple power modules to continuously release current pulses to act on the target material according to the preset delay time to obtain extreme ultraviolet light.

[0170] It is understandable that the current pulse acting on the target material can ionize it to form plasma and radiate extreme ultraviolet light, but for a single power module, each current pulse requires a certain amount of time to generate. The delay device controls multiple power modules to release current pulses on the target material in a regular and sequential manner according to a specific delay time. For the target material, this operation increases the repetition frequency of the current pulses acting on the target material. From this perspective, the repetition frequency of the current pulses is ultimately increased.

[0171] By using this method, the current pulses generated by the discharge of multiple power modules are combined, so that the release frequency of the current pulses is effectively improved.

[0172] 8. The delay device provided in an embodiment of the present invention controls multiple power modules to continuously release current pulses according to a preset delay time, comprising the following steps:

[0173] Provides preset delay time for each power module;

[0174] The corresponding power module is started to release the current pulse according to the preset delay time.

[0175] It can be understood that by obtaining the preset delay time of the power module, the current pulses generated by the discharge of the power module are combined in time, and the corresponding power module is further controlled to start working based on the preset delay time of the power module, so that the power supply device finally releases current pulses at a higher discharge frequency to act on the target material, so as to improve the efficiency of radiating extreme ultraviolet light.

[0176] 9. The current pulse provided in the embodiment of the present invention acts on the target material, comprising the following steps:

[0177] The power supply device releases a pre-current pulse to act on the target material to form an initial plasma;

[0178] The power supply device releases a main current pulse to act on the initial plasma to obtain extreme ultraviolet light.

[0179] It can be understood that a pre-current pulse with a lower peak value is first used to act on the target material to ionize it to form an initial plasma that is more easily broken down, so that the main current pulse can effectively radiate extreme ultraviolet light after discharge, thereby improving the conversion efficiency of the target material.

[0180] The above is a detailed introduction to a multi-power extreme ultraviolet light generation system and method disclosed in an embodiment of the present invention. Specific examples are used in this article to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only used to help understand the method of the present invention and its core idea; at the same time, for those skilled in the art, based on the ideas of the present invention, there will be changes in the specific implementation methods and application scopes. In summary, the content of this specification should not be understood as a limitation on the present invention. Any modifications, equivalent replacements and improvements made within the principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A multi-power source extreme ultraviolet light generation system, characterized in that: The multi-power source extreme ultraviolet light generation system includes: an extreme ultraviolet light generator, a power supply device and a delay device; The power supply device is electrically connected to the extreme ultraviolet light generator and applies current pulses to the interior of the extreme ultraviolet light generator to radiate extreme ultraviolet light; the power supply device includes multiple power modules, each of which generates current pulses for radiating extreme ultraviolet light; the delay device is control-connected to the power supply device to control the operation of multiple power modules.

2. The EUV light generation system with multiple power sources according to claim 1, wherein: The power supply module includes a charging and discharging module and a compression module.

3. The EUV light generation system with multiple power sources according to claim 1, wherein: The power supply module can generate two-level current pulses with different current peak values.

4. The EUV light generation system with multiple power sources according to claim 1, wherein: The current pulses generated by different power modules are the same or different.

5. The EUV light generation system with multiple power sources according to claim 1, wherein: The multi-power source extreme ultraviolet light generating system further includes a target material supply device, which is in communication with the extreme ultraviolet light generator and provides target material to the extreme ultraviolet light generator to generate plasma.

6. The EUV light generation system with multiple power sources according to claim 1, wherein: The extreme ultraviolet light generator is a pinch device, a gas discharge plasma device and / or a laser discharge plasma device.

7. A multi-power source extreme ultraviolet light generation method, which can be performed by the multi-power source extreme ultraviolet light generation system according to any one of claims 1 to 6, characterized in that: The method comprises the following steps: Providing target materials to the EUV generator; The delay device controls multiple power modules to continuously release current pulses to the target material according to the preset delay time to obtain extreme ultraviolet light.

8. The method for generating EUV light with multiple power sources according to claim 7, wherein: The delay device controls multiple power modules to continuously release current pulses according to a preset delay time, including the following steps: Provides preset delay time for each power module; The corresponding power module is started to release the current pulse according to the preset delay time.

9. The EUV light generation method using multiple power sources according to claim 7, wherein: The current pulse generated by each power module has the energy required to radiate extreme ultraviolet light.

10. The method for generating EUV light with multiple power sources according to claim 7, wherein: The current pulse is applied to the target, which includes the following steps: The power supply device releases a pre-current pulse to act on the target material to form an initial plasma; The power supply device releases a main current pulse to act on the initial plasma to obtain extreme ultraviolet light.

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