Display panel, preparation method thereof and display device
By setting an anti-reflection layer on the side of the first electrode of the OLED display panel away from the array substrate, the problem of high reflectivity of the display panel under natural light is solved, thus improving the display effect.
Patent Information
- Application Number
- CN202511065332.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-30
- Publication Date
- 2025-12-12
- Estimated Expiration
- 2045-07-30
AI Technical Summary
Existing OLED display panels have high reflectivity under natural light, resulting in poor display quality, especially in strong light environments where contrast is reduced and color distortion occurs.
An anti-reflection layer is provided on the side of the first electrode of the display panel that is away from the array substrate, so that its orthogonal projection covers part of the non-light-emitting area, thereby reducing the reflectivity.
It effectively reduces the reflection of the display panel under natural light, thus improving the display effect.
Smart Images

Figure CN120583868B_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application relates to the technical field of display, in particular to a display panel, a preparation method thereof and a display device. BACKGROUND
[0002] Organic light emitting diode (OLED) display technology is considered as the most potential new flat panel display technology in the next generation. Compared with liquid crystal display technology, OLED display technology has the advantages of low energy consumption, low cost, self-luminous, wide viewing angle and fast response speed.
[0003] In the preparation process of a traditional display panel, a fine metal mask (FMM) is usually used to realize the patterning of a light-emitting pixel. The FMM technology is mature and has rich mass production experience. However, the FMM technology also has the problems of limited precision, high development cost and long development cycle. The fine metal mask-free technology eliminates the limitations of the traditional OLED process on the size, resolution and other performance of the display screen, and has the advantages of high performance, full-size and agile delivery. The patents CN118251982A, CN115666161A, CN116648095A, CN117062489A, CN118678742A, CN118785761A, CN115224220A, CN118678729A, CN118660529A and CN118660589A disclose the related content of the fine metal mask-free technology, which are referred to.
[0004] However, the current OLED display panel still has the problem of poor display effect. SUMMARY
[0005] Therefore, it is necessary to provide a display panel, a preparation method thereof and a display device capable of improving the above problems.
[0006] In a first aspect, an embodiment of the present application provides a display panel, comprising:
[0007] an array substrate;
[0008] a pixel definition layer arranged on one side of the array substrate, the pixel definition layer enclosing a plurality of pixel openings;
[0009] an isolation structure arranged on one side of the pixel definition layer and enclosing a plurality of isolation openings, the plurality of isolation openings being in communication with the plurality of pixel openings in correspondence;
[0010] a plurality of light emitting devices disposed on one side of the array substrate and arranged corresponding to the plurality of pixel openings; at least part of the light emitting devices is disposed in the corresponding pixel opening; the light emitting device comprises a first electrode; the first electrode comprises a first part and a second part arranged around the first part; the second part of the first electrode is disposed between the pixel defining layer and the array substrate, and the orthogonal projection of the pixel opening on the array substrate covers the orthogonal projection of the first part of the corresponding light emitting device on the array substrate; the orthogonal projection of the second part on the array substrate does not overlap with the orthogonal projection of the isolation structure on the array substrate;
[0011] a plurality of anti-reflection layers arranged corresponding to the first electrode of the plurality of light emitting devices; the anti-reflection layer is disposed on the side of the corresponding first electrode away from the array substrate; the orthogonal projection of the anti-reflection layer on the array substrate covers at least part of the orthogonal projection of the second part on the array substrate.
[0012] In one of the embodiments, the anti-reflection layer is located between the pixel defining layer and the first electrode;
[0013] Optionally, the material of at least part of the anti-reflection layer is a conductive film layer;
[0014] Optionally, the material of the anti-reflection layer includes at least one of molybdenum, tantalum, titanium, chromium, and iron;
[0015] Optionally, the material of at least part of the anti-reflection layer is an insulating film layer; the material of the anti-reflection layer includes at least one of aluminum oxide, titanium oxide, silicon oxide, magnesium oxide, calcium carbonate, zirconium oxide, and magnesium fluoride.
[0016] In one of the embodiments, the orthogonal projection outer contour of the anti-reflection layer on the array substrate is located at the periphery of the orthogonal projection outer contour of the corresponding first electrode on the array substrate;
[0017] Optionally, in the circumferential direction of the anti-reflection layer, the distance between the orthogonal projection outer contour of the anti-reflection layer on the array substrate and the orthogonal projection outer contour of the corresponding first electrode on the array substrate is equal.
[0018] In one of the embodiments, the anti-reflection layer is located on the side of the pixel defining layer away from the array substrate.
[0019] In one of the embodiments, the anti-reflection layer is arranged in contact with the pixel defining layer;
[0020] Optionally, the material of at least part of the anti-reflection layer is an insulating film layer;
[0021] Optionally, the material of the anti-reflective layer comprises at least one of aluminum oxide, titanium oxide, silicon oxide, magnesium oxide, calcium carbonate, zirconium oxide, and magnesium fluoride.
[0022] In one of the embodiments, the display panel further comprises a plurality of encapsulation portions corresponding to the plurality of light emitting devices, the encapsulation portion is arranged on the side of the corresponding light emitting device away from the array substrate;
[0023] The anti-reflective layer is arranged on the side of the encapsulation portion away from the array substrate;
[0024] Optionally, the anti-reflective layer is in contact with the encapsulation portion;
[0025] Optionally, the material of at least part of the anti-reflective layer is a conductive film layer;
[0026] Optionally, the material of the anti-reflective layer comprises at least one of molybdenum, tantalum, titanium, chromium, and iron;
[0027] Optionally, the material of at least part of the anti-reflective layer is an insulating film layer;
[0028] Optionally, the material of the anti-reflective layer comprises at least one of aluminum oxide, titanium oxide, silicon oxide, magnesium oxide, calcium carbonate, zirconium oxide, and magnesium fluoride.
[0029] In one of the embodiments, the display panel further comprises a color filter layer, the color filter layer comprises a plurality of light filtering portions corresponding to the plurality of light emitting devices, the light filtering portion is arranged on the side of the corresponding light emitting device away from the array substrate;
[0030] The orthographic projection of the light filtering portion on the array substrate covers at least part of the orthographic projection of the corresponding anti-reflective layer on the array substrate;
[0031] Optionally, the color filter layer further comprises a light shielding portion, the light shielding portion encloses a plurality of light transmission openings, the plurality of light transmission openings are arranged corresponding to the plurality of light filtering portions, and at least part of each light filtering portion is arranged in the corresponding light transmission opening;
[0032] Optionally, the orthographic projection of the light shielding portion on the array substrate intersects and overlaps the orthographic projection of the isolation structure on the array substrate;
[0033] Optionally, the orthographic projection of the light shielding portion on the array substrate covers the orthographic projection of the isolation structure on the array substrate.
[0034] In one of the embodiments, the display panel further comprises:
[0035] a plurality of encapsulation portions corresponding to the plurality of light emitting devices, the encapsulation portions being disposed away from the array substrate side of the corresponding light emitting devices; and
[0036] a first encapsulation layer disposed away from the array substrate side of the color filter layer;
[0037] a second encapsulation layer disposed away from the array substrate side of the first encapsulation layer;
[0038] Optionally, part of the light shielding portions is located between the encapsulation portions and the isolation structures.
[0039] Optionally, the isolation structures include first isolation portions and second isolation portions stacked in a direction away from the array substrate, and a projection of the second isolation portions on the array substrate is located outside a projection of the first isolation portions on the array substrate.
[0040] In one of the embodiments, a projection of the anti-reflection layer on the array substrate surrounds a projection of the first portion on the array substrate.
[0041] Optionally, a projection of the anti-reflection layer on the array substrate does not overlap with a projection of the first portion on the array substrate.
[0042] Optionally, a projection of the anti-reflection layer on the array substrate is in contact with a projection of the first portion on the array substrate.
[0043] In one of the embodiments, the anti-reflection layer has a reflectivity less than or equal to 50%.
[0044] In a second aspect, the embodiments of the present application provide a display panel, comprising:
[0045] an array substrate;
[0046] a pixel definition layer disposed on one side of the array substrate, the pixel definition layer enclosing a plurality of pixel openings;
[0047] a plurality of light emitting devices disposed on one side of the array substrate and corresponding to the plurality of pixel openings, at least part of the light emitting devices being disposed in the corresponding pixel openings; the light emitting devices including a first electrode; the first electrode including a first portion and a second portion surrounding the first portion; the second portion of the first electrode being disposed between the pixel definition layer and the array substrate, and a projection of the pixel opening on the array substrate covering a projection of the first portion of the corresponding light emitting device on the array substrate.
[0048] A plurality of anti-reflective layers are arranged corresponding to the first electrodes of the plurality of light emitting devices; the anti-reflective layer is arranged on the side of the corresponding first electrode away from the array substrate; the orthographic projection of the anti-reflective layer on the array substrate covers at least part of the orthographic projection of the second part on the array substrate.
[0049] In one of the embodiments, the display panel further comprises a color filter layer, the color filter layer comprises a plurality of filter parts arranged corresponding to the plurality of light emitting devices, the filter part is arranged on the side of the corresponding light emitting device away from the array substrate;
[0050] The orthographic projection of the filter part on the array substrate covers at least part of the orthographic projection of the corresponding anti-reflective layer on the array substrate;
[0051] Optionally, the color filter layer further comprises a light shielding part, the light shielding part encloses to form a plurality of light transmission ports, the plurality of light transmission ports are arranged corresponding to the plurality of filter parts, and at least part of each filter part is arranged in the corresponding light transmission port.
[0052] In one of the embodiments, the anti-reflective layer is located between the pixel defining layer and the first electrode;
[0053] Optionally, the material of the anti-reflective layer is a conductive film layer or an insulating film layer;
[0054] Optionally, the material of the anti-reflective layer comprises at least one of molybdenum, tantalum, titanium, chromium and iron.
[0055] In a third aspect, the embodiments of the present application provide a preparation method of a display panel, comprising:
[0056] Providing an array substrate;
[0057] Forming a plurality of first electrodes on one side of the array substrate;
[0058] forming a pixel defining layer, an isolation structure, a plurality of anti-reflective layers and a plurality of light emitting devices on a side of the array substrate; the pixel defining layer encloses a plurality of pixel openings; the isolation structure encloses a plurality of isolation openings; the plurality of isolation openings correspondingly communicate with the plurality of pixel openings; the plurality of light emitting devices are correspondingly arranged with the plurality of pixel openings; at least part of the light emitting device is arranged in the corresponding pixel opening; the light emitting device comprises the first electrode; the first electrode comprises a first part and a second part arranged around the first part; the second part of the first electrode is arranged between the pixel defining layer and the array substrate, and the orthographic projection of the pixel opening on the array substrate covers the orthographic projection of the first part of the corresponding light emitting device on the array substrate; the orthographic projection of the second part on the array substrate does not overlap with the orthographic projection of the isolation structure on the array substrate; the plurality of anti-reflective layers are correspondingly arranged with the first electrode of the plurality of light emitting devices; the anti-reflective layer is arranged on the side of the corresponding first electrode away from the array substrate; the orthographic projection of the anti-reflective layer on the array substrate covers at least part of the orthographic projection of the second part on the array substrate.
[0059] In one of the embodiments, the step of forming a plurality of first electrodes on a side of the array substrate comprises:
[0060] forming a first electrode material layer on a side of the array substrate;
[0061] forming an anti-reflective material layer on a side of the first electrode material layer away from the array substrate;
[0062] performing a patterning process on the first electrode material layer and the anti-reflective material layer based on a first mask to obtain the plurality of first electrodes and a plurality of initial anti-reflective layers.
[0063] In one of the embodiments, the step of forming a pixel defining layer, an isolation structure, a plurality of anti-reflective layers and a plurality of light emitting devices on a side of the array substrate comprises:
[0064] forming a pixel defining material layer on a side of the array substrate; the pixel defining material layer covers the initial anti-reflective layer and the region between adjacent initial anti-reflective layers;
[0065] forming an isolation material layer on a side of the pixel defining material layer away from the array substrate;
[0066] performing a patterning process on the isolation material layer to form the isolation structure;
[0067] performing a patterning process on the pixel defining material layer to form the pixel defining layer;
[0068] The initial anti-reflective layer exposed to the pixel opening is etched to form the anti-reflective layer.
[0069] In one of the embodiments, in the step of etching the initial anti-reflective layer exposed to the pixel opening to form the anti-reflective layer, the etching process has a higher etching rate on the initial anti-reflective layer than on the first electrode.
[0070] In a fourth aspect, the embodiments of the present application provide a display device, including the display panel in any of the embodiments of the first aspect and the second aspect.
[0071] The display panel, the manufacturing method thereof and the display device, the first electrode in the light-emitting region is the first part, the first electrode in the non-light-emitting region and without overlapping with the isolation structure is the second part, by setting the anti-reflective layer on the side of the first electrode away from the array substrate, the orthographic projection of the anti-reflective layer covers at least part of the orthographic projection of the second part. In this way, the anti-reflective layer can reduce the reflectivity of the region where the second part is located, and when the external natural light irradiates the display panel, the anti-reflective layer can weaken the reflection phenomenon, thereby improving the display effect. BRIEF DESCRIPTION OF DRAWINGS
[0072] In order to more clearly illustrate the technical solutions in the embodiments or the example embodiments of the present application, the drawings needed to be used in the description of the embodiments or the example embodiments will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without any creative effort on the basis of these drawings.
[0073] Figure 1 A cross-sectional structure schematic diagram of a display panel provided by an embodiment of the present application.
[0074] Figure 2 A planar structure schematic diagram of the first electrode of the display panel shown in FIG. 1. Figure 1
[0075] A planar structure schematic diagram of the first electrode and the anti-reflective layer of the display panel shown in FIG. 1. Figure 3 Figure 1 A cross-sectional structure schematic diagram of another display panel provided by an embodiment of the present application.
[0076] Figure 4 A cross-sectional structure schematic diagram of still another display panel provided by an embodiment of the present application.
[0077] Figure 5
[0078] Figure 6 A cross-sectional structure diagram of a display panel provided by an embodiment of the present application.
[0079] Figure 7 A cross-sectional structure diagram of an array substrate, a pixel defining layer and a first electrode provided by an embodiment of the present application.
[0080] Figure 8 An equivalent circuit diagram of a pixel driving circuit provided by an embodiment of the present application.
[0081] Figure 9 A film layer structure diagram of a light emitting layer group provided by an embodiment of the present application.
[0082] Figure 10 A flow diagram of a display panel manufacturing method provided by an embodiment of the present application.
[0083] Figure 11 A structure diagram of a first electrode and an initial anti-reflection layer after manufacturing provided by an embodiment of the present application.
[0084] Figure 12 A structure diagram of a pixel defining material layer after manufacturing provided by an embodiment of the present application.
[0085] Figure 13 A structure diagram of an isolation material layer after manufacturing provided by an embodiment of the present application.
[0086] Figure 14 A structure diagram of an isolation structure after manufacturing provided by an embodiment of the present application.
[0087] Figure 15 A structure diagram of a pixel defining layer after manufacturing provided by an embodiment of the present application.
[0088] Figure 16 A structure diagram of an anti-reflection layer after manufacturing provided by an embodiment of the present application.
[0089] Legend of reference signs:
[0090] 10, display panel; 11, array substrate; 111, planarization layer; 12, isolation structure; 12a, isolation opening; 121, first isolation part; 122, second isolation part; 13, light emitting device; 131, first electrode; 1311, first part; 1312, second part; 1313, third part; 132, light emitting layer group; 133, second electrode; 14, pixel defining layer; 14a, pixel opening; 15, anti-reflection layer; 16, encapsulation part; 17, color film layer; 171, light shielding part; 172, light filtering part; 181, first encapsulation layer; 182, second encapsulation layer; 19, transistor; 20, initial anti-reflection layer; 30, pixel defining material layer; 40, isolation material layer. Detailed Implementation
[0091] To facilitate understanding of this application, a more comprehensive description of this application will be provided below with reference to the accompanying drawings.
[0092] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the specification of this application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.
[0093] COE (Color Filter on Encapsulation) technology, as an emerging technology, is widely used in OLED display products. The core of COE technology lies in patterning BM (Black Matrix) and CF (Color Filter) layers on a TFE (Thin Film Encapsulation) layer. This structural design effectively reduces the power consumption of display devices, while simultaneously thinning the module and, to some extent, increasing the color gamut, thereby improving display performance and product competitiveness. However, despite the significant technological advantages of COE technology, some problems have emerged in practical applications that urgently need to be addressed. In particular, after removing the POL (Polarizer), the screen's reflectivity increases significantly when exposed to natural light. This high reflectivity leads to reduced contrast and color distortion, severely impacting the user's visual experience, especially under strong light conditions where the decline in display performance is more pronounced. Therefore, effectively reducing the screen's reflectivity under natural light has become a key technical challenge that COE technology for current display products urgently needs to overcome, requiring further technological innovation and improvement to optimize and enhance performance.
[0094] In view of the above problems, this application provides a display panel and its manufacturing method, as well as a display device. A first electrode located in the light-emitting area is a first part, and a first electrode located in the non-light-emitting area and not overlapping with the isolation structure is a second part. By providing an anti-reflection layer on the side of the first electrode away from the array substrate, the orthographic projection of the anti-reflection layer covers at least a portion of the orthographic projection of the second part. In this way, the anti-reflection layer can reduce the reflectivity of the area where the second part is located. When external natural light shines on the display panel of the display device, the anti-reflection layer can reduce the reflection phenomenon, thereby improving the display effect.
[0095] Firstly, referring to Figures 1-3As shown, the display panel 10 can be an organic light emitting diode display panel 10 (OLED) or a quantum dot light emitting diodes display panel 10 (QLED).
[0096] The display panel 10 includes an array substrate 11, a pixel defining layer 14, an isolation structure 12, a plurality of light emitting devices 13, and a plurality of anti-reflection layers 15. The pixel defining layer 14 is disposed on one side of the array substrate 11 and forms a plurality of pixel openings 14a. The isolation structure 12 is disposed on one side of the pixel defining layer 14 and forms a plurality of isolation openings 12a. The plurality of isolation openings 12a correspond to the plurality of pixel openings 14a. In one example, one isolation opening 12a corresponds to one pixel opening 14a. In another example, one isolation opening 12a corresponds to a plurality of pixel openings 14a.
[0097] Further, the plurality of light emitting devices 13 are disposed on one side of the array substrate 11 and correspond to the plurality of pixel openings 14a. At least part of the light emitting device 13 is disposed in the corresponding pixel opening 14a. The light emitting device 13 includes a first electrode 131. The first electrode 131 includes a first portion 1311 and a second portion 1312 disposed around the first portion 1311. The second portion 1312 of the first electrode 131 is disposed between the pixel defining layer 14 and the array substrate 11, and the pixel opening 14a exposes the first portion 1311 of the first electrode 131 of the corresponding light emitting device 13. In other words, the orthographic projection of the pixel opening 14a on the array substrate 11 covers the orthographic projection of the first portion 1311 of the first electrode 131 of the corresponding light emitting device 13 on the array substrate 11. The orthographic projection of the second portion 1312 on the array substrate 11 does not overlap with the orthographic projection of the isolation structure 12 on the array substrate 11.
[0098] The plurality of anti-reflection layers 15 correspond to the plurality of first electrodes 131 of the plurality of light emitting devices 13. In one example, one anti-reflection layer 15 corresponds to a plurality of first electrodes 131. In another example, one anti-reflection layer 15 corresponds to one first electrode 131. The anti-reflection layer 15 is disposed on the side of the corresponding first electrode 131 away from the array substrate 11. The orthographic projection of the anti-reflection layer 15 on the array substrate 11 covers at least part of the orthographic projection of the second portion 1312 on the array substrate 11.
[0099] Please refer to Figure 1 As shown, there is a reflection area FG in the display panel 10, the isolation structure 12 cannot cover the reflection area FG, and part of the first electrode 131 is located in the reflection area FG.
[0100] It should be noted that the isolation structure 12 refers to a structure capable of cutting off the light-emitting functional material of the adjacent light-emitting device 13 when the light-emitting functional material of the light-emitting device 13 is evaporated. By arranging the isolation structure 12, the light-emitting device 13 can adopt a photolithography process, thereby canceling the FMM and facilitating the improvement of PPI. Further, since the light-emitting device 13 is manufactured by using the photolithography process, compared with the display panel 10 in which the light-emitting device 13 is evaporated by using the FMM, the isolation structure 12 can make the shape of the light-emitting device 13 more abundant and the arrangement mode more optimized. In the embodiment of the present application, the isolation structure 12 is an undercut structure with a large upper part and a small lower part. When the light-emitting functional material of the light-emitting device 13 is evaporated, the undercut structure can cut off the light-emitting functional material.
[0101] In the embodiment of the present application, the first electrode 131 located in the light-emitting area is a first part 1311, and the first electrode 131 located in the non-light-emitting area and not overlapping with the isolation structure 12 is a second part 1312. The second part 1312 is located in the reflection area FG in the figure.
[0102] By arranging the anti-reflection layer 15 on the side of the first electrode 131 away from the array substrate 11, the anti-reflection layer 15 covers at least part of the orthographic projection of the second part 1312, in other words, in the thickness direction of the array substrate 11, the anti-reflection layer 15 blocks the second part 1312. In this way, the anti-reflection layer 15 can reduce the reflectivity of the area where the second part 1312 is located, and when external natural light irradiates the display panel 10, the anti-reflection layer 15 can weaken the reflection phenomenon, thereby improving the display effect.
[0103] In one of the embodiments, as shown in FIG. 1C, the anti-reflection layer 15 is arranged between the pixel defining layer 14 and the first electrode 131. By arranging the anti-reflection layer 15 between the pixel defining layer 14 and the first electrode 131, the anti-reflection layer 15 will not have too much impact on the manufacture of the first electrode 131, and the impact of the anti-reflection layer 15 on the manufacture of other film layers can also be reduced. Figure 1
[0104] In one of the embodiments, the anti-reflection layer 15 is in contact with the first electrode 131.
[0105] In one of the embodiments, the anti-reflection layer 15 is in contact with the pixel defining layer 14.
[0106] In one of the embodiments, at least part of the material of the anti-reflection layer 15 is a conductive film layer, and / or at least part of the material of the anti-reflection layer 15 is an insulating film layer.
[0107] In one embodiment, the entire antireflection layer 15 is made of a conductive film or an insulating film. It is understood that when the antireflection layer 15 is made of a conductive film, it not only does not affect the first electrode 131, but also helps to reduce the conductivity resistance of the first electrode 131 when it is in contact with it.
[0108] In one embodiment, the antireflective layer 15 is made of at least one of molybdenum, tantalum, titanium, chromium, and iron. It should be noted that the above-mentioned materials all have low reflectivity in the visible light range, which helps to reduce the reflectivity of the area where the second part 1312 is located. When ambient natural light shines on the display panel 10, the antireflective layer 15 can effectively reduce reflection, thereby improving the display effect.
[0109] Optionally, the antireflective layer 15 is a molybdenum layer.
[0110] Optionally, the antireflective layer 15 is a tantalum layer.
[0111] Optionally, the antireflective layer 15 is a titanium layer.
[0112] Optionally, the antireflective layer 15 is a chromium layer.
[0113] Optionally, the antireflective layer 15 is an iron layer.
[0114] Optionally, the antireflection layer 15 is a composite layer composed of at least two of the above-mentioned metal film layers.
[0115] In one embodiment, such as Figure 3 As shown, the orthographic projection of the antireflection layer 15 onto the array substrate 11 is located outside the orthographic projection of the corresponding first electrode 131 onto the array substrate 11. In other words, the orthographic projection of the antireflection layer 15 onto the array substrate 11 is large, while the orthographic projection of the first electrode 131 onto the array substrate 11 is small, and the orthographic projection of the antireflection layer 15 surrounds the orthographic projection of the first electrode 131. It should be noted that the orthographic projection of the antireflection layer 15 is annular, and the outer contour refers to the contour of the outer ring, not the contour of the inner ring.
[0116] It is understandable that the non-light-emitting area of the first electrode 131 is generally located on the periphery of the light-emitting area. The above arrangement ensures that the anti-reflective layer 15 effectively blocks the non-light-emitting area of the first electrode 131, maximizing the reduction of reflection.
[0117] In one of the embodiments, the outer contour of the normal projection of the anti-reflective layer 15 on the array substrate 11 coincides with the outer contour of the normal projection of the corresponding first electrode 131 on the array substrate 11. In this way, the same mask can be used for patterning the anti-reflective layer 15 and the first electrode 131, which is conducive to reducing the manufacturing cost.
[0118] In one of the embodiments, as shown in FIG. 1, the outer contour of the normal projection of the anti-reflective layer 15 on the array substrate 11 coincides with the outer contour of the normal projection of the corresponding first electrode 131 on the array substrate 11. Figure 3 In one of the embodiments, as shown in FIG. 1, the outer contour of the normal projection of the anti-reflective layer 15 on the array substrate 11 coincides with the outer contour of the normal projection of the corresponding first electrode 131 on the array substrate 11.
[0119] In this way, the same mask can be used for patterning the anti-reflective layer 15 and the first electrode 131, which is conducive to reducing the manufacturing cost.
[0120] In one of the embodiments, as shown in FIG. 1, the outer contour of the normal projection of the anti-reflective layer 15 on the array substrate 11 coincides with the outer contour of the normal projection of the corresponding first electrode 131 on the array substrate 11. Figure 4 In one of the embodiments, as shown in FIG. 1, the plurality of light emitting devices 13 include a first light emitting device (not shown in the figure), a second light emitting device (not shown in the figure) and a third light emitting device (not shown in the figure), the first light emitting device, the second light emitting device and the third light emitting device emit light of different colors. In one example, the first light emitting device is a red light emitting device 13, the second light emitting device is a blue light emitting device 13, and the third light emitting device is a green light emitting device 13.
[0121] In one of the embodiments, the light emitting device 13 further includes a light emitting layer group 132 and a second electrode 133 which are sequentially stacked on the first electrode 131.
[0122] In one example, the first electrode 131 is an anode and the second electrode 133 is a cathode. The light-emitting layer group 132 further comprises an emission layer (EML), and can further comprise one or more of a hole injection layer (HIL), a hole transport layer (HTL), an electron injection layer (EIL), an electron transport layer (ETL), a hole block layer (HBL), and an electron block layer (EBL). Alternatively, the light-emitting layer group 132 can also be a stacked light-emitting structure, i.e., comprising at least two light-emitting layers and a charge generation layer (CGL) between each adjacent light-emitting layer.
[0123] In one example, the first electrode 131 is an anode and the second electrode 133 is a cathode. The light-emitting layer group 132 further comprises an emission layer (EML), and can further comprise one or more of a hole injection layer (HIL), a hole transport layer (HTL), an electron injection layer (EIL), an electron transport layer (ETL), a hole block layer (HBL), and an electron block layer (EBL). Alternatively, the light-emitting layer group 132 can also be a stacked light-emitting structure, i.e., comprising at least two light-emitting layers and a charge generation layer (CGL) between each adjacent light-emitting layer. Figure 5 and Figure 6 In one example, the anti-reflective layer 15 is located on the side of the pixel defining layer 14 away from the array substrate 11. In other words, the anti-reflective layer 15 is arranged above the pixel defining layer 14, so that the anti-reflective layer 15 has more options for the arrangement position, which is beneficial for the designer to adjust the arrangement position of the anti-reflective layer 15 according to actual needs. In addition, this arrangement mode can make the anti-reflective layer 15 closer to external light, which is beneficial for absorbing more external light, thereby improving the reflectivity.
[0124] In one example, the anti-reflective layer 15 is in contact with the pixel defining layer 14.
[0125] In one example, the anti-reflective layer 15 is located between the pixel defining layer 14 and the light-emitting layer group 132.
[0126] In one example, at least part of the anti-reflective layer 15 is an insulating film layer.
[0127] In one example, all of the anti-reflective layer 15 is an insulating film layer. It can be understood that by arranging the anti-reflective layer 15 as an insulating film layer, the anti-reflective layer 15 can be prevented from being electrically connected with the light-emitting layer group 132, thereby avoiding the light-emitting layer group 132 from being short-circuited.
[0128] In one embodiment, the antireflective layer 15 is made of at least one of aluminum oxide, titanium oxide, silicon oxide, magnesium oxide, calcium carbonate, zirconium oxide, and magnesium fluoride. It should be noted that the above materials all have low reflectivity in the visible light range, which helps to reduce the reflectivity of the area where the second part 1312 is located. When ambient natural light illuminates the display panel 10, the antireflective layer 15 can effectively reduce reflections, thereby improving the display effect.
[0129] Optionally, the antireflective layer 15 is an aluminum oxide layer.
[0130] Optionally, the antireflective layer 15 is a titanium oxide layer.
[0131] Optionally, the antireflective layer 15 is a silicon oxide layer.
[0132] Optionally, the antireflective layer 15 is an aluminum oxide layer.
[0133] Optionally, the antireflective layer 15 is a calcium carbonate layer.
[0134] Optionally, the antireflective layer 15 is a zirconium oxide layer.
[0135] Optionally, the antireflective layer 15 is a magnesium fluoride layer.
[0136] In one embodiment, such as Figure 6 As shown, the display panel 10 also includes a plurality of encapsulation portions 16 corresponding to a plurality of light-emitting devices 13, with the encapsulation portions 16 disposed on the side of the corresponding light-emitting device 13 away from the array substrate 11. An antireflective layer 15 is located on the side of the encapsulation portion 16 away from the array substrate 11. In other words, the antireflective layer 15 is located above the encapsulation portion 16.
[0137] Thus, on the one hand, the antireflection layer 15 cannot directly contact the light-emitting device 13, which can avoid the antireflection layer 15 from having an adverse effect on the light-emitting device 13; on the other hand, it can make the antireflection layer 15 closer to the external light, which is conducive to absorbing more external light and thus improving the reflectivity.
[0138] In one embodiment, the antireflective layer 15 is disposed in contact with the encapsulation portion 16. This not only avoids affecting the manufacturing of the encapsulation portion 16, but also reduces the impact of the antireflective layer 15 on the fabrication of other film layers.
[0139] In one embodiment, at least a portion of the antireflection layer 15 is made of a conductive film layer, and / or at least a portion of the antireflection layer 15 is made of an insulating film layer.
[0140] In one embodiment, all antireflective layers 15 are made of conductive film or insulating film.
[0141] Optionally, the material of the anti-reflective layer 15 comprises at least one of molybdenum, tantalum, titanium, chromium, and iron.
[0142] Optionally, the material of the anti-reflective layer 15 comprises at least one of aluminum oxide, titanium oxide, silicon oxide, magnesium oxide, calcium carbonate, zirconium oxide, and magnesium fluoride.
[0143] In one embodiment, the encapsulation part 16 is an inorganic film layer. In this way, the encapsulation part 16 has good encapsulation performance, and the anti-reflective layer 15 can be easily fabricated on the encapsulation part 16, that is, the fabrication of the anti-reflective layer 15 does not have a great impact on the encapsulation part 16.
[0144] Optionally, the material of the encapsulation part 16 comprises at least one of silicon nitride (SiN), silicon oxide (SiO), and silicon oxynitride (SiON).
[0145] In one embodiment, the plurality of encapsulation parts 16 comprises a first encapsulation part (not shown in the figure), a second encapsulation part (not shown in the figure), and a third encapsulation part (not shown in the figure), the first encapsulation part encapsulates the first light emitting device, the second encapsulation part encapsulates the second light emitting device, and the third encapsulation part encapsulates the third light emitting device.
[0146] In one embodiment, as shown in Figure 1 , Figure 4 , Figure 5 and Figure 6 , the display panel 10 further comprises a color filter layer 17, the color filter layer 17 comprises a plurality of filter parts 172 corresponding to the plurality of light emitting devices 13, and the filter part 172 is arranged on the side of the corresponding light emitting device 13 away from the array substrate 11. The orthographic projection of the filter part 172 on the array substrate 11 covers at least part of the orthographic projection of the corresponding anti-reflective layer 15 on the array substrate 11.
[0147] It can be understood that the plurality of filter parts 172 comprises a first filter part (not shown in the figure), a second filter part (not shown in the figure), and a third filter part (not shown in the figure), the first filter part is arranged corresponding to the first light emitting device, the second filter part is arranged corresponding to the second light emitting device, and the third filter part is arranged corresponding to the third light emitting device.
[0148] In one embodiment, the color filter layer 17 further comprises a light shielding part 171, the light shielding part 171 encloses a plurality of light transmission openings (not shown in the figure), the plurality of light transmission openings are arranged corresponding to the plurality of filter parts 172, and at least part of each filter part 172 is arranged in the corresponding light transmission opening.
[0149] Optionally, the light shielding part 171 is a black matrix.
[0150] In one of the embodiments, the orthographic projection of the light shielding portion 171 on the array substrate 11 overlaps the orthographic projection of the isolation structure 12 on the array substrate 11. In one example, the light shielding portion 171 is arranged on the side of the isolation structure 12 away from the array substrate 11. In this way, the light shielding portion 171 does not interfere with the light emitted by the light emitting device 13, and is conducive to the light being emitted from the isolation opening 12a and the light transmission opening.
[0151] In one of the embodiments, the orthographic projection of the light shielding portion 171 on the array substrate 11 covers the orthographic projection of the isolation structure 12 on the array substrate 11. In one example, the orthographic projection of the light shielding portion 171 on the array substrate 11 completely overlaps the orthographic projection of the isolation structure 12 on the array substrate 11. In another example, the orthographic projection of the isolation structure 12 on the array substrate 11 is located within the orthographic projection of the light shielding portion 171 on the array substrate 11.
[0152] The above arrangement is conducive to increasing the light shielding area of the light shielding portion 171, thereby maximizing the reduction of the reflectivity of the display panel 10.
[0153] In one of the embodiments, the orthographic projection of the light shielding portion 171 on the array substrate 11 does not overlap the orthographic projection of the second portion 1312 on the array substrate 11.
[0154] In one of the embodiments, the display panel 10 further comprises a plurality of packaging portions 16, a first packaging layer 181, and a second packaging layer 182. The plurality of packaging portions 16 are arranged corresponding to the plurality of light emitting devices 13, and the packaging portion 16 is arranged on the side of the corresponding light emitting device 13 away from the array substrate 11. The color film layer 17 is arranged on the side of the packaging portion 16 away from the array substrate 11. The first packaging layer 181 is arranged on the side of the color film layer 17 away from the array substrate 11. The second packaging layer 182 is arranged on the side of the first packaging layer 181 away from the array substrate 11. In this way, the COE technology can be implemented, which can effectively reduce the power consumption of the display panel 10, while reducing the thickness of the display panel 10 and increasing the color gamut range to a certain extent.
[0155] In one of the embodiments, part of the light shielding portion 171 is located between the packaging portion 16 and the isolation structure 12. In this way, on the one hand, the light shielding area of the light shielding portion 171 can be increased, thereby maximizing the reduction of the reflectivity of the display panel 10; on the other hand, the gap between the packaging portion 16 and the isolation structure 12 can be filled, thereby improving the structural stability of the packaging portion 16 and reducing the probability of peeling phenomenon.
[0156] In one of the embodiments, the first packaging layer 181 is an organic film layer. Optionally, the material of the first packaging layer 181 includes resin materials such as epoxy resin and acrylic resin.
[0157] In one of the embodiments, the second encapsulation layer 182 is an inorganic film layer. Optionally, the material of the second encapsulation layer 182 includes at least one of silicon nitride (SiN), silicon oxide (SiO), silicon oxynitride (SiON).
[0158] It is to be noted that the first encapsulation layer 181 and the second encapsulation layer 182 are continuously arranged at least on the whole display area, and a part of which is arranged in the frame area.
[0159] In one of the embodiments, the isolation structure 12 includes a first isolation portion 121 and a second isolation portion 122 which are arranged in a stacked manner away from the array substrate 11, and the outer contour of the orthographic projection of the second isolation portion 122 on the array substrate 11 is located outside the outer contour of the orthographic projection of the first isolation portion 121 on the array substrate 11.
[0160] Optionally, the second electrode 133 of the light emitting device 13 is electrically connected with the first isolation portion 121.
[0161] In one of the embodiments, the first isolation portion 121 includes at least one metal layer. In one example, the first isolation portion 121 includes one metal layer. Further, the material of the first isolation portion 121 includes at least one of metal and metal oxide. Exemplarily, the metal can be silver, copper, titanium, aluminum, etc. The metal oxide can be tin oxide, zinc oxide, cadmium oxide, indium oxide, indium tin oxide, zinc indium oxide, zinc gallium oxide, zinc aluminum oxide, titanium tantalum oxide, etc.
[0162] In one of the embodiments, the first isolation portion 121 includes a second metal layer (not shown in the figure) and a first metal layer (not shown in the figure) which are arranged in a stacked manner away from the array substrate 11, and the material of the first metal layer and the second metal layer are different.
[0163] In one of the embodiments, the material of the first metal layer includes aluminum.
[0164] In one of the embodiments, the material of the second metal layer includes titanium or molybdenum.
[0165] In one of the embodiments, the material of the second isolation portion 122 includes titanium or molybdenum.
[0166] In one of the embodiments, the stacked structure of the isolation structure 12 can be titanium / aluminum / titanium, molybdenum / aluminum / molybdenum or molybdenum / aluminum / titanium. By arranging the three metal layers in a stacked manner, the resistance of the isolation structure 12 can be reduced, thereby reducing the power consumption of the display panel 10.
[0167] In other embodiments, the second electrode 133 of the light emitting device 13 is electrically connected with the metal layer in the isolation structure 12 which is located below the first isolation portion 121.
[0168] In one example, the cross-sectional shape of the isolation structure 12 formed by the first metal layer, the second metal layer and the second isolation portion 122 can be an I-shaped cross-section.
[0169] In one of the embodiments, as shown in Figure 2 FIG. 6, the orthographic projection of the anti-reflection layer 15 on the array substrate 11 surrounds the orthographic projection of the first portion 1311 on the array substrate 11. In this way, the reflectivity can be minimized, and thus the display effect can be improved.
[0170] In one example, as shown in Figure 2 FIG. 7, the orthographic projection of each anti-reflection layer 15 on the array substrate 11 is annular.
[0171] In another example, each anti-reflection layer 15 includes a plurality of anti-reflection portions, the orthographic projection of the plurality of anti-reflection portions surrounds the orthographic projection of the first portion 1311, and the adjacent two anti-reflection portions are spaced apart.
[0172] In one of the embodiments, the orthographic projection of the anti-reflection layer 15 on the array substrate 11 does not overlap with the orthographic projection of the first portion 1311 on the array substrate 11. In other words, the orthographic projection of the anti-reflection layer 15 on the array substrate 11 is located outside the orthographic projection of the first portion 1311 on the array substrate 11. In this way, the anti-reflection layer 15 can avoid blocking the light emitted by the light emitting device 13.
[0173] In one of the embodiments, the orthographic projection of the anti-reflection layer 15 on the array substrate 11 is connected with the orthographic projection of the first portion 1311 on the array substrate 11. In this way, the coverage area of the anti-reflection layer 15 can be maximized, the reflectivity can be minimized, and the anti-reflection layer 15 can avoid blocking the light emitted by the light emitting device 13.
[0174] In one of the embodiments, the reflectivity of the anti-reflection layer 15 is less than or equal to 50%. In this way, when the external natural light irradiates the display panel 10, the anti-reflection layer 15 can weaken the reflection phenomenon, and thus the display effect can be improved.
[0175] In one of the embodiments, as shown in Figure 2 FIG. 8, the first electrode 131 further includes a third portion 1313, the third portion 1313 surrounds the second portion 1312. The orthographic projection of the third portion 1313 on the array substrate 11 is located within the orthographic projection of the isolation structure 12 on the array substrate 11.
[0176] Referring to Figure 7 FIG. 9, the array substrate 11 includes a pixel circuit layer and a planarization layer 111, the pixel circuit layer includes a pixel circuit for driving the light emitting device 13 to emit light, Figure 7A transistor 19 in a pixel circuit is shown. A via is provided in the planarization layer 111, and a first electrode 131 is electrically connected to the transistor 19 in the pixel circuit layer through the via. Furthermore, the pixel circuit layer includes at least one insulating layer, which may include at least one of an inorganic layer and an organic layer. Additionally, the array substrate 11 includes scan lines providing the scan signal Scan and data lines providing the data signal Data to the pixel circuit.
[0177] refer to Figure 8 The pixel circuit includes a driving transistor T1 and a data transistor T2. The source of the data transistor T2 is connected to the data line that provides the data signal Data, the gate of the data transistor T2 is connected to the scan line that provides the scan signal Scan, and the drain of the data transistor T2 is connected to the gate of the driving transistor T1. The two ends of the storage capacitor C1 are respectively connected to the gate and the source of the driving transistor T1, and the drain of the driving transistor T1 is connected to the light-emitting device 13. Figure 8 This is one implementation of a pixel circuit; the pixel circuit described in this application is not limited to... Figure 8 The 2T1C pixel circuit shown can also be other pixel circuits, such as 7T1C, 8T1C pixel circuits, etc.
[0178] In one embodiment, reference Figure 9 As shown, the light-emitting layer group 132 includes a hole injection layer HIL, a hole transport layer HTL, an electron blocking layer EBL, a light-emitting material layer EML, a hole blocking layer HBL, an electron transport layer ETL, and an electron injection layer EIL stacked along a direction away from the array substrate 11. The light-emitting layer group 132 may include a single light-emitting material layer EML, or a stacked light-emitting structure including multiple light-emitting material layers EML.
[0179] Secondly, embodiments of this application provide a display panel 10, which includes an array substrate 11, a pixel defining layer 14, a plurality of light-emitting devices 13, and a plurality of anti-reflection layers 15. The pixel defining layer 14 is disposed on one side of the array substrate 11; the pixel defining layer 14 encloses and forms a plurality of pixel openings 14a. The plurality of light-emitting devices 13 are disposed on one side of the array substrate 11 and are correspondingly disposed to the plurality of pixel openings 14a; at least a portion of the light-emitting device 13 is disposed within the corresponding pixel opening 14a; the light-emitting device 13 includes a first electrode 131; the first electrode 131 includes a first portion 1311 and a second portion 1312 disposed around the first portion 1311; the second portion 1312 of the first electrode 131 is disposed between the pixel defining layer 14 and the array substrate 11, and the pixel opening 14a exposes the first portion 1311 of the first electrode 131 of the corresponding light-emitting device 13.
[0180] Further, the plurality of anti-reflective layers 15 are arranged corresponding to the first electrodes 131 of the plurality of light emitting devices 13; the anti-reflective layer 15 is arranged on the side of the corresponding first electrode 131 away from the array substrate 11; the orthographic projection of the anti-reflective layer 15 on the array substrate 11 covers at least part of the orthographic projection of the second portion 1312 on the array substrate 11.
[0181] By arranging the anti-reflective layer 15 on the side of the first electrode 131 away from the array substrate 11, the orthographic projection of the anti-reflective layer 15 covers at least part of the orthographic projection of the second portion 1312, in other words, in the thickness direction of the array substrate 11, the anti-reflective layer 15 blocks the second portion 1312. In this way, the anti-reflective layer 15 can reduce the reflectivity of the area where the second portion 1312 is located, and when external natural light shines on the display panel 10, the anti-reflective layer 15 can weaken the reflection phenomenon, thereby improving the display effect.
[0182] In one of the embodiments, the display panel 10 further comprises a color filter layer 17, the color filter layer 17 comprises a plurality of filter portions 172 arranged corresponding to the plurality of light emitting devices 13, the filter portion 172 is arranged on the side of the corresponding light emitting device 13 away from the array substrate 11. The orthographic projection of the filter portion 172 on the array substrate 11 covers at least part of the orthographic projection of the corresponding anti-reflective layer 15 on the array substrate 11.
[0183] In this way, when a part of external light enters from the filter portion 172, the anti-reflective layer 15 can absorb this part of light, thereby weakening the reflection phenomenon, and further improving the display effect.
[0184] It can be understood that the plurality of light emitting devices 13 comprise a first light emitting device, a second light emitting device and a third light emitting device, the plurality of filter portions 172 comprise a first filter portion, a second filter portion and a third filter portion, the first filter portion and the first light emitting device are arranged corresponding to each other, the second filter portion and the second light emitting device are arranged corresponding to each other, and the third filter portion and the third light emitting device are arranged corresponding to each other.
[0185] In one of the embodiments, the color filter layer 17 further comprises a light shielding portion 171, the light shielding portion 171 encloses a plurality of light transmission openings, the plurality of light transmission openings are arranged corresponding to the plurality of filter portions 172, and at least part of each filter portion 172 is arranged in the corresponding light transmission opening.
[0186] Optionally, the light shielding portion 171 is a black matrix.
[0187] In one of the embodiments, the anti-reflective layer 15 is located between the pixel defining layer 14 and the first electrode 131. By arranging the anti-reflective layer 15 between the pixel defining layer 14 and the first electrode 131, it will not have too much impact on the manufacturing of the first electrode 131, and it can also reduce the impact of the anti-reflective layer 15 on the manufacturing of other film layers.
[0188] In one of the embodiments, the anti-reflection layer 15 is arranged in contact with the first electrode 131.
[0189] In one of the embodiments, the anti-reflection layer 15 is arranged in contact with the pixel defining layer 14.
[0190] In one of the embodiments, the material of the anti-reflection layer 15 is a conductive film layer or an insulating film layer. It can be understood that, when the material of the anti-reflection layer 15 is a conductive film layer, the anti-reflection layer 15 will not affect the first electrode 131, and when the anti-reflection layer 15 is arranged in contact with the first electrode 131, the conductive resistance of the first electrode 131 can be reduced.
[0191] In one of the embodiments, the material of the anti-reflection layer 15 includes at least one of molybdenum, tantalum, titanium, chromium, and iron. It should be noted that the reflectivity of the above-mentioned materials in the visible light range is relatively small, which is conducive to reducing the reflectivity of the area where the second part 1312 is located. When the external natural light irradiates the display panel 10, the anti-reflection layer 15 can better weaken the reflection phenomenon, thereby improving the display effect.
[0192] Optionally, the anti-reflection layer 15 is a molybdenum layer.
[0193] Optionally, the anti-reflection layer 15 is a tantalum layer.
[0194] Optionally, the anti-reflection layer 15 is a titanium layer.
[0195] Optionally, the anti-reflection layer 15 is a chromium layer.
[0196] Optionally, the anti-reflection layer 15 is an iron layer.
[0197] Optionally, the anti-reflection layer 15 is a composite layer composed of at least two metal film layers.
[0198] In one of the embodiments, the display panel 10 further includes a plurality of packaging parts 16, the plurality of packaging parts 16 include a plurality of first packaging parts (not shown in the figure) corresponding to the plurality of first light emitting devices, a plurality of second packaging parts (not shown in the figure) corresponding to the plurality of second light emitting devices, and a plurality of third packaging parts (not shown in the figure) corresponding to the plurality of third light emitting devices. The first packaging part is arranged on the side of the corresponding first light emitting device away from the array substrate 11, the second packaging part is arranged on the side of the corresponding second light emitting device away from the array substrate 11, and the third packaging part is arranged on the side of the corresponding third light emitting device away from the array substrate 11.
[0199] In one embodiment, the display panel 10 further includes a pixel defining layer 14, which has a first pixel opening (not shown), a second pixel opening (not shown), and a third pixel opening (not shown). A first light-emitting device is disposed in the first pixel opening, a second light-emitting device is disposed in the second pixel opening, and a third light-emitting device is disposed in the third pixel opening. It is understood that the planar shape of the first pixel opening matches the planar shape of the isolation opening 12a corresponding to the first light-emitting device, the planar shape of the second pixel opening matches the planar shape of the isolation opening 12a corresponding to the second light-emitting device, and the planar shape of the third pixel opening matches the planar shape of the isolation opening 12a corresponding to the third light-emitting device.
[0200] In one embodiment, the light-emitting device 13 further includes a light-emitting layer group 132 and a second electrode 133 sequentially stacked on the first electrode 131.
[0201] In one example, the first electrode 131 is the anode, and the second electrode 133 is the cathode. The light-emitting layer group 132 also includes an emission layer (EML), and may further include one or more of a hole injection layer (HIL), a hole transport layer (HTL), an electron injection layer (EIL), an electron transport layer (ETL), a hole block layer (HBL), and an electron block layer (EBL). Alternatively, the light-emitting layer group 132 may also be a stacked light-emitting structure, that is, it includes at least two light-emitting layers and a charge generation layer (CGL) located between each adjacent light-emitting layer.
[0202] In one embodiment, the orthographic projection of the light-shielding portion 171 on the array substrate 11 does not overlap with the orthographic projection of the second portion 1312 on the array substrate 11.
[0203] In one embodiment, the display panel 10 may further include at least one film layer such as a touch layer, a polarizer, a color filter substrate, and a protective cover. This film layer may also be bonded to the display panel via an adhesive layer such as OCA (Optical Clear Adhesive).
[0204] Thirdly, such as Figure 10 As shown in the figure, this application embodiment provides a method for manufacturing a display panel, which specifically includes the following steps:
[0205] S100: providing an array substrate 11.
[0206] S200: forming a plurality of first electrodes 131 on one side of the array substrate 11.
[0207] S300: forming a pixel defining layer 14, an isolation structure 12, a plurality of anti-reflective layers 15 and a plurality of light emitting devices 13 on one side of the array substrate 11. The pixel defining layer 14 encloses a plurality of pixel openings 14a; the isolation structure 12 encloses a plurality of isolation openings 12a; the plurality of isolation openings 12a correspondingly communicate with the plurality of pixel openings 14a; the plurality of light emitting devices 13 are correspondingly arranged in the plurality of pixel openings 14a; at least part of the light emitting device 13 is arranged in the corresponding pixel opening 14a; the light emitting device 13 comprises the first electrode 131; the first electrode 131 comprises a first part 1311 and a second part 1312 arranged around the first part 1311; the second part 1312 of the first electrode 131 is arranged between the pixel defining layer 14 and the array substrate 11, and the pixel opening 14a exposes the first part 1311 of the first electrode 131 of the corresponding light emitting device 13; in other words, the orthographic projection of the pixel opening 14a on the array substrate 11 covers the orthographic projection of the first part 1311 of the first electrode 131 of the corresponding light emitting device 13 on the array substrate 11. The orthographic projection of the second part 1312 on the array substrate 11 does not overlap with the orthographic projection of the isolation structure 12 on the array substrate 11; the plurality of anti-reflective layers 15 are correspondingly arranged with the first electrode 131 of the plurality of light emitting devices 13; the anti-reflective layer 15 is arranged on the side of the corresponding first electrode 131 away from the array substrate 11; the orthographic projection of the anti-reflective layer 15 on the array substrate 11 covers at least part of the orthographic projection of the second part 1312 on the array substrate 11.
[0208] The preparation method of the display panel, by arranging the anti-reflective layer 15 on the side of the first electrode 131 away from the array substrate 11, the orthographic projection of the anti-reflective layer 15 covers at least part of the orthographic projection of the second part 1312. In this way, the anti-reflective layer 15 can reduce the reflectivity of the area where the second part 1312 is located. When the external natural light irradiates the display panel 10, the anti-reflective layer 15 can weaken the reflection phenomenon, thereby improving the display effect.
[0209] In one of the embodiments, S200: forming a plurality of first electrodes 131 on one side of the array substrate 11, specifically comprising the following steps:
[0210] S210A: forming a first electrode material layer on one side of the array substrate 11.
[0211] S220A: forming an anti-reflective material layer on the side of the first electrode material layer away from the array substrate 11;
[0212] S230A: based on the first mask, the first electrode material layer and the anti-reflective material layer are patterned to obtain a plurality of first electrodes 131 and a plurality of initial anti-reflective layers 20. The structure after the first electrode 131 and the initial anti-reflective layer 20 are formed is as shown in FIG. 2G. Figure 11
[0213] In this way, the same mask is used to pattern the first electrode material layer and the anti-reflective material layer, which is conducive to reducing the manufacturing cost.
[0214] In one embodiment, S200: a plurality of first electrodes 131 are formed on one side of the array substrate 11, which specifically includes the following steps:
[0215] S210B: a first electrode material layer is formed on one side of the array substrate 11.
[0216] S220B: based on the first mask, the first electrode material layer is patterned to obtain a plurality of first electrodes 131.
[0217] S200: a plurality of first electrodes 131 are formed on one side of the array substrate 11, and then S300: a pixel defining layer 14, an isolation structure 12, a plurality of anti-reflective layers 15 and a plurality of light emitting devices 13 are formed on one side of the array substrate 11, which further includes the following steps:
[0218] S230B: an anti-reflective material layer is formed on the array substrate 11. The anti-reflective material layer covers the first electrode 131 and the area between adjacent first electrodes 131.
[0219] S240B: based on the second mask, the anti-reflective material layer is patterned to obtain a plurality of initial anti-reflective layers 20. The orthographic projection of the initial anti-reflective layer 20 on the array substrate 11 covers the orthographic projection of the corresponding first electrode 131 on the array substrate 11.
[0220] In this way, the first electrode 131 and the initial anti-reflective layer 20 are formed by step-by-step patterning.
[0221] In one embodiment, S300: a pixel defining layer 14, an isolation structure 12, a plurality of anti-reflective layers 15 and a plurality of light emitting devices 13 are formed on one side of the array substrate 11, which specifically includes the following steps:
[0222] S310: a pixel defining material layer 30 is formed on one side of the array substrate 11. As shown in FIG. 3A, the pixel defining material layer 30 covers the initial anti-reflective layer 20 and the area between adjacent initial anti-reflective layers 20. Figure 12
[0223] S320: Forming an isolation material layer 40 on the side of the pixel defining material layer 30 away from the array substrate 11. The structure after forming the isolation material layer 40 is shown in FIG. 4. Figure 13 It can be understood that the isolation material layer 40 can include multiple metal layers arranged in a stack.
[0224] S330: Performing a patterning process on the isolation material layer 40 to form an isolation structure 12. The structure after forming the isolation structure 12 is shown in FIG. 5. Figure 14
[0225] S340: Performing a patterning process on the pixel defining material layer 30 to form a pixel defining layer 14. The structure after forming the pixel defining layer 14 is shown in FIG. 6. Figure 15
[0226] S350: Performing an etching process on the initial anti-reflective layer 20 exposed by the pixel opening 14a to form an anti-reflective layer 15. The structure after forming the anti-reflective layer 15 is shown in FIG. 7. Figure 16 It can be understood that in the process of patterning the initial anti-reflective layer 20, the portion covered by the pixel defining layer 14 is reserved to form the anti-reflective layer 15.
[0227] It can be understood that after forming the anti-reflective layer 15, the light emitting device 13 can be manufactured by using existing processes.
[0228] In one of the embodiments, in the step S350 of performing an etching process on the initial anti-reflective layer 20 exposed by the pixel opening 14a to form an anti-reflective layer 15, the etching rate of the etching process on the initial anti-reflective layer 20 is greater than the etching rate on the first electrode 131. It can be understood that the etching rate of the etching process on the first electrode 131 can be zero, i.e., no etching on the first electrode 131. In this way, the etching process has a certain etching selectivity in the process of etching the initial anti-reflective layer 20, reducing the damage to the first electrode 131. It can be understood that the patterning process can be performed by using a dry etching or wet etching process.
[0229] In a fourth aspect, the embodiments of the present application provide a display device, including the display panel 10 in any of the embodiments of the first aspect and the second aspect.
[0230] The display device can be a portable electronic device such as a mobile phone, a smart phone, a tablet personal computer (PC), a mobile communication terminal, an electronic notebook, an electronic book, a portable multimedia player (PMP), a navigation, and an ultra-mobile PC (UMPC). In an embodiment, for example, the display device can be a display unit of a television, a laptop computer, a monitor, a billboard, or an Internet of Things (IOT) device. In an embodiment, for example, the display device can be a wearable device such as a smart watch, a watch phone, a glasses-type display, and a head-mounted display (HMD).
[0231] The display device can be formed in a planar shape similar to a quadrilateral. In an embodiment, for example, the display device can have a planar shape similar to a quadrilateral having a short side in the second direction and a long side in the first direction. Alternatively, the display device can have a planar shape similar to a quadrilateral having a long side in the second direction and a short side in the first direction intersecting the second direction. The angle at which the short side and the long side meet can be formed in a circular shape to have a predetermined curvature or in a right angle. In an embodiment, the planar shape of the display device is not limited to a quadrilateral, and can be formed in a planar shape similar to other polygons, a circular shape, or an elliptical shape.
[0232] The technical features of the above embodiments can be combined in any combination. For the sake of brevity, not all possible combinations are described, however, it is to be understood that the scope of the present description includes all possible combinations.
Claims
1. A display panel, characterized by, The display panel comprises: an array substrate; a pixel definition layer arranged on one side of the array substrate; the pixel definition layer forms a plurality of pixel openings by enclosing; an isolation structure arranged on one side of the pixel definition layer and enclosing a plurality of isolation openings; the plurality of isolation openings correspondingly communicate with the plurality of pixel openings; a plurality of light emitting devices arranged on one side of the array substrate and arranged corresponding to the plurality of pixel openings; at least part of the light emitting devices is arranged in the corresponding pixel opening; the light emitting device comprises a first electrode; the first electrode comprises a first part and a second part arranged around the first part; the second part of the first electrode is arranged between the pixel definition layer and the array substrate, and the orthogonal projection of the pixel opening on the array substrate covers the orthogonal projection of the first part of the corresponding light emitting device on the array substrate; the orthogonal projection of the second part on the array substrate does not overlap with the orthogonal projection of the isolation structure on the array substrate; a plurality of anti-reflection layers corresponding to the first electrode of the plurality of light emitting devices; the anti-reflection layer is arranged on the side of the corresponding first electrode away from the array substrate; the orthogonal projection of the anti-reflection layer on the array substrate covers at least part of the orthogonal projection of the second part on the array substrate; the display panel further comprises a color filter layer, the color filter layer comprises a plurality of filter parts corresponding to the plurality of light emitting devices, the filter part is arranged on the side of the corresponding light emitting device away from the array substrate; the orthogonal projection of the filter part on the array substrate covers at least part of the orthogonal projection of the corresponding anti-reflection layer on the array substrate; the color filter layer further comprises a light shielding part, the light shielding part encloses a plurality of light transmission openings, the plurality of light transmission openings are arranged corresponding to the plurality of filter parts, and at least part of each filter part is arranged in the corresponding light transmission opening; the orthogonal projection of the light shielding part on the array substrate overlaps with the orthogonal projection of the isolation structure on the array substrate; the light shielding part is arranged on the side of the isolation structure away from the array substrate; the orthogonal projection of the light shielding part on the array substrate does not overlap with the orthogonal projection of the second part on the array substrate; the display panel further comprises: a plurality of encapsulation parts corresponding to the plurality of light emitting devices, the encapsulation part is arranged on the side of the corresponding light emitting device away from the array substrate; the color filter layer is arranged on the side of the encapsulation part away from the array substrate; part of the light shielding part is located between the encapsulation part and the isolation structure; a first encapsulation layer arranged on the side of the color filter layer away from the array substrate; a second encapsulation layer arranged on the side of the first encapsulation layer away from the array substrate; wherein the anti-reflection layer is located between the pixel definition layer and the first electrode, or the anti-reflection layer is located on the side of the encapsulation part away from the array substrate, and the anti-reflection layer is arranged in contact with the encapsulation part.
2. The display panel of claim 1, wherein, At least part of the material of the anti-reflection layer is a conductive film layer; the material of the anti-reflection layer comprises at least one of molybdenum, tantalum, titanium, chromium and iron; And / or, at least part of the material of the anti-reflective layer is an insulating film layer; the material of the anti-reflective layer includes at least one of aluminum oxide, titanium oxide, silicon oxide, magnesium oxide, calcium carbonate, zirconium oxide, and magnesium fluoride.
3. The display panel of claim 2, wherein, The outer contour of the anti-reflective layer on the array substrate is located at the periphery of the outer contour of the corresponding first electrode on the array substrate; or, the outer contour of the anti-reflective layer on the array substrate coincides with the outer contour of the corresponding first electrode on the array substrate.
4. The display panel of claim 3, wherein, In the circumferential direction of the anti-reflective layer, the distance between the outer contour of the anti-reflective layer on the array substrate and the outer contour of the corresponding first electrode on the array substrate is equal.
5. The display panel of claim 1, wherein, The anti-reflective layer is in contact with the pixel defining layer; At least part of the material of the anti-reflective layer is an insulating film layer; the material of the anti-reflective layer includes at least one of aluminum oxide, titanium oxide, silicon oxide, magnesium oxide, calcium carbonate, zirconium oxide, and magnesium fluoride.
6. The display panel of claim 1, wherein, The outer contour of the anti-reflective layer on the array substrate is located at the periphery of the outer contour of the corresponding first electrode on the array substrate; or, the outer contour of the anti-reflective layer on the array substrate coincides with the outer contour of the corresponding first electrode on the array substrate.
7. The display panel of claim 1, wherein, The outer contour of the anti-reflective layer on the array substrate is located at the periphery of the outer contour of the corresponding first electrode on the array substrate; or, the outer contour of the anti-reflective layer on the array substrate coincides with the outer contour of the corresponding first electrode on the array substrate.
8. The display panel of claim 1, wherein, The outer contour of the anti-reflective layer on the array substrate is located at the periphery of the outer contour of the corresponding first electrode on the array substrate; or, the outer contour of the anti-reflective layer on the array substrate coincides with the outer contour of the corresponding first electrode on the array substrate. The outer contour of the anti-reflective layer on the array substrate is located at the periphery of the outer contour of the corresponding first electrode on the array substrate; or, the outer contour of the anti-reflective layer on the array substrate coincides with the outer contour of the corresponding first electrode on the array substrate. The reflectivity of the anti-reflective layer is less than or equal to 50%.
9. The display panel of claim 1, wherein, Including:
10. A method for manufacturing a display panel, characterized by, Providing an array substrate; Forming a plurality of first electrodes on one side of the array substrate; Forming a pixel defining layer, an isolation structure, a plurality of anti-reflective layers, and a plurality of light emitting devices on one side of the array substrate; the pixel defining layer encloses a plurality of pixel openings; The isolation structure encloses a plurality of isolation openings; The plurality of isolation openings and the plurality of pixel openings correspondingly communicate; the plurality of light emitting devices are correspondingly arranged in the plurality of pixel openings; at least part of the light emitting devices are arranged in the corresponding pixel openings; the light emitting devices include the first electrodes; the first electrodes include a first part and a second part arranged around the first part; the second part of the first electrode is arranged between the pixel defining layer and the array substrate, and the outer contour of the anti-reflective layer on the array substrate coincides with the outer contour of the corresponding first electrode on the array substrate. The outer contour of the anti-reflective layer on the array substrate is located at the periphery of the outer contour of the corresponding first electrode on the array substrate; or, the outer contour of the anti-reflective layer on the array substrate coincides with the outer contour of the corresponding first electrode on the array substrate. The plurality of anti-reflective layers are arranged corresponding to the first electrodes of the plurality of light emitting devices; the anti-reflective layer is arranged on the side of the corresponding first electrode away from the array substrate; the orthographic projection of the anti-reflective layer on the array substrate covers at least part of the orthographic projection of the second part on the array substrate. The display panel further comprises a color filter layer, the color filter layer comprises a plurality of filter parts arranged corresponding to the plurality of light emitting devices, the filter part is arranged on the side of the corresponding light emitting device away from the array substrate; the orthographic projection of the filter part on the array substrate covers at least part of the orthographic projection of the corresponding anti-reflective layer on the array substrate; the color filter layer further comprises a light shielding part, the light shielding part encloses a plurality of light transmission openings, the plurality of light transmission openings are arranged corresponding to the plurality of filter parts, at least part of each filter part is arranged in the corresponding light transmission opening; the orthographic projection of the light shielding part on the array substrate overlaps with the orthographic projection of the isolation structure on the array substrate; the light shielding part is arranged on the side of the isolation structure away from the array substrate; the orthographic projection of the light shielding part on the array substrate does not overlap with the orthographic projection of the second part on the array substrate; the display panel further comprises a plurality of packaging parts, a first encapsulation layer and a second encapsulation layer, the plurality of packaging parts are arranged corresponding to the plurality of light emitting devices, the packaging part is arranged on the side of the corresponding light emitting device away from the array substrate; the color filter layer is arranged on the side of the packaging part away from the array substrate; part of the light shielding part is located between the packaging part and the isolation structure; the first encapsulation layer is arranged on the side of the color filter layer away from the array substrate; the second encapsulation layer is arranged on the side of the first encapsulation layer away from the array substrate; wherein, the anti-reflective layer is located between the pixel defining layer and the first electrode, or the anti-reflective layer is located on the side of the packaging part away from the array substrate, and the anti-reflective layer is arranged in contact with the packaging part.
11. The method of manufacturing a display panel according to claim 10, wherein The step of forming a plurality of first electrodes on one side of the array substrate comprises: forming a first electrode material layer on one side of the array substrate; forming an anti-reflective material layer on the side of the first electrode material layer away from the array substrate; performing pattern processing on the first electrode material layer and the anti-reflective material layer based on a first mask to obtain the plurality of first electrodes and a plurality of initial anti-reflective layers.
12. The method of manufacturing a display panel according to claim 11, wherein The step of forming a pixel defining layer, an isolation structure, a plurality of anti-reflective layers and a plurality of light emitting devices on one side of the array substrate comprises: forming a pixel defining material layer on one side of the array substrate; the pixel defining material layer covers the initial anti-reflective layer and the area located between adjacent initial anti-reflective layers; forming an isolation material layer on the side of the pixel defining material layer away from the array substrate; performing pattern processing on the isolation material layer to form the isolation structure; performing pattern processing on the pixel defining material layer to form the pixel defining layer; performing etching processing on the initial anti-reflective layer exposed by the pixel opening to form the anti-reflective layer.
13. The method of manufacturing a display panel according to claim 12, wherein, In the step of etching the initial anti-reflective layer exposed to the pixel opening to form the anti-reflective layer, the etching process has an etching rate on the initial anti-reflective layer greater than an etching rate on the first electrode.
14. A display device comprising: A display panel comprising the display panel of any one of claims 1-9.
Citation Information
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