High-density calcium fluoride photoelectric ceramic and ultralow-temperature preparation method thereof
High-density calcium fluoride optoelectronic ceramics are prepared at low temperatures through reaction activation cold sintering technology, which solves the problems of oxygen defects and equipment corrosion caused by high-temperature sintering and realizes calcium fluoride ceramics with high mechanical properties, which are suitable for high-end optoelectronic systems.
Patent Information
- Application Number
- CN202510932780.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-07-07
- Publication Date
- 2025-09-12
AI Technical Summary
In the existing technology, high-temperature sintering of CaF2 ceramics leads to oxygen defects and high costs, and cold sintering in acidic solvents has equipment corrosion problems, making it difficult to achieve large-scale industrial production.
High-density calcium fluoride optoelectronic ceramics are prepared by reaction-activated cold sintering technology through applying uniaxial pressure and chemical reaction at low temperature (no higher than 350°C). Calcium hydroxide and ammonium fluoride are used as raw materials, the stoichiometric ratio is controlled, and the use of acidic solvents is avoided.
Ultra-low temperature preparation of high-density calcium fluoride optoelectronic ceramics has been achieved, with mechanical properties improved by 2-4 times, equipment corrosion avoided, the process simplified, costs reduced, and the needs of high-end optoelectronic applications met.