Manufacturing method of TFT-LCD liquid crystal display screen and TFT-LCD liquid crystal display screen

Abstract

The invention provides a manufacturing method of a thin film transistor liquid crystal display (TFT-LCD) and the TFT-LCD. The method comprises the following steps: sequentially forming a gate layer, a gate insulating layer, a silicon island, an active layer, a source electrode / drain electrode, a passivation layer and a transparent pixel electrode ITO on a first substrate to form a first substrate; a BM matrix, a color filter layer, an OC layer, a plurality of spacers and an alignment film are sequentially formed below the second substrate to form a second base plate, and when the alignment film is rubbed, orthographic projections of tracks formed by the fact that rubbing cloth moves through the spacers in the rubbing direction on the second base plate all fall within the area range of the BM matrix; a second substrate is disposed on the first substrate. According to the technical scheme, when the rubbing cloth rubs the alignment film, generated trailing tracks all fall in the area range of the BM matrix, so that the situation that bad phenomena enter the opening area is effectively avoided, it is guaranteed that the friction of the opening area is uniform, the pixel brightness is uniform, and the display effect of a TFT-LCD liquid crystal display screen is improved.

Description

Technical Field

[0001] The present invention relates to the technical field of display screens, and in particular to a method for manufacturing a TFT-LCD liquid crystal display screen and the TFT-LCD liquid crystal display screen. Background Art

[0002] As TFT-LCD displays become increasingly popular, market demands for higher resolution are becoming increasingly stringent. Improving product competitiveness has become a crucial factor in a company's survival, especially amidst the current global economic recession. Affordability is a key factor in improving display market competitiveness. Advantages of affordability include low power consumption, low operating costs, and low production costs. Improving product yield can significantly reduce production costs.

[0003] Post Spacers (PS) maintain a stable gap between the TFT and CF substrates, and their placement and quantity play a decisive role in the display quality of display products. In the TFT (thin-film transistor) manufacturing process, the rubbing process is a key step in liquid crystal display (LCD) production, primarily used to control the orientation of liquid crystal molecules. However, during the rubbing process, because the PS is often set high and has a large height difference from the surrounding area, the rubbing hairs of the rubbing cloth will trail when passing over the PS, resulting in uneven rubbing of the alignment film (PI), and thus uneven fixation of the liquid crystal molecules. When the voltage changes, the corresponding liquid crystal molecules have different abilities to change accordingly, and their ability to control light also varies. If the PS is in the conventional design position, the uneven rubbing occurs in the opening area, which can easily lead to uneven brightness within the pixel. Even in the black state, some light can still pass through, making the black state of the display less dark and the contrast poor. Summary of the Invention

[0004] The present invention aims to overcome the shortcomings of the prior art and proposes a method for manufacturing a TFT-LCD liquid crystal display and a TFT-LCD liquid crystal display. To achieve the above-mentioned object, the present invention adopts the following technical solutions:

[0005] In a first aspect, an embodiment of the present invention provides a method for manufacturing a TFT-LCD liquid crystal display screen, comprising:

[0006] A gate layer, a gate insulating layer, a silicon island, an active layer, a source / drain electrode, a passivation layer and a transparent pixel electrode ITO are sequentially formed on the first substrate to form a first base plate;

[0007] A BM matrix, a color filter layer, an OC layer, a plurality of spacers, and an alignment film are sequentially formed below the second substrate to form the second substrate, wherein when the alignment film is rubbed, the orthographic projections of the tracks formed by the rubbing cloth moving along the rubbing direction through the plurality of spacers on the second substrate all fall within the area of ​​the BM matrix;

[0008] The second substrate is disposed on the first substrate.

[0009] As a preferred implementation of the embodiment of the present invention, the BM matrix, the color filter layer, the OC layer, a plurality of spacers and the alignment film are sequentially formed under the second substrate to form the second substrate, including:

[0010] A BM matrix is ​​formed under the second substrate, wherein an orthographic projection of the BM matrix on the first substrate at least covers the gate layer.

[0011] As a preferred implementation manner of an embodiment of the present invention, a gate layer, a gate insulating layer, a silicon island, an active layer, a source / drain, a passivation layer and a transparent pixel electrode ITO are sequentially formed on the first substrate to form a first substrate, including:

[0012] A plurality of gates and gate connecting lines are formed on the first substrate to form the gate layer, and the gate connecting lines are arranged along the rubbing direction of the alignment film.

[0013] As a preferred implementation manner of the embodiment of the present invention, after the second substrate is disposed on the first substrate, the method further includes:

[0014] A liquid crystal layer is disposed between the first substrate and the second substrate.

[0015] As a preferred implementation manner of an embodiment of the present invention, a BM matrix, a color filter layer, an OC layer, a plurality of spacers, and an alignment film are sequentially formed below the second substrate to form the second substrate. When the alignment film is rubbed, the orthographic projections of the tracks formed by the rubbing cloth moving along the rubbing direction through the plurality of spacers on the second substrate all fall within the area of ​​the BM matrix. Furthermore, the method further comprises:

[0016] The alignment film is rubbed along the rubbing direction to form grooves of the alignment film.

[0017] In a second aspect, an embodiment of the present invention further provides a TFT-LCD liquid crystal display screen, comprising: a first substrate and a second substrate arranged correspondingly;

[0018] The first substrate includes a first substrate, a gate layer, a gate insulating layer, a silicon island, an active layer, a source / drain, a passivation layer and a transparent pixel electrode ITO;

[0019] The second substrate includes a second underlay, a BM matrix, a color filter layer, an OC layer, a plurality of spacers and an alignment film;

[0020] When the alignment film is rubbed, the orthographic projections of the tracks formed by the rubbing cloth moving along the rubbing direction through the plurality of spacers on the second substrate all fall within the area of ​​the BM matrix.

[0021] As a preferred implementation manner of the embodiment of the present invention, the orthographic projection of the BM matrix on the first substrate at least covers the gate layer.

[0022] As a preferred implementation of the embodiment of the present invention, the gate layer includes a plurality of gates and gate connecting lines;

[0023] The gate connection line is arranged along a track in a rubbing direction of the alignment film.

[0024] As a preferred implementation of the embodiment of the present invention, it further includes: a liquid crystal layer;

[0025] The liquid crystal layer is disposed between the first substrate and the second substrate.

[0026] As a preferred implementation of the embodiment of the present invention, it also includes: a sealing structure;

[0027] The sealing structure is arranged around the liquid crystal layer, and is used to bond the first substrate and the second substrate, and frame the liquid crystal layer.

[0028] Compared with the prior art, the advantages and positive effects of the present invention are:

[0029] In the present invention, when the alignment film is rubbed, the tracks formed by the rubbing cloth moving along the rubbing direction through several spacers (that is, the trailing tracks generated when the rubbing cloth rubs the alignment film) are projected on the second substrate within the area of ​​the BM matrix, thereby effectively blocking the trailing tracks, preventing undesirable phenomena from entering the opening area, ensuring uniform friction in the opening area, uniform pixel brightness, and improving the display effect of the TFT-LCD liquid crystal display. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] Figure 1 A flowchart of a method for manufacturing a TFT-LCD liquid crystal display screen provided by the present invention;

[0031] Figure 2 A flowchart of a method for manufacturing a TFT-LCD liquid crystal display screen provided by the present invention;

[0032] Figure 3A flowchart of a method for manufacturing a TFT-LCD liquid crystal display screen provided by the present invention;

[0033] Figure 4 A schematic diagram of a top view of a TFT-LCD liquid crystal display screen provided by the present invention;

[0034] Figure 5 This is a schematic side view of the structure of a TFT-LCD liquid crystal display provided by the present invention. DETAILED DESCRIPTION

[0035] In order to more clearly understand the above-mentioned objects, features and advantages of the present invention, the present invention is further described below in conjunction with the accompanying drawings and embodiments. It should be noted that, in the absence of conflict, the embodiments of the present application and the features therein can be combined with each other.

[0036] In the following description, many specific details are set forth to facilitate a full understanding of the present invention. However, the present invention may also be implemented in other ways than those described herein. Therefore, the present invention is not limited to the specific embodiments disclosed below.

[0037] In the description of the present invention, it should be understood that the terms "length", "width", "above", "below", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention.

[0038] In the present invention, unless otherwise expressly specified or limited, terms such as "installed," "connected," "connect," "fixed," and "disposed" should be understood in a broad sense. For example, they may refer to fixed or detachable connections, or integration; mechanical or electrical connections; direct or indirect connections through an intermediate medium; or internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in the present invention based on specific circumstances.

[0039] In the existing TFT-LCD manufacturing process, because the spacers are mainly used to control the gap between the first and second substrates, they are often set high, with a large height difference from the surrounding areas. During the alignment film rubbing process, the friction hairs are prone to tailing when the rubbing cloth passes over the protruding spacers, resulting in uneven friction of the alignment film and uneven fixation of the liquid crystal molecules. When the voltage changes, the corresponding liquid crystal molecules have different abilities to change accordingly, and their ability to control light is also different. If the spacers are in the conventional design position, the tailing tracks formed in the friction direction, that is, the uneven friction positions, are very likely to appear in the opening area, resulting in uneven brightness within the pixels. Even in the black state, some light still passes through, making the black state of the display not too dark and the contrast poor.

[0040] In order to address the above-mentioned defects, in a first aspect, an embodiment of the present invention provides a method for manufacturing a TFT-LCD liquid crystal display screen, comprising:

[0041] S10, forming a gate layer, a gate insulating layer, a silicon island, an active layer, a source / drain electrode, a passivation layer and a transparent pixel electrode ITO in sequence on the first substrate to form a first substrate;

[0042] S20, sequentially forming a BM matrix, a color filter layer, an OC layer, a plurality of spacers, and an alignment film below the second substrate to form a second substrate, wherein when the alignment film is rubbed, the orthographic projections of the tracks formed by the rubbing cloth moving along the rubbing direction through the plurality of spacers on the second substrate all fall within the area of ​​the BM matrix;

[0043] S30: Dispose the second substrate on the first substrate.

[0044] In an embodiment of the present invention, when the alignment film is rubbed, the tracks formed by the movement of the rubbing cloth through several spacers along the rubbing direction (that is, the trailing tracks generated when the rubbing cloth rubs the alignment film) are projected on the second substrate within the area of ​​the BM matrix, thereby effectively blocking the trailing tracks, preventing undesirable phenomena from entering the opening area, ensuring uniform friction in the opening area, uniform pixel brightness, and improving the display effect of the TFT-LCD liquid crystal display.

[0045] Preferably, the step of sequentially forming a gate layer, a gate insulating layer, a silicon island, an active layer, a source / drain electrode, a passivation layer, and a transparent pixel electrode ITO on the first substrate to form the first substrate specifically includes:

[0046] First, a first substrate is provided; the first substrate is a glass substrate. The gate layer is formed on the glass substrate using processes such as metal sputtering film formation, photolithography, and wet etching; wherein the gate layer includes a gate and a gate connection line (i.e., a scan line), and the gate is a component structure of a thin film transistor, used to provide a thin film transistor switching signal. Furthermore, it also includes forming a gate insulating layer and a silicon island on the gate layer; wherein the gate insulating layer and the silicon island can be formed using PECVD technology, and the silicon island is a component structure of a thin film transistor, used to provide a channel. Furthermore, it also includes the formation of an active layer. After further forming the source and drain electrodes, the active layer serves as a channel channel for the source and drain electrodes. In an embodiment of the present invention, the active layer, source and drain electrodes can be formed using processes such as metal sputtering film formation, photolithography, wet etching, and channel dry etching, wherein the source electrode is connected to the data line to provide a data signal for the pixel unit, and the drain electrode is connected to the pixel to also provide a data signal for the pixel unit. Furthermore, the process also includes the formation of a passivation layer and vias. After the aforementioned processes are completed, these passivation layers and vias can be formed on the glass substrate using processes such as PECVD film formation, photolithography, and dry etching of vias. The passivation layer serves as protective insulation for the TFT channel and metal lines, and the vias provide electrical connectivity between metal film layers. Furthermore, the process also includes the formation of transparent ITO pixel electrodes. After the aforementioned processes are completed, these transparent ITO pixel electrodes can be formed on the glass substrate using processes such as ITO sputtering film formation, ITO photolithography, and ITO wet etching. Through these processes, a first substrate, i.e., a TFT substrate, can be formed.

[0047] Preferably, a BM matrix, a color filter layer, an OC layer, a plurality of spacers, and an alignment film are sequentially formed below the second substrate to form the second substrate. When the alignment film is rubbed, the orthographic projections of the tracks formed by the rubbing cloth moving along the rubbing direction through the plurality of spacers on the second substrate all fall within the area of ​​the BM matrix. Specifically, the method includes:

[0048] First, a second substrate is provided; the second substrate is a glass substrate. A BM matrix is ​​formed on the glass substrate using a photolithography process. The BM matrix is ​​a black matrix that serves as the color boundary between the R, G, and B sub-pixels in the color filter layer. It blocks stray light, prevents backlight leakage, color mixing between RGB pixels, and prevents ambient light from reaching the TFT channel and causing leakage current. Furthermore, a photolithography process is used to form the color filter layer on the glass substrate after the above-mentioned process. The color filter layer includes R, G, and B sub-pixels, and its arrangement and specifications can be flexibly configured according to customer needs. Furthermore, a uniform OC layer (flattening layer) can be formed on the surface of the color filter layer using a coating and curing process to achieve overall flatness of the second substrate and protect the internal structure. Furthermore, a number of spacers can be regularly formed on the OC layer using a photolithography process. These spacers support the first and second substrates and maintain the thickness of the liquid crystal cell, thereby preventing uneven cell thickness when the TFT-LCD panel is under pressure, which could affect the display quality. Furthermore, after the above process is completed, an alignment film needs to be coated on the glass substrate, and the alignment film needs to be rubbed to form grooves for liquid crystal alignment. Through the above process, a second substrate, namely a CF substrate, can be formed.

[0049] It should be noted that in this embodiment of the present invention, an alignment film is also provided on the first substrate, with the liquid crystal disposed between the upper and lower alignment films. However, since the height difference on the surface of the first substrate is relatively flat and not noticeable, the grooves created by friction are relatively uniform and do not significantly affect the display effect. Therefore, this embodiment of the present invention only describes the alignment film on the second substrate.

[0050] Preferably, the step of disposing the second substrate on the first substrate specifically includes:

[0051] A sealing structure, such as a frame glue, is provided. The sealing structure is a square structure and is provided around the liquid crystal layer in the TFT-LCD liquid crystal display screen. The first substrate and the second substrate can be bonded together, thereby providing the second substrate on the first substrate and framing the liquid crystal layer.

[0052] As a preferred implementation of the present invention, please refer to Figure 2 The step S20 of sequentially forming a BM matrix, a color filter layer, an OC layer, a plurality of spacers, and an alignment film under the second substrate to form the second substrate, wherein when rubbing the alignment film, the orthographic projections of the tracks formed by the rubbing cloth moving along the rubbing direction through the plurality of spacers on the second substrate all fall within the area of ​​the BM matrix includes:

[0053] S21. Form a BM matrix under the second substrate, wherein the orthographic projection of the BM matrix on the first substrate at least covers the gate layer.

[0054] Specifically, a BM matrix is ​​formed under the second substrate using a photolithography process. The BM matrix is ​​a black matrix and can serve as a color boundary between R, G, and B sub-pixels in the color filter layer to block stray scattered light, prevent backlight leakage, color mixing between RGB pixels, and prevent ambient light from irradiating the TFT channel to generate leakage current.

[0055] The orthographic projection of the BM matrix on the first substrate at least covers the gate layer to avoid light leakage.

[0056] Furthermore, step S20 further includes:

[0057] S22, forming the color filter layer by using a photolithography process.

[0058] The color filter layer includes R, G, and B sub-pixels, and their arrangement and specifications can be flexibly set according to customer needs.

[0059] S23 , forming the OC layer by coating and curing processes.

[0060] The OC layer is used to achieve overall planarization of the second substrate and protect the internal structure.

[0061] S24, forming the plurality of spacers by using a photolithography process.

[0062] The spacers are used to support the first substrate and the second substrate, and maintain the thickness of the liquid crystal cell, so as to prevent uneven cell thickness from affecting the display effect when the TFT-LCD liquid crystal display panel is under pressure.

[0063] S25, coating an alignment film.

[0064] The alignment film needs to be subjected to a rubbing process to form grooves for liquid crystal alignment.

[0065] As a preferred implementation of the present invention, please refer to Figure 3 The step S10 of sequentially forming a gate layer, a gate insulating layer, a silicon island, an active layer, a source / drain, a passivation layer and a transparent pixel electrode ITO on the first substrate to form a first substrate includes:

[0066] S11. Form a plurality of gates and gate connecting lines on the first substrate to form the gate layer, wherein the gate connecting lines are arranged along the rubbing direction of the alignment film.

[0067] The first substrate is a glass substrate, and the gate layer can be formed using processes such as metal sputtering, photolithography, and wet etching. The gate layer includes a plurality of gates and gate connecting lines (i.e., scan lines). The gates are components of thin-film transistors and are used to provide switching signals for the thin-film transistors. In an embodiment of the present invention, the gate connecting lines are arranged along the rubbing direction of the alignment film. This arrangement ensures that the BM matrix, under the condition that the orthographic projection of the BM matrix on the first substrate at least covers the gate layer, can simultaneously cover the gate layer and the tailing phenomenon caused by the friction hairs with a minimal area, thereby avoiding uneven pixel brightness and saving production costs.

[0068] Furthermore, step S10 further includes:

[0069] S12. Form a gate insulating layer and a silicon island using PECVD technology.

[0070] The gate insulating layer is used to isolate the gate from other parts to prevent current leakage / short circuit; the silicon island is a component structure of the thin film transistor and is used to provide a channel.

[0071] S13. Use metal sputtering film formation, photolithography, wet etching, channel dry etching and other process steps to form an active layer, a source electrode and a drain electrode.

[0072] The active layer serves as a channel for the source and drain electrodes; the source electrode is connected to the data line to provide a data signal for the pixel unit, and the drain electrode is connected to the pixel to also provide a data signal for the pixel unit.

[0073] S14. A passivation layer is formed by using processes such as PECVD film formation, photolithography, and via dry etching.

[0074] The passivation layer is used for protection and insulation of the channel and the metal wire; in addition, it also includes the formation of vias, which are used for conduction between metal film layers.

[0075] S15, forming a transparent pixel electrode ITO by adopting processes such as ITO sputtering film formation, ITO photolithography, and ITO wet etching.

[0076] Wherein, the transparent pixel electrode ITO serves as a common electrode of the TFT substrate.

[0077] As a preferred implementation of the embodiment of the present invention, refer to Figure 3 , after the step S30 of placing the second substrate on the first substrate, further comprising:

[0078] S40: Disposing a liquid crystal layer between the first substrate and the second substrate.

[0079] The first substrate and the second substrate may be bonded together by a sealing structure (such as a sealant), and the liquid crystal may be filled into the sealing structure to form the liquid crystal layer.

[0080] As a preferred implementation of the embodiment of the present invention, refer to Figure 2 After the step S20 of sequentially forming a BM matrix, a color filter layer, an OC layer, a plurality of spacers and an alignment film under the second substrate to form the second substrate, the method further includes:

[0081] S26 , rubbing the alignment film along the rubbing direction to form grooves on the alignment film.

[0082] In an embodiment of the present invention, when the alignment film is rubbed along the rubbing direction, the friction hairs of the rubbing cloth are prone to trailing when passing over protruding spacers. The above-mentioned technical solution ensures that the trailing tracks produced by the rubbing cloth when rubbing the alignment film fall within the area of ​​the BM matrix, thereby effectively shielding the trailing tracks and preventing undesirable phenomena from entering the opening area. This ensures uniform friction in the opening area, uniform pixel brightness, and improved display quality of the TFT-LCD display. The grooves of the alignment film are used to align and fix the liquid crystal molecules.

[0083] Second, reference Figure 4-5 , an embodiment of the present invention further provides a TFT-LCD liquid crystal display screen, comprising: a first substrate 100 and a second substrate 200 arranged correspondingly;

[0084] The first substrate 100 includes a first substrate 110, a gate layer 120, a gate insulating layer 130, a silicon island 140, an active layer 150, a source electrode 160 / a drain electrode 170, a passivation layer 180 and a transparent pixel electrode ITO 190;

[0085] The second substrate 200 includes a second underlay 210, a BM matrix 220, a color filter layer 230, an OC layer 240, a plurality of spacers 250 and an alignment film 260;

[0086] When the alignment film 260 is rubbed, the tracks formed by the rubbing cloth moving along the rubbing direction through the spacers 250 have their orthographic projections on the second substrate 200 all fall within the area of ​​the BM matrix 220 .

[0087] in, Figure 4 Only a partial structure of the top view of the TFT-LCD liquid crystal display screen in the embodiment of the present invention is shown, which is used to illustrate the relative position relationship of the partial structure and the rubbing direction. The rubbing direction is indicated by the arrow.

[0088] The technical solution in the embodiment of the present invention can ensure that when the rubbing cloth rubs the alignment film, the tailing tracks generated will fall within the area of ​​the BM matrix, thereby effectively preventing adverse phenomena from entering the opening area, ensuring uniform friction in the opening area, uniform pixel brightness, and improving the display effect of the TFT-LCD liquid crystal display.

[0089] As a preferred embodiment of the present invention, the orthographic projection of the BM matrix on the first substrate at least covers the gate layer. The BM matrix is ​​a black matrix that serves as the color boundary between the R, G, and B sub-pixels in the color filter layer, blocking stray light, preventing backlight leakage, color mixing between RGB pixels, and preventing ambient light from reaching the TFT channel and generating leakage current. The orthographic projection of the BM matrix on the first substrate at least covers the gate layer to prevent light leakage.

[0090] As a preferred implementation of the embodiment of the present invention, the gate layer includes a plurality of gates and gate connecting lines;

[0091] The gate connection line is arranged along a track in a rubbing direction of the alignment film.

[0092] In an embodiment of the present invention, the gate connection line is arranged along the friction direction of the alignment film. In this way, under the condition that the positive projection of the BM matrix on the first substrate at least covers the gate layer, it can be ensured that the BM matrix can simultaneously cover the gate layer and the tailing phenomenon caused by the friction hair with the smallest area, thereby avoiding uneven pixel brightness and saving production costs.

[0093] As a preferred implementation of the embodiment of the present invention, it further includes: a liquid crystal layer;

[0094] The liquid crystal layer is disposed between the first substrate and the second substrate.

[0095] As a preferred implementation of the embodiment of the present invention, it also includes: a sealing structure;

[0096] The sealing structure is arranged around the liquid crystal layer, and is used to bond the first substrate and the second substrate, and frame the liquid crystal layer.

[0097] The first substrate and the second substrate may be bonded together by a sealing structure (such as a sealant), and liquid crystal molecules may be filled into the sealing structure to form the liquid crystal layer.

[0098] The beneficial effects achieved by the electronic device provided by the present invention refer to the beneficial effects in any embodiment of the present invention.

[0099] The above description is merely a preferred embodiment of the present invention and does not constitute any other form of limitation to the present invention. Any person skilled in the art may utilize the technical contents disclosed above to change or modify them into equivalent embodiments with equivalent changes for application in other fields. However, any simple modification, equivalent change, and modification of the above embodiments made in accordance with the technical essence of the present invention without departing from the technical solution of the present invention shall still fall within the scope of protection of the technical solution of the present invention.

Claims

1. A method for manufacturing a TFT-LCD liquid crystal display screen, characterized in that: include: A gate layer, a gate insulating layer, a silicon island, an active layer, a source / drain electrode, a passivation layer and a transparent pixel electrode ITO are sequentially formed on the first substrate to form a first base plate; A BM matrix, a color filter layer, an OC layer, a plurality of spacers, and an alignment film are sequentially formed below the second substrate to form the second substrate, wherein when the alignment film is rubbed, the orthographic projections of the tracks formed by the rubbing cloth moving along the rubbing direction through the plurality of spacers on the second substrate all fall within the area of ​​the BM matrix; The second substrate is disposed on the first substrate.

2. The method according to claim 1, characterized in that The BM matrix, the color filter layer, the OC layer, a plurality of spacers and the alignment film are sequentially formed under the second substrate to form the second substrate, including: A BM matrix is ​​formed under the second substrate, wherein an orthographic projection of the BM matrix on the first substrate at least covers the gate layer.

3. The method according to claim 2, characterized in that The gate layer, the gate insulating layer, the silicon island, the active layer, the source / drain, the passivation layer and the transparent pixel electrode ITO are sequentially formed on the first substrate to form the first substrate, including: A plurality of gates and gate connecting lines are formed on the first substrate to form the gate layer, and the gate connecting lines are arranged along the rubbing direction of the alignment film.

4. The method according to claim 1, wherein After the second substrate is disposed on the first substrate, the method further includes: A liquid crystal layer is disposed between the first substrate and the second substrate.

5. The method according to claim 1, characterized in that A BM matrix, a color filter layer, an OC layer, a plurality of spacers, and an alignment film are sequentially formed below the second substrate to form the second substrate. When the alignment film is rubbed, the orthographic projections of the tracks formed by the rubbing cloth moving along the rubbing direction through the plurality of spacers on the second substrate all fall within the area of ​​the BM matrix. Furthermore, the method further comprises: The alignment film is rubbed along the rubbing direction to form grooves of the alignment film.

6. A TFT-LCD liquid crystal display screen, characterized in that: include: A first substrate and a second substrate are arranged correspondingly; The first substrate includes a first substrate, a gate layer, a gate insulating layer, a silicon island, an active layer, a source / drain, a passivation layer and a transparent pixel electrode ITO; The second substrate includes a second underlay, a BM matrix, a color filter layer, an OC layer, a plurality of spacers and an alignment film; When the alignment film is rubbed, the orthographic projections of the tracks formed by the rubbing cloth moving along the rubbing direction through the plurality of spacers on the second substrate all fall within the area of ​​the BM matrix.

7. The TFT-LCD liquid crystal display according to claim 6, characterized in that: The orthographic projection of the BM matrix on the first substrate at least covers the gate layer.

8. The TFT-LCD liquid crystal display according to claim 7, characterized in that: The gate layer includes a plurality of gates and gate connecting lines; The gate connection line is arranged along a track in a rubbing direction of the alignment film.

9. The TFT-LCD liquid crystal display according to claim 6, characterized in that: Also includes: liquid crystal layer; The liquid crystal layer is disposed between the first substrate and the second substrate.

10. The TFT-LCD liquid crystal display screen according to claim 9, characterized in that: Also includes: Sealed structure; The sealing structure is arranged around the liquid crystal layer, and is used to bond the first substrate and the second substrate, and frame the liquid crystal layer.

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