X-ray generating device, x-ray analyzing device, control method for x-ray generating device, and control system for x-ray generating device

Abstract

The invention provides a technology which can realize a window holding part, an X-ray generation device, an X-ray analysis device, a control method of the X-ray generation device, and a control system of the X-ray generation device without providing an X-ray observation part in a vacuum area and without using a part of X-rays used for X-ray analysis and measurement. According to one aspect of the invention, an X-ray generating device (20) is provided. The X-ray generation device (20) includes an X-ray generation unit (203a) and an X-ray transmission window. The X-ray generation unit (203a) is configured so as to generate X-rays by receiving an electron beam from the outside. The X-ray transmission window includes a first X-ray transmission window (204a) and a second X-ray transmission window (205a). The first X-ray transmission window (204a) is configured so as to transmit a first X-ray (L1) directed in a first direction (D1) among the X-rays. The first X-ray (L1) is incident on an X-ray observation unit (21) which is provided on the optical axis thereof and which is capable of observing the X-ray focus of the X-ray. The second X-ray transmission window (204) is configured so as to transmit a second X-ray (L2) directed in a second direction (D2) different from the first direction (D1) among the X-rays.

Description

Technical Field

[0001] The present invention relates to an X-ray generating device, an X-ray analyzing device, a control method for an X-ray generating device, and a control system for an X-ray generating device. Background Art

[0002] Patent Document 1 discloses a technique for determining and controlling the width of an electron beam when the electron beam intersects a target, which is implemented together with an X-ray source capable of generating an X-ray target. Prior art literature Patent Literature

[0003] Patent Document 1: Japanese Patent Application No. 2014-503960 Non-patent literature

[0004] Non-Patent Document 1: Benedikt Gunther et al., “Device for source position stabilization and beam parameter monitoring at inverse Compton X-ray sources,” Journal of Synchrotron Radiation, September 2019. Non-Patent Document 2: Jae Yeon Park et al., “X-ray beam-position feedback system with easy-to-use beam-position monitor,” Journal of Synchrotron Radiation, May 2019. Summary of the Invention Problems to be solved by the invention

[0005] However, in Patent Document 1, the sensor for detecting the presence of the electron beam spot is located inside the vacuum housing, making it difficult to construct a system for detecting the electron beam. Furthermore, Patent Document 1 envisions liquid targets such as liquid metal jets, making it difficult to expand its application to solid targets such as fixed or rotating targets.

[0006] In view of the above situation, the present invention aims to provide a technology that can realize a window holding part, an X-ray generating device, an X-ray analyzing device, a control method of an X-ray generating device and a control system of an X-ray generating device without setting up an X-ray observation part in a vacuum area and without using a part of the X-rays used for X-ray analysis and measurement. Solutions for solving problems

[0007] According to one embodiment of the present invention, an X-ray generating device is provided. The X-ray generating device includes an X-ray generating unit and an X-ray transmission window. The X-ray generating unit is configured to generate X-rays by receiving an electron beam from an external source. The X-ray transmission window includes a first X-ray transmission window and a second X-ray transmission window. The first X-ray transmission window is configured to transmit a first X-ray directed in a first direction among the X-rays. The first X-ray enters an X-ray observation unit disposed on its optical axis and capable of observing the X-ray focus of the X-ray. The second X-ray transmission window is configured to transmit a second X-ray directed in a second direction different from the first direction among the X-rays.

[0008] According to the present disclosure, it is possible to provide a technology that can be realized without providing an X-ray observation unit in a vacuum region and without using a portion of X-rays used for X-ray analysis measurement. BRIEF DESCRIPTION OF THE DRAWINGS

[0009] Figure 1 1 is a diagram showing an example of the system configuration of the X-ray analysis system 1 in the embodiment. Figure 2 1 is a diagram illustrating an example of the X-ray analysis device 2 in the embodiment. Figure 3 1 is an example of a cross-sectional view of the first window holding portion 204 in the embodiment. Figure 4 1 is an example of a cross-sectional view of the second window holding portion 205 in the embodiment. Figure 5 204 b is a diagram illustrating the positional relationship among the X-ray generation unit 203 a , the X-ray imaging unit 204 b , and the X-ray observation unit 21 . Figure 6 1 is a diagram showing an example of the hardware configuration of the information processing device 3 in the embodiment. Figure 7 It is a diagram illustrating an example of information processing in the embodiment. Figure 8 1 and 2 are diagrams showing examples of X-ray focal points acquired by the X-ray observation unit 21 and examples of data related to X-ray shapes. Figure 9 1 is an example of a cross-sectional view of the first window holding portion 404 in a modified example. DETAILED DESCRIPTION

[0010] [Example] The following describes embodiments of the present invention with reference to the accompanying drawings. The various features of the embodiments described below can be combined with each other.

[0011] 1. System Configuration of X-ray Analysis System 1 First, refer to Figure 1 The system configuration of the X-ray analysis system 1 of this embodiment will be described. Figure 1 1 is a diagram showing an example of the system configuration of the X-ray analysis system 1 in the embodiment. Figure 1 As shown, the X-ray analysis system 1 includes an X-ray analysis device 2 and an information processing device 3. The X-ray analysis system 1 is a system capable of performing X-ray sample analysis. The X-ray analysis device 2 and the information processing device 3 are configured to communicate with each other via a communication cable or a network. Thus, the X-ray analysis device 2 and the information processing device 3 can send or receive various information to or from each other. Note that in this embodiment, the information processing device 3 is a computer (personal computer (PC)). The information processing device 3 can also be a tablet computer, a smartphone, etc. instead of a computer. Here, the system shown in the X-ray analysis system 1 refers to a system composed of one or more devices or components. Therefore, the X-ray analysis device 2 alone or the information processing device 3 alone is also included in the system shown in the X-ray analysis system 1. The X-ray analysis device 2 and the information processing device 3 are operated by the measurer, i.e., the user.

[0012] 2. Configuration of X-ray Analyzer 2 Next, refer to Figure 2 The configuration of the X-ray analysis apparatus 2 of this embodiment will be described. Figure 2 1 is a diagram illustrating an example of an X-ray analysis device 2 in the embodiment. Figure 2 In order to clearly show features, the proportions of components may differ from the actual ones.

[0013] The X-ray analyzer 2 of this embodiment is a device for performing X-ray analysis and measurement. It includes an X-ray generator 20, an X-ray observation unit 21, a sample stage 22, and an X-ray detector 23. The X-ray analyzer 2 is configured to directly observe X-rays generated by the X-ray generator 20 at the X-ray observation unit 21. Furthermore, the X-ray analyzer 2 of this embodiment irradiates a sample on the sample stage 22 with X-rays generated by the X-ray generator 20, and the X-ray detector 23 detects X-rays reflected, diffracted, or scattered by the sample.

[0014] The X-ray generator 20 is a device that contains a vacuum space and can generate X-rays from a target within the space and emit the X-rays outside the vacuum. The X-ray generator 20 includes a housing 200, an insulating portion 201, a cathode portion 202, an anode portion 203, a first window holder 204, a second window holder 205, a housing 206, and a bellows 207.

[0015] The housing 200 forms a vacuum space within its interior. The housing 200 houses the insulating portion 201, cathode portion 202, anode portion 203, first window holder 204, and second window holder 205, among the components that make up the X-ray generator 20. Note that the vacuum state is not limited to a complete vacuum state and may also include a reduced pressure state sufficient to allow propagation of a particle beam, such as an electron beam, such as a low vacuum state.

[0016] The insulating portion 201 is formed of a material having electrical insulation properties, such as an insulator, etc. The insulating portion 201 functions as a support for the cathode portion 202 .

[0017] The cathode portion 202 is configured to emit an electron beam. It is electrically connected to the anode portion 203 via a cable, enabling the application of a high voltage. The cathode portion 202 is mounted on the insulating portion 201 so that the electron beam can be directed toward the anode portion 203, thereby insulating the cathode portion 202 from the bellows 207 described later.

[0018] The anode portion 203 is an anode that forms a pair with the cathode portion 202. The anode portion 203 accelerates the electron beam emitted by the cathode portion 202. The anode portion 203 has an X-ray generating portion 203a as a target at a position facing the cathode portion 202.

[0019] The X-ray generator 203a can be made of any metal. For example, the X-ray generator 203a can be made of a single metal such as carbon, aluminum, chromium, iron, cobalt, copper, molybdenum, rhodium, silver, or gold. Furthermore, the X-ray generator 203a can also include multiple single metals mentioned above and be configured to switch the metal used to generate X-rays based on the user's selection. This metal switching can be performed by moving a target material such as a rotating target. Furthermore, this metal switching can also be performed by changing the electron beam trajectory or by moving the position of the cathode portion 202. Furthermore, the X-ray generator 203a can be made of not only a solid target material such as a rotating target or a fixed target, but also a liquid target material such as a liquid metal jet. A liquid metal jet refers to the use of liquid metal instead of solid metal as the X-ray generator 203a. Examples of liquid metals include alloys containing copper, gallium, indium, tin, and the like.

[0020] The X-ray generator 203a is configured to generate X-rays in various directions by receiving the electron beam generated by the cathode 202. The X-rays generated in this manner include characteristic X-rays specific to the metal of the X-ray generator 203a. The X-rays generated in various directions include first X-rays L1 and second X-rays L2.

[0021] The first X-ray L1 is used to directly observe the X-ray focus in the X-ray generating unit 203a. That is, the first X-ray L1 points to the first direction D1, is taken out to the outside of the X-ray generating device 20 through the first X-ray transmission window 204a of the first window holding unit 204, and is incident on the X-ray observation unit 21 that is set on its optical axis and can observe the X-ray focus of the X-ray. At this time, the first X-ray L1 is directly incident on the X-ray observation unit 21 from the X-ray generating unit 203a without passing through the sample. That is, in this embodiment, the situation where a sample is set between the X-ray generating unit 203a and the X-ray observation unit 21 is excluded. Regarding the first window holding unit 204, reference will be made later. Figure 3 Thus, it is possible to directly observe X-rays using one of the plurality of X-ray transmission windows. In addition, in this way, it is possible to control the X-rays generated from the X-ray generation unit 203a.

[0022] The second window holding portion 205 has a second X-ray transmission window 205a. The second X-ray transmission window 205a is configured to transmit the second X-ray L2 directed in the second direction D2 different from the first direction D1. The second window holding portion 205 will be described later. Figure 4 To describe.

[0023] The housing 206 includes a plurality of platforms for parallel movement of the cathode portion 202. For example, the plurality of platforms include a platform that can move in the X-axis direction, a platform that can move in the Y-axis direction, and a platform that can move in the Z-axis direction. The plurality of platforms move along their respective axial directions according to the movement instructions received. As the plurality of platforms move, the housing 206, the insulating portion 201, and the cathode portion 202 supported by the insulating portion 201 also move. In addition, when the three mutually orthogonal spatial axes are the X-axis, Y-axis, and Z-axis, the directions along the X-axis, Y-axis, and Z-axis are referred to as the X-axis direction, the Y-axis direction, and the Z-axis direction, respectively. Note that the housing 206 is arranged outside the vacuum. The housing 206 is connected to the insulating portion 201 via a bellows 207. In addition, as shown in the modified example described later, the housing 206 can also be configured to change the posture of the cathode portion 202. In addition, as shown in the modified example described later, an actuator can also be used instead of the housing 206.

[0024] The bellows 207 is configured to deform in response to the movement of the housing 206. Using the bellows 207 allows the insulating portion 201 supporting the cathode portion 202 to smoothly move parallel to the X-axis, Y-axis, or Z-axis while maintaining the vacuum state of the X-ray generator 20. This allows for fine adjustment of the position of the electron beam emitted from the cathode portion 202.

[0025] The X-ray observation unit 21 is configured to observe the X-rays generated by the X-ray generation unit 203a. The X-ray observation unit 21 has an arbitrary configuration. For example, the X-ray observation unit 21 can be configured by an X-ray camera that uses a photodiode such as a charge coupled device (CCD) or a complementary metal oxide semiconductor (CMOS) to detect X-rays. In addition, the X-ray observation unit 21 can also be configured to receive visible light emitted by a scintillator that emits the first X-ray L1, focus the visible light through a lens or change the magnification, and detect the visible light with a photodiode. The material forming the scintillator can be a crystalline material such as LuAG or GAGG, or a powdered material such as P43.

[0026] In the present embodiment, the X-ray focus is directly observed in the X-ray observation section 21. This "direct observation" refers to the concept of imaging the image of the X-ray focus in the X-ray observation section 21 and observing the image. For example, "direct observation" includes using a pinhole camera to evaluate the profile of the X-ray focus by the point spread function (PSF) method. In addition, in addition to the method using a pinhole camera, "direct observation" also includes the method of a four-quadrant slit or an optical lens described later. On the other hand, "direct observation" does not include the case where a slit, a test pattern (for example, a star pattern), etc. is set on the X-ray optical path, and the X-ray focus size is inferred from the edge image through the line spread function (LSF), modulation transfer function (MTF), etc. from its transmission image.

[0027] The second X-rays L2 are used to analyze the sample using X-rays. Specifically, the second X-rays L2 irradiate the sample. More specifically, for example, the second X-rays L2 are directed in a second direction D2, which is different from the first direction D1. They are then emitted outside the X-ray generator 20 through the second X-ray transmission window 205a and incident on the sample on the sample stage 22.

[0028] The sample stage 22 is configured to accommodate a sample upon which the second X-rays L2 are incident. The second X-rays L2 incident on the sample are diffracted, reflected, or scattered by the sample. The sample stage 22 can be configured to move or tilt in any direction based on an action command generated by the processor 31. This action command is used to move or tilt the sample stage 22.

[0029] The X-ray detector 23 is configured to detect second X-rays L2 diffracted, reflected, or scattered from the sample placed on the sample stage 22. The detected X-rays are analyzed by the information processing device 3. The X-ray detector 23 can be a zero-dimensional detector using a counter tube, a one-dimensional detector using a linear CCD, or a two-dimensional detector using a CCD or imaging plate. In this manner, an X-ray analysis device can be provided that controls the X-rays used for X-ray analysis based on the observation results of the X-rays generated by the X-ray generator.

[0030] Next, refer to Figure 3 The first window holding unit 204 will be described. Figure 3 : is an example of a cross-sectional view of the first window retaining portion 204 in the embodiment. This cross-sectional view is a cross-sectional view of the first window retaining portion 204 as viewed from a plane parallel to the straight-forward direction of the first X-ray L1. The first window retaining portion 204 includes a first X-ray transmission window 204a, an X-ray imaging portion 204b, and an air hole 204c. In this embodiment, the first window retaining portion 204 is configured to be able to fit the first X-ray transmission window 204a and the X-ray imaging portion 204b, respectively. That is, the first X-ray transmission window 204a and the X-ray imaging portion 204b can be provided in the same unit. Thus, the X-ray imaging portion 204b can be configured as the same unit as the X-ray transmission window, and is therefore easily integrated into an existing system.

[0031] The first window holder 204 can be positioned in any position within the X-ray generator 20 as long as it does not mechanically interfere with the second X-ray L2. The first window holder 204 can be positioned differently from the second window holder 205 relative to the position of the X-ray generator 203a, or they can be positioned in the same relationship.

[0032] The first X-ray transmission window 204a is configured to transmit first X-rays L1 directed in a first direction D1. The shape of the first X-ray transmission window 204a is arbitrary, and may be, for example, a flat plate. The first X-ray transmission window 204a may be made of any material that transmits X-rays, such as beryllium, carbon, diamond, or SUS.

[0033] The X-ray imaging unit 204b receives the incident first X-ray L1. The X-ray imaging unit 204b is configured to be able to form an image of the first X-ray L1 in the X-ray observation unit 21. In this embodiment, a pinhole 204b2 is formed in the X-ray imaging unit 204b. Among the X-rays generated by the X-ray generating unit 203a, the X-rays that pass through the pinhole 204b2 of the X-ray imaging unit 204b go straight and form an image of the X-ray generating unit 203a that is reversed in the top, bottom, left, and right directions in the X-ray observation unit 21. By using the pinhole 204b2, the image of the X-ray generating unit 203a can be formed in the X-ray observation unit 21. In addition, since the image of the X-ray generating unit 203a is formed in the X-ray observation unit 21, the situation of the X-ray generating unit 203a can be observed.

[0034] The shape of the X-ray imaging part 204b is arbitrary, for example, a flat plate. When the pinhole 204b2 is formed in the X-ray imaging part 204b, the shape of the pinhole 204b2 is arbitrary, for example, a cylindrical shape, a polygonal prism (triangular prism, quadrangular prism, etc.).

[0035] When the pinhole 204b2 is formed in the X-ray imaging portion 204b, the material forming the X-ray imaging portion 204b can be any material capable of shielding X-rays, such as molybdenum, tungsten, platinum, gold, etc. Furthermore, when the X-ray imaging portion 204b is disposed in a vacuum, the material forming the X-ray imaging portion 204b can be a material that is resistant to ozone generated in the vacuum within the housing portion 200.

[0036] In this embodiment, the size of the X-ray focal spot is 40 μm or less. The diameter of the pinhole 204b2 is preferably smaller than the size of the X-ray focal spot. Preferably, the diameter of the pinhole 204b2 is 20 μm or less. More preferably, the diameter of the pinhole 204b2 is 5 μm or less. In addition, the diameter of the pinhole 204b2 can be 1, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, or 20 μm, and can also be within the range between any two values ​​shown here. Note that the diameter of the pinhole 204b2 can be selected based on the material forming the X-ray imaging unit 204b, the wavelength of the characteristic X-rays, etc. By using a pinhole 204b2 of an appropriate diameter, a clearer image of the X-ray generating unit 203a can be formed in the X-ray observation unit 21.

[0037] When a pinhole 204b2 is formed in the X-ray imaging unit 204b, the depth of the pinhole 204b2 can be any value. The deeper the depth of the pinhole 204b2, the better. Preferably, the depth of the pinhole 204b2 is 50μm or greater. Note that the depth of the pinhole 204b2 can be selected based on the material forming the X-ray imaging unit 204b, the wavelength of the characteristic X-rays, and other factors. By using a pinhole 204b2 of an appropriate depth, a clearer image of the X-ray generating unit 203a can be formed in the X-ray observation unit 21.

[0038] In this embodiment, the X-ray imaging unit 204b can be provided in a vacuum between the first X-ray transmission window 204a and the X-ray generating unit 203a. Regarding the positional relationship between the X-ray generating unit 203a, the X-ray imaging unit 204b and the X-ray observing unit 21, reference will be made to FIG. Figure 5 As described later, since the X-ray imaging unit 204b can be disposed closer to the X-ray generating unit 203a than the first X-ray transmission window 204a, an image of sufficient size can be formed in the X-ray observation unit 21 without requiring a large device.

[0039] The air hole 204 c is a hole that allows gas to pass between the space defined between the first X-ray transmission window 204 a and the X-ray imaging unit 204 b in the first window holder 204 and the space outside the first window holder 204 .

[0040] The first direction D1 is Figure 3 The first X-ray L1 travels in a first direction D1, that is, a direction from the X-ray imaging portion 204b to the first X-ray transmission window 204a.

[0041] Next, refer to Figure 4 The second window holding unit 205 will be described. Figure 4 : is an example of a cross-sectional view of the second window holding portion 205 in the embodiment. This cross-sectional view is a view of the cross section of the second window holding portion 205 observed from a plane parallel to the straight-forward direction of the second X-ray L2. The second window holding portion 205 includes a second X-ray transmission window 205a. The second window holding portion 205 is configured to fit the second X-ray transmission window 205a. Regarding the shape of the second X-ray transmission window 205a and the material forming the second X-ray transmission window 205a, reference can be made to the first X-ray transmission window 204a. The second direction D2 is Figure 4 The second X-ray L2 travels in the second direction D2, that is, from the X-ray generator 203a through the first X-ray transmission window 204a toward the sample on the sample stage 22.

[0042] In this way, by using the first window holding portion 204 for observing X-rays, unlike non-patent literature 1 and non-patent literature 2, part of the X-rays used for X-ray analysis measurement is not used to evaluate the X-rays, so it is less likely to affect the sample analysis in the X-ray analysis measurement.

[0043] Next, we will refer to Figure 5 The positional relationship among the X-ray generation unit 203 a , the X-ray imaging unit 204 b , and the X-ray observation unit 21 will be described. Figure 5 This diagram illustrates the positional relationship between the X-ray generator 203a, the X-ray imaging unit 204b, and the X-ray observation unit 21. The magnification of the image of the X-ray focal point formed at the X-ray observation unit 21 is the size obtained by dividing the distance B from the X-ray imaging unit 204b to the X-ray observation unit 21 by the distance A from the X-ray generator 203a to the X-ray imaging unit 204b. By utilizing this, if the X-ray imaging unit 204b can be positioned closer to the X-ray generator 203a, an image of sufficient size can be formed at the X-ray observation unit 21 without requiring a large device.

[0044] 3. Configuration of Information Processing Device 3 The information processing device 3 is a device for sending commands to the X-ray analyzer 2. For example, the information processing device 3 is configured to send at least one of the following: control commands for the X-ray generator 20 (described later); commands to the X-ray observation unit 21; operation commands for the sample stage 22 described above; commands to the X-ray detector 23; and commands for operating the goniometer arm. Furthermore, the information processing device 3 is capable of acquiring a profile based on the detection results of the X-ray detector 23 and analyzing samples such as thin films and single crystals.

[0045] Next, we will refer to Figure 6 The hardware configuration of the information processing device 3 will be described. Figure 6 : is a diagram showing an example of the hardware configuration of the information processing device 3 in the embodiment. Figure 6 As shown, the information processing device 3 includes a processor 31, a storage unit 32, a communication unit 33, an input unit 34, and an output unit 35. These components are electrically connected inside the information processing device 3 via a communication bus 30. The information processing device 3 executes processing related to the embodiment.

[0046] The processor 31 performs processing and control of the overall operation related to the information processing device 3. The processor 31 is, for example, a central processing unit (CPU). The information processing of the program stored in the storage unit 32 is specifically implemented by the processor 31 as an example of hardware, and can be executed as each functional unit included in the processor 31. The functional units included in the processor 31 can realize, for example, the following Figure 7 The processing shown. Note that the processor 31 is not limited to a single one, and multiple processors 31 may be provided depending on the function. In addition, a combination of these is also possible. At least one processor 31 can execute each step of the control method described below. The processor 31 is included in the control system of the X-ray generator 20.

[0047] The storage unit 32 stores the various information defined above. This can be implemented, for example, as a storage device such as a solid-state drive (SSD) that stores various programs related to the information processing device 3 and executed by the processor 31, or as a memory device such as a random access memory (RAM) that stores temporary information necessary for program operations (parameters, arrays, etc.). The storage unit 32 stores various programs related to the information processing device 3 and executed by the processor 31, as well as variables and data used by the processor 31 when executing processing based on the programs.

[0048] Communication unit 33 preferably utilizes wired communication methods such as USB (Universal Serial Bus), IEEE (Institute of Electrical and Electronics Engineers) 1394, Thunderbolt (registered trademark), and wired LAN (Local Area Network) network communication. However, communication unit 33 may also include wireless LAN network communication, mobile communication such as LTE (Long Term Evolution) / 3G (Third Generation Mobile Communication) / 4G (Fourth Generation Mobile Communication) / 5G (Fifth Generation Mobile Communication), and Bluetooth (registered trademark) communication, as needed. Specifically, it is more preferably implemented as a combination of these multiple communication methods. In other words, information processing device 3 can communicate various information with the outside world via communication unit 33.

[0049] The input unit 34 can be contained within the housing of the information processing device 3 or externally located. For example, the input unit 34 can be integrated with the output unit 35 to form a touchscreen. If it is a touchscreen, the user can input operations such as clicking and sliding. Of course, a switch button, a mouse, a keyboard, etc. can also be used in place of a touchscreen. In other words, the input unit 34 receives input based on user operations. This input is transmitted as a command signal via the communication bus 30 to the processor 31, which can then perform predetermined control or calculations as needed.

[0050] The output unit 35 can function as a display device for the information processing device 3. For example, the output unit 35 can be contained within the housing of the information processing device 3 or be external. The output unit 35 displays a graphical user interface (GUI) screen that the user can operate. For example, a display device such as a CRT display, a liquid crystal display, an organic EL display, or a plasma display is preferably used depending on the type of information processing device 3.

[0051] The program for implementing the software appearing in this embodiment can be provided as a computer-readable non-transitory storage medium (Non-Transitory Computer-Readable Medium), can be provided as a downloadable medium from an external server, and can also be provided by launching the program on an external computer and implementing its functions on a client device (so-called cloud computing).

[0052] Furthermore, in this embodiment, a "unit" can include, for example, a combination of hardware resources implemented by a broad circuit and software information processing specifically implemented by such hardware resources. Furthermore, while various information is processed in this embodiment, this information is physically represented by numerical values, such as voltage or current signal values, or can be represented as the high or low values ​​of binary bit sets consisting of 0s and 1s, or can be represented by quantum superpositions (so-called qubits), and communication or calculations can be performed on a broad circuit.

[0053] In a broad sense, a circuit refers to a circuit implemented by appropriately combining at least circuits, circuit classes, processors, and memories. This includes application-specific integrated circuits (ASICs), programmable logic devices (e.g., simple programmable logic devices (SPLDs), complex programmable logic devices (CPLDs), and field programmable gate arrays (FPGAs)).

[0054] 4. Information Processing Overview Next, we will refer to Figure 7 A method of controlling the X-ray analysis system 1 for causing the X-ray analysis device 20 to stably generate X-rays suitable for X-ray analysis measurement will be described. Figure 7 3 is a diagram illustrating an example of information processing in the embodiment. Specifically, the control method includes the following steps S1 to S4. The processor 31 may display the status of information processing related to the subsequent steps S1 to S4 on the output unit 35 in a manner that is recognizable to the user.

[0055] In step S1, the processor 31 receives the observation results of the first X-ray L1 in the X-ray observation unit 21 from the X-ray analyzer 2 via the communication unit 33. The observation results include data related to X-ray intensity or X-ray shape. Here, data related to X-ray intensity refers to data related to the number of X-ray photons detected per unit time on the detection surface of the X-ray observation unit 21. Data related to X-ray shape refers to data that includes both data related to the position on the detection surface of the X-ray observation unit 21 and data related to the X-ray intensity. Figure 8 : is a diagram showing an example of the X-ray focus acquired by the X-ray observation unit 21, and is a diagram showing an example of data related to the X-ray shape. Figure 8 In [1], the image of the X-ray focus is visually presented. Note that the data related to the X-ray shape also includes data after intensity information is transformed, such as binarization or grayscale conversion.

[0056] As described above, the metal of the X-ray generating unit 203a may be switched by changing the trajectory of the electron beam or moving the position of the cathode unit 202. In this case, the shape of the X-rays changes so as to be concentrated on the metal portion after the switch.

[0057] In step S2, processor 31 references reference data and compares it with the observation result. Reference data is data that specifies the conditions for stable X-ray intensity or shape. The reference data is stored in storage unit 32. Processor 31 can switch reference data for each wavelength of characteristic X-rays. If the observation result meets the conditions of the reference data, processor 31 proceeds to step S3. If the observation result does not meet the conditions of the reference data, processor 31 proceeds to step S4.

[0058] In step S3, the processor 31 generates a control instruction based on the observation result and sends the control instruction to the X-ray analysis device 2 via the communication unit 33. The control instruction is an instruction for controlling the X-rays generated by the X-ray generation unit 203a. In addition, the control instruction is generated based on the deviation between the observation result and the reference data. The control instruction includes an instruction to control the position of the cathode portion 202, which is the electron gun that generates the electron beam, an instruction to change the filament output of the cathode portion 202, an instruction to change the electric field output between the cathode portion 202 and the anode portion 203, etc. The X-ray analysis device 2 that receives the control instruction performs the action corresponding to the control instruction. Thereafter, the processor 31 returns to step S1. The processor 31 loops through the information processing of steps S1 to S3. In addition, the processor 31 performs real-time observation of the X-ray focus by looping through steps S1 to S3 at short intervals of less than 0.1 seconds.

[0059] Note that in this case, the control method based on the control command is not particularly limited. For example, P control, PD control, PID control, etc. can be appropriately adopted. The various coefficients related to the control can be set to preferred values ​​as needed. In addition, the value of the control command is preferably specified by voltage.

[0060] In step S4, when the observation result satisfies the condition of the reference data, the processor 31 ends the information processing. Note that the processor 31 can restart the information processing from step S1 according to an instruction from the user received via the input unit 34.

[0061] According to such information processing, the X-rays generated from the X-ray generation unit can be controlled according to the observation results.

[0062] In summary, according to this embodiment, a technology related to a window holding portion, an X-ray generating device, an X-ray analyzing device, a control method of an X-ray generating device, and a control system of an X-ray generating device can be provided without setting up an X-ray observation portion in a vacuum area and without using a part of the X-rays used for X-ray analysis and measurement.

[0063] [other] In the embodiment, the X-ray imaging part 204b is described as being provided between the first X-ray transmission window 204a and the X-ray generating part 203a, but in a modified example, the first X-ray transmission window 404a may be provided between the X-ray imaging part 404b and the X-ray generating part 203a. In this case, the X-ray imaging part 204b may be provided as follows. Figure 9 The first window retaining portion 404 is shown. Figure 9 2 is an example of a cross-sectional view of the first window holding portion 404 in a modified example. This cross-sectional view is a cross-sectional view of the first window holding portion 204 as viewed from a plane parallel to the straight-travel direction of the first X-ray L1. Figure 9 The first window retaining portion 404 includes a first X-ray transmission window 404a and an X-ray imaging portion 404b. That is, in the modified example, the first X-ray transmission window 404a and the X-ray imaging portion 404b are also provided in the same unit. In addition, a pinhole 404b2 is also formed in the X-ray imaging portion 404b of the modified example. Regarding the X-ray imaging portion 404b and the pinhole 404b2 of the modified example, reference may be made to the X-ray imaging portion 204b and the pinhole 204b2 of the embodiment. In the first window retaining portion 404 of the modified example, the X-ray imaging portion is not exposed to a high-energy environment, and therefore degradation of the X-ray imaging portion caused by generated ozone, etc., is less likely to occur. In addition, since the X-ray imaging portion is not provided in a vacuum, adjustment or replacement of the X-ray imaging portion can be easily performed.

[0064] Furthermore, in the embodiment, the first X-ray transmission window 204a and the X-ray imaging portion 204b are described as being provided in the same unit, but the first X-ray transmission window 204a and the X-ray imaging portion 204b may also be provided separately.

[0065] In the embodiment, the X-ray imaging unit 204b is described as a pinhole 204b2, but in a modified example, various forms can be used as long as an X-ray image can be formed through the X-ray observation unit 21. For example, the X-ray imaging unit in the modified example can be a four-quadrant slit. The four-quadrant slit is similar to the pinhole 204b2 and can limit the space through which X-rays can pass. That is, among the X-rays generated by the X-ray generating unit 203a, the X-rays that pass through the four-quadrant slit will form an image in the X-ray observation unit 21. In addition, the X-ray imaging unit in the modified example can also be an optical lens that can focus X-rays on the X-ray observation unit 21. The optical lens can use a curved crystal, a multilayer film crystal, etc.

[0066] In the embodiment, the magnification of the image of the X-ray focal point formed at the X-ray observation section 21 is described as the size obtained by dividing the distance B by the distance A. In a modified example, the magnification of the image of the X-ray focal point formed at the X-ray observation section 21 may be determined by the ratio of the distance of parallel movement of the housing 206 in a specific direction to the movement distance of the X-ray focal point formed by the corresponding movement of the X-ray observation section 21.

[0067] The housing portion 206 is described as moving parallel to the X-axis, Y-axis, or Z-axis, but the housing portion 206 of the modified example can adopt any structure. For example, the housing portion 206 is described as moving via multiple platforms, but the cathode portion 202 can also be moved using a platform that moves by applying a magnetic field. In addition, for example, the housing portion 206 of the modified example can be configured so that the posture of the cathode portion 202 can be changed by rotating the cathode portion 202 to any angle. In this case, the direction of the electron beam emitted by the cathode portion 202 to the X-ray generating unit 203a will change according to the change in the posture of the cathode portion 202. In this case, the control instructions can also include instructions for controlling the posture of the electron gun of the cathode portion 202 that generates the electron beam.

[0068] In the embodiment, the housing portion 206 for housing the platform is described, but other mechanisms may also be employed. In a modified embodiment, the position or posture of the cathode portion 202 may be controlled by an actuator. Such actuators include piezoelectric actuators, electromagnetic actuators, linear motors (voice coils), rotary motors with appropriate gearing, and the like.

[0069] In this embodiment, the reference data in step S2 can be generated using a learned model trained using a machine learning algorithm such as a neural network. The features of the learned model can include data such as X-ray intensity, X-ray shape, output of the cathode filament 202, the magnitude of the magnetic field applied between the cathode 202 and anode 203, and the position and posture of the cathode 202.

[0070] In a modified example, step S4 may not be executed. That is, in a modified example, processor 31 repeatedly executes the information processing of steps S1 to S3.

[0071] In this embodiment, the case where the size of the X-ray focal spot is 40 μm or less has been described. However, in a modified embodiment, the size of the X-ray focal spot may be 40 μm or more.

[0072] In addition, it can also be provided in various ways as described below.

[0073] (1) An X-ray generating device, comprising: an X-ray generating unit and an X-ray transmission window; the X-ray generating unit is configured to generate X-rays by receiving an electron beam from the outside; the X-ray transmission window includes a first X-ray transmission window and a second X-ray transmission window; the first X-ray transmission window is configured to transmit a first X-ray pointing in a first direction among the X-rays, where the first X-ray is incident on an X-ray observation unit arranged on its optical axis and capable of observing the X-ray focus of the X-ray; the second X-ray transmission window is configured to transmit a second X-ray pointing in a second direction different from the first direction among the X-rays.

[0074] According to this aspect, there is no need to provide an X-ray observation unit in the vacuum region, and there is no need to use a portion of X-rays used for X-ray analysis and measurement.

[0075] (2) The X-ray generating device according to (1) above, further comprising an X-ray imaging unit; the X-ray imaging unit is configured to receive the incident first X-ray and to form an image of the first X-ray in the X-ray observation unit.

[0076] According to this aspect, since the image of the X-ray generating unit is formed in the X-ray observation unit, the condition of the X-ray generating unit can be observed.

[0077] (3) The X-ray generation device according to (2) above, wherein a pinhole is formed in the X-ray imaging portion.

[0078] According to this aspect, by using the pinhole, an image of the X-ray generation unit can be formed in the X-ray observation unit.

[0079] (4) The X-ray generation device according to (3) above, wherein the pinhole has a diameter of 20 μm or less.

[0080] According to this aspect, by using a pinhole having an appropriate diameter, a clearer image of the X-ray generating section can be formed in the X-ray observation section.

[0081] (5) The X-ray generation device according to any one of (2) to (4) above, wherein the X-ray imaging section is provided between the X-ray transmission window and the X-ray generation section.

[0082] According to this embodiment, since the X-ray imaging unit can be provided at a position closer to the X-ray generating unit than the X-ray transmission window, an image of a sufficient size can be formed in the X-ray observation unit without requiring a large device.

[0083] (6) The X-ray generation device according to any one of (2) to (5) above, wherein the X-ray imaging section and the X-ray transmission window are provided in the same unit.

[0084] According to this embodiment, since the X-ray imaging unit and the X-ray transmission window can be constructed in the same unit, it is easy to integrate into an existing system.

[0085] (7) An X-ray analysis device comprising: an X-ray generating device, a sample table, and an X-ray detector; the X-ray generating device is the X-ray generating device described in any one of (1) to (6) above; the sample table is configured to be capable of setting a sample on which the second X-ray is incident; and the X-ray detector is configured to be capable of detecting the second X-ray diffracted, reflected, or scattered by the sample.

[0086] According to this aspect, it is possible to provide an X-ray analysis apparatus capable of controlling X-rays used for X-ray analysis measurement based on the observation results of X-rays generated by the X-ray generation unit.

[0087] (8) A method for controlling an X-ray generating device according to any one of (1) to (6) above, comprising the following steps: in a receiving step, receiving the observation result of the first X-ray in the X-ray observation section; in a controlling step, controlling the position or posture of the electron gun that generates the electron beam based on the observation result.

[0088] According to this aspect, the X-rays generated from the X-ray generating unit can be controlled according to the observation results.

[0089] (9) A control system for an X-ray generating device includes at least one processor that executes each step of the control method described in (8) above.

[0090] According to this aspect, the X-rays generated from the X-ray generating unit can be controlled according to the observation results. Of course, it’s not limited to this.

[0091] Finally, while various embodiments of the present invention have been described, these are presented only as examples and are not intended to limit the scope of the invention. The new embodiments may be implemented in various other forms, and various omissions, substitutions, and modifications may be made without departing from the spirit of the invention. These embodiments and their variations are intended to be within the scope and spirit of the invention and are intended to be included in the invention described in the claims and their equivalents. Description of Reference Numerals

[0092] 1: X-ray analysis system, 2: X-ray analysis equipment, 20: X-ray generator, 200: Accommodation part, 201: Insulation part, 202: cathode, 203: Anode, 203a: X-ray generating unit, 204: first window holding unit, 204a: first X-ray transmission window, 204b: X-ray imaging department, 204b2: pinhole, 204c: pores, 205: Second window holding unit, 205a: second X-ray transmission window, 206: Shell, 207: bellows, 21: X-ray observation unit, 22: Sample table, 23: X-ray detector, 3: Information processing device, 30: Communication bus, 31: Processor, 32: Storage Department, 33: Ministry of Communications, 34: Input unit, 35: Output unit, 404: first window holding unit, 404a: X-ray transmission window, 404b: X-ray imaging department, 404b2: pinhole, D1: First direction, D2: Second direction, L1: First X-ray, L2: Second X-ray.

Claims

1. An X-ray generating device, comprising: An X-ray generating unit and an X-ray transmission window; The X-ray generating unit is configured to generate X-rays by receiving an electron beam from the outside; The X-ray transmission window includes a first X-ray transmission window and a second X-ray transmission window; The first X-ray transmission window is configured to transmit a first X-ray directed in a first direction among the X-rays, where the first X-ray enters an X-ray observation portion disposed on its optical axis and capable of observing an X-ray focus of the X-ray; The second X-ray transmission window is configured to transmit second X-rays directed in a second direction different from the first direction among the X-rays.

2. The X-ray generating device according to claim 1, wherein: Also includes X-ray imaging department, The X-ray imaging unit is configured to receive the incident first X-rays and to form an image of the first X-rays in the X-ray observation unit.

3. The X-ray generating device according to claim 2, wherein: A pinhole is formed in the X-ray imaging portion.

4. The X-ray generating device according to claim 3, wherein: The pinhole has a diameter of 20 μm or less.

5. The X-ray generating device according to any one of claims 2 to 4, wherein: The X-ray imaging part is provided between the X-ray transmission window and the X-ray generating part.

6. The X-ray generating device according to any one of claims 2 to 5, wherein: The X-ray imaging part and the X-ray transmission window are provided in the same unit.

7. An X-ray analysis device comprising: X-ray generating device, sample stage and X-ray detector; The X-ray generating device is an X-ray generating device according to any one of claims 1 to 6; The sample stage is configured to be capable of placing a sample on which the second X-ray is incident; The X-ray detector is configured to detect the second X-rays diffracted, reflected, or scattered by the sample.

8. A method for controlling an X-ray generating device according to any one of claims 1 to 6, comprising the following steps: In the receiving step, an observation result of the first X-ray in the X-ray observation section is received; In the control step, the position or posture of an electron gun that generates the electron beam is controlled based on the observation result.

9. A control system for an X-ray generating device, comprising: At least one processor executes each step of the control method according to claim 8.

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