Display device and method of manufacturing same

Abstract

A display device and a method of manufacturing the same are provided. The display device includes a substrate including a display area and a non-display area adjacent to the display area; a light emitting element disposed on the substrate in the display area and including a first light emitting layer and a second light emitting layer disposed on the first light emitting layer; and an inspection array disposed on the substrate in the non-display area and including a first inspection pattern and a second inspection pattern disposed on the first inspection pattern.

Description

Technical Field

[0001] The present disclosure relates to a display device, and more particularly, to a display device providing visual information and a method of manufacturing the display device. Background Art

[0002] Display devices are formed by stacking multiple layers, such as light-emitting layers or metal layers. To form the multiple layers of a display device, a deposition process for depositing various types of thin films can be performed. The deposition process can be performed by closely contacting a mask defining openings having the same pattern as the deposition pattern of the light-emitting layer or metal layer, etc., to a target mask on which deposition is to be performed. The deposition pattern can be formed in the area exposed by the opening, and the shape of the deposition pattern can be controlled depending on the shape of the opening.

[0003] Meanwhile, the display device includes a light-emitting element, and the light-emitting element includes a pixel electrode, a common electrode, and a light-emitting layer disposed between the pixel electrode and the common electrode. To improve the luminous efficiency of the light-emitting element, functional layers (e.g., a hole transport layer, an electron transport layer, or an auxiliary layer, etc.) may be further disposed above and below the light-emitting layer. Summary of the Invention

[0004] The embodiment provides a display device with improved reliability.

[0005] The embodiment provides a method of manufacturing a display device.

[0006] According to an embodiment of the present disclosure, a display device includes: a substrate, including a display area and a non-display area adjacent to the display area; a light-emitting element, arranged in the display area and on the substrate, and including a first light-emitting layer and a second light-emitting layer arranged on the first light-emitting layer; and an inspection array, arranged in the non-display area and on the substrate, and including a first inspection pattern and a second inspection pattern arranged on the first inspection pattern.

[0007] In an embodiment, the first light emitting layer and the first inspection pattern may include the same material, and the second light emitting layer and the second inspection pattern may include the same material.

[0008] In an embodiment, the first light emitting layer and the second light emitting layer may overlap in a plan view.

[0009] In an embodiment, the first check pattern and the second check pattern may overlap in a plan view.

[0010] In an embodiment, the first light emitting layer and the second light emitting layer may include the same material.

[0011] In an embodiment, the display device may further include a charge generation layer disposed between the first light emitting layer and the second light emitting layer and between the first inspection pattern and the second inspection pattern. The charge generation layer may include a first semiconductor layer doped with an n-type dopant and a second semiconductor layer doped with a p-type dopant.

[0012] In an embodiment, the charge generation layer may extend from the display area to the non-display area.

[0013] In an embodiment, the light-emitting element may include: a first light-emitting element, which emits a first light and includes a first first light-emitting layer and a first second light-emitting layer arranged on the first first light-emitting layer; a second light-emitting element, which emits a second light and includes a second first light-emitting layer and a second second light-emitting layer arranged on the second first light-emitting layer; and a third light-emitting element, which emits a third light and includes a third first light-emitting layer and a third second light-emitting layer arranged on the third first light-emitting layer.

[0014] In an embodiment, the inspection array may include: a first inspection array, including a first first inspection pattern containing the same material as the first first light-emitting layer and a first second inspection pattern arranged on the first first inspection pattern and containing the same material as the first second light-emitting layer; a second inspection array, including a second first inspection pattern containing the same material as the second first light-emitting layer and a second second inspection pattern arranged on the second first inspection pattern and containing the same material as the second second light-emitting layer; and a third inspection array, including a third first inspection pattern containing the same material as the third first light-emitting layer and a third second inspection pattern arranged on the third first inspection pattern and containing the same material as the third second light-emitting layer.

[0015] In an embodiment, the second inspection array may be adjacent to the first inspection array in one direction, and the third inspection array may be adjacent to the second inspection array in the one direction.

[0016] According to an embodiment of the present disclosure, a method for manufacturing a display device includes: using multiple masks to form a first light-emitting layer on a substrate in a display area and forming a first inspection pattern on the substrate in a non-display area adjacent to the display area; and using the above-mentioned multiple masks to form a second light-emitting layer on the first light-emitting layer and form a second inspection pattern on the first inspection pattern.

[0017] In an embodiment, the first light emitting layer and the first inspection pattern may be formed of the same material, and the second light emitting layer and the second inspection pattern may be formed of the same material.

[0018] In an embodiment, the first light emitting layer and the second light emitting layer may be formed to overlap in a plan view, and the first inspection pattern and the second inspection pattern may be formed to overlap in a plan view.

[0019] In an embodiment, the first light emitting layer and the second light emitting layer may be formed of the same material.

[0020] In an embodiment, the method may further include forming a charge generation layer on the first light emitting layer and the first check pattern using an open mask defining openings corresponding to the display area and the non-display area after forming the first light emitting layer and the first check pattern and before forming the second light emitting layer and the second check pattern.

[0021] In an embodiment, the method may further include measuring the first inspection pattern to confirm alignment of the first light emitting layer and measuring the second inspection pattern to confirm alignment of the second light emitting layer after forming the second light emitting layer and the second inspection pattern.

[0022] In an embodiment, the formation of the first light-emitting layer and the first inspection pattern may include: using a first mask among the above-mentioned multiple masks to form a first first light-emitting layer and a first first inspection pattern; using a second mask among the above-mentioned multiple masks to form a second first light-emitting layer and a second first inspection pattern; and using a third mask among the above-mentioned multiple masks to form a third first light-emitting layer and a third first inspection pattern.

[0023] In an embodiment, the first first light-emitting layer and the first first inspection pattern may be formed of a material that emits a first light, the second first light-emitting layer and the second first inspection pattern may be formed of a material that emits a second light, and the third first light-emitting layer and the third first inspection pattern may be formed of a material that emits a third light.

[0024] In an embodiment, the formation of the second light-emitting layer and the second inspection pattern may include: using a first mask to form a first second light-emitting layer on the first first light-emitting layer and forming a first second inspection pattern on the first first inspection pattern; using a second mask to form a second second light-emitting layer on the second first light-emitting layer and forming a second second inspection pattern on the second first inspection pattern; and using a third mask to form a third second light-emitting layer on the third first light-emitting layer and forming a third second inspection pattern on the third first inspection pattern.

[0025] In an embodiment, the first second light-emitting layer and the first second inspection pattern can be formed of a material that emits a first light, the second second light-emitting layer and the second second inspection pattern can be formed of a material that emits a second light, and the third second light-emitting layer and the third second inspection pattern can be formed of a material that emits a third light.

[0026] In a display device according to an embodiment of the present disclosure, the display device may include first and second light-emitting layers that overlap in a plan view in a display area, and first and second check patterns that overlap in a plan view and are used to confirm the alignment of the first and second light-emitting layers, respectively, in a non-display area. The first and second light-emitting layers and the first and second check patterns may be formed using the same mask. Since different layers can be formed using a single mask, the burden of mask management or design, etc., can be minimized, and the area in the non-display area where the first and second check patterns are provided can be relatively reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 is a plan view illustrating a display device according to an embodiment of the present disclosure.

[0028] Figure 2 According to the embodiment of the present disclosure Figure 1 A cross-sectional view taken along line II'.

[0029] Figure 3 According to an embodiment of the present disclosure Figure 1 An enlarged plan view of area A.

[0030] Figure 4 According to the embodiment of the present disclosure Figure 3 A cross-sectional view taken along line II-II'.

[0031] Figure 5A 、 Figure 5B 、 Figure 6A 、 Figure 6B 、 Figure 7A 、 Figure 7B 、 Figure 8A and Figure 8B is a view illustrating a method of manufacturing a display device according to an embodiment of the present disclosure.

[0032] Figure 9 is a perspective view schematically illustrating a mask used in a method of manufacturing a display device according to an embodiment of the present disclosure. DETAILED DESCRIPTION

[0033] Hereinafter, embodiments of the present disclosure will be described in more detail with reference to the accompanying drawings. In the accompanying drawings, the same reference numerals are used for the same components, and redundant descriptions of the same components will be omitted.

[0034] Figure 1 is a plan view illustrating a display device according to an embodiment of the present disclosure.

[0035] refer to Figure 1, the display device 10 according to an embodiment of the present disclosure may include a display area DA and a non-display area NDA.

[0036] The display area DA may be an area for displaying an image. A plurality of pixels PX may be disposed in the display area DA and may be repeatedly arranged in a plan view along a first direction DR1 and a second direction DR2 intersecting the first direction DR1. For example, the second direction DR2 may be perpendicular to the first direction DR1. Each pixel PX may be defined as a minimum light-emitting unit that emits light.

[0037] Signal lines, such as gate lines or data lines, may be provided in the display area DA. The signal lines may be connected to each of the pixels PX. Each of the pixels PX may receive a gate signal or a data signal from the signal lines. Accordingly, an image may be displayed in the display area DA in a third direction DR3 that intersects each of the first direction DR1 and the second direction DR2. For example, the third direction DR3 may be perpendicular to each of the first direction DR1 and the second direction DR2.

[0038] The non-display area NDA may be an area where no image is displayed. The non-display area NDA may be disposed around the display area DA. For example, in a plan view, the non-display area NDA may surround the display area DA. A driver for displaying an image in the display area DA may be disposed in the non-display area NDA.

[0039] Figure 2 According to the embodiment of the present disclosure Figure 1 For example, Figure 2 A cross-sectional view of a portion that may be an example of the display area DA.

[0040] refer to Figure 1 and Figure 2 , the display device 10 may include a substrate SUB, a circuit layer TL, a light emitting element LE, a pixel defining layer PDL, and an encapsulation layer TFE.

[0041] The substrate SUB may include a transparent material or an opaque material. Examples of materials that can be used as the substrate SUB may include polyimide, quartz, or glass. These materials may be used alone or in combination. In an embodiment, the first direction DR1 and the second direction DR2 may be parallel to the upper surface of the substrate SUB, and the third direction DR3 may be perpendicular to the upper surface of the substrate SUB.

[0042] The circuit layer TL may be provided on the substrate SUB. The circuit layer TL may include transistors or capacitors, etc. The circuit layer TL may include an insulating layer, a semiconductor pattern, a conductive pattern, and signal lines. The preliminary insulating layer, the preliminary semiconductor layer, and the preliminary conductive layer may be formed on the substrate SUB through a process such as a coating process or a deposition process, and the preliminary insulating layer, the preliminary semiconductor layer, and the preliminary conductive layer may be selectively patterned through multiple photolithography processes. Thereafter, the insulating layer, the semiconductor pattern, the conductive pattern, and the signal lines included in the circuit layer TL may be formed.

[0043] The light emitting element LE and the pixel defining layer PDL may be disposed on the circuit layer TL.

[0044] The light-emitting element LE may include a first light-emitting element LE1, a second light-emitting element LE2, and a third light-emitting element LE3, and may include a pixel electrode PE, a first common layer CL1, a first light-emitting layer EL1, a second common layer CL2, a charge generation layer CGL, a third common layer CL3, a second light-emitting layer EL2, a fourth common layer CL4, and a common electrode CE. The first light-emitting layer EL1 may include a first first light-emitting layer EL1-1 (hereinafter referred to as the "1-1st light-emitting layer"), a second first light-emitting layer EL1-2 (hereinafter referred to as the "1-2nd light-emitting layer"), and a third first light-emitting layer EL1-3 (hereinafter referred to as the "1-3rd light-emitting layer"). The second light-emitting layer EL2 may include a first second light-emitting layer EL2-1 (hereinafter referred to as the "2-1st light-emitting layer"), a second second light-emitting layer EL2-2 (hereinafter referred to as the "2-2nd light-emitting layer"), and a third second light-emitting layer EL2-3 (hereinafter referred to as the "2-3rd light-emitting layer"). The pixel electrode PE may include a first pixel electrode PE1 , a second pixel electrode PE2 , and a third pixel electrode PE3 .

[0045] Specifically, the first light-emitting element LE1 may include a first pixel electrode PE1, a first common layer CL1, a 1-1 light-emitting layer EL1-1, a second common layer CL2, a charge generation layer CGL, a third common layer CL3, a 2-1 light-emitting layer EL2-1, a fourth common layer CL4, and a common electrode CE. The second light-emitting element LE2 may include a second pixel electrode PE2, a first common layer CL1, a 1-2 light-emitting layer EL1-2, a second common layer CL2, a charge generation layer CGL, a third common layer CL3, a 2-2 light-emitting layer EL2-2, a fourth common layer CL4, and a common electrode CE. The third light-emitting element LE3 may include a third pixel electrode PE3, a first common layer CL1, a 1-3 light-emitting layer EL1-3, a second common layer CL2, a charge generation layer CGL, a third common layer CL3, a 2-3 light-emitting layer EL2-3, a fourth common layer CL4, and a common electrode CE.

[0046] The first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may be disposed on the circuit layer TL. Each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may be electrically connected to a corresponding transistor included in the circuit layer TL. The first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may include a metal, an alloy, a conductive metal nitride, a conductive metal oxide, or a transparent conductive material. These materials may be used alone or in combination.

[0047] The pixel defining layer PDL may expose at least a central portion of the upper surface of each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3. For example, the pixel defining layer PDL may cover the side surfaces of each of the first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3. In an embodiment, the pixel defining layer PDL may cover an edge portion of the upper surface of each of the first pixel electrode PE1 to the third pixel electrode PE3. The pixel defining layer PDL may include an organic material such as a polyimide resin, an epoxy resin, and a siloxane resin, or an inorganic material such as silicon oxide, silicon nitride, and silicon oxynitride. These materials may be used alone or in combination with one another. In an embodiment, the first light-emitting elements LE1 to the third light-emitting elements LE3 may share a first common layer CL1, a second common layer CL2, a charge generation layer CGL, a third common layer CL3, a fourth common layer CL4, and a common electrode CE. Each of the first common layer CL1, the second common layer CL2, the charge generation layer CGL, the third common layer CL3, the fourth common layer CL4, and the common electrode CE may extend continuously on the upper surface of the substrate SUB to be disposed in each of the first to third light-emitting elements LE1 to LE3. In an embodiment, the first to third pixel electrodes PE1 to PE3 may be separated from each other and may be disposed in the first to third light-emitting elements LE1 to LE3, respectively. In an embodiment, the light-emitting layers EL1-1, EL1-2, and EL1-3 may be separated from each other and may be disposed in the first, second, and third light-emitting elements LE1, LE2, and LE3, respectively. In an embodiment, the light-emitting layers EL2-1, EL2-2, and EL2-3 may be separated from each other and may be disposed in the first, second, and third light-emitting elements LE1, LE2, and LE3, respectively.

[0048] The non-emission area NLA may be defined as corresponding to the area in which the pixel-defining layer PDL is disposed. Furthermore, the first, second, and third emission areas LA1, LA2, and LA3 may be defined as corresponding to areas of the first, second, and third pixel electrodes PE1, PE2, and PE3, respectively, that are exposed by the pixel-defining layer PDL. That is, the non-emission area NLA may overlap with the pixel-defining layer PDL in a plan view, and the first, second, and third emission areas LA1, LA2, and LA3 may overlap with the first, second, and third light-emitting elements LE1, LE2, and LE3, respectively, in a plan view. The non-emission area NLA may be defined between the first, second, and third emission areas LA1, LA2, and LA3.

[0049] The first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3 may emit light in different wavelength bands. The first light emitting area LA1 may emit a first light, the second light emitting area LA2 may emit a second light, and the third light emitting area LA3 may emit a third light. For example, the first light may be light in a blue wavelength band, the second light may be light in a green wavelength band, and the third light may be light in a red wavelength band, but the present disclosure is not limited thereto. For example, the first light may be light in a wavelength band of approximately 400 nanometers (nm) to approximately 495 nm, the second light may be light in a wavelength band of approximately 495 nm to approximately 580 nm, and the third light may be light in a wavelength band of approximately 580 nm to approximately 780 nm, but the present disclosure is not limited thereto.

[0050] The first common layer CL1 may be disposed on the pixel electrode PE and the pixel defining layer PDL. The first common layer CL1 may have a single-layer structure or a multi-layer structure. For example, the first common layer CL1 may include at least one of a hole injection layer (HIL) and a hole transport layer (HTL).

[0051] The first light-emitting layer EL1 may be disposed on the first common layer CL1. In a plan view, the first-first light-emitting layer EL1-1, the first-second light-emitting layer EL1-2, and the first-third light-emitting layer EL1-3 may overlap with the first light-emitting area LA1, the second light-emitting area LA2, and the third light-emitting area LA3, respectively. The first-first light-emitting layer EL1-1 may be disposed on the first pixel electrode PE1 exposed by the pixel-defining layer PDL, the first-second light-emitting layer EL1-2 may be disposed on the second pixel electrode PE2 exposed by the pixel-defining layer PDL, and the first-third light-emitting layer EL1-3 may be disposed on the third pixel electrode PE3 exposed by the pixel-defining layer PDL.

[0052] In the embodiment, the 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2, and the 1-3 light-emitting layer EL1-3 may emit light in different wavelength bands. The 1-1st light-emitting layer EL1-1 may emit a first light and may include a material that emits the first light. The 1-2nd light-emitting layer EL1-2 may emit a second light and may include a material that emits the second light. The 1-3 light-emitting layer EL1-3 may emit a third light and may include a material that emits the third light.

[0053] In the embodiment, the 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2, and the 1-3 light-emitting layer EL1-3 may emit light in the same wavelength band, or at least one of the 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2, and the 1-3 light-emitting layer EL1-3 may emit light in a wavelength band different from the wavelength band of light emitted by the other light-emitting layers among the 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2, and the 1-3 light-emitting layer EL1-3. For example, the 1-1 light-emitting layer EL1-1, the 1-2 light-emitting layer EL1-2, and the 1-3 light-emitting layer EL1-3 may include a first light-emitting layer that emits light in a blue band and a second light-emitting layer that emits light in a green band, and in this case, the display device 10 may further include a color panel that transmits light emitted from the 1-1 light-emitting layer EL1-1, the 1-2 light-emitting layer EL1-2, and the 1-3 light-emitting layer EL1-3, or converts the above light into light in different bands.

[0054] The second common layer CL2 may be disposed on the first common layer CL1 and the first light emitting layer EL1. For example, the second common layer CL2 may include an electron transport layer (ETL).

[0055] The charge generation layer CGL may be disposed on the second common layer CL2. The charge generation layer CGL may extend from the display area DA to the non-display area NDA. For example, the charge generation layer CGL may include an n-type charge generation layer that provides electrons to the first light-emitting layer EL1 and a p-type charge generation layer that provides holes to the second light-emitting layer EL2. In an embodiment, the n-type charge generation layer may include a first semiconductor layer doped with n-type impurities and contacting the second common layer CL2, and the p-type charge generation layer may include a second semiconductor layer doped with p-type impurities and contacting the third common layer CL3. The n-type charge generation layer and the p-type charge generation layer may form a pn junction at an interface therebetween, and the second common layer CL2 and the third common layer CL3 may be biased with a positive voltage and a negative voltage, respectively, so that electrons are supplied to the first light-emitting layer EL1 via the second common layer CL2 and holes are supplied to the second light-emitting layer EL2 via the third common layer CL3.

[0056] The third common layer CL3 may be disposed on the charge generation layer CGL. For example, the third common layer CL3 may include a hole transport layer.

[0057] The second light-emitting layer EL2 may be disposed on the third common layer CL3. In a plan view, the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 may overlap with the first light-emitting area LA1, the second light-emitting area LA2, and the third light-emitting area LA3, respectively. In a plan view, the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 may overlap with the 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2, and the 1-3rd light-emitting layer EL1-3, respectively. The 2-1st light-emitting layer EL2-1 may be disposed on the first pixel electrode PE1 exposed by the pixel defining layer PDL, the 2-2nd light-emitting layer EL2-2 may be disposed on the second pixel electrode PE2 exposed by the pixel defining layer PDL, and the 2-3rd light-emitting layer EL2-3 may be disposed on the third pixel electrode PE3 exposed by the pixel defining layer PDL.

[0058] In an embodiment, the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 may emit light in different wavelength bands. For example, the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 may respectively emit light in the same wavelength band as the light emitted by the 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2, and the 1-3rd light-emitting layer EL1-3. In this case, the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 may respectively include the same material as the 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2, and the 1-3rd light-emitting layer EL1-3. The 2-1st light-emitting layer EL2-1 may emit a first light and may include a material that emits the first light. The 2-2nd light-emitting layer EL2-2 may emit a second light and may include a material that emits the second light. The 2-3 light-emitting layer EL2-3 may emit a third light and may include a material that emits the third light. In an embodiment, the 2-1 light-emitting layer EL2-1, the 2-2 light-emitting layer EL2-2, and the 2-3 light-emitting layer EL2-3 may each emit light in a wavelength band different from the wavelength band of light emitted by the 1-1 light-emitting layer EL1-1, the 1-2 light-emitting layer EL1-2, and the 1-3 light-emitting layer EL1-3. In this case, the 2-1 light-emitting layer EL2-1, the 2-2 light-emitting layer EL2-2, and the 2-3 light-emitting layer EL2-3 may each include a material different from that of the 1-1 light-emitting layer EL1-1, the 1-2 light-emitting layer EL1-2, and the 1-3 light-emitting layer EL1-3.

[0059] In the embodiment, the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 may emit light in the same wavelength band, or at least one of the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 may emit light in a wavelength band different from the wavelength band of light emitted by the other light-emitting layers of the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3. For example, the 2-1 light-emitting layer EL2-1, the 2-2 light-emitting layer EL2-2, and the 2-3 light-emitting layer EL2-3 may include a first light-emitting layer that emits light in a blue band and a second light-emitting layer that emits light in a green band, and in this case, the display device 10 may further include a color panel that transmits light emitted from the 2-1 light-emitting layer EL2-1, the 2-2 light-emitting layer EL2-2, and the 2-3 light-emitting layer EL2-3, or converts the above light into light in different bands.

[0060] The fourth common layer CL4 may be disposed on the third common layer CL3 and the second light emitting layer EL2. The fourth common layer CL4 may have a single layer structure or a multilayer structure. For example, the fourth common layer CL4 may include at least one of an electron injection layer (EIL) and an electron transport layer.

[0061] The common electrode CE may be disposed on the fourth common layer CL4. The common electrode CE may overlap the first, second, and third light-emitting areas LA1, LA2, and LA3, as well as the non-light-emitting area NLA. That is, the common electrode CE may extend continuously across the first, second, and third light-emitting areas LA1, LA2, and LA3, as well as the non-light-emitting area NLA. The common electrode CE may include a metal, an alloy, a conductive metal oxide, a conductive metal nitride, or a transparent conductive material. These materials may be used alone or in combination.

[0062] Accordingly, the first light-emitting element LE1 including the first pixel electrode PE1, the first common layer CL1, the second common layer CL2, the third common layer CL3, the fourth common layer CL4, the 1-1 light-emitting layer EL1-1, the 2-1 light-emitting layer EL2-1, the charge generation layer CGL, and the common electrode CE can be disposed in the first light-emitting area LA1 on the substrate SUB. The second light-emitting element LE2 including the second pixel electrode PE2, the first common layer CL1, the second common layer CL2, the third common layer CL3, the fourth common layer CL4, the 1-2 light-emitting layer EL1-2, the 2-2 light-emitting layer EL2-2, the charge generation layer CGL, and the common electrode CE can be disposed in the second light-emitting area LA2 on the substrate SUB. A third light-emitting element LE3, including a third pixel electrode PE3, a first common layer CL1, a second common layer CL2, a third common layer CL3, a fourth common layer CL4, first-third light-emitting layers EL1-3, second-third light-emitting layers EL2-3, a charge generation layer CGL, and a common electrode CE, can be disposed in the third light-emitting area LA3 on the substrate SUB. The first light-emitting element LE1, the second light-emitting element LE2, and the third light-emitting element LE3 can each correspond to a pixel PX. For example, the first light-emitting element LE1 can emit a first light, the second light-emitting element LE2 can emit a second light, and the third light-emitting element LE3 can emit a third light.

[0063] The encapsulation layer TFE may be disposed on the common electrode CE. The encapsulation layer TFE may prevent impurities, moisture, or external air from penetrating into the light emitting element LE from the outside. The encapsulation layer TFE may include at least one inorganic encapsulation layer and at least one organic encapsulation layer.

[0064] although Figure 2 The light emitting element LE is shown to include a structure in which two light emitting layers are stacked, but the present disclosure is not limited thereto. In an embodiment, the light emitting element LE may include a structure in which a single light emitting layer is provided or three or more light emitting layers are stacked.

[0065] Figure 3 According to an embodiment of the present disclosure Figure 1 An enlarged plan view of area A. Figure 4 According to the embodiment of the present disclosure Figure 3 For example, Figure 3 and Figure 4 1 and 2 may be enlarged plan views and cross-sectional views of a portion of an example of the non-display area NDA, respectively.

[0066] refer to Figure 1 、 Figure 2 、 Figure 3 and Figure 4, the display device 10 may include a substrate SUB, an inspection array IPA, an alignment pattern AP, and a charge generation layer CGL.

[0067] The inspection array IPA and the alignment pattern AP may be disposed in the non-display area NDA on the substrate SUB. In this case, the inspection array IPA and the alignment pattern AP are disposed in the non-display area NDA. However, the positions of the inspection array IPA and the alignment pattern AP are not limited thereto.

[0068] The inspection array IPA may include a first inspection array IPA1, a second inspection array IPA2, and a third inspection array IPA3, and may include a first inspection pattern IP1 and a second inspection pattern IP2. The first inspection pattern IP1 may include a first first inspection pattern IP1-1 (hereinafter, referred to as a "1-1th inspection pattern"), a second first inspection pattern IP1-2 (hereinafter, referred to as a "1-2th inspection pattern"), and a third first inspection pattern IP1-3 (hereinafter, referred to as a "1-3th inspection pattern"), and the second inspection pattern IP2 may include a first second inspection pattern IP2-1 (hereinafter, referred to as a "2-1st inspection pattern"), a second second inspection pattern IP2-2 (hereinafter, referred to as a "2-2nd inspection pattern"), and a third second inspection pattern IP2-3 (hereinafter, referred to as a "2-3rd inspection pattern").

[0069] Specifically, the first inspection array IPA1 may include a 1-1th inspection pattern IP1-1 and a 2-1th inspection pattern IP2-1, the second inspection array IPA2 may include a 1-2th inspection pattern IP1-2 and a 2-2nd inspection pattern IP2-2, and the third inspection array IPA3 may include a 1-3th inspection pattern IP1-3 and a 2-3rd inspection pattern IP2-3.

[0070] The first inspection array IPA1, the second inspection array IPA2, and the third inspection array IPA3 may be arranged in one direction. For example, the second inspection array IPA2 may be adjacent to the first inspection array IPA1 in the first direction DR1, and the third inspection array IPA3 may be adjacent to the second inspection array IPA2 in the first direction DR1. However, the present disclosure is not limited thereto, and the arrangement of the first inspection array IPA1, the second inspection array IPA2, and the third inspection array IPA3 may be modified in various ways.

[0071] The first inspection array IPA1 can be set in the non-display area NDA to confirm the alignment of the light-emitting layer of the first light-emitting element LE1. For example, the first inspection array IPA1 can be used to determine whether the light-emitting layer of the first light-emitting element LE1 is deposited at the desired position. In other words, by measuring the position of the first inspection array IPA1, it is possible to evaluate whether the light-emitting layer of the first light-emitting element LE1 is deposited at the desired position. For example, the inspection of the first inspection array IPA1 set at the target position can indicate whether the light-emitting layer of the first light-emitting element LE1 is set at the target position. The first inspection array IPA1 may include the same material as the material of the light-emitting layer of the first light-emitting element LE1. In an embodiment, the first inspection array IPA1 and the light-emitting layer of the first light-emitting element LE1 may be composed of the same material.

[0072] The first inspection array IPA1 may include a 1st inspection pattern IP1-1 and a 2nd inspection pattern IP2-1 disposed on the 1st inspection pattern IP1-1. In a plan view, the 1st inspection pattern IP1-1 and the 2nd inspection pattern IP2-1 may overlap. For example, in a plan view, the 1st inspection pattern IP1-1 and the 2nd inspection pattern IP2-1 may partially overlap. The 1st inspection pattern IP1-1 may be a pattern for confirming the alignment of the 1st light-emitting layer EL1-1, and the 2nd inspection pattern IP2-1 may be a pattern for confirming the alignment of the 2nd light-emitting layer EL2-1. For example, the 1st inspection pattern IP1-1 may be used to determine whether the 1st light-emitting layer EL1-1 is deposited in the desired position. In other words, by measuring the position of the 1st inspection pattern IP1-1, it is possible to assess whether the 1st light-emitting layer EL1-1 is deposited in the desired position. Similarly, the 2-1st inspection pattern IP2-1 can be used to determine whether the 2-1st light-emitting layer EL2-1 is deposited at the desired location. In other words, by measuring the position of the 2-1st inspection pattern IP2-1, it is possible to evaluate whether the 2-1st light-emitting layer EL2-1 is deposited at the desired location. In an embodiment, the 1-1st inspection pattern IP1-1 may include the same material as the 1-1st light-emitting layer EL1-1, and the 2-1st inspection pattern IP2-1 may include the same material as the 2-1st light-emitting layer EL2-1. In an embodiment, the 1-1st inspection pattern IP1-1 and the 1-1st light-emitting layer EL1-1 may be composed of the same material, and the 2-1st inspection pattern IP2-1 and the 2-1st light-emitting layer EL2-1 may be composed of the same material.

[0073] The second inspection array IPA2 can be set in the non-display area NDA to confirm the alignment of the light-emitting layer of the second light-emitting element LE2. For example, the second inspection array IPA2 can be used to determine whether the light-emitting layer of the second light-emitting element LE2 is deposited at the desired position. In other words, by measuring the position of the second inspection array IPA2, it is possible to evaluate whether the light-emitting layer of the second light-emitting element LE2 is deposited at the desired position. For example, the inspection in which the second inspection array IPA2 is set at the target position can indicate whether the light-emitting layer of the second light-emitting element LE2 is set at the target position. The second inspection array IPA2 may include the same material as the material of the light-emitting layer of the second light-emitting element LE2. In an embodiment, the second inspection array IPA2 and the light-emitting layer of the second light-emitting element LE2 may be composed of the same material.

[0074] The second inspection array IPA2 may include a 1-2nd inspection pattern IP1-2 and a 2-2nd inspection pattern IP2-2 disposed on the 1-2nd inspection pattern IP1-2. In a plan view, the 1-2nd inspection pattern IP1-2 and the 2-2nd inspection pattern IP2-2 may overlap. For example, in a plan view, the 1-2nd inspection pattern IP1-2 and the 2-2nd inspection pattern IP2-2 may partially overlap. The 1-2nd inspection pattern IP1-2 may be a pattern for confirming the alignment of the 1-2nd light-emitting layer EL1-2, and the 2-2nd inspection pattern IP2-2 may be a pattern for confirming the alignment of the 2-2nd light-emitting layer EL2-2. For example, the 1-2nd inspection pattern IP1-2 may be used to determine whether the 1-2nd light-emitting layer EL1-2 is deposited in the desired position. In other words, by measuring the position of the 1-2nd inspection pattern IP1-2, it is possible to assess whether the 1-2nd light-emitting layer EL1-2 is deposited in the desired position. Similarly, the 2-2nd inspection pattern IP2-2 can be used to determine whether the 2-2nd light-emitting layer EL2-2 is deposited at the desired position. In other words, by measuring the position of the 2-2nd inspection pattern IP2-2, it is possible to evaluate whether the 2-2nd light-emitting layer EL2-2 is deposited at the desired position. In an embodiment, the 1-2nd inspection pattern IP1-2 may include the same material as the 1-2nd light-emitting layer EL1-2, and the 2-2nd inspection pattern IP2-2 may include the same material as the 2-2nd light-emitting layer EL2-2. In an embodiment, the 1-2nd inspection pattern IP1-2 and the 1-2nd light-emitting layer EL1-2 may be composed of the same material, and the 2-2nd inspection pattern IP2-2 and the 2-2nd light-emitting layer EL2-2 may be composed of the same material.

[0075] The third inspection array IPA3 can be set in the non-display area NDA to confirm the alignment of the light-emitting layer of the third light-emitting element LE3. For example, the third inspection array IPA3 can be used to determine whether the light-emitting layer of the third light-emitting element LE3 is deposited at the desired position. In other words, by measuring the position of the third inspection array IPA3, it is possible to evaluate whether the light-emitting layer of the third light-emitting element LE3 is deposited at the desired position. For example, the inspection of the third inspection array IPA3 set at the target position can indicate whether the light-emitting layer of the third light-emitting element LE3 is set at the target position. The third inspection array IPA3 may include the same material as the material of the light-emitting layer of the third light-emitting element LE3. In an embodiment, the third inspection array IPA3 and the light-emitting layer of the third light-emitting element LE3 may be composed of the same material.

[0076] The third inspection array IPA3 may include 1-3 inspection patterns IP1-3 and 2-3 inspection patterns IP2-3 disposed on the 1-3 inspection patterns IP1-3. In a plan view, the 1-3 inspection patterns IP1-3 and the 2-3 inspection patterns IP2-3 may overlap. For example, in a plan view, the 1-3 inspection patterns IP1-3 and the 2-3 inspection patterns IP2-3 may partially overlap. The 1-3 inspection patterns IP1-3 may be patterns for confirming the alignment of the 1-3 light-emitting layers EL1-3, and the 2-3 inspection patterns IP2-3 may be patterns for confirming the alignment of the 2-3 light-emitting layers EL2-3. For example, the 1-3 inspection patterns IP1-3 may be used to determine whether the 1-3 light-emitting layers EL1-3 are deposited in the desired locations. In other words, by measuring the position of the 1-3 inspection patterns IP1-3, it is possible to assess whether the 1-3 light-emitting layers EL1-3 are deposited in the desired locations. Similarly, the 2nd-3rd inspection pattern IP2-3 can be used to determine whether the 2nd-3rd light-emitting layer EL2-3 is deposited at the desired location. In other words, by measuring the position of the 2nd-3rd inspection pattern IP2-3, it is possible to evaluate whether the 2nd-3rd light-emitting layer EL2-3 is deposited at the desired location. In an embodiment, the 1st-3rd inspection pattern IP1-3 may include the same material as the 1st-3rd light-emitting layer EL1-3, and the 2nd-3rd inspection pattern IP2-3 may include the same material as the 2nd-3rd light-emitting layer EL2-3. In an embodiment, the 1st-3rd inspection pattern IP1-3 and the 1st-3 light-emitting layer EL1-3 may be composed of the same material, and the 2nd-3rd inspection pattern IP2-3 and the 2nd-3rd light-emitting layer EL2-3 may be composed of the same material.

[0077] The first inspection array IPA1, the second inspection array IPA2, and the third inspection array IPA3 may have a shape or size different from that of the first light emitting element LE1, the second light emitting element LE2, and the third light emitting element LE3, or may have the same shape or size as that of the first light emitting element LE1, the second light emitting element LE2, and the third light emitting element LE3. Figure 3 It is illustrated that each of the first inspection array IPA1, the second inspection array IPA2, and the third inspection array IPA3 has a circular planar shape, but the present disclosure is not limited thereto.

[0078] The alignment pattern AP may include a first alignment pattern AP1 , a second alignment pattern AP2 , and a third alignment pattern AP3 .

[0079] The first alignment pattern AP1 and the second alignment pattern AP2 may be provided in the non-display area NDA to confirm the alignment of the inspection array IPA. The first alignment pattern AP1 may be adjacent to the inspection array IPA in the first direction DR1, and the second alignment pattern AP2 may be adjacent to the inspection array IPA in the second direction DR2. For example, the first alignment pattern AP1 may be a pattern for confirming the alignment of the inspection array IPA in the first direction DR1, and the second alignment pattern AP2 may be a pattern for confirming the alignment of the inspection array IPA in the second direction DR2. For example, the first alignment pattern AP1 may be arranged along a straight line extending in the first direction DR1 together with the first inspection array IPA1, the second inspection array IPA2, and the third inspection array IPA3, and the second alignment pattern AP2 may be arranged along the second direction DR2 together with each of the first inspection array IPA1, the second inspection array IPA2, and the third inspection array IPA3. In order to simplify the description, Figure 3 In the embodiment, three inspection arrays IPA1, IPA2 and IP3 and three second alignment patterns AP2 are arranged Figure 1 In an embodiment, the first inspection array IPA1 and one of the three second alignment patterns AP2 may be arranged on a first straight line extending in the second direction DR2, the second inspection array IPA2 and another of the three second alignment patterns AP2 may be arranged on a second straight line extending in the second direction DR2, and the third inspection array IPA3 and the remaining one of the three second alignment patterns AP2 may be arranged on a third straight line extending in the second direction DR2. The first to third straight lines are spaced apart from each other in the first direction DR1.

[0080] The third alignment pattern AP3 may be a pattern for confirming the alignment of the substrate SUB. For example, the third alignment pattern AP3 may be a pattern for confirming the alignment with a mask for forming a specific layer, but the present disclosure is not limited thereto.

[0081] although Figure 3 It is illustrated that each of the first and second alignment patterns AP1 and AP2 has a rectangular planar shape and the third alignment pattern AP3 has a cross planar shape, but the present disclosure is not limited thereto.

[0082] The charge generation layer CGL may be disposed on and may cover the first inspection pattern IP1 and the alignment pattern AP. The charge generation layer CGL may extend from the display area DA to the non-display area NDA. In an embodiment, the charge generation layer CGL may be disposed between the first inspection pattern IP1 and the second inspection pattern IP2. That is, the 1-1st inspection pattern IP1-1, the 1-2nd inspection pattern IP1-2, and the 1-3rd inspection pattern IP1-3 may be separated from the 2-1st inspection pattern IP2-1, the 2-2nd inspection pattern IP2-2, and the 2-3rd inspection pattern IP2-3, respectively, with the charge generation layer CGL interposed therebetween.

[0083] although Figure 4 It is shown that no separate component is provided between the substrate SUB and the first inspection pattern IP1, but the present disclosure is not limited thereto. In an embodiment, another component included in the display device 10 (for example, an insulating layer included in the circuit layer TL, etc.) may be further provided between the substrate SUB and the first inspection pattern IP1.

[0084] In addition, although Figure 4 The charge generation layer CGL is shown as being disposed between the first inspection pattern IP1 and the second inspection pattern IP2, but the present disclosure is not limited thereto. In embodiments, another component instead of the charge generation layer CGL may be disposed between the first inspection pattern IP1 and the second inspection pattern IP2, or another component in addition to the charge generation layer CGL may be further disposed between the first inspection pattern IP1 and the second inspection pattern IP2.

[0085] In addition, although Figure 4 The inspection array IPA is shown to include a structure in which two inspection patterns are stacked, but the present disclosure is not limited thereto. For another example, the inspection array IPA may include a structure in which one inspection pattern is provided or three or more inspection patterns are stacked.

[0086] Figure 5A 、 Figure 5B 、 Figure 6A 、 Figure 6B 、 Figure 7A 、 Figure 7B 、 Figure 8A and Figure 8B is a view illustrating a method of manufacturing a display device according to an embodiment of the present disclosure.

[0087] For example, reference Figure 5A 、 Figure 5B 、 Figure 6A 、 Figure 6B 、 Figure 7A 、 Figure 7B 、 Figure 8A and Figure 8B The method of manufacturing a display device described may be a method of manufacturing a display device Figure 1 、 Figure 2 、 Figure 3 and Figure 4 The method of the display device 10 is described. In addition, Figure 5A 、 Figure 5B 、 Figure 6A 、 Figure 6B 、 Figure 7A 、 Figure 7B 、 Figure 8A and Figure 8B Can be shown to be made with Figure 2 and Figure 4 The corresponding cross-sectional view of the method of display device 10. In the following, redundant descriptions are omitted or simplified.

[0088] refer to Figure 5A and Figure 5B , the circuit layer TL, the first pixel electrode PE1, the second pixel electrode PE2 and the third pixel electrode PE3, the pixel defining layer PDL and the first common layer CL1 can be sequentially formed in the display area DA and on the substrate SUB, and the alignment pattern (for example, the first alignment pattern AP1) can be formed in the non-display area NDA and on the substrate SUB.

[0089] The first pixel electrode PE1, the second pixel electrode PE2, and the third pixel electrode PE3 may be formed to overlap the first light emitting area LA1, the second light emitting area LA2, and the third light emitting area LA3, respectively, in a plan view, and the pixel defining layer PDL may be formed to overlap the non-light emitting area NLA in a plan view.

[0090] refer to Figure 6A and Figure 6B , the first light emitting layer EL1 may be formed on the first common layer CL1 in the display area DA, and the first inspection pattern IP1 may be formed on the substrate SUB in the non-display area NDA.

[0091] The first light-emitting layer EL1 may include a 1-1 light-emitting layer EL1-1, a 1-2 light-emitting layer EL1-2, and a 1-3 light-emitting layer EL1-3, and the 1-1 light-emitting layer EL1-1, the 1-2 light-emitting layer EL1-2, and the 1-3 light-emitting layer EL1-3 may be formed to overlap with the first light-emitting region LA1, the second light-emitting region LA2, and the third light-emitting region LA3, respectively, in a plan view.

[0092] The first inspection pattern IP1 may include a 1-1th inspection pattern IP1-1, a 1-2th inspection pattern IP1-2, and a 1-3th inspection pattern IP1-3, and the 1-1th inspection pattern IP1-1, the 1-2nd inspection pattern IP1-2, and the 1-3rd inspection pattern IP1-3 may be formed along the first direction DR1.

[0093] The 1-1st light-emitting layer EL1-1 and the 1-1st inspection pattern IP1-1 may be formed of the same material and may be formed by the same process. For example, the 1-1st light-emitting layer EL1-1 and the 1-1st inspection pattern IP1-1 may be formed of a material that emits the first light and may be formed using a first mask (e.g., a fine metal mask (FMM)) that defines openings corresponding to the 1-1st light-emitting layer EL1-1 and the 1-1st inspection pattern IP1-1.

[0094] The 1-2nd light-emitting layer EL1-2 and the 1-2nd inspection pattern IP1-2 may be formed of the same material and may be formed by the same process. For example, the 1-2nd light-emitting layer EL1-2 and the 1-2nd inspection pattern IP1-2 may be formed of a material that emits the second light and may be formed using a second mask (e.g., FMM) that defines openings corresponding to the 1-2nd light-emitting layer EL1-2 and the 1-2nd inspection pattern IP1-2.

[0095] The 1-3rd light-emitting layer EL1-3 and the 1-3rd inspection pattern IP1-3 may be formed of the same material and may be formed by the same process. For example, the 1-3rd light-emitting layer EL1-3 and the 1-3rd inspection pattern IP1-3 may be formed of a material that emits a third light and may be formed using a third mask (e.g., FMM) that defines openings corresponding to the 1-3rd light-emitting layer EL1-3 and the 1-3rd inspection pattern IP1-3.

[0096] For example, the 1-1st light-emitting layer EL1-1 and the 1-1st inspection pattern IP1-1 may be formed by a deposition process using a first mask, and thereafter, the 1-3rd light-emitting layer EL1-3 and the 1-3rd inspection pattern IP1-3 may be formed by a deposition process using a third mask, and thereafter, the 1-2nd light-emitting layer EL1-2 and the 1-2nd inspection pattern IP1-2 may be formed by a deposition process using a second mask. However, the present disclosure is not limited thereto, and the order of forming the 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2, and the 1-3rd light-emitting layer EL1-3 and the 1-1st inspection pattern IP1-1, the 1-2nd inspection pattern IP1-2, and the 1-3rd inspection pattern IP1-3 may be modified differently.

[0097] refer to Figure 7A and Figure 7B, the second common layer CL2 and the charge generation layer CGL may be sequentially formed in the display area DA and on the first light emitting layer EL1. In an embodiment, the second common layer CL2 may be formed in the display area DA, and the charge generation layer CGL may be formed in the display area DA and the non-display area NDA. In the non-display area NDA, the charge generation layer CGL may be formed on the first inspection pattern IP1 and the alignment pattern (e.g., the first alignment pattern AP1).

[0098] The charge generation layer CGL may extend from the display area DA to the non-display area NDA. For example, the charge generation layer CGL may be formed using a mask (eg, an open mask) defining openings corresponding to the display area DA and the non-display area NDA. For example, the openings of the open mask may expose Figure 6A and Figure 6B The final structure includes areas corresponding to the display area DA and the non-display area NDA.

[0099] refer to Figure 8A and Figure 8B The third common layer CL3 and the second light-emitting layer EL2 may be sequentially formed in the display area DA on the charge generation layer CGL, and the second inspection pattern IP2 may be formed in the non-display area NDA on the charge generation layer CGL. Accordingly, the first inspection array IPA1, the second inspection array IPA2, and the third inspection array IPA3 may be formed in the non-display area NDA on the substrate SUB.

[0100] The second light-emitting layer EL2 may include a 2-1st light-emitting layer EL2-1, a 2-2nd light-emitting layer EL2-2, and a 2-3rd light-emitting layer EL2-3, and the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 may be formed to overlap with the first light-emitting region LA1, the second light-emitting region LA2, and the third light-emitting region LA3, respectively, in a plan view. In addition, the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 may be formed to overlap with the 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2, and the 1-3rd light-emitting layer EL1-3, respectively, in a plan view. In an embodiment, the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 may be formed of or composed of the same material as the 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2, and the 1-3rd light-emitting layer EL1-3. In an embodiment, the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 may be formed of a material different from the material of the 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2, and the 1-3rd light-emitting layer EL1-3.

[0101] The second inspection pattern IP2 may include a 2-1st inspection pattern IP2-1, a 2-2nd inspection pattern IP2-2, and a 2-3rd inspection pattern IP2-3, and the 2-1st inspection pattern IP2-1, the 2-2nd inspection pattern IP2-2, and the 2-3rd inspection pattern IP2-3 may be formed along the first direction DR1. In addition, the 2-1st inspection pattern IP2-1, the 2-2nd inspection pattern IP2-2, and the 2-3rd inspection pattern IP2-3 may be formed to overlap with the 1-1st inspection pattern IP1-1, the 1-2nd inspection pattern IP1-2, and the 1-3rd inspection pattern IP1-3, respectively, in a plan view. For example, the 2-1st inspection pattern IP2-1, the 2-2nd inspection pattern IP2-2, and the 2-3rd inspection pattern IP2-3 may be formed to partially overlap with the 1-1st inspection pattern IP1-1, the 1-2nd inspection pattern IP1-2, and the 1-3rd inspection pattern IP1-3, respectively, in a plan view.

[0102] In an embodiment, the 2-1st inspection pattern IP2-1, the 2-2nd inspection pattern IP2-2, and the 2-3rd inspection pattern IP2-3 may be formed of or composed of the same material as the 1-1st inspection pattern IP1-1, the 1-2nd inspection pattern IP1-2, and the 1-3rd inspection pattern IP1-3, respectively. In an embodiment, the 2-1st inspection pattern IP2-1, the 2-2nd inspection pattern IP2-2, and the 2-3rd inspection pattern IP2-3 may be formed of a material different from the material of the 1-1st inspection pattern IP1-1, the 1-2nd inspection pattern IP1-2, and the 1-3rd inspection pattern IP1-3, respectively.

[0103] The 2-1st light-emitting layer EL2-1 and the 2-1st inspection pattern IP2-1 may be formed of or composed of the same material and may be formed by the same process. In an embodiment, the 2-1st light-emitting layer EL2-1 and the 2-1st inspection pattern IP2-1 may be formed by using a first mask for forming the 1-1st light-emitting layer EL1-1 and the 1-1st inspection pattern IP1-1. That is, the 1-1st light-emitting layer EL1-1 and the 2-1st light-emitting layer EL2-1 as well as the 1-1st inspection pattern IP1-1 and the 2-1st inspection pattern IP2-1 may be formed by using the same mask. For example, the 2-1st light-emitting layer EL2-1 and the 2-1st inspection pattern IP2-1 may be formed of or composed of a material that emits the first light and may be formed by using a first mask that defines an opening corresponding to the 2-1st light-emitting layer EL2-1 and the 2-1st inspection pattern IP2-1.

[0104] The 2-2nd light-emitting layer EL2-2 and the 2-2nd inspection pattern IP2-2 may be formed of or composed of the same material and may be formed by the same process. In an embodiment, the 2-2nd light-emitting layer EL2-2 and the 2-2nd inspection pattern IP2-2 may be formed using a second mask for forming the 1-2nd light-emitting layer EL1-2 and the 1-2nd inspection pattern IP1-2. That is, the 1-2nd light-emitting layer EL1-2 and the 2-2nd light-emitting layer EL2-2 and the 1-2nd inspection pattern IP1-2 and the 2-2nd inspection pattern IP2-2 may be formed using the same mask. For example, the 2-2nd light-emitting layer EL2-2 and the 2-2nd inspection pattern IP2-2 may be formed of or composed of a material that emits a second light and may be formed using a second mask that defines an opening corresponding to the 2-2nd light-emitting layer EL2-2 and the 2-2nd inspection pattern IP2-2.

[0105] The 2-3rd light-emitting layer EL2-3 and the 2-3rd inspection pattern IP2-3 may be formed of or composed of the same material and may be formed by the same process. In an embodiment, the 2-3rd light-emitting layer EL2-3 and the 2-3rd inspection pattern IP2-3 may be formed using a third mask used to form the 1-3rd light-emitting layer EL1-3 and the 1-3rd inspection pattern IP1-3. That is, the 1-3rd light-emitting layer EL1-3 and the 2-3rd light-emitting layer EL2-3 as well as the 1-3rd inspection pattern IP1-3 and the 2-3rd inspection pattern IP2-3 may be formed using the same mask. For example, the 2-3rd light-emitting layer EL2-3 and the 2-3rd inspection pattern IP2-3 may be formed of or composed of a material that emits a third light and may be formed using a third mask that defines an opening corresponding to the 2-3rd light-emitting layer EL2-3 and the 2-3rd inspection pattern IP2-3.

[0106] For example, the 2-3rd light-emitting layer EL2-3 and the 2-3rd inspection pattern IP2-3 may be formed by a deposition process using a third mask, after which the 2-2nd light-emitting layer EL2-2 and the 2-2nd inspection pattern IP2-2 may be formed by a deposition process using a second mask, and after which the 2-1st light-emitting layer EL2-1 and the 2-1st inspection pattern IP2-1 may be formed by a deposition process using a first mask. However, the present disclosure is not limited thereto, and the order of forming the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2, and the 2-3rd light-emitting layer EL2-3 and the 2-1st inspection pattern IP2-1, the 2-2nd inspection pattern IP2-2, and the 2-3rd inspection pattern IP2-3 may be modified differently.

[0107] After forming the second light-emitting layer EL2 and the second inspection pattern IP2, the alignment of the first light-emitting layer EL1 can be confirmed by the first inspection pattern IP1, and the alignment of the second light-emitting layer EL2 can be confirmed by the second inspection pattern IP2. For example, the substrate SUB can be transferred in the third direction DR3 using lift pins LP, and the first inspection pattern IP1 and the second inspection pattern IP2 can be measured simultaneously by the inspection device IE.

[0108] Since the first inspection pattern IP1 and the second inspection pattern IP2 are spaced apart from each other with the charge generation layer CGL interposed therebetween, the first inspection pattern IP1 and the second inspection pattern IP2, which overlap in a plan view, can be separately measured by the inspection device IE. For example, the inspection device IE located below the substrate SUB (i.e., the inspection device IE positioned away from the substrate SUB in a direction opposite to the third direction DR3) can measure the first inspection pattern IP1 in the third direction DR3, and the inspection device IE located above the substrate SUB (i.e., the inspection device IE positioned away from the substrate SUB in the third direction DR3) can measure the second inspection pattern IP2 in a direction opposite to the third direction DR3. For example, the inspection device IE can be various types of devices that measure the first inspection pattern IP1 and the second inspection pattern IP2, such as a polarizing microscope or an imaging ellipsometer. For example, the inspection device IE can measure the position and alignment of the first inspection pattern IP1 and the second inspection pattern IP2 to assess whether the first inspection pattern IP1 and the second inspection pattern IP2 are deposited in the desired positions.

[0109] By measuring the first inspection pattern IP1 formed by the same process as the process for the first light-emitting layer EL1, the shift, shrinkage, or expansion of the first, second, and third masks can be confirmed, and the alignment of the first light-emitting layer EL1 can be confirmed. In addition, by measuring the second inspection pattern IP2 formed by the same process as the process for the second light-emitting layer EL2, the shift, shrinkage, or expansion of the first, second, and third masks can be confirmed, and the alignment of the second light-emitting layer EL2 can be confirmed. That is, the alignment of the 1-1 light-emitting layer EL1-1, the alignment of the 1-2 light-emitting layer EL1-2, and the alignment of the 1-3 light-emitting layer EL1-3 can be confirmed by respectively measuring the 1-1 inspection pattern IP1-1, the 1-2 inspection pattern IP1-2, and the 1-3 inspection pattern IP1-3, and the alignment of the 2-1 light-emitting layer EL2-1, the alignment of the 2-2 light-emitting layer EL2-2, and the alignment of the 2-3 light-emitting layer EL2-3 can be confirmed by respectively measuring the 2-1 inspection pattern IP2-1, the 2-2 inspection pattern IP2-2, and the 2-3 inspection pattern IP2-3.

[0110] Return Reference Figure 1 、 Figure 2 and Figure 4 , the fourth common layer CL4, the common electrode CE, and the encapsulation layer TFE may be sequentially formed in the display area DA on the second light-emitting layer EL2. Accordingly, a display device 10 including the first and second light-emitting layers EL1 and EL2 overlapping in a plan view in the display area DA and the first and second inspection patterns IP1 and IP2 overlapping in a plan view in the non-display area NDA may be manufactured.

[0111] Figure 9 is a perspective view schematically illustrating a mask used in a method of manufacturing a display device according to an embodiment of the present disclosure.

[0112] For example, reference Figure 9 The mask MA described can be found in reference Figure 5A 、 Figure 5B 、 Figure 6A 、 Figure 6B 、 Figure 7A 、 Figure 7B 、 Figure 8A and Figure 8B That is, the mask MA may correspond to the first, second, and third masks used to form the first and second light emitting layers EL1 and EL2 and the first and second inspection patterns IP1 and IP2 included in the display device 10, respectively.

[0113] refer to Figure 9 , the mask MA may include a mask frame MF and at least one mask sheet MS.

[0114] The mask frame MF may have one or more frames defining an opening of a central portion. When the mask frame MF includes a plurality of frames, the frames may be connected to each other to form one mask frame.

[0115] The mask sheet MS may be disposed on the mask frame MF. The mask sheet MS may extend in the first direction DR1, and when a plurality of mask sheets MS are provided, the mask sheets MS may be arranged along the second direction DR2. The mask sheet MS may cover the opening of the mask frame MF.

[0116] The mask sheet MS may include a cell area CA and a peripheral area NCA. The cell area CA may correspond to a deposition area where a deposition material is deposited on a target substrate, and the peripheral area NCA may correspond to a non-deposition area where a deposition material is not deposited on the target substrate. The first opening OP1 and the second opening OP2 may be defined in the cell area CA, and the peripheral area NCA may surround the cell area CA.

[0117] The first openings OP1 may be spaced apart from each other and may form a predetermined pattern. For example, the first openings OP1 may be arranged along the first direction DR1 and / or the second direction DR2. The first openings OP1 may correspond to regions on the substrate SUB where the first light-emitting layer EL1 and the second light-emitting layer EL2 are formed in the display area DA. The first openings OP1 may correspond to the first light-emitting area LA1, the second light-emitting area LA2, and the third light-emitting area LA3 on the substrate SUB.

[0118] The second opening OP2 may be disposed to be spaced apart from the first opening OP1. The second opening OP2 may correspond to a region on the substrate SUB where the first and second inspection patterns IP1 and IP2 are formed in the non-display area NDA.

[0119] The 1-1st light-emitting layer EL1-1, the 1-2nd light-emitting layer EL1-2 and the 1-3 light-emitting layer EL1-3 and the 1-1st inspection pattern IP1-1, the 1-2 inspection pattern IP1-2 and the 1-3 inspection pattern IP1-3 can be formed using a mask MA to correspond to the first opening OP1 and the second opening OP2 respectively, and the 2-1st light-emitting layer EL2-1, the 2-2nd light-emitting layer EL2-2 and the 2-3rd light-emitting layer EL2-3 and the 2-1st inspection pattern IP2-1, the 2-2nd inspection pattern IP2-2 and the 2-3rd inspection pattern IP2-3 can be formed using a mask MA to correspond to the first opening OP1 and the second opening OP2 respectively.

[0120] In the display device 10 and the method for manufacturing the display device 10 according to an embodiment of the present disclosure, the first light-emitting layer EL1 and the second light-emitting layer EL2 and the first inspection pattern IP1 and the second inspection pattern IP2 for confirming the alignment of the first light-emitting layer EL1 and the alignment of the second light-emitting layer EL2, respectively, can be formed by using the same mask. Since different layers (for example, the 1-1 light-emitting layer EL1-1 and the 2-1 light-emitting layer EL2-1) can be formed by using one mask, the burden of mask management or design, etc. can be minimized, and the area in the non-display area NDA in which the first inspection pattern IP1 and the second inspection pattern IP2 are provided can be relatively reduced. In addition, since the alignment of the first light-emitting layer EL1 and the alignment of the second light-emitting layer EL2 can be checked by measuring the first inspection pattern IP1 and the second inspection pattern IP2, respectively, using the inspection device IE, even if different layers overlap each other in a plan view, the alignment of these layers can be confirmed separately.

[0121] The present disclosure can be applied to various display devices. For example, the present disclosure is applicable to various display devices such as display devices for vehicles, ships, and aircraft, portable communication devices, display devices for exhibitions or information transmission, and medical display devices.

[0122] The foregoing is illustrative of embodiments and should not be construed as limiting thereof. Although a few embodiments have been described, those skilled in the art will readily appreciate that many modifications may be made to the embodiments without materially departing from the novel teachings and advantages of the present invention. Accordingly, all such modifications are intended to be included within the scope of the present invention as defined in the claims. Therefore, it should be understood that the foregoing is illustrative of various embodiments and should not be construed as being limited to the specific embodiments disclosed, and modifications to the disclosed embodiments and other embodiments are intended to be included within the scope of the claims.

Claims

1. A display device, comprising: a substrate comprising a display area and a non-display area adjacent to the display area; a light-emitting element, disposed in the display area and on the substrate, and comprising a first light-emitting layer and a second light-emitting layer disposed on the first light-emitting layer; as well as The inspection array is disposed in the non-display area and on the substrate, and includes a first inspection pattern and a second inspection pattern disposed on the first inspection pattern.

2. The display device according to claim 1, in, The first light emitting layer and the first inspection pattern include the same material, and The second light emitting layer and the second inspection pattern include the same material.

3. The display device according to claim 1, in, The first light emitting layer and the second light emitting layer overlap in a plan view, and The first inspection pattern and the second inspection pattern overlap in the plan view.

4. The display device according to claim 1, in, The first light emitting layer and the second light emitting layer include the same material.

5. The display device according to any one of claims 1 to 4, further comprising: a charge generation layer disposed between the first light emitting layer and the second light emitting layer and between the first inspection pattern and the second inspection pattern, The charge generation layer includes a first semiconductor layer doped with an n-type dopant and a second semiconductor layer doped with a p-type dopant.

6. A method for manufacturing a display device, comprising: forming a first light emitting layer on a substrate in a display area and forming a first inspection pattern on the substrate in a non-display area using a plurality of masks, wherein the non-display area is adjacent to the display area; and A second light emitting layer is formed on the first light emitting layer and a second inspection pattern is formed on the first inspection pattern using the plurality of masks.

7. The method according to claim 6, in, The first light emitting layer and the first inspection pattern are formed of the same material, and The second light emitting layer and the second inspection pattern are formed of the same material.

8. The method according to claim 6, in, The first light emitting layer and the second light emitting layer are formed to overlap in a plan view, and The first inspection pattern and the second inspection pattern are formed to overlap in the plan view.

9. The method according to claim 6, in, The first light-emitting layer and the second light-emitting layer are formed of the same material.

10. The method according to any one of claims 6 to 9, further comprising: forming a charge generation layer on the first light emitting layer and the first check pattern using an open mask defining openings corresponding to the display area and the non-display area after the forming of the first light emitting layer and the first check pattern and before the forming of the second light emitting layer and the second check pattern; as well as After the forming of the second light emitting layer and the second inspection pattern, the first inspection pattern is measured to confirm alignment of the first light emitting layer and the second inspection pattern is measured to confirm alignment of the second light emitting layer.

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