Mushroom bran washing and impurity removing device

Abstract

The invention discloses a mushroom bran washing and impurity removing device, relates to the field of agriculture, and aims to solve the problem that dust on the surface of mushroom bran is difficult to remove at present. A discharging opening in the bottom of the discharging groove is communicated with a feeding opening of the inclined groove, and a discharging opening of the inclined groove is communicated with a feeding opening in the upper end of the sedimentation tank; and a plurality of grids are arranged at the bottom of the chute side by side. According to the device, surface impurities are removed through the scouring force of water flow, mushroom residues are deeply cleaned through the dissolution effect, and the dual impurity removal effect is achieved.

Description

Technical Field

[0001] The invention belongs to the field of agriculture, and in particular relates to a mushroom husk water washing and impurity removal device. Background Art

[0002] The cultivation of fungi, such as wood ear mushrooms and mushrooms, produces a large number of fungus bags annually. The fungus residue within these bags has potential for fuel utilization. However, due to the addition of ingredients such as gypsum and inorganic salts during the preparation process, and the inclusion of dust and gravel during collection, these impurities affect their fuel utilization, necessitating their removal. Traditional wind-driven impurity removal equipment, such as cyclone dust removal and air separation, generates dust pollution during operation, and some dust adhering to the surface of the fungus residue is difficult to remove.

[0003] CN214287323U, entitled "A Dust Removal Equipment for Mushroom Bran Feed Processing," discloses a dust removal equipment for mushroom bran feed processing, comprising a base, a dust box disposed on one side of the base's top outer wall, and an opening formed in the top outer wall of the dust box. A dust removal box is disposed on the inner wall of the opening. Horizontally disposed lower baffles are fixed to the inner walls of both sides of the dust removal box by screws, and the outer wall of the lower baffles has a lower trapezoidal hole formed in the outer wall. A rotating rod is connected to the middle of the top outer wall of the lower baffle via a bearing, and the outer wall of the rotating rod is provided with a stirring plate. The outer wall of the stirring plate has equally spaced through holes, and the outer wall of the stirring plate near the through holes is provided with equally spaced guide plates. This equipment has a complex structure, requires a large number of power devices, and is costly. Summary of the Invention

[0004] The purpose of the present invention is to solve the problem that dust on the surface of mushroom dregs is difficult to remove, and to provide a mushroom dregs water washing and impurity removal device.

[0005] The present invention provides a device for washing and removing impurities from mushroom husks, which comprises a discharge trough, a chute and a sedimentation tank;

[0006] The discharge port at the bottom of the discharge trough is connected to the feed port of the chute, and the discharge port of the chute is connected to the feed port at the upper end of the sedimentation tank; a plurality of grids are arranged side by side at the bottom of the chute.

[0007] A method for removing impurities using a mushroom husk water washing and impurity removal device:

[0008] Step 1: Insert the adjustable baffle into the discharge trough to divide the discharge trough into two areas, wherein the area with the discharge trough outlet is used to place the mushroom husks, and the other area is used to add water;

[0009] Step 2: Lift the adjustable baffle upwards to allow water to flush the mushroom shavings into the chute, while continuously adding mushroom shavings;

[0010] Step 3: The mushroom residue is washed by water through the chute and flows into the sedimentation tank. The sand and gravel that sinks when the mushroom residue flows through the chute are intercepted by the grille; the mushroom residue that flows into the sedimentation tank is further cleaned, and the mushroom residue floating on the water surface flows out through the outlet of the sedimentation tank;

[0011] Step 4: The mixture of mushroom residue and water flowing out of the sedimentation tank flows into the dehydration process. The dehydrated water is filtered and then transported back to the discharge tank for reuse.

[0012] The present invention has the following beneficial effects:

[0013] The present invention discloses a self-flowing liquid separation device. The device, which is composed of a discharge trough, a chute, and a sedimentation tank, not only utilizes the scouring force of the water flow to remove surface impurities, but also deeply cleans the mushroom shavings through a dissolving action, achieving a dual impurity removal effect. Compared with the CN214287323U patent, the device of the present invention can quickly precipitate impurities such as sand and gravel mixed in the mushroom shavings, achieving fast, low-cost impurity removal and improving the cleanliness of the mushroom shavings. Based on the physical properties that the density of mushroom shavings is less than that of water and the density of sand and gravel is greater than that of water, and the chemical properties that inorganic salts, solvents, and dust are soluble in water, the present invention designs a self-flowing liquid separation structure. The chute and sedimentation tank in the structure can achieve the purpose of quickly separating impurities such as dust and soil attached to the surface of the mushroom shavings under the action of hydraulic scouring, and quickly precipitating impurities such as sand and gravel mixed in the mushroom shavings, thereby achieving fast, low-cost impurity removal and improving the cleanliness of the mushroom shavings. BRIEF DESCRIPTION OF THE DRAWINGS

[0014] Figure 1 This is a schematic diagram of the structure of the mushroom husk water washing and impurity removal device;

[0015] Figure 2 This is a perspective view of a device for washing and removing impurities from mushroom husks;

[0016] Figure 3 This is a real photo of the device for washing and removing impurities from mushroom husks;

[0017] In the figure, 1 is a discharge chute, 2 is a chute, 3 is a sedimentation tank, 4 is a grille, 5 is an adjustable baffle, and 6 is a bracket. DETAILED DESCRIPTION

[0018] In order to make the objectives, technical solutions and advantages of the embodiments of the present invention more clearly understood, the spirit of the contents disclosed in the present invention will be described in detail below. After understanding the embodiments of the contents of the present invention, any technician in the relevant technical field can change and modify the contents of the present invention based on the techniques taught by the contents of the present invention without departing from the spirit and scope of the contents of the present invention.

[0019] The exemplary embodiments of the present invention and the description thereof are used to explain the present invention but are not intended to limit the present invention.

[0020] Specific implementation method 1: Combination Figure 13 illustrates this embodiment, a device for washing and removing impurities from mushroom husks in this embodiment comprises a discharge trough 1, a chute 2 and a sedimentation tank 3;

[0021] The discharge port at the bottom of the discharge trough 1 is connected to the feed port of the chute 2, and the discharge port of the chute 2 is connected to the feed port at the upper end of the sedimentation tank 3; a plurality of grids 4 are arranged side by side at the bottom of the chute 2; an adjustable baffle 5 is provided in the discharge trough 1.

[0022] This implementation leverages the differences in physical and chemical properties between mushroom shavings and impurities, combining physical separation (based on the different densities between mushroom shavings and impurities like sand and gravel) with chemical dissolution (taking advantage of the water solubility of inorganic salts, solvents, and dust) to create a mushroom shavings water-washing and impurity removal device. This device not only utilizes the scouring force of the water flow to remove surface impurities, but also deeply cleans the shavings through dissolution, achieving a dual impurity removal effect.

[0023] The adjustable baffle 5 of the mushroom stalk washing and impurity removal device of this embodiment is placed at the lowest end of the discharge trough 1. During operation, water is continuously added to the left side of the discharge trough 1, while mushroom stalks are added to the right side of the baffle. The baffle is then raised to a certain height. By adjusting the height and the water flow rate, the water flushes the mushroom stalks into the chute 2. The chute 2 is equipped with multiple raised grates 4 arranged horizontally side by side. As the mushroom stalks are flushed downward by the water, some sand and gravel settle, intercepted by the grates, and then flows into the sedimentation tank 3. The bottom of the sedimentation tank 3 has a zigzag structure (which can be composed of multiple curved plates). This structure allows the retained water to form vortices under the action of the curved plates, creating a centrifugal effect, further cleaning the surface of the mushroom stalks, further settling sand and gravel, and dissolving dust. After washing and impurity removal, the mushroom stalks float to the water surface and flow out of the outlet to enter the dehydration and drying process. The settled sand and gravel in the sedimentation tank 3 are regularly cleaned, and the remaining water is promptly filtered and transported to the discharge trough 1 for reuse.

[0024] Specific implementation method 2: Combination Figure 1 3 illustrates this embodiment, which is different from the specific embodiment.

[0025] The similarity is that the adjustable baffle 5 is inserted into the slot provided on the inner wall of the discharge trough 1 .

[0026] The rest is the same as the first embodiment.

[0027] Specific implementation method three: Combination Figure 1 3 illustrates this embodiment, which is different from the specific embodiment.

[0028] The similarity is that the outlet of the sedimentation tank 3 extends outward to form a convex portion.

[0029] The rest is the same as the first embodiment.

[0030] In this embodiment, the mushroom residue flows out from the outlet of the sedimentation tank 3 along with the water flow and directly flows into the next process link, which facilitates the connection between different devices.

[0031] Specific implementation method four: Combination Figure 1 Or 3 describes this embodiment, this embodiment is different from the specific embodiment

[0032] The point is that the bottom of the sedimentation tank 3 is a zigzag structure.

[0033] The rest is the same as the first embodiment.

[0034] Through this structure, this embodiment forms a vortex of water inside the sedimentation tank 3. On the one hand, the surface of the mushroom sludge can be further washed under the rotation of the vortex of water; on the other hand, the sand and gravel in the mushroom sludge are accelerated to separate from the mushroom sludge and precipitate under the centrifugal action of the vortex.

[0035] Specific implementation method five: Combination Figure 1 Or 3 illustrates this embodiment, which differs from the specific embodiment 1 in that the discharge trough 1 and the sedimentation tank 3 are placed on the bracket 6.

[0036] The rest is the same as the first embodiment.

[0037] Specific implementation method six: combination Figure 1 3 illustrates this embodiment, which uses a method for removing impurities using the aforementioned device for washing and removing impurities from mushroom husks:

[0038] Step 1: insert the adjustable baffle 5 into the discharge trough 1 to divide the discharge trough 1 into two areas, wherein the area where the discharge trough 1 outlet is provided is used to place the mushroom husks, and the other area is used to add water;

[0039] Step 2: Lift the adjustable baffle 5 upwards to allow the water to flush the mushroom stalks into the chute 2, and continue adding mushroom stalks during this period;

[0040] Step 3: The mushroom residue is flushed by water through the chute 2 and flows into the sedimentation tank 3. The sand and gravel that sinks when the mushroom residue flows through the chute 2 are intercepted by the grille 4; the mushroom residue that flows into the sedimentation tank 3 is further washed, and the mushroom residue floating on the water surface flows out through the outlet of the sedimentation tank 3;

[0041] Step 4: The mixture of mushroom husk and water flowing out of the sedimentation tank 3 flows into the dehydration process. The dehydrated water is filtered and then transported back to the discharge tank 1 for reuse.

[0042] The method of this embodiment can achieve efficient and low-cost mushroom bran impurity removal. After being washed with the mushroom bran water washing and impurity removal device of this embodiment, the ash content of the mushroom bran fuel reaches less than 20%.

[0043] Specific implementation method seven: combination Figure 13 illustrates this embodiment, which differs from the sixth embodiment in that the sand and gravel in the chute 2 and the sedimentation tank 3 are cleaned regularly.

[0044] The rest is the same as the sixth embodiment.

Claims

1. A device for washing and removing impurities from mushroom husks, characterized in that It includes a discharge trough (1), a chute (2) and a sedimentation tank (3); The discharge port at the bottom of the discharge trough (1) is connected to the feed port of the chute (2), and the discharge port of the chute (2) is connected to the feed port at the upper end of the sedimentation tank (3); a plurality of grids (4) are arranged side by side at the bottom of the chute (2); and an adjustable baffle (5) is arranged in the discharge trough (1).

2. A mushroom husk washing and impurity removal device according to claim 1, characterized in that The adjustable baffle (5) is inserted into a slot provided on the inner wall of the discharge trough (1).

3. A mushroom husk washing and impurity removal device according to claim 1, characterized in that The outlet of the sedimentation tank (3) extends outward to form a convex portion.

4. a kind of mushroom dregs washing and impurity removal device according to claim 1 or 3, is characterized in that The bottom of the sedimentation tank (3) is a zigzag structure.

5. A mushroom husk washing and impurity removal device according to claim 1, characterized in that The discharge trough (1) and the sedimentation tank (3) are placed on a bracket (6).

6. adopt the method for removing impurities of a kind of mushroom husk water washing and impurity removal device according to claim 1, it is characterized in that The impurity removal method is carried out as follows: Step 1: insert the adjustable baffle (5) into the discharge trough (1) to divide the discharge trough (1) into two areas, wherein the area where the discharge trough (1) outlet is located is used to place the mushroom shavings, and the other area is used to add water; Step 2: Lift the adjustable baffle (5) upwards to allow the water to flush the mushroom shavings into the chute (2), and continue adding mushroom shavings during this period; Step 3: The mushroom shavings are flushed by water through the chute (2) and flow into the sedimentation tank (3). Sand and gravel that sink when the mushroom shavings flow through the chute (2) are intercepted by the screen (4); the mushroom shavings that flow into the sedimentation tank (3) are further cleaned, and the mushroom shavings that float on the water surface flow out through the outlet of the sedimentation tank (3); Step 4: The mixture of the mushroom slag and water flowing out of the sedimentation tank (3) flows into the dehydration process. The dehydrated water is filtered and then transported back to the discharge tank (1) for reuse.

7. the method for removing impurities by using a bacterium chaff washing and impurity removal device according to claim 6, is characterized in that Regularly clean the sand and gravel in the chute (2) and sedimentation tank (3).

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