Multi-nuclide electrodeposition source and partition deposition method thereof

Abstract

The invention provides a multi-nuclide electro-deposition source and a partitioned deposition method thereof, and the partitioned deposition method comprises the steps: (1) dividing the surface of a cathode into at least two target deposition regions, shielding at least one target deposition region by using a shielding piece, and performing electro-deposition on a first target region which is not shielded to form a first nuclide; (2) when there are two types of nuclides to be deposited, shielding the first target area by using a shielding member and then electrically depositing a second nuclide in the remaining second target area; or when the number of the nuclides to be deposited is more than two, (a) shielding at least one of the first target area where the first nuclide is deposited and the target area where the first nuclide is not deposited by using a shielding piece, and electrically depositing a second nuclide in the exposed second target area; and (b) repeating the step (a), and electro-depositing corresponding nuclides in the third to Nth target areas in sequence until electro-deposition of all nuclides in all target areas is completed. According to the invention, quantitative deposition can be realized, and deposition of various nuclides on the same deposition sheet can be realized.

Description

Technical Field

[0001] The invention belongs to the technical field of nuclide deposition, and relates to a partitioned deposition method of a multi-nuclide electrodeposition source, in particular to a multi-nuclide electrodeposition source and a partitioned deposition method thereof. Background Art

[0002] In multi-nuclide electrodeposition sources, due to the large number of nuclides and their varying chemical properties and electrode potentials, it is difficult to achieve the desired deposition in a single electrochemical electrodeposition system, or to ensure quantitative deposition of all nuclides. Consequently, it is difficult to achieve multi-nuclide deposition on the same deposition sheet.

[0003] Furthermore, since isotopes can be deposited using the same electrodeposition or electroplating method, it is possible to deposit two nuclides on the same deposition sheet; however, it is limited to the deposition of two nuclides and it is not possible to deposit multiple nuclides on the same deposition sheet.

[0004] CN117418283A discloses a method for preparing 239Pu and 237Np electrodeposition sources by electrodeposition under the coexistence of interfering ions, which belongs to the technical field of radionuclide analysis. The method comprises the following steps: 1. installing a stainless steel cathode sheet in an electrodeposition tank for standby use; 2. adding an ammonium sulfate-sulfuric acid buffer solution, adding 237Np and 239Pu standard nuclide solutions, and adding an interfering metal element solution or a sample solution treated by carbonization-ashing-acid dissolution to the electrodeposition tank; 3. installing a semiconductor cooling device and connecting the power supply; 4. adding an ammonia solution to the electrodeposition tank, cutting off the power supply, removing the stainless steel cathode sheet and washing it, and finally washing the electrodeposition source with anhydrous ethanol and naturally drying it for measurement; 5. measuring the electrodeposition source using an α spectrometer.

[0005] CN117059296A discloses a method for preparing palladium-103 and its application. The method comprises: 1) placing a copper substrate in a rhodium plating solution for electroplating to obtain a rhodium target; 2) irradiating the rhodium target obtained in step 1) in a proton cyclotron; 3) grinding the rhodium coating of the rhodium target obtained in step 2) into powder, dissolving the rhodium coating powder using a potassium hydrogen sulfate-dilute acid melting method to obtain a solution to be separated; and 4) treating the solution to be separated obtained in step 3) using an anion exchange resin column.

[0006] The multi-nuclide deposition methods disclosed in the prior art all have certain drawbacks, such as the difficulty in achieving multi-nuclide deposition on the same deposition sheet. Therefore, it is crucial to develop a novel multi-nuclide electrodeposition source and its partitioned deposition method. Summary of the Invention

[0007] In view of the shortcomings of the prior art, the present invention aims to provide a multi-nuclide electrodeposition source and a partitioned deposition method thereof. In the present invention, the partitioned electrodeposition technology is used, and different nuclides are deposited in different target areas without interfering with each other. Each nuclide can independently complete an electrodeposition process, which can achieve quantitative deposition without affecting the resolution. At the same time, the radioactive nuclides in the generated electrodeposition waste liquid are greatly reduced; moreover, the partitioned deposition method can combine the types of electrodeposition nuclides with great freedom, and can realize the deposition of multiple nuclides in the same deposition sheet; in addition, the partitioned deposition method can also make different nuclides have different deposition areas according to the different specific activities of the nuclides (for example, the area with high specific activity is small, and the area with low specific activity is large).

[0008] To achieve this object, the present invention adopts the following technical solutions:

[0009] In a first aspect, the present invention provides a partitioned deposition method for a multi-nuclide electrodeposition source, the partitioned deposition method comprising:

[0010] (1) dividing the cathode surface into at least two target deposition areas, shielding at least one target deposition area with a shielding member, and forming a first nuclide by electrodeposition in the first target area that is not shielded;

[0011] (2) when there are two nuclides to be deposited, shielding the first target area with a shielding member and then electrodepositing the second nuclide in the remaining second target area;

[0012] or

[0013] When there are two or more nuclides to be deposited:

[0014] (a) shielding at least one of a first target region where the first nuclear species has been deposited and a target region where the first nuclear species has not been deposited with a shielding member, and electrodepositing a second nuclear species in the exposed second target region;

[0015] (b) Repeat step (a) to sequentially electrodeposit corresponding nuclides in the third to Nth target areas until electrodeposition of all nuclides is completed in all target areas.

[0016] In the partitioned deposition method of the multi-nuclide electrodeposition source provided by the present invention, the partitioned electrodeposition technology is used. When the first nuclide is formed by electrodeposition in the first target area, the remaining target deposition areas are all shielded by the shielding member; when other nuclides are subsequently deposited in the remaining target areas, the target area where the nuclide has been deposited and the target area where more nuclides need to be deposited are all shielded by the shielding member; when different nuclides are deposited in different target areas, they do not interfere with each other, and each nuclide can independently complete an electrodeposition process, so that quantitative deposition can be achieved without affecting the resolution. At the same time, a large amount of radioactive nuclides in the generated electrodeposition waste liquid are reduced. Less; moreover, the partitioned deposition method can combine the types of electrodeposited nuclides with great freedom, and can realize the deposition of two or more of Am241, Pu239, Pu242, Pu238, Cm244, Th232, Th228, Ra226, Po210, U238, U234, U235, U232, U233 or Np237 on the same deposition sheet; in addition, the partitioned deposition method can also make different nuclides have different deposition areas according to the different specific activities of the nuclides (for example, the area with high specific activity is small, and the area with low specific activity is large).

[0017] The resolution of the nuclide mentioned in the present invention refers to the boundary clarity or the minimum distinguishable distance between adjacent different nuclide deposition areas during the multi-nuclide electrodeposition process. This parameter directly determines the positioning accuracy and cross-contamination control ability of different nuclides deposited on the cathode surface, and is one of the core indicators for evaluating the partitioned deposition process.

[0018] Preferably, the deposition process of each nuclide in the zoned deposition method is different.

[0019] Preferably, the shielding member in the partitioned deposition method is a hollow polytetrafluoroethylene sheet;

[0020] The hollow polytetrafluoroethylene sheet includes a polytetrafluoroethylene ring and at least one sector-shaped polytetrafluoroethylene sheet arranged in the polytetrafluoroethylene ring.

[0021] Preferably, two sector-shaped polytetrafluoroethylene sheets are provided in the polytetrafluoroethylene ring.

[0022] Preferably, the partitioned deposition method comprises:

[0023] (1) dividing the cathode surface into at least three target deposition areas, shielding at least two of the target deposition areas with two sector-shaped polytetrafluoroethylene sheets of a hollow polytetrafluoroethylene sheet, leaving only one unshielded first target area, and forming a first nuclide in the unshielded first target area through a first electrodeposition process;

[0024] (2) There are two or more nuclides to be deposited:

[0025] (a) controlling the rotation of two sector-shaped polytetrafluoroethylene sheets of the hollow polytetrafluoroethylene sheet so that the two sector-shaped polytetrafluoroethylene sheets shield at least one of a first target area where the first nuclide has been deposited and a target area where the first nuclide has not been deposited, and forming a second nuclide in the exposed second target area through a second electrodeposition process;

[0026] (b) Repeating step (a) to deposit corresponding nuclides in the third to Nth target areas by different electrodeposition processes, until electrodeposition of all nuclides is completed in all target areas.

[0027] Preferably, the partitioned deposition method comprises:

[0028] (1) dividing the cathode surface into three target deposition areas, shielding two target deposition areas with two sector-shaped polytetrafluoroethylene sheets of a hollow polytetrafluoroethylene sheet, leaving only one unshielded first target area, and forming a first nuclide in the unshielded first target area through a first electrodeposition process;

[0029] (2) There are three types of nuclides to be deposited:

[0030] (a) controlling the rotation of two fan-shaped polytetrafluoroethylene sheets of the hollow polytetrafluoroethylene sheet so that the two fan-shaped polytetrafluoroethylene sheets shield a first target area where the first nuclide has been deposited and a third target area where the first nuclide has not been deposited, and forming a second nuclide in the exposed second target area through a second electrodeposition process;

[0031] (b) controlling the rotation of the two fan-shaped polytetrafluoroethylene sheets of the hollow polytetrafluoroethylene sheet so that the two fan-shaped polytetrafluoroethylene sheets shield a first target area where the first nuclide has been deposited and a second target area where the second nuclide has been deposited, forming a third nuclide in the exposed third target area through a third electrodeposition process, and completing the electrodeposition of all nuclides.

[0032] Preferably, the shielding member in the partitioned deposition method comprises a circular sheet and at least two concentric circular rings, and the circular sheet and all the circular rings are spliced ​​together to form a complete circular sheet-shaped shielding member.

[0033] Preferably, the partitioned deposition method comprises:

[0034] (1) dividing the cathode surface into at least three target deposition areas, shielding at least two of the target deposition areas with circular pieces and / or at least one circular ring in a shielding member, and forming a first species in a first target area that is not shielded by a first electrodeposition process;

[0035] (2) When there are two or more nuclides to be deposited:

[0036] (a) shielding at least one of a first target area where the first species has been deposited and a target area where the first species has not been deposited using a circular sheet and / or at least one circular ring in a shielding member, and performing a second electrodeposition process on the exposed second target area;

[0037] (b) Repeating step (a) to sequentially electrodeposit corresponding nuclides in the third to Nth target areas until electrodeposition of all nuclides is completed in all target areas by different electrodeposition processes.

[0038] Preferably, the shielding member in the partitioned deposition method comprises a circular sheet and four concentric circular rings, and the circular sheet and all the circular rings are spliced ​​together to form a complete circular sheet-shaped shielding member;

[0039] The partitioned deposition method comprises:

[0040] (1) dividing the cathode surface into five target deposition areas, shielding the four target deposition areas with a circular sheet and three circular rings in a shielding member, and forming a first species in a first target area that is not shielded by a first electrodeposition process;

[0041] (2) There are five nuclides to be deposited:

[0042] (a) shielding a first target area where the first species has been deposited and three of the target areas where the first species has not been deposited using a circular sheet and three circular rings in a shielding member, and performing a second electrodeposition process on the exposed second target area;

[0043] (b) shielding a first target area on which the first nuclear species has been deposited, a second target area on which the second nuclear species has been deposited, and two of the target areas on which no nuclear species has been deposited, using a circular sheet and three circular rings in the shielding member, and performing a third electrodeposition process on the exposed third target area;

[0044] (c) shielding a first target area on which the first nuclear species has been deposited, a second target area on which the second nuclear species has been deposited, a third target area on which the third nuclear species has been deposited, and one of the target areas on which no nuclear species has been deposited, using the circular sheet and the three rings in the shielding member, and depositing a fourth nuclear species through a fourth electrodeposition process in the exposed fourth target area;

[0045] (d) Using the four circular rings in the shielding member to shield the first target area where the first nuclear element has been deposited, the second target area where the second nuclear element has been deposited, the third target area where the third nuclear element has been deposited, and the fourth target area where the fourth nuclear element has been deposited, the exposed fifth target area is subjected to a fifth electrodeposition process for the fifth nuclear element.

[0046] In a second aspect, the present invention provides a multi-nuclide electrodeposition source, which is obtained by the partitioned deposition method described in the first aspect.

[0047] Compared with the prior art, the present invention has the following beneficial effects:

[0048] (1) In the partitioned deposition method of the multi-nuclide electrodeposition source provided by the present invention, a partitioned electrodeposition technology is used. When the first nuclide is electrodeposited in the first target area to form the first nuclide, the remaining target deposition areas are all shielded by shielding members. When other nuclides are subsequently deposited in the remaining target areas, the target area where the nuclide has been deposited and the target area where more nuclides are subsequently to be deposited are all shielded by shielding members. When different nuclides are deposited in different target areas, they do not interfere with each other. Each nuclide can independently complete an electrodeposition process, and quantitative deposition can be achieved without affecting the resolution. At the same time, the radioactive nuclides in the generated electrodeposition waste liquid are greatly reduced.

[0049] (2) The partitioned deposition method provided by the present invention can combine the types of electrodeposited nuclides with great freedom, and can achieve the deposition of two or more of Am241, Pu239, Pu242, Pu238, Cm244, Th232, Th228, Ra226, Po210, U238, U234, U235, U232, U233 or Np237 on the same deposition sheet;

[0050] (3) The partitioned deposition method provided by the present invention can also make different nuclides have different deposition areas according to the different specific activities of the nuclides (for example, the area with high specific activity is small, and the area with low specific activity is large). BRIEF DESCRIPTION OF THE DRAWINGS

[0051] Figure 1 It is a structural diagram of the shielding member in Example 1.

[0052] Figure 2 It is a complete circular sheet-shaped shielding piece formed after splicing in Example 2.

[0053] Figure 3 This is a schematic structural diagram of a circular sheet-shaped shielding member in Example 2 in which a portion of the ring is removed to expose a portion of the target deposition area.

[0054] Among them, 1-polytetrafluoroethylene ring; 2-fan-shaped polytetrafluoroethylene sheet; 3-target deposition area; 4-circular sheet; 5-circular ring. DETAILED DESCRIPTION

[0055] The technical solution of the present invention is further described below by way of specific embodiments. It should be understood by those skilled in the art that the embodiments are merely to help understand the present invention and should not be regarded as specific limitations of the present invention.

[0056] Example 1

[0057] This embodiment provides a partitioned deposition method for a multi-nuclide electrodeposition source, the partitioned deposition method comprising:

[0058] (1) dividing the cathode surface into three target deposition areas 3, shielding two target deposition areas 3 with two sector-shaped polytetrafluoroethylene sheets 2 of a hollow polytetrafluoroethylene sheet, leaving only one unshielded first target area, and forming Am241 nuclides in the unshielded first target area through a first electrodeposition process;

[0059] like Figure 1 As shown, the shielding member in the partitioned deposition method is a hollow polytetrafluoroethylene sheet; the hollow polytetrafluoroethylene sheet includes a polytetrafluoroethylene ring 1 and two fan-shaped polytetrafluoroethylene sheets 2 arranged in the polytetrafluoroethylene ring 1;

[0060] In the electrodeposition solution in the first electrodeposition process, the concentration of ammonium sulfate is 0.2 mol / L, the concentration of H2SO4 is 0.005 mol / L, 241 The activity of Am is (0.1~10 4 ) Bq; the electrodeposition parameters in the first electrodeposition process are: voltage of 12V, current density of 0.15A / cm 2 , the electrodeposition time is 60 min;

[0061] (2) There are three types of nuclides to be deposited:

[0062] (a) controlling the rotation of two sector-shaped polytetrafluoroethylene sheets 2 of the hollow polytetrafluoroethylene sheet so that the two sector-shaped polytetrafluoroethylene sheets 2 shield a first target area where Am241 nuclides have been deposited and a third target area where Pu239 nuclides have not been deposited, and forming Pu239 nuclides in the exposed second target area through a second electrodeposition process;

[0063] In the electrodeposition solution in the second electrodeposition process, the concentration of ammonium chloride is 0.2 mol / L, the concentration of HCl is 0.01 mol / L, 239 The activity of Pu is (0.1~10 4 )Bq; the electrodeposition parameters in the second electrodeposition process are: voltage of 9V, current density of 0.15 A / cm 2 , the electrodeposition time is 45 min;

[0064] (b) controlling the rotation of the two sector-shaped polytetrafluoroethylene sheets 2 of the hollow polytetrafluoroethylene sheet so that the two sector-shaped polytetrafluoroethylene sheets 2 shield the first target area where the Am241 nuclide has been deposited and the second target area where the Pu239 nuclide has been deposited, and forming the Cm244 nuclide in the exposed third target area through a third electrodeposition process, thereby completing the electrodeposition of all nuclides;

[0065] In the electrodeposition solution in the third electrodeposition process, the concentration of ammonium nitrate is 0.2 mol / L, the concentration of HNO3 is 0.01 mol / L, 244 The activity of Cm is (0.1~10 4 )Bq.;;

[0066] The electrodeposition parameters in the third electrodeposition process are: voltage of 12 V, current density of 0.11 A / cm 2 , the electrodeposition time is 90min.

[0067] Example 2

[0068] This embodiment provides a partitioned deposition method for a multi-nuclide electrodeposition source, the partitioned deposition method comprising:

[0069] (1) Dividing the cathode surface into five target deposition areas 3, shielding the four target deposition areas 3 with a circular sheet 4 and three circular rings 5 ​​in a shielding member, and forming Pu239 nuclides in the first target area that is not shielded by a first electrodeposition process;

[0070] The shielding member includes a circular piece 4 and four concentric rings 5, wherein the circular piece 4 and all the rings 5 ​​are spliced ​​together to form a complete shielding member. Figure 2 The circular sheet shielding member shown; the circular sheet shielding member after removing part of the ring 5 to expose part of the target deposition area 3 is shown in FIG. Figure 3 As shown;

[0071] In the electrodeposition solution in the first electrodeposition process, the concentration of ammonium chloride is 0.2 mol / L, the concentration of HCl is 0.01 mol / L, 239 The activity of Pu is (0.1~10 4 )Bq;;

[0072] The electrodeposition parameters in the first electrodeposition process are: voltage of 9V, current density of 0.15A / cm 2 , the electrodeposition time is 45 min;

[0073] (2) There are five nuclides to be deposited:

[0074] (a) shielding the first target area where Pu239 nuclide has been deposited and three of the undeposited target areas with the circular piece 4 and three rings 5 ​​in the shielding member, and performing a second electrodeposition process on the exposed second target area where Cm244 nuclide has been deposited;

[0075] In the electrodeposition solution in the second electrodeposition process, the concentration of ammonium nitrate is 0.2 mol / L, the concentration of HNO3 is 0.01 mol / L, 244 The activity of Cm is (0.1~10 4)Bq;

[0076] The electrodeposition parameters in the second electrodeposition process are: voltage of 12 V, current density of 0.11 A / cm 2 , the electrodeposition time is 90 min;

[0077] (b) shielding the first target area where the Pu238 nuclide has been deposited, the second target area where the Cm244 nuclide has been deposited, and two of the undeposited target areas with the circular piece 4 and three rings 5 ​​in the shielding member, and performing a third electrodeposition process on the exposed third target area;

[0078] In the electrodeposition solution in the third electrodeposition process: the concentration of sodium bisulfate is 0.05 mol / L, 232 The activity of Th is (0.1~10 3 )Bq;

[0079] The electrodeposition parameters in the third electrodeposition process are: voltage of 8V, current density of 0.11A / cm 2 , the electrodeposition time is 180 min;

[0080] (c) shielding the first target area where the Pu238 nuclide has been deposited, the second target area where the Cm244 nuclide has been deposited, the third target area where the Th232 nuclide has been deposited, and one of the target areas where no nuclide has been deposited, using the circular piece 4 and the three rings 5 ​​in the shielding member, and performing the fourth electrodeposition process on the exposed fourth target area where the Ra226 nuclide has been deposited;

[0081] The electrodeposition solution in the fourth electrodeposition process is as follows: the concentration of ammonium sulfate is 0.2 mol / L, the concentration of HCl is 0.02 mol / L, and the concentration of sodium chloroplatinate is 0.05 mg / g. 226 The activity of Ra is (0.1~10 3 )Bq;

[0082] The electrodeposition parameters in the fourth electrodeposition process are: electrode voltage of 13.5 V, current density of 0.11 A / cm 2 , the electrodeposition time is 300min;

[0083] (d) shielding the first target area where the Pu238 nuclide has been deposited, the second target area where the Cm244 nuclide has been deposited, the third target area where the Th232 nuclide has been deposited, and the fourth target area where the Ra226 nuclide has been deposited using the four rings 5 ​​in the shielding member, and performing the fifth electrodeposition process on the exposed fifth target area where the Po210 nuclide has been deposited;

[0084] The electrodeposition solution in the fifth electrodeposition process is as follows: the concentration of ammonium sulfate is 0.2 mol / L, the concentration of H2SO4l is 0.01 mol / L, and the concentration of ascorbic acid is 0.05 mol / L. 210 The activity of Po is (0.1~10 4 )Bq;

[0085] The electrodeposition parameters in the fifth electrodeposition process are: electrode voltage 5V, current density 0.11A / cm 2 , the electrodeposition time is 45min.

[0086] The resolution of the nuclides deposited on the cathode surface in the above embodiment was tested by using an α spectrometer with a PIPS detector and an area of ​​600 mm 2 , placed 14mm away from the detector surface;

[0087] The test results show that the resolution of 5485.6keV of Am241 nuclide in Example 1 is 15keV, the resolution of 5156.6keV of Pu239 nuclide is 16keV, and the resolution of 5804keV of Cm244 nuclide is 17keV;

[0088] The test results show that the resolution of 5156.keV of Pu239 nuclide in Example 2 is 15.keV, the resolution of 5804.keV of Cm244 nuclide is 17.keV; the resolution of 4012.keV of Th232 nuclide is 16.keV; the resolution of 4783.keV of Ra226 nuclide is 15.keV; and the resolution of 5304.keV of Po210 nuclide is 14.keV.

[0089] The content of radionuclides in the electrodeposition waste liquids produced in the above embodiments and comparative examples was tested using a liquid scintillation counter;

[0090] The test results show that the content of radionuclides in Example 1 is less than 0.2 Bq / mL;

[0091] The test results show that the content of radionuclides in Example 2 is less than 0.2 Bq / mL;

[0092] It can be seen from Examples 1 and 2 that in the partitioned deposition method of the multi-nuclide electrodeposition source provided by the present invention, the partitioned electrodeposition technology is used. When the first nuclide is formed by electrodeposition in the first target area, the remaining target deposition areas 3 are all shielded by the shielding member; when other nuclides are subsequently deposited in the remaining target areas, the target area where the nuclides have been deposited and the target area where more nuclides need to be deposited are all shielded by the shielding member; when different nuclides are deposited in different target areas, they do not interfere with each other, and each nuclide can independently complete an electrodeposition process, which can achieve quantitative deposition without affecting the resolution. At the same time, the radioactive nuclides in the generated electrodeposition waste liquid are largely The amount of electrodeposition is reduced; the partitioned deposition method provided by the present invention can combine the types of electrodeposited nuclides with great freedom, and can realize the deposition of two or more of Am241, Pu239, Pu242, Pu238, Cm244, Th232, Th228, Ra226, Po210, U238, U234, U235, U232, U233 or Np237 on the same deposition sheet; the partitioned deposition method provided by the present invention can also make different nuclides have different deposition areas according to the different specific activities of the nuclides (for example, the area with high specific activity is small, and the area with low specific activity is large).

[0093] The above description is only a specific embodiment of the present invention, but the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any changes or substitutions that can be easily thought of by those skilled in the art within the technical scope disclosed by the present invention fall within the protection scope and disclosure scope of the present invention.

Claims

1. A partitioned deposition method for a multi-nuclide electrodeposition source, characterized in that: The partitioned deposition method comprises: (1) dividing the cathode surface into at least two target deposition areas, shielding at least one target deposition area with a shielding member, and forming a first nuclide by electrodeposition in the first target area that is not shielded; (2) when there are two nuclides to be deposited, shielding the first target area with a shielding member and then electrodepositing the second nuclide in the remaining second target area; or When there are two or more nuclides to be deposited: (a) shielding at least one of a first target region where the first nuclear species has been deposited and a target region where the first nuclear species has not been deposited with a shielding member, and electrodepositing a second nuclear species in the exposed second target region; (b) Repeat step (a) to sequentially electrodeposit corresponding nuclides in the third to Nth target areas until electrodeposition of all nuclides is completed in all target areas.

2. The partitioned deposition method according to claim 1, characterized in that: The deposition process of each nuclide in the partitioned deposition method is different.

3. The partitioned deposition method according to claim 1 or 2, characterized in that: The shielding member in the partitioned deposition method is a hollow polytetrafluoroethylene sheet; The hollow polytetrafluoroethylene sheet includes a polytetrafluoroethylene ring and at least one sector-shaped polytetrafluoroethylene sheet arranged in the polytetrafluoroethylene ring.

4. The partitioned deposition method according to claim 3, characterized in that: Two sector-shaped polytetrafluoroethylene sheets are arranged in the polytetrafluoroethylene ring.

5. The partitioned deposition method according to claim 4, characterized in that: The partitioned deposition method comprises: (1) dividing the cathode surface into at least three target deposition areas, shielding at least two of the target deposition areas with two sector-shaped polytetrafluoroethylene sheets of a hollow polytetrafluoroethylene sheet, leaving only one unshielded first target area, and forming a first nuclide in the unshielded first target area through a first electrodeposition process; (2) There are two or more nuclides to be deposited: (a) controlling the rotation of two sector-shaped polytetrafluoroethylene sheets of the hollow polytetrafluoroethylene sheet so that the two sector-shaped polytetrafluoroethylene sheets shield at least one of a first target area where the first nuclide has been deposited and a target area where the first nuclide has not been deposited, and forming a second nuclide in the exposed second target area through a second electrodeposition process; (b) Repeating step (a) to deposit corresponding nuclides in the third to Nth target areas by different electrodeposition processes, until electrodeposition of all nuclides is completed in all target areas.

6. The partitioned deposition method according to claim 4, characterized in that: The partitioned deposition method comprises: (1) dividing the cathode surface into three target deposition areas, shielding two target deposition areas with two sector-shaped polytetrafluoroethylene sheets of a hollow polytetrafluoroethylene sheet, leaving only one unshielded first target area, and forming a first nuclide in the unshielded first target area through a first electrodeposition process; (2) There are three types of nuclides to be deposited: (a) controlling the rotation of two fan-shaped polytetrafluoroethylene sheets of the hollow polytetrafluoroethylene sheet so that the two fan-shaped polytetrafluoroethylene sheets shield a first target area where the first nuclide has been deposited and a third target area where the first nuclide has not been deposited, and forming a second nuclide in the exposed second target area through a second electrodeposition process; (b) controlling the rotation of the two fan-shaped polytetrafluoroethylene sheets of the hollow polytetrafluoroethylene sheet so that the two fan-shaped polytetrafluoroethylene sheets shield a first target area where the first nuclide has been deposited and a second target area where the second nuclide has been deposited, forming a third nuclide in the exposed third target area through a third electrodeposition process, and completing the electrodeposition of all nuclides.

7. The partitioned deposition method according to claim 1 or 2, characterized in that: The shielding member in the partitioned deposition method includes a circular sheet and at least two concentric circular rings. The circular sheet and all the circular rings are spliced ​​together to form a complete circular sheet-shaped shielding member.

8. The partitioned deposition method according to claim 7, characterized in that: The partitioned deposition method comprises: (1) dividing the cathode surface into at least three target deposition areas, shielding at least two of the target deposition areas with circular pieces and / or at least one circular ring in a shielding member, and forming a first species in a first target area that is not shielded by a first electrodeposition process; (2) When there are two or more nuclides to be deposited: (a) shielding at least one of a first target area where the first species has been deposited and a target area where the first species has not been deposited using a circular sheet and / or at least one circular ring in a shielding member, and performing a second electrodeposition process on the exposed second target area; (b) Repeating step (a) to sequentially electrodeposit corresponding nuclides in the third to Nth target areas until electrodeposition of all nuclides is completed in all target areas by different electrodeposition processes.

9. The partitioned deposition method according to claim 7, characterized in that: The shielding member in the partitioned deposition method includes a circular sheet and four concentric circular rings, wherein the circular sheet and all the circular rings are spliced ​​together to form a complete circular sheet-shaped shielding member; The partitioned deposition method comprises: (1) dividing the cathode surface into five target deposition areas, shielding the four target deposition areas with a circular sheet and three circular rings in a shielding member, and forming a first species in a first target area that is not shielded by a first electrodeposition process; (2) There are five nuclides to be deposited: (a) shielding a first target area where the first species has been deposited and three of the target areas where the first species has not been deposited using a circular sheet and three circular rings in a shielding member, and performing a second electrodeposition process on the exposed second target area; (b) shielding a first target area on which the first nuclear species has been deposited, a second target area on which the second nuclear species has been deposited, and two of the target areas on which no nuclear species has been deposited, using a circular sheet and three circular rings in the shielding member, and performing a third electrodeposition process on the exposed third target area; (c) shielding a first target area on which the first nuclear species has been deposited, a second target area on which the second nuclear species has been deposited, a third target area on which the third nuclear species has been deposited, and one of the target areas on which no nuclear species has been deposited, using the circular sheet and the three rings in the shielding member, and depositing a fourth nuclear species through a fourth electrodeposition process in the exposed fourth target area; (d) Using the four circular rings in the shielding member to shield the first target area where the first nuclear element has been deposited, the second target area where the second nuclear element has been deposited, the third target area where the third nuclear element has been deposited, and the fourth target area where the fourth nuclear element has been deposited, the exposed fifth target area is subjected to a fifth electrodeposition process for the fifth nuclear element.

10. A multi-nuclide electrodeposition source, characterized in that: The multi-nuclide electrodeposition source is obtained by the partitioned deposition method according to any one of claims 1 to 9.

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