Display substrate and display device
By setting a multi-layer insulating layer structure in the OLED display substrate and adjusting the relative position and thickness of the electrodes and the insulating layer, the balance problem between white light color deviation and brightness attenuation is solved, and the display effect and white light viewing angle characteristics are improved.
Patent Information
- Application Number
- CN202510902251.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2021-03-31
- Publication Date
- 2025-09-23
AI Technical Summary
In the display effects of multiple sub-pixels in existing OLED display substrates, it is difficult to achieve a balance between white light color shift and brightness attenuation, which affects the display effect.
By setting a multi-layer insulating layer structure in the display substrate, including a first insulating layer, a second insulating layer and a third insulating layer, adjusting the relative position and thickness of the electrode and the insulating layer to optimize the transmission path of light, ensuring that the distance between the electrode in the island area and the base substrate is greater than that in the effective light-emitting area, thereby adjusting the emission angle and distribution of light.
The brightness attenuation of multiple sub-pixels and the balance of white light color deviation are achieved, the white light viewing angle characteristics are improved, and the display effect is enhanced.
Smart Images

Figure CN120693026A_ABST
Abstract
Description
[0001] This application is a divisional application of the invention patent application filed on March 31, 2021, with the invention name "Display Substrate and Display Device" and application number "202110348040.5". Technical Field
[0002] Embodiments of the present disclosure relate to a display substrate and a display device. Background Art
[0003] With the rapid development and application of OLED (Organic Light-emitting Diode) display technology, in recent years, the market demand for the display effect of OLED display products has become increasingly higher, prompting the pixel arrangement and light-emitting element structure of OLED display products to become more and more diversified. Summary of the Invention
[0004] At least one embodiment of the present disclosure provides a display substrate, which includes a base substrate and an insulating layer. The base substrate includes a display area, wherein the display area includes a plurality of pixel units arranged in multiple rows and columns, each of the pixel units includes a plurality of sub-pixels, each of the sub-pixels includes a light-emitting element and a sub-pixel driving circuit, the light-emitting element includes a first electrode, a second electrode and a light-emitting layer, the first electrode is located on the base substrate, the second electrode is located on a side of the first electrode away from the base substrate, the light-emitting layer is located between the first electrode and the second electrode, and a first insulating layer is located between the first electrode and the light-emitting layer, wherein the first insulating layer includes a plurality of first openings, the plurality of first openings are arranged in a one-to-one correspondence with the plurality of sub-pixels, and the first openings are configured to expose the first electrode. The first insulating layer includes a first insulating pattern, and a second insulating pattern is arranged on a side of the first electrode close to the substrate. The second insulating pattern, the first electrode, the first insulating pattern, the light-emitting layer and the second electrode are sequentially arranged in a direction away from the substrate in each island. The distance between the first electrode in the island and the surface of the substrate in a direction perpendicular to the surface of the substrate is greater than the distance between the first electrode in the effective light-emitting area and the surface of the substrate in a direction perpendicular to the surface of the substrate.
[0005] For example, the display substrate provided by at least one embodiment of the present disclosure also includes: a second insulating layer, wherein the second insulating layer is arranged on the side of the first electrode close to the base substrate, the orthographic projection of the first insulating pattern on the board surface of the base substrate and the orthographic projection of the second insulating pattern on the board surface of the base substrate at least partially overlap, the first insulating layer and the first insulating pattern are arranged in the same layer and material, and the second insulating layer and the second insulating pattern are arranged in the same layer and material.
[0006] For example, in the display substrate provided in at least one embodiment of the present disclosure, the second insulating layer has a second opening corresponding to the effective light-emitting area, and the second opening is formed between the edge of the second insulating layer surrounding the effective light-emitting area and the edge of the second insulating pattern, and the thickness of the second insulating layer in the area where the bottom of the second opening is located along the direction perpendicular to the board surface of the base substrate is 0, or greater than 0 and less than the thickness of the second insulating pattern along the direction perpendicular to the board surface of the base substrate.
[0007] For example, the display substrate provided by at least one embodiment of the present disclosure also includes: a third insulating layer, the third insulating layer is located on the side of the second insulating layer close to the base substrate, the third insulating layer has a third insulating pattern located in the island area, and the distance between the third insulating pattern and the board surface of the base substrate along the direction perpendicular to the board surface of the base substrate is greater than the distance between the part of the third insulating layer located in the effective light-emitting area and the board surface of the base substrate along the direction perpendicular to the board surface of the base substrate.
[0008] For example, in the display substrate provided in at least one embodiment of the present disclosure, the thickness of the portion of the third insulating layer located in the effective light-emitting area in the direction perpendicular to the board surface of the base substrate is less than the thickness of the portion of the third insulating layer surrounding the effective light-emitting area in the direction perpendicular to the board surface of the base substrate.
[0009] For example, in the display substrate provided in at least one embodiment of the present disclosure, the second insulating pattern has a side surface located at its edge, and the tangent of the side surface intersects with the plane where the board surface of the base substrate is located, and the intersection angle is a first angle α1. The first electrode has a first sub-portion covering the second insulating pattern, and the tangent of the side surface at the edge of the first sub-portion intersects with the plane where the board surface of the base substrate is located, and the intersection angle is a second angle α2. The second angle α2 is approximately the same as the first angle α1, and the value range of the first angle α1 is 15 degrees to 70 degrees.
[0010] For example, in the display substrate provided in at least one embodiment of the present disclosure, the first insulating pattern includes at least one insulating pattern sub-portion separated from each other, the second insulating pattern includes at least one convex portion, the at least one insulating pattern sub-portion respectively covers at least part of the at least one convex portion, and the orthographic projection of the at least one convex portion on the board surface of the base substrate and the orthographic projection of the at least one insulating pattern sub-portion on the board surface of the base substrate both overlap with the orthographic projection of the first sub-portion on the board surface of the base substrate.
[0011] For example, in the display substrate provided in at least one embodiment of the present disclosure, the orthographic projection of the at least one convex portion on the board surface of the base substrate is located within the range of the orthographic projection of the at least one insulating pattern sub-portion on the board surface of the base substrate, and in the circumferential direction of the orthographic projection of the at least one convex portion on the board surface of the base substrate, the distance between the edge of the orthographic projection of the at least one insulating pattern sub-portion on the board surface of the base substrate and the edge of the at least one convex portion is approximately equal.
[0012] For example, in the display substrate provided in at least one embodiment of the present disclosure, in a direction perpendicular to the surface of the base substrate, the maximum thickness of the at least one protrusion is H1, and the maximum thickness of the portion of the second insulating layer surrounding the effective light-emitting area is H2, wherein H1<H2.
[0013] For example, in the display substrate provided in at least one embodiment of the present disclosure, the maximum thickness H1 of the at least one protrusion ranges from 0.5 micrometers to 3 micrometers.
[0014] For example, in the display substrate provided in at least one embodiment of the present disclosure, the multiple sub-pixels of the pixel unit are arranged along a row direction, and in the row direction, the maximum size of the at least one convex portion is greater than or equal to H1 / tan(α1).
[0015] For example, in the display substrate provided in at least one embodiment of the present disclosure, the distance between the edge of the orthographic projection of the at least one convex portion on the surface of the base substrate in the row direction and the edge of the corresponding effective light-emitting area in the row direction is approximately equal.
[0016] For example, in the display substrate provided by at least one embodiment of the present disclosure, the multiple sub-pixels of each of the pixel units include a first sub-pixel, a second sub-pixel and at least one third sub-pixel, the second insulating pattern includes a first convex portion located in the first sub-pixel, the first insulating pattern includes a first insulating pattern sub-portion covering the first convex portion, the effective light-emitting area of the first sub-pixel surrounds the first insulating pattern sub-portion along the circumference of the first insulating pattern sub-portion, and the shape of the positive projection contour of the first convex portion on the substrate is substantially the same as the shape of the positive projection contour of the edge of the effective light-emitting area of the first sub-pixel away from the first convex portion on the board surface of the substrate.
[0017] For example, in the display substrate provided in at least one embodiment of the present disclosure, the maximum dimensions of the effective light-emitting area of the first sub-pixel and the first convex portion along the column direction are respectively greater than their maximum dimensions along the row direction, and the distance between the edge of the orthographic projection of the first convex portion on the base substrate in the column direction and the edge of the corresponding effective light-emitting area in the column direction is approximately equal.
[0018] For example, in the display substrate provided in at least one embodiment of the present disclosure, the second insulating pattern also includes a plurality of second protrusions located in the second sub-pixel, the maximum dimension of the effective light-emitting area of the second sub-pixel along the column direction is greater than its maximum dimension along the row direction, the plurality of second protrusions are arranged at intervals along the column direction, the first insulating pattern also includes second insulating pattern sub-portions respectively covering the plurality of second protrusions, the effective light-emitting area of the second sub-pixel respectively surrounds the second insulating pattern sub-portion along the circumference of the second insulating pattern sub-portion, and the effective light-emitting area includes a portion located between the plurality of second protrusions.
[0019] For example, in the display substrate provided in at least one embodiment of the present disclosure, the at least one third sub-pixel includes two third sub-pixels spaced apart in the column direction, the second insulating pattern also includes a third convex portion located in each of the third sub-pixels, the first insulating pattern also includes a third insulating pattern sub-portion respectively covering the third convex portions, the effective light-emitting area of the third sub-pixel surrounds a portion of the edge of the third convex portion, the effective light-emitting area of the third sub-pixel has a notch, and the orthographic projection of the notch on the board surface of the base substrate at least partially overlaps with the orthographic projection of the third convex portion on the board surface of the base substrate.
[0020] For example, in the display substrate provided in at least one embodiment of the present disclosure, the third protrusions in the two third sub-pixels are connected to and integrally arranged with the second insulating layer in the spacing area between the two third sub-pixels, and the third insulating pattern sub-portion is connected to and integrally arranged with the first insulating layer in the spacing area between the two third sub-pixels.
[0021] For example, in the display substrate provided in at least one embodiment of the present disclosure, the notches of the effective light-emitting areas of the two third sub-pixels are respectively arranged at adjacent edges of the two third sub-pixels, and the two notches are roughly symmetrical about a straight line extending along the row direction.
[0022] For example, in the display substrate provided in at least one embodiment of the present disclosure, the first sub-pixel is a red sub-pixel, the second sub-pixel is a blue sub-pixel, and the third sub-pixel is a green sub-pixel. At least one island region is provided in the first sub-pixel, and no island region is provided in the second sub-pixel and the third sub-pixel.
[0023] For example, in the display substrate provided in at least one embodiment of the present disclosure, the portion of the second insulating layer surrounding the edge of the effective light-emitting area has a side surface, and the tangent line of the side surface intersects with the plane where the plate surface of the base substrate is located, and the intersection angle is a third angle α3.
[0024] For example, in the display substrate provided in at least one embodiment of the present disclosure, the first electrode further has a second sub-portion covering the side surface of the second insulating layer, and the tangent of the second sub-portion intersects with the plane where the plate surface of the base substrate is located, and the intersection angle is a fourth angle α4, and the third angle α3 is approximately the same as the fourth angle α4, and the value range of the third angle α3 is 40 degrees to 60 degrees.
[0025] For example, in the display substrate provided in at least one embodiment of the present disclosure, each of the sub-pixels further includes a transfer electrode, which is connected to the sub-pixel driving circuit through a first via hole in the third insulating layer, and is connected to the first electrode through a second via hole in the second insulating layer, and the transfer electrode includes a transparent conductive oxide material.
[0026] For example, the display substrate provided in at least one embodiment of the present disclosure further includes a buffer layer, which is disposed between the second insulating layer and the third insulating layer, and a material of the buffer layer includes silicon oxide or silicon nitride.
[0027] At least one embodiment of the present disclosure provides a display device, comprising any one of the display substrates described above. BRIEF DESCRIPTION OF THE DRAWINGS
[0028] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced below. Obviously, the drawings in the following description only relate to some embodiments of the present disclosure, rather than limiting the present disclosure.
[0029] Figure 1 A schematic diagram of the optical path of light emitted by a light-emitting layer of a display substrate;
[0030] Figure 2 A schematic diagram of a display substrate provided in at least one embodiment of the present disclosure;
[0031] Figure 3 A schematic planar layout diagram of a partial structure of a pixel unit provided by at least one embodiment of the present disclosure;
[0032] Figure 4A A schematic planar layout diagram of a partial structure of a sub-pixel provided for at least one example of the present disclosure;
[0033] Figure 4B A schematic planar layout diagram of a partial structure of another sub-pixel provided for at least one example of the present disclosure;
[0034] Figure 4C A schematic planar layout diagram of a partial structure of another sub-pixel provided for at least one example of the present disclosure;
[0035] Figure 5 For the Figure 3 Cross-section along the midline A1-A2;
[0036] Figure 6 For the Figure 3 Cross-section along the midline A3-A4;
[0037] Figure 7 For the Figure 3 Cross-section along the midline A5-A6;
[0038] Figure 8A A plan view of a first conductive layer provided for at least one embodiment of the present disclosure;
[0039] Figure 8B A plan view of a third insulating layer provided for at least one embodiment of the present disclosure;
[0040] Figure 8C A plan view of a second conductive layer provided for at least one embodiment of the present disclosure;
[0041] Figure 8D A plan view of a second insulating layer provided in at least one embodiment of the present disclosure;
[0042] Figure 8E A plan view of a first electrode layer provided for at least one embodiment of the present disclosure;
[0043] Figure 8F A plan view of a first insulating layer provided for at least one embodiment of the present disclosure;
[0044] Figure 9A A graph showing how the color shift of white light from a display substrate varies with viewing angle, provided in at least one embodiment of the present disclosure;
[0045] Figure 9B A graph showing the attenuation of white light brightness of a display substrate as a function of viewing angle provided by at least one embodiment of the present disclosure; and
[0046] Figure 10 A schematic diagram of a display device provided in accordance with at least one embodiment of the present disclosure. DETAILED DESCRIPTION
[0047] To make the purpose, technical solutions, and advantages of the embodiments of the present disclosure more clear, the technical solutions of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.
[0048] Unless otherwise defined, the technical or scientific terms used in the present disclosure shall have the usual meanings understood by persons of ordinary skill in the field to which the present disclosure belongs. The “first”, “second” and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, similar words such as “one”, “an” or “the” do not indicate a quantity limitation, but rather indicate the presence of at least one. Similar words such as “include” or “comprise” mean that the elements or objects preceding the word include the elements or objects listed after the word and their equivalents. For the convenience of description, “upper”, “lower”, “front” and “back” are given in some of the drawings. In the embodiments of the present disclosure, the vertical direction is the direction from top to bottom, the vertical direction is the direction of gravity, the horizontal direction is the direction perpendicular to the vertical direction, and the horizontal direction from right to left is the direction from front to back.
[0049] Figure 1 A schematic diagram of the light path of light emitted by a light-emitting layer of a display substrate.
[0050] like Figure 1As shown, because the refractive index of the material of the display substrate's light-emitting layer is generally approximately 1.8, which is much higher than that of air, only a small portion of the light generated by the light-emitting layer can emit at an angle less than the critical angle θ for total internal reflection. Consequently, only a small portion of the light can be emitted directly from the designated light-emitting surface. The majority of the light undergoes total internal reflection at the interface, for example, traveling through the film in a waveguide mode. Light transmitted in a waveguide mode can suffer losses during transmission or dissipate uncontrollably at untreated film edges (such as waveguide terminals), preventing effective display radiation. Currently, achieving the desired display effect for multiple sub-pixels in a display substrate requires a balance between white light color shift and luminance decay (L-decay) in the light emitted by the multiple pixels.
[0051] At least one embodiment of the present disclosure provides a display substrate, which includes a base substrate and a first insulating layer. The substrate includes a display area, the display area including a plurality of pixel units arranged in a plurality of rows and columns, each pixel unit including a plurality of sub-pixels, each sub-pixel including a light-emitting element and a sub-pixel driving circuit, the light-emitting element including a first electrode, a second electrode, and a light-emitting layer, the first electrode being located on the substrate, the second electrode being located on a side of the first electrode away from the substrate, the light-emitting layer being located between the first electrode and the second electrode, and a first insulating layer being located between the first electrode and the light-emitting layer, the first insulating layer including a plurality of first openings, the plurality of first openings being provided in a one-to-one correspondence with the plurality of sub-pixels, the first openings being configured to expose the first electrode to form an effective light-emitting area of the light-emitting element, at least one effective light-emitting area at least partially surrounding at least one island area, the first insulating layer including a first insulating pattern, a second insulating pattern being provided on a side of the first electrode close to the substrate, the second insulating pattern, the first electrode, the first insulating pattern, the light-emitting layer, and the second electrode being provided in sequence on each island area in a direction away from the substrate, the distance between a portion of the first electrode in the island area and a surface of the substrate in a direction perpendicular to the surface of the substrate is greater than a distance between a portion of the first electrode in the effective light-emitting area and the surface of the substrate in a direction perpendicular to the surface of the substrate.
[0052] At least one embodiment of the present disclosure further provides a display device including the above-mentioned display substrate.
[0053] In the display substrate and display device provided in the above embodiments, the display substrate is configured such that the distance between the portion of the first electrode in the island area and the board surface of the base substrate in a direction perpendicular to the board surface of the base substrate is greater than the distance between the portion of the first electrode in the effective light-emitting area and the board surface of the base substrate in a direction perpendicular to the board surface of the base substrate, thereby making the brightness attenuation and white light color deviation of multiple sub-pixels more balanced, thereby improving the white light viewing angle characteristics on the basis of ensuring the color gamut, and thus meeting product requirements.
[0054] The embodiments of the present disclosure and examples thereof are described in detail below with reference to the accompanying drawings.
[0055] Figure 2 A schematic diagram of a display substrate provided according to at least one embodiment of the present disclosure. Figure 3 A schematic plan layout diagram of a partial structure of a pixel unit provided in at least one embodiment of the present disclosure.
[0056] For example, in some embodiments, Figure 2 and Figure 3 As shown, the display substrate 1 includes a base substrate 100. The base substrate 100 includes a display area 10 and a peripheral area 20 at least partially surrounding the display area 1. The display area 10 includes a plurality of pixel units P1 arranged in multiple rows and columns and a plurality of light-emitting areas L0 ( Figure 3 ). Each pixel unit P1 includes multiple sub-pixels P10, and each sub-pixel P10 includes a light-emitting element and a sub-pixel driving circuit. The light-emitting element includes a first electrode, a second electrode, and a light-emitting layer, and the multiple light-emitting areas L0 correspond one-to-one to the light-emitting elements of the multiple sub-pixels P10. For example, each pixel unit P1 includes a first sub-pixel P11, a second sub-pixel P12, and at least one third sub-pixel P13. For example, take the example of at least one third sub-pixel P13 including a third sub-pixel P131 and a third sub-pixel P132. For example, the light-emitting element of the first sub-pixel P11 corresponds to the light-emitting area L1, the light-emitting source of the second sub-pixel P12 corresponds to the light-emitting area L2, and the light-emitting elements of the third sub-pixel P131 and the third sub-pixel P132 correspond to the light-emitting area L31 and the light-emitting area L32, respectively.
[0057] For example, the base substrate 100 may be a glass plate, a quartz plate, a metal plate, or a resin plate. For example, the base substrate may be made of an organic material, such as a resin material such as polyimide, polycarbonate, polyacrylate, polyetherimide, polyethersulfone, polyethylene terephthalate, and polyethylene naphthalate. For example, the base substrate 100 may be a flexible substrate or a non-flexible substrate, which is not limited in the embodiments of the present disclosure.
[0058] For example, in some embodiments, the first sub-pixel P11 is a red sub-pixel, the second sub-pixel P12 is a blue sub-pixel, and the third sub-pixel P13 is a green sub-pixel. That is, in the embodiments of the present disclosure, the sub-pixel arrangement of the pixel unit is GGRB as an example, but the present disclosure is not limited thereto.
[0059] Figure 4A A schematic planar layout diagram of a partial structure of a sub-pixel provided for at least one example of the present disclosure. Figure 4B A schematic planar layout diagram of a partial structure of another sub-pixel provided for at least one example of the present disclosure. Figure 4CA schematic planar layout diagram of a partial structure of another sub-pixel provided for at least one example of the present disclosure. Figure 5 For the Figure 3 The cross-section of the center line A1-A2 is Figure 2 The center line A1 - A2 extends along the row direction Y and passes through the light emitting area corresponding to the first sub-pixel. Figure 6 For the Figure 3 The cross section of the center line A3-A4, Figure 2 The center line A3 - A4 extends along the column direction X and passes through the light emitting area corresponding to the second sub-pixel. Figure 7 For the Figure 3 The cross section of the center line A5-A6, Figure 2 The center line A5 - A6 extends along the column direction X and passes through the light-emitting area corresponding to the third sub-pixel.
[0060] It should be noted that in the embodiments of the present disclosure, the column direction X is, for example, the row direction, and the row direction Y is, for example, the column direction. For example, the angle between the column direction X and the row direction Y in the present disclosure is between 70° and 90°, inclusive. For example, the angle between the column direction X and the row direction Y is 70°, 90°, or 80°, etc., which can be set according to actual circumstances and is not limited in the embodiments of the present disclosure. For example, the angle between the column direction X and the row direction Y can also be 75°, 85°, etc.
[0061] For example, Figure 5 As shown, the light emitting element 101A of the first sub-pixel P11 includes a first electrode 110, a second electrode 130 and a light emitting layer 120. Figure 6 As shown, the light-emitting element 101B of the second sub-pixel P12 includes a first electrode 110 (e.g., an anode), a second electrode 130 (e.g., a cathode), and a light-emitting layer 120. The first electrode 110 is located on the base substrate 100, the second electrode 130 is located on a side of the first electrode 110 away from the base substrate 100, and the light-emitting layer 120 is located between the first electrode 110 and the second electrode.
[0062] For example, Figure 6 As shown, the light emitting element 101C of the third sub-pixel P131 includes a first electrode 310, a second electrode 130 and a light emitting layer 120. Figure 7 As shown, the light-emitting element 101D of the third subpixel P132 includes a first electrode 410, a second electrode 130, and a light-emitting layer 120. The first electrodes 110, 210, 310, and 410 are located on the first electrode layer AN. The light-emitting layer 120 is located between the first electrode layer AN and the second electrode 130. The first electrode layer AN is located on the side of the light-emitting layer 120 that is closer to the base substrate 100.
[0063] It should be noted that, in the embodiment of the present disclosure, the second electrode 130 and the light-emitting layer 120 are disposed on the entire surface.
[0064] For example, the material of the first electrode layer AN may include at least one transparent conductive oxide material, including indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide (ZnO), and the like. Furthermore, the first electrode layer AN may include a metal with high reflectivity, such as silver (Ag), as a reflective layer. For example, the first electrode layer AN may include a multilayer structure, such as a three-layer stack of indium tin oxide, silver, and indium tin oxide (ITO / Ag / ITO).
[0065] For example, for OLED, the light-emitting layer 120 may include small molecule organic materials or polymer molecule organic materials, may be fluorescent materials or phosphorescent materials, may emit red light, green light, blue light, or may emit white light; and, as needed, the light-emitting layer may further include functional layers such as an electron injection layer, an electron transport layer, a hole injection layer, and a hole transport layer.
[0066] For example, for QLED, the light-emitting layer 120 may include quantum dot materials, such as silicon quantum dots, germanium quantum dots, cadmium sulfide quantum dots, cadmium selenide quantum dots, cadmium telluride quantum dots, zinc selenide quantum dots, lead sulfide quantum dots, lead selenide quantum dots, indium phosphide quantum dots and indium arsenide quantum dots, etc., and the particle size of the quantum dots is 2-20nm.
[0067] For example, the second electrode 130 may include various conductive materials, such as lithium (Li), aluminum (Al), magnesium (Mg), silver (Ag), and the like.
[0068] For example, Figure 3 and Figure 5 As shown, the first insulating layer 104 is located between the first electrode 110 and the light-emitting layer 120. The first insulating layer includes a plurality of first openings. In the first sub-pixel P11, the first insulating layer 104 has a first opening 1041A in the light-emitting area L1. The first opening 1041A is arranged corresponding to the first sub-pixel P11. The first opening 1041A is configured to expose the first electrode 110 to form an effective light-emitting area L11 of the light-emitting element of the first sub-pixel P11. The effective light-emitting area L11 at least partially surrounds at least one island area. For example, Figure 4A As shown, the effective light emitting area L11 surrounds the island area D1.
[0069] Figure 8F A plan view of a first insulating layer provided in accordance with at least one embodiment of the present disclosure. Figure 8D A plan view of a second insulating layer provided in at least one embodiment of the present disclosure.
[0070] For example, in some embodiments, Figure 4A 、 Figure 5 、 Figure 8F as well as Figure 8D As shown, the first insulating layer 104 includes a first insulating pattern 1042, and a second insulating pattern 1030 is provided on a side of the first electrode 110 close to the base substrate 100. Figure 4B The islands D22 and D21 shown as well as Figure 4C In the example of the island regions D31 and D32 shown in FIG. 1 , for example, the second insulating pattern 1030, the first electrode 110, the first insulating pattern 1042, the light-emitting layer 120, and the second electrode 130 are sequentially arranged in the direction away from the base substrate 100 in the island region D1. The distance G1 between the portion of the first electrode 110 in the island region D1 and the surface S of the base substrate 100, along a direction perpendicular to the surface of the base substrate 100, is greater than the distance G2 between the portion of the first electrode 110 in the effective light-emitting area L11 and the surface S of the base substrate 100, along a direction perpendicular to the surface S of the base substrate 100. That is, the portion of the first electrode 110 in the island region D1 is higher than the portion in the effective light-emitting area L11, so that the side surface of the first electrode 110 can participate in the light emission regulation of the effective light-emitting area L11 to achieve a better color gamut and white light color shift.
[0071] For example, the material of the first insulating layer 104 includes inorganic insulating materials such as silicon oxide, silicon nitride, and silicon oxynitride, and may also include organic insulating materials such as polyimide, polyphthalimide, polyphthalamide, acrylic resin, benzocyclobutene, or phenolic resin, but the embodiments of the present disclosure are not limited thereto. For example, in some embodiments, the first insulating layer 104 and the first insulating pattern 1042 are provided in the same layer and with the same material to save manufacturing process steps.
[0072] For example, in some embodiments, Figure 4A and Figure 5 As shown, the display substrate 1 further includes a second insulating layer 103 (e.g., a second planarization layer). The second insulating layer 103 is located on the base substrate 100, and the light-emitting element is located on a side of the second insulating layer 103 away from the base substrate 100. The second insulating layer 103 surrounds the edge of the light-emitting region L0 and is located within at least one light-emitting region L0. For example, the second insulating pattern 1030 includes at least one protrusion, with a second opening formed between the edge of the second insulating layer 103 surrounding the light-emitting region L0 and the edge of the at least one protrusion. The first electrode is located on a side of the second insulating layer away from the base substrate and covers the second opening.
[0073] For example, in some embodiments, the second insulating layer 103 and the second insulating pattern 1030 are provided in the same layer and with the same material to save the manufacturing process. Figure 4A and Figure 5As shown, in the light-emitting area L1 corresponding to the first sub-pixel P11, the second insulating layer 103 has a first convex portion 1031A in the light-emitting area L1, and a second opening 1032A is formed between the edge of the second insulating layer 103 surrounding the light-emitting area L1 and the edge of the first convex portion 1031A, and the first electrode 110 is located on the side of the second insulating layer 103 away from the base substrate 100 and covers the second opening 1032A.
[0074] For example, Figure 4B and Figure 6 As shown, in the light-emitting area L2 corresponding to the second sub-pixel P12, the second insulating layer 103 has two second protrusions 1031B in the light-emitting area L2. A second opening 1032B is formed between the edge of the second insulating layer 103 surrounding the light-emitting area L2 and the edge of the second protrusion 1031B. The first electrode 210 is located on a side of the second insulating layer 103 away from the base substrate 100 and covers the second opening 1032B.
[0075] For example, Figure 4C and Figure 7 As shown, a third convex portion, namely, a third convex portion 1031C and a third convex portion 1031D, is provided in both the light-emitting regions L31 and L32 of the third subpixel P131 and the third subpixel P132. In the light-emitting region L31, a second opening 1032C is formed between the edge of the second insulating layer 103 surrounding the light-emitting region L31 and the edge of the third convex portion 1031C, and the first electrode 310 covers the second opening 1032C. In the light-emitting region L32, a second opening 1032D is formed between the edge of the second insulating layer 103 surrounding the light-emitting region L32 and the edge of the third convex portion 1031D, and the first electrode 410 covers the second opening 1032D.
[0076] It should be noted that in the embodiments of the present disclosure, the number of convex portions in each light-emitting region can be selected based on process requirements, etc., and a light-emitting region can be provided with one convex portion, two convex portions, etc. For example, some light-emitting regions may not be provided with convex portions. The embodiments of the present disclosure are not limited to this.
[0077] For example, the material of the second insulating layer 103 includes inorganic insulating materials such as silicon oxide, silicon nitride, and silicon oxynitride, and may also include organic insulating materials such as polyimide, polyphthalimide, polyphthalamide, acrylic resin, benzocyclobutene, or phenolic resin, which is not limited in the embodiments of the present disclosure.
[0078] For example, in some embodiments, Figure 5As shown, the display substrate 1 further includes a first insulating layer 104 (e.g., a pixel defining layer). The first insulating layer 104 is located on a side of the second insulating layer 103 away from the base substrate 100 and has a first opening in each light-emitting region. The first opening at least partially surrounds at least one protrusion. The first opening is configured to expose at least a portion of the first electrode located within the second opening to form an effective light-emitting region of the light-emitting element. The light-emitting layer is located at least on a side of the exposed first electrode away from the base substrate 100. The second electrode 130 is located on a side of the light-emitting layer 120 away from the base substrate 100.
[0079] For example, in some embodiments, Figure 8F and Figure 8D As shown, for example, the orthographic projection of the first insulating pattern 1042 on the plate surface S of the base substrate 100 at least partially overlaps with the orthographic projection of the second insulating pattern 1030 on the plate surface S of the base substrate 100. For example, the orthographic projection of the first insulating pattern 1042 on the plate surface S of the base substrate 100 at least partially overlaps with the orthographic projection of at least one protrusion on the plate surface S of the base substrate 100. It should be noted that in Figure 8F In the figure, the first insulating layer 104 is inverted, that is, the portion with textured fill in the figure is the portion where the first insulating layer 104 has been removed. The first insulating pattern 1042 of the first insulating layer 1042 at least partially covers at least one protrusion of the second insulating layer 103. A portion of the first insulating layer 102 (i.e., the first insulating pattern) remains in the light-emitting area of each sub-pixel, and the first insulating layer 102 is also provided in the portion outside the light-emitting area. As a result, in the light-emitting area, the light-emitting layer in the area where the first insulating pattern 1042 is provided does not contact the first electrode, and thus does not directly emit light there. By providing the first insulating pattern 1042 and the second insulating pattern 1030 (e.g., at least one protrusion), the light emission of multiple sub-pixels is adjusted to achieve a better color gamut and white light color shift.
[0080] For example, Figure 5 As shown, the first opening 1041A surrounds the first protrusion 1031A and is configured to expose the portion of the first electrode 110 located in the second opening 1032A to form an effective light-emitting region L11 of the light-emitting element 101A. The portion of the light-emitting layer 120 is located on the side of the exposed first electrode 110 away from the base substrate 100, and the second electrode 130 is located on the side of the light-emitting layer 120 away from the base substrate 100. Figure 3 As shown in FIG, the effective light emitting area L11 surrounds the first convex portion 1031A.
[0081] For example, Figure 3 and Figure 6As shown, in the second sub-pixel P12, the first insulating layer 104 has a first opening 1041B in the light-emitting region L2. The first opening 1041B surrounds the two second protrusions 1031B. The first opening 1041B is configured to expose the portion of the first electrode 210 located in the second opening 1032B to form the effective light-emitting region L12 of the light-emitting element 101B. The portion of the light-emitting layer 120 is located on the side of the exposed first electrode 210 away from the base substrate 100, and the second electrode 130 is located on the side of the light-emitting layer 120 away from the base substrate 100. Figure 3 As shown in FIG, two second convex portions 1031B in a polygonal shape are provided in the effective light emitting area L12.
[0082] For example, Figure 3 and Figure 7 As shown, in the third subpixel P131 (taking one of the third subpixels as an example), the first insulating layer 104 has a first opening 1041C in the light-emitting area L31. The first opening 1041C surrounds the edge of the third protrusion 1031C in the light-emitting area L31. The first opening 1041C is configured to expose the portion of the first electrode 310 located in the second opening 1032C to form the effective light-emitting area L131 of the light-emitting element 101C. The portion of the light-emitting layer 120 is located on the side of the exposed first electrode 310 away from the base substrate 100, and the second electrode 130 is located on the side of the light-emitting layer 120 away from the base substrate 100. Figure 3 As shown in FIG, the effective light emitting area L31 is in an arch shape surrounding the edge of the third convex portion 1031C in the light emitting area L31.
[0083] For example, Figure 5 As shown, the thickness of the second insulating layer 103 in the region (effective light-emitting area L11) at the bottom of the second opening, along a direction perpendicular to the substrate surface S of the base substrate 100, is 0. That is, the second opening exposes the film layer beneath the second insulating layer 103. Alternatively, the thickness of the second insulating layer 103 in the region (effective light-emitting area L11) at the bottom of the second opening, along a direction perpendicular to the substrate surface S of the base substrate 100, is greater than 0 and less than the thickness H1 of the second insulating pattern 1030 in the direction perpendicular to the substrate surface S of the base substrate 100. In other words, the second insulating pattern 1030 protrudes beyond the portion of the second insulating layer 103 in the effective light-emitting area L11 in a direction perpendicular to the substrate 100. As a result, the first electrode 110 located on the second insulating layer 103 can adjust the light emission of multiple sub-pixels to achieve a better color gamut and white light color shift.
[0084] Figure 8B A plan view of a third insulating layer provided in at least one embodiment of the present disclosure. Figure 8E A plan view of a first electrode layer provided for at least one embodiment of the present disclosure.
[0085] For example, in some embodiments, Figure 5 and Figure 8B As shown, the display substrate 1 further includes a third insulating layer 105, and the third insulating layer 105 is located on a side of the second insulating layer 103 close to the base substrate 100. For example, in some embodiments, Figure 5 As shown, the third insulating layer includes a third insulating pattern (not shown) located in the island region D1. The distance between the third insulating pattern and the surface S of the base substrate 100, along a direction perpendicular to the surface S of the base substrate 100, is greater than the distance between the portion of the third insulating layer 105 located in the effective light-emitting area L11 and the surface S of the base substrate 100, along a direction perpendicular to the surface S of the base substrate 100. In other words, the third insulating pattern protrudes beyond the portion of the third insulating layer 105 in the effective light-emitting area L11, along a direction perpendicular to the base substrate 100. As a result, the first electrode 110 located above the third insulating layer 105 can adjust the light emission of multiple sub-pixels to achieve a better color gamut and white light color shift.
[0086] For example, in some embodiments, Figure 5 As shown, the thickness of the portion of the third insulating layer 105 located in the effective light-emitting area L11, in a direction perpendicular to the surface S of the base substrate 100, is less than the thickness of the portion of the third insulating layer 105 surrounding the effective light-emitting area L11, in a direction perpendicular to the surface S of the base substrate 100. In other words, the third insulating layer 105 protrudes beyond the portion of the third insulating layer 105 located in the effective light-emitting area L11, in a direction perpendicular to the base substrate 100. As a result, the first electrode 110 located above the third insulating layer 105 can adjust the light emission of multiple sub-pixels to achieve a better color gamut and white light color shift.
[0087] It should be noted that the surface of the third insulating layer 105 away from the base substrate 100 shown in the drawings is a plane, but the surface of the third insulating layer 105 away from the base substrate 100 may also have a protruding portion located in the island area, and the present disclosure is not limited thereto.
[0088] Figure 8D A plan view of the second insulating layer provided in at least one embodiment of the present disclosure. Figure 8D In the figure, the second insulating layer 103 is inverted, that is, the portion filled with texture in the figure is the portion where the second insulating layer 103 is removed.
[0089] For example, in some embodiments, Figure 8DAs shown, the first convex portion 1031A of the first subpixel P11 is shown as an unfilled hexagon. The second convex portion 1031B of the second subpixel P12 is shown as an unfilled pentagon. The third convex portion 1031C of the third subpixel P131 is shown as an unfilled pentagon. The third convex portion 1031D of the third subpixel P132 is shown as an unfilled pentagon. A portion of the second insulating layer 103 (i.e., at least one convex portion) remains in the light-emitting area of each subpixel. The second insulating layer 103 is also provided outside the light-emitting area.
[0090] It should be noted that the embodiment of the present disclosure is not limited to the planar shapes of the first convex portion 1031A, the second convex portion 1031B, the third convex portion 1031C, and the third convex portion 1031D.
[0091] For example, in some embodiments, at least one protrusion has a side surface located at its edge, the second insulating pattern has a side surface located at its edge, the tangent of the side surface intersects with the plane where the board surface of the base substrate is located, and the intersection angle is a first angle α1. The first electrode has a first sub-portion covering the second insulating pattern, and the tangent of the side surface at the edge of the first sub-portion intersects with the plane where the board surface of the base substrate is located, and the intersection angle is a second angle α2. The second angle α2 is approximately the same as the first angle α1, and the value range of the first angle α1 is 15 degrees to 70 degrees.
[0092] The first angle α1 and the second angle α2 are described below by taking the structure of the first sub-pixel P11 as an example.
[0093] For example, Figure 5 As shown, the first protrusion 1031A of the second insulating pattern 1030 has a side surface S1 located at its edge. A tangent line of the side surface S1 intersects the plane of the substrate surface S of the base substrate 100 at a first angle α1. That is, the side surface S1 is inclined relative to the base substrate 100, and the intersection angle is the angle between the side surface S1 and the substrate surface S of the base substrate 100 (for example, an acute angle). The inclined side surface S1 of the first protrusion 1031A can be used to form an island region within the light-emitting area. This island region directs a portion of the light emitted from the effective light-emitting area that enters the first insulating layer 104 away, thereby increasing light efficiency.
[0094] For example, in other embodiments, the first protrusion may also have an inclined side surface at a portion of its edge, but the embodiments of the present disclosure are not limited thereto.
[0095] For example, in some embodiments, Figure 5As shown, the first electrode 110 has a main portion 111A located in the light-emitting area L1. The main portion 111A has a first sub-portion 1111 covering the side surface S1 of the first protrusion 1031A. The first sub-portion 1111 is uniformly disposed on the side surface S1. The first sub-portion 1111 intersects a direction parallel to the surface S1 of the base substrate 100 at a second angle α2. That is, the first sub-portion 1111 is also inclined relative to the base substrate 100, with the intersection angle being the angle between the side surface S1 and the surface S of the base substrate 100 (e.g., an acute angle). The second angle α2 is the same as the first angle α1. The first sub-portion 1111 is a component of the island region in the light-emitting area. The effective light-emitting area L11 emits light, at least part of which will enter the first insulating layer 104 for conduction. Due to the inclined setting of the first sub-portion 1111, this part of the light will be reflected and change its propagation path, so that it will be emitted to the light-emitting surface of the display substrate, thereby increasing the light-emitting efficiency of the first sub-pixel, and at the same time, it is beneficial to achieve a better color gamut and white light color deviation of the display substrate.
[0096] For example, in some embodiments, the first angle α1 has a value range of, for example, approximately 15 degrees to 70 degrees. For example, the first angle α1 has a value of approximately 55 degrees. This allows the display substrate to achieve a good balance in light extraction efficiency, color gamut, and white light color shift, thereby meeting product requirements. It should be noted that the value range or value of the second angle α2 can refer to the first angle α1.
[0097] It should be noted that, in the embodiments of the present disclosure, “about” means that the value may fluctuate within a range of, for example, ±15% or ±5%.
[0098] It should be noted that, in other sub-pixels, for example, Figure 6 The second convex portion 1031B, Figure 7 The side surfaces of the third protrusion 1031C and the third protrusion 1031D can also be made of the same Figure 5 The structure similar to the side surface S1 of the first protrusion 1031A shown in FIG will not be described in detail. Figure 6 The main body 111B of the first electrode 210, Figure 7 The main body 111C of the first electrode 310 and the main body 111D of the first electrode 410 also have a first sub-portion, which covers the side surfaces of the second convex portion 1031B, the third convex portion 1031C and the third convex portion 1031D. The structure of the first sub-portion is the same as that of Figure 5 The structure of the first sub-section 1111 provided in is similar and will not be repeated here.
[0099] For example, in some embodiments, Figure 8F and Figure 8DAs shown, the first insulating pattern 1042 includes at least one insulating pattern sub-portion (e.g., first insulating pattern sub-portion 1043A, second insulating pattern sub-portion 1043B, third insulating pattern sub-portion 1043C, and third insulating pattern sub-portion 1043D) located in each light-emitting region. Each of the at least one insulating pattern sub-portion covers at least a portion of at least one protrusion (e.g., first protrusion 1031A, second protrusion 1031B, first protrusion 1031C, and first protrusion 1031D), and the orthographic projection of at least one protrusion on the surface S of the substrate 100 at least partially overlaps with the orthographic projection of the at least one insulating pattern sub-portion on the surface S of the substrate 100. For example, the insulating pattern sub-portion in the light-emitting region of each sub-pixel at least partially covers the corresponding protrusion. In a direction perpendicular to the surface S of the substrate 100, the first sub-portion of the main portion of the first electrode is located between the at least one insulating pattern sub-portion and the at least one protrusion.
[0100] For example, in some embodiments, the orthographic projection of at least one protrusion on the board surface of the substrate substrate is located within the range of the orthographic projection of at least one insulating pattern sub-portion on the board surface of the substrate substrate, and in the circumferential direction of the orthographic projection of at least one protrusion on the board surface of the substrate substrate, the distance between the edge of the orthographic projection of at least one insulating pattern sub-portion on the board surface of the substrate substrate and the edge of the at least one protrusion is approximately equal.
[0101] For example, Figure 5As shown, in the first subpixel P11, the first insulating pattern 1042 includes a first insulating pattern sub-portion 1043A located in the light-emitting area L1. For example, the first insulating pattern sub-portion 1043A covers the entire first convex portion 1031A. The orthographic projection of the first convex portion 1031A on the surface S of the substrate 100 is located within the orthographic projection of the first insulating pattern sub-portion 1043A on the surface S of the substrate 100. For example, the orthographic projection of the first convex portion 1031A on the surface S of the substrate 100 overlaps with the orthographic projection of the first insulating pattern sub-portion 1043A on the surface S of the substrate 100, that is, the orthographic projection of the first convex portion 1031A is located within the orthographic projection of the first insulating pattern sub-portion 1043A. In a direction perpendicular to the surface S of the substrate 100, the first sub-portion 1111 of the main portion 111A of the first electrode 110 is located between the first insulating pattern sub-portion 1043A and the first convex portion 1031A. For example, the side surface of the first insulating pattern sub-portion 1043A is parallel to the first sub-portion 1111, and the side surface of the first insulating pattern sub-portion 1043A forms a certain angle with the plate surface S of the base substrate 100. For example, the effective light-emitting area L11 of the first sub-pixel P11 surrounds the first insulating pattern sub-portion 1043A along the circumference of the first insulating pattern sub-portion 1043A. For example, the shape of the orthographic projection outline of the first convex portion 1043A on the base substrate 100 is substantially the same as the shape of the orthographic projection outline of the edge of the effective light-emitting area L11 of the first sub-pixel P11 away from the first convex portion 1043A on the plate surface S of the base substrate 100, for example, both are hexagonal.
[0102] refer to Figure 4A and Figure 8F As shown, the maximum dimensions B14 of the effective light-emitting area L11 and the first protrusion 1043A along the column direction of the first subpixel P11 are both greater than their maximum dimensions K21 along the row direction. The distances between the edges of the orthographic projection of the first protrusion 1043A on the substrate 100 in the column direction and the corresponding edges of the effective light-emitting area L11 in the column direction are approximately equal. For example, along the circumference of the first protrusion 1031A, the distances between corresponding points on the edges of the first insulating pattern sub-portion 1043A and the edges of the first protrusion 1031A are equal. In other words, the first insulating pattern sub-portion 1043A uniformly covers the edges of the first protrusion 1031A. As a result, in each light-emitting area, light from the effective light-emitting area that enters the first insulating pattern sub-portion 1043A can be reflected by the first sub-portion 1111 of the main portion 111A and then emitted from the first insulating pattern sub-portion 1043A. This improves the light extraction efficiency of the first subpixel and facilitates achieving a better color gamut and white light color shift for the display substrate.
[0103] For example, Figure 5In the embodiment, the first insulating pattern sub-portion 1043A, the first protrusion 1031A, the portion of the main portion 111A covering the first protrusion 1031A, and the light-emitting layer 120 and the second electrode 130 covering the first insulating pattern sub-portion 1043A collectively form an island region D1 located within the light-emitting region L1. Light is emitted from the side portions of the island region D1, while no light is emitted from the portion parallel to the surface S of the base substrate 100. For example, to achieve better color shift, the sensitivity of light emitted by the first sub-pixel needs to be reduced. For example, if the first sub-pixel is a red sub-pixel, to reduce red light sensitivity, an island region D1 can be provided within the light-emitting region L1 of the first sub-pixel. For example, the larger the perimeter of the island region D1, the greater the effect of reducing red light sensitivity. The size and number of island regions D1 can be designed according to product requirements.
[0104] For example, in other examples, the number of the island regions D1 in the first sub-pixel may also be two, three, etc., and the embodiment of the present disclosure is not limited thereto.
[0105] For example, in some embodiments, the distance between the edge of the orthographic projection of at least one convex portion on the surface of the base substrate in the row direction and the edge of the corresponding effective light-emitting area in the row direction is substantially equal.
[0106] For example, Figure 6 As shown, in the first subpixel P12, the first insulating pattern 1042 includes multiple second insulating pattern sub-portions 1043B located in the light-emitting area L1. For example, the multiple second insulating pattern sub-portions 1043B may also cover the entirety of the two second protrusions 1031B. For example, the orthographic projection of the second protrusion 1031B on the surface S of the substrate 100 overlaps with the orthographic projection of the corresponding second insulating pattern sub-portion 1043B on the surface S of the substrate 100. In other words, the orthographic projection of the second protrusion 1031B is located within the orthographic projection of the second insulating pattern sub-portion 1043B. In a direction perpendicular to the surface S of the substrate 100, the first sub-portion of the main portion 111B of the first electrode 210 is located between the second insulating pattern sub-portion 1043B and the second protrusion 1031B.
[0107] For example, in some embodiments, Figure 6 and Figure 8D As shown, the maximum dimension B15 of the effective light-emitting area L12 of the second sub-pixel P12 along the column direction is greater than its maximum dimension K12 along the row direction, and the two second protrusions 1031B are arranged at intervals along the column direction. For example, the side surface of the second insulation pattern sub-portion 1043B is an inclined surface, and the side surface of the second insulation pattern sub-portion 1043B forms a certain angle with the plate surface S of the base substrate 100. For example, the side surface of the second insulation pattern sub-portion 1043B can be parallel to the side surface of the protrusion of the second protrusion 1031B, or it can be non-parallel, and the undisclosed embodiments are not limited to this. Figure 4B As shown, along the circumference of the second convex portion 1031B, the distances between the edges of the second insulating pattern sub-portion 1043B and the corresponding edges of the second convex portion 1031B are equal. In other words, the second insulating pattern sub-portion 1043B evenly covers the edges of the second convex portion 1031B. As a result, in each light-emitting zone, light from the effective light-emitting zone that enters the second insulating pattern sub-portion 1043B can be reflected by the main portion 111B and emitted from the first insulating pattern sub-portion 1043B. This improves the light extraction efficiency of the second sub-pixel and helps achieve a better color gamut and white light color shift for the display substrate.
[0108] For example, in some embodiments, the first insulating pattern also includes a second insulating pattern sub-portion that respectively covers the multiple second protrusions, and the effective light-emitting area of the second sub-pixel surrounds the second insulating pattern sub-portion along the circumference of the second insulating pattern sub-portion, and the effective light-emitting area includes a portion located between the multiple second protrusions.
[0109] For example, Figure 6 In the embodiment of the present invention, the second insulating pattern sub-portion 1043B, the second protrusion 1031B, the portion of the main portion 111B covering the second protrusion 1031B, the light-emitting layer 120 covering the second insulating pattern sub-portion 1043B, and the second electrode 130 collectively form islands D21 and D22 located within the light-emitting area L2. Specifically, two spaced islands D21 and D22 are provided within the light-emitting area L2. Light is emitted from the side portions of the islands D21 and D22, while no light is emitted from the portions parallel to the surface S of the base substrate 100. For example, if the sensitivity of light emitted by the second sub-pixel needs to be reduced to achieve better color shift, for example, if the second sub-pixel is a blue sub-pixel, the perimeters of the islands D21 and D22 within the light-emitting area L2 of the second sub-pixel may be increased to reduce the sensitivity to blue light.
[0110] For example, in other examples, the number of the island area D21 and the island area D22 in the second sub-pixel can also be set to 1, etc., and the embodiments of the present disclosure are not limited thereto. Figure 7As shown, taking the third subpixel P131 as an example, in the third subpixel P131, the first insulating pattern 1042 includes a third insulating pattern sub-portion 1043C located in the light-emitting area L31. For example, the third insulating pattern sub-portion 1043C may also cover the entire edge of the third protrusion 1031C in the light-emitting area L31. For example, the orthographic projection of the third protrusion 1031C on the surface S of the substrate 100 overlaps with the orthographic projection of the third insulating pattern sub-portion 1043C on the surface S of the substrate 100. In a direction perpendicular to the surface S of the substrate 100, the main portion 111C of the first electrode 310 is located between the third insulating pattern sub-portion 1043C and the second protrusion 1031C. For example, the side surface of the third insulating pattern sub-portion 1043C is an inclined surface, forming a certain angle with the surface S of the substrate 100. For example, the side surface of the third insulation pattern sub-portion 1043C may be parallel to the side surface of the convex portion of the second convex portion 1031C, or may not be parallel to the side surface of the convex portion of the second convex portion 1031C. The embodiments not disclosed are not limited thereto. Figure 4C As shown, along the circumference of the third protrusion 1031C, the distances between corresponding points on the edge of the third insulating pattern sub-portion 1043C and the edge of the third protrusion 1031C are equal. In other words, the third insulating pattern sub-portion 1043C evenly covers the edge of the third protrusion 1031C. As a result, in each light-emitting zone, light from the effective light-emitting zone that enters the second insulating pattern sub-portion 1043B can be reflected by the main portion 111C and emitted from the third insulating pattern sub-portion 1043C. This improves the light extraction efficiency of the third sub-pixel and helps achieve a better color gamut and white light color shift for the display substrate.
[0111] For example, Figure 7 As shown, the third insulating pattern sub-portion 1043C, the third protrusion 1031C, the portion of the main portion 111C covering the third protrusion 1031C, the light-emitting layer 120 covering the third insulating pattern sub-portion 1043C, and the second electrode 130 collectively form an island D21 and an island D22 located within the light-emitting area L31. Specifically, the island D31 is provided within the light-emitting area L31. Light is emitted from the side portions of the island D31, while no light is emitted from the portion parallel to the surface S of the base substrate 100. For example, if the sensitivity of light emitted by the third sub-pixel needs to be reduced to achieve better color shift, for example, if the third sub-pixel is a green sub-pixel, the perimeter of the island D31 within the light-emitting area L31 of the third sub-pixel may be increased to reduce the sensitivity to green light.
[0112] For example, in some embodiments, Figure 7 、 Figure 8DAs shown, the effective light-emitting area L131 of the third subpixel P131 surrounds a portion of the edge of the third convex portion 1031C, while the effective light-emitting area L132 of the third subpixel P132 surrounds a portion of the edge of the third convex portion 1031D. For example, the effective light-emitting area L131 of the third subpixel P131 has a notch (located in the island area D31), resulting in the effective light-emitting area L131 forming a gate shape facing the effective light-emitting area L132. The orthographic projection of the notch (located in the island area D31) on the surface S of the base substrate 100 at least partially overlaps with the orthographic projection of the third convex portion 1031C on the surface S of the base substrate 100. For example, the effective light-emitting area L132 also has a notch (located in the island area D32).
[0113] For example, in some embodiments, Figure 7 、 Figure 8D As shown, the gaps of the effective light-emitting area L131 of the third sub-pixel P131 and the effective light-emitting area L132 of the third sub-pixel P132 are respectively set at the adjacent edges of the two third sub-pixels, and the two gaps are roughly symmetrical about the straight line extending along the row direction to improve the uniformity of light emission.
[0114] For example, in other examples, the island area D21 and the island area D22 in the second sub-pixel can also be set to two, and the embodiment of the present disclosure is not limited thereto. Figure 4B As shown, the edge of the island area D21 and the island area D22 is an open figure, and the specific structure will be described in detail later.
[0115] It should be noted that Figure 7 , the structures of the third subpixel P131 and the third subpixel P132 are identical. The third insulating pattern sub-portion 1043D, the third convex portion 1031D, the portion of the main portion 111D covering the third convex portion 1031D, and the light-emitting layer 120 and second electrode 130 covering the third insulating pattern sub-portion 1043D in the third subpixel P132 collectively form an island region D32 located in the light-emitting region L32, which will not be described in detail here.
[0116] For example, in some embodiments, in a direction perpendicular to the surface of the substrate, the maximum thickness of at least one protrusion is H1, and the maximum thickness of the portion of the second insulating layer surrounding the light emitting area is H2, wherein H1<H2. Figure 5 Take the first sub-pixel P11 as an example. Figure 5 As shown, the maximum thickness of the first protrusion 1031A (of the first protrusion 1031A) is H1, and the maximum thickness of the portion of the second insulating layer 103 surrounding the light-emitting area L1 (i.e., the portion of the second insulating layer 103 located outside the light-emitting area L1) is H2. The maximum thickness H1 is less than the maximum thickness H2. This reduces the impact of the island region D1 in the light-emitting area L1 on the luminous efficiency.
[0117] It should be noted that in the disclosed embodiment, the maximum thickness of the first protrusion 1031A refers to the vertical distance between the surface of the first protrusion 1031A farthest from the surface S of the base substrate 100 and the surface of the first protrusion 1031A closest to the surface S of the base substrate 100, in a direction perpendicular to the surface S of the base substrate 100. The maximum thickness of other structures is also marked in the same manner and will not be further described here.
[0118] For example, in some embodiments, the maximum thickness H1 of at least one protrusion ranges from 0.5 micrometers to 3 micrometers. Figure 5 As shown, the maximum thickness H1 of the first protrusion 1031A ranges from, for example, approximately 0.5 μm to 3 μm. For example, the maximum thickness H1 of the first protrusion 1031A is approximately 1.5 μm. For example, the maximum thicknesses of the second protrusion 1031B, the third protrusion 1031C, and the third protrusion 1031D can refer to the maximum thickness H1 of the first protrusion 1031A, and are not further described here.
[0119] For example, in some embodiments, Figure 8D As shown, the multiple sub-pixels of the pixel unit are arranged along the row direction, and in the row direction, the width K1 of at least one convex portion is greater than or equal to H1 / tan(α1). Figure 8D As shown, the width K11 of the first convex portion 1031A is greater than or equal to H1 / tan(α1), thereby reducing the impact of the island region D1 in the luminous area L1 on the luminous efficiency while regulating the color gamut and color shift of white light. For example, the value ranges of the widths K12 and K13 of the second convex portion 1031B, the third convex portion 1031C, and the third convex portion 1031D can refer to the width K11 of the first convex portion 1031A and are not further described here.
[0120] For example, Figure 8D As shown, the value range of width K11 is approximately 4 microns to 6 microns, for example, approximately 5 microns. For example, the value range of width K12 is approximately 4 microns to 6 microns, for example, approximately 5 microns. For example, the value range of width K13 is approximately 4.5 microns to 6.5 microns, for example, approximately 5.5 microns.
[0121] For example, in some embodiments, the center line of at least one convex portion along the column direction coincides with the center line of the light emitting area where the at least one convex portion is located along the column direction. Figure 4A and Figure 8D As shown, Figure 8D The center line C1A of the first convex portion 1031A along the column direction X and the center line C2A of the light emitting area L1 where the first convex portion 1031A is located along the column direction X ( Figure 4AThat is, the light emitting area L1 is a symmetrical structure along the center line C2A. For example, Figure 4B and Figure 8D As shown, Figure 8D The center line C1B of the two second convex portions 1031B along the column direction X and the center line C2B of the light emitting area L2 where the two second convex portions 1031B are located along the column direction X ( Figure 4A For example, Figure 4C and Figure 8D As shown, Figure 8D The center line C1C of the two third convex portions 1031C along the column direction X and the center line C2C of the light emitting areas L31 and L32 where the two third convex portions 1031C are located along the column direction X ( Figure 4A This ensures uniformity of brightness of the display substrate.
[0122] For example, in some embodiments, Figure 8F As shown, the width K2 of the effective light-emitting area along the row direction Y ranges from 0.5 microns to 5 microns. For example, in the first sub-pixel P11, the width K21 of the effective light-emitting area L11 along the row direction Y ranges from approximately 0.5 microns to 5 microns. For example, the width K21 of the effective light-emitting area L11 along the row direction Y ranges from approximately 3.5 microns. For example, the width K22 of the effective light-emitting area L12 of the second sub-pixel along the row direction Y, and the width K23 of the effective light-emitting areas L131 and L132 of the third sub-pixel along the row direction Y can refer to the width K21 of the effective light-emitting area L11 along the row direction Y, and will not be further described here.
[0123] For example, in some examples, such as Figure 4A and Figure 5 As shown, in the light emitting area L1 of the first sub-pixel P11, the effective light emitting area L11 of the first sub-pixel P11 surrounds the first insulation pattern sub-portion 1043A along the circumference of the first insulation pattern sub-portion 1043A. Figure 4AAs shown in FIG, the light-emitting area L1 is hexagonal, and the orthographic projection of the first insulating pattern sub-portion 1043A is a hexagon located in the center of the light-emitting area L1. The effective light-emitting area L11 is located outside and surrounds the edge of the first insulating pattern sub-portion 1043A. That is, the first opening 1041A of the first insulating layer 104 forms a polygonal ring surrounding the first insulating pattern sub-portion 1043A. Along the circumference of the first protrusion 1031A, the first protrusion 1031A and the portion of the second insulating layer 103 surrounding the edge of the light-emitting area L1 of the first subpixel P11 are located on both sides of the effective light-emitting area L11. That is, the second opening 1032A of the second insulating layer 103 also forms a polygonal ring surrounding the first protrusion 1031A. The first opening 1041A of the first insulating layer 104 is located within the second opening 1032A of the second insulating layer 103.
[0124] For example, in other embodiments, the shape of the orthographic projection of the first insulation pattern sub-portion 1043A may also be designed to be other shapes, and the embodiments of the present disclosure are not limited thereto.
[0125] For example, in some examples, such as Figure 4A and Figure 5 As shown, the light-emitting area L1 of the first subpixel P11 extends along the column direction X. The orthographic projection of the first convex portion 1031A on the surface S of the substrate 100 extends in the same direction as the light-emitting area L1 of the first subpixel P11. For example, the orthographic projection of the first insulating pattern sub-portion 1043A on the surface S of the substrate 100 extends in the same direction as the light-emitting area L1 of the first subpixel P11. As a result, the effective light-emitting area L11 is formed as a narrow strip surrounding the island area D1. The smaller the perimeter of the island area D1 and the width of the effective light-emitting area L11, the more significant the effect of adjusting the color cast of white light.
[0126] For example, in some embodiments, Figure 4B and Figure 6 As shown, the light emitting area L2 of the second sub-pixel P12 extends along the column direction X. The plurality of first convex portions 1031B are arranged at intervals along the column direction X. For example, two first convex portions 1031B are arranged at intervals in the extension direction of the light emitting area L2. The effective light emitting area L12 of the second sub-pixel P12 surrounds the second insulating pattern sub-portions 1043B along the circumference of the plurality of second insulating pattern sub-portions 1043B. For example, Figure 4BAs shown in FIG, the light-emitting area L2 is hexagonal, and the orthographic projection of the second insulating pattern sub-portion 1043B is located on the centerline C2B of the light-emitting area L2. The orthographic projection of the second insulating pattern sub-portion 1043B is a pentagon. For example, two second insulating pattern sub-portions 1043B can be combined to form a hexagon, which is equivalent to forming two second insulating pattern sub-portions 1043B separated by the effective light-emitting area in a hexagon. The effective light-emitting area L12 is located outside the edge of the second insulating pattern sub-portion 1043B and surrounds the edge of the second insulating pattern sub-portion 1043B. In other words, the first opening 1041B of the first insulating layer 104 is a narrow strip surrounding the second insulating pattern sub-portion 1043B. Portions of the effective light-emitting area L12 (for example, the portion located between the two second insulating pattern sub-portions 1043B) pass through the spaces between the multiple second protrusions 1031B. Thus, the island regions D21 and D22 are formed in the light emitting region L2 , and the area of the inclined side surface of the first electrode formed in the light emitting region L2 is increased, further enhancing the effect of improving the color shift of white light.
[0127] For example, in other embodiments, the shape of the orthographic projection of the second insulation pattern sub-portion 1043B may also be designed to be other shapes, and the embodiments of the present disclosure are not limited thereto.
[0128] For example, in some embodiments, Figure 4C and Figure 7 As shown, in two third sub-pixels (e.g., the third sub-pixel P131 and the third sub-pixel P132) spaced apart in the column direction X, a third convex portion 1031C and a third convex portion 1031D are respectively provided. The third insulating pattern sub-portion 1043C and the third insulating pattern sub-portion 1043D cover the third convex portion 1031C and the third convex portion 1031D, respectively. In the column direction X, the orthographic projections of the two third convex portions (the third convex portion 1031C and the third convex portion 1031D) on the plate surface S of the base substrate 100 are adjacent to the spaced area between the two third sub-pixels (e.g., the third sub-pixel P131 and the third sub-pixel P132). Figure 8D As shown, the edge Y2C of the third convex portion 1031C is an open figure that opens toward the third convex portion 1031D. The shape of the edge of the third convex portion 1031D is the same as the shape of the edge Y2C of the third convex portion 1031C, and they face each other. Figure 8F , the shapes of the edges of the third insulation pattern sub-portion 1043C and the third insulation pattern sub-portion 1043D are the same as those of the third convex portion 1031C and the third convex portion 1031D, but the sizes of the shapes are different.
[0129] For example, in some embodiments, Figure 7As shown, the third convex portions (third convex portion 1031C and third convex portion 1031D) of two third sub-pixels (for example, third sub-pixel P131 and third sub-pixel P132) are connected to and integrally provided with the second insulating layer 103 in the spacing region J1 between the two third sub-pixels. The third insulating pattern sub-portions 1043C and third insulating pattern sub-portions 1043D are connected to and integrally provided with the first insulating layer 104 in the spacing region J1 between the two third sub-pixels. This allows the convex portions to be as large as possible within the light-emitting area of the third sub-pixels to further improve color shift.
[0130] It should be noted that in the embodiment of the present disclosure, the structures of the light-emitting area L131 of the third sub-pixel P131 and the light-emitting area L132 of the third sub-pixel P132 are symmetrical in the row direction Y. The embodiment of the present disclosure is not limited to this, and the structures of the light-emitting area L131 of the third sub-pixel P131 and the light-emitting area L132 of the third sub-pixel P132 can also be designed to be asymmetrical as needed.
[0131] For example, in some embodiments, Figure 4C and Figure 7 As shown, the effective light-emitting area of each third subpixel surrounds the edge of the third insulating pattern sub-portion located within the light-emitting area, forming an arch-shaped effective light-emitting area. For example, taking the third subpixel P131 as an example, the effective light-emitting area L131 of the third subpixel P131 surrounds the edge of the third insulating pattern sub-portion 1043C and forms an arch-shaped opening toward the third subpixel P132. This results in a larger perimeter for the island D31 formed in the light-emitting area of the third subpixel, thereby further improving color shift.
[0132] It should be noted that the embodiments of the present disclosure are not limited to the shapes of the light-emitting areas L1 , L2 , L31 , and L32 .
[0133] It should be noted that, in the embodiment of the present disclosure, the number of sub-pixels provided with island regions in the plurality of pixel units P1 of the display substrate 1 may be adjusted according to the product's requirements for color gamut and white light color shift.
[0134] For example, in some embodiments, a portion of the second insulating layer surrounding the edge of the effective light-emitting area has a side surface, a tangent line of the side surface intersects with the plane of the base substrate at a third angle α3.
[0135] For example, in some embodiments, the first electrode further includes a second sub-portion covering a side surface of the second insulating layer. A tangent line of the side surface at an edge of the second sub-portion intersects the plane of the substrate surface at a fourth angle α4. The third angle α3 and the fourth angle α4 are substantially the same. The value of the third angle α3 ranges from 40 degrees to 60 degrees.
[0136] The third angle α3 and the fourth angle α4 are described below by taking the structure of the first sub-pixel P11 as an example.
[0137] For example, Figure 5 As shown, the portion of the second insulating layer 103 surrounding the edge of the light-emitting area L1 has a side surface S2. A tangent line of the side surface S2 intersects the plane of the substrate surface S of the base substrate 100 at a third angle α3. That is, the side surface S2 is inclined relative to the base substrate 100, and the intersection angle is the angle between the side surface S1 and the substrate surface S of the base substrate 100 (for example, an acute angle in this case). The inclined side surface S2 of the second insulating layer 103 can be used to form a light-emitting portion at the edge of the light-emitting area. This light-emitting portion directs a portion of light emitted from the effective light-emitting area that enters the first insulating layer 104 and is transmitted away from the first insulating layer 104, thereby increasing light efficiency.
[0138] For example, Figure 5 As shown, the main portion 111A of the first electrode 110 further includes a second sub-portion 1112 that covers the side surface S2 of the second insulating layer 103. The second sub-portion 1112 intersects the plane of the surface S of the base substrate 100 at a fourth angle α4. In a direction perpendicular to the surface S of the base substrate 100, the second sub-portion 1112 of the first electrode 110 is separated from the side surface S2 of the second insulating layer 103 and the first insulating layer 104. The third angle α3 and the fourth angle α4 are equal. Thus, at the edge of the light-emitting area L1, the tilted arrangement of the first electrode 110 can form a reflective cup structure. This reflective cup structure causes light emitted from the effective light-emitting area L11 to be reflected after entering the first insulating layer 104, changing its propagation path and emitting it toward the light-emitting surface of the display substrate. This increases the light extraction efficiency of the first sub-pixel and facilitates achieving a better color gamut and white light color shift for the display substrate.
[0139] For example, in some embodiments, the third angle α3 has a value range of approximately 40 to 60 degrees. For example, the third angle α3 has a value of approximately 55 degrees. This allows the display substrate to achieve a good balance in light extraction efficiency, color gamut, and white light color shift, thereby meeting product requirements. It should be noted that the range or value of the fourth angle α4 can refer to the third angle α3.
[0140] For example, in some embodiments, the first angle α1 and the third angle α3 of the edge of the first protrusion 1031A should be as similar as possible to increase the uniformity of light emission. For example, when the first angle α1 and the third angle α3 are different, the third angle α3 should be closer to 55 degrees than the first angle α1, thereby more effectively adjusting the color cast of white light.
[0141] It should be noted that if Figure 6 and Figure 7 As shown, the edge of the light emitting area L2 of the second sub-pixel and the edges of the light emitting areas L31 and L32 of the third sub-pixel are also set to be Figure 5 The similar inclined structure shown is not described in detail here.
[0142] For example, in some instances, Figure 4A As shown, the distance along the row direction Y between the edge of the first protrusion 1031A and the edge of the first insulating pattern sub-portion 1043A is B2. For example, the value of B2 ranges from approximately 2 microns to 3 microns, or approximately 2.5 microns. For example, the distance along the row direction Y between the edge of the second insulating layer 103 near the light-emitting area L1 and the edge of the first insulating layer 104 near the light-emitting area L1 is B1. For example, the value of B1 ranges from approximately 2 microns to 3 microns, or approximately 2.5 microns. For example, the distance along the row direction Y between the edge of the second insulating layer 103 near the light-emitting area L1 and the edge of the main portion 111A of the first electrode 110 is B3. For example, the value of B3 ranges from approximately 1 micron to 2 microns, or approximately 1.5 microns. This achieves a good balance between the luminous efficiency, color gamut, and white light color shift of the display substrate.
[0143] For example, in some instances, Figure 4B As shown, the distance along the row direction Y between the edge of the second protrusion 1031B and the edge of the corresponding second insulating pattern sub-portion 1043B is B6. For example, the value of B6 ranges from approximately 2 microns to 3 microns, and for example, the value of B6 is approximately 2.5 microns. For example, the distance along the row direction Y between the edge of the second insulating layer 103 near the light-emitting area L2 and the edge of the first insulating layer 104 near the light-emitting area L2 is B4. For example, the value of B4 ranges from approximately 2 microns to 3 microns, and for example, the value of B4 is approximately 2.5 microns. For example, the distance along the row direction Y between the edge of the second insulating layer 103 near the light-emitting area L2 and the edge of the main portion 111B of the first electrode 210 is B5. For example, the value of B5 ranges from approximately 1 micron to 2 microns, and for example, the value of B5 is approximately 1.5 microns. This achieves a good balance between the luminous efficiency, color gamut, and white light color shift of the display substrate.
[0144] For example, in some instances, Figure 4CAs shown, the distance along the row direction Y between the edge of the third protrusion 1031D and the edge of the third insulating pattern sub-portion 1043D is B8. For example, the value of B8 ranges from approximately 2 microns to 3 microns, or approximately 2.5 microns. For example, the distance along the row direction Y between the edge of the second insulating layer 103 near the light-emitting area L32 and the edge of the first insulating layer 104 near the light-emitting area L32 is B9. For example, the value of B9 ranges from approximately 2 microns to 3 microns, or approximately 2.5 microns. For example, the distance along the row direction Y between the edge of the second insulating layer 103 near the light-emitting area L31 and the edge of the main portion 111C of the first electrode 310 is B7. For example, the value of B7 ranges from approximately 1 micron to 2 microns, or approximately 1.5 microns. This achieves a good balance between the luminous efficiency, color gamut, and white light color shift of the display substrate.
[0145] For example, in some instances, Figure 8D As shown, the maximum length of edge Y2A of first protrusion 1031A of second insulating layer 103 along column direction Y is B10. For example, B10 is in the range of approximately 13 microns to 15 microns, or approximately 14 microns. The maximum length of edge Y2B of second protrusion 1031B of second insulating layer 103 along column direction Y is B11. For example, B11 is in the range of approximately 5 microns to 7 microns, or approximately 6 microns. The maximum length of edge Y2C of third protrusion 1031C of second insulating layer 103 along column direction Y is B13. For example, B13 is in the range of approximately 8.5 microns to 10.5 microns, or approximately 9.5 microns. The side length of edge Y2C of third protrusion 1031C of second insulating layer 103 along column direction Y is B12. For example, B12 is in the range of approximately 7.6 microns to 8.4 microns, or approximately 8 microns. As a result, a better balance is achieved among the luminous efficiency, color gamut and white light color shift of the display substrate.
[0146] For example, in some instances, Figure 8FAs shown, the maximum width of the second opening 1041A in the first insulating layer 104 in the column direction X is B14. For example, the value of B14 ranges from approximately 5.5 microns to 6.5 microns, and for example, the value of B14 is approximately 6.1 microns. For example, the maximum width of the second opening 1041B in the first insulating layer 104 in the column direction X is B15. For example, the value of B15 ranges from approximately 5.5 microns to 6.5 microns, and for example, the value of B15 is approximately 6.1 microns. For example, the width of the portion of the second opening 1041B in the first insulating layer 104 located between the two second insulating pattern sub-portions 1043B in the column direction X is B16. For example, the value of B16 ranges from approximately 4.5 microns to 5.5 microns, and for example, the value of B16 is approximately 5 microns. For example, the maximum width of the second opening 1041C of the first insulating layer 104 in the column direction X is B17. For example, the value of B17 ranges from approximately 9 microns to 10.5 microns, and for example, the value of B17 is approximately 9.8 microns. Thus, a better balance is achieved among the luminous efficiency, color gamut, and white light color shift of the display substrate.
[0147] For example, Figure 5 As shown, the maximum thickness of the first convex portion 1031A (the first convex portion 1031A) is H1, and the maximum thickness of the portion of the second insulating layer 103 surrounding the light emitting area L1 (ie, the portion of the second insulating layer 103 outside the light emitting area L1) is H2.
[0148] For example, Figure 5 As shown, the maximum thickness of the first insulating sublayer 1043A is H3, and the maximum thickness of the portion of the first insulating layer 104 surrounding the light-emitting area L1 (i.e., the portion of the first insulating layer 104 located outside the light-emitting area L1) is H4. For example, H3 can be equal to H4. For example, the value of H3 ranges from approximately 2.5 microns to 3.5 microns, and for example, the value of H3 is approximately 3 microns.
[0149] For example, Figure 5 As shown, the first electrode layer AN may include a multilayer structure, for example, a three-layer stack of indium tin oxide, silver, and indium tin oxide (ITO / Ag / ITO). For example, the thickness of the indium tin oxide layer is about 8 nm, and the thickness of the silver layer is about 100 nm.
[0150] Figure 8C A plan view of a second conductive layer provided for at least one embodiment of the present disclosure.
[0151] For example, Figure 5 and Figure 8CAs shown, the display substrate 1 also includes a second conductive layer SD2. The second conductive layer SD2 is located on the side of the second insulating layer 103 that is closest to the base substrate 100. Each subpixel also includes a transfer electrode (ZL1 / ZL2 / ZL31 / ZL32) located on the second conductive layer SD2. The transfer electrodes (ZL1 / ZL2 / ZL31 / ZL32) are connected to the subpixel driving circuit through first vias in the third insulating layer 105 and to the first electrode through second vias in the second insulating layer 103. The transfer electrodes (ZL1 / ZL2 / ZL31 / ZL32) are made of a transparent conductive oxide material, such as indium tin oxide. This ensures that the second conductive layer SD2 is formed without affecting the roughness of the second insulating layer 103 or the flatness of the first electrode, thereby preventing a reduction in luminous efficiency.
[0152] For example, in some embodiments, a side insulating layer, such as a buffer layer, may be provided on the third insulating layer 105. The buffer layer is provided between the second insulating layer 103 and the third insulating layer 105 to improve the roughness of the second insulating layer 103. For example, the material of the insulating layer may include insulating materials such as silicon oxide, silicon nitride, and silicon oxynitride.
[0153] For example, in some embodiments, the first electrode further includes an extension portion, which is connected to the main portion of the first electrode and the second via hole, and the orthographic projection of the second via hole on the surface of the base substrate does not overlap with the orthographic projection of the light-emitting area on the surface of the base substrate. Thus, the flatness of the light-emitting area of the sub-pixel is ensured.
[0154] For example, Figure 5 、 Figure 8B 、 Figure 8C 、 Figure 8D and Figure 8E As shown, in the first sub-pixel P11, the first sub-pixel P11 includes a switching electrode ZL1. The first electrode 110 includes an extension portion 112A. The switching electrode ZL1 is connected to the sub-pixel driving circuit 102A through a first via hole GK11 in the third insulating layer 105. The switching electrode ZL1 is connected to the extension portion 112A of the first electrode 110 through a second via hole GK21 in the second insulating layer 103. The extension portion 112A is connected to the main portion 111A of the first electrode 110 and the second via hole GK21. Figure 8D The second via hole GK21 is located at the lower left of the light-emitting area L1. The extension portion 112A extends from the main portion 111A of the first electrode 110 to the second via hole GK21. The orthographic projection of the second via hole GK21 on the surface S of the base substrate 100 does not overlap with the orthographic projection of the light-emitting area L1 on the surface S of the base substrate 100, thereby ensuring the flatness of the light-emitting area L1 of the first sub-pixel.
[0155] For example, Figure 6 、 Figure 8B 、 Figure 8C 、 Figure 8D and Figure 8E As shown, in the second sub-pixel P12, the second sub-pixel P12 includes a switching electrode ZL2. The first electrode 210 includes an extension portion 112B. The switching electrode ZL2 is connected to the sub-pixel driving circuit 102B through a first via hole GK12 in the third insulating layer 105. The switching electrode ZL2 is connected to the extension portion 112B of the first electrode 210 through a second via hole GK22 in the second insulating layer 103. The extension portion 112B is connected to the main portion 111B of the first electrode 210 and the second via hole GK22. Figure 8D The second via hole GK22 is located to the lower right of the light-emitting area L2. The extension portion 112B extends from the main portion 111B of the first electrode 210 to the second via hole GK22. The orthographic projection of the second via hole GK22 on the surface S of the base substrate 100 does not overlap with the orthographic projection of the light-emitting area L2 on the surface S of the base substrate 100, thereby ensuring the flatness of the light-emitting area L2 of the second sub-pixel.
[0156] For example, Figure 7 、 Figure 8B 、 Figure 8C 、 Figure 8D and Figure 8E As shown, in the third sub-pixel P131, the third sub-pixel P11 includes a switching electrode ZL31. The first electrode 310 includes an extension portion 112C. The switching electrode ZL31 is connected to the sub-pixel driving circuit 102C through a first via hole GK131 in the third insulating layer 105. The switching electrode ZL31 is connected to the extension portion 112C of the first electrode 310 through a second via hole GK231 in the second insulating layer 103. The extension portion 112C is connected to the main portion 111C of the first electrode 310 and the second via hole GK231. Figure 8D The second via hole GK231 is located at the lower left of the light-emitting area L31. The extension portion 112C extends from the main portion 111C of the first electrode 310 to the second via hole GK231. The orthographic projection of the second via hole GK231 on the surface S of the base substrate 100 does not overlap with the orthographic projection of the light-emitting area L31 on the surface S of the base substrate 100, thereby ensuring the flatness of the light-emitting area L31 of the third subpixel. The third subpixel P132 includes a transfer electrode ZL32. The transfer electrode ZL32, the extension portion 112D of the first electrode 410, the first via hole GK132, and the second via hole GK232 of the third subpixel P132 are symmetrically arranged in the row direction Y with the transfer electrode ZL31, the extension portion 112C of the first electrode 310, the first via hole GK131, and the second via hole GK231 of the third subpixel P131. A detailed description thereof will not be repeated here.
[0157] For example, Figure 5 、 Figure 6 as well as Figure 7 As shown, the display substrate 1 further includes a barrier layer 1240, a buffer layer 1241, a first gate insulating layer 1242, a second gate insulating layer 1243, an interlayer insulating layer 1244, a semiconductor layer ACT, a first gate layer GT1, a second gate layer GT2, and a first conductive layer SD1. The barrier layer 1240 is located on the surface S of the base substrate 100. The buffer layer 1241 is located on the side of the barrier layer 1240 away from the base substrate 100. The buffer layer 1241 serves as a transition layer, which can prevent harmful substances in the base substrate from invading the interior of the display substrate and increase the adhesion of the film layers in the display substrate to the base substrate 100. The barrier layer 1240 can provide a flat surface for forming the pixel driving circuit 103 and prevent impurities that may exist in the base substrate 100 from diffusing into the sub-pixel driving circuit or the pixel driving circuit 103, thereby adversely affecting the performance of the display substrate.
[0158] For example, the buffer layer 1241 may include insulating materials such as silicon oxide, silicon nitride, and silicon oxynitride. For example, the barrier layer 1240 may include inorganic insulating materials such as silicon oxide, silicon nitride, and silicon oxynitride, or other suitable materials.
[0159] For example, the first gate insulating layer 1242 is located on the side of the buffer layer 1241 away from the base substrate 100. The semiconductor layer ACT is located between the first gate insulating layer 1242 and the buffer layer 1241. The second gate insulating layer 1243 is located on the side of the first gate insulating layer 1242 away from the base substrate 100. The first gate layer GT1 is located between the first gate insulating layer 1242 and the second gate insulating layer 1243. The interlayer insulating layer 1244 is located on the side of the second gate insulating layer 1243 away from the base substrate 100. The second gate layer GT2 is located between the second gate insulating layer 1243 and the interlayer insulating layer 1244. The first conductive layer SD is located on the side of the interlayer insulating layer 1244 away from the base substrate 100.
[0160] Figure 8A A plan view of a first conductive layer provided for at least one embodiment of the present disclosure.
[0161] For example, Figure 8A At least the following structures are shown: the portion of the subpixel driving circuit 102A of the first subpixel connected to the switching electrode ZL1, the portion of the subpixel driving circuit 102B of the second subpixel connected to the switching electrode ZL2, the portion of the subpixel driving circuit 102C of the third subpixel connected to the switching electrode ZL31, and the portion of the subpixel driving circuit 102D of the third subpixel connected to the switching electrode ZL32. It should be noted that other wirings or structures in the first conductive layer SD1 are not described in detail here.
[0162] For example, the material of one or more of the first gate insulating layer 1242, the second gate insulating layer 1243, and the interlayer insulating layer 1244 may include insulating materials such as silicon oxide, silicon nitride, and silicon oxynitride. The materials of the first gate insulating layer 1242, the second gate insulating layer 1243, and the interlayer insulating layer 1244 may be the same or different.
[0163] For example, the material of the semiconductor layer ACT may include polysilicon or an oxide semiconductor (eg, indium gallium zinc oxide (IGZO)).
[0164] For example, the materials of the first gate layer GT1, the second gate layer GT2, and the first conductive layer SD1 may include a metal material or an alloy material, such as a metal single layer or multilayer structure formed of molybdenum, aluminum, and titanium. For example, the multilayer structure is a multi-metal stack (such as a three-layer metal stack of titanium, aluminum, and titanium (Ti / Al / Ti)). For example, the materials of the first gate layer GT1, the second gate layer GT2, and the first conductive layer SD1 may be the same or different, and the embodiments of the present disclosure are not limited thereto.
[0165] For example, Figure 5 、 Figure 6 as well as Figure 7 As shown, the display substrate 1 also includes an encapsulation layer 147 and a spacer 117. The spacer 117 is located on the side of the first insulating layer 104 away from the base substrate 100, that is, the spacer 117 is located between the first insulating layer 104 and the second electrode 130. The encapsulation layer 147 is located on the side of the second electrode 111 away from the base substrate 100. The encapsulation layer 147 seals the light-emitting element, thereby reducing or preventing degradation of the light-emitting element caused by moisture and / or oxygen included in the environment. The encapsulation layer 147 can be a single-layer structure or a composite layer structure, which includes a stacked structure of an inorganic layer and an organic layer. The encapsulation layer 147 includes at least one encapsulation sublayer. For example, the encapsulation layer 147 may include a first inorganic encapsulation layer, a first organic encapsulation layer, and a second inorganic encapsulation layer arranged in sequence.
[0166] For example, the material of the spacers 117 may include a transparent insulating material.
[0167] For example, the material of the encapsulation layer 147 may include insulating materials such as silicon nitride, silicon oxide, silicon oxynitride, and polymer resins. Inorganic materials such as silicon nitride, silicon oxide, and silicon oxynitride have high density and can prevent the intrusion of water, oxygen, and the like. The material of the organic encapsulation layer may be a polymer material containing a desiccant or a polymer material that can block water vapor, such as a polymer resin, to planarize the surface of the display substrate and relieve stress on the first and second inorganic encapsulation layers. A water-absorbing material such as a desiccant may also be included to absorb intrusive water, oxygen, and the like.
[0168] For example, Figure 5 As shown, the sub-pixel driving circuit 102A includes a first transistor 12 and a storage capacitor 13. The first transistor 13 is a transistor directly electrically connected to the light-emitting element 101A. This transistor can be, for example, a switching transistor (e.g., a light-emission control transistor) or a driving transistor. The first transistor 12 includes a gate 122, two source-drain electrodes (source 123 and drain 124), and an active layer 121. The gate 122 is located on the first gate layer GT1, the two source-drain electrodes (source 123 and drain 124) are located on the first conductive layer SD1, and the active layer 121 is located on the semiconductor layer ACT. The storage capacitor 13 includes a first plate 131 and a second plate 132. For example, the first plate 131 is located on the first gate layer GT1, and the second plate 132 is located on the second gate layer GT2. The gate 122 and the first plate 131 are arranged on the same layer. A second gate insulating layer 1243 is placed between the first plate 131 and the second plate 132 to form a capacitor.
[0169] It should be noted that in Figure 6 In the embodiment, the sub-pixel driving circuit 102B includes a first transistor 22 and a storage capacitor 23. The first transistor 22 includes a gate 222, two source-drain electrodes (source 223 and drain 224), and an active layer 221. The storage capacitor 23 includes a first plate 231 and a second plate 232. The structures of the first transistor 22 and the storage capacitor 23 are shown in FIG. Figure 5 The first transistor 12 and the storage capacitor 13 in FIG are not described in detail here. Figure 7 In the embodiment, the sub-pixel driving circuit 102C includes a first transistor 32 and a storage capacitor 33. The first transistor 32 includes a gate 322, two source-drain electrodes (source 323 and drain 324), and an active layer 321. The storage capacitor 33 includes a first plate 331 and a second plate 332. The structures of the first transistor 32 and the storage capacitor 33 are shown in FIG. Figure 5 The first transistor 12 and the storage capacitor 13 in the sub-pixel driving circuit 102D are not described in detail here. The sub-pixel driving circuit 102D includes a first transistor 42 and a storage capacitor 43. The first transistor 42 includes a gate 422, two source-drain electrodes (source 423 and drain 424) and an active layer 421. The storage capacitor 43 includes a first plate 431 and a second plate 432. The structure of the first transistor 42 and the storage capacitor 43 is shown in FIG. Figure 5 The first transistor 12 and the storage capacitor 13 are not described in detail here.
[0170] It should be noted that in the embodiment of the present disclosure, the sub-pixel driving circuit (102A / 102B / 102C / 102D) includes a conventional 2T1C (i.e., two transistors and one capacitor) pixel circuit, a 7T1C (i.e., seven transistors and one capacitor) pixel circuit, etc. The sub-pixel driving circuit includes at least one switching transistor and one driving transistor (e.g., Figure 5 The first transistor 12 is connected to the sub-pixel driver circuit (102A / 102B / 102C / 102D), wherein the gate of the switching transistor receives a gate scan signal, and the source or drain of the switching transistor is connected to the data line to receive a data signal. In different embodiments, the sub-pixel driver circuit (102A / 102B / 102C / 102D) may further include a compensation circuit, which may include an internal compensation circuit or an external compensation circuit. The compensation circuit may include a transistor, a capacitor, etc. For example, as needed, the pixel circuit may also include a reset circuit, a light-emitting control circuit, a detection circuit, etc. The embodiments of the present disclosure do not limit the type of the first light-emitting device or the specific structure of the pixel circuit.
[0171] Figure 9A A graph showing how the color shift of white light from a display substrate varies with viewing angle, provided in at least one embodiment of the present disclosure. Figure 9B A graph showing the attenuation of white light brightness of a display substrate with viewing angle provided in at least one embodiment of the present disclosure.
[0172] For example, in some embodiments, the sizes of the luminous area, effective luminous area, convex portion, and insulating pattern sub-portion provided in each sub-pixel of the display substrate 1 can be designed based on desired performance requirements such as brightness, color gamut, and white light color shift. For example, the larger the perimeter of the reflective cup structure at the edge of the luminous area, and the greater the number and perimeter of the convex portion's edges (i.e., the greater the number and perimeter of the island regions in the luminous area), the lower the light sensitivity of the corresponding sub-pixel, and the greater the deviation of the light displayed by the display substrate 1 from the light of that sub-pixel.
[0173] For example, Table 1 below shows the color coordinates and NTSC (Just Noticeable Color Difference) color gamut (e.g., the sum of colors under the NTSC standard) parameters under four design schemes. The four designs are: the red sub-pixel R, the green sub-pixel G, and the blue sub-pixel B do not have an island region and a light-emitting region peripheral emission cup structure (RGB_nomal); the red sub-pixel R is set to Figure 3 In the structure shown in the figure, the green sub-pixel G and the blue sub-pixel B do not have an island region and an emission cup structure around the luminous region (R_cup / GB_normal), and the red sub-pixel R and the green sub-pixel G are set to Figure 3 In the structure shown in the figure, the blue sub-pixel B does not have an island region and an emission cup structure around the luminous region (RG_cup / B_normal), and the red sub-pixel R, the green sub-pixel G and the blue sub-pixel B are configured as Figure 3 The structure shown (RGB_cup).
[0174] Table 1
[0175]
[0176] For example, FIG9A shows a graph showing the change of white light color deviation with viewing angle in the above four cases. FIG9B shows a graph showing the change of white light brightness with viewing angle in the above four cases. Figure 9A and Figure 9B As can be seen from the curve, when the red sub-pixel R, green sub-pixel G, and blue sub-pixel B do not have an island area and a peripheral emission cup structure (RGB_nomal), the value of the NTSC color gamut is the largest. Figure 3 The structure (RGB_cup) shown in the figure achieves the highest white light efficiency, indicating minimal white light color shift. This demonstrates that by providing islands within the subpixel's light-emitting area and reflective cups at the edges of the light-emitting area, product requirements for both color gamut and white light color shift can be met. For example, by providing a larger number of islands and increasing the perimeter of the island edges or the perimeter of the reflective cups, white light color shift can be reduced. Alternatively, by reducing the number of islands and the perimeter of the edges or the perimeter of the reflective cups, the color gamut can be increased. This approach helps achieve a good balance between color gamut and white light color shift in display substrates.
[0177] At least one embodiment of the present disclosure further provides a display device. Figure 10 A schematic diagram of a display device provided in accordance with at least one embodiment of the present disclosure.
[0178] like Figure 10 As shown, the display device 2 includes a display substrate 1 provided by any embodiment of the present disclosure, for example, Figure 2 The display substrate 1 shown in FIG.
[0179] It should be noted that the display device 2 can be any product or component with a display function, such as an OLED panel, an OLED TV, a QLED panel, a QLED TV, a mobile phone, a tablet computer, a laptop computer, a digital photo frame, or a navigation system. The display device 2 may also include other components, such as a data drive circuit and a timing controller, which are not limited in the embodiments of the present disclosure.
[0180] It should be noted that for the sake of clarity and brevity, the embodiments of this disclosure do not provide all components of the display device. To implement the substrate function of the display device, those skilled in the art may provide and configure other structures not shown according to specific needs, and the embodiments of this disclosure do not limit this.
[0181] Regarding the technical effects of the display device 2 provided in the above embodiment, reference may be made to the technical effects of the display substrate 1 provided in the embodiments of the present disclosure, which will not be repeated here.
[0182] There are a few points to note:
[0183] (1) The drawings of the embodiments of the present disclosure only relate to the structures related to the embodiments of the present disclosure. Other structures may refer to conventional designs.
[0184] (2) In the absence of conflict, the embodiments of the present disclosure and the features therein may be combined with each other to form new embodiments.
[0185] The above are only specific embodiments of the present disclosure, but the scope of protection of the present disclosure is not limited thereto. Any changes or substitutions that can be easily conceived by a person skilled in the art within the technical scope disclosed in this disclosure should be included in the scope of protection of the present disclosure. Therefore, the scope of protection of the present disclosure should be based on the scope of protection of the claims.
Claims
1. A display substrate, comprising: A base substrate includes a display area, wherein the display area includes a plurality of pixel units arranged in multiple rows and columns, each of the pixel units includes a plurality of sub-pixels, the sub-pixels include a light-emitting element, the light-emitting element includes a first electrode, a second electrode, and a light-emitting layer, the first electrode is located on a side of the light-emitting layer close to the base substrate, the second electrode is located on a side of the light-emitting layer away from the base substrate, and the light-emitting layer is located between the first electrode and the second electrode. a first insulating layer located between the first electrode and the light-emitting layer, wherein the first insulating layer includes a plurality of first openings, the plurality of first openings being arranged in a one-to-one correspondence with the plurality of sub-pixels, the first openings being configured to expose the first electrode to form an effective light-emitting area of the light-emitting element, at least one of the effective light-emitting areas at least partially surrounding at least one island area; A first insulating pattern is provided in the island area, a second insulating pattern is provided on the side of the first electrode close to the base substrate, and the second insulating pattern, the first electrode, the first insulating pattern, the light-emitting layer and the second electrode are sequentially provided in each island area in a direction away from the base substrate. The island region is arranged so that the effective light emitting region is formed into a ring shape or a shape with an edge concave inward.
2. The display substrate according to claim 1, wherein The effective light emitting area and the corresponding island area of at least one sub-pixel together form a convex polygonal shape.
3. The display panel according to claim 2, wherein: The island region includes a side parallel to a side of the effective light emitting region.
4. The display substrate according to claim 1, wherein: At least one film layer arranged in the island area of at least one sub-pixel is integrated with at least one film layer arranged in the spacing area between the at least one sub-pixel and an adjacent sub-pixel.
5. The display substrate according to claim 4, wherein: The at least one film layer includes the first insulating layer, and the first insulating pattern is a portion of the first insulating layer. The display substrate according to claim 1 , wherein: The effective light emitting area is in the shape of a convex polygon with at least one side having a concave portion, and the concave portion corresponds to the island area.
7. The display substrate according to claim 1, wherein: The closest distance between the island area and the orthographic projection of the center of the convex polygon on the substrate is smaller than the closest distance between the edge of the convex polygon and the orthographic projection of the center of the convex polygon on the substrate, or the orthographic projection of the center of the convex polygon on the substrate is located within the orthographic projection of the island area on the substrate.
8. The display substrate according to claim 1, wherein: The display substrate further includes a pixel driving circuit for driving the light-emitting element. The pixel driving circuit includes a plurality of metal layers. The island region overlaps with at least one of the plurality of metal layers.
9. The display substrate according to claim 8, wherein: The multiple metal layers include at least one source-drain metal layer, the source-drain electrode of at least one transistor is arranged in the at least one source-drain metal layer or the source-drain electrode of at least one transistor is electrically connected to the pattern arranged in the at least one source-drain metal layer, and the overlapping area between the effective light-emitting area and the source-drain metal layer is larger than the overlapping area between the island area and the source-drain metal layer.
10. The display substrate according to claim 8, wherein A portion of at least one of the plurality of metal layers overlapping with the light emitting area is distributed on both sides of the island area.
11. The display substrate according to claim 8, wherein The island region extends in a column direction, and overlapping portions of at least one of the plurality of metal layers and the effective light emitting region are distributed on both sides of a straight line extending in the column direction and passing through the effective light emitting region.
12. The display substrate according to claim 8, wherein: At least one metal layer of the multiple metal layers includes a metal line, and the orthographic projection of at least one metal line on the base substrate overlaps with the orthographic projection of the effective light-emitting area on the base substrate and passes through the orthographic projection of the effective light-emitting area on the base substrate in a column direction.
13. The display substrate according to claim 12, wherein: The metal line includes a data line, and an orthographic projection of an effective light-emitting area of at least one sub-pixel including the island area on the base substrate overlaps with an orthographic projection of the data line on the base substrate.
14. The display substrate according to claim 8, wherein At least one metal pattern in the plurality of metal layers extends from a region overlapping with the island region to a region overlapping with the effective light emitting region.
15. The display substrate according to claim 6, wherein: An island region formed by the concave portion is provided at the opposite edges of at least two adjacent sub-pixels of the same color, and at least one film layer provided in the island region of the at least two sub-pixels is connected to at least one film layer provided in the interval between the at least two sub-pixels.
16. The display substrate according to claim 15, wherein: The effective light emitting areas of the at least two adjacent sub-pixels are symmetrically arranged about a straight line in the row direction.
17. The display device according to claim 15, wherein: The effective light-emitting areas of the at least two adjacent sub-pixels are symmetrically arranged about a straight line in the column direction, and the symmetry axes of the effective light-emitting areas of the at least two adjacent sub-pixels in the column direction are located on the same straight line.
18. The display device according to claim 1, wherein An orthographic projection of an effective light emitting area of at least one sub-pixel on the substrate includes a symmetry axis, and the symmetry axis passes through an orthographic projection of the island area on the substrate.
19. The display device according to claim 18, wherein: The orthographic projection of the island region on the substrate is symmetrical about the symmetry axis.
20. The display device according to claim 1, wherein The orthographic projections of the island regions in the sub-pixels of the same color and located in the same column on the substrate are passed through by the same straight line.
21. The display device according to claim 1, wherein The shortest distance between the island regions of two adjacent sub-pixels in the same column is equal to the shortest distance between the two adjacent sub-pixels.
22. The display device according to claim 1, wherein The multiple sub-pixels include multiple sub-pixel pairs, and the opposite edges of two sub-pixels in the sub-pixel pair are concave inward to form a pair of island areas. The closest distance between the pair of island areas in the sub-pixel pair is smaller than the closest distance between the island areas of other sub-pixels adjacent to the two sub-pixels in the sub-pixel pair and the pair of island areas.
23. The display device according to claim 1, wherein The effective light emitting area and the island area therein of at least one sub-pixel are both in a strip shape, and the corresponding effective light emitting area and the island area extend in the same direction.
24. The display device according to claim 1, wherein The orthographic projections of the geometric centers of the light-emitting area of at least one sub-pixel and the island area therein on the substrate are both located on the same straight line parallel to the row direction or the column direction.
25. The display device according to claim 1, wherein The sub-pixel having the island region includes a blue sub-pixel.
26. The display substrate according to claim 1, further comprising: A second insulating layer, wherein The second insulating layer is provided on a side of the first electrode close to the base substrate. The orthographic projection of the first insulating pattern on the board surface of the base substrate at least partially overlaps with the orthographic projection of the second insulating pattern on the board surface of the base substrate, The first insulating layer and the first insulating pattern are provided in the same layer and made of the same material, and the second insulating layer and the second insulating pattern are provided in the same layer and made of the same material.
27. The display substrate according to claim 26, wherein: The second insulating layer has a second opening corresponding to the effective light emitting area, and the second opening is formed between an edge of the second insulating layer surrounding the effective light emitting area and an edge of the second insulating pattern. The thickness of the second insulating layer in the area where the bottom of the second opening is located along the direction perpendicular to the board surface of the base substrate is 0, or is greater than 0 and less than the thickness of the second insulating pattern along the direction perpendicular to the board surface of the base substrate.
28. The display substrate according to claim 26 or 27, further comprising: a third insulating layer, the third insulating layer being located on a side of the second insulating layer close to the base substrate, the third insulating layer having a third insulating pattern located in the island region, The distance between the third insulating pattern and the surface of the base substrate in a direction perpendicular to the surface of the base substrate is greater than the distance between the portion of the third insulating layer located in the effective light-emitting area and the surface of the base substrate in a direction perpendicular to the surface of the base substrate.
29. The display substrate according to claim 28, wherein: The thickness of the portion of the third insulating layer located in the effective light emitting area in a direction perpendicular to the plate surface of the base substrate is less than the thickness of the portion of the third insulating layer surrounding the effective light emitting area in a direction perpendicular to the plate surface of the base substrate.
30. A display device comprising the display substrate according to any one of claims 1-29.