Epitaxial furnace substrate transfer device

Abstract

The invention belongs to the technical field of silicon carbide substrate production, and particularly relates to an epitaxial furnace substrate transfer device which comprises an epitaxial furnace body. One side of the epitaxial furnace body is fixedly connected with a transfer box; through grooves are formed in the opposite surfaces of the two sides of the transfer box. The through groove is communicated with the epitaxial furnace body, through cooperation of the tray, the electric push rod, the mechanical arm and the clamping jaw, clamping and transferring of a substrate are achieved, then the spraying pipe on the bottom face of the bottom cover is used for conducting air spraying treatment on the surface of the substrate, and therefore the effect of cleaning the surface of the substrate is achieved; and meanwhile, an electric control valve at the through groove 3 is opened, so that silicon carbide particles in the extension wheel body 1 can be sucked into the annular groove 10, the particles in the extension wheel body 1 are prevented from polluting a substrate, the cleaning effect on the substrate is further guaranteed, and the final product quality is guaranteed.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of silicon carbide substrate production, in particular to an epitaxial furnace substrate transfer device. BACKGROUND

[0002] The epitaxial furnace is a key equipment for semiconductor material manufacturing, mainly used for growing high-quality single crystal thin film on single crystal substrate, and its working principle is to deposit semiconductor material on the substrate in a high-temperature and high-pressure environment to form a crystal layer consistent with the lattice structure of the substrate, wherein the substrate transfer is an important link to ensure the smooth progress of the production process.

[0003] In the prior art, the epitaxial furnace substrate transfer device is usually composed of a mechanical arm, a cantilever, a clamping jaw and a tray, and a position sensor is used to ensure the repeated positioning accuracy in a high-temperature and high-vacuum environment, so that the mechanical arm can control the clamping jaw to clamp the substrate and transfer the substrate to the processing area inside the epitaxial furnace, so that the surface of the substrate can grow a high-quality single crystal thin film smoothly.

[0004] In the prior art, during the process of transferring the substrate by the clamping jaw, the substrate will be in contact with the external air, and since the air contains a large number of dust particles, in addition, during the production process of the epitaxial furnace, the silicon carbide fine particles in the furnace will accumulate more and more, and during the process of replacing the substrate by opening the gate, the silicon carbide fine particles in the epitaxial furnace will be contaminated on the substrate due to air flow disturbance, and these dust and particles will affect the generation of single crystal thin film on the surface of the substrate, and further affect the final product quality.

[0005] Therefore, the present application provides an epitaxial furnace substrate transfer device. SUMMARY

[0006] In order to make up for the deficiencies of the prior art and solve at least one technical problem proposed in the background art.

[0007] The technical scheme adopted by the present application to solve its technical problems is: the substrate transfer device of the epitaxial furnace, including an epitaxial furnace body; a transfer box is fixedly connected to one side of the epitaxial furnace body; through grooves are formed in the opposite surfaces of the transfer box; the through grooves are communicated with the epitaxial furnace body, and an electric control valve is installed at the connection; a tray is rotatably connected inside the transfer box, and the tray is driven by a servo motor; an electric push rod is embedded in the surface of the tray at the center; a mechanical arm is fixedly connected to the telescopic end of the electric push rod; a gripper is installed at the execution end of the mechanical arm; a top cover is fixedly connected to the top surface of the transfer box; a plurality of uniformly arranged spray pipes are installed on the bottom surface of the top cover; the spray pipes are connected with an external pump assembly; the external pump assembly pumps pure inert gas into the spray pipes through a gas pump; an arc-shaped groove is formed in the inner wall of the transfer box; the arc-shaped groove is connected with an external vacuum pump; when working, in order to avoid the substrate surface from being easily contaminated with dust during the process of sending the substrate into and out of the epitaxial furnace, thereby affecting the final product quality, the embodiment of the present application can be used, first, during the substrate feeding process, the cooperation of the tray, the electric push rod and the mechanical arm drives the gripper to extend out of the through groove on the side away from the epitaxial furnace body, then the gripper picks up the substrate to be processed, and then the mechanical arm drives the gripper and the substrate back to the inside of the transfer box, at this time the spray pipes on the bottom surface of the top cover spray pure inert gas towards the top surface of the substrate, thereby blowing away the dust adhered to the surface of the substrate, and when the spray pipes spray gas, the external vacuum pump simultaneously sucks the gas in the transfer box through the arc-shaped groove, thereby enabling the dust blown up by the inert gas to be discharged to the outside from the arc-shaped groove, thereby avoiding the dust from diffusing in the transfer box and then falling back to the surface of the substrate, and when the surface of the substrate is cleaned, the electric control valve no longer closes the through groove between the epitaxial furnace body and the transfer box, so that the mechanical arm and the gripper can send the substrate into the inside of the epitaxial furnace body, thereby realizing the clamping and transfer of the substrate through the cooperation of the tray, the electric push rod, the mechanical arm and the gripper, and then the spray pipes on the bottom surface of the bottom cover perform gas spraying treatment on the surface of the substrate, thereby achieving the effect of cleaning the surface of the substrate, and the suction of the gas in the transfer box by the arc-shaped groove enables the transfer box to not diffuse dust, and the opening of the electric control valve at the through groove enables the silicon carbide particles in the epitaxial wheel body to also be sucked into the annular groove, thereby avoiding the particles in the epitaxial wheel body from polluting the substrate, and further ensuring the cleaning effect of the substrate, thereby ensuring the final product quality.

[0008] Preferably, the top surface of the spray pipe is provided with a base; the rotating rods are fixedly connected between the same columns of the spray pipes; the rotating rods rotate on the bottom surface of the base; one end of the rotating rod is engagedly connected with a toothed plate; a sliding groove is formed on the surface of the base at the corresponding position of the toothed plate; the toothed plate is slidingly connected in the sliding groove; the top surface of the toothed plate is engagedly connected with a gear one; the gear one is rotatably connected on the top surface of the base and is driven by a servo motor; when the spray pipe needs to spray the substrate surface, the servo motor drives the gear one to rotate forwardly and then reversely, and the rotating angles of the forward rotation and the reverse rotation are the same; since the gear one is engaged with the toothed plate, the toothed plate reciprocatingly slides in the sliding groove under the driving of the gear one; the reciprocating toothed plate drives the rotating rod engaged with the toothed plate to continuously rotate forwardly and reversely, thereby driving the spray pipe fixedly connected with the rotating rod to continuously swing, so that the inert gas sprayed by the spray pipe can sweep the substrate surface at different angles, the dust adhered to the substrate surface can be more easily blown away, and the cleaning effect of the substrate is improved.

[0009] Preferably, the side surface of the tray is engagedly connected with a gear two; the top surface of the gear two is fixedly connected with a transmission rod; the rotating rod is rotatably connected with the inner wall of the transfer box; the top surface of the transmission rod is fixedly connected with a gear three; the gear three is engagedly connected with the base; when the tray drives the electric push rod and the mechanical arm to rotate, the tray also drives the gear two to synchronously rotate, the rotating gear two drives the transmission rod to synchronously rotate, and the rotating transmission rod drives the gear three on the top of the transmission rod to rotate; since the gear three is engagedly connected with the base, the base also synchronously rotates with the gear three, so that the spray pipe on the surface of the base can rotate with the rotation of the tray, and the spray pipe can be located on the top surface of the substrate gripped by the clamping jaw after the clamping jaw is retracted into the transfer box, and the spray pipe is also located between the clamping jaws, so that the dust can be blown out from the two clamping jaws with less obstruction during the process that the spray pipe swings and sprays the inert gas toward the substrate surface, and the dust is prevented from being accumulated at the connection between the clamping jaw and the mechanical arm.

[0010] Preferably, the transfer box is fixed with a temporary storage tank on one side; the temporary storage tank is connected with the transfer box, and the temporary storage tank is adjacent to the epitaxial furnace body; the inside of the temporary storage tank is fixed with a partition plate; one pair of suction pipes is fixed on the side surface of the temporary storage tank; the two suction pipes are connected with the inside of the temporary storage tank, and the two suction pipes are respectively located on the top and bottom of the partition plate; the suction pipes are connected with an external vacuum pump; a sealing door is installed on the side of the temporary storage tank away from the transfer box, and the sealing door is located on the bottom of the partition plate; when the substrate is still being processed in the epitaxial furnace body, the mechanical arm first transfers the substrate to be processed to the inside of the transfer box through the gripper, then cleans the surface of the substrate through the spray pipe, and then puts the substrate on the top surface of the partition plate in the temporary storage tank; after the substrate is processed, the electric control valve is opened, the mechanical arm drives the gripper to extend into the epitaxial furnace body to clamp the substrate, and then returns to the transfer box, and after cleaning through the spray pipe, the processed substrate is put into the bottom of the partition plate in the temporary storage tank; then the mechanical arm sends the substrate to be processed on the top surface of the partition plate into the epitaxial furnace body, and the processed substrate is taken out from the bottom sealing door; since the mechanical arm can prepare the cleaning of the next substrate in advance during the processing of the substrate in the epitaxial furnace body, the substrate preparation time is shortened, the work efficiency is improved, and the two suction pipes continuously suck the gas in the temporary storage tank to avoid dust in the air from polluting the substrate in the temporary storage tank.

[0011] Preferably, an ejection groove is formed at the connection between the temporary storage tank and the transfer box; a baffle is slidably connected in the ejection groove, and the baffle can block the connection between the temporary storage tank and the transfer box; a transmission plate is fixed on the side of the baffle close to the transfer box; a driven disc is fixed on the side surface of the electric push rod; the end of the transmission plate away from the baffle is located on the top of the driven disc; the arc-shaped groove is located on the top of the driven disc; when the epitaxial furnace body is processing the substrate, and the substrate to be processed is cleaned and placed on the top of the partition plate, the electric push rod rises from the driven disc, the driven disc pushes the transmission plate to rise, and finally the transmission plate drives the baffle to rise, so that the baffle can block the connection between the transfer box and the temporary storage tank, thereby ensuring that the substrate stored in the storage tank can be in a sealed vacuum state, and further avoiding the surface from being contaminated by dust.

[0012] Preferably, the bottom surface of the temporary storage tank is embedded with a hydraulic rod; the top surface of the hydraulic rod is fixedly connected with a rotating connecting seat; the top surface of the connecting seat is provided with a placing groove; the two sides of the connecting seat are fixedly connected with limiting columns; the inner wall of the temporary storage tank is provided with a guide groove at the position corresponding to the limiting column; the limiting column is slidingly connected in the guide groove; when the mechanical arm needs to put the processed substrate into the temporary storage tank, the mechanical arm will put the processed substrate into the placing groove on the surface of the connecting seat to fix the substrate and avoid its sliding in the temporary storage tank; when the user needs to take out the processed substrate at the connecting seat, the user needs to control the hydraulic rod to drive the connecting seat to descend, and since the limiting columns on both sides of the connecting seat are slidingly connected in the guide groove, the connecting seat will also rotate by 180 degrees in the process of descending, so that the user can more easily take out the processed substrate from the placing groove.

[0013] Preferably, the inner wall of the mounting groove is fixedly connected with a supporting ring; the inner diameter of the supporting ring is smaller than the diameter of the substrate; the bottom of the mounting groove is slidingly connected with a supporting column at the center; the supporting column and the bottom of the mounting groove are fixedly connected with a spring; when the mechanical arm places the substrate at the connecting seat, the substrate will be placed on the top surface of the supporting column by the clamping jaw of the mechanical arm, and then the supporting column will continuously descend under the action of the gravity of the substrate and compress the spring until the edge of the substrate is placed on the supporting ring, thereby completing the fixation of the substrate, so that the substrate directly hits the bottom of the placing groove in the process of placing the substrate by the mechanical arm, thereby causing damage to the substrate.

[0014] Preferably, the bottom surface of the connecting seat is provided with a pair of openings, and the openings penetrate through the connecting seat; the bottom surface of the temporary storage tank is fixedly connected with a pair of cooling seats at the position corresponding to the arc-shaped groove; the cooling seat is matched with the arc-shaped groove, and the inside is embedded with a cooling pipe; when the hydraulic rod drives the connecting seat to descend to the sealing door, the cooling seat at the bottom of the temporary storage tank will be inserted into the opening on the surface of the connecting seat, thereby lifting the substrate from the supporting ring to facilitate the user to take it, and the inside of the cooling seat is embedded with a cooling pipe, which can cool the substrate after it contacts with the cooling seat, thereby avoiding the user from being scalded when taking it, and the rapid cooling of the substrate can make it quickly enter the one-step processing process.

[0015] Preferably, the inner wall of the receiving seat is provided with a plurality of uniformly arranged air injection holes; the inner wall of the temporary storage tank is slidably connected with a gas guide pipe at a side away from the sealing door, and the gas guide pipe is driven by a hydraulic cylinder; the side surface of the receiving seat is provided with an air inlet, and the air inlet is matched with the gas guide pipe; the gas guide pipe is in communication with an external air pumping assembly; the external air pumping assembly is used for pumping pure inert gas into the gas guide pipe; during operation, when the receiving seat is lowered to the sealing door, the gas guide pipe is just aligned with the air inlet on the surface of the receiving seat, then the gas guide pipe is inserted into the air inlet under the drive of the hydraulic cylinder, and inert gas is pumped in, and finally the inert gas is discharged from the air injection holes, thereby cleaning the top surface of the processed substrate, and then the dust-containing gas is pumped away by the suction pipe, so that the surface of the substrate is cleaned to ensure smooth subsequent processing.

[0016] Preferably, the surface of the gas guide pipe in the temporary storage tank is fixedly connected with a sealing film between the inner wall of the temporary storage tank, and the sealing film is elastic; a rubber pad is fixedly connected at the pipe opening of the gas guide pipe, and the cross section of the rubber pad is triangularly arranged; during operation, when the gas guide pipe moves, the sealing film can block the gap between the gas guide pipe and the temporary storage tank, thereby ensuring the sealing property of the temporary storage tank, and at the same time, after the gas guide pipe is inserted into the air inlet, the rubber pad can also fill the gap between the inner wall of the air inlet and the gas guide pipe, thereby reducing gas leakage.

[0017] The beneficial effects of the present application are as follows: 1. The substrate transfer device of the epitaxial furnace, through the cooperation of the tray, the electric push rod, the mechanical arm and the clamping jaw, realizes the clamping and transfer of the substrate, and then the substrate surface is treated by the air injection pipe on the bottom surface of the bottom cover, thereby achieving the effect of cleaning the substrate surface, and the suction of the gas in the transfer box by the arc-shaped groove makes the transfer box not diffuse dust, and the opening of the electric control valve at the through groove makes the silicon carbide particles in the epitaxial wheel body also be sucked into the annular groove, thereby avoiding the particles in the epitaxial wheel body from polluting the substrate, and further ensuring the cleaning effect of the substrate, thereby ensuring the quality of the final product.

[0018] 2. The substrate transfer device of the epitaxial furnace, through the reciprocating sliding tooth plate, the rotating rod engaged with the tooth plate is constantly forward and reverse rotated, thereby constantly swinging the air injection pipe fixedly connected with the rotating rod, so that the inert gas injected by the air injection pipe can constantly sweep the surface of the substrate at different angles, and the dust adhered to the surface of the substrate can be more easily blown away, thereby improving the cleaning effect of the substrate. BRIEF DESCRIPTION OF DRAWINGS

[0019] The present application will be further described below with reference to the drawings.

[0020] Figure 1 is a perspective view of the present application; Figure 2is a sectional view of the top cover in the present application; Figure 3 is a sectional view of the transfer box in the present application; Figure 4 is a structural schematic view of the base in the present application; Figure 5 is a structural schematic view of the partition plate in the present application; Figure 6 is a sectional view of the temporary storage tank in the present application; Figure 7 is a structural schematic view of the cooling seat in the present application; Figure 8 is a structural schematic view of the receiving seat in the present application; Figure 9 is a structural schematic view of the rubber pad in the present application; In the figure: 1, the epitaxial furnace body; 2, the transfer box; 3, the through groove; 4, the tray; 5, the electric push rod; 6, the mechanical arm; 7, the clamping jaw; 8, the top cover; 9, the spray pipe; 10, the arc-shaped groove; 11, the base; 12, the rotating rod; 13, the toothed plate; 14, the sliding groove; 15, the gear one; 6, the gear two; 17, the transmission rod; 18, the gear three; 19, the temporary storage tank; 20, the partition plate; 21, the air extraction pipe; 22, the sealing door; 23, the ejection groove; 24, the baffle; 25, the transmission plate; 26, the driven disc; 27, the hydraulic rod; 28, the receiving seat; 29, the placing groove; 30, the limiting column; 31, the guide groove; 32, the support ring; 33, the support column; 34, the spring; 35, the opening; 36, the cooling seat; 38, the air injection hole; 39, the air guide pipe; 40, the air inlet; 41, the sealing film; 42, the rubber pad. DETAILED DESCRIPTION

[0021] In order to make the technical means, creative features, purposes and effects realized by the present application easy to understand, the present application is further described below in combination with specific embodiments.

[0022] As Figures 1 to 4As shown, the substrate transfer device of the epitaxial furnace comprises an epitaxial furnace body 1; one side of the epitaxial furnace body 1 is fixedly connected with a transfer box 2; the opposite surfaces of the transfer box are both provided with a through groove 3; the through groove 3 is communicated with the epitaxial furnace body 1, and an electric control valve is installed at the connecting position; a tray 4 is rotatably connected in the transfer box 2, and the tray 4 is driven by a servo motor; an electric push rod 5 is embedded at the center of the surface of the tray 4; a mechanical arm 6 is fixedly connected to the telescopic end of the electric push rod 5; a clamping jaw 7 is installed at the execution end of the mechanical arm 6; a top cover 8 is fixedly connected to the top surface of the transfer box 2; a plurality of uniformly arranged spray pipes 9 are installed at the bottom surface of the top cover 8; the spray pipes 9 are connected with an external pump assembly; the external pump assembly pumps pure inert gas into the spray pipes 9 through a gas pump; an arc-shaped groove 10 is formed in the inner wall of the transfer box 2; the arc-shaped groove 10 is connected with an external vacuum pump; during operation, in order to avoid the surface of the substrate from being contaminated by dust during the process of sending the substrate into and out of the epitaxial furnace, thereby affecting the quality of the final product, the embodiment of the present application can be used, first, during the feeding process of the substrate, the cooperation of the tray 4, the electric push rod 5 and the mechanical arm 6 drives the clamping jaw 7 to extend out of the through groove 3 away from the epitaxial furnace body 1, then the clamping jaw 7 clamps the substrate to be processed, and then the mechanical arm 6 drives the clamping jaw 7 and the substrate to return to the inside of the transfer box 2, at this time, the spray pipes 9 at the bottom surface of the top cover 8 spray pure inert gas towards the top surface of the substrate, thereby blowing away the dust adhered to the surface of the substrate, and when the spray pipes 9 spray gas, the external vacuum pump simultaneously sucks the gas in the transfer box 2 through the arc-shaped groove 10, thereby enabling the dust blown up by the inert gas to be discharged to the outside from the arc-shaped groove 10, thereby avoiding the dust from diffusing in the transfer box 2 and then falling back to the surface of the substrate, and when the surface of the substrate is cleaned, the electric control valve no longer closes the through groove 3 between the epitaxial furnace body 1 and the transfer box 2, thereby enabling the mechanical arm 6 and the clamping jaw 7 to send the substrate into the epitaxial furnace body 1, thereby realizing the clamping and transfer of the substrate through the cooperation of the tray 4, the electric push rod 5, the mechanical arm 6 and the clamping jaw 7, and then the spray pipes 9 at the bottom surface of the bottom cover spray gas to the surface of the substrate, thereby achieving the effect of cleaning the surface of the substrate, and the suction of the arc-shaped groove 10 to the gas in the transfer box 2 enables the transfer box 2 to not diffuse dust, and the opening of the electric control valve at the through groove 3 enables the silicon carbide particles in the epitaxial furnace body 1 to also be sucked into the arc-shaped groove 10, thereby avoiding the particles in the epitaxial furnace body 1 from polluting the substrate, and further ensuring the cleaning effect of the substrate, thereby ensuring the quality of the final product.

[0023] As Figures 3 to 4As shown, the top surface of the spray pipe 9 is provided with a base 11; the rotating rod 12 is fixedly connected between the spray pipes 9; the rotating rod 12 rotates on the bottom surface of the base 11; one end of the rotating rod 12 is engagedly connected with a toothed plate 13; the surface of the base 11 is provided with a sliding groove 14 at the corresponding position of the toothed plate 13; the toothed plate 13 is slidingly connected in the sliding groove 14; the top surface of the toothed plate 13 is engagedly connected with a gear one 15; the gear one 15 is rotatably connected on the top surface of the base 11, and the gear one 15 is driven by a servo motor; when the spray pipe 9 needs to clean the surface of the substrate by spraying, the servo motor drives the gear one 15 to rotate forwardly and then reversely, and the rotating angles of the forward rotation and the reverse rotation are the same, and since the gear one 15 is engaged with the toothed plate 13, the toothed plate 13 will reciprocatingly slide in the sliding groove 14 under the driving of the gear one 15, and the reciprocatingly sliding toothed plate 13 will drive the rotating rod 12 engaged with the toothed plate 13 to continuously rotate forwardly and reversely, thereby driving the spray pipe 9 fixedly connected with the rotating rod 12 to continuously swing, so that the inert gas sprayed by the spray pipe 9 can continuously sweep the surface of the substrate at different angles, and the dust adhered to the surface of the substrate can be more easily blown away, thereby improving the cleaning effect of the substrate.

[0024] As shown in Figures 2 to 4 , the side surface of the tray 4 is engagedly connected with a gear two 6; the top surface of the gear two 6 is fixedly connected with a transmission rod 17; the rotating rod 12 is rotatably connected with the inner wall of the transfer box 2; the top surface of the transmission rod 17 is fixedly connected with a gear three 18; the gear three 18 is engagedly connected with the base 11; when the tray 4 drives the electric push rod 5 and the mechanical arm 6 to rotate, the tray 4 will also drive the gear two 6 to synchronously rotate, the rotating gear two 6 will drive the transmission rod 17 to synchronously rotate, and the rotating transmission rod 17 will drive the gear three 18 on the top thereof to rotate, and since the gear three 18 is engagedly connected with the base 11, the base 11 will also synchronously rotate with the gear three 18, thereby driving the spray pipe 9 on the surface of the base 11 to rotate with the rotation of the tray 4, so that after the mechanical arm 6 drives the clamping jaw 7 to retract into the transfer box 2, the spray pipe 9 can always be located on the top surface of the substrate clamped by the clamping jaw 7, and the spray pipe 9 will also be located between the clamping jaws, so that in the process of swinging and spraying the inert gas towards the surface of the substrate, the dust can be blown out from the two clamping jaws 7 with less obstruction, thereby avoiding the accumulation of dust at the connection between the clamping jaw 7 and the mechanical arm 6.

[0025] As shown in Figure 1 , Figure 5 , and Figure 6As shown, a temporary storage tank 19 is fixedly connected to one side of the transfer box 2; the temporary storage tank 19 is connected to the transfer box 2, and the temporary storage tank 19 is adjacent to the epitaxial furnace body 1; the interior of the temporary storage tank 19 is fixedly connected to a partition plate 20; the side surface of the temporary storage tank 19 is fixedly connected to a pair of exhaust pipes 21; the two exhaust pipes 21 are connected to the interior of the temporary storage tank 19, and the two exhaust pipes 21 are respectively located at the top and bottom of the partition plate 20; the exhaust pipes 21 are connected to an external vacuum pump; a sealing door 22 is installed on the side of the temporary storage tank 19 away from the transfer box 2, and the sealing door 22 is located at the bottom of the partition; during operation, when the substrate is still being processed inside the epitaxial furnace body 1, the robot 6 will first transfer the substrate to be processed to the interior of the transfer box 2 through the clamp 7, and then the nozzle 9 will press the surface The surface is cleaned and then placed on the top surface of the partition in the temporary storage tank 19. After the substrate is processed, the electric control valve is opened, and the robot arm 6 drives the clamping to extend into the epitaxial furnace body 1 to clamp the substrate, and then returns to the transfer box 2. After cleaning it through the nozzle 9, the processed substrate is placed at the bottom of the partition in the transfer tank. Then the robot arm 6 sends the substrate to be processed on the top surface of the partition into the epitaxial furnace body 1, and the processed substrate is taken out from the bottom sealing door 22. Since the epitaxial furnace body 1 is still in the process of processing the substrate, the robot arm 6 can prepare for the cleaning of the next substrate in advance, thereby shortening the substrate preparation time and thus improving work efficiency. At the same time, the two exhaust pipes 21 continuously suck the gas in the temporary storage tank 19 to prevent dust in the air from contaminating the substrate in the temporary storage tank 19.

[0026] like Figures 6 to 7 As shown, an ejection groove 23 is provided at the connection between the temporary storage tank 19 and the transfer box 2; a baffle 24 is slidably connected inside the ejection groove 23, and the baffle 24 can seal the connection between the temporary storage tank 19 and the transfer box 2; a transmission plate 25 is fixedly connected to the side of the baffle 24 close to the transfer box 2; a driven disk 26 is fixedly connected to the side surface of the telescopic end of the electric push rod 5; the end of the transmission plate 25 away from the baffle 24 is located at the top of the driven disk 26; the arc groove 10 is located at the driven disk 26 Top; during operation, when the epitaxial furnace body 1 is processing the substrate, and the substrate to be processed is cleaned and placed on the top of the partition, the electric push rod 5 will rise from the driven disk 26, and the driven disk 26 will push the transmission plate 25 to rise, and finally the transmission plate 25 will drive the baffle 24 to rise, so that the baffle 24 can block the connection between the transfer box 2 and the transfer tank, thereby ensuring that the substrate stored in the storage tank can be in a sealed vacuum state, thereby further preventing its surface from being contaminated with dust.

[0027] like Figures 6 to 8As shown, the bottom of the temporary storage tank 19 is inlaid with a hydraulic rod 27; the top surface of the hydraulic rod 27 is fixedly connected with a rotating connection with a receiving seat 28; the top surface of the receiving seat 28 is provided with a placing groove 29; the two sides of the receiving seat 28 are fixedly connected with a limiting column 30; the inner wall of the temporary storage tank 19 is provided with a guide groove 31 at the corresponding position of the limiting column 30; the limiting column 30 is slidingly connected in the guide groove 31; When the mechanical arm 6 needs to put the processed substrate into the temporary storage tank 19, the mechanical arm 6 will put the processed substrate into the placing groove 29 on the surface of the receiving seat 28 to fix the substrate and avoid sliding in the temporary storage tank 19. When the user needs to take out the processed substrate in the receiving seat 28, the user needs to control the hydraulic rod 27 to drive the receiving seat 28 to descend. Because the limiting column 30 on both sides of the receiving seat 28 is slidingly connected in the guide groove 31, the receiving seat 28 will also rotate 180 degrees during the descending process, so that the user can more easily take out the processed substrate from the placing groove 29.

[0028] As shown in Figure 8 , the inner wall of the mounting groove is fixedly connected with a support ring 32; the inner diameter of the support ring 32 is smaller than the diameter of the substrate; the bottom of the mounting groove is slidingly connected with a support column 33 at the center; the support column 33 and the bottom of the mounting groove are fixedly connected with a spring 34; When the mechanical arm 6 places the substrate at the receiving seat 28, the substrate will be placed on the top surface of the support column 33 by the clamping jaw 7 at the execution end of the mechanical arm 6. Then the support column 33 will continuously descend under the action of the gravity of the substrate and compress the spring 34 until the edge of the substrate is placed on the support ring 32, thereby completing the fixation of the substrate. Thus, during the process of placing the substrate, the substrate directly hits the bottom of the placing groove 29, thereby causing damage to the substrate.

[0029] As shown in Figures 6 to 8 , the bottom of the receiving seat 28 is provided with a pair of openings 35, and the openings 35 penetrate the receiving seat 28; the bottom of the temporary storage tank 19 is fixedly connected with a pair of cooling seats 36 at the corresponding position of the arc-shaped groove 10; the cooling seat 36 is matched with the arc-shaped groove 10, and the inside is inlaid with a cooling pipe; When the hydraulic rod 27 drives the receiving seat 28 to descend to the sealing door 22, the cooling seat 36 at the bottom of the temporary storage tank 19 will just insert into the opening 35 on the surface of the receiving seat 28, thereby lifting the substrate from the support ring 32 to facilitate the user to take it, and the inside of the cooling seat 36 is inlaid with a cooling pipe. When the substrate contacts the cooling seat 36, the cooling seat 36 can cool the substrate, thereby avoiding scalding when the user takes it, and the substrate is rapidly cooled, which can make the substrate quickly enter the next processing process.

[0030] As shown in Figures 5 to 8As shown, the inner wall of the receiving seat 28 is provided with a plurality of evenly arranged air injection holes 38; the inner wall of the temporary storage tank 19 is slidingly connected with a gas guide pipe 39 away from one side of the sealing door 22, and the gas guide pipe 39 is driven by a hydraulic cylinder; the side surface of the receiving seat 28 is provided with an air inlet 40, and the air inlet 40 is matched with the gas guide pipe 39; the gas guide pipe 39 is in communication with an external air pumping assembly; the external air pumping assembly is used for introducing pure inert gas into the gas guide pipe 39; when the receiving seat 28 is lowered to the sealing door 22, the gas guide pipe 39 is just aligned with the air inlet 40 on the surface of the receiving seat 28, then the gas guide pipe 39 is inserted into the air inlet 40 under the drive of the hydraulic cylinder, and inert gas is introduced, and finally the inert gas is discharged from the air injection hole 38, thereby cleaning the top surface of the processed substrate, and then the dust-containing gas is sucked away by the suction pipe, so as to clean the surface of the substrate, so as to ensure the smooth processing.

[0031] As shown in Figure 7 and Figure 9 The surface of the gas guide pipe 39 in the temporary storage tank 19 is fixedly connected with a sealing film 41 between the inner wall of the temporary storage tank 19, and the sealing film 41 has elasticity; the pipe opening of the gas guide pipe 39 is fixedly connected with a rubber pad 42, and the cross section of the rubber pad 42 is triangularly arranged; when the gas guide pipe 39 moves, the sealing film 41 can block the gap between the gas guide pipe 39 and the temporary storage tank 19, thereby ensuring the sealing property of the temporary storage tank 19, and at the same time, after the gas guide pipe 39 is inserted into the air inlet 40, the rubber pad 42 can also fill the gap between the inner wall of the air inlet 40 and the gas guide pipe 39, thereby reducing the gas leakage.

[0032] In operation, in order to avoid the substrate surface from being contaminated by dust during the substrate is sent into and out of the epitaxial furnace, which will affect the quality of the final product, the embodiment of the present application is used, first, in the process of loading the substrate, the cooperation of the tray 4, the electric push rod 5 and the mechanical arm 6 drives the clamping jaw 7 to extend from the through slot 3 on the side away from the epitaxial furnace body 1, then the clamping jaw 7 clamps the substrate to be processed, and then the mechanical arm 6 drives the clamping jaw 7 and the substrate to return to the inside of the transfer box 2, at this time the spray pipe 9 on the bottom surface of the top cover 8 sprays pure inert gas towards the top surface of the substrate, thereby blowing away the dust adhered to the surface of the substrate, and when the spray pipe 9 sprays, the external vacuum pump simultaneously sucks the gas in the transfer box 2 through the arc-shaped slot 10, so that the dust blown up by the inert gas can be discharged to the outside from the arc-shaped slot 10, thereby avoiding the dust from diffusing in the transfer box 2 and then falling back to the surface of the substrate, and when the surface of the substrate is cleaned, the electric control valve no longer closes the through slot 3 between the epitaxial furnace body 1 and the transfer box 2, so that the mechanical arm 6 and the clamping jaw 7 can send the substrate into the inside of the epitaxial furnace body 1, thereby realizing the clamping and transfer of the substrate through the cooperation of the tray 4, the electric push rod 5, the mechanical arm 6 and the clamping jaw 7, and then the spray pipe 9 on the bottom surface of the bottom cover sprays the surface of the substrate, thereby achieving the effect of cleaning the surface of the substrate, and the suction of the arc-shaped slot 10 to the gas in the transfer box 2 makes the transfer box 2 not diffuse dust, and the opening of the electric control valve at the through slot 3 makes the silicon carbide particles in the epitaxial furnace body 1 also be sucked into the annular slot 10, thereby avoiding the particles in the epitaxial furnace body 1 from polluting the substrate, and further ensuring the cleaning effect of the substrate, thereby ensuring the quality of the final product.

[0033] When the spray pipe 9 needs to spray and clean the surface of the substrate, the servo motor drives gear one 15 to rotate first, and then reversely, and the rotation angles of the forward and reverse rotations are the same, and since gear one 15 is engaged with the toothed plate 13, the toothed plate 13 reciprocally slides in the sliding groove 14 under the drive of gear one 15, and the reciprocally sliding toothed plate 13 drives the rotating rod 12 engaged with the toothed plate 13 to continuously rotate forward and reversely, thereby driving the spray pipe 9 fixedly connected with the rotating rod 12 to continuously swing, so that the inert gas sprayed by the spray pipe 9 can continuously sweep the surface of the substrate at different angles, so that the dust adhered to the surface of the substrate can be more easily blown away, thereby improving the cleaning effect of the substrate.

[0034] When the tray 4 drives the electric push rod 5 and the mechanical arm 6 to rotate, the tray 4 also drives the gear two 6 to rotate synchronously, and the rotating gear two 6 drives the transmission rod 17 to rotate synchronously, and then the rotating transmission rod 17 drives the gear three 18 at the top of the transmission rod 17 to rotate, and because the gear three 18 is meshed and connected with the base 11, the base 11 also rotates synchronously with the gear three 18, so that the base 11 surface nozzle 9 can rotate with the rotation of the tray 4, so that the mechanical arm 6 can always be in the substrate top surface after the clamping jaw 7 is retracted into the transfer box 2, and the nozzle 9 is also located between the clamping jaws 7, so that the dust can be blown out from the two sides of the clamping jaw 7 with less obstruction during the process of the nozzle 9 swinging and spraying gas to the substrate surface, avoiding the accumulation of dust at the connection between the clamping jaw 7 and the mechanical arm 6.

[0035] When the substrate is still being processed inside the epitaxial furnace body 1, the mechanical arm 6 first transfers the substrate to be processed into the transfer box 2 inside the transfer box 2 by the clamping jaw 7, and then cleans the surface by the nozzle 9, and then puts it into the top surface of the partition plate in the temporary storage tank 19. After the substrate is processed, the electric control valve is opened, the mechanical arm 6 drives the clamping to extend into the epitaxial furnace body 1 to clamp the substrate, and then returns to the transfer box 2, and then cleans it by the nozzle 9, and then puts the processed substrate into the bottom of the partition plate in the temporary storage tank, and then the mechanical arm 6 sends the substrate to be processed on the top surface of the partition plate into the epitaxial furnace body 1, and the processed substrate is taken out from the bottom sealing door 22. Because the mechanical arm 6 can prepare the next substrate cleaning in advance during the process of the epitaxial furnace body 1 processing the substrate, the substrate preparation time is shortened, and the work efficiency is improved, and at the same time, the two air suction pipes 21 continuously suck the gas in the temporary storage tank 19, avoiding the dust in the air from polluting the substrate in the temporary storage tank 19.

[0036] When the epitaxial furnace body 1 is processing the substrate, and the substrate to be processed is cleaned and placed on the top of the partition plate, the electric push rod 5 rises from the driven disc 26, the driven disc 26 pushes the transmission plate 25 to rise, and finally the transmission plate 25 drives the baffle 24 to rise, so that the baffle 24 can block the communication between the transfer box 2 and the temporary storage tank, so as to ensure that the substrate stored in the storage tank can be in a sealed vacuum state, and further avoid the surface from being contaminated by dust.

[0037] When the mechanical arm 6 needs to put the processed substrate into the temporary storage tank 19, the mechanical arm 6 will put the processed substrate into the placing groove 29 on the surface of the receiving seat 28 to fix the substrate to avoid sliding in the temporary storage tank 19, and when the user needs to take out the processed substrate at the receiving seat 28, the user needs to control the hydraulic rod 27 to drive the receiving seat 28 to descend, and because the limiting columns 30 on both sides of the receiving seat 28 are slidingly connected in the guide groove 31, the receiving seat 28 will also rotate 180 degrees in the process of descending, so that the user can more easily take out the processed substrate from the placing groove 29.

[0038] When the mechanical arm 6 places the substrate at the receiving seat 28, the substrate will be placed on the top surface of the supporting column 33 by the clamping jaw 7 at the end of the mechanical arm 6, and then the supporting column 33 will continuously descend under the action of the gravity of the substrate and compress the spring 34 until the edge of the substrate is lapped on the supporting ring 32, thereby completing the fixation of the substrate, so that in the process of placing the substrate by the mechanical arm 6, the substrate directly hits the groove bottom of the placing groove 29, thereby causing damage to the substrate.

[0039] When the hydraulic rod 27 drives the receiving seat 28 to descend to the sealing door 22, the cooling seat 36 at the bottom of the temporary storage tank 19 will just be inserted into the opening 35 on the surface of the receiving seat 28, thereby lifting the substrate from the supporting ring 32 to facilitate the user to take it, and the cooling seat 36 is inlaid with a cooling pipe inside, which can cool the substrate after the substrate contacts the cooling seat 36, thereby avoiding scalding when the user takes it, and the rapid cooling of the substrate can make the substrate quickly enter the next processing process.

[0040] When the receiving seat 28 descends to the sealing door 22, the gas guide pipe 39 is just aligned with the gas inlet 40 on the surface of the receiving seat 28, and then the gas guide pipe 39 is inserted into the gas inlet 40 under the drive of the hydraulic cylinder and inert gas is introduced into the gas guide pipe 39, and finally the inert gas is discharged from the gas injection hole 38, thereby cleaning the top surface of the processed substrate, and then the dust-containing gas is sucked away by the suction pipe, so as to clean the surface of the substrate to ensure the smooth processing thereafter.

[0041] When the gas guide pipe 39 moves, the sealing film 41 can block the gap between the gas guide pipe 39 and the temporary storage tank 19, thereby ensuring the sealing property of the temporary storage tank 19, and after the gas guide pipe 39 is inserted into the gas inlet 40, the rubber pad 42 can also fill the gap between the inner wall of the gas inlet 40 and the gas guide pipe 39, thereby reducing the gas leakage.

[0042] The above shows and describes the basic principles, main features and advantages of the present application. Those skilled in the art should understand that the present application is not limited to the above-mentioned embodiments, and the above-mentioned embodiments and descriptions in the specification are only to illustrate the principles of the present application. Without departing from the spirit and scope of the present application, various changes and improvements can be made to the present application, and these changes and improvements all fall within the scope of the claimed present application. The scope of protection of the present application is defined by the appended claims and their equivalents.

Claims

1. An epitaxial furnace substrate transfer device, characterized in that: It includes an epitaxial furnace body; a transfer box is fixedly connected to one side of the epitaxial furnace body; through grooves are provided on opposite surfaces of the transfer box; the through grooves are connected to the epitaxial furnace body, and an electric control valve is installed at the connection; the interior of the transfer box is rotatably connected to a tray, and the tray is driven by a servo motor; an electric push rod is embedded at the center of the tray surface; the telescopic end of the electric push rod is fixedly connected to a robotic arm; a clamp is installed at the execution end of the robotic arm; the top surface of the transfer box is fixedly connected to a top cover; a plurality of evenly arranged nozzles are installed on the bottom surface of the top cover; the nozzles are connected to an external pump air component; the external pump air component pumps pure inert gas into the nozzle through an air pump; an arc groove is provided on the inner wall of the transfer box; the arc groove is connected to an external vacuum pump.

2. The epitaxial furnace substrate transfer device according to claim 1, characterized in that: A base is provided on the top surface of the nozzle; a rotating rod is commonly fixedly connected between the nozzles in the same row; the rotating rod rotates on the bottom surface of the base; one end of the rotating rod is meshedly connected to a toothed plate; a sliding groove is provided on the surface of the base at a corresponding position of the toothed plate; the toothed plate is slidably connected in the sliding groove; the top surface of the toothed plate is meshedly connected to gear 1; the gear 1 is rotatably connected to the top surface of the base, and gear 1 is driven by a servo motor.

3. The epitaxial furnace substrate transfer device according to claim 2, characterized in that: The side surface of the tray is meshed with gear 2; the top surface of gear 2 is fixedly connected with a transmission rod; the rotating rod is rotatably connected to the inner wall of the transfer box; the top surface of the transmission rod is fixedly connected with gear 3; the gear 3 is meshed with the base.

4. The epitaxial furnace substrate transfer device according to claim 1, characterized in that: A temporary storage tank is fixedly connected to one side of the transfer box; the temporary storage tank is connected to the transfer box, and the temporary storage tank is adjacent to the epitaxial furnace body; a partition plate is fixedly connected to the interior of the temporary storage tank; a pair of exhaust pipes are fixedly connected to the surface of one side of the temporary storage tank; the two exhaust pipes are connected to the interior of the temporary storage tank, and the two exhaust pipes are respectively located at the top and bottom of the partition plate; the exhaust pipes are connected to an external vacuum pump; a sealing door is installed on the side of the temporary storage tank away from the transfer box, and the sealing door is located at the bottom of the partition.

5. The epitaxial furnace substrate transfer device according to claim 4, characterized in that: An ejection groove is provided at the connection between the temporary storage tank and the transfer box; a baffle is slidably connected to the inside of the ejection groove, and the baffle can seal the connection between the temporary storage tank and the transfer box; a transmission plate is fixedly connected to the side of the baffle close to the transfer box; a driven disk is fixedly connected to the side surface of the telescopic end of the electric push rod; the end of the transmission plate away from the baffle is located at the top of the driven disk; the arc-shaped groove is located at the top of the driven disk.

6. The epitaxial furnace substrate transfer device according to claim 5, characterized in that: A hydraulic rod is embedded in the bottom surface of the temporary storage tank; the top surface of the hydraulic rod is fixedly connected to a receiving seat that is rotatably connected; a placement groove is provided on the top surface of the receiving seat; both sides of the receiving seat are fixedly connected to limiting columns; the inner wall of the temporary storage tank is provided with guide grooves at the corresponding positions of the limiting columns; the limiting columns are slidably connected in the guide grooves.

7. The epitaxial furnace substrate transfer device according to claim 6, characterized in that: A support ring is fixedly connected to the inner wall of the mounting groove; the inner diameter of the support ring is smaller than the diameter of the substrate; the bottom of the mounting groove is slidably connected to a support column at the center of the circle; a spring is fixedly connected between the support column and the bottom of the mounting groove.

8. The epitaxial furnace substrate transfer device according to claim 7, characterized in that: A pair of arc-shaped grooves are provided on the bottom surface of the receiving seat, and the arc-shaped grooves pass through the receiving seat; a pair of cooling seats are fixedly connected to the bottom surface of the temporary storage tank at positions corresponding to the arc-shaped grooves; the cooling seats are adapted to the arc-shaped grooves, and cooling pipes are embedded inside.

9. The epitaxial furnace substrate transfer device according to claim 6, characterized in that: The inner wall of the receiving seat is provided with a plurality of evenly arranged air injection holes; an air duct is slidably connected to the side of the inner wall of the temporary storage tank away from the sealing door, and the air duct is driven by a hydraulic cylinder; an air inlet is provided on the side surface of the receiving seat, and the air inlet is adapted to the air duct; the air duct is connected to an external air pump assembly; the external air pump assembly is used to introduce pure inert gas into the air duct.

10. The epitaxial furnace substrate transfer device according to claim 9, characterized in that: A sealing film is fixedly connected between the surface of the air guide pipe in the temporary storage tank and the inner wall of the temporary storage tank, and the sealing film is elastic; a rubber pad is fixedly connected to the pipe mouth of the air guide pipe, and the cross section of the rubber pad is triangular.

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