Diverter with double-valuing structure and preparation and use method thereof

Abstract

The invention discloses a shunt with a dual-valuing structure and a preparation and use method thereof. The device comprises a first red copper plate, a first manganese copper plate, a second red copper plate, a second manganese copper plate and a third red copper plate which are connected in sequence, wherein the first red copper plate and the third red copper plate are provided with wiring holes; two first binding posts are arranged on the first red copper plate and the second red copper plate close to the first manganese-copper plate; the preparation method comprises the following steps: processing five base materials, and firstly welding the first red copper plate, the first manganese copper plate and the second red copper plate to form a first intermediate plate; welding a second manganese-copper plate and a third red copper plate to form a second intermediate plate; and then welding the two intermediate plates, and finally welding a binding post and adjusting the resistance. The application method comprises the following steps: accessing load current, respectively measuring voltage from the first binding post and the second binding post, respectively calculating current according to the resistance of the first manganese copper plate and the second manganese copper plate, and taking the average value of the current as a final current value. According to the invention, redundant backup and error calibration are realized through a double-manganese-copper design.

Description

Technical Field

[0001] The invention relates to a shunt with a dual-value structure and a preparation and use method thereof. Background Art

[0002] Shunts are essential components in intelligent circuit breakers, power supplies, disconnect switches, and test instruments. Their mechanical structure, as described in Chinese patent CN208270633U, typically uses a manganese copper plate as the resistor material. Copper plates are welded to either side of the plate to connect the current, and sampling is performed near the plate. Existing shunts have two drawbacks. First, existing shunts consist of only one section of manganese copper, with only a pair of sampling points on either side. This lacks redundancy, and the terminal blocks serving as voltage sampling points are susceptible to damage after prolonged use, rendering the shunt inoperable. Second, the single voltage sampling point prevents additional verification, leading to system errors that cannot be mitigated. Summary of the Invention

[0003] The first technical problem to be solved by the present invention is to provide a shunt with a dual-value structure. The shunt adopts a dual manganese copper design, and each manganese copper area is provided with a corresponding sampling terminal. It can not only provide redundancy for terminal damage, but also use the two manganese copper areas to verify each other and take the average to reduce accidental errors and narrow system errors.

[0004] The second technical problem to be solved by the present invention is to provide a method for preparing the above-mentioned shunt with a dual-value structure, which has simple steps, convenient processing, good welding effect and high yield.

[0005] The third technical problem to be solved by the present invention is to provide a method for using the above-mentioned shunt with a dual-value structure, which is easy to operate and has accurate measurement.

[0006] In order to solve the first technical problem mentioned above, the present invention provides a shunt with a dual-value structure, including a first copper plate, a first manganese copper plate, a second copper plate, a second manganese copper plate, and a third copper plate, which are arranged horizontally and connected in sequence from left to right and are all rectangular. The three copper plates and the two manganese copper plates are flush with each other front and back. Load wiring holes are provided on the left side of the first copper plate and the right side of the third copper plate. Two vertically arranged first binding posts are provided near the first manganese copper plate on the first copper plate and the second copper plate. The two first binding posts are symmetrically arranged on the left and right sides of the first manganese copper plate. Two vertically arranged second binding posts are provided near the second manganese copper plate on the second copper plate and the third copper plate. The two second binding posts are symmetrically arranged on the left and right sides of the second manganese copper plate, and the central axes of the four binding posts share a vertical plane running left and right.

[0007] For the purpose of simple explanation, the splitter with a dual-value structure described in the present invention is referred to as the present splitter for short.

[0008] This shunt adopts a dual manganese copper design. Each manganese copper area is equipped with a corresponding sampling terminal. When one set of terminals is damaged, the other set of terminals can still correctly sample and obtain data. This not only provides redundancy for terminal damage, but also uses the two manganese copper areas to verify each other and take the average to reduce accidental errors and narrow system errors.

[0009] To solve the second technical problem mentioned above, the present invention provides a method for preparing a shunt with a dual-value structure, comprising the following steps:

[0010] (1) First, five base materials, namely, a first copper plate, a first manganese copper plate, a second copper plate, a second manganese copper plate, and a third copper plate, are processed according to the specifications;

[0011] (2) The first copper plate, the first manganese copper plate, and the second copper plate are sequentially electron beam welded and flattened to form a first intermediate plate;

[0012] (3) The second manganese copper plate and the third copper plate are electron beam welded and flattened to form a second intermediate plate;

[0013] (4) The second copper plate on the first middle plate and the second manganese copper plate on the second middle plate are electron beam welded, and finally the terminals are welded to the corresponding positions of the three copper plates, and the resistance is adjusted as needed.

[0014] The preparation method of the diverter is simple in steps and easy to process. It is divided into two parts and welded separately to form an intermediate plate and then combined. The welding effect is good, deformation and bending are not easy to occur, and the yield rate is high.

[0015] To solve the third technical problem, the present invention provides a method for using a splitter with a dual-value structure, comprising the following steps:

[0016] (1) Connect the load current to the load interface at both ends of the shunt;

[0017] (2) Measure the voltage at the two first terminals, and then calculate the current passing through the shunt based on the resistance parameters of the first manganese copper plate, which is recorded as A1;

[0018] (3) Measure the voltage at the two first terminals, and then calculate the current passing through the shunt based on the resistance parameters of the second manganese copper plate, which is recorded as A2;

[0019] (4) Take the average value of A1 and A2, which is the final value of the current passing through the shunt.

[0020] The method for using the shunt is easy to operate and has accurate measurement. It utilizes two manganese copper areas to verify each other and take the average value to reduce accidental errors and narrow systematic errors. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a structural diagram of this diverter. DETAILED DESCRIPTION

[0022] See also Figure 1 A shunt with a dual-value structure includes a first copper plate 1, a first manganese copper plate 2, a second copper plate 3, a second manganese copper plate 4, and a third copper plate 5 which are arranged horizontally and connected in sequence from left to right and are all rectangular (the width of the first manganese copper plate 2 is greater than the width of the second manganese copper plate 4). The three copper plates and the two manganese copper plates are flush with each other front and back. A load wiring hole 6 is provided on the left side of the first copper plate 1 and the right side of the third copper plate 5. Two vertically arranged first binding posts 7 are provided near the first manganese copper plate 2 on the first copper plate 1 and the second copper plate 3. The two first binding posts 7 are symmetrically arranged on both sides of the first manganese copper plate 2. Two vertically arranged second binding posts 8 are provided near the second manganese copper plate 4 on the second copper plate 3 and the third copper plate 5. The two second binding posts 8 are symmetrically arranged on both sides of the second manganese copper plate 4, and the central axes of the four binding posts share a vertical plane running left and right.

[0023] A method for preparing a splitter with a dual-value structure comprises the following steps:

[0024] (1) First, five base materials, namely, a first copper plate 1, a first manganese copper plate 2, a second copper plate 3, a second manganese copper plate 4, and a third copper plate 5, are processed according to the specifications;

[0025] (2) The first copper plate 1, the first manganese copper plate 2, and the second copper plate 3 are sequentially electron beam welded and flattened to form a first intermediate plate;

[0026] (3) The second manganese copper plate 4 and the third copper plate 5 are electron beam welded and flattened to form a second intermediate plate;

[0027] (4) The second copper plate 3 on the first middle plate and the second manganese copper plate 4 on the second middle plate are electron beam welded, and finally the terminals are welded at the corresponding positions of the three copper plates, and the resistance is adjusted as needed.

[0028] The preparation method of the diverter is simple in steps and easy to process. It is divided into two parts and welded separately to form an intermediate plate and then combined. The welding effect is good, deformation and bending are not easy to occur, and the yield rate is high.

[0029] A method for using a splitter with a dual-value structure, comprising the following steps:

[0030] (1) Connect the load current to the load interface at both ends of the shunt;

[0031] (2) Measure the voltage at the two first terminals 7, and then calculate the current passing through the shunt based on the resistance parameter of the first manganese copper plate 2, which is recorded as A1;

[0032] (3) Measure the voltage at the two first terminals 7, and then calculate the current passing through the shunt based on the resistance parameter of the second manganese copper plate 4, which is recorded as A2;

[0033] (4) Take the average value of A1 and A2, which is the final value of the current passing through the shunt.

Claims

1. A shunt with a dual-value structure, characterized in that: It includes a first copper plate, a first manganese copper plate, a second copper plate, a second manganese copper plate, and a third copper plate which are arranged horizontally and connected in sequence from left to right and are all rectangular. The three copper plates and the two manganese copper plates are flush with each other front to back. Load wiring holes are provided on the left side of the first copper plate and the right side of the third copper plate. Two vertically arranged first binding posts are provided on the first copper plate and the second copper plate near the first manganese copper plate. The two first binding posts are symmetrically arranged on the left and right sides of the first manganese copper plate. Two vertically arranged second binding posts are provided on the second copper plate and the third copper plate near the second manganese copper plate. The two second binding posts are symmetrically arranged on the left and right sides of the second manganese copper plate, and the central axes of the four binding posts share a vertical plane running left and right.

2. The method for preparing a shunt with a dual-value structure according to claim 1, characterized in that: The following steps are involved: (1) First, five base materials, namely, a first copper plate, a first manganese copper plate, a second copper plate, a second manganese copper plate, and a third copper plate, are processed according to the specifications; (2) The first copper plate, the first manganese copper plate, and the second copper plate are sequentially electron beam welded and flattened to form a first intermediate plate; (3) The second manganese copper plate and the third copper plate are electron beam welded and flattened to form a second intermediate plate; (4) The second copper plate on the first middle plate and the second manganese copper plate on the second middle plate are electron beam welded, and finally the terminals are welded to the corresponding positions of the three copper plates, and the resistance is adjusted as needed.

3. The method for using a dual-value structure splitter according to claim 1, characterized in that: The following steps are involved: (1) Connect the load current to the load interface at both ends of the shunt; (2) Measure the voltage at the two first terminals, and then calculate the current passing through the shunt based on the resistance parameters of the first manganese copper plate, which is recorded as A1; (3) Measure the voltage at the two first terminals, and then calculate the current passing through the shunt based on the resistance parameters of the second manganese copper plate, which is recorded as A2; (4) Take the average value of A1 and A2, which is the final value of the current passing through the shunt.

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