Display panel and display device

Abstract

The invention discloses a display panel and a display device. The display panel comprises a substrate, a planarization layer, a first passivation layer, a second passivation layer and an electrode layer, the planarization layer is located on one side of the substrate, the first passivation layer is located on the surface of the side, away from the substrate, of the planarization layer, the second passivation layer is located on the side, away from the substrate, of the first passivation layer, and the electrode layer is located on the side, away from the substrate, of the second passivation layer; the electrode layer comprises a plurality of electrode arrangement areas arranged in an array and non-electrode arrangement areas located between the electrode arrangement areas. The second passivation layer comprises an opening structure or a grooving structure and a second passivation structure surrounding the opening structure or the grooving structure; in the thickness direction of the display panel, the opening structure or the grooving structure is overlapped with at least part of the non-electrode arrangement area; the display panel further comprises a plurality of through holes which are located in the opening structure or the grooving structure and at least penetrate through the first passivation layer.

Description

Technical Field

[0001] The present invention relates to the field of display, and in particular to a display panel and a display device. Background Art

[0002] The manufacturing process of display panels includes high-temperature processes. Some film layers within the display panel are prone to releasing gas under high temperature and other process conditions. If the gas cannot be discharged in time, it will affect other film layers within the display panel, thereby affecting the display effect of the display panel. Summary of the Invention

[0003] The present invention provides a display panel and a display device to solve the problem that gas released from a part of a film layer of the display panel cannot be discharged in time.

[0004] In a first aspect, the present invention provides a display panel, comprising: a base substrate, a planarization layer, a first passivation layer, a second passivation layer, and an electrode layer;

[0005] A planarization layer is located on one side of the base substrate, a first passivation layer is located on a surface of the planarization layer facing away from the base substrate, a second passivation layer is located on a side of the first passivation layer facing away from the base substrate, and an electrode layer is located on a side of the second passivation layer facing away from the base substrate; the electrode layer includes a plurality of electrode arrangement areas arranged in an array and a non-electrode arrangement area located between the electrode arrangement areas; the second passivation layer includes an opening structure or a groove structure, and a second passivation structure surrounding the opening structure or the groove structure; in the thickness direction of the display panel, the opening structure or the groove structure overlaps with at least a portion of the non-electrode arrangement area;

[0006] The display panel further includes a plurality of through holes located in the opening structure or the groove structure and penetrating at least the first passivation layer.

[0007] In a second aspect, the present invention provides a display device comprising the display panel of the present invention.

[0008] The display panel provided by the present invention includes: a base substrate, a planarization layer, a first passivation layer, a second passivation layer and an electrode layer; the planarization layer is located on one side of the base substrate, the first passivation layer is located on the surface of the planarization layer facing away from the base substrate, the second passivation layer is located on the side of the first passivation layer facing away from the base substrate, and the electrode layer is located on the side of the second passivation layer facing away from the base substrate; the electrode layer includes a plurality of electrode setting areas arranged in an array and non-electrode setting areas located between the electrode setting areas; the second passivation layer includes an opening structure or a groove structure, and a second passivation structure surrounding the opening structure or the groove structure; in the thickness direction of the display panel, the opening structure or the groove structure overlaps with at least part of the non-electrode setting area; the display panel also includes a plurality of through holes located in the opening structure or the groove structure and penetrating at least the first passivation layer. The present invention provides an opening structure or a groove structure on the second passivation layer in contact with the planarization layer, and provides a plurality of through holes on the first passivation layer located in the opening structure or the groove structure so that the gas generated by the planarization layer can be released through the through holes in the first passivation layer, thereby preventing the gas generated by the planarization layer from being retained between the first passivation layer and the planarization layer and causing the film layer to peel off or bulge, thereby improving the flatness of the film layer inside the display panel, thereby enhancing the ability of the display panel to resist high temperature and high humidity, and improving the display effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0009] Figure 1 A schematic structural diagram of a display panel provided by the present invention;

[0010] Figure 2 A schematic structural diagram of a display panel provided by the present invention;

[0011] Figure 3 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0012] Figure 4 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0013] Figure 5 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0014] Figure 6 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0015] Figure 7 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0016] Figure 8 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0017] Figure 9A schematic diagram of a partial top view of the final display panel provided by the present invention;

[0018] Figure 10 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0019] Figure 11 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0020] Figure 12 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0021] Figure 13 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0022] Figure 14 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0023] Figure 15 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0024] Figure 16 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0025] Figure 17 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0026] Figure 18 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0027] Figure 19 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0028] Figure 20 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0029] Figure 21 A schematic structural diagram of a display panel provided by the present invention;

[0030] Figure 22 A schematic structural diagram of a display panel provided by the present invention;

[0031] Figure 23 A schematic structural diagram of a display panel provided by the present invention;

[0032] Figure 24 A schematic diagram of a partial top view of the structure of a display panel provided by the present invention

[0033] Figure 25A schematic diagram of a partial top view of the structure of a display panel provided by the present invention;

[0034] Figure 26 A schematic structural diagram of a display panel provided by the present invention;

[0035] Figure 27 A schematic structural diagram of a display panel provided by the present invention;

[0036] Figure 28 A schematic structural diagram of a display panel provided by the present invention;

[0037] Figure 29 A schematic structural diagram of a display panel provided by the present invention;

[0038] Figure 30 A schematic structural diagram of a display panel provided by the present invention;

[0039] Figure 31 A schematic structural diagram of a display panel provided by the present invention;

[0040] Figure 32 A schematic diagram of the structure of a pixel in a display panel provided by the present invention;

[0041] Figure 33 This is a structural schematic diagram of a display device provided by the present invention. DETAILED DESCRIPTION

[0042] The present invention will be further described in detail below with reference to the accompanying drawings and examples. It will be understood that the specific embodiments described herein are intended only to illustrate the present invention and are not intended to limit the present invention. It should also be noted that, for ease of description, the accompanying drawings only illustrate portions relevant to the present invention, not all structures.

[0043] Figure 1 A schematic structural diagram of a display panel provided by the present invention is shown in FIG. Figure 2 A schematic diagram of the structure of a display panel provided by the present invention, referring to Figure 1 and Figure 2The display panel 100 includes a base substrate 10, a planarization layer 20, a first passivation layer 31, a second passivation layer 32, and an electrode layer 40. The planarization layer 20 is located on one side of the base substrate 10, the first passivation layer 31 is located on the surface of the planarization layer 20 facing away from the base substrate 10, the second passivation layer 32 is located on the side of the first passivation layer 31 facing away from the base substrate 10, and the electrode layer 40 is located on the side of the second passivation layer 32 facing away from the base substrate 10. The electrode layer 40 includes a plurality of electrode arrangement areas 41 arranged in an array and non-electrode arrangement areas 42 located between the electrode arrangement areas 41. The second passivation layer 32 includes an opening structure 321 or a groove structure 322, and a second passivation structure 323 surrounding the opening structure 321 or the groove structure 322; in the thickness direction Z of the display panel 100, the opening structure 321 or the groove structure 322 overlaps with at least a portion of the non-electrode arrangement area 42. The display panel 100 further includes a plurality of via holes located in the opening structure 321 or the groove structure 322 and penetrating at least the first passivation layer 31 .

[0044] It should be noted that, for the convenience of description, the driving circuit layer is omitted in the diagram of the display panel film layer provided in the embodiment of the present invention.

[0045] Optionally, the base substrate 10 may be a flexible base substrate or a rigid base substrate. The flexible base substrate may include a flexible organic material layer such as PI or PET, so that the base substrate 10 has the characteristics of being bendable and rollable; the rigid base substrate may include a hard inorganic material layer such as glass, so that the base substrate 10 has sufficiently strong supporting capabilities. The material of the planarization layer 02 includes, but is not limited to, organic insulating materials such as acrylic resin, epoxy resin, phenolic resin, polyamide resin, and polyimide resin. The materials of the first passivation layer 31 and the second passivation layer 32 include, but are not limited to, aluminum oxide, silicon dioxide, silicon nitride, etc. The electrode layer 40 includes a conductive oxide material such as indium tin oxide (ITO) or indium zinc oxide (IZO).

[0046] The display panel 100 can be a self-luminous display panel or a non-self-luminous display panel. When the display panel is a self-luminous display panel, the electrode layer 40 may include an anode or a cathode. When the display panel is a non-self-luminous display panel, the electrode layer 40 may include a pixel electrode or a common electrode. For ease of description, this embodiment uses a liquid crystal display panel as an example. The display panel 100 may also include a drive circuit located on one side of the base substrate 10. The drive circuit includes active devices such as transistors and / or passive devices such as resistors, capacitors, and inductors. The devices in the drive circuit can be formed through processes such as etching and patterning. After formation, the side of the drive circuit facing away from the base substrate 10 may have pits or protrusions. Therefore, the present invention provides a planarization layer 20. When the surface of the drive circuit facing away from the base substrate 10 is uneven, the planarization layer 20 is covered to make the surface of the planarization layer 20 facing away from the base substrate 10 smooth, facilitating the subsequent preparation of subsequent film layers on the planarization layer 10 and improving the flatness of the subsequent film layers.

[0047] In the thickness direction Z of the display panel 100, the opening structure 321 or the groove structure 323 does not overlap with the electrode setting area 41, thereby preventing the gas released from the opening structure 321 or the groove structure 323 from affecting the electrodes in the electrode setting area 41, ensuring the working reliability of the electrodes in the electrode setting area 41, and thus improving the display effect of the display panel 100. The opening structure 321 or the groove structure 322 overlaps with at least a portion of the non-electrode setting area 42. The opening structure 321 or the groove structure 322 may overlap with a portion of the non-electrode setting area 42, or may overlap with all of the non-electrode setting area 42. The arrangement can be based on actual needs and is not specifically limited here.

[0048] Specifically, when the display panel 100 enters a high-temperature process, the organic insulating material of the planarization layer 20 easily releases gas under high-temperature conditions. No second passivation material is provided at the opening structure 321, and the thickness of the second passivation material at the groove structure 322 is less than the thickness of the second passivation material at the second passivation structure 323. Therefore, the gas barrier capability of the second passivation material at the opening structure 321 and the groove structure 322 is less than the gas barrier capability of the second passivation material at the second passivation structure 323. Therefore, the present solution provides a plurality of vias that penetrate at least the first passivation layer 31 in the opening structure 321 or the groove structure 322 of the second passivation layer 32, so that when gas is generated in the planarization layer 20, the gas can be released toward the side away from the base substrate 10 through the vias, thereby preventing the gas from staying between the planarization layer 20 and the first passivation layer 31, thereby preventing bulging between the film layers and causing adjacent film layers to peel off, thereby improving the flatness and display effect of the display panel 100.

[0049] It should be noted that the aperture and number of through holes via are related to the size of the opening structure 321 or the groove structure 322. The larger the size of the opening structure 321 or the groove structure 322, the more through holes via can be set under the premise that the aperture of the through hole via is constant. It can be set according to actual needs and is not specifically limited here.

[0050] The technical solution of the present invention is to set a plurality of through holes that penetrate at least the first passivation layer in the opening structure or the groove structure of the second passivation layer overlapping with at least part of the non-electrode setting area, so that when the display panel performs the process steps of the high-temperature process, the gas released by the material of the planarization layer in the high-temperature environment can be released through the through holes in the first passivation layer, thereby preventing the gas generated by the planarization layer from remaining between the first passivation layer and the planarization layer, causing the film layer to peel off or bulge, thereby improving the flatness and display effect of the film layer inside the display panel.

[0051] Optional, Figure 3 A schematic diagram of a partial top view of a display panel provided by the present invention is shown in FIG. Figure 3 As shown, the display panel 100 further includes a plurality of metal traces 50 arranged along a first direction X and extending along a second direction Y; the first direction X intersects the second direction Y; the first direction X is the row direction of the electrode setting area 41; the metal traces 50 are located in the non-electrode setting area 42 between two adjacent electrode setting areas 41; and in the thickness direction of the display panel 100, the via holes and the metal traces 50 do not overlap.

[0052] The material of the metal trace 50 includes conductive materials such as Al, Mo, Ti, and Ta, and can be set according to actual needs.

[0053] Specifically, the electrode arrangement area 41 and the non-electrode arrangement area 42 are arranged in a spaced relationship along the first direction X and the second direction Y, respectively. The electrode arrangement area 41 is provided with an electrode structure. By arranging the metal traces 50 in the non-electrode arrangement area 42, this prevents the metal traces 50 from overlapping with the electrode structure in the electrode arrangement area 41 to form parasitic capacitance. This prevents the electrode structure from being susceptible to interference from signals on the metal traces, leading to grayscale distortion and other issues, thereby improving the display quality of the display panel. The metal traces 50 include data traces or touch traces, and can transmit electrical signals to the electrodes in the electrode arrangement area 41 or provide electrical signals to other circuit structures in the display panel 100 to drive the display panel 100 to display and emit light. If the through-holes (vias) overlap with the metal traces 50 in the thickness direction of the display panel 100, the metal traces 50 that overlap with the through-holes will be exposed when the metal traces 50 are located between the first passivation layer 31 and the planarization layer 20. During the subsequent film preparation process, moisture and other factors in the preparation environment may corrode the metal traces 50, thereby affecting the connection reliability of the metal traces 50. Therefore, by ensuring that the through-holes (vias) do not overlap with the metal traces 50, the metal traces 50 are protected and the transmission reliability and stability of the metal traces 50 are improved.

[0054] Optional, Figure 4 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 5 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 6 This is a partial top view structural diagram of a display panel provided by the present invention, referring to Figures 4 to 6 The electrode layer 40 includes a pixel electrode layer; the metal trace 50 includes a first metal trace 51 and a second metal trace 52; the second metal trace 52 is a floating electrode. The non-electrode setting area 42 includes a first non-electrode setting area 421 and / or a second non-electrode setting area 422; the first non-electrode setting area 421 is located between two adjacent electrode setting areas 41 in the same row and is not provided with a metal trace 50. The second non-electrode setting area 422 is located between two adjacent electrode setting areas 41 in the same row and is provided with a second metal trace 52; the non-electrode setting area 42 also includes a third non-electrode setting area 423, which is located between two adjacent electrode setting areas 41 in the same row and is provided with a first metal trace 51; in the thickness direction Z of the display panel 100, the opening structure 321 or the groove structure 322 overlaps with at least one of the first non-electrode setting area 421 and the second non-electrode setting area 422, and the second passivation structure 323 overlaps with the third non-electrode setting area 423.

[0055] The through hole via includes a first through hole via1 ; in the thickness direction Z of the display panel 100 , the first through hole via1 overlaps with the first non-electrode arrangement area 421 , and / or the first through hole via1 overlaps with the second non-electrode arrangement area 422 .

[0056] It is understandable that when the electrode layer 40 includes a pixel electrode layer, a pixel electrode may be provided in the electrode setting area 41, and the material of the pixel electrode may be a transparent conductive material such as ITO or aluminum-doped zinc oxide (AZO) to improve the transmittance of the light beam. The display panel 100 also includes a common electrode, which may be located between the first passivation layer 31 and the second passivation layer 32. In the thickness direction Z of the display panel 100, the opening structure 321 or the groove structure 322 may also overlap with part of the common electrode. The pixel electrode and the common electrode may be respectively provided on both sides of the liquid crystal layer, and the pixel electrode may form a vertical electric field with the common electrode to control the tilt angle of the liquid crystal molecules. Alternatively, the pixel electrode and the common electrode may be both provided on the same side of the liquid crystal layer to generate a lateral electric field to control the twist angle of the liquid crystal molecules in the horizontal direction to control the transmittance of light, so that the display panel 100 can present a colorful display screen.

[0057] The first metal trace 51 is used to receive and transmit effective electrical signals, and the second metal trace 52 is a floating electrode. The floating electrode is usually not directly connected to the effective electrical signal, so the second metal trace 52 does not participate in the transmission of the effective electrical signal. The materials of the first metal trace 51 and the second metal trace 52 can be the same or different and can be set according to actual needs. In an optional embodiment, if Figure 5 As shown, the first metal trace 51 and the second metal trace 52 are made of the same material and are provided in the same layer, so that the first metal trace 51 and the second metal trace 52 can be formed in the same process, simplifying the process of the display panel.

[0058] It can also be understood that in the thickness direction Z of the display panel 100, the opening structure 321 or the groove structure 322 overlaps with at least one of the first non-electrode setting area 421 and the second non-electrode setting area 422. Specifically, when the display panel 100 only includes the first non-electrode setting area 421 and the third non-electrode setting area 423, the opening structure 321 or the groove structure 322 overlaps with the first non-electrode setting area 421; when the display panel 100 only includes the second non-electrode setting area 422 and the third non-electrode setting area 423, the opening structure 321 or the groove structure 322 overlaps with the second non-electrode setting area 422; when the display panel 100 includes the first non-electrode setting area 421, the second non-electrode setting area 422 and the third non-electrode setting area 423, the opening structure 321 or the groove structure 322 can overlap with the first non-electrode setting area 421 and the second non-electrode setting area 422, respectively.

[0059] When the non-electrode setting area 42 includes a second non-electrode setting area 422 and a third non-electrode setting area 423, a second metal trace 52 is set in the second non-electrode setting area 422. Therefore, in the first direction X, a first metal trace 51 or a second metal trace 52 is set between any two adjacent electrode setting areas 41, which can balance the material stress during etching or plating and improve the uniformity of film preparation.

[0060] When the non-electrode setting area 42 also includes a first non-electrode setting area 421 where no metal wiring is set and a second non-electrode setting area 422 where a second metal wiring 52 with a floating electrode is set, by setting an opening structure 321 or a groove structure 322 that overlaps with the first non-electrode setting area 421 and the second non-electrode setting area 422, the first metal wiring 51 or other wiring that transmits electrical signals will not be affected.

[0061] Correspondingly, a first metal trace 51 for transmitting electrical signals is provided in the third non-electrode setting area 423. The opening structure 321 or the groove structure 322 is not overlapped with the third non-electrode setting area 423. Instead, the second passivation structure 323 is overlapped with the third non-electrode setting area 423 to protect the first metal trace 51 in the third non-electrode setting area 423, to avoid the opening structure 321 exposing the first metal trace 51 to the outside, or the second passivation material at the groove structure 322 is thin and cannot better protect the first metal trace 51. Therefore, a second passivation structure 323 is provided in the third non-electrode setting area 423 to protect the first metal trace 51, improve the reliability of the electrical signal transmission of the first metal trace 51, and improve the display effect of the display panel 100.

[0062] Specifically, by arranging the first via 1 to overlap the first non-electrode arrangement area 421 and / or the second non-electrode arrangement area 422, since the first non-electrode arrangement area 421 is not provided with a metal trace, the first via 1 overlapping the first non-electrode arrangement area 421 can be provided with a larger size, thereby improving gas release efficiency. Accordingly, the second metal trace 52 provided in the second non-electrode arrangement area 422 is a floating electrode, so the second metal trace 52 can be provided with a smaller width. This allows the first via 1 overlapping the second non-electrode arrangement area 422 to have a larger arrangement area, thereby increasing the overall size of the first via 1 in the area overlapping the second non-electrode arrangement area 422 and improving gas release efficiency.

[0063] It should be noted that the above description only takes the example of the through hole via including the first through hole via1 overlapping the first non-electrode setting area 421 and / or the second non-electrode setting area 422. In the embodiment of the present invention, the through hole via can also include through holes set at other positions, which can be designed according to actual needs, and the embodiment of the present invention does not make specific limitations on this.

[0064] In an optional embodiment, Figure 7 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 8 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 9 This is a partial top view of the final display panel provided by the present invention, refer to Figure 7-Figure 9 , the through hole via further includes a second through hole via2 ; in the thickness direction of the display panel 100 , the second through hole via2 overlaps with the third non-electrode arrangement area 423 .

[0065] Specifically, by setting a first through hole via1 overlapping with the first non-electrode setting area 421 and / or the second non-electrode setting area 422, and a second through hole via2 overlapping with the third non-electrode setting area 423, the gas generated by the planarization layer 30 can not only be released through the first through hole via1, but also before preparing the second passivation layer 32, the gas generated by the planarization layer 20 overlapping with the third non-electrode setting area 423 can be released through the second through hole via2, so as to increase the gas release rate and release completeness, reduce the gas retention amount in the display panel 100, avoid the problem of film bulging caused by gas retention inside the display panel 100, and improve the film flatness and preparation reliability of the display panel 100.

[0066] It should be noted that when the through hole via overlaps with the first non-electrode setting area 421, the second non-electrode setting area 422 and the third non-electrode setting area 423, the relative position relationship between the second metal wire 52 set in the second non-electrode setting area 422 and the first metal routing 51 set in the third non-electrode setting area 423 and the through hole via can be set according to actual needs. No specific limitation is made here. The following only uses a typical example to illustrate the position relationship between the through hole via and the first metal routing 51 and the second metal routing 52.

[0067] Optional, Figure 10 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 11 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 12 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 13 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 14 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 15 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 16 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 17 This is a partial top view structural diagram of a display panel provided by the present invention, referring to Figures 7 to 15 When the first through hole via1 is located in the second non-electrode setting area 422, along the first direction X, the first through hole via1 is located on at least one side of the second metal trace 52, and / or, along the first direction X, the second through hole via2 is located on at least one side of the first metal trace 51.

[0068] Specifically, Figures 10 to 13 It shows that the first vias via1 are all located on one side of the second metal trace 52, and the second vias via2 are all located on one side of the first metal trace 51; Figures 14 and 15 It shows that the first through hole via1 is located on both sides of the second metal trace 52, and the second through hole via2 is located on one side of the first metal trace 51; Figures 16 and 17 It shows that the first through hole via1 is located on one side of the second metal trace 52, and the second through hole via2 is located on both sides of the first metal trace 51; Figures 7 to 9The figure shows that the first via 1 is located on both sides of the second metal trace 52, and the second via 2 is located on both sides of the first metal trace 51. Thus, before the first via 1 and the second via 2 are provided, if the first passivation layer on the side of the second metal trace 52 is severely bulged, the first via 1 is provided only on one side of the second metal layer 52. If the first passivation layer on both sides of the second metal trace 52 is severely bulged, the first via 1 is provided on both sides of the second metal trace 52 to ensure gas release and improve the flatness of the film. Correspondingly, if the first passivation layer on the side of the first metal trace 51 is severely bulged, the second via 2 is provided only on one side of the first metal trace 51. If the first passivation layer on both sides of the first metal trace 51 is severely bulged, the second via 2 is provided on both sides of the first metal trace 51 to ensure gas release and improve the flatness of the film.

[0069] In other optional embodiments, the position of the second through hole via2 relative to the first metal trace 51 can be determined based on the distance between the first metal trace 51 and the adjacent electrode setting area 41, and the position of the first through hole via1 relative to the second metal trace 52 can be determined based on the distance between the second metal trace 52 and the adjacent electrode setting area 41. Figure 18 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 19 This is a schematic diagram of a partial top view of the structure of a display panel provided by the present invention. Figure 20 This is a partial top view structural diagram of a display panel provided by the present invention, referring to Figures 18 to 20 When the first via1 is located in the second non-electrode arrangement area 422 and the first via1 is located on one side of the second metal trace 52, along the first direction X, the shortest spacing between the second metal trace 52 and the electrode arrangement area 41 located on the side of the first via1 facing away from the second metal trace 52 is d1, and the shortest spacing between the second metal trace 52 and the electrode arrangement area 41 located on the side of the second metal trace 52 facing away from the first via1 is d2; wherein d1>d2. And / or, when the second via2 is located on one side of the first metal trace 51, along the first direction X, the shortest spacing between the first metal trace 51 and the electrode arrangement area 41 located on the side of the second via2 facing away from the first metal trace 51 is d3, and the shortest spacing between the first metal trace 51 and the electrode arrangement area 41 located on the side of the first metal trace 51 facing away from the second via2 is d4; wherein d3>d4.

[0070] Specifically, along the first direction X, when the shortest distance d1 between the second metal routing 52 and the electrode setting area 41 located on the side of the first through hole via1 away from the second metal routing 52 is greater than the shortest distance d2 between the second metal routing 52 and the electrode setting area 41 located on the side of the second metal routing 52 away from the first through hole via1, it means that the distance between the second metal routing 52 and the electrode setting area 41 located between the first through hole via1 and the second metal routing 52 is large. Therefore, the first through hole via1 is set in an area with a large gap between the second metal routing 52 and the two adjacent electrode setting areas 41, so that the first through hole via1 has a larger preparation area, avoiding the overlap of the first through hole via1 and the second metal routing 52, so that the second metal routing 52 is corroded when water vapor is present. Correspondingly, when the shortest distance between the first metal routing 51 and the electrode setting area 41 located on the side of the second through hole via2 away from the first metal routing 51 is d3, it is greater than the shortest distance d4 between the first metal routing 51 and the electrode setting area 41 located on the side of the first metal routing 51 away from the second through hole via2, indicating that the distance between the first metal routing 51 and the electrode setting area 41 located between the second through hole via2 and the first metal routing 51 is large. Therefore, the second through hole via2 is set in an area with a large gap between the first metal routing 51 and the two adjacent electrode setting areas 41, so that the second through hole via2 has a larger preparation area, avoiding the second through hole via2 and the first metal routing 51 from overlapping, and improving the opening quality of the second through hole via2.

[0071] Optional, reference Figures 18 to 20 The aperture of the first through hole via1 is r1, and the aperture of the second through hole via2 is r2; wherein, r1<d1, r2<d3.

[0072] Specifically, if the aperture r1 of the first through-hole via1 is greater than or equal to the shortest distance d1 between the second metal trace 52 and the electrode setting area 41 located on the side of the first through-hole via1 facing away from the second metal trace 52, and the aperture r2 of the second through-hole via2 is greater than the shortest distance d3 between the first metal trace 51 and the electrode setting area 41 located on the side of the second through-hole via2 facing away from the first metal trace 51, then the first through-hole via1 and the second through-hole via2 may overlap with the electrode setting area 41, causing the side of the electrode setting area 41 near the non-electrode setting area 42 to be uneven, thereby affecting the distribution of electric field lines within the electrode setting area 41 and the display effect of the display panel 100. Therefore, by setting r1 < d1 and r2 < d3, the first through-hole via1 and the second through-hole via2 are prevented from overlapping with the electrode setting area 41, ensuring the flatness and display function of the film layer in the electrode setting area 41, and improving the display effect of the display panel 100.

[0073] Optional, continue to refer to Figure 7-Figure 9 When the first through hole via1 is located in the second non-electrode setting area 422, along the first direction X, the first through hole via1 is located on opposite sides of the second metal trace 52; and / or, along the first direction X, the second through hole via2 is located on opposite sides of the first metal trace 51.

[0074] Specifically, along the first direction X, when the shortest spacing between the second metal trace 52 and the electrode setting areas 41 on both sides are equal or have a small difference, and the areas of the first through-holes via1 prepared on both sides of the second metal trace 52 are equal, the first through-holes via1 can be arranged on opposite sides of the second metal trace 52 to increase the number of first through-holes via1, improve the gas release efficiency, and improve the gas release uniformity on opposite sides of the second metal trace 52. Correspondingly, when the shortest spacing between the first metal trace 51 and the electrode setting areas 41 on both sides are equal or have a small difference, and the areas of the second through-holes via2 prepared on both sides of the first metal trace 51 are equal, the second through-holes via2 can be arranged on opposite sides of the first metal trace 51 to increase the number of second through-holes via2, improve the gas release efficiency, and improve the gas release uniformity on opposite sides of the first metal trace 52.

[0075] Optional, Figure 21 A schematic structural diagram of a display panel provided by the present invention is shown in FIG. Figure 22 A schematic structural diagram of a display panel provided by the present invention is shown in FIG. Figure 23 A schematic diagram of the structure of a display panel provided by the present invention, referring to Figures 21 to 23 , the planarization layer 20 includes a first groove 21 that does not penetrate the planarization layer 20, and the first groove 21 is located in the first non-electrode setting area 421 and / or the second non-electrode setting area 422; in the thickness direction Z of the display panel 100, the first groove 21 overlaps with at least a portion of the first through hole via1; and / or, the planarization layer 20 located in the third non-electrode setting area 423 includes a second groove 22 that does not penetrate the planarization layer 20; in the thickness direction Z of the display panel 100, the second groove 22 overlaps with at least a portion of the second through hole via2.

[0076] The depth of the first groove 21 and the second groove 22 is less than the thickness of the planarization layer 20 .

[0077] Specifically, a first groove 21 is provided in the planarization layer 20, overlapping at least a portion of the first through-hole via1, to increase the area of ​​the planarization layer 20 exposed at the first through-hole via1. This increases the rate at which the planarization layer 20 releases gas to the outside through the first through-hole via1, which overlaps with the first groove 21, thereby increasing the amount of gas released. Accordingly, a second groove 22 is provided in the planarization layer 20, overlapping at least a portion of the second through-hole via2, to increase the area of ​​the planarization layer 20 exposed at the second through-hole via2. This increases the rate at which the planarization layer 20 releases gas to the outside through the second through-hole via2, which overlaps with the second groove 22, thereby increasing the amount of gas released.

[0078] Optional, Figure 24 A schematic diagram of a partial top view of a display panel provided by the present invention is shown in FIG. Figure 24 As shown, the total area occupied by the first through hole via1 is S1, and the total area occupied by the second through hole via2 is S2; wherein S1>S2.

[0079] Specifically, the first through hole via1 is overlapped with the first non-electrode setting area 421 and / or the second non-electrode setting area 422, and the second through hole via2 is overlapped with the third non-electrode setting area 423. Since the opening structure 321 or the groove structure 322 overlaps with at least one of the first non-electrode setting area 421 and the second non-electrode setting area 422, and the second passivation structure 323 overlaps with the third non-electrode setting area 42. In this way, the area in the first non-electrode setting area 421 and the second non-electrode setting area 422 that overlaps with the opening structure 321 or the groove structure 322 has a weaker gas barrier capability, while the second passivation structure 323 and the first passivation layer 31 in the third non-electrode setting area 423 can jointly block gas, and have a stronger gas barrier capability. Therefore, by setting the total area S1 of the area occupied by the first through holes via1 to be larger than the total area S2 of the area occupied by the second through holes via2, more first through holes via1 can be set in the first non-electrode setting area 421 and / or the second non-electrode setting area 422, thereby improving the gas release amount and gas release efficiency of the first non-pixel electrode setting area 421 and / or the second non-electrode setting area 422.

[0080] It should be noted that the total area S1 of the first through holes via1 is larger than the total area S2 of the second through holes via2 according to actual needs. For example, the area can be adjusted by adjusting either the aperture or the number. Figure 24, it is shown that the number of first through holes via1 is greater than the number of second through holes via2, and the aperture of the first through holes via1 is greater than the aperture of the second through holes via2, so that the total area S1 of the area occupied by the first through holes via1 is greater than the total area S2 of the area occupied by the second through holes via2. In an optional embodiment, Figure 25 A schematic diagram of a partial top view of a display panel provided by an embodiment of the present invention is shown in FIG. Figure 25 As shown, the aperture of the first through hole via1 is r1, and the aperture of the second through hole via2 is r2; the number of the first through hole via1 is n1, and the number of the second through hole via2 is n2; wherein, |r1-r2| / r1<2%,n1>n2.

[0081] Here, |r1-r2| / r1<2% indicates that the apertures of the first through hole via1 and the second through hole via2 are consistent or have a small difference therebetween.

[0082] Specifically, when the apertures of the first through hole via1 and the second through hole via2 are consistent or the difference between the two is small, that is, when the aperture areas of the first through hole via1 and the second through hole via2 are equal or the difference is small, the number n1 of the first through hole via1 can be made greater than the number of the second through hole via2, and the product of the aperture area and the number n1 of the first through hole via1 is used as the total area S1 of the area occupied by the first through hole via1, and the product of the aperture area and the number n2 of the second through hole via2 is used as the total area S2 of the area occupied by the second through hole via2, so that S1 is greater than S2.

[0083] In other optional embodiments, the number of the first through hole via1 and the second through hole via2 can be made the same, the aperture of the first through hole via1 can be set to be larger than the aperture of the second through hole via2, and the total area S1 of the area occupied by the first through hole via1 can be made larger than the total area S2 of the area occupied by the second through hole via2. The specific implementation method can be selected according to actual needs and is not specifically limited here.

[0084] Optional, Figure 26 A schematic diagram of the structure of a display panel provided by the present invention is shown in FIG. Figure 26 As shown, the display panel 100 further includes a support column 60 ; the support column 60 is located on the side of the second passivation layer 32 away from the base substrate 10 ; in the thickness direction Z of the display panel 100 , the through hole via and the support column 60 do not overlap.

[0085] Among them, the support column 60 is used to support the film layers on its opposite sides. For example, when the display panel is a liquid crystal display panel, the support column 60 is used to support the array substrate and the color film substrate to prevent the film layers on both sides of the support column 60 from collapsing, causing pits or display abnormalities in the display panel 100.

[0086] Specifically, compared to areas without vias, the second passivation layer 32 that overlaps the vias has pits corresponding to the vias. If the support pillars 60 are positioned overlapping the vias, the contact area between the support pillars 60 and the second passivation layer 32 is smaller, and the second passivation layer 32's support for the support pillars 60 is weaker, resulting in poor stability for the support pillars 60. Therefore, by ensuring that the vias do not overlap with the support pillars 60, the contact area between the support pillars 60 and the second passivation layer 32 is maintained, thereby improving the support performance of the support pillars 60 and enhancing the film stability of the display panel 100.

[0087] Optional, Figure 27 A schematic diagram of the structure of a display panel provided by the present invention is shown in FIG. Figure 27 As shown, the planarization layer 20 includes a first thickness region A1 and a second thickness region A2. In the thickness direction Z of the display panel 100, the through hole via at least overlaps with the first thickness region A1. In a direction perpendicular to the plane of the base substrate 10, the height of the first thickness region A1 is H1, and the height of the second thickness region A2 is H2. Where H1>H2.

[0088] Specifically, the greater the thickness of the planarization layer 20, the more gas it releases under high-temperature support. Therefore, when the height H1 of the first thickness region A1 is greater than the height H2 of the second thickness region A2, the amount of gas required to be released from the first thickness region A1 is greater than that required to be released from the second thickness region A2. Therefore, only through-holes (vias) overlapping with the first thickness region A1 can be provided. This allows the gas released from the first thickness region A1 to be released through the through-holes (vias). This prevents the large amount of gas released from the first thickness region A1 from being retained between the film layers, causing problems such as bulging, thereby improving the flatness of the display panel 100.

[0089] Optionally, the through hole via overlapping the first thickness area A1 is a third through hole via3, the aperture of the first through hole via1 is r1, and the aperture of the third through hole via3 is r3; wherein, 1 μm≤r1≤3 μm, 1 μm≤r3≤3 μm.

[0090] Specifically, if the aperture r1 of the first through hole via1 and the aperture r3 of the third through hole via3 are both less than 1 μm, the pore area of ​​the first through hole via1 and the third through hole via3 is small, and the gas release rate is slow. If the aperture r1 of the first through hole via1 and the aperture r3 of the third through hole via3 are both greater than 3 μm, the pore area of ​​the first through hole via1 and the third through hole via3 is too large, and the gas release rate is fast. However, this also increases the area where the through holes are set, which is not conducive to the flatness of the film layer. Therefore, by setting the aperture r1 of the first through hole via1 and the aperture r3 of the third through hole via3 within the range of 1 μm to 3 μm, the gas release rate of the first through hole via1 and the third through hole via3 can be improved while reducing the area occupied by the through holes, thereby improving the flatness of the film layer.

[0091] On the basis that the through hole via overlaps with the first thickness area A1, the through hole via may also overlap with the second thickness area A2. Figure 28 A schematic diagram of the structure of a display panel provided by the present invention is shown in FIG. Figure 28 As shown, the through hole via overlapping the first thickness area A1 is the third through hole via3 ; in the thickness direction Z of the display panel 100 , the through hole via further includes a fourth through hole via4 overlapping the second thickness area A2 .

[0092] Specifically, by providing a third through hole via3 overlapping with the first thickness area A1, and a fourth through hole via4 overlapping with the second thickness area A2, the gas generated by the planarization layer 30 can be released not only through the third through hole via3, but also through the fourth through hole via4, so as to improve the release rate and completeness of the gas, reduce the amount of gas retained in the display panel 100, avoid problems such as film bulging caused by gas retained inside the display panel 100, and improve the film flatness and preparation reliability of the display panel 100.

[0093] Optional, Figure 29 A schematic structural diagram of a display panel provided by the present invention is shown in FIG. Figure 30 A schematic structural diagram of a display panel provided by the present invention is shown in FIG. Figure 31 A schematic diagram of the structure of a display panel provided by the present invention, referring to Figures 29 to 31 , the first thickness region A1 includes a third groove 23 that does not penetrate the planarization layer 20; in the thickness direction Z of the display panel 100, the third groove 23 overlaps with at least a portion of the third through hole via3; and / or, the second thickness region A2 includes a fourth groove 24 that does not penetrate the planarization layer 20; in the thickness direction Z of the display panel 100, the fourth groove 24 overlaps with at least a portion of the fourth through hole via4.

[0094] The depths of the third groove 23 and the fourth groove 24 are smaller than the thickness of the planarization layer 20 .

[0095] Specifically, a third groove 23 is provided in the planarization layer 20, overlapping at least a portion of the third through-hole via3. This increases the area of ​​the planarization layer 20 exposed at the third through-hole via3, thereby increasing the rate at which the planarization layer 20 releases gas to the outside through the third through-hole via3 overlapping with the third groove 23, and thereby increasing the amount of gas released. Accordingly, a fourth groove 24 is provided in the planarization layer 20, overlapping at least a portion of the fourth through-hole via4. This increases the area of ​​the planarization layer 20 exposed at the fourth through-hole via4, thereby increasing the rate at which the planarization layer 20 releases gas to the outside through the fourth through-hole via4 overlapping with the fourth groove 24, and thereby increasing the amount of gas released.

[0096] Optionally, the aperture of the first through hole via1 is r1, and the aperture of the fourth through hole via4 is r4; wherein, 1 μm≤r1≤2 μm, and 1 μm≤r4≤2 μm.

[0097] Specifically, if the aperture r1 of the first through hole via1 and the aperture r4 of the fourth through hole via4 are both less than 1 μm, the pore area of ​​the first through hole via1 and the fourth through hole via4 is small, and the gas release rate is slow. If the aperture r1 of the first through hole via1 and the aperture r4 of the fourth through hole via4 are both greater than 2 μm, the pore area of ​​the first through hole via1 and the fourth through hole via4 is too large, and the gas release rate is fast. However, this also increases the area of ​​the through hole vias, which is not conducive to the flatness of the film layer. Therefore, by setting the aperture r1 of the first through hole via1 and the aperture r4 of the fourth through hole via4 within the range of 1 μm to 2 μm, the gas release rate of the first through hole via1 and the fourth through hole via4 can be improved while reducing the area occupied by the through holes vias, thereby improving the flatness of the film layer.

[0098] Optional, Figure 32 A schematic diagram of the structure of a pixel in a display panel provided by the present invention is shown in FIG. Figure 32 As shown, the area of ​​the third through hole via3 in contact with the planarization layer 20 is S1, the number of the third through hole via3 is N1, the area of ​​the fourth through hole via4 in contact with the planarization layer 20 is S2, and the number of the fourth through hole via4 is N2; (S1*N1) / (S2*N2)≥(S01*H1) / (S02*H2).

[0099] The display panel 100 includes a plurality of pixels. In the same pixel, S01 is the area of ​​the planarization layer 20 located in the first thickness region A1, S02 is the area of ​​the planarization layer 20 located in the second thickness region A2, H1 is the height of the first thickness region A1, and H2 is the height of the second thickness region A2.

[0100] The area S1 of the third through-hole via 3 in contact with the planarization layer 20 refers to the area of ​​the planarization layer 20 exposed at the location of the third through-hole via 3, and the area S2 of the fourth through-hole via 4 in contact with the planarization layer 20 refers to the area of ​​the planarization layer 20 exposed at the location of the fourth through-hole via 4. When the third recess 23 overlapping the third through-hole via 3 is not provided in the planarization layer 20, the area S1 of the third through-hole via 3 in contact with the planarization layer 20 is the hole area of ​​the third through-hole via 3. When the fourth recess 24 overlapping the fourth through-hole via 4 is not provided in the planarization layer 20, the area S2 of the fourth through-hole via 4 in contact with the planarization layer 20 is the hole area of ​​the fourth through-hole via 4. When the third recess 23 overlapping the third through-hole via 3 is provided in the planarization layer 20, the area S1 of the third through-hole via 3 in contact with the planarization layer 20 includes the bottom area and side area of ​​the planarization layer 20 exposed at the location of the third through-hole via 3. When a fourth recess 24 overlapping with the fourth through hole via 4 is provided in the planarization layer 20, an area S2 where the fourth through hole via 4 contacts the planarization layer 20 includes a bottom area and a side area of ​​the planarization layer 20 exposed at the fourth through hole via 4. The bottom area can be calculated based on the aperture of the through hole, and the side area can be calculated based on the depth and perimeter of the through hole via. The product of the depth and perimeter of the through hole via is the side area.

[0101] Specifically, the product of the area S01 of the planarization layer 20 in the first thickness region A1 and the height H1 of the first thickness region A1 represents the total volume of the planarization layer 20 in the first thickness region A1. The amount of gas released from the planarization layer 20 is the product of the material density and the material volume. The amount of gas that can be released from the first thickness region A1 is φ1 = ρ × V1 = ρ × S01 * H1, and the amount of gas that can be released from the second thickness region A1 is φ1 = ρ × V2 = ρ × S02 * H2. The amount of gas that can be released by the vias is related to the released gas flux J per unit time per cross-sectional area perpendicular to the gas release direction, the gas release time t, the contact area between the vias and the planarization layer 20, and the number of vias provided. The amount of gas released from the release channel formed by each third via 3 is φ3 = J × t × S1 × N1, and the amount of gas released from the release channel formed by each fourth via 4 is φ4 = J × t × S2 × N2. By setting φ3 / φ4≥φ1 / φ2, the third through hole via3 in the first thickness region A1 can release more gas, and the fourth through hole via4 in the second thickness region A2 can release more gas, thereby improving the gas release amount and gas release efficiency of the planarization layer 20.

[0102] The areas of S01 and S02 need to be determined according to the actual configuration of the display panel 100, such as Figure 32As shown, S01 = l2×W2+2×l1×W1, S02 = l1×W1. The areas of S01 and S02 may be other and are not specifically limited here.

[0103] Based on the same inventive concept, embodiments of the present invention further provide a display device, comprising a display panel provided by any embodiment of the present invention. Therefore, the display device possesses the technical features of the display panel provided by any embodiment of the present invention and can achieve the beneficial effects of the display panel provided by any embodiment of the present invention. For similarities, reference can be made to the above description of the display panel provided by any embodiment of the present invention and will not be repeated here.

[0104] For example, Figure 33 A schematic structural diagram of a display device provided by the present invention is shown in FIG. Figure 33 As shown, the display device 200 includes the display panel 100 provided by the present invention. The display device 200 provided by the present invention can be any electronic product with a display function, including but not limited to the following categories: mobile phones, televisions, laptops, desktop monitors, tablet computers, digital cameras, smart bracelets, smart glasses, car displays, medical equipment, industrial control equipment, touch interactive terminals, etc., and the embodiments of the present invention are not particularly limited to this.

[0105] Compared with the prior art, the display panel and display device provided by the present invention achieve at least the following beneficial effects:

[0106] The display panel provided by the present invention includes: a base substrate, a planarization layer, a first passivation layer, a second passivation layer and an electrode layer; the planarization layer is located on one side of the base substrate, the first passivation layer is located on the surface of the planarization layer facing away from the base substrate, the second passivation layer is located on the side of the first passivation layer facing away from the base substrate, and the electrode layer is located on the side of the second passivation layer facing away from the base substrate; the electrode layer includes a plurality of electrode setting areas arranged in an array and non-electrode setting areas located between the electrode setting areas; the second passivation layer includes an opening structure or a groove structure, and a second passivation structure surrounding the opening structure or the groove structure; in the thickness direction of the display panel, the opening structure or the groove structure overlaps with at least part of the non-electrode setting area; the display panel also includes a plurality of through holes located in the opening structure or the groove structure and penetrating at least the first passivation layer. The present invention provides an opening structure or a groove structure in a second passivation layer in contact with the planarization layer, and provides a plurality of through holes in the first passivation layer located in the opening structure or the groove structure so that the gas generated by the planarization layer can be released through the through holes in the first passivation layer, thereby preventing the gas generated by the planarization layer from being retained between the first passivation layer and the planarization layer, causing the film layer to peel off or bulge, thereby improving the flatness of the film layer inside the display panel, thereby improving the ability of the display panel to resist high temperature and high humidity, and improving the display effect.

[0107] Note that the above are only preferred embodiments of the present invention and the technical principles employed. Those skilled in the art will appreciate that the present invention is not limited to the specific embodiments described herein, and that various obvious changes, readjustments, combinations, and substitutions are possible for those skilled in the art without departing from the scope of the present invention. Therefore, although the present invention has been described in detail through the above embodiments, the present invention is not limited to the above embodiments and may include many other equivalent embodiments without departing from the scope of the present invention. The scope of the present invention is determined by the scope of the appended claims.

Claims

1. A display panel, characterized in that: include: A substrate, a planarization layer, a first passivation layer, a second passivation layer and an electrode layer; The planarization layer is located on one side of the base substrate, the first passivation layer is located on a surface of the planarization layer facing away from the base substrate, the second passivation layer is located on a side of the first passivation layer facing away from the base substrate, and the electrode layer is located on a side of the second passivation layer facing away from the base substrate; the electrode layer includes a plurality of electrode arrangement areas arranged in an array and a non-electrode arrangement area located between the electrode arrangement areas; the second passivation layer includes an opening structure or a groove structure, and a second passivation structure surrounding the opening structure or the groove structure; in the thickness direction of the display panel, the opening structure or the groove structure overlaps with at least a portion of the non-electrode arrangement area; The display panel further includes a plurality of through holes located in the opening structure or the groove structure and penetrating at least the first passivation layer.

2. The display panel according to claim 1, wherein: Also includes: A plurality of metal traces arranged along a first direction and extending along a second direction; the first direction intersects the second direction; The first direction is the row direction of the electrode arrangement area; The metal wiring is located in the non-electrode arrangement area between two adjacent electrode arrangement areas; and in the thickness direction of the display panel, the through hole and the metal wiring do not overlap.

3. The display panel according to claim 2, wherein: The electrode layer includes a pixel electrode layer; the metal wiring includes a first metal wiring and a second metal wiring; the second metal wiring is a floating electrode; The non-electrode setting area includes a first non-electrode setting area and / or a second non-electrode setting area; the first non-electrode setting area is located between two adjacent electrode setting areas in the same row and is not provided with the metal trace; the second non-electrode setting area is located between two adjacent electrode setting areas in the same row and is provided with the second metal trace; The non-electrode arrangement area further includes a third non-electrode arrangement area, the third non-electrode arrangement area is located between two adjacent electrode arrangement areas in the same row, and is provided with the first metal trace; In the thickness direction of the display panel, the opening structure or the groove structure overlaps with at least one of the first non-electrode arrangement area and the second non-electrode arrangement area, and the second passivation structure overlaps with the third non-electrode arrangement area; The through hole includes a first through hole; in the thickness direction of the display panel, the first through hole overlaps with the first non-electrode arrangement area, and / or the first through hole overlaps with the second non-electrode arrangement area.

4. The display panel according to claim 3, wherein: The through hole further includes a second through hole; in the thickness direction of the display panel, the second through hole overlaps with the third non-electrode arrangement area.

5. The display panel according to claim 4, wherein: When the first through hole is located in the second non-electrode arrangement area, along the first direction, the first through hole is located on at least one side of the second metal trace; and / or, Along the first direction, the second through hole is located on at least one side of the first metal trace.

6. The display panel according to claim 4, wherein: When the first through hole is located in the second non-electrode setting area and the first through hole is located on one side of the second metal trace, along the first direction, the shortest distance between the second metal trace and the electrode setting area located on the side of the first through hole away from the second metal trace is d1, and the shortest distance between the second metal trace and the electrode setting area located on the side of the second metal trace away from the first through hole is d2; wherein d1>d2; and / or, When the second through hole is located on one side of the first metal trace, along the first direction, the shortest distance between the first metal trace and the electrode setting area located on the side of the second through hole away from the first metal trace is d3, and the shortest distance between the first metal trace and the electrode setting area located on the side of the first metal trace away from the second through hole is d4; wherein, d3>d4.

7. The display panel according to claim 4, wherein: When the first through hole is located in the second non-electrode arrangement area, the first through hole is located on two opposite sides of the second metal trace along the first direction; and / or, Along the first direction, the second through-holes are located on two opposite sides of the first metal trace.

8. The display panel according to claim 4, wherein: The planarization layer includes a first groove that does not penetrate the planarization layer, the first groove is located in the first non-electrode arrangement area and / or the second non-electrode arrangement area; in the thickness direction of the display panel, the first groove overlaps with at least a portion of the first through hole; and / or, The planarization layer located in the third non-electrode arrangement area includes a second groove that does not penetrate the planarization layer; in the thickness direction of the display panel, the second groove overlaps with at least a portion of the second through hole.

9. The display panel according to claim 4, wherein: The total area of ​​the regions occupied by the first through holes is S1, and the total area of ​​the regions occupied by the second through holes is S2; Among them, S1>S2.

10. The display panel according to claim 9, wherein: The aperture of the first through hole is r1, and the aperture of the second through hole is r2; the number of the first through holes is n1, and the number of the second through holes is n2; Among them, |r1-r2| / r1<2%, n1>n2.

11. The display panel according to claim 1, wherein Also includes: Support columns; The supporting column is located on a side of the second passivation layer facing away from the base substrate; in the thickness direction of the display panel, the through hole and the supporting column do not overlap.

12. The display panel according to claim 11, wherein: The planarization layer includes a first thickness region and a second thickness region; In the thickness direction of the display panel, the through hole at least overlaps with the first thickness region; In a direction perpendicular to the plane of the substrate, the height of the first thickness region is H1, and the height of the second thickness region is H2; Among them, H1>H2.

13. The display panel according to claim 12, wherein: The through hole overlapping the first thickness region is a third through hole; In a thickness direction of the display panel, the through hole further includes a fourth through hole overlapping with the second thickness region.

14. The display panel according to claim 13, wherein: The first thickness region includes a third groove that does not penetrate the planarization layer; in the thickness direction of the display panel, the third groove overlaps with at least a portion of the third through hole; and / or, The second thickness region includes a fourth groove that does not penetrate the planarization layer; in the thickness direction of the display panel, the fourth groove overlaps with at least a portion of the fourth through hole.

15. The display panel according to claim 6, wherein: The aperture of the first through hole is r1, and the aperture of the second through hole is r2; Among them, r1<d1, r2<d3.

16. The display panel according to claim 12, wherein: The through hole overlapping the first thickness region is a third through hole, and the aperture of the third through hole is r3; Among them, 1μm≤r3≤3μm.

17. The display panel according to claim 13, wherein: The aperture of the fourth through hole is r4; Among them, 1μm≤r4≤2μm.

18. The display panel according to claim 13, wherein: The area of ​​the third through hole in contact with the planarization layer is S1, and the number of the third through holes is N1; the area of ​​the fourth through hole in contact with the planarization layer is S2, and the number of the fourth through holes is N2; (S1×N1) / (S2×N2)≥(S01×H1) / (S02×H2); Wherein, the display panel includes multiple pixels. In the same pixel, S01 is the area of ​​the planarization layer located in the first thickness zone, S02 is the area of ​​the planarization layer located in the second thickness zone, H1 is the height of the first thickness zone, and H2 is the height of the second thickness zone.

19. A display device, characterized in that: include: The display panel according to any one of claims 1 to 18.

Images