Precise etching device

By using alternating spray modules and limiting channel design, the problems of uneven etching and low efficiency in etching equipment are solved, achieving uniform coverage and efficient utilization of etching solution, and significantly improving etching uniformity and efficiency.

CN120844085APending Publication Date: 2025-10-28DONGGUAN NARITA PRECISION TECH CO LTD
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Patent Information

Application Number
CN202511019356.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-07-23
Publication Date
2025-10-28

AI Technical Summary

Technical Problem

Existing etching equipment suffers from a "pool effect" in the etching process, resulting in uneven etching and low efficiency. In particular, after deep etching grooves are formed on the workpiece surface, the etching solution has difficulty contacting the workpiece, affecting the etching uniformity and efficiency.

Method used

The workpiece is sprayed with etching solution on both sides using an alternating spray module. The workpiece is oscillated by the driving force of the etching solution, and the inertial force is generated by the limiting channel, which causes the etching solution to be thrown out, ensuring uniform coverage and full reaction of the etching solution.

Benefits of technology

It effectively solves the "pool effect" in the etching process, improves etching uniformity and efficiency, increases the utilization rate of etching solution to 72%, and improves etching efficiency by 34%.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention relates to a precise etching device in the technical field of etching devices, the precise etching device comprises a spraying module and a carrier module, the carrier module comprises a vertical clamp and a driving module used for driving the vertical clamp to move along the spraying module, and the spraying module comprises a first spraying module and a second spraying module which are oppositely arranged; according to the precise etching device provided by the invention, the first spraying module and the second spraying module alternately spray the etching liquid to the two surfaces of the workpiece, the workpiece swings by utilizing the pushing force of the etching liquid, and inertia force is formed through the limitation of the limiting channel, so that the etching liquid attached to the other surface of the workpiece is thrown out to the other side. By means of the design, accumulation of the etching liquid on the surface of the workpiece can be reduced, it can be guaranteed that the etching liquid can evenly and fully cover the to-be-etched area, and the etching uniformity is effectively improved. And meanwhile, the etching liquid can be ensured to have sufficient etching reaction time through the alternate and spaced spraying mode, so that the utilization rate of the etching liquid is further improved.
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Description

Technical Field

[0001] This invention relates to the field of etching apparatus technology, and more specifically to a precision etching apparatus. Background Technology

[0002] With the continuous development of etching equipment, the chemical etching process for precision metal plates has placed higher demands on equipment. The etching process of the substrate is a crucial factor affecting substrate quality. As the quality requirements for substrates continue to increase, the precision requirements during substrate etching are also becoming increasingly stringent. Existing spray treatment equipment typically uses downward spraying of treatment liquid to chemically react or clean horizontally moving materials. Due to gravity, the treatment liquid forms a water film on the horizontally moving substrate, hindering the contact of new treatment liquid with the material and creating a "pool effect" on the upper surface. This prevents the sprayed liquid from directly reaching the horizontally moving substrate, resulting in uneven etching. Furthermore, the failure to quickly remove excess etching liquid from the substrate surface after etching allows residual etching liquid to cause excessive etching in certain areas, severely affecting the etching precision and quality of the substrate.

[0003] To address the aforementioned technical problems, this application references prior art patent number ZL202111012626.0, which discloses a precision etching module, a precision etching device, and an etching process for the device. The module includes a module frame, a linear drive assembly, an etching spray device, an etching water tank, and a clamping device. The precision etching module enables vertical etching of substrates such as PCBs, avoiding the formation of a water film and ensuring uniform etching. The nozzle of this application can perform close-range spray etching on the substrate, improving etching efficiency. The vertical placement method significantly reduces the floor space required. Furthermore, the same precision etching device can process substrates with different etching requirements, making the etching process more flexible. In actual production, if a problem occurs in the etching process of a certain substrate etching production line, only the precision etching module at the corresponding location needs adjustment and repair, without affecting other precision etching modules, thus ensuring that production efficiency is not significantly impacted.

[0004] In actual production, the inventors discovered that in the initial stage of the etching process, because the area to be etched on the workpiece has not yet formed a deep etching groove, vertically arranged workpieces can still allow the etching solution attached to them to hang down naturally under gravity, thus reducing the pooling effect on the workpiece surface. However, in the middle stage of the etching process, after a deeper etching groove forms in the area to be etched on the workpiece, the etching solution is restricted by its own tension and the groove structure, making it difficult to detach from the groove. This hinders new etching solution from contacting the workpiece, resulting in a "pooling effect" on the surface. Consequently, the sprayed etching solution cannot be directly sprayed onto the area to be etched on the workpiece, severely affecting etching efficiency and uniformity. To solve this problem, this invention proposes a precision etching device designed to effectively improve the "pooling effect" in the etching process, thereby enhancing etching uniformity and efficiency. Summary of the Invention

[0005] The present invention provides a precision etching apparatus to solve the problems mentioned in the background art.

[0006] The objective of this invention is achieved through the following means:

[0007] A precision etching apparatus includes a spraying module and a carrier module. The carrier module includes a vertical clamp for fixing a workpiece and a drive module for moving the vertical clamp along the spraying module. The vertical clamp is swayably mounted on the drive module via a lifting assembly. The spraying module includes a first spraying module and a second spraying module disposed opposite to each other. A feeding channel is formed between the first spraying module and the second spraying module, through which the vertical clamp can pass. A first limiting component is provided at the lower end of the feeding channel. The first limiting component includes two limiting members disposed opposite to each other on both sides of the vertical clamp. A first limiting channel is formed between the two limiting members to limit the vertical clamp. The width of the first limiting channel is greater than the width of the vertical clamp.

[0008] Driven by the drive module, the vertical fixture and the workpiece pass through the spraying module along the feeding channel. The first spraying module and the second spraying module alternately spray etching liquid onto the first and second surfaces of the workpiece, respectively. When the first spraying module sprays etching liquid onto the first surface of the workpiece, the workpiece swings along the lifting assembly toward the second spraying module under the push of the etching liquid. The workpiece is constrained by the first limiting channel and forms an inertial force, causing the etching liquid attached to the second surface of the workpiece to be thrown out toward the second spraying module. Conversely, when the second spraying module sprays etching liquid onto the second surface of the workpiece, the etching liquid attached to the first surface of the workpiece is thrown out toward the first spraying module.

[0009] Furthermore, a second limiting component is provided at the upper end of the feeding channel. The second limiting component includes a protective plate installed at the upper end of the vertical fixture and two guide plates respectively installed on the first spraying module and the second spraying module. A second limiting channel through which the vertical fixture can pass is provided between the two guide plates. The width of the protective plate is greater than the width of the second limiting channel.

[0010] Furthermore, the drive module includes a track, a chain, and a drive motor. The track is installed above the feeding channel, and the lifting device assembly includes a roller assembly slidably disposed on the track, the roller assembly being connected to the chain.

[0011] Furthermore, the lifting device assembly also includes a hook fixedly mounted on the vertical clamp and a tripod mounted on the lower end of the roller assembly, with the hook hooked onto the tripod.

[0012] Furthermore, the lifting device assembly also includes a connector fixedly mounted on the vertical clamp and a load-bearing bearing mounted on the lower end of the roller assembly, wherein the connector is rotatably mounted on the load-bearing bearing via a rotating shaft.

[0013] Furthermore, the load-bearing bearing is rotatably mounted on the lower end of the roller assembly via a bearing housing, which can swing along the axial direction of the track.

[0014] Furthermore, the vertical fixture includes a fixed frame, a reference base plate, and two guide rods. The two guide rods are respectively vertically arranged at both ends of the fixed frame. One end of the reference base plate is rotatably hinged to the bottom end of one of the guide rods, and the other end of the reference base plate is connected to the other guide rod through a pin. Counterweights are slidably installed on the two guide rods, and a positioning groove for limiting the workpiece is provided between the counterweights and the reference base plate.

[0015] Furthermore, both the first and second injection modules include multiple vertically arranged nozzles and a liquid pump. The nozzles are arranged with multiple nozzles spaced apart from top to bottom, and the nozzles are connected to the liquid pump via solenoid valves.

[0016] Furthermore, each of the at least one nozzle constitutes a group of injection units, and each group of injection units is connected to the liquid pump via the same solenoid valve.

[0017] Furthermore, the feeding channel is equipped with sensors for sensing the vertical clamps for each group of spraying units.

[0018] This invention provides a precision etching apparatus that alternately sprays etching solution onto both sides of a workpiece using a first spray module and a second spray module. The propulsive force of the etching solution causes the workpiece to oscillate, and the limiting channel creates an inertial force that causes the etching solution adhering to one side of the workpiece to be flung off to the other side. This design not only helps reduce the accumulation of etching solution on the workpiece surface but also ensures that the etching solution can uniformly and fully cover the area to be etched, effectively improving etching uniformity. Simultaneously, the alternating spraying method ensures sufficient etching reaction time for the etching solution, thereby further improving the utilization rate of the etching solution. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the structure of a precision etching device according to the present invention;

[0020] Figure 2 This is a left view of a precision etching apparatus according to the present invention;

[0021] Figure 3 This is a first schematic diagram of the use of a precision etching apparatus according to the present invention;

[0022] Figure 4 This is a second schematic diagram of the use of a precision etching apparatus according to the present invention;

[0023] Figure 5 This is a schematic diagram of the structure of the first injection module in this invention;

[0024] Figure 6 This is a front view of the first injection module in this invention;

[0025] Figure 7 This is a schematic diagram of the vertical clamp in this invention;

[0026] Figure 8 This is a first schematic diagram of the vertical clamp in this invention;

[0027] Figure 9 This is a second schematic diagram of the use of the vertical clamp in this invention;

[0028] Figure 10 for Figure 9 Enlarged diagram of A in the middle;

[0029] Figure 11 This is a schematic diagram of the lifting device assembly in Embodiment 1;

[0030] Figure 12 This is a schematic diagram of the lifting device assembly in Embodiment 2;

[0031] The reference numerals in the figure are as follows: 1-spray module, 1A-first spray module, 1B-second spray module, 101-nozzle, 102-nozzle, 103-spray unit, 104-sensor;

[0032] 2-Fixed frame, 200-Feeding channel, 201-First limit channel, 202-Second limit channel, 203-Collection pool;

[0033] 3-Carrier module, 3A-Vertical clamp, 30A-Fixed frame, 31A-Base plate, 32A-Guide rod, 33A-Counterweight, 34A-Positioning slot, 3B-Lifting device assembly, 30B-Roller assembly, 31B-Hook, 32B-Triangle frame, 33B-Connector, 34B-Bearing bearing, 35B-Spindle, 36B-Bearing seat, 300-Railway, 301-Chain;

[0034] 4-First limiting component, 5-Second limiting component, 6-Protective plate, 10-Workpiece. Detailed Implementation

[0035] The present invention will now be described in further detail with reference to the accompanying drawings and specific embodiments.

[0036] Example 1:

[0037] In this embodiment, refer to Figure 1 - Figure 11 The precision etching apparatus specifically implemented therein includes a spraying module 1 and a carrier module 3. The carrier module 3 includes a vertical clamp 3A for fixing a workpiece 10 and a drive module for moving the vertical clamp 3A along the spraying module 1. The vertical clamp 3A is swayably mounted on the drive module via a lifting assembly 3B. The spraying module 1 includes a first spraying module 1A and a second spraying module 1B arranged opposite to each other. A feeding channel 200 is formed between the first spraying module 1A and the second spraying module 1B, through which the vertical clamp 3A can pass. A first limiting assembly 4 is provided at the lower end of the feeding channel 200. The first limiting assembly 4 includes two limiting members arranged opposite to each other on both sides of the vertical clamp 3A. A first limiting channel 201 is formed between the two limiting members to limit the vertical clamp 3A. The width of the first limiting channel 201 is greater than the width of the vertical clamp 3A.

[0038] like Figure 2As shown, in this embodiment, a second limiting component 5 is provided at the upper end of the feeding channel 200. The second limiting component 5 includes a protective plate 6 installed on the upper end of the vertical clamp 3A and two guide plates respectively installed on the first spray module 1A and the second spray module 1B. A second limiting channel 202 through which the vertical clamp 3A can pass is provided between the two guide plates. The width of the protective plate 6 is greater than the width of the second limiting channel 202. In practical applications, the vertical clamp 3A, driven by the drive module, passes through the spray module 1 along the second limiting channel 202. During the alternating spraying process of the first spray module 1A and the second spray module 1B, the two guide plates can block most of the splashed etching liquid, while the protective plate 6 is used to prevent the etching liquid from splashing out from the second limiting channel 202, thus avoiding the splashed etching liquid from affecting the drive module above. At the same time, both sides of the protective plate 6 are provided with inclined surfaces facing the vertical clamp 3A. The inclined surfaces are used to guide the splashed etching liquid to flow down along both sides of the protective plate 6, preventing the etching liquid from accumulating on the upper end of the protective plate 6, further improving the protection effect on the drive module.

[0039] The widths of the first limiting channel 201 and the second limiting channel 202 are typically the same, and the width of the limiting channels can be adjusted according to the actual width of the workpiece 10 or the vertical fixture 3A. Preferably, the width of the limiting channels is typically set to be greater than or equal to twice the thickness of the vertical fixture 3A, thereby preventing excessive swaying of the vertical fixture 3A. To improve the stability of the vertical fixture 3A's transport, guide members are provided at both ends of the first limiting component 4 and the second limiting component 5 to guide the limiting channels. The guide members are composed of beveled or guiding arc surfaces. The provision of these guide members ensures that the vertical fixture 3A moves more smoothly when entering and exiting the limiting channels, reducing collisions or jamming.

[0040] like Figure 3-4As shown, the vertical fixture 3A and the workpiece 10, driven by the drive module, pass through the spraying module 1 along the feeding channel 200. The first spraying module 1A and the second spraying module 1B alternately spray etching liquid onto the first and second surfaces of the workpiece 10, respectively. When the first spraying module 1A sprays etching liquid onto the first surface of the workpiece 10, the workpiece 10 swings along the lifting assembly 3B towards the second spraying module 1B under the push of the etching liquid. The inertial force is formed by the restriction of the first limiting channel 201, causing the workpiece 10 to... The etching solution attached to the second surface is flung out towards the second spray module 1B; conversely, when the second spray module 1B sprays etching solution onto the second surface of the workpiece 10, the first spray module 1A stops spraying etching solution. Driven by the etching solution, the workpiece 10 swings along the lifting assembly 3B toward the first spray module 1A, and under the restriction of the first limiting channel 201, the swing of the vertical clamp 3A is stopped, thereby forming an inertial force toward the first spray module 1A, causing the etching solution attached to the first surface of the workpiece 10 to be flung out towards the first spray module 1A.

[0041] Thus, by alternately spraying etching liquid onto both sides of the workpiece 10 through the first spraying module 1A and the second spraying module 1B, the vertical fixture 3A and the workpiece 10 oscillate back and forth within the feeding channel 200, so as to throw off the etching liquid on the surface of the workpiece 10, avoiding the etching liquid that has completed the reaction from remaining on the surface of the workpiece 10 for a long time, and completely solving the "pool effect" that occurs in the existing etching process. This allows for efficient completion of the etching process and significantly improves the utilization rate of the etching liquid.

[0042] like Figure 1-5 As shown, the spraying module 1 in this embodiment includes a fixed frame 2 and a first spraying module 1A and a second spraying module 1B arranged opposite to each other on both sides of the feeding channel 200. The first spraying module 1A and the second spraying module 1B each include a plurality of vertically arranged spray pipes 101 and a corresponding liquid pump. The spray pipes 101 are arranged with a plurality of nozzles 102 at intervals from top to bottom. The spray pipes 101 are connected to the liquid pump through a solenoid valve. The nozzles 102 are provided with spray holes for spraying etching liquid.

[0043] In practice, the number and distribution of nozzles 102 can be adjusted according to actual needs to ensure that the etching solution can be uniformly sprayed onto the surface of the workpiece 10. At the same time, the spray pressure and spray angle of the nozzles 102 can also be adjusted to adapt to the needs of different workpieces 10 and etching processes.

[0044] To further improve etching efficiency and quality, the spraying module 1 also includes an etching solution circulation system. This system includes a collection tank 203 located below the feeding channel 200, an external etching solution storage tank, a filter, and pipes. During etching, a pump draws the etching solution from the storage tank and delivers it through pipes to the nozzle 102 for spraying. After the sprayed etching solution passes over the surface of the workpiece 10, some of it reacts chemically with the workpiece 10, while the remaining etching solution flows to the collection tank 203 for collection and is then uniformly proportioned and returned to the storage tank. During the return process, the filter removes impurities and reaction products from the etching solution, ensuring the accuracy of subsequent etching. This repeated circulation of the etching solution effectively improves the utilization rate of the etching solution.

[0045] Furthermore, to achieve precise control of the etching process, the precision etching apparatus is also equipped with a control system. This system includes components such as sensors, a controller, and actuators. The sensors are used to monitor various parameters during the etching process in real time, including the etching solution temperature, spray pressure, and workpiece position. The controller analyzes and processes the data collected by the sensors and controls the actuators according to preset process parameters to achieve precise adjustment and control of the etching process.

[0046] like Figure 6 As shown, for reference, in this embodiment, considering that the workpiece 10 to be etched is a wide-body metal sheet, specifically, every two of the nozzles 101 can be selected to form a group of spraying units 103. Each group of spraying units 103 is connected to the liquid pump through the same solenoid valve. The feeding channel 200 is provided with a sensor 104 for sensing the vertical fixture 3A corresponding to each group of spraying units 103.

[0047] In practical applications, the drive module typically has multiple vertical fixtures 3A spaced apart to form an assembly line etching process. Driven by the drive module, the vertical fixtures 3A and the workpieces 10 on them pass through the spraying module 1 along the feeding channel 200. Each time a vertical fixture 3A passes a set of spraying units 103, the corresponding sensor 104 on the feeding channel 200 detects its arrival and transmits a signal to the controller. Upon receiving the signal, the controller opens the corresponding solenoid valve, causing the liquid pump to deliver the etching solution to the nozzles 102 of that spraying unit 103 for spraying. This setup allows for precise etching of each vertical fixture 3A and the workpiece 10 on it, improving etching efficiency and processing quality. Furthermore, since each spraying unit 103 is independently controlled, the number and layout of the spraying units 103 can be flexibly adjusted according to actual needs to adapt to different workpieces 10 and etching processes.

[0048] Furthermore, when the workpiece 10 to be etched has a relatively narrow structure, each nozzle 101 can be configured into a spray unit 103, and the spray of each nozzle 101 can be individually controlled by a solenoid valve. Alternatively, three or more nozzles 101 can be combined into a spray unit 103, and the output of the etching solution can be controlled by the same solenoid valve, thereby adapting to workpieces 10 with different widths to be etched.

[0049] In the initial stage of etching a workpiece 10 with densely packed slots, existing etching equipment allows the etching solution to naturally droop due to gravity, reducing the pooling effect on the workpiece 10 surface, as the etched area has not yet formed a deep etched slot structure. However, in the later stages of the etching process, once a deep etched slot structure has formed in the etched area, the etching solution is constrained by its own surface tension and the slot structure, making it difficult to detach and creating a pooling effect on the workpiece 10 surface. This severely affects etching efficiency and uniformity. To address this problem, existing etching equipment typically increases the density and water pressure of the etching solution nozzles 102, thereby impacting the slot structure of the workpiece 10 with the etching solution and preventing it from remaining within the slot structure. However, in actual production, many workpieces 10 of different sizes are often encountered, and the areas requiring etching vary. Therefore, the above solution is difficult to fully cover all workpieces 10, resulting in uneven etching on some workpieces 10. Moreover, the higher density of etching nozzles 102 not only increases the difficulty of arrangement but also requires a higher-power etching solution supply system to meet the spray coverage. This structure is not only costly to arrange but also consumes a large amount of etching solution to meet the coverage requirements during operation, resulting in low etching solution utilization and failing to meet the requirements of most manufacturers.

[0050] To address the aforementioned issues, this embodiment proposes a precision etching apparatus. The apparatus alternately sprays etching solution onto both sides of a workpiece 10 using a first spray module 1A and a second spray module 1B. The propulsive force of the etching solution causes the workpiece 10 to oscillate, and the limiting channel creates an inertial force that causes the etching solution adhering to the other side of the workpiece 10 to be flung off to the other side. This design not only helps reduce the accumulation of etching solution on the surface of the workpiece 10 but also ensures that the etching solution can uniformly and fully cover the area to be etched, effectively improving etching uniformity. Simultaneously, the alternating spraying method ensures sufficient etching reaction time for the etching solution, thereby further improving the utilization rate of the etching solution.

[0051] To accommodate actual production needs, the spraying module 1 in this embodiment employs four sets of first spraying modules 1A and second spraying modules 1B arranged sequentially and opposite to each other. For reference, an existing double-sided vertical etching device with the same number of nozzles 102 is used as a comparison object, wherein the workpiece 10 to be etched, the etching solution ratio, and the etching solution temperature are all set to be the same.

[0052] Specifically, actual testing showed that the precision etching apparatus of this embodiment, compared to the traditional double-sided vertical etching apparatus, improved etching efficiency by 34% and increased etching solution utilization from 30% to 72% (excluding the etching solution recycling system). This significant improvement is mainly due to the alternating spraying of etching solution and the use of the inertial force generated by the oscillation of the workpiece 10, which effectively solves the problem of the "pool effect" during etching. This allows the etching solution to cover the area to be etched more evenly and fully. Furthermore, the intermittent spraying method ensures that the etching solution has sufficient etching reaction time, thereby greatly improving etching efficiency and etching solution utilization.

[0053] In this embodiment, the drive module includes a track 300, a chain 301, a drive motor, a reducer, and a transmission mechanism. The track 300 is installed above the feeding channel 200. The vertical clamp 3A is movably mounted on the track 300 via a lifting assembly 3B. The lifting assembly 3B is connected to the chain 301. The motor is connected to the transmission mechanism via the reducer. The transmission mechanism is used to drive the chain 301 to move, thereby driving the vertical clamp 3A to move along the feeding channel 200, realizing an automated assembly line etching operation. The transmission mechanism is a sprocket.

[0054] Furthermore, to further improve production efficiency, a drive module can be directly connected to a drying and washing device at the end of the feeding channel 200. This device includes a drying module and a washing module. The drying module dries the etched workpiece 10, while the washing module cleans the workpiece 10 to remove residual etching solution. In practice, after the vertical fixture 3A completes the etching operation on the workpiece 10, the drive module continues to move the fixture 3A to the washing module, where it cleans the workpiece 10. Then, the fixture 3A continues to move to the drying module, where it dries the workpiece 10. Finally, the cleaned workpiece 10 is removed, and the fixture 3A is then cycled back to the feeding channel 200 for the next etching process. This achieves automated, assembly-line etching, drying, and cleaning operations, effectively reducing process handover time and improving production efficiency. The accompanying drawings of this invention only show track 300 of the etching process section.

[0055] like Figure 7-8As shown, the vertical fixture 3A includes a fixed frame 30A, a base plate 31A, and two guide rods 32A. The two guide rods 32A are vertically disposed at both ends of the fixed frame 30A. One end of the base plate 31A is rotatably hinged to the bottom end of one of the guide rods 32A, and the other end of the base plate 31A is connected to the other guide rod 32A via a pin or bolt. Counterweights 33A are slidably mounted on both guide rods 32A. A positioning groove 34A for limiting the workpiece 10 is provided between the counterweight 33A and the base plate 31A. In actual use, the workpiece 10 is placed in the positioning groove 34A, and the weight of the counterweight 33A fixes the workpiece 10 between the counterweight 33A and the base plate 31A. After the etching process is completed, the workpiece 10 can be removed from the base plate 31A by removing the pin. Meanwhile, the adjustable counterweight 33A on the guide rod 32A facilitates the adaptation to different sizes and models of metal sheet parts, improving the compatibility rate. Furthermore, placing the counterweight 33A above the workpiece 10 effectively balances the overall center of gravity of the vertical fixture 3A, ensuring the stability of the vertical fixture 3A during swinging.

[0056] Further, such as Figure 9-10 As shown, when the length of workpiece 10 is less than half the length of guide rod 32A, the vertical fixture 3A can be adjusted by removing the base plate 31A and adding two additional counterweights 33A. One counterweight 33A is fixed to the bottom of the two guide rods 32A with a nut, while the original counterweight 33A and the other counterweight 33A are slidably mounted on the guide rod 32A. The positioning groove 34A formed between two adjacent counterweights 33A can fix one workpiece 10. The arrangement of the three counterweights 33A can fix two workpieces 10. Furthermore, when four counterweights 33A are set, three workpieces 10 can be fixed, thus achieving the purpose of adapting to different workpieces 10. This improvement is a simple improvement. In practical applications, the width of the positioning groove 34A must match the thickness of the workpiece 10 to avoid the positioning groove 34A from loosening. Furthermore, a retractable structure such as a screw can be provided on one side of the positioning groove 34A to adjust the width of the positioning groove 34A or to further fix the workpiece 10. Such adjustments are conventional technical means in this field and will not be elaborated on here.

[0057] In addition, in order to efficiently solve the technical problem of single-sided etching of workpiece 10, the vertical fixture 3A of this embodiment has two positioning slots 34A symmetrically arranged between the counterweight 33A and the reference base plate 31A, so that it can hang at least two workpieces 10 at a time, wherein the surface of workpiece 10 to be etched faces the spraying module, thereby completing the etching process of at least two workpieces 10 simultaneously through a vertical fixture 3A.

[0058] like Figure 11 As shown, the lifting device assembly 3B includes a hook 31B fixedly mounted on the vertical clamp 3A and a roller assembly 30B slidably mounted on the track 300. The roller assembly 30B is connected to the chain 301. The lower end of the roller assembly 30B is provided with a tripod 32B for cooperating with the hook 31B. The triangular structure of the tripod 32B not only has stable structural strength, but also facilitates the swinging of the hook 31B along the end of the tripod 32B. The bottom of the tripod 32B is provided with a circular groove that matches the hook 31B, so that the hook 31B can be firmly fixed in the circular groove during the swinging of the vertical clamp 3A, reducing the swing resistance.

[0059] The tripod 32B is rotatably mounted on the roller assembly 30B to further improve the flexibility of the vertical clamp 3A's swing. To facilitate the installation and removal of the vertical clamp 3A, the hook 31B and the tripod 32B are detachably connected, allowing for easy replacement or maintenance of the vertical clamp 3A.

[0060] Example 2:

[0061] like Figure 12 As shown, to reduce the swing resistance between the vertical fixture 3A and the workpiece 10, the lifting assembly 3B in this embodiment includes a connector 33B fixedly mounted on the vertical fixture 3A and a bearing 34B mounted on the lower end of the roller assembly 30B. The connector 33B is rotatably mounted on the bearing 34B via a pivot 35B, so that the vertical fixture 3A swings more smoothly, reducing friction and resistance. Simultaneously, the use of the bearing 34B also improves the swing accuracy of the vertical fixture 3A, ensuring its stability during the swing process. Furthermore, to further improve the flexibility and adaptability of the etching operation, in specific implementations, a suitable bearing 34B model can be selected according to the weight and swing requirements of the vertical fixture 3A to ensure that it meets the requirements of the etching operation.

[0062] Furthermore, the bearing 34B is rotatably mounted on the lower end of the roller assembly 30B via a bearing seat 36B. The bearing seat 36B can swing along the axial direction of the track 300 to accommodate minor offsets of the vertical clamp 3A during the swinging process, thereby further reducing friction and resistance between the vertical clamp 3A and the track 300. This design not only improves the swinging flexibility of the vertical clamp 3A but also helps extend the service life of both the track 300 and the vertical clamp 3A.

[0063] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make some changes or modifications to the above-disclosed technical content to create equivalent embodiments without departing from the scope of the present invention. Any simple modifications, equivalent changes, and modifications made to the above embodiments based on the present invention without departing from the scope of the present invention are within the scope of the present invention.

Claims

1. A precision etching apparatus, comprising a jetting module (1) and a carrier module (3), characterized in that: The carrier module (3) includes a vertical clamp (3A) for fixing the workpiece (10) and a drive module for moving the vertical clamp (3A) along the spraying module (1). The vertical clamp (3A) is swayably mounted on the drive module via a lifting assembly (3B). The spraying module (1) includes a first spraying module (1A) and a second spraying module (1B) arranged opposite to each other. A feeding channel (200) is formed between the first spraying module (1A) and the second spraying module (1B) through which the vertical clamp (3A) can pass. A first limiting component (4) is provided at the lower end of the feeding channel (200). The first limiting component (4) includes two limiting members disposed opposite to each other on both sides of the vertical clamp (3A), and a first limiting channel (201) for limiting the vertical clamp (3A) is formed between the two limiting members. The width of the first limiting channel (201) is greater than the width of the vertical clamp (3A). Driven by the drive module, the vertical fixture (3A) and the workpiece (10) pass through the spray module (1) along the feeding channel (200). The first spray module (1A) and the second spray module (1B) alternately spray etching liquid onto the first and second surfaces of the workpiece (10). When the first spray module (1A) sprays etching liquid onto the first surface of the workpiece (10), the workpiece (10) swings along the lifting assembly (3B) towards the second spray module (1B) under the push of the etching liquid. The workpiece (10) is limited by the first limiting channel (201) to form an inertial force, causing the etching liquid attached to the second surface of the workpiece (10) to be thrown out towards the second spray module (1B). Conversely, when the second spray module (1B) sprays etching liquid onto the second surface of the workpiece (10), the etching liquid attached to the first surface of the workpiece (10) is thrown out towards the first spray module (1A).

2. The precision etching apparatus according to claim 1, characterized in that: The upper end of the feeding channel (200) is provided with a second limiting component (5). The second limiting component (5) includes a protective plate (6) installed on the upper end of the vertical clamp (3A) and two guide plates respectively installed on the first spray module (1A) and the second spray module (1B). A second limiting channel (202) through which the vertical clamp (3A) can pass is provided between the two guide plates. The width of the protective plate (6) is greater than the width of the second limiting channel.

3. The precision etching apparatus according to claim 1, characterized in that: The drive module includes a track (300), a chain (301), and a drive motor. The track (300) is installed above the feeding channel (200). The lifting device assembly (3B) includes a roller assembly (30B) slidably disposed on the track (300) and connected to the chain (301).

4. The precision etching apparatus according to claim 3, characterized in that: The lifting device assembly (3B) also includes a hook (31B) fixedly mounted on the vertical clamp (3A) and a tripod (32B) mounted on the lower end of the roller assembly (30B), the hook (31B) being hooked onto the tripod (32B).

5. The precision etching apparatus according to claim 3, characterized in that: The lifting device assembly (3B) also includes a connector (33B) fixedly mounted on the vertical clamp (3A) and a load bearing (34B) mounted on the lower end of the roller assembly (30B). The connector (33B) is rotatably mounted on the load bearing (34B) via a pivot (35B).

6. The precision etching apparatus according to claim 5, characterized in that: The load-bearing bearing (34B) is rotatably mounted on the lower end of the roller assembly (30B) via a bearing housing (36B), which is oscillating along the axial direction of the track (300).

7. A precision etching apparatus according to any one of claims 3-6, characterized in that: The vertical fixture (3A) includes a fixed frame (30A), a base plate (31A), and two guide rods (32A). The two guide rods (32A) are respectively vertically arranged at both ends of the fixed frame (30A). One end of the base plate (31A) is rotatably hinged to the bottom end of one of the guide rods (32A), and the other end of the base plate (31A) is connected to the other guide rod (32A) through a pin. Counterweights (33A) are slidably installed on the two guide rods (32A). The counterweights (33A) and the base plate (31A) are provided with positioning grooves (34A) for limiting the workpiece (10).

8. A precision etching apparatus according to any one of claims 1-6, characterized in that: The first injection module (1A) and the second injection module (1B) both include a plurality of vertically arranged nozzles (101) and a liquid pump. The nozzles (101) are arranged with a plurality of nozzles (102) at intervals from top to bottom. The nozzles (101) are connected to the liquid pump through a solenoid valve.

9. The precision etching apparatus according to claim 8, characterized in that, Each of at least one of the nozzles (101) constitutes a group of injection units, and each group of injection units is connected to the liquid pump via the same solenoid valve.

10. The precision etching apparatus according to claim 9, characterized in that: The feeding channel (200) is equipped with a sensor for sensing the vertical clamp (3A) for each group of the spraying units.

Citation Information

Patent Citations

  • Precise etching module, precise etching device and etching process of precise etching device

    CN114150316A