A control method and system for a photovoltaic cell piece negative pitch shingling process

Abstract

The application discloses a kind of photovoltaic cell piece negative interval imbrication process control method and system, it is related to cell piece imbrication technical field, comprising: S1, the first, tail portion step surface corresponding to target photovoltaic cell piece is respectively carried out image acquisition, obtains first imbrication plan image and second imbrication plan image, respectively according to first imbrication plan image and second imbrication plan image, target photovoltaic cell piece is carried out imbrication negative interval deviation analysis, according to analysis result, obtains negative interval deviation monitoring index value;S2, according to negative interval deviation monitoring index value, target photovoltaic cell piece is carried out interval rationality judgment, according to the result of judgment, target photovoltaic cell piece is carried out photovoltaic power generation power monitoring, obtains cell piece electric power monitoring data;S3, according to cell piece electric power monitoring data, target photovoltaic cell piece is carried out photovoltaic control early warning, the application effectively improves the control efficiency of photovoltaic cell piece negative interval imbrication and the power generation efficiency of photovoltaic cell piece.

Description

Technical Field

[0001] This invention relates to the field of solar cell shingling technology, and specifically to a control method and system for a negative-pitch shingling process of photovoltaic cells. Background Technology

[0002] Existing methods for controlling negative spacing in photovoltaic cells have the following drawbacks when performing negative spacing control in shingled cells:

[0003] 1. Existing photovoltaic cell negative spacing control methods cannot combine the images of the stepped surfaces at the beginning and end of the photovoltaic cells to automatically monitor the negative spacing when controlling the negative spacing of shingled cells. This can easily lead to deviations between the actual spacing and the design value, affecting power generation efficiency.

[0004] 2. Existing methods for controlling negative spacing of photovoltaic cells do not periodically monitor the power generation of photovoltaic cells, nor do they have effective automatic early warning mechanisms for photovoltaic cells. This leads to a lag in adjusting the photovoltaic cell process, which also affects power generation efficiency. Summary of the Invention

[0005] In view of one or more shortcomings of the prior art, the present invention provides a control method and system for the negative-pitch shingled process of photovoltaic cells, which can effectively improve the power generation efficiency of photovoltaic cells.

[0006] To achieve the above objectives, the present invention adopts one or more of the following technical solutions:

[0007] In a first aspect, a method for controlling the negative-spacing shingling process of photovoltaic cells is provided, comprising the following steps:

[0008] S1. Obtain the first and last stepped surface images of the target photovoltaic cell to obtain the first shingled plane image and the second shingled plane image. Perform shingled negative spacing deviation analysis on the target photovoltaic cell based on the first shingled plane image and the second shingled plane image respectively, and obtain the negative spacing deviation monitoring index value based on the analysis results.

[0009] S2. Based on the negative spacing deviation monitoring index value, judge the spacing rationality of the target photovoltaic cells, monitor the photovoltaic power generation of the target photovoltaic cells based on the judgment result, and obtain the cell power monitoring data based on the monitoring result.

[0010] S3. Conduct photovoltaic control early warning for the target photovoltaic cells based on the cell power monitoring data.

[0011] Preferably, the specific process of step S1 is as follows:

[0012] S11. Select the photovoltaic cells in the photovoltaic power station that require shingled process control as the target photovoltaic cells.

[0013] S12. The multiple photovoltaic cell bars that make up the target photovoltaic cell are named D1 photovoltaic cell bar to Da photovoltaic cell bar according to the order of shingling.

[0014] S13. Monitor the negative spacing of photovoltaic cell strips from D1 to Da, and obtain the negative spacing deviation monitoring index value based on the monitoring results.

[0015] Preferably, the specific process of step S13 is as follows:

[0016] S131. The first stepped surface formed by stacking photovoltaic cells D1 to Da with negative spacing in the target photovoltaic cell is used as the first shingled monitoring plane, and the last stepped surface formed by stacking photovoltaic cells D1 to Da with negative spacing is used as the second shingled monitoring plane.

[0017] S132. Images are acquired from the first shingle monitoring plane and the second shingle monitoring plane to obtain images of the first shingle plane and the second shingle plane, respectively.

[0018] S133. Perform negative spacing monitoring on photovoltaic cell strips D1 to Da in the first shingled plane image to obtain the negative spacing value from the beginning of D1 to the beginning of Db.

[0019] S134. Perform negative spacing monitoring on photovoltaic cell strips D1 to Da in the second shingled plane image, and obtain the negative spacing values ​​from the tail of D1 to the tail of Db.

[0020] S135. Obtain the negative spacing deviation monitoring index value based on the negative spacing value from the beginning of D1 to the beginning of Db and the negative spacing value from the end of D1 to the end of Db.

[0021] Where b = a - 1.

[0022] Preferably, the specific process of step S133 is as follows:

[0023] S1331. Obtain the right edge point of the D1 photovoltaic cell strip in the first shingled planar image to obtain the first head shingled feature point; obtain the left edge point of the D2 photovoltaic cell strip in the first shingled planar image to obtain the second head shingled feature point; obtain the right edge point of the D2 photovoltaic cell strip in the first shingled planar image to obtain the third head shingled feature point; and so on, obtain the left edge point of the Da photovoltaic cell strip in the first shingled planar image to obtain the cth head shingled feature point;

[0024] S1332. In the first shingled planar image, draw the extension line of the upper edge of the D1 photovoltaic cell strip to obtain the head reference line; draw a perpendicular line from the first head shingled feature point to the head reference line to obtain the first shingled head feature line; draw a perpendicular line from the second head shingled feature point to the head reference line to obtain the second shingled head feature line, and so on, draw a perpendicular line from the cth head shingled feature point to the head reference line to obtain the cth shingled head feature line.

[0025] S1333. Obtain the vertical distance between the first shingle head feature line and the second shingle head feature line to get the D1 head negative spacing value. Obtain the vertical distance between the second shingle head feature line and the third shingle head feature line to get the D2 head negative spacing value. And so on, obtain the vertical distance between the c-1th shingle head feature line and the cth shingle head feature line to get the Db head negative spacing value.

[0026] Preferably, the specific process of step S134 is as follows:

[0027] S1341. Obtain the right edge point of the D1 photovoltaic cell strip in the second shingled plane image to obtain the first tail shingled feature point; obtain the left edge point of the D2 photovoltaic cell strip in the second shingled plane image to obtain the second tail shingled feature point; obtain the right edge point of the D2 photovoltaic cell strip in the second shingled plane image to obtain the third tail shingled feature point; and so on, obtain the left edge point of the Da photovoltaic cell strip in the second shingled plane image to obtain the c-th tail shingled feature point;

[0028] S1342. In the second shingled planar image, extend the upper edge line of the beginning of the D1 photovoltaic cell strip to obtain the tail reference line; draw a perpendicular line from the first tail shingled feature point to the tail reference line to obtain the first shingled tail feature line; draw a perpendicular line from the second tail shingled feature point to the tail reference line to obtain the second shingled tail feature line; and so on, draw a perpendicular line from the cth tail shingled feature point to the tail reference line to obtain the cth shingled tail feature line.

[0029] S1343. Obtain the vertical distance between the tail feature line of the first shingle and the tail feature line of the second shingle to obtain the tail negative spacing value D1; obtain the vertical distance between the tail feature line of the third shingle and the tail feature line of the fourth shingle to obtain the tail negative spacing value D2; and so on, obtain the vertical distance between the tail feature line of the (c-1)th shingle and the tail feature line of the cth shingle to obtain the tail negative spacing value Db.

[0030] Preferably, the specific process of step S135 is as follows:

[0031] S1351. Obtain the negative spacing deviation value between every two consecutive photovoltaic cell bars to obtain multiple negative spacing deviation values;

[0032] S1352. Obtain the reasonable range of negative spacing deviation, and obtain the range value of the interval corresponding to the reasonable range of negative spacing deviation to obtain the span of the reasonable deviation range;

[0033] S1353. Count the negative spacing deviation values ​​that are within the reasonable range of negative spacing deviation to obtain the reasonable spacing deviation quantity value; Count the negative spacing deviation values ​​to obtain the negative spacing deviation quantity value; Calculate the ratio of the reasonable spacing deviation quantity value to the negative spacing deviation quantity value to obtain the negative spacing deviation pass rate.

[0034] S1354. The negative spacing deviation monitoring index value is calculated based on the negative spacing deviation compliance rate, the reasonable range of deviation, and multiple negative spacing deviation values; the calculation formula is as follows:

[0035]

[0036] Wherein, Pzb is the negative spacing deviation monitoring index value, Hgd is the negative spacing deviation qualification rate, Hfz is the reasonable range of deviation, Fpci is any one of the multiple negative spacing deviation values, and n is the quantity value corresponding to the negative spacing deviation value.

[0037] Preferably, the specific process of step S1351 is as follows:

[0038] Obtain the reference value of the shingled negative spacing corresponding to the set target photovoltaic cell, calculate the absolute value of the difference between the negative spacing value at the beginning of D1 and the reference value of the shingled negative spacing, and obtain the negative spacing deviation value at the beginning of D1; calculate the absolute value of the difference between the negative spacing value at the end of D1 and the reference value of the shingled negative spacing, and obtain the negative spacing deviation value at the end of D1.

[0039] Compare the negative spacing deviation values ​​at the beginning and end of D1 with those at the end of D1:

[0040] If the negative spacing deviation value at the beginning of D1 is greater than or equal to the negative spacing deviation value at the end of D1, then the negative spacing deviation value at the beginning of D1 is set as the negative spacing deviation value between the photovoltaic cell strips D1 and D2.

[0041] If the negative spacing deviation value at the head of D1 is less than the negative spacing deviation value at the tail of D1, then the negative spacing deviation value at the tail of D1 is set as the negative spacing deviation value between the photovoltaic cell strips D1 and D2.

[0042] Repeat the process of obtaining the negative spacing deviation value between photovoltaic cell strips D1 and D2, and obtain the negative spacing deviation value between every two consecutive photovoltaic cell strips to obtain multiple negative spacing deviation values.

[0043] Preferably, in step S1352, the specific process for obtaining the reasonable range of negative spacing deviation is as follows:

[0044] Several historical photovoltaic cells with normal shingled operation are obtained. The average negative spacing deviation of the photovoltaic cells corresponding to each historical photovoltaic cell is obtained. The values ​​of the obtained average negative spacing deviations of photovoltaic cells are compared. The average negative spacing deviation of the photovoltaic cells with the smallest value is set as the lower limit of the reasonable range of negative spacing deviation, and the average negative spacing deviation of the photovoltaic cells with the largest value is set as the upper limit of the reasonable range of negative spacing deviation, thus obtaining the reasonable range of negative spacing deviation.

[0045] Preferably, the specific process of step S2 is as follows:

[0046] S21. Obtain the preset range of the negative spacing deviation index. Based on the negative spacing deviation monitoring index value and the preset range of the negative spacing deviation index, determine the rationality of the shingle spacing to obtain the rationality judgment data of the shingle spacing:

[0047] If the negative spacing deviation monitoring index value is within the preset range of the negative spacing deviation index, it is determined that the shingled spacing corresponding to the target photovoltaic cell is reasonable; if the negative spacing deviation monitoring index value is not within the preset range of the negative spacing deviation index, it is determined that the shingled spacing corresponding to the target photovoltaic cell is unreasonable.

[0048] S22. If the shingled spacing of the target photovoltaic cell is reasonable, the power generation of the target photovoltaic cell is monitored, and periodic power generation monitoring data is obtained based on the monitoring results to obtain the cell power monitoring data.

[0049] Preferably, in step S21, the specific process of obtaining the preset range of the negative spacing deviation index is as follows:

[0050] For several historical photovoltaic cells with reasonable shingled spacing, the corresponding negative spacing deviation monitoring index values ​​are obtained. The values ​​of the obtained negative spacing deviation monitoring index values ​​are compared. The negative spacing deviation monitoring index value with the smallest value is set as the lower limit of the preset range of negative spacing deviation index, and the negative spacing deviation index with the largest value is set as the upper limit of the reasonable range of negative spacing deviation, thus obtaining the preset range of negative spacing deviation index.

[0051] Preferably, the specific process of step S22 is as follows:

[0052] Obtain the set power generation monitoring period, obtain the average power generation of the target photovoltaic cell within the power generation monitoring period, and obtain the power generation of the target period;

[0053] For the photovoltaic cells that have been put into operation in the photovoltaic power station, the average power generation of each photovoltaic cell in operation during the power generation monitoring period is obtained to obtain multiple power generation values. The values ​​of the multiple power generation values ​​are compared. The power generation value with the largest value is set as the upper limit of the reasonable power generation range, and the power generation value with the smallest value is set as the lower limit of the reasonable power generation range, thus obtaining the reasonable power generation range.

[0054] The reasonable range of power generation and the target periodic power generation are defined as periodic power generation monitoring data, and the periodic power generation monitoring data and the data for judging the reasonableness of the shingled spacing are defined as cell power monitoring data.

[0055] Preferably, the specific process of step S3 is as follows:

[0056] Acquire solar cell power monitoring data; based on this data, obtain periodic power generation monitoring data and shingle spacing rationality assessment data; and based on these data, determine whether to issue a photovoltaic control early warning. The assessment content includes:

[0057] If the data on the rationality of the shingle spacing shows that the shingle spacing corresponding to the target photovoltaic cell is unreasonable, a photovoltaic control warning will be issued directly.

[0058] If the data from the shingle spacing assessment shows that the shingle spacing corresponding to the target photovoltaic cells is reasonable, then further judgment is made based on the reasonable power generation range and the target cycle power generation obtained from the cell power monitoring data:

[0059] If the power generation during the target period is within a reasonable range, there is no need to issue a photovoltaic control warning.

[0060] If the power generation during the target period is not within the reasonable range, a photovoltaic control warning will be issued directly.

[0061] Secondly, the present invention provides a control system for a negative-pitch shingled process of photovoltaic cells, comprising:

[0062] The negative spacing deviation monitoring module is used to acquire images of the first and last stepped surfaces of the target photovoltaic cell, respectively, to obtain the first shingled plane image and the second shingled plane image. Based on the first shingled plane image and the second shingled plane image, the negative spacing deviation of the target photovoltaic cell is analyzed, and the negative spacing deviation monitoring index value is obtained based on the analysis results.

[0063] The power monitoring module is used to judge the spacing rationality of the target photovoltaic cells based on the negative spacing deviation monitoring index value, monitor the photovoltaic power generation of the target photovoltaic cells based on the judgment result, and obtain the cell power monitoring data based on the monitoring result.

[0064] The control and early warning module is used to provide photovoltaic control and early warning for the target photovoltaic cells based on the cell power monitoring data.

[0065] Thirdly, the present invention also provides a computer device, including a memory and a processor, the memory storing a computer program, and the processor being configured to run the computer program stored in the memory to perform the steps in a control method for a negative-pitch shingled process of photovoltaic cells as described in any of the preceding claims.

[0066] Fourthly, the present invention also provides a non-transitory computer-readable storage medium for storing a readable computer program, which, when run by a processor, is capable of executing the steps in a control method for a negative-pitch shingled process of photovoltaic cells as described in any of the preceding claims.

[0067] By adopting the above technical solution, the beneficial effects of the present invention are as follows:

[0068] 1. In controlling the negative spacing of shingled photovoltaic cells, this invention automatically monitors the negative spacing by acquiring images of the stepped surfaces at the beginning and end of the photovoltaic cells. This accurately monitors the deviation between the actual spacing and the design value, improving the precision of the negative spacing control. Furthermore, by periodically monitoring the power generation of the photovoltaic cells, the invention uses the periodic power generation monitoring results combined with the negative spacing deviation monitoring index value to automatically control and warn of the photovoltaic cells. This improves the timeliness of photovoltaic cell process adjustments, enabling timely and targeted process adjustments to the photovoltaic cells, further enhancing the power generation efficiency of the photovoltaic cells.

[0069] 2. In this invention, negative spacing values ​​are obtained by image negative spacing monitoring and shingled negative spacing analysis is performed. Non-contact geometric measurement is used to replace traditional manual caliper detection, avoiding the risk of damage to the battery strip edge caused by physical contact. At the same time, the detection accuracy is greatly improved, ensuring accurate capture of negative spacing changes.

[0070] 3. In this invention, the existence of the negative spacing deviation monitoring index value is compared with the preset range of the negative spacing deviation index to determine whether the shingled spacing of the target photovoltaic cell is reasonable. This can quickly identify abnormal shingled spacing and reduce power generation efficiency loss caused by installation defects from the source. By conducting targeted periodic power generation monitoring on photovoltaic cells with reasonable shingled spacing, performance degradation trends can be actively captured, and preventive maintenance can be achieved through data-driven approaches to avoid sudden failures. This hierarchical management and control strategy not only ensures basic quality standards but also extends the effective service life of equipment through continuous performance tracking, ultimately improving the overall operation and maintenance efficiency and power generation revenue of photovoltaic cells. Therefore, this invention achieves dual optimization of photovoltaic cell quality and performance through a collaborative mechanism of dynamic comparison and intelligent monitoring. Attached Figure Description

[0071] The accompanying drawings, which form part of this invention, are used to provide a further understanding of the invention. The illustrative embodiments of the invention and their descriptions are used to explain the invention and do not constitute an improper limitation of the invention.

[0072] Figure 1 This is a flowchart of a method according to an embodiment of the present invention;

[0073] Figure 2 This is a schematic diagram of the first shingled planar image according to an embodiment of the present invention;

[0074] Figure 3 This is a schematic diagram illustrating the acquisition of the negative spacing value of the D1 header according to an embodiment of the present invention;

[0075] Figure 4 This is a schematic diagram of obtaining the negative spacing value of the tail of D1 according to an embodiment of the present invention. Detailed Implementation

[0076] It should be noted that the following detailed description is illustrative and intended to provide further explanation of the invention. Unless otherwise specified, all technical and scientific terms used in this invention have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains.

[0077] It should be noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the exemplary embodiments of the present invention. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise. Furthermore, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

[0078] Example 1

[0079] In one typical embodiment of this application, a method for controlling the negative-pitch shingling process of photovoltaic cells is provided, such as... Figures 1-4 As shown, it includes the following steps:

[0080] S1. Images of the first and second stepped surfaces corresponding to the target photovoltaic cell are acquired to obtain the first shingled plane image and the second shingled plane image. The negative spacing deviation of the target photovoltaic cell is analyzed based on the first shingled plane image and the second shingled plane image, and the negative spacing deviation monitoring index value is obtained based on the analysis results.

[0081] In this embodiment, the first stepped surface and the last stepped surface refer to the stepped surfaces on both sides of the target photovoltaic cell. An industrial camera is used to photograph the stepped surfaces on both sides respectively, thereby obtaining the first shingled planar image and the second shingled planar image.

[0082] Preferably, the specific process of step S1 includes:

[0083] S11. Obtain the photovoltaic cells in the photovoltaic power station that require shingling process control, and select one of the multiple photovoltaic cells as the target photovoltaic cell.

[0084] In this embodiment, the photovoltaic cell referred to herein is specifically a photovoltaic cell that is in the shingled cell installation stage.

[0085] S12. Obtain the battery bars that make up the target photovoltaic cell, and name the multiple photovoltaic battery bars obtained in the order of shingling as photovoltaic battery bar D1 to photovoltaic battery bar Da.

[0086] In this embodiment, the photovoltaic cell strips involved are cut from photovoltaic cells laid on the surface of the target photovoltaic cell, and the cut area corresponding to each photovoltaic cell strip is equal.

[0087] In this embodiment, D1 to Da are the serial numbers corresponding to the multiple photovoltaic cell strips obtained, and two photovoltaic cells with consecutive serial numbers are in a stacked state in the target photovoltaic cell, that is, photovoltaic cell strip D2 is in a stacked state with photovoltaic cell strip D1 and photovoltaic cell strip D3 respectively.

[0088] S13. Monitor the negative spacing of photovoltaic cell strips from D1 to Da, and obtain the negative spacing deviation monitoring index value based on the monitoring results.

[0089] Specifically as follows:

[0090] S131, reference Figure 2As shown, in the target photovoltaic cell, the first stepped surface formed by stacking photovoltaic cells D1 to Da with negative spacing is obtained to obtain the first shingled monitoring plane, and the second stepped surface formed by stacking photovoltaic cells D1 to Da with negative spacing is obtained to obtain the second shingled monitoring plane.

[0091] S132. Images of the first shingle monitoring plane and the second shingle monitoring plane are acquired respectively to obtain images of the first shingle plane and the second shingle plane.

[0092] In this embodiment, the first shingled planar image and the second shingled planar image are obtained in the same way, and the display parameters of the D1 photovoltaic cell strip to the Da photovoltaic cell strip are the same in the first shingled planar image and the second shingled planar image. The display parameters involved here include, but are not limited to, display angle, display ratio and distortion angle.

[0093] S133. Perform negative spacing monitoring on photovoltaic cell strips D1 to Da in the first shingled planar image, and obtain the negative spacing values ​​from the beginning of D1 to the beginning of Db based on the monitoring results.

[0094] In this embodiment, the two photovoltaic cell strips will show a negative spacing between the shingled layers in the shingled image, so b = a - 1.

[0095] Step S133 is as follows:

[0096] S1331, please refer to Figure 3 The first head shingle feature point P1 is obtained by acquiring the right edge point of the D1 photovoltaic cell strip in the first shingle planar image. The second head shingle feature point P2 is obtained by acquiring the left edge point of the D2 photovoltaic cell strip in the first shingle planar image. The third head shingle feature point P3 is obtained by acquiring the right edge point of the D2 photovoltaic cell strip in the first shingle planar image. And so on, the cth head shingle feature point Pc is obtained by acquiring the left edge point of the Da photovoltaic cell strip in the first shingle planar image.

[0097] Here, c represents the number of feature points corresponding to the first shingled tile, and c is an integer greater than 0.

[0098] S1332. In the first shingled planar image, extend the upper edge line of the D1 photovoltaic cell strip to obtain the first reference line L. Draw a perpendicular line from the first first shingled feature point P1 to the first reference line L to obtain the first shingled feature line L1. Draw a perpendicular line from the second first shingled feature point P2 to the first reference line L to obtain the second shingled feature line L2. And so on, draw a perpendicular line from the cth first shingled feature point Pc to the first reference line L to obtain the cth shingled feature line Lc.

[0099] S1333. The vertical distance between the first shingle head feature line L1 and the second shingle head feature line L2 is numerically obtained to obtain the head negative spacing value D1. The vertical distance between the third shingle head feature line L3 and the fourth shingle head feature line L4 is numerically obtained to obtain the head negative spacing value D2. And so on, the vertical distance between the (c-1)th shingle head feature line Lc-1 and the cth shingle head feature line Lc is numerically obtained to obtain the head negative spacing value Db.

[0100] S134. Perform negative spacing monitoring on photovoltaic cell strips D1 to Da in the second shingled planar image, and obtain the negative spacing values ​​from the tail of D1 to the tail of Db based on the monitoring results.

[0101] Specifically as follows:

[0102] S1341, please refer to Figure 4 The first tail shingled feature point Q1 is obtained by acquiring the right edge point of the D1 photovoltaic cell strip in the second shingled plane image. The second tail shingled feature point Q2 is obtained by acquiring the left edge point of the D2 photovoltaic cell strip in the second shingled plane image. The third tail shingled feature point Q3 is obtained by acquiring the right edge point of the D2 photovoltaic cell strip in the second shingled plane image. Similarly, the c-th tail shingled feature point Qc is obtained by acquiring the left edge point of the Da photovoltaic cell strip in the second shingled plane image.

[0103] S1342. In the second shingled planar image, extend the upper edge line of the tail of the D1 photovoltaic cell strip to obtain the tail reference line F. Draw a perpendicular line from the tail reference line F through the first tail shingled feature point Q1 to obtain the first tail feature line F1. Draw a perpendicular line from the tail reference line F through the second tail shingled feature point Q2 to obtain the second tail feature line F2. And so on, draw a perpendicular line from the tail reference line F through the c-th tail shingled feature point Qc to obtain the c-th tail feature line Fc.

[0104] S1343. The vertical distance between the tail feature line F1 of the first shingle and the tail feature line F2 of the second shingle is numerically obtained to obtain the tail negative distance value D1. The vertical distance between the tail feature line F3 of the third shingle and the tail feature line F4 of the fourth shingle is numerically obtained to obtain the tail negative distance value D2. Similarly, the vertical distance between the tail feature line Fc-1 of the (c-1)th shingle and the tail feature line Fc of the cth shingle is numerically obtained to obtain the tail negative distance value Db.

[0105] S135. Obtain the negative spacing deviation monitoring index value based on the negative spacing value from the beginning of D1 to the beginning of Db and the negative spacing value from the end of D1 to the end of Db.

[0106] Specifically as follows:

[0107] S1351. Obtain the reference value of the shingled negative spacing corresponding to the set target photovoltaic cell, calculate the difference between the negative spacing value at the beginning of D1 and the reference value of the shingled negative spacing, and take the absolute value of the obtained difference to obtain the negative spacing deviation value at the beginning of D1. Calculate the difference between the negative spacing value at the end of D1 and the reference value of the shingled negative spacing, and take the absolute value of the obtained difference to obtain the negative spacing deviation value at the end of D1.

[0108] The shingled negative spacing reference value mentioned here is specifically the shingled negative spacing value determined during the design of the target photovoltaic cell, which is generally 1~3mm, and preferably 3mm in this embodiment.

[0109] The negative spacing deviation value at the beginning of D1 is compared with the negative spacing deviation value at the end of D1. If the negative spacing deviation value at the beginning of D1 is greater than or equal to the negative spacing deviation value at the end of D1, then the negative spacing deviation value at the beginning of D1 is set as the negative spacing deviation value between the photovoltaic cell strip D1 and the photovoltaic cell strip D2.

[0110] The negative spacing deviation value at the head of D1 is compared with the negative spacing deviation value at the tail of D1. If the negative spacing deviation value at the head of D1 is less than the negative spacing deviation value at the tail of D1, then the negative spacing deviation value at the tail of D1 is set as the negative spacing deviation value between the photovoltaic cell strips D1 and D2.

[0111] Repeat the process of obtaining the negative spacing deviation value between photovoltaic cell strips D1 and D2, and obtain the negative spacing deviation value between every two consecutive photovoltaic cell strips to obtain multiple negative spacing deviation values.

[0112] S1352. Obtain the reasonable range of negative spacing deviation, and obtain the range value of the interval corresponding to the reasonable range of negative spacing deviation to obtain the span of the reasonable deviation range;

[0113] Specifically as follows:

[0114] Several historical photovoltaic cells with normal shingled operation were obtained. The average negative spacing deviation of the photovoltaic cells corresponding to each historical photovoltaic cell was obtained. The values ​​of the obtained average negative spacing deviations of photovoltaic cells were compared. The average negative spacing deviation of the photovoltaic cells with the smallest value was set as the lower limit of the reasonable range of negative spacing deviation, and the average negative spacing deviation of the photovoltaic cells with the largest value was set as the upper limit of the reasonable range of negative spacing deviation, thus obtaining the reasonable range of negative spacing deviation. The difference between the maximum value of the average negative spacing deviation of photovoltaic cells corresponding to the upper limit of the reasonable range of negative spacing deviation and the minimum value of the average negative spacing deviation of photovoltaic cells corresponding to the lower limit of the reasonable range of negative spacing deviation was calculated to obtain the span of the reasonable range of deviation.

[0115] The historical photovoltaic cells involved here are the same type as the target photovoltaic cells.

[0116] S1353. Statistically count the negative spacing deviation values ​​within the reasonable range of negative spacing deviation to obtain the reasonable spacing deviation value. Statistically count the negative spacing deviation values ​​to obtain the negative spacing deviation value. Calculate the ratio of the reasonable spacing deviation value to the negative spacing deviation value to obtain the negative spacing deviation pass rate.

[0117] Among them, the range within the reasonable deviation range includes the case where it is within the range.

[0118] S1354. The negative spacing deviation monitoring index value is calculated based on the negative spacing deviation compliance rate, the reasonable range of deviation, and multiple negative spacing deviation values; the specific calculation formula is as follows:

[0119]

[0120] Wherein, Pzb is the negative spacing deviation monitoring index value, Hgd is the negative spacing deviation qualification rate, Hfz is the reasonable range of deviation, Fpci is any one of the multiple negative spacing deviation values, and n is the quantity value corresponding to the negative spacing deviation value.

[0121] In this embodiment, step S1 adopts the above-mentioned technical solution, which uses a geometric method to monitor the negative spacing of photovoltaic cell strips D1 to Da in the first shingled plan view and the second shingled plan view. Based on the monitoring results, the negative spacing values ​​from the tail of D1 to the tail of Db and from the tail of D1 to the tail of Db are obtained. Based on this, a comprehensive shingled negative spacing analysis is performed on the target photovoltaic cell. This method uses non-contact geometric measurement to replace traditional manual caliper detection, which can effectively avoid edge damage to the cell strips caused by physical contact, and at the same time improve the detection accuracy to the micrometer level, ensuring accurate capture of negative spacing changes.

[0122] S2. Based on the negative spacing deviation monitoring index value, determine the spacing rationality of the target photovoltaic cells, monitor the photovoltaic power generation of the target photovoltaic cells based on the judgment result, and obtain the cell power monitoring data based on the monitoring result.

[0123] Specifically as follows:

[0124] S21. Obtain the preset range of the negative spacing deviation index, and judge the rationality of the shingle spacing based on the negative spacing deviation monitoring index value and the preset range of the negative spacing deviation index:

[0125] If the negative spacing deviation monitoring index value is within the preset range of the negative spacing deviation index, it is determined that the shingled spacing corresponding to the target photovoltaic cell is reasonable. If the negative spacing deviation monitoring index value is not within the preset range of the negative spacing deviation index, it is determined that the shingled spacing corresponding to the target photovoltaic cell is unreasonable. The reasonableness judgment data of the shingled spacing is obtained.

[0126] Reasonable shingle spacing includes situations where the negative spacing deviation monitoring index value is within the preset range boundary of the negative spacing deviation index.

[0127] Specifically, the preset range for obtaining the negative spacing deviation index is as follows:

[0128] Obtain several historical photovoltaic cells with reasonable shingled spacing. For each historical photovoltaic cell, obtain its corresponding negative spacing deviation monitoring index value according to the method in step S1. Compare the numerical values ​​of several negative spacing deviation monitoring index values ​​of the obtained historical photovoltaic cells. Set the negative spacing deviation monitoring index value with the smallest value as the lower limit of the preset range of negative spacing deviation index, and set the preset range of negative spacing deviation index with the largest value as the upper limit of the reasonable range of negative spacing deviation, thus obtaining the preset range of negative spacing deviation index.

[0129] S22. If the shingled spacing of the target photovoltaic cell is reasonable, the power generation of the target photovoltaic cell is monitored, and periodic power generation monitoring data is obtained based on the monitoring results, thereby obtaining the cell power monitoring data.

[0130] Specifically as follows:

[0131] Obtain the set power generation monitoring period, obtain the average power generation of the target photovoltaic cell within the power generation monitoring period, and obtain the target period power generation.

[0132] In the process of monitoring the power generation of the target photovoltaic cell, the time point at which the target photovoltaic cell begins to generate electricity can be set as the first power generation characteristic time point, and the time point corresponding to the monitoring time can be set as the second power generation characteristic time point. Alternatively, other specific times after the start of power generation can be selected as the second power generation characteristic time point, and the time period between the first power generation characteristic time point and the second power generation characteristic time point can be set as the power generation monitoring period. Preferably, the power generation monitoring period is set to 60 seconds.

[0133] The photovoltaic cells already in operation at the photovoltaic power station were obtained, resulting in multiple photovoltaic cells in operation.

[0134] In this embodiment, all photovoltaic cells involved in production are photovoltaic cells with normal power generation, and the photovoltaic cells involved in production are of the same type as the target photovoltaic cells.

[0135] The average power generation of each photovoltaic cell in operation during the power generation monitoring period is obtained to obtain multiple power generation values. The values ​​of these multiple power generation values ​​are compared, and the power generation value with the largest value is set as the upper limit of the reasonable power generation range, while the power generation value with the smallest value is set as the lower limit of the reasonable power generation range, thus obtaining the reasonable power generation range.

[0136] The reasonable range of power generation and the target periodic power generation are defined as periodic power generation monitoring data, and the periodic power generation monitoring data and the data for judging the reasonableness of the shingled spacing are defined as cell power monitoring data.

[0137] In this embodiment, step S2 adopts the above-mentioned scheme, which determines whether the shingled spacing of the target photovoltaic cell is reasonable by comparing the negative spacing deviation monitoring index value with the preset range of the negative spacing deviation index. Then, targeted periodic power generation monitoring is performed on photovoltaic cells with reasonable shingled spacing. In this way, through the synergistic mechanism of dynamic comparison and intelligent monitoring, the dual optimization of photovoltaic cell quality and performance is achieved.

[0138] First, the preset interval comparison can quickly identify abnormal shingle spacing, reducing the loss of power generation efficiency caused by installation defects from the source;

[0139] Secondly, periodic power generation monitoring of qualified products can proactively capture performance degradation trends, enabling preventative maintenance through data-driven approaches and avoiding sudden failures.

[0140] Finally, this tiered management strategy not only ensures basic quality standards but also extends the effective service life of equipment through continuous performance tracking, ultimately improving overall operation and maintenance efficiency and power generation revenue.

[0141] S3. Conduct photovoltaic control early warning for the target photovoltaic cells based on the cell power monitoring data.

[0142] Specifically as follows:

[0143] Acquire solar cell power monitoring data; based on this data, obtain periodic power generation monitoring data and shingle spacing rationality assessment data; based on these data, determine whether to issue a photovoltaic control early warning, specifically:

[0144] If the data on the rationality of the shingle spacing shows that the shingle spacing corresponding to the target photovoltaic cell is unreasonable, a photovoltaic control warning will be issued directly.

[0145] If the data from the shingle spacing assessment shows that the shingle spacing corresponding to the target photovoltaic cells is reasonable, then further judgment is made based on the reasonable power generation range and the target cycle power generation obtained from the cell power monitoring data:

[0146] If the power generation during the target period is within a reasonable range, there is no need to issue a photovoltaic control warning.

[0147] If the target period's power generation is not within a reasonable range, a photovoltaic control early warning will be issued directly.

[0148] Among them, situations in which photovoltaic control early warnings are issued directly include when the target period power generation is not within the reasonable power generation range boundary.

[0149] It should be noted that in the above process of this embodiment, if a corresponding calculation formula appears, the above calculation formula is to remove the dimension and take its numerical value. The weight coefficient, proportional coefficient and other coefficients in the formula are set to a result value obtained by quantifying each parameter. The size of the weight coefficient and proportional coefficient is only necessary to not affect the proportional relationship between the parameter and the result value.

[0150] In another typical embodiment of the present invention, a control system for a negative-pitch shingled process of photovoltaic cells is provided, the system comprising:

[0151] The negative spacing deviation monitoring module is used to acquire images of the first and last stepped surfaces of the target photovoltaic cell, respectively, to obtain the first shingled plane image and the second shingled plane image. Based on the first shingled plane image and the second shingled plane image, the negative spacing deviation of the target photovoltaic cell is analyzed, and the negative spacing deviation monitoring index value is obtained based on the analysis results.

[0152] The power monitoring module is used to judge the spacing rationality of the target photovoltaic cells based on the negative spacing deviation monitoring index value, monitor the photovoltaic power generation of the target photovoltaic cells based on the judgment result, and obtain the cell power monitoring data based on the monitoring result.

[0153] The control and early warning module is used to provide photovoltaic control and early warning for the target photovoltaic cells based on the cell power monitoring data.

[0154] On the other hand, the present invention also provides a computer device, including a memory and a processor, wherein the memory stores a computer program, and the processor is used to run the computer program stored in the memory to perform the steps in the control method of a negative-pitch shingled process for photovoltaic cells provided in Embodiment 1.

[0155] In another aspect, the present invention also provides a non-transitory computer-readable storage medium for storing a readable computer program, which, when run by a processor, is capable of executing the steps in the control method for a negative-pitch shingled process of photovoltaic cells provided in Embodiment 1.

[0156] It should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit it. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that the present invention can have various modifications and variations. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A control method of a photovoltaic cell piece negative pitch shingling process, characterized in that, The method comprises the following steps: S1, image acquisition is performed on the head and tail stepped surfaces corresponding to the target photovoltaic cell to obtain a first shingled plane image and a second shingled plane image, shingled negative spacing deviation analysis is performed on the target photovoltaic cell according to the first shingled plane image and the second shingled plane image, and a negative spacing deviation monitoring index value is obtained according to the analysis result; S2, spacing rationality judgment is performed on the target photovoltaic cell according to the negative spacing deviation monitoring index value, photovoltaic power generation power monitoring is performed on the target photovoltaic cell according to the judgment result, and cell power monitoring data is obtained according to the monitoring result; S3, photovoltaic control warning is performed on the target photovoltaic cell according to the cell power monitoring data; In the step S2, the following steps are included: S21, a negative spacing deviation index preset interval is obtained, shingled spacing rationality judgment is performed according to the negative spacing deviation monitoring index value and the negative spacing deviation index preset interval, and shingled spacing rationality judgment data is obtained: If the negative spacing deviation monitoring index value is in the negative spacing deviation index preset interval, it is judged that the shingled spacing of the target photovoltaic cell is reasonable; if the negative spacing deviation monitoring index value is not in the negative spacing deviation index preset interval, it is judged that the shingled spacing of the target photovoltaic cell is unreasonable; S22, if the shingled spacing of the target photovoltaic cell is reasonable, power generation power monitoring is performed on the target photovoltaic cell, periodic power generation monitoring data is obtained according to the monitoring result, and cell power monitoring data is obtained; In the step S21, the specific process of obtaining the negative spacing deviation index preset interval is as follows: The negative spacing deviation monitoring index values corresponding to a plurality of historical photovoltaic cells with reasonable shingled spacing are obtained, the obtained negative spacing deviation monitoring index values are compared in value, the minimum negative spacing deviation monitoring index value is set as the lower limit of the negative spacing deviation index preset interval, the maximum negative spacing deviation index value is set as the upper limit of the negative spacing deviation reasonable interval, and the negative spacing deviation index preset interval is obtained.

2. The method of claim 1, wherein the negative interdigitated shingling process is controlled by the controller to: The specific process of the step S1 is as follows: ​ S11, a photovoltaic cell in a photovoltaic power station that needs to be controlled by a shingling process is selected as a target photovoltaic cell; S12, a plurality of photovoltaic cell strips constituting the target photovoltaic cell are named as D1 photovoltaic cell strip to Da photovoltaic cell strip according to the shingling order; S13, shingled negative spacing monitoring is performed on the D1 photovoltaic cell strip to the Da photovoltaic cell strip, and a negative spacing deviation monitoring index value is obtained according to the monitoring result.

3. The method of claim 2, wherein the negative interdigitated shingling process is controlled by the controller to: The specific process of the step S13 is as follows: ​ S131, the head stepped surface formed by stacking the D1 photovoltaic cell strip to the Da photovoltaic cell strip in a negative spacing in the target photovoltaic cell is taken as a first shingled monitoring plane, and the tail stepped surface formed by stacking the D1 photovoltaic cell strip to the Da photovoltaic cell strip in a negative spacing is taken as a second shingled monitoring plane; S132, image acquisition is performed on the first shingled monitoring plane and the second shingled monitoring plane to obtain a first shingled plane image and a second shingled plane image; S133, image negative spacing monitoring is performed on the D1 photovoltaic cell strip to the Da photovoltaic cell strip in the first shingled planar image, and D1 head negative spacing values to Db head negative spacing values are obtained; S134, image negative spacing monitoring is performed on the D1 photovoltaic cell strip to the Da photovoltaic cell strip in the second shingled planar image, and D1 tail negative spacing values to Db tail negative spacing values are obtained according to the monitoring results; S135, according to the D1 head negative spacing values to the Db head negative spacing values and the D1 tail negative spacing values to the Db tail negative spacing values, a negative spacing deviation monitoring index value is obtained. Wherein, b = a - 1.

4. The method of claim 3, wherein the negative inter-tile spacing is controlled by the following equation: ###0001### where, d is the negative inter-tile spacing, h is the height of the tile, and θ is the angle of the tile. The specific process of step S133 is as follows: ​ S1331, the image right side edge points of the D1 photovoltaic cell strip in the first shingled planar image are obtained to obtain the first head shingled feature point; the image left side edge points of the D2 photovoltaic cell strip in the first shingled planar image are obtained to obtain the second head shingled feature point; the image right side edge points of the D2 photovoltaic cell strip in the first shingled planar image are obtained to obtain the third head shingled feature point; and so on, the image left side edge points of the Da photovoltaic cell strip in the first shingled planar image are obtained to obtain the cth head shingled feature point; S1332, in the first shingled planar image, the extension line of the D1 photovoltaic cell strip head upper edge line is drawn to obtain a head reference straight line; a vertical line passing through the first head shingled feature point and the head reference straight line is drawn to obtain a first shingled head feature straight line; a vertical line passing through the second head shingled feature point and the head reference straight line is drawn to obtain a second shingled head feature straight line; and so on, a vertical line passing through the cth head shingled feature point and the head reference straight line is drawn to obtain a cth shingled head feature straight line; S1333, the perpendicular distance between the first shingled head feature straight line and the second shingled head feature straight line is obtained to obtain the D1 head negative spacing value; the perpendicular distance between the third shingled head feature straight line and the fourth shingled head feature straight line is obtained to obtain the D2 head negative spacing value; and so on, the perpendicular distance between the c-1th shingled head feature straight line and the cth shingled head feature straight line is obtained to obtain the Db head negative spacing value.

5. The method of claim 3, wherein the negative inter-tile spacing is controlled by the following equation: ###0001### where, d is the negative inter-tile spacing, h is the height of the tile, and θ is the angle of the tile. The specific process of step S134 is as follows: ​ S1341, the image right side edge points of the D1 photovoltaic cell strip in the second shingled planar image are obtained to obtain the first tail shingled feature point; the image left side edge points of the D2 photovoltaic cell strip in the second shingled planar image are obtained to obtain the second tail shingled feature point; the image right side edge points of the D2 photovoltaic cell strip in the second shingled planar image are obtained to obtain the third tail shingled feature point; and so on, the image left side edge points of the Da photovoltaic cell strip in the second shingled planar image are obtained to obtain the cth tail shingled feature point; S1342, in the second shingle plane image, the extension line of the upper edge line of the head of the D1 photovoltaic cell strip is obtained, and the tail reference straight line is obtained; the vertical line of the tail reference straight line is drawn through the first tail shingle feature point, and the first shingle tail feature straight line is obtained; the vertical line of the tail reference straight line is drawn through the second tail shingle feature point, and the second shingle tail feature straight line is obtained; in this way, the vertical line of the tail reference straight line is drawn through the cth tail shingle feature point, and the cth shingle tail feature straight line is obtained; S1343, the vertical distance between the first shingle tail feature straight line and the second shingle tail feature straight line is obtained, and the D1 tail negative spacing numerical value is obtained; the vertical distance between the third shingle tail feature straight line and the fourth shingle tail feature straight line is obtained, and the D2 tail negative spacing numerical value is obtained; in this way, the vertical distance between the c-1th shingle tail feature straight line and the cth shingle tail feature straight line is obtained, and the Db tail negative spacing numerical value is obtained.

6. The method of claim 3, wherein the negative interdigitated shingling process is controlled by the controller to: The specific process of step S135 is as follows: ​ S1351, the negative spacing deviation numerical value between each two continuous photovoltaic cell strips is obtained, and a plurality of negative spacing deviation numerical values are obtained; S1352, the negative spacing deviation reasonable interval is obtained, and the interval range value corresponding to the negative spacing deviation reasonable interval is obtained, and the deviation reasonable interval span is obtained; S1353, the number of negative spacing deviation numerical values in the negative spacing deviation reasonable interval is counted, and the reasonable spacing deviation number value is obtained; The number of negative spacing deviation numerical values is counted, and the negative spacing deviation number value is obtained; The ratio of the reasonable spacing deviation number value to the negative spacing deviation number value is calculated, and the negative spacing deviation qualification degree is obtained; S1354, the negative spacing deviation monitoring index value is calculated according to the negative spacing deviation qualification degree, the deviation reasonable interval span and the plurality of negative spacing deviation numerical values; the calculation formula is as follows: Wherein, Pzb is the negative spacing deviation monitoring index value, Hgd is the negative spacing deviation qualification degree, Hfz is the deviation reasonable interval span, Fpci is any one of the plurality of negative spacing deviation numerical values, and n is the number value corresponding to the negative spacing deviation numerical value.

7. The method of claim 6, wherein the negative inter-tile spacing is controlled by the following equation: ###0001### where, d is the negative inter-tile spacing, h is the height of the tile, and θ is the angle of the tile. The specific process of step S1351 is as follows: ​ The shingle negative spacing reference value corresponding to the set target photovoltaic cell piece is obtained, the absolute value of the difference between the D1 head negative spacing numerical value and the shingle negative spacing reference value is calculated, and the D1 head negative spacing deviation numerical value is obtained; the absolute value of the difference between the D1 tail negative spacing numerical value and the shingle negative spacing reference value is calculated, and the D1 tail negative spacing deviation numerical value is obtained; The D1 head negative spacing deviation numerical value and the D1 tail negative spacing deviation numerical value are compared in value: If the D1 head negative spacing deviation numerical value is greater than or equal to the D1 tail negative spacing deviation numerical value, the D1 head negative spacing deviation numerical value is set as the negative spacing deviation numerical value between the D1 photovoltaic cell strip and the D2 photovoltaic cell strip; If the D1 head negative spacing deviation numerical value is less than the D1 tail negative spacing deviation numerical value, the D1 tail negative spacing deviation numerical value is set as the negative spacing deviation numerical value between the D1 photovoltaic cell strip and the D2 photovoltaic cell strip; The process of obtaining the negative interval deviation value between the D1 photovoltaic cell strip and the D2 photovoltaic cell strip is repeated to obtain the negative interval deviation value between each two continuous photovoltaic cell strips, thereby obtaining a plurality of negative interval deviation values.

8. The method of claim 1, wherein the method further comprises: determining a plurality of parameters of the photovoltaic cell; and determining a plurality of parameters of the plurality of shingled photovoltaic cells. The specific process of step S22 is as follows: The average power generation of the target photovoltaic cell in the power generation monitoring period is obtained, and the target period power generation is obtained. The average power generation of each photovoltaic cell in the power generation monitoring period is obtained, and a plurality of power generations are obtained. The maximum power generation is set as the upper limit of the reasonable power generation interval, and the minimum power generation is set as the lower limit of the reasonable power generation interval, thereby obtaining the reasonable power generation interval. The reasonable power generation interval and the target period power generation are defined as the period power generation monitoring data, and the period power generation monitoring data and the shingled interval rationality judgment data are defined as the cell power monitoring data.

9. The method of claim 1, wherein the negative inter-tile spacing is controlled by a process of: The specific process of step S3 is as follows: ​ The cell power monitoring data is obtained, and the period power generation monitoring data and the shingled interval rationality judgment data are obtained according to the cell power monitoring data. Whether to issue a photovoltaic control warning is determined according to the period power generation monitoring data and the shingled interval rationality judgment data. The determination content is as follows: If the shingled interval rationality judgment data shows that the shingled interval corresponding to the target photovoltaic cell is unreasonable, a photovoltaic control warning is directly issued. If the shingled interval rationality judgment data shows that the shingled interval corresponding to the target photovoltaic cell is reasonable, the reasonable power generation interval and the target period power generation are obtained according to the cell power monitoring data, and further determination is made. If the target period power generation is in the reasonable power generation interval, no photovoltaic control warning needs to be issued. If the target period power generation is not in the reasonable power generation interval, a photovoltaic control warning is directly issued.

10. A control system for a photovoltaic cell negative interstitial shingling process for implementing a control method of a photovoltaic cell negative interstitial shingling process according to any one of claims 1-9, characterized in that, The specific process of step S3 is as follows: The negative interval deviation monitoring module is used for obtaining the first shingled plane image and the second shingled plane image by respectively performing image acquisition on the head step surface and the tail step surface corresponding to the target photovoltaic cell. The target photovoltaic cell is analyzed for shingled negative interval deviation according to the first shingled plane image and the second shingled plane image, and a negative interval deviation monitoring index value is obtained according to the analysis result. The power monitoring module is used for performing interval rationality judgment on the target photovoltaic cell according to the negative interval deviation monitoring index value, performing photovoltaic power generation monitoring on the target photovoltaic cell according to the judgment result, and obtaining cell power monitoring data according to the monitoring result. The control warning module is used for performing photovoltaic control warning on the target photovoltaic cell according to the cell power monitoring data. 11.A computer device, comprising a memory and a processor, and characterized in that, The memory stores a computer program, and the processor is configured to execute the computer program stored in the memory to perform the steps in the control method of the photovoltaic cell negative interval shingling process according to any one of claims 1-9.

12. A non-transitory computer-readable storage medium storing a readable computer program, characterized in that, The computer program, which is capable of performing the steps of the control method of a photovoltaic cell negative pitch shingling process according to any one of claims 1-9, is run by a processor.

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