Anti-dazzle conductive glass and preparation method thereof

Abstract

The invention discloses anti-dazzle conductive glass and a preparation method thereof. The anti-dazzle conductive glass comprises a glass substrate, an anti-dazzle coating and a transparent conductive layer, wherein the glass substrate is provided with a light-in surface and a light-out surface which are opposite to each other; the glass substrate is subjected to or not subjected to strengthening treatment, the strengthening treatment comprises chemical strengthening treatment or physical strengthening treatment, the anti-dazzle coating is formed by coating an anti-dazzle material on a light-in surface of the glass substrate and curing, and the transparent conductive layer is arranged on a light-out surface of the glass substrate in a laminated manner; the anti-dazzle material comprises the following components in parts by weight: 40-60 parts of silica sol, 30-45 parts of organic silicon resin, 8-15 parts of functional particles, 1-5 parts of a flatting agent and 1-5 parts of a defoaming agent, the functional particles comprise fused quartz powder and function enhanced composite particles, and the function enhanced composite particles are ZrO2 coated Al2O3 core-shell particles and / or YSZ coated SiO2 core-shell particles.

Description

Technical Field

[0001] This invention relates to the field of photovoltaic glass technology, specifically to an anti-glare conductive glass and its preparation method. Background Technology

[0002] Currently, traditional conductive glass (such as ITO glass) is mostly obtained by preparing a conductive functional layer on a glass substrate. However, when this type of conductive glass is used in perovskite components or in outdoor scenarios such as curtain walls, there are risks of light pollution and glare.

[0003] To address this glare problem, most existing solutions involve fabricating anti-glare patterns on the surface of conductive glass. However, the fabrication process for these anti-glare patterns is relatively expensive, and adjusting different anti-glare parameters is difficult (different anti-glare parameters require different anti-glare patterns, which are difficult to adjust), making it impossible to make timely adjustments to meet customer requirements. Summary of the Invention

[0004] The purpose of this invention is to address the problems of high process costs and difficulty in adjusting different anti-glare indicators in existing solutions for glare in conductive glass, which involve preparing anti-glare patterns on the glass surface. This invention proposes an anti-glare conductive glass that solves these problems.

[0005] To achieve the above objectives, the present invention is implemented through the following technical solution:

[0006] This invention proposes an anti-glare conductive glass, characterized in that the anti-glare conductive glass comprises a glass substrate having opposing light-incident and light-exit surfaces, an anti-glare coating, and a transparent conductive layer; wherein the glass substrate may or may not undergo strengthening treatment, the strengthening treatment including chemical strengthening treatment or physical strengthening treatment, the anti-glare coating is formed by coating an anti-glare material onto the light-incident surface of the glass substrate and then curing it, and the transparent conductive layer is stacked on the light-exit surface of the glass substrate; wherein the anti-glare material comprises the following components in parts by weight: 40-60 parts of silica sol, 30-45 parts of silicone resin, 8-15 parts of functional particles, 1-5 parts of leveling agent, and 1-5 parts of defoamer; the functional particles have a scattering effect and include fused silica powder and functionally enhanced composite particles, wherein the functionally enhanced composite particles are ZrO2-coated Al2O3 core-shell particles and / or YSZ@SiO2 core-shell particles.

[0007] The thickness of the transparent conductive layer is set to 50–500 nm.

[0008] Furthermore, an anti-glare conductive glass: the anti-glare conductive glass further includes a silicon oxide layer with a thickness of 15.0 to 25.0 nm stacked on the light-emitting surface of the glass substrate, and the transparent conductive layer is stacked on the silicon oxide layer.

[0009] Furthermore, an anti-glare conductive glass: the thickness of the anti-glare coating is set to 2.0 to 10.0 μm.

[0010] Furthermore, an anti-glare conductive glass: the silica sol is a dispersion of SiO2 with a particle size of 10-30 nm and a solid content of 30-50%.

[0011] Furthermore, an anti-glare conductive glass: the silicone resin is selected from one or more of methylphenyl silicone resin, polysiloxane resin, and water-based silicone resin.

[0012] Furthermore, an anti-glare conductive glass: the fused silica powder has a particle size of 1-3 μm, the ZrO2 shell thickness in the ZrO2-coated Al2O3 core-shell particles is 30-80 nm, the core diameter in the YSZ@SiO2 core-shell particles is 0.5-1.0 μm, and the SiO2 shell thickness is 50-100 nm.

[0013] This invention also provides a method for preparing anti-glare conductive glass, the method comprising the following steps:

[0014] S1. A glass substrate having a light-incident surface and a light-exit surface opposite each other is provided, and the glass substrate is subjected to or not subjected to strengthening treatment; wherein, the strengthening treatment includes chemical strengthening treatment or physical strengthening treatment;

[0015] S2 includes either step S2-1 or step S2-2;

[0016] S2-1: For glass substrates that are not subjected to any strengthening treatment or are chemically strengthened: apply anti-glare material to their light-incident surface and cure to form an anti-glare coating.

[0017] S2-2: For glass substrates that undergo physical strengthening treatment: Apply an anti-glare material to the light-incident surface of the glass substrate before or after physical strengthening treatment, cure to form an anti-glare coating, and then perform physical strengthening treatment on the glass substrate coated with the anti-glare material before physical strengthening.

[0018] S3. For glass substrates that are not subjected to any strengthening treatment, or are subjected to chemical strengthening treatment or physical strengthening treatment: a transparent conductive layer is formed by magnetron sputtering on its light-emitting surface to obtain anti-glare conductive glass.

[0019] Furthermore, a method for preparing anti-glare conductive glass includes, or excludes, preparing a silicon oxide layer on the light-emitting surface of the glass substrate; if a silicon oxide layer is prepared, the transparent conductive layer is formed on the silicon oxide layer.

[0020] Furthermore, a method for preparing anti-glare conductive glass includes: the chemical strengthening process in step S1 is as follows: immersing the glass substrate in potassium nitrate molten salt at 380-450°C for 2-8 hours; and the physical strengthening process is as follows: tempering the glass substrate at 600-750°C for 10-200 seconds.

[0021] Furthermore, a method for preparing anti-glare conductive glass: in step S2-1, the curing temperature is 200-450℃ and the curing time is 10-30 minutes; in step S2-2, if the anti-glare material is coated on the light-incident surface of the glass substrate before physical strengthening treatment, the curing temperature is 100-200℃ and the curing time is 3-10 minutes; if the anti-glare material is coated on the light-incident surface of the glass substrate after physical strengthening treatment, the curing temperature is 200-450℃ and the curing time is 10-30 minutes.

[0022] The beneficial effects of this invention are:

[0023] The anti-glare conductive glass of this invention achieves its anti-glare effect through anti-glare materials, which differs from the traditional method of preparing anti-glare patterns on the glass surface. This overcomes the problem of high processing costs associated with preparing anti-glare patterns. Furthermore, using anti-glare materials to achieve the anti-glare effect allows for flexible adjustments based on different anti-glare requirements (the anti-glare index can be adjusted by changing the component content of the anti-glare material). This solves the problem that anti-glare patterns are difficult to adjust flexibly according to different anti-glare requirements.

[0024] Furthermore, the anti-glare material optimized in this invention contains fused silica powder that not only scatters light, thus aiding in anti-glare, but also enhances the adhesion between the formed anti-glare coating and the glass substrate, preventing the anti-glare coating from peeling off and maintaining the long-lasting anti-glare effect of the conductive glass. The preferred functionally enhanced composite particles also possess optical properties and the ability to inhibit high-temperature agglomeration. Specifically, the coating material in the functionally enhanced composite particles can inhibit high-temperature agglomeration of the particles and reduce reflectivity, thereby maintaining the anti-glare function of the surface microstructure. The functional particles in the anti-glare material of this invention can form covalent bonds with the interface of the glass substrate, and the Si-OH in the silicone resin condenses with the silica sol to form a Si-O-Si three-dimensional network structure, further enhancing the adhesion between the anti-glare coating and the glass substrate. The silica sol added to the anti-glare material of this invention can also prevent the anti-glare coating from cracking during high-temperature tempering. Attached Figure Description

[0025] To more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the following description of the embodiments will be briefly introduced. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0026] Figure 1 This is a schematic diagram of the anti-glare conductive glass prepared in Embodiment 1 of the present invention;

[0027] Figure 2 This is a schematic diagram of the anti-glare conductive glass prepared in Example 5 of the present invention.

[0028] The markings in the image are as follows:

[0029] 1-Glass substrate, 2-Anti-glare coating, 3-Transparent conductive layer, 4-Silicon oxide layer. Detailed Implementation

[0030] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. The following description of at least one exemplary embodiment is merely illustrative and is in no way intended to limit the present invention or its application or use. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without creative effort are within the scope of protection of the present invention.

[0031] In the description of this invention, it should be understood that the terms "upper," "lower," "left," "right," "top," and "bottom," etc., indicating orientation or positional relationships, are merely for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention. Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined with "first" and "second" may explicitly or implicitly include one or more of that feature. Moreover, the terms "first," "second," etc., are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of the invention described herein can be implemented in orders other than those illustrated or described herein.

[0032] Example 1

[0033] like Figure 1As shown, this embodiment 1 provides an anti-glare conductive glass, which includes a glass substrate 1 having opposing light-incident and light-exit surfaces, an anti-glare coating 2, and a transparent conductive layer 3; the glass substrate 1 undergoes physical strengthening treatment, the anti-glare coating 2 is formed by coating an anti-glare material onto the light-incident surface of the glass substrate 1 and then curing it, and the transparent conductive layer 3 is stacked on the light-exit surface of the glass substrate 1.

[0034] The anti-glare material comprises the following components in parts by weight: 50 parts silica sol, 35 parts silicone resin, 12 parts functional particles, 3 parts leveling agent, and 2.5 parts defoamer. Specifically, the silica sol is a dispersion of SiO2 with a particle size of 10-30 nm and a solid content of 40%. The silicone resin is methylphenyl silicone resin. The functional particles have a scattering effect and include 5.0 parts fused silica powder and 7.0 parts ZrO2-coated Al2O3 core-shell particles (functionally enhanced composite particles). The leveling agent is BYK-307, and the defoamer is OTD defoamer.

[0035] The method for preparing the anti-glare conductive glass of Example 1 above includes the following steps:

[0036] S1. A glass substrate 1 with a thickness of 2.0 mm and having opposite light-incident and light-out surfaces is provided, and then subjected to plasma treatment to achieve a surface energy ≥50 mN / m;

[0037] S2-2. Apply anti-glare material to the light-incident surface of the glass substrate 1 by roller coating, and then cure it at 150-200℃ for 6 minutes to initially form anti-glare coating 2. Then, perform physical strengthening treatment on the glass substrate 1 coated with anti-glare material, specifically, perform physical strengthening (tempering) at 600-750℃ for 120 seconds, and then sinter and cure at high temperature to form anti-glare coating 2 with a thickness of 2-10 μm and a reflectivity of 2-4%.

[0038] S3. After cleaning the glass substrate 1, an ITO transparent conductive layer 3 with a thickness of 50-300nm is formed by magnetron sputtering on its light-emitting surface to obtain anti-glare conductive glass.

[0039] The silica sol added to the anti-glare material formulation in this invention not only improves the adhesion between the anti-glare coating and the glass substrate, but also avoids cracking during the high-temperature tempering process of the anti-glare coating, ensuring the adhesion between the coatings and improving the anti-glare effect.

[0040] Example 2

[0041] The difference between Example 2 and Example 1 is that in Example 2, the glass substrate 1 is first physically tempered before the anti-glare coating 2 is prepared, and then the AZO transparent conductive layer 3 is deposited. The specific preparation method of the anti-glare conductive glass in Example 2 includes the following steps:

[0042] S1. A glass substrate 1 with a thickness of 2.0 mm and having opposite light-incident and light-out surfaces is provided, and then subjected to plasma treatment to achieve a surface energy ≥50 mN / m;

[0043] S2-2. Physically strengthen (temper) the glass substrate 1 at 600-750℃ for 120 seconds, and then coat the light-incident surface of the physically strengthened glass substrate 1 with anti-glare material by roller coating. Then heat and cure at 250-400℃ for 12 minutes (specifically, pre-curing at 250℃ for 5 minutes and then final curing at 400℃ for 7 minutes) to form an anti-glare coating 2 with a thickness of 2-10 μm and a reflectivity of 2-4%.

[0044] S3. After cleaning the glass substrate 1, an AZO transparent conductive layer 3 with a thickness of 200-400 nm is formed by magnetron sputtering on its light-emitting surface to obtain anti-glare conductive glass.

[0045] Example 2 employs a method of first physically strengthening and then preparing the anti-glare coating 2, and uses low-temperature sputtering of the AZO transparent conductive layer 3, which has high sheet resistance adjustability and low cost (AZO raw materials are abundant).

[0046] Example 3

[0047] This embodiment 3 provides an anti-glare conductive glass, which includes a glass substrate 1 having a light-incident surface and a light-outceasing surface, an anti-glare coating 2, and a transparent conductive layer 3; the glass substrate 1 is chemically strengthened, the anti-glare coating 2 is formed by coating an anti-glare material onto the light-incident surface of the glass substrate 1 and curing it, and the transparent conductive layer 3 is stacked on the light-outceasing surface of the glass substrate 1.

[0048] The anti-glare material comprises the following components in parts by weight: 40 parts silica sol, 31 parts silicone resin, 8.5 parts functional particles, 1.2 parts leveling agent, and 1.0 part defoamer; wherein the silica sol is a dispersion of SiO2 with a particle size of 10-30 nm (solid content 35%), the silicone resin is methylphenyl silicone resin, the functional particles include 3.5 parts fused silica powder and 5.0 parts YSZ@SiO2 core-shell particles (functionally enhanced composite particles), the leveling agent is BYK-378, and the defoamer is a polyether defoamer.

[0049] The preparation method of the anti-glare conductive glass in Example 3 above includes the following steps:

[0050] S1. A glass substrate 1 with a thickness of 1.0 mm and having opposite light-incident and light-out surfaces is provided, and then subjected to plasma treatment to achieve a surface energy ≥50 mN / m.

[0051] S2-1: The glass substrate 1 is immersed in potassium nitrate molten salt at 400°C for 4 hours, and then ultrasonically cleaned with deionized water to remove residual molten salt. Then, an anti-glare material is coated on the light-incident surface of the chemically strengthened glass substrate 1 by roller coating. The curing time is 20 minutes at 200-350°C (pre-curing at 200°C for 5 minutes, raising the temperature to 300°C within 5 minutes, and finally curing at 300°C for 10 minutes) to form an anti-glare coating 2 with a thickness of 2-10 μm and a reflectivity of 2-4%.

[0052] S3. After cleaning the glass substrate 1, an ITO transparent conductive layer 3 with a thickness of 50-300nm is formed by magnetron sputtering on its light-emitting surface to obtain anti-glare conductive glass.

[0053] In Example 3, the method of first chemically tempering and then preparing the anti-glare coating 2, followed by the deposition of the ITO transparent conductive layer 3, is beneficial for controlling the flatness of the thin glass.

[0054] Example 4

[0055] The difference between Example 4 and Example 1 is that the glass substrate 1 in Example 4 was not subjected to physical strengthening treatment, while the other conditions were the same as in Example 1.

[0056] Example 5

[0057] The difference between Example 5 and Example 1 is that in Example 5, a silicon oxide layer 4 with a thickness of 20.0 nm is first deposited on the light-emitting surface of the glass substrate 1, and then a transparent conductive layer 3 is formed on the silicon oxide layer 4 by magnetron sputtering, as shown in the figure. Figure 2 As shown.

[0058] test:

[0059] The performance of the anti-glare conductive glass obtained in Examples 1-4 is shown in the table below:

[0060]

[0061] The above-described preferred embodiments of the present invention are for illustrative purposes only and are not intended to limit the scope of the invention. Any obvious variations or modifications derived from the technical solutions of the present invention are still within the protection scope of the present invention.

Claims

1. An anti-glare conductive glass, characterized in that, The anti-glare conductive glass includes a glass substrate (1) having opposing light-incident and light-out surfaces, an anti-glare coating (2), and a transparent conductive layer (3). The glass substrate (1) may or may not undergo strengthening treatment, the strengthening treatment includes chemical strengthening treatment or physical strengthening treatment, the anti-glare coating (2) is formed by coating the light-incident surface of the glass substrate (1) with anti-glare material and curing it, and the transparent conductive layer (3) is stacked on the light-exit surface of the glass substrate (1). The anti-glare material comprises the following components in parts by weight: 40-60 parts of silica sol, 30-45 parts of silicone resin, 8-15 parts of functional particles, 1-5 parts of leveling agent, and 1-5 parts of defoamer; the functional particles include fused silica powder and functionally enhanced composite particles, wherein the functionally enhanced composite particles are ZrO2-coated Al2O3 core-shell particles and / or YSZ@SiO2 core-shell particles.

2. The anti-glare conductive glass according to claim 1, characterized in that, The anti-glare conductive glass further includes a silicon oxide layer (4) with a thickness of 15.0 to 25.0 nm stacked on the light-emitting surface of the glass substrate (1), and the transparent conductive layer (3) is stacked on the silicon oxide layer (4).

3. The anti-glare conductive glass according to claim 1, characterized in that, The thickness of the anti-glare coating (2) is 2.0 to 10.0 μm.

4. The anti-glare conductive glass according to claim 1, characterized in that, The silica sol is a dispersion of SiO2 with a particle size of 10-30 nm and a solid content of 30-50%.

5. The anti-glare conductive glass according to claim 1, characterized in that, The organosilicon resin is selected from one or more of methylphenyl silicone resin, polysiloxane resin, and water-based organosilicon resin.

6. The anti-glare conductive glass according to claim 1, characterized in that, The fused silica powder has a particle size of 1–3 μm, the ZrO2 shell in the ZrO2-coated Al2O3 core-shell particles has a thickness of 30–80 nm, the core in the YSZ@SiO2 core-shell particles has a diameter of 0.5–1.0 μm, and the SiO2 shell has a thickness of 50–100 nm.

7. A method for preparing an anti-glare conductive glass according to any one of claims 1 to 6, characterized in that, The method includes the following steps: S1. Provide a glass substrate (1) having opposing light-incident and light-out surfaces, and perform or not perform strengthening treatment on the glass substrate (1); Among them, the strengthening treatment includes chemical strengthening treatment or physical strengthening treatment; S2 includes either step S2-1 or step S2-2; S2-1: For glass substrates that are not subjected to any strengthening treatment or are subjected to chemical strengthening treatment (1): Coat the light-incident surface with anti-glare material and cure to form an anti-glare coating (2); S2-2: For the glass substrate (1) that has undergone physical strengthening treatment: apply an anti-glare material to the light-incident surface of the glass substrate (1) before or after physical strengthening treatment, cure to form an anti-glare coating (2), and then perform physical strengthening treatment on the glass substrate (1) that has been coated with anti-glare material before physical strengthening. S3. For glass substrates (1) that are not subjected to any strengthening treatment, or are subjected to chemical strengthening treatment or physical strengthening treatment: a transparent conductive layer (3) is formed by magnetron sputtering on its light-emitting surface to obtain anti-glare conductive glass.

8. The method for preparing an anti-glare conductive glass according to claim 7, characterized in that, The method may or may not include the preparation of a silicon oxide layer (4) on the light-emitting surface of the glass substrate (1). If a silicon oxide layer (4) is prepared, the transparent conductive layer (3) is formed on the silicon oxide layer (4).

9. The method for preparing an anti-glare conductive glass according to claim 7, characterized in that, The chemical strengthening process in step S1 is as follows: the glass substrate (1) is immersed in potassium nitrate molten salt at 380-450°C for 2-8 hours; The physical strengthening process is as follows: the glass substrate (1) is tempered at 600-750°C for 10-200 seconds.

10. The method for preparing an anti-glare conductive glass according to claim 7, characterized in that, In step S2-1, the curing temperature is 200-450℃ and the curing time is 10-30 minutes. In step S2-2, if the anti-glare material is coated on the light-incident surface of the glass substrate (1) before the physical strengthening treatment, the curing temperature is 100-200℃ and the curing time is 3-10 minutes. If the anti-glare material is coated on the light-incident surface of the glass substrate (1) after the physical strengthening treatment, the curing temperature is 200-450℃ and the curing time is 10-30 minutes.

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