Preparation method of diamond composite material
By performing chemical metal plating followed by annealing, the problem of interface defects caused by metal plating in the preparation of existing diamond composite materials has been solved, resulting in diamond-metal composite materials with higher interface quality and better performance, thus improving preparation efficiency and performance.
Patent Information
- Application Number
- CN202511118845.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-08-11
- Publication Date
- 2025-11-11
AI Technical Summary
Existing methods for preparing diamond composite materials involve annealing followed by metal plating, which leads to interfacial defects and reduced interfacial bonding in the metal coating.
A method of first performing chemical metal plating followed by annealing was adopted. A uniform coating was formed on the surface of diamond particles by magnetron sputtering technology, and then the target metal coating was deposited on the surface. Subsequently, annealing and sintering were performed to prepare diamond-metal composite materials with higher interface quality and better performance.
This improved the preparation efficiency of diamond composite materials, ensured uniform coverage and high bonding strength of the metal coating, and enhanced the overall thermal conductivity and structural stability of the material.
Smart Images
Figure CN120924926A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of diamond composite materials technology, and more specifically, to a method for preparing diamond composite materials. Background Technology
[0002] Diamond-copper composites, due to their excellent thermal conductivity and low coefficient of thermal expansion, show broad application prospects in electronic packaging, heat dissipation components, and high-power devices. Currently, common methods for preparing such composites typically include the following key steps: First, coating the surface of single-crystal diamond, using techniques such as magnetron sputtering, vacuum evaporation, and salt bath coating; second, heat treatment, i.e., annealing, which can be carried out under normal pressure or a vacuum environment; third, metal plating, primarily using methods such as electroless plating, electroplating, or mixing metal powder with the coated diamond particles, or even ball milling to adhere the metal to the diamond surface; finally, sintering to prepare the final composite material, with common sintering methods including spark plasma sintering, hot pressing, and melt infiltration sintering.
[0003] However, in the aforementioned traditional manufacturing process, annealing is typically performed after coating the diamond particle surface and before metal plating. This process has significant technical problems. Specifically, during annealing, microscopic pores and cracks may appear on the surface of the diamond particles. During metal plating, the target metal liquid may be unable to flow into these pores and cracks due to surface tension, making it difficult for the subsequent target metal coating to achieve a completely uniform coverage of the diamond surface. This results in porosity in the final composite material, leading to a significant increase in the interfacial thermal resistance between diamond and metal, thus affecting the overall thermal conductivity of the composite material (e.g., ...). Figure 2 As shown, Figure 2 This is a schematic diagram of the cross-section of diamond particles after annealing and subsequent metal plating. In the diagram, a represents the coating process, b represents the annealing process, c represents the metal plating process, d represents the pores, e represents the coating, f represents the diamond, and g represents the target metal coating. Furthermore, grain growth may occur during the annealing process, altering the surface morphology and microstructure of the coating. This reduces the adhesion and bonding strength of the subsequent target metal coating to the diamond surface, ultimately affecting the overall structural stability and reliability of the diamond composite material.
[0004] Therefore, in order to solve the technical problem that the metal coating has interface defects and reduced interfacial bonding strength due to the annealing treatment followed by metal plating in the existing diamond composite material preparation method, there is an urgent need for a diamond composite material preparation method. Summary of the Invention
[0005] The purpose of this application is to provide a method for preparing diamond composite materials. By performing chemical metal plating followed by annealing, a diamond-metal composite material is prepared. This method solves the problem that existing diamond composite material preparation methods, which involve annealing followed by metal plating, result in interface defects and reduced interfacial bonding in the metal coating. By performing metal plating followed by annealing, a diamond-metal composite material with higher interface quality and superior performance is prepared, thereby improving the preparation efficiency of diamond composite materials.
[0006] In a first aspect, this application provides a method for preparing a diamond composite material, used to prepare a composite material of diamond and metal, comprising the following steps: A coating is deposited on the surface of a first diamond particle using magnetron sputtering technology to obtain a second diamond particle with a uniformly coated surface. A target metal coating is deposited on the surface of the second diamond particle by chemical plating to obtain a third diamond particle with the target metal coating on its surface. The third diamond particle is annealed to obtain the fourth diamond particle after annealing. The fourth diamond particle was sintered to obtain a diamond-target metal composite material.
[0007] The diamond composite material preparation method provided in this application can realize the preparation of diamond composite materials. By performing chemical metal plating treatment followed by annealing treatment, a diamond-metal composite material is prepared. This solves the problem that the metal coating has interface defects and reduced interfacial bonding strength in the existing diamond composite material preparation methods that perform annealing treatment before metal plating treatment. By performing metal plating treatment first and then annealing, a diamond-metal composite material with higher interface quality and better performance is prepared, thereby improving the preparation efficiency of diamond composite materials.
[0008] Optionally, magnetron sputtering technology is used to deposit a film on the surface of the first diamond particle to obtain a second diamond particle with a uniformly deposited film on its surface, including: The first diamond particle is pretreated to obtain the pretreated first diamond particle. The pretreated first diamond particles are placed in the vacuum chamber of the magnetron sputtering equipment, and the vacuum chamber is evacuated. Argon gas is introduced into the vacuum chamber, a high-temperature resistant metal is used as the target material, and a coating is applied to the surface of the pretreated first diamond particle according to the preset coating pressure to obtain a second diamond particle with a uniform coating on the surface.
[0009] Optionally, the first diamond particle is pretreated to obtain a pretreated first diamond particle, comprising: The first diamond particle was cleaned using an ethanol solution and ultrasonic cleaning technology to obtain the cleaned first diamond particle. The cleaned first diamond particles are placed in a vacuum drying oven for drying to obtain pretreated first diamond particles.
[0010] Optionally, the preset coating pressure is 0.3~1.0 Pa.
[0011] Optionally, a target metal coating is deposited on the surface of the second diamond particle using a chemical plating method to obtain a third diamond particle with the target metal coating on its surface, comprising: According to the preset ratio of target metal solution to diamond, the target metal solution and the second diamond particles are placed into a round-bottom flask of a rotary evaporator. Rotate the rotary evaporator at a preset speed to ensure that the target metal solution is in full contact with the surface of the second diamond particle. After drying, a third diamond particle with a target metal coating on its surface is obtained.
[0012] The diamond composite material preparation method provided in this application can realize the preparation of diamond composite materials. By chemically plating metal, a target metal coating is deposited on the surface of a second diamond particle to form a third diamond particle, providing a high-quality intermediate product for subsequent annealing and sintering steps.
[0013] Optionally, the rotary evaporator is rotated at a preset speed to ensure that the target metal solution is in full contact with the surface of the second diamond particles. After drying, a third diamond particle with a target metal coating on its surface is obtained, comprising: While rotating the rotary evaporator at a preset speed, the rotary evaporator is maintained within a preset metal plating temperature range by water bath heating, so that the target metal solution can fully contact the surface of the second diamond particle to obtain a second diamond particle with the target metal solution on its surface. After cleaning the second diamond particles with the target metal solution on their surface using deionized water, they are dried to obtain a third diamond particle with a target metal coating on its surface.
[0014] Optionally, the third diamond particle is annealed to obtain an annealed fourth diamond particle, comprising: After the third diamond particles are evenly spread on the graphite boat, the graphite boat with the third diamond particles is placed in the constant temperature zone of the tube furnace. A vacuum operation is performed inside the constant temperature zone of the tubular furnace; While maintaining the vacuum operation, the third diamond particle is annealed based on the preset annealing temperature, preset annealing heating rate and preset annealing time, and then naturally cooled to room temperature to obtain the annealed fourth diamond particle.
[0015] The diamond composite material preparation method provided in this application can prepare diamond composite materials. By annealing the third diamond particles that have formed a target metal coating, the interfacial diffusion and bonding between diamond and target metal can be effectively promoted, thereby obtaining a diamond-target metal composite material with strong interfacial bonding and stable performance.
[0016] Optionally, the preset annealing temperature is 600~1600℃; the preset annealing heating rate is 5~20℃ / min; and the preset annealing time is 1~4 hours.
[0017] Optionally, the fourth diamond particle is sintered to obtain a diamond-target metal composite material, comprising: According to the preset sintering and forming heating rate, the internal temperature of the constant temperature zone of the tubular furnace is adjusted to the preset sintering and forming temperature. Based on a preset sintering pressure range and a preset sintering time, the preset sintering temperature is maintained to perform sintering treatment on the fourth diamond particles. After the sintering process is completed, heating is stopped, and the material is allowed to cool naturally to the preset cooling temperature. Then, the pressure is removed to obtain a diamond-target metal composite material.
[0018] Optionally, the preset sintering heating rate is 30~80℃ / min; the preset sintering temperature is 800~1100℃; the preset sintering pressure range is 15~80MPa; the preset sintering time is 30~120 minutes; and the preset cooling temperature is below 200℃.
[0019] Beneficial effects: The diamond composite material preparation method provided in this application prepares a diamond-metal composite material by first performing chemical metal plating and then annealing. This solves the problem that the metal coating has interface defects and reduced interfacial bonding strength in the existing diamond composite material preparation methods that first perform annealing and then metal plating. By first performing metal plating and then annealing, a diamond-metal composite material with higher interface quality and better performance is prepared, thus improving the preparation efficiency of diamond composite materials. Attached Figure Description
[0020] Figure 1 A flowchart illustrating the diamond composite material preparation method provided in this application embodiment.
[0021] Figure 2 This is a schematic diagram of the cross-section of diamond particles that have been annealed and then plated with metal.
[0022] Figure 3 This is a schematic diagram of the cross-section of diamond particles in the diamond composite material preparation method provided in the embodiments of this application. Detailed Implementation
[0023] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely represents selected embodiments of this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.
[0024] It should be noted that similar reference numerals and letters in the following figures indicate similar items; therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures. Furthermore, in the description of this application, terms such as "first," "second," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.
[0025] Please refer to Figure 1 , Figure 1 This application discloses a method for preparing a diamond composite material, which is used to prepare a diamond-metal composite material, comprising: Step S1: Using magnetron sputtering technology, a film is deposited on the surface of the first diamond particle to obtain a second diamond particle with a uniformly coated surface. Step S2: A target metal coating is deposited on the surface of the second diamond particle by chemical plating to obtain a third diamond particle with the target metal coating on its surface. Step S3: Anneal the third diamond particle to obtain the annealed fourth diamond particle. Step S4: The fourth diamond particle is sintered to form a composite material of diamond and target metal.
[0026] This method for preparing diamond composite materials involves first performing chemical metal plating followed by annealing to obtain a diamond-metal composite material. This method solves the problem of interface defects and reduced interfacial bonding caused by annealing followed by metal plating in existing diamond composite material preparation methods. By performing metal plating first and then annealing, a diamond-metal composite material with higher interface quality and superior performance is prepared, thus improving the preparation efficiency of diamond composite materials.
[0027] Specifically, in step S1, magnetron sputtering technology is used to deposit a film on the surface of the first diamond particle to obtain a second diamond particle with a uniformly deposited film on its surface, including: The first diamond particle is pretreated to obtain the pretreated first diamond particle. The pretreated first diamond particle is placed into the vacuum chamber of the magnetron sputtering equipment, and the vacuum chamber is evacuated. Argon gas is introduced into the vacuum chamber, a high-temperature resistant metal is used as the target material, and a coating is applied to the surface of the pretreated first diamond particle according to the preset coating pressure to obtain a second diamond particle with a uniform coating on the surface.
[0028] Specifically, in step S1, the first diamond particle is pretreated to obtain a pretreated first diamond particle, including: The first diamond particle was cleaned using an ethanol solution and ultrasonic cleaning technology to obtain the cleaned first diamond particle. The cleaned first diamond particles were placed in a vacuum drying oven for drying to obtain pretreated first diamond particles.
[0029] In step S1, the first diamond particles are cleaned using an ethanol solution and ultrasonic cleaning technology to remove surface oil and impurities. The ethanol solution dissolves organic contaminants, while the ultrasonic waves physically peel away the adhering substances. The combined effect of these two methods ensures a highly clean surface for the diamond particles. Subsequently, the cleaned diamond particles are placed in a vacuum drying oven for drying. This step utilizes the vacuum environment to lower the boiling point of water, allowing the moisture on the particle surface to evaporate quickly and completely, while avoiding secondary contamination from airborne impurities. Thorough removal of moisture is crucial for the subsequent magnetron sputtering process, as the presence of moisture can affect the vacuum level of the vacuum chamber or cause unnecessary reactions with the target or diamond at high temperatures, thus affecting the stability of the coating process and the quality of the coating layer.
[0030] In step S1, the pretreated first diamond particles are placed in the vacuum chamber of a magnetron sputtering apparatus. After evacuating the vacuum chamber, argon gas is introduced into the chamber. Using a high-temperature resistant metal as the target material, a coating is deposited on the surface of the pretreated first diamond particles according to a preset coating pressure, resulting in second diamond particles with a uniformly coated surface. The preset coating pressure is 0.3~1.0 Pa.
[0031] Argon gas is introduced as the sputtering gas, and argon ions bombard the target material, efficiently sputtering target atoms and depositing them onto the surface of diamond particles. The selection of a high-temperature resistant metal as the target material ensures the stability of the coating layer during subsequent high-temperature processing, preventing phase transitions or decomposition of the coating layer at high temperatures, thus guaranteeing the performance of the final composite material. Precise control of the coating vacuum and coating gas pressure are crucial parameters in magnetron sputtering technology. The preset coating vacuum helps maintain the stability of the sputtering process and the purity of the film, while the preset coating gas pressure affects the mean free path and energy of the sputtered particles, thereby determining the deposition rate, grain size, density, and uniformity of the coating layer. Through precise control of these parameters, a highly uniform, dense coating layer with good adhesion to the substrate can be formed on the surface of the diamond particles, providing a high-quality intermediate product for subsequent target metal deposition and sintering.
[0032] Specifically, in step S2, a target metal coating is deposited on the surface of the second diamond particle using a chemical metal plating method to obtain a third diamond particle with the target metal coating on its surface, including: According to the preset ratio of target metal solution to diamond, the target metal solution and the second diamond particles are placed into the round-bottom flask of the rotary evaporator. Rotate the rotary evaporator at the preset speed to ensure that the target metal solution is in full contact with the surface of the second diamond particle. After drying, a third diamond particle with a target metal coating on its surface is obtained.
[0033] In step S2, according to the preset ratio of target metal solution to diamond, the target metal solution and the second diamond particles are placed together into a round-bottom flask of a rotary evaporator (the volume of the target metal solution is 1 / 3 to 1 / 2 of the flask's volume). The preset ratio of target metal solution to diamond is 500-1000 ml of target metal solution to 3-4 g of diamond particles (i.e., the second diamond particles). The preset rotation speed is 50-200 r / min.
[0034] Specifically, in step S2, the rotary evaporator is rotated at a preset rotation speed to ensure that the target metal solution is in full contact with the surface of the second diamond particles. After drying, a third diamond particle with a target metal coating on its surface is obtained, comprising: While rotating the rotary evaporator at the preset rotation speed, the rotary evaporator is maintained within the preset metal plating temperature range by water bath heating, so that the target metal solution can fully contact the surface of the second diamond particles, and a second diamond particle with the target metal solution on its surface is obtained. After cleaning the second diamond particles with the target metal solution on their surface using deionized water, they are dried to obtain the third diamond particles with the target metal coating on their surface.
[0035] In step S2, the target metal solution and the second diamond particles are placed in a round-bottom flask of a rotary evaporator. In this stage, to optimize the contact between the target metal solution and the surface of the second diamond particles and ensure uniform coating formation, the rotary evaporator is rotated at a preset speed while simultaneously heated by a water bath to maintain it within a preset metallization temperature range. This combination of rotation and controlled heating allows the target metal solution to continuously and uniformly cover every surface of the diamond particles, avoiding uneven coating or agglomeration caused by excessively rapid evaporation in localized areas. The stable temperature environment provided by the water bath precisely controls the solvent evaporation rate, ensuring that the target metal precursor can be adsorbed or reacted on the diamond surface in a controlled manner, thereby forming a uniform and well-adhered initial wet film, resulting in second diamond particles with the target metal solution coated on their surface. Furthermore, to further improve the purity and density of the coating, the surface of the second diamond particles coated with the target metal solution is repeatedly rinsed with deionized water until the resulting deionized water solution is neutral. This cleaning process effectively removes any unreacted precursors, loosely adsorbed impurities, or excess solution components that may remain on the particle surface. By cleaning, the adverse effects of impurities on the quality of subsequent coatings and the final composite material properties are avoided, significantly improving the purity and density of the metal coating, thereby enhancing the adhesion between the metal coating and the diamond. The cleaned particles are then dried to ensure that the final third diamond particle surface has a stable, uniform, and pure target metal coating.
[0036] Specifically, in step S3, the third diamond particle is annealed to obtain an annealed fourth diamond particle, comprising: After the third diamond particles are evenly spread on the graphite boat, the graphite boat with the third diamond particles is placed in the constant temperature zone of the tube furnace. Vacuuming is performed inside the constant temperature zone of the tubular furnace. While maintaining the vacuum operation, the third diamond particle was annealed based on the preset annealing temperature, preset annealing heating rate and preset annealing time, and then naturally cooled to room temperature to obtain the annealed fourth diamond particle.
[0037] In step S3, the third diamond particles, already coated with the target metal, are uniformly spread in a graphite boat and placed in the isothermal zone of a tube furnace. This initial operation ensures that the diamond particles are heated uniformly throughout the annealing process, avoiding localized overheating or insufficient annealing due to uneven temperature, thus providing a stable physical environment for subsequent interfacial diffusion and bonding. The inert nature of the graphite boat also prevents adverse reactions with the diamond or target metal at high temperatures. Subsequently, a vacuum operation is performed inside the isothermal zone of the tube furnace to effectively remove oxygen and other impurity gases from the furnace chamber, creating a clean reaction environment for the annealing process. Throughout the annealing process, the vacuum is maintained, and the third diamond particles are precisely heat-treated based on preset annealing temperatures, preset annealing heating rates, and preset annealing times. This precise parameter control allows the diamond and the target metal to undergo atomic-level diffusion and interfacial reactions under optimal temperature and time conditions, thereby forming a robust metallurgical bonding layer. After annealing, natural cooling to room temperature can effectively avoid thermal stress caused by rapid cooling, thereby reducing cracking or deformation of diamond particles, helping to form a stable crystal structure and interface, and ultimately obtaining fourth diamond particles with high performance.
[0038] The preset annealing temperature is 600~1600℃; the preset annealing heating rate is 5~20℃ / min; and the preset annealing time is 1~4 hours.
[0039] Specifically, in step S4, the fourth diamond particle is sintered to obtain a diamond-target metal composite material, including: According to the preset sintering heating rate, the temperature inside the constant temperature zone of the tube furnace is adjusted to the preset sintering temperature. Based on the preset sintering pressure range and preset sintering time, the preset sintering temperature is maintained to perform sintering treatment on the fourth diamond particles. After the sintering process is completed, heating is stopped, and the material is allowed to cool naturally to the preset cooling temperature. Then, the pressure is removed to obtain a diamond-target metal composite material.
[0040] In step S4, the temperature inside the constant temperature zone of the tube furnace is adjusted to the preset sintering temperature according to the preset sintering heating rate. This precise temperature control effectively avoids thermal shock that the fourth diamond particles may suffer during rapid heating. Especially considering that the fourth diamond particles have already undergone annealing, the interface between their surface metal coating and the diamond matrix has been optimized. Slow and uniform heating helps maintain the integrity of this interface and provides a stable temperature environment for subsequent densification and bonding. Subsequently, based on the preset sintering pressure range and preset sintering time, the preset sintering temperature is maintained to sinter the fourth diamond particles. In this stage, the preset sintering temperature allows the target metal to reach a suitable plastic flow or diffusion state, thereby promoting wetting and reaction between it and the diamond particles, establishing a tight interfacial bond. Simultaneously, the preset sintering pressure range applies uniform pressure to the particles at high temperatures, which plays an important role in promoting densification between particles and eliminating internal porosity, effectively improving the density and mechanical properties of the composite material. The preset sintering time ensures sufficient time for material densification and interfacial bonding under specific temperature and pressure, allowing diamond and the target metal to fully bond and form a stable composite structure. After sintering, heating is stopped, and the material is allowed to cool naturally to the preset cooling temperature before pressure is removed, resulting in a diamond-target metal composite material. This optimized cooling and depressurization process avoids stress concentration and cracking within the composite material that might occur with rapid cooling, helping to maintain the material's structural integrity. Removing pressure only after reaching the preset cooling temperature ensures that the composite material is cured and stabilized before external constraints are released, further reducing residual stress.
[0041] The preset sintering heating rate is 30~80℃ / min; the preset sintering temperature is 800~1100℃; the preset sintering pressure range is 15~80MPa; the preset sintering time is 30~120 minutes; and the preset cooling temperature is below 200℃.
[0042] In practical applications, such as Figure 3 As shown, Figure 3 This is a schematic cross-sectional view of diamond particles in the diamond composite material preparation method provided in this application embodiment, where a represents coating treatment, b represents annealing treatment, c represents metal plating treatment, e represents coating, f represents diamond, and g represents the target metal coating. Figure 3As can be seen, using the diamond composite material preparation method provided in the embodiments of this application, metal plating is performed first, followed by annealing. Without annealing, the grains on the surface of the diamond particles are finer and the surface is flat and uniform. Under the condition of metal plating first, the target metal coating is easier to combine with the film. Subsequently, during the annealing process, although the crystallization of the grains on the film will increase, the target metal coating on the surface of the film has a certain fluidity at high temperature and will also change accordingly, always ensuring that there are no pores or cracks among the diamond particles / film / target metal coating.
[0043] As can be seen from the above, the method for preparing diamond composite materials involves using magnetron sputtering technology to deposit a film on the surface of a first diamond particle, resulting in a second diamond particle with a uniformly deposited film. Then, a target metal coating is deposited on the surface of the second diamond particle using chemical plating, resulting in a third diamond particle with the same target metal coating. The third diamond particle is then annealed to obtain a fourth diamond particle, which is subsequently sintered to form a diamond-target metal composite material. Therefore, by first performing chemical plating followed by annealing, a diamond-metal composite material is prepared, solving the problem of interface defects and reduced interfacial bonding caused by annealing followed by metal plating in existing diamond composite material preparation methods. By first plating and then annealing, a diamond-metal composite material with higher interface quality and superior performance is prepared, thus improving the preparation efficiency of diamond composite materials.
[0044] In this document, relational terms such as first and second are used only to distinguish one entity or operation from another entity or operation, without necessarily requiring or implying any such actual relationship or order between these entities or operations.
[0045] The above description is merely an embodiment of this application and is not intended to limit the scope of protection of this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the scope of protection of this application.
Claims
1. A method for preparing a diamond composite material, used to prepare a composite material of diamond and metal, characterized in that, Including the following steps: A coating is deposited on the surface of a first diamond particle using magnetron sputtering technology to obtain a second diamond particle with a uniformly coated surface. A target metal coating is deposited on the surface of the second diamond particle by chemical plating to obtain a third diamond particle with the target metal coating on its surface. The third diamond particle is annealed to obtain the fourth diamond particle after annealing. The fourth diamond particle was sintered to obtain a diamond-target metal composite material.
2. The method for preparing diamond composite material according to claim 1, characterized in that, A second diamond particle with a uniformly coated surface is obtained by using magnetron sputtering technology to deposit a film on the surface of a first diamond particle, comprising: The first diamond particle is pretreated to obtain the pretreated first diamond particle. The pretreated first diamond particles are placed in the vacuum chamber of the magnetron sputtering equipment, and the vacuum chamber is evacuated. Argon gas is introduced into the vacuum chamber, a high-temperature resistant metal is used as the target material, and a coating is applied to the surface of the pretreated first diamond particle according to the preset coating pressure to obtain a second diamond particle with a uniform coating on the surface.
3. The method for preparing diamond composite material according to claim 2, characterized in that, The first diamond particle is pretreated to obtain a pretreated first diamond particle, comprising: The first diamond particle was cleaned using an ethanol solution and ultrasonic cleaning technology to obtain the cleaned first diamond particle. The cleaned first diamond particles are placed in a vacuum drying oven for drying to obtain pretreated first diamond particles.
4. The method for preparing diamond composite material according to claim 2, characterized in that, The preset coating pressure is 0.3~1.0 Pa.
5. The method for preparing diamond composite material according to claim 1, characterized in that, A target metal coating is deposited on the surface of the second diamond particle using a chemical plating method to obtain a third diamond particle with the target metal coating on its surface, comprising: According to the preset ratio of target metal solution to diamond, the target metal solution and the second diamond particles are placed into a round-bottom flask of a rotary evaporator. Rotate the rotary evaporator at a preset speed to ensure that the target metal solution is in full contact with the surface of the second diamond particle. After drying, a third diamond particle with a target metal coating on its surface is obtained.
6. The method for preparing diamond composite material according to claim 5, characterized in that, The rotary evaporator is rotated at a preset speed to ensure that the target metal solution is in full contact with the surface of the second diamond particles. After drying, a third diamond particle with a target metal coating on its surface is obtained, comprising: While rotating the rotary evaporator at a preset speed, the rotary evaporator is maintained within a preset metal plating temperature range by water bath heating, so that the target metal solution can fully contact the surface of the second diamond particle to obtain a second diamond particle with the target metal solution on its surface. After cleaning the second diamond particles with the target metal solution on their surface using deionized water, they are dried to obtain a third diamond particle with a target metal coating on its surface.
7. The method for preparing diamond composite material according to claim 1, characterized in that, The third diamond particle is annealed to obtain an annealed fourth diamond particle, comprising: After the third diamond particles are evenly spread on the graphite boat, the graphite boat with the third diamond particles is placed in the constant temperature zone of the tube furnace. A vacuum operation is performed inside the constant temperature zone of the tubular furnace; While maintaining the vacuum operation, the third diamond particle is annealed based on the preset annealing temperature, preset annealing heating rate and preset annealing time, and then naturally cooled to room temperature to obtain the annealed fourth diamond particle.
8. The method for preparing diamond composite material according to claim 7, characterized in that, The preset annealing temperature is 600~1600℃; the preset annealing heating rate is 5~20℃ / min; and the preset annealing time is 1~4 hours.
9. The method for preparing diamond composite material according to claim 7, characterized in that, The fourth diamond particle is sintered to form a diamond-target metal composite material, comprising: According to the preset sintering and forming heating rate, the internal temperature of the constant temperature zone of the tubular furnace is adjusted to the preset sintering and forming temperature. Based on a preset sintering pressure range and a preset sintering time, the preset sintering temperature is maintained to perform sintering treatment on the fourth diamond particles. After the sintering process is completed, heating is stopped, and the material is allowed to cool naturally to the preset cooling temperature. Then, the pressure is removed to obtain a diamond-target metal composite material.
10. The method for preparing diamond composite material according to claim 9, characterized in that, The preset sintering heating rate is 30~80℃ / min; the preset sintering temperature is 800~1100℃; the preset sintering pressure range is 15~80MPa; the preset sintering time is 30~120 minutes; and the preset cooling temperature is below 200℃.