Multi-chamber linked magnetron sputtering coating device

Abstract

This invention relates to the field of coating technology, specifically disclosing a multi-chamber linked magnetron sputtering coating apparatus, comprising: an annular vacuum chamber with a vacuum tube connected to its side wall; multiple process chambers, including a loading / unloading chamber, a pretreatment chamber, an annealing chamber, and several sputtering chambers, the loading / unloading chamber being located on the top surface of the annular vacuum chamber, and the pretreatment chamber, annealing chamber, and each sputtering chamber being arranged annularly along the outer periphery of the annular vacuum chamber and all communicating with it; a turntable rotatably disposed in the center of the annular vacuum chamber and connected to a drive assembly for driving the turntable to rotate; and robotic arm mechanisms arranged annularly on the turntable, with partitions between adjacent robotic arm mechanisms on the turntable, one end of each robotic arm mechanism being disposed on the turntable, and the other end being provided with a carrier for mounting a substrate. This invention features a compact structure, high space utilization, high adaptability and process flexibility, avoids process interference, and improves production efficiency.

Description

Technical Field

[0001] This invention belongs to the field of coating technology, specifically relating to a multi-chamber linkage magnetron sputtering coating device. Background Technology

[0002] Magnetron sputtering is an advanced and highly advantageous physical vapor deposition (PVD) technology commonly used for depositing various functional films, including metals, oxides, and nitrides. This technology, with its mature equipment, stable and controllable process, ability to achieve large-area uniform deposition, and strong adhesion between the film and the substrate, has been widely applied in microelectronics manufacturing, optical thin film preparation, and material surface modification. Through magnetron sputtering, workpiece surfaces can achieve excellent anti-adhesion properties, wear resistance, and reduced coefficient of friction, making it of significant practical value.

[0003] Currently, mainstream magnetron sputtering equipment mainly includes single-chamber structures or linear slide-table multi-chamber structures. Single-chamber structures typically integrate multiple process functions into a single vacuum chamber, switching process zones or adjusting process parameters via a rotating base to achieve the deposition of different film layers. Their advantages include a smaller footprint and compact layout, making them suitable for scenarios with strict requirements on equipment size. However, in practical applications, different processes sharing the same chamber can easily lead to process interference, resulting in unstable film quality. Furthermore, this structure has limited process flexibility and is difficult to adapt to diverse and complex multilayer film deposition needs. Linear slide-table multi-chamber structures, on the other hand, arrange multiple functional chambers sequentially along a straight line. A linear slide or track mechanism drives the workpiece through each process chamber in sequence, gradually completing each process. While this type of structure offers a degree of process flexibility and scalability, the linear layout results in a large equipment size, low space utilization, and a single workpiece transport path, making process adjustments more cumbersome. For production lines with a wide variety of products or frequent process changes, this further limits the improvement of production efficiency. As electronic products increasingly demand higher performance and production capacity for thin films, traditional magnetron sputtering equipment is struggling to meet the modern electronics manufacturing industry's need for efficient, precise, and compact production equipment.

[0004] Therefore, we propose a multi-chamber linked magnetron sputtering coating device to solve the above-mentioned technical problems. Summary of the Invention

[0005] In order to solve the technical problems existing in the prior art, the present invention proposes a multi-chamber linkage magnetron sputtering coating device.

[0006] The technical solution adopted in this invention is as follows:

[0007] A multi-chamber linked magnetron sputtering coating apparatus includes:

[0008] An annular vacuum chamber, wherein a vacuum tube is connected to the side wall of the annular vacuum chamber;

[0009] Multiple process chambers, including a loading and unloading chamber, a pretreatment chamber, an annealing chamber, and several sputtering chambers, wherein the loading and unloading chamber is connected to the top surface of an annular vacuum chamber, and the pretreatment chamber, the annealing chamber, and each sputtering chamber are arranged in a ring around the outer periphery of the annular vacuum chamber and are all connected to the annular vacuum chamber.

[0010] A turntable is rotatably positioned in the center of an annular vacuum chamber and is connected to a drive assembly for rotating the turntable.

[0011] The robotic arm mechanism is arranged in a ring on the turntable. The turntable is provided with partitions between adjacent robotic arm mechanisms. One end of the robotic arm mechanism is located on the turntable, and the other end is provided with a carrier for mounting the substrate. The robotic arm mechanism can rotate and extend and retract to drive the substrate to extend into or out of the corresponding process chamber from the annular vacuum chamber.

[0012] The control system is used to coordinate and control the opening and closing of the drive components, the robotic arm mechanism, and the process components in each process chamber, thereby realizing the transfer and processing of the substrate between each process chamber.

[0013] In a further technical solution, the robotic arm mechanism includes a base, an electric telescopic rod, and a steering drive assembly. The base is mounted on a turntable, the carrier is located at the front end of the electric telescopic rod, and a steering shaft is fixedly installed through the tail end of the electric telescopic rod and hinged to the base via the steering shaft. The steering drive assembly is mounted on the base and is connected to the steering shaft via a transmission connection.

[0014] In a further technical solution, the steering drive assembly includes a second servo motor, a drive gear, and a driven gear. The second servo motor is mounted on a base, the drive gear is fixedly sleeved on the output shaft of the second servo motor, and the driven gear is fixedly sleeved on the steering shaft. The drive gear and the driven gear mesh with each other.

[0015] In a further technical solution, the carrier includes a collar, and a first clamping rod is provided inside the collar for clamping and mounting a substrate.

[0016] In a further technical solution, a support rod is also included, which includes a lower rod and an upper rod. The lower rod can be installed inside a collar, and a first steering motor is provided inside the lower rod. The upper rod can be rotatably installed on the top surface of the lower rod and is connected to the first steering motor for transmission. A second clamping rod is provided on the top surface of the upper rod for clamping and mounting the substrate.

[0017] In a further technical solution, two circular baffles are arranged parallel to each other on the top surface of the upper rod. The two circular baffles are connected in the middle by a shaft. Each of the two circular baffles has a fan-shaped opening on its upper side. A rotating ring is provided in the middle of the shaft, and a second steering motor for driving the rotating ring to rotate is provided inside the shaft. At least two second clamping rods are evenly arranged in a ring around the outer periphery of the rotating ring.

[0018] In a further technical solution, the top surface of the annular vacuum chamber is detachably connected to a cover plate, the loading and unloading cavity is integrally formed on the cover plate, and the top surface of the loading and unloading cavity is provided with a loading and unloading sliding window.

[0019] In a further technical solution, the driving component is a first servo motor, which is inverted and mounted on the top surface of the loading and unloading cavity. The output shaft of the first servo motor extends into the loading and unloading cavity and is connected to a rotating shaft. The lower end of the rotating shaft is rotatably mounted in the center of the annular vacuum chamber, and the turntable is fixedly sleeved on the rotating shaft.

[0020] In a further technical solution, the pretreatment chamber, annealing chamber, and sputtering chamber are all bolted to the outer periphery of the annular vacuum chamber, and the ends of the pretreatment chamber, annealing chamber, and sputtering chamber are all bolted with inspection plates.

[0021] In summary, due to the adoption of the above technical solution, the beneficial effects of the present invention are:

[0022] 1. This invention achieves orderly and efficient transfer of substrates between process chambers through the coordinated operation of an annular vacuum chamber, a turntable, a robotic arm mechanism, and various process chambers, thereby improving the continuity and production efficiency of the overall process flow. It is not only compact in structure and has high space utilization, but also, by setting up multiple sputtering chambers, can not only process multiple substrates in the same batch at the same time, improving production efficiency, but also flexibly combine different magnetron sputtering processes to meet the diverse and complex multilayer film deposition needs, thereby improving the adaptability of the device and the flexibility of the process.

[0023] 2. In this invention, the turntable is equipped with partitions between adjacent robotic arm mechanisms, which can effectively prevent cross-contamination and mutual interference during the process, and further ensure the stability and consistency of the film quality.

[0024] 3. This invention replaces the first clamping rod with a supporting rod and adopts a structure design of a lower rod and an upper rod. The first steering motor built into the lower rod drives the upper rod to rotate, thereby driving the second clamping rod at the top of the upper rod to rotate. This allows the substrate clamped on the second clamping rod to achieve angle adjustment, thereby meeting the coating requirements of multiple angles and multiple processes, and improving the automation level and production efficiency of the device.

[0025] 4. This invention features two circular baffles arranged parallel to each other on the top surface of the upper rod, with a fan-shaped opening on their upper side. The two circular baffles are connected at their center by a shaft, and a rotating ring is set in the middle of the shaft. The rotating ring is driven to rotate by a built-in second steering motor, thereby causing the second clamping rods evenly arranged around the outer circumference of the rotating ring to rotate synchronously. This structure allows the substrates on each of the second clamping rods to be switched sequentially to the corresponding positions of the fan-shaped openings through rotation, realizing the alternating exposure of individual substrates for corresponding process processing. The remaining substrates are shielded by the circular baffles to avoid process interference, further ensuring the consistency and stability of the film quality. At the same time, this structure also increases the number of substrates processed, effectively improving the utilization rate of the device and production efficiency. In addition, when the annular vacuum chamber is equipped with an automatic film thickness detector, the circular baffles can block part of the substrate during magnetron sputtering to correct the film thickness of the substrate, thereby effectively solving the problem of poor longitudinal uniformity of the film in traditional equipment and further improving the coating quality. Attached Figure Description

[0026] The present invention will be described by way of example and with reference to the accompanying drawings, wherein:

[0027] Figure 1 This is a schematic diagram of the structure of the present invention;

[0028] Figure 2 This is a schematic diagram of the internal structure of the present invention.

[0029] Figure 3 for Figure 2 A magnified view of a portion of point A in the middle;

[0030] Figure 4 This is a schematic diagram showing the connection between the bearing rod and the circular baffle of the present invention;

[0031] Figure 5 This is a schematic diagram showing the connection between the shaft and the second clamping rod of the present invention.

[0032] Reference numerals: 1-Annular vacuum chamber, 2-Vacuum tube, 3-Loading / unloading chamber, 4-Pretreatment chamber, 5-Annealing chamber, 6-Sputtering chamber, 7-Turntable, 8-Baffle, 9-Cover plate, 10-Loading / unloading sliding window, 11-First servo motor, 12-Rotating shaft, 13-Base, 14-Electric telescopic rod, 15-Steering shaft, 16-Second servo motor, 17-Driving gear, 18-Passive gear, 19-Collar, 20-First clamping rod, 21-Lower rod, 22-Upper rod, 23-Second clamping rod, 24-Circular baffle, 25-Shaft, 26-Fan-shaped opening, 27-Rotating ring, 28-Inspection plate. Detailed Implementation

[0033] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0034] See Figures 1-5 This invention provides a multi-chamber linked magnetron sputtering coating apparatus, comprising:

[0035] An annular vacuum chamber 1, wherein a vacuum tube 2 is connected to the side wall of the annular vacuum chamber 1;

[0036] Multiple process chambers, including loading and unloading chamber 3, pretreatment chamber 4, annealing chamber 5 and several sputtering chambers 6, wherein the loading and unloading chamber 3 is connected to the top surface of the annular vacuum chamber 1, and the pretreatment chamber 4, annealing chamber 5 and each sputtering chamber 6 are arranged in a ring around the outer periphery of the annular vacuum chamber 1 and are all connected to the annular vacuum chamber 1.

[0037] Turntable 7 is rotatably disposed in the center of the annular vacuum chamber 1 and is connected to a drive assembly for driving the turntable 7 to rotate.

[0038] The robotic arm mechanism is arranged in a ring on the turntable 7. The turntable 7 is provided with partitions 8 between adjacent robotic arm mechanisms. One end of the robotic arm mechanism is provided on the turntable 7, and the other end is provided with a carrier for mounting the substrate. The robotic arm mechanism can rotate and extend and retract to drive the substrate to extend into or out of the corresponding process chamber from the annular vacuum chamber 1.

[0039] The control system is used to coordinate and control the opening and closing of the drive components, the robotic arm mechanism, and the process components in each process chamber, thereby realizing the transfer and processing of the substrate between each process chamber.

[0040] This coating apparatus connects all process chambers to an annular vacuum chamber 1, using a vacuum tube 2 to evacuate the chamber, thus providing a constant and stable vacuum environment for both the annular vacuum chamber 1 and each process chamber, ensuring stability and consistency of process effects. In actual operation, the control system first operates a robotic arm mechanism to extend into the loading / unloading chamber 3. By opening the loading / unloading chamber 3, the substrate to be processed is mounted onto the carrier of each robotic arm mechanism. Next, the robotic arm mechanism retracts into the annular vacuum chamber 1, simultaneously closing the loading / unloading chamber 3 and initiating the vacuum evacuation procedure, creating and maintaining the required vacuum environment. Subsequently, the control system operates the drive assembly, driving the turntable 7 located in the center of the annular vacuum chamber 1 to rotate according to a set rhythm, aligning each robotic arm mechanism sequentially with its corresponding pretreatment chamber 4, annealing chamber 5, and sputtering chamber 6. Through the extension and retraction of the robotic arm mechanism, the carrier carrying the substrate is accurately delivered into the target process chamber to complete the predetermined process treatment. After the process is completed, the substrate is retracted onto the turntable 7 and transferred to the next process chamber, repeating this cycle until all processes are completed. This device, by incorporating multiple sputtering chambers 6, not only enables simultaneous processing of multiple substrates in the same batch, improving production efficiency, but also allows for flexible combination of different magnetron sputtering processes to meet diverse and complex multilayer film deposition needs, enhancing the device's adaptability and process flexibility. Furthermore, the turntable 7 is equipped with partitions 8 between adjacent robotic arm mechanisms, effectively preventing cross-contamination and interference during the process, further ensuring the stability and consistency of film quality. Compared to traditional equipment, this coating device, through the coordinated operation of the annular vacuum chamber 1, the turntable 7, the robotic arm mechanisms, and the various process chambers, achieves orderly and efficient transfer of substrates between process chambers, improving the overall process flow continuity and production efficiency. This coating device is not only compact and space-efficient but also highly flexible, making it particularly suitable for production lines with a wide variety of products or frequent process changes, demonstrating promising application prospects. It is worth mentioning that the pretreatment chamber 4, annealing chamber 5 and sputtering chamber 6 are equipped with process components for corresponding process treatments, as well as control systems for controlling each component. These all adopt conventional technical means in the prior art and do not involve changes to their structure and usage methods, nor are they improvements of this invention. Those skilled in the art can easily and completely implement them, so they will not be described in detail here.

[0041] In one specific implementation, see Figure 2 and Figure 3 The robotic arm mechanism includes a base 13, an electric telescopic rod 14, and a steering drive assembly. The base 13 is mounted on a turntable 7. The carrier is located at the front end of the electric telescopic rod 14. A steering shaft 15 is fixedly installed through the tail end of the electric telescopic rod 14 and is hinged to the base 13 through the steering shaft 15. The steering drive assembly is mounted on the base 13 and is connected to the steering shaft 15 in a transmission manner.

[0042] By designing the robotic arm mechanism to include a base 13, an electric telescopic rod 14, and a steering drive assembly, the carrier can extend and retract axially under the drive of the electric telescopic rod 14. This facilitates the accurate delivery of substrates into or from various process chambers. Simultaneously, the tail end of the electric telescopic rod 14 is hinged to the base 13 via a steering shaft 15, which is rotated by the steering drive assembly. This allows for angle adjustment of the electric telescopic rod 14 and its front carrier, enabling flexible switching between horizontal and vertical directions. This allows the substrates to be precisely aligned with the different orientation requirements of each process chamber, further enhancing the overall stability and adaptability of the device.

[0043] In one specific implementation, see Figure 3 The steering drive assembly includes a second servo motor 16, a drive gear 17, and a driven gear 18. The second servo motor 16 is mounted on the base 13. The drive gear 17 is fixedly sleeved on the output shaft of the second servo motor 16. The driven gear 18 is fixedly sleeved on the steering shaft 15. The drive gear 17 and the driven gear 18 mesh with each other.

[0044] The steering drive assembly utilizes the coordinated operation of a second servo motor 16, a drive gear 17, and a driven gear 18. The second servo motor 16 drives the drive gear 17 to rotate, and the meshing transmission between the drive gear 17 and the driven gear 18 drives the steering shaft 15, thereby adjusting the angle of the electric telescopic rod 14 and its front-end carrier to ensure the smooth operation of each process step. Furthermore, the drive method is not limited to gear meshing transmission; belt drives, chain drives, and other transmission forms can also be used to adapt to different application requirements.

[0045] In one specific implementation, see Figure 3 The carrier includes a collar 19, and a first clamping rod 20 for clamping and mounting a substrate is provided inside the collar 19.

[0046] The first clamping rod 20 securely holds the substrate, preventing displacement or loosening during transport and processing, thus ensuring process accuracy and uniform and stable film quality. Simultaneously, this structure is simple and compact, facilitating rapid loading and unloading of the substrate and improving production efficiency.

[0047] In one specific implementation, see Figure 4It also includes a support rod, which includes a lower rod 21 and an upper rod 22. The lower rod 21 can be installed inside the collar 19. The lower rod 21 is equipped with a first steering motor. The upper rod 22 can be rotatably installed on the top surface of the lower rod 21 and is connected to the first steering motor in a transmission connection. The top surface of the upper rod 22 is provided with a second clamping rod 23 for clamping and mounting the substrate.

[0048] By replacing the first clamping rod 20 with a support rod, and employing a structure of a lower rod 21 and an upper rod 22, the upper rod 22 is rotated by a first steering motor built into the lower rod 21. This, in turn, rotates the second clamping rod 23 at the top of the upper rod 22, allowing the substrate clamped on the second clamping rod 23 to be angled, thus meeting the coating requirements of multiple angles and processes. For example, rotating the second clamping rod 23 by 180 degrees completes the substrate flipping operation, enabling double-sided coating without opening the vacuum chamber. This effectively simplifies the double-sided coating process and improves the automation level and production efficiency of the device.

[0049] In one specific implementation, see Figure 4 and Figure 5 The top surface of the upper rod 22 is provided with two circular baffles 24 in parallel. The middle of the two circular baffles 24 is connected by a shaft 25. The upper side of each of the two circular baffles 24 is provided with a fan-shaped opening 26. The middle of the shaft 25 is provided with a rotating ring 27, and the shaft 25 is provided with a second steering motor for driving the rotating ring 27 to rotate. At least two second clamping rods 23 are evenly arranged in a ring around the outer periphery of the rotating ring 27.

[0050] By parallelly arranging two circular baffles 24 on the top surface of the upper rod 22, with fan-shaped openings 26 on their upper sides, and connecting the two circular baffles 24 to their center via a shaft 25, a rotating ring 27 is set in the middle of the shaft 25. A built-in second steering motor drives the rotating ring 27 to rotate, thereby causing the second clamping rods 23 evenly arranged around the outer periphery of the rotating ring 27 to rotate synchronously. This structure allows the substrates on each of the second clamping rods 23 to be sequentially switched to the corresponding positions of the fan-shaped openings 26 through rotation, achieving alternating exposure of individual substrates for corresponding process processing. The remaining substrates are shielded by the circular baffles 24 to avoid process interference, further ensuring the consistency and stability of the film quality. Simultaneously, this structure also increases the number of substrates processed, effectively improving the utilization rate of the device and production efficiency. Furthermore, when the annular vacuum chamber 1 is equipped with an automatic film thickness detector, during magnetron sputtering of the substrate, the circular baffles 24 can block part of the substrate to correct the film thickness, effectively solving the problem of poor longitudinal uniformity of the film in traditional equipment and further improving the coating quality.

[0051] In one specific implementation, see Figure 1The top surface of the annular vacuum chamber 1 is detachably connected to a cover plate 9, the loading and unloading chamber 3 is integrally formed on the cover plate 9, and the top surface of the loading and unloading chamber 3 is provided with a loading and unloading sliding window 10.

[0052] The loading and unloading sliding window 10 on the top surface of the loading and unloading chamber 3 allows for convenient and quick installation and disassembly of the substrate, ensuring efficient loading and unloading. The annular vacuum chamber 1 features a detachable cover plate 9 on its top surface, making the disassembly, maintenance, and cleaning of internal components such as the turntable 7 and robotic arm mechanism more convenient. This improves the maintainability of the device, extends its service life, and further ensures the stability and reliability of the device's operation.

[0053] In one specific implementation, see Figure 1 and Figure 2 The driving component is a first servo motor 11, which is inverted and installed on the top surface of the loading and unloading cavity 3. The output shaft of the first servo motor 11 extends into the loading and unloading cavity 3 and is connected to a rotating shaft 12. The lower end of the rotating shaft 12 is rotatably installed in the center of the annular vacuum chamber 1. The turntable 7 is fixedly sleeved on the rotating shaft 12.

[0054] By inverting the first servo motor 11 and mounting it on the top surface of the loading / unloading chamber 3, and connecting it to the rotating shaft 12 located in the center of the annular vacuum chamber 1 via its output shaft, the turntable 7 mounted on the rotating shaft 12 is driven to rotate, thereby achieving precise transfer of the substrate between the various process chambers. This structure is compact, avoids the first servo motor 11 occupying the effective space inside the annular vacuum chamber 1, and improves the overall space utilization of the device.

[0055] In one specific implementation, see Figure 1 and Figure 2 The pretreatment chamber 4, annealing chamber 5 and sputtering chamber 6 are all bolted to the outer periphery of the annular vacuum chamber 1, and inspection plates 28 are bolted to the ends of the pretreatment chamber 4, annealing chamber 5 and sputtering chamber 6.

[0056] By bolting the pretreatment chamber 4, annealing chamber 5, and sputtering chamber 6 to the outer periphery of the annular vacuum chamber 1, not only is modular assembly of the device facilitated, improving its disassembly and maintenance convenience, but the type and number of chambers can also be flexibly adjusted or changed according to process requirements, enhancing the device's adaptability and scalability. Furthermore, the installation of inspection plates 28 at the ends of each process chamber facilitates subsequent cleaning, maintenance, or replacement of components, further improving the device's maintainability and service life.

[0057] The above description is merely an embodiment of the present invention and does not limit the patent scope of the present invention. Any equivalent structural or procedural transformations made based on the content of the present invention specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of the present invention.

Claims

1. A multi-chamber linked magnetron sputtering coating apparatus, characterized in that, include: An annular vacuum chamber (1) is provided with a vacuum tube (2) connected to the side wall of the annular vacuum chamber (1). Multiple process chambers, including loading and unloading chamber (3), pretreatment chamber (4), annealing chamber (5) and several sputtering chambers (6), the loading and unloading chamber (3) is connected to the top surface of the annular vacuum chamber (1), the pretreatment chamber (4), the annealing chamber (5) and each sputtering chamber (6) are arranged in a ring around the outer periphery of the annular vacuum chamber (1) and are all connected to the annular vacuum chamber (1); The turntable (7) is rotatably disposed in the center of the annular vacuum chamber (1) and is connected to a drive assembly for driving the turntable (7) to rotate. The robotic arm mechanism is distributed in a ring on the turntable (7). The turntable (7) is provided with partitions (8) between adjacent robotic arm mechanisms. One end of the robotic arm mechanism is provided on the turntable (7), and the other end is provided with a carrier for mounting the substrate. The robotic arm mechanism can rotate and extend and retract to drive the substrate to extend from the annular vacuum chamber (1) into or out of the corresponding process chamber. The control system is used to coordinate and control the opening and closing of the drive components, the robotic arm mechanism, and the process components in each process chamber, thereby realizing the transfer and processing of the substrate between each process chamber. The carrier includes a collar (19), and a first clamping rod (20) for clamping and mounting a substrate is provided inside the collar (19). It also includes a support rod, which includes a lower rod (21) and an upper rod (22). The lower rod (21) can be installed in the collar (19). The lower rod (21) is provided with a first steering motor inside. The upper rod (22) can be rotatably installed on the top surface of the lower rod (21) and is connected to the first steering motor in a transmission connection. The top surface of the upper rod (22) is provided with a second clamping rod (23) that can be used to clamp the mounting substrate. The top surface of the upper rod (22) is provided with two circular baffles (24) arranged in parallel. The middle of the two circular baffles (24) is connected by a shaft (25). The upper side of the two circular baffles (24) is provided with a fan-shaped opening (26). The middle of the shaft (25) is provided with a rotating ring (27). The shaft (25) is provided with a second steering motor for driving the rotating ring (27) to rotate. At least two second clamping rods (23) are evenly arranged in a ring around the outer periphery of the rotating ring (27).

2. The multi-chamber linkage magnetron sputtering coating apparatus according to claim 1, characterized in that, The robotic arm mechanism includes a base (13), an electric telescopic rod (14), and a steering drive assembly. The base (13) is mounted on a turntable (7). The carrier is located at the front end of the electric telescopic rod (14). A steering shaft (15) is fixedly installed through the tail end of the electric telescopic rod (14) and is hinged to the base (13) through the steering shaft (15). The steering drive assembly is mounted on the base (13) and is connected to the steering shaft (15) in a transmission manner.

3. The multi-chamber linkage magnetron sputtering coating apparatus according to claim 2, characterized in that, The steering drive assembly includes a second servo motor (16), a drive gear (17), and a driven gear (18). The second servo motor (16) is mounted on a base (13). The drive gear (17) is fixedly sleeved on the output shaft of the second servo motor (16). The driven gear (18) is fixedly sleeved on the steering shaft (15). The drive gear (17) and the driven gear (18) mesh with each other.

4. The multi-chamber linkage magnetron sputtering coating apparatus according to claim 1, characterized in that, The top surface of the annular vacuum chamber (1) is detachably connected to a cover plate (9), the loading and unloading chamber (3) is integrally formed on the cover plate (9), and the top surface of the loading and unloading chamber (3) is provided with a loading and unloading sliding window (10).

5. The multi-chamber linkage magnetron sputtering coating apparatus according to claim 1, characterized in that, The driving component is a first servo motor (11), which is inverted and installed on the top surface of the loading and unloading cavity (3). The output shaft of the first servo motor (11) extends into the loading and unloading cavity (3) and is connected to a rotating shaft (12). The lower end of the rotating shaft (12) is rotatably installed in the center of the annular vacuum chamber (1). The turntable (7) is fixedly sleeved on the rotating shaft (12).

6. The multi-chamber linkage magnetron sputtering coating apparatus according to claim 1, characterized in that, The pretreatment chamber (4), annealing chamber (5) and sputtering chamber (6) are all bolted to the outer periphery of the annular vacuum chamber (1), and the ends of the pretreatment chamber (4), annealing chamber (5) and sputtering chamber (6) are all bolted with inspection plates (28).

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