A high-power electron beam physical vapor deposition chamber system for engine blades

Abstract

The present application relates to the technical fields of electron beam physical vapor deposition, and relates to a high-power electron beam physical vapor deposition chamber system for engine blades, comprising: a deposition chamber body, inside which a first chamber and a second chamber are formed, and the second chamber is located outside the first chamber; a side wall of the deposition chamber body forms an inlet and outlet port connected to a loading structure, and a connecting position for setting an electron gun, and a baffle assembly is arranged at the inlet and outlet port and the connecting position; a target material conveying device, comprising a rotating assembly and a lifting assembly, the target material enters the first chamber from a target material port on the deposition chamber body, and a sealing tube is further sleeved on the outside of the target material. By improving the composition structure of the vapor deposition chamber, the vapor deposition operation in the first chamber of the vapor deposition chamber is realized, and at the same time, the temperature control can be performed by the cooling medium of the second chamber, the overall environmental temperature of the first chamber is maintained, and the stability and reliability of the vapor deposition process are ensured; in this way, the vapor deposition process is more flexible and simple.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of electron beam physical vapor deposition, and aims at performing vapor deposition treatment on engine blades, in particular to a high-power electron beam physical vapor deposition chamber system for engine blades. BACKGROUND

[0002] The electron beam physical vapor deposition (EB-PVD) technology is to use high-energy-density electron beams to bombard, heat and evaporate target materials under high-vacuum conditions, and form thermal barrier coatings with high bonding strength and excellent thermal shock resistance on substrates, and is widely used in the field of protective coating preparation for turbine blades of aircraft engines.

[0003] The existing electron beam physical vapor deposition equipment includes a deposition chamber, a loading chamber and a feeding mechanism. The deposition chamber is usually in a square structure, the inside of the deposition chamber is used to accommodate products for deposition operation, and the outer wall of the deposition chamber is connected with an electron gun. When performing vapor deposition treatment, the electron gun is driven to send electron beams to bombard the target material, so as to process or produce products.

[0004] When processing products, the existing deposition chamber feeds and discharges products from a single product port, which affects the production speed of products. Even when the product port fails, the single product port cannot be quickly and coordinately switched, and the equipment has to stop production. When the deposition chamber is working, the gas flow rate cannot be effectively controlled, and the environment in the deposition chamber is difficult to maintain in a better state, which cannot guarantee uniform deposition of the target material on the workpiece surface. At the same time, during the deposition process, the deposition chamber is in a high-temperature state, and the temperature in the deposition chamber needs to be effectively controlled to promote the stability and reliability of the deposition process. In addition, the existing deposition chamber is connected with the external loading chamber, considering the requirements of feeding and discharging and the cooperation of vapor deposition operation, which leads to gas leakage at the connection, cannot guarantee the vacuum degree in the deposition chamber, and part of the target material may even enter the external loading chamber, which not only affects the cleanliness of the loading chamber, but also affects the deposition process in the deposition chamber.

[0005] It can be seen that the structure of the deposition chamber of the existing EB-PVD equipment still needs to be improved, and should be optimized to improve the deposition effect, specifically to guarantee the stability and reliability of the deposition chamber during the deposition process, and to more flexibly cope with various conditions in actual work. Therefore, a more reasonable technical scheme needs to be proposed to solve the technical problems in the prior art. SUMMARY

[0006] To address some of the problems existing in the prior art, this invention discloses a high-power electron beam physical vapor deposition chamber system for engine blades. The deposition chamber structure has been optimized, and a quick-change electron gun has been set up to meet the needs of various deposition processes. At the same time, multiple electron guns are set up to fully cover the inside of the deposition chamber to improve the deposition effect. Multiple material inlets and outlets improve the flexibility of operation, making it easier and more efficient to process.

[0007] To achieve the above objectives, the deposition chamber system disclosed in this invention can adopt the following approach:

[0008] A high-power electron beam physical vapor deposition chamber system for engine blades includes:

[0009] The deposition chamber body has a first chamber for performing vapor deposition and a second chamber for introducing a cooling medium. The second chamber is located outside the first chamber. The side wall of the deposition chamber body has an inlet and outlet for communicating with the loading structure and a connection position for setting up an electron gun. Baffle assemblies are provided at both the inlet / outlet and the connection position.

[0010] The target material conveying device includes a rotary assembly for driving the target material to rotate and a lifting assembly for driving the target material to rise and fall. The target material enters the first chamber from the target material port on the main body of the deposition chamber, and a sealing tube is also fitted around the outside of the target material.

[0011] The aforementioned deposition chamber system improves the internal structure of the deposition chamber body to form a second chamber inside the deposition chamber body, which is used to cool the first chamber and maintain the temperature during the vapor deposition process, keeping the temperature of the first chamber controllable. At the same time, after the target material delivery device sends the target material into the vapor deposition chamber, it drives the target material to rise, fall, and rotate, adjusting the attitude of the target material in the vapor deposition chamber, so that the electron beam bombards the target material to form gaseous material, and better deposits the product into a film.

[0012] Furthermore, the baffle assembly is used to maintain the relative airtightness of the inside and outside of the sedimentation chamber body. When the product to be processed is conveyed into the sedimentation chamber or the product is removed from the sedimentation chamber body, the baffle assembly can open the inlet and outlet ports on the sedimentation chamber body. When the product to be processed enters the sedimentation chamber body and is in place, or when the product is removed from the sedimentation chamber body, the scissor baffle can close the inlet and outlet ports. The scissor baffle can be constructed in various forms, and its structure is not limited to a single one. Here, optimization is performed and one feasible option is proposed: The baffle assembly includes a scissor baffle set at the inlet and outlet ports. The scissor baffle includes two shaft baffles that are hinged to each other and open and close relative to each other. The shaft baffles are provided with corresponding slots. When the shaft baffles are closed, they form shaft holes and are used to clamp the feeding shaft that is used to transport the product. It also includes an opening and closing driver for providing opening and closing power. The telescopic drive shaft of the opening and closing driver is hinged to the transmission arm and drives the shaft baffles one by one through the transmission arm. When the telescopic drive shaft reciprocates, the shaft baffles open or close. When the above scheme is adopted, a fixed arm is provided on the shaft baffle that is hinged to the transmission arm. A bent section is formed on the fixed arm and forms an obtuse angle with the transmission arm to improve the ease with which the transmission arm opens and closes the fixed arm.

[0013] Furthermore, the baffle assembly is used to open or close process holes on the main body of the deposition chamber. The baffle assembly can adopt various designs, and its structure is not limited to a single design. Here, we optimize and propose one feasible option: the baffle assembly includes a rotating baffle disposed at the connection position. The rotating baffle includes rotating blades that conform to the inner wall of the deposition chamber. When the rotating blades are driven to the closed position by the rotating actuator, the connection position is closed; when the rotating blades are driven to the open position by the rotating actuator, the connection position is opened. With the above design, the rotating baffle can be constructed with one end enlarged to cover the process holes, and the other end having a thin structure that connects and engages with the rotating actuator.

[0014] Furthermore, the lifting assembly can be constructed in various feasible ways, and its structure is not limited to a single one. Here, we optimize and propose one feasible option: the lifting assembly includes a lifting driver that drives the lifting slider to slide along the lifting rail; the rotary assembly includes a rotary driver that engages with the lifting slider and moves synchronously with it; one end of the sealing tube engages with and seals the target material opening, and the other end of the sealing tube engages with and seals the rotary driver; the output shaft of the rotary driver is coaxially engaged with the target material. When using the above scheme, the lifting driver includes a cylinder, and the lifting rail can be a single rail or a double rail. When a single rail is used, it can be configured to maintain straight-line travel and prevent lateral rotation.

[0015] Furthermore, the structure of the sedimentation chamber body can be constructed in various forms, and its structure is not limited to a single one. Here, we optimize and propose one feasible option: the sedimentation chamber body includes several sealed and spliced ​​wall panels, and the second chamber is located inside the wall panels. When adopting the above scheme, the second chamber can be constructed as a reciprocating channel or as a single integral cavity.

[0016] Furthermore, to maintain the gas pressure within the main body of the deposition chamber, various methods can be used to regulate the pressure, and the structure is not limited to a single one. Here, we optimize and propose one feasible option: the main body of the deposition chamber is connected to an inflation assembly, which is used to supply gas to the first chamber. The inflation assembly includes an inflation pipeline, on which a flow meter and a gas valve are installed. The gas valve is connected to the first chamber via a connecting flange and controls the gas flow rate. When adopting the above scheme, the inflation assembly is connected to a gas pump via the inflation pipeline. The gas pump supplies gas to the gas phase deposition chamber, and the gas supply volume is determined under the control of the flow meter and the gas valve, thereby adjusting the internal gas pressure value.

[0017] Furthermore, when controlling the internal gas pressure of the deposition chamber, the pressure is reduced by venting the gas inside the deposition chamber. This can be achieved through various methods and is not limited to a single approach. Here, we optimize and propose one feasible option: the deposition chamber is equipped with an exhaust port connected to the first chamber. Before vapor deposition, the gas inside the first chamber is exhausted through the exhaust port to achieve a set vacuum level. When using this approach, the exhaust port is connected to an extraction device for gas extraction, thereby adjusting the vacuum level in the first chamber.

[0018] Furthermore, during vapor deposition in the first chamber, to prevent internal materials from entering the extraction port, an optimization is proposed, and one feasible option is suggested: an inner baffle layer is provided in the first chamber. This inner baffle layer is formed corresponding to the inner wall of the deposition chamber and has several pore structures. These pore structures include through holes corresponding to the inlet and outlet ports and mesh holes corresponding to the extraction port. When using this solution, the inner baffle layer is made of a high-temperature resistant material and is installed on multiple walls within the vapor deposition chamber to form an internal barrier layer, preventing a large amount of vaporized target material from entering the extraction channel.

[0019] Furthermore, to facilitate observation of the internal processing within the sedimentation chamber, the structure of the main body of the sedimentation chamber was adjusted. Its structure is not limited to a single design; one feasible option is proposed here: a detachable inspection door is installed on the main body of the sedimentation chamber, with an observation window facing the first chamber formed on the door. An observation window baffle assembly is also provided for shielding and opening the observation window. With this design, the inspection door is tilted at a certain angle so that the observation window faces the product to be deposited, thus facilitating observation.

[0020] Furthermore, during the vapor deposition process, it is necessary to monitor the deposition process to determine the progress. This monitoring can be achieved in various ways; here, we optimize and propose one feasible option: The deposition chamber body is also equipped with a detection component. This component includes a weighing module for measuring the deposition amount, a temperature measuring module for measuring the internal temperature of the first chamber, and an image module for acquiring an image of the first chamber. In this scheme, the weighing module includes a weight block, and a weight sensor is used to obtain the weight value of the weight block. During the vapor deposition process, the target material adheres to the weight block, and its weight changes. Based on this weight change, the increased weight of the product after target material deposition can be assessed after conversion. The temperature measuring module includes a temperature sensor, and the image module includes a camera.

[0021] Compared with the prior art, some of the beneficial effects of the technical solution disclosed in this invention include:

[0022] This invention improves the composition and structure of the vapor deposition chamber, enabling vapor deposition operations within the first chamber while simultaneously controlling the temperature of the first chamber through the cooling medium in the second chamber, thus maintaining the overall ambient temperature of the first chamber and ensuring the stability and reliability of the vapor deposition process. This makes the vapor deposition process more flexible and simple. Attached Figure Description

[0023] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of the present invention and should not be regarded as a limitation on the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0024] Figure 1 This is a schematic diagram of the overall structure of the sedimentation chamber system.

[0025] Figure 2 This is a schematic diagram of the overall structure of the sedimentation chamber.

[0026] Figure 3 This is a schematic diagram of the left-hand structure of the sedimentation chamber.

[0027] Figure 4 This is a rear view schematic diagram of the main structure of the sedimentation chamber.

[0028] Figure 5 This is a front view schematic diagram of the main structure of the sedimentation chamber.

[0029] Figure 6 This is a schematic diagram of the sedimentation chamber structure viewed from below.

[0030] Figure 7 This is a schematic diagram of the internal structure of the sedimentation chamber.

[0031] Figure 8 This is a schematic diagram of the overall structure of the target material delivery device.

[0032] Figure 9 This is a schematic diagram of the overall structure of the inflatable assembly.

[0033] Figure 10 This is a schematic diagram of the overall structure of the scissor guard.

[0034] Figure 11 This is a structural diagram of the inspection door.

[0035] Figure 12 This is a schematic diagram of the overall structure of the rotating baffle.

[0036] In the above attached figures, the meanings of each label are as follows:

[0037] 1. Sedimentation chamber main body; 101. Air extraction port; 102. Inner baffle layer; 103. Inlet and outlet; 104. Inspection door; 105. Observation window; 106. Connection position; 107. Second chamber; 108. First chamber; 2. Target material conveying device; 201. Lifting driver; 202. Lifting rail; 203. Lifting slider; 204. Rotary driver; 205. Output shaft; 206. Sealing pipe; 3. Inflation assembly; 301. Inflation pipeline; 302. Flow meter; 303. Air valve; 4. Rotating baffle; 401. Rotating blade; 402. Rotary driver; 5. Scissor baffle; 501. Opening and closing driver; 502. Telescopic drive shaft; 503. Transmission arm; 504. Bending section; 505. Shaft baffle; 506. Groove. Detailed Implementation

[0038] The following description, in conjunction with the accompanying drawings and specific embodiments, further illustrates this embodiment.

[0039] In view of the shortcomings of the prior art in the vapor deposition chamber, such as poor control of the working environment temperature, poor attitude control of the target material after delivery which affects vaporization, and the impact of the deposited material in the vapor deposition chamber on the cleanliness of the internal components, the following embodiments are optimized and overcome the defects of the prior art.

[0040] Example

[0041] like Figure 1 As shown, this embodiment provides a high-power electron beam physical vapor deposition chamber system for engine blades, comprising:

[0042] Sedimentation chamber body 1, such as Figures 1-6As shown, the interior of the deposition chamber 1 forms a first chamber 108 for performing vapor deposition and a second chamber 107 for introducing a cooling medium. The second chamber 107 is located outside the first chamber 108. The side wall of the deposition chamber 1 forms an inlet / outlet 103 that communicates with the loading structure and a connection position 106 for setting up an electron gun. Baffle assemblies are provided at both the inlet / outlet 103 and the connection position 106.

[0043] Target material conveying device 2, such as Figure 8 As shown, it includes a rotary assembly for rotating the target and a lifting assembly for lifting the target. The target enters the first chamber 108 from the target port on the main body 1 of the deposition chamber, and a sealing tube 206 is also fitted on the outside of the target.

[0044] The deposition chamber system disclosed in this embodiment improves the internal structure of the deposition chamber body 1, forming a second chamber 107 inside the deposition chamber body 1 to cool the first chamber 108, maintain the temperature during the vapor deposition process, and keep the temperature of the first chamber 108 controllable. At the same time, after the target material conveying device 2 sends the target material into the vapor deposition chamber, it drives the target material to rise, fall, and rotate, adjusting the attitude of the target material in the vapor deposition chamber, so that the electron beam bombards the target material to form gaseous material, and better deposits the product into a film.

[0045] The baffle assembly is used to maintain a relative airtightness between the inside and outside of the deposition chamber body 1. When the product to be processed is conveyed into the deposition chamber or the product is removed from the deposition chamber body 1, the baffle assembly can open the inlet / outlet 103 on the deposition chamber body 1. When the product to be processed enters the deposition chamber body 1 and is in place, or when the product is removed from the deposition chamber body 1, the scissor baffle 5 can close the inlet / outlet 103. The scissor baffle 5 can be constructed in various forms, and its structure is not uniquely limited. This embodiment optimizes and adopts one feasible option: such as Figure 10 As shown, the baffle assembly includes a scissor baffle 5 disposed at the inlet / outlet 103. The scissor baffle 5 includes two hinged and opening / closing shaft baffles 505. Each shaft baffle 505 has a corresponding slot 506. When the shaft baffles 505 are closed, they form shaft holes for clamping and conveying the product feed shaft. The assembly also includes an opening / closing actuator 501 to provide opening and closing power. The telescopic drive shaft 502 of the opening / closing actuator 501 is hinged to a transmission arm 503 and drives the shaft baffles 505 one by one through the transmission arm 503. When the telescopic drive shaft 502 reciprocates, the shaft baffles 505 open or close. In this configuration, a fixed arm is provided on the shaft baffle 505, which is hinged to the transmission arm 503. The fixed arm has a bent section 504 that forms an obtuse angle with the transmission arm 503, improving the ease with which the transmission arm 503 opens and closes the fixed arm.

[0046] The baffle assembly is used to open or close process holes and other openings on the deposition chamber body 1. The baffle assembly can be implemented in various ways, and its structure is not limited to a single design. This embodiment optimizes and adopts one feasible option: such as... Figure 12 As shown, the baffle assembly includes a rotating baffle 4 disposed at the connection position 106. The rotating baffle 4 includes a rotating blade 401 that conforms to the wall surface of the deposition chamber. When the rotating blade 401 is driven to the closed position by the rotating actuator 402, the connection position 106 is closed; when the rotating blade 401 is driven to the open position by the rotating actuator 402, the connection position 106 is opened. With the above scheme, the rotating baffle 4 can be constructed such that one end is enlarged to cover the process hole, and the other end has a small structure that connects and cooperates with the rotating actuator 402.

[0047] The lifting assembly can be constructed in various feasible ways, and its structure is not limited to a single one. This embodiment optimizes and adopts one of the feasible options: such as Figure 8 As shown, the lifting assembly includes a lifting driver 201, which drives the lifting slider 203 to slide along the lifting rail 202. The rotary assembly includes a rotary driver 204 that is coupled to the lifting slider 203 and moves synchronously. One end of the sealing tube 206 is coupled to the target material opening and sealed, and the other end of the sealing tube 206 is coupled to the rotary driver 204 and sealed. The output shaft 205 of the rotary driver 204 is coaxially coupled to the target material. In this configuration, the lifting driver 201 includes a cylinder, and the lifting rail 202 can be a single rail or a double rail. When a single rail is used, it can be configured to maintain straight-line travel and prevent lateral rotation.

[0048] The structure of the sedimentation chamber body 1 can be constructed in various forms, and its structure is not limited to a single one. This embodiment optimizes and adopts one of the feasible options: such as Figure 7 As shown, the sedimentation chamber body 1 includes several sealed and spliced ​​wall panels, and the second chamber 107 is located inside the wall panels. When adopting the above scheme, the second chamber 107 can be constructed as a reciprocating channel or as a single integral cavity.

[0049] To maintain the gas pressure within the sedimentation chamber 1, various methods can be used to regulate the pressure. The structure is not uniquely limited; this embodiment optimizes and employs one feasible option: such as... Figures 2-5 , Figure 9As shown, the deposition chamber body 1 is connected to an aeration assembly 3, which is used to supply gas into the first chamber 108. The aeration assembly 3 includes an aeration pipe 301, on which a flow meter 302 and a gas valve 303 are installed. The gas valve 303 is connected to the first chamber 108 via a connecting flange and controls the gas flow rate. In this configuration, the aeration assembly 3 is connected to a gas pump via the aeration pipe 301. The gas pump supplies gas into the gas phase deposition chamber, and the gas supply volume is determined under the control of the flow meter 302 and the gas valve 303, thereby adjusting the internal gas pressure value.

[0050] When controlling the internal gas pressure of the sedimentation chamber body 1, the gas pressure is also reduced by venting the gas inside the sedimentation chamber. This can be achieved through various methods and is not limited to a single approach. This embodiment optimizes and adopts one feasible option: such as... Figure 1 As shown, the deposition chamber body 1 is provided with an exhaust port 101 that connects to the first chamber 108. Before vapor deposition, the gas inside the first chamber 108 is discharged through the exhaust port 101 to achieve a set vacuum level. When the above scheme is adopted, the exhaust port 101 is connected to an exhaust device for extracting gas, thereby adjusting the vacuum level in the first chamber 108.

[0051] During vapor deposition in the first chamber 108, to prevent internal materials from entering the vent 101, this embodiment optimizes the process and employs one feasible option: such as... Figure 7 As shown, an inner baffle layer 102 is provided inside the first chamber 108. The inner baffle layer 102 is formed corresponding to the inner wall surface of the deposition chamber and forms a plurality of pore structures. The pore structures include through holes corresponding to the inlet / outlet ports 103 and mesh holes corresponding to the exhaust ports 101. When adopting the above scheme, the inner baffle layer 102 is made of high-temperature resistant material and is provided on multiple walls inside the vapor deposition chamber to form an internal barrier layer to prevent a large amount of vaporized target material from entering the exhaust channel.

[0052] To facilitate observation of the internal processing of the sedimentation chamber body 1, the structure of the sedimentation chamber body 1 has been adjusted. Its structure is not uniquely limited; this embodiment optimizes and adopts one feasible option: such as... Figure 1 , Figure 11 As shown, the deposition chamber body 1 is equipped with a detachable inspection door 104, on which an observation window 105 facing the first chamber 108 is formed. An observation window 105 baffle assembly is also provided for shielding and opening the observation window 105. With the above solution, the inspection door 104 is tilted at a certain angle so that the observation window 105 faces the product to be deposited, thereby facilitating observation.

[0053] During vapor deposition, it is necessary to monitor the process to determine the progress. This monitoring can be achieved in various ways; this embodiment optimizes and adopts one feasible option: a detection component is also installed on the deposition chamber body 1. This component includes a weighing module for measuring the deposition amount, a temperature measuring module for measuring the internal temperature of the first chamber 108, and an image module for acquiring an image of the interior of the first chamber 108. In this scheme, the weighing module includes a weight block, and a weight sensor is used to obtain the weight value of the weight block. During vapor deposition, the target material adheres to the weight block, and its weight changes. Based on this weight change, the increased weight of the product after target material deposition can be assessed. The temperature measuring module includes a temperature sensor, and the image module includes a camera.

[0054] The above are the embodiments listed in this example; however, this example is not limited to the optional embodiments described above; those skilled in the art can arbitrarily combine the above methods to obtain other various embodiments; anyone can derive other various forms of embodiments under the guidance of this example. The above specific embodiments should not be construed as limiting the scope of protection of this example; the scope of protection of this example should be determined by the claims.

Claims

1. A high-power electron beam physical vapor deposition chamber system for engine blades, characterized by, The application relates to a deposition chamber, which comprises the following parts: a deposition chamber body (1) which is internally formed with a first chamber (108) for carrying out vapor deposition and a second chamber (107) for feeding in cooling medium, the second chamber (107) is located outside the first chamber (108); the side wall of the deposition chamber body (1) is formed with an inlet and outlet port (103) which is connected with a loading structure and a connecting position (106) for arranging an electron gun, the inlet and outlet port (103) and the connecting position (106) are both provided with a shutter assembly; a target material conveying device (2) which comprises a rotating assembly for rotating the target material and a lifting assembly for lifting the target material, the target material enters the first chamber (108) from a target material port on the deposition chamber body (1), and the target material is further sleeved with a sealing pipe (206); the shutter assembly comprises a scissor shutter (5) arranged at the inlet and outlet port (103), the scissor shutter (5) comprises two shaft shutters (505) which are hinged to each other and can be opened and closed relative to each other, the shaft shutters (505) are correspondingly provided with notches (506), when the shaft shutters (505) are closed, shaft holes are formed and used for clamping a feeding shaft of a conveying product; the shutter assembly further comprises an opening and closing driver (501) for providing opening and closing power, a telescopic driving shaft (502) of the opening and closing driver (501) is hinged to a transmission arm (503) and drives the shaft shutters (505) through the transmission arm (503), when the telescopic driving shaft (502) reciprocates, the shaft shutters (505) are opened or closed.

2. The high power e-beam physical vapor deposition chamber system for engine blades of claim 1, wherein: the shutter assembly comprises a rotary shutter (4) arranged at the connecting position (106), the rotary shutter (4) comprises a rotary blade (401) which is attached to the inner wall of the deposition chamber, when the rotary blade (401) is driven to a closed position by a rotary driver (402), the connecting position (106) is closed, when the rotary blade (401) is driven to an open position by the rotary driver (402), the connecting position (106) is opened.

3. The high power e-beam physical vapor deposition chamber system for engine blades of claim 1, wherein: the lifting assembly comprises a lifting driver (201) for driving a lifting slider (203) to slide along a lifting rail (202); the rotating assembly comprises a rotating driver (204) which is matched to the lifting slider (203) and synchronously lifted, one end of the sealing pipe (206) is matched to the target material port and sealed, the other end of the sealing pipe (206) is matched to the rotating driver (204) and sealed, and an output shaft (205) of the rotating driver (204) is coaxially matched with the target material.

4. The high power e-beam physical vapor deposition chamber system for engine blades of claim 1, wherein: the deposition chamber body (1) comprises a plurality of sealingly spliced wall plates, and the second chamber (107) is located inside the wall plates.

5. The high power e-beam physical vapor deposition chamber system for engine blades of claim 1, wherein: the deposition chamber body (1) is connected with an inflation assembly (3) which is used for conveying gas into the first chamber (108); the inflation assembly (3) comprises an inflation pipeline (301), the inflation pipeline (301) is provided with a flow meter (302) and a gas valve (303), the gas valve (303) is connected with the first chamber (108) through a connecting flange and controls the gas flow.

6. The high power e-beam physical vapor deposition chamber system for engine blades of claim 1, wherein: The deposition chamber body (1) is provided with a gas exhaust port (101) communicating with the first chamber (108), and the gas in the first chamber (108) is exhausted from the gas exhaust port (101) to reach a set vacuum degree before vapor deposition.

7. The high power e-beam physical vapor deposition chamber system for engine blades of claim 6, wherein: The first chamber (108) is provided with an inner barrier layer (102) formed corresponding to the inner wall of the deposition chamber and forming a plurality of hole structures, the hole structures including through holes corresponding to the inlet and outlet port (103) and mesh holes corresponding to the gas exhaust port (101).

8. The high power e-beam physical vapor deposition chamber system for engine blades of claim 1, wherein: The deposition chamber body (1) is provided with a detachable inspection door (104), the inspection door (104) is formed with an observation window (105) facing the first chamber (108), and an observation window (105) shutter assembly is further provided to shield and open the observation window (105).

9. The high power e-beam physical vapor deposition chamber system for engine blades of claim 1, wherein: The deposition chamber body (1) is further provided with a detection assembly, the detection assembly including a weighing module for weighing the deposition amount, a temperature measuring module for measuring the temperature in the first chamber (108), and an image module for obtaining the picture in the first chamber (108).

Images