Light-absorbing filter, light filter, method for manufacturing light filter, organic electroluminescent display device, inorganic electroluminescent display device, and liquid crystal display device

Abstract

A light absorption filter, an optical filter using the light absorption filter, a method for manufacturing the same, and an OLED display device, an inorganic EL display device, and a liquid crystal display device provided with the optical filter, the light absorption filter comprising: a wavelength selective absorption layer containing a dye and a resin A containing an acid group; and an adjacent layer disposed directly on at least one surface of the wavelength selective absorption layer, the adjacent layer containing a resin containing a basic group.

Description

Technical Field

[0001] This invention relates to a light absorption filter, a filter and its manufacturing method, an organic electroluminescent display device, an inorganic electroluminescent display device and a liquid crystal display device. Background Technology

[0002] As image display devices, organic light-emitting diode (OLED) display devices, inorganic light-emitting diode (inorganic EL) display devices, and liquid crystal display devices have been used in recent years.

[0003] Liquid crystal displays (LCDs) are increasingly used as image display devices that consume little power and save space. In an LCD, the liquid crystal panel itself, which displays the image, is a non-light-emitting element; therefore, a backlight unit is provided on the back of the liquid crystal panel to supply light to it.

[0004] OLED display devices are devices that display images using the self-emissive properties of OLED elements. Therefore, compared to various display devices such as liquid crystal displays and plasma displays, they offer advantages such as high contrast ratio, high color reproduction, wide viewing angle, high-speed response, and thin and lightweight design. In addition to these advantages, they are actively being researched and developed as a next-generation display device, focusing on flexibility.

[0005] Inorganic EL display devices are devices that use the self-emissive properties of inorganic EL elements as fluorescent materials to display images, replacing the OLED elements in OLED display devices. Recent research suggests the potential to achieve display devices that surpass OLED devices in terms of larger screen size and longer lifespan.

[0006] In the development of image display devices, there is a known technique that uses light absorption filters as structural components.

[0007] For example, Patent Document 1 describes a laminate in which at least one side of a wavelength-selective absorption layer containing a dye having a main absorption wavelength band in a specific wavelength region and an anti-fading agent of the dye is directly disposed, consisting of a crystalline resin with a thickness of 0.1 μm to 10 μm and an oxygen permeability of 60 cc / m. 2 The layer is formed by a barrier layer of less than 1 day atm. According to the aforementioned Patent Document 1, when this laminate is used as an external light reflection prevention mechanism for an OLED display device instead of a circular polarizer, it exhibits excellent light resistance and high productivity.

[0008] As another method of assembling a light absorption filter into an image display device, a filter was also studied that combines a light-absorbing region with a light-absorbing region (hereinafter referred to as a "light-absorbing region") by eliminating the light absorption of a desired region. In particular, as a method of assembling a filter in an image display device, the light-absorbing region in the filter is required to have near-colorless light absorption characteristics.

[0009] For example, Patent Document 2 describes a light absorption filter containing a resin, a dye containing a squaraine-based pigment represented by general formula (1) as described in Patent Document 2, and a compound that generates free radicals upon ultraviolet irradiation. According to the light absorption filter described in Patent Document 2, a high decolorization rate is achieved due to ultraviolet irradiation, and almost no absorption originating from the new coloring structure (hereinafter also referred to as "secondary absorption") occurs accompanying the dye decomposition caused by ultraviolet irradiation, thus achieving high decolorization properties.

[0010] Previous technical documents Patent documents Patent Document 1: International Publication No. 2021 / 066082 Patent Document 2: International Publication No. 2021 / 132674 Summary of the Invention

[0011] The technical problem to be solved by the invention The inventors' research revealed that there is room for improvement in the adhesion between the dye-containing layer and adjacent layers in the laminate described in Patent Document 1 and the light absorption filter described in Patent Document 2.

[0012] That is, the objective of this invention is to provide a light absorption filter with excellent sealing performance.

[0013] Furthermore, in one embodiment of the present invention, the objective is to provide a light absorption filter with excellent sealing performance and decolorization properties, a filter using the light absorption filter and a method for manufacturing the same, and an OLED display device, an inorganic electroluminescent display device, and a liquid crystal display device equipped with the filter, wherein the filter has a light-absorbing portion and a light-absorbing portion at a desired location.

[0014] means for solving technical problems Based on in-depth research into the aforementioned issues, the inventors discovered that in a light absorption filter comprising a wavelength-selective absorption layer containing an acid-containing resin A and a dye, and an adjacent layer directly disposed on at least one side of the wavelength-selective absorption layer, the adhesion between the wavelength-selective absorption layer and the adjacent layer can be effectively improved by configuring the structure of the light absorption filter with the adjacent layer containing a resin containing basic groups. This invention was completed based on further repeated research based on this insight.

[0015] That is, the above-mentioned problem was solved in the following way.

[0016] <1> An optical absorption filter comprising: a wavelength-selective absorption layer containing a resin A comprising acid groups and a dye; and an adjacent layer directly disposed on at least one side of the wavelength-selective absorption layer, wherein, The aforementioned adjacent layers contain a resin comprising basic groups.

[0017] <2> According to the optical absorption filter described in <1>, wherein, The wavelength-selective absorption layer described above contains compound B, which forms hydrogen bonds with the acid groups contained in the resin A and generates free radicals upon ultraviolet irradiation.

[0018] <3> According to the light absorption filter described in <2>, the light absorption filter causes the dye to undergo a chemical change and decolorize by irradiation with ultraviolet light.

[0019] <4> A filter is formed by mask exposure of the light absorption filter described in <2> or <3> by ultraviolet irradiation.

[0020] <5> An organic electroluminescent display device, an inorganic electroluminescent display device, or a liquid crystal display device, wherein the filter described in <4> is included.

[0021] <6> The organic electroluminescent display device, inorganic electroluminescent display device or liquid crystal display device according to <5>, wherein, relative to the above-mentioned filter on the visual observer side, there is a layer that blocks the light absorption of the compound B that generates free radicals by ultraviolet irradiation.

[0022] <7> A method for manufacturing a filter, comprising the following steps: The step of irradiating the light absorption filter described in <2> or <3> with ultraviolet light to perform mask exposure.

[0023] In this invention, when multiple substituents or linking groups (hereinafter referred to as substituents, etc.) represented by specific symbols or formulas are present, or when multiple substituents, etc. are specified simultaneously, each substituent, etc., may be identical or different from each other unless otherwise specified. The same applies to the number of substituents, etc. Furthermore, when multiple substituents, etc., are close together (especially adjacent), they may link together to form a ring unless otherwise specified. Moreover, unless otherwise specified, rings such as alicyclic rings, aromatic rings, and heteroatom-containing rings may be further fused to form fused rings.

[0024] In this invention, unless otherwise specified, the components constituting the wavelength-selective absorption layer in the optical absorption filter (resin A containing acid groups, dye) and other components that may be included in the wavelength-selective absorption layer (resins other than resin A, compound B that forms hydrogen bonds with the acid groups contained in resin A and generates free radicals upon ultraviolet irradiation, and other appropriately included components, etc.) may each contain one or more types in the wavelength-selective absorption layer. Furthermore, the components constituting adjacent layers in the optical absorption filter of this invention (resins containing basic groups) and other components that may be included in adjacent layers (other appropriately included components, etc.) may each contain one or more types in the adjacent layers. This also applies to the wavelength-selective absorption layer and adjacent layers in filters made using the optical absorption filter of this invention.

[0025] In the filter of the present invention, the wavelength-selective absorption layer of the optical absorption filter of the present invention has a light absorption vanishing region formed by ultraviolet irradiation. Except for having this light absorption vanishing region, the optical absorption filter of the present invention can preferably be applied in the description of the present invention, unless otherwise specified.

[0026] In this invention, unless otherwise specified, double bonds can be either E-type or Z-type in the presence of E-type or Z-type in the molecule, and can also be a mixture of them.

[0027] In this invention, the pigments (dyes) represented by the various general formulas contain delocalized cations and multiple tautomer structures. Therefore, in this invention, when at least one tautomer structure of a certain pigment is applicable to each general formula, a certain pigment is defined as a pigment represented by each general formula. Thus, a pigment represented by a specific general formula can also be called a pigment capable of having at least one tautomer structure represented by that specific general formula. In this invention, for pigments represented by general formulas, any tautomer structure can be used as long as at least one of its tautomer structures is applicable to that general formula.

[0028] In this invention, the designation of a compound (including complexes) includes not only the compound itself but also its salts and ions. It also refers to a compound obtained by modifying a portion of its structure without impairing the effects of this invention. Furthermore, compounds without specified substitutions or non-substitutions are defined as compounds that may contain any substituents without impairing the effects of this invention. The same applies to substituents and linking groups.

[0029] Furthermore, in this invention, the numerical range represented by “~” refers to the range including the values ​​recorded before and after “~” as the lower limit and upper limit.

[0030] In this invention, a composition refers to a mixture that, in addition to a mixture with a constant concentration of components (in which the components are uniformly dispersed), also includes a mixture in which the concentration of components varies within a range that does not impair the target function.

[0031] In this invention, having a main absorption wavelength band in the wavelength range of XX to YY nm means that the wavelength representing maximum absorption (i.e., the maximum absorption wavelength) exists within the wavelength range of XX to YY nm. Therefore, as long as the maximum absorption wavelength is within the aforementioned wavelength range, the entire absorption band including that wavelength can be within the aforementioned wavelength range or can extend beyond it. Furthermore, when multiple maximum absorption wavelengths exist, it is sufficient that the maximum absorption wavelength representing the maximum absorbance exists within the aforementioned wavelength range. That is, maximum absorption wavelengths other than the maximum absorption wavelength representing the maximum absorbance can exist anywhere within or outside the aforementioned wavelength range of XX to YY nm.

[0032] In this invention, the main absorption wavelength band of the dye refers to the main absorption wavelength band of the dye measured under the condition of an optical absorption filter. Specifically, in the embodiments described later, the measurement is performed under the condition of an optical absorption filter with a substrate, using the conditions described in the section on absorbance of the optical absorption filter.

[0033] In this invention, "(meth)acrylate" means any one or both of acrylate and methacrylate, "(meth)acrylic acid" means any one or both of acrylic acid and methacrylic acid, and "(meth)acryloyl" means any one or both of acryloyl and methacryloyl.

[0034] Invention Effects The optical absorption filter of the present invention exhibits excellent sealing performance.

[0035] Furthermore, the filter of the present invention, obtained by using a light absorption filter that exhibits excellent sealing and decolorization properties as one embodiment of the light absorption filter of the present invention, has a light absorption portion and a light absorption disappearance portion at the desired location.

[0036] The OLED display device, inorganic electroluminescent display device, and liquid crystal display device of the present invention are equipped with the filter of the present invention.

[0037] Furthermore, according to the manufacturing method of the present invention, it is possible to obtain a filter of the present invention having a light-absorbing portion and a light-absorbing portion at a desired location. Attached Figure Description

[0038] Figure 1 This is a schematic diagram illustrating one embodiment of a liquid crystal display device having the filter of the present invention.

[0039] Figure 2 This is a schematic cross-sectional view illustrating one embodiment of the optical absorption filter of the present invention. Detailed Implementation

[0040] [Optical Absorption Filter] The optical absorption filter of the present invention comprises a wavelength-selective absorption layer and an adjacent layer. The wavelength-selective absorption layer contains a resin A containing acid groups and a dye. The adjacent layer is directly disposed on at least one side of the wavelength-selective absorption layer (contact configuration), wherein the adjacent layer contains a resin containing basic groups. The optical absorption filter of the present invention, having this structure, exhibits excellent interlayer adhesion. Although the reason is not yet clear, it is believed that the resin containing basic groups added to the adjacent layer is unevenly distributed near the interface between the wavelength-selective absorption layer and the adjacent layer, and forms hydrogen bonds with the acid groups contained in the resin A contained in the wavelength-selective absorption layer, thus contributing to the excellent adhesion. This effect is demonstrated by the examples described later.

[0041] In the wavelength-selective absorption layer of the optical absorption filter of the present invention, the dye is dispersed (preferably dissolved) in the aforementioned resin A containing acid groups, and the optical absorption filter and the wavelength-selective absorption layer are configured as layers representing a specific absorption spectrum originating from the dye. This dispersion can be random, regular, or any of the following.

[0042] Furthermore, in the case where the optical absorption filter of the present invention contains resins other than the resin A containing acid groups described above, the dye only needs to be dispersed (preferably dissolved) in the resin A containing acid groups and / or the resin other than the resin A containing acid groups described above.

[0043] Furthermore, in the light absorption filter of the present invention, when it is configured to decolorize the dye by ultraviolet light (a structure with decolorizing properties), the light absorption filter of the present invention has the characteristic of being able to decolorize the dye by causing a chemical change through ultraviolet irradiation. Therefore, by performing mask exposure by ultraviolet irradiation, it is possible to obtain the filter of the present invention, which simultaneously has a light-absorbing region with light absorption effect and a light-absorbing region where light absorption disappears.

[0044] As a structure for a light absorption filter that can decolorize dyes using ultraviolet light, for example, as described in Patent Document 2 above, the wavelength-selective absorption layer in the light absorption filter of the present invention contains a compound that generates free radicals by ultraviolet irradiation.

[0045] Preferably, an optical absorption filter (hereinafter also referred to as "optical absorption filter I of the present invention") comprises: a wavelength-selective absorption layer containing a dye, a resin A containing acid groups, and a compound B that forms hydrogen bonds with the acid groups contained in the resin A and generates free radicals upon ultraviolet irradiation; and an adjacent layer disposed on at least one side of the wavelength-selective absorption layer, wherein the adjacent layer contains a resin containing basic groups.

[0046] In the wavelength-selective absorption layer described above, the "compound B that forms hydrogen bonds with the acid groups contained in the resin A and generates free radicals by ultraviolet irradiation" is dispersed (preferably dissolved) in the resin A by forming hydrogen bonds with the acid groups contained in the resin A, and generates free radicals when irradiated with ultraviolet light. The mechanism by which the generated free radicals react with nearby dyes makes it easier for the free radicals to react with the dyes, thereby enabling more effective decolorization and fading of the dyes.

[0047] As described above, the wavelength-selective absorption layer in the optical absorption filter I of the present invention contains a dye, a resin A containing acid groups, and a compound B that forms hydrogen bonds with the acid groups contained in the resin A and generates free radicals upon ultraviolet irradiation. As described above, the optical absorption filter I of the present invention, having this structure of wavelength-selective absorption layer, exhibits excellent sealing properties and, even under ultraviolet irradiation in a mild environment, i.e., room temperature (10°C to 30°C), excellent decolorization properties. While this reason is speculative, it is believed to be as follows.

[0048] It is believed that in the wavelength-selective absorption layer of the light absorption filter I of the present invention, free radicals with strong reducing power are generated by ultraviolet irradiation. Therefore, even under mild temperature conditions such as room temperature, the dye is reduced and decomposed, thereby causing the dye to fade and decolorize. In particular, when the dye contained in the wavelength-selective absorption layer of the light absorption filter I of the present invention contains at least one of an azo dye represented by any one of general formulas (i) to (iv) and an indigoaniline dye represented by general formula (v), even under ultraviolet irradiation at room temperature (10°C to 30°C), which is a mild environment, almost no secondary absorption accompanying dye decomposition occurs, and decolorization is possible.

[0049] Although the rationale is estimated, it is believed that in azo dyes represented by general formula (i), the hydroxyl group on the pyridine ring bonded to the azo group (-N=N-) facilitates the generation of free radical species. Therefore, even under mild temperature conditions such as room temperature and UV irradiation, excellent decolorization rates can be obtained. Azo dyes represented by general formula (i) themselves exhibit almost no secondary absorption associated with dye decomposition, thus demonstrating excellent decolorization properties. Azo dyes represented by any of general formulas (ii) to (iv) have a structure in which one end of the chromophore is replaced by an electron-donating group (amino group) and the other end by an electron-withdrawing group (thiazolyl or isothiazolyl group). Generally, the effect of stabilizing free radicals by substituting both the electron-donating and electron-withdrawing groups relative to the free radical center is called the "captodative effect," as described, for example, in Acc. Chem. Res. Vol. 18 (1985), pp. 148–154. It is believed that azo dyes represented by any one of general formulas (ii) to (iv) also readily generate free radicals through the aforementioned "push-pull effect," thus achieving excellent decolorization rates under ultraviolet irradiation. Furthermore, it is believed that indigoaniline dyes represented by general formula (v) also possess a structure where an electron-donating group (amino group) is substituted at one end of the chromophore, and an electron-withdrawing group (carbonyl group) is substituted at the other end. Through the aforementioned "push-pull effect," excellent decolorization rates can be achieved even under mild temperature conditions such as room temperature under ultraviolet irradiation. Both azo dyes represented by any one of general formulas (ii) to (iv) and indigoaniline dyes represented by general formula (v) exhibit almost no secondary absorption associated with dye decomposition, thus demonstrating excellent decolorization properties.

[0050] On the other hand, among the dyes described in Patent Document 2 that have a main absorption wavelength band in the wavelength range of 400-700 nm, the dyes that have a main absorption wavelength band in the wavelength range of approximately 400-500 nm contain benzylidene or cinnamylene pigments represented by general formula (V) as described in Patent Document 2. However, when the light absorption filter containing this pigment is subjected to ultraviolet irradiation in a mild environment, i.e., room temperature (10-30°C), as described in Comparative Example No. c202 in the reference examples described later, the decolorization rate is as low as 84%, indicating poor decolorization performance at room temperature. The light absorption filter of the present invention, by containing an azo pigment represented by general formula (i) as described later instead of the benzylidene or cinnamylene pigments represented by general formula (V) as described in Patent Document 2, has a main absorption wavelength band in the wavelength range of approximately 400-500 nm, and can also exhibit excellent decolorization performance when subjected to ultraviolet irradiation in a mild environment, i.e., room temperature (10°C-30°C).

[0051] Furthermore, the light absorption filter of the present invention, by containing an azo dye represented by any one of the general formulas (ii) to (iv) or an indigoaniline dye represented by general formula (v), has a main absorption wavelength band in the wavelength region of about 450 to 700 nm, and even under ultraviolet irradiation in a mild environment, i.e., room temperature (10 to 30°C), it can exhibit the same level of excellent decolorization as the light absorption filter containing a squaric acid dye represented by general formula (1) described in Patent Document 2.

[0052] The wavelength-selective absorption layer and adjacent layers in the optical absorption filter of the present invention will be described in sequence.

[0053] [Wavelength-selective absorption layer] The wavelength-selective absorption layer in the optical absorption filter of the present invention contains resin A containing acid groups and dye.

[0054] <Dyes> There are no particular limitations on the dyes contained in the wavelength-selective absorption layer described above. For example, dyes with a main absorption wavelength band in the wavelength range of 400 to 700 nm can be used.

[0055] The dye included in the wavelength-selective absorption layer is preferably at least one of an azo dye represented by any one of the following general formulas (i) to (iv) and an indigoaniline dye represented by the following general formula (v), and more preferably at least one of an azo dye represented by the following general formula (i) and an indigoaniline dye represented by the following general formula (v).

[0056] In addition, the azo dye represented by the general formula (i) described later is a dye having a main absorption wavelength band in the wavelength region of about 400 to 500 nm, the azo dye represented by any one of the general formulas (ii) to (iv) described later is a dye having a main absorption wavelength band in the wavelength region of about 450 to 600 nm, and the indigoaniline dye represented by the general formula (v) described later is a dye having a main absorption wavelength band in the wavelength region of about 580 to 700 nm.

[0057] The wavelength-selective absorption layer may contain one or more of the following pigments: azo pigment represented by general formula (i), azo pigment represented by general formula (ii), azo pigment represented by general formula (iii), azo pigment represented by general formula (iv), and indigoaniline pigment represented by general formula (v).

[0058] The wavelength-selective absorption layer described above can also contain dyes other than those mentioned above.

[0059] (1) Azo pigments represented by the following general formula (i) [Chemical Formula 1] In the above formula, R 17 and R 18 Each can be used to independently represent a hydrogen atom or a monovalent substituent.

[0060] R 19 It represents a hydrogen atom, an aliphatic group, an aryl group, a heteroatom-containing cyclic group, a carbamoyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an acyl group, an alkylsulfonyl group, an arylsulfonyl group, or an aminosulfonyl group.

[0061] Q represents a diazo component residue.

[0062] However, R 17 ~R 19 Q does not have a squaric acid structure.

[0063] The aforementioned squaric acid structure refers to the structure of squaric acid-based pigments. Squaric acid-based pigments are pigments that have a skeleton derived from squaric acid in the central part of a π-conjugated system. For example, the squaric acid-based pigment represented by general formula (1) described in Patent Document 2 can be cited.

[0064] As can be used as R 17 and R 18Examples of monovalent substituents include halogen atoms, aliphatic groups, aryl groups, heteroatom-containing cyclic groups, cyano groups, carboxyl groups, carbamoyl groups, aliphatic oxygen carbonyl groups, aryloxy carbonyl groups, acyl groups, hydroxyl groups, aliphatic oxygen groups, aryloxy groups, acyloxy groups, carbamoyloxy groups, heteroatom-containing epoxy groups, amino groups (-NH2), aliphatic amino groups, arylamino groups, heteroatom-containing cyclic amino groups, acylamino groups, carbamoylamino groups, aminosulfonylamino groups, aliphatic oxygen carbonylamino groups, aryloxy carbonylamino groups, aliphatic sulfonylamino groups, arylsulfonylamino groups, nitro groups, aliphatic thio groups, arylthio groups, aliphatic sulfonyl groups, arylsulfonyl groups, aminosulfonyl groups, sulfonyl groups, imide groups, and heteroatom-containing cyclic thio groups. Among these, from the viewpoint of primarily imparting solubility, aliphatic groups, aryl groups, heteroatom-containing cyclic groups, cyano groups, carbamoyl groups, aliphatic oxygen carbonyl groups, aryloxy carbonyl groups, acyl groups, aliphatic oxygen groups, aryloxy groups, aliphatic amino groups, or arylamino groups are preferred.

[0065] These can be used as R 17 and R 18 The substituents can be further replaced.

[0066] Can be used as R 17 ~R 19 The aliphatic group may further have monovalent substituents, which may be saturated, unsaturated, or cyclic. Specifically, examples include alkyl, substituted alkyl, alkenyl, substituted alkenyl, alkynyl, substituted alkynyl, aralkyl, and substituted aralkyl groups. The total number of carbon atoms in the aliphatic group is preferably 1 to 30, more preferably 1 to 16. Specific examples of aliphatic groups include methyl, ethyl, butyl, isopropyl, tert-butyl, hydroxyethyl, methoxyethyl, cyanoethyl, trifluoromethyl, 3-sulfopropyl, 4-sulfobutyl, 2-(2-hydroxyethoxy)ethyl, 2-(2-(acetoxy)ethoxy)ethyl, cyclohexyl, benzyl, 2-phenylethyl, vinyl, and allyl groups.

[0067] Furthermore, as a substituent that can have a 1 valence, examples of substituents that can be used as R can be given. 17 and R 18 The same applies to the following description regarding the possible monovalent substituents. Examples of possible monovalent substituents include alkoxy, acyloxy, and hydroxyl groups. Furthermore, these substituents may further have substituents, for example, alkoxy, acyloxy, and hydroxyl groups are preferably included.

[0068] Can be used as R 17 ~R 19The aryl group may further have a monovalent substituent, preferably an aryl group with a total carbon number of 6 to 30, more preferably an aryl group with a total carbon number of 6 to 16. Specifically, examples include phenyl, 4-tolyl, 4-methoxyphenyl, 2-chlorophenyl, 3-(3-sulfopropylamino)phenyl, 4-aminosulfonylphenyl, 4-(ethoxyethylaminosulfonyl)phenyl, and 3-(dimethylcarbamoyl)phenyl.

[0069] As can be used as R 17 ~R 19 The heteroatom-containing cyclic group can be a saturated or unsaturated aliphatic cyclic group or an aromatic cyclic group, preferably an aromatic heteroatom-containing cyclic group. Examples of ring-forming atoms constituting the heteroatom-containing cyclic group include ring-forming atoms containing at least one of heteroatoms such as nitrogen, sulfur, and oxygen atoms, and may further have monovalent substituents. Preferably, the heteroatom-containing cyclic group has a total carbon number of 1 to 30, more preferably 1 to 15. Specifically, examples include 2-pyridyl, 2-thienyl, 2-thiazolyl, 2-benzothiazolyl, 2-benzoxazolyl, and 2-furanyl.

[0070] As can be used as R 17 ~R 19 The carbamoyl group, in addition to the unsubstituted carbamoyl group (-CONH2), also includes carbamoyl groups substituted by aliphatic groups, aryl groups, etc.

[0071] Can be used as R 17 ~R 19 The carbamoyl group may further have a monovalent substituent, preferably a carbamoyl group with 1 to 30 total carbon atoms, more preferably a carbamoyl group with 1 to 16 total carbon atoms. Specifically, examples include methylcarbamoyl, dimethylcarbamoyl, phenylcarbamoyl, and N-methyl-N-phenylcarbamoyl.

[0072] As can be used as R 17 and R 18 The aliphatic group in the aliphatic oxygen carbonyl group can be used as R 17 ~R 19 The record of aliphatic groups.

[0073] Can be used as R 17 and R 18 The aliphatic oxygen carbonyl group may further have monovalent substituents, which may be saturated, unsaturated, or cyclic, and are preferably aliphatic oxygen carbonyl groups with a total carbon number of 2 to 30, more preferably aliphatic oxygen carbonyl groups with a total carbon number of 2 to 16. Specifically, examples include methoxycarbonyl, ethoxycarbonyl, and 2-methoxyethoxycarbonyl.

[0074] Can be used as R 19 The alkoxycarbonyl group may further have a monovalent substituent, which may be saturated, unsaturated, or cyclic, and is preferably an alkoxycarbonyl group with a total carbon number of 2 to 30, more preferably an alkoxycarbonyl group with a total carbon number of 2 to 16. Specifically, examples include methoxycarbonyl, ethoxycarbonyl, and 2-methoxyethoxycarbonyl.

[0075] Can be used as R 17 ~R 19 The aryloxycarbonyl group may further have a monovalent substituent, preferably an aryloxycarbonyl group with a total carbon number of 7 to 30, more preferably an aryloxycarbonyl group with a total carbon number of 7 to 16. Specifically, examples include phenoxycarbonyl, 4-methylphenoxycarbonyl, and 3-chlorophenoxycarbonyl.

[0076] In which it can be used as R 17 ~R 19 The acyl group includes an aliphatic carbonyl group, an aryl carbonyl group, and a heteroatom-containing cyclic carbonyl group, preferably with a total carbon number of 1 to 30, more preferably with a total carbon number of 1 to 16. Specifically, examples include acetyl, methoxyacetyl, thienoyl, and benzoyl groups.

[0077] As can be used as R 17 and R 18 The aliphatic group in the aliphatic sulfonyl group can be used as R 17 ~R 19 The record of aliphatic groups.

[0078] Can be used as R 17 and R 18 The aliphatic sulfonyl group may further have a monovalent substituent, which may be saturated, unsaturated, or cyclic, preferably with a total carbon number of 1 to 30, more preferably with a total carbon number of 1 to 16. Specifically, examples include methanesulfonyl, methoxymethanesulfonyl, and ethoxyethanesulfonyl.

[0079] Can be used as R 19 The alkyl sulfonyl group may further have a monovalent substituent, which may be saturated, unsaturated, or cyclic, preferably with a total carbon number of 1 to 30, more preferably with a total carbon number of 1 to 16. Specifically, examples include methanesulfonyl, methoxymethanesulfonyl, and ethoxyethanesulfonyl.

[0080] Can be used as R 17 ~R 19The arylsulfonyl group may further have a monovalent substituent, preferably with a total carbon number of 6 to 30, more preferably with a total carbon number of 6 to 18. Specifically, examples include benzenesulfonyl and toluenesulfonyl groups.

[0081] As can be used as R 17 ~R 19 The aminosulfonyl group, in addition to the unsubstituted aminosulfonyl group (-SO2NH2), also includes aminosulfonyl groups substituted by aliphatic groups, aryl groups, etc.

[0082] Can be used as R 17 ~R 19 The aminosulfonyl group may further have a monovalent substituent, preferably in a manner with a total carbon number of 0 to 30, more preferably in a manner with a total carbon number of 0 to 16. Specifically, examples include unsubstituted aminosulfonyl groups, dimethylaminosulfonyl groups, and di-(2-hydroxyethyl)aminosulfonyl groups.

[0083] Can be used as R 17 and R 18 The imide group may further have a monovalent substituent, preferably a 5- to 6-membered ring imide group. Furthermore, it is preferable that the total number of carbon atoms in the imide group is 4 to 30, more preferably 4 to 20. Specifically, examples include succinimide and phthalimide groups.

[0084] As can be used as R 17 and R 18 The aliphatic groups in aliphatic oxygen, aliphatic amino, aliphatic oxycarbonyl amino, aliphatic sulfonyl amino, and aliphatic thio groups can be used as R 17 ~R 19 The record of aliphatic groups.

[0085] As can be used as R 17 and R 18 The aryl groups in aryloxy, arylamino, aryloxycarbonylamino, arylsulfonylamino, and arylthioyl groups can be used as R 17 ~R 19 Records of aryl compounds.

[0086] As can be used as R 17 and R 18 The acyl group in the acyloxy and acylamino groups can be used as R 17 ~R 19 The record of the acyl group.

[0087] As can be used as R 17 and R 18 The carbamoyl group in carbamoyloxy and carbamoylamino can be used as R 17 ~R19 The record of the carbamoyl group.

[0088] As can be used as R 17 and R 18 The heteroatom-containing cyclic groups in heteroatom-containing epoxy groups, heteroatom-containing cyclic amino groups, and heteroatom-containing cyclic thio groups can be used as R 17 ~R 19 The record of heteroatom-containing cyclic groups.

[0089] As can be used as R 17 and R 18 The aminosulfonyl group in the aminosulfonyl amino group can be used as R 17 ~R 19 The record of aminosulfonyl group.

[0090] The diazo component residue represented by Q refers to the residue "Q" in the diazo component "Q-NH2". The diazo ion "QN" is obtained by using the diazo component "Q-NH2". + The diazo coupling reaction of ≡N” can yield azo pigments represented by the above general formula (i). In particular, from the viewpoint of the color reproducibility of the target, Q is preferably an aryl or aromatic heteroatom-containing cyclic group.

[0091] The aromatic hydrocarbon ring constituting the aryl group that can be used as Q can be a monocyclic or a fused ring, preferably a monocyclic ring. Aryl groups with a total carbon number of 6 to 30 are preferred, more preferably 6 to 16. Specifically, phenyl is preferred. The aryl group that can be used as Q can have substituents; preferred substituents include aminosulfonyl (preferably alkylaminosulfonyl or dialkylaminosulfonyl), sulfonyl (preferably alkylsulfonyl), and cyano.

[0092] The aromatic heteroatom-containing cyclic group that can be used as Q is preferably an aromatic cyclic group that includes at least one of the heteroatoms such as nitrogen, sulfur, and oxygen as the ring constituent atom of the heteroatom-containing cyclic group, and is composed of 5- to 6-membered rings. The total number of carbon atoms in the aromatic heteroatom-containing cyclic group is preferably 1 to 25, more preferably 1 to 15. The aromatic heteroatom-containing ring constituting the aromatic heteroatom-containing cyclic group can be a monocyclic ring or a fused ring, and is preferably a monocyclic ring.

[0093] As aromatic heteroatom-containing cyclic groups, examples include pyrazolyl, 1,2,4-triazolyl, isothiazolyl, benzoisothiazolyl, thiazolyl, benzothiazolyl, oxazolyl, and 1,2,4-thiadiazolyl.

[0094] Examples of azo dyes represented by the above general formula (i) include the following exemplary compounds (B-12) to (B-16), (B-18), and (B-19). However, the present invention is not limited to these.

[0095] [Chemical Formula 2] (2) Azo pigments represented by the following general formula (ii) [Chemical Formula 3] In the above formula, R 21 ~R 24 R 26 and R 27 Represents hydrogen atom, halogen atom, cyano group, nitro group, carboxyl group, sulfonyl group, -OR 108 -SR 109 -NR 110 R 111 -S(=O)2NR 112 R 113 -C(=O)NR 114 R 115 -NHC(=O)R 116 -C (=O) OR 117 -O (CH2CH2O) n R 118 -O(CH2CH2S) n R 119 -S(CH2CH2O) n R 120 -S (CH2CH2S) n R 121 Acyclic hydrocarbon groups, monocyclic hydrocarbon groups, fused polycyclic hydrocarbon groups, or heterocyclic groups.

[0096] R 108 ~R 121 This represents a hydrogen atom, an acyclic hydrocarbon group, a monocyclic hydrocarbon group, a fused polycyclic hydrocarbon group, or a heterocyclic group. n is a positive integer.

[0097] In addition, acyclic hydrocarbon groups, monocyclic hydrocarbon groups, fused polycyclic hydrocarbon groups, and heterocyclic groups can have halogen atoms, cyano groups, nitro groups, carboxyl groups, sulfonyl groups, and -OR groups. 108 -SR 109 -NR 110 R 111 -S(=O)2NR 112 R 113 -C(=O)NR 114 R 115 -NHC(=O)R 116 -C (=O) OR 117 -O (CH2CH2O) n R 118 -O(CH2CH2S) n R119 -S(CH2CH2O) n R 120 -S (CH2CH2S) n R 121 One or more of the following can be used as substituents: acyclic hydrocarbon groups, monocyclic hydrocarbon groups, fused polycyclic hydrocarbon groups, and heterocyclic groups.

[0098] Can be used as R 21 ~R 24 R 26 R 27 and R 108 ~R 121 Acyclic hydrocarbon groups refer to acyclic alkyl groups obtained by removing one hydrogen atom from an acyclic alkane. However, acyclic alkyl groups can have a cyclic structure as a substituent. The number of carbon atoms in the acyclic alkyl group is preferably 1 to 30, more preferably 1 to 20, even more preferably 1 to 12, particularly preferably 1 to 8, and most preferably 1 to 6.

[0099] Can be used as R 21 ~R 24 R 26 R 27 and R 108 ~R 121 A monocyclic hydrocarbon group refers to a group obtained by removing one hydrogen atom from a monocyclic aliphatic hydrocarbon ring (which can be any of monocyclic cycloalkanes, monocyclic cycloolefins, and monocyclic cycloalkynes) or a monocyclic aromatic hydrocarbon ring; that is, a monocyclic cycloalkyl, monocyclic cycloalkenyl, monocyclic cycloalkynyl, or monocyclic aryl group.

[0100] Regarding the number of carbon atoms in monocyclic cycloalkyl, monocyclic cycloalkenyl, and monocyclic cycloynyl groups, the structure is not particularly limited as much as possible, but 3 to 30 is more preferred, 3 to 20 is more preferred, and 3 to 16 is even more preferred. The number of carbon atoms in monocyclic aryl groups is more preferred to be 6 to 30, more preferred to be 6 to 20, and even more preferred to be 6 to 16.

[0101] Can be used as R 21 ~R 24 R 26 R 27 and R 108 ~R 121 A fused polycyclic hydrocarbon group refers to a group obtained by removing one hydrogen atom from a fused polycyclic aliphatic hydrocarbon ring (which can be any of a fused polycyclic cycloalkanes, fused polycyclic cycloolefins, and fused polycyclic cycloalkynes) or a fused polycyclic aromatic hydrocarbon ring; that is, a fused polycyclic cycloalkyl, a fused polycyclic cycloalkenyl, a fused polycyclic cycloalkynyl, or a fused polycyclic aryl.

[0102] Regarding the number of carbon atoms in fused polycyclic cycloalkyl, fused polycyclic cycloalkenyl, and fused polycyclic cycloynyl groups, the structure is not particularly limited as much as possible, but 8 to 30 is more preferred, and 8 to 20 is even more preferred. The number of carbon atoms in fused polycyclic aryl groups is more preferred to be 12 to 30, and more preferred to be 12 to 20.

[0103] As can be used as R 21 ~R 24 R 26 R 27 and R 108 ~R 121 The heterocyclic group can be used as R in the above general formula (i). 17 ~R 19 The record of heteroatom-containing cyclic groups.

[0104] n is preferably an integer from 1 to 12, more preferably an integer from 1 to 6, and even more preferably an integer from 1 to 3.

[0105] Regarding the specific substituents in general formula (ii), unless otherwise specified, the groups described in Japanese Patent Application Publication No. 5-257180 and the R groups of compounds represented by general formula [1] can be compared. 1 ~R 4 R 6 R 7 R 8 ~R 21 The relevant records were directly applied to R. 21 ~R 24 R 26 R 27 R 108 ~R 121 .

[0106] R 21 Preferred groups: cyano, nitro, -OR 108 Acyclic hydrocarbon group (preferably acyclic alkyl or acyclic alkenyl) or heterocyclic group, more preferably cyano or nitro, or acyclic alkyl group substituted with halogen atoms (preferably alkyl group substituted with fluorine atoms), and even more preferably cyano.

[0107] R 22 The preferred radicals are hydrogen atom, cyano group, non-cyclic hydrocarbon group (preferably non-cyclic alkyl) or monocyclic hydrocarbon group, more preferably hydrogen atom, alkyl or aryl, and even more preferably alkyl or aryl.

[0108] Additionally, R 21 and R 22 At least one of them is preferably a cyano or nitro group, or an acyclic alkyl group substituted with a halogen atom, cyano or nitro group.

[0109] R 23 Preferred hydrogen atoms, -OR108 -SR 109 -NR 110 R 111 -C(=O)NR 114 R 115 -NHC(=O)R 116 -O (CH2CH2O) n R 118 -O(CH2CH2S) n R 119 -S(CH2CH2O) n R 120 -S (CH2CH2S) n R 121 Or a noncyclic hydrocarbon group (preferably a noncyclic alkyl group), more preferably a hydrogen atom, -OR 108 -SR 109 -NR 110 R 111 -NHC(=O)R 116 Or acyclic alkyl, more preferably -NHC(=O)R 116 Among them, R 108 ~R 111 R 114 ~R 116 R 118 ~R 121 Acyclic alkyl groups are preferred.

[0110] R 24 and R 27 Hydrogen atoms are preferred.

[0111] R 26 Preferred hydrogen atoms, -OR 108 -SR 109 -NR 110 R 111 -NHC(=O)R 116 -O (CH2CH2O) n R 118 -O(CH2CH2S) n R 119 -S(CH2CH2O) n R 120 -S (CH2CH2S) n R 121 Or a noncyclic hydrocarbon group (preferably a noncyclic alkyl group), more preferably a hydrogen atom, -OR 108 or -SR 109 Further optimization of hydrogen atoms, including R. 108 ~R 111 R 116 R 118 ~R121 Acyclic alkyl groups are preferred.

[0112] In relation to R 24 and R 26 -NR located in the adjacent position 110 R 111 In the middle, R 110 Preferred acyclic alkyl group, R 111 Preferably acyclic alkyl, more preferably unsubstituted acyclic alkyl, or having -OR 108 Acyclic alkyl groups with monocyclic or fused polycyclic hydrocarbon groups as substituents. Among them, R... 108 Hydrogen atoms or acyclic alkyl groups are preferred.

[0113] As specific examples of pigments represented by general formula (ii), in addition to the compounds used in one of the examples described below, examples may include the compounds described in paragraphs

[0023] to

[0034] of Japanese Patent Application Publication No. 5-257180, the compounds described in paragraphs

[0050] and

[0052] , compound D-18 described in paragraph

[0055] , and the compounds described in paragraph

[0056] of Japanese Patent Application Publication No. 2013-129712. However, the present invention is not limited to these.

[0114] (3) Azo pigments represented by the following general formula (iii) [Chemical Formula 4] In the above formula, R 31 It represents a hydrogen atom, alkyl group, alkoxy group, cyano group, carbonyl group (preferably alkoxycarbonyl or aryloxycarbonyl), aromatic group or heterocyclic group.

[0115] R 32 It represents a hydrogen atom, alkyl group, alkoxy group, cyano group, nitro group, carbonyl group (preferably alkoxycarbonyl or aryloxycarbonyl), aromatic group or heterocyclic group.

[0116] R 34 and R 35 Each can be represented independently as a hydrogen atom, alkyl group, or aromatic group.

[0117] R 37 It represents a hydrogen atom, alkyl group, alkoxy group, cyano group, carbonyl group (preferably alkoxycarbonyl or aryloxycarbonyl), amide group, or aromatic group.

[0118] R 34 With R 35 They can bond together to form a ring.

[0119] Regarding the definitions and preferred ranges of each substituent in general formula (iii), unless otherwise specified, the information described in Japanese Patent Application Publication No. 2013-129712 and the information regarding R in general formula (1) can be compared. 1 and R 2 The relevant records were directly applied to R. 31 and R 32 The R mentioned in Japanese Patent Application Publication No. 2013-129712 and the general formula (3) 4 R 5 and R 7 The relevant records were directly applied to R. 34 R 35 and R 37 .

[0120] Furthermore, in this invention, regarding R... 37 Except for R related to general formula (3) as recorded in Japanese Patent Application Publication No. 2013-129712 7 In addition to hydrogen atoms, alkyl groups, alkoxy groups, cyano groups, carbonyl groups, and aromatic groups, the following amide groups may also be used.

[0121] Can be used as R 37 The number of carbon atoms in the amide group is preferably 1 to 12, more preferably 1 to 6.

[0122] In this invention, it can be used as R 31 R 32 and R 37 The alkyl group has a more preferred number of carbon atoms of 1 to 20, a further preferred number of 1 to 12, and especially a preferred number of 1 to 6.

[0123] Can be used as R 31 R 32 and R 37 The number of carbon atoms in the alkoxy group is more preferably 1 to 20, further preferably 1 to 12, and especially preferably 1 to 6.

[0124] Can be used as R 31 R 32 and R 37 The number of carbon atoms in the alkoxycarbonyl group is preferably 2 to 30, more preferably 2 to 20, even more preferably 2 to 12, and especially preferably 2 to 7.

[0125] Can be used as R 34 and R 35 The alkyl group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, and even more preferably 1 to 12.

[0126] R 31 Alkyl or aryl is preferred, with alkyl being more preferred.

[0127] R 32Alkyl or cyano groups are preferred, with cyano groups being more preferred.

[0128] R 34 and R 35 Hydrogen atoms or alkyl groups are preferred, with alkyl groups being more preferred.

[0129] R 37 Preferred groups include hydrogen atoms, alkyl groups, amide groups, or aromatic groups, more preferably hydrogen atoms or alkyl groups, and even more preferably alkyl groups.

[0130] Specific examples of pigments represented by general formula (iii) include the compounds described below. However, the present invention is not limited to these.

[0131] [Chemical Formula 5] [Chemical Formula 6] [Chemical Formula 7] (4) Azo pigments represented by the following general formula (iv) [Chemical Formula 8] In the above formula, R 41 ~R 44 R 46 and R 47 Represents hydrogen atom, halogen atom, cyano group, nitro group, carboxyl group, sulfonyl group, -OR 208 -SR 209 -NR 210 R 211 -S(=O)2NR 212 R 213 -C(=O)NR 214 R 215 -NHC(=O)R 216 -C (=O) OR 217 -O (CH2CH2O) n R 218 -O(CH2CH2S) n R 219 -S(CH2CH2O) n R 220 -S (CH2CH2S) n R 221 Acyclic hydrocarbon groups, monocyclic hydrocarbon groups, fused polycyclic hydrocarbon groups, or heterocyclic groups.

[0132] R 208 ~R 221This represents a hydrogen atom, an acyclic hydrocarbon group, a monocyclic hydrocarbon group, a fused polycyclic hydrocarbon group, or a heterocyclic group. n is a positive integer.

[0133] In addition, acyclic hydrocarbon groups, monocyclic hydrocarbon groups, fused polycyclic hydrocarbon groups, and heterocyclic groups can have halogen atoms, cyano groups, nitro groups, carboxyl groups, sulfonyl groups, and -OR groups. 208 -SR 209 -NR 210 R 211 -S(=O)2NR 212 R 213 -C(=O)NR 214 R 215 -NHC(=O)R 216 -C (=O) OR 217 -O (CH2CH2O) n R 218 -O(CH2CH2S) n R 219 -S(CH2CH2O) n R 220 -S (CH2CH2S) n R 221 One or more of the following can be used as substituents: acyclic hydrocarbon groups, monocyclic hydrocarbon groups, fused polycyclic hydrocarbon groups, and heterocyclic groups.

[0134] Regarding R in general formula (iv) 41 ~R 44 R 46 R 47 R 208 ~R 221 Unless otherwise specified, R in the above general formula (ii) can be directly applied to n. 21 ~R 24 R 26 R 27 R 108 ~R 121 And the record of n.

[0135] R 43 Preferred hydrogen atoms, -OR 208 -SR 209 -NR 210 R 211 -NHC(=O)R 216 -O (CH2CH2O) n R 218 -O(CH2CH2S) n R 219 -S(CH2CH2O) n R 220 -S (CH2CH2S)n R 221 Or a noncyclic hydrocarbon group (preferably a noncyclic alkyl group), more preferably a hydrogen atom, -OR 208 -SR 209 -NR 210 R 211 -NHC(=O)R 216 Or acyclic alkyl, more preferably -NHC(=O)R 216 Or acyclic alkyl. Wherein, R 208 ~R 211 R 216 R 218 ~R 221 Acyclic alkyl groups are preferred.

[0136] In relation to R 44 and R 46 -NR located in the adjacent position 210 R 211 In the middle, R 210 Preferred acyclic alkyl group, R 211 Preferably acyclic alkyl, more preferably unsubstituted acyclic alkyl (including acyclic alkyl substituted with acyclic alkyl) or having -OR 208 Acyclic alkyl groups with monocyclic or fused polycyclic hydrocarbon groups as substituents. Among them, R... 208 Hydrogen atoms or acyclic alkyl groups are preferred.

[0137] Additionally, R in general formula (iv) 44 and / or R 46 It can be related to R on the benzene ring 44 and R 46 -NR located in the adjacent position 210 R 211 R in 210 and / or R 211 The rings are bonded together to form a ring. The rings that can be formed are preferably 5-membered or 6-membered rings, and can be saturated or unsaturated, but are preferably saturated 6-membered rings. The rings that can be formed may further have substituents, for example, preferably alkyl groups.

[0138] Among them, R is preferred as the morphology for forming the ring. 46 With respect to R on the benzene ring 44 and R 46 -NR located in the adjacent position 210 R 211 R in 211 They bond together to form a saturated 6-membered ring.

[0139] As specific examples of pigments represented by general formula (iv), in addition to the compounds used in one of the examples described later, compounds described in paragraph

[0053] of Japanese Patent Application Publication No. 2013-129712 may also be cited. However, the present invention is not limited to these.

[0140] (5) Indigoaniline pigments represented by the following general formula (v) [Chemical Formula 9] In the above formula, Q 1 It represents the set of atoms required to form a 5- to 7-membered nitrogen-containing heterocycle together with at least one nitrogen atom and bonded to a carbon atom.

[0141] R 51 R represents acyl, alkoxycarbonyl, aryloxycarbonyl, aminocarbonyl (carbamoyl), or sulfonyl. 52 R represents a hydrogen atom or an alkyl group. 53 ~R 57 R represents a hydrogen atom, alkyl group, alkoxy group, amide group, alkylsulfonamide group, or halogen atom. 58 and R 59 It represents a hydrogen atom, alkyl group, or aryl group.

[0142] R 51 With R 53 R 54 With R 55 and / or R 55 With R 59 Or R 58 With R 59 They can bond together to form a ring. That is, it refers to R. 51 With R 53 They can bond together to form a ring, R 54 With R 55 and / or R 55 With R 59 They can bond together to form a ring, or R 58 With R 59 They can bond together to form a ring.

[0143] Regarding the definitions and preferred ranges of each substituent in general formula (v), unless otherwise specified, the information described in Japanese Patent Application Publication No. 2-92686 and the information regarding R in general formula (I) can be considered consistent. 1 ~R 6 R 8 R 9 and Q 1 The relevant records were directly applied to R. 51 ~R 56 R 58 R59 and Q 1 .

[0144] Furthermore, in this invention, regarding R... 53 ~R 56 Except for R related to general formula (I) as recorded in Japanese Patent Application Publication No. 2-92686 3 ~R 6 In addition to hydrogen atoms, alkyl groups, alkoxy groups, and halogen atoms, the following amide groups and alkylsulfonamide groups may also be used.

[0145] Can be used as R 53 ~R 57 The number of carbon atoms in the amide group is preferably 1 to 12, more preferably 1 to 6.

[0146] Can be used as R 53 ~R 57 The number of carbon atoms in the alkylsulfonamide is preferably 1 to 12, more preferably 1 to 6.

[0147] Regarding what can be used as R 57 The alkyl, alkoxy, and halogen atoms can be directly used as R 53 ~R 56 The description of alkyl, alkoxy and halogen atoms.

[0148] Q 1 Preferred to be -NR 16 C(=O)-Q 2 - indicates. Q 2 Indicates -NR 16 C(=O)-Q 2 -The bonded carbon atoms and -NR 16 C(=O)- can be used to form a 5- to 7-membered nitrogen-containing heterocycle. Examples of such groups include divalent amino groups, ether bonds, thioether bonds, alkylene bonds, vinyl bonds, imino bonds, sulfonyl bonds, carbonyl bonds, arylene bonds, or divalent heteroatom-containing cyclic groups, or groups composed of multiple of these. R 16 Represents a hydrogen atom, alkyl, aryl, or heterocyclic group, preferably a hydrogen atom. Regarding R... 16 The definitions and preferred ranges of each substituent can also be directly applied to the R values ​​described in Japanese Patent Application Publication No. 2-92686 and those relating to general formula (I). 16 Relevant records.

[0149] R 51 Preferably, the acyl group or the alkoxy carbonyl group has 2 to 7 carbon atoms.

[0150] R 52 Preferably, hydrogen atoms, R 53 ~R 56Hydrogen atoms are preferred.

[0151] R 57 Preferably, it is alkoxy, amide, or alkylsulfonamide, more preferably alkoxy or amide.

[0152] R 58 and R 59 Preferably, it is an alkyl group having 1 to 6 carbon atoms.

[0153] The indigo aniline pigment represented by the above general formula (v) is preferably represented by the following general formula (va).

[0154] [Chemical Formula 10] In the above formula, R 51 R 53 R 57 ~R 59 and Q 2 R in the above general formula (v) 51 R 53 R 57 ~R 59 and Q 2 They have the same meaning.

[0155] Q 2 Preferred -CR 11 R 12 CR 13 R 14 -、-CR 11 R 12 -or-NR 11 -, more preferably -CR 11 R 12 CR 13 R 14 -

[0156] R 11 ~R 14 R represents an alkyl group having 1 to 4 hydrogen atoms or carbon atoms. 11 and R 12 It is a hydrogen atom and R 13 and R 14 It is an alkyl group having 1 to 4 carbon atoms.

[0157] Additionally -CR 11 R 12 CR 13 R 14 -Preferred in R 11 and R 12 The bonded carbon atom is bonded to the >C=O side.

[0158] As specific examples of pigments represented by general formula (v), in addition to the compounds used in one of the examples described later, compounds No. 1 to 51 disclosed on pages 5 to 6 of Japanese Patent Application Publication No. 2-92686 can also be cited. However, the present invention is not limited to these.

[0159] The total content of the dyes in the wavelength-selective absorption layer is preferably 0.10% by mass or more, more preferably 0.15% by mass or more, even more preferably 0.20% by mass or more, particularly preferably 0.25% by mass or more, and especially preferably 0.30% by mass or more. If the total content of the dyes in the wavelength-selective absorption layer is at or above the lower limit of the above-mentioned preferred values, a good anti-reflective effect can be obtained.

[0160] Furthermore, the total content of the dyes in the wavelength-selective absorption layer is generally 50% by mass or less, preferably 40% by mass or less, more preferably 30% by mass or less, even more preferably 15% by mass or less, and especially preferably 10% by mass or less.

[0161] That is, the total content of the dye in the wavelength selective absorption layer is preferably 0.10 to 50% by mass, more preferably 0.15 to 40% by mass, even more preferably 0.20 to 30% by mass, especially preferably 0.25 to 15% by mass, and even more preferably 0.30 to 10% by mass.

[0162] The content of the azo pigment represented by the above general formula (i) in the wavelength selective absorption layer is preferably 0.01 to 30% by mass, more preferably 0.1 to 10% by mass. The content of each pigment in the wavelength selective absorption layer—the azo pigment represented by the above general formula (ii), the azo pigment represented by the above general formula (iii), the azo pigment represented by the above general formula (iv), and the indoaniline pigment represented by the above general formula (v)—is also preferably 0.01 to 30% by mass, more preferably 0.1 to 10% by mass, similar to the content of the azo pigment represented by the above general formula (i). Furthermore, in the wavelength selective absorption layer, all of the dyes may be composed of at least one of the azo pigments represented by any one of the above general formulas (i) to (iv) and the indoaniline pigment represented by the above general formula (v).

[0163] <Resin> In the optical absorption filter of the present invention, the resin (hereinafter also referred to as "matrix resin") contained in the wavelength selective absorption layer is not particularly limited as long as it can disperse (preferably dissolve) the dye and has the desired light transmittance (preferably 80% or more in the visible region of wavelengths from 400 to 800 nm).

[0164] Furthermore, in the optical absorption filter of the present invention, the resin contained in the wavelength selective absorption layer may be resin A containing acid groups, which will be described later. In addition to resin A containing acid groups, other resins may also be contained.

[0165] In the light absorption filter I of the present invention, apart from the above, the resin contained in the wavelength selective absorption layer is not particularly limited as long as it can exhibit the decolorization effect of the dye caused by the free radical generated by compound B, which forms hydrogen bonds with the acid group contained in resin A and generates free radicals by ultraviolet irradiation.

[0166] Various polymers can be used as the polymers constituting the aforementioned resins. From the viewpoint of minimizing the decrease in molecular weight of the resin due to ultraviolet irradiation, polymers having aromatic rings or alicyclic structures in their side chains are preferred, and (meth)acrylic acid polymers containing structural units having aromatic rings or alicyclic structures are more preferred. From the viewpoint of further improving the decolorization rate, and further improving heat resistance and light resistance, (meth)acrylic acid polymers containing structural units having alicyclic structures are even more preferred.

[0167] Wherein, (meth)acrylic acid polymer refers to a polymer containing at least one of structural units derived from (meth)acrylic acid and structural units derived from (meth)acrylic acid esters. In addition, when the polymer contains structural units derived from (meth)acrylic acid, the structural units derived from (meth)acrylic acid become structural units with carboxyl groups in the acid groups contained in resin A described later, which are equivalent to the carboxyl-containing polymer constituting resin A described later.

[0168] Furthermore, in this invention, "main chain" refers to the longest connecting chain in the molecule of a polymer compound, and "side chain" refers to a group of atoms that branch off from the main chain.

[0169] Examples of monomers that guide the aromatic ring-containing structural units include benzyl acrylate, benzyl methacrylate, naphthyl acrylate, naphthyl methacrylate, naphthyl methyl acrylate, and naphthyl methyl methacrylate. The content of the aromatic ring-containing structural units relative to the total mass of the polymer is preferably 5 to 100% by mass, more preferably 10 to 100% by mass, and even more preferably 20 to 100% by mass.

[0170] Examples of monomers that guide structural units with alicyclic structures include dicyclopentyl methacrylate, cyclohexyl methacrylate, and isobornyl methacrylate.

[0171] When the polymer contains structural units with alicyclic structures, the content of structural units with alicyclic structures is preferably 1 to 90% by mass relative to the total mass of the polymer, more preferably 5 to 90% by mass, and even more preferably 5 to 80% by mass.

[0172] From the viewpoint of regulating the glass transition temperature, the polymer constituting the above-mentioned resin may contain alkyl structural units having 1 to 14 carbon atoms. Examples of alkyl structural units having 1 to 14 carbon atoms include structural units derived from alkyl methacrylates such as methyl methacrylate, ethyl methacrylate, n-propyl methacrylate, isopropyl methacrylate, n-butyl methacrylate, tert-butyl methacrylate, sec-butyl methacrylate, amyl methacrylate, 2-ethylhexyl methacrylate, 2-ethylbutyl methacrylate, n-octyl methacrylate, isooctyl methacrylate, isononyl methacrylate, lauryl methacrylate, and tetradecyl methacrylate. In this invention, alkyl structural units having 1 to 14 carbon atoms may be used alone, or two or more may be used in combination. The content of alkyl structural units having 1 to 14 carbon atoms is preferably 0 to 95% by mass relative to the total mass of the polymer constituting the resin.

[0173] The weight-average molecular weight (Mw) of the polymer constituting the above-mentioned resin is preferably 10,000 or more, more preferably 10,000 to 200,000, and even more preferably 15,000 to 150,000.

[0174] Furthermore, as an example of other embodiments of the above-mentioned resin, the matrix resin described in paragraphs

[0145] to

[0189] of International Publication No. 2021 / 132674 can be directly applied.

[0175] <Resin A containing acid groups> In the optical absorption filter of the present invention, the wavelength selective absorption layer comprises resin A containing acid groups (also referred to as "resin A" in the present invention).

[0176] As for the acid groups contained in resin A, it is preferable to have a proton-dissociable group with a pKa of 12 or less. Specifically, examples of acid groups include carboxyl groups, sulfonamide groups (-S(=O)₂NH₂), phosphonic acid groups (-P(=O)(OH)₂), phosphate groups (-OP(=O)(OH)₂), sulfonyl groups, phenolic hydroxyl groups, and sulfonamide groups, with carboxyl groups being preferred. In addition, pKa refers to the negative common logarithm (-logKa) of the acid dissociation constant (Ka) in water at 25°C. In the pKa of compound B described later, the pKa can be calculated in the same way by changing the mixed solvent of water / methanol = 50 / 50 (volume ratio) to water.

[0177] In this invention, resin A containing acid groups means that the polymer constituting resin A contains acid groups.

[0178] The lower limit of the weight-average molecular weight of the polymer constituting resin A is 5,000 or more, and from the viewpoint of the physical properties of the filter, it is preferably 10,000 or more, more preferably 15,000 or more. There is no particular limitation on the upper limit, but from the viewpoint of solubility in solvents, it is preferably 500,000 or less, more preferably 200,000 or less, and even more preferably 150,000 or less. That is, practically it is 5,000 to 500,000, preferably 10,000 to 200,000, and more preferably 15,000 to 150,000.

[0179] Furthermore, in this invention, the weight-average molecular weight of the polymer can be measured as the molecular weight converted from polystyrene by gel permeation chromatography (GPC).

[0180] Specifically, the GPC device HLC-8220 (trade name, manufactured by TOSOH CORPORATION) was used, with tetrahydrofuran as the eluent, and the column used was G3000HXL+G2000HXL (both trade names, manufactured by TOSOH CORPORATION). The system was operated at 23°C and a flow rate of 1 mL / min, and detection was performed using RI (differential refractive index).

[0181] Furthermore, some or all of the acid groups contained in resin A may be anionized or not in the optical absorption filter. In this invention, both anionized and unanionized acid groups are included and referred to as acid groups. That is, resin A may or may not be anionized in the optical absorption filter.

[0182] From the viewpoint of excellent film-forming properties of light absorption filters, polymers containing carboxyl groups are preferred as the polymer constituting resin A.

[0183] Furthermore, some or all of the carboxyl groups (-COOH) in carboxyl-containing polymers can be anionized in the light absorption filter, or they can remain unanionized. The anionized carboxyl groups (-COOH)... - Both ) and unanionized carboxyl groups are included and collectively referred to as carboxyl groups.

[0184] That is, carboxyl-containing polymers can be anionized or not in the light absorption filter. Both anionized and unanionized carboxyl-containing polymers are included and referred to as carboxyl-containing polymers.

[0185] In the optical absorption filter of the present invention, the content of resin A in the wavelength selective absorption layer is preferably 50% by mass or more and less than 100% by mass, more preferably 60% by mass or more and less than 100% by mass, and even more preferably 65% ​​by mass or more and less than 100% by mass. The upper limit is also preferably 99% by mass or less, more preferably 97% by mass or less, even more preferably 95% by mass or less, and particularly preferably 90% by mass or less.

[0186] Resin A can be used alone or in combination with two or more other resins.

[0187] (Carboxyl-containing polymers) Carboxyl-containing polymers may further have acid groups other than carboxyl groups as acid groups. Examples of acid groups other than carboxyl groups include phenolic hydroxyl groups, phosphate groups, and sulfonic acid groups.

[0188] When the carboxyl-containing polymer is a copolymer, the polymer structure can be a random polymer or an ordered polymer such as a block polymer.

[0189] <<Structural units with carboxyl groups>> Carboxyl-containing polymers preferably contain structural units with carboxyl groups.

[0190] Examples of structural units containing a carboxyl group include those derived from (meth)acrylic acid, crotonic acid, itaconic acid, maleic acid, or fumaric acid. From the viewpoint of excellent decolorizing properties of dyes, structural units derived from (meth)acrylic acid are preferred.

[0191] When the total of all structural units of the carboxyl-containing polymer is set to 100 mol%, the content of structural units with carboxyl groups in the carboxyl-containing polymer is preferably 1 to 100 mol%, more preferably 10 to 90 mol%, even more preferably 30 to 90 mol%, particularly preferably 45 to 80 mol%, and especially preferably 45 to 75 mol.

[0192] Structural units with carboxyl groups can be used alone or in combination with two or more.

[0193] <<Structural units with aromatic rings>> In addition to the structural units described above, carboxyl-containing polymers preferably also possess structural units having an aromatic ring (preferably an aromatic hydrocarbon ring). For example, structural units derived from (meth)acrylates (specifically, benzyl (meth)acrylate, phenethyl (meth)acrylate, or phenoxyethyl (meth)acrylate, etc.) with aromatic rings can be cited.

[0194] When the total of all structural units of the carboxyl-containing polymer is set to 100 mol%, the content of the structural units with aromatic rings in the carboxyl-containing polymer is preferably 0 to 97 mol%, more preferably 0 to 95 mol%, and even more preferably 0 to 90 mol.

[0195] Aromatic ring structural units can be used alone or in combination with two or more.

[0196] <<Structural Units with Alicyclic Structures>> In addition to the structural units mentioned above, the carboxyl-containing polymers also preferably have structural units with alicyclic structures.

[0197] As an alicyclic structure, for example, a tricyclic [5.2.1.0] can be cited. 2,6 Decane ring structure (also known as tetrahydrodicyclopentadiene. The monovalent group is dicyclopentyl), tricyclic [5.2.1.0] 2,6 Decane-3-enyl ring structure (also known as 5,6-dihydrodicyclopentadiene. The monovalent group is dicyclopentenyl), isobornane ring structure (the monovalent group is isobornyl), adamantane ring structure (the monovalent group is adamantyl), and cyclohexane ring structure (the monovalent group is cyclohexyl).

[0198] As structural units with an alicyclic structure, examples include structural units derived from (meth)acrylates with an alicyclic structure. Specifically, examples include structural units derived from dicyclopentyl (meth)acrylate, dicyclopentenyl (meth)acrylate, isobornyl (meth)acrylate, adamantane (meth)acrylate, or cyclohexyl (meth)acrylate.

[0199] When the total of all structural units of the carboxyl-containing polymer is set to 100 mol%, the content of structural units with alicyclic structures in the carboxyl-containing polymer is preferably 0-99 mol, more preferably 10-90 mol, even more preferably 10-70 mol, particularly preferably 20-55 mol, and especially preferably 25-55 mol.

[0200] Structural units with alicyclic structures can be used individually or in combination with two or more.

[0201] <<Other Structural Units>> In addition to the structural units mentioned above, carboxyl-containing polymers may also have other structural units.

[0202] Other structural units mentioned above, for example, include those derived from methyl (meth)acrylate.

[0203] When the total of all structural units of the carboxyl-containing polymer is set to 100 mol%, the content of other structural units in the carboxyl-containing polymer is preferably 0-70 mol%, more preferably 0-50 mol%, and even more preferably 0-20 mol%.

[0204] Other structural units can be used individually or in combination with two or more.

[0205] <Compound B> In the optical absorption filter I of the present invention, the wavelength selective absorption layer contains compound B (also referred to as "compound B" in the present invention) which forms hydrogen bonds with the acid groups contained in resin A and generates free radicals by ultraviolet irradiation.

[0206] As compound B, it is preferable to have a structure that increases basicity by absorbing ultraviolet light and becoming excited. By increasing the basicity of compound B in the excited state, a complex can be formed in which the acid groups contained in resin A interact more strongly with compound B, thereby improving the efficiency of free radical generation.

[0207] The structure of compound B that can form hydrogen bonds with the acid groups contained in resin A can be the overall structure of compound B or a partial structure that constitutes a part of compound B.

[0208] Compound B can be a high molecular weight compound (a compound with a molecular weight of 5000 or more) or a low molecular weight compound (a compound with a molecular weight of less than 5000), with a low molecular weight compound being preferred.

[0209] Compound B, as a low-molecular-weight compound, has a molecular weight of less than 5000, preferably less than 1000, more preferably less than 300, and even more preferably less than 250. There is no particular limitation on the lower limit, but 65 or more is preferred, more preferably 75 or more. A preferred range for the molecular weight of compound B as a low-molecular-weight compound is, for example, 65 to 300, more preferably 75 to 250.

[0210] From the perspective of having a large molar absorptivity relative to ultraviolet light, compound B is preferably an aromatic compound.

[0211] Aromatic compounds are those that have one or more aromatic rings.

[0212] The aromatic ring described above may be present in compound B in a single form or in multiple forms. In the case of multiple forms, for example, the aromatic ring may be present in the side chain of the polymer constituting the resin.

[0213] The aromatic ring described above can be any of an aromatic hydrocarbon ring or an aromatic heterocycle, and compound B preferably has at least an aromatic heterocycle. In the case of an aromatic heterocycle (also called a heteroaromatic ring), compound B is a compound having one or more (e.g., 1 to 4) heteroatoms (at least one of nitrogen, oxygen, or sulfur atoms, etc.) as ring member atoms (ring constituent atoms), and preferably a compound having one or more (e.g., 1 to 4) nitrogen atoms as ring member atoms.

[0214] Furthermore, the unsubstituted aromatic hydrocarbon ring does not possess the ability to form hydrogen bonds with the acid groups contained in resin A and generate free radicals upon ultraviolet irradiation, therefore it does not belong to compound B. Also, the unsubstituted aromatic hydrocarbon ring in the form of being bonded to the side chains of the polymer constituting the resin does not possess the ability to form hydrogen bonds with the acid groups contained in resin A and generate free radicals upon ultraviolet irradiation, therefore it does not belong to compound B.

[0215] The number of ring members in the above-mentioned aromatic ring is preferably 5 to 15.

[0216] Examples of aromatic rings include monocyclic aromatic rings such as pyridine, pyrazine, pyrimidine, and triazine rings; aromatic rings formed by the fusion of two rings such as quinoline, isoquinoline, quinoxaline, and quinazoline rings; and aromatic rings formed by the fusion of three rings such as acridine, phenanthridine, phenanthroxaline, and phenazine rings.

[0217] The aromatic ring described above may have one or more substituents (e.g., 1 to 5), and examples of such substituents include alkyl, aryl, halogen, acyl, alkoxycarbonyl, arylcarbonyl, carbamoyl, hydroxyl, cyano, and nitro groups. Furthermore, when the aromatic ring has two or more substituents, these substituents may bond together to form a non-aromatic ring.

[0218] In addition, when multiple aromatic rings (e.g., 2 to 5 aromatic rings) are formed into a series of aromatic ring structures bonded by structures selected from single bonds, carbonyl bonds, and multiple bonds (e.g., vinylenes that may have substituents, -C≡C-, -N=N-, etc.), the entire series of aromatic ring structures is regarded as a single specific structure.

[0219] The aforementioned aromatic rings bonded by a series of aromatic ring structures selected from single bonds, carbonyl bonds, and multiple bonds do not belong to the aforementioned unsubstituted aromatic hydrocarbon rings, nor do they belong to the unsubstituted aromatic hydrocarbon rings in the manner in which unsubstituted aromatic hydrocarbon rings are bonded to the side chains of the polymer constituting the resin.

[0220] Furthermore, preferably, one or more of the aromatic rings constituting the above-mentioned series of aromatic ring structures are the above-mentioned heteroaromatic rings.

[0221] Specific examples of compound B include monocyclic aromatic compounds such as pyridine compounds (pyridine and pyridine derivatives), pyrazine compounds (pyrazine and pyrazine derivatives), pyrimidine compounds (pyrimidine and pyrimidine derivatives), and triazine compounds (triazine and triazine derivatives); compounds in which two rings are fused to form an aromatic ring, such as quinoline compounds (quinoline and quinoline derivatives), isoquinoline compounds (isoquinoline and isoquinoline derivatives), quinoxaline compounds (quinoxaline and quinoxaline derivatives), and quinazoline compounds (quinazoline and quinazoline derivatives); and compounds in which three or more rings are fused to form an aromatic ring, such as acridine compounds (acrididine and acridine derivatives), phenanthridine compounds (phenanthridine and phenanthridine derivatives), phenanthroline compounds (phenanthroline and phenanthroline derivatives), and phenazine compounds (phenazine and phenazine derivatives). In specific examples of these compounds B, the term "compound" is used in the sense of including, in addition to the compound itself, unsubstituted compounds with altered structures, and compounds having substituents (referred to as "derivatives"), without impairing the effects of the invention.

[0222] It is estimated that these compounds B form a complex with the aforementioned resin A, and generate two molecules of free radicals through the following mechanism by ultraviolet irradiation.

[0223] 1) Compound B is generated in an excited state by absorbing ultraviolet light.

[0224] 2) Holes move from the excited state of compound B to the base state of resin A (electrons from resin A move to the lower energy side of the two half-occupied orbitals of the excited state of compound B).

[0225] 3) Protons move from resin A to compound B, thereby generating free radicals that add to compound B and free radicals that detach from resin A.

[0226] When resin A is a compound with a carboxyl group, the following reaction is further initiated, generating free radicals through photodecarbonylation.

[0227] 4) Carbon dioxide is released from the free radicals that are released from resin A by hydrogen free radicals.

[0228] Wherein, compound B is preferably one or more of quinoline compounds (quinoline and quinoline derivatives) and isoquinoline compounds (isoquinoline and isoquinoline derivatives).

[0229] As substituents that may be present in these compounds, alkyl, aryl, halogen, acyl, alkoxycarbonyl, arylcarbonyl, carbamoyl, hydroxyl, cyano, or nitro groups are preferred.

[0230] When compound B is a polymer, it can be a polymer in which the above-mentioned specific structure is bonded to the polymer backbone via single bonds or linking groups.

[0231] Compound B, as a polymer, is obtained, for example, by polymerizing monomers having heteroaromatic rings (specifically, heteroaromatic rings having vinyl groups and / or (meth)acrylate monomers having a specific structure (preferably heteroaromatic rings). Copolymerization with other monomers may be performed as needed.

[0232] Specific examples of compound B include, for instance, quinoline, 2-methylquinoline, 4-methylquinoline, 2,4-dimethylquinoline, 2-methyl-4-phenylquinoline, isoquinoline, 1-methylisoquinoline, 3-methylisoquinoline, and 1-phenylisoquinoline.

[0233] From the viewpoint of balancing the decolorization of the ultraviolet-irradiated part and the durability of the dye in the ultraviolet-unirradiated part, in the light absorption filter I of the present invention, the content of compound B relative to the total mass of the wavelength-selective absorption layer is preferably 0.1 to 50% by mass, more preferably 2.0 to 40% by mass, even more preferably 4 to 35% by mass, and particularly preferably 8 to 30% by mass.

[0234] Furthermore, the pKaH (pKa of the conjugate acid), which serves as a measure of the basicity of compound B, can be set to, for example, 2.0 to 13.0. From the viewpoint of balancing the decolorization of the UV-irradiated portion and the durability of the dye in the UV-unirradiated portion, 2.0 to 7.0 is preferred, 3.0 to 6.0 is more preferred, and 4.3 to 5.5 is even more preferred.

[0235] In this invention, pKa refers to the negative common logarithm (-logKa) of the acid dissociation constant (Ka) in a 50 / 50 (volume ratio) water / methanol mixture at 25°C. pKa can be calculated by adding 0.01 mol / L of sodium hydroxide aqueous solution to a 50 / 50 (volume ratio) water / methanol mixture of the sample (the conjugate acid of compound B) and reading the amount of sodium hydroxide aqueous solution added to the half-equivalent point.

[0236] Compound B can be used alone or in combination with two or more compounds.

[0237] <Other Ingredients> In addition to the resin A containing dye acid groups described above, the wavelength selective absorption layer of the light absorption filter of the present invention may also contain compound B, which forms hydrogen bonds with the acid groups contained in the resin A and generates free radicals by ultraviolet irradiation, resins other than the resin A, and photoradical generators, and may further contain anti-fading agents and leveling agents (surfactants), etc.

[0238] In this invention, a photoradical generator refers to a compound other than compound B mentioned above that generates free radicals through ultraviolet irradiation. Regarding specific examples, preferred methods, commercially available products, and content of the photoradical generator, the descriptions of specific examples, preferred methods, commercially available products, and content of the photoradical generator in paragraphs

[0118] to

[0125] of International Publication No. 2023 / 068235 are also preferably applicable to this invention. Furthermore, in the description of the content of the photoradical generator in paragraph

[0125] of International Publication No. 2023 / 068235, "the light absorption filter of this invention" and "free radical generator (preferably a photoradical generator)" are respectively renamed as "wavelength-selective absorption layer in the light absorption filter of this invention" and "photoradical generator".

[0239] Furthermore, as an anti-fading agent, it is preferable to have an anti-fading agent that does not hinder fading caused by ultraviolet radiation and inhibits dye decomposition caused by visible light. As an anti-fading agent used in this invention, the anti-fading agents described in paragraphs

[0265] to

[0280] of International Publication No. 2022 / 210444 can be used.

[0240] (Leveling agent) In the wavelength-selective absorption layer of the optical absorption filter of the present invention, a leveling agent (surfactant) can be appropriately mixed. Commonly used compounds can be used as leveling agents, and fluorinated surfactants are particularly preferred. Specifically, for example, compounds described in paragraphs

[0028] to

[0056] of Japanese Patent Application Publication No. 2001-330725 can be cited. Furthermore, the Megaface F series (trade name) manufactured by DIC Corporation can also be used as a commercially available product.

[0241] The content of leveling agent in the wavelength selective absorption layer of the optical absorption filter of the present invention can be appropriately adjusted according to the purpose.

[0242] In addition to the components mentioned above, the wavelength selective absorption layer in the optical absorption filter of the present invention may also contain low molecular weight plasticizers, oligomer plasticizers, delay modifiers, degradation inhibitors, infrared absorbers, antioxidants, fillers, and compatibilizers.

[0243] Furthermore, the wavelength-selective absorption layer in the optical absorption filter of the present invention may contain the reaction promoter or reaction retarder described in paragraphs

[0020] and

[0021] of Japanese Patent Application Publication No. 09-286979.

[0244] <<Method for Manufacturing Wavelength Selective Absorption Layers>> The wavelength-selective absorption layer in the optical absorption filter of the present invention can be fabricated using conventional methods, such as solution film preparation, melt extrusion, or coating on a substrate film (support film) by any method (coating method), and can also be appropriately combined with stretching. The wavelength-selective absorption layer in the optical absorption filter of the present invention is preferably fabricated by coating method.

[0245] As for the above-mentioned solution film formation method and melt extrusion method, the descriptions of the solution film formation method and melt extrusion method in International Publication No. 2021 / 132674

[0197] to

[0203] can be directly applied.

[0246] (Coating method) In the coating method, a solution of a wavelength-selective absorption layer material is applied to a support film to form a coating. To control the adhesion between the coating and the support film, a release agent or similar agent can be pre-applied to the surface of the support film. The coating can be used after being laminated with other components via an adhesive layer in a subsequent process, or after being laminated with a gas barrier layer or similar agent without an adhesive layer in a subsequent process, after which the support film can be peeled off. Regarding the adhesive constituting the adhesive layer, any adhesive can be used appropriately. Furthermore, the support film can be stretched appropriately along with the support film, either in the state where the solution of the wavelength-selective absorption layer material is coated on the support film or in the state where the coating is laminated.

[0247] The solvent for the solution of the material used in the wavelength selective absorption layer can be appropriately selected from the following perspectives: capable of dissolving or dispersing the material of the wavelength selective absorption layer; easily forming a uniform surface in the coating and drying processes; ensuring solution preservation; and having a suitable saturated vapor pressure.

[0248] -Addition of pigments (dyes), etc.- Regarding the timing of adding the dye to the material of the wavelength-selective absorption layer, there is no particular limitation as long as it is added at the film-forming time. For example, it can be added at the synthesis time of the aforementioned resin A, or it can be mixed with the material of the wavelength-selective absorption layer when preparing the coating solution. The same applies when the wavelength-selective absorption layer contains the aforementioned compound B, etc.

[0249] -Support membrane- The thickness of the support film used to form the wavelength selective absorption layer by coating or other methods is preferably 5 to 100 μm, more preferably 10 to 75 μm, and even more preferably 15 to 55 μm. If the film thickness is above or below the aforementioned preferred lower limit, sufficient mechanical strength is easily ensured, and defects such as curling, wrinkling, and bending are less likely to occur. Furthermore, if the film thickness is below or below the aforementioned preferred upper limit, when storing a multilayer film consisting of adjacent layers, the wavelength selective absorption layer, and the support film in a long roll, for example, it is easy to adjust the surface pressure applied to the multilayer film within an appropriate range, and adhesion defects are less likely to occur.

[0250] The surface energy of the support film is not particularly limited, but by adjusting the correlation between the surface energy of the material and coating solution of the wavelength-selective absorption layer and the surface energy of the side of the support film on which the wavelength-selective absorption layer is formed, the adhesion between the wavelength-selective absorption layer and the support film can be adjusted. If the surface energy difference is reduced, the adhesion tends to increase; if the surface energy difference is increased, the adhesion tends to decrease. The surface energy difference can be set appropriately.

[0251] Furthermore, there are no particular limitations on the surface unevenness of the support film. However, adjustments can be made based on the correlation between the surface energy and hardness of the wavelength selective absorption layer, the surface unevenness of the support film and the surface energy and hardness of the side opposite to the side forming the wavelength selective absorption layer, for example, to prevent adhesion failures when storing multilayer films of adjacent layers, wavelength selective absorption layers, and support films in a long roll form. Increasing the surface unevenness tends to suppress adhesion failures, while decreasing the surface unevenness tends to reduce the surface unevenness of the wavelength selective absorption layer and reduce the haze of the wavelength selective absorption layer. These settings can be appropriately adjusted.

[0252] Any material and membrane can be appropriately used as such a support membrane. Specific materials include polyester polymers (including polyethylene terephthalate), olefin polymers, cycloolefin polymers, (meth)acrylic acid polymers, cellulose polymers, and polyamide polymers. Furthermore, surface treatments can be performed to adjust the surface properties of the support membrane. To reduce surface energy, corona treatment, room temperature plasma treatment, saponification treatment, etc., can be performed; to increase surface energy, silicone treatment, fluorine treatment, olefin treatment, etc., can be performed.

[0253] <Wavelength-selective absorption layer thickness> The thickness of the wavelength-selective absorption layer is not particularly limited, but is preferably 1–18 μm, more preferably 1–12 μm, even more preferably 1–8 μm, and particularly preferably 1–5 μm. If the thickness is below the upper limit of the above-mentioned preferences, the reduction in polarization caused by fluorescence emitted by the dye can be suppressed by adding a high concentration of dye to the film. Furthermore, the quencher effect is readily apparent. On the other hand, if the thickness is above the lower limit of the above-mentioned preferences, it is easier to maintain the uniformity of in-plane absorbance.

[0254] In this invention, a film thickness of 1–18 μm means that the thickness of the wavelength-selective absorption layer is within the range of 1–18 μm regardless of the location at which the measurement is taken. The same applies to film thicknesses of 1–12 μm, 1–8 μm, and 1–5 μm. The film thickness can be measured using an electronic micrometer manufactured by ANRITSUCORPORATION.

[0255] <Processing of Wavelength Selective Absorption Layer> The wavelength-selective absorption layer can be hydrophilized by any glow discharge treatment, corona discharge treatment, or alkaline saponification treatment, with corona discharge treatment being preferred. Methods disclosed in Japanese Patent Application Publication No. 6-94915 or Japanese Patent Application Publication No. 6-118232 are also preferred.

[0256] Furthermore, depending on the requirements, the obtained membrane can undergo heat treatment, superheated steam contact, or organic solvent contact processes. Additionally, surface treatment can be performed as appropriate.

[0257] Furthermore, as an adhesive layer, a layer made of an adhesive composition using (meth)acrylic resin, styrene resin, silicone resin, etc. as a base polymer and incorporating crosslinking agents such as isocyanate compounds, epoxy compounds, aziridine compounds, etc., can also be applied.

[0258] Preferably, the adhesive layer in the OLED display device described later can be applied.

[0259] [Adjacent layers] The optical absorption filter of the present invention includes an adjacent layer disposed directly on at least one side of the wavelength selective absorption layer, the adjacent layer containing a resin comprising basic groups.

[0260] The adjacent layers may be disposed on only one side of the wavelength selective absorption layer in the optical absorption filter or the filter of the present invention, or they may be disposed on both sides.

[0261] There are no particular limitations on the adjacent layers mentioned above. For example, a layer containing a resin with basic groups can be provided as an adjacent layer in layers commonly used in display devices such as organic electroluminescent display devices, inorganic electroluminescent display devices, or liquid crystal display devices (hereinafter referred to as "layers commonly used in display devices"). Specifically, the adjacent layers can be made of resin containing basic groups in the gas barrier layer, diffusion barrier layer, adhesive layer or antireflective layer, the aforementioned adhesive layer or refractive index adjusting layer mentioned above.

[0262] Furthermore, it is also possible to assemble layers that are different from the layers typically used in the aforementioned display devices and contain resins containing alkaline groups as adjacent layers.

[0263] <Resins containing basic groups> It is believed that in the optical absorption filter of the present invention, the resin containing basic groups contained in the adjacent layer is unevenly distributed near the interface between the adjacent layer and the wavelength selective absorption layer, and the adhesion can be improved by hydrogen bonding with the acid groups contained in the resin A contained in the wavelength selective absorption layer.

[0264] As for the resin containing basic groups contained in the aforementioned adjacent layers, there are no particular limitations as long as it contains groups or structures exhibiting basicity (in this invention, they are collectively referred to as "basic groups") and can improve the sealing of the light absorption filter of this invention.

[0265] Furthermore, in this invention, a resin containing basic groups refers to a polymer constituting the resin containing basic groups.

[0266] The polymer constituting the resin containing the above-mentioned basic groups can be an organic basic group or an inorganic basic group, preferably a polymer containing an organic basic group, and more preferably a polymer containing an organic basic group containing a nitrogen atom (a polymer containing a nitrogen-containing basic group).

[0267] The aforementioned organic basic group is preferably a structure with a pKaH (pKa of the conjugate acid) of 4 or higher. There is no particular upper limit to the pKa of the conjugate acid; in practice, it is 13 or lower. Furthermore, pKa has the same meaning as in compound B mentioned above.

[0268] Examples of organic basic groups with a pKaH (pKa of the conjugate acid) of 4 or more include unsubstituted amino groups (-NH2, primary amino groups), substituted secondary to tertiary amino groups (amino groups with at least one substituent), and nitrogen-containing aromatic cyclic groups. Furthermore, the substituents on the nitrogen atom of the aforementioned secondary to tertiary amino groups can bond with each other to form a ring structure other than an aromatic ring.

[0269] Preferred examples of organic basic groups with a pKaH (pKa of the conjugate acid) of 4 or more include groups composed of nitrogen-containing aromatic rings such as guanidine, pyridine, aminopyridine, aminoalkylpyridine, aminopyrrolidine, indazole, imidazole, pyrazole, pyrazine, pyrimidine, purine, imidazoline, pyrazoline, piperazine, aminomorpholine, or aminoalkylmorpholine. As substituents that these organic basic groups may have, preferred examples include unsubstituted amino, alkylamino, aminoaryl, arylamino, alkyl (with aminoalkyl being particularly preferred as a substituted alkyl group), alkoxy, acyl, acyloxy, aryl, aryloxy, nitro, hydroxyl, and cyano groups.

[0270] Among these, particularly preferred organic basic groups include guanidine, 1,1-dimethylguanidine, 1,1,3,3-tetramethylguanidine, imidazole, 2-methylimidazolium, 4-methylimidazolium, N-methylimidazolium, 2-phenylimidazolium, 4,5-diphenylimidazolium, 2,4,5-triphenylimidazolium, 2-aminopyridine, 3-aminopyridine, 4-aminopyridine, 2-dimethylaminopyridine, 4-dimethylaminopyridine, 2-diethylaminopyridine, 2-(aminomethyl)pyridine, 2-amino-3-methylpyridine, 2-amino-4-methylpyridine, 2-amino-5-methylpyridine, 2-amino-6-methylpyridine, 3-aminoethyl... Pyridine, 4-aminoethylpyridine, 3-aminopyrrolidine, piperazine, N-(2-aminoethyl)piperazine, N-(2-aminoethyl)piperidine, 4-amino-2,2,6,6-tetramethylpiperidine, 4-piperidinepiperidine, 2-iminopiperidine, 1-(2-aminoethyl)pyrrolidine, pyrazole, 3-amino-5-methylpyrazole, 5-amino-3-methyl-1-p-tolylpyrazole, pyrazine, 2-(aminomethyl)-5-methylpyrazine, pyrimidine, 2,4-diaminopyrimidine, 4,6-dihydroxypyrimidine, 2-pyrazoline, 3-pyrazoline, N-aminomorpholine, or N-(2-aminoethyl)morpholine, etc., consisting of a nitrogen-containing aromatic ring. However, it is not limited to these.

[0271] As a polymer having a nitrogen-containing aromatic ring group as the above-mentioned organic basic group, examples include polymers having the above-mentioned group composed of a nitrogen-containing aromatic ring, and polyvinylpyridine is preferably mentioned.

[0272] Specific examples of polymers in which the aforementioned organic basic group includes an amino group selected from unsubstituted amino groups and amino groups from secondary to tertiary amino groups with substituents include polyethyleneimine and polymeric polyamines other than polyethyleneimine (hereinafter also simply referred to as "polymeric polyamines"). It is preferred to use at least one of polyethyleneimine and polymeric polyamines.

[0273] Furthermore, polymeric polyamines refer to polymers having two or more amino groups selected from the unsubstituted amino groups and substituted secondary to tertiary amino groups. Additionally, polymeric polyamines are preferably linear polymers having two or more amino groups selected from the unsubstituted amino groups and substituted secondary to tertiary amino groups, more preferably linear polymers containing structural units in the side chains having amino groups selected from the unsubstituted amino groups and substituted secondary to tertiary amino groups, even more preferably linear polymers containing structural units in the side chains having unsubstituted amino groups, and particularly preferably linear vinyl polymers containing structural units in the side chains having unsubstituted amino groups.

[0274] There are no particular limitations on the structural unit having the aforementioned unsubstituted amino group in the side chain. For example, structural units derived from N-vinylamine or allylamine can be cited, with structural units derived from N-vinylamine or allylamine being preferred.

[0275] There are no particular limitations on the structural unit having a secondary to tertiary amino group containing a substituent in the side chain. For example, structural units derived from N-vinylamine derivatives such as N-vinylformamide, structural units derived from diallylamine, and structural units derived from allylamine derivatives such as alkoxycarbonylated allylamine or ureated allylamine can be cited.

[0276] Furthermore, polymeric polyamines may have structural units other than those having unsubstituted amino groups on the side chains and secondary to tertiary amino groups containing substituents on the side chains. For example, structural units derived from diallylamine derivatives such as diallyl dialkylammonium salts can be cited.

[0277] The content of structural units in the linear polymeric polyamine having an amino group selected from the above-mentioned unsubstituted amino group and a substituent secondary to tertiary amino group in the side chain (preferably structural units having the above-mentioned unsubstituted amino group in the side chain) is preferably 10 to 100 mol%, more preferably 20 to 100 mol%, and even more preferably 50 to 100 mol%.

[0278] As for the aforementioned polyethyleneimine, for example, those manufactured under trade names such as Epomin SP-200, Epomin HM-2000, Epomin P-1000, and Epomin P-3000 by Nippon Shokubai Co., Ltd., and polyethyleneimine 10000 and polyethyleneimine 70000 by JUNSEICHEMICAL CO.,LTD., are preferred. Furthermore, polyethyleneimine manufactured by FUJIFILM Wako Pure Chemical Corporation is also preferred.

[0279] Furthermore, as the aforementioned polymeric polyamines, for example, those manufactured under trade names such as PVAM-0570B, PVAM-0595B, and PVDL by Mitsubishi Chemical Corporation, and PAA-15C, PAA-25, PAA-1222, PAA-U5000, PAA-N5000, PAS-21, and PAA-D11 by Nitto Boseki Co., Ltd., are preferred.

[0280] The weight-average molecular weight (Mw) of the polymer constituting the resin containing the above-mentioned basic groups is preferably 5,000 or more, more preferably 5,000 to 200,000, and even more preferably 5,000 to 150,000.

[0281] The content of the resin containing basic groups in the aforementioned adjacent layers is preferably 0.5 parts by mass or more, more preferably 0.75 parts by mass or more, further preferably 1.0 parts by mass or more, and especially preferably 1.5 parts by mass or more, relative to the total 100 parts by mass of the components other than the resin containing basic groups constituting the adjacent layers. The upper limit is preferably 45 parts by mass or less, more preferably 30 parts by mass or less, further preferably 20 parts by mass or less, and especially preferably 15 parts by mass or less. As a preferred range for the content of the resin containing basic groups in the adjacent layers, relative to the total 100 parts by mass of the components other than the resin containing basic groups constituting the adjacent layers, for example, preferably 0.5 to 45 parts by mass, more preferably 0.75 to 30 parts by mass, further preferably 1.0 to 20 parts by mass, and especially preferably 1.5 to 15 parts by mass. The content of resin containing basic groups in 100% by mass of the total mass of adjacent layers is preferably 0.5 to 30% by mass, more preferably 0.75 to 25% by mass, even more preferably 1.0 to 15% by mass, and particularly preferably 1.5 to 10% by mass. By adjusting the content of resin containing basic groups in the adjacent layers, good adhesion can be ensured while maintaining the transparency of the light absorption filter.

[0282] <Film thickness of the optical absorption filter of the present invention> The film thickness of the optical absorption filter of the present invention is not particularly limited, but it is preferably 1.5 to 20 μm, more preferably 1.5 to 15 μm, and even more preferably 2 to 10 μm.

[0283] In this invention, a film thickness of 1.5–20 μm means that the thickness of the optical absorption filter of this invention, regardless of the location at which it is measured, falls within the range of 1.5–20 μm. The same applies to film thicknesses of 1.5–15 μm and 2–10 μm. The film thickness can be measured using an electronic micrometer manufactured by ANRITSU CORPORATION.

[0284] <Absorbance of the optical absorption filter of the present invention> In the optical absorption filter of the present invention, the dye exhibits absorbance at the maximum absorption wavelength of maximum absorbance (hereinafter also simply referred to as "Ab(λ)"). max The value is preferably 0.3 or more, more preferably 0.5 or more, and even more preferably 0.7 or more.

[0285] However, the absorbance of the optical absorption filter of the present invention can be adjusted by the type, amount or thickness of the dye contained in the wavelength selective absorption layer of the optical absorption filter of the present invention.

[0286] When the light absorption filter of the present invention has decolorizing properties, the decolorization rate of the light absorption filter caused by ultraviolet irradiation is preferably 35% or more, more preferably 45% or more, even more preferably 55% or more, and particularly preferably 70% or more. There is no particular limitation on the upper limit, but 100% is also preferred.

[0287] In addition, regarding the aforementioned decolorization rate, the Ab(λ) values ​​before and after the ultraviolet irradiation test... max The value of is calculated using the following formula.

[0288] Decolorization rate (%) = 100 - (Ab(λ) after UV irradiation) max ) / Ab (λ) before ultraviolet irradiation max ))×100 In the ultraviolet irradiation test, under atmospheric pressure (101.33 kPa), an ultra-high pressure mercury lamp (e.g., manufactured by HOYACORPORATION, trade name: UL750) was used to irradiate the light absorption filter at room temperature (25°C) with an illuminance of 100 mW / cm². 2 The radiation dose is 2000 mJ / cm². 2 Ultraviolet rays.

[0289] The absorbance, ultraviolet irradiation test, and decolorization rate described above can be measured and calculated for the optical absorption filter of the present invention using the methods described in the examples.

[0290] Furthermore, when the light absorption filter of the present invention has decolorizing properties, the light absorption filter of the present invention preferably produces almost no absorption (secondary absorption) originating from the new coloring structure that accompanies the decomposition of the dye.

[0291] For example, it is possible to determine the absorbance at a specific wavelength relative to the aforementioned Ab(λ). max The ratio of the two wavelengths was used to confirm whether there was absorption originating from the new coloring structure accompanying dye decomposition. A specific wavelength selection was used; the dye before UV irradiation showed almost no absorption, and new absorption wavelengths caused by dye decomposition were observed.

[0292] As a specific example, as described in the embodiments below, it is possible to determine the absorbance at a wavelength of 450 nm (hereinafter also referred to as "Ab(450)") relative to the above Ab(λ). maxThe ratio of (II) to (I) is used to determine whether there is absorption from the new coloring structure accompanying dye decomposition. That is, the smaller the value obtained by subtracting the ratio of (I) below from the ratio below (II), the less absorption from the new coloring structure accompanying dye decomposition has occurred. This value is preferably less than 8.5%, more preferably less than 7.0%, and even more preferably less than 5.0%. There is no particular limitation on the lower limit, but from the viewpoint of properly evaluating the presence or absence of secondary absorption accompanying dye decomposition, it is practically -10% or more, preferably -6% or more.

[0293] (I) {Ab(450) before UV irradiation / Ab(λ) before UV irradiation} max )}×100% (II) {Ab(450) after UV irradiation / Ab(λ) before UV irradiation} max )}×100% The presence or absence of absorption originating from the new coloring structure accompanying the aforementioned dye decomposition can be confirmed by measuring Ab(λ) using the method described in the examples. max ) and Ab(450) are used to calculate.

[0294] When the light absorption filter of the present invention has decolorizing properties, the light absorption filter of the present invention can exhibit excellent decolorizing properties by confirming that the above-mentioned decolorization rate and the value of absorption from the new coloring structure with or without accompanying dye decomposition both meet the preferred range.

[0295] The light-absorbing portion of the filter of the present invention preferably satisfies the above-described Ab(λ) related to the light-absorbing filter of the present invention. max (Records).

[0296] <Optical Functional Films> The optical absorption filter of the present invention may appropriately have any optical functional film such as the gas barrier layer, without compromising the effect of the present invention.

[0297] Regarding any of the aforementioned optical functional films, there are no particular restrictions on optical properties or materials, but films containing at least one of cellulose ester resin, acrylic resin, cyclic olefin resin, and polyethylene terephthalate resin (or as a main component) are preferred. Furthermore, optically isotropic films or optically anisotropic retardation films can be used.

[0298] Regarding any of the aforementioned optical functional films, as optical films containing cellulose ester resins, FUJITAC TD80UL (trade name, manufactured by Fujifilm Corporation) can be used, for example.

[0299] Regarding any of the aforementioned optical functional films, as optical films containing acrylic resins, the optical films containing (meth)acrylic resins containing styrene-based resins as described in Japanese Patent No. 4570042, the optical films containing (meth)acrylic resins having a glutarimide ring structure on the main chain as described in Japanese Patent No. 5041532, the optical films containing (meth)acrylic resins having a lactone ring structure as described in Japanese Patent Application Publication No. 2009-122664, and the optical functional films containing (meth)acrylic resins having glutaric anhydride units as described in Japanese Patent Application Publication No. 2009-139754 are all applicable.

[0300] Furthermore, regarding any of the aforementioned optical functional films, as optical films containing cyclic olefin resins, the cyclic olefin resin films described after paragraph

[0029] of Japanese Patent Application Publication No. 2009-237376, the cyclic olefin resin films containing additives that reduce Rth described in Japanese Patent Application Publication No. 4881827, and Japanese Patent Application Publication No. 2008-063536 can be utilized.

[0301] <Gas Barrier Layer> The optical absorption filter of the present invention may have a gas barrier layer on at least one side of the wavelength-selective absorption layer. When the optical absorption filter of the present invention has a gas barrier layer, it can be used as an optical absorption filter that achieves both excellent decolorization and excellent lightfastness, and is preferably used to manufacture the filter described later.

[0302] In the optical absorption filter of the present invention, a gas barrier layer is preferably provided as an adjacent layer directly disposed on at least one side of the wavelength selective absorption layer.

[0303] The material forming the gas barrier layer is not particularly limited. Examples include organic materials such as polyvinyl alcohol and polyvinylidene chloride (preferably crystalline resins), organic-inorganic hybrid materials such as sol-gel materials, SiO2, and SiO2. x SiON, SiN x Inorganic materials such as Al2O3 are also included. The gas barrier layer can be a single layer or multiple layers. In the case of multiple layers, examples include inorganic dielectric multilayer films and multilayer films obtained by alternating layers of organic and inorganic materials.

[0304] The light absorption filter of the present invention, by having at least an air-barrier layer on the surface in contact with air when using the light absorption filter of the present invention, can suppress the decrease in the light absorption intensity (absorbance) of the dye in the light absorption filter of the present invention. As long as the air-barrier layer is provided at the interface of the light absorption filter of the present invention that is in contact with air, the air-barrier layer can be provided on only one side of the light absorption filter of the present invention or on both sides.

[0305] In the case where the gas barrier layer is composed of a crystalline resin, the gas barrier layer preferably has a thickness of 0.1 μm to 10 μm and an oxygen permeability of 60 cc / m. 2 •day•atm or less.

[0306] In the aforementioned gas barrier layer, the “crystalline resin” is a resin that has a melting point that changes from a crystalline phase to a liquid when the temperature is increased, and can impart oxygen-related gas barrier properties to the aforementioned gas barrier layer.

[0307] (Crystall resin) As for the crystalline resin included in the aforementioned gas barrier layer, any crystalline resin that has gas barrier properties and can impart the desired oxygen permeability to the gas barrier layer can be used without particular restrictions.

[0308] Examples of crystalline resins include polyvinyl alcohol and polyvinylidene chloride. From the viewpoint that the crystalline portion can effectively suppress gas permeation, polyvinyl alcohol is preferred.

[0309] The polyvinyl alcohols mentioned above can be modified or left unmodified. Examples of modified polyvinyl alcohols include those with acetyl groups, carboxyl groups, etc.

[0310] From the viewpoint of further improving oxygen barrier properties, the degree of saponification of the aforementioned polyvinyl alcohol is preferably 80.0 mol% or more, more preferably 90.0 mol% or more, even more preferably 97.0 mol% or more, and particularly preferably 98.0 mol% or more. There is no particular upper limit, but in practice it is 99.99 mol% or less. The degree of saponification of the aforementioned polyvinyl alcohol is a value calculated according to the method described in JIS (Japanese Industrial Standard) K 6726 1994.

[0311] Without impairing the effects of the present invention, the aforementioned gas barrier layer may generally contain any components found in gas barrier layers. For example, in addition to the aforementioned crystalline resin, it may also contain amorphous resin materials, organic-inorganic hybrid materials such as sol-gel materials, SiO2, SiO2, etc. x SiON, SiN x Inorganic materials such as Al2O3.

[0312] Furthermore, without compromising the effectiveness of the present invention, the aforementioned gas barrier layer may contain solvents such as water and organic solvents generated during the manufacturing process.

[0313] The content of crystalline resin in the aforementioned gas barrier layer is preferably 90% by mass or more, more preferably 95% by mass or more, out of 100% by mass of the total mass of the gas barrier layer. There is no particular limitation on the upper limit, but it can also be set to 100% by mass.

[0314] Furthermore, when the above-mentioned gas barrier layer is provided as an adjacent layer, the content of crystalline resin in the gas barrier layer is preferably 70 to 99.5% by mass, more preferably 75 to 99.25% by mass, even more preferably 85 to 99% by mass, and particularly preferably 90 to 98.5% by mass.

[0315] The oxygen permeability of the aforementioned gas barrier layer is preferably 60 cc / m 2 •day•atm or less, preferably 50cc / m 2 •day•atm or less, preferably 30cc / m 2 •day•atm and below, 10cc / m is especially preferred 2 •day•atm and below, preferably 5cc / m 2 •day•atm and below, the optimal value is 1cc / m 2 •day•atm and below. The actuality lower limit is 0.001cc / m 2 •day•atm or more, for example, preferably more than 0.05cc / m 2 •day•atm. By keeping the oxygen permeability within the above-mentioned preferred range, lightfastness can be further improved.

[0316] Furthermore, the oxygen permeability of the gas barrier layer is a value determined according to the gas permeability test method based on JIS K 7126-2 2006. As a measuring device, for example, an oxygen permeability meter manufactured by MOCON Inc., OX-TRAN2 / 21 (trade name), can be used. The measuring conditions are set to a temperature of 25°C and a relative humidity of 50%.

[0317] Oxygen permeability can be expressed in SI units as (fm) / (s•Pa). It can pass through (1fm) / (s•Pa) = 8.752 (cc) / (m 2 •day•atm) to convert. fm is read as femtometer and means 1fm = 10 -15 m.

[0318] From the viewpoint of further improving light resistance, the thickness of the gas barrier layer is preferably 0.1μm to 5μm, more preferably 0.1μm to 4.0μm.

[0319] The thickness of the aforementioned gas barrier layer was determined by taking cross-sectional photographs using a field emission scanning electron microscope S-4800 (trade name) manufactured by Hitachi High-Technologies Corporation.

[0320] The crystallinity of the crystalline resin contained in the aforementioned gas barrier layer is preferably 25% or more, more preferably 40% or more, and even more preferably 45% or more. There is no particular limitation on the upper limit, but in practice it is 55% or less, preferably 50% or less.

[0321] The crystallinity of the crystalline resin contained in the above-mentioned gas barrier layer is a value determined and calculated according to the method described in J. Appl. Pol. Sci., 81, 762 (2001) by the following method.

[0322] For samples stripped from the gas barrier layer, the heat of fusion 1 was determined using a DSC (differential scanning calorimeter) with a heating rate of 10 °C / min within the range of 20 °C to 260 °C. The heat of fusion 2 for complete crystallization was determined using the value described in J. Appl. Pol. Sci., 81, 762 (2001). The degree of crystallinity was calculated using the obtained heats of fusion 1 and fusion 2 by the following formula.

[0323] [Crystallization (%)] = ([Heat of fusion 1] / [Heat of fusion 2]) × 100 In addition, heat of fusion 1 and heat of fusion 2 only need to be in the same unit, usually J / g. -1 .

[0324] <Manufacturing Method of Gas Barrier Layer> There are no particular limitations on the method for forming the gas barrier layer, but conventional methods, such as casting methods like spin coating and slot coating, can be used in the case of organic materials. Furthermore, methods such as attaching a commercially available resin-based gas barrier film or a pre-fabricated resin-based gas barrier film to the light absorption filter of this invention can be cited. In the case of inorganic materials, methods such as plasma-enhanced chemical vapor deposition (CVD), sputtering, and evaporation can be cited.

[0325] When the above-mentioned barrier layer is provided in the optical absorption filter of the present invention, for example, a method can be described as directly fabricating the barrier layer on the optical absorption filter of the present invention manufactured by the above-described manufacturing method. In this case, it is also preferable to perform corona treatment on the surface of the optical absorption filter of the present invention in which the barrier layer is provided.

[0326] Furthermore, when any of the aforementioned optical functional films are provided, it is preferable to bond them via an adhesive layer. For example, it is also preferable to bond the optical functional films via an adhesive layer after providing a gas barrier layer on the light absorption filter of the present invention.

[0327] When the above-mentioned gas barrier layer or optical functional film is provided as an adjacent layer in the optical absorption filter of the present invention, the wavelength selective absorption layer in the optical absorption filter of the present invention is provided instead of being provided in the optical absorption filter of the present invention, in a manner that is a gas barrier layer containing a resin containing alkaline groups. Otherwise, it can be provided in the same manner as described above.

[0328] <Diffusion Barrier Layer> The optical absorption filter of the present invention can provide a diffusion barrier layer between the wavelength selective absorption layer and the support. This diffusion barrier layer can suppress the diffusion of components in the wavelength selective absorption layer into the support. In particular, in the optical absorption filter I of the present invention, decolorization caused by ultraviolet irradiation can be improved.

[0329] The diffusion of the wavelength-selective absorption layer components into the support can occur either during or after the formation of the wavelength-selective absorption layer. Particularly during the formation of the wavelength-selective absorption layer, the expansion of the support due to swelling caused by the solvent in the coating solution significantly increases the free volume within the support. From this perspective, the diffusion-barrier layer preferably has a low affinity for the solvent used in the formation of the wavelength-selective absorption layer. For example, if the dyes or compounds that generate free radicals upon ultraviolet irradiation contained in the wavelength-selective absorption layer are materials soluble in organic solvents (non-aqueous solvents), the resin constituting the diffusion-barrier layer is preferably a resin with low affinity for organic solvents, i.e., a water-soluble resin.

[0330] The affinity between the solvent used in the wavelength-selective absorption layer and the resin constituting the diffusion-barrier layer can be evaluated using the solubility parameter δt calculated using the Hoy method. The solubility parameter δt can be obtained, for example, from the literature "Properties of Polymers 3". rd The method described in the “2) Method of Hoy (1985, 1989)” section on pages 214-220 of “ELSEVIER, (1990)” is used for calculation.

[0331] In this invention, the absolute value of the difference between the δt value of the solvent used in forming the wavelength-selective absorption layer and the δt value of the resin constituting the diffusion barrier layer is preferably 1.0 or more, more preferably 2.0 or more, and even more preferably 3.0 or more. By adjusting the absolute value of the difference between the δt value of the solvent used in forming the wavelength-selective absorption layer and the δt value of the resin constituting the diffusion barrier layer to the above-mentioned preferred value or more, when the liquid forming the wavelength-selective absorption layer is coated onto the diffusion barrier layer, the solvent contained in the liquid forming the wavelength-selective absorption layer is suppressed from permeating through the diffusion barrier layer, and the swelling of the support is effectively suppressed, which is therefore preferable.

[0332] (Resin) Water-soluble resin is preferred as the resin constituting the diffusion barrier layer. The water-soluble resin can be any of thermosetting resin or thermoplastic resin. If it is a thermoplastic resin, it can be crystalline or amorphous.

[0333] For example, polyvinyl alcohol, polyvinylpyridine, (meth)acrylic resin, polyurethane, polyester, epoxy resin, cellulose resin, etc., are preferably used as water-soluble resins. At least one portion of these water-soluble resins can be modified.

[0334] The polyvinyl alcohols mentioned above may or may not be modified. Examples of modified polyvinyl alcohols include those with acetyl groups, carboxyl groups, etc.

[0335] From the viewpoint of further improving the barrier properties (transmission inhibition performance) of organic solvents, the degree of saponification of the above-mentioned polyvinyl alcohol is preferably 60.0 mol% or more, more preferably 80.0 mol% or more, and even more preferably 90.0 mol% or more. There is no particular upper limit, but in practice it is 99.99 mol% or less. The degree of saponification of the above-mentioned polyvinyl alcohol is a value calculated according to the method described in JIS K 6726 (1994).

[0336] As the aforementioned (meth)acrylic resin, any resin containing at least one of structural units derived from (meth)acrylic acid and structural units derived from (meth)acrylate is acceptable, and resins containing structural units derived from (meth)acrylic acid are preferred. The proportion of structural units derived from (meth)acrylic acid in all structural units constituting the (meth)acrylic resin is preferably 70 to 100 mol%, more preferably 80 to 100 mol%, and even more preferably 90 to 100 mol%.

[0337] From the viewpoint that the crystallization portion can effectively suppress the permeation of solvent molecules and that swelling caused by the organic solvent used in the wavelength selective absorption layer is less likely to occur, the resin constituting the diffusion barrier layer is preferably at least one of polyvinyl alcohol and (meth)acrylic resin, and more preferably at least one of polyvinyl alcohol and poly(meth)acrylic acid.

[0338] The content of resin (preferably water-soluble resin) in the aforementioned diffusion-blocking layer is preferably 90% by mass or more, and more preferably 95% by mass or more. There is no particular limitation on the upper limit, but it can also be set to 100% by mass.

[0339] From the viewpoint of further improving diffusion barrier capability, the thickness of the diffusion barrier layer is preferably 0.1 to 5.0 μm, more preferably 0.2 to 4.0 μm.

[0340] (Method for manufacturing diffusion barrier layer) There are no particular limitations on the methods for forming the diffusion barrier layer. For example, methods such as casting on a support using conventional methods, spin coating, and slot coating can be cited.

[0341] At this point, any solvent that can be used can be used without particular restriction as long as it can produce the desired diffusion barrier layer. For example, when the resin constituting the diffusion barrier layer is a water-soluble resin, water is preferred; water-soluble solvents such as ethanol, isopropanol, etc., are also preferred.

[0342] Regarding the support, the description of the support in the aforementioned coating method can be directly applied.

[0343] (Matte agent) Without impairing the effects of the present invention, microparticles can be added to the surface of the optical absorption filter of the present invention to impart slipability and prevent adhesion. Preferably, these microparticles are silicon dioxide (SiO2) with a surface coated with hydrophobic groups and in the form of secondary particles. Alternatively, titanium dioxide, alumina, zirconium oxide, calcium carbonate, talc, clay, calcined kaolin, calcined calcium silicate, hydrated calcium silicate, aluminum silicate, magnesium silicate, and calcium phosphate can be used together with or in place of silicon dioxide. Commercially available microparticles include R972 and NX90S (both manufactured by NIPPONAEROSIL CO.,LTD., trade names).

[0344] These microparticles function as a so-called matting agent. By adding these microparticles, tiny irregularities are formed on the surface of the light absorption filter of the present invention. Even if the light absorption filters of the present invention overlap each other or other films due to these irregularities, they will not stick to each other, thus ensuring slipability.

[0345] In the case where the optical absorption filter of the present invention contains an extinction agent as particulate matter, if there are 10 micro-protrusions caused by the protrusions of the particulate matter protruding from the filter surface... 4 pcs / mm 2 For protrusions with a height of 30nm or more, the improvement in sliding and adhesion is particularly significant.

[0346] From the viewpoint of improving adhesion and slip properties, matting agents (microparticles) are particularly preferred to be applied to the surface layer. Methods for applying microparticles to the surface layer include multilayer casting and coating.

[0347] The content of the extinction agent in the optical absorption filter of the present invention can be appropriately adjusted according to the purpose.

[0348] [Filter] In the case where the light absorption filter of the present invention has decolorization properties, the filter of the present invention is obtained by performing mask exposure by irradiating the light absorption filter of the present invention with ultraviolet light.

[0349] Examples of light absorption filters with decolorizing properties in the light absorption filters of the present invention include, for example, the light absorption filter I of the present invention, which contains the dye and resin A containing the acid group and compound B that forms hydrogen bonds with the acid group contained in resin A and generates free radicals by ultraviolet irradiation; and the light absorption filter containing resin A containing the dye and acid group and photoradical generator in the wavelength selective absorption layer.

[0350] In the following description of the filter and the description of the method of manufacturing the filter, when referred to simply as the light absorption filter of the present invention, it refers to the light absorption filter of the present invention that has decolorizing properties.

[0351] The wavelength selective absorption layer in the filter of the present invention has light-absorbing regions with light absorption effect and regions that cause light absorption to disappear (light absorption disappearance regions) according to the pattern exposed by the mask (hereinafter also referred to as "mask pattern").

[0352] That is, by irradiating the light absorption filter of the present invention with ultraviolet light, the masked part of the wavelength selective absorption layer in the light absorption filter of the present invention is not exposed and exists as a light-absorbing part with light absorption effect, while the unmasked part is exposed and becomes a part where light absorption disappears.

[0353] The aforementioned light-absorbing regions can display the desired absorbance.

[0354] Furthermore, regarding the aforementioned areas where light absorption disappears, the wavelength-selective absorption layer in the light absorption filter of the present invention exhibits an excellent decolorization rate and hardly any secondary absorption accompanying dye decomposition occurs, thus enabling it to display near-colorless optical properties.

[0355] <Method for manufacturing filters> The filter of the present invention is obtained by irradiating the light absorption filter of the present invention with ultraviolet light to perform mask exposure.

[0356] The mask pattern can be appropriately adjusted to obtain the filter of the present invention having a desired pattern consisting of light-absorbing regions and light-absorbing regions.

[0357] The ultraviolet irradiation conditions can be appropriately adjusted to obtain the filter of the present invention with a light absorption loss region. For example, regarding the pressure condition, it can be carried out at atmospheric pressure (101.33 kPa), and regarding the temperature condition, it can be carried out under mild temperature conditions, without heating at room temperature (10-30°C). The lamp output power can be set to 80-320 W / cm², and the lamp used can be a gas-cooled metal halide lamp, an ultra-high pressure mercury lamp, or the like. Furthermore, the irradiation dose can be set to 200-2000 mJ / cm². 2 .

[0358] The filter of the present invention may have the optical functional film described in the optical absorption filter of the present invention.

[0359] Furthermore, the filter of the present invention may have a layer containing an ultraviolet absorber. There are no particular limitations on the ultraviolet absorber; commonly used compounds can be used, for example, the ultraviolet absorber in the ultraviolet absorbing layer described later. There are also no particular limitations on the resin constituting the layer containing the ultraviolet absorber; for example, the resin in the ultraviolet absorbing layer described later can be used.

[0360] The content of ultraviolet absorbers in the layer containing the above-mentioned ultraviolet absorbers can be appropriately adjusted according to the purpose.

[0361] The filter of the present invention can be used in display devices such as organic electroluminescent display devices, inorganic electroluminescent display devices, and liquid crystal display devices. When used in any display device, if the filter of the present invention includes a gas barrier layer, it is preferably configured such that the gas barrier layer is located on the outer light side relative to the wavelength selective absorption layer.

[0362] OLED display devices The organic electroluminescent display device of the present invention (referred to as an organic EL (electroluminescence) display device or an OLED (Organic Light Emitting Diode) display device, and in this invention, it is also simply referred to as an OLED display device) includes the filter of the present invention.

[0363] As the OLED display device of the present invention, as long as it includes the filter of the present invention, other structures can be used without particular limitation, and the structure of commonly used OLED display devices can be used. There are no particular limitations on the structural examples of the OLED display device of the present invention, but for example, a display device that includes, in order from opposite sides to external light, glass, a layer including TFTs (thin-film transistors), an OLED display element, a blocking film, a color filter, glass, an adhesive layer, the filter of the present invention, and a surface film can be cited.

[0364] The aforementioned OLED display element has a structure consisting of an anode electrode, a light-emitting layer, and a cathode electrode stacked sequentially. Between the anode and cathode electrodes, in addition to the light-emitting layer, there are also a hole injection layer, a hole transport layer, an electron transport layer, and an electron injection layer. Furthermore, for example, reference can be made to Japanese Patent Application Publication No. 2014-132522.

[0365] Furthermore, in addition to conventional color filters, color filters with stacked quantum dots can also be used as the aforementioned color filters.

[0366] Resin film can also be used to replace the glass mentioned above.

[0367] <Adhesive layer> In the OLED display device of the present invention, the outer light side of the filter of the present invention can be bonded to an optical functional film having an anti-reflective layer or the like via an adhesive layer. Furthermore, the side of the filter of the present invention located opposite to the outer light source is preferably bonded to glass (substrate) via an adhesive layer.

[0368] As the aforementioned adhesive layer, the descriptions relating to the adhesive layer and formation method in an OLED display device as disclosed in International Publication Nos. 2021 / 132674,

[0239] to

[0290] , can be directly applied.

[0369] Furthermore, from the viewpoint of the light resistance of the filter, the adhesive composition described in International Publication No. 2021 / 132674 preferably contains the aforementioned ultraviolet absorber.

[0370] <Substrate> In the OLED display device of the present invention, the filter of the present invention can also be bonded to any optical functional film via an adhesive layer on the side facing outward light. Furthermore, the filter of the present invention is preferably bonded to glass (substrate) via an adhesive layer on the side facing away from outward light.

[0371] There are no particular limitations on the method for forming the adhesive layer described above. For example, a method can be used to apply the adhesive composition to the light absorption filter or filter of the present invention using a conventional method such as a bar coater, and then dry and cure it; or a method can be used to first apply the adhesive composition to the surface of a release substrate, and after drying it, transfer the adhesive layer to the light absorption filter of the present invention using a release substrate, and then cure it.

[0372] There are no particular limitations on the release substrate; any release substrate can be used. For example, the support film in the manufacturing method of the light absorption filter of the present invention described above can be cited.

[0373] In addition, the conditions for coating, drying, curing and hardening can be appropriately adjusted according to conventional methods.

[0374] [Inorganic electroluminescent display device] The inorganic electroluminescent display device of the present invention (referred to as an inorganic EL (electroluminescence) display device, and further simply as an inorganic EL display device in this invention) includes the filter of the present invention.

[0375] As for the inorganic EL display device of the present invention, as long as it includes the filter of the present invention, other structures can be used without particular limitation. For example, the inorganic EL element and inorganic electroluminescent display device described in Japanese Patent Application Publication No. 2005-338640 can be preferably applied.

[0376] Liquid crystal display device The liquid crystal display device of the present invention includes the filter of the present invention.

[0377] As described later, the filter of the present invention can be used as at least one of the polarizing protective film and the adhesive layer, and can also be included in the backlight unit used in a liquid crystal display device.

[0378] A liquid crystal display device preferably includes the filter of the present invention, a polarizer including a polarizer and a polarizing protective film, an adhesive layer, and a liquid crystal cell, wherein the polarizer is preferably bonded to the liquid crystal cell via the adhesive layer. In this liquid crystal display device, the filter of the present invention can also serve as a polarizing protective film or an adhesive layer. That is, the liquid crystal display device can be divided into the following types: having a polarizer including a polarizer and the filter (polarizing protective film) of the present invention, an adhesive layer, and a liquid crystal cell; and having a polarizer including a polarizer and a polarizing protective film, the filter (adhesive layer) of the present invention, and a liquid crystal cell.

[0379] Figure 1 This is a schematic diagram illustrating an example of the liquid crystal display device of the present invention. Figure 1 In this liquid crystal display device 10, a liquid crystal cell having a liquid crystal layer 5 and an upper electrode substrate 3 and a lower electrode substrate 6 disposed above and below it, and an upper polarizer 1 and a lower polarizer 8 disposed on both sides of the liquid crystal cell. A color filter layer may be stacked on the upper electrode substrate 3 or the lower electrode substrate 6. A backlight is disposed on the back side of the liquid crystal display device 10. The light source described in the backlight unit can be used as the backlight source.

[0380] The upper polarizer 1 and the lower polarizer 8 each have a structure formed by stacking the polarizer in such a way that the polarizer is held between two polarizer protective films. Preferably, at least one polarizer in the liquid crystal display device 10 is a polarizer that includes the filter of the present invention.

[0381] Furthermore, in the liquid crystal display device 10, the aforementioned liquid crystal cell and polarizers (upper polarizer 1 and / or lower polarizer 8) can be bonded together via an adhesive layer (not shown). In this case, the filter of the present invention can also serve as the aforementioned adhesive layer.

[0382] The liquid crystal display device 10 includes image direct viewing type, image projection type, and light modulation type. Active matrix liquid crystal display devices using three-terminal or two-terminal semiconductor elements such as TFT (Thin Film Transistor) or MIM (Metal Insulator Metal) are effective for this invention. Of course, passive matrix liquid crystal display devices, represented by the STN (Super Twisted Nematic) mode known as time-division driving, are also effective.

[0383] When the filter of the present invention is included in the backlight unit, the polarizer of the liquid crystal display device can be a conventional polarizer (excluding the polarizer of the filter of the present invention) or a polarizer including the filter of the present invention. Furthermore, the adhesive layer can be a conventional adhesive layer (not the filter of the present invention) or an adhesive layer based on the filter of the present invention.

[0384] The IPS (In Plane Switching) liquid crystal display device described in paragraphs 0128 to 0136 of Japanese Patent Application Publication No. 2010-102296 is preferably used as the liquid crystal display device of the present invention, except that the filter of the present invention is used.

[0385] <Polarizer> The polarizer used in this invention includes a polarizer and at least one polarizer protective film.

[0386] The polarizer used in this invention preferably has a polarizer and polarizer protective films located on both sides of the polarizer, and preferably includes the filter of this invention as a polarizer protective film on at least one side. In this case, a conventional polarizer protective film may be provided on the side of the polarizer opposite to the side having the filter of this invention (polarizer protective film of this invention).

[0387] The thickness of the polarizer protective film is preferably 5 to 120 μm, more preferably 10 to 100 μm. This is preferable because the film is less prone to uneven display after high temperature and humidity periods when assembled into a liquid crystal display device. On the other hand, from the viewpoint of stable transport during film manufacturing and polarizer fabrication, a thicker film is preferred. In the case where the filter of the present invention also serves as a polarizer protective film, the thickness of the filter preferably meets the above-mentioned range.

[0388] As the polarizer used in this invention, the descriptions related to the performance, shape, structure, polarizer, method of stacking polarizer and polarizer protective film, and functionalization of polarizer described in International Publication No. 2021 / 132674

[0299] to

[0309] can be directly applied.

[0389] <Adhesive layer> In the liquid crystal display device of the present invention, it is preferable that the polarizer is bonded to the liquid crystal cell via an adhesive layer. The filter of the present invention can also serve as the adhesive layer. If the filter of the present invention does not also serve as an adhesive layer, a conventional adhesive layer can be used.

[0390] As an adhesive layer, there are no particular limitations as long as it can bond the polarizer to the liquid crystal cell, but acrylic, urethane, polyisobutylene, etc. are preferred.

[0391] In the case where the filter of the present invention also functions as an adhesive layer, the adhesive layer comprises the aforementioned dye, resin A containing acid groups, and the aforementioned base polymer, and further comprises a crosslinking agent, coupling agent, etc., to impart adhesiveness. Furthermore, the resin in resin A containing acid groups that functions as the base polymer in the adhesive layer can be used in a form that also functions as the base polymer.

[0392] In the case where the filter of the present invention also serves as an adhesive layer, the adhesive layer preferably contains 90% by mass or more and less than 100% by mass of the aforementioned base polymer, more preferably 95% by mass or more and less than 100% by mass. The dye content is as described above.

[0393] The thickness of the adhesive layer is not particularly limited, but it is preferred, for example, to be 1 to 50 μm, and more preferably 3 to 30 μm.

[0394] <Liquid Crystal Unit> There are no particular limitations on the liquid crystal cell; a standard liquid crystal cell can be used.

[0395] <Ultraviolet Absorption Layer> Organic electroluminescent display devices, inorganic electroluminescent display devices, or liquid crystal display devices incorporating the filter of the present invention preferably have a layer on the viewer side relative to the filter of the present invention, wherein the layer is a layer (hereinafter also referred to as "ultraviolet absorption layer") that blocks the light absorption of compound B, which forms hydrogen bonds with the acid groups contained in the above-mentioned resin A and generates free radicals upon ultraviolet irradiation. By providing the above-mentioned ultraviolet absorption layer, fading of the filter of the present invention caused by external light can be prevented.

[0396] The ultraviolet absorbing layer used in this invention will be described below.

[0397] (UV absorber) The aforementioned ultraviolet absorbing layer typically comprises a resin and an ultraviolet absorber. From the viewpoint of excellent absorption of ultraviolet light with wavelengths below 370 nm and good liquid crystal display properties, an ultraviolet absorber with low absorption of visible light with wavelengths above 400 nm is preferred as the ultraviolet absorber.

[0398] Specific examples of ultraviolet absorbers preferred for use in this invention include hindered phenolic compounds, benzophenone compounds such as hydroxybenzophenone compounds, benzotriazole compounds, salicylates, cyanoacrylates, nickel complex salts, etc.

[0399] Examples of hindered phenolic compounds include 2,6-di-tert-butyl-p-cresol, pentaerythritol tetrakis[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], N,N'-hexamethylenebis(3,5-di-tert-butyl-4-hydroxycinnamoamide), 1,3,5-trimethyl-2,4,6-tris(3,5-di-tert-butyl-4-hydroxybenzyl)benzene, and tris-(3,5-di-tert-butyl-4-hydroxybenzyl)isocyanurate.

[0400] Examples of benzotriazole compounds include 2-(2'-hydroxy-5'-methylphenyl)benzotriazole, 2,2-methylenebis(4-(1,1,3,3-tetramethylbutyl)-6-(2H-benzotriazole-2-yl)phenol), 2,4-bis(n-octylthio)-6-(4-hydroxy-3,5-di-tert-butylaniline)-1,3,5-triazine, triethylene glycol-bis[3-(3-tert-butyl-5-methyl-4-hydroxyphenyl)propionate], and N,N'-hexamethylenebis(3-(3-tert-butyl-5-methyl-4-hydroxyphenyl)propionate]. (3,5-di-tert-butyl-4-hydroxycinnamoamide), 1,3,5-trimethyl-2,4,6-tris(3,5-di-tert-butyl-4-hydroxybenzyl)benzene, 2-(2'-hydroxy-3',5'-di-tert-butylphenyl)-5-chlorobenzotriazole, 2-(2'-hydroxy-3',5'-di-tert-pentylphenyl)-5-chlorobenzotriazole, 2,6-di-tert-butyl-p-cresol, pentaerythritol ester-tetra[3-(3,5-di-tert-butyl-4-hydroxyphenyl)propionate], etc.

[0401] The amount of these UV absorbers added is preferably 0.1 to 30.0 parts by weight relative to 100 parts by weight of the resin.

[0402] Furthermore, from the viewpoint of further improving the light resistance of the filter of the present invention, the compound (1) represented by formula (1) as described in paragraphs

[0229] to

[0283] of International Publication No. 2023 / 068235 is also preferably used as the ultraviolet absorber. Regarding the absorption characteristics, synthesis method and content of the compound (1) represented by formula (1) as described in International Publication No. 2023 / 068235, paragraphs

[0279] to

[0283] of International Publication No. 2023 / 068235 are also preferably used in the present invention.

[0403] (Resin) As the resin used in the aforementioned ultraviolet absorbing layer, commonly used resins can be used, and there are no particular limitations as long as they do not violate the spirit of the present invention. Examples of such resins include cellulose acylated resins, acrylic resins, cycloolefin resins, polyester resins, and epoxy resins.

[0404] (Location of the ultraviolet absorption layer) Regarding the configuration of the aforementioned ultraviolet absorbing layer, there are no particular limitations as long as it is positioned on the visual observer's side relative to the filter of the present invention; it can be placed at any location. For example, an ultraviolet absorber can be added to components such as the protective film of the polarizer or the anti-reflective film to give it the function of an ultraviolet absorbing layer. Furthermore, an ultraviolet absorber can also be added to the aforementioned adhesive layer.

[0405] Example The present invention will now be described in further detail with reference to embodiments. Appropriate changes can be made to the materials, amounts, proportions, processing contents, processing order, etc., shown in the following embodiments, as long as they do not depart from the spirit of the invention. Therefore, the scope of the present invention is not limited to the embodiments shown below.

[0406] In addition, in the following embodiments, unless otherwise specified, the terms "parts" and "%" indicating composition are based on mass. Room temperature refers to "25°C".

[0407] In addition, all processes, from the preparation of the wavelength-selective absorption layer forming liquid to the fabrication of the optical absorption filter using the wavelength-selective absorption layer forming liquid and the process up to the use in the ultraviolet irradiation test, are carried out under a yellow lamp to avoid exposure to ultraviolet light.

[0408] Example [Fabrication of an optical absorption filter] The following shows the materials used to make optical absorption filters.

[0409] <Polymer (Resin)> (Resin 1) Cyclohexyl methacrylate-methacrylic acid random copolymer, with methacrylic acid content of 40 mol% and weight average molecular weight of 53,500.

[0410] (Resin 2) Cyclohexyl methacrylate-methacrylic acid random copolymer, with 50 mol% methacrylic acid content and a weight-average molecular weight of 46,400.

[0411] (Resin 3) Cyclohexyl methacrylate-methacrylic acid random copolymer, with 60 mol% methacrylic acid content and a weight-average molecular weight of 43,800.

[0412] (Resin 4) Cyclohexyl methacrylate-methacrylic acid random copolymer, with methacrylic acid content of 70 mol%, and weight average molecular weight of 49,900.

[0413] (Resin 5) Adamantane methacrylate-acrylic acid random copolymer, with an acrylic acid content of 52 mol% and a weight-average molecular weight of 46,300.

[0414] In addition, the (meth)acrylic acid portion of resins 1 to 5 corresponds to the acid group contained in resin A as specified in this invention.

[0415] <Compound B> 4-Methylquinoline (manufactured by Tokyo Chemical Industry Co., Ltd., Lepidine, pKaH5.1) <Dyes> In the following structural formula, Bu represents butyl.

[0416] [Chemical Formula 11] (Leveling agent 1) A polymeric surfactant composed of the following components is used as leveling agent 1. In the following structural formula, the proportions of each component are molar ratios, and t-Bu refers to tert-butyl.

[0417] [Chemical Formula 12] (Substrate 1) Cellulose acylated membrane (manufactured by Fujifilm Corporation, trade name: ZRD40SL) Example 1 <1. Fabrication of substrate 1 with diffusion barrier layer> (1) Preparation of diffusion barrier layer forming liquid (resin solution) The components were mixed according to the composition shown below and stirred in a constant temperature bath at 50°C for 1 hour to dissolve poly(methacrylic acid) (manufactured by FUJIFILM Wako Pure Chemical Corporation, with a weight average molecular weight of approximately 100,000), thus preparing a diffusion barrier layer forming solution.

[0418] ------------------------------------------------------------ Composition of diffusion-inhibiting layer-forming liquid ------------------------------------------------------------ Poly(methacrylic acid) (manufactured by FUJIFILM Wako Pure Chemical Corporation, weight average molecular weight approximately 100,000) 4.0 parts by weight 60.0 parts by weight of pure water 36.0 parts by weight of ethanol ------------------------------------------------------------ Next, the obtained diffusion barrier layer forming liquid was filtered using a filter with an absolute filtration accuracy of 5 μm (trade name: Hydrohobic Fluorepore Membrane, manufactured by Millex).

[0419] (2) Fabrication of diffusion barrier layer The above-filtered diffusion barrier layer forming liquid was applied to the substrate 1 using a bar coater to make the film thickness 1.1 μm after drying, and then dried at 120°C for 60 seconds to produce the substrate 1 with a diffusion barrier layer.

[0420] <2. Fabrication of Optical Absorption Filter No. 101> (1) Preparation of wavelength-selective absorption layer forming liquid (resin solution) The components were mixed in the manner shown below to prepare the wavelength-selective absorption layer forming liquid Ba-2.

[0421] ------------------------------------------------------------ Composition of Ba-2, the wavelength-selective absorption layer forming liquid ------------------------------------------------------------ Resin 1 76.8 parts by weight Leveling agent 1 0.08 parts by weight Dye D-3 3.05 parts by weight Dye B-18 2.85 parts by weight 4-Methylquinoline (manufactured by Tokyo Chemical Industry Co., Ltd.) 17.2 parts by weight Methyl ethyl ketone (solvent) 566.7 parts by weight ------------------------------------------------------------ Next, the obtained wavelength selective absorption layer forming liquid Ba-2 was filtered using filter paper with an absolute filtration accuracy of 10 μm (#63, manufactured by TOYO ROSHI KAISHA, Ltd.), and further filtered using a metal sintered filter with an absolute filtration accuracy of 2.5 μm (trade name: PALL Filter PMF, media code: FH025, manufactured by NIHON PALL LTD.).

[0422] (2) Fabrication of optical absorption filter The wavelength selective absorption layer forming liquid Ba-2 after the above-mentioned filtration treatment was coated onto the diffusion barrier layer side of the substrate 1 with the diffusion barrier layer using a bar coater, so that the film thickness after drying is 2.5 μm, and then dried at 120°C to produce the light absorption filter No.101.

[0423] <3. Fabrication of optical absorption filters No. 102-105 and r201> In the fabrication of optical absorption filter No. 101, the resin 1 constituting the wavelength selective absorption layer was replaced with an equal mass of the resin shown in Table 1. Otherwise, optical absorption filters No. 102 to 105 of the present invention were fabricated in the same manner as optical absorption filter No. 101.

[0424] Furthermore, in the fabrication of optical absorption filter No. 105, except for removing dye D-3, dye B-18, and 4-methylquinoline from the wavelength selective absorption layer forming solution, optical absorption filter No. r201 was fabricated in the same manner as optical absorption filter No. 105.

[0425] Fabrication of an optical absorption filter with a gas barrier layer Regarding optical absorption filters No. 101 to 105 and r201, optical absorption filters (optical absorption filters with gas barrier layers) were fabricated by further stacking a gas barrier layer on the optical absorption filter in the following manner, and their evaluation was described later.

[0426] (1) Preparation of barrier layer forming liquid (resin solution) The components were set to the composition ratio shown below. Kuraray Poval AQ-4105 (trade name, manufactured by KURARAY CO.,LTD., modified polyvinyl alcohol, saponification degree 98-99 mol%) was dissolved in pure water and isopropanol in a constant temperature bath at 90°C for 1 hour. After cooling to room temperature, polyethyleneimine (manufactured by FUJIFILM Wako PureChemical Corporation, weight average molecular weight approximately 10,000) was added to prepare the barrier layer forming liquid.

[0427] ------------------------------------------------------------ Composition of the gas barrier layer forming liquid ------------------------------------------------------------ Kuraray Poval AQ-4105 (product name, manufactured by KURARAY CO., LTD.) 3.8 parts by weight Polyethyleneimine (manufactured by FUJIFILM Wako Pure Chemical Corporation, weight average molecular weight approximately 10,000) 0.2 parts by weight 88.5 parts by weight of pure water 7.5 parts by weight of isopropanol ------------------------------------------------------------ Next, the obtained barrier layer forming liquid was filtered using a filter with an absolute filtration accuracy of 5 μm (trade name: Hydrohobic Fluorepore Membrane, manufactured by Millex).

[0428] (2) Stacking of gas barrier layers The gas barrier layer forming liquid after the above filtration treatment was coated onto the wavelength selective absorption layer side of the optical absorption filter using a bar coater, so that the film thickness after drying was 0.3 μm. The film was then dried at 130°C for 60 seconds to produce an optical absorption filter with a gas barrier layer.

[0429] like Figure 2 As shown, the optical absorption filter with the gas barrier layer has a structure in which a substrate 1 (14), a diffusion barrier layer 13, a wavelength selective absorption layer 12 and a gas barrier layer 11 are stacked in sequence.

[0430] Among them, No. 101 to 105 are optical absorption filters of the present invention, and No. r201 is an optical absorption filter for reference.

[0431] <4. Fabrication of Optical Absorption Filter No. 106 with Gas Barrier Layer> In the fabrication of the light absorption filter No. 101 with a gas barrier layer, the polyethyleneimine added to the gas barrier layer was replaced with an equal part by mass of poly(N-vinylamine) resin (manufactured by Mitsubishi Chemical Corporation, trade name: PVAM-0570B, weight average molecular weight 100,000). Otherwise, the light absorption filter No. 106 with a gas barrier layer was fabricated in the same manner as the light absorption filter No. 101.

[0432] Among them, No. 106 is the optical absorption filter of the present invention.

[0433] <5. Fabrication of Optical Absorption Filters No. C202 and C203 with Gas Barrier Layers> In fabricating the light absorption filter No. 101 with a barrier layer, a comparative example light absorption filter No. c202 with a barrier layer was fabricated in the same manner as the fabrication of the light absorption filter No. 101, except that polyethyleneimine was not added to the barrier layer.

[0434] Furthermore, when fabricating the light absorption filter No. 104 with a gas barrier layer, the comparative example light absorption filter No. c203 with a gas barrier layer was fabricated in the same manner as the light absorption filter No. 104, except that polyethyleneimine was not added to the gas barrier layer.

[0435] <Evaluation of the physical properties of the gas barrier layer> Regarding the physical properties of the gas barrier layer measured by the method described in International Publication Nos. 2022 / 149510

[0182] to

[0184] , in the case of adding 5% by mass of either the above-mentioned polyethyleneimine (manufactured by FUJIFILM Wako Pure Chemical Corporation, weight average molecular weight about 10,000) or poly(N-vinylamine) resin (manufactured by Mitsubishi Chemical Corporation, trade name: PVAM-0570B, weight average molecular weight 100,000), the crystallinity is 47% and the oxygen permeability is 2.5 cc / m 2 •day•atm, thickness 0.3μm.

[0436] [1. Fit] A light-absorbing filter with a gas barrier layer was cut into pieces 25 mm wide and 150 mm long. The gas barrier layer side of the filter was then bonded to glass using an adhesive (trade name: SK2057, manufactured by Soken Chemical & Engineering Co., Ltd.) with a width of 30 mm and a length of 100 mm, thus creating an adhesion evaluation film. Furthermore, the light-absorbing filter with the gas barrier layer was bonded in such a manner that the bonding surface between the adhesive and the filter with the gas barrier layer was 25 mm wide and 100 mm long, with an excess of 25 mm wide and 50 mm long relative to the adhesive and glass laminate (not bonded to the adhesive).

[0437] Next, a 90-degree peel test was conducted according to JIS standard: JIS Z-0237 (2009) at a peel speed of 300 mm / min and 25°C. Specifically, in the adhesion evaluation film obtained above, at the boundary between the portion of the light absorption filter with the gas barrier layer adhered to the adhesive and the portion not adhered to the adhesive, a 25 mm wide cut was made with a cutting blade from the gas barrier layer side to the diffusion barrier layer directly in front of the substrate, in a manner that the cut would not reach the substrate. Holding the portion of the light absorption filter with the gas barrier layer not adhered to the glass, the portion of the light absorption filter with the gas barrier layer adhered to the glass was peeled 50 mm toward the side opposite to the glass side in a direction perpendicular to the glass surface, and the peel force at this point was measured using a tensile testing machine.

[0438] In the above test, the average peel force (average peel force) was calculated from the position where 20 mm was peeled to the position where 50 mm was peeled. Based on this average peel force, the adhesion was evaluated by the following criteria.

[0439] In addition, the adhesion between the adhesive-based glass and the gas barrier layer in the optical absorption filter is significantly higher than the adhesion between the layers constituting the optical absorption filter. The average peel force obtained through the above test is the peel force between the two layers that are easiest to peel off among the layers constituting the optical absorption filter.

[0440] -Evaluation Criteria- A: The average peel force is above 5N / 25mm.

[0441] B: The average peel force is above 2N / 25mm and less than 5N / 25mm.

[0442] C: Average peel force is less than 2N / 25mm.

[0443] The results are shown in Table 1.

[0444] [Table 1]

[0445] (Notes in the table) Resins 1 to 5: These are the aforementioned resins 1 to 5.

[0446] Polyethyleneimine: Manufactured by FUJIFILM Wako Pure Chemical Corporation, with a weight-average molecular weight of approximately 10,000. Poly(N-vinylamine): Poly(N-vinylamine) resin, manufactured by Mitsubishi Chemical Corporation, trade name: PVAM-0570B, weight average molecular weight 100,000 Added amount: indicates the percentage of resin containing basic groups in the gas barrier layer, based on mass.

[0447] "-" indicates that the gas barrier layer does not contain resin containing basic groups.

[0448] As can be seen from the results in Table 1, the optical absorption filters No. 101 to 106 of the present invention, which have a gas barrier layer as the adjacent layer specified in the present invention, exhibit excellent sealing performance. On the other hand, regarding the comparative examples optical absorption filters No. c202 and c203, the adjacent layer, i.e., the gas barrier layer, directly disposed on one side of the wavelength selective absorption layer does not contain a resin containing basic groups, which does not meet the requirements of the present invention. The sealing performance of these comparative examples optical absorption filters No. c202 and c203 is insufficient, and delamination easily occurs at the interface between the wavelength selective absorption layer and the gas barrier layer.

[0449] [2. Decolorization rate] The decolorization rate was evaluated for light absorption filters No. 101–106 with gas barrier layers.

[0450] (Ultraviolet radiation test) At atmospheric pressure (101.33 kPa), using an ultra-high pressure mercury lamp (manufactured by HOYA CORPORATION, trade name: UL750), at room temperature, a light absorption filter with a barrier layer and a standard filter were irradiated from the barrier layer side (the side opposite to substrate 1) with an illuminance of 100 mW / cm². 2 The radiation dose is 2000 mJ / cm². 2 Ultraviolet (UV) radiation.

[0451] <Absorbance of the light absorption filter (before and after UV irradiation)> The absorbance Ab(λ) of the light-absorbing filter and the standard filter before and after ultraviolet irradiation was calculated as follows.

[0452] (1) Measurement of absorbance Using a UV3600 spectrophotometer (trade name) manufactured by SHIMADZU CORPORATION, the absorbance of light-absorbing filters with gas barrier layers and standard filters was measured in wavelength ranges of 380–800 nm per 1 nm.

[0453] The standard filters for optical absorption filters No. 101-106, C202, and C203 containing resins 1-5 were changed to optical absorption filter No. r201, which does not contain dye and compound B. Furthermore, since the absorbance values ​​of resins 1-5 are not different in the wavelength range of 380-800 nm, optical absorption filter No. r201 was used as the standard filter for all optical absorption filters.

[0454] (2) Calculation of absorbance The absorbance values ​​Ab of the light absorption filter with a barrier layer measured above at each wavelength λnm were used. x The absorbance values ​​Ab0(λ) and the standard filter containing the same resin at each wavelength λnm were obtained, and the absorbance Ab(λ) of the light absorption filter before ultraviolet irradiation was calculated by the following formula.

[0455] Ab(λ) = Ab x (λ)-Ab0(λ) Hereinafter, the wavelength exhibiting the maximum absorption Ab(λ) among the wavelengths of the absorbance Ab(λ) of the optical absorption filter in the wavelength region of 400–700 nm will be defined as the wavelength of maximum absorption (hereinafter, it will also be simply referred to as "λ"). max ”), which will λ max The absorbance below is set as the absorption maximum (hereinafter also referred to as "Ab(λ)"). max )

[0456] In addition, the maximum absorption wavelength and absorption maximum value were determined for dyes B-18 and D-3 respectively, and the decolorization rate was evaluated for each dye as described later.

[0457] (3) Evaluation of decolorization rate The maximum absorbance (Ab(λ)) before and after the above ultraviolet irradiation test max The decolorization rate was calculated using the following formula.

[0458] Decolorization rate (%) = 100 - (Ab(λ) after UV irradiation) max ) / Ab (λ) before ultraviolet irradiation max ))×100 The calculated decolorization rates of light absorption filters No. 101 to 106 with gas barrier layers are all above 90%, demonstrating excellent decolorization performance.

[0459] (4) Absorption originating from the new coloring structure accompanying dye decomposition (secondary absorption) In addition, in light absorption filters No. 101 to 106 with gas barrier layers, the value of subtracting the ratio of (I) from the ratio of (II) below is 5.0% or less, which suppresses secondary absorption associated with dye decomposition caused by ultraviolet irradiation.

[0460] (I) {Ab(450) before UV irradiation / Ab(λ) before UV irradiation} max )}×100% (II) {Ab(450) after UV irradiation / Ab(λ) before UV irradiation} max )}×100% Reference example: Evaluation of the fabrication and decolorization properties of light absorption filters comprising at least one of azo pigments represented by any one of general formulas (i) to (iv) and indigoaniline pigments represented by general formula (v). The materials and filter numbers used in the fabrication and evaluation of the decolorization properties of the light absorption filters described below are used only in the reference examples following this paragraph.

[0461] [Fabrication of an optical absorption filter] The following shows the materials used to make optical absorption filters.

[0462] <Polymer (Resin)> (Resin 1) Cyclohexyl methacrylate-methacrylic acid random copolymer, with methacrylic acid content of 29 mol% and weight average molecular weight of 26300.

[0463] Furthermore, the methacrylic portion of resin 1 corresponds to compound A, which has an acid group, as specified in this invention.

[0464] <Compound B> 4-Methylquinoline (manufactured by Tokyo Chemical Industry Co., Ltd., Lepidine, pKaH5.1) <Dyes> [Chemical Formula 13] [Chemical Formula 14] (Leveling agent 1) A polymeric surfactant composed of the following components is used as leveling agent 1. In the following structural formula, the proportions of each component are molar ratios, and t-Bu refers to tert-butyl.

[0465] [Chemical Formula 15] (Substrate 1) Polyethylene terephthalate (manufactured by TORAY INDUSTRIES, INC., trade name: Lumirror XD-510P, film thickness 50μm) <1. Fabrication of Optical Absorption Filter No. 101> (1) Preparation of resin solution (light absorption filter forming solution) The components were mixed in the manner shown below to prepare the light absorption filter forming liquid (composition) Ba-1.

[0466] ------------------------------------------------------------ Composition of the light absorption filter forming liquid Ba-1 ------------------------------------------------------------ Resin 1 81.1 parts by weight Leveling agent 1 0.08 parts by weight Dye B-19 1.56 parts by weight 4-Methylquinoline (manufactured by Tokyo Chemical Industry Co., Ltd.) 17.2 parts by weight Methyl ethyl ketone (solvent) 566.7 parts by weight ------------------------------------------------------------ Next, the obtained light absorption filter forming liquid Ba-1 was filtered using filter paper with an absolute filtration accuracy of 10 μm (#63, manufactured by TOYO ROSHI KAISHA, Ltd.), and further filtered using a metal sintered filter with an absolute filtration accuracy of 2.5 μm (trade name: PALL Filter PMF, media code: FH025, manufactured by NIHON PALL LTD.).

[0467] (2) Fabrication of optical absorption filter The light absorption filter forming liquid Ba-1 after the above filtration treatment was coated onto the substrate 1 using a bar coater to make the film thickness 2.2 μm after drying, and then dried at 120°C to produce light absorption filter No.101.

[0468] <2. Fabrication of optical absorption filters No. 102~112, r201, c202~c206> In the fabrication of light absorption filter No. 101, at least one of the types and amounts of dyes was changed to those listed in Table 1A. Otherwise, light absorption filters No. 102–112 and c202–c206 were fabricated in the same manner as light absorption filter No. 101. Furthermore, while keeping the amounts of leveling agent 1 and compound B fixed in light absorption filter No. 101, the amount of resin was adjusted according to the changes in the amount of dyes, while maintaining the overall mass of the filter.

[0469] Furthermore, in the fabrication of light absorption filter No. 101, the amount of resin was changed without compound B and dye, while keeping the overall mass of the filter constant. In addition, light absorption filter No. r201 was fabricated in the same manner.

[0470] Among them, No. 101 to 112 are optical absorption filters for reference examples, No. c202 to c206 are optical absorption filters used for comparison, and No. r201 is an optical absorption filter for reference.

[0471] Fabrication of an optical absorption filter with a gas barrier layer Regarding optical absorption filters No. 101~112, r201, c202~c206, optical absorption filters (optical absorption filters with gas barrier layers) were fabricated by further stacking gas barrier layers on the optical absorption filters in the following manner, and their evaluation was described later.

[0472] (1) Fabrication of substrate 3 Using a corona treatment device (trade name: Corona-Plus, manufactured by VETAPHONE), at a discharge rate of 1000 W•min / m 2 Corona treatment was performed on the wavelength selective absorption layer side of the optical absorption filter with substrate fabricated above under the condition of a processing speed of 3.2 m / min, and it was used as substrate 3.

[0473] (2) Preparation of resin solution The components were mixed according to the composition shown below and stirred in a constant temperature bath at 90°C for 1 hour to dissolve KurarayPoval AQ-4105 (trade name, manufactured by KURARAY CO., LTD., modified polyvinyl alcohol, saponification degree 98-99 mol%), thus preparing the gas barrier layer forming liquid.

[0474] ------------------------------------------------------------ Composition of the gas barrier layer forming liquid ------------------------------------------------------------ Kuraray Poval AQ-4105 (product name, manufactured by KURARAY CO., LTD.) 4.0 parts by weight 88.5 parts by weight of pure water 7.5 parts by weight of isopropanol ------------------------------------------------------------ Next, the obtained barrier layer forming liquid was filtered using a filter with an absolute filtration accuracy of 5 μm (trade name: Hydrohobic Fluorepore Membrane, manufactured by Millex).

[0475] (3) Stacking of gas barrier layers The filtered barrier layer forming liquid was applied to the corona-treated side of the substrate 3 using a bar coater to make the dried film thickness 1.6 μm, and then dried at 120°C for 60 seconds to produce a light absorption filter with a barrier layer.

[0476] The optical absorption filter with the gas barrier layer has a structure in which a substrate 1, a wavelength selective absorption layer and a gas barrier layer are stacked in sequence.

[0477] <Evaluation of the physical properties of the gas barrier layer> The physical properties of the gas barrier layer, determined by the methods described in International Publication No. 2022 / 149510

[0182] to

[0184] , are a crystallinity of 53% and an oxygen permeability of 0.4 cc / m. 2 •day•atm, thickness 1.6μm.

[0478] <Absorbance of the light absorption filter (before ultraviolet irradiation)> (1) Measurement of absorbance Using a UV3600 spectrophotometer (trade name) manufactured by SHIMADZU CORPORATION, the absorbance of light-absorbing filters with gas barrier layers and standard filters was measured in wavelength ranges of 380–800 nm per 1 nm.

[0479] The standard filters No. 101-112 and C202-C206 containing resin 1 are changed to No. r201, which does not contain dye and compound B.

[0480] (2) Calculation of absorbance The absorbance values ​​Ab of the light absorption filter with a barrier layer measured above at each wavelength λnm were used. x The absorbance values ​​Ab0(λ) and the standard filter containing the same resin at each wavelength λnm were obtained, and the absorbance Ab(λ) of the light absorption filter before ultraviolet irradiation was calculated by the following formula.

[0481] Ab(λ) = Ab x (λ)-Ab0(λ) Hereinafter, the wavelength exhibiting the maximum absorption Ab(λ) among the wavelengths of the absorbance Ab(λ) of the optical absorption filter in the wavelength region of 400–700 nm will be defined as the wavelength of maximum absorption (hereinafter, it will also be simply referred to as "λ"). max ”), which will λ max The absorbance below is set as the absorption maximum (hereinafter also referred to as "Ab(λ)"). max )

[0482] Furthermore, the aforementioned maximum absorption wavelength and absorption maximum value were determined for dyes A, B, and C respectively, and the decolorization rate was evaluated for each dye as described later. Specifically, the azo pigments represented by the aforementioned general formula (i), namely dyes B-19 and B-18, and comparative dyes 1 to 4, were classified as dyes A; dyes 7-23, the azo pigments represented by the aforementioned general formula (ii), namely dye F-1, the azo pigments represented by the aforementioned general formula (iii), namely dyes E-1 and E-2, the azo pigments represented by the aforementioned general formula (iv), namely dyes D-1 and D-2, and comparative dye 5, were classified as dyes B; and the indigoaniline pigments represented by the aforementioned general formula (v), namely dyes G-1 and G-2, and dye C-73, were classified as dyes C.

[0483] <<Evaluation 1>> The decolorization rate of each optical absorption filter was evaluated.

[0484] The results are shown in Table 2A below.

[0485] (Ultraviolet radiation test) At atmospheric pressure (101.33 kPa), using an ultra-high pressure mercury lamp (manufactured by HOYA CORPORATION, trade name: UL750) at room temperature, light absorption filters with gas barrier layers and standard filters were tested at an illuminance of 100 mW / cm². 2 The UV radiation doses recorded in Table 1A were irradiated from the gas barrier layer side (the side opposite to substrate 1).

[0486] <Absorbance of the light absorption filter (after ultraviolet irradiation)> Using a light-absorbing filter with a barrier layer after ultraviolet irradiation and a standard filter, the absorbance Ab(λ) of the light-absorbing filter after ultraviolet irradiation was calculated using the same method as described above for <Absorbance of the light-absorbing filter (before ultraviolet irradiation)>.

[0487] [1. Evaluation of decolorization rate] The maximum absorbance (Ab(λ)) before and after the above ultraviolet irradiation test max The decolorization rate was calculated using the following formula.

[0488] Decolorization rate (%) = 100 - (Ab(λ) after UV irradiation) max ) / Ab (λ) before ultraviolet irradiation max ))×100 [2. Evaluation of whether there is secondary absorption accompanying pigment decomposition] The absorbance at wavelength 450 nm (hereinafter, also referred to as "Ab(450)") is based on the maximum absorption value before ultraviolet irradiation (Ab(λ)). max ), and the absorbance at a wavelength of 650 nm (hereinafter, also referred to as "Ab(650)") relative to the maximum absorption value before ultraviolet irradiation (Ab(λ)). max The ratio of the two ratios was used to evaluate whether there was absorption (secondary absorption) from the new coloring structure accompanied by pigment decomposition. The smaller the value obtained by subtracting the ratio of (I) below from the ratio of (II) below, and the smaller the value obtained by subtracting the ratio of (III) below from the ratio of (IV) below, the less absorption from the new coloring structure accompanied by pigment decomposition occurred.

[0489] Furthermore, as described in Table 2A below, the wavelengths that can be used to evaluate whether there is secondary absorption accompanying pigment decomposition, i.e., the wavelengths in which the pigment shows almost no absorption before ultraviolet irradiation and new absorption caused by pigment decomposition is observed, can be selected as follows: wavelength 450nm for No.101, 105, 106, 109-111 and c203, and wavelength 650nm for No.101-109, 112 and c202-c206.

[0490] (I) {Ab(450) before UV irradiation / Ab(λ) before UV irradiation} max )}×100% (II) {Ab(450) after UV irradiation / Ab(λ) before UV irradiation} max )}×100% (III) {Ab(650) before UV irradiation / Ab(λ) before UV irradiation} max )}×100% (IV) {Ab(650) after UV irradiation / Ab(λ) before UV irradiation} max )}×100% [Table 1A]

[0491] [Table 2A]

[0492] (Notes in the table) λ max It refers to the wavelength at which the optical absorption filter exhibits the highest absorbance Ab(λ) in the region of maximum absorption in the wavelength range of 400 to 700 nm.

[0493] The amount of dye and compound B is defined as the number of parts by mass relative to 100 parts by mass of the wavelength-selective absorption layer.

[0494] Ab(λ) max (λ) refers to the wavelength of maximum absorption. max The absorbance value at that location.

[0495] The "-" in the decolorization rate column indicates that the corresponding dye is not present.

[0496] The following information can be obtained from the results in Tables 1A and 2A above.

[0497] The light absorption filters No. c202 to c206 of the comparative examples, which do not contain any of the azo dyes represented by general formulas (i) to (iv) and any of the indoaniline dyes represented by general formula (v), all have low decolorization rates caused by UV light irradiation.

[0498] In contrast to these, the light absorption filters No. 101-104 of the reference examples containing azo dyes represented by general formula (i), namely dyes B-19 or B-18; the light absorption filters No. 105 and 106 of the reference examples containing azo dyes represented by general formula (iv), namely dyes D-1 or D-2; the light absorption filters No. 107 and 108 of the reference examples containing azo dyes represented by general formula (iii), namely dyes E-1 or E-2; and the light absorption filters of the reference examples containing azo dyes represented by general formula (ii), namely dyes F-1... Filter No. 109, light absorption filters No. 110 and 111 containing reference examples of indigo aniline pigments, i.e. dyes G-1 or G-2 represented by general formula (v), and light absorption filters No. 112 containing reference examples of azo pigments, i.e. dyes B-19 represented by general formula (i) and azo pigments, i.e. dyes E-2 represented by general formula (iii) all have the following characteristics: high decolorization rate caused by UV light irradiation, almost no secondary absorption accompanying dye decomposition caused by UV light irradiation, and excellent decolorization performance when irradiated with ultraviolet light at room temperature.

[0499] The invention has been described together with its embodiments, but unless otherwise stated, we do not intend to limit our invention to any of the details described, and it should be interpreted broadly without departing from the spirit and scope of the invention as shown in the appended claims.

[0500] This application claims priority based on Japanese Patent Application No. 2023-068488, filed in Japan on April 19, 2023, and Japanese Patent Application No. 2023-141858, filed in Japan on August 31, 2023, the contents of which are incorporated herein by reference as a part of the description herein.

[0501] Symbol Explanation 1-Upper polarizer, 2-Direction of absorption axis of upper polarizer, 3-Upper electrode substrate of liquid crystal cell, 4-Orientation control direction of upper substrate, 5-Liquid crystal layer, 6-Lower electrode substrate of liquid crystal cell, 7-Orientation control direction of lower substrate, 8-Lower polarizer, 9-Direction of absorption axis of lower polarizer, B-Backlight unit, 10-Liquid crystal display device, 11-Gas barrier layer, 12-Wavelength selective absorption layer, 13-Diffusion barrier layer, 14-Substrate 1, 15-Light absorption filter.

Claims

1. A light-absorbing filter comprising: a wavelength-selective absorption layer containing a resin A containing an acid group and a dye; and an adjacent layer disposed directly on at least one side of the wavelength-selective absorption layer, wherein the adjacent layer containing a resin containing a basic group.

2. The light-absorbing filter according to claim 1, wherein the wavelength-selective absorption layer contains a compound B that forms a hydrogen bond with the acid group contained in the resin A and generates a radical by ultraviolet irradiation.

3. The light-absorbing filter according to claim 2, wherein the light-absorbing filter decolorizes the dye by chemical change by irradiation of ultraviolet rays.

4. A light filter formed by mask exposure of the light-absorbing filter according to claim 2 or 3 by ultraviolet irradiation.

5. An organic electroluminescent display device, inorganic electroluminescent display device, or liquid crystal display device, wherein the light filter according to claim 4 is included.

6. The organic electroluminescent display device, inorganic electroluminescent display device, or liquid crystal display device according to claim 5, wherein a layer that hinders light absorption of the compound B that generates a radical by ultraviolet irradiation is present on the side of the visual recognizer with respect to the light filter.

7. A method for manufacturing a light filter, comprising the step of: mask exposure by irradiation of ultraviolet rays to the light-absorbing filter according to claim 2 or 3.

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