Apparatus for measuring spatial spectral irradiance uniformity, data acquisition and determination method

Abstract

The present application relates to the field of semiconductor device detection, specifically relates to spatial spectral irradiance consistency measurement device, data acquisition and determination method, the device includes: external frame module, the inside of external frame module defines test space, external frame module has support structure for bearing to be measured light source on it;Test module is arranged in the test space, and it includes: object table;Positioning system, including horizontal translation mechanism and vertical lifting mechanism;Through the horizontal translation mechanism, the irradiance meter probe and the spectrometer integrating sphere are installed on the object table, and the irradiance meter probe and the spectrometer integrating sphere move in the test space through the positioning system;Processing module is electrically connected to the external frame module and the test module.It is used for measuring the spatial spectral irradiance consistency of high-power microwave ultraviolet light source for semiconductor, solves the problem of how to measure and evaluate the spatial spectral irradiance consistency of microwave ultraviolet light source.

Description

Measurement equipment, data acquisition, and determination methods for spatial spectral irradiance consistency Technical Field

[0001] This invention relates to the field of semiconductor equipment testing, specifically to measurement equipment for spatial spectral irradiance consistency and methods for data acquisition and determination. Background Technology

[0002] As semiconductor manufacturing nodes continue to shrink, low-dielectric-constant thin films have become key materials in advanced interconnect processes, used to reduce parasitic capacitance and signal delay between metal wires. Among various deposition techniques, plasma-enhanced chemical vapor deposition (PECVD) is widely used due to its excellent step coverage and compositional controllability. This process is highly dependent on high-energy ultraviolet radiation sources, using ultraviolet photons to dissociate precursor gases and excite plasma reactions, thereby achieving low-temperature, uniform deposition of low-dielectric-constant thin films.

[0003] In recent years, microwave ultraviolet (UV) light sources have gradually replaced traditional electrode-type mercury lamps as the core light source in semiconductor low-dielectric-constant thin film deposition equipment due to their high output spectral purity, high power, strong UV radiation, and lack of electrode contamination risk. The consistency of its spatial spectral irradiance directly determines the dielectric constant consistency of the thin film and the device yield, making it a crucial indicator for performance evaluation. Therefore, detecting the spatial spectral irradiance of manufactured microwave UV light sources for low-dielectric-constant thin film deposition has practical engineering significance.

[0004] Current research and development on microwave ultraviolet (UV) light sources mainly focuses on the UV light source system itself, such as Chinese patents CN 1422436A and CN 103038572 A, which protect the design and fabrication methods of the UV light source system itself. Regarding testing equipment for the performance of UV light sources, Chinese patent CN 119469690A discloses a multi-channel rapid testing system with a modular design, using detachable detection tubes and connecting tubes, and incorporating a built-in UV light intensity sensor, supporting rapid disassembly and assembly testing of the UV curing lamp on the production line. Chinese patent CN 222800179U discloses a light intensity measuring device and UV curing equipment, which can accurately confirm the illumination of silicon wafers throughout the UV curing process, helping to analyze the impact of light intensity on the process effect of silicon wafers. However, the above patents can only measure the radiation intensity at a single point on the UV curing equipment. Furthermore, the radiation intensity and spectral consistency of the UV light source at different locations on the working surface can significantly affect the final curing effect.

[0005] In addition, microwave ultraviolet light sources emit high-energy, high-intensity ultraviolet light, which can cause significant harm to human skin, eyes, and other organs without protection. Furthermore, the energy of microwave ultraviolet light sources is derived from microwaves, posing a certain risk of microwave leakage, and both ultraviolet light and microwaves are in wavelengths invisible to the human eye. These characteristics mean that when testing microwave ultraviolet light sources, it is impossible to change testing instruments or equipment while the light is on. When experiments require measuring multiple parameters, repeated switching of the light on and off is necessary, and it is impossible to determine whether one is in a safe experimental environment.

[0006] Research and investigation revealed that existing research and inventions do not provide methods or equipment to address the aforementioned issues. Therefore, a method and testing equipment are needed to measure the spatial spectral irradiance uniformity of high-power microwave ultraviolet light sources for semiconductor applications. Summary of the Invention

[0007] The purpose of this invention is to overcome the shortcomings of the prior art by providing a measurement device, data acquisition and determination method for spatial spectral irradiance consistency.

[0008] The objective of this invention can be achieved through the following technical solutions:

[0009] The first aspect of the present invention discloses a measuring device for spatial spectral irradiance uniformity, comprising:

[0010] An external frame module, the interior of which defines the test space, and the external frame module has a support structure for supporting the light source under test;

[0011] The test module, located within the test space, includes:

[0012] storage table;

[0013] The positioning system includes a horizontal translation mechanism and a vertical lifting mechanism;

[0014] The radiometer probe and the spectrometer integrating sphere are mounted on the platform via the horizontal translation mechanism, and the radiometer probe and the spectrometer integrating sphere are moved within the test space via the positioning system.

[0015] The processing module is electrically connected to the external frame module and the test module.

[0016] According to a first aspect of the device, the external frame module comprises:

[0017] Test box frame;

[0018] A cooling fan is mounted on the test chamber frame;

[0019] The support structure is located on the top of the test box frame;

[0020] A rotary motor and a transmission gear set, wherein the rotary motor is connected to the support structure via the transmission gear set.

[0021] According to the apparatus of the first aspect of the invention, the inner surface of the test chamber frame is treated with black anodizing.

[0022] According to the first aspect of the invention, the support structure is a light source support plate with circular stepped edges and a hollow center.

[0023] The device according to the first aspect of the invention,

[0024] The shelf includes an upper shelf and a lower shelf.

[0025] The vertical lifting mechanism includes a lifting column and a lifting platform;

[0026] The upper shelf and the lower shelf are connected by the lifting column;

[0027] The lower shelf is connected to the bottom of the outer frame module via the lifting platform;

[0028] The radiometer probe is mounted on the upper shelf.

[0029] The integrating sphere of the spectrometer is mounted on the lower stage.

[0030] According to a first aspect of the invention, the upper shelf has a perforated area, and a light-blocking roller blind is installed in the perforated area; the light-blocking roller blind has a closed position and an open position, and in the closed position, it blocks the perforated area.

[0031] According to the device of the first aspect of the present invention, there are four lifting columns, which are respectively connected between the four corners of the upper shelf and the lower shelf;

[0032] The horizontal translation mechanism includes two translation platforms, which are fixed to the upper and lower storage platforms, respectively.

[0033] According to the apparatus of the first aspect of the present invention, the testing module further includes two laser distance sensors, which are respectively mounted on the upper shelf and the lower shelf.

[0034] A second aspect of the present invention discloses a method for acquiring spatial spectral irradiance consistency data, used in the apparatus according to the first aspect of the present invention, comprising:

[0035] Control the vertical lifting mechanism to move the radiometer probe to a plane at a preset distance from the light source to be tested, and place the light source to be tested on the support structure;

[0036] Control the horizontal translation mechanism to move the radiometer probe to multiple preset spatial points;

[0037] At each of the spatial locations, the irradiance value collected by the irradiance meter probe is acquired and recorded by the processing module;

[0038] Control the vertical lifting mechanism to move the integrating sphere of the spectrometer onto the plane;

[0039] Control the horizontal translation mechanism to move the spectrometer integrating sphere to the plurality of preset spatial points;

[0040] At each spatial location, the processing module acquires and records the relative spectral power distribution obtained by moving the spectrometer integrating sphere to the acquisition point.

[0041] The method according to a second aspect of the present invention further includes:

[0042] Change the value of the preset distance and repeat all the steps of the method.

[0043] The method according to a second aspect of the present invention further includes:

[0044] The support structure is controlled to make the light source under test rotate around its central axis.

[0045] A third aspect of the present invention discloses a method for determining spatial spectral irradiance uniformity, comprising the following steps:

[0046] Receive multiple sets of measurement data, each set of measurement data including an ultraviolet irradiance value E of a spatial point (u, v) on a plane at a preset distance a in front of the light source. u,v,a and a relative spectral power distribution The spatial point (u, v) is one of the n×n grid points on the plane, where u and v are the coordinate values ​​on the plane, u = -n / 2, -(n / 2-1), ..., -1, 0, 1, ..., n / 2, v = -n / 2, -(n / 2-1), ..., -1, 0, 1, ..., n / 2. Wavelength;

[0047] Based on the ultraviolet irradiance value E u,v,a The relative spectral power distribution And based on the preset ultraviolet radiometer spectral sensitivity S(λ), the absolute spectral irradiance corresponding to the spatial point (u,v) is determined. ;

[0048] The absolute spectral irradiance based on all spatial points (u,v) on the plane The consistency matrix S is determined through pairwise comparison calculations. a .

[0049] According to the method of the third aspect of the invention, the absolute spectral irradiance It is calculated using the following formula:

[0050] ,

[0051] in, and The effective wavelength range of the ultraviolet radiometer is defined as follows.

[0052] According to the method of the third aspect of the present invention, the consistency matrix S a Any consistency coefficient S within ij,a Calculated using the following formula:

[0053] ,

[0054] Where i and j represent the ordinal numbers of the absolute spectral irradiance being compared, and R ij,a The normalization factor is calculated as follows:

[0055] .

[0056] The method according to a third aspect of the invention further includes: comparing a plurality of said consistency matrices S when a takes different values. a .

[0057] Compared with the prior art, the present invention has the following advantages:

[0058] This invention addresses the problem of measuring and evaluating the spatial spectral irradiance consistency of microwave ultraviolet (UV) light sources. Existing working surface consistency evaluation techniques mostly consider only irradiance distribution. However, for applications such as semiconductor thin film deposition, not only is spatial uniformity of irradiance required, but also strict requirements for spectral shift. Different spectral power distributions may lead to inconsistent curing products or curing degrees at different locations, thus requiring inclusion as an evaluation indicator. This invention calculates absolute spectral irradiance from UV irradiance and relative spectral power distribution, and then visually displays the spectral irradiance consistency of the microwave UV light source through a consistency matrix. It simultaneously achieves the evaluation of spectral power distribution and UV irradiance. The calculation is simple, and the results are intuitive. This invention provides a testing method and equipment for the radiation consistency of high-power light source devices in semiconductor applications. Attached Figure Description

[0059] Figure 1 is a schematic diagram of the device of the present invention.

[0060] Figure 2 is a schematic diagram of the external frame module structure.

[0061] Figure 3 is a schematic diagram of the integrated testing module for microwave ultraviolet light source spectrum and irradiance.

[0062] Figure 4 is a flowchart of the method steps for measuring the spatial spectral irradiance consistency of a microwave ultraviolet light source according to the present invention.

[0063] Figure 5 shows the spectral irradiance curve of the original point of the microwave ultraviolet light source in the embodiment.

[0064] Reference numerals: 11-Test box frame, 12-Cooling fan, 13-Microwave ultraviolet light source support plate, 14-Rotary motor, 15-Transmission gear set, 21-Lifting platform, 22-Double-layer platform, 23-Lifting column, 24-Two-dimensional translation stage, 25-Laser distance sensor, 26-Spectrometer integrating sphere, 27-Ultraviolet radiometer probe, 28-Light-shielding roller blind, 31-Spectrometer, 32-Ultraviolet radiometer, 33-Programmable controller, 34-Computer. Detailed Implementation

[0065] The present invention will now be described in detail with reference to the accompanying drawings and specific embodiments. These embodiments are based on the technical solution of the present invention and provide detailed implementation methods and specific operating procedures. However, the scope of protection of the present invention is not limited to the following embodiments.

[0066] Example 1

[0067] Figure 1 shows a schematic diagram of the test equipment for measuring the spatial spectral irradiance consistency of a microwave ultraviolet light source according to the present invention. It includes three parts: an external frame module, an integrated test module for microwave ultraviolet light source spectrum and irradiance, and an online control and data processing module (or collectively referred to as the processing module).

[0068] As shown in Figure 2, the external frame module constitutes the overall architecture of the experimental system. It is a movable black box, including a test box frame 11 for isolating the test environment and a cooling fan 12 for ventilation and cooling. For convenient experimental testing, one side of the test box is designed as a double door with a handle, allowing the installation of a testing platform and testing equipment. The top layer of the test box is circularly layered and hollowed out. The microwave ultraviolet light source support plate (or support structure) 13 is stepped and hollowed out, and is placed on the top support plate. During experimental measurements, the microwave ultraviolet light source is placed on the support plate. The rotary motor 14 passes through the top layer of the test box and drives the microwave ultraviolet light source support plate 13 to rotate via a transmission gear set 15, thus achieving a uniform and slow rotation of the microwave ultraviolet light source. The transmission ratio of this transmission system is 18:5.

[0069] As shown in Figure 3, the integrated microwave ultraviolet light source spectrum and irradiance testing module constitutes the main detection part of this invention. It includes a lifting platform 21 that connects the integrated microwave ultraviolet light source spectrum and irradiance testing module to the external frame module. The lower platform 22(a) and upper platform 22(b) are connected by four uniformly controlled lifting columns 23 and placed on the lifting platform 21. The upper platform 22(b) has a rectangular hollow center. Two sets of two-dimensional translation stages 24 are respectively fixed in the center to the lower platform 22(a) and the upper platform 22(b). Two laser distance sensors are included: the lower laser distance sensor... The distance sensor 25(a) and the upper laser distance sensor 25(b) are respectively placed on the side platforms of two sets of two-dimensional translation stages 24. The spectrometer integrating sphere 26 is fixed on the lower two-dimensional translation stage 24(a), and the ultraviolet radiometer probe 27 is fixed on the upper two-dimensional translation stage 24(b). A light-shielding roller shutter 28 is installed in the rectangular hollow area in the middle of the upper platform 22(b). When the detection equipment on the upper platform 22(b) is working, the light-shielding roller shutter 28 is closed to shield the detection equipment on the lower platform 22(a) from light, preventing the lower detection equipment from aging faster due to prolonged exposure to light. The online control and data processing module consists of a spectrometer 31, an ultraviolet radiometer 32, a programmable controller 33, and a computer 34. It is responsible for data reading and processing, as well as the automated control of various motors, lifting platforms, and other mobile equipment.

[0070] Taking the measurement of a 9.6 kW microwave ultraviolet light source (10-inch lamp) as an example, this invention specifically illustrates the method steps and equipment application for measuring the spatial spectral irradiance consistency of a microwave ultraviolet light source. Figure 4 is a flowchart of the method steps for measuring the spatial spectral irradiance consistency of a microwave ultraviolet light source according to this invention, mainly divided into the following five test steps:

[0071] S401, Instrument Positioning and Preparation. This step is mainly the preparation stage for testing. Place the microwave ultraviolet light source to be tested on the microwave ultraviolet light source support plate 13, ensuring the experimental system is in a stable state. Check whether the cooling fan 12, lifting platform 21, two-dimensional translation stage 24, and other devices are working properly. If they are not working properly, adjust them to normal working state first to ensure that all components of the testing system can operate normally. According to the reading of the upper laser distance sensor 25(b), adjust the lifting platform 21 and lifting column 23 so that the distance between the ultraviolet radiometer probe 27 and the light source outlet is a = 200 mm. Here, the value of a is only an example of the approximate planar position of the wafer placement when the microwave ultraviolet light source is used for low dielectric constant thin film deposition in this embodiment. Different values ​​of a can be selected to evaluate the consistency of different planes and find the optimal placement position of the wafer. Move the upper two-dimensional translation stage 24(b) so that the center of the ultraviolet radiometer probe 27 is vertically aligned with the center of the light source. Close the light-shielding roller shutter 28.

[0072] S402, Testing the stability of the microwave ultraviolet light source. Turn on the cooling fan 12, and turn on the spectrometer 31, ultraviolet radiometer 32, programmable controller 33, and computer 34. Light up the microwave ultraviolet light source to be tested. Since the microwave ultraviolet light source rotates to irradiate the target wafer in actual applications, this invention allows the microwave ultraviolet light source to rotate slowly and uniformly, simulating the actual working mode. The computer reads the values ​​detected by the ultraviolet radiometer 32 and displays the irradiance versus time curve. When the curve shows a fluctuation of less than 1% within a 15-minute time range, the microwave ultraviolet light source is considered stable.

[0073] S403, Measure the ultraviolet irradiance and relative spectral power distribution at various points on the light-receiving surface. Adjust the lifting platform 21 so that the distance between the plane of the ultraviolet radiometer probe 27 and the light outlet of the light source is 200 mm. With the center directly below the center of the light source as the origin, and with the origin as the center, symmetrically set a 3×3 grid of points in the x and y directions with equal intervals of 150 mm. Control the movement of the upper two-dimensional translation stage 24(b), and control the ultraviolet radiometer 32 to read data. The time for the ultraviolet radiometer 32 to accumulate data reading at each point is the same as the time for the microwave ultraviolet light source to rotate 180 degrees. Obtain the 300 mm × 300 mm distribution of the microwave ultraviolet light source on the light-receiving surface at a distance of 200 mm from the light outlet of the light source. The ultraviolet irradiance of 9 points within a 300 mm × 300 mm square area is collected. After the data acquisition by the ultraviolet irradiance meter 32 is completed, the ultraviolet irradiance meter probe 27 is moved to the corner, the light-shielding roller shutter 28 is opened, and the lifting platform 21 and the lifting column 23 are moved so that the distance between the plane of the integrating sphere 26 of the spectrometer and the light outlet of the light source is 200 mm. In the same coordinate system, a 3×3 grid is symmetrically set in the x and y directions with equal intervals of 150 mm. The lower two-dimensional translation stage 24(a) is controlled to move, and the spectrometer 31 is linked to read the data to obtain the relative spectral power distribution of 9 points within a 300 mm × 300 mm square area on the light receiving surface 200 mm away from the light outlet of the microwave ultraviolet light source. The relative spectrum and irradiance data at each point correspond one-to-one.

[0074] S404, Calibration of Spectral Irradiance. The absolute spectral irradiance is further calibrated using the measured relative spectral power distribution data and ultraviolet irradiance data of the microwave ultraviolet light source. Ultraviolet Irradiance It is absolute spectral irradiance Convolution of the spectral sensitivity of the UV power meter probe over the effective wavelength range of the UV radiometer: ,in, and It is the effective wavelength range of the ultraviolet radiometer; relative spectral intensity. Proportional to absolute spectral irradiance: ,in, It is a proportionality constant and needs to be calculated from the total irradiance. Solve by substituting the above relationship into the integral formula: ,therefore, Finally, the absolute spectral irradiance is: Figure 5 shows the spectral irradiance curve of the original point of the microwave ultraviolet light source in the embodiment.

[0075] S405, Evaluate the consistency of spatial spectral irradiance. The nine obtained absolute spectral irradiance distribution curves are numbered 1-9 according to their corresponding spatial locations, with the following correspondence between the numbers and location coordinates: (0,0) is location 1, (-150,150) is location 2, (0,150) is location 3, (150,150) is location 4, (-150,0) is location 5, (150,0) is location 6, (-150,-150) is location 7, (0,-150) is location 8, and (150,-150) is location 9.

[0076] The nine absolute spectral irradiance curves obtained are on the same horizontal axis, i.e., wavelengths λ1, λ2, ..., λ m The vertical axis contains irradiance values, where m is equal to (λ). m - λ1) / λ step λ1 is the lower limit of the effective wavelength range of the spectrometer, λ m λ is the upper limit of the effective wavelength range of the spectrometer. step This refers to the resolution of the effective wavelength range of the spectrometer. For example, in the spectrometer used in the embodiments of this application, λ1 = 225 nm, λ m = 800nm, λ step = 0.5nm, then m = 1150. Then the ordinate sequence E of the i-th curve... (i) =[E1 (i) E2 (i) , ···, E n (i) By comparing the curves pairwise, the normalization factor R between the i-th and j-th curves is calculated. ij,200 :

[0077]

[0078] According to R ij,200 Calculate the consistency coefficient S between the i-th curve and the j-th curve. ij,200 :

[0079]

[0080] When S ij,200 When S = 0, the i-th curve and the j-th curve are completely different. ij,200 When S = 1, the i-th curve is completely identical to the j-th curve; ij,200 = S ji,200 S 200 It is a 9×9 consistency matrix and is a symmetric matrix; S ii,200 =1, meaning the same curve is completely similar; For the i-th absolute spectral irradiance distribution curve in Irradiance value at that location.

[0081] According to the calculated S ij,200 Thus, in this embodiment, the spatial spectral irradiance uniformity matrix S of nine points within a 300 mm × 300 mm square area on the light receiving surface 200 mm from the light outlet of the 9.6 kW microwave ultraviolet light source 10-inch lamp can be obtained. 200 :

[0082]

[0083] As can be seen, the spectral irradiance of the microwave ultraviolet light source on this plane has good consistency.

[0084] For ease of data demonstration, this embodiment only uses 9 points on a plane with a distance of 200 mm from the light source outlet. In actual measurement, the measurement accuracy can be increased by increasing the number of points, and the optimal illumination plane can be measured by increasing the number of planes.

[0085] The preferred embodiments of the present invention have been described in detail above. It should be understood that those skilled in the art can make numerous modifications and variations based on the concept of the present invention without creative effort. Therefore, all technical solutions that can be obtained by those skilled in the art based on the concept of the present invention through logical analysis, reasoning, or limited experimentation on the basis of existing technology should be within the scope of protection defined by the claims.

Claims

1. A measuring device for spatial spectral irradiance uniformity, characterized in that, include: An external frame module, which is a movable black box that defines the test space inside; The external frame module includes: a test box frame for isolating the test environment, with a hollow top; a support structure, which is a light source support plate with a hollow center, located on the top of the test box frame to support the light source to be tested; a test module, located within the test space, including: a platform; a positioning system, including a horizontal translation mechanism and a vertical lifting mechanism; an irradiance meter probe and a spectrometer integrating sphere mounted on the platform via the horizontal translation mechanism, the irradiance meter probe and the spectrometer integrating sphere moving within the test space via the positioning system; and a processing module electrically connected to the external frame module and the test module.

2. The device according to claim 1, characterized in that, The external frame module also includes: a cooling fan, mounted on the test box frame; a rotary motor and a transmission gear set, wherein the rotary motor is connected to the support structure via the transmission gear set.

3. The device according to claim 2, characterized in that, The inner surface of the test chamber frame is treated with black anodizing.

4. The device according to claim 2, characterized in that, The support structure has a circular stepped edge.

5. The device according to claim 1, characterized in that, The storage platform includes an upper storage platform and a lower storage platform. The vertical lifting mechanism includes a lifting column and a lifting platform. The upper storage platform and the lower storage platform are connected by the lifting column. The lower storage platform is connected to the bottom of the external frame module through the lifting platform. The radiometer probe is installed on the upper storage platform. The spectrometer integrating sphere is installed on the lower storage platform.

6. The device according to claim 5, characterized in that, The upper shelf has a cutout area, and a blackout roller blind is installed in the cutout area; the blackout roller blind has a closed position and an open position, and in the closed position, it covers the cutout area.

7. The device according to claim 5, characterized in that, The lifting columns consist of four columns, which are connected between the four corners of the upper and lower shelves respectively; the horizontal translation mechanism includes two translation platforms, which are fixed to the upper and lower shelves respectively.

8. The device according to claim 5, characterized in that, The testing module also includes two laser distance sensors, which are respectively installed on the upper and lower shelves.

9. A method for acquiring spatial spectral irradiance consistency data, used in the device according to any one of claims 1-8, characterized in that, include: Control the vertical lifting mechanism to move the radiometer probe to a plane at a preset distance from the light source to be tested, and place the light source to be tested on the support structure; The system controls a horizontal translation mechanism to move the radiometer probe to multiple preset spatial points; at each spatial point, the processing module acquires and records the irradiance value collected by the radiometer probe; the system controls a vertical lifting mechanism to move the spectrometer integrating sphere onto the plane; the system controls a horizontal translation mechanism to move the spectrometer integrating sphere to the multiple preset spatial points; and at each spatial point, the processing module acquires and records the relative spectral power distribution collected by the spectrometer integrating sphere.

10. The method according to claim 9, characterized in that, Also includes: Change the value of the preset distance and repeat all the steps of the method.

11. The method according to claim 9, characterized in that, Also includes: The support structure is controlled to make the light source under test rotate around its central axis.

12. A method for determining spatial spectral irradiance consistency, used in the measuring device according to any one of claims 1-8, characterized in that, Includes the following steps: Receive multiple sets of measurement data, each set of measurement data including an ultraviolet irradiance value E of a spatial point (u, v) on a plane at a preset distance a in front of the light source. u,v,a and a relative spectral power distribution The spatial point (u, v) is one of the n×n grid points on the plane. The grid points are symmetrically arranged with equal intervals in two mutually perpendicular directions, with the origin directly below the center of the light source under test. u and v are the coordinate values ​​on the plane. The wavelength; based on the ultraviolet irradiance value E u,v,a The relative spectral power distribution And based on the preset ultraviolet radiometer spectral sensitivity S(λ), the absolute spectral irradiance corresponding to the spatial point (u,v) is determined. The absolute spectral irradiance based on all spatial points (u,v) on the plane Calculate the absolute spectral irradiance corresponding to any two spatial points. The consistency coefficients among them, and all the calculated consistency coefficients constitute the consistency matrix S. a .

13. The method according to claim 12, characterized in that, The absolute spectral irradiance It is calculated using the following formula: ,in, and The effective wavelength range of the ultraviolet radiometer is defined as follows.

14. The method according to claim 12 or 13, characterized in that, The consistency matrix S a Any of the aforementioned consistency coefficients S within ij,a Calculated using the following formula: Where i and j represent the ordinal numbers of the absolute spectral irradiance being compared, and m is the total number of effective wavelength points within the effective wavelength range of the ultraviolet radiometer. From arrive The ordinal number of the value, Indicates the first One effective wavelength; and They represent the first The and the first One in The value of the absolute spectral irradiance at that location; R ij,a The normalization factor is calculated as follows: ,in, and They represent the first The and the first One in all A sequence of absolute spectral irradiance values ​​at each effective wavelength.

15. The method according to claim 12 or 13, characterized in that, Also includes: Compare multiple consistency matrices S with different values ​​of 'a'. a .

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